WO2014157427A1 - Curable composition, cured film, color filter, protective film, display device and solid-state imaging element - Google Patents

Curable composition, cured film, color filter, protective film, display device and solid-state imaging element Download PDF

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WO2014157427A1
WO2014157427A1 PCT/JP2014/058700 JP2014058700W WO2014157427A1 WO 2014157427 A1 WO2014157427 A1 WO 2014157427A1 JP 2014058700 W JP2014058700 W JP 2014058700W WO 2014157427 A1 WO2014157427 A1 WO 2014157427A1
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group
carbon atoms
curable composition
substituent
acid
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PCT/JP2014/058700
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French (fr)
Japanese (ja)
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福重 裕一
一真 両角
漢那 慎一
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富士フイルム株式会社
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/02Monomers containing only one unsaturated aliphatic radical
    • C08F212/04Monomers containing only one unsaturated aliphatic radical containing one ring
    • C08F212/06Hydrocarbons
    • C08F212/08Styrene
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/206Filters comprising particles embedded in a solid matrix
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2810/00Chemical modification of a polymer
    • C08F2810/20Chemical modification of a polymer leading to a crosslinking, either explicitly or inherently
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters

Definitions

  • the present invention relates to a curable composition, a cured film, a color filter, a protective film, a display device, and a solid-state imaging device. Specifically, the present invention relates to a curable composition having high hardness and low temperature curing characteristics and its use.
  • Liquid crystal display devices are widely used for display devices that display high-quality images.
  • a substrate for a display device for example, a color filter substrate, an active matrix substrate, an organic EL display substrate, etc.
  • structures such as a color filter and a protective film are formed on the substrate.
  • photosensitive resin composition a photosensitive curable composition
  • a pattern having the resolution and chemical resistance required for applications such as a color filter is such that the substrate does not deform.
  • a material capable of forming a pattern at a temperature a colored photosensitive resin composition containing a colorant, a resin, and a dendrimer or hyperbranched polymer as a polymerizable compound is disclosed (for example, JP 2012-173546 A). See the official gazette).
  • JP 2012-173546 A See the official gazette.
  • this colored photosensitive resin composition is described that a cured pattern can be obtained by baking a colored pattern formed by pattern exposure and development at a temperature of 25 ° C. or higher and 230 ° C. or lower. In specific examples, it is described that the baking is not performed, and that a colored pattern having excellent solvent resistance can be obtained.
  • curable compositions used for forming a protective film for preventing scratches and contamination on various substrate surfaces
  • two or more (meth) acryloyl groups in a molecule such as dipentaerythritol hexaacrylate are used.
  • curable compositions comprising a compound having a photopolymerization initiator, and a multibranched polymer such as a dendrimer or hyperbranched polymer. It is described that a protective film obtained by applying this curable composition to a plastic substrate such as cellulose triacetate and curing with ultraviolet rays has high pencil hardness (see, for example, JP-A-2009-286924).
  • a pattern for example, a pixel of a color filter
  • a protective film is formed on a substrate using a curable composition
  • curing is often insufficient only by exposure with ultraviolet rays or the like, and further heat treatment is performed. May need to be applied.
  • a glass substrate having high heat resistance is generally used, but the use of a substrate having excellent flexibility such as a plastic substrate has been desired for a long time.
  • the plastic substrate has low heat resistance, it is necessary to set the temperature of the heat treatment to a temperature at which the plastic substrate does not deform. Therefore, there is a demand for a curable composition that can form a pattern or protective film having a high hardness at a much lower temperature than in the past.
  • the present invention relates to a curable composition in which a pattern or protective film having a high hardness is formed at a lower temperature than before, a cured film using the curable composition, a color filter, a protective film, a display device, and It is an object to provide a solid-state imaging device.
  • ⁇ 1> (A) a compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group, (B) a hyperbranched compound having a molecular weight of 1300 or more, and (C) photopolymerization.
  • a curable composition comprising at least one initiator selected from the group consisting of an initiator and a thermal polymerization initiator.
  • the (B) multi-branched compound is at least one selected from the group consisting of dendrimers and hyperbranched polymers.
  • ⁇ 3> The curable composition according to ⁇ 1> or ⁇ 2>, further comprising (D) a resin having an acidic group in the side chain.
  • ⁇ 4> The curable composition according to any one of ⁇ 1> to ⁇ 3>, further comprising (E) a colorant.
  • ⁇ 5> The curable composition according to any one of ⁇ 1> to ⁇ 4>, further comprising (F) a refractive index adjusting material.
  • ⁇ 6> The curable composition according to ⁇ 5>, wherein the refractive index adjusting material is at least one kind of inorganic fine particles selected from metal fine particles and metal oxide fine particles.
  • ⁇ 7> A cured film obtained by curing the curable composition according to any one of ⁇ 1> to ⁇ 6>.
  • ⁇ 8> A color filter including the cured film according to ⁇ 7>.
  • ⁇ 9> A protective film including the cured film according to ⁇ 7>.
  • a curable composition in which a pattern having a high hardness or a protective film is formed at a lower temperature than before, a cured film using the curable composition, a color filter, a protective film, a display device, and A solid-state imaging device is provided.
  • curable composition of the present invention and a cured film, a color filter, a protective film, a display device, and a solid-state imaging device using the curable composition will be described in detail.
  • the curable composition of the present invention comprises (A) a compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group, and (B) a multibranched compound having a molecular weight of 1300 or more. (C) at least one initiator selected from the group consisting of a photopolymerization initiator and a thermal polymerization initiator.
  • the curable composition is more highly crosslinked at a low temperature and has high hardness. It is clear that the cured film is formed by comparing the curable composition according to the present invention in the examples described later and the curable composition according to the comparative example.
  • the curable composition according to the present invention has the same composition as the curable composition according to the present invention except that it does not contain a hyperbranched compound and the (C) initiator, or the (B) hyperbranched compound.
  • the curable composition according to the present invention has high ethylenically unsaturated double bonds and high hardness in the obtained cured film even when heated at the same heating temperature.
  • ⁇ (A) Compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group (hereinafter also referred to as “specific polymerizable compound”)>
  • the specific polymerizable compound is subjected to the action of the radical derived from the (C) initiator, and at least two ethylenically unsaturated double bond groups of the specific polymerizable compound cause a polymerization reaction to increase the molecular weight.
  • the specific polymerizable compound has at least one secondary hydroxyl group
  • the polarity of the specific polymerizable compound is improved, and the hydrogen atom adjacent to the secondary hydroxyl group is easily extracted.
  • the inhibition of the polymerization reaction by oxygen is suppressed and the reaction progress is fast, and the coexistence of the (B) multi-branched compound promotes the polymerization reaction and increases the hardness. It seems that a high cured film can be obtained.
  • the specific polymerizable compound is preferably a compound having a molecular weight of less than 1300 represented by the following general formula (1).
  • X represents a hydrogen atom or a methyl group.
  • N represents an integer of 2 to 6.
  • A represents a hydrogen atom of n hydroxy groups from an m-valent polyhydric alcohol. Represents an excluded n-valent group, where m represents an integer of 2 or more and 6 or less, and m ⁇ n.
  • the m-valent polyhydric alcohol includes aliphatic alcohols and aromatic polyhydroxy compounds.
  • m-valent aliphatic alcohols include ethylene glycol oligomers such as ethylene glycol, diethylene glycol, triethylene glycol, and tetraethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,3-propanediol, 1-methyl- 1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 1,4-dimethylolcyclohexane, 1,2,3-trihydroxypropane, 1,1,1-trimethylolpropane, pentaerythritol And dipentaerythritol.
  • Examples of the m-valent aromatic polyhydroxy compound include bisfer A and 1,4-dimethanolcyclohexane. Of these m-valent polyhydric alcohols, aliphatic alcohols are preferred because the lower the viscosity of the system during polymerization, the better the progress of polymerization. On the other hand, when importance is attached to the hardness of the crosslinked film, an aromatic polyhydroxy type may be preferable, and it is preferable to use them properly depending on the required performance.
  • preferred specific examples of the compound represented by the general formula (1) will be given.
  • the following compound (35) is not contained in the compound represented by General formula (1), this is also a preferable example of a specific polymerizable compound.
  • the content of the specific polymerizable compound is suitably 1% by mass or more and 60% by mass or less, preferably 5% by mass or more and 55% by mass or less, preferably 5% by mass or more, based on the total solid content of the curable composition. 40 mass% or less is especially preferable.
  • the content of the specific polymerizable compound is 1% by mass or more, when it contains a photopolymerization initiator (C) as an initiator, curing by exposure becomes good, and further, by heat treatment at a low temperature, A cured film having a much higher hardness can be obtained, and when this cured film is used as a protective film, there is little deterioration.
  • C photopolymerization initiator
  • the content of the specific polymerizable compound is in the range of 60% by mass or less, it is easy to adjust the viscosity of the coating liquid to an appropriate range when the curable composition is used as the coating liquid, and curing is performed. It is easy to adjust the hardness of the film and the exposure sensitivity.
  • the hyperbranched compound is a compound having a molecular weight of 1300 or more having a higher-order branched structure having a partial structure such as a comb shape or a star shape repeatedly in two or more stages.
  • Multi-branched compounds include those whose terminal group is a group selected from the group consisting of a carboxyl group, an amino group, an epoxy group, an acryloyl group, and a methacryloyl group. Among these, a particularly preferred terminal group is an acryloyl group or a methacryloyl group.
  • a compound having a molecular weight of 1300 or more having at least one group selected from the group consisting of an acryloyl group and a methacryloyl group (hereinafter, these groups are also collectively referred to as “(meth) acryloyl group”) as a terminal group.
  • polymerizable hyperbranched compound also referred to as “polymerizable hyperbranched compound”.
  • the hyperbranched compound is preferably a polymerizable hyperbranched compound.
  • the polymerizable multi-branched compound preferably has at least 10 terminal (meth) acryloyl groups, more preferably 12 or more and 32 or less.
  • the hyperbranched compound is a compound having a molecular weight of 1300 or more, but the molecular weight is 1300 or more and 100,000 or less, more preferably 1300 or more and 20000 or less, and particularly preferably 1300 or more and 15000 or less. . When it has a molecular weight of 1300 or more, it means a weight average molecular weight.
  • the (B) multi-branched compound is selected from the group consisting of a dendrimer and a hyperbranched polymer because a cured film having high hardness can be easily obtained.
  • a dendrimer has a chemical structure in which a chemical structure constituting a core (hereinafter also referred to as “core part”) is regularly branched to the outside thereof, and has a spherical, highly controlled chemical structure and Has a molecular weight.
  • Hyperbranched polymers have a chemical structure similar to dendrimers, but are not as highly regular branching structures or high molecular weight controls as in dendrimers, and the branches are formed according to a probability distribution and have a broad molecular weight distribution. It is what you have.
  • Dendrimers and hyperbranched polymers are excellent in solubility, have low viscosity when made into a solution, and have a large number of functional groups (for example, carboxyl group, amino group, epoxy group, acryloyl group, and methacryloyl group). Such a characteristic on the chemical structure is considered to be a factor for obtaining a cured film having a high hardness at a low heating temperature by the combination with the specific polymerizable compound (A).
  • Dendrimers and hyperbranched polymers are described in, for example, Japanese Patent Application Laid-Open No. 2012-173549, International Publication No. 2008-047620, Japanese Patent Application Laid-Open No. 2012-83594, and the like. These compounds have a core portion, a branched chain portion bonded to the core portion, and an end group bonded to the branched chain portion.
  • the branched chain portion includes a highly branched structure in which a two-dimensional or three-dimensional branched partial structure is repeated two or more steps, and the terminal group has a large number of functional groups (for example, a hydroxy group, a carboxyl group, an amino group). , Epoxy group, acryloyl group, and methacryloyl group).
  • Such dendrimers and hyperbranched polymers are dendritic compounds having a molecular weight of 1300 or more.
  • the compound constituting the core is preferably synthesized using a branched polyhydric alcohol having three or more chain groups having a methylol group at the end, and further having a chain shape having a methylol group at the end.
  • Those synthesized using a branched polyhydric alcohol having 4 or more groups are particularly preferred.
  • Preferable specific examples of the polyhydric alcohol include, for example, pentaerythritol, dipentaerythritol, trimethylolpropane and the like.
  • these groups include an alkyl group such as a methyl group.
  • the core part include structural units represented by the following structures (1) to (4).
  • n represents an integer of 0 to 2
  • the * part has the same meaning as described above.
  • the branched chain portion is preferably a structural unit having three or more branched structures, and examples thereof include polyamide, polyester, polyether, polyurethane, and polyurea. Of these, polyester units and polyurethane units are preferred.
  • a polyhydroxycarboxylic acid unit is preferable, and a unit represented by the following structure (5) or structure (6) is more preferable.
  • * part represents a binding site with a core part or a branched chain unit.
  • * part represents a binding site with a core part or a branched chain unit.
  • the core portion and the branched chain portion may be bonded by a single bond, or may be bonded via a bonding site derived from an alkylene oxide such as ethylene oxide or propylene oxide.
  • a bonding site derived from an alkylene oxide such as ethylene oxide or propylene oxide.
  • the group bonded to the terminal of the multi-branched compound is preferably a group having an ethylenically unsaturated bond, and examples of such a group include a (meth) acryloyl group and a vinyloxy group. Of these, a (meth) acryloyl group is preferable.
  • alkali-developable multi-branched polymer described in International Publication No. 2008-047620 is more advantageous for pattern formation by alkali development because of increased solubility before curing by radiation.
  • the molecular weight or the weight average molecular weight of these compounds is 1300 or more and 100,000 or less, more preferably 1300 or more and 20000 or less, further preferably 1300 or more and 15000 or less.
  • the viscosity at 25 ° C. is preferably 100 Pa ⁇ s to 500,000 Pa ⁇ s, more preferably 300 to 300,000 Pa ⁇ s.
  • Esdrimer HU-22 manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.
  • Biscoat # 1000 manufactured by Osaka Organic Chemical Co., Ltd., weight average molecular weight: 4000
  • STAR-501 manufactured by Osaka Organic Chemical Co., Ltd., weight average Molecular weight: 11000
  • A-HBR-5 Shin Nakamura Chemical Co., Ltd., weight average molecular weight: 8000
  • New Frontier R-1150 (Daiichi Kogyo Seiyaku Co., Ltd., weight average molecular weight: 11500
  • SN-2301 Sartomer, weight average molecular weight: 7500
  • products sold under the name “Hypertech” manufactured by Nissan Chemical Industries UR-101 (weight average molecular weight: 8000), Dendron product number 686581 (SIGMA- A product made by ALDRICH, weight average molecular weight: 3803, etc.
  • the content of the multi-branched compound is preferably 5% by mass or more and 70% by mass or less, and particularly preferably 10% by mass or more and 65% by mass or less, based on the total solid content of the curable composition. .
  • the curable composition may contain a polymerizable compound (hereinafter also referred to as “additionally polymerizable compound”) that is different from both the (A) specific polymerizable compound and the (B) hyperbranched compound.
  • a polymerizable compound hereinafter also referred to as “additionally polymerizable compound”
  • Such an additional polymerizable compound is a compound that can be polymerized by an active radical or an acid radical generated from (C) an initiator, and examples thereof include a compound having a polymerizable ethylenically unsaturated bond. .
  • a polymerizable compound having at least one ethylenically unsaturated double bond the components described in paragraphs [0010] to [0020] of JP-A-2006-23696, Mention may be made of the components described in paragraph numbers [0027] to [0053] of 2006-64921.
  • the polymerizable compound is preferably a compound having a terminal ethylenically unsaturated bond, and more preferably selected from compounds having two or more terminal ethylenically unsaturated bonds.
  • Such a compound group is widely known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers, or mixtures thereof and multimers thereof.
  • a urethane-added polymerizable compound produced by an addition reaction between an isocyanate and a hydroxyl group is also suitable, such as JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765.
