WO2014201950A1 - 一种二自由度外差光栅干涉仪位移测量系统 - Google Patents

一种二自由度外差光栅干涉仪位移测量系统 Download PDF

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WO2014201950A1
WO2014201950A1 PCT/CN2014/079223 CN2014079223W WO2014201950A1 WO 2014201950 A1 WO2014201950 A1 WO 2014201950A1 CN 2014079223 W CN2014079223 W CN 2014079223W WO 2014201950 A1 WO2014201950 A1 WO 2014201950A1
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grating
measurement
degree
interferometer
measuring
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PCT/CN2014/079223
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English (en)
French (fr)
Inventor
张鸣
朱煜
王磊杰
杨开明
刘召
成荣
刘昊
徐登峰
叶伟楠
张利
赵彦坡
田丽
张金
胡金春
穆海华
尹文生
秦慧超
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Tsinghua University
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Tsinghua University
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Priority to US14/900,121 priority Critical patent/US20160138903A1/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G01B9/02003—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies using beat frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Definitions

  • the present invention relates to a grating measuring system, and more particularly to a two-degree-of-freedom heterodyne grating interferometer measuring system for measuring displacement of a workpiece table of a lithography machine.
  • the grating measuring system is widely used in many electromechanical devices.
  • the measurement principle of the grating measurement system is mainly based on the principle of moiré fringe and the principle of diffraction interference.
  • the grating measuring system based on the Moire fringe principle has become the first choice for displacement measurement of many electromechanical devices due to its long distance measurement, low cost and easy assembly.
  • the accuracy is usually on the order of micrometers. Common in general industrial applications.
  • a lithography machine in semiconductor manufacturing equipment is a key device in the fabrication of semiconductor chips.
  • the ultra-precision workpiece stage is the core subsystem of the lithography machine, which is used to carry the high-speed ultra-precision step-scan motion by carrying the mask and the silicon wafer.
  • Ultra-precision workpiece table has become the most representative system in the book ultra-precision motion system with its high speed, high acceleration, large stroke, ultra-precision, multi-degree of freedom and other motion characteristics.
  • the ultra-precision workpiece stage usually uses a dual-frequency laser interferometer measurement system to measure the multi-degree of freedom displacement of the ultra-precision workpiece table.
  • the dual-frequency laser interferometer is difficult to improve due to environmental sensitivity, measurement speed, large space occupation, high price, and poor dynamic characteristics of the measurement target workpiece table.
  • a series of problems make it difficult to meet higher measurement needs.
  • US Patent Nos. US 7,102, 729 B2 (publication date August 4, 2005), US 7, 483, 120 B2 (publication date November 15, 2007), US7, 940, 392 B2 (publication date 2009 12
  • a flat grating measuring system and an arrangement scheme applied to a super-precision workpiece stage of a lithography machine are disclosed in the publication No. US2010/0321665 A1 (Publication Date December 23, 2010), which mainly utilizes one-dimensional Or a two-dimensional plane grating with a readhead to measure the horizontal large stroke displacement of the workpiece table.
  • the vertical displacement measurement uses sensors such as eddy current or interferometer, but the application of various sensors limits the measurement accuracy of the workpiece table.
  • US2011/0255096 A1 (Publication Date, October 20, 2011) discloses a grating measuring system applied to a lithography machine ultra-precision workpiece stage, which also uses a one-dimensional or two-dimensional grating to match a specific The reading head realizes the displacement measurement, and the horizontal and vertical displacement measurement can be performed simultaneously, but the structure is complicated;
  • U.S. Patent Publication No. US2011/0096334 A1 (publication date: April 28, 2011) discloses a heterodyne interferometer. A grating is used as the target mirror in the interferometer, but the interferometer can only achieve one-dimensional measurement.
  • a heterodyne grating interferometer measuring system using the principle of optical beat frequency is sought, which can realize simultaneous measurement of two linear degrees of freedom displacement; the measuring system measures short optical path and environmental sensitivity Low, measurement signal is easy to handle, resolution and accuracy can reach sub-nanometer or even higher; at the same time, the grating interferometer measurement system also has the advantages of simple structure, small size, light weight, easy installation and convenient application.
  • the measurement system is used as the ultra-precision workpiece table displacement measuring device, which can effectively reduce the shortage of the laser interferometer measuring system in the ultra-precision workpiece table application, and improve the performance of the ultra-precision workpiece table of the lithography machine.
