WO2014178157A1 - Liquid crystal display device and display device substrate - Google Patents

Abstract

　This liquid crystal display device (1) is formed by arranging a display device substrate (12) and an array substrate (10) so as to face each other, and affixing the display device substrate (12) and the array substrate (10) to each other with a liquid crystal layer (11) interposed therebetween. A liquid crystal display device in which the display device substrate (12) has, provided on a transparent substrate (17): a black matrix (BM) having a plurality of pixel openings (2); and a transparent resin layer (20). The array substrate (10) is provided with: a plurality of active elements (3) corresponding to each of the pixel openings (2); and copper wiring (24) electrically connected to the active elements (3). The liquid crystal display device is provided with a color adjustment layer (18) having transmittance characteristics exhibiting a low transmittance with respect to a light wavelength region corresponding to a high reflectivity in copper, and a high transmittance with respect to a light wavelength region corresponding to a low reflectivity in copper, the color adjustment layer (18) overlapping with at least a part of the copper wiring (24) in plan view from the observer side.

Description

Liquid crystal display device and substrate for display device

The present invention relates to a liquid crystal display device including a copper wiring and a substrate for a display device.
Priority is claimed on Japanese Patent Application No. 2013-096,723, filed on Apr. 30, 2013, the content of which is incorporated herein by reference.

In the liquid crystal display device or the organic EL display device, in order to improve the image quality, a technology using copper interconnections instead of aluminum interconnections as interconnections electrically connected to active elements such as TFTs (thin film transistors) has been studied.

For example, Patent Document 1 (Japanese Patent Application Laid-Open No. 10-307303) discloses a technique for forming a copper wiring with an alkaline oxidizing solution. Patent Document 2 (Japanese Patent Laid-Open Publication No. 2011-135061) discloses a technology in which a copper wiring is used as a wiring of an active element formed using an oxide semiconductor.

Japanese Patent Application Laid-Open No. 10-307303 Japanese Patent Application Laid-Open No. 2011-135061

In a liquid crystal display device provided with a copper wiring, light may be reflected by the copper wiring, and the display quality may be degraded. The above-mentioned Patent Documents 1 and 2 do not disclose a technique for suppressing the reflected color of the copper wiring using a coloring material or a pigment to optimize the display color.

The present invention has been made in view of the above situation, and it is an object of the present invention to provide a liquid crystal display device and a substrate for a display device, which suppress the reflected color of copper wiring using coloring materials or pigments and optimize the display color. To aim.

In the first aspect of the present invention, a liquid crystal display device is formed by facing a display device substrate and an array substrate and bonding them through a liquid crystal layer. The display device substrate includes a black matrix having a plurality of pixel openings and a transparent resin layer on a transparent substrate. The array substrate includes a plurality of active elements corresponding to each of the plurality of pixel openings, and a copper wire electrically connected to the plurality of active elements. The liquid crystal display device overlaps with at least a part of the copper wiring in plan view from the viewer side, and exhibits low transmittance in a light wavelength region with high reflectance of copper and a light wavelength region with low reflectance of copper. And a color adjustment layer having a transmittance characteristic exhibiting high transmittance.
In addition, a liquid crystal display device includes a transparent substrate, a display substrate having a plurality of pixel openings and a black matrix provided on the transparent substrate, a transparent resin layer, a liquid crystal layer, and a plurality of the plurality. A plurality of active elements corresponding to each of the pixel openings and a copper wire electrically connected to the plurality of active elements, and pasted so as to face the display device substrate through the liquid crystal layer The combined array substrate overlaps with at least a portion of the copper wiring in a plan view viewed from an observer, and exhibits low transmittance in a light wavelength range with high reflectance of copper and light with low reflectance of the copper You may comprise the color-adjustment layer which has the transmittance | permeability characteristic which shows the high transmittance | permeability in a wavelength range.
Further, a liquid crystal display device includes a transparent substrate, a substrate for a display device having a plurality of pixel openings and a black matrix layer provided on the transparent substrate, and a transparent resin layer, a liquid crystal layer, A plurality of active elements corresponding to each of a plurality of pixel openings, and a copper wire electrically connected to the plurality of active elements are provided to face the display device substrate via the liquid crystal layer. It is laminated on the bonded array substrate and the black matrix layer of the display device substrate to constitute a black matrix, and at least a part of the copper wiring is overlapped in a plan view, and the light wavelength is high in copper reflectance The color adjustment layer may have a transmittance characteristic that exhibits a low transmittance in the region and a high transmittance in the light wavelength region where the reflectance of the copper is low.

In the first aspect, the copper wiring may include portions located in the plurality of pixel openings in a plan view. At least a part of the pattern of the color adjustment layer overlaps the portion of the pattern of the copper wiring which does not overlap with the black matrix in plan view.

In the first aspect, the color adjustment layer may be formed between the transparent substrate and the transparent resin layer.

In the first aspect, the liquid crystal display device may further include an adhesion improving resin layer between the transparent substrate and the black matrix. The pattern of the black matrix and the pattern of the adhesion improving resin layer may have the same shape in plan view.

In the first aspect, at least a part of the color adjustment layer may be provided in at least one of between the transparent substrate and the black matrix and between the black matrix and the transparent resin layer.

In the first aspect, the display device substrate may further include a red filter, a green filter, and a blue filter assigned to each of the plurality of pixel openings.

In the first aspect, the black matrix may contain an organic pigment as a main component of the light-shielding coloring material.

In the first aspect, the liquid crystal display device may have a display unit and a frame unit surrounding the display unit in plan view. The frame portion may contain carbon as a main component of the light-shielding color material.

In the second aspect of the present invention, the display device substrate is bonded to the array substrate provided with the copper wiring, with the liquid crystal layer interposed therebetween. The display device substrate includes, on a transparent substrate, a black matrix having a plurality of pixel openings, a red filter, a green filter, a blue filter, and a transparent resin layer assigned to each of the plurality of pixel openings. The display device substrate overlaps with at least a part of the copper wiring in a plan view from the viewer side, and exhibits low transmittance in a light wavelength region where the reflectance of copper is high and a light wavelength where the reflectance of copper is low. It further comprises a color adjustment layer having a transmittance characteristic showing high transmittance in the region.
In addition, the display device substrate is a display device substrate that faces the array substrate provided with a copper wiring and is bonded via a liquid crystal layer, and has a transparent substrate and a plurality of pixel openings. A black matrix provided on a substrate, a red filter, a green filter, a blue filter, a transparent resin layer, and a copper filter provided in a plan view as viewed from an observer allocated to each of the plurality of pixel openings. The color adjustment layer has a transmittance characteristic that overlaps a part and exhibits low transmittance in a light wavelength region with high copper reflectance and high transmittance in a light wavelength region with low copper reflectance. You may
In addition, the display device substrate is a display device substrate that faces the array substrate provided with a copper wiring and is bonded via a liquid crystal layer, and has a transparent substrate and a plurality of pixel openings. It is laminated on a black matrix layer provided on a substrate, a red filter, a green filter, a blue filter, a transparent resin layer, and a black resin layer assigned to each of the plurality of pixel openings, and viewed from the observer Transmittance showing at least a part of the copper wiring in a plan view and exhibiting low transmittance in a light wavelength region with high reflectance of copper and high transmittance in a light wavelength region with low reflectance of copper A color adjustment layer having characteristics may be provided.

In the second aspect, the color adjustment layer may be formed closer to the liquid crystal layer than the black matrix, the red filter, the green filter and the blue filter.

In the second aspect, the display device substrate may further include an adhesion improving resin layer between the transparent substrate and the black matrix.

In the second aspect, at least a part of the color adjustment layer may be formed on the interface between the transparent substrate and the black matrix in substantially the same pattern as the black matrix.

In the second aspect, the red filter, the green filter, and the blue filter are formed on the transparent substrate. A black matrix is formed on the red filter, the green filter, and the blue filter.

In the second aspect, the color adjustment layer may have a transmittance of about 30% to 80% of light at a wavelength of 620 nm.

In the second aspect, the adhesion improving resin layer may be a translucent resin layer.

In the second aspect, the adhesion improving resin layer may have a light transmittance of about 30% to 95% at a wavelength of about 550 nm.

In the second aspect, the adhesion improving resin layer may contain carbon.

In the second aspect, the color adjustment layer may contain an aluminum phthalocyanine pigment as a main component.

In the second aspect, the black matrix may contain an organic pigment as a main component of the light-shielding coloring material.

In the second aspect, the display device substrate may be provided with a display portion and a frame portion surrounding the display portion in plan view. The frame portion may contain carbon as a main component of the light-shielding color material.

In the aspect of the present invention, it is possible to provide a liquid crystal display device and a substrate for a display device in which a color material or a pigment is used to suppress a reflection color of a copper wiring and optimize a display color.