  • the ethylene oxide skeletons described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418 are also known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers, or mixtures thereof and multimers thereof
  • Urethane compounds having them are also suitable.
  • Other examples include polyester acrylates, epoxy resins and (meth) described in JP-A-48-64183, JP-B-49-43191 and JP-B-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as epoxy acrylates obtained by reacting with acrylic acid. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.
  • pentaerythritol tri (meth) acrylate pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tri ((meth) acryloyloxyethyl) isocyanurate.
  • Pentaerythritol tetra (meth) acrylate EO modified products dipentaerythritol hexa (meth) acrylate EO modified products, etc., and commercially available products include NK ester A-TMMT, NK ester A-TMM-3, and NK oligo UA.
  • NK Oligo UA-7200 manufactured by Shin-Nakamura Chemical Co., Ltd.
  • These polymerizable compounds can be used alone or in combination of two or more.
  • the content is preferably 0.01% by mass or more and 20% by mass or less based on the total mass of the total solid content of the curable composition. 1% by mass to 10% by mass is more preferable, and 0.5% by mass to 8% by mass is particularly preferable.
  • the initiator is at least one compound selected from the group consisting of a photopolymerization initiator and a thermal polymerization initiator.
  • a photopolymerization initiator is contained as an initiator, a patterned cured film can be formed by a lithographic process, which is advantageous when forming a color separation pixel of a color filter. is there. Of course, it is also possible to form a protective film by performing full-surface solid exposure.
  • a thermal polymerization initiator is contained as an initiator, if an infrared ray such as an infrared laser beam is used as a light source, a patterned cured film can be formed by a lithographic process.
  • a protective film by performing whole surface solid exposure.
  • C When both a photopolymerization initiator and a thermal polymerization initiator are contained as an initiator, for example, a patterned cured film is formed as a light source by a lithographic process using ultraviolet rays as a light source. Heating is preferable because a patterned cured film having a much higher hardness can be obtained.
  • Photopolymerization initiator As the photopolymerization initiator, known compounds can be suitably used. For example, triazine derivatives, oxadiazole derivatives, oxime initiators, acetophenone initiators, titanocene initiators, acylphosphine oxide initiators. Etc. are preferred. Specifically, for example, the components described in paragraph numbers [0012] to [0020] of JP-A-2006-23696, and the paragraphs [0050] to [0053] of JP-A-2006-64921 are described. Ingredients.
  • Preferred (C-1) photopolymerization initiators usable in the present invention include, for example, 2-trichloromethyl-5- (p-styrylmethyl) -1,3,4-oxadiazole, 2,4-bis (Trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethyl) -3-bromophenyl] -s-triazine, 7- [2- [4- (3-hydroxymethylpiperidino) -6 -Diethylamino] triazinylamino] -3-phenylcoumarin, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexyl-phenylketone, 2-hydroxy-2-methyl-1-phenyl -Propan-1-one, 1- [4-2-2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1 ⁇ 4- [4- (2-hydroxy-2-methyl-propionyl) -
  • R and X each represent a monovalent substituent
  • A represents a divalent organic group
  • Ar represents an aryl group.
  • n is an integer of 1 to 5.
  • R is preferably an acyl group from the viewpoint of increasing sensitivity, and specifically, an acetyl group, a propionyl group, a benzoyl group, and a toluyl group are preferable.
  • A is an unsubstituted alkylene group, an alkylene group substituted with an alkyl group (for example, a methyl group, an ethyl group, a tert-butyl group, or a dodecyl group) from the viewpoint of increasing sensitivity and suppressing coloration due to heating,
  • An alkylene group substituted with an alkenyl group for example, vinyl group, allyl group
  • aryl group for example, phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl group, phenanthryl group, styryl group
  • a substituted alkylene group is preferred.
  • Ar is preferably a substituted or unsubstituted phenyl group from the viewpoint of increasing sensitivity and suppressing coloring due to heating.
  • the substituent is preferably a halogen group such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.
  • X is an alkyl group that may have a substituent, an aryl group that may have a substituent, or an alkenyl that may have a substituent from the viewpoint of improving solvent solubility and absorption efficiency in the long wavelength region.
  • n is preferably an integer of 1 to 2.
  • photopolymerization initiator represented by the general formula (a) include the following exemplary compound (V-3).
  • thermal polymerization initiator known compounds can be suitably used.
  • ketone peroxide compounds, peroxyketal compounds, hydroperoxide compounds, dialkyl peroxide compounds, diacyl peroxide compounds, Peroxydicarbonate compounds, peroxyester compounds and the like are used, and these thermal polymerization initiators are disclosed in company product catalogs and the like.
  • a thermal polymerization initiator containing a hydroxylamine ester described in JP 2012-521573 is preferably used in the present invention. Specific compound examples are as follows.
  • the content of the initiator is preferably 0.1% by mass or more and 20% by mass or less, and 0.5% by mass or more and 10% by mass or less based on the total amount of the total solid content of the curable composition. More preferably, it is more preferably 1% by mass or more and 5% by mass or less.
  • the curable composition according to the present invention may contain (D) a resin having an acidic group in the side chain (hereinafter also referred to as “specific resin”).
  • the specific resin is not particularly limited as long as it has an acidic group in the side chain, but has a branched and / or alicyclic structure in the side chain in addition to the group having an acidic group: Y (y mol%). It preferably contains a group: X (x mol%) and a group having an ethylenically unsaturated group: Z (z mol%), and optionally has other groups (L) (1 mol%). It may be. Moreover, at least 2 or more types of groups selected from X, Y, and Z may be contained in one group in specific resin.
  • the acidic group is not particularly limited and may be appropriately selected from known ones, and examples thereof include a carboxyl group, a sulfonic acid group, a sulfonamide group, a phosphoric acid group, and a phenolic hydroxyl group. Among these, a carboxy group and a phenolic hydroxyl group are preferable from the viewpoint of excellent developability and water resistance of the cured film.
  • the monomer used for introducing an acidic group into the side chain of the specific resin is not particularly limited, and styrenes, (meth) acrylates, vinyl ethers, vinyl esters. And those obtained by introducing an acidic group such as the above carboxyl group into (meth) acrylamides and the like, (meth) acrylates, vinyl esters, and those having an acidic group introduced into (meth) acrylamides are preferred. Preferably, an acid group is introduced into (meth) acrylates.
  • acryl and / or “methacryl when referring to “(meth) acryl” and / or “acrylate” and / or “methacrylate”, “(meth) )) Acrylate ".
  • the monomer having an acidic group can be appropriately selected from known ones such as (meth) acrylic acid, vinyl benzoic acid, maleic acid, maleic acid monoalkyl ester, fumaric acid, Itaconic acid, crotonic acid, cinnamic acid, sorbic acid, ⁇ -cyanocinnamic acid, acrylic acid dimer, addition reaction product of hydroxyl group-containing monomer and cyclic acid anhydride, ⁇ -carboxy-polycaprolactone mono (meth) acrylate Etc.
  • those produced as appropriate may be used, or commercially available products may be used.
  • Examples of the monomer having a hydroxyl group used in the addition reaction product of the monomer having a hydroxyl group and a cyclic acid anhydride include 2-hydroxyethyl (meth) acrylate.
  • Examples of the cyclic acid anhydride include maleic anhydride, phthalic anhydride, and cyclohexanedicarboxylic anhydride. Among these, (meth) acrylic acid and the like are preferable in terms of excellent developability and low cost.
  • the amount of the monomer having an acidic group in the side chain in the specific resin is preferably 5 to 70 mol%, more preferably 10 to 60 mol%, and particularly preferably 20 to 50 mol%.
  • the group having an acidic group in the side chain is within the above range, good curability and developability can be obtained.
  • the acid value suitable as the specific resin varies within a preferable range depending on the molecular structure that can be taken, but is generally preferably 20 mgKOH / g or more, more preferably 50 mgKOH / g or more, and 70 to 130 mgKOH / g. Particularly preferred is g.
  • an insulating layer and an overcoat layer excellent in good insulation, transparency, water resistance, alkali resistance and acid resistance can be obtained. For this reason, what is necessary is just to determine the usage-amount of the monomer which has an acidic group in a side chain so that an acid value may become the said range.
  • the specific resin may further have a “group having a branched and / or alicyclic structure” or an “ethylenically unsaturated group” in the side chain. That is, the specific resin in the present invention includes a group having a branched and / or alicyclic structure in the side chain: X (x mol%), a group having an acidic group: Y (y mol%), and ethylenically unsaturated.
  • a copolymer obtained by copolymerizing at least one of the monomers constituting the X, Y, and Z is preferable.
  • branched group examples include branched alkyl groups having 3 to 12 carbon atoms, such as i-propyl group, i-butyl group, s-butyl group, t-butyl group, isopentyl group, and neopentyl group.
  • i-propyl group, s-butyl group, t-butyl group, isopentyl group and the like are preferable, and i-propyl group, s-butyl group, t-butyl group and the like are more preferable.
  • Examples of the group having an alicyclic structure include an alicyclic hydrocarbon group having 5 to 20 carbon atoms, such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, an isobornyl group, an adamantyl group. , Tricyclodecyl group, dicyclopentenyl group, dicyclopentanyl group, tricyclopentenyl group, and tricyclopentanyl group.
  • a cyclohexyl group, a norbornyl group, an isobornyl group, an adamantyl group, a tricyclodecyl group, a tricyclopentenyl group, a tricyclopentanyl group, and the like are preferable, and a cyclohexyl group, a norbornyl group, an isobornyl group, a tricyclopentenyl group, and the like. Is preferred.
  • Examples of the monomer containing a group having a branched and / or alicyclic structure in the side chain include styrenes, (meth) acrylates, vinyl ethers, vinyl esters, (meth) acrylamides, and the like ( (Meth) acrylates, vinyl esters and (meth) acrylamides are preferred, and (meth) acrylates are more preferred.
  • the monomer containing a group having a branched structure in the side chain include i-propyl (meth) acrylate, i-butyl (meth) acrylate, s-butyl (meth) acrylate, (meth ) T-butyl acrylate, i-amyl (meth) acrylate, t-amyl (meth) acrylate, sec-iso-amyl (meth) acrylate, 2-octyl (meth) acrylate, (meth) acrylic acid 3-octyl, t-octyl (meth) acrylate, and the like, among which i-propyl (meth) acrylate, i-butyl (meth) acrylate, t-butyl methacrylate, and the like are preferable, and more preferable.
  • I-propyl methacrylate, t-butyl methacrylate and the like are preferable, and more preferable.
  • a specific example of the monomer containing a group having an alicyclic structure in the side chain is (meth) acrylate having an alicyclic hydrocarbon group having 5 to 20 carbon atoms.
  • Specific examples include (meth) acrylic acid (bicyclo [2.2.1] heptyl-2), (meth) acrylic acid-1-adamantyl, (meth) acrylic acid-2-adamantyl, (meth) acrylic.
  • Acid-3-methyl-1-adamantyl (meth) acrylic acid-3,5-dimethyl-1-adamantyl, (meth) acrylic acid-3-ethyladamantyl, (meth) acrylic acid-3-methyl-5-ethyl 1-adamantyl, (meth) acrylic acid-3,5,8-triethyl-1-adamantyl, (meth) acrylic acid-3,5-dimethyl-8-ethyl-1-adamantyl, (meth) acrylic acid 2- Methyl-2-adamantyl, (meth) acrylic acid 2-ethyl-2-adamantyl, (meth) acrylic acid 3-hydroxy-1-adamantyl, (meth) acrylic acid Tahydro-4,7-mentanoinden-5-yl, octahydro-4,7-mentanoinden-1-ylmethyl (meth) acrylate, (meth) acrylate-1-menthyl, tricyclo (meth) acrylate Decy
  • the copolymer composition ratio of the respective components of the specific resin is determined in consideration of the glass transition temperature and the acid value, and cannot be generally stated, but “group having a branched and / or alicyclic structure in the side chain”
  • the content of the repeating unit is preferably 10 mol% to 70 mol%, more preferably 15 mol% to 65 mol%, and particularly preferably 20 mol% to 60 mol%.
  • the “ethylenically unsaturated group” is not particularly limited, but is preferably an allyl group or a (meth) acryloyl group.
  • the connection between the ethylenically unsaturated group and the monomer is not particularly limited as long as it is a divalent linking group such as an ester group, an amide group, or a carbamoyl group.
  • the method for introducing an ethylenically unsaturated group into the side chain can be appropriately selected from known ones.
  • a compound having an acidic group for example, acrylic acid, methacrylic acid, vinylbenzoic acid, maleic acid, maleic acid
  • a method of adding a (meth) acrylate having an epoxy group to a monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, sorbic acid, ⁇ -cyanocinnamic acid, etc., a group having a hydroxyl group for example, 2- Examples thereof include a method of adding (meth) acrylate having an isocyanate group to hydroxyethyl methacrylate, 2-hydroxyethyl acrylate and the like, and a method of adding (meth) acrylate having a hydroxy group to a group having an isocyanate group.
  • the method of adding (meth) acrylate having an epoxy group to a repeating unit having an acidic group is most preferable because it is the easiest to produce and is low in cost.
  • the (meth) acrylate having an ethylenically unsaturated bond and an epoxy group is not particularly limited as long as it has these.
  • the content of the repeating unit having an “ethylenically unsaturated group in the side chain” is preferably 10 to 70 mol%, more preferably 20 to 70 mol%, particularly preferably 30 to 70 mol%.
  • developability and curability are also good.
  • the specific resin may contain a repeating unit derived from another monomer in addition to the three kinds of repeating units.
  • Such other monomer is not particularly limited, for example, (meth) acrylic acid ester having no branched and / or alicyclic structure, styrene, vinyl ether, dibasic acid anhydride group, vinyl ester group, And monomers having a hydrocarbon alkenyl group.
  • the dibasic acid anhydride group is not particularly limited, and examples thereof include a maleic anhydride group and an itaconic anhydride group.
  • limiting in particular as said vinyl ester group For example, a vinyl acetate group etc. are mentioned.
  • hydrocarbon alkenyl group For example, a butadiene group, an isoprene group, etc. are mentioned.
  • the molar composition ratio is preferably 0 mol% to 30 mol%, more preferably 0 mol% to 20 mol%. preferable.
  • Specific examples of the specific resin include compounds represented by compounds P-1 to P-35 described in paragraph numbers [0057] to [0063] of JP-A-2008-146018.
  • the specific resin is made from a two-stage process including a monomer (co) polymerization reaction process and an ethylenically unsaturated group introduction process.
  • the (co) polymerization reaction is made by a (co) polymerization reaction of various monomers, and is not particularly limited and can be appropriately selected from known ones.
  • radical polymerization, cationic polymerization, anionic polymerization, coordination polymerization and the like can be appropriately selected for the active species of polymerization.
  • radical polymerization is preferable from the viewpoint of easy synthesis and low cost.
  • limiting in particular also about the polymerization method It can select suitably from well-known things. For example, a bulk polymerization method, a suspension polymerization method, an emulsion polymerization method, a solution polymerization method and the like can be appropriately selected. Among these, the solution polymerization method is more desirable.
  • the weight average molecular weight of the copolymer suitable as the specific resin is that the strength of the cured film can be improved by including the specific resin, and that a patterned cured film can be easily produced by a lithographic process. In this respect, it is preferably 10,000 to 100,000, more preferably 12,000 to 60,000, and particularly preferably 15,000 to 45,000.
  • the glass transition temperature (Tg) suitable as the specific resin is preferably 40 to 180 ° C., more preferably 45 to 140 ° C., and particularly preferably 50 to 130 ° C. When the glass transition temperature (Tg) is within the preferred range, an insulating layer and an overcoat layer excellent in good insulation, transparency, water resistance, alkali resistance and acid resistance can be obtained.
