WO2014200071A1 - Adhesive sheet - Google Patents

Adhesive sheet Download PDF

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Publication number
WO2014200071A1
WO2014200071A1 PCT/JP2014/065629 JP2014065629W WO2014200071A1 WO 2014200071 A1 WO2014200071 A1 WO 2014200071A1 JP 2014065629 W JP2014065629 W JP 2014065629W WO 2014200071 A1 WO2014200071 A1 WO 2014200071A1
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WO
WIPO (PCT)
Prior art keywords
pressure
sensitive adhesive
adhesive sheet
parts
mass
Prior art date
Application number
PCT/JP2014/065629
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French (fr)
Japanese (ja)
Inventor
友也 津久井
剛介 中島
Original Assignee
電気化学工業株式会社
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Priority to JP2015522864A priority Critical patent/JPWO2014200071A1/en
Publication of WO2014200071A1 publication Critical patent/WO2014200071A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30Low-molecular-weight compounds
    • C08G18/32Polyhydroxy compounds; Polyamines; Hydroxyamines
    • C08G18/3203Polyhydroxy compounds
    • C08G18/3206Polyhydroxy compounds aliphatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/67Unsaturated compounds having active hydrogen
    • C08G18/671Unsaturated compounds having only one group containing active hydrogen
    • C08G18/672Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/73Polyisocyanates or polyisothiocyanates acyclic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/80Masked polyisocyanates
    • C08G18/8003Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen
    • C08G18/8006Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32
    • C08G18/8009Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32 with compounds of C08G18/3203
    • C08G18/8022Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32 with compounds of C08G18/3203 with polyols having at least three hydroxy groups
    • C08G18/8025Masked aliphatic or cycloaliphatic polyisocyanates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/80Masked polyisocyanates
    • C08G18/8003Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen
    • C08G18/8006Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32
    • C08G18/8009Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32 with compounds of C08G18/3203
    • C08G18/8022Masked polyisocyanates masked with compounds having at least two groups containing active hydrogen with compounds of C08G18/32 with compounds of C08G18/3203 with polyols having at least three hydroxy groups
    • C08G18/8029Masked aromatic polyisocyanates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81Unsaturated isocyanates or isothiocyanates
    • C08G18/8141Unsaturated isocyanates or isothiocyanates masked
    • C08G18/815Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen
    • C08G18/8158Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen
    • C08G18/8175Polyisocyanates or polyisothiocyanates masked with unsaturated compounds having active hydrogen with unsaturated compounds having only one group containing active hydrogen with esters of acrylic or alkylacrylic acid having only one group containing active hydrogen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04Homopolymers or copolymers of esters
    • C09D133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09D133/062Copolymers with monomers not covered by C09D133/06
    • C09D133/066Copolymers with monomers not covered by C09D133/06 containing -OH groups
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J175/00Adhesives based on polyureas or polyurethanes; Adhesives based on derivatives of such polymers
    • C09J175/04Polyurethanes
    • C09J175/14Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09J175/16Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors

Definitions

  • the present invention relates to an adhesive sheet used in the manufacturing process of electronic components.
  • the semiconductor wafer or substrate is attached to each process such as cutting (dicing), stretching (expanding) the adhesive sheet, and peeling (pickup) the element small piece from the adhesive sheet after bonding the adhesive sheet. Is done.
  • the pressure-sensitive adhesive sheet (dicing tape) used in these processes has sufficient adhesive strength to the cut element pieces (chips) in the dicing process, but does not have adhesive residue during the pick-up process. It is hoped that is reduced.
  • the pressure-sensitive adhesive sheet there is one in which a pressure-sensitive adhesive layer that undergoes a polymerization and curing reaction with ultraviolet light or the like is applied on a base material that is transparent to active rays such as ultraviolet light and / or electron beams.
  • a pressure-sensitive adhesive layer that undergoes a polymerization and curing reaction with ultraviolet light or the like is applied on a base material that is transparent to active rays such as ultraviolet light and / or electron beams.
  • ultraviolet light or the like is irradiated to the pressure-sensitive adhesive layer, the pressure-sensitive adhesive layer is polymerized and cured to reduce the pressure-sensitive adhesive force, and then a cut chip is picked up.
  • Patent Document 1 and Patent Document 2 disclose a compound having a photopolymerizable unsaturated double bond in its molecule (polyfunctional) that can be three-dimensionally reticulated on the substrate surface by, for example, actinic rays.
  • An adhesive sheet coated with an adhesive containing an oligomer) is disclosed.
  • a dicing machine that performs a dicing step uses a thin grindstone called a blade that rotates at high speed, and processes a workpiece while applying grinding water or cooling water.
  • this dicing machine is extremely disliked by contaminants (contamination: hereinafter referred to as “contamination” for short) due to the fine grinding powder generated during machining, so it is in the vicinity of the rotating blade.
  • a cleaning nozzle is provided to reduce adhesion of contamination during dicing, and the work after dicing processing is carried into a spin cleaning device provided in the dicing machine, and the cleaning nozzle is moved within the work surface while rotating the work. There is a step of performing spin cleaning by swinging.
  • pure water such as ultrapure water from which organic substances, ionic components, fine particles, bacteria, etc. are highly removed is used.
  • a large amount of pure water is used in the cleaning process, and the demand for the water quality is increasing year by year.
  • Pure water used in the cleaning process of electronic component manufacturing is one of the water quality management items in order to prevent the organic matter contained in the pure water from carbonizing in the subsequent heat treatment process and causing poor insulation. It has been demanded that the total organic carbon (TOC) concentration be extremely low.
  • the total organic carbon concentration is very low in the cleaning water during and after the dicing process, the chips do not scatter during the dicing process, the pickup can be easily performed, and the adhesive residue hardly occurs.
  • the main purpose is to provide an adhesive sheet.
  • the present invention A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate, wherein the pressure-sensitive adhesive layer is a photocurable pressure-sensitive adhesive layer, and the photocurable pressure-sensitive adhesive is 100 parts by weight of a (meth) acrylic acid ester copolymer, 5 to 200 parts by mass of a photopolymerizable compound, 0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent; 0.1 to 20 parts by mass of a photopolymerization initiator,
  • the photopolymerizable compound has a weight average molecular weight of 500 or more
  • the pressure-sensitive adhesive sheet is adjusted to a size of 50 mm ⁇ 50 mm and has a total organic carbon (TOC) concentration of 5.0 mg / L or less that is eluted when immersed in 500 mL of pure water for 24 hours. .
  • TOC total organic carbon
  • the present invention also provides: A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate,
  • the pressure-sensitive adhesive layer is It contains (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent as essential components, and the total organic carbon (TOC: Total Organic Carbon) concentration eluted in pure water is 3.0 mg / L or less.
  • TOC Total Organic Carbon
  • the pressure-sensitive adhesive layer is 100 parts by weight of a (meth) acrylic acid ester copolymer, 0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent; Containing 0.1 to 20 parts by mass of a photopolymerization initiator, The pressure-sensitive adhesive sheet in which the (meth) acrylic acid ester copolymer and the photopolymerizable compound contain a hydroxyl group.
  • (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent are contained as essential components, and (meth) acrylic acid ester copolymer and curing agent, and photopolymerizable compound and curing agent, If is not chemically bonded, the organic component of the pressure-sensitive adhesive layer is likely to elute into water. As a result, the TOC concentration contained in the cleaning water at the time of dicing is likely to increase, resulting in an insulation failure of the electronic component.
  • the total organic carbon concentration is at a very low level, so insulation failure is unlikely to occur, chips do not scatter during dicing, and pickup can be performed easily.
  • an adhesive sheet that hardly causes adhesive residue.
  • the pressure-sensitive adhesive sheet according to this embodiment is A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate, wherein the pressure-sensitive adhesive layer is a photocurable pressure-sensitive adhesive layer, and the photocurable pressure-sensitive adhesive is 100 parts by weight of a (meth) acrylic acid ester copolymer, 5 to 200 parts by mass of a photopolymerizable compound, 0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent; 0.1 to 20 parts by mass of a photopolymerization initiator,
  • the photopolymerizable compound has a weight average molecular weight of 500 or more
  • the pressure-sensitive adhesive sheet is adjusted to a size of 50 mm ⁇ 50 mm, and the total organic carbon (TOC) concentration eluted when immersed in 500 mL of pure water for 24 hours is 5.0 mg / L or less.
  • TOC total organic carbon
  • the pressure-sensitive adhesive sheet according to this embodiment is A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a base material, wherein the pressure-sensitive adhesive sheet is adjusted to a size of 100 mm ⁇ 100 mm and is dissolved in water for 24 hours to dissolve all organic carbon (TOC: Total Organic) Carbon) concentration is 0-5 mg / L.
  • TOC Total Organic
  • the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer polymers obtained by polymerizing acrylic acid, methacrylic acid and ester monomers thereof, unsaturated monomers copolymerizable with these monomers (for example, vinyl acetate, styrene, acrylonitrile) and There is a copolymer obtained by copolymerizing.
  • the pressure-sensitive adhesive sheet of the present embodiment the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer is preferably an acrylic polymer that is easy to design the pressure-sensitive adhesive force, and the adhesive force can be adjusted more precisely by containing a curing agent. And it is preferable that at least one of the acrylic monomers constituting the acrylic polymer contains a functional group-containing monomer.
  • This functional group-containing monomer is preferably blended and polymerized in an acrylic polymer in an amount of 0% by mass to 10% by mass. If the blending ratio of the functional group-containing monomer is 0.01% by mass or more, the adhesive strength to the adherend is sufficiently strong and the generation around the water tends to be suppressed. If the blending ratio is 10 mass% or less, the adhesive force to the adherend will not be too high, so that it is possible to suppress the occurrence of adhesive residue.
  • Examples of the main monomer of the acrylic polymer include butyl (meth) acrylate, 2-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, octyl (meth) acrylate, 2- Ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, tridecyl (meth) acrylate, myristyl ( Examples include (meth) acrylic monomers such as (meth) acrylate, cetyl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, and benzyl (meth) acrylate.
  • acrylic monomer those having a monomer containing a functional group at least in part are particularly preferable.
  • a monomer having a hydroxyl group, a carboxyl group, an epoxy group, an amide group, an amino group, a methylol group, a sulfonic acid group, a sulfamic acid group, or a (phosphite) ester group Is preferred.
  • vinyl compounds having these functional groups are particularly preferable, and vinyl compounds having hydroxyl groups are particularly preferable.
  • the acrylate mentioned later is included in the vinyl compound here.
  • Examples of the functional group-containing monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate.
  • Examples of the monomer having a carboxyl group include (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N-glycolic acid, and cinnamic acid.
  • Examples of the monomer having an epoxy group include allyl glycidyl ether and (meth) acrylic acid glycidyl ether.
  • Examples of the monomer having an amide group include (meth) acrylamide.
  • Examples of the monomer having an amino group include N, N-dimethylaminoethyl (meth) acrylate.
  • Examples of the monomer having a methylol group include N-methylol acrylamide.
  • the monomer containing a carboxyl group constituting the acrylic polymer is It is preferably 0.1 to 10% by mass or less in the acrylic polymer. That is, according to another expression, among functional group-containing monomers obtained by reacting an adhesive with a curing agent, the functional group-containing monomer containing a carboxyl group is preferably 10% by mass or less.
  • the adhesion to metal increases, so the carboxyl group-containing functional group-containing monomer after reacting with the curing agent exceeds 10% by mass.
  • the monomer having a carboxyl group is preferably one that easily disappears by reaction with a curing agent.
  • (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N Glycolic acid and cinnamic acid are preferably used.
  • the adhesive sheet of this embodiment it is preferable to mix
  • curing agent is 0.1 to 10 mass parts with respect to 100 mass parts of acrylic polymers. This is because if the blending ratio of the curing agent is 0.1 parts by mass or more and 10 parts by mass or less, generation of adhesive residue can be suppressed.
  • the curing agent to be blended in the pressure-sensitive adhesive layer there are a polyfunctional isocyanate curing agent, a polyfunctional epoxy curing agent, an azirine compound, a melamine compound, and the like, and preferably a polyfunctional isocyanate curing agent and a polyfunctional epoxy curing agent.
  • a polyfunctional epoxy curing agent or a polyfunctional isocyanate curing agent as at least a part of the above curing agent, it is possible to selectively cause a functional group-containing monomer having a carboxyl group to react and disappear. It is possible to adjust the amount of the functional group-containing monomer having a carboxyl group after curing.
  • polyfunctional isocyanate curing agent examples include an aromatic polyisocyanate curing agent, an aliphatic polyisocyanate curing agent, and an alicyclic polyisocyanate curing agent.
  • an aliphatic polyisocyanate curing agent particularly a xamethylene diisocyanate curing agent among them is preferable. The reason why this isocyanate curing agent is good is that it can impart flexibility to the pressure-sensitive adhesive and is also effective for an adherend having irregularities.
  • the aromatic polyisocyanate is not particularly limited, and for example, 1,3-phenylene diisocyanate, 4,4′-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4′-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2, , 6-tolylene diisocyanate, 4,4′-toluidine diisocyanate, 2,4,6-triisocyanate toluene, 1,3,5-triisocyanate benzene, dianisidine diisocyanate, 4,4′-diphenyl ether diisocyanate, 4,4 ', 4 "-triphenylmethane triisocyanate, ⁇ , ⁇ '-diisocyanate-1,3-dimethylbenzene, ⁇ , ⁇ '-diisocyanate-1,4-dimethylbenzene, ⁇ , ⁇ '-diisocyanate-1,4- Diechi
  • the aliphatic polyisocyanate is not particularly limited.
  • diisocyanate and 2,4,4-trimethylhexamethylene diisocyanate examples thereof include diisocyanate and 2,4,4-trimethylhexamethylene diisocyanate.
  • the alicyclic polyisocyanate is not particularly limited.
  • 1,3-phenylene diisocyanate, 4,4'-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate 4,4′-toluidine diisocyanate and hexamethylene diisocyanate are preferably used.
  • the polyfunctional epoxy curing agent mainly means a compound having two or more epoxy groups and one or more tertiary nitrogen atoms.
  • the pressure-sensitive adhesive can be a pressure-sensitive pressure-sensitive adhesive mainly composed of an acrylic polymer and a curing agent, but in addition to the acrylic polymer and the curing agent, a photopolymerizable compound, a photopolymerization initiator, a tackifying resin, and an additive It can be used as a photo-curing pressure-sensitive adhesive using etc.
  • photopolymerizable compound examples include trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butylene.
  • Glycol diacrylate, 1,6-hexanediol diacrylate, polyethylene glycol diacrylate, cyanuric acid triethyl acrylate, commercially available oligoester acrylate, and the like are used.
  • a urethane acrylate oligomer can be used in addition to the acrylate compound.
  • the urethane acrylate oligomer is obtained by reacting a (meth) acrylate having a hydroxy group with a terminal isocyanate urethane prepolymer obtained by reacting a polyol compound such as a polyester type or a polyether type with a polyvalent isocyanate compound.
  • polyvalent isocyanate compound examples include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylene diisocyanate, 1,4-xylene diisocyanate, diphenylmethane 4,4-diisocyanate, trimethylhexamethylene diisocyanate. , Hexamethylene diisocyanate, isophorone diisocyanate and the like can be used.
  • Examples of the (meth) acrylate having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, polyethylene glycol (meth) acrylate, pentaerythritol triacrylate, and glycidol di (meth). Acrylate, dipentaerythritol monohydroxypentaacrylate, etc. are used.
  • a urethane acrylate oligomer having 4 or more vinyl groups is preferable because the adhesive is cured well after irradiation with ultraviolet rays or the like.
  • the weight average molecular weight of the photopolymerizable compound is preferably 500 or more, and more preferably 1000 or more. If the weight average molecular weight of the photopolymerizable compound is small, the TOC concentration contained in the washing water at the time of dicing tends to increase, which may cause insulation failure of electronic components.
  • the blending amount of the photopolymerizable compound is preferably 5 parts by mass or more and 200 parts by mass or less, and more preferably 20 parts by mass or more and 120 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. If the blending amount of the photopolymerizable compound is reduced, the peelability of the pressure-sensitive adhesive sheet after irradiation is reduced, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, when the blending amount of the photopolymerizable compound is increased, pick-up failure is liable to occur due to the glue being picked up during dicing, and a minute glue residue is generated due to a reaction residue, which causes contamination.
  • Photopolymerization initiator benzoin, benzoin alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones or xanthones are used.
  • benzoin examples include benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether.
  • acetophenones examples include benzoin alkyl ethers, acetophenone, 2,2-dimethoxy-2-acetophenone, 2,2-diethoxy-2-acetophenone, 1,1-dichloroacetophenone, and the like.
  • Anthraquinones include 2-methylanthraquinone, 2-ethylanthraquinone, 2-tertiarybutylanthraquinone, 1-chloroanthraquinone and the like.
  • Examples of thioxanthones include 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and 2,4-diisopropylthioxanthone.
  • Examples of ketals include acetophenone dimethyl ketal, benzyldimethylmethal, benzyldiphenylsulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, ⁇ -chloranthraquinone, and the like.
  • 2-hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] having a hydroxyl group capable of reacting with an isocyanate curing agent in order to prevent contamination of the adherend -Phenyl ⁇ -2-methyl-propan-1-one (manufactured by BASF Japan, product name IRGACURE127) is preferred.
  • the blending amount of the photopolymerization initiator is preferably 0.1 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester polymer. If the blending amount is too small, the peelability of the pressure-sensitive adhesive sheet after irradiation is lowered, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, if the amount is too large, the photopolymerization initiator bleeds out to the pressure-sensitive adhesive surface, causing contamination.
  • the photopolymerization initiator may be used in combination with one or more conventionally known photopolymerization accelerators, if necessary.
  • group, a tertiary amine, etc. can be used for a photoinitiator.
  • the tertiary amine include triethylamine, tetraethylpentamine, dimethylamino ether and the like.
  • the tackifier resin is a terpene phenol resin that is completely or partially hydrogenated with a terpene phenol resin.
  • the terpene phenol resin can be produced, for example, by reacting 1 mol of a terpene compound with 0.1 to 50 phenols.
  • terpene compounds include myrcene, alloocimene, osmene, ⁇ -pinene, ⁇ -pinene, dipentene, limonene, ⁇ -ferrandrene, ⁇ -terpinene, ⁇ -terpinene, terpinolene, 1,8-cineole, 1,4-cineole, Examples include ⁇ -terpineol, ⁇ -terpineol, ⁇ -terpineol, camphene, tricyclene, sabinene, paramentadienes, and carenes. Among these compounds, ⁇ -pinene, ⁇ -pinene, limonene, myrcene, alloocimene and ⁇ -terpinene are particularly preferably used in the present invention.
  • phenols examples include, but are not limited to, phenol, cresol, xylenol, catechol, resorcin, hydroquinone, bisphenol A, and the like.
  • the ratio of phenols in the terpene phenol resin is about 25 to 50 mol%, but is not limited thereto.
  • the hydroxyl value of the fully or partially hydrogenated terpene phenol resin is preferably 50 to 250.
  • the reaction with the isocyanate curing agent is not sufficient, bleeds out to the surface of the pressure-sensitive adhesive, causing contamination, and when it exceeds 250, the viscosity increases and the (meth) acrylic acid ester This is because uneven mixing with a polymer or the like occurs and the pickup characteristics are not stable.
  • the hydrogenation method is not particularly limited, and for example, a noble metal such as palladium, ruthenium, rhodium or the like supported on a carrier such as activated carbon, activated alumina, or diatomaceous earth is used as a catalyst.
  • the hydrogenation rate can be measured by bromine number measurement, iodine number measurement or the like.
  • the hydrogenation rate of the completely or partially hydrogenated terpene phenol resin is preferably 30 mol% or more, more preferably 70 mol% or more.
  • the amount is less than 30 mol%, the adhesive force is not sufficiently lowered due to the reaction inhibition of the photopolymerizable compound by irradiation with actinic rays, and the pickup property is lowered.
  • the blending ratio of the fully or partially hydrogenated terpene phenol resin is preferably 0.5 parts by mass or more and 100 parts by mass or less, and 1.0 part by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. Less than the mass part is more preferable. If the completely or partially hydrogenated terpene phenol resin is 0.5 parts by mass or more, the adhesive strength is not too low, so the retention of the semiconductor chip is maintained during dicing, and if it is 100 parts by mass or less, the pickup is poor. Can be suppressed.
  • additives such as a softening agent, an anti-aging agent, a filler, a conductive agent, an ultraviolet absorber, and a light stabilizer may be added to the adhesive.
  • the thickness of the pressure-sensitive adhesive layer is preferably 1 ⁇ m to 50 ⁇ m, particularly preferably 5 ⁇ m to 35 ⁇ m. If the pressure-sensitive adhesive layer is too thick, the pressure-sensitive adhesive strength becomes too high and the pick-up property is lowered. On the other hand, if the pressure-sensitive adhesive layer is too thin, the pressure-sensitive adhesive force becomes too low, chip retention during dicing is lowered, and peeling may occur between the ring frame and the sheet.
  • the base material examples include polyvinyl chloride, polyethylene terephthalate, ethylene-vinyl acetate copolymer, ethylene-acrylic acid-acrylate film, ethylene-ethyl acrylate copolymer, polyethylene, polypropylene, propylene-based copolymer Polymers, ethylene-acrylic acid copolymers, and ionomer resins obtained by crosslinking ethylene- (meth) acrylic acid copolymers, ethylene- (meth) acrylic acid- (meth) acrylic acid ester copolymers, etc. with metal ions Is mentioned.
  • the base material may be a mixture or copolymer of these resins, and may be a laminate of films and sheets made of these resins.
  • an ionomer resin as a material for the base film.
  • ionomer resins if an ionomer resin obtained by crosslinking a copolymer having an ethylene unit, a methacrylic acid unit, and a (meth) acrylic acid alkyl ester unit with a metal ion such as Na + , K + , or Zn 2+ is used, cutting is performed. The dust suppressing effect is remarkable and is preferably used.
  • the base material may be a single layer or a multilayer film or sheet made of the above material, or may be a laminate of films made of different materials.
  • the thickness of the substrate is 50 to 200 ⁇ m, preferably 70 to 150 ⁇ m.
  • an antistatic treatment it is preferable to apply an antistatic treatment to the substrate.