It is a top view which shows an example which looked at the array substrate of the liquid crystal display concerning a 1st embodiment from an observer. It is a top view which shows an example which looked at the color filter substrate of the liquid crystal display concerning a 1st embodiment from an observer. It is a figure which shows an example of the 1st cross section of the liquid crystal display device which concerns on 1st Embodiment. It is a figure which shows an example of the 2nd cross section of the liquid crystal display device which concerns on 2nd Embodiment. It is a graph which shows an example of the reflectance of copper. It is a graph which shows the example of the light transmission characteristic of a color adjustment layer. It is sectional drawing which shows an example of the liquid crystal display device which concerns on 2nd Embodiment. It is sectional drawing which shows an example of the liquid crystal display device which concerns on 3rd Embodiment. It is a top view which shows an example which looked at the array substrate of the liquid crystal display concerning a 4th embodiment from an observer. It is a sectional view showing an example of a liquid crystal display concerning a 4th embodiment. It is a top view showing an example which looked at a color filter substrate concerning a 5th embodiment from an observer. It is sectional drawing which shows an example of the liquid crystal display device which concerns on 5th Embodiment. It is sectional drawing which shows an example of the color filter substrate which concerns on 5th Embodiment. It is a top view which shows an example which looked at the black matrix and color filter which concern on 5th Embodiment from the alignment film side. It is a graph which shows the example of the light transmission characteristic of the color adjustment layer formed using the color adjustment layer photosensitive resist 2 which concerns on 6th Embodiment. It is a graph which shows the example of the light transmission characteristic of the color adjustment layer formed using the color adjustment layer photosensitive resist 3 which concerns on 6th Embodiment. It is a graph which shows the example of the light transmission characteristic of the color adjustment layer formed using the color adjustment layer photosensitive resist 4 which concerns on 6th Embodiment.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following description, the same or substantially the same functions and components will be denoted by the same reference numerals, and the description will be omitted or will be described only when necessary.

In each embodiment, only characteristic parts will be described, and description of parts that are not different from the components of a normal liquid crystal display device will be omitted.

In each embodiment, the case where the display unit of the liquid crystal display device is one pixel (or picture element) will be described. However, the display unit may be one sub-pixel, or a plurality of pixels (pixel number) may constitute the display unit, or any pixel or pixel defined arbitrarily may constitute the display unit. May be A pixel is assumed to be a polygon having at least two parallel sides.

In a plan view, the lateral direction of the pixel is parallel to the alignment direction of the right eye and the left eye of the observer.

In plan view, the direction perpendicular to the horizontal direction of the pixel is the vertical direction of the pixel.

Although each embodiment is described taking a liquid crystal display device as an example, the same applies to other display devices such as an organic EL display device.

First Embodiment
In the present embodiment, for example, a liquid crystal display device having liquid crystal molecules of which the initial alignment is vertical alignment and having a normally black characteristic will be described. The liquid crystal display device according to the present embodiment includes polarizing plates in a cross nicol relationship of approximately 90 degrees on the front and back surfaces of the liquid crystal display panel. In the present embodiment, the description of the polarizing plate and the retardation plate provided in the liquid crystal display device is omitted. The liquid crystal display device according to the present embodiment includes liquid crystal molecules having negative dielectric anisotropy.

FIG. 1 is a plan view showing an example of the array substrate of the liquid crystal display device according to the present embodiment as viewed from an observer.

The liquid crystal display device 1 includes an active element 3, a source line 4, a gate line 5, an auxiliary capacitance line 6, and an extended line 33 a in the pixel opening 2.

The active element 3 is, for example, a thin film transistor. The active element 3 includes, for example, a transparent channel layer 31 formed of an oxide semiconductor, a source electrode 32, a gate electrode, and a drain electrode 33. The oxide semiconductor may be composed of indium, gallium and zinc. In the present embodiment, the active element 3 is provided at the corner of the pixel opening 2. In the example of FIG. 1, the active element 3 is disposed at the upper left of the pixel opening 2.

The source line 4 is disposed on the side of the pixel opening 2 and extends in the vertical direction. Source line 4 is electrically connected to source electrode 32 of active element 3.

The gate lines 5 are disposed on the upper side and the lower side of the pixel opening 2 and extend in the lateral direction. Gate line 5 is electrically connected to the gate electrode of active element 3.

The storage capacitance line 6 extends in the lateral direction, and is disposed to cross substantially the central portion of the pixel opening 2.

The pixel electrode 7 is a conductive oxide film provided on the array substrate of the liquid crystal display device 1 and is, for example, a transparent conductive film (ITO, Indium Tin Oxide). The pixel electrode 7 is provided in the pixel opening 2. The pixel electrode 7 is supplied with a liquid crystal drive voltage from, for example, the contact hole 8 at the central portion of the pixel via the drain electrode 33 of the active element 3 and the extended line 33 a of the drain electrode 33. The pixel electrode 7 may have an auxiliary capacitance for driving liquid crystal with the auxiliary capacitance line 6.

For example, on a transparent substrate such as glass, a plurality of active elements 3, extended wires 33a, source lines 4, gate lines 5, storage capacitance lines 6, and pixel electrodes 7 are formed. An array substrate having pixels is formed.

From the viewpoint of the observer, in the first layer, the source line 4, the source electrode 32 and the drain electrode 33 of the active element 3, and the extension 33 a are disposed, and in the second layer below the first layer, the active element The gate electrode 3, the gate line 5, and the storage capacitance line 6 are disposed.

The source line 4 has, for example, a two-layer structure in which copper is formed on titanium. In the present embodiment, the gate line 5, the storage capacitance line 6, and the extension line 33a also have a two-layer structure in which copper is formed on, for example, titanium.

FIG. 2 is a plan view showing an example of the color filter substrate of the liquid crystal display device 1 according to the present embodiment as viewed from an observer. FIG. 2 corresponds to a portion of the color filter substrate overlapping the pixel opening 2 shown in FIG.

The black matrix BM (black matrix layer) formed on the color filter substrate (substrate for display device) is formed at a position covering the source line 4, the gate line 5 and the active element 3 shown in FIG. Ru.

The color adjustment layer 18 is disposed to overlap the black matrix BM, the auxiliary capacitance line 6, and the extended line 33a in plan view.

The color adjustment layer 18 may be disposed below the black matrix BM. The color adjustment layer 18 may be formed to be in direct contact with the black matrix BM (black matrix layer). As a structure of the black matrix, a two-layer structure constituted by the color adjustment layer 18 and the black matrix layer may be adopted.

FIG. 3 is a view showing an example of the first cross section of the liquid crystal display device 1 and corresponds to the A-A ′ cross section of FIG. 1 and FIG. 2 described above.

The liquid crystal display device 1 includes a liquid crystal panel 9. The liquid crystal panel 9 includes an array substrate 10, a liquid crystal layer 11, and a color filter substrate 12. The array substrate 10 and the color filter substrate 12 face each other through the liquid crystal layer 11.

The array substrate 10 includes a transparent substrate 13, insulating layers (transparent resin) 14 a to 14 c, active elements 3, extended wires 33 a, pixel electrodes 15, and an alignment film 16.

For example, a glass plate is used as the transparent substrate 13.

An insulating layer 14 a is formed on the first plane (surface facing the liquid crystal layer 11) of the transparent substrate 13. The gate electrode 34 of the active element 3 is formed on the insulating layer 14 a. An insulating layer 14 b is formed on the insulating layer 14 a on which the gate electrode 34 is formed. The source electrode 32 and the drain electrode 33 of the active element 3 and the extended wire 33 a of the drain electrode 33 are formed on the insulating layer 14 b. An insulating layer 14c is formed on the insulating layer 14b on which the source electrode 32, the drain electrode 33, and the extended wire 33a are formed. The pixel electrode 15 is formed on the insulating layer 14c.

The alignment film 16 of the array substrate 10 is located near the liquid crystal layer 11. A second plane (opposite to the first plane) of the transparent substrate 13 of the array substrate 10 faces the inside of the liquid crystal display device 1.

The color filter substrate 12 includes a transparent substrate 17, a color adjustment layer 18, a black matrix BM, a color filter 19, an overcoat layer (transparent resin layer) 20, a counter electrode (common electrode) 21, and an alignment film 22. And

For example, glass is used as the transparent substrate 11.

A color adjustment layer 18 is formed on the first plane (surface facing the liquid crystal layer 11) of the transparent substrate 17. A black matrix BM is formed on the color adjustment layer 18. A color filter 19 is formed on the color adjustment layer 18 and the transparent substrate 17 on which the black matrix BM is formed. In the color filter 19, one of a red filter RF, a green filter GF, and a blue filter BF is disposed for each pixel. An overcoat layer 20 is formed on the color filter 19. The counter electrode 21 is formed on the overcoat layer 20. An alignment film 22 is formed on the counter electrode 21.

The alignment film 22 of the color filter substrate 12 is located near the liquid crystal layer 11. The second plane (surface opposite to the first plane) of the transparent substrate 17 of the color filter substrate 12 is a surface facing the viewer.

In the present embodiment, the liquid crystal molecules of the liquid crystal layer 11 have an initial vertical alignment, and have negative dielectric anisotropy.