  • the specific resin has a glass transition temperature (Tg) of 40 to 180 ° C. and a weight average molecular weight of 10,000 to 100,000. Good insulation, transparency, water resistance, alkali resistance, acid resistance It is preferable in that an insulating layer and an overcoat layer excellent in the above can be obtained. Furthermore, among the preferable examples of the specific resin, a resin in which all of the molecular weight, the glass transition temperature (Tg), and the acid value are in the preferable range is more preferable.
  • the content of the specific resin is preferably 5% by mass to 70% by mass and more preferably 10% by mass to 50% by mass with respect to the total solid content of the curable composition.
  • the solid content refers to the total amount of other components excluding the solvent in the curable composition.
  • the curable composition according to the present invention may contain a resin (other resin) other than the resin having an acidic group in the side chain, as long as the effects of the present invention are not impaired.
  • the content thereof is preferably 30 parts by mass or less with respect to 100 parts by mass of the specific resin, and from the viewpoint of the effect, an embodiment including only the specific resin as the resin is more preferable. preferable.
  • any of a pigment and a dye can be used as the colorant (E).
  • the colorant (E) When the curable composition of the present invention is used as a photosensitive resin composition in a color filter, it is desirable to use a dye for the purpose of obtaining a composition having high luminance.
  • the dye may be used alone, or a plurality of dyes may be mixed according to the required hue.
  • it is difficult to obtain the color required for the color filter in the absorption spectrum obtained with a single dye so it is practical to use a plurality of dyes.
  • a pigment having higher heat resistance than the dye can be used in combination with the dye.
  • the colorant is composed of only the pigment, although the luminance is reduced.
  • the content of the colorant in the curable composition of the present invention is 0.5 to 70% by mass relative to the total solid content of the composition. Preferably, 1 to 60% by mass is more preferable.
  • the content of the pigment is within the above range, it is effective to secure excellent color characteristics and achieve both performance as a curable composition.
  • the dye various dyes including those known from Color Index Number can be used. Particularly, barbituric acid azo dyes, pyrimidine azo dyes, pyrazole azo dyes, pyridone azo dyes, xanthene dyes. , Triarylmethane dyes, dipyrromethene dyes, azapyromethene dyes, methine dyes, cyanine dyes, squarylium dyes, phthalocyanine dyes, porphyrin dyes, anthraquinone dyes, merocyanine dyes, benzopyran dyes, indigo dyes One type is preferably used. Which of the above dyes is used may be appropriately selected depending on a required hue or the like.
  • a dye represented by the general formula (I) can be used.
  • R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 each independently represent a hydrogen atom or a monovalent substituent
  • R 7 represents a hydrogen atom
  • a halogen atom, an alkyl group, an aryl group, or a heterocyclic group is represented.
  • examples of the monovalent substituent represented by R 1 to R 6 include a halogen atom (for example, a fluorine atom, a chlorine atom and a bromine atom), an alkyl group (preferably having a carbon number of 1 to 48, more preferably a linear, branched or cyclic alkyl group having 1 to 24 carbon atoms, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, t-butyl group, pentyl group Hexyl group, heptyl group, octyl group, 2-ethylhexyl group, dodecyl group, hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group), alkenyl group (preferably).
  • a halogen atom for example, a fluorine atom,
  • An aryl group preferably an aryl group having 6 to 48 carbon atoms, more preferably an aryl group having 6 to 24 carbon atoms, such as a phenyl group or a naphthyl group
  • a heterocyclic group preferably a carbon group.
  • a heterocyclic group having 1 to 32, more preferably 1 to 18 carbon atoms such as 2-thienyl, 4-pyridyl, 2-furyl, 2-pyrimidinyl, 1-pyridyl, 2-benzothiazolyl Group, 1-imidazolyl group, 1-pyrazolyl group, benzotriazol-1-yl group).
  • Silyl group (preferably a silyl group having 3 to 38 carbon atoms, more preferably 3 to 18 carbon atoms, such as trimethylsilyl group, triethylsilyl group, tributylsilyl group, t-butyldimethylsilyl group, t-hexyldimethylsilyl group)
  • a hydroxyl group, a cyano group, a nitro group, an alkoxy group preferably an alkoxy group having 1 to 48 carbon atoms, more preferably an alkoxy group having 1 to 24 carbon atoms, such as a methoxy group, an ethoxy group, 1- A butoxy group, a 2-butoxy group, an isopropoxy group, a t-butoxy group, a dodecyloxy group, and a cycloalkyloxy group such as a cyclopentyloxy group and a cyclohexyloxy group), an aryl An oxy group (preferably an aryl
  • a carbamoyloxy group (preferably a carbamoyloxy group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as N, N-dimethylcarbamoyloxy group, N-butylcarbamoyloxy group, N-phenylcarbamoyl group)
  • a sulfonyloxy group for example, a methylsulfonyloxy group, hexadecylsulfonyl An oxy group, a cyclohexylsulfonyloxy group), an arylsulfonyloxy group (preferably an arylsulfonyloxy group having 6 to 32 carbon atoms, more preferably 6 to 24 carbon atoms, such as a phenylsulfonyloxy group).
  • An acyl group (preferably an acyl group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as formyl group, acetyl group, pivaloyl group, benzoyl group, tetradecanoyl group, cyclohexa Noyl group).
  • An alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, an octadecyloxycarbonyl group, a cyclohexyloxycarbonyl group, 2, 6 -Di-tert-butyl-4-methylcyclohexyloxycarbonyl group), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 32 carbon atoms, more preferably 7 to 24 carbon atoms, ),
  • a carbamoyl group (preferably a carbamoyl group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as a carbamoyl group, N, N-diethylcarbamoyl group, N- Ethyl-N-octylcarbamo , N, N-dibut
  • an amino group a methylamino group, an N, N-dibutylamino group, a tetradecylamino group, a 2-ethylhexylamino group, a cyclohexyl group.
  • Anilino group preferably an anilino group having 6 to 32 carbon atoms, more preferably 6 to 24 carbon atoms, such as an anilino group and an N-methylanilino group
  • a heterocyclic amino group Preferably a heterocyclic amino group having 1 to 32 carbon atoms, more preferably 1 to 18 carbon atoms.
  • a carbonamido group (preferably a carbonamido group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, such as an acetamido group, a benzamido group, a tetradecanamido group, a pivaloylamido group, a cyclohexaneamido).
  • a carbonamido group preferably a carbonamido group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, such as an acetamido group, a benzamido group, a tetradecanamido group, a pivaloylamido group, a cyclohexaneamido).
  • Ureido group (preferably a ureido group having 1 to 32 carbon atoms, more preferably 1 to 24 carbon atoms, and examples thereof include ureido group, N, N-dimethylureido group and N-phenylureido group), imide.
  • a group preferably an imide group having 36 or less carbon atoms, more preferably 24 or less carbon atoms, such as N-succinimide group and N-phthalimide group
  • an alkoxycarbonylamino group preferably having 2 to 48, more preferably an alkoxycarbonylamino group having 2 to 24 carbon atoms, and examples thereof include a methoxycarbonylamino group, an ethoxycarbonylamino group, a t-butoxycarbonylamino group, an octadecyloxycarbonylamino group, and a cyclohexyloxycarbonylamino group.
  • Aryloxycarbonylamino group An aryloxycarbonylamino group having 7 to 32 carbon atoms, more preferably 7 to 24 carbon atoms is preferable, and examples thereof include a phenoxycarbonylamino group.
  • a sulfonamide group (preferably having 1 to 48 carbon atoms, more Preferred is a sulfonamide group having 1 to 24 carbon atoms, and examples thereof include a methanesulfonamide group, a butanesulfonamide group, a benzenesulfonamide group, a hexadecanesulfonamide group, and a cyclohexanesulfonamide group.), Sulfamoylamino A group (preferably a sulfamoylamino group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as N, N-dipropylsulfamoylamino group, N-ethyl-N-do
  • An azo group having 1 to 24 carbon atoms is more preferable, and examples thereof include a phenylazo group and a 3-pyrazolylazo group), an alkylthio group (preferably having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms).
  • An alkylthio group for example, a methylthio group, an ethylthio group, an octylthio group, a cyclohexylthio group), an arylthio group (preferably an arylthio group having 6 to 48 carbon atoms, more preferably 6 to 24 carbon atoms, For example, a phenylthio group), a heterocyclic thio group (preferably a heterocyclic thio group having 1 to 32 carbon atoms, more preferably 1 to 18 carbon atoms, such as a 2-benzothiazolylthio group, 2 -Pyridylthio group, 1-phenyltetrazolylthio group).
  • alkylsulfinyl group preferably an alkylsulfinyl group having 1 to 32 carbon atoms, more preferably an alkylsulfinyl group having 1 to 24 carbon atoms, such as a dodecanesulfinyl group
  • an arylsulfinyl group preferably having 6 to 32 carbon atoms, More preferably, it is an arylsulfinyl group having 6 to 24 carbon atoms, such as a phenylsulfinyl group, and an alkylsulfonyl group (preferably having 1 to 48 carbon atoms, more preferably an alkylsulfonyl group having 1 to 24 carbon atoms).
  • examples thereof include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, a butylsulfonyl group, an isopropylsulfonyl group, a 2-ethylhexylsulfonyl group, a hexadecylsulfonyl group, an octylsulfonyl group, and a cyclohexylsulfonyl group.
  • a rusulfonyl group (preferably an arylsulfonyl group having 6 to 48 carbon atoms, more preferably an arylsulfonyl group having 6 to 24 carbon atoms, such as a phenylsulfonyl group and a 1-naphthylsulfonyl group), a sulfamoyl group (preferably a carbon Sulfamoyl group having 32 or less, more preferably 24 or less carbon atoms, such as sulfamoyl group, N, N-dipropylsulfamoyl group, N-ethyl-N-dodecylsulfamoyl group, N-ethyl-N— Phenylsulfamoyl group, N-cyclohexylsulfamoyl group), sulfo group, phosphonyl group (preferably a phosphonyl group having 1 to 32 carbon atoms, more
  • the monovalent substituent described above is a further substitutable group, it may be further substituted with any of the groups described above.
  • those substituents may be the same or different.
  • R 1 and R 2 , R 2 and R 3 , R 4 and R 5 , and R 5 and R 6 are each independently bonded to each other to form 5, 6 or 7 members.
  • the ring may be formed.
  • either a saturated ring or an unsaturated ring may be sufficient.
  • Examples of the 5-membered, 6-membered, or 7-membered saturated ring or unsaturated ring include a pyrrole ring, a furan ring, a thiophene ring, a pyrazole ring, an imidazole ring, a triazole ring, an oxazole ring, a thiazole ring, a pyrrolidine ring, Examples include a piperidine ring, a cyclopentene ring, a cyclohexene ring, a benzene ring, a pyridine ring, a pyrazine ring and a pyridazine ring, and preferably a benzene ring and a pyridine ring.
  • the formed 5-membered, 6-membered and 7-membered rings are further substitutable groups, they are substituted with any of the groups exemplified as the monovalent substituent in the general formula (I). When it is substituted with two or more substituents, these substituents may be the same or different.
  • R 1 and R 6 preferably do not form a ring.
  • R 7 is a halogen atom, an alkyl group, an aryl group, or a heterocyclic group
  • these preferred ranges are the halogen atom, alkyl group, R 1 to R 6 described above, This is the same as the preferred range of the aryl group or heterocyclic group.
  • the metal or metal compound may be any metal atom or metal compound capable of forming a complex, and may be any divalent metal atom, divalent metal oxide, divalent metal hydroxide, or 2 Valent metal chlorides are included.
  • metal chlorides such as GeCl 2 , metal oxides such as TiO and VO, and metal hydroxides such as Si (OH) 2 are also included.
  • Fe, Zn, Mg, Si, Pt, Pd, Mo, Mn, Cu, Ni, Co, TiO, B from the viewpoints of stability, spectral characteristics, heat resistance, light resistance, and production suitability of the complex Or VO is preferable, Fe, Zn, Mg, Si, Pt, Pd, Cu, Ni, Co, B, or VO is more preferable, and Fe, Zn, Cu, Co, B, or VO is most preferable.
  • Zn is particularly preferable.
  • R 1 and R 6 are each independently a hydrogen atom, alkyl group, alkenyl group, aryl group, heterocyclic group, cyano group, acyl group, alkoxycarbonyl group, carbamoyl group, Amino group, heterocyclic amino group, carbonamido group, ureido group, imide group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfonamido group, azo group, alkylsulfonyl group, arylsulfonyl group, or phosphinoylamino group
  • R 2 and R 5 are each independently an alkyl group, alkenyl group, aryl group, heterocyclic group, cyano group, nitro group, acyl group, alkoxycarbonyl group
  • R 1 , R 2 , R 3 , R 4 , R 5 and R 6 each independently represent a hydrogen atom or a monovalent substituent.
  • Examples of the monovalent substituent when R 1 to R 6 represent a monovalent substituent include the monovalent substituents exemplified for R 1 to R 6 in the general formula (I). Is the same. Note that at least one pair of R 1 and R 2 , R 2 and R 3 , R 4 and R 5 , and R 5 and R 6 is bonded to each other to form a 5-membered, 6-membered, or 7-membered saturated ring, Alternatively, an unsaturated ring may be formed.
  • the metal is preferably Zn, Mg, Sc, Fe, Al, Cr, Si, Pt, Pd, Mo, Mn, Cu, Ni , Co, TiO, or VO, more preferably Zn, Mg, Sc, Fe, Al, Mn, Cu, Ni, Co, TiO, or VO, and particularly preferably Zn, Cu, or Co. .
  • R 8 , R 9 , R 10 , and R 11 are each independently a hydrogen atom, a saturated hydrocarbon group having 1 to 10 carbon atoms, or an aromatic carbon atom having 6 to 10 carbon atoms. Represents a hydrogen group.
  • the saturated hydrocarbon group having 1 to 10 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neopentyl, cyclopentyl, hexyl, cyclohexyl, heptyl, cycloheptyl, octyl, 2-ethylhexyl.
  • preferred is an alkyl group having 1 to 9 carbon atoms, and more preferred is an alkyl group having 1 to 8 carbon atoms.
  • Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms include groups such as phenyl and naphthyl.
  • the aromatic hydrocarbon group having 6 to 10 carbon atoms includes a halogen atom, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OH, —OR, —SO 3 ⁇ , —SO 3 H, —SO 3 M, —CO It may be substituted with 2 H, —CO 2 R 13 , —SO 3 R 13 , —SO 2 NHR 14 , or —SO 2 NR 14 R 15 .
  • R and R 13 each represent a saturated hydrocarbon group having 1 to 10 carbon atoms, and have the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in R 8 to R 11 , and the preferred embodiments are also the same. Details of R 14 , R 15 , and M will be described later.
  • Examples of the halogen atom include fluorine, chlorine, bromine and the like.
  • Examples of the “—SO 3 R 13 ” include methanesulfonyl, ethanesulfonyl, hexanesulfonyl, decanesulfonyl and the like.
  • Examples of the “—CO 2 R 13 ” include methyloxycarbonyl, ethyloxycarbonyl, propyloxycarbonyl, isopropyloxycarbonyl, butyloxycarbonyl, isobutyloxycarbonyl, pentyloxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl.
  • R 14 and R 15 are each independently a hydrogen atom, a linear or branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 10 carbon atoms, Alternatively, it represents an aromatic heterocyclic group having 5 to 10 carbon atoms, and R 14 and R 15 may be bonded to each other to form a heterocyclic ring having 1 to 10 carbon atoms.
  • the aromatic hydrocarbon group and the aromatic heterocyclic group represented by R 14 and R 15 are —OH, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OR, —NO 2 , —CH ⁇ It may be substituted with CH 2 , —CH ⁇ CHR, or a halogen atom.
  • R represents a saturated hydrocarbon group having 1 to 10 carbon atoms.
  • the saturated hydrocarbon group having 1 to 10 carbon atoms has the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in the above R 8 to R 11 , and the preferred embodiment is also the same.
