WO2014167095A1 - Hybrid magnet support structure - Google Patents

Hybrid magnet support structure Download PDF

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Publication number
WO2014167095A1
WO2014167095A1 PCT/EP2014/057368 EP2014057368W WO2014167095A1 WO 2014167095 A1 WO2014167095 A1 WO 2014167095A1 EP 2014057368 W EP2014057368 W EP 2014057368W WO 2014167095 A1 WO2014167095 A1 WO 2014167095A1
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WO
WIPO (PCT)
Prior art keywords
support structure
magnet support
folded plate
profile
magnetic field
Prior art date
Application number
PCT/EP2014/057368
Other languages
French (fr)
Inventor
Niek DEWILDE
Ivan Van De Putte
Wilmert De Bosscher
Original Assignee
Soleras Advanced Coatings Bvba
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Publication date
Application filed by Soleras Advanced Coatings Bvba filed Critical Soleras Advanced Coatings Bvba
Publication of WO2014167095A1 publication Critical patent/WO2014167095A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3414Targets
    • H01J37/342Hollow targets
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)

Definitions

  • the present invention generally relates to sputtering magnetron devices. More specifically, the present invention relates to a magnet support structure and corresponding sputtering magnetron for use with rotatable targets, as are typically used in systems for providing coatings for substrates having a large surface.
  • Sputtering is a technique of applying a coating to a substrate.
  • Sputter deposition has become the general practice in a wide range of technical areas, such as for example during the production of hard disks or memory devices for computers, during the application of optical coatings on glass, during the coating of flat monitors, etc.
  • Such sputtering is carried out in a reduced-pressure atmosphere in which sputtering or reacting gases or mixtures of both are supplied in a controlled manner. Free electrons which move in a magnetically limited path in this case ionize the gas atoms or molecules in the vicinity of the target surface. These ions are subsequently accelerated towards the target which is charged negatively, as a result of which the atoms are released from the target upon impact and gain sufficient kinetic energy to reach the substrate and coat it.
  • the shape of the path is determined by a magnetic field close to the target surface. Due to the presence of the magnetic field, such a deposition process is generally referred to as "magnetron sputtering".
  • the magnet element remains stationary while the cylindrical rotating target rotates around it, it is possible to achieve targeted deposition (the plasma region is stationary) while the target material is removed relatively evenly across the entire tube.
  • it remains a technical challenge to provide accurate cooling and electrical power supply when using a cylindrical rotating target in a vacuum environment.
  • the magnet element has to be provided inside the cylindrical rotating target in an accurate manner. Since the restricted path of the free electrons in the plasma is determined by the component of the magnetic field which runs parallel to the surface of the target, it is very important that this component is constant along the entire length of the cylindrical rotating target. Nevertheless, the magnetic induction of this component typically varies by at least a power of two of the distance to the magnet element, as a result of which small variations in the distance between the magnet element and the target surface can have a critical effect. The distance between the magnet element and the target surface thus has to be checked particularly carefully, so that local variations in the plasma intensity and corresponding variations in the thickness of the deposited layer can be prevented.
  • Another technical difficulty is to provide accurate cooling.
  • the majority of the power which is supplied to the target is converted into heat at the surface of the target. This heat has to be dissipated efficiently in order to prevent the target from heating up excessively and the magnet element from losing its power at higher temperatures.
  • a water-based cooling circuit is provided for this purpose.
  • Patent application US2012/0152738 Al describes a magnetron configuration for a cylindrical rotating target in which a tube structure is provided with a number of coolant ducts.
  • the magnet element is in this case provided on the outer side of the tube structure, close against the sputter surface. By providing coolant between the outer side of the tube structure and the cylindrical, rotating target, the target and the magnets are cooled accurately.
  • the magnet element is in direct contact with coolant, as a result of which the magnet element used has to be water-resistant in order to continue to be able to ensure accurate operation thereof.
  • an extruded aluminium tube structure is provided with one or more cooling compartments which extend along the length of the tube structure and have a compartment in which the magnet element can be accommodated.
  • the compartment in which the magnet element can be accommodated is in this case protected against the coolant, so that the magnet element does not come into contact with the coolant during use.
  • the aluminium tube structure is dimensionally stable and rigid, as a result of which the magnetron configuration is not or hardly prone to deformation during its service life.
  • Such a configuration has the drawback that the extruded aluminium tube structure itself is surrounded by coolant under high pressure and that aluminium is susceptible to electrocorrosion.
  • the present invention relates to a magnet support structure which is insertable in a cylindrical, rotatable sputter target, the magnet support structure comprising:
  • a tube structure with a set of compartments which extend along substantially the entire length of the tube structure, wherein an elongate magnetic field generator can be fitted in one of said compartments and wherein at least one of the compartments can be used as a cooling duct,
  • the tube structure comprises at least one folded plate profile for forming the compartment suitable for fitting an elongate magnetic field generator, wherein the folded plate profile has a flat part adapted for serving as a reference surface for aligning the elongate magnetic field generator.
  • a system which comprises an accurate reference surface for referencing and adjusting the magnet system with respect to the target tube.
  • the specific manner of construction in which the reference surface is formed by a folded plate profile and the specific form of the plate profile result in a particularly flat reference surface which is not or hardly susceptible to deformation while producing the specific shape of the plate profile.
  • This is unlike for example conventional extruded profiles which may per se already be less fixed with regard to tolerances and in which, in addition, the reference surface is typically formed by an inner rib which is less readily accessible during extrusion for cooling and which thus develops a greater degree of deformation.
  • the flat reference surface can be achieved without this requiring further specific processing, such as machining or finishing.
  • the wall in the longitudinal direction of the compartment may be closed and may be made from one folded plate profile.