  • the antistatic treatment include a treatment for adding an antistatic agent to the substrate, a treatment for applying the antistatic agent to the substrate surface, and a treatment by corona discharge.
  • a quaternary amine salt monomer can be used as the antistatic agent.
  • the quaternary amine salt monomer include dimethylaminoethyl (meth) acrylate quaternary chloride, diethylaminoethyl (meth) acrylate quaternary chloride, methylethylaminoethyl (meth) acrylate quaternary chloride, p-dimethyl.
  • examples include aminostyrene quaternary chloride and p-diethylaminostyrene quaternary chloride. Of these, dimethylaminoethyl methacrylate quaternary chloride is preferred.
  • the adhesive may be applied to one side of the base film, and the slip agent and / or the antistatic agent may be applied to the back side thereof.
  • an antistatic agent may be kneaded into the resin of the base film to form a sheet.
  • a slip agent In order to improve the expandability after dicing, a slip agent can be applied to the non-adhesive surface of the base material, or the slip agent can be kneaded into the base material.
  • the slip agent is not particularly limited as long as it is a substance that reduces the friction coefficient of the pressure-sensitive adhesive sheet and the expanding device.
  • silicone compounds such as silicone resins and (modified) silicone oils, fluororesins, hexagonal boron nitride, carbon black, And molybdenum disulfide. These friction reducing agents may mix a plurality of components. Since manufacture of an electronic component is performed in a clean room, it is preferable to use a silicone compound or a fluororesin.
  • a copolymer having a silicone macromonomer unit is particularly preferred because it has good compatibility with the antistatic layer and can achieve a balance between antistatic properties and expandability.
  • an adhesive sheet is affixed on a semiconductor wafer (or substrate) and a ring frame.
  • the wafer may be a conventional general-purpose wafer such as a silicon wafer and a gallium nitride wafer, a silicon carbide wafer, or a sapphire wafer.
  • the substrate may be a general-purpose substrate such as a package substrate in which a chip is sealed with a resin or an LED package substrate.
  • actinic rays such as an ultraviolet-ray
  • actinic rays are irradiated to a photocurable adhesive layer from the base material side.
  • an ultraviolet light source a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or a metal halide lamp can be used.
  • an electron beam may be used instead of ultraviolet rays, and ⁇ -rays, ⁇ -rays, and ⁇ -rays can be used as a light source for the electron beams.
  • the light-sensitive adhesive layer is three-dimensionally reticulated and cured by light irradiation, and the adhesive strength of the pressure-sensitive adhesive layer is reduced. At this time, as described above, since the pressure-sensitive adhesive sheet according to the present invention does not excessively adhere to a wafer or the like even when heated, a sufficient decrease in adhesive force can be obtained by irradiation with ultraviolet rays or the like.
  • the adhesive sheet is stretched to widen the gap between the semiconductor chips or semiconductor components, and the chip or components are pushed up with a needle pin or the like. Thereafter, the chip or component is adsorbed by a vacuum collet or air tweezers, peeled off from the adhesive layer of the adhesive sheet and picked up.
  • a sufficient decrease in the adhesive strength is obtained by irradiation with ultraviolet rays or the like, so that peeling between the chip or component and the pressure-sensitive adhesive layer becomes easy, and good pick-up properties are obtained. And no defects such as glue residue occur.
  • a method of forming a pressure-sensitive adhesive layer on a substrate to form a pressure-sensitive adhesive sheet for example, a method of directly applying a pressure-sensitive adhesive on a substrate with a coater such as a gravure coater, comma coater, bar coater, knife coater or roll coater, There is a method in which a pressure-sensitive adhesive is applied to a release film and dried and bonded to a base film.
  • the adhesive may be printed on the substrate by convex printing, concave printing, flat printing, flexographic printing, offset printing, screen printing, or the like.
  • the pressure-sensitive adhesive sheet of the present invention is suitably used for attaching an electronic component assembly called a workpiece in a dicing process and a back grinding process, which are electronic component manufacturing processes.
  • the curable pressure-sensitive adhesive was coated on a polyethylene terephthalate separator film, and coated so that the thickness of the pressure-sensitive adhesive layer after drying was 20 ⁇ m.
  • This pressure-sensitive adhesive layer was laminated on a base film and aged at 40 ° C. for 7 days to obtain a pressure-sensitive adhesive sheet.
  • the base film is mainly composed of Zn salt of ethylene-methacrylic acid-methacrylic acid alkyl ester copolymer, which is an ionomer resin, MFR value 1.0 g / 10 min (JIS K7210, 210 ° C.), melting point 86 ° C., A Zn 2+ ion-containing (Mitsui / DuPont Polychemical Co., Ltd., product number: HM1855) film formed to 100 ⁇ m by T-die extrusion was used.
  • Zn salt of ethylene-methacrylic acid-methacrylic acid alkyl ester copolymer which is an ionomer resin
  • MFR value 1.0 g / 10 min JIS K7210, 210 ° C.
  • melting point 86 ° C. melting point 86 ° C.
  • A-1 Acrylic rubber AR53L manufactured by Nippon Zeon Co., Ltd .; a copolymer of 54% ethyl acrylate, 19% butyl acrylate and 24% methoxyethyl acrylate, obtained by emulsion polymerization.
  • A-2 SK dyne 1496 manufactured by Soken Chemical Co .; a copolymer of 96% 2-ethylhexyl acrylate and 4% 2-hydroxyethyl acrylate, obtained by solution polymerization.
  • B-1 Weight average molecular weight 300
  • B-2 Weight average molecular weight 500
  • B-3 Weight average molecular weight 1,300
  • B-4 Weight average molecular weight 4,100
  • B-5 Weight average molecular weight 120,000
  • B-6 Weight average molecular weight 230,000 [Multifunctional isocyanate curing agent]
  • C-1 Coronate L-45E manufactured by Nippon Polyurethane; Trimethylolpropane adduct of 2,4-tolylene diisocyanate.
  • C-2 Coronate HL manufactured by Nippon Polyurethane Co .; trimethylolpropane adduct of hexamethylene diisocyanate.
  • D-1 IRGACURE127 manufactured by BASF Japan; 2-hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] -phenyl ⁇ -2-methyl-propan-1-one.
  • D-2 IRGACURE651 manufactured by BASF Japan Ltd .; benzyldimethyl ketal.
  • the obtained pressure-sensitive adhesive sheet was prepared according to the following procedure, and an all organic carbon meter (manufactured by Shimadzu Corporation) in accordance with JIS K 0101 20.1 “combustion oxidation-infrared TOC analysis method” ON-LINE TOC-VCHS), the TOC concentration in the sample was measured.
  • the TOC concentration obtained by the above method was evaluated according to the following criteria. ⁇ (excellent): 0-2.0mg / L ⁇ (good): 2.1 to 5.0 mg / L X (impossible): More than 5.0 mg / L
  • the conditions for the dicing process were as follows.
  • Dicing machine DAD341 manufactured by DISCO Dicing blade: NBC-ZH205O-27HEEE made by DISCO Dicing blade shape: outer diameter 55.56 mm, blade width 35 ⁇ m, inner diameter 19.05 mm
  • Dicing blade rotation speed 40,000 rpm
  • Dicing blade feed rate 50 mm / sec.
  • Dicing size 1.5 mm square.
  • Cutting depth into adhesive sheet 15 ⁇ m
  • Cutting water temperature 25 ° C
  • Cutting water volume 1.0 l / min
  • Chip Retention was evaluated according to the following criteria based on the remaining ratio of the semiconductor chips held on the adhesive sheet after the dicing process. ⁇ (excellent): Chip skipping is less than 5% ⁇ (good): Chip skipping is 5% or more and less than 10% ⁇ (impossible): Chip skipping is 10% or more
  • Chip pickup success rate is 95% or more
  • Chip pickup success rate is 80% or more and less than 95%
  • Chip pickup success rate is less than 80%
  • the pressure-sensitive adhesive sheet according to this embodiment is A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate,
  • the pressure-sensitive adhesive layer is It contains (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent as essential components, and the total organic carbon (TOC: Total Organic Carbon) concentration eluted in pure water is 3.0 mg / L or less.
  • TOC Total Organic Carbon
  • the pressure-sensitive adhesive layer is 100 parts by weight of a (meth) acrylic acid ester copolymer, 0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent; Containing 0.1 to 20 parts by mass of a photopolymerization initiator, The (meth) acrylic acid ester copolymer and the photopolymerizable compound contain a hydroxyl group.
  • the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer polymers obtained by polymerizing acrylic acid, methacrylic acid and ester monomers thereof, unsaturated monomers copolymerizable with these monomers (for example, vinyl acetate, styrene, acrylonitrile) and There is a copolymer obtained by copolymerizing.
  • the pressure-sensitive adhesive sheet of the present embodiment the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer is preferably an acrylic polymer that is easy to design the pressure-sensitive adhesive force, and the adhesive force can be adjusted more precisely by containing a curing agent. And it is preferable that at least one of the acrylic monomers constituting the acrylic polymer contains a functional group-containing monomer.
  • This functional group-containing monomer is preferably blended and polymerized in an acrylic polymer in an amount of 0% by mass to 10% by mass. If the blending ratio of the functional group-containing monomer is 0.01% by mass or more, the adhesive strength to the adherend is sufficiently strong and the generation around the water tends to be suppressed. If the blending ratio is 10 mass% or less, the adhesive force to the adherend will not be too high, so that it is possible to suppress the occurrence of adhesive residue.
  • Examples of the main monomer of the acrylic polymer include butyl (meth) acrylate, 2-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, octyl (meth) acrylate, 2- Ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, tridecyl (meth) acrylate, myristyl ( Examples include (meth) acrylic monomers such as (meth) acrylate, cetyl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, and benzyl (meth) acrylate.
  • acrylic monomer those having a monomer containing a functional group at least in part are particularly preferable.
  • a monomer having a hydroxyl group, a carboxyl group, an epoxy group, an amide group, an amino group, a methylol group, a sulfonic acid group, a sulfamic acid group, or a (phosphite) ester group Is preferred.
  • vinyl compounds having these functional groups are particularly preferable, and vinyl compounds having hydroxyl groups are particularly preferable.
  • the acrylate mentioned later is included in the vinyl compound here.
  • Examples of the functional group-containing monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate.
  • Examples of the monomer having a carboxyl group include (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N-glycolic acid, and cinnamic acid.
  • Examples of the monomer having an epoxy group include allyl glycidyl ether and (meth) acrylic acid glycidyl ether.
  • Examples of the monomer having an amide group include (meth) acrylamide.
  • Examples of the monomer having an amino group include N, N-dimethylaminoethyl (meth) acrylate.
  • Examples of the monomer having a methylol group include N-methylol acrylamide.
  • the monomer containing a carboxyl group constituting the acrylic polymer is It is preferably 0.1 to 10% by mass or less in the acrylic polymer. That is, according to another expression, among functional group-containing monomers obtained by reacting an adhesive with a curing agent, the functional group-containing monomer containing a carboxyl group is preferably 10% by mass or less.
  • the adhesion to metal increases, so the carboxyl group-containing functional group-containing monomer after reacting with the curing agent exceeds 10% by mass.
  • the monomer having a carboxyl group is preferably one that easily disappears by reaction with a curing agent.
  • (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N Glycolic acid and cinnamic acid are preferably used.
  • the adhesive sheet of this embodiment it is preferable to mix
  • curing agent is 0.1 to 20 mass parts with respect to 100 mass parts of acrylic polymers. It is because it can suppress that the adhesive residue generate
  • the curing agent to be blended in the pressure-sensitive adhesive layer there are a polyfunctional isocyanate curing agent, a polyfunctional epoxy curing agent, an azirine compound, a melamine compound, and the like, and preferably a polyfunctional isocyanate curing agent and a polyfunctional epoxy curing agent.
  • a polyfunctional epoxy curing agent or a polyfunctional isocyanate curing agent as at least a part of the above curing agent, it is possible to selectively cause a functional group-containing monomer having a carboxyl group to react and disappear. It is possible to adjust the amount of the functional group-containing monomer having a carboxyl group after curing.
  • polyfunctional isocyanate curing agent examples include an aromatic polyisocyanate curing agent, an aliphatic polyisocyanate curing agent, and an alicyclic polyisocyanate curing agent.
  • an aliphatic polyisocyanate curing agent particularly a xamethylene diisocyanate curing agent among them is preferable. The reason why this isocyanate curing agent is good is that it can impart flexibility to the pressure-sensitive adhesive and is also effective for an adherend having irregularities.
  • the aromatic polyisocyanate is not particularly limited, and for example, 1,3-phenylene diisocyanate, 4,4′-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4′-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2, , 6-tolylene diisocyanate, 4,4′-toluidine diisocyanate, 2,4,6-triisocyanate toluene, 1,3,5-triisocyanate benzene, dianisidine diisocyanate, 4,4′-diphenyl ether diisocyanate, 4,4 ', 4 "-triphenylmethane triisocyanate, ⁇ , ⁇ '-diisocyanate-1,3-dimethylbenzene, ⁇ , ⁇ '-diisocyanate-1,4-dimethylbenzene, ⁇ , ⁇ '-diisocyanate-1,4- Diechi
  • the aliphatic polyisocyanate is not particularly limited.
  • diisocyanate and 2,4,4-trimethylhexamethylene diisocyanate examples thereof include diisocyanate and 2,4,4-trimethylhexamethylene diisocyanate.
  • the alicyclic polyisocyanate is not particularly limited.
  • 1,3-phenylene diisocyanate, 4,4'-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate 4,4′-toluidine diisocyanate and hexamethylene diisocyanate are preferably used.
  • the polyfunctional epoxy curing agent mainly means a compound having two or more epoxy groups and one or more tertiary nitrogen atoms.
  • the pressure-sensitive adhesive can be a pressure-sensitive pressure-sensitive adhesive mainly composed of an acrylic polymer and a curing agent, but in addition to the acrylic polymer and the curing agent, a photopolymerizable compound, a photopolymerization initiator, a tackifying resin, and an additive It can be used as a photo-curing pressure-sensitive adhesive using etc.
  • the photopolymerizable compound preferably contains a hydroxyl group.
  • Examples of the photopolymerizable compound containing a hydroxyl group include pentaerythritol triacrylate and dipentaerythritol monohydroxypentaacrylate.
  • an epoxy acrylate oligomer such as a bis-A type epoxy acrylate represented by the following general formula may be used in addition to the acrylate compound.
  • R represents a hydrogen molecule or a (meth) acrylate group.
  • N represents an integer of 1 or more.
  • the photopolymerizable compound those having 4 or more vinyl groups are preferred in that the adhesive is cured well after irradiation with ultraviolet rays or the like.
  • the blending amount of the photopolymerizable compound is preferably 5 parts by mass or more and 200 parts by mass or less, and more preferably 40 parts by mass or more and 150 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. If the blending amount of the photopolymerizable compound is reduced, the peelability of the pressure-sensitive adhesive sheet after irradiation is reduced, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, when the blending amount of the photopolymerizable compound is increased, pick-up failure is liable to occur due to the glue being picked up during dicing, and a minute glue residue is generated due to a reaction residue, which causes contamination.
  • Photopolymerization initiator benzoin, benzoin alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones or xanthones are used.
  • benzoin examples include benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether.
  • acetophenones examples include benzoin alkyl ethers, acetophenone, 2,2-dimethoxy-2-acetophenone, 2,2-diethoxy-2-acetophenone, 1,1-dichloroacetophenone, and the like.
  • Anthraquinones include 2-methylanthraquinone, 2-ethylanthraquinone, 2-tertiarybutylanthraquinone, 1-chloroanthraquinone and the like.
  • Examples of thioxanthones include 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and 2,4-diisopropylthioxanthone.
  • Examples of ketals include acetophenone dimethyl ketal, benzyldimethylmethal, benzyldiphenylsulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, ⁇ -chloranthraquinone, and the like.
  • 2-hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] having a hydroxyl group capable of reacting with an isocyanate curing agent in order to prevent contamination of the adherend -Phenyl ⁇ -2-methyl-propan-1-one (manufactured by BASF Japan, product name IRGACURE127) is preferred.
  • the blending amount of the photopolymerization initiator is preferably 0.1 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester polymer. If the blending amount is too small, the peelability of the pressure-sensitive adhesive sheet after irradiation is lowered, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, if the amount is too large, the photopolymerization initiator bleeds out to the pressure-sensitive adhesive surface, causing contamination.
  • the photopolymerization initiator may be used in combination with one or more conventionally known photopolymerization accelerators, if necessary.
  • group, a tertiary amine, etc. can be used for a photoinitiator.
  • the tertiary amine include triethylamine, tetraethylpentamine, dimethylamino ether and the like.
  • the tackifier resin is a terpene phenol resin that is completely or partially hydrogenated with a terpene phenol resin.
  • the terpene phenol resin can be produced, for example, by reacting 1 mol of a terpene compound with 0.1 to 50 phenols.
  • terpene compounds include myrcene, alloocimene, osmene, ⁇ -pinene, ⁇ -pinene, dipentene, limonene, ⁇ -ferrandrene, ⁇ -terpinene, ⁇ -terpinene, terpinolene, 1,8-cineole, 1,4-cineole, Examples include ⁇ -terpineol, ⁇ -terpineol, ⁇ -terpineol, camphene, tricyclene, sabinene, paramentadienes, and carenes. Among these compounds, ⁇ -pinene, ⁇ -pinene, limonene, myrcene, alloocimene and ⁇ -terpinene are particularly preferably used in the present invention.
  • phenols examples include, but are not limited to, phenol, cresol, xylenol, catechol, resorcin, hydroquinone, bisphenol A, and the like.
  • the ratio of phenols in the terpene phenol resin is about 25 to 50 mol%, but is not limited thereto.
  • the hydroxyl value of the fully or partially hydrogenated terpene phenol resin is preferably 50 to 250.
  • the reaction with the isocyanate curing agent is not sufficient, bleeds out to the surface of the pressure-sensitive adhesive, causing contamination, and when it exceeds 250, the viscosity increases and the (meth) acrylic acid ester This is because uneven mixing with a polymer or the like occurs and the pickup characteristics are not stable.
  • the hydrogenation method is not particularly limited, and for example, a noble metal such as palladium, ruthenium, rhodium or the like supported on a carrier such as activated carbon, activated alumina, or diatomaceous earth is used as a catalyst.
  • the hydrogenation rate can be measured by bromine number measurement, iodine number measurement or the like.
  • the hydrogenation rate of the completely or partially hydrogenated terpene phenol resin is preferably 30 mol% or more, more preferably 70 mol% or more.
  • the amount is less than 30 mol%, the adhesive force is not sufficiently lowered due to the reaction inhibition of the photopolymerizable compound by irradiation with actinic rays, and the pickup property is lowered.
  • the blending ratio of the fully or partially hydrogenated terpene phenol resin is preferably 0.5 parts by mass or more and 100 parts by mass or less, and 1.0 part by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. Less than the mass part is more preferable. If the completely or partially hydrogenated terpene phenol resin is 0.5 parts by mass or more, the adhesive strength is not too low, so the retention of the semiconductor chip is maintained during dicing, and if it is 100 parts by mass or less, the pickup is poor. Can be suppressed.
  • additives such as a softening agent, an anti-aging agent, a filler, a conductive agent, an ultraviolet absorber, and a light stabilizer may be added to the adhesive.
  • the thickness of the pressure-sensitive adhesive layer is preferably 1 ⁇ m to 50 ⁇ m, particularly preferably 5 ⁇ m to 35 ⁇ m. If the pressure-sensitive adhesive layer is too thick, the pressure-sensitive adhesive strength becomes too high and the pick-up property is lowered. On the other hand, if the pressure-sensitive adhesive layer is too thin, the pressure-sensitive adhesive force becomes too low, chip retention during dicing is lowered, and peeling may occur between the ring frame and the sheet.
  • the base material examples include polyvinyl chloride, polyethylene terephthalate, ethylene-vinyl acetate copolymer, ethylene-acrylic acid-acrylate film, ethylene-ethyl acrylate copolymer, polyethylene, polypropylene, propylene-based copolymer Polymers, ethylene-acrylic acid copolymers, and ionomer resins obtained by crosslinking ethylene- (meth) acrylic acid copolymers, ethylene- (meth) acrylic acid- (meth) acrylic acid ester copolymers, etc. with metal ions Is mentioned.
  • the base material may be a mixture or copolymer of these resins, and may be a laminate of films and sheets made of these resins.
  • an ionomer resin as a material for the base film.
  • ionomer resins if an ionomer resin obtained by crosslinking a copolymer having an ethylene unit, a methacrylic acid unit, and a (meth) acrylic acid alkyl ester unit with a metal ion such as Na + , K + , or Zn 2+ is used, cutting is performed. The dust suppressing effect is remarkable and is preferably used.
  • the base material may be a single layer or a multilayer film or sheet made of the above material, or may be a laminate of films made of different materials.
  • the thickness of the substrate is 50 to 200 ⁇ m, preferably 70 to 150 ⁇ m.
  • an antistatic treatment it is preferable to apply an antistatic treatment to the substrate.
  • the antistatic treatment include a treatment for adding an antistatic agent to the substrate, a treatment for applying the antistatic agent to the substrate surface, and a treatment by corona discharge.
  • a quaternary amine salt monomer can be used as the antistatic agent.
  • the quaternary amine salt monomer include dimethylaminoethyl (meth) acrylate quaternary chloride, diethylaminoethyl (meth) acrylate quaternary chloride, methylethylaminoethyl (meth) acrylate quaternary chloride, p-dimethyl.
  • examples include aminostyrene quaternary chloride and p-diethylaminostyrene quaternary chloride. Of these, dimethylaminoethyl methacrylate quaternary chloride is preferred.
  • the adhesive may be applied to one side of the base film, and the slip agent and / or the antistatic agent may be applied to the back side thereof.
  • an antistatic agent may be kneaded into the resin of the base film to form a sheet.
  • a slip agent In order to improve the expandability after dicing, a slip agent can be applied to the non-adhesive surface of the base material, or the slip agent can be kneaded into the base material.
  • the slip agent is not particularly limited as long as it is a substance that reduces the friction coefficient of the pressure-sensitive adhesive sheet and the expanding device.