  • the linear or branched alkyl group having 1 to 10 carbon atoms represented by R 14 and R 15 may be unsubstituted or substituted, and examples thereof include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, Examples include pentyl, isopentyl, hexyl, 2-ethylhexyl, 1,5-dimethylhexyl, octyl and the like. Of these, a linear or branched alkyl group having 1 to 8 carbon atoms is preferable.
  • the cycloalkyl group having 3 to 30 carbon atoms represented by R 14 and R 15 may be unsubstituted or substituted, and examples thereof include groups such as cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, and tricyclodecyl. Is mentioned. Of these, a cycloalkyl group having 3 to 15 carbon atoms is preferable.
  • Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms represented by R 14 and R 15 include groups such as phenyl and naphthyl.
  • Examples of the aromatic heterocyclic group having 5 to 10 carbon atoms represented by R 14 and R 15 include aromatic heterocyclic groups having an oxygen atom, a nitrogen atom or the like as a hetero atom, such as a pyrrole ring group and a pyrazine ring. Pyridine ring group, thiazine ring group, triazine ring group, pyran ring group, furan ring group, morpholine ring group, and the like.
  • the linear or branched alkyl group having 1 to 10 carbon atoms and the cycloalkyl group having 3 to 30 carbon atoms may be substituted.
  • substituent when they are substituted include a hydroxyl group, a halogen atom, an aromatic hydrocarbon group having 6 to 10 carbon atoms, an aromatic heterocyclic group having 5 to 10 carbon atoms, —CH ⁇ CH 2 , Or —CH ⁇ CHR 6 (R 6 : a saturated hydrocarbon group having 1 to 10 carbon atoms).
  • the methylene group contained in the cycloalkyl group may be substituted with an oxygen atom, a carbonyl group, or —NR 6 — (R 6 : a saturated hydrocarbon group having 1 to 10 carbon atoms).
  • the saturated hydrocarbon group having 1 to 10 carbon atoms has the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in R 1 to R 4 , and the preferred embodiment is also the same.
  • the aromatic hydrocarbon group having 6 to 10 carbon atoms may be substituted.
  • the substituent when it is substituted for example, ethyl, propyl, phenyl, dimethylphenyl, —SO 3 R (R: a saturated hydrocarbon group having 1 to 10 carbon atoms) or —SO 2 NHR 14 is preferable.
  • Examples of the substituted aromatic hydrocarbon group having 6 to 10 carbon atoms include methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, hexylphenyl, decanylphenyl, fluorophenyl, chlorophenyl, bromophenyl, hydroxyphenyl, Examples include methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, decanyloxyphenyl, and trifluoromethylphenyl.
  • the heterocyclic ring having 1 to 10 carbon atoms is a saturated hydrocarbon group having 1 to 10 carbon atoms, a hydroxyl group , An aromatic hydrocarbon group having 6 to 10 carbon atoms, or an aromatic heterocyclic group having 5 to 10 carbon atoms may be substituted.
  • R 14 and R 15 are each a branched alkyl group having 6 to 8 carbon atoms, a cycloalkyl group having 5 to 7 carbon atoms, an allyl group, a phenyl group, an aralkyl group having 8 to 10 carbon atoms, carbon A hydroxyl group-containing alkyl group having 2 to 8 carbon atoms, a hydroxyl group-containing aryl group having 2 to 8 carbon atoms, or an alkoxyl group-containing alkyl group having 2 to 8 carbon atoms, an alkoxyl group-containing aryl group having 2 to 8 carbon atoms is preferable, and 2-ethylhexyl is preferable. Particularly preferred.
  • M represents a sodium atom or a potassium atom.
  • R 12 represents —SO 3 — , —SO 3 H, —SO 3 M, —CO 2 H, —CO 2 R, —SO 3 R, —SO 2 NHR 14 , or —SO 2 NR 14 R 15 . . R, R 14 , R 15 , and M are as described above, and the preferred embodiments are also the same.
  • R 12 is —CO 2 H, ethyloxycarbonyl, sulfoxyl, 2-ethylhexyloxypropane sulfamoyl, 1,5-dimethylhexanesulfamoyl, 3-phenyl-1-methylpropanesulfamoyl, iso
  • An embodiment that is propoxypropane sulfamoyl is preferred.
  • M represents an integer of 0 to 5.
  • n1, n2, n3 and n4 each independently represents 0 or 1. However, the sum of n1 to n4 is 3 or 4.
  • X represents a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom.
  • a represents an integer of 0 or 1.
  • at least one group of R 8 to R 11 and R 12 may exist as an anion group from which one hydrogen atom is removed.
  • At least one of R 8 and R 9 or at least one of R 10 and R 11 is an alkyl group having 1 to 4 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms is preferable. More preferably, at least one of R 8 and R 9 and at least one of R 10 and R 11 is an alkyl group having 1 to 4 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, An embodiment in which at least one of R 8 and R 9 and at least one of R 10 and R 11 is an aromatic hydrocarbon group having 6 to 10 carbon atoms is preferred.
  • Specific examples of the dye represented by the general formula (III) include compounds described in paragraph No. 0010 of Japanese Patent No. 3387541.
  • R 16 , R 17 , R 18 , R 19 , R 20 , and R 21 are each independently a hydrogen atom, a saturated hydrocarbon group having 1 to 10 carbon atoms, or 6 carbon atoms. Represents 10 to 10 aromatic hydrocarbon groups.
  • saturated hydrocarbon group having 1 to 10 carbon atoms examples include alkyl groups (for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neopentyl, cyclopentyl, hexyl, cyclohexyl, heptyl, cycloheptyl, Octyl, 2-ethylhexyl, cyclooctyl, nonyl, decanyl, tricyclodecanyl, methoxypropyl, ethoxypropyl, hexyloxypropyl, 2-ethylhexyloxypropyl, methoxyhexyl, ethoxypropyl, etc.), alkenyl group (for example, butenyl group, Straight-chain alkenyl groups such as hexenyl group, pentenyl group, octenyl group).
  • Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms include groups such as phenyl and naphthyl.
  • the aromatic hydrocarbon group having 6 to 10 carbon atoms includes a halogen atom, an aromatic hydrocarbon group having 6 to 10 carbon atoms, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OH, —OR, —SO 3 ⁇ , It may be substituted with —SO 3 H, —SO 3 M, —CO 2 H, —CO 2 R, —SO 3 R, —SO 2 NHR.
  • R represents an aromatic hydrocarbon group having 6 to 10 carbon atoms or a saturated hydrocarbon group having 1 to 10 carbon atoms, and the “aromatic hydrocarbon group having 6 to 10 carbon atoms” in the above R 16 to R 21 ; It is synonymous with “saturated hydrocarbon group having 1 to 10 carbon atoms”, and preferred embodiments are also the same.
  • the “aromatic hydrocarbon group having 6 to 10 carbon atoms” and the “saturated hydrocarbon group having 1 to 10 carbon atoms” represented by R may be substituted with a halogen atom.
  • the methylene group contained in the saturated hydrocarbon group having 1 to 10 carbon atoms may be substituted with an oxygen atom, a carbonyl group, or —NR—.
  • halogen atom examples include a fluorine atom, a chlorine atom, and a bromine atom.
  • —SO 3 R examples include methanesulfonyl, ethanesulfonyl, hexanesulfonyl, decanesulfonyl and the like.
  • Examples of the “—CO 2 R” include methyloxycarbonyl, ethyloxycarbonyl, propyloxycarbonyl, isopropyloxycarbonyl, butyloxycarbonyl, isobutyloxycarbonyl, pentyloxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl, Cyclopentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxycarbonyl, heptyloxycarbonyl, cycloheptyloxycarbonyl, octyloxycarbonyl, 2-ethylhexyloxycarbonyl, cyclooctyloxycarbonyl, nonyloxycarbonyl, decanyloxycarbonyl, tricyclodecanyloxy Carbonyl, methoxypropyloxycarbonyl, ethoxypropyloxyca Boniru, hexyloxy propyl oxycarbony
  • Examples of the “—SO 2 NHR” include sulfamoyl, methanesulfamoyl, ethanesulfamoyl, propanesulfamoyl, isopropanesulfamoyl, butanesulfamoyl, isobutanesulfamoyl, pentansulfamoyl, isopentane.
  • Examples of the “—OR” include a methoxy group, an ethoxy group, a propoxy group, and a hexyloxy group.
  • Preferable substituents when the aromatic hydrocarbon group having 6 to 10 carbon atoms is substituted include ethyl, propyl, phenyl, dimethylphenyl, —SO 3 R, —SO 2 NHR, and the like.
  • —SO 3 R and —SO 2 NHR are as described above.
  • substituted aromatic hydrocarbon group having 6 to 10 carbon atoms include methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, hexylphenyl, decanylphenyl, fluorophenyl, chlorophenyl, bromophenyl, and hydroxyphenyl. , Methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, decanyloxyphenyl, trifluoromethylphenyl and the like.
  • M represents a sodium atom or a potassium atom.
  • R 22 and R 23 each independently represents a hydrogen atom or a saturated hydrocarbon group having 4 to 8 carbon atoms.
  • the saturated hydrocarbon group having 4 to 8 carbon atoms include butyl group, heptyl group, hexyl group, octyl group and the like.
  • R 22 and R 23 may be bonded to each other to form an aromatic hydrocarbon ring.
  • Preferred examples of the aromatic hydrocarbon ring in this case include a benzene ring and a naphthalene ring.
  • R 24 represents a hydrogen atom or a saturated hydrocarbon group having 1 to 10 carbon atoms.
  • the saturated hydrocarbon group having 1 to 10 carbon atoms represented by R 24 has the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in R 16 to R 21 .
  • R 24 is preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
  • X represents a halogen atom, BF 4 , PF 6 , ClO 4 , N (SO 2 CF 3 ) 2 , or ArSO 3 .
  • Ar in ArSO 3 represents an aromatic hydrocarbon group having 6 to 10 carbon atoms.
  • the aromatic hydrocarbon group having 6 to 10 carbon atoms has the same meaning as the “aromatic hydrocarbon group having 6 to 10 carbon atoms” in R 16 to R 21 , and the preferred embodiment is also the same.
  • Examples of the halogen atom represented by X include a fluorine atom, a chlorine atom, and a bromine atom.
  • the aromatic hydrocarbon group having 6 to 10 carbon atoms represented by Ar is synonymous with the aromatic hydrocarbon group having 6 to 10 carbon atoms represented by R 16 to R 21 , and preferred embodiments thereof are also the same.
  • the aromatic hydrocarbon group having 6 to 10 carbon atoms is a halogen atom, an aromatic hydrocarbon group having 6 to 10 carbon atoms, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OH, —OR, —SO 3 ⁇ , It may be substituted with —SO 3 H, —SO 3 M, —CO 2 H, —CO 2 R, —SO 3 R, —SO 2 NHR, —SO 2 N (R) 2 .
  • a phenyl group and a naphthyl group are preferable.
  • Specific examples of the dye represented by formula (IV) include the following compounds.
  • a plurality of Xs each independently represent a halogen atom.
  • a plurality of R 25 each independently represents a group represented by the following general formula (VI) or general formula (VII).
  • Plural Rs each independently represent a hydrogen atom or a monovalent substituent.
  • M represents Cu, Zn, V ( ⁇ O), Mg, Ni, Ti ( ⁇ O), Mg, Sn, or Si.
  • a plurality of a's each independently represents an integer of 0 to 4
  • a plurality of n's each independently represents an integer of 0 to 4
  • a plurality of r's each independently represents an integer of 0 to 4. .
  • At least one of the plurality of a is 1 or more, and at least one of the plurality of n is 1 or more.
  • the sum of the plurality of a, the plurality of n, and the plurality of r is 16.
  • a plurality of R 25 are all the same substituent, a plurality of a are all the same, and a plurality of n are not all the same.
  • R 26s each independently represents a monovalent substituent selected from the group consisting of the following general formulas (VIII) to (X).
  • R 27 represents a monovalent substituent.
  • b represents an integer of 1 to 5
  • c represents an integer of 0 to 4.
  • Y represents —O—, —S—, —SO 2 —, or —NR 28 —.
  • R 28 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
  • R 29 represents a hydrogen atom, an alkyl group which may have a substituent, an oxyalkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent.
  • d represents an integer of 0 to 2, and when d is 0 or 1, R 30 is an alkyl group which may have a substituent, or an aryl group which may have a substituent. And when d is 2, R 30 has an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, and a substituent. It represents a diarylamino group which may be substituted, or an alkylarylamino group which may have a substituent.
  • R 31 has an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, and a substituent.
  • An optionally substituted arylcarbonyl group, an optionally substituted alkylsulfonyl group, an optionally substituted arylsulfonyl group, R 32 represents a hydrogen atom, an optionally substituted alkyl group, Or the aryl group which may have a substituent is represented.
  • the compound represented by the general formula (V) used in the present invention is a mixture of two or more kinds having different numbers of substitutions, a, n and r each mean an average value of the compounds in the mixture.
  • X represents a halogen atom, preferably a chlorine atom or a bromine atom, and more preferably a chlorine atom. Further, when the substitution position of X is the ⁇ -position of the phthalocyanine skeleton, the absorption wavelength becomes longer, and it can be suitably used for a green color filter.
  • a plurality of n's independently represents an integer of 0 to 4, preferably an integer of 1 to 3. The total number of n is preferably 1 to 14, more preferably 6 to 14, and particularly preferably 9 to 12.
  • R 25 represents a group represented by General Formula (VI) or General Formula (VII), and more preferably a group represented by General Formula (VI).
  • a plurality of a's each independently represents an integer of 0 to 4, preferably 1 or 2.
  • the total number of a is preferably 1 to 14, particularly preferably 2 to 8, and more preferably 3 to 5.
  • M represents Cu, Zn, V ( ⁇ O), Mg, Ni, Ti ( ⁇ O), Mg, Sn, or Si, and Zn or Cu is preferable.
  • R represents a hydrogen atom or a monovalent substituent. Examples of the monovalent substituent include the substituent T described later.
  • R is preferably a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group, more preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, or a phenoxy group, More preferred is a hydrogen atom.
  • a plurality of r each independently represents an integer of 0 to 4.
  • R 26 in general formula (VI) and general formula (VII) each independently represents a monovalent substituent selected from the group consisting of general formula (VIII) to general formula (X).
  • a monovalent substituent represented by VIII) or (IX) is preferred.
  • b is an integer of 1 to 5, preferably 1 or 2. When b is 2 or more, a plurality of R 26 may be the same or different.
  • R ⁇ 27 > in general formula (VI) and general formula (VII) represents a monovalent substituent.
  • the monovalent substituent represented by R 27 can be selected from the substituent T described later, and is a halogen atom (preferably a chlorine atom or a bromine atom), a cyano group, a nitro group, a hydroxyl group, an amino group, an aryl group, or a total carbon.
  • An arylthio group, an alkyl group having 1 to 20 carbon atoms, and an alkoxy group having 1 to 20 carbon atoms are preferable, and a methyl group or a methoxy group is more preferable.
  • c is an integer of 0 to 4, preferably 0 or 1, and more preferably 0. When c is 2 or more, a plurality of R 3 may be the same or different.
  • Y is, -O -, - S -, - SO 2 -, or -NR 28 - represents, -O- or -SO 2 - are preferred, -O -Is more preferable.
  • R 28 represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group, preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a phenyl group, An atom or a methyl group is more preferable, and a hydrogen atom is more preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
  • R 29 in the general formula (VIII) is a hydrogen atom, an alkyl group which may have a substituent, an oxyalkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent.
  • An alkylamino group which may have a substituent, a dialkylamino group which may have a substituent, an arylamino group which may have a substituent, a diarylamino group which may have a substituent, or a substituent Represents an alkylarylamino group which may have a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, a dialkylamino group having 2 to 20 carbon atoms, a total carbon number of 12
  • Jary A ruamino group or an alkylarylamino group having 7 to 20 carbon atoms is more preferable, and a diarylamino group having 12 to 20 carbon atoms or a dialkylamino group having 2 to 20 carbon atoms is particularly preferable.