  • the folded plate profile is therefore closed at the ends in the longitudinal direction, so that it has a seam there, i.e. at this location, the ends are connected to each other. It is an advantage of an embodiment according to the present invention that the number of seams in the device is limited. This is not only advantageous during manufacture since much less welding has to be carried out, but also promotes the strength and reliability of the system, as seams may develop cracks or other detrimental effects more quickly than other parts of the folded plate. In addition, welding causes deformation which is reduced if less welding is required.
  • the surface can be straightened after welding in some locations as well.
  • the tube structure may comprise several, for example at least two or at least three, folded plate profiles which are fastened to each other in order to form walls in the longitudinal direction of the set of compartments. In some embodiments, this may be exactly three folded plate profiles. It is an advantage of embodiments of the present invention that a system is provided which has the same outer diameter as conventional systems, but which has a larger inner opening, resulting in more space for the magnetic system and for coolant, due to the fact that the walls are thinner because of the use of a stainless steel folded profile instead of, for example, an extruded profile. This makes it possible to use more complex magnetic fields and stronger fields. In addition, the cooling efficiency of the sputter target can remain at least at the same level as for conventional systems.
  • the system combines these properties with sufficient rigidity. It is an advantage of embodiments of the present invention that exact positioning of the magnetic field generator can be achieved, not only because a reference surface has been provided which has very narrow tolerances and which can serve as reference for adjusting the position of the magnetic field generator, but also because the specific construction of the tube structure makes it possible to choose slightly thicker sheet metal for the folded plate which forms the compartment for fitting the elongate magnetic field generator. If desired, the other plate profiles may be made from thinner sheet metal because the tolerance of the other zones (for example as cooling duct) is less critical.
  • the several, for example at least two or at least three, folded plate profiles may each per se form a wall in the longitudinal direction of a compartment and may in addition be fastened to each other in such a way that the spaces between the folded plate profiles which are fastened to each other also form independent compartments.
  • the wall of the compartment, suitable for fitting the magnetic field generator may be composed of one single folded plate profile in the longitudinal direction. This implies that the occurrence of leaks at the junctions between different plate profiles, where seals are typically provided, has no impact on whether the compartment suitable for fitting the magnetic field generator is dry.
  • the at least one folded plate profile may be a stainless steel profile. It is an advantage of embodiments according to the present invention that a non-corroding material can be used which makes it possible to construct the device as having a relatively thin wall structure, while at the same time ensuring the strength of the device. This is in contrast with, for example, systems in which other non-corroding materials, such as plastic, are used, requiring a much greater wall thickness in order to achieve an equal and sufficient degree of strength of the device.
  • the folded plate profiles may be composed of materials which are compatible with a magnetron configuration, as a result of which electrocorrosion or chemical reactivity can be limited to a minimum.
  • electrocorrosion or chemical reactivity can be limited to a minimum.
  • other metals such as e.g. (optionally extruded) aluminium are used, as a result of which the potential difference (of the work function) with the other metals in the environment and immersed in a liquid in which (ionic) conduction may occur, may give rise to electrocorrosion.
  • the tube structure may furthermore comprise an extruded profile which is anchored to the folded plate profile which forms the compartment suitable for fitting an elongate magnetic field generator. It is an advantage of embodiments of the present invention that, in addition to the folded plate profile, an extruded profile is also present and is situated in the folded plate profile to ensure additional stabilisation against deformation during use, so that narrower tolerances are achieved. The combination of the folded plate profile and the extruded profile ensures a stable reference for fitting the elongate magnetic field generator, optionally by means of a modification system.
  • the shape of the extruded profile and the folded plate profile may be modified so that they are in tangent contact on at least one side, better still on two sides, preferably on three sides, over a part of their length. It is an advantage of an embodiment according to the present invention that the additional stabilisation may prevent the side walls of the central profile in the device from folding inwards under the effect of, for example, water pressure from water which is present on one side of the profile for cooling purposes.
  • the extruded profile may be surrounded by a folded plate profile along substantially its entire length.
  • the extruded profile may be an aluminium profile.
  • the tube structure may be modified so that the compartment suitable for fitting an elongate magnetic field generator is a dry compartment separated from the coolant.
  • the magnet support structure may furthermore comprise an elongate magnetic field generator.
  • the magnet support structure may furthermore comprise a modification system for modifying the magnet configuration during use of the magnet support structure. It is an advantage of an embodiment according to the present invention that online, i.e. during use, modifications of the magnet configuration can be accurately carried out due to the fact that a reference surface with very narrow tolerances has been provided.
  • the modification system may be modified to align the magnet configuration by reference to the reference surface. It is an advantage of an embodiment according to the present invention that the reference surface has narrow tolerances.
  • the tube structure may comprise at least one compartment which acts as a cooling duct and is positioned on the outer wall of the tube structure.
  • a combination of compartments may be provided, so that a set of cooling ducts is produced which are configured such that a substantially homogenous distribution of the coolant along the length of the tube structure is achieved.
  • the present invention also relates to a sputtering magnetron installation which comprises a magnet support structure as described above.
  • FIG. 1 and FIG. 2 illustrate a cross section and an isometric projection, respectively, of a magnet support structure composed of three folded plate profiles according to an embodiment of the present invention.
  • FIG. 3 shows an isometric projection of a magnet support structure composed of three folded plate profiles and an extruded profile positioned inside one of the folded plate profiles, according to an embodiment of the present invention.
  • FIG. 4 and FIG. 5 illustrate a cross section and an isometric projection, respectively, of a magnet support structure provided with an extruded profile and a magnet element, according to an embodiment of the present invention.
  • FIG. 6 and FIG. 7 illustrate a cross section and an isometric projection, respectively, of a magnet support structure provided with an extruded profile, a magnet element and a control system for positioning the magnet element, according to an embodiment of the present invention.
  • the drawings are only diagrammatic and non-limiting. For illustrative purposes, the dimensions of some components may have been exaggerated and not been illustrated to scale in the figures.