In FIG. 3, the transistor structure of the active element 3 is illustrated as a bottom gate structure as an example. However, the transistor structure of the active element 3 may be a top gate structure, a double gate structure, a dual gate structure, or a bottom contact structure.

FIG. 4 is a view showing an example of the second cross section of the liquid crystal display device 1, and corresponds to the B-B 'cross section of FIG. 1 and FIG. 2 described above.

Source line 4 and extended line 33 a are formed on insulating layer 14 b of array substrate 10. An insulating layer 14c is formed on the insulating layer 14b in which the source line 4 and the extended line 33a are formed.

An overcoat layer 20 is formed on the color filter 19.

In FIGS. 1 to 4 described above, the metal wires such as the source electrode 32, the drain electrode 33, the gate electrode 34, the source line 4, the gate line 5, the auxiliary capacitance line 6, and the extended line 33a are titanium layers 23 and copper layers 24. It has a two-layer structure including (copper wiring).

The oxide of the transparent channel layer 31 (channel layer) of the active element 3 is gallium (Ga), indium (In), zinc (Zn), hafnium (Hf), tin (Sn), yttrium (Y), germanium (Ge) And two or more mixed oxides selected from The transparent channel layer 31 formed of two or more or three or more complex oxides is in an amorphous state. After forming the transparent channel layer 31 or after forming the pattern of the transparent channel layer 31, heat treatment is performed within a range of approximately 250 ° C. or more and 500 ° C. or less to crystallize the complex oxide, thereby forming each of the transistors. The electrical properties can be stabilized and homogenized. By performing annealing with laser light on a part of a plurality of transistors (transparent channel layer 31) formed on the same substrate, it is possible to change electric characteristics such as threshold voltage Vth among the plurality of transistors. Can. The heat treatment condition of the complex oxide is preferably a high temperature range of about 500 ° C. or higher. The heat resistance of copper, which is a metal that forms the source electrode 32, the drain electrode 33, the gate electrode 34, the source line 4, the gate line 5, the storage line 6, the extended line 33a, and the like is limited. Heat treatment can be performed in a short time at 500 ° C. or higher by an RTA (Rapid Thermal Anneal) method.

As described above, in the active element 3, the transparent channel layer 31 is the above complex oxide, and the metal wiring such as the source electrode 32, the drain electrode 33, and the gate electrode 34 is a two-layer structure of the titanium layer 23 and the copper layer 24. There is. Titanium can be substituted for refractory metals such as molybdenum or tungsten.

The gate line 4 and the extended line 33a shown in FIG. 4 are formed on the insulating layer 14b by, for example, a titanium layer 23 having a thickness of about 8 nm and a copper layer 24 having a thickness of about 250 nm. The insulating layers 14a to 14c may be formed of, for example, silicon nitride, silicon oxide, or a mixture of these materials. The insulating layers 14a to 14c may be, for example, two layers of silicon nitride and a transparent resin.

When copper wiring is used for the conventional liquid crystal display device, light reflection occurs due to the copper wiring.

FIG. 5 is a graph showing an example of the reflectance of copper. The vertical axis of this graph represents reflectance (%). The horizontal axis represents the wavelength (nm) of light. The reflectivity of copper is low in the low wavelength region of light and high in the high wavelength region of light. For example, the reflectivity of copper has a high reflectivity on the long wavelength side after about 550 nm. In the conventional liquid crystal display device, for example, since the extended wire 33a from the active element 3 is located at the pixel opening 2, when the extended wire 33a is copper, the redness inherent to light reflection of copper is displayed in the display color. Join. Also in the case where the storage capacitance line 6 is copper, redness inherent to light reflection of copper is similarly added to the display color.

In this embodiment, copper may contain less than about 3% foreign metals or impurities. Examples of dissimilar metals that may be added to copper include magnesium, aluminum, indium and tin. The smaller the added amount of such dissimilar metals, the more preferable is the reflectivity of copper.

On the other hand, in the present embodiment, the color adjustment layer 18 is formed as shown in FIG. The color adjustment layer 18 and the black matrix BM have a two-layer configuration.

In the pixel of the liquid crystal display device 1 according to the present embodiment, at least a part of the pattern of the color adjustment layer 18 is formed in substantially the same shape as the storage capacitance line 6, the extended line 33a, and the like in plan view.

FIG. 6 is a graph showing an example of the light transmission characteristic of the color adjustment layer 18. The vertical axis of this graph represents the transmittance (%). The horizontal axis represents the wavelength (nm) of light.

In the present embodiment, the transmittance of the color adjustment layer 18 is high in the wavelength range of low light and low in the wavelength range of high light. Therefore, the characteristics of the reflectance color of copper shown in FIG. 5 and the characteristics of the transmittance of the color adjustment layer 18 shown in FIG. 6 have an inverse correlation with changes in the wavelength of light. For example, the transmittance of the color adjustment layer 18 is high transmittance in the range of about 430 nm to less than 550 nm. The transmittance of the color adjustment layer 18 has a feature of absorbing light in a range of about 550 nm to 700 nm, and is low in transmission. This transmittance characteristic is generally close to that of a color filter called cyan. The blue filter, which is usually employed for color filters, also has an absorption band in a wavelength range of about 500 nm to less than 550 nm. Copper thin films are less reflective in the short wavelength range than in the green light wavelength range. For this reason, in the case where a color adjustment layer containing a blue color material or an adhesion improving resin layer is formed as a main color material, the green reflection component becomes too low, which is suitable for compensating for the red inherent to light reflection of copper. Absent. Here, the main color material is a color material having a mass ratio of 50% or more to the total amount of color materials dispersed or added to the color adjustment layer or the adhesion improving resin layer. However, even when the blue color material is included in the color adjustment layer, the transmittance in the red wavelength region of the color adjustment layer is approximately 30% or more or 40% or less to make the color substantially cyan. Can.

The transmittance characteristics of the color adjustment layer 18 may be inversely correlated with the reflectance characteristics of the copper wiring instead of the reflectance of copper.

A red filter RF, a green filter GF, and a blue filter BF are provided in the respective pixel openings 2 in FIGS. 2 to 4 in plan view. The color filter 19 including the red filter RF, the green filter GF, and the blue filter BF may be omitted. When the color filter 19 including the red filter RF, the green filter GF, and the blue filter BF is omitted, a backlight unit including color LED light sources emitting red, green, and blue light is an array of the liquid crystal display device 1 The backside of the substrate 10 is provided. When a backlight unit provided with a color LED light source is used, the liquid crystal layer 11 for each pixel and the color LED light source of each color are time-division driven to realize color display. The color filter 19 is also omitted when an organic EL display that emits red, green, and blue light is used.

The color material or film thickness of the color adjustment layer 18 will be described later. The transmittance characteristics of the color adjustment layer 18 according to the second and third embodiments described later have less absorption in the light wavelength range of 550 nm to 700 nm than the transmittance characteristics of FIG. 6 described above. It may be a high transmittance. Therefore, in the second and third embodiments described later, the film thickness of the color adjustment layer 18 can be reduced.

The color adjustment layer 18 may contain an ultraviolet absorber. When an ultraviolet light absorber is added to the color adjustment layer 18, the rereflection of ultraviolet light in the liquid crystal panel 9 can be alleviated, and fluctuation of the threshold voltage Vth of a transistor using an oxide semiconductor can be prevented. . As a ultraviolet absorber, a benzotriazole type compound, a benzophenone series compound, a salicylic acid type compound, a coumarin type compound etc. are used, for example. To these UV absorbers, for example, light stabilizers such as hindered amine compounds or quenchers (for example, singlet oxygen quenchers) may be added.

In the present embodiment, having absorption in the visible light region of about light wavelength 550 nm or more and 700 nm or less means that the transmittance of about 430 nm or more and less than 550 nm which is shorter than light wavelength 550 nm is about 550 nm or more Mean transmittance characteristics above a transmittance of 700 nm or less and mean S-shaped transmittance characteristics. Typically, a complementary cyan filter can be used as the color adjustment layer 18. However, as the color adjustment layer 18, another color filter that cancels out the redness that is a reflected color of copper may be used. Four representative transmission characteristics are shown in FIG. 6 above.

When the representative light wavelength in the light wavelength range in which the reflectance of copper is high is 620 nm, the transmittance of the color adjustment layer 18 may be included in the range of about 30% to about 80% of the light wavelength.

When the representative wavelength of the region having a high reflectance of copper is approximately 620 nm, the transmittance of the color adjustment layer 18 may be in the range of approximately 30% to 80%.

When the color adjustment layer 18 is formed on the black matrix BM closer to the liquid crystal layer 11, the color adjustment layer 18 reduces the amount of addition of the coloring material to achieve a transmittance of about 40% to 80%. It is also good. The transmittance of 40% or more is 0.4 or less in optical density conversion.

If the transmittance near about 620 nm of the color adjustment layer 18 is too low, for example, less than about 30%, the reflected color becomes too bluish past reddish. If the transmittance around 620 nm of the color adjustment layer 18 is high, for example, more than about 85%, the correction of the copper reflection color may be insufficient, and redness may remain in the reflection color.