  • the two-degree-of-freedom heterodyne grating interferometer displacement measuring system can also be applied to precision measurement of multi-degree-of-freedom displacement of a workpiece table such as a precision machine tool, a coordinate measuring machine, and a semiconductor detecting device.
  • a two-degree-of-freedom heterodyne grating interferometer displacement measuring system comprising: a dual-frequency laser, a grating interferometer, a measuring grating, two receivers and an electronic signal processing component;
  • the grating interferometer comprises a polarization beam splitter, a reference grating a first refracting element and a second refracting element;
  • the dual-frequency laser emitting dual-frequency orthogonally polarized laser light is incident on the polarization beam splitter after being coupled to the polarization beam splitter by the fiber coupling, and the transmitted light is the reference light, and the reflected light is the measuring light;
  • the reference light is incident on the reference grating to generate two diffractive reflected reference lights, and the two reference beams are deflected by the first refractive element to form two parallel reference beams, and the two parallel reference beams are retroreflected to the polarization beam splitter and transmitted;
  • the measuring light is incident on the measuring grating to generate two diffracted and reflected measuring lights, and the two measuring lights are deflected by the second refractive element to form two parallel measuring lights, and the two parallel measuring lights are reflected back to the polarizing beam splitter and reflected;
  • One of the transmitted reference light and one of the reflected measuring light are coincident to form one measuring optical signal, and the other of the transmitted reference light and the other reflected measuring light are coincident to form another measuring optical signal, and the two measuring optical signals are respectively transmitted through the optical fiber.
  • Two receivers are processed to form two measuring electrical signals, and two measuring electrical signals are input to the electronic signal processing component for processing; the dual-frequency laser also outputs a reference electrical signal to the electronic signal processing component;
  • the electronic signal processing component will output a linear displacement of two degrees of freedom.
  • the reference grating and the measurement grating each adopt a one-dimensional reflection type grating, and the first refractive element and the second refractive element are both composed of two right-angle prisms, and two right-angle prisms are arranged side by side.
  • the first refractive element and the second refractive element are both composed of two mirrors.
  • the first refractive element and the second refractive element are both prisms having an isosceles trapezoidal refractive cross section.
  • the first refractive element and the second refractive element both use a lens.
  • Another preferred technical solution of the present invention is that the two receivers are integrated with the electronic signal processing component into an integrated structure, and the two-way measurement optical signal and the one-way reference electrical signal output by the dual-frequency laser are input to the integrated structure. After processing, the linear motion displacements are output horizontally and vertically to two degrees of freedom.
  • the two-degree-of-freedom heterodyne grating interferometer displacement measuring system has the following advantages and outstanding effects -
  • the measurement system enables simultaneous measurement of two linear degrees of freedom displacement; the measurement system measures short optical paths, low environmental sensitivity, easy measurement of measurement signals, resolution and accuracy up to sub-nanometers and even higher;
  • the instrument measurement system also has the advantages of simple structure, small size, light weight, easy installation and convenient application. It is applied to the displacement measurement of the ultra-precision workpiece table of the lithography machine. Compared with the measurement system of the laser interferometer, the volume and quality of the workpiece table can be effectively reduced, and the dynamic performance of the workpiece table can be greatly improved. Comprehensive performance improvement.
  • the two-degree-of-freedom heterodyne grating interferometer displacement measuring system can also be applied to precision measurement of multi-degree-of-freedom displacement of a workpiece table of a precision machine tool, a coordinate measuring machine, a semiconductor detecting device, and the like.
  • FIG. 1 is a schematic diagram of a displacement measuring system of a first heterodyne grating interferometer of the present invention.
  • FIG. 2 is a schematic view showing the internal structure of the first grating interferometer of the present invention.
  • FIG. 3 is a schematic diagram of a displacement measuring system of a second heterodyne grating interferometer of the present invention.
  • FIG. 4 is a schematic view showing the internal structure of a second grating interferometer of the present invention.
  • FIG. 5 is a schematic view showing the internal structure of a third grating interferometer according to the present invention.
  • FIG. 6 is a schematic view showing the internal structure of a fourth grating interferometer of the present invention.
  • 1 dual-frequency laser 2 grating interferometer, 3 measuring grating, 4 receiver, 5 electronic signal processing components, 6 integrated structure; 21 polarizing beamsplitter, 22 reference grating, 23a right-angle prism, 23b mirror, 23c Refractive prism, 23d lens.