  • the present invention comprises a magnet support structure which is insertable in a cylindrical, rotatable sputter target.
  • a magnet support structure may typically form part of a sputtering magnetron configuration.
  • the magnet support structure is in this case adapted to position an elongate magnetic field generator, for example a magnet element, in the cylindrical rotatable sputter target.
  • an elongate magnetic field generator for example a magnet element
  • FIG. 1 to FIG. 2 show an exemplary magnet support structure 100 in cross section and in isometric perspective, respectively.
  • the magnet support structure 100 comprises a tube structure with a set of compartments 110a, 110b, 110c, HOd, HOe which extend along substantially the entire length of the tube structure. Due to the fact that the compartments extend along substantially the entire length of the tube structure, an accurate magnetic field can be generated and accurate cooling can be provided along the entire length of the cylindrical target. At least one of these compartments 110a - typically the compartment which is situated closest to the centre - is suitable for fitting/positioning an elongate magnetic field generator, for example a magnet element 160 (for example illustrated in FIG. 7). According to embodiments of the present invention, this compartment 110a is formed by at least one folded plate profile 120a.
  • the wall in the longitudinal direction of the compartment 110a suitable for fitting/positioning is formed by at least one folded plate profile 120a, preferably by exactly one folded plate profile 120a.
  • the folded plate profile 120a is preferably made from a material which is not susceptible to electrocorrosion, such as for example stainless steel or titanium.
  • the folded plate profile 120a may have a thickness in the range from 0.6 mm to 5 mm.
  • the folded plate profile 120a may be folded in such a manner that it has a closed form, in which case, for example, the ends in the longitudinal direction of the plate are welded together.
  • the weld may be produced by, for example, laser-welding.
  • the folded plate profile 120a also has a flat part 122a.
  • a flat part 122a is very suitable to act as a reference surface for aligning the positioning of the elongate magnetic field generator 160.
  • This reference surface 122a can be used during the initial alignment of the magnetic field generator 160, during recalibration of the alignment of the magnetic field generator 160, as well as during the online adjustment of the position of the magnetic field generator in magnetron sputter systems which are provided with a control system in order to adjust the position of the magnetic field generator 160, e.g. the magnet element, during use.
  • the reference surface 122a is typically extremely flat and is not or hardly adversely affected by deformation induced during the production of the plate profile.
  • the exemplary embodiment illustrated in FIG. 1 and FIG. 2 is a tube structure composed of three folded plate profiles 120a, 120b, 120c which together form the walls in the longitudinal direction of five compartments 110a, 110b, 110c, llOd, llOe in the tube structure.
  • the walls in the longitudinal direction of three compartments 110a, llOd, llOe are in this case formed by the internal spaces formed by the three closed plate profiles 120a, 120b, 120c, while the walls in the longitudinal direction of two compartments 110b, 110c are formed by the cavities which are generated when the three profiles 120a, 120b, 120c are connected to each other mechanically. With these mechanical connections, seals 130 may also be provided.
  • the central compartment 110a which is formed by one folded plate profile in this case serves, as described above, to place the elongate magnetic field generator 160 in.
  • at least one other one of the compartments 110b, 110c, llOd, llOe is suitable to serve as cooling duct.
  • each of the four other compartments can be used to provide cooling. It is possible to generate a flow of water between the compartments by providing through-passages for coolant between the compartments 110b, 110c, llOd, llOe which are used to provide cooling.
  • perforated bolts may be used to make it possible for coolant to flow between the compartments of the tube structure.
  • perforations may be provided in e.g. 120b or 120c, respectively, as a result of which coolant can flow between the compartments 110b and llOd or 110c and llOe, respectively.
  • sealing pieces may be fitted to both or to one of the two ends of the magnet support structure with such openings, as a result of which a coolant connection can be achieved between the compartments.
  • one or more compartments are provided with drain holes or nozzles along the length of the compartments in order to blow coolant to another compartment.
  • the magnet support structure may also comprise guide elements 140 in order to guide the magnet support structure when pushing the magnet support structure into the cylindrical rotating target and/or to position the magnet support structure with respect to the cylindrical rotating support structure.
  • the magnet support structure 100 also comprises an extruded aluminium profile 150 in addition to folded plate profiles 110a, 110b, 110c.
  • the extruded aluminium profile 150 may be anchored to the folded plate profile 120a which forms the compartment 110a suitable for fitting the elongate magnetic field generator 160.
  • the shape of the extruded profile 150 and the folded plate profile 120a may be modified so that they are in tangent contact along part of their length on at least two sides and preferably on three sides. This profile can thus, in so far as necessary, provide additional rigidity to the magnet support structure 100.
  • the profile 150 may, for example, in so far as necessary, remedy the fact that deformation of the central folded plate profile 120a occurs due to pressure from coolant in compartments 110b and 110c. In view of the fact that the extruded aluminium profile 150 is in the dry compartment 110a in the present support structure 100, this aluminium profile 150 cannot be susceptible to electrocorrosion.
  • the magnet support structure 100 may comprise the elongate magnetic field generator 160, fitted in the compartment 110a.
  • the elongate magnetic field generator 160 may, for example, be a permanent magnet, optionally positioned on a magnet support. It is an advantage of embodiments according to the present invention that the alignment of the elongate magnetic field generator 160 may be carried out with respect to a specific reference surface 122a, for example at the initial fitting, so that the alignment can be carried out within very narrow tolerances.
  • the specific shape, strength and/or configuration of the magnetic field generator 160 or the field which is created thereby may be chosen by the person skilled in the art depending on the application.
  • the magnet support structure 100 comprises a control system 170 for controlling the position of the magnetic field generator 160 with respect to the tube structure and, by extension, with respect to the rotating cylindrical target.