  • the alkyl moiety and aryl moiety such as the alkyl group and aryl group described above may further have a substituent.
  • a substituent an alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, an arylthio group, or a halogen atom is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable.
  • the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
  • d represents an integer of 0 to 2, and when d is 0 or 1, R 30 is an alkyl group which may have a substituent, or an aryl which may have a substituent. And when d is 2, the alkyl group which may have a substituent, the aryl group which may have a substituent, the dialkylamino group which may have a substituent, and the substituent Or a diarylamino group which may be substituted or an alkylarylamino group which may have a substituent.
  • R 30 is preferably a dialkylamino group having 2 to 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms when d is 2.
  • the alkyl moiety and the aryl moiety such as the above-described alkyl group and aryl group may further have a substituent, and examples of the substituent include a substituent T described later, an alkoxy group, an aryl group, an aryloxy group, An alkoxycarbonyl group, an alkylthio group, an arylthio group, a halogen atom or the like is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
  • R 31 has an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, and a substituent.
  • the alkyl moiety and the aryl moiety such as the above-described alkyl group and aryl group may further have a substituent, and examples of the substituent include a substituent T described later, an alkoxy group, an aryl group, an aryloxy group, An alkoxycarbonyl group, an alkylthio group, an arylthio group, a halogen atom or the like is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
  • R 32 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent, an alkyl group having 1 to 20 carbon atoms or a carbon number of 6 ⁇ 20 aryl groups are preferred.
  • the alkyl moiety and the aryl moiety such as the above-described alkyl group and aryl group may further have a substituent, and examples of the substituent include a substituent T described later, an alkoxy group, an aryl group, an aryloxy group, An alkoxycarbonyl group, an alkylthio group, an arylthio group, a halogen atom or the like is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
  • alkyl group which may have a substituent in the general formulas (VI) to (X) are shown below.
  • Examples of the alkyl group which may have a substituent include a methyl group, an ethyl group, a propyl group, an isopropyl group, a tert-butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a 2-ethylhexyl group, a dodecyl group, Hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group, phenoxyethyl group, benzyl group, phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibut
  • methyl group ethyl group, propyl group, tert-butyl group, phenoxyethyl.
  • benzyl group phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group and ethoxyethoxyethyl group.
  • aryl group that may have a substituent in the general formulas (VI) to (X) are shown below.
  • the aryl group which may have a substituent include a phenyl group, 2-chlorophenyl group, 2-methoxyphenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N— And butylaminosulfonylphenyl group, 4-N, N-dibutylaminosulfonylphenyl group, and more preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N- Butylaminosulfonylphenyl group, 4-N, N-dibutylaminosulfonylphenyl group, and particularly preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutoxycarbonyl
  • dialkylamino group which may have a substituent in the above general formulas (VI) to (X) are shown below.
  • Examples of the dialkylamino group which may have a substituent include N, N-dimethylamino group, N, N-dibutylamino group, N, N-di (2-ethylhexyl) amino group, and N-methyl-N-benzyl.
  • Amino group, N, N-di (2-ethoxyethyl) amino group, N.I. N-di (2-hydroxyethyl) amino group may be mentioned.
  • diarylamino group which may have a substituent in the above general formulas (VI) to (X) are shown below.
  • Examples of the diarylamino group that may have a substituent include N, N-diphenylamino group, N, N-di (4-methoxyphenyl) amino group, and N, N-di (4-acylphenyl) amino group. Can be mentioned.
  • alkylarylamino group which may have a substituent in the general formulas (VI) to (X) are shown below.
  • alkylarylamino group which may have a substituent include N-methyl-N-phenylamino group, N-benzyl-N-phenylamino group, and N-methyl-N- (4-methoxyphenyl) amino group. Can be mentioned.
  • alkylcarbonyl group which may have a substituent in the above general formulas (VI) to (X) are shown below.
  • alkylcarbonyl group which may have a substituent include an acetyl group, a propylcarbonyl group, a heptyl-3-carbonyl group, a 2-ethylhexyloxymethylcarbonyl group, a phenoxymethylcarbonyl group, and a 2-ethylhexyloxycarbonylmethylcarbonyl group. Can be mentioned.
  • arylcarbonyl group which may have a substituent in the above general formulas (VI) to (X) are shown below.
  • arylcarbonyl group which may have a substituent include a benzoyl group, a 4-methoxybenzoyl group, and a 4-ethoxycarbonylbenzoyl group.
  • alkylsulfonyl group that may have a substituent in the general formulas (VI) to (X) are shown below.
  • alkylsulfonyl group which may have a substituent include a methanesulfonyl group, an octanesulfonyl group, a dodecylsulfonyl group, a benzylsulfonyl group, and a phenoxypropylsulfonyl group.
  • arylsulfonyl group which may have a substituent in the general formulas (VI) to (X) are shown below.
  • arylsulfonyl group which may have a substituent include a phenylsulfonyl group, a 2-methoxyphenylsulfonyl group, and a 4-ethoxycarbonylphenylsulfonyl group.
  • alkylsulfonylamino group which may have a substituent in the general formulas (VI) to (X) are shown below.
  • alkylsulfonylamino group which may have a substituent include a methylsulfonylamino group, a butylsulfonylamino group, a hydroxypropylsulfonylamino group, a 2-ethylhexylsulfonylamino group, an n-octylsulfonylamino group, and a phenoxyethylsulfonylamino group. And an allylsulfonylamino group.
  • examples of the vinylsulfonylamino group which may have a substituent include a vinylsulfonylamino group and a 1-methylvinylsulfonylamino group.
  • the arylsulfonylamino group which may have a substituent includes a phenylsulfonylamino group, a p-methoxyphenylsulfonylamino group, a p-ethoxycarbonylsulfonylamino group, and the like. Can be mentioned.
  • the alkylcarbonylamino group which may have a substituent is a methylcarbonylamino group, a 2-ethylhexanoylamino group, an n-heptylcarbonylamino group, an ethoxyethoxy group.
  • Examples include a methylcarbonylamino group.
  • examples of the arylcarbonylamino group which may have a substituent include a benzoylamino group, a 2-methoxybenzoylamino group, and a 4-vinylbenzoylamino group.
  • An alkyl group preferably a linear, branched or cyclic alkyl group having 1 to 24 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, Hexyl group, heptyl group, octyl group, 2-ethylhexyl group, dodecyl group, hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group), alkenyl group (preferably having a carbon number of 2 to 18 alkenyl groups such as vinyl group, allyl group, 3-buten-1-yl group), aryl groups (preferably aryl groups having 6 to 24 carbon atoms such as phenyl group, naphthyl group), heterocyclic ring Group (preferably a heterocyclic
  • a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 18 carbon atoms, for example, 1-phenyltetrazol-5-oxy group, 2-tetrahydropyranyloxy group), silyloxy group (preferably having 1 to 18 carbon atoms) Silyloxy groups such as trimethylsilyloxy group, tert-butyldimethylsilyloxy group, diphenylmethylsilyloxy group), acyloxy groups (preferably acyloxy groups having 2 to 24 carbon atoms, such as acetoxy group, pivaloyloxy group, benzoyl group) Oxy group, dodecanoyloxy group), alkoxycarbonyloxy group (preferably an alkoxycarbonyloxy group having 2 to 24 carbon atoms, such as ethoxycarbonyloxy group, tert-butoxycarbonyloxy group, cyclohexyloxycarbonyloxy group), A reeloxycarbonyloxy group (preferably an aryloxycarbonyloxy group
  • An acyl group (preferably an acyl group having 1 to 24 carbon atoms, for example, formyl group, acetyl group, pivaloyl group, benzoyl group, tetradecanoyl group, cyclohexanoyl group), alkoxycarbonyl group (preferably having 2 to 2 carbon atoms) 24 alkoxycarbonyl groups, for example, methoxycarbonyl group, ethoxycarbonyl group, octadecyloxycarbonyl group, cyclohexyloxycarbonyl group, 2,6-di-tert-butyl-4-methylcyclohexyloxycarbonyl group), aryloxycarbonyl group (Preferably an aryloxycarbonyl group having 7 to 24 carbon atoms such as phenoxycarbonyl group), carbamoyl group (preferably a carbamoyl group having 1 to 24 carbon atoms such as carbamoyl group, N, N-diethylcarb
  • An aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 24 carbon atoms, such as a phenoxycarbonylamino group), a sulfonamide group (preferably a sulfonamide group having 1 to 24 carbon atoms, such as methanesulfone Amide group, butanesulfonamide group, benzenesulfonamide group, hexadecanesulfonamide group, cyclohexanesulfonamide group), sulfamoylamino group (preferably a sulfamoylamino group having 1 to 24 carbon atoms, for example, N, N -Dipropylsulfamoylamino group, N-ethyl-N-dodecylsulfamoylamino group), azo group (preferably an azo group having 1 to 24 carbon atoms, such as phenylazo group, 3-pyrazolylazo
  • Sulfamoyl group (preferably a sulfamoyl group having 24 or less carbon atoms, such as sulfamoyl group, N, N-dipropylsulfamoyl group, N-ethyl-N-dodecylsulfamoyl group, N-ethyl-N-phenylsulfa group) Moyl group, N-cyclohexylsulfamoyl group), sulfo group, phosphonyl group (preferably phosphonyl group having 1 to 24 carbon atoms, such as phenoxyphosphonyl group, octyloxyphosphonyl group, phenylphosphonyl group), phosphine group It represents a finoylamino group (preferably a phosphinoylamino group having 1 to 24 carbon atoms, such as a diethoxyphosphinoylamino group or a dioctyloxy
  • the substituent T is an alkaline aqueous solution solubilized part, for example, a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, a sulfonimide group, a phenolic hydroxyl group, an acetoacetamide group, for the purpose of improving developability with respect to an alkaline developer.
  • Substituents such as acetoacetic ester groups and substituents such as alkyl groups, alkyloxy groups, alkylthio groups, aryloxy groups, arylthio groups, alkylsulfonyl groups, arylsulfonyl groups and the like in which these groups are substituted are preferably used. .
  • substituent When the above-described substituent is a further substitutable group, it may be further substituted with any of the above-described substituents. In addition, when it has two or more substituents, those substituents may be the same or different. However, the substituent in the present invention preferably has a mass per molecule of 500 or less.
  • R 33 , R 34 , R 35 and R 36 are each independently a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a sulfonylamino group, or a carbonylamino group.
  • a cyano group, an aryl group, or a heteroaryl group, and a plurality of R 33 and R 34 present in the molecule may be the same as or different from each other.
  • R 36 , R 37 , R 38 , R 39 , and R 40 are each independently a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, or a sulfonylamino group.
  • a carbonylamino group, a cyano group, an aryl group, or a heteroaryl group, and a plurality of R 37 present in the molecule may be the same as or different from each other.
  • R 33 in the general formula (XI) and R 37 in the general formula (XII) are preferably an alkyl group, an aryl group, or a cyano group, and the alkyl group and the aryl group may further have a substituent.
  • substituents that can be introduced into the alkyl group and the aryl group include an alkoxy group, a thioalkoxy group, a cyano group, and a halogen atom.
  • R 33 and R 37 are more preferably a t-butyl group, a phenyl group, or an o-methylphenyl group.
  • R 35 in general formula (XI) is more preferably a hydrogen atom
  • R 36 in general formula (XI) and general formula (XII) is preferably a hydrogen atom or a methyl group, more preferably a hydrogen atom.
  • R 34 , R 39 , and R 40 are each a hydrogen atom, alkyl group, alkoxy group, alkoxycarbonyl group, carbamoyl group, sulfamoyl group, sulfonylamino group, carbonylamino group, cyano group, aryl group, and heteroaryl group
  • R 41 and R 42 each independently represent a hydrogen atom or a monovalent substituent.
  • R 43 represents a hydrogen atom, an aliphatic group, an aryl group, a heterocyclic group, a carbamoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group, or a sulfamoyl group.
  • Q represents a diazo component residue.
  • the dye represented by the general formula (XIII) may form a dimer or more multimer at an arbitrary position.
  • the monovalent substituents represented by R 41 and R 42 are each independently a halogen atom, an aliphatic group, an aryl group, a heterocyclic group, a cyano group, a carboxyl group, a carbamoyl group, an aliphatic group.
  • each of these groups may be further substituted, and each monovalent substituent represented by R 1 to R 5 has a total carbon number of 1 to 40, preferably 3 to 25. By setting it as this range, the storage stability of the colored curable composition is good, and a colored curable composition having high brightness can be obtained.
  • the aliphatic group represented by R 41 to R 43 may have a substituent, may be saturated or unsaturated, and may be cyclic. Specific examples include alkyl groups, substituted alkyl groups, alkenyl groups, substituted alkenyl groups, alkynyl groups, substituted alkynyl groups, aralkyl groups, and substituted aralkyl groups.
  • the total number of carbon atoms in the aliphatic group is preferably 1-30, and more preferably 1-16.
  • aliphatic group examples include, for example, methyl group, ethyl group, butyl group, isopropyl group, t-butyl group, hydroxyethyl group, methoxyethyl group, cyanoethyl group, trifluoromethyl group, 3-sulfopropyl group, Examples include 4-sulfobutyl group, cyclohexyl group, benzyl group, 2-phenethyl group, vinyl group, and allyl group.
  • the aryl group represented by R 41 to R 43 may have a substituent, preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 16 carbon atoms.
  • a substituent preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 16 carbon atoms.
  • the heterocyclic group represented by R 41 to R 43 may be saturated or unsaturated, and includes the following aromatic heterocyclic groups, including a nitrogen atom, a sulfur atom, an oxygen atom, etc. Including any of the above heteroatoms, may further have a substituent, and is preferably a heterocyclic group having 1 to 30 carbon atoms in total, and a heterocyclic group having 1 to 15 carbon atoms. Is more preferable. Specific examples include 2-pyridyl group, 2-thienyl group, 2-thiazolyl group, 2-benzothiazolyl group, 2-benzoxazolyl group, 2-furyl group and the like.
  • the carbamoyl group represented by R 41 to R 43 may have a substituent, is preferably a carbamoyl group having 1 to 30 carbon atoms, and more preferably a carbamoyl group having 1 to 16 carbon atoms. . Specific examples include a methylcarbamoyl group, a dimethylcarbamoyl group, a phenylcarbamoyl group, and an N-methyl-N-phenylcarbamoyl group.
  • the aliphatic oxycarbonyl group represented by R 41 to R 43 may have a substituent, may be saturated or unsaturated, may be cyclic, and has a total number of carbon atoms of 2
  • An aliphatic oxycarbonyl group having 30 to 30 carbon atoms is preferable, and an aliphatic oxycarbonyl group having 2 to 16 carbon atoms in total is more preferable.
  • Specific examples include a methoxycarbonyl group, an ethoxycarbonyl group, and a 2-methoxyethoxycarbonyl group.
  • the aryloxycarbonyl group represented by R 41 to R 43 may have a substituent, preferably an aryloxycarbonyl group having 7 to 30 carbon atoms in total, and an aryloxycarbonyl group having 7 to 16 carbon atoms. Is more preferable. Specific examples include a phenoxycarbonyl group, a 4-methylphenoxycarbonyl group, and a 3-chlorophenoxycarbonyl group.
  • the acyl group represented by R 41 to R 43 includes an aliphatic carbonyl group, an arylcarbonyl group, and a heterocyclic carbonyl group, and preferably has a total carbon number of 1 to 30, and has a total carbon number of An embodiment having 1 to 16 is more preferable. Specific examples include an acetyl group, a methoxyacetyl group, a thienoyl group, and a benzoyl group.
  • the aliphatic sulfonyl group represented by R 41 to R 43 may have a substituent, may be saturated or unsaturated, may be cyclic, and has a total carbon number of 1 to An embodiment having 30 is preferable, and an embodiment having 1 to 16 total carbon atoms is more preferable.