  • silicone compounds such as silicone resins and (modified) silicone oils, fluororesins, hexagonal boron nitride, carbon black, And molybdenum disulfide. These friction reducing agents may mix a plurality of components. Since manufacture of an electronic component is performed in a clean room, it is preferable to use a silicone compound or a fluororesin.
  • a copolymer having a silicone macromonomer unit is particularly preferred because it has good compatibility with the antistatic layer and can achieve a balance between antistatic properties and expandability.
  • an adhesive sheet is affixed on a semiconductor wafer (or substrate) and a ring frame.
  • the wafer may be a conventional general-purpose wafer such as a silicon wafer and a gallium nitride wafer, a silicon carbide wafer, or a sapphire wafer.
  • the substrate may be a general-purpose substrate such as a package substrate in which a chip is sealed with a resin or an LED package substrate.
  • actinic rays such as an ultraviolet-ray
  • actinic rays are irradiated to a photocurable adhesive layer from the base material side.
  • an ultraviolet light source a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or a metal halide lamp can be used.
  • an electron beam may be used instead of ultraviolet rays, and ⁇ -rays, ⁇ -rays, and ⁇ -rays can be used as a light source for the electron beams.
  • the light-sensitive adhesive layer is three-dimensionally reticulated and cured by light irradiation, and the adhesive strength of the pressure-sensitive adhesive layer is reduced. At this time, as described above, since the pressure-sensitive adhesive sheet according to the present invention does not excessively adhere to a wafer or the like even when heated, a sufficient decrease in adhesive force can be obtained by irradiation with ultraviolet rays or the like.
  • the adhesive sheet is stretched to widen the gap between the semiconductor chips or semiconductor components, and the chip or components are pushed up with a needle pin or the like. Thereafter, the chip or component is adsorbed by a vacuum collet or air tweezers, peeled off from the adhesive layer of the adhesive sheet and picked up.
  • a sufficient decrease in the adhesive strength is obtained by irradiation with ultraviolet rays or the like, so that peeling between the chip or component and the pressure-sensitive adhesive layer becomes easy, and good pick-up properties are obtained. And no defects such as glue residue occur.
  • a method of forming a pressure-sensitive adhesive layer on a substrate to form a pressure-sensitive adhesive sheet for example, a method of directly applying a pressure-sensitive adhesive on a substrate with a coater such as a gravure coater, comma coater, bar coater, knife coater or roll coater, There is a method in which a pressure-sensitive adhesive is applied to a release film and dried and bonded to a base film.
  • the adhesive may be printed on the substrate by convex printing, concave printing, flat printing, flexographic printing, offset printing, screen printing, or the like.
  • the pressure-sensitive adhesive sheet of this embodiment is suitably used for attaching an electronic component assembly called a workpiece in a dicing step and a back grinding step, which are electronic component manufacturing steps.
  • the curable pressure-sensitive adhesive was coated on a polyethylene terephthalate separator film, and coated so that the thickness of the pressure-sensitive adhesive layer after drying was 20 ⁇ m.
  • This pressure-sensitive adhesive layer was laminated on a base film and aged at 40 ° C. for 7 days to obtain a pressure-sensitive adhesive sheet.
  • the base film is mainly composed of Zn salt of ethylene-methacrylic acid-methacrylic acid alkyl ester copolymer, which is an ionomer resin, MFR value 1.0 g / 10 min (JIS K7210, 210 ° C.), melting point 86 ° C., A Zn 2+ ion-containing (Mitsui / DuPont Polychemical Co., Ltd., product number: HM1855) film formed to 100 ⁇ m by T-die extrusion was used.
  • Zn salt of ethylene-methacrylic acid-methacrylic acid alkyl ester copolymer which is an ionomer resin
  • MFR value 1.0 g / 10 min JIS K7210, 210 ° C.
  • melting point 86 ° C. melting point 86 ° C.
  • A-1 Acrylic rubber AR53L manufactured by Nippon Zeon Co., Ltd .; a copolymer of 54% ethyl acrylate, 19% butyl acrylate and 24% methoxyethyl acrylate, obtained by emulsion polymerization.
  • A-2 SK dyne 1496 manufactured by Soken Chemical Co .; a copolymer of 96% 2-ethylhexyl acrylate and 4% 2-hydroxyethyl acrylate, obtained by solution polymerization.
  • B-1 A bis-A type epoxy acrylate represented by the following general formula.
  • tetrafunctional acrylate having a weight average molecular weight of 1000 (manufactured by Showa Denko KK, product name: Lipoxy PX-390HT). Contains hydroxyl groups.
  • R represents a hydrogen molecule or a (meth) acrylate group.
  • N represents an integer of 1 or more.
  • B-2 A terminal isocyanate compound obtained by reacting hexamethylene diisocyanate with the OH terminal of pentaerythritol, further reacted with 2-hydroxyethyl acrylate, and has 4 vinyl groups per molecule and a weight average molecular weight of 1000.
  • Urethane acrylate synthetic product
  • a weight average molecular weight is the value measured as a weight average molecular weight of polystyrene conversion by the gel permeation chromatography method (GPC).
  • GPC gel permeation chromatography method
  • D-1 IRGACURE127 manufactured by BASF Japan; 2-hydroxy-1- ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] -phenyl ⁇ -2-methyl-propan-1-one.
  • D-2 IRGACURE651 manufactured by BASF Japan Ltd .; benzyldimethyl ketal.
  • the obtained pressure-sensitive adhesive sheet was prepared according to the following procedure, and an all organic carbon meter (manufactured by Shimadzu Corporation) in accordance with JIS K 0101 20.1 “combustion oxidation-infrared TOC analysis method” ON-LINE TOC-VCHS), the TOC concentration in the sample was measured.
  • the TOC concentration obtained by the above method was evaluated according to the following criteria. ⁇ (excellent): less than 1.0 mg / L ⁇ (good): 1.0 mg / L or more, 3.0 mg / L or less ⁇ (impossible): more than 3.0 mg / L
  • the conditions for the dicing process were as follows.
  • Dicing machine DAD341 manufactured by DISCO Dicing blade: NBC-ZH205O-27HEEE made by DISCO Dicing blade shape: outer diameter 55.56 mm, blade width 35 ⁇ m, inner diameter 19.05 mm
  • Dicing blade rotation speed 40,000 rpm
  • Dicing blade feed rate 50 mm / sec.
  • Dicing size 1.5 mm square.
  • Cutting depth into adhesive sheet 15 ⁇ m
  • Cutting water temperature 25 ° C
  • Cutting water volume 1.0 l / min
  • Chip Retention was evaluated according to the following criteria based on the remaining ratio of the semiconductor chips held on the adhesive sheet after the dicing process. ⁇ (excellent): Chip skipping is less than 5% ⁇ (good): Chip skipping is 5% or more and less than 10% ⁇ (impossible): Chip skipping is 10% or more
  • Chip pickup success rate is 95% or more
  • Chip pickup success rate is 80% or more and less than 95%
  • Chip pickup success rate is less than 80%

Abstract

Provided is an adhesive sheet that is such that the total organic carbon concentration in washing water during a dicing process and after the dicing process is an extremely low level, there is no spattering of chips during the dicing process, pick-up is easily performed, and it is difficult for glue residue to arise. The present invention provides an adhesive sheet resulting from laminating an adhesive layer onto a substrate, wherein the adhesive layer is a photocurable adhesive layer, the photocurable adhesive layer contains 100 parts by mass of a (meth)acrylic ester copolymer, 5-200 parts by mass of a photocurable compound, 0.1-20 parts by mass of a polyfunctional isocyanate curing agent, and 0.1-20 parts by mass of a photoinitiator, the weight average molecular weight of the photocurable compound is at least 500, the adhesive sheet is adjusted to the size of 50 mm x 50 mm, and the total organic carbon (TOC) concentration leaching out when immersed in 500 mL of pure water for 24 hours is no greater than 5.0 mg/L.

Description

粘着シートAdhesive sheet
 本発明は、電子部品の製造工程で使用される粘着シートに関する。 The present invention relates to an adhesive sheet used in the manufacturing process of electronic components.
 半導体ウエハ又は基板は、粘着シートを貼合してから、素子小片への切断(ダイシング)、粘着シートの延伸(エキスパンディング)、粘着シートからの素子小片の剥離(ピックアップ)などの各工程へ配される。これらの工程で使用される粘着シート(ダイシングテープ)には、ダイシング工程では切断された素子小片(チップ)に対して充分な粘着力を有しながら、ピックアップ工程時には糊残りのない程度に粘着力が減少していることが望まれる。 The semiconductor wafer or substrate is attached to each process such as cutting (dicing), stretching (expanding) the adhesive sheet, and peeling (pickup) the element small piece from the adhesive sheet after bonding the adhesive sheet. Is done. The pressure-sensitive adhesive sheet (dicing tape) used in these processes has sufficient adhesive strength to the cut element pieces (chips) in the dicing process, but does not have adhesive residue during the pick-up process. It is hoped that is reduced.
 粘着シートとして、紫外線および/又は電子線などの活性光線に対し透過性を有する基材上に紫外線等により重合硬化反応をする粘着剤層を塗布したものがある。この粘着シートでは、ダイシング工程後に紫外線等を粘着剤層に照射し、粘着剤層を重合硬化させて粘着力を低下させた後、切断されたチップをピックアップする方法がとられる。 As the pressure-sensitive adhesive sheet, there is one in which a pressure-sensitive adhesive layer that undergoes a polymerization and curing reaction with ultraviolet light or the like is applied on a base material that is transparent to active rays such as ultraviolet light and / or electron beams. In this pressure-sensitive adhesive sheet, after the dicing step, ultraviolet light or the like is irradiated to the pressure-sensitive adhesive layer, the pressure-sensitive adhesive layer is polymerized and cured to reduce the pressure-sensitive adhesive force, and then a cut chip is picked up.
 このような粘着シートとしては、特許文献1および特許文献2には、基材面に例えば活性光線によって三次元網状化しうる、分子内に光重合性不飽和二重結合を有する化合物(多官能性オリゴマー)を含有してなる粘着剤を塗布した粘着シートが開示されている。 As such a pressure-sensitive adhesive sheet, Patent Document 1 and Patent Document 2 disclose a compound having a photopolymerizable unsaturated double bond in its molecule (polyfunctional) that can be three-dimensionally reticulated on the substrate surface by, for example, actinic rays. An adhesive sheet coated with an adhesive containing an oligomer) is disclosed.
特開2006-049509号公報JP 2006-049509 A 特開2007-246633号公報JP 2007-246633 A
 半導体ウエハ又は基板の加工工程のうち、ダイシング工程を行うダイシングマシンにおいては、高速で回転するブレードと称する薄型砥石を使用し、研削水や冷却水をかけながらワークを加工している。 Among semiconductor wafer or substrate processing steps, a dicing machine that performs a dicing step uses a thin grindstone called a blade that rotates at high speed, and processes a workpiece while applying grinding water or cooling water.
 また、このダイシングマシンでは、加工中に発生する微細な研削粉によるワーク表面や研削溝内の汚染物(コンタミネーション:以下略して「コンタミ」と言う)付着を極度に嫌うため、回転ブレードの近傍に洗浄ノズルを設け、ダイシング中のコンタミ付着を削減し、更に、ダイシング加工終了後のワークをダイシングマシン中に設けられたスピン洗浄装置に搬入し、ワークを回転させながら洗浄ノズルをワーク面内で揺動させてスピン洗浄を行う工程がある。 In addition, this dicing machine is extremely disliked by contaminants (contamination: hereinafter referred to as “contamination” for short) due to the fine grinding powder generated during machining, so it is in the vicinity of the rotating blade. A cleaning nozzle is provided to reduce adhesion of contamination during dicing, and the work after dicing processing is carried into a spin cleaning device provided in the dicing machine, and the cleaning nozzle is moved within the work surface while rotating the work. There is a step of performing spin cleaning by swinging.
 この加工中及び加工後の洗浄水においては、有機物、イオン成分、微粒子、細菌等が高度に除去された超純水等の純水が使用されている。特に、半導体装置を含む電子部品を製造する際には、その洗浄工程において多量の純水が使用されており、その水質に対する要求も年々高まっている。電子部品製造の洗浄工程等において使用される純水では、純水中に含まれる有機物がその後の熱処理工程において炭化して絶縁不良等を引き起こすことを防止するため、水質管理項目の一つである全有機炭素(TOC:Total Organic Carbon)濃度を極めて低いレベルとすることが求められるようになってきている。 In the cleaning water during and after the processing, pure water such as ultrapure water from which organic substances, ionic components, fine particles, bacteria, etc. are highly removed is used. In particular, when manufacturing an electronic component including a semiconductor device, a large amount of pure water is used in the cleaning process, and the demand for the water quality is increasing year by year. Pure water used in the cleaning process of electronic component manufacturing is one of the water quality management items in order to prevent the organic matter contained in the pure water from carbonizing in the subsequent heat treatment process and causing poor insulation. It has been demanded that the total organic carbon (TOC) concentration be extremely low.
 そこで、本発明は、ダイシング加工中及びダイシング加工後の洗浄水において、全有機炭素濃度が極めて低いレベルにあり、ダイシング加工中時にチップが飛散せず、ピックアップが容易にでき、糊残りが生じ難い粘着シートを提供することを主な目的とする。 Therefore, in the present invention, the total organic carbon concentration is very low in the cleaning water during and after the dicing process, the chips do not scatter during the dicing process, the pickup can be easily performed, and the adhesive residue hardly occurs. The main purpose is to provide an adhesive sheet.
 本発明は、
 基材に粘着剤層を積層してなる粘着シートであって、前記粘着剤層が、光硬化型粘着剤層であって、光硬化型粘着剤が、
 (メタ)アクリル酸エステル共重合体100質量部と、
 光重合性化合物5~200質量部と、
 多官能イソシアネート硬化剤0.1~20質量部と、
 光重合開始剤0.1~20質量部と、を含み、
 前記光重合性化合物の重量平均分子量が500以上であり、
 前記粘着シートを50mm×50mmの大きさに調整し、24時間、500mLの純水に浸漬したときに溶出する全有機炭素(TOC:Total Organic Carbon)濃度が5.0mg/L以下である
 粘着シート。
The present invention
A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate, wherein the pressure-sensitive adhesive layer is a photocurable pressure-sensitive adhesive layer, and the photocurable pressure-sensitive adhesive is
100 parts by weight of a (meth) acrylic acid ester copolymer,
5 to 200 parts by mass of a photopolymerizable compound,
0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent;
0.1 to 20 parts by mass of a photopolymerization initiator,
The photopolymerizable compound has a weight average molecular weight of 500 or more,
The pressure-sensitive adhesive sheet is adjusted to a size of 50 mm × 50 mm and has a total organic carbon (TOC) concentration of 5.0 mg / L or less that is eluted when immersed in 500 mL of pure water for 24 hours. .
 また、本発明は、
 基材に粘着剤層を積層してなる粘着シートであって、
 前記粘着剤層が、
 (メタ)アクリル酸エステル共重合体、光重合性化合物、及び硬化剤を必須成分として含有し、純水に溶出する全有機炭素(TOC:Total Organic Carbon)濃度が3.0mg/L以下であり、
 前記粘着剤層が、
  (メタ)アクリル酸エステル共重合体100質量部と、
  多官能イソシアネート硬化剤0.1~20質量部と、
  光重合開始剤0.1~20質量部と、を含有し、
 前記(メタ)アクリル酸エステル共重合体および前記光重合性化合物がヒドロキシル基を含有する
 粘着シート。
The present invention also provides:
A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate,
The pressure-sensitive adhesive layer is
It contains (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent as essential components, and the total organic carbon (TOC: Total Organic Carbon) concentration eluted in pure water is 3.0 mg / L or less. ,
The pressure-sensitive adhesive layer is
100 parts by weight of a (meth) acrylic acid ester copolymer,
0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent;
Containing 0.1 to 20 parts by mass of a photopolymerization initiator,
The pressure-sensitive adhesive sheet in which the (meth) acrylic acid ester copolymer and the photopolymerizable compound contain a hydroxyl group.
 なお、(メタ)アクリル酸エステル共重合体、光重合性化合物、及び硬化剤を必須成分として含有し、且つ(メタ)アクリル酸エステル共重合体と硬化剤、ならびに光重合性化合物と硬化剤とが化学的に結合していないと、粘着剤層の有機成分が水へ溶出しやすくなる。その結果、ダイシング時の洗浄水に含まれるTOC濃度が上昇しやすくなり、電子部品の絶縁不良などの原因となる。 In addition, (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent are contained as essential components, and (meth) acrylic acid ester copolymer and curing agent, and photopolymerizable compound and curing agent, If is not chemically bonded, the organic component of the pressure-sensitive adhesive layer is likely to elute into water. As a result, the TOC concentration contained in the cleaning water at the time of dicing is likely to increase, resulting in an insulation failure of the electronic component.
 本発明により、ダイシング加工中及びダイシング加工後の洗浄水において、全有機炭素濃度が極めて低いレベルにありのため絶縁不良が生じにくく、ダイシング加工中時にチップが飛散せず、ピックアップが容易にでき、糊残りが生じ難い粘着シートが提供される。 According to the present invention, in the cleaning water during dicing and after dicing, the total organic carbon concentration is at a very low level, so insulation failure is unlikely to occur, chips do not scatter during dicing, and pickup can be performed easily. There is provided an adhesive sheet that hardly causes adhesive residue.
 以下、本発明を実施するための好適な形態について説明する。なお、以下に説明する実施形態は、本発明の代表的な実施形態の一例を示したものであり、これにより本発明の範囲が狭く解釈されることはない。 Hereinafter, preferred embodiments for carrying out the present invention will be described. In addition, embodiment described below shows an example of typical embodiment of this invention, and, thereby, the range of this invention is not interpreted narrowly.
<<第1実施形態>>
 本実施形態に係る粘着シートは、
 基材に粘着剤層を積層してなる粘着シートであって、前記粘着剤層が、光硬化型粘着剤層であって、光硬化型粘着剤が、
 (メタ)アクリル酸エステル共重合体100質量部と、
 光重合性化合物5~200質量部と、
 多官能イソシアネート硬化剤0.1~20質量部と、
 光重合開始剤0.1~20質量部と、を含み、
 前記光重合性化合物の重量平均分子量が500以上であり、
 前記粘着シートを50mm×50mmの大きさに調整し、24時間、500mLの純水に浸漬したときに溶出する全有機炭素(TOC:Total Organic Carbon)濃度が5.0mg/L以下である。
<< First Embodiment >>
The pressure-sensitive adhesive sheet according to this embodiment is
A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate, wherein the pressure-sensitive adhesive layer is a photocurable pressure-sensitive adhesive layer, and the photocurable pressure-sensitive adhesive is
100 parts by weight of a (meth) acrylic acid ester copolymer,
5 to 200 parts by mass of a photopolymerizable compound,
0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent;
0.1 to 20 parts by mass of a photopolymerization initiator,
The photopolymerizable compound has a weight average molecular weight of 500 or more,
The pressure-sensitive adhesive sheet is adjusted to a size of 50 mm × 50 mm, and the total organic carbon (TOC) concentration eluted when immersed in 500 mL of pure water for 24 hours is 5.0 mg / L or less.
 また、本実施形態に係る粘着シートは、
 基材に粘着剤層を積層してなる粘着シートであって、前記粘着シートを100mm×100mmの大きさに調整し、24時間、水に浸漬したときに溶出する全有機炭素(TOC:Total Organic Carbon)濃度が0~5mg/Lである。
In addition, the pressure-sensitive adhesive sheet according to this embodiment is
A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a base material, wherein the pressure-sensitive adhesive sheet is adjusted to a size of 100 mm × 100 mm and is dissolved in water for 24 hours to dissolve all organic carbon (TOC: Total Organic) Carbon) concentration is 0-5 mg / L.
<粘着剤層>
 粘着剤層を構成する粘着剤としては、アクリル酸、メタクリル酸及びそれらのエステルモノマーを重合させたポリマー、これらモノマーと共重合可能な不飽和単量体(例えば、酢酸ビニル、スチレン、アクリロニトリル)とを共重合させたコポリマーがある。本実施形態の粘着シートでは、粘着剤層を構成する粘着剤は、粘着力を設計しやすいアクリル重合体がよく、硬化剤を含有することによって、粘着力をより精密に調整することができる。そして、アクリル重合体を構成するアクリルモノマーの少なくとも一つは、官能基含有単量体を含むものが好ましい。この官能基含有単量体は、アクリル重合体中に0質量%以上10質量%以下配合され重合されていることが好ましい。この官能基含有単量体の配合比が0.01質量%以上であれば、被着体への粘着力が十分強く水周りの発生が抑制される傾向にあり、この官能基含有単量体の配合比が10質量%以下であれば、被着体への粘着力が高くなりすぎないため、糊残りが発生することを抑制できる傾向にある。
<Adhesive layer>
As the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer, polymers obtained by polymerizing acrylic acid, methacrylic acid and ester monomers thereof, unsaturated monomers copolymerizable with these monomers (for example, vinyl acetate, styrene, acrylonitrile) and There is a copolymer obtained by copolymerizing. In the pressure-sensitive adhesive sheet of the present embodiment, the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer is preferably an acrylic polymer that is easy to design the pressure-sensitive adhesive force, and the adhesive force can be adjusted more precisely by containing a curing agent. And it is preferable that at least one of the acrylic monomers constituting the acrylic polymer contains a functional group-containing monomer. This functional group-containing monomer is preferably blended and polymerized in an acrylic polymer in an amount of 0% by mass to 10% by mass. If the blending ratio of the functional group-containing monomer is 0.01% by mass or more, the adhesive strength to the adherend is sufficiently strong and the generation around the water tends to be suppressed. If the blending ratio is 10 mass% or less, the adhesive force to the adherend will not be too high, so that it is possible to suppress the occurrence of adhesive residue.
 このアクリル重合体の主単量体としては、例えば、ブチル(メタ)アクリレート、2-ブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、オクチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ノニル(メタ)アクリレート、デシル(メタ)アクリレート、ラウリル(メタ)アクリレート、メチル(メタ)アクリレート、エチル(メタ)アクリレート、イソプロピル(メタ)アクリレート、トリデシル(メタ)アクリレート、ミリスチル(メタ)アクリレート、セチル(メタ)アクリレート、ステアリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート等の(メタ)アクリル単量体が挙げられる。 Examples of the main monomer of the acrylic polymer include butyl (meth) acrylate, 2-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, octyl (meth) acrylate, 2- Ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, tridecyl (meth) acrylate, myristyl ( Examples include (meth) acrylic monomers such as (meth) acrylate, cetyl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, and benzyl (meth) acrylate.