  • a control system may, for example, be based on pneumatic, mechanical or other actuators for modifying the position of the magnetic field generator 160.
  • the control system 170 may be configured to provide the initial alignment or the alignment at recalibration.
  • the control system may also be configured for modifying the position of the elongate magnetic field generator online, in order thus to modify the magnetic field online.
  • the present invention also relates to a magnetron configuration which comprises a magnet support structure as described in the first aspect and an elongate magnetic field generator fitted thereon. Further characteristic features and advantages of such a magnetron configuration are similar to the characteristic features described for the magnet support structure in the first aspect.

Abstract

A magnet support structure is described which comprises a set of compartments (110a, 110b, 110c, 110d, 110e) and wherein the structure comprises at least one folded plate profile (120a) for forming the compartment (110a) suitable for fitting an elongate magnetic field generator. The folded plate profile (120a) in this case has a flat part (122) adapted for serving as a reference surface for aligning the elongate magnetic field generator.

Description

Hybrid magnet support structure
Field of the invention
The present invention generally relates to sputtering magnetron devices. More specifically, the present invention relates to a magnet support structure and corresponding sputtering magnetron for use with rotatable targets, as are typically used in systems for providing coatings for substrates having a large surface.
Background of the invention
Sputtering is a technique of applying a coating to a substrate. Sputter deposition has become the general practice in a wide range of technical areas, such as for example during the production of hard disks or memory devices for computers, during the application of optical coatings on glass, during the coating of flat monitors, etc.
Such sputtering is carried out in a reduced-pressure atmosphere in which sputtering or reacting gases or mixtures of both are supplied in a controlled manner. Free electrons which move in a magnetically limited path in this case ionize the gas atoms or molecules in the vicinity of the target surface. These ions are subsequently accelerated towards the target which is charged negatively, as a result of which the atoms are released from the target upon impact and gain sufficient kinetic energy to reach the substrate and coat it.
The shape of the path is determined by a magnetic field close to the target surface. Due to the presence of the magnetic field, such a deposition process is generally referred to as "magnetron sputtering".
Although various other configurations for targets are known, it has recently become customary to cause an axially symmetrical target, e.g. a cylindrical target, to rotate about the longitudinal axis during sputtering in order to use the target material uniformly and achieve a more homogenous thermal spread in the target surface. Such solutions are very advantageous for applications in which the economic incentive is to coat substrates at low material costs and achieve good quality. Rotating tubular targets is the ideal choice in this case, as these span large widths and can be used during long periods.
Since, with these arrangements, the magnet element remains stationary while the cylindrical rotating target rotates around it, it is possible to achieve targeted deposition (the plasma region is stationary) while the target material is removed relatively evenly across the entire tube. However, it remains a technical challenge to provide accurate cooling and electrical power supply when using a cylindrical rotating target in a vacuum environment.
One of the technical problems which has to be solved in order to be able to use sputtering in such a configuration is that the magnet element has to be provided inside the cylindrical rotating target in an accurate manner. Since the restricted path of the free electrons in the plasma is determined by the component of the magnetic field which runs parallel to the surface of the target, it is very important that this component is constant along the entire length of the cylindrical rotating target. Nevertheless, the magnetic induction of this component typically varies by at least a power of two of the distance to the magnet element, as a result of which small variations in the distance between the magnet element and the target surface can have a critical effect. The distance between the magnet element and the target surface thus has to be checked particularly carefully, so that local variations in the plasma intensity and corresponding variations in the thickness of the deposited layer can be prevented.
Another technical difficulty is to provide accurate cooling. The majority of the power which is supplied to the target is converted into heat at the surface of the target. This heat has to be dissipated efficiently in order to prevent the target from heating up excessively and the magnet element from losing its power at higher temperatures. Typically, a water-based cooling circuit is provided for this purpose.
Patent application US2012/0152738 Al describes a magnetron configuration for a cylindrical rotating target in which a tube structure is provided with a number of coolant ducts. The magnet element is in this case provided on the outer side of the tube structure, close against the sputter surface. By providing coolant between the outer side of the tube structure and the cylindrical, rotating target, the target and the magnets are cooled accurately. However, in this case it is a drawback that the magnet element is in direct contact with coolant, as a result of which the magnet element used has to be water-resistant in order to continue to be able to ensure accurate operation thereof.
An alternative configuration is provided in the international patent application WO 2009/138348. In this configuration, an extruded aluminium tube structure is provided with one or more cooling compartments which extend along the length of the tube structure and have a compartment in which the magnet element can be accommodated. The compartment in which the magnet element can be accommodated is in this case protected against the coolant, so that the magnet element does not come into contact with the coolant during use. The aluminium tube structure is dimensionally stable and rigid, as a result of which the magnetron configuration is not or hardly prone to deformation during its service life. Such a configuration has the drawback that the extruded aluminium tube structure itself is surrounded by coolant under high pressure and that aluminium is susceptible to electrocorrosion. Although the effect of electrocorrosion can be reduced by providing the aluminium with protective coatings, these may be damaged, for example by manipulation, which has a negative effect on the service life of the magnetron. Another drawback of this configuration is the fact that alignment of the magnet element is critical and labour-intensive, on the one hand because the magnet is typically situated further from the sputter surface - in a separate compartment - and on the other hand because additional processing is necessary in order to generate a good alignment reference in the extruded aluminium tube structure.
Summary of the invention
It is an object of embodiments of the present invention to provide good magnet support structures and corresponding sputtering magnetron devices. It is an advantage of embodiments according to the present invention that they are not or hardly susceptible to electrocorrosion and that they make it possible to accurately position the magnet element in a simple manner.
The abovementioned object is achieved by an apparatus and device according to the present invention.