  • a methanesulfonyl group, a methoxymethanesulfonyl, an ethoxyethanesulfonyl group, etc. are mentioned, for example.
  • the arylsulfonyl group represented by R 41 to R 43 may have a substituent, and preferably has a total carbon number of 6 to 30, and more preferably has a total carbon number of 6 to 18. Specific examples include benzenesulfonyl and toluenesulfonyl groups.
  • the sulfamoyl group represented by R 41 to R 43 may have a substituent, and preferably has a total carbon number of 0 to 30, more preferably a total carbon number of 0 to 16. Specific examples include a sulfamoyl group, a dimethylsulfamoyl group, and a di- (2-hydroxyethyl) sulfamoyl group.
  • the imide group represented by R 41 to R 43 may have a substituent and is preferably a 5- to 6-membered imide group.
  • Specific examples include succinimide and phthalimide groups.
  • the diazo component residue represented by Q means the residue of the diazo component “B—NH 2 ”.
  • Q is preferably an aryl group or an aromatic heterocyclic group. Is preferred.
  • the aromatic heterocyclic group is an aromatic ring containing any one of hetero atoms such as nitrogen atom, sulfur atom and oxygen atom in the ring, and preferably a 5- to 6-membered ring.
  • the number of carbon atoms in the aromatic heterocyclic group is preferably 1 to 25, and more preferably 1 to 15.
  • Specific examples of the aromatic heterocycle include pyrazole group, 1,2,4-triazole group, isothiazole group, benzoisothiazole group, thiazole group, benzothiazole group, oxazole group, 1,2,4 thiadiazole group. Etc.
  • the compound represented by the general formula (XIII) preferably has the following mode. That is, R 41 is a cyano group, aliphatic oxycarbonyl group or carbamoyl group, R 42 is an aliphatic group, R 43 is an aliphatic group, acyl group, aryl group, aliphatic carbonyl group, aliphatic sulfonyl group Or an arylsulfonyl group, and Q is an aryl group.
  • the colorant of the present invention can be composed of only a pigment for reasons such as using a pigment in combination with a dye, or placing importance on heat resistance.
  • Conventionally known various inorganic pigments or organic pigments can be used as the pigment, but organic pigments are preferably used from the viewpoint of reliability.
  • Examples of the organic pigment in the present invention include organic pigments described in paragraph [0093] of JP-A-2009-256572.
  • the following pigments are suitable from the viewpoint of color reproducibility, but are not limited to these in the present invention.
  • These organic pigments can be used alone or in various combinations in order to increase color purity.
  • Cabot Corporation Monarch120, Monarch280, Monarch460, Monarch800, Monarch880, Monarch900, Monarch1000, Monarch1100, Monarch1300, Monarch1400, Monarch4630, REGAL99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R, REGAL55R0, REGAL660R, BLACK PEARLS480, PEARLS130 , VULCAN XC72R, ELFTEX-8, Colombian Carbon Corporation: RAVEN11, RAVEN14, RAVEN15, RAVEN16, RAVEN22RAV N30, Raven35, Raven40, Raven410, Raven420, Raven450, Raven450, Raven500, Raven780, Raven850, Raven890H, Raven1000, Raven1020, Raven1040, Raven1060U, Raven1080U, Raven1170, Raven1190U, Raven1170, Raven1170U RAVEN7000
  • the following pigments are suitable from the viewpoint of color reproducibility, but are not limited to these in the present invention.
  • These organic pigments can be used alone or in various combinations in order to increase color purity.
  • carbon black described in JP-A No. 09-71733 can be suitably used.
  • a tablet-type input device is disposed on the surface of a liquid crystal device or the like, and while referring to an instruction image displayed in an image display area of the liquid crystal device, a finger or There is a type that can input information corresponding to an instruction image by touching a touch pen or the like.
  • Such an input device touch panel
  • Such an input device includes a resistance film type, a capacitance type, and the like.
  • the capacitance type input device for example, an electrode pattern is extended in a direction crossing each other, and a finger or the like is extended.
  • There is a type of detecting the input position by detecting that the capacitance between the electrodes changes when contacted.
  • the transparent electrode pattern is conspicuous at a position slightly away from the vicinity of regular reflection when the light source is reflected, and there is a problem of visibility such as poor appearance. It was.
  • the curable composition of the present invention preferably contains metal oxide particles as a refractive index adjusting material to be included for the purpose of adjusting such refractive index and light transmittance. Since the metal oxide particles have high transparency and light transmittance, a curable composition having a high refractive index and excellent transparency can be obtained.
  • the metal oxide particles preferably have a refractive index higher than the refractive index of the curable composition made of a material excluding the particles, and specifically, the refractive index in light having a wavelength of 400 nm to 750 nm.
  • the refractive index of light having a wavelength of 400 to 750 nm being 1.50 or more means that the average refractive index of light having a wavelength in the above range is 1.50 or more. It is not necessary that the refractive index of all light having a wavelength is 1.50 or more.
  • the average refractive index is a value obtained by dividing the sum of the measured values of the refractive index for each light having a wavelength in the above range by the number of measurement points.
  • the metal of the metal oxide particles includes semimetals such as B, Si, Ge, As, Sb, and Te.
  • the light-transmitting and high refractive index metal oxide particles include Be, Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Gd, Tb, Dy, Yb, Lu, Ti, Zr, Hf, and Nb.
  • Oxide particles containing atoms such as Mo, W, Zn, B, Al, Si, Ge, Sn, Pb, Sb, Bi, and Te are preferable.
  • Titanium oxide, titanium composite oxide, zinc oxide, zirconium oxide, indium / Tin oxide and antimony / tin oxide are more preferable, titanium oxide, titanium composite oxide and zirconium oxide are more preferable, titanium oxide and zirconium oxide are particularly preferable, and titanium dioxide is most preferable.
  • Titanium dioxide is particularly preferably a rutile type having a high refractive index.
  • the surface of these metal oxide particles can be treated with an organic material in order to impart dispersion stability.
  • Hypertech UR-101 manufactured by Nissan Chemical Industries, Ltd. is also preferably used.
  • the average primary particle diameter of the metal oxide particles is preferably 1 to 200 nm, particularly preferably 3 to 80 nm.
  • the average primary particle diameter of the particles refers to an arithmetic average obtained by measuring the particle diameter of 200 arbitrary particles with an electron microscope.
  • the longest side is the diameter.
  • the said metal oxide particle may be used individually by 1 type, and can also use 2 or more types together.
  • the content of the metal oxide particles in the curable composition may be appropriately determined in consideration of the refractive index required for the optical member obtained from the curable composition, light transmittance, and the like.
  • the content is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, based on the total solid content of the composition.
  • the transparent protective film preferably has at least one of ZrO 2 particles and TiO 2 particles from the viewpoint of controlling the refractive index, ZrO 2 particles are more preferred.
  • the curable composition of the present invention can contain an organic solvent.
  • the organic solvent is basically not particularly limited as long as it can satisfy the solubility of each of the coexisting components and the applicability when a curable composition is used, and in particular, the solubility of the solids, applicability, It is preferable to select in consideration of safety.
  • organic solvents examples include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate.
  • Oxyacetic acid alkyl esters eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (specific examples include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate).
  • ethers include diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether.
  • ketones include methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone.
  • aromatic hydrocarbons include toluene and xylene.
  • organic solvents are also preferably mixed in a combination of two or more from the viewpoints of the solubility of each of the aforementioned components and, when an alkali-soluble binder is included, the solubility of the components and the improvement of the coated surface.
  • the content of the organic solvent in the curable composition is preferably such that the total solid concentration in the curable composition is 10% by mass to 80% by mass, more preferably 15% by mass to 60% by mass. preferable.
  • the curable composition of the present invention may contain a surfactant.
  • a surfactant any of anionic, cationic, nonionic, or amphoteric surfactants can be used, but a preferred surfactant is a nonionic surfactant. Specific examples include nonionic surfactants described in paragraph 0058 of JP-A-2009-098616, and among them, fluorine surfactants are preferable.
  • Other surfactants that can be used in the present invention include, for example, commercially available products such as MegaFuck F142D, F172, F173, F176, F177, F183, F479, F482, and F554.
  • F780, F781, F781-F, R30, R08, F-472SF, BL20, R-61, R-90 (manufactured by DIC Corporation), Florard FC-135, FC -170C, FC-430, FC-431, Novec FC-4430 (manufactured by Sumitomo 3M), Asahi Guard AG7105,7000,950,7600, Surflon S-112, S-113, S-131 S-141, S-145, S-382, SC-101, SC-102, SC-103, SC-104, SC-105, SC-106 (manufactured by Asahi Glass Co., Ltd.), Ftop EF351, 352, 801, 802 (manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.), Footgent 250 (manufactured by Neos Co., Ltd.), etc.
  • the structural unit A and the structural unit B represented by the following formula (W) are included, and the weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography using tetrahydrofuran as a solvent is 1, A copolymer having a molecular weight of 000 or more and 10,000 or less can be given as a preferred example.
  • R 1 and R 3 each independently represent a hydrogen atom or a methyl group
  • R 2 represents a linear alkylene group having 1 to 4 carbon atoms
  • R 4 represents a hydrogen atom or carbon number
  • 1 represents an alkyl group having 4 or less
  • L represents an alkylene group having 3 to 6 carbon atoms
  • p and q are weight percentages representing a polymerization ratio
  • p is a numerical value of 10% by mass to 80% by mass
  • Q represents a numerical value of 20% to 90% by mass
  • r represents an integer of 1 to 18, and n represents an integer of 1 to 10.
  • L is preferably a branched alkylene group represented by the following formula (W-2).
  • R 5 in Formula (W-2) represents an alkyl group having 1 to 4 carbon atoms, and is preferably an alkyl group having 1 to 3 carbon atoms in terms of compatibility and wettability with respect to the coated surface. Two or three alkyl groups are more preferred.
  • the weight average molecular weight (Mw) of the copolymer is more preferably from 1,500 to 5,000.
  • the addition amount of the surfactant in the curable composition of the present invention is preferably 0.01 to 2.0% by mass, particularly preferably 0.02 to 1.0% by mass in the total solid content of the curable composition. Within this range, the coatability and the uniformity of the cured film are good.
  • the curable composition of the present invention may contain an adhesion improving agent.
  • the adhesion improver improves the adhesion between the inorganic material serving as the support, for example, a silicon compound such as glass, silicon, silicon oxide, and silicon nitride, gold, copper, aluminum, and the cured film of the colored curable composition layer.
  • a compound for example, a silicon compound such as glass, silicon, silicon oxide, and silicon nitride, gold, copper, aluminum, and the cured film of the colored curable composition layer.
  • a compound include silane coupling agents.
  • the silane coupling agent as the adhesion improving agent is for the purpose of modifying the interface, and any known silane coupling agent can be used without any particular limitation.
  • silane coupling agent a silane coupling agent described in paragraph 0048 of JP-A-2009-98616 is preferable, and ⁇ -glycidoxypropyltrialkoxysilane and ⁇ -methacryloxypropyltrialkoxysilane are more preferable. These can be used alone or in combination of two or more.
  • the content of the adhesion improving agent in the curable composition of the present invention is preferably 0.1 to 20% by mass, more preferably 0.2 to 5% by mass, based on the total solid content of the curable composition.
  • Crosslinking agent It is also possible to supplement the curable composition of the present invention with a crosslinking agent to increase the hardness of the cured layer obtained by curing the curable composition.
  • the crosslinking agent is not particularly limited as long as the film can be cured by a crosslinking reaction. For example, at least selected from (a) an epoxy resin, (b) a methylol group, an alkoxymethyl group, and an acyloxymethyl group.
  • a development accelerator can also be added when the alkali solubility of the non-exposed area when the curable composition layer is exposed is promoted and the developability of the curable composition is further improved.
  • the development accelerator is preferably a low molecular weight organic carboxylic acid compound having a molecular weight of 1000 or less and a low molecular weight phenol compound having a molecular weight of 1000 or less.
  • aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, mesitylene acid; phthalic acid, is
  • the curable composition of the present invention may further contain various additives such as fillers, polymer compounds other than those described above, ultraviolet absorbers, antioxidants and the like. Examples of these additives include those described in paragraphs [0155] to [0156] of JP-A No. 2004-295116.
  • the curable composition of the present invention may contain a light stabilizer described in paragraph [0078] of JP-A No. 2004-295116 and a thermal polymerization inhibitor described in paragraph [0081] of the publication.
  • the curable composition of the present invention is prepared by mixing the above-described components and optional components as necessary.
  • E When a colorant is contained, any of a pigment, a dye, or a mixed system of a pigment and a dye may be used.
  • the components constituting the curable composition may be combined at once, or may be sequentially mixed after each component is dissolved and dispersed in a solvent.
  • the composition may be prepared by dissolving and dispersing all components in a solvent at the same time.
  • each component may be suitably used as two or more solutions / dispersions at the time of use (at the time of application). ) May be mixed to prepare a curable composition.
  • the colored curable composition prepared as described above can be used after being preferably filtered using a filter having a pore size of about 0.01 ⁇ m to 3.0 ⁇ m.
  • the curable composition of the present invention contains a colorant, a colored cured film excellent in hue and contrast can be formed, so that for forming a colored pixel such as a color filter used in a liquid crystal display device, Moreover, it can use suitably as preparation uses, such as printing ink, inkjet ink, and a coating material.
  • the color filter of the present invention is configured by providing a substrate and a colored region made of the colored curable composition of the present invention on the substrate.
  • the colored region on the substrate is composed of colored layers such as red (R), green (G), and blue (B) that form each pixel of the color filter.
  • the method for producing a color filter of the present invention includes a colored layer forming step (A) in which a colored layer (colored curable composition layer) is formed by applying the above-described colored curable composition on a support, and a step ( An exposure step (B) for forming a latent image by performing pattern-like exposure on the colored layer formed in A), and a developing step for developing the colored layer on which the latent image is formed to form a pattern (C).
  • the aspect which further provided the process (D) which heat-processes with respect to the coloring pattern obtained at the process (C) is preferable.
  • the manufacturing method of the color filter of the present invention will be described more specifically.
  • the support examples include soda glass, alkali-free glass, borosilicate glass, quartz glass, a silicon substrate, and a resin substrate used for liquid crystal display devices. Further, an undercoat layer may be provided on these supports, if necessary, in order to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the surface.
  • the pre-baking condition examples include a condition of heating at 70 to 130 ° C. for about 0.5 to 15 minutes using a hot plate or an oven.
  • the thickness of the colored layer formed with a colored curable composition is suitably selected according to the objective.
  • the range of 0.2 ⁇ m to 5.0 ⁇ m is preferable, and the range of 1.0 ⁇ m to 4.0 ⁇ m is more preferable.
  • the thickness of a colored layer is a film thickness after drying.
  • ultrahigh pressure, high pressure, medium pressure, and low pressure mercury lamps chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, various laser light sources, and the like can be used.
  • the irradiation light is preferably an ultraviolet laser having a wavelength in the range of 300 nm to 410 nm, and more preferably an ultraviolet laser having a wavelength in the range of 300 nm to 360 nm.
  • the Nd: YAG laser third harmonic (355 nm), which is a relatively inexpensive solid output, and the excimer laser XeCl (308 nm), XeF (353 nm) can be suitably used.
  • the pattern exposure from the viewpoint of productivity, preferably in the range of 1mJ / cm 2 ⁇ 100mJ / cm 2, the range of 1mJ / cm 2 ⁇ 50mJ / cm 2 is more preferable.
  • the colored layer after exposure is developed with a developer.
  • a developer dissolves the uncured portion of the colored layer and does not dissolve the cured portion
  • a combination of various organic solvents or an alkaline aqueous solution can be used.
  • the alkali concentration is preferably adjusted to pH 10-13.