 このアクリル単量体としては、特に、少なくとも一部に官能基を含有する単量体を有するものが好ましい。この官能基を含有する単量体としては、ヒドロキシル基、カルボキシル基、エポキシ基、アミド基、アミノ基、メチロール基、スルホン酸基、スルファミン酸基、(亜)リン酸エステル基を有する単量体が好ましい。そして、これらの中でも、特に、これらの官能基を有するビニル化合物がよく、好ましくはヒドロキシル基を有するビニル化合物がよい。なお、ここでいうビニル化合物には、後述するアクリレートが含まれるものとする。 As the acrylic monomer, those having a monomer containing a functional group at least in part are particularly preferable. As the monomer containing this functional group, a monomer having a hydroxyl group, a carboxyl group, an epoxy group, an amide group, an amino group, a methylol group, a sulfonic acid group, a sulfamic acid group, or a (phosphite) ester group Is preferred. Of these, vinyl compounds having these functional groups are particularly preferable, and vinyl compounds having hydroxyl groups are particularly preferable. In addition, the acrylate mentioned later is included in the vinyl compound here.
 ヒドロキシル基を有する官能基含有単量体としては、例えば2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、及び2-ヒドロキシブチル(メタ)アクリレートがある。
 カルボキシル基を有する単量体としては、例えば(メタ)アクリル酸、クロトン酸、マレイン酸、無水マレイン酸、イタコン酸、フマール酸、アクリルアミドN-グリコール酸、及びケイ皮酸等が挙げられる。
Examples of the functional group-containing monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate.
Examples of the monomer having a carboxyl group include (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N-glycolic acid, and cinnamic acid.
 エポキシ基を有する単量体としては、例えばアリルグリシジルエーテル、及び(メタ)アクリル酸グリシジルエーテル等が挙げられる。 Examples of the monomer having an epoxy group include allyl glycidyl ether and (meth) acrylic acid glycidyl ether.
 アミド基を有する単量体としては、例えば(メタ)アクリルアミド等が挙げられる。 Examples of the monomer having an amide group include (meth) acrylamide.
 アミノ基を有する単量体としては、例えばN,N-ジメチルアミノエチル(メタ)アクリレート等が挙げられる。 Examples of the monomer having an amino group include N, N-dimethylaminoethyl (meth) acrylate.
 メチロール基を有する単量体としては、例えばN-メチロールアクリルアミド等が挙げられる。 Examples of the monomer having a methylol group include N-methylol acrylamide.
 なお、本実施形態の粘着剤層では、上記のアクリル重合体および硬化剤を反応させて粘着剤層を硬化させた後において、そのアクリル重合体を構成するカルボキシル基を含む単量体が、そのアクリル重合体中0.1~10質量%以下であることが好ましい。すなわち、別の表現によれば、粘着剤を硬化剤で反応させた官能基含有単量体のうち、カルボキシル基を含む官能基含有単量体は、10質量%以下が好ましい。カルボキシル基含有の官能基含有単量体を用いることで、金属への粘着力が増加するので、硬化剤と反応させた後のカルボキシル基含有の官能基含有単量体は、10質量%を超えると金属への粘着力が高く糊残りが発生する傾向にあり、10質量%以下であるほうがよい。そのため、カルボキシル基を有する単量体としては、硬化剤との反応によって消滅しやすいものが好ましく、例えば(メタ)アクリル酸、クロトン酸、マレイン酸、無水マレイン酸、イタコン酸、フマール酸、アクリルアミドN-グリコール酸、及びケイ皮酸が好ましく用いられる。 In the pressure-sensitive adhesive layer of this embodiment, after the pressure-sensitive adhesive layer is cured by reacting the acrylic polymer and the curing agent, the monomer containing a carboxyl group constituting the acrylic polymer is It is preferably 0.1 to 10% by mass or less in the acrylic polymer. That is, according to another expression, among functional group-containing monomers obtained by reacting an adhesive with a curing agent, the functional group-containing monomer containing a carboxyl group is preferably 10% by mass or less. By using a carboxyl group-containing functional group-containing monomer, the adhesion to metal increases, so the carboxyl group-containing functional group-containing monomer after reacting with the curing agent exceeds 10% by mass. In addition, the adhesive strength to the metal is high, and the adhesive residue tends to be generated. Therefore, the monomer having a carboxyl group is preferably one that easily disappears by reaction with a curing agent. For example, (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N Glycolic acid and cinnamic acid are preferably used.
(硬化剤)
 本実施形態の粘着シートでは、粘着剤層に用いる粘着剤には、硬化剤を配合するのが好ましい。硬化剤を配合する場合、アクリル重合体100質量部に対し、硬化剤の配合比は0.1質量部以上10質量部以下であることが好ましい。この硬化剤の配合比が0.1質量部以上10質量部以下であれば、糊残りが発生することを抑制できるからである。
(Curing agent)
In the adhesive sheet of this embodiment, it is preferable to mix | blend a hardening | curing agent with the adhesive used for an adhesive layer. When mix | blending a hardening | curing agent, it is preferable that the compounding ratio of a hardening | curing agent is 0.1 to 10 mass parts with respect to 100 mass parts of acrylic polymers. This is because if the blending ratio of the curing agent is 0.1 parts by mass or more and 10 parts by mass or less, generation of adhesive residue can be suppressed.
 粘着剤層に配合する硬化剤としては、多官能イソシアネート硬化剤、多官能エポキシ硬化剤、アジリン化合物、メラミン化合物等があり、好ましくは、多官能イソシアネート硬化剤、多官能エポキシ硬化剤がよい。上記の硬化剤の少なくとも一部として多官能エポキシ硬化剤または多官能イソシアネート硬化剤を使用することにより、選択的にカルボキシル基を有する官能基含有単量体を反応させて消滅させることが可能であり、硬化後のカルボキシル基を有する官能基含有単量体量を調節することが可能である。 As the curing agent to be blended in the pressure-sensitive adhesive layer, there are a polyfunctional isocyanate curing agent, a polyfunctional epoxy curing agent, an azirine compound, a melamine compound, and the like, and preferably a polyfunctional isocyanate curing agent and a polyfunctional epoxy curing agent. By using a polyfunctional epoxy curing agent or a polyfunctional isocyanate curing agent as at least a part of the above curing agent, it is possible to selectively cause a functional group-containing monomer having a carboxyl group to react and disappear. It is possible to adjust the amount of the functional group-containing monomer having a carboxyl group after curing.
 多官能イソシアネート硬化剤としては、例えば芳香族ポリイソシアネート硬化剤、脂肪族ポリイソシアネート硬化剤、脂環族ポリイソシアネート硬化剤がある。また、好ましくは、脂肪族ポリイソシアネート硬化剤、特にそのうちのキサメチレンジイソシアネート硬化剤がよい。このイソシアネート硬化剤が良いのは、粘着剤に柔軟性を付与することができ、凹凸のある被着体にも有効だからである。 Examples of the polyfunctional isocyanate curing agent include an aromatic polyisocyanate curing agent, an aliphatic polyisocyanate curing agent, and an alicyclic polyisocyanate curing agent. In addition, an aliphatic polyisocyanate curing agent, particularly a xamethylene diisocyanate curing agent among them is preferable. The reason why this isocyanate curing agent is good is that it can impart flexibility to the pressure-sensitive adhesive and is also effective for an adherend having irregularities.
 芳香族ポリイソシアネートは特に限定されず、例えば1,3-フェニレンジイソシアネート、4,4’-ジフェニルジイソシアネート、1,4-フェニレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、4,4’-トルイジンジイソシアネート、2,4,6-トリイソシアネートトルエン、1,3,5-トリイソシアネートベンゼン、ジアニシジンジイソシアネート、4,4’-ジフェニルエーテルジイソシアネート、4,4’,4”-トリフェニルメタントリイソシアネート、ω,ω’-ジイソシアネート-1,3-ジメチルベンゼン、ω,ω’-ジイソシアネート-1,4-ジメチルベンゼン、ω,ω’-ジイソシアネート-1,4-ジエチルベンゼン、1,4-テトラメチルキシリレンジイソシアネート、及び1,3-テトラメチルキシリレンジイソシアネート等が挙げられる。 The aromatic polyisocyanate is not particularly limited, and for example, 1,3-phenylene diisocyanate, 4,4′-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4′-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2, , 6-tolylene diisocyanate, 4,4′-toluidine diisocyanate, 2,4,6-triisocyanate toluene, 1,3,5-triisocyanate benzene, dianisidine diisocyanate, 4,4′-diphenyl ether diisocyanate, 4,4 ', 4 "-triphenylmethane triisocyanate, ω, ω'-diisocyanate-1,3-dimethylbenzene, ω, ω'-diisocyanate-1,4-dimethylbenzene, ω, ω'-diisocyanate-1,4- Diechi Benzene, 1,4-tetramethylxylylene diisocyanate, and 1,3-tetramethylxylylene diisocyanate and the like.
 脂肪族ポリイソシアネートは特に限定されず、例えばトリメチレンジイソシアネート、テトラメチレンジイソシアネート、ヘキサメチレンジイソシアネート、ペンタメチレンジイソシアネート、1,2-プロピレンジイソシアネート、2,3-ブチレンジイソシアネート、1,3-ブチレンジイソシアネート、ドデカメチレンジイソシアネート、及び2,4,4-トリメチルヘキサメチレンジイソシアネート等が挙げられる。 The aliphatic polyisocyanate is not particularly limited. For example, trimethylene diisocyanate, tetramethylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, 1,2-propylene diisocyanate, 2,3-butylene diisocyanate, 1,3-butylene diisocyanate, dodecamethylene Examples thereof include diisocyanate and 2,4,4-trimethylhexamethylene diisocyanate.
 脂環族ポリイソシアネートは特に限定されず、例えば3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート、1,3-シクロペンタンジイソシアネート、1,3-シクロヘキサンジイソシアネート、1,4-シクロヘキサンジイソシアネート、メチル-2,4-シクロヘキサンジイソシアネート、メチル-2,6-シクロヘキサンジイソシアネート、4,4’-メチレンビス(シクロヘキシルイソシアネート)、1,4-ビス(イソシアネートメチル)シクロヘキサン、及び1,4-ビス(イソシアネートメチル)シクロヘキサンがある。 The alicyclic polyisocyanate is not particularly limited. For example, 3-isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate, 1,3-cyclopentane diisocyanate, 1,3-cyclohexane diisocyanate, 1,4-cyclohexane diisocyanate, methyl -2,4-cyclohexane diisocyanate, methyl-2,6-cyclohexane diisocyanate, 4,4'-methylenebis (cyclohexyl isocyanate), 1,4-bis (isocyanatomethyl) cyclohexane, and 1,4-bis (isocyanatomethyl) cyclohexane There is.
 ポリイソシアネートのうち、1,3-フェニレンジイソシアネート、4,4’-ジフェニルジイソシアネート、1,4-フェニレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、4,4’-トルイジンジイソシアネート、ヘキサメチレンジイソシアネートが好適に用いられる。 Among polyisocyanates, 1,3-phenylene diisocyanate, 4,4'-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate 4,4′-toluidine diisocyanate and hexamethylene diisocyanate are preferably used.
 多官能エポキシ硬化剤は、主にエポキシ基を2個以上、第3級窒素原子を1個以上有する化合物をいい、N・N-グリシジルアニリン、N・N-グリシジルトルイジン、m-N・N-グリシジルアミノフェニルグリシジルエーテル、p-N・N-グリシジルアミノフェニルグリシジルエーテル、トリグリシジルイソシアヌレート、N・N・N’・N’-テトラグリシジルジアミノジフェニルメタン、N・N・N’・N’-テトラグリシジル-m-キシリレンジアミン、N・N・N’・N’・N’’-ペンタグリシジルジエチレントリアミンなどが挙げられる。 The polyfunctional epoxy curing agent mainly means a compound having two or more epoxy groups and one or more tertiary nitrogen atoms. N · N-glycidylaniline, N · N-glycidyltoluidine, mN · N— Glycidylaminophenyl glycidyl ether, pN · N-glycidylaminophenyl glycidyl ether, triglycidyl isocyanurate, N · N · N '· N'-tetraglycidyldiaminodiphenylmethane, N · N · N' · N'-tetraglycidyl -M-xylylenediamine, N · N · N ′ · N ′ · N ″ -pentaglycidyldiethylenetriamine and the like.
 粘着剤はアクリル重合体及び硬化剤を主体とする感圧型粘着剤とすることも可能であるがアクリル重合体及び硬化剤の他に光重合性化合物、光重合開始剤、粘着付与樹脂、添加物等を用いた光硬化型粘着剤として使用可能である。 The pressure-sensitive adhesive can be a pressure-sensitive pressure-sensitive adhesive mainly composed of an acrylic polymer and a curing agent, but in addition to the acrylic polymer and the curing agent, a photopolymerizable compound, a photopolymerization initiator, a tackifying resin, and an additive It can be used as a photo-curing pressure-sensitive adhesive using etc.
(光重合性化合物)
 光重合性化合物としては、例えば、トリメチロールプロパントリアクリレート、テトラメチロールメタンテトラアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレート、ジペンタエリスリトールヘキサアクリレート、1,4-ブチレングリコールジアクリレート、1,6-ヘキサンジオールジアクリレート、ポリエチレングリコールジアクリレート、シアヌル酸トリエチルアクリレート、市販のオリゴエステルアクリレートなどが用いられる。
(Photopolymerizable compound)
Examples of the photopolymerizable compound include trimethylolpropane triacrylate, tetramethylolmethane tetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butylene. Glycol diacrylate, 1,6-hexanediol diacrylate, polyethylene glycol diacrylate, cyanuric acid triethyl acrylate, commercially available oligoester acrylate, and the like are used.
 光重合性化合物として、上記アクリレート系化合物の他に、ウレタンアクリレートオリゴマーを用いることもできる。ウレタンアクリレートオリゴマーは、ポリエステル型又はポリエーテル型などのポリオール化合物と多価イソシアネート化合物とを反応させて得られる末端イソシアネートウレタンプレポリマに、ヒドロキシ基を有する(メタ)アクリレートを反応させて得られる。 As the photopolymerizable compound, a urethane acrylate oligomer can be used in addition to the acrylate compound. The urethane acrylate oligomer is obtained by reacting a (meth) acrylate having a hydroxy group with a terminal isocyanate urethane prepolymer obtained by reacting a polyol compound such as a polyester type or a polyether type with a polyvalent isocyanate compound.
 多価イソシアネート化合物には、例えば、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、1,3-キシレンジイソシアネート、1,4-キシレンジイソシアネート、ジフェニルメタン4,4-ジイソシアネート、トリメチルヘキサメチレンジイソシアネート、ヘキサメチレンジイソシアネート、イソホロンジイソシアネートなどが用いらえる。また、ヒドロキシ基を有する(メタ)アクリレートには、例えば、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、ポリエチレングリコール(メタ)アクリレート、ペンタエリスリトールトリアクリレート、グリシドールジ(メタ)アクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレートなどが用いられる。 Examples of the polyvalent isocyanate compound include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylene diisocyanate, 1,4-xylene diisocyanate, diphenylmethane 4,4-diisocyanate, trimethylhexamethylene diisocyanate. , Hexamethylene diisocyanate, isophorone diisocyanate and the like can be used. Examples of the (meth) acrylate having a hydroxy group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, polyethylene glycol (meth) acrylate, pentaerythritol triacrylate, and glycidol di (meth). Acrylate, dipentaerythritol monohydroxypentaacrylate, etc. are used.
 光重合性化合物としては、ビニル基を4個以上有するウレタンアクリレートオリゴマーが、紫外線等の照射後の粘着剤の硬化が良好である点で好ましい。 As the photopolymerizable compound, a urethane acrylate oligomer having 4 or more vinyl groups is preferable because the adhesive is cured well after irradiation with ultraviolet rays or the like.
 光重合性化合物の重量平均分子量は500以上であることが好ましく、1000以上がより好ましい。光重合性化合物の重量平均分子量が小さいと、ダイシング時の洗浄水に含まれるTOC濃度が上昇しやすくなり、電子部品の絶縁不良などの原因となる。 The weight average molecular weight of the photopolymerizable compound is preferably 500 or more, and more preferably 1000 or more. If the weight average molecular weight of the photopolymerizable compound is small, the TOC concentration contained in the washing water at the time of dicing tends to increase, which may cause insulation failure of electronic components.
 光重合性化合物の配合量は、(メタ)アクリル酸エステル共重合体100質量部に対して5質量部以上200質量部以下とすることが好ましく、20質量部以上120質量部以下がより好ましい。光重合性化合物の配合量を少なくすると、放射線照射後の粘着シートの剥離性が低下し、半導体チップのピックアップ不良を生じやすくなる。一方、光重合性化合物の配合量を多くすると、ダイシング時の糊の掻き上げによりピックアップ不良が生じ易くなるとともに反応残渣による微小な糊残りの発生し、汚染の原因となる。 The blending amount of the photopolymerizable compound is preferably 5 parts by mass or more and 200 parts by mass or less, and more preferably 20 parts by mass or more and 120 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. If the blending amount of the photopolymerizable compound is reduced, the peelability of the pressure-sensitive adhesive sheet after irradiation is reduced, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, when the blending amount of the photopolymerizable compound is increased, pick-up failure is liable to occur due to the glue being picked up during dicing, and a minute glue residue is generated due to a reaction residue, which causes contamination.
(光重合開始剤)
 光重合開始剤には、ベンゾイン、ベンゾインアルキルエーテル類、アセトフェノン類、アントラキノン類、チオキサントン類、ケタール類、ベンゾフェノン類またはキサントン類などが用いられる。
(Photopolymerization initiator)
As the photopolymerization initiator, benzoin, benzoin alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones or xanthones are used.
 ベンゾインとしては、例えばベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテルなどがある。
 アセトフェノン類としては、例えばベンゾインアルキルエーテル類、アセトフェノン、2,2-ジメトキシ-2-アセトフェノン、2,2―ジエトキシ-2-アセトフェノン、1,1-ジクロロアセトフェノンなどがある。
 アントラキノン類としては、2-メチルアントラキノン、2-エチルアントラキノン、2-ターシャリブチルアントラキノン、1-クロロアントラキノンなどがある。
 チオキサントン類としては、例えば2,4-ジメチルチオキサントン、2,4-ジイソプロピルチオキサントン、2-クロロチオキサントン、2,4-ジイソプロピルチオキサントンなどがある。
 ケタール類としては、例えばアセトフェノンジメチルケータル、ベンジルジメチルメタール、ベンジルジフエニルサルフアイド、テトラメチルチウラムモノサルフアイド、アゾビスイソブチロニトリル、ジベンジル、ジアセチル、β-クロールアンスラキノンなどがある。
 このうち、被着体への汚染を防止するため、イソシアネート硬化剤と反応し得る水酸基を有する2-ヒドロキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]-フェニル}-2-メチル-プロパン-1-オン(BASFジャパン社製、製品名IRGACURE127)などが好ましい。
Examples of benzoin include benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether.
Examples of acetophenones include benzoin alkyl ethers, acetophenone, 2,2-dimethoxy-2-acetophenone, 2,2-diethoxy-2-acetophenone, 1,1-dichloroacetophenone, and the like.
Anthraquinones include 2-methylanthraquinone, 2-ethylanthraquinone, 2-tertiarybutylanthraquinone, 1-chloroanthraquinone and the like.
Examples of thioxanthones include 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and 2,4-diisopropylthioxanthone.
Examples of ketals include acetophenone dimethyl ketal, benzyldimethylmethal, benzyldiphenylsulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, β-chloranthraquinone, and the like.
Of these, 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] having a hydroxyl group capable of reacting with an isocyanate curing agent in order to prevent contamination of the adherend -Phenyl} -2-methyl-propan-1-one (manufactured by BASF Japan, product name IRGACURE127) is preferred.
 光重合開始剤の配合量は、(メタ)アクリル酸エステル重合体100質量部に対して0.1質量部以上20質量部以下が好ましい。配合量が少な過ぎると、放射線照射後の粘着シートの剥離性が低下し、半導体チップのピックアップ不良を生じやすくなる。一方、配合量が多過ぎると、光重合開始剤が粘着剤表面へブリードアウトし、汚染の原因となる。 The blending amount of the photopolymerization initiator is preferably 0.1 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester polymer. If the blending amount is too small, the peelability of the pressure-sensitive adhesive sheet after irradiation is lowered, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, if the amount is too large, the photopolymerization initiator bleeds out to the pressure-sensitive adhesive surface, causing contamination.
 光重合開始剤には、必要に応じて従来公知の光重合促進剤を1種または2種以上を組合せて併用してもよい。光重合促進剤には、安息香酸系や第三級アミンなどを用いることができる。第三級アミンとしては、トリエチルアミン、テトラエチルペンタアミン、ジメチルアミノエーテルなどが挙げられる。 The photopolymerization initiator may be used in combination with one or more conventionally known photopolymerization accelerators, if necessary. A benzoic acid type | system | group, a tertiary amine, etc. can be used for a photoinitiator. Examples of the tertiary amine include triethylamine, tetraethylpentamine, dimethylamino ether and the like.
(粘着付与樹脂)
 粘着付与樹脂としては、テルペンフェノール樹脂を完全又は部分水添されたテルペンフェノール樹脂である。
(Tackifying resin)
The tackifier resin is a terpene phenol resin that is completely or partially hydrogenated with a terpene phenol resin.
 テルペンフェノール樹脂は、例えば、テルペン化合物1モルとフェノール類0.1~50を反応させて製造することが出来る。 The terpene phenol resin can be produced, for example, by reacting 1 mol of a terpene compound with 0.1 to 50 phenols.