The present invention relates to a magnet support structure which is insertable in a cylindrical, rotatable sputter target, the magnet support structure comprising:
a tube structure with a set of compartments which extend along substantially the entire length of the tube structure, wherein an elongate magnetic field generator can be fitted in one of said compartments and wherein at least one of the compartments can be used as a cooling duct,
characterized in that
the tube structure comprises at least one folded plate profile for forming the compartment suitable for fitting an elongate magnetic field generator, wherein the folded plate profile has a flat part adapted for serving as a reference surface for aligning the elongate magnetic field generator.
It is an advantage of embodiments of the present invention that a system is provided which comprises an accurate reference surface for referencing and adjusting the magnet system with respect to the target tube. The specific manner of construction in which the reference surface is formed by a folded plate profile and the specific form of the plate profile result in a particularly flat reference surface which is not or hardly susceptible to deformation while producing the specific shape of the plate profile. This is unlike for example conventional extruded profiles which may per se already be less fixed with regard to tolerances and in which, in addition, the reference surface is typically formed by an inner rib which is less readily accessible during extrusion for cooling and which thus develops a greater degree of deformation.
It is an advantage of embodiments of the present invention that the flat reference surface can be achieved without this requiring further specific processing, such as machining or finishing.
The wall in the longitudinal direction of the compartment, suitable for fitting an elongate magnetic field generator, may be closed and may be made from one folded plate profile. In some embodiments of the present invention, the folded plate profile is therefore closed at the ends in the longitudinal direction, so that it has a seam there, i.e. at this location, the ends are connected to each other. It is an advantage of an embodiment according to the present invention that the number of seams in the device is limited. This is not only advantageous during manufacture since much less welding has to be carried out, but also promotes the strength and reliability of the system, as seams may develop cracks or other detrimental effects more quickly than other parts of the folded plate. In addition, welding causes deformation which is reduced if less welding is required. In some embodiments, it is moreover possible to weld at specific positions, such as for example at a symmetrical location, as a result of which it is readily possible to correct possible deformation. In some embodiments, the surface can be straightened after welding in some locations as well.
The tube structure may comprise several, for example at least two or at least three, folded plate profiles which are fastened to each other in order to form walls in the longitudinal direction of the set of compartments. In some embodiments, this may be exactly three folded plate profiles. It is an advantage of embodiments of the present invention that a system is provided which has the same outer diameter as conventional systems, but which has a larger inner opening, resulting in more space for the magnetic system and for coolant, due to the fact that the walls are thinner because of the use of a stainless steel folded profile instead of, for example, an extruded profile. This makes it possible to use more complex magnetic fields and stronger fields. In addition, the cooling efficiency of the sputter target can remain at least at the same level as for conventional systems. In addition, it should be noted that the system combines these properties with sufficient rigidity. It is an advantage of embodiments of the present invention that exact positioning of the magnetic field generator can be achieved, not only because a reference surface has been provided which has very narrow tolerances and which can serve as reference for adjusting the position of the magnetic field generator, but also because the specific construction of the tube structure makes it possible to choose slightly thicker sheet metal for the folded plate which forms the compartment for fitting the elongate magnetic field generator. If desired, the other plate profiles may be made from thinner sheet metal because the tolerance of the other zones (for example as cooling duct) is less critical. The several, for example at least two or at least three, folded plate profiles may each per se form a wall in the longitudinal direction of a compartment and may in addition be fastened to each other in such a way that the spaces between the folded plate profiles which are fastened to each other also form independent compartments. It is an advantage of embodiments of the present invention that the wall of the compartment, suitable for fitting the magnetic field generator, may be composed of one single folded plate profile in the longitudinal direction. This implies that the occurrence of leaks at the junctions between different plate profiles, where seals are typically provided, has no impact on whether the compartment suitable for fitting the magnetic field generator is dry.
The at least one folded plate profile may be a stainless steel profile. It is an advantage of embodiments according to the present invention that a non-corroding material can be used which makes it possible to construct the device as having a relatively thin wall structure, while at the same time ensuring the strength of the device. This is in contrast with, for example, systems in which other non-corroding materials, such as plastic, are used, requiring a much greater wall thickness in order to achieve an equal and sufficient degree of strength of the device.
It is an advantage of embodiments of the present invention that the folded plate profiles may be composed of materials which are compatible with a magnetron configuration, as a result of which electrocorrosion or chemical reactivity can be limited to a minimum. This is in contrast with, for example, systems in which other metals, such as e.g. (optionally extruded) aluminium are used, as a result of which the potential difference (of the work function) with the other metals in the environment and immersed in a liquid in which (ionic) conduction may occur, may give rise to electrocorrosion.
The tube structure may furthermore comprise an extruded profile which is anchored to the folded plate profile which forms the compartment suitable for fitting an elongate magnetic field generator. It is an advantage of embodiments of the present invention that, in addition to the folded plate profile, an extruded profile is also present and is situated in the folded plate profile to ensure additional stabilisation against deformation during use, so that narrower tolerances are achieved. The combination of the folded plate profile and the extruded profile ensures a stable reference for fitting the elongate magnetic field generator, optionally by means of a modification system.
The shape of the extruded profile and the folded plate profile may be modified so that they are in tangent contact on at least one side, better still on two sides, preferably on three sides, over a part of their length. It is an advantage of an embodiment according to the present invention that the additional stabilisation may prevent the side walls of the central profile in the device from folding inwards under the effect of, for example, water pressure from water which is present on one side of the profile for cooling purposes.
The extruded profile may be surrounded by a folded plate profile along substantially its entire length.
The extruded profile may be an aluminium profile.
The tube structure may be modified so that the compartment suitable for fitting an elongate magnetic field generator is a dry compartment separated from the coolant. The magnet support structure may furthermore comprise an elongate magnetic field generator.
