WO2014196827A3 - Novel amino-silyl amine compound, method for perparing the 'same and silicon-containing thin-film using the same - Google Patents

Novel amino-silyl amine compound, method for perparing the 'same and silicon-containing thin-film using the same Download PDF

Info

Publication number
WO2014196827A3
WO2014196827A3 PCT/KR2014/005006 KR2014005006W WO2014196827A3 WO 2014196827 A3 WO2014196827 A3 WO 2014196827A3 KR 2014005006 W KR2014005006 W KR 2014005006W WO 2014196827 A3 WO2014196827 A3 WO 2014196827A3
Authority
WO
WIPO (PCT)
Prior art keywords
same
silicon
film
amine compound
containing thin
Prior art date
Application number
PCT/KR2014/005006
Other languages
French (fr)
Other versions
WO2014196827A2 (en
Inventor
Se Jin Jang
Sang-Do Lee
Jun Hee Cho
Sung Gi Kim
Jong Hyun Kim
Byeong-Il Yang
Jang Hyeon Seok
Sang Ick Lee
Myong Woon Kim
Original Assignee
Dnf Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020130159399A external-priority patent/KR101600337B1/en
Application filed by Dnf Co., Ltd. filed Critical Dnf Co., Ltd.
Priority to JP2016518275A priority Critical patent/JP6366698B2/en
Priority to US14/896,156 priority patent/US9586979B2/en
Priority to CN201480032373.5A priority patent/CN105377860B/en
Publication of WO2014196827A2 publication Critical patent/WO2014196827A2/en
Publication of WO2014196827A3 publication Critical patent/WO2014196827A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)

Abstract

Provided are a novel amino-silyl amine compound, a method for preparing the same, and a silicon-containing thin-film using the same, wherein the amino-silyl amine compound has thermal stability and high volatility and is maintained in a liquid state at room temperature and under a pressure where handling is easy to thereby form a silicon-containing thin-film haying high purity and excellent physical and electrical properties by various deposition methods.
PCT/KR2014/005006 2013-06-07 2014-06-05 Novel amino-silyl amine compound, method for perparing the 'same and silicon-containing thin-film using the same WO2014196827A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2016518275A JP6366698B2 (en) 2013-06-07 2014-06-05 Novel aminosilylamine compound, method for producing the same, and silicon-containing thin film using the same
US14/896,156 US9586979B2 (en) 2013-06-07 2014-06-05 Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same
CN201480032373.5A CN105377860B (en) 2013-06-07 2014-06-05 New amino silane ylamine compounds, prepare its method and use its silicon-containing film

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2013-0065399 2013-06-07
KR20130065399 2013-06-07
KR1020130159399A KR101600337B1 (en) 2013-06-07 2013-12-19 Novel amino-silyl amine compound, method for manufacturing thereof and silicon-containing thin film use the same
KR10-2013-0159399 2013-12-19

Publications (2)

Publication Number Publication Date
WO2014196827A2 WO2014196827A2 (en) 2014-12-11
WO2014196827A3 true WO2014196827A3 (en) 2015-04-23

Family

ID=52008679

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2014/005006 WO2014196827A2 (en) 2013-06-07 2014-06-05 Novel amino-silyl amine compound, method for perparing the 'same and silicon-containing thin-film using the same

Country Status (1)

Country Link
WO (1) WO2014196827A2 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3049499B1 (en) 2013-09-27 2020-07-22 L'air Liquide, Société Anonyme Pour L'Étude Et L'exploitation Des Procédés Georges Claude Amine substituted trisilylamine and tridisilylamine compounds
US9777025B2 (en) 2015-03-30 2017-10-03 L'Air Liquide, Société pour l'Etude et l'Exploitation des Procédés Georges Claude Si-containing film forming precursors and methods of using the same
WO2018182318A1 (en) * 2017-03-29 2018-10-04 Dnf Co., Ltd. Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same
KR20180110612A (en) 2017-03-29 2018-10-10 (주)디엔에프 Compositions for depositing silicon-containing thin films containing bis(aminosilyl)alkylamine compound and methods for manufacturing silicon-containing thin film using the same
WO2018182305A1 (en) * 2017-03-29 2018-10-04 Dnf Co., Ltd. Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
KR102105977B1 (en) 2017-03-29 2020-05-04 (주)디엔에프 silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
WO2018182309A1 (en) * 2017-03-29 2018-10-04 Dnf Co., Ltd. Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110021130A (en) * 2009-08-25 2011-03-04 (주)디엔에프 Preparation of alkylaminosilane