The adhesion improving resin layer to be described later is formed on the interface between the transparent substrate 17 and the black matrix BM, so that it is possible to give priority to a neutral reflection color in the visible range. Therefore, the transmittance when the representative light wavelength is approximately 550 nm may be in the range of approximately 30% to 95%.

In the present embodiment, the transmittance refers to the transparent non-alkali glass used in the liquid crystal display device 1.

The reflectance is based on the reflectance of a magnesium oxide standard white plate.

In the present embodiment, in the liquid crystal display device 1 provided with the copper wiring for transmitting the electric signal to the plurality of active elements 3, it is possible to suppress the appearance of the reflected color of copper.

The reflected light from the copper wiring includes internally reflected light of emitted light from the backlight unit or rereflected light of external light which is incident on the display surface of the liquid crystal display device 1.

In the present embodiment, the effects of the change in display color based on the reflected color of the copper wiring, and the reflected light from inside the liquid crystal display device 1 using the copper wiring and re-reflected light in the liquid crystal panel 9 are eliminated. Can. Further, in the present embodiment, the influence of the constituent members of the liquid crystal panel 9 such as a polarization plate can be eliminated.

In the present embodiment, it is possible to improve the quality of black display (display when the liquid crystal drive voltage is off) of the liquid crystal display device 1 having a slight reddishness depending on the optical conditions such as the cell gap of the liquid crystal panel 9. .

Therefore, in the present embodiment, a color material or a pigment can be used to suppress the reflected color of the copper wiring, and the display color can be optimized.

In the present embodiment, by providing the copper wiring with high conductivity, it is possible to realize the liquid crystal display device 1 with high speed and without response unevenness.

Second Embodiment
In the present embodiment, a modification of the first embodiment will be described.

FIG. 7 is a cross-sectional view showing an example of a liquid crystal display device 1A according to the present embodiment.

In the color filter substrate 12A of the liquid crystal display device 1A, the overcoat layer 20a is formed on the color filter 19. The color adjustment layer 18a is formed on the overcoat layer 20a. Overcoat layer 20b is formed on overcoat layer 20a in which color adjustment layer 18a was formed. The counter electrode 21 is formed on the overcoat layer 20b. At least a part of the pattern of the color adjustment layer 18 a overlaps a portion of the pattern of the copper wiring 24 not overlapping the black matrix BM in a plan view (located in a portion not overlapping the black matrix BM). In other words, in plan view, the color adjustment layer 18a (the pattern of the color adjustment layer 18a) is positioned so as to overlap the extended wire 33a which is a copper wiring. Further, the color adjustment layer 18 a overlaps the storage capacitance line 6 which is a portion not overlapping with the black matrix BM in plan view.

In the liquid crystal display device 1A according to the present embodiment, the color adjustment layer 18 is formed at the interface between the transparent substrate 17 and the black matrix BM.

The color adjustment layer 18 a is formed at a position overlapping with the black matrix BM via the color filter 19 and the overcoat layer 20 a in plan view. Further, the color adjustment layer 18a is formed in the pixel opening 2 at a position facing the color filter 19 (green filter GF in FIG. 7) via the overcoat layer 20a in plan view.

The color adjustment layer 18 a is disposed to cover the source line 4 and the extended line 33 a in a plan view as viewed from the observer.

The main role of the color adjustment layers 18 and 18a is to reduce redness based on reflected light and re-reflected light including oblique directions from copper wiring included in the wire 33a and the source line 4 or the like.

Further, as described in the fourth embodiment described later, the color adjustment layers 18 and 18a may be colored using a cyan pigment. Further, the color adjustment layers 18 and 18a can suppress the reflected light of the black matrix BM to the outside of the liquid crystal panel 9A by adding a carbon coloring material of approximately 18% by mass or less.

In the present embodiment, the position of the color adjustment layer 18a can be brought closer to the positions of the copper interconnections such as the extended wire 33a and the source line 4, so that re-reflected light from the copper interconnection can be efficiently suppressed. .

Third Embodiment
In this embodiment, modifications of the first and second embodiments will be described.

FIG. 8 is a cross-sectional view showing an example of a liquid crystal display device 1B according to the present embodiment.

The color adjustment layer 18 is formed at the interface between the transparent substrate 17 and the black matrix BM in the color filter substrate 12.

Further, the color adjustment layer 18 b is formed on the copper interconnection included in the source line 4 in the array substrate 10 B and the copper interconnection included in the extended wire 33 a.

In the array substrate 10B, the insulating layer 14d is formed on the insulating layer 14c. The color adjustment layer 18 b is formed on the insulating layer 14 d. An insulating layer 14e is formed on the insulating layer 14d on which the color adjustment layer 18b is formed. The pixel electrode 15 is formed on the insulating layer 14e. An alignment film 16 is formed on the insulating layer 14 e on which the pixel electrode 15 is formed.

The color adjustment layer 18b in the array substrate 10B is formed to overlap the source line 4 and the extended line 33a via the insulating layers 14c and 14d in plan view, that is, in the direction perpendicular to the display surface.

Through holes are formed in the insulating layers 14 c and 14 d, and the pixel electrode 15 may be electrically connected to the extended line 33 a of the drain electrode 33.

In the present embodiment, the color adjustment layer 18 b is formed at a position closest to the copper wiring in the film thickness direction as compared with the above embodiment. Therefore, it is possible to prevent the reflected light component in the oblique direction from being emitted from the display surface.

Fourth Embodiment
In this embodiment, modified examples of the first to third embodiments will be described.

In the present embodiment, the alignment process for the alignment films 16 and 22 uses photo-alignment, but mechanical alignment such as rubbing may be used. The alignment direction of the alignment films 16 and 22 is inclined at an angle of about 15 degrees with respect to the optical axis of the polarizing plate. In the following, the description of the polarizing plate and the retardation plate is omitted.

In the present embodiment, the liquid crystal molecules may have negative dielectric anisotropy or may have positive dielectric anisotropy.

FIG. 9 is a plan view showing an example of the array substrate 10C of the liquid crystal display device 1C according to the present embodiment as viewed from the observer.

The array substrate 10C includes the source line 4, the gate line 5, and the storage capacitance line 61.

The source line 4 is disposed on the side of the pixel opening 2 and extends in the vertical direction. Source line 4 is electrically connected to source electrode 32 of active element 3.

The gate line 5 is disposed on the lower side of the pixel opening 2 and extends in the lateral direction. Gate line 5 is electrically connected to gate electrode 34 of active element 3.

The storage capacitance line 61 is disposed on the upper side of the pixel opening 2 and extends in the lateral direction. The storage capacitance line 61 is formed of a titanium layer 23 having a thickness of about 8 nm and a copper layer 24 having a thickness of about 250 nm, as in the first embodiment.

In the present embodiment, the common electrode 25 is formed in a layer above the source line 4. A comb-like pixel electrode 26 is formed in a layer above the common electrode 25.

The pixel electrode 26 is formed as a comb-like pattern having an axis in the longitudinal direction, as shown in FIG.

The active element 3 is formed at the lower left of the pixel. The transparent channel layer 31 of the active element 3 may be, for example, IGZO (registered trademark, indium oxide, gallium oxide, mixed oxide of zinc oxide) having a film thickness of about 30 nm.

The common electrode 25 is electrically connected to the storage capacitance line 61 via the contact hole 81. The common electrode 25 and the pixel electrode 26 may have an auxiliary capacitance via an insulating layer.

FIG. 10 is a cross-sectional view showing an example of the liquid crystal display device 1C, and corresponds to the C-C 'cross section of FIG. 9 described above.

In the liquid crystal panel 9C of the liquid crystal display device 1C according to the present embodiment, the array substrate 10C and the color filter substrate 12C face each other via the liquid crystal layer 11.

The array substrate 10C includes a common electrode 25 and a pixel electrode 26 which are transparent conductive films (ITO).

The insulating layer 14a is formed on the first plane (the surface facing the liquid crystal layer 11) of the transparent substrate 13 of the array substrate 10C. Source line 4 is formed on insulating layer 14a. An insulating layer 14 b is formed on the insulating layer 14 a on which the source line 4 is formed. The common electrode 25 is formed on the insulating layer 14 b. An insulating layer 14c is formed on the insulating layer 14b on which the common electrode 25 is formed. A comb-like pixel electrode 26 is formed on the insulating layer 14c. An alignment film 16 is formed on the insulating layer 14c on which the pixel electrode 26 is formed.

The alignment film 16 of the array substrate 10C is located near the liquid crystal layer 11. The second plane (opposite to the first plane) of the transparent substrate 13 of the array substrate 10C faces the inside of the liquid crystal display device 1C.

The adhesion improving resin layer 27 is formed on the first flat surface (surface facing the liquid crystal layer 11) of the color filter substrate 12C (surface facing the liquid crystal layer 11) and at the boundary between the pixels in a plan view. A black matrix BM is formed on the adhesion improving resin layer 27. The color adjustment layer 18 c is formed on the black matrix BM. A color filter 19 is formed on the transparent substrate 17 on which the adhesion improving resin layer 27, the black matrix BM, and the color adjustment layer 18c are formed. An overcoat layer 20 and an alignment film 22 are formed on the color filter 19.