The magnet support structure may furthermore comprise a modification system for modifying the magnet configuration during use of the magnet support structure. It is an advantage of an embodiment according to the present invention that online, i.e. during use, modifications of the magnet configuration can be accurately carried out due to the fact that a reference surface with very narrow tolerances has been provided.
The modification system may be modified to align the magnet configuration by reference to the reference surface. It is an advantage of an embodiment according to the present invention that the reference surface has narrow tolerances. The tube structure may comprise at least one compartment which acts as a cooling duct and is positioned on the outer wall of the tube structure.
A combination of compartments may be provided, so that a set of cooling ducts is produced which are configured such that a substantially homogenous distribution of the coolant along the length of the tube structure is achieved.
The present invention also relates to a sputtering magnetron installation which comprises a magnet support structure as described above.
Specific and preferred aspects of the invention are included in the attached independent and dependent claims. Characteristic features of the dependent claims may be combined with characteristic features of the independent claims and with characteristic features of other dependent claims as indicated and not only as expressly stated in the claims.
These and other aspects of the invention will be clear from and explained by means of the embodiment(s) described below.
Brief description of the drawings
FIG. 1 and FIG. 2 illustrate a cross section and an isometric projection, respectively, of a magnet support structure composed of three folded plate profiles according to an embodiment of the present invention.
FIG. 3 shows an isometric projection of a magnet support structure composed of three folded plate profiles and an extruded profile positioned inside one of the folded plate profiles, according to an embodiment of the present invention.
FIG. 4 and FIG. 5 illustrate a cross section and an isometric projection, respectively, of a magnet support structure provided with an extruded profile and a magnet element, according to an embodiment of the present invention.
FIG. 6 and FIG. 7 illustrate a cross section and an isometric projection, respectively, of a magnet support structure provided with an extruded profile, a magnet element and a control system for positioning the magnet element, according to an embodiment of the present invention. The drawings are only diagrammatic and non-limiting. For illustrative purposes, the dimensions of some components may have been exaggerated and not been illustrated to scale in the figures.
Reference numerals in the claims should not be interpreted in such a manner as to limit the scope of protection. In the various figures, identical reference numerals refer to the same or similar elements.
Detailed description of illustrative embodiments
The present invention will be described by means of particular embodiments and by reference to specific drawings, but the invention is not limited thereto, and is only limited by the claims. The described drawings are only diagrammatic and not limiting. For illustrative purposes, the dimensions of some elements may have been increased and not been drawn to scale in the drawings. Sometimes, the dimensions and relative dimensions do not correspond to the actual practical embodiment of the invention.
Furthermore, the terms first, second and the like in the description and in the claims are used to distinguish similar elements and are not necessarily an indication of a sequence, not in time, not in space, not in order or in any other way. It should be understood that the terms used in this way are interchangeable under suitable circumstances and that the embodiments of the invention which are described herein are suitable to work in a different order than that which is described or illustrated herein.
It should be understood that embodiments described in relation to a specific orientation of the system are also suitable to work according to other orientations than described or illustrated herein.
It should be noted that the term "contains", as used in the claims, should not be interpreted as being limited to the means described thereafter; this term does not exclude any other elements or steps. It should thus be interpreted as specifying the presence of the characteristic features, values, steps or components which are mentioned and to which reference is made, but does not exclude the presence or addition of one or more other characteristic features, values, steps or components, or groups thereof. Therefore, the scope of the expression "a device containing means A and B" should not be limited to devices which only consist of components A and B. It means that, with regard to the present invention, A and B are the only relevant components of the device.
Reference in this specification to "one embodiment" or "an embodiment" means that a specific characteristic feature, structure or characteristic described in connection with the embodiment is incorporated in at least one embodiment of the present invention. Thus, use of the expressions "in one embodiment" or "in an embodiment" at various locations throughout this specification does not necessarily have to refer to the same embodiment in each case, although it may do. Furthermore, the specific characteristic features, structures or characteristics may be combined in any suitable manner, as should be clear to an average person skilled in the art on the basis of this publication, in one or more embodiments.
Similarly, it should be appreciated that, in the description of illustrative embodiments of the invention, various characteristic features of the invention are sometimes grouped together in one single embodiment, figure or description thereof in order to streamline the publication and to aid the understanding of one or more of the different inventive aspects. This method of publication should therefore not be interpreted as a reflection of an intention that the invention requires more characteristic features than explicitly mentioned in each claim. Rather, as the following claims indicate, inventive aspects are in fewer than all characteristic features of one single previous disclosed embodiment. Therefore, the claims following after the detailed description are in this case explicitly incorporated in this detailed description, with each independent claim being a separate embodiment of the present invention.
Furthermore, although some of the embodiments described herein contain some characteristic features but not other characteristic features from other embodiments, combinations of characteristic features from different embodiments are intended to be within the scope of the invention, and these form different embodiments, as the person skilled in the art will understand. For example, in the following claims, any one of the embodiments described can be used in any desired combination.
In the description provided herein, many specific details are mentioned. However, it should be understood that embodiments of the invention may be configured without these specific details. In other cases, well-known methods, structures and techniques have not been shown in detail for the sake of clarity of the description.
In a first aspect, the present invention comprises a magnet support structure which is insertable in a cylindrical, rotatable sputter target. Such a magnet support structure may typically form part of a sputtering magnetron configuration. The magnet support structure is in this case adapted to position an elongate magnetic field generator, for example a magnet element, in the cylindrical rotatable sputter target. By way of example, embodiments of the present invention not limited thereby, standard and optional characteristic features and properties of a magnet support structure will be described with reference to FIG. 1 to FIG. 2, which show an exemplary magnet support structure 100 in cross section and in isometric perspective, respectively.