  • FIG. 1 is a schematic diagram of a displacement measuring system of a first heterodyne grating interferometer according to the present invention.
  • the two-degree-of-freedom heterodyne grating interferometer displacement measuring system comprises a dual-frequency laser 1, a grating interferometer 2, a measuring grating 3, a receiver 4, an electronic signal processing component 5, and the measuring grating 3 is a one-dimensional reflection.
  • Type grating is
  • FIG. 2 is a schematic diagram showing the internal structure of the first grating interferometer of the present invention.
  • the grating interferometer 2 includes a polarization beam splitter 21, a reference grating 22, a first refractive element, and a second refractive element.
  • the reference grating 22 is a one-dimensional reflective grating, and both the first refractive element and the second refractive element use two
  • the right-angle prism 23a is composed of two right-angle prisms 23a arranged side by side.
  • the dual-frequency laser 1 emits a dual-frequency orthogonally polarized laser light and is incident on the polarization beam splitter 21 through the optical fiber coupling, and the transmitted light is reference light, and the reflected light is measurement light.
  • the reference light is incident on the reference grating 22 to generate two diffracted reflected reference lights, and the two reference beams are respectively deflected by the two right-angle prisms 23a to form two parallel reference beams, and the two parallel reference beams are retroreflected to the polarization beam splitter 21 After transmission.
  • the measurement light is incident on the measurement grating 3 to generate two diffracted reflection measurement lights, and the two measurement lights are respectively deflected by two right-angle prisms 23a to form two parallel measurement lights, and the two parallel measurement lights are retroreflected to the polarization beam splitter. 21 after reflection.
  • One of the transmitted reference light and one of the reflected measuring light are coincident to form one measuring optical signal, and the other of the transmitted reference light and the other reflected measuring light are coincident to form another measuring optical signal, and the two measuring optical signals are respectively transmitted through the optical fiber.
  • the receiver 4 performs processing to form two measurement electrical signals, and the two measurement electrical signals are input to the electronic signal processing component 5 for processing.
  • the dual-frequency laser 1 also outputs a reference electrical signal to the electronic signal processing component 5 at the same time; when the measuring grating 3 is horizontally and vertically relative to the grating interferometer 2 (the vertical motion is a minute motion, the motion range is 1 mm) When linear motion of degrees of freedom, the electronic signal processing unit 5 linearly shifts the output two degrees of freedom.
  • FIG. 3 is a schematic diagram of a displacement measuring system for a second heterodyne grating interferometer according to the present invention.
  • the two receivers are integrated with the electronic signal processing component 5 into an integrated structure 6, and the two-way measurement optical signal and one reference electrical signal output by the dual-frequency laser are input to the integrated structure 6.
  • the linear motion displacements are output horizontally and vertically to two degrees of freedom.
  • the measurement system adopts this integrated structure. 6 It can effectively reduce the number of system components, improve the anti-interference ability of the system, and improve system integration.
  • FIG. 4 is a schematic diagram showing the internal structure of a second grating interferometer according to the present invention.
  • the first refractive element and the second refractive element in the internal structure of the grating interferometer are each composed of two mirrors 23b.
  • the comparison uses a right-angle prism 23a scheme, which eliminates the measurement nonlinearity caused by the beam passing through the right-angle prism, but the mirror installation takes up more space.
  • FIG. 5 is a schematic diagram showing the internal structure of a third grating interferometer according to the present invention.
  • the first refractive element and the second refractive element in the internal structure of the grating interferometer adopt a refractive prism 23c having an isosceles trapezoidal cross section.
  • the refractive prism 23c integrates a set of right-angle prisms 23a, and has the advantages of simple structure and easy installation.
  • FIG. 6 is a schematic diagram showing the internal structure of a fourth grating interferometer according to the present invention.
  • the first refractive element and the second refractive element in the internal structure of the grating interferometer adopt the lens 23d to realize beam deflection
  • the comparison refractive prism 23c adopts the lens 23d, which occupies a small space, and the interferometer structure is more compact. Simple and easy to install.