The alignment film 22 of the color filter substrate 12C is located near the liquid crystal layer 11. The second plane (opposite to the first plane) of the transparent substrate 17 of the color filter substrate 12C is a surface facing the viewer.

For example, the adhesion improving resin layer 27 may be a translucent resin. The adhesion improving resin layer 27 may be a translucent resin containing carbon.

The black matrix BM is sandwiched between the color adjustment layer 18 c having a film thickness of about 0.3 μm and the adhesion improving resin layer 27.

Usually, the black matrix BM is formed of, for example, a thin film of about 1.5 μm or less in order to not adversely affect the alignment of the liquid crystal. The black matrix BM has high light shielding properties, and has a high content of light shielding coloring materials such as carbon. The black matrix BM contains about 40% or more and 60% or less of carbon by mass ratio of solid ratio. Therefore, peeling is likely to occur in a photolithography process including exposure and development. The ratio of the coloring material or the pigment contained in the color adjustment layer 18c or the adhesion improving resin layer 27 according to the present embodiment may be about 35% or less. Thus, it is possible to eliminate the peeling of the black matrix BM containing high concentration of carbon at the time of development.

The coloring material contained in the adhesion improving resin layer 27 may be a combination of pigments exhibiting cyan.

In the present embodiment, the color adjustment layer 18 c may be configured to sandwich the upper surface and the lower surface of the black matrix BM.

In addition, numerical values, such as various film thickness illustrated by this embodiment, are not limited to this, It can change suitably.

Fifth Embodiment
In the present embodiment, a modification of the fourth embodiment will be described.

FIG. 11 is a plan view showing an example of the color filter substrate according to the present embodiment as viewed from an observer.

In FIG. 11, a red filter RF, a green filter GF, a blue filter BF, and a black matrix BM are shown.

FIG. 12 is a cross-sectional view showing an example of a liquid crystal display device 1D according to the present embodiment.

FIG. 13 is a cross-sectional view showing an example of a color filter substrate 12D according to the present embodiment.

The color filter substrate 12D of the liquid crystal display device 1D according to the present embodiment includes a display unit 28 and a frame unit 29.

A color filter 19 is formed on a first plane (surface facing the liquid crystal layer 11) of the transparent substrate 17 of the color filter substrate 12D. A black matrix BM is formed on the color filters 19 and at the boundaries of the pixels in plan view. The color adjustment layer 18 c is formed on the black matrix BM. An overcoat layer 20 and an alignment film 22 are formed on the color filter 19 on which the black matrix Bm and the color adjustment layer 18c are formed.

The alignment film 22 of the color filter substrate 12D is located near the liquid crystal layer 11. The second plane (opposite to the first plane) of the transparent substrate 17 of the color filter substrate 12D is a surface facing the viewer.

As a light shielding member used for the black matrix BM, a light shielding resist 2 described later is used. The light shielding resist 2 is formed by mixing and dispersing plural kinds of organic pigments in a transparent resin, and has a light shielding property in a visible region. For example, as in the first embodiment, the color adjustment layer 18c is more absorptive in the light wavelength range of approximately 550 nm to 700 nm than the light wavelength range of approximately 400 nm or more and less than 550 nm.

In the present embodiment, the position of the black matrix BM is arranged closest to the liquid crystal layer 11 except the overcoat layer 20 and the alignment film 22 among the components of the color filter substrate 12D. By forming a black matrix BM at this position, in the liquid crystal display device 1D of IPS (In-Plane-Switching) driving system (horizontal electric field system using liquid crystal molecules in horizontal alignment), color mixture from adjacent pixels is suppressed. be able to.

In the liquid crystal display device 1D of the IPS drive system, even when the operation propagation distance in the horizontal direction of the liquid crystal molecules is long and the adjacent pixels are in the off state (no drive voltage application), Affected, prone to light leakage. In other words, making the position of the black matrix BM close to the liquid crystal layer 11 can suppress light leakage due to crosstalk when driving adjacent pixels. In a high definition liquid crystal display device of about 300 ppi (pixels per inch) or 400 ppi or more, it is easy to give an adjacent pixel light leakage in an oblique direction which is unlikely to occur in a large pixel. By making the position of the black matrix BM close to the liquid crystal layer 11, it is possible to further suppress light leakage in the oblique direction caused by the miniaturization of the pixels.

The black matrix BM is formed by mixing and dispersing a plurality of organic pigments in a transparent resin, and has a light shielding property in the visible range of light. When the black matrix BM is formed at a position close to the liquid crystal layer 11, the dielectric constant of the black matrix containing the carbon coloring material is high. For this reason, in the vicinity of the black matrix BM containing a carbon coloring material, the equipotential line of the drive voltage applied to the liquid crystal layer 11 is distorted, and light leakage is likely to occur. Therefore, in the color filter substrate 1D according to the present embodiment, it is preferable to use the main material of the light-shielding color material as the organic pigment.

FIG. 14 is a plan view showing an example of the black matrix BM and the color filter 19 according to this embodiment as viewed from the alignment film 22. As shown in FIG.

The frame portion 29 is composed of two layers of a light shielding layer of a carbon colorant having an optical density of about 4.5 and a pigment colorant having an optical density of about 1.0.

As described above, the black matrix BM is formed on the color filter 19 (red filter RF, green filter GF, blue filter BF) in a single layer configuration of the light shielding layer containing a pigment coloring material.

The alignment mark necessary for alignment of the color filter 19 or the light shielding layer of the pigment coloring material is formed of the same material as the light shielding layer of the carbon coloring material in the same process when forming the light shielding layer of the carbon coloring material. The frame portion 29 needs to sufficiently block the light from the backlight provided on the back surface of the liquid crystal display device 1D, and for example, an optical density of 4 or more is required. Since the black matrix BM in which the light-shielding color material is a pigment transmits infrared rays in the near-infrared region, alignment marks formed of carbon colorants can be aligned using near-infrared light and a near-infrared camera. Alignment marks formed using a carbon colorant are difficult to transmit near infrared light.

Sixth Embodiment
In this embodiment, materials used for the display device substrates ( array substrates 10, 10B, 10C and color filter substrates 12, 12A, 12C, 12D) described in the above embodiments will be described.

(About a layer constituting at least one of the color adjustment layers 18, 18a, 18b, 18c and the color material for the adhesion improving resin layer 27)
The color materials to be applied to the layers constituting at least one of the color adjustment layers 18, 18a, 18b and 18c and the adhesion improving resin layer 27 will be shown below.

The spectral characteristics of the pigment applied to the layer constituting at least one of the color adjustment layers 18, 18a, 18b and 18c and the adhesion improving resin layer 27 according to the present embodiment are generally that the bottom of the spectral curve is floating. And, it may have a broad high transmittance called cyan. Pigments having such spectral characteristics are produced, for example, by combining organic pigments. On the other hand, a color adjustment layer of spectral characteristics which is called blue and has a high transmittance portion on the short wavelength side is not suitable. It is preferable that the transmission areas of the layers constituting at least one of the color adjustment layers 18, 18a, 18b, and 18c and the adhesion improving resin layer 27 cover (belong to) approximately two transmission areas of blue and green. The layer constituting at least one of the color adjustment layers 18, 18a, 18b, and 18c and the adhesion improving resin layer 27 has a light wavelength corresponding to a green transmission peak and a visible light range of about 550 nm to 700 nm, that is, copper It is desirable to have absorption performance in the region of high reflectivity of In other words, it is desirable that the half value of the color adjustment layers 18, 18a, 18b, and 18c (for example, the light wavelength corresponding to the half transmittance of the peak transmittance) be longer than about 550 nm.

For example, the layer constituting at least one of the color adjustment layers 18, 18a, 18b and 18c and the adhesion improving resin layer 27 may contain a small amount of carbon having an optical density of about 0.4 or less as a coloring material. For example, when the adhesion improving resin layer 27 contains a small amount of carbon having an optical density of about 0.4 or less, coloring due to interference color or the like due to light reflection of the black matrix BM seen from the transparent substrate 17 can be suppressed. , Neutral reflection color can be displayed.

Aluminum phthalocyanine, copper phthalocyanine, zinc phthalocyanine or the like is used as a coloring material of the layer constituting at least one of the color adjustment layers 18, 18a, 18b, 18c and the adhesion improving resin layer 27. These phthalocyanine pigments can be adjusted in color tone by the amount of bromine (Br) and chlorine (Cl) having a phthalocyanine structure. The aluminum phthalocyanine pigment is used as a coloring material for reproducing a cyan color because it has a broad transmission range exceeding the wavelength range of light of about 400 nm to 550 nm. As the aluminum phthalocyanine pigment, for example, the pigment described in Japanese Patent No. 3837037 can be applied. As a copper phthalocyanine pigment, for example, C.I. I. Pigment green 7, C.I. I. Pigment green 36 can be used. As a zinc phthalocyanine pigment, for example, C.I. I. Pigment green 58 can be used. The above coloring materials are added as main coloring materials of the color adjustment layers 18, 18a, 18b and 18c in a range of about 5% by mass to 35% by mass with respect to mass% of solid ratio including transparent resin Good. The wavelength of light to be adjusted is in the visible range. From the viewpoint of copper reflection color suppression, it is desirable that the light to be adjusted has, for example, an optical wavelength of about 620 nm and an optical density of less than about 0.5. For example, when the light to be adjusted has an optical wavelength of about 620 nm and an optical density of about 0.5 or more, the color of the added coloring material is too strong to cause an adverse effect.