 テルペン化合物としては、ミルセン、アロオシメン、オシメン、α-ピネン、β-ピネン、ジペンテン、リモネン、α-フェランドレン、α-テルピネン、γ-テルピネン、テルピノレン、1,8-シネオール、1,4-シネオール、α-テルピネオール、β-テルピネオール、γ-テルピネオール、カンフェン、トリシクレン、サビネン、パラメンタジエン類、カレン類等が挙げられる。これらの化合物の中で、α-ピネン、β-ピネン、リモネン、ミルセン、アロオシメン、α-テルピネンが本発明では特に好ましく用いられる。 Examples of terpene compounds include myrcene, alloocimene, osmene, α-pinene, β-pinene, dipentene, limonene, α-ferrandrene, α-terpinene, γ-terpinene, terpinolene, 1,8-cineole, 1,4-cineole, Examples include α-terpineol, β-terpineol, γ-terpineol, camphene, tricyclene, sabinene, paramentadienes, and carenes. Among these compounds, α-pinene, β-pinene, limonene, myrcene, alloocimene and α-terpinene are particularly preferably used in the present invention.
 フェノール類としては、フェノール、クレゾール、キシレノール、カテコール、レゾルシン、ヒドロキノン、ビスフェノールA等が挙げられるが、これらに限定はされない。 Examples of the phenols include, but are not limited to, phenol, cresol, xylenol, catechol, resorcin, hydroquinone, bisphenol A, and the like.
 テルペンフェノール樹脂のフェノール類の比率は、25~50モル%程度であるが、これらに限定はされない。 The ratio of phenols in the terpene phenol resin is about 25 to 50 mol%, but is not limited thereto.
 完全又は部分水添されたテルペンフェノール樹脂の水酸基価は、50~250が好ましい。水酸基価が50未満の場合は、イソシアネート系硬化剤との反応が十分ではなく、粘着剤表面へブリードアウトし、汚染の原因となり、250より多いと粘度が上昇し、(メタ)アクリル酸エステル共重合体等との混合ムラが生じ、ピックアップ特性が安定しないためである。 The hydroxyl value of the fully or partially hydrogenated terpene phenol resin is preferably 50 to 250. When the hydroxyl value is less than 50, the reaction with the isocyanate curing agent is not sufficient, bleeds out to the surface of the pressure-sensitive adhesive, causing contamination, and when it exceeds 250, the viscosity increases and the (meth) acrylic acid ester This is because uneven mixing with a polymer or the like occurs and the pickup characteristics are not stable.
 水添する方法としては、特に限定されるものではなく、例えば、パラジウム、ルテニウム、ロジウムなどの貴金属またはそれらを活性炭素、活性アルミナ、珪藻土などの坦体上に担持したものを触媒として使用して行う方法が挙げられ、水添率は、臭素価測定、ヨウ素価測定等により測定することができる。 The hydrogenation method is not particularly limited, and for example, a noble metal such as palladium, ruthenium, rhodium or the like supported on a carrier such as activated carbon, activated alumina, or diatomaceous earth is used as a catalyst. The hydrogenation rate can be measured by bromine number measurement, iodine number measurement or the like.
 完全又は部分水添されたテルペンフェノール樹脂の水添率は、30モル%以上であることが好ましく、より好ましくは70モル%以上である。30モル%未満の場合、活性光線の照射による光重合性化合物の反応阻害により粘着力が十分低下せず、ピックアップ性が低下するためである。 The hydrogenation rate of the completely or partially hydrogenated terpene phenol resin is preferably 30 mol% or more, more preferably 70 mol% or more. When the amount is less than 30 mol%, the adhesive force is not sufficiently lowered due to the reaction inhibition of the photopolymerizable compound by irradiation with actinic rays, and the pickup property is lowered.
 完全又は部分水添されたテルペンフェノール樹脂の配合比は、(メタ)アクリル酸エステル共重合体100質量部に対して0.5質量部以上100質量部以下が好ましく、1.0質量部以上50質量部以下がより好ましい。完全又は部分水添されたテルペンフェノール樹脂が0.5質量部以上であれば、粘着力が低すぎないので、ダイシング時に半導体チップの保持性が維持され、100質量部以下であれば、ピックアップ不良の発生を抑制することができる。 The blending ratio of the fully or partially hydrogenated terpene phenol resin is preferably 0.5 parts by mass or more and 100 parts by mass or less, and 1.0 part by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. Less than the mass part is more preferable. If the completely or partially hydrogenated terpene phenol resin is 0.5 parts by mass or more, the adhesive strength is not too low, so the retention of the semiconductor chip is maintained during dicing, and if it is 100 parts by mass or less, the pickup is poor. Can be suppressed.
(添加剤等)
 粘着剤には、例えば、軟化剤、老化防止剤、充填剤、導電剤、紫外線吸収剤、及び光安定剤等の各種添加剤を添加してもよい。
(Additives, etc.)
Various additives such as a softening agent, an anti-aging agent, a filler, a conductive agent, an ultraviolet absorber, and a light stabilizer may be added to the adhesive.
 粘着剤層の厚みは、1μm以上50μmが好ましく、5μm以上35μm以下が特に好ましい。粘着剤層が厚過ぎると粘着力が高くなり過ぎ、ピックアップ性が低下する。また、粘着剤層が薄過ぎると粘着力が低くなり過ぎ、ダイシング時のチップ保持性が低下し、リングフレームとシートとの間で剥離が生じる場合がある。 The thickness of the pressure-sensitive adhesive layer is preferably 1 μm to 50 μm, particularly preferably 5 μm to 35 μm. If the pressure-sensitive adhesive layer is too thick, the pressure-sensitive adhesive strength becomes too high and the pick-up property is lowered. On the other hand, if the pressure-sensitive adhesive layer is too thin, the pressure-sensitive adhesive force becomes too low, chip retention during dicing is lowered, and peeling may occur between the ring frame and the sheet.
<基材>
 基材の材料としては、例えば、ポリ塩化ビニル、ポリエチレンテレフタレート、エチレン-酢酸ビニル共重合体、エチレン-アクリル酸-アクリル酸エステルフィルム、エチレン-エチルアクリレート共重合体、ポリエチレン、ポリプロピレン、プロピレン系共重合体、エチレン-アクリル酸共重合体、および、エチレン-(メタ)アクリル酸共重合体やエチレン-(メタ)アクリル酸-(メタ)アクリル酸エステル共重合体等を金属イオンで架橋したアイオノマ樹脂などが挙げられる。基材は、これら樹脂の混合物又は共重合体であってよく、これら樹脂からなるフィルムやシートの積層体であってもよい。
<Base material>
Examples of the base material include polyvinyl chloride, polyethylene terephthalate, ethylene-vinyl acetate copolymer, ethylene-acrylic acid-acrylate film, ethylene-ethyl acrylate copolymer, polyethylene, polypropylene, propylene-based copolymer Polymers, ethylene-acrylic acid copolymers, and ionomer resins obtained by crosslinking ethylene- (meth) acrylic acid copolymers, ethylene- (meth) acrylic acid- (meth) acrylic acid ester copolymers, etc. with metal ions Is mentioned. The base material may be a mixture or copolymer of these resins, and may be a laminate of films and sheets made of these resins.
 基材フィルムの素材はアイオノマ樹脂を用いることが好ましい。アイオノマ樹脂の中でも、エチレン単位、メタアクリル酸単位、及び(メタ)アクリル酸アルキルエステル単位を有する共重合体をNa、K、Zn2+等の金属イオンで架橋したアイオノマ樹脂を用いると、切削屑抑制効果が顕著であり、好適に用いられる。 It is preferable to use an ionomer resin as a material for the base film. Among ionomer resins, if an ionomer resin obtained by crosslinking a copolymer having an ethylene unit, a methacrylic acid unit, and a (meth) acrylic acid alkyl ester unit with a metal ion such as Na + , K + , or Zn 2+ is used, cutting is performed. The dust suppressing effect is remarkable and is preferably used.
 基材は、上記材料からなる単層あるいは多層のフィルムあるいはシートであってよく、異なる材料からなるフィルム等を積層したものであってもよい。基材の厚さは50~200μm、好ましくは70~150μmである。 The base material may be a single layer or a multilayer film or sheet made of the above material, or may be a laminate of films made of different materials. The thickness of the substrate is 50 to 200 μm, preferably 70 to 150 μm.
 基材には、帯電防止処理を施すことが好ましい。帯電防止処理としては、基材に帯電防止剤を配合する処理、基材表面に帯電防止剤を塗布する処理、コロナ放電による処理がある。 It is preferable to apply an antistatic treatment to the substrate. Examples of the antistatic treatment include a treatment for adding an antistatic agent to the substrate, a treatment for applying the antistatic agent to the substrate surface, and a treatment by corona discharge.
 帯電防止剤としては、例えば四級アミン塩単量体などを用いることができる。四級アミン塩単量体としては、例えばジメチルアミノエチル(メタ)アクリレート四級塩化物、ジエチルアミノエチル(メタ)アクリレート四級塩化物、メチルエチルアミノエチル(メタ)アクリレート四級塩化物、p-ジメチルアミノスチレン四級塩化物、およびp-ジエチルアミノスチレン四級塩化物が挙げられる。このうち、ジメチルアミノエチルメタクリレート四級塩化物が好ましい。 As the antistatic agent, for example, a quaternary amine salt monomer can be used. Examples of the quaternary amine salt monomer include dimethylaminoethyl (meth) acrylate quaternary chloride, diethylaminoethyl (meth) acrylate quaternary chloride, methylethylaminoethyl (meth) acrylate quaternary chloride, p-dimethyl. Examples include aminostyrene quaternary chloride and p-diethylaminostyrene quaternary chloride. Of these, dimethylaminoethyl methacrylate quaternary chloride is preferred.
 滑り剤及び帯電防止剤の使用方法は特に限定されないが、例えば基材フィルムの片面に粘着剤を塗布し、その裏面に滑り剤及び/又は帯電防止剤を塗布してもよく、滑り剤及び/又は帯電防止剤を基材フィルムの樹脂に練り込んでシート化しても良い。 The method of using the slip agent and the antistatic agent is not particularly limited. For example, the adhesive may be applied to one side of the base film, and the slip agent and / or the antistatic agent may be applied to the back side thereof. Alternatively, an antistatic agent may be kneaded into the resin of the base film to form a sheet.
 基材の片面に粘着剤を積層し、他方の面は平均表面粗さ(Ra)が0.3~1.5μmのエンボス面とすることが可能である。エキスパンド装置の機械テーブル側にエンボス面を設置することにより、ダイシング後のエキスパンド工程で基材フィルムを容易に拡張することができる。 It is possible to laminate an adhesive on one side of the substrate and make the other side an embossed surface with an average surface roughness (Ra) of 0.3 to 1.5 μm. By installing the embossed surface on the machine table side of the expanding device, the base film can be easily expanded in the expanding process after dicing.
(滑り剤)
 ダイシング後のエキスパンド性を向上させるために、基材の粘着剤非接触面に滑り剤を施したり、基材に滑り剤を練り込むことができる。
(Slip agent)
In order to improve the expandability after dicing, a slip agent can be applied to the non-adhesive surface of the base material, or the slip agent can be kneaded into the base material.
 滑り剤は、粘着シートとエキスパンド装置の摩擦係数を低下させる物質であれば特に限定されず、例えばシリコーン樹脂や(変性)シリコーン油等のシリコーン化合物、フッ素樹脂、六方晶ボロンナイトライド、カーボンブラック、及び二硫化モリブデン等が挙げられる。これらの摩擦低減剤は複数の成分を混合してもよい。電子部品の製造はクリーンルームで行われるため、シリコーン化合物又はフッ素樹脂を用いることが好ましい。シリコーン化合物の中でも特にシリコーンマクロモノマ単位を有する共重合体は帯電防止層との相溶性が良く、帯電防止性とエキスパンド性のバランスが図れるため、好適に用いられる。 The slip agent is not particularly limited as long as it is a substance that reduces the friction coefficient of the pressure-sensitive adhesive sheet and the expanding device. For example, silicone compounds such as silicone resins and (modified) silicone oils, fluororesins, hexagonal boron nitride, carbon black, And molybdenum disulfide. These friction reducing agents may mix a plurality of components. Since manufacture of an electronic component is performed in a clean room, it is preferable to use a silicone compound or a fluororesin. Among silicone compounds, a copolymer having a silicone macromonomer unit is particularly preferred because it has good compatibility with the antistatic layer and can achieve a balance between antistatic properties and expandability.
<電気部品の製造工程>
 本発明に係る電子部品の製造方法の具体的な工程を順に説明する。
<Manufacturing process of electrical parts>
Specific steps of the electronic component manufacturing method according to the present invention will be described in order.
 (1)貼付工程
 まず、貼付工程において、粘着シートを半導体ウエハ(又は基板)とリングフレームに貼り付ける。ウエハは、シリコンウエハおよびガリウムナイトライドウエハ、炭化ケイ素ウエハ、サファイアウエハなどの従来汎用のウエハであってよい。基板は樹脂でチップを封止したパッケージ基板、LEDパッケージ基板などの汎用の基板であってよい。
(1) Affixing process First, in an affixing process, an adhesive sheet is affixed on a semiconductor wafer (or substrate) and a ring frame. The wafer may be a conventional general-purpose wafer such as a silicon wafer and a gallium nitride wafer, a silicon carbide wafer, or a sapphire wafer. The substrate may be a general-purpose substrate such as a package substrate in which a chip is sealed with a resin or an LED package substrate.
(2)ダイシング工程
 ダイシング工程では、シリコンウエハ等をダイシングして半導体チップ又は半導体部品にする。
(2) Dicing process In the dicing process, a silicon wafer or the like is diced into semiconductor chips or semiconductor components.
(3)光照射工程
 光照射工程では、基材側から光硬化型粘着剤層に紫外線等の活性光線を照射する。紫外線の光源としては、低圧水銀灯、高圧水銀灯、超高圧水銀灯、メタルハライドランプを用いることができる。また、紫外線に替えて電子線を用いてもよく、電子線の光源としてはα線、β線、γ線を用いることができる。
(3) Light irradiation process In a light irradiation process, actinic rays, such as an ultraviolet-ray, are irradiated to a photocurable adhesive layer from the base material side. As the ultraviolet light source, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or a metal halide lamp can be used. In addition, an electron beam may be used instead of ultraviolet rays, and α-rays, β-rays, and γ-rays can be used as a light source for the electron beams.
 光照射により粘着剤層は三次元網状化して硬化し、粘着剤層の粘着力が低下する。この際、上述したように、本発明に係る粘着シートは加温してもウエハ等に過度に密着することがないため、紫外線等の照射により十分な接着力の低下が得られる。 The light-sensitive adhesive layer is three-dimensionally reticulated and cured by light irradiation, and the adhesive strength of the pressure-sensitive adhesive layer is reduced. At this time, as described above, since the pressure-sensitive adhesive sheet according to the present invention does not excessively adhere to a wafer or the like even when heated, a sufficient decrease in adhesive force can be obtained by irradiation with ultraviolet rays or the like.
(4)エキスパンド・ピックアップ工程
 エキスパンド・ピックアップ工程では、半導体チップ又は半導体部品同士の間隔を広げるため粘着シートを引き伸ばし、チップ又は部品をニードルピン等で突き上げる。その後、チップ又は部品を真空コレットまたはエアピンセット等で吸着し、粘着シートの粘着剤層から剥離してピックアップする。この際、本発明に係る粘着シートでは紫外線等の照射により十分な接着力の低下が得られているため、チップ又は部品と粘着剤層との間の剥離が容易となり、良好なピックアップ性が得られ、糊残りなどの不良が生じることもない。
(4) Expanding and Picking Up Step In the expanding and picking up step, the adhesive sheet is stretched to widen the gap between the semiconductor chips or semiconductor components, and the chip or components are pushed up with a needle pin or the like. Thereafter, the chip or component is adsorbed by a vacuum collet or air tweezers, peeled off from the adhesive layer of the adhesive sheet and picked up. At this time, in the pressure-sensitive adhesive sheet according to the present invention, a sufficient decrease in the adhesive strength is obtained by irradiation with ultraviolet rays or the like, so that peeling between the chip or component and the pressure-sensitive adhesive layer becomes easy, and good pick-up properties are obtained. And no defects such as glue residue occur.
<粘着シートの製造>
 基材上に粘着剤層を形成して粘着シートとする方法としては、例えばグラビアコーター、コンマコーター、バーコーター、ナイフコーター又はロールコーターといったコーターで基材上に粘着剤を直接塗布する方法や、剥離フィルムに粘着剤を塗布/乾燥後に基材フィルムに貼り合わせる方法がある。凸板印刷、凹板印刷、平板印刷、フレキソ印刷、オフセット印刷、又はスクリーン印刷等で基材上に粘着剤を印刷してよい。
<Manufacture of adhesive sheet>
As a method of forming a pressure-sensitive adhesive layer on a substrate to form a pressure-sensitive adhesive sheet, for example, a method of directly applying a pressure-sensitive adhesive on a substrate with a coater such as a gravure coater, comma coater, bar coater, knife coater or roll coater, There is a method in which a pressure-sensitive adhesive is applied to a release film and dried and bonded to a base film. The adhesive may be printed on the substrate by convex printing, concave printing, flat printing, flexographic printing, offset printing, screen printing, or the like.
 本発明の粘着シートは、電子部品の製造工程である、ダイシング工程、バックグラインド工程において、ワークと呼ばれる電子部品集合体の貼着用に好適に用いられる。 The pressure-sensitive adhesive sheet of the present invention is suitably used for attaching an electronic component assembly called a workpiece in a dicing process and a back grinding process, which are electronic component manufacturing processes.
 実施例・比較例に係る粘着剤組成物及び粘着シートを次の処方で製造した。主な配合と、各実験例の結果を表1~表2に示す。 The pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet according to Examples and Comparative Examples were produced with the following prescription. Tables 1 and 2 show the main formulations and the results of each experimental example.
 硬化型粘着剤をポリエチレンテレフタレート製のセパレーターフィルム上に塗布し、乾燥後の粘着層の厚みが20μmとなるように塗工した。この粘着層を基材フィルムに積層し、40℃で7日間熟成し、粘着シートを得た。基材フィルムには、アイオノマ樹脂であるエチレン-メタアクリル酸-メタアクリル酸アルキルエステル共重合体のZn塩を主体、MFR値1.0g/10分(JIS K7210、210℃)、融点86℃、Zn2+イオンを含有(三井・デュポンポリケミカル社製、品番:HM1855)をTダイ押出しにより100μmに成膜したもの用いた。 The curable pressure-sensitive adhesive was coated on a polyethylene terephthalate separator film, and coated so that the thickness of the pressure-sensitive adhesive layer after drying was 20 μm. This pressure-sensitive adhesive layer was laminated on a base film and aged at 40 ° C. for 7 days to obtain a pressure-sensitive adhesive sheet. The base film is mainly composed of Zn salt of ethylene-methacrylic acid-methacrylic acid alkyl ester copolymer, which is an ionomer resin, MFR value 1.0 g / 10 min (JIS K7210, 210 ° C.), melting point 86 ° C., A Zn 2+ ion-containing (Mitsui / DuPont Polychemical Co., Ltd., product number: HM1855) film formed to 100 μm by T-die extrusion was used.
[光硬化型粘着剤]
〔(メタ)アクリル酸エステル共重合体〕
 A-1:日本ゼオン社製アクリルゴムAR53L;エチルアクリレート54%、ブチルアクリレート19%、メトキシエチルアクリレート24%の共重合体、乳化重合により得られる。
 A-2:綜研化学社製SKダイン1496;2-エチルヘキシルアクリレート96%、2-ヒドロキシエチルアクリレート4%の共重合体、溶液重合により得られる。
〔光重合性化合物〕
 ペンタエリスリトールのOH末端にヘキサメチレンジイソシアネートを反応させてなる末端イソシアネート化合物に、更に2-ヒドロキシエチルアクリレートを反応させてなり、ビニル基数が1分子あたり4個のウレタンアクリレート(合成品)。なお数平均分子量はゲルパーミエーションクロマトグラフィー法(GPC)によりポリスチレン換算の数平均分子量として測定した値である。
 B-1:重量平均分子量 300
 B-2:重量平均分子量 500
 B-3:重量平均分子量 1,300
 B-4:重量平均分子量 4,100
 B-5:重量平均分子量 120,000
 B-6:重量平均分子量 230,000
〔多官能イソシアネート硬化剤〕
 C-1:日本ポリウレタン社製コロネートL-45E;2,4-トリレンジイソシアネートのトリメチロールプロパンアダクト体。
 C-2:日本ポリウレタン社製コロネートHL;ヘキサメチレンジイソシアネートのトリメチロールプロパンアダクト体。
〔光重合開始剤〕
 D-1:BASFジャパン社製IRGACURE127;2-ヒドロキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]-フェニル}-2-メチル-プロパン-1-オン。
 D-2:BASFジャパン社製IRGACURE651;ベンジルジメチルケタール。
[Photo-curing adhesive]
[(Meth) acrylic acid ester copolymer]
A-1: Acrylic rubber AR53L manufactured by Nippon Zeon Co., Ltd .; a copolymer of 54% ethyl acrylate, 19% butyl acrylate and 24% methoxyethyl acrylate, obtained by emulsion polymerization.
A-2: SK dyne 1496 manufactured by Soken Chemical Co .; a copolymer of 96% 2-ethylhexyl acrylate and 4% 2-hydroxyethyl acrylate, obtained by solution polymerization.
[Photopolymerizable compound]
Urethane acrylate having 4 vinyl groups per molecule (synthetic product) obtained by further reacting 2-hydroxyethyl acrylate with a terminal isocyanate compound obtained by reacting hexamethylene diisocyanate with the OH terminal of pentaerythritol. The number average molecular weight is a value measured as a number average molecular weight in terms of polystyrene by gel permeation chromatography (GPC).
B-1: Weight average molecular weight 300
B-2: Weight average molecular weight 500
B-3: Weight average molecular weight 1,300
B-4: Weight average molecular weight 4,100
B-5: Weight average molecular weight 120,000
B-6: Weight average molecular weight 230,000
[Multifunctional isocyanate curing agent]
C-1: Coronate L-45E manufactured by Nippon Polyurethane; Trimethylolpropane adduct of 2,4-tolylene diisocyanate.
C-2: Coronate HL manufactured by Nippon Polyurethane Co .; trimethylolpropane adduct of hexamethylene diisocyanate.
(Photopolymerization initiator)
D-1: IRGACURE127 manufactured by BASF Japan; 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] -phenyl} -2-methyl-propan-1-one.