  • the measurement system and the structural scheme given in the above embodiments can realize simultaneous measurement of two linear degrees of freedom displacement; and the system measures short optical path, low environmental sensitivity, easy measurement of measurement signals, resolution and precision can reach sub-nano or even more
  • the grating interferometer measuring system also has the advantages of simple structure, small size, light weight, easy installation and convenient application. It is applied to the displacement measurement of the ultra-precision workpiece table of the lithography machine. Compared with the measurement system of the laser interferometer, the volume and quality of the workpiece table can be effectively reduced, and the dynamic performance of the workpiece table can be greatly improved. Comprehensive performance improvement.
  • the three-degree-of-freedom heterodyne grating interferometer displacement measuring system can also be applied to precision measurement of multi-degree-of-freedom displacement of a workpiece table such as a precision machine tool, a coordinate measuring machine, and a semiconductor detecting device.

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  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

一种二自由度外差光栅干涉仪位移测量系统，包括双频激光器（1）、光栅干涉仪（2）、测量光栅（3）、接收器（4）、电子信号处理部件（5）；光栅干涉仪（2）包括偏振分光镜（21）、参考光栅（22）、折光元件（23a，23b，23c）；该测量系统基于光栅衍射、光学多普勒效应和光学拍频原理实现位移测量。双频激光器（1）出射的双频激光入射至光栅干涉仪（2）、测量光栅（3）后输出两路光信号至接收器（4），后至电子信号处理部件（5）。当光栅干涉仪（2）与测量光栅（3）做二自由度线性相对运动时，系统可输出二个线性位移。该测量系统能够实现亚纳米甚至更高分辨率及精度，且能够同时测量二个线性位移。该测量系统具有对环境不敏感、测量精度高、体积小、质量轻等优点，作为光刻机超精密工件台位置测量系统可提升工件台综合性能。

Description

一种二自由度外差光栅干涉仪位移测量系统
技术领域
本发明涉及一种光栅测量系统， 特别涉及一种用于光刻机工件台位移测量的二自由度外 差光栅干涉仪测量系统。
背景技术
光栅测量系统作为一种典型的位移传感器广泛应用于众多机电设备。 光栅测量系统的测 量原理主要基于莫尔条纹原理和衍射干涉原理。 基于莫尔条纹原理的光栅测量系统作为一种 发展成熟的位移传感器以其测距长、 说成本低、 易于装调等众多优点成为众多机电设备位移测 量的首选， 但精度通常在微米量级， 常见于一般工业应用。
半导体制造装备中的光刻机是半导体芯片制作中的关键设备。 超精密工件台是光刻机的 核心子系统， 用于承载掩模板和硅片完成高速超精密步进扫描运动。超精密工件台以其高速、 高加速、 大行程、 超精密、 多自由度等运动特点成为书超精密运动系统中最具代表性的一类系 统。 为实现上述运动， 超精密工件台通常采用双频激光干涉仪测量系统测量超精密工件台多 自由度位移。 然而随着测量精度、 测量距离、 测量速度等运动指标的不断提高， 双频激光干 涉仪以环境敏感性、 测量速度难以提高、 占用空间大、 价格昂贵、 测量目标工件台动态特性 差等存在的一系列问题， 从而难以满足更高的测量需求。