  • alkaline aqueous solution examples include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethyl.
  • alkaline aqueous solutions such as ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo- [5.4.0] -7-undecene.
  • the development time is preferably from 30 seconds to 300 seconds, more preferably from 30 seconds to 120 seconds.
  • the development temperature is preferably 20 ° C.
  • Development can be performed by a paddle method, a shower method, a spray method, or the like. Moreover, after developing using alkaline aqueous solution, it is preferable to wash
  • a color filter of the present invention it is also preferable to perform post-exposure by ultraviolet irradiation on a colored pattern (pixel) formed using a colored curable composition.
  • -Process (D)- It is preferable to further heat-treat the colored pattern after development or the colored pattern subjected to post-exposure by ultraviolet irradiation as described above.
  • the color pattern By heating the formed color pattern (so-called post-bake process), the color pattern can be further cured.
  • This heat treatment can be performed by, for example, a hot plate, various heaters, an oven, or the like.
  • the temperature during the heat treatment is preferably 100 ° C. to 300 ° C., more preferably 120 ° C. to 250 ° C.
  • the heating time is preferably about 10 minutes to 120 minutes.
  • the colored pattern thus obtained constitutes a pixel in the color filter.
  • the above-described step (A), step (B), step (C), and step (D) may be repeated in accordance with the desired number of colors.
  • the step (D) may be performed, or formation, exposure, and formation of all colored layers having a desired number of colors. After the development is completed, the step (D) may be performed collectively.
  • the color filter obtained by the method for producing a color filter of the present invention (the color filter of the present invention) is excellent in hue and contrast since the colored curable composition of the present invention is used.
  • the color filter of the present invention When used in a liquid crystal display device or the like, it is possible to display an image excellent in spectral characteristics and contrast while achieving a good hue.
  • the liquid crystal display device of the present invention includes the above-described color filter of the present invention.
  • the liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
  • the color filter of the present invention is particularly effective for a color TFT liquid crystal display device.
  • the color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention is applied to a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
  • the color filter of the present invention can also be used for a COA (Color-filter On Array) system.
  • the color filter of the present invention When the color filter of the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, but further, red, green and blue LED light sources (RGB-LED).
  • RGB-LED red, green and blue LED light sources
  • the solid-state imaging device of the present invention includes the above-described color filter of the present invention.
  • the configuration of the solid-state imaging device of the present invention is a configuration provided with the color filter of the present invention, and is not particularly limited as long as it is a configuration that functions as a solid-state imaging device. .
  • a transfer electrode made of a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and a photo is formed on the photodiode and the transfer electrode.
  • the color filter of the present invention is provided on the protective film.
  • a condensing means for example, a microlens etc. The same shall apply hereinafter
  • a condensing means for example, a microlens etc. The same shall apply hereinafter
  • a condensing means on the device protective layer and below the color filter (on the side close to the support), or a condensing means on the color filter. It may be a configuration or the like.
  • the protective film of the present invention is formed using the curable composition of the present invention described above. Since the protective film of the present invention is constituted using the curable composition of the present invention, it is excellent in high hardness and film thickness uniformity even when formed at a low heating temperature or without heat treatment.
  • the protective film of the present invention may be formed by any method as long as it is a method using the curable composition of the present invention, but can be formed by a method similar to the above-described method for producing a color filter.
  • a method of exposing the entire surface of the film in the (b) exposure step is preferable.
  • an ITO pattern visibility improving property may be incorporated.
  • a method of forming a curable composition layer on a substrate (a) a coating method of applying a curable composition containing at least the resin, the polymerizable compound, and the photopolymerization initiator described above, and (b) the above-mentioned
  • a transfer-type dry film form in which a transfer material having a curable composition layer is used, and the curable composition layer is laminated and transferred by heating and / or pressurization is preferable.
  • the curable composition can be coated by a known coating method such as spin coating, curtain coating, slit coating, dip coating, air knife coating, roller coating, wire bar coating, It can be carried out by a gravure coating method or an extrusion coating method using a popper described in US Pat. No. 2,681,294.
  • JP 2004-89851 A, JP 2004-17043 A, JP 2003-170098 A, JP 2003-164787 A, JP 2003-10767 A, JP 2002-79163 A A method using a slit nozzle or a slit coater described in JP 2001-310147 A is suitable.
  • (B) Transfer method Transfer is performed by using a photosensitive transfer material, for example, a roller or flat plate in which a curable composition layer formed in a film shape on a temporary support is heated and / or pressed on a desired substrate surface. After being bonded together by pressure bonding or thermocompression bonding, the curable composition layer is transferred onto the substrate by peeling off the temporary support.
  • a photosensitive transfer material for example, a roller or flat plate in which a curable composition layer formed in a film shape on a temporary support is heated and / or pressed on a desired substrate surface. After being bonded together by pressure bonding or thermocompression bonding, the curable composition layer is transferred onto the substrate by peeling off the temporary support.
  • Specific examples include laminators and laminating methods described in JP-A-7-110575, JP-A-11-77942, JP-A-2000-334836, and JP-A-2002-148794. From the viewpoint, it is preferable to use the method described in JP-A-7-11
  • an oxygen barrier layer (hereinafter also referred to as “oxygen barrier film” or “intermediate layer”) can be further provided between the curable composition layer and the temporary support. .
  • oxygen barrier film or “intermediate layer”
  • a thermoplastic resin layer having cushioning properties may be provided.
  • the temporary support, the oxygen blocking layer, the thermoplastic resin layer, and other layers constituting the photosensitive transfer material and the method for producing the photosensitive transfer material paragraph numbers [0024] to [0024] of [Japanese Patent Laid-Open No. 2006-23696] The structure and manufacturing method described in [0030] can be applied.
  • the substrate on which the curable composition layer is formed examples include, for example, a transparent substrate (for example, a glass substrate or a plastics substrate), a substrate with a transparent conductive film (for example, an ITO film), and a substrate with a color filter (also called a color filter substrate).
  • a driving substrate with a driving element for example, a thin film transistor [TFT]
  • the thickness of the substrate is generally preferably 700 to 1200 ⁇ m.
  • curable composition 1- The following components were mixed and dissolved to prepare a curable composition.
  • Organic solvent 1 Propylene glycol monomethyl ether acetate 77.41 parts Resin having an acidic group in the side chain: Alkali-soluble binder P-1 (1-methoxy-2-propanol / 1-methoxy-2-propyl acetate 45% below) Solution) 6.31 parts
  • Polymerizable compound 1 Nagase ChemteX Co., Ltd., DA-314 (Exemplary compound (34) 3.1 parts Hyperbranched polymer: Osaka Organic Chemical Co., Ltd., STAR-501 (Weight average molecular weight: 11000) 12.39 parts
  • Polymerization inhibitor 0.003 part of p-methoxyphenol
  • Initiator 1 CGI Specialty Chemicals, CGI-242 0.45 parts
  • adhesion improver 3-methacryloxypropyltrimethoxysilane 0.2 parts
  • fluorosurfactant DIC's
  • curable compositions 2-9 and curable compositions C1-C5 (for comparison)-
  • curable compositions 2 to 9 and curable compositions C1 to C5 having the compositions shown in Table 1 below (unit: parts by mass) were prepared.
  • curable composition layer After applying each curable composition on a glass (# 1737; made by Corning) substrate or a polyethylene terephthalate film (PET) substrate by a spin coat method, the one applied to the glass substrate is PET at 120C for 120 seconds. What was apply
  • Double bond consumption rate ⁇ 1- (B / A) ⁇ ⁇ 100% "Evaluation criteria" A: Double bond consumption rate is 80% or more B: Double bond consumption rate is 50% or more and less than 80% C: Double bond consumption rate is less than 50%
  • the curable compositions 1 to 9 according to the examples of the present invention have a high double bond consumption rate under any heat treatment conditions and the polymerization is efficient as compared with the curable compositions C1 to C5 according to the comparative examples.
  • a cured film having high pencil hardness is obtained.
  • a cured film having sufficient pencil hardness can be obtained even in a cured film that is heat-treated at a low temperature of 150 ° C. or a cured film that is cured only by i-line exposure without performing the heat treatment.
  • PET which is a plastic base
  • a cured film having high hardness is obtained under a heat treatment condition of 130 ° C.
  • curable composition 10 (containing colorant)- The following components were mixed, dissolved or dispersed to prepare curable composition 10.
  • Organic solvent 1 9 parts of propylene glycol monomethyl ether acetate
  • Organic solvent 2 25 parts of diethylene glycol ethyl methyl ether Resin having acidic group in side chain: Alkali-soluble binder P-1 6 parts, polymerizable compound 1: manufactured by Nagase ChemteX Corporation, DA-314 1.6 parts hyperbranched polymer: made by Osaka Organic Chemical Co., Ltd., STAR-501 6.4 parts ⁇
  • Polymerization inhibitor 0.003 part of p-methoxyphenol
  • Initiator 0.26 part of exemplary compound (V-3)
  • Adhesion improver 0.22 part of 3-methacryloxypropyltrimethoxysilane Fluorine-based surfactant (Megafac F-554 manufactured by DIC, propylene glycol monomethyl ether acetate solution with a solid content of 0.2
  • the pigment dispersion 1 was prepared as follows. C. I. 12.8 parts of Pigment Blue 15: 6 and 7.2 parts of a dispersant (Solsperse 24000 manufactured by Nihon Lubrizol Co., Ltd.) are mixed with 80.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently mixed using a bead mill. Dispersion was carried out to prepare Pigment Dispersion Liquid 1.
  • a dispersant Solsperse 24000 manufactured by Nihon Lubrizol Co., Ltd.
  • the pigment dispersion 2 was prepared as follows. C. I. 5 parts of Pigment Violet 23 and 5 parts of a dispersant (Solsperse 24000 manufactured by Nihon Lubrizol Corporation) are mixed with 90.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently dispersed using a bead mill. Liquid 2 was prepared.
  • curable compositions 11-20 and curable compositions C-6-C-8- were prepared.
  • the pigment dispersions 3 to 5 and the dye solutions 1 to 6 used are as follows.
  • Pigment dispersion 3 C. I. 12.8 parts of Pigment Green 58 and 7.2 parts of a dispersant (Solsperse 24000 manufactured by Nihon Lubrizol) are mixed with 80.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently dispersed using a bead mill. Thus, a pigment dispersion 3 was prepared.
  • a dispersant Solsperse 24000 manufactured by Nihon Lubrizol
  • Pigment dispersion 4 C. I. 5 parts of Pigment Yellow 138 and 5 parts of a dispersant (Solsperse 32000 manufactured by Nippon Lubrizol) were mixed with 90.0 parts of propylene glycol monomethyl ether acetate, and the pigment was sufficiently dispersed using a bead mill. Liquid 4 was prepared.
  • Pigment dispersion 5 C. I. 12.8 parts of Pigment Red 254 and 7.2 parts of a dispersant (Solsperse 24000 manufactured by Nippon Lubrizol Corporation) are mixed with 80.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently dispersed using a bead mill. Thus, a pigment dispersion 5 was prepared.
  • a dispersant Solsperse 24000 manufactured by Nippon Lubrizol Corporation
  • the dye solution 1 was prepared by mixing and dissolving the following components. ⁇ Organic solvent (propylene glycol monomethyl ether acetate) 95 parts ⁇ Dye (the following compound (A)) 5 parts
  • Dye solutions 2 to 6 were prepared in the same manner as the dye solution 1 except that the following compounds (B) to (F) were used as dyes.
  • the colored curable composition layer irradiated with i-line in a pattern was developed with an aqueous solution of sodium carbonate / sodium bicarbonate (concentration 2.4%, pH 10) at 26 ° C. for 45 seconds, After rinsing with running water for 20 seconds, it was dried to obtain a fine line pattern image.
  • the obtained fine line pattern image was post-baked under the heat treatment conditions shown in Table 4 to obtain a colored cured film (colored layer B) having a pattern thickness of 2 ⁇ m.
  • the luminance values when the polarizing axes of the two polarizing films are parallel and perpendicular are colored. Measured using a luminance meter (Topcon Co., Ltd., model number: BM-5A), and obtained by dividing the luminance when the polarization axes of the two polarizing films are parallel by the luminance when vertical. The value was determined as contrast. The higher the contrast, the better the performance as a color filter for a liquid crystal display device.
  • the colored curable composition layer A obtained above has a wavelength of 365 nm, 5, 10, 15, 20, And an exposure dose of 40 mJ / cm 2 through a mask having a mask width of 25 ⁇ m.
  • the developer was used and developed at 23 ° C. for 60 seconds.
  • the film was dried by spraying to obtain a fine line pattern image. Image formation was observed by an ordinary method using an optical microscope and SEM photograph observation. The pattern dimension of the thinnest fine line pattern remaining on the substrate was used as the evaluation of adhesion. It can be said that the thinner the fine wire remains, the better the adhesion.
  • Table 4 shows the following.
  • the curable compositions 10 to 20 according to the examples of the present invention have excellent sensitivity and spectral characteristics (Y value), high contrast, excellent adhesion, high specific resistance of liquid crystal, and good chemical resistance. I understand that. The effect is effectively manifested under heat treatment conditions at 130 ° C. even when plastic base PET is used as the substrate. In addition, the liquid crystal display device obtained using the curable compositions 10 to 20 did not cause burn-in. On the other hand, in the case of the curable compositions C6 to C8 as comparative examples, when the heat treatment temperature was as low as 150 ° C., the specific resistance of the liquid crystal was low and the adhesion was low. .
  • thermoplastic resin layer and intermediate layer A thermoplastic resin layer having a film thickness of 15 ⁇ m is applied on a polyethylene terephthalate film having a thickness of 75 ⁇ m as a temporary support using a slit-like nozzle and dried by applying a coating solution for a thermoplastic resin layer having the following formulation H1. Formed. On top of that, an intermediate layer coating solution having the following formulation P1 was applied and dried to form an intermediate layer having a thickness of 1.6 ⁇ m.
  • the curable composition 21, 22, 23, C9, C10 or C11 for the first curable transparent resin layer prepared by the composition described in the following Table 5 (unit is part by mass).
  • the first curable transparent resin layer was formed by applying and drying while changing the coating amount so as to obtain the film thickness after drying described in Table 6 below.
  • the first curable transparent resin layer of each obtained sample was cured by irradiation with ultraviolet irradiation (exposure amount: 300 mJ / cm 2 , light source: methane halide lamp).
  • a section of the cured film of the first curable transparent resin layer thus obtained was cut from the surface using a microtome.
  • 2 mg of KBr powder was added and mixed well under a yellow lamp to obtain a measurement sample after coating, drying and curing in the measurement of the double bond consumption rate described later.
  • Double bond consumption rate ⁇ 1- (B / A) ⁇ ⁇ 100% "Evaluation criteria"
  • the curable composition 24 or C12 described in Table 5 described above has a film thickness after drying described in Table 6 while changing the coating amount. It apply
  • thermoplastic resin layer having a dry film thickness of 15.1 ⁇ m, the intermediate layer having a dry film thickness of 1.7 ⁇ m, and the dry film thickness in Table 6 below are provided on the temporary support.
  • the curable transparent resin layer and the second curable transparent resin layer were provided, and finally a protective film (thickness 12 ⁇ m polypropylene film) was pressure-bonded.
  • Transfer films C9 to C11 were prepared.
  • thermoplastic resin layer having a film thickness of 15.1 ⁇ m, an intermediate layer having a film thickness of 1.7 ⁇ m, and a transparent curable composition layer having a film thickness of 65 nm are formed on the temporary support, Finally, a protective film (12 ⁇ m thick polypropylene film) was pressure-bonded.
  • a transfer material in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), the transparent curable composition layer, and the protective film were integrated was produced.
  • the protective film of the transfer material is peeled to expose the transparent curable composition layer, and the transparent curable composition layer and the intermediate layer are formed on the glass transparent substrate so that the exposed surface of the transparent curable composition layer is in contact with the transfer material.