D-2: IRGACURE651 manufactured by BASF Japan Ltd .; benzyldimethyl ketal.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
(1)TOC濃度の測定方法
 得られた粘着シートを以下の手順で調整し、JIS K 0101 20.1「燃焼酸化-赤外線式TOC分析法」に準拠して、全有機炭素計(島津製作所製 ON-LINE TOC-VCHS)によって、試料中のTOC濃度を測定した。
 1. 粘着シートを50mm×50mmに切断する。
 2. TOC濃度が5ppb以下の純水500mLを純水で十分に洗浄したサンプル瓶に加え、セパレーターフィルムを剥離した粘着シートを30秒間純水中で揺らす。
 3. 粘着シートの粘着面を下にして純水に浸す。
 4. 23℃で静置する。
 5. 24時間後粘着シートを取り出す。
 6. 溶液のTOC濃度を3回測定し、平均値を測定値とする。
(1) Measuring method of TOC concentration The obtained pressure-sensitive adhesive sheet was prepared according to the following procedure, and an all organic carbon meter (manufactured by Shimadzu Corporation) in accordance with JIS K 0101 20.1 “combustion oxidation-infrared TOC analysis method” ON-LINE TOC-VCHS), the TOC concentration in the sample was measured.
1. Cut the adhesive sheet to 50 mm x 50 mm.
2. 500 mL of pure water having a TOC concentration of 5 ppb or less is added to a sample bottle sufficiently washed with pure water, and the pressure-sensitive adhesive sheet from which the separator film has been peeled is shaken in pure water for 30 seconds.
3. Immerse it in pure water with the adhesive side of the adhesive sheet facing down.
4). Let stand at 23 ° C.
5. After 24 hours, the adhesive sheet is taken out.
6). The TOC concentration of the solution is measured three times, and the average value is taken as the measured value.
 前記手法で得られたTOC濃度は、以下の基準により評価した。
 ◎(優)  :0~2.0mg/L
 ○(良)  :2.1~5.0mg/L
 ×(不可) :5.0mg/L超
The TOC concentration obtained by the above method was evaluated according to the following criteria.
◎ (excellent): 0-2.0mg / L
○ (good): 2.1 to 5.0 mg / L
X (impossible): More than 5.0 mg / L
(2)チップ保持性及びピックアップ性の評価
 得られた粘着シートをダミーの回路パターンを形成した直径8インチ×厚さ0.1mmのシリコンウエハとリングフレームに貼り合わせた。その後、加温する場合は75℃で30分間、オーブンで加温した。その後、ダイシング、ピックアップの各工程を行った。
(2) Evaluation of chip holding property and pick-up property The obtained adhesive sheet was bonded to a ring frame and a silicon wafer having a diameter of 8 inches and a thickness of 0.1 mm on which a dummy circuit pattern was formed. Then, when heating, it heated in oven at 75 degreeC for 30 minutes. Thereafter, dicing and pick-up processes were performed.
 ダイシング工程の条件は以下の通りとした。
 ダイシング装置:DISCO社製DAD341
 ダイシングブレード:DISCO社製NBC-ZH205O-27HEEE
 ダイシングブレード形状:外径55.56mm、刃幅35μm、内径19.05mm
 ダイシングブレード回転数:40、000rpm
 ダイシングブレード送り速度:50mm/秒
 ダイシングサイズ:1.5mm角
 粘着シートへの切り込み量:15μm
 切削水温度:25℃
 切削水量:1.0リットル/分
The conditions for the dicing process were as follows.
Dicing machine: DAD341 manufactured by DISCO
Dicing blade: NBC-ZH205O-27HEEE made by DISCO
Dicing blade shape: outer diameter 55.56 mm, blade width 35 μm, inner diameter 19.05 mm
Dicing blade rotation speed: 40,000 rpm
Dicing blade feed rate: 50 mm / sec. Dicing size: 1.5 mm square. Cutting depth into adhesive sheet: 15 μm
Cutting water temperature: 25 ° C
Cutting water volume: 1.0 l / min
 ピックアップ工程の条件は以下の通りとした。
 ピックアップ装置:キヤノンマシナリー社製CAP-300II
 エキスパンド量:8mm
 ニードルピン形状:70μmR
 ニードルピン数:1本
 ニードルピン突き上げ高さ:1.5mm
The conditions for the pick-up process were as follows.
Pickup device: CAP-300II manufactured by Canon Machinery
Expanding amount: 8mm
Needle pin shape: 70μmR
Number of needle pins: 1 Needle pin push-up height: 1.5 mm
 ダイシング工程およびピックアップ工程において、以下の評価を行った。 The following evaluation was performed in the dicing process and the pickup process.
(2-1)チップ保持性
 チップ保持性は、ダイシング工程後において、半導体チップが粘着シートに保持されている半導体チップの残存率に基づき、以下の基準により評価した。
 ◎(優)  :チップ飛びが5%未満
 ○(良)  :チップ飛びが5%以上10%未満
 ×(不可) :チップ飛びが10%以上
(2-1) Chip Retention The chip retention was evaluated according to the following criteria based on the remaining ratio of the semiconductor chips held on the adhesive sheet after the dicing process.
◎ (excellent): Chip skipping is less than 5% ○ (good): Chip skipping is 5% or more and less than 10% × (impossible): Chip skipping is 10% or more
(2-2)ピックアップ性
 ピックアップ性は、ピックアップ工程において、半導体チップがピックアップできた率に基づき、以下の基準により評価した。
 ◎(優)  :チップのピックアップ成功率が95%以上
 ○(良)  :チップのピックアップ成功率が80%以上95%未満
 ×(不可) :チップのピックアップ成功率が80%未満
(2-2) Pickup property Pickup property was evaluated according to the following criteria based on the rate at which a semiconductor chip could be picked up in the pickup process.
◎ (Excellent): Chip pickup success rate is 95% or more ○ (Good): Chip pickup success rate is 80% or more and less than 95% × (Not possible): Chip pickup success rate is less than 80%
<<第2実施形態>>
 本実施形態に係る粘着シートは、
 基材に粘着剤層を積層してなる粘着シートであって、
 前記粘着剤層が、
 (メタ)アクリル酸エステル共重合体、光重合性化合物、及び硬化剤を必須成分として含有し、純水に溶出する全有機炭素(TOC:Total Organic Carbon)濃度が3.0mg/L以下であり、
 前記粘着剤層が、
  (メタ)アクリル酸エステル共重合体100質量部と、
  多官能イソシアネート硬化剤0.1~20質量部と、
  光重合開始剤0.1~20質量部と、を含有し、
 前記(メタ)アクリル酸エステル共重合体および前記光重合性化合物がヒドロキシル基を含有する。
<< Second Embodiment >>
The pressure-sensitive adhesive sheet according to this embodiment is
A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate,
The pressure-sensitive adhesive layer is
It contains (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent as essential components, and the total organic carbon (TOC: Total Organic Carbon) concentration eluted in pure water is 3.0 mg / L or less. ,
The pressure-sensitive adhesive layer is
100 parts by weight of a (meth) acrylic acid ester copolymer,
0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent;
Containing 0.1 to 20 parts by mass of a photopolymerization initiator,
The (meth) acrylic acid ester copolymer and the photopolymerizable compound contain a hydroxyl group.
<粘着剤層>
 粘着剤層を構成する粘着剤としては、アクリル酸、メタクリル酸及びそれらのエステルモノマーを重合させたポリマー、これらモノマーと共重合可能な不飽和単量体(例えば、酢酸ビニル、スチレン、アクリロニトリル)とを共重合させたコポリマーがある。本実施形態の粘着シートでは、粘着剤層を構成する粘着剤は、粘着力を設計しやすいアクリル重合体がよく、硬化剤を含有することによって、粘着力をより精密に調整することができる。そして、アクリル重合体を構成するアクリルモノマーの少なくとも一つは、官能基含有単量体を含むものが好ましい。この官能基含有単量体は、アクリル重合体中に0質量%以上10質量%以下配合され重合されていることが好ましい。この官能基含有単量体の配合比が0.01質量%以上であれば、被着体への粘着力が十分強く水周りの発生が抑制される傾向にあり、この官能基含有単量体の配合比が10質量%以下であれば、被着体への粘着力が高くなりすぎないため、糊残りが発生することを抑制できる傾向にある。
<Adhesive layer>
As the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer, polymers obtained by polymerizing acrylic acid, methacrylic acid and ester monomers thereof, unsaturated monomers copolymerizable with these monomers (for example, vinyl acetate, styrene, acrylonitrile) and There is a copolymer obtained by copolymerizing. In the pressure-sensitive adhesive sheet of the present embodiment, the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer is preferably an acrylic polymer that is easy to design the pressure-sensitive adhesive force, and the adhesive force can be adjusted more precisely by containing a curing agent. And it is preferable that at least one of the acrylic monomers constituting the acrylic polymer contains a functional group-containing monomer. This functional group-containing monomer is preferably blended and polymerized in an acrylic polymer in an amount of 0% by mass to 10% by mass. If the blending ratio of the functional group-containing monomer is 0.01% by mass or more, the adhesive strength to the adherend is sufficiently strong and the generation around the water tends to be suppressed. If the blending ratio is 10 mass% or less, the adhesive force to the adherend will not be too high, so that it is possible to suppress the occurrence of adhesive residue.
 このアクリル重合体の主単量体としては、例えば、ブチル(メタ)アクリレート、2-ブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、オクチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ノニル(メタ)アクリレート、デシル(メタ)アクリレート、ラウリル(メタ)アクリレート、メチル(メタ)アクリレート、エチル(メタ)アクリレート、イソプロピル(メタ)アクリレート、トリデシル(メタ)アクリレート、ミリスチル(メタ)アクリレート、セチル(メタ)アクリレート、ステアリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート等の(メタ)アクリル単量体が挙げられる。 Examples of the main monomer of the acrylic polymer include butyl (meth) acrylate, 2-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, octyl (meth) acrylate, 2- Ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, isopropyl (meth) acrylate, tridecyl (meth) acrylate, myristyl ( Examples include (meth) acrylic monomers such as (meth) acrylate, cetyl (meth) acrylate, stearyl (meth) acrylate, cyclohexyl (meth) acrylate, and benzyl (meth) acrylate.
 このアクリル単量体としては、特に、少なくとも一部に官能基を含有する単量体を有するものが好ましい。この官能基を含有する単量体としては、ヒドロキシル基、カルボキシル基、エポキシ基、アミド基、アミノ基、メチロール基、スルホン酸基、スルファミン酸基、(亜)リン酸エステル基を有する単量体が好ましい。そして、これらの中でも、特に、これらの官能基を有するビニル化合物がよく、好ましくはヒドロキシル基を有するビニル化合物がよい。なお、ここでいうビニル化合物には、後述するアクリレートが含まれるものとする。 As the acrylic monomer, those having a monomer containing a functional group at least in part are particularly preferable. As the monomer containing this functional group, a monomer having a hydroxyl group, a carboxyl group, an epoxy group, an amide group, an amino group, a methylol group, a sulfonic acid group, a sulfamic acid group, or a (phosphite) ester group Is preferred. Of these, vinyl compounds having these functional groups are particularly preferable, and vinyl compounds having hydroxyl groups are particularly preferable. In addition, the acrylate mentioned later is included in the vinyl compound here.
 ヒドロキシル基を有する官能基含有単量体としては、例えば2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、及び2-ヒドロキシブチル(メタ)アクリレートがある。 Examples of the functional group-containing monomer having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 2-hydroxybutyl (meth) acrylate.
 カルボキシル基を有する単量体としては、例えば(メタ)アクリル酸、クロトン酸、マレイン酸、無水マレイン酸、イタコン酸、フマール酸、アクリルアミドN-グリコール酸、及びケイ皮酸等が挙げられる。 Examples of the monomer having a carboxyl group include (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N-glycolic acid, and cinnamic acid.
 エポキシ基を有する単量体としては、例えばアリルグリシジルエーテル、及び(メタ)アクリル酸グリシジルエーテル等が挙げられる。 Examples of the monomer having an epoxy group include allyl glycidyl ether and (meth) acrylic acid glycidyl ether.
 アミド基を有する単量体としては、例えば(メタ)アクリルアミド等が挙げられる。 Examples of the monomer having an amide group include (meth) acrylamide.
 アミノ基を有する単量体としては、例えばN,N-ジメチルアミノエチル(メタ)アクリレート等が挙げられる。 Examples of the monomer having an amino group include N, N-dimethylaminoethyl (meth) acrylate.
 メチロール基を有する単量体としては、例えばN-メチロールアクリルアミド等が挙げられる。 Examples of the monomer having a methylol group include N-methylol acrylamide.
 なお、本実施形態の粘着剤層では、上記のアクリル重合体および硬化剤を反応させて粘着剤層を硬化させた後において、そのアクリル重合体を構成するカルボキシル基を含む単量体が、そのアクリル重合体中0.1~10質量%以下であることが好ましい。すなわち、別の表現によれば、粘着剤を硬化剤で反応させた官能基含有単量体のうち、カルボキシル基を含む官能基含有単量体は、10質量%以下が好ましい。カルボキシル基含有の官能基含有単量体を用いることで、金属への粘着力が増加するので、硬化剤と反応させた後のカルボキシル基含有の官能基含有単量体は、10質量%を超えると金属への粘着力が高く糊残りが発生する傾向にあり、10質量%以下であるほうがよい。そのため、カルボキシル基を有する単量体としては、硬化剤との反応によって消滅しやすいものが好ましく、例えば(メタ)アクリル酸、クロトン酸、マレイン酸、無水マレイン酸、イタコン酸、フマール酸、アクリルアミドN-グリコール酸、及びケイ皮酸が好ましく用いられる。 In the pressure-sensitive adhesive layer of this embodiment, after the pressure-sensitive adhesive layer is cured by reacting the acrylic polymer and the curing agent, the monomer containing a carboxyl group constituting the acrylic polymer is It is preferably 0.1 to 10% by mass or less in the acrylic polymer. That is, according to another expression, among functional group-containing monomers obtained by reacting an adhesive with a curing agent, the functional group-containing monomer containing a carboxyl group is preferably 10% by mass or less. By using a carboxyl group-containing functional group-containing monomer, the adhesion to metal increases, so the carboxyl group-containing functional group-containing monomer after reacting with the curing agent exceeds 10% by mass. In addition, the adhesive strength to the metal is high, and the adhesive residue tends to be generated. Therefore, the monomer having a carboxyl group is preferably one that easily disappears by reaction with a curing agent. For example, (meth) acrylic acid, crotonic acid, maleic acid, maleic anhydride, itaconic acid, fumaric acid, acrylamide N Glycolic acid and cinnamic acid are preferably used.
(硬化剤)
 本実施形態の粘着シートでは、粘着剤層に用いる粘着剤には、硬化剤を配合するのが好ましい。硬化剤を配合する場合、アクリル重合体100質量部に対し、硬化剤の配合比は0.1質量部以上20質量部以下であることが好ましい。この硬化剤の配合比が0.1質量部以上15質量部以下であれば、糊残りが発生することを抑制できるからである。
(Curing agent)
In the adhesive sheet of this embodiment, it is preferable to mix | blend a hardening | curing agent with the adhesive used for an adhesive layer. When mix | blending a hardening | curing agent, it is preferable that the compounding ratio of a hardening | curing agent is 0.1 to 20 mass parts with respect to 100 mass parts of acrylic polymers. It is because it can suppress that the adhesive residue generate | occur | produces if the compounding ratio of this hardening | curing agent is 0.1 to 15 mass parts.
 粘着剤層に配合する硬化剤としては、多官能イソシアネート硬化剤、多官能エポキシ硬化剤、アジリン化合物、メラミン化合物等があり、好ましくは、多官能イソシアネート硬化剤、多官能エポキシ硬化剤がよい。上記の硬化剤の少なくとも一部として多官能エポキシ硬化剤または多官能イソシアネート硬化剤を使用することにより、選択的にカルボキシル基を有する官能基含有単量体を反応させて消滅させることが可能であり、硬化後のカルボキシル基を有する官能基含有単量体量を調節することが可能である。 As the curing agent to be blended in the pressure-sensitive adhesive layer, there are a polyfunctional isocyanate curing agent, a polyfunctional epoxy curing agent, an azirine compound, a melamine compound, and the like, and preferably a polyfunctional isocyanate curing agent and a polyfunctional epoxy curing agent. By using a polyfunctional epoxy curing agent or a polyfunctional isocyanate curing agent as at least a part of the above curing agent, it is possible to selectively cause a functional group-containing monomer having a carboxyl group to react and disappear. It is possible to adjust the amount of the functional group-containing monomer having a carboxyl group after curing.
 多官能イソシアネート硬化剤としては、例えば芳香族ポリイソシアネート硬化剤、脂肪族ポリイソシアネート硬化剤、脂環族ポリイソシアネート硬化剤がある。また、好ましくは、脂肪族ポリイソシアネート硬化剤、特にそのうちのキサメチレンジイソシアネート硬化剤がよい。このイソシアネート硬化剤が良いのは、粘着剤に柔軟性を付与することができ、凹凸のある被着体にも有効だからである。 Examples of the polyfunctional isocyanate curing agent include an aromatic polyisocyanate curing agent, an aliphatic polyisocyanate curing agent, and an alicyclic polyisocyanate curing agent. In addition, an aliphatic polyisocyanate curing agent, particularly a xamethylene diisocyanate curing agent among them is preferable. The reason why this isocyanate curing agent is good is that it can impart flexibility to the pressure-sensitive adhesive and is also effective for an adherend having irregularities.
 芳香族ポリイソシアネートは特に限定されず、例えば1,3-フェニレンジイソシアネート、4,4’-ジフェニルジイソシアネート、1,4-フェニレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、4,4’-トルイジンジイソシアネート、2,4,6-トリイソシアネートトルエン、1,3,5-トリイソシアネートベンゼン、ジアニシジンジイソシアネート、4,4’-ジフェニルエーテルジイソシアネート、4,4’,4”-トリフェニルメタントリイソシアネート、ω,ω’-ジイソシアネート-1,3-ジメチルベンゼン、ω,ω’-ジイソシアネート-1,4-ジメチルベンゼン、ω,ω’-ジイソシアネート-1,4-ジエチルベンゼン、1,4-テトラメチルキシリレンジイソシアネート、及び1,3-テトラメチルキシリレンジイソシアネート等が挙げられる。 The aromatic polyisocyanate is not particularly limited, and for example, 1,3-phenylene diisocyanate, 4,4′-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4′-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2, , 6-tolylene diisocyanate, 4,4′-toluidine diisocyanate, 2,4,6-triisocyanate toluene, 1,3,5-triisocyanate benzene, dianisidine diisocyanate, 4,4′-diphenyl ether diisocyanate, 4,4 ', 4 "-triphenylmethane triisocyanate, ω, ω'-diisocyanate-1,3-dimethylbenzene, ω, ω'-diisocyanate-1,4-dimethylbenzene, ω, ω'-diisocyanate-1,4- Diechi Benzene, 1,4-tetramethylxylylene diisocyanate, and 1,3-tetramethylxylylene diisocyanate and the like.
 脂肪族ポリイソシアネートは特に限定されず、例えばトリメチレンジイソシアネート、テトラメチレンジイソシアネート、ヘキサメチレンジイソシアネート、ペンタメチレンジイソシアネート、1,2-プロピレンジイソシアネート、2,3-ブチレンジイソシアネート、1,3-ブチレンジイソシアネート、ドデカメチレンジイソシアネート、及び2,4,4-トリメチルヘキサメチレンジイソシアネート等が挙げられる。 The aliphatic polyisocyanate is not particularly limited. For example, trimethylene diisocyanate, tetramethylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, 1,2-propylene diisocyanate, 2,3-butylene diisocyanate, 1,3-butylene diisocyanate, dodecamethylene Examples thereof include diisocyanate and 2,4,4-trimethylhexamethylene diisocyanate.
 脂環族ポリイソシアネートは特に限定されず、例えば3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート、1,3-シクロペンタンジイソシアネート、1,3-シクロヘキサンジイソシアネート、1,4-シクロヘキサンジイソシアネート、メチル-2,4-シクロヘキサンジイソシアネート、メチル-2,6-シクロヘキサンジイソシアネート、4,4’-メチレンビス(シクロヘキシルイソシアネート)、1,4-ビス(イソシアネートメチル)シクロヘキサン、及び1,4-ビス(イソシアネートメチル)シクロヘキサンがある。 The alicyclic polyisocyanate is not particularly limited. For example, 3-isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate, 1,3-cyclopentane diisocyanate, 1,3-cyclohexane diisocyanate, 1,4-cyclohexane diisocyanate, methyl -2,4-cyclohexane diisocyanate, methyl-2,6-cyclohexane diisocyanate, 4,4'-methylenebis (cyclohexyl isocyanate), 1,4-bis (isocyanatomethyl) cyclohexane, and 1,4-bis (isocyanatomethyl) cyclohexane There is.
 ポリイソシアネートのうち、1,3-フェニレンジイソシアネート、4,4’-ジフェニルジイソシアネート、1,4-フェニレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、4,4’-トルイジンジイソシアネート、ヘキサメチレンジイソシアネートが好適に用いられる。 Among polyisocyanates, 1,3-phenylene diisocyanate, 4,4'-diphenyl diisocyanate, 1,4-phenylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate 4,4′-toluidine diisocyanate and hexamethylene diisocyanate are preferably used.
 多官能エポキシ硬化剤は、主にエポキシ基を2個以上、第3級窒素原子を1個以上有する化合物をいい、N・N-グリシジルアニリン、N・N-グリシジルトルイジン、m-N・N-グリシジルアミノフェニルグリシジルエーテル、p-N・N-グリシジルアミノフェニルグリシジルエーテル、トリグリシジルイソシアヌレート、N・N・N’・N’-テトラグリシジルジアミノジフェニルメタン、N・N・N’・N’-テトラグリシジル-m-キシリレンジアミン、N・N・N’・N’・N’’-ペンタグリシジルジエチレントリアミンなどが挙げられる。 The polyfunctional epoxy curing agent mainly means a compound having two or more epoxy groups and one or more tertiary nitrogen atoms. N · N-glycidylaniline, N · N-glycidyltoluidine, mN · N— Glycidylaminophenyl glycidyl ether, pN · N-glycidylaminophenyl glycidyl ether, triglycidyl isocyanurate, N · N · N '· N'-tetraglycidyldiaminodiphenylmethane, N · N · N' · N'-tetraglycidyl -M-xylylenediamine, N · N · N ′ · N ′ · N ″ -pentaglycidyldiethylenetriamine and the like.