针对上述问题， 世界上超精密测量领域的各大公司及研究机构展开了一系列的研究， 研 究主要集中于基于衍射干涉原理的光栅测量系统， 研究成果在诸多专利论文中均有揭露。
美国专利文献 US7, 102, 729 B2 (公开日 2005年 8月 4日）、 US7, 483, 120 B2 (公开日 2007 年 11月 15日）、 US7, , 940, 392 B2 (公开日 2009年 12月 24日）、 公开号 US2010/0321665 A1 (公开日 2010年 12月 23日）公开了一种应用于光刻机超精密工件台的平面光栅测量系统及 布置方案， 该测量系统主要利用一维或二维的平面光栅配合读数头测量工件台水平大行程位 移， 垂直方向位移测量采用电涡流或干涉仪等传感器， 但多种传感器的应用限制工件台测量 精度。 美国专利文献公开号 US2011/0255096 A1 (公开日 2011年 10月 20日） 公开了一种应 用于光刻机超精密工件台的光栅测量系统， 该测量系统亦采用一维或二维光栅配合特定的读 数头实现位移测量， 可同时进行水平向和垂向位移测量， 但结构复杂； 美国专利文献公开号 US2011/0096334 A1 (公开日 2011年 4月 28日） 公开了一种外差干涉仪， 该干涉仪中采用光 栅作为目标镜， 但该干涉仪仅能实现一维测量。 日本学者 GA0WEI 在研究论文 "Design and construction of a two_degree_of—freedom l inear encoder for nanometric measurement of stage position and straightness. Precision Engineering 34 (2010) 145-155 " 中提出 了一种利用衍射干涉原理的单频二维光栅测量系统， 该光栅测量系统可同时实现水平和垂直 向的位移测量， 但由于采用单频激光， 测量信号易受干扰， 精度难以保证。 中国专利文献申 请号 201210449244. 9 (申请日 2012年 11月 09日） 及 201210448734· 7 (申请日 2012年 11 月 09日）分别公开了一种外差光栅干涉仪测量系统， 两种干涉仪测量系统中的读数头结构中 均采用了四分之一波片用于改变光束的偏振态， 光学结构复杂， 同时光学元件的非理想性将 导致测量误差。
发明内容
考虑到上述技术方案的局限， 寻求一种利用光学拍频原理的外差光栅干涉仪测量系统， 该测量系统能够实现二个线性自由度位移的同时测量； 该测量系统测量光路短、 环境敏感性 低、 测量信号易于处理， 分辨率与精度可达亚纳米甚至更高； 同时该光栅干涉仪测量系统还 具有结构简洁、 体积小、 质量轻、 易于安装、 方便应用等优点。 采用该测量系统作为超精密 工件台位移测量装置， 能够有效的降低激光干涉仪测量系统在超精密工件台应用中的不足， 使光刻机超精密工件台性能提升。 该二自由度外差光栅干涉仪位移测量系统还可应用于精密 机床、 三坐标测量机、 半导体检测设备等的工件台多自由度位移的精密测量。
本发明的技术方案如下：
一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 包括双频激光器、 光栅干涉 仪、 测量光栅、 两个接收器和电子信号处理部件； 光栅干涉仪包括偏振分光镜、 参考光栅、 第一折光元件和第二折光元件； 双频激光器出射双频正交偏振激光经光纤耦合入射至偏振分 光镜后分光， 透射光为参考光， 反射光为测量光；
所述参考光入射至参考光栅后产生两束衍射反射参考光，两束参考光经第一折光元件后 偏转形成两束平行参考光， 两束平行参考光回射至偏振分光镜后透射；
所述测量光入射至测量光栅后产生两束衍射反射测量光，两束测量光经第二折光元件后 偏转形成两束平行测量光， 两束平行测量光回射至偏振分光镜后反射；
其中的一束透射参考光和一束反射测量光重合形成一路测量光信号，另一束透射参考光 和另一束反射测量光重合形成另一路测量光信号， 两路测量光信号分别经光纤传输至两个接 收器进行处理分别形成两路测量电信号，两路测量电信号输入至电子信号处理部件进行处理; 双频激光器同时也输出一束参考电信号至电子信号处理部件；当测量光栅相对于光栅干 涉仪做水平向和垂向两个自由度的线性运动时，电子信号处理部件将输出二自由度线性位移。
上述技术方案中， 所述的参考光栅、 测量光栅均采用一维反射型光栅， 所述的第一折光 元件和第二折光元件均采用两个直角棱镜组成， 两个直角棱镜并列布置。