A small amount of blue pigment is added to the layer constituting at least one of the color adjustment layers 18, 18a, 18b, 18c and the adhesion improving resin layer 27 in order to provide absorption performance in the area of high reflectivity of copper. May be Examples of blue pigments include C.I. I. Pigment blue 15: 3, C.I. I. Pigment blue 15: 4, C.I. I. Pigment blue 15: 6, C.I. I. Pigment green 7, C.I. I. Pigment green 36, C.I. I. Pigment green 58 can be used. These auxiliary pigments can be added to adjust the color of the above-mentioned phthalocyanine pigments.

The color adjustment layers 18, 18a, 18b, and 18c are formed, for example, with a film thickness of about 0.1 μm or more and 0.8 μm or less by a well-known photolithography method. When the color adjustment layers 18, 18a, 18b, and 18c are thicker than about 0.8 μm, the total film thickness of the color adjustment layers 18, 18a, 18b, and 18c and the black matrix BM becomes too thick, which adversely affects the alignment of liquid crystals. . The color adjustment layer 18, 18a, 18b, 18c is thicker than approximately 0.8 μm, and the transmittance of the layer constituting at least one of the color adjustment layer 18, 18a, 18b, 18c and the adhesion improving resin layer 27 is high. In this case, the iridescent interference of light is likely to occur between the transparent substrate 17 and the black matrix BM, and the display quality is degraded. With a thin film thickness of about 0.1 μm or less, it is difficult to ensure film thickness accuracy. The resin, the heavy synthesis monomer, the photopolymerization initiator, the solvent and the like used for the photosensitive resin composition will be described later. The red filter RF of the color filter 19, the green filter GF, and the pigment used for the blue filter BF will also be described later.

(Example of color adjustment layer resist adjustment)
<Color Adjustment Layer Photosensitive Resist 1>
The color adjustment layer photosensitive resist 1 is prepared by As a coloring material, aluminum phthalocyanine and C.I. I. Pigment blue 15: 4 in 35 parts by mass of a mixture having a mass ratio of 81/19, B.I. 60 parts by mass of a methacrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer (copolymerization weight ratio = 15/70/15, Mw = 28,000) as an alkali-soluble resin, C.I. As a polyfunctional monomer, 40 parts by mass of dipentaerythritol hexaacrylate, D.I. 10 parts by mass of 2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole as a photopolymerization initiator, 4,4′-bis (diethylamino) benzophenone It is prepared by mixing 10 parts by mass and 1,100 parts by mass of ethyl 3-ethoxypropionate as a solvent.

The transmittances of the color adjustment layers 18, 18a, 18b and 18c are controlled by adjusting the amount of addition of the solvent, adjusting the film ratio of the main coloring material aluminum phthalocyanine, and adjusting the pigment ratio of the pigment described later It can be adjusted by addition. In FIG. 6 described above, representative transmittance characteristics 1a, 1b, 1c, 1d of the color adjustment layer formed using the color adjustment layer photosensitive resist 1 are shown. The transmittance characteristics 1a, 1b, 1c and 1d as shown in FIG. 6 can be adjusted by adjusting the concentration of the colorant or the film thickness of the color adjustment layer.

<Color Adjustment Layer Photosensitive Resist 2>
The color adjustment layer photosensitive resist 2 is prepared by As a coloring material, C.I. I. Pigment blue 15: 3 single pigment (33 parts by mass). B. Other Elements in Color Adjustment Layer Photosensitive Resist 2 Alkali soluble resin, C.I. Multifunctional monomer, D.I. The photopolymerization initiator is the same as that of the above-mentioned color adjustment layer photosensitive resist 1.

FIG. 15 is a graph showing an example of the light transmission characteristic of the color adjustment layer formed using the color adjustment layer photosensitive resist 2.

In FIG. 15, representative transmittance characteristics 2a, 2b, 2c and 2d of the color adjustment layer formed using the color adjustment layer photosensitive resist 2 are shown. The transmittance characteristics 2a, 2b, 2c and 2d as shown in FIG. 15 can be adjusted by adjusting the concentration of the colorant or the thickness of the color adjustment layer.

<Color adjustment layer photosensitive resist 3>
The color adjustment layer photosensitive resist 3 is prepared from A.I. As a coloring material, C.I. I. Pigment green 7 and C.I. I. Pigment Blue 15: 3 in 35 parts by weight of a 50/50 mixture by weight, B.I. 60 parts by mass of a methacrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer (copolymerization weight ratio = 15/70/15, Mw = 28,000) as an alkali-soluble resin, C.I. As a polyfunctional monomer, 40 parts by mass of dipentaerythritol hexaacrylate, D.I. 10 parts by mass of 2,2′-bis (2,4-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole as a photopolymerization initiator, 4,4′-bis (diethylamino) benzophenone It is prepared by mixing 10 parts by mass and 1,100 parts by mass of ethyl 3-ethoxypropionate as a solvent.

FIG. 16 is a graph showing an example of the light transmission characteristics of the color adjustment layer formed using the color adjustment layer photosensitive resist 3.

In FIG. 16, typical transmittance characteristics 3a, 3b, 3c and 3d of the color adjustment layer formed using the color adjustment layer photosensitive resist 3 are shown. The transmittance characteristics 3a, 3b, 3c, 3d as shown in FIG. 16 can be adjusted by adjusting the concentration of the coloring material or the film thickness of the color adjustment layer.

<Color Adjustment Layer Photosensitive Resist 4>
The color control layer photosensitive resist 4 is prepared by As a coloring material, aluminum phthalocyanine, C.I. I. Pigment blue 15: 4, C.I. I. A mixture of pigment yellow 138 is used as 35 parts by mass. B. Other Elements in Color Adjustment Layer Photosensitive Resist 4 Alkali soluble resin, C.I. Multifunctional monomer, D.I. The photopolymerization initiator is the same as that of the above-mentioned color adjustment layer photosensitive resist 1.

FIG. 17 is a graph showing an example of the light transmission characteristic of the color adjustment layer formed using the color adjustment layer photosensitive resist 4.

In FIG. 17, representative transmittance characteristics 4a, 4b, 4c, 4d of the color adjustment layer formed using the color adjustment layer photosensitive resist 4 are shown. The transmittance characteristics 4a, 4b, 4c and 4d as shown in FIG. 17 can be adjusted by adjusting the concentration of the coloring material or the film thickness of the color adjustment layer.

The resin, the initiator, the monomer and the like are selected from various materials described later. In order to uniformly reduce the transmittance in a wide range of visible range, the color adjustment layers 18, 18a, 18b and 18c are made of a light-shielding coloring material carbon in an amount of 10% by mass or less based on the solid ratio of all coloring materials You may add. In other words, by adding a small amount of carbon of the light-shielding coloring material to the color adjustment layers 18, 18a, 18b, and 18c, the reflected light from the surface of the black matrix BM becomes approximately 0.5% or less in a wide range of visible range. It can be suppressed.

(An example of adhesion improvement resin layer resist adjustment)
Dipentaerythritol penta / hexaacrylate mixture ("KayaraD DPHA" manufactured by Nippon Kayaku Co., Ltd.) with respect to 16.48 g of bisphenol fluorene type epoxy resin ("V 259-ME" solid content 56.1% manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.) 02 g, 0.21 g of a photopolymerization initiator (“NCI-831” manufactured by ADEKA), and a dispersion of a carbon black (carbon coloring material) in propylene glycol monomethyl ether acetate (solid content 26.0%, carbon black concentration in solid content) 75.0 mass%) 9.69 g and 71.59 g of propylene glycol monomethyl ether acetate are added and stirred well to obtain an adhesion improving resin layer resist, 100 g (solid content 14.0%, carbon black concentration 13.5 mass%, An optical density of 1.0 / μm) is produced.

In each of the above embodiments, the film thickness after hardening of the adhesion improving resin layer 27 is approximately 0.3 μm. The effective optical density is about 0.3.

(Photosensitive resin composition)
The color adjustment layers 18, 18a, 18b and 18c and the adhesion improving resin layer 27 of the present embodiment are a light shielding coloring material in a photosensitive resin composition containing at least a resin, a polymerizable monomer, a photopolymerization initiator and a solvent. Or it is made by adding a pigment. The color filter 19 including the red filter RF, the green filter GF, and the blue filter BF may be colored by adding a pigment described later to the photosensitive resin composition.