 粘着剤はアクリル重合体及び硬化剤を主体とする感圧型粘着剤とすることも可能であるがアクリル重合体及び硬化剤の他に光重合性化合物、光重合開始剤、粘着付与樹脂、添加物等を用いた光硬化型粘着剤として使用可能である。 The pressure-sensitive adhesive can be a pressure-sensitive pressure-sensitive adhesive mainly composed of an acrylic polymer and a curing agent, but in addition to the acrylic polymer and the curing agent, a photopolymerizable compound, a photopolymerization initiator, a tackifying resin, and an additive It can be used as a photo-curing pressure-sensitive adhesive using etc.
(光重合性化合物)
 光重合性化合物としてはヒドロキシル基を含有することが好ましい。ヒドロキシル基を含有する光重合性化合物としては、例えば、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレートなどが用いられる。
(Photopolymerizable compound)
The photopolymerizable compound preferably contains a hydroxyl group. Examples of the photopolymerizable compound containing a hydroxyl group include pentaerythritol triacrylate and dipentaerythritol monohydroxypentaacrylate.
 光重合性化合物として、上記アクリレート系化合物の他に、下記一般式で示されるビスA型エポキシアクリレートなどのエポキシアクリレートオリゴマーを用いることもできる。 As the photopolymerizable compound, an epoxy acrylate oligomer such as a bis-A type epoxy acrylate represented by the following general formula may be used in addition to the acrylate compound.
Figure JPOXMLDOC01-appb-C000003
(式中、Rは水素分子あるいは(メタ)アクリレート基を表す。nは1以上の整数を表す。)
Figure JPOXMLDOC01-appb-C000003
(In the formula, R represents a hydrogen molecule or a (meth) acrylate group. N represents an integer of 1 or more.)
 光重合性化合物としては、ビニル基を4個以上有するものが、紫外線等の照射後の粘着剤の硬化が良好である点で好ましい。 As the photopolymerizable compound, those having 4 or more vinyl groups are preferred in that the adhesive is cured well after irradiation with ultraviolet rays or the like.
 光重合性化合物の配合量は、(メタ)アクリル酸エステル共重合体100質量部に対して5質量部以上200質量部以下とすることが好ましく、40質量部以上150質量部以下がより好ましい。光重合性化合物の配合量を少なくすると、放射線照射後の粘着シートの剥離性が低下し、半導体チップのピックアップ不良を生じやすくなる。一方、光重合性化合物の配合量を多くすると、ダイシング時の糊の掻き上げによりピックアップ不良が生じ易くなるとともに反応残渣による微小な糊残りの発生し、汚染の原因となる。 The blending amount of the photopolymerizable compound is preferably 5 parts by mass or more and 200 parts by mass or less, and more preferably 40 parts by mass or more and 150 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. If the blending amount of the photopolymerizable compound is reduced, the peelability of the pressure-sensitive adhesive sheet after irradiation is reduced, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, when the blending amount of the photopolymerizable compound is increased, pick-up failure is liable to occur due to the glue being picked up during dicing, and a minute glue residue is generated due to a reaction residue, which causes contamination.
(光重合開始剤)
 光重合開始剤には、ベンゾイン、ベンゾインアルキルエーテル類、アセトフェノン類、アントラキノン類、チオキサントン類、ケタール類、ベンゾフェノン類またはキサントン類などが用いられる。
(Photopolymerization initiator)
As the photopolymerization initiator, benzoin, benzoin alkyl ethers, acetophenones, anthraquinones, thioxanthones, ketals, benzophenones or xanthones are used.
 ベンゾインとしては、例えばベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインプロピルエーテルなどがある。
 アセトフェノン類としては、例えばベンゾインアルキルエーテル類、アセトフェノン、2,2-ジメトキシ-2-アセトフェノン、2,2―ジエトキシ-2-アセトフェノン、1,1-ジクロロアセトフェノンなどがある。
 アントラキノン類としては、2-メチルアントラキノン、2-エチルアントラキノン、2-ターシャリブチルアントラキノン、1-クロロアントラキノンなどがある。
 チオキサントン類としては、例えば2,4-ジメチルチオキサントン、2,4-ジイソプロピルチオキサントン、2-クロロチオキサントン、2,4-ジイソプロピルチオキサントンなどがある。
 ケタール類としては、例えばアセトフェノンジメチルケータル、ベンジルジメチルメタール、ベンジルジフエニルサルフアイド、テトラメチルチウラムモノサルフアイド、アゾビスイソブチロニトリル、ジベンジル、ジアセチル、β-クロールアンスラキノンなどがある。
 このうち、被着体への汚染を防止するため、イソシアネート硬化剤と反応し得る水酸基を有する2-ヒドロキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]-フェニル}-2-メチル-プロパン-1-オン(BASFジャパン社製、製品名IRGACURE127)などが好ましい。
Examples of benzoin include benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin propyl ether.
Examples of acetophenones include benzoin alkyl ethers, acetophenone, 2,2-dimethoxy-2-acetophenone, 2,2-diethoxy-2-acetophenone, 1,1-dichloroacetophenone, and the like.
Anthraquinones include 2-methylanthraquinone, 2-ethylanthraquinone, 2-tertiarybutylanthraquinone, 1-chloroanthraquinone and the like.
Examples of thioxanthones include 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone, and 2,4-diisopropylthioxanthone.
Examples of ketals include acetophenone dimethyl ketal, benzyldimethylmethal, benzyldiphenylsulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, dibenzyl, diacetyl, β-chloranthraquinone, and the like.
Of these, 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] having a hydroxyl group capable of reacting with an isocyanate curing agent in order to prevent contamination of the adherend -Phenyl} -2-methyl-propan-1-one (manufactured by BASF Japan, product name IRGACURE127) is preferred.
 光重合開始剤の配合量は、(メタ)アクリル酸エステル重合体100質量部に対して0.1質量部以上20質量部以下が好ましい。配合量が少な過ぎると、放射線照射後の粘着シートの剥離性が低下し、半導体チップのピックアップ不良を生じやすくなる。一方、配合量が多過ぎると、光重合開始剤が粘着剤表面へブリードアウトし、汚染の原因となる。 The blending amount of the photopolymerization initiator is preferably 0.1 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester polymer. If the blending amount is too small, the peelability of the pressure-sensitive adhesive sheet after irradiation is lowered, and the pick-up failure of the semiconductor chip is likely to occur. On the other hand, if the amount is too large, the photopolymerization initiator bleeds out to the pressure-sensitive adhesive surface, causing contamination.
 光重合開始剤には、必要に応じて従来公知の光重合促進剤を1種または2種以上を組合せて併用してもよい。光重合促進剤には、安息香酸系や第三級アミンなどを用いることができる。第三級アミンとしては、トリエチルアミン、テトラエチルペンタアミン、ジメチルアミノエーテルなどが挙げられる。 The photopolymerization initiator may be used in combination with one or more conventionally known photopolymerization accelerators, if necessary. A benzoic acid type | system | group, a tertiary amine, etc. can be used for a photoinitiator. Examples of the tertiary amine include triethylamine, tetraethylpentamine, dimethylamino ether and the like.
(粘着付与樹脂)
 粘着付与樹脂としては、テルペンフェノール樹脂を完全又は部分水添されたテルペンフェノール樹脂である。
(Tackifying resin)
The tackifier resin is a terpene phenol resin that is completely or partially hydrogenated with a terpene phenol resin.
 テルペンフェノール樹脂は、例えば、テルペン化合物1モルとフェノール類0.1~50を反応させて製造することが出来る。 The terpene phenol resin can be produced, for example, by reacting 1 mol of a terpene compound with 0.1 to 50 phenols.
 テルペン化合物としては、ミルセン、アロオシメン、オシメン、α-ピネン、β-ピネン、ジペンテン、リモネン、α-フェランドレン、α-テルピネン、γ-テルピネン、テルピノレン、1,8-シネオール、1,4-シネオール、α-テルピネオール、β-テルピネオール、γ-テルピネオール、カンフェン、トリシクレン、サビネン、パラメンタジエン類、カレン類等が挙げられる。これらの化合物の中で、α-ピネン、β-ピネン、リモネン、ミルセン、アロオシメン、α-テルピネンが本発明では特に好ましく用いられる。 Examples of terpene compounds include myrcene, alloocimene, osmene, α-pinene, β-pinene, dipentene, limonene, α-ferrandrene, α-terpinene, γ-terpinene, terpinolene, 1,8-cineole, 1,4-cineole, Examples include α-terpineol, β-terpineol, γ-terpineol, camphene, tricyclene, sabinene, paramentadienes, and carenes. Among these compounds, α-pinene, β-pinene, limonene, myrcene, alloocimene and α-terpinene are particularly preferably used in the present invention.
 フェノール類としては、フェノール、クレゾール、キシレノール、カテコール、レゾルシン、ヒドロキノン、ビスフェノールA等が挙げられるが、これらに限定はされない。 Examples of the phenols include, but are not limited to, phenol, cresol, xylenol, catechol, resorcin, hydroquinone, bisphenol A, and the like.
 テルペンフェノール樹脂のフェノール類の比率は、25~50モル%程度であるが、これらに限定はされない。 The ratio of phenols in the terpene phenol resin is about 25 to 50 mol%, but is not limited thereto.
 完全又は部分水添されたテルペンフェノール樹脂の水酸基価は、50~250が好ましい。水酸基価が50未満の場合は、イソシアネート系硬化剤との反応が十分ではなく、粘着剤表面へブリードアウトし、汚染の原因となり、250より多いと粘度が上昇し、(メタ)アクリル酸エステル共重合体等との混合ムラが生じ、ピックアップ特性が安定しないためである。 The hydroxyl value of the fully or partially hydrogenated terpene phenol resin is preferably 50 to 250. When the hydroxyl value is less than 50, the reaction with the isocyanate curing agent is not sufficient, bleeds out to the surface of the pressure-sensitive adhesive, causing contamination, and when it exceeds 250, the viscosity increases and the (meth) acrylic acid ester This is because uneven mixing with a polymer or the like occurs and the pickup characteristics are not stable.
 水添する方法としては、特に限定されるものではなく、例えば、パラジウム、ルテニウム、ロジウムなどの貴金属またはそれらを活性炭素、活性アルミナ、珪藻土などの坦体上に担持したものを触媒として使用して行う方法が挙げられ、水添率は、臭素価測定、ヨウ素価測定等により測定することができる。 The hydrogenation method is not particularly limited, and for example, a noble metal such as palladium, ruthenium, rhodium or the like supported on a carrier such as activated carbon, activated alumina, or diatomaceous earth is used as a catalyst. The hydrogenation rate can be measured by bromine number measurement, iodine number measurement or the like.
 完全又は部分水添されたテルペンフェノール樹脂の水添率は、30モル%以上であることが好ましく、より好ましくは70モル%以上である。30モル%未満の場合、活性光線の照射による光重合性化合物の反応阻害により粘着力が十分低下せず、ピックアップ性が低下するためである。 The hydrogenation rate of the completely or partially hydrogenated terpene phenol resin is preferably 30 mol% or more, more preferably 70 mol% or more. When the amount is less than 30 mol%, the adhesive force is not sufficiently lowered due to the reaction inhibition of the photopolymerizable compound by irradiation with actinic rays, and the pickup property is lowered.
 完全又は部分水添されたテルペンフェノール樹脂の配合比は、(メタ)アクリル酸エステル共重合体100質量部に対して0.5質量部以上100質量部以下が好ましく、1.0質量部以上50質量部以下がより好ましい。完全又は部分水添されたテルペンフェノール樹脂が0.5質量部以上であれば、粘着力が低すぎないので、ダイシング時に半導体チップの保持性が維持され、100質量部以下であれば、ピックアップ不良の発生を抑制することができる。 The blending ratio of the fully or partially hydrogenated terpene phenol resin is preferably 0.5 parts by mass or more and 100 parts by mass or less, and 1.0 part by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the (meth) acrylic acid ester copolymer. Less than the mass part is more preferable. If the completely or partially hydrogenated terpene phenol resin is 0.5 parts by mass or more, the adhesive strength is not too low, so the retention of the semiconductor chip is maintained during dicing, and if it is 100 parts by mass or less, the pickup is poor. Can be suppressed.
(添加剤等)
 粘着剤には、例えば、軟化剤、老化防止剤、充填剤、導電剤、紫外線吸収剤、及び光安定剤等の各種添加剤を添加してもよい。
(Additives, etc.)
Various additives such as a softening agent, an anti-aging agent, a filler, a conductive agent, an ultraviolet absorber, and a light stabilizer may be added to the adhesive.
 粘着剤層の厚みは、1μm以上50μmが好ましく、5μm以上35μm以下が特に好ましい。粘着剤層が厚過ぎると粘着力が高くなり過ぎ、ピックアップ性が低下する。また、粘着剤層が薄過ぎると粘着力が低くなり過ぎ、ダイシング時のチップ保持性が低下し、リングフレームとシートとの間で剥離が生じる場合がある。 The thickness of the pressure-sensitive adhesive layer is preferably 1 μm to 50 μm, particularly preferably 5 μm to 35 μm. If the pressure-sensitive adhesive layer is too thick, the pressure-sensitive adhesive strength becomes too high and the pick-up property is lowered. On the other hand, if the pressure-sensitive adhesive layer is too thin, the pressure-sensitive adhesive force becomes too low, chip retention during dicing is lowered, and peeling may occur between the ring frame and the sheet.
<基材>
 基材の材料としては、例えば、ポリ塩化ビニル、ポリエチレンテレフタレート、エチレン-酢酸ビニル共重合体、エチレン-アクリル酸-アクリル酸エステルフィルム、エチレン-エチルアクリレート共重合体、ポリエチレン、ポリプロピレン、プロピレン系共重合体、エチレン-アクリル酸共重合体、および、エチレン-(メタ)アクリル酸共重合体やエチレン-(メタ)アクリル酸-(メタ)アクリル酸エステル共重合体等を金属イオンで架橋したアイオノマ樹脂などが挙げられる。基材は、これら樹脂の混合物又は共重合体であってよく、これら樹脂からなるフィルムやシートの積層体であってもよい。
<Base material>
Examples of the base material include polyvinyl chloride, polyethylene terephthalate, ethylene-vinyl acetate copolymer, ethylene-acrylic acid-acrylate film, ethylene-ethyl acrylate copolymer, polyethylene, polypropylene, propylene-based copolymer Polymers, ethylene-acrylic acid copolymers, and ionomer resins obtained by crosslinking ethylene- (meth) acrylic acid copolymers, ethylene- (meth) acrylic acid- (meth) acrylic acid ester copolymers, etc. with metal ions Is mentioned. The base material may be a mixture or copolymer of these resins, and may be a laminate of films and sheets made of these resins.
 基材フィルムの素材はアイオノマ樹脂を用いることが好ましい。アイオノマ樹脂の中でも、エチレン単位、メタアクリル酸単位、及び(メタ)アクリル酸アルキルエステル単位を有する共重合体をNa、K、Zn2+等の金属イオンで架橋したアイオノマ樹脂を用いると、切削屑抑制効果が顕著であり、好適に用いられる。 It is preferable to use an ionomer resin as a material for the base film. Among ionomer resins, if an ionomer resin obtained by crosslinking a copolymer having an ethylene unit, a methacrylic acid unit, and a (meth) acrylic acid alkyl ester unit with a metal ion such as Na + , K + , or Zn 2+ is used, cutting is performed. The dust suppressing effect is remarkable and is preferably used.
 基材は、上記材料からなる単層あるいは多層のフィルムあるいはシートであってよく、異なる材料からなるフィルム等を積層したものであってもよい。基材の厚さは50~200μm、好ましくは70~150μmである。 The base material may be a single layer or a multilayer film or sheet made of the above material, or may be a laminate of films made of different materials. The thickness of the substrate is 50 to 200 μm, preferably 70 to 150 μm.
 基材には、帯電防止処理を施すことが好ましい。帯電防止処理としては、基材に帯電防止剤を配合する処理、基材表面に帯電防止剤を塗布する処理、コロナ放電による処理がある。 It is preferable to apply an antistatic treatment to the substrate. Examples of the antistatic treatment include a treatment for adding an antistatic agent to the substrate, a treatment for applying the antistatic agent to the substrate surface, and a treatment by corona discharge.
 帯電防止剤としては、例えば四級アミン塩単量体などを用いることができる。四級アミン塩単量体としては、例えばジメチルアミノエチル(メタ)アクリレート四級塩化物、ジエチルアミノエチル(メタ)アクリレート四級塩化物、メチルエチルアミノエチル(メタ)アクリレート四級塩化物、p-ジメチルアミノスチレン四級塩化物、およびp-ジエチルアミノスチレン四級塩化物が挙げられる。このうち、ジメチルアミノエチルメタクリレート四級塩化物が好ましい。 As the antistatic agent, for example, a quaternary amine salt monomer can be used. Examples of the quaternary amine salt monomer include dimethylaminoethyl (meth) acrylate quaternary chloride, diethylaminoethyl (meth) acrylate quaternary chloride, methylethylaminoethyl (meth) acrylate quaternary chloride, p-dimethyl. Examples include aminostyrene quaternary chloride and p-diethylaminostyrene quaternary chloride. Of these, dimethylaminoethyl methacrylate quaternary chloride is preferred.
 滑り剤及び帯電防止剤の使用方法は特に限定されないが、例えば基材フィルムの片面に粘着剤を塗布し、その裏面に滑り剤及び/又は帯電防止剤を塗布してもよく、滑り剤及び/又は帯電防止剤を基材フィルムの樹脂に練り込んでシート化しても良い。 The method of using the slip agent and the antistatic agent is not particularly limited. For example, the adhesive may be applied to one side of the base film, and the slip agent and / or the antistatic agent may be applied to the back side thereof. Alternatively, an antistatic agent may be kneaded into the resin of the base film to form a sheet.
 基材の片面に粘着剤を積層し、他方の面は平均表面粗さ(Ra)が0.3~1.5μmのエンボス面とすることが可能である。エキスパンド装置の機械テーブル側にエンボス面を設置することにより、ダイシング後のエキスパンド工程で基材フィルムを容易に拡張することができる。 It is possible to laminate an adhesive on one side of the substrate and make the other side an embossed surface with an average surface roughness (Ra) of 0.3 to 1.5 μm. By installing the embossed surface on the machine table side of the expanding device, the base film can be easily expanded in the expanding process after dicing.
(滑り剤)
 ダイシング後のエキスパンド性を向上させるために、基材の粘着剤非接触面に滑り剤を施したり、基材に滑り剤を練り込むことができる。
(Slip agent)
In order to improve the expandability after dicing, a slip agent can be applied to the non-adhesive surface of the base material, or the slip agent can be kneaded into the base material.
 滑り剤は、粘着シートとエキスパンド装置の摩擦係数を低下させる物質であれば特に限定されず、例えばシリコーン樹脂や(変性)シリコーン油等のシリコーン化合物、フッ素樹脂、六方晶ボロンナイトライド、カーボンブラック、及び二硫化モリブデン等が挙げられる。これらの摩擦低減剤は複数の成分を混合してもよい。電子部品の製造はクリーンルームで行われるため、シリコーン化合物又はフッ素樹脂を用いることが好ましい。シリコーン化合物の中でも特にシリコーンマクロモノマ単位を有する共重合体は帯電防止層との相溶性が良く、帯電防止性とエキスパンド性のバランスが図れるため、好適に用いられる。 The slip agent is not particularly limited as long as it is a substance that reduces the friction coefficient of the pressure-sensitive adhesive sheet and the expanding device. For example, silicone compounds such as silicone resins and (modified) silicone oils, fluororesins, hexagonal boron nitride, carbon black, And molybdenum disulfide. These friction reducing agents may mix a plurality of components. Since manufacture of an electronic component is performed in a clean room, it is preferable to use a silicone compound or a fluororesin. Among silicone compounds, a copolymer having a silicone macromonomer unit is particularly preferred because it has good compatibility with the antistatic layer and can achieve a balance between antistatic properties and expandability.
<電子部品の製造工程>
 本発明に係る電子部品の製造方法の具体的な工程を順に説明する。
<Manufacturing process of electronic parts>
Specific steps of the electronic component manufacturing method according to the present invention will be described in order.
(1)貼付工程
 まず、貼付工程において、粘着シートを半導体ウエハ(又は基板)とリングフレームに貼り付ける。ウエハは、シリコンウエハおよびガリウムナイトライドウエハ、炭化ケイ素ウエハ、サファイアウエハなどの従来汎用のウエハであってよい。基板は樹脂でチップを封止したパッケージ基板、LEDパッケージ基板などの汎用の基板であってよい。
(1) Affixing process First, in an affixing process, an adhesive sheet is affixed on a semiconductor wafer (or substrate) and a ring frame. The wafer may be a conventional general-purpose wafer such as a silicon wafer and a gallium nitride wafer, a silicon carbide wafer, or a sapphire wafer. The substrate may be a general-purpose substrate such as a package substrate in which a chip is sealed with a resin or an LED package substrate.
(2)ダイシング工程
 ダイシング工程では、シリコンウエハ等をダイシングして半導体チップ又は半導体部品にする。
(2) Dicing process In the dicing process, a silicon wafer or the like is diced into semiconductor chips or semiconductor components.
(3)光照射工程
 光照射工程では、基材側から光硬化型粘着剤層に紫外線等の活性光線を照射する。紫外線の光源としては、低圧水銀灯、高圧水銀灯、超高圧水銀灯、メタルハライドランプを用いることができる。また、紫外線に替えて電子線を用いてもよく、電子線の光源としてはα線、β線、γ線を用いることができる。
(3) Light irradiation process In a light irradiation process, actinic rays, such as an ultraviolet-ray, are irradiated to a photocurable adhesive layer from the base material side. As the ultraviolet light source, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, or a metal halide lamp can be used. In addition, an electron beam may be used instead of ultraviolet rays, and α-rays, β-rays, and γ-rays can be used as a light source for the electron beams.