本发明另一技术方案是： 所述的第一折光元件和第二折光元件均采用两个反射镜组成。 本发明另一技术方案是： 所述的第一折光元件和第二折光元件均采用截面为等腰梯形折 光的棱镜。
本发明优选技术方案是： 所述的第一折光元件和第二折光元件均采用透镜。
本发明另一优选技术方案是：所述的两个接收器与电子信号处理部件集成为一体化结构， 所述的两路测量光信号和双频激光器输出的一路参考电信号输入至一体化结构进行处理后， 输出水平向和垂直向二自由度线性运动位移。
本发明所提供的一种二自由度外差光栅干涉仪位移测量系统具有以下优点及突出性效 果- 该测量系统能够实现二个线性自由度位移的同时测量； 该测量系统测量光路短、 环境敏 感性低、 测量信号易于处理， 分辨率与精度可达亚纳米甚至更高； 同时该光栅干涉仪测量系 统还具有结构简洁、 体积小、 质量轻、 易于安装、 方便应用等优点。 应用于光刻机超精密工 件台的位移测量， 对比激光干涉仪测量系统， 在满足测量需求的基础上， 可有效的降低工件 台体积、 质量， 大大提高工件台的动态性能， 使工件台整体性能综合提高。 该二自由度外差 光栅干涉仪位移测量系统还可应用于精密机床、 三坐标测量机、 半导体检测设备等的工件台 多自由度位移的精密测量中。
附图说明
图 1为本发明第一种外差光栅干涉仪位移测量系统示意图。
图 2为本发明第一种光栅干涉仪内部结构示意图。
图 3为本发明第二种外差光栅干涉仪位移测量系统示意图。
图 4为本发明第二种光栅干涉仪内部结构示意图。
图 5为本发明第三种光栅干涉仪内部结构示意图。
图 6为本发明第四种光栅干涉仪内部结构示意图。
图中， 1 双频激光器， 2 光栅干涉仪， 3 测量光栅， 4 接收器， 5 电子 信号处理部件， 6 一体化结构； 21 偏振分光镜， 22 参考光栅， 23a 直角棱镜， 23b 反射镜， 23c 折光棱镜， 23d 透镜。
具体实施方式
下面结合附图对本发明的结构、 原理和具体实施方式作进一步地详细描述。
请参考图 1， 图 1为本发明第一种外差光栅干涉仪位移测量系统示意图。 如图 1所示， 该二自由度外差光栅干涉仪位移测量系统包括双频激光器 1、 光栅干涉仪 2、 测量光栅 3、 接 收器 4、 电子信号处理部件 5， 测量光栅 3为一维反射型光栅。
请参考图 2， 图 2为本发明第一种光栅干涉仪内部结构示意图。 所述的光栅干涉仪 2包 括偏振分光镜 21、 参考光栅 22、 第一折光元件、 第二折光元件， 参考光栅 22为一维反射型 光栅， 第一折光元件与第二折光元件均采用两个直角棱镜 23a组成， 两个直角棱镜 23a并列 布置。
结合图 1、 图 2阐述测量系统原理， 所述的双频激光器 1出射双频正交偏振激光经光纤 耦合入射至偏振分光镜 21后分光， 透射光为参考光， 反射光为测量光。
所述参考光入射至参考光栅 22后产生两束衍射反射参考光， 两束参考光分别经两个直 角棱镜 23a后偏转形成两束平行参考光， 两束平行参考光回射至偏振分光镜 21后透射。
所述测量光入射至测量光栅 3后产生两束衍射反射测量光，两束测量光经分别经两个直 角棱镜 23a后偏转形成两束平行测量光， 两束平行测量光回射至偏振分光镜 21后反射。
其中的一束透射参考光和一束反射测量光重合形成一路测量光信号，另一束透射参考光 和另一束反射测量光重合形成另一路测量光信号， 两路测量光信号分别经光纤传输至两个接 收器 4进行处理分别形成两路测量电信号， 两路测量电信号输入至电子信号处理部件 5进行 处理。
双频激光器 1同时也输出一束参考电信号至电子信号处理部件 5; 当测量光栅 3相对于 光栅干涉仪 2做水平向和垂向 （其中垂向运动为微小运动， 运动范围为 1mm) 两个自由度的 线性运动时， 电子信号处理部件 5将输出二自由度线性位移。
二自由度运动位移的表达式为 x=kx X ( a - e )、z=kz X ( α + β ) Λχ= Λ /4 π，kz= A /4( l+cos 9 )，式中<1、 β为电子信号处理卡的读数值， Λ为光栅常数， λ为激光波长， Θ为光栅衍射 角， 取 Λ =1 μ πι， λ =632. 8nm, α、 β的相位分辨率为 2 π /1024， 外差光栅干涉仪的 χ、 ζ的 测量分辨率分别为 0. 49nm、 0. 18nm。
请参考图 3， 图 3为本发明第二种外差光栅干涉仪位移测量系统示意图。 如图 3所示， 所述的两个接收器与电子信号处理部件 5集成为一体化结构 6， 所述的两路测量光信号和双 频激光器输出的一路参考电信号输入至一体化结构 6进行处理后， 输出水平向和垂直向二自 由度线性运动位移。 测量系统采用这种一体化结构 6可有效的减少系统部件数量， 提高系统 的抗干扰能力， 提高系统集成性。