<Resin>
As the resin, for example, alkyl acrylate or alkyl methacrylate such as acrylic acid, methacrylic acid, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, cyclic cyclohexyl acrylate or methacrylate, hydroxyethyl acrylate or methacrylate, A resin having a molecular weight of about 5,000 to 100,000, which is synthesized using about 3 to 5 kinds of monomers such as styrene, is used.

It is obtained by reacting a compound such as the above acrylic resin, isocyanate ethyl acrylate having an isocyanate group and one or more vinyl groups, methacryloyl isocyanate, etc. as a resin in which unsaturated double bond is added to a part of acrylic resin. A photosensitive copolymer having an acid value of 50 or more and 150 or less is preferably used from the viewpoint of heat resistance, developability and the like.

As the resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, polycarboxylic acid glycidyl ester, polyol polyglycidyl ester, aliphatic or alicyclic epoxy resin, amine epoxy resin, triphenolmethane type epoxy Also usable are ordinary photopolymerizable resins such as epoxy (meth) acrylates obtained by reacting an epoxy resin such as a dihydroxybenzene type epoxy resin and (meth) acrylic acid, and a cardo resin.

<Polymerizable monomer>
As the photopolymerizable monomer, for example, ethylene glycol (meth) acrylate, diethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, dipropylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, polypropylene glycol Di (meth) acrylate, hexane di (meth) acrylate, neopentyl glycol di (meth) acrylate, glycerin di (meth) acrylate, glycerin tri (meth) acrylate, glycerin tetra (meth) acrylate, tetratrimethylolpropane tri (meth) Acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta ( Data) acrylate, dipentaerythritol hexa (meth) acrylate and the like are used. These components are used alone or as a mixture. As the photopolymerizable monomer, for example, various modified (meth) acrylates, urethane (meth) acrylates and the like can also be used. In particular, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, and dipentaerythritol hexa (meth) acrylate, which have a small double bond equivalent and can achieve high sensitivity, are preferably used.

The content of the photopolymerizable monomer is preferably about 5% by weight or more and 20% by weight or less in the solid content of the photosensitive resin composition. The content of the photopolymerizable monomer is more preferably in the range of about 10% by weight or more and 15% by weight or less. When the content of the photopolymerizable monomer is in this range, the sensitivity of the photosensitive resin composition and the development rate can be adjusted to a level suitable for production. When the content of the photopolymerizable monomer is less than about 5% by weight, the sensitivity of the black photosensitive resin composition is insufficient.

<Photoinitiator>
As the photopolymerization initiator, a conventionally known compound may be suitably used. As a photoinitiator, it is preferable that an oxime ester compound is used. The oxime ester compound can realize high sensitivity when it is used for a black photosensitive resin composition which does not transmit light.

Specific examples of the oxime ester compound include 2- (O-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2-octanedione, 1- (O-acetyloxime) -1- [9 -Ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl] ethanone (both manufactured by BASF Japan Ltd.) and the like are used.

The content of the photopolymerization initiator is preferably about 0.5% by weight or more and 10.0% by weight or less in the solid content of the photosensitive resin composition, and more preferably about 1.0% by weight or more It is the range of 5.0 weight% or less. When the content of the photopolymerization initiator is less than about 1% by weight, the sensitivity of the photosensitive resin composition is insufficient. When the content of the photopolymerization initiator is more than about 10% by weight, the pattern line width of the black matrix becomes too thick.

In the photosensitive resin composition used for this embodiment, other photoinitiators can be used together with said photoinitiator.

Other photopolymerization initiators include 4-phenoxydichloroacetophenone, 4-t-butyl-dichloroacetophenone, diethoxyacetophenone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2-methyl-1 [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl)- Acetophenone compounds such as butan-1-one, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin compounds such as benzyl dimethyl ketal, benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-pheny Benzophenone compounds such as benzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl-4′-methyldiphenyl sulfide, 3,3 ′, 4,4′-tetra (t-butylperoxycarbonyl) benzophenone, thioxanthone, 2- Thioxanthone compounds such as chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone, 2,4-diisopropylthioxanthone, 2,4-diethylthioxanthone, 2,4,6-trichloro-s-triazine, 2-phenyl-4,6- Bis (trichloromethyl) -s-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -S-Triage , 2-piperonyl-4,6-bis (trichloromethyl) -s-triazine, 2,4-bis (trichloromethyl) -6-styryl-s-triazine, 2- (naphth-1-yl) -4,6 -Bis (trichloromethyl) -s-triazine, 2- (4-methoxy-naphth-1-yl) -4,6-bis (trichloromethyl) -s-triazine, 2,4-trichloromethyl- (piperonyl)- Triazine compounds such as 6-triazine, 2,4-trichloromethyl (4'-methoxystyryl) -6-triazine, bis (2,4,6-trimethylbenzoyl) phenyl phosphine oxide, 2,4,6-trimethylbenzoyl Phosphine compounds such as diphenyl phosphine oxide, 9,10-phenanthrene quinone, camphor quinone, ethyl anthra A quinone compound such as quinone, a borate compound, a carbazole compound, an imidazole compound, a titanocene compound or the like is used. These photopolymerization initiators may be used alone or in combination of two or more at any ratio as required. The content of the other photopolymerization initiator is preferably about 0.1% by weight or more and 1% by weight or less, more preferably about 0.2% by weight or more, of the solid content of the photosensitive resin composition. .5% by weight or less.

<Solvent>
As the solvent, methanol, ethanol, ethyl cellosolve, ethyl cellosolve acetate, diglyme, cyclohexanone, ethylbenzene, xylene, isoamyl acetate, n-amyl acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol mono Ethyl ether acetate, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, triethylene glycol, Polyethylene glycol monomethyl ether, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether, triethylene glycol monoethyl ether acetate, liquid polyethylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether Dipropylene glycol monoethyl ether acetate, lactic acid ester, ethyl ethoxy propionate and the like are used.

<Light-shielding color material>
As the light-shielding coloring material according to the present embodiment, carbon black (also referred to as carbon in each embodiment) is preferable. As the carbon black, lamp black, acetylene black, thermal black, channel black, furnace black or the like may be used.

<Pigment>
Examples of red pigments used to form the red filter RF include C.I. I. Pigment Red 7, 9, 14, 41, 48: 1, 48: 2, 48: 3, 48: 4, 81: 1, 81: 2, 81: 3, 97, 122, 123, 146, 149, 168, 177 178, 179, 180, 184, 185, 187, 192, 200, 202, 208, 210, 215, 216, 217, 220, 224, 226, 227, 228, 240, 246, 254, 255, 264 272, 279, etc. may be used. In order to adjust the hue of the red filter RF, a red pigment and at least one of a yellow pigment and an orange pigment may be used in combination.

As yellow pigments, C.I. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 144, 146, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, It may be used, such as 73,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214.

As an orange pigment, C.I. I. Pigment Orange 36, 43, 51, 55, 59, 61, 71, 73, and the like may be used.

As a green pigment for forming a green filter GF, for example, C.I. I. Pigment Green 7, 10, 36, 37, 58, etc. may be used. A green pigment and a yellow pigment may be used in combination to adjust the hue of the green filter GF. As a yellow pigment, a yellow pigment that can be used in combination to adjust the hue of the red filter RF may be appropriately used.

Examples of blue pigments for forming the blue filter BF include C.I. I. Pigment blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, etc. may be used. In order to adjust the hue of the blue filter BF, a blue pigment and a purple pigment may be used in combination. Specific examples of the purple pigment include C.I. I. Pigment Violet 1, 19, 23, 27, 29, 30, 32, 37, 40, 42, 50, etc. may be used.

The pigments listed above may be used as coloring materials for the color adjustment layers 18, 18a, 18b and 18c. In the following, C.I. I. Pigment Yellow 139 to Y139, C.I. I. Pigment blue 15: 6 is B15: 6, C.I. I. Pigment Violet 23 may be abbreviated as V23.

(Example of the light shielding resist 1 applied to the frame portion 29)
In the liquid crystal display device 1D, a high light shielding property is required of the frame portion. Therefore, it is preferable that the main material of the light shielding color material is carbon.

Further, the frame portion 29 mainly made of carbon as a light shielding color material has a high relative dielectric constant. Therefore, it is desirable that the frame portion 29 be formed at a position far from the liquid crystal layer in the film thickness direction.

A mixture having the following composition is uniformly mixed by stirring, and is stirred by a bead mill disperser to form a black paste. The composition of the mixture is expressed in parts by weight.

Carbon pigment 20 parts Dispersant 8.3 parts Copper phthalocyanine derivative 1.0 part Propylene glycol monomethyl ether acetate 71 parts Using the above black paste, the mixture of the following composition is stirred and mixed so as to be uniform, approximately 5 μm A light shielding resist 1 is prepared which is filtered by a filter and applied to the light shielding layer 18. In the present embodiment, a resist refers to a photosensitive coloring composition containing carbon or an organic pigment.