 光照射により粘着剤層は三次元網状化して硬化し、粘着剤層の粘着力が低下する。この際、上述したように、本発明に係る粘着シートは加温してもウエハ等に過度に密着することがないため、紫外線等の照射により十分な接着力の低下が得られる。 The light-sensitive adhesive layer is three-dimensionally reticulated and cured by light irradiation, and the adhesive strength of the pressure-sensitive adhesive layer is reduced. At this time, as described above, since the pressure-sensitive adhesive sheet according to the present invention does not excessively adhere to a wafer or the like even when heated, a sufficient decrease in adhesive force can be obtained by irradiation with ultraviolet rays or the like.
(4)エキスパンド・ピックアップ工程
 エキスパンド・ピックアップ工程では、半導体チップ又は半導体部品同士の間隔を広げるため粘着シートを引き伸ばし、チップ又は部品をニードルピン等で突き上げる。その後、チップ又は部品を真空コレットまたはエアピンセット等で吸着し、粘着シートの粘着剤層から剥離してピックアップする。この際、本発明に係る粘着シートでは紫外線等の照射により十分な接着力の低下が得られているため、チップ又は部品と粘着剤層との間の剥離が容易となり、良好なピックアップ性が得られ、糊残りなどの不良が生じることもない。
(4) Expanding and Picking Up Step In the expanding and picking up step, the adhesive sheet is stretched to widen the gap between the semiconductor chips or semiconductor components, and the chip or components are pushed up with a needle pin or the like. Thereafter, the chip or component is adsorbed by a vacuum collet or air tweezers, peeled off from the adhesive layer of the adhesive sheet and picked up. At this time, in the pressure-sensitive adhesive sheet according to the present invention, a sufficient decrease in the adhesive strength is obtained by irradiation with ultraviolet rays or the like, so that peeling between the chip or component and the pressure-sensitive adhesive layer becomes easy, and good pick-up properties are obtained. And no defects such as glue residue occur.
<粘着シートの製造>
 基材上に粘着剤層を形成して粘着シートとする方法としては、例えばグラビアコーター、コンマコーター、バーコーター、ナイフコーター又はロールコーターといったコーターで基材上に粘着剤を直接塗布する方法や、剥離フィルムに粘着剤を塗布/乾燥後に基材フィルムに貼り合わせる方法がある。凸板印刷、凹板印刷、平板印刷、フレキソ印刷、オフセット印刷、又はスクリーン印刷等で基材上に粘着剤を印刷してよい。
<Manufacture of adhesive sheet>
As a method of forming a pressure-sensitive adhesive layer on a substrate to form a pressure-sensitive adhesive sheet, for example, a method of directly applying a pressure-sensitive adhesive on a substrate with a coater such as a gravure coater, comma coater, bar coater, knife coater or roll coater, There is a method in which a pressure-sensitive adhesive is applied to a release film and dried and bonded to a base film. The adhesive may be printed on the substrate by convex printing, concave printing, flat printing, flexographic printing, offset printing, screen printing, or the like.
 本実施形態の粘着シートは、電子部品の製造工程である、ダイシング工程、バックグラインド工程において、ワークと呼ばれる電子部品集合体の貼着用に好適に用いられる。 The pressure-sensitive adhesive sheet of this embodiment is suitably used for attaching an electronic component assembly called a workpiece in a dicing step and a back grinding step, which are electronic component manufacturing steps.
 実施例・比較例に係る粘着剤組成物及び粘着シートを次の処方で製造した。主な配合と、各実験例の結果を表3に示す。 The pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet according to Examples and Comparative Examples were produced with the following prescription. Table 3 shows the main formulations and the results of each experimental example.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 硬化型粘着剤をポリエチレンテレフタレート製のセパレーターフィルム上に塗布し、乾燥後の粘着層の厚みが20μmとなるように塗工した。この粘着層を基材フィルムに積層し、40℃で7日間熟成し、粘着シートを得た。基材フィルムには、アイオノマ樹脂であるエチレン-メタアクリル酸-メタアクリル酸アルキルエステル共重合体のZn塩を主体、MFR値1.0g/10分(JIS K7210、210℃)、融点86℃、Zn2+イオンを含有(三井・デュポンポリケミカル社製、品番:HM1855)をTダイ押出しにより100μmに成膜したもの用いた。 The curable pressure-sensitive adhesive was coated on a polyethylene terephthalate separator film, and coated so that the thickness of the pressure-sensitive adhesive layer after drying was 20 μm. This pressure-sensitive adhesive layer was laminated on a base film and aged at 40 ° C. for 7 days to obtain a pressure-sensitive adhesive sheet. The base film is mainly composed of Zn salt of ethylene-methacrylic acid-methacrylic acid alkyl ester copolymer, which is an ionomer resin, MFR value 1.0 g / 10 min (JIS K7210, 210 ° C.), melting point 86 ° C., A Zn 2+ ion-containing (Mitsui / DuPont Polychemical Co., Ltd., product number: HM1855) film formed to 100 μm by T-die extrusion was used.
[光硬化型粘着剤]
〔(メタ)アクリル酸エステル共重合体〕
 A-1:日本ゼオン社製アクリルゴムAR53L;エチルアクリレート54%、ブチルアクリレート19%、メトキシエチルアクリレート24%の共重合体、乳化重合により得られる。
 A-2:綜研化学社製SKダイン1496;2-エチルヘキシルアクリレート96%、2-ヒドロキシエチルアクリレート4%の共重合体、溶液重合により得られる。
〔光重合性化合物〕
 B-1:下記一般式で示されるビスA型エポキシアクリレート。4官能アクリレートであり、重量平均分子量1000の市販品(昭和電工社製、製品名;リポキシPX-390HT)。ヒドロキシル基含有。
Figure JPOXMLDOC01-appb-C000005
(式中、Rは水素分子あるいは(メタ)アクリレート基を表す。nは1以上の整数を表す。)
 B-2:ペンタエリスリトールのOH末端にヘキサメチレンジイソシアネートを反応させてなる末端イソシアネート化合物に、更に2-ヒドロキシエチルアクリレートを反応させてなり、ビニル基数が1分子あたり4個、重量平均分子量が1000のウレタンアクリレート(合成品)。ヒドロキシル基なし。
 なお重量平均分子量はゲルパーミエーションクロマトグラフィー法(GPC)によりポリスチレン換算の重量平均分子量として測定した値である。
〔多官能イソシアネート硬化剤〕
 C-1:日本ポリウレタン社製コロネートL-45E;2,4-トリレンジイソシアネートのトリメチロールプロパンアダクト体。
 C-2:日本ポリウレタン社製コロネートHL;ヘキサメチレンジイソシアネートのトリメチロールプロパンアダクト体。
〔光重合開始剤〕
 D-1:BASFジャパン社製IRGACURE127;2-ヒドロキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]-フェニル}-2-メチル-プロパン-1-オン。
 D-2:BASFジャパン社製IRGACURE651;ベンジルジメチルケタール。
[Photo-curing adhesive]
[(Meth) acrylic acid ester copolymer]
A-1: Acrylic rubber AR53L manufactured by Nippon Zeon Co., Ltd .; a copolymer of 54% ethyl acrylate, 19% butyl acrylate and 24% methoxyethyl acrylate, obtained by emulsion polymerization.
A-2: SK dyne 1496 manufactured by Soken Chemical Co .; a copolymer of 96% 2-ethylhexyl acrylate and 4% 2-hydroxyethyl acrylate, obtained by solution polymerization.
[Photopolymerizable compound]
B-1: A bis-A type epoxy acrylate represented by the following general formula. Commercially available tetrafunctional acrylate having a weight average molecular weight of 1000 (manufactured by Showa Denko KK, product name: Lipoxy PX-390HT). Contains hydroxyl groups.
Figure JPOXMLDOC01-appb-C000005
(In the formula, R represents a hydrogen molecule or a (meth) acrylate group. N represents an integer of 1 or more.)
B-2: A terminal isocyanate compound obtained by reacting hexamethylene diisocyanate with the OH terminal of pentaerythritol, further reacted with 2-hydroxyethyl acrylate, and has 4 vinyl groups per molecule and a weight average molecular weight of 1000. Urethane acrylate (synthetic product). No hydroxyl group.
In addition, a weight average molecular weight is the value measured as a weight average molecular weight of polystyrene conversion by the gel permeation chromatography method (GPC).
[Multifunctional isocyanate curing agent]
C-1: Coronate L-45E manufactured by Nippon Polyurethane; Trimethylolpropane adduct of 2,4-tolylene diisocyanate.
C-2: Coronate HL manufactured by Nippon Polyurethane Co .; trimethylolpropane adduct of hexamethylene diisocyanate.
(Photopolymerization initiator)
D-1: IRGACURE127 manufactured by BASF Japan; 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] -phenyl} -2-methyl-propan-1-one.
D-2: IRGACURE651 manufactured by BASF Japan Ltd .; benzyldimethyl ketal.
(1)TOC濃度の測定方法
 得られた粘着シートを以下の手順で調整し、JIS K 0101 20.1「燃焼酸化-赤外線式TOC分析法」に準拠して、全有機炭素計(島津製作所製 ON-LINE TOC-VCHS)によって、試料中のTOC濃度を測定した。
 1) 粘着シートを50mm×50mmに切断する。
 2) TOC濃度が5ppb以下の純水500mLを純水で十分に洗浄したサンプル瓶に加え、セパレーターフィルムを剥離した粘着シートを30秒間純水中で揺らす。
 3) 粘着シートの粘着面を下にして純水に浸す。
 4) 23℃で静置する。
 5) 24時間後粘着シートを取り出す。
 6) 溶液のTOC濃度を3回測定し、平均値を測定値とする。
(1) Measuring method of TOC concentration The obtained pressure-sensitive adhesive sheet was prepared according to the following procedure, and an all organic carbon meter (manufactured by Shimadzu Corporation) in accordance with JIS K 0101 20.1 “combustion oxidation-infrared TOC analysis method” ON-LINE TOC-VCHS), the TOC concentration in the sample was measured.
1) Cut the adhesive sheet into 50 mm × 50 mm.
2) 500 mL of pure water having a TOC concentration of 5 ppb or less is added to a sample bottle sufficiently washed with pure water, and the pressure-sensitive adhesive sheet from which the separator film has been peeled is shaken in pure water for 30 seconds.
3) Soak the adhesive sheet in pure water with the adhesive side down.
4) Let stand at 23 ° C.
5) Remove the adhesive sheet after 24 hours.
6) Measure the TOC concentration of the solution three times, and use the average value as the measured value.
 前記手法で得られたTOC濃度は、以下の基準により評価した。
 ◎(優)  :1.0mg/L未満
 ○(良)  :1.0mg/L以上、3.0mg/L以下
 ×(不可) :3.0mg/L超
The TOC concentration obtained by the above method was evaluated according to the following criteria.
◎ (excellent): less than 1.0 mg / L ○ (good): 1.0 mg / L or more, 3.0 mg / L or less × (impossible): more than 3.0 mg / L
(2)チップ保持性及びピックアップ性の評価
 得られた粘着シートをダミーの回路パターンを形成した直径8インチ×厚さ0.1mmのシリコンウエハとリングフレームに貼り合わせた。その後、加温する場合は75℃で30分間、オーブンで加温した。その後、ダイシング、ピックアップの各工程を行った。
(2) Evaluation of chip holding property and pick-up property The obtained adhesive sheet was bonded to a ring frame and a silicon wafer having a diameter of 8 inches and a thickness of 0.1 mm on which a dummy circuit pattern was formed. Then, when heating, it heated in oven at 75 degreeC for 30 minutes. Thereafter, dicing and pick-up processes were performed.
 ダイシング工程の条件は以下の通りとした。
 ダイシング装置:DISCO社製DAD341
 ダイシングブレード:DISCO社製NBC-ZH205O-27HEEE
 ダイシングブレード形状:外径55.56mm、刃幅35μm、内径19.05mm
 ダイシングブレード回転数:40、000rpm
 ダイシングブレード送り速度:50mm/秒
 ダイシングサイズ:1.5mm角
 粘着シートへの切り込み量:15μm
 切削水温度:25℃
 切削水量:1.0リットル/分
The conditions for the dicing process were as follows.
Dicing machine: DAD341 manufactured by DISCO
Dicing blade: NBC-ZH205O-27HEEE made by DISCO
Dicing blade shape: outer diameter 55.56 mm, blade width 35 μm, inner diameter 19.05 mm
Dicing blade rotation speed: 40,000 rpm
Dicing blade feed rate: 50 mm / sec. Dicing size: 1.5 mm square. Cutting depth into adhesive sheet: 15 μm
Cutting water temperature: 25 ° C
Cutting water volume: 1.0 l / min
 ピックアップ工程の条件は以下の通りとした。
 ピックアップ装置:キヤノンマシナリー社製CAP-300II
 エキスパンド量:8mm
 ニードルピン形状:70μmR
 ニードルピン数:1本
 ニードルピン突き上げ高さ:1.5mm
The conditions for the pick-up process were as follows.
Pickup device: CAP-300II manufactured by Canon Machinery
Expanding amount: 8mm
Needle pin shape: 70μmR
Number of needle pins: 1 Needle pin push-up height: 1.5 mm
 ダイシング工程およびピックアップ工程において、以下の評価を行った。 The following evaluation was performed in the dicing process and the pickup process.
(2-1)チップ保持性
 チップ保持性は、ダイシング工程後において、半導体チップが粘着シートに保持されている半導体チップの残存率に基づき、以下の基準により評価した。
 ◎(優)  :チップ飛びが5%未満
 ○(良)  :チップ飛びが5%以上10%未満
 ×(不可) :チップ飛びが10%以上
(2-1) Chip Retention The chip retention was evaluated according to the following criteria based on the remaining ratio of the semiconductor chips held on the adhesive sheet after the dicing process.
◎ (excellent): Chip skipping is less than 5% ○ (good): Chip skipping is 5% or more and less than 10% × (impossible): Chip skipping is 10% or more
(2-2)ピックアップ性
 ピックアップ性は、ピックアップ工程において、半導体チップがピックアップできた率に基づき、以下の基準により評価した。
 ◎(優)  :チップのピックアップ成功率が95%以上
 ○(良)  :チップのピックアップ成功率が80%以上95%未満
 ×(不可) :チップのピックアップ成功率が80%未満
(2-2) Pickup property Pickup property was evaluated according to the following criteria based on the rate at which a semiconductor chip could be picked up in the pickup process.
◎ (Excellent): Chip pickup success rate is 95% or more ○ (Good): Chip pickup success rate is 80% or more and less than 95% × (Not possible): Chip pickup success rate is less than 80%

Claims (10)

  1.  基材に粘着剤層を積層してなる粘着シートであって、前記粘着剤層が、光硬化型粘着剤層であって、光硬化型粘着剤が、
     (メタ)アクリル酸エステル共重合体100質量部と、
     光重合性化合物5~200質量部と、
     多官能イソシアネート硬化剤0.1~20質量部と、
     光重合開始剤0.1~20質量部と、を含み、
     前記光重合性化合物の重量平均分子量が500以上であり、
     前記粘着シートを50mm×50mmの大きさに調整し、24時間、500mLの純水に浸漬したときに溶出する全有機炭素(TOC:Total Organic Carbon)濃度が5.0mg/L以下である
     粘着シート。
    A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate, wherein the pressure-sensitive adhesive layer is a photocurable pressure-sensitive adhesive layer, and the photocurable pressure-sensitive adhesive is
    100 parts by weight of a (meth) acrylic acid ester copolymer,
    5 to 200 parts by mass of a photopolymerizable compound,
    0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent;
    0.1 to 20 parts by mass of a photopolymerization initiator,
    The photopolymerizable compound has a weight average molecular weight of 500 or more,
    The pressure-sensitive adhesive sheet is adjusted to a size of 50 mm × 50 mm and has a total organic carbon (TOC) concentration of 5.0 mg / L or less that is eluted when immersed in 500 mL of pure water for 24 hours. .
  2.  前記光硬化型粘着剤において、光重合性化合物40~150質量部と、多官能イソシアネート硬化剤1~15質量部と、光重合性開始剤1~10質量部と、を含む
     請求項1に記載の粘着シート。
    The photocurable pressure-sensitive adhesive includes 40 to 150 parts by mass of a photopolymerizable compound, 1 to 15 parts by mass of a polyfunctional isocyanate curing agent, and 1 to 10 parts by mass of a photopolymerizable initiator. Adhesive sheet.
  3.  前記粘着シートがダイシングテープであって、該ダイシングテープが、
    (a)半導体ウエハ又は基板とリングフレームとにダイシングテープを貼り付ける貼付工程、
    (b)半導体ウエハ又は基板をダイシングして半導体チップ又は半導体部品にするダイシング工程、
    (c)粘着シートに活性光線を照射する光照射工程、
    (d)半導体チップ又は半導体部品同士の間隔を広げるため粘着シートを引き伸ばすエキスパンド工程、
    (e)粘着シートから半導体チップ又は半導体部品をピックアップするピックアップ工程、
     を含む電子部品の製造工程に使用される
     請求項1又は2に記載の粘着シート。
    The pressure-sensitive adhesive sheet is a dicing tape, and the dicing tape is
    (A) A sticking step of attaching a dicing tape to a semiconductor wafer or substrate and a ring frame;
    (B) a dicing step of dicing a semiconductor wafer or substrate into a semiconductor chip or a semiconductor component;
    (C) a light irradiation step of irradiating the adhesive sheet with actinic rays,
    (D) an expanding step of stretching the pressure-sensitive adhesive sheet to widen the gap between the semiconductor chips or the semiconductor components;
    (E) a pickup step of picking up a semiconductor chip or semiconductor component from the adhesive sheet;
    The pressure-sensitive adhesive sheet according to claim 1, wherein the pressure-sensitive adhesive sheet is used in a production process of an electronic component including
  4.  前記電子部品がLEDである
     請求項1~3のいずれか一項に記載の粘着シート。
    The pressure-sensitive adhesive sheet according to any one of claims 1 to 3, wherein the electronic component is an LED.
  5.  基材に粘着剤層を積層してなる粘着シートであって、
     前記粘着剤層が、
     (メタ)アクリル酸エステル共重合体、光重合性化合物、及び硬化剤を必須成分として含有し、純水に溶出する全有機炭素(TOC:Total Organic Carbon)濃度が3.0mg/L以下であり、
     前記粘着剤層が、
      (メタ)アクリル酸エステル共重合体100質量部と、
      多官能イソシアネート硬化剤0.1~20質量部と、
      光重合開始剤0.1~20質量部と、を含有し、
     前記(メタ)アクリル酸エステル共重合体および前記光重合性化合物がヒドロキシル基を含有する
     粘着シート。
    A pressure-sensitive adhesive sheet obtained by laminating a pressure-sensitive adhesive layer on a substrate,
    The pressure-sensitive adhesive layer is
    It contains (meth) acrylic acid ester copolymer, photopolymerizable compound, and curing agent as essential components, and the total organic carbon (TOC: Total Organic Carbon) concentration eluted in pure water is 3.0 mg / L or less. ,
    The pressure-sensitive adhesive layer is
    100 parts by weight of a (meth) acrylic acid ester copolymer,
    0.1 to 20 parts by mass of a polyfunctional isocyanate curing agent;
    Containing 0.1 to 20 parts by mass of a photopolymerization initiator,
    The pressure-sensitive adhesive sheet in which the (meth) acrylic acid ester copolymer and the photopolymerizable compound contain a hydroxyl group.
  6.  前記ヒドロキシル基とイソシアネート基との間に化学的な結合が形成されている
     請求項5に記載の粘着シート。
    The pressure-sensitive adhesive sheet according to claim 5, wherein a chemical bond is formed between the hydroxyl group and the isocyanate group.
  7.  前記粘着剤層が、
      光重合性化合物5~200質量部を含有する
     請求項5に記載の粘着シート。
    The pressure-sensitive adhesive layer is
    The pressure-sensitive adhesive sheet according to claim 5, comprising 5 to 200 parts by mass of a photopolymerizable compound.
  8.  前記粘着剤層が、(メタ)アクリル酸エステル共重合体100質量部と、光重合性化合物40~150質量部と、多官能イソシアネート硬化剤1~15質量部と、光重合性開始剤1~10質量部と、を含有する
     請求項5~7のいずれか一項に記載の粘着シート。
    The pressure-sensitive adhesive layer comprises 100 parts by weight of a (meth) acrylic acid ester copolymer, 40 to 150 parts by weight of a photopolymerizable compound, 1 to 15 parts by weight of a polyfunctional isocyanate curing agent, 1 to 1 part of a photopolymerizable initiator. The pressure-sensitive adhesive sheet according to any one of claims 5 to 7, comprising 10 parts by mass.
  9.  前記粘着シートがダイシングテープであって、該ダイシングテープが、
    (a)半導体ウエハ又は基板とリングフレームとにダイシングテープを貼り付ける貼付工程、
    (b)半導体ウエハ又は基板をダイシングして半導体チップ又は半導体部品にするダイシング工程、
    (c)粘着シートに活性光線を照射する光照射工程、
    (d)半導体チップ又は半導体部品同士の間隔を広げるため粘着シートを引き伸ばすエキスパンド工程、
    (e)粘着シートから半導体チップ又は半導体部品をピックアップするピックアップ工程、
     を含む電子部品の製造工程に使用される
     請求項5~8のいずれか一項に記載の粘着シート。
    The pressure-sensitive adhesive sheet is a dicing tape, and the dicing tape is
    (A) A sticking step of attaching a dicing tape to a semiconductor wafer or substrate and a ring frame;
    (B) a dicing step of dicing a semiconductor wafer or substrate into a semiconductor chip or a semiconductor component;
    (C) a light irradiation step of irradiating the adhesive sheet with actinic rays,
    (D) an expanding step of stretching the pressure-sensitive adhesive sheet to widen the gap between the semiconductor chips or the semiconductor components;
    (E) a pickup step of picking up a semiconductor chip or semiconductor component from the adhesive sheet;
    The pressure-sensitive adhesive sheet according to any one of claims 5 to 8, wherein the pressure-sensitive adhesive sheet is used in a production process of an electronic component comprising
  10.  前記電子部品がLEDである
     請求項9に記載の粘着シート。
    The pressure-sensitive adhesive sheet according to claim 9, wherein the electronic component is an LED.
PCT/JP2014/065629 2013-06-14 2014-06-12 Adhesive sheet WO2014200071A1 (en)

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