请参考图 4， 图 4为本发明第二种光栅干涉仪内部结构示意图。 如图 4所示， 光栅干涉 仪内部结构中的第一折光元件、 第二折光元件均采用两个反射镜 23b组成。 对比采用直角棱 镜 23a方案， 该方案可消除光束通过直角棱镜所引起的测量非线性， 但反射镜的安装占据更 大的空间。
请参考图 5， 图 5为本发明第三种光栅干涉仪内部结构示意图。 如图 5所示， 光栅干涉 仪内部结构中的第一折光元件、 第二折光元件均采用截面为等腰梯形的折光棱镜 23c。 该折 光棱镜 23c将一组直角棱镜 23a集成， 具有结构简洁、 便于安装等优点。
请参考图 6， 图 6为本发明第四种光栅干涉仪内部结构示意图。 如图 6所示， 光栅干涉 仪内部结构中的第一折光元件、 第二折光元件均采用透镜 23d实现光束偏转， 对比折光棱镜 23c, 采用透镜 23d， 占用空间小， 可使干涉仪结构更加紧凑、 简洁、 便于安装。
上述实施方式中给出的测量系统及结构方案能够实现二个线性自由度位移的同时测量； 且系统测量光路短、 环境敏感性低、 测量信号易于处理， 分辨率与精度可达亚纳米甚至更高； 同时该光栅干涉仪测量系统还具有结构简洁、 体积小、 质量轻、 易于安装、 方便应用等优点。 应用于光刻机超精密工件台的位移测量， 对比激光干涉仪测量系统， 在满足测量需求的基础 上， 可有效的降低工件台体积、 质量， 大大提高工件台的动态性能， 使工件台整体性能综合 提高。 该三自由度外差光栅干涉仪位移测量系统还可应用于精密机床、 三坐标测量机、 半导 体检测设备等的工件台多自由度位移的精密测量中。

Claims

权 利 要 求 书
1.一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 包括双频激光器 （1 )、 光 栅干涉仪 （2)、 测量光栅 （3)、 两个接收器 （4 )和电子信号处理部件 （5 ) ; 光栅干涉仪 （2 ) 包括偏振分光镜 （21 )、 参考光栅 （22)、 第一折光元件和第二折光元件； 双频激光器 （1 ) 出 射双频正交偏振激光经光纤耦合入射至偏振分光镜 （21 ) 后分光， 透射光为参考光， 反射光 所述参考光入射至参考光栅 （22 ) 后产生两束衍射反射参考光， 两束参考光经第一折光 元件后偏转形成两束平行参考光， 两束平行参考光回射至偏振分光镜 （21 ) 后透射；
所述测量光入射至测量光栅（3 )后产生两束衍射反射测量光， 两束测量光经第二折光元 件后偏转形成两束平行测量光， 两束平行测量光回射至偏振分光镜 （21 ) 后反射；
其中的一束透射参考光和一束反射测量光重合形成一路测量光信号， 另一束透射参考光 和另一束反射测量光重合形成另一路测量光信号， 两路测量光信号分别经光纤传输至两个接 收器（4 )进行处理分别形成两路测量电信号， 两路测量电信号输入至电子信号处理部件（5 ) 进行处理；
双频激光器（1 ) 同时也输出一束参考电信号至电子信号处理部件（5 ) ; 当测量光栅（3 ) 相对于光栅干涉仪 （2 ) 做水平向和垂向两个自由度的线性运动时， 电子信号处理部件 （5 ) 将输出二自由度线性位移。
2.根据权利要求 1所述的一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的参考光栅 （22 ) 和测量光栅 （3 ) 均采用一维反射型光栅。
3. 根据权利要求 1所述的一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的第一折光元件和第二折光元件均采用两个直角棱镜 （23a) 组成， 两个直角棱镜 （23a) 并列布置。
4. 根据权利要求 1所述的一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的第一折光元件和第二折光元件均采用两个反射镜 （23b ) 组成。
5.根据权利要求 1所述的一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的第一折光元件和第二折光元件均采用截面为等腰梯形的折光棱镜 （23c)。
6.根据权利要求 1所述的一种三自由度外差光栅干涉仪位移测量系统， 其特征在于： 所 述的第一折光元件和第二折光元件均采用透镜 （23d)。
7.根据权利要求 1-6任一权利要求所述的一种二自由度外差光栅干涉仪位移测量系统， 其特征在于： 所述的两个接收器与电子信号处理部件 （5 )集成为一体化结构 （6)， 所述的两 路测量光信号和双频激光器输出的一路参考电信号输入至一体化结构（6 )进行处理后， 输出 水平向和垂直向二自由度线性运动位移。
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