Black paste 25.2 parts Acrylic resin solution 18 parts Dipentaerythritol penta and hexaacrylate 5.2 parts Photopolymerization initiator 1.2 parts Sensitizer 0.3 parts Leveling agent 0.1 part Cyclohexanone 25 parts Propylene glycol monomethyl ether Acetate 25 parts In this embodiment, the main coloring material (pigment) in the black resist 1 or the color resist is a color exceeding 50% with respect to the total mass ratio (%) of the coloring material (pigment) contained in the resist Means wood. For example, in the black resist 1, carbon accounts for 100% of the coloring material, and carbon is the main coloring material. In addition, in the case of the black resist 1 mainly composed of carbon, in order to adjust the color tone or the reflection color, an organic pigment such as red, yellow, blue or the like is added with a total mass ratio of 10% or less as a standard. It is also good. The target coating film thickness can be adjusted by the addition amount of solvent such as cyclohexanone.

(Example of the light shielding resist 2 applied to the black matrix BM of the fifth embodiment)
The fifth embodiment is a liquid crystal display device 1D of a driving method called IPS or FFS (Fringe Field Switching).

The liquid crystal display device 1D of the IPS driving method includes liquid crystal molecules in the initial horizontal alignment, and causes the liquid crystal molecules to rotate on the plane in which the pixel electrodes 26 of the array substrate 10C are arranged. Therefore, it is desirable that the black matrix BM have a low relative dielectric constant so as not to affect the rotational movement of liquid crystal molecules.

In order to lower the relative dielectric constant of the black matrix BM, carbon may not be used, or the amount of carbon added may be reduced, and the light shielding resist may contain a combination of a plurality of organic pigments.

Before the color resist (colored composition) is made, the pigment is dispersed in a resin or solution to make a pigment paste (dispersion liquid). For example, in order to disperse the yellow pigment Y139 alone in a resin or a solution, the following materials are mixed with 7 parts (by mass) of the yellow pigment Y139.

Acrylic resin solution (solid content 20%) 40 parts Dispersant 0.5 part Cyclohexanone 23.0 parts Note that other pigments such as red, purple and blue are also dispersed in the same resin or solution to make a pigment dispersion paste It may be done.

Below, the composition ratio for producing the light-shielding resist 2 is illustrated based on said pigment dispersion paste.

Y139 paste 13 parts B15: 6 paste 5 parts V23 paste 20 parts acrylic resin solution 14 parts acrylic monomer 4.2 parts initiator 0.7 part sensitizer 0.4 part cyclohexanone 27 parts PGMAC 11 parts according to the above composition ratio The light shielding resist 2 used in the black matrix according to the third embodiment is formed.

In the liquid crystal display device 1D, black is displayed (displayed when the liquid crystal drive voltage is in the off state), and is affected by other liquid crystal panel components such as a polarizing plate or according to optical conditions such as a cell gap of a liquid crystal cell. The display may be slightly reddish. The observer prefers a black (slightly bluish) black display to a reddish black display.

The display device substrate according to each of the above-described embodiments can eliminate the redness that is generated based on the copper wiring as described above. The above embodiments may also be applied to, for example, a liquid crystal display device provided with a wiring formed of another material other than copper wiring, such as aluminum wiring.

The liquid crystal display device according to each of the above embodiments may be any liquid crystal drive system of vertical alignment and vertical electric field VA (Virtical Alignment) and horizontal alignment and horizontal electric field IPS, and may be another liquid crystal drive system. As another liquid crystal drive system, for example, ECB (Electrically Controlled Birefringence), FFS, OCB (Optically Compensated Bend), blue phase or the like is used.

The display device substrate board according to each of the above embodiments can be applied to a liquid crystal display device and an organic EL display device including copper wiring.

The above-described embodiments can be variously modified and applied as long as the spirit of the invention does not change. Each above-mentioned embodiment can be used combining freely.

1, 1A to 1D: liquid crystal display device, 2: pixel opening, 3: active element, 31: transparent channel layer, 32: source electrode, 33: drain electrode, 33a: extended wire, 34: gate electrode, 4: source Line 5 5 gate line 6 61 auxiliary capacitance line 7 pixel electrode 8 81 contact hole BM black matrix 9, 9A 9C liquid crystal panel 10 10B array substrate 11 Liquid crystal layer 12, 12A, 12C, 12D: color filter substrate (substrate for display device) 13, transparent substrate, 14a to 14e: insulating layer, 15, 26: pixel electrode, 16, 22: alignment film, 17: transparent Substrate, 18, 18a to 18c: color adjustment layer, 19: color filter, RF: red filter, GF: green filter, BF: blue filter, 20, 20a, 20b: overcoat layer (transparent tree Layer), 21 ... counter electrode, 23 ... titanium layer, 24 ... copper layer (copper wire), 25 ... common electrode, 27 ... adhesion improving resin layer, 28 ... display unit, 29 ... frame portion.

Claims (20)

1. In a liquid crystal display device formed by facing a display device substrate and an array substrate and bonding them through a liquid crystal layer,
   The display device substrate includes, on a transparent substrate, a black matrix having a plurality of pixel openings, and a transparent resin layer.
   The array substrate includes a plurality of active elements corresponding to each of the plurality of pixel openings, and a copper wire electrically connected to the plurality of active elements.
   In a plan view from the observer side, it overlaps at least a part of the copper wiring and exhibits low transmittance in a light wavelength range with high copper reflectance and high transmission in a light wavelength range with low copper reflectance A liquid crystal display device comprising a color adjustment layer having a transmittance characteristic indicating a rate.
2. The copper wiring includes a portion located in the plurality of pixel openings in the plan view,
   2. The liquid crystal display device according to claim 1, wherein at least a part of the pattern of the color adjustment layer overlaps the portion of the pattern of the copper wiring which does not overlap the black matrix in the plan view.
3. The liquid crystal display device according to claim 1, wherein the color adjustment layer is formed between the transparent substrate and the transparent resin layer.
4. An adhesion improving resin layer is further provided between the transparent substrate and the black matrix,
   The liquid crystal display device according to any one of claims 1 to 3, wherein the pattern of the black matrix and the pattern of the adhesion improving resin layer have the same shape in the plan view.
5. The at least one portion of the color adjustment layer is provided in at least one of between the transparent substrate and the black matrix, and between the black matrix and the transparent resin layer. 4. The liquid crystal display device according to any one of 4.
6. The liquid crystal display device according to any one of claims 1 to 5, wherein the display device substrate further includes a red filter, a green filter, and a blue filter assigned to each of the plurality of pixel openings.
7. The liquid crystal display device according to any one of claims 1 to 6, wherein the black matrix contains an organic pigment as a main component of a light-shielding coloring material.
8. In the plan view, the display unit includes a display unit and a frame unit surrounding the display unit.
   The liquid crystal display device according to any one of claims 1 to 7, wherein the frame portion contains carbon as a main material of a light shielding color material.
9. In a substrate for a display device which is opposed to an array substrate provided with copper wiring and is bonded via a liquid crystal layer,
   A black matrix having a plurality of pixel openings and a red filter, a green filter, a blue filter, and a transparent resin layer assigned to each of the plurality of pixel openings are provided on a transparent substrate,
   In a plan view from the observer side, it overlaps at least a part of the copper wiring and exhibits low transmittance in a light wavelength range with high copper reflectance and high transmission in a light wavelength range with low copper reflectance A substrate for a display device, further comprising a color adjustment layer having a transmittance characteristic indicating a rate.
10. 10. The display device substrate according to claim 9, wherein the color adjustment layer is formed closer to the liquid crystal layer than the black matrix, the red filter, the green filter, and the blue filter.
11. 11. The display device substrate according to claim 9, further comprising an adhesion improving resin layer between the transparent substrate and the black matrix.
12. The color matching layer according to any one of claims 9 to 11, wherein at least a part of the color adjustment layer is formed in substantially the same pattern as the black matrix at the interface between the transparent substrate and the black matrix. Display substrate.
13. The red filter, the green filter, and the blue filter are formed on the transparent substrate,
    The substrate for a display device according to any one of claims 9 to 12, wherein the black matrix is formed on the red filter, the green filter, and the blue filter.
14. The display device substrate according to any one of claims 9 to 13, wherein the color adjustment layer has a transmittance of about 30% to 80% at a wavelength of about 620 nm of light.
15. The display device substrate according to claim 11, wherein the adhesion improving resin layer is a translucent resin layer.
16. The substrate for a display device according to claim 11 or 15, wherein the adhesion improving resin layer has a transmittance of about 30% to about 95% at a wavelength of about 550 nm of light.
17. The substrate for a display device according to any one of claims 11, 15, and 16, wherein the adhesion improving resin layer contains carbon.
18. The display device substrate according to any one of claims 9 to 17, wherein the color adjustment layer contains an aluminum phthalocyanine pigment.
19. The substrate for a display device according to any one of claims 9 to 18, wherein the black matrix contains an organic pigment as a main component of a light-shielding coloring material.
20. In the plan view, the display unit includes a display unit and a frame unit surrounding the display unit.
    20. The display device substrate according to any one of claims 9 to 19, wherein the frame portion contains carbon as a main material of a light shielding color material.
    

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