The magnet support structure 100 comprises a tube structure with a set of compartments 110a, 110b, 110c, HOd, HOe which extend along substantially the entire length of the tube structure. Due to the fact that the compartments extend along substantially the entire length of the tube structure, an accurate magnetic field can be generated and accurate cooling can be provided along the entire length of the cylindrical target. At least one of these compartments 110a - typically the compartment which is situated closest to the centre - is suitable for fitting/positioning an elongate magnetic field generator, for example a magnet element 160 (for example illustrated in FIG. 7). According to embodiments of the present invention, this compartment 110a is formed by at least one folded plate profile 120a. More specifically, the wall in the longitudinal direction of the compartment 110a suitable for fitting/positioning is formed by at least one folded plate profile 120a, preferably by exactly one folded plate profile 120a. In this case, the folded plate profile 120a is preferably made from a material which is not susceptible to electrocorrosion, such as for example stainless steel or titanium. The folded plate profile 120a may have a thickness in the range from 0.6 mm to 5 mm. The folded plate profile 120a may be folded in such a manner that it has a closed form, in which case, for example, the ends in the longitudinal direction of the plate are welded together. The weld may be produced by, for example, laser-welding. One of the advantages of a compartment in which the wall in the longitudinal direction is formed by one folded plate profile is the fact that there are few seams or seals, as a result of which it is simpler to keep the inside of the compartment dry when the compartment is surrounded by coolant, such as water.
According to embodiments of the present invention, the folded plate profile 120a also has a flat part 122a. Such a flat part 122a is very suitable to act as a reference surface for aligning the positioning of the elongate magnetic field generator 160. This reference surface 122a can be used during the initial alignment of the magnetic field generator 160, during recalibration of the alignment of the magnetic field generator 160, as well as during the online adjustment of the position of the magnetic field generator in magnetron sputter systems which are provided with a control system in order to adjust the position of the magnetic field generator 160, e.g. the magnet element, during use. As the flat part 122a forms part of a plate profile 120a formed by folding - and does not, for example, form part of an extruded profile - the reference surface 122a is typically extremely flat and is not or hardly adversely affected by deformation induced during the production of the plate profile.
The exemplary embodiment illustrated in FIG. 1 and FIG. 2 is a tube structure composed of three folded plate profiles 120a, 120b, 120c which together form the walls in the longitudinal direction of five compartments 110a, 110b, 110c, llOd, llOe in the tube structure. The walls in the longitudinal direction of three compartments 110a, llOd, llOe are in this case formed by the internal spaces formed by the three closed plate profiles 120a, 120b, 120c, while the walls in the longitudinal direction of two compartments 110b, 110c are formed by the cavities which are generated when the three profiles 120a, 120b, 120c are connected to each other mechanically. With these mechanical connections, seals 130 may also be provided. The central compartment 110a which is formed by one folded plate profile in this case serves, as described above, to place the elongate magnetic field generator 160 in. According to embodiments of the present embodiment, at least one other one of the compartments 110b, 110c, llOd, llOe is suitable to serve as cooling duct. In the exemplary embodiment, each of the four other compartments can be used to provide cooling. It is possible to generate a flow of water between the compartments by providing through-passages for coolant between the compartments 110b, 110c, llOd, llOe which are used to provide cooling. In some embodiments, perforated bolts may be used to make it possible for coolant to flow between the compartments of the tube structure. In other embodiments, perforations may be provided in e.g. 120b or 120c, respectively, as a result of which coolant can flow between the compartments 110b and llOd or 110c and llOe, respectively. If desired, sealing pieces may be fitted to both or to one of the two ends of the magnet support structure with such openings, as a result of which a coolant connection can be achieved between the compartments. In some embodiments, one or more compartments are provided with drain holes or nozzles along the length of the compartments in order to blow coolant to another compartment.
The magnet support structure may also comprise guide elements 140 in order to guide the magnet support structure when pushing the magnet support structure into the cylindrical rotating target and/or to position the magnet support structure with respect to the cylindrical rotating support structure.
In a specific embodiment, as illustrated in FIG. 3 to FIG. 5, the magnet support structure 100 also comprises an extruded aluminium profile 150 in addition to folded plate profiles 110a, 110b, 110c. The extruded aluminium profile 150 may be anchored to the folded plate profile 120a which forms the compartment 110a suitable for fitting the elongate magnetic field generator 160. The shape of the extruded profile 150 and the folded plate profile 120a may be modified so that they are in tangent contact along part of their length on at least two sides and preferably on three sides. This profile can thus, in so far as necessary, provide additional rigidity to the magnet support structure 100. The profile 150 may, for example, in so far as necessary, remedy the fact that deformation of the central folded plate profile 120a occurs due to pressure from coolant in compartments 110b and 110c. In view of the fact that the extruded aluminium profile 150 is in the dry compartment 110a in the present support structure 100, this aluminium profile 150 cannot be susceptible to electrocorrosion.
In a further specific embodiment, as illustrated in FIGS. 4 and 5, the magnet support structure 100 may comprise the elongate magnetic field generator 160, fitted in the compartment 110a. The elongate magnetic field generator 160 may, for example, be a permanent magnet, optionally positioned on a magnet support. It is an advantage of embodiments according to the present invention that the alignment of the elongate magnetic field generator 160 may be carried out with respect to a specific reference surface 122a, for example at the initial fitting, so that the alignment can be carried out within very narrow tolerances.
The specific shape, strength and/or configuration of the magnetic field generator 160 or the field which is created thereby may be chosen by the person skilled in the art depending on the application.