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110021130A (en) * 2009-08-25 2011-03-04 (주)디엔에프 Preparation of alkylaminosilane

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
BLASZCZYK LEZAK ET AL.: "Silicon carbonitride films produced by remote hydrogen microwave plasma CVD using a (dimethylamino) dimethylsilane precurs or", CHEMICAL VAPOR DEPOSITION, vol. 11, no. L, 2005, pages 44 - 52, XP001225058, DOI: doi:10.1002/cvde.200406316 *
U. WANNAGAT ET AL.: "Zur Umset zung yon metallierten (Di)Alkylaminosilylamin en mit Chlorsilanen", CHEMICAL MONTHLY, vol. 99, no. 4, pages 1376 - 1382 *

Also Published As

Publication number Publication date
WO2014196827A2 (en) 2014-12-11

Similar Documents

Publication Publication Date Title
WO2014196827A3 (en) Novel amino-silyl amine compound, method for perparing the 'same and silicon-containing thin-film using the same
WO2014147525A3 (en) Perylenemonoimide and naphthalenemonoimide derivatives and their use in dye-sensitized solar cells
MX2016002433A (en) Substrate structure and method of manufacturing same.
EP2995697A4 (en) Stainless steel substrate for solar battery having excellent insulation properties and small thermal expansion coefficient, and process for producing same
WO2015008218A3 (en) Process for the preparation of suvorexant and intermediates useful in the synthesis of suvorexant
WO2016117814A3 (en) Novel crystal form of benzimidazole derivative and preparation method thereof
WO2014170913A3 (en) A novel transition metal based pro-catalyst and a process for its preparation
WO2015038267A3 (en) Graphene synthesis by suppressing evaporative substrate loss during low pressure chemical vapor deposition
WO2014140901A3 (en) Directional solidification system and method
CA2899024C (en) Crystalline forms of {[1-cyano-5-(4-chlorophenoxy)-4-hydroxy-isoquinoline-3-carbonyl]-amino}-acetic acid
WO2014197197A8 (en) High temperature geomembrane liners and master batch compositions
WO2014140850A3 (en) Aryloxy-phthalocyanines of group iv metals for use in solar cells
WO2013089478A3 (en) Method for preparing cysteine or a derivative thereof using a novel o-phosphoserine sulfhydrylase
WO2015022265A3 (en) Cyclobutyl carboxamides as nematicides
WO2013010882A3 (en) 2,3-diphenyl-valeronitrile derivatives, method for the production thereof and use thereof as herbicides and plant growth regulators
WO2016088081A8 (en) Processes for the preparation of ertugliflozin
WO2015062937A3 (en) Disperse dyes, their preparation and their use
GB2523674A (en) Compounds as inhibitor of DNA double-strand break repair, methods and applications thereof
WO2015079451A8 (en) Alkylphenol ethoxylates and a process for preparing the same
WO2014095158A3 (en) Method for the gentle heat-assisted shaping of keratin fibers
TN2015000336A1 (en) Production method of pyridazinone compounds
WO2016005903A3 (en) A process for obtaining exendin-4
EA201400882A1 (en) METHOD OF STEREOELECTIVE SYNTHESIS OF 9-HYDROXY-5-OXO-1,4-DIAZASPIRO [5.5] UNDECANES CONTAINING PROTECTIVE GROUPS IN 1,4-PROVISIONS
UA80249U (en) Process for the preparation of 6-n-substituted derivatives of 1,3-dimethyluracil-5-carbaldehydes
IN2013MU03089A (en)

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14807566

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 14896156

Country of ref document: US

ENP Entry into the national phase

Ref document number: 2016518275

Country of ref document: JP

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 14807566

Country of ref document: EP

Kind code of ref document: A2