In yet another specific embodiment, as illustrated in FIG. 6 and FIG. 7, the magnet support structure 100 comprises a control system 170 for controlling the position of the magnetic field generator 160 with respect to the tube structure and, by extension, with respect to the rotating cylindrical target. Such a control system may, for example, be based on pneumatic, mechanical or other actuators for modifying the position of the magnetic field generator 160. The control system 170 may be configured to provide the initial alignment or the alignment at recalibration. In an advantageous embodiment, the control system may also be configured for modifying the position of the elongate magnetic field generator online, in order thus to modify the magnetic field online. Such a modification may be effected by means of control signals and may, for example, be initiated by the detection of a change in or a deviation of a physical parameter of the sputter process. The control system 170 is in this case adapted to carry out the alignment by reference to the reference surface 122a. Because of the flatness of this reference surface 122a, an accurate alignment within very narrow tolerances is possible. In a second aspect, the present invention also relates to a magnetron configuration which comprises a magnet support structure as described in the first aspect and an elongate magnetic field generator fitted thereon. Further characteristic features and advantages of such a magnetron configuration are similar to the characteristic features described for the magnet support structure in the first aspect.
The different embodiments can readily be combined with each other, and the combinations thus also correspond to embodiments according to the present invention.

Claims

A magnet support structure (100) which is insertable in a cylindrical, rotatable sputter target, the magnet support structure comprising:
a tube structure with a set of compartments (110a, 110b, 110c, HOd, HOe) which extend along substantially the entire length of the tube structure, wherein an elongate magnetic field generator can be fitted in one of said compartments (110a) and wherein at least one of the compartments (110b, 110c, HOd, HOe) can be used as a cooling duct,
characterized in that
the tube structure comprises at least one folded plate profile (120a) for forming the compartment (110a) suitable for fitting an elongate magnetic field generator, wherein the folded plate profile (120a) has a flat part (122) adapted for serving as a reference surface for aligning the elongate magnetic field generator.
A magnet support structure (100) according to Claim 1, wherein the wall in the longitudinal direction of the compartment (110a), suitable for fitting an elongate magnetic field generator, is closed and is made from one folded plate profile (120a).
A magnet support structure (100) according to one of the preceding claims, wherein the tube structure comprises three folded plate profiles (120a, 120b, 120c) which are fastened to each other to form the set of compartments (110a, 110b, 110c, HOd, HOe).
A magnet support structure (100) according to the preceding claim, wherein the three folded plate profiles (120a, 120b, 120c) each per se form the walls in the longitudinal direction of a compartment (110a, HOd, HOe) and wherein the three folded plate profiles (120a, 120b, 120c) are in addition fastened to each other in such a way that the spaces between the folded plate profiles (120a, 120b, 120c) which are fastened to each other also form independent compartments (110b, 110c).
5. A magnet support structure (100) according to one of the preceding claims, wherein the at least one folded plate profile (120a, 120b, 120c) is a stainless steel profile.
6. A magnet support structure (100) according to one of the preceding claims, wherein the tube structure furthermore comprises an extruded profile (150) which is anchored to the folded plate profile (120a) which forms the
compartment (110a) suitable for fitting an elongate magnetic field generator.
7. A magnet support structure (100) according to claim 6, wherein the shape of the extruded profile (150) and the folded plate profile (120a) is adapted so that they are in tangent contact on at least two sides, preferably on three sides, over a part of their length.
8. A magnet support structure (100) according to one of preceding claims 6 or 7, wherein the extruded profile (150) is an aluminium profile.
9. A magnet support structure (100) according to one of claims 6 to 8, wherein the extruded profile (150) is surrounded by a folded plate profile along substantially its entire length.
10. A magnet support structure (100) according to one of the preceding claims, wherein the tube structure is modified so that the compartment (110a) suitable for fitting an elongate magnetic field generator is a dry compartment separated from the coolant.
11. A magnet support structure (100) according to one of the preceding claims, wherein the magnet support structure (100) furthermore comprises an elongate magnetic field generator (160).
12. A magnet support structure (100) according to claim 11, wherein the magnet support structure (100) furthermore comprises a modification system (170) for modifying a magnet configuration during use of the magnet support structure.
13. A magnet support structure (100) according to claim 12, wherein the modification system (170) is modified to align the magnet configuration by reference to the reference surface (122a).
14. A magnet support structure (100) according to one of the preceding claims, wherein the at least one compartment (llOd, llOe) is positioned on the outer wall of the tube structure in order to act as cooling duct.
15. A magnet support structure (100) according to one of the preceding claims, wherein a combination of compartments (110b, 110c, llOd, llOe) is provided, so that a set of cooling ducts is produced which are configured such that a substantially homogenous distribution of the coolant along the length of the tube structure is achieved.
16. A sputtering magnetron installation which comprises a magnet support structure (100) according to one of the preceding claims.
PCT/EP2014/057368 2013-04-12 2014-04-11 Hybrid magnet support structure WO2014167095A1 (en)

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BE2013/0270A BE1021020B1 (en) 2013-04-12 2013-04-12 HYBRID MAGNET WEAR STRUCTURE
BE2013/0270 2013-04-12

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009138348A1 (en) 2008-05-16 2009-11-19 Bekaert Advanced Coatings A rotatable sputtering magnetron with high stiffness
US20120152738A1 (en) 2010-02-21 2012-06-21 Von Ardenne Anlagentechnik Gmbh Magnetron arrangement with a hollow target
DE102011075543A1 (en) * 2011-05-10 2012-11-15 Von Ardenne Anlagentechnik Gmbh Cooling arrangement used for cooling elongated magnetron used in continuous coating system for coating target material onto substrate, has coolant inlet and outlet that are provided at ends of magnetron

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009138348A1 (en) 2008-05-16 2009-11-19 Bekaert Advanced Coatings A rotatable sputtering magnetron with high stiffness
US20120152738A1 (en) 2010-02-21 2012-06-21 Von Ardenne Anlagentechnik Gmbh Magnetron arrangement with a hollow target
DE102011075543A1 (en) * 2011-05-10 2012-11-15 Von Ardenne Anlagentechnik Gmbh Cooling arrangement used for cooling elongated magnetron used in continuous coating system for coating target material onto substrate, has coolant inlet and outlet that are provided at ends of magnetron

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