  • the thermoplastic resin layer and the PET temporary support were laminated together, and the PET temporary support was peeled off.
  • a proximity type exposure machine manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd. having an ultrahigh pressure mercury lamp, the entire surface was exposed from the thermoplastic resin layer side at i line and 40 mJ / cm 2 .
  • triethanolamine developer (containing 30% triethanolamine, trade name: T-PD2 (manufactured by FUJIFILM Corporation) 10 times with pure water (1 part of T-PD2 and 9 parts of pure water).
  • the mixture was diluted to 30) at 30 C for 60 seconds at a flat nozzle pressure of 0.04 MPa to remove the thermoplastic resin and the intermediate layer.
  • air was blown onto the upper surface (transparent curable resin layer side) of the glass transparent substrate to drain the liquid, and then pure water was blown for 10 seconds in a shower to wash, and air was blown onto the glass transparent substrate. Reduced the puddle.
  • the substrate was heat-treated (post-baked) under the conditions shown in Table 6 below, and a cured film (hereinafter referred to as “transparent film”) of the transparent curable composition layer was laminated on the glass transparent substrate.
  • a substrate was obtained.
  • An ITO thin film having a thickness of 40 nm and a refractive index of 1.82 was formed by DC magnetron sputtering (conditions: substrate temperature 250 ° C., argon pressure 0.13 Pa, oxygen pressure 0.01 Pa), and a transparent electrode layer was formed. A front plate was obtained.
  • the surface resistance of the ITO thin film was 80 ⁇ / ⁇ .
  • thermoplastic resin layer composed of the above-mentioned formulation H1 was applied using a slit nozzle and dried.
  • middle layer which consists of the above-mentioned prescription P1 was apply
  • the thermoplastic resin layer having a dry film thickness of 15.1 ⁇ m, the intermediate layer having a dry film thickness of 1.6 ⁇ m, and the photocurable resin layer for etching having a film thickness of 2.0 ⁇ m are formed on the temporary support.
  • a laminate was obtained, and finally a protective film (12 ⁇ m thick polypropylene film) was pressure-bonded.
  • a photosensitive transfer material for etching in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), and the transparent curable resin layer were integrated was produced.
  • a triethanolamine developer (containing 30% by mass of triethanolamine, a trade name: T-PD2 (manufactured by Fuji Film Co., Ltd.) diluted 10 times with pure water) at 25 ° C. for 100 seconds
  • a surfactant-containing cleaning solution (trade name: T-SD3 (manufactured by FUJIFILM Corporation) diluted 10-fold with pure water) was treated at 33 ° C. for 20 seconds, using a rotating brush and an ultra-high pressure cleaning nozzle. Residue removal was performed, and a post-bake treatment at 130 ° C. for 30 minutes was further performed to obtain a front plate on which a transparent electrode layer and a photocurable resin layer pattern for etching were formed.
  • the front plate on which the transparent electrode layer and the photocurable resin layer pattern for etching are formed is immersed in an etching bath containing ITO etchant (hydrochloric acid, potassium chloride aqueous solution, liquid temperature 30 ° C.), treated for 100 seconds, and used for etching.
  • ITO etchant hydrochloric acid, potassium chloride aqueous solution, liquid temperature 30 ° C.
  • the exposed transparent electrode layer not covered with the photocurable resin layer was dissolved and removed to obtain a front plate with a transparent electrode layer pattern having a photocurable resin layer pattern for etching.
  • a front plate with a transparent electrode layer pattern with a photocurable resin layer pattern for etching is applied to a resist stripping solution (N-methyl-2-pyrrolidone, monoethanolamine, a surfactant (trade name: Surfynol 465).
  • FIG. 1 illustrates the taper angle ⁇ in the pattern 4.
  • first curable transparent resin layer and second curable transparent resin layer A transparent film on a glass-made transparent substrate using the substrate obtained by forming a transparent film and a transparent electrode pattern on the glass-made transparent substrate obtained above, and the transfer films 21 to 23 and transfer films C9 to C11 described above.

Abstract

A curable composition which contains (A) a compound that has a molecular weight of less than 1,300 and contains at least two ethylenically unsaturated double bonding groups and at least one secondary hydroxyl group, (B) a hyperbranched compound that has a molecular weight of 1,300 or more and (C) at least one initiator that is selected from the group consisting of photopolymerization initiators and thermal polymerization initiators; and a cured film, a color filter, a protective film, a display device and a solid-state imaging element, each of which uses this curable composition.

Description

硬化性組成物、硬化膜、カラーフィルタ、保護膜、表示装置、及び固体撮像素子Curable composition, cured film, color filter, protective film, display device, and solid-state imaging device
 本発明は、硬化性組成物、硬化膜、カラーフィルタ、保護膜、表示装置、及び固体撮像素子に関する。詳しくは、高硬度、低温硬化特性を有する硬化性組成物とその用途に関する。 The present invention relates to a curable composition, a cured film, a color filter, a protective film, a display device, and a solid-state imaging device. Specifically, the present invention relates to a curable composition having high hardness and low temperature curing characteristics and its use.
 液晶表示装置は、高画質画像を表示する表示装置に広く利用されている。表示装置用基板(例えば、カラーフィルタ基板、アクティブマトリクス基板、有機ELディスプレイ基板等)は、基板上にカラーフィルタや保護膜等の構造物が形成された構成となっている。これらの構造物のうち、カラーフィルタや保護膜の形成方法としては、感光性を有する硬化性組成物(以下、「感光性樹脂組成物」ともいう。)を用いてフォトリソグラフィーにより形成する方法が主流となっている。 Liquid crystal display devices are widely used for display devices that display high-quality images. A substrate for a display device (for example, a color filter substrate, an active matrix substrate, an organic EL display substrate, etc.) has a structure in which structures such as a color filter and a protective film are formed on the substrate. Among these structures, as a method for forming a color filter or a protective film, there is a method of forming by photolithography using a photosensitive curable composition (hereinafter also referred to as “photosensitive resin composition”). It has become mainstream.
 このような感光性樹脂組成物として、プラスチック基板のような耐熱性が低い基板上に、カラーフィルタ等の用途に必要とされる解像度、耐薬品性をもつパターンを、前記基板が変形しない程度の温度でパターンを形成することが可能なものとして、着色剤、樹脂及び重合性化合物としてのデンドリマー又はハイパーブランチポリマーを含む着色感光性樹脂組成物が開示されている(例えば、特開2012-173546号公報参照)。この着色感光性樹脂組成物は、パターン露光及び現像して形成された着色パターンを、更に25℃以上230℃以下の温度でベークすることにより、硬化されたパターンが得られると説明されているが、具体的な実施例においては、上記ベークは行われておらず、それで耐溶剤性に優れる着色パターンが得られると説明されている。 As such a photosensitive resin composition, on a substrate with low heat resistance such as a plastic substrate, a pattern having the resolution and chemical resistance required for applications such as a color filter is such that the substrate does not deform. As a material capable of forming a pattern at a temperature, a colored photosensitive resin composition containing a colorant, a resin, and a dendrimer or hyperbranched polymer as a polymerizable compound is disclosed (for example, JP 2012-173546 A). See the official gazette). Although this colored photosensitive resin composition is described that a cured pattern can be obtained by baking a colored pattern formed by pattern exposure and development at a temperature of 25 ° C. or higher and 230 ° C. or lower. In specific examples, it is described that the baking is not performed, and that a colored pattern having excellent solvent resistance can be obtained.
 また、各種基材表面の傷付き防止や汚染防止のための保護膜の形成に使用される硬化性組成物として、ジペンタエリスリトールヘキサアクリレートのような分子内に2個以上の(メタ)アクリロイル基を有する化合物、光重合開始剤、及びデンドリマー又はハイパーブランチポリマーのような多分岐ポリマーを含む硬化性組成物が開示されている。この硬化性組成物をセルローストリアセテートのようなプラスチック基板に塗布し、紫外線で硬化した保護膜は、高い鉛筆硬度を有すると記載されている(例えば、特開2009-286924号公報参照)。 Moreover, as a curable composition used for forming a protective film for preventing scratches and contamination on various substrate surfaces, two or more (meth) acryloyl groups in a molecule such as dipentaerythritol hexaacrylate are used. Disclosed are curable compositions comprising a compound having a photopolymerization initiator, and a multibranched polymer such as a dendrimer or hyperbranched polymer. It is described that a protective film obtained by applying this curable composition to a plastic substrate such as cellulose triacetate and curing with ultraviolet rays has high pencil hardness (see, for example, JP-A-2009-286924).
 一般に、硬化性組成物を用いて基板上にパターン(例えば、カラーフィルタの画素など)又は保護膜を形成する場合、紫外線等による露光のみでは硬化が不十分である場合が多く、更に加熱処理を施す必要を生ずる場合がある。このような加熱処理を行う場合、耐熱性の高いガラス基板が使用されることが一般的であったが、プラスチック基板のような可撓性に優れた基板の使用も久しく望まれている。
 しかし、プラスチック基板は耐熱性が低いため、加熱処理の温度をプラスチック基板が変形しない程度の温度とする必要がある。そのため、従来よりも更に一段と低い温度で、高い硬度を有するパターン又は保護膜を形成することができる硬化性組成物が要望されている。
 即ち、本発明は、従来よりも低い温度で、高い硬度を有するパターン又は保護膜が形成される硬化性組成物、当該硬化性組成物を用いた硬化膜、カラーフィルタ、保護膜、表示装置及び固体撮像素子を提供することを課題とする。
In general, when a pattern (for example, a pixel of a color filter) or a protective film is formed on a substrate using a curable composition, curing is often insufficient only by exposure with ultraviolet rays or the like, and further heat treatment is performed. May need to be applied. When such heat treatment is performed, a glass substrate having high heat resistance is generally used, but the use of a substrate having excellent flexibility such as a plastic substrate has been desired for a long time.
However, since the plastic substrate has low heat resistance, it is necessary to set the temperature of the heat treatment to a temperature at which the plastic substrate does not deform. Therefore, there is a demand for a curable composition that can form a pattern or protective film having a high hardness at a much lower temperature than in the past.
That is, the present invention relates to a curable composition in which a pattern or protective film having a high hardness is formed at a lower temperature than before, a cured film using the curable composition, a color filter, a protective film, a display device, and It is an object to provide a solid-state imaging device.
 前記課題を達成するための具体的手段は以下の通りである。
<1> (A)少なくとも二つのエチレン性不飽和二重結合基及び少なくとも一つの2級水酸基を有する分子量1300未満の化合物と、(B)分子量1300以上の多分岐化合物と、(C)光重合開始剤及び熱重合開始剤からなる群より選ばれる少なくとも1種の開始剤と、を含む硬化性組成物。
<2> (B)多分岐化合物が、デンドリマー及びハイパーブランチポリマーからなる群より選ばれる少なくとも1種である<1>に記載の硬化性組成物。
Specific means for achieving the above object are as follows.
<1> (A) a compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group, (B) a hyperbranched compound having a molecular weight of 1300 or more, and (C) photopolymerization. A curable composition comprising at least one initiator selected from the group consisting of an initiator and a thermal polymerization initiator.
<2> The curable composition according to <1>, wherein the (B) multi-branched compound is at least one selected from the group consisting of dendrimers and hyperbranched polymers.
<3> 更に、(D)側鎖に酸性基を有する樹脂を含む<1>又は<2>に記載の硬化性組成物。
<4> 更に、(E)着色剤を含む<1>~<3>のいずれか一項に記載の硬化性組成物。
<5> 更に、(F)屈折率調整材料を含む<1>~<4>のいずれか一項に記載の硬化性組成物。
<6> (F)屈折率調整材料が、金属微粒子及び金属酸化物微粒子から選ばれた少なくとも一種の無機微粒子である<5>に記載の硬化性組成物。
<3> The curable composition according to <1> or <2>, further comprising (D) a resin having an acidic group in the side chain.
<4> The curable composition according to any one of <1> to <3>, further comprising (E) a colorant.
<5> The curable composition according to any one of <1> to <4>, further comprising (F) a refractive index adjusting material.
<6> (F) The curable composition according to <5>, wherein the refractive index adjusting material is at least one kind of inorganic fine particles selected from metal fine particles and metal oxide fine particles.
<7> <1>~<6>のいずれか一項に記載の硬化性組成物を硬化してなる硬化膜。
<8> <7>に記載の硬化膜を含むカラーフィルタ。
<9> <7>に記載の硬化膜を含む保護膜。
<7> A cured film obtained by curing the curable composition according to any one of <1> to <6>.
<8> A color filter including the cured film according to <7>.
<9> A protective film including the cured film according to <7>.
<10> <8>に記載のカラーフィルタを含む表示装置。
<11> <9>に記載の保護膜を含む表示装置。
<12> <8>に記載のカラーフィルタを含む固体撮像素子。
<13> <9>に記載の保護膜を含む固体撮像素子。
<10> A display device including the color filter according to <8>.
<11> A display device including the protective film according to <9>.
<12> A solid-state imaging device including the color filter according to <8>.
<13> A solid-state imaging device including the protective film according to <9>.
 本発明によれば、従来よりも低い温度で、高い硬度を有するパターン又は保護膜が形成される硬化性組成物、当該硬化性組成物を用いた硬化膜、カラーフィルタ、保護膜、表示装置及び固体撮像素子が提供される。 According to the present invention, a curable composition in which a pattern having a high hardness or a protective film is formed at a lower temperature than before, a cured film using the curable composition, a color filter, a protective film, a display device, and A solid-state imaging device is provided.
ITOパターンのテーパー角αの説明図である。It is explanatory drawing of taper angle (alpha) of an ITO pattern.
 以下、本発明の硬化性組成物、並びに、この硬化性組成物を用いた硬化膜、カラーフィルタ、保護膜、表示装置、及び固体撮像素子について詳細に説明する。 Hereinafter, the curable composition of the present invention, and a cured film, a color filter, a protective film, a display device, and a solid-state imaging device using the curable composition will be described in detail.
[硬化性組成物]
 本発明の硬化性組成物は、(A)少なくとも二つのエチレン性不飽和二重結合基及び少なくとも一つの2級水酸基を有する分子量1300未満の化合物と、(B)分子量1300以上の多分岐化合物と、(C)光重合開始剤及び熱重合開始剤からなる群より選ばれる少なくとも1種の開始剤と、を含む。
 本発明に係る硬化性組成物を用いることで、従来に比べて低い温度で、高い硬度を有する硬化膜が得られる反応機構は、必ずしも明らかではない。しかし、前記(A)の化合物に含まれる2級水酸基と、前記(B)多分岐化合物との両者が含まれることにより、硬化性組成物が低い温度でより高度に架橋し、高い硬度を有する硬化膜が形成されることは、後述の実施例における本発明に係る硬化性組成物と、比較例に係る硬化性組成物とを比較すれば明らかである。即ち、前記(A)の化合物に代えて、2級水酸基を有しておらず且つ少なくとも二つのエチレン性不飽和二重結合基を有する分子量1300未満の化合物(例えば、ジエチレングリコールヘキサアクリレート)と、前記(B)多分岐化合物と、前記(C)開始剤を含む硬化性組成物、又は、前記(B)多分岐化合物を含まない点を除いて本発明に係る硬化性組成物と同じ組成を有する硬化性組成物に比べて、本発明に係る硬化性組成物は、同じ加熱温度で加熱した場合であっても、得られた硬化膜におけるエチレン性不飽和二重結合が高く且つ硬度が高い。
[Curable composition]
The curable composition of the present invention comprises (A) a compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group, and (B) a multibranched compound having a molecular weight of 1300 or more. (C) at least one initiator selected from the group consisting of a photopolymerization initiator and a thermal polymerization initiator.
By using the curable composition according to the present invention, the reaction mechanism for obtaining a cured film having a high hardness at a lower temperature than the conventional one is not always clear. However, by including both the secondary hydroxyl group contained in the compound (A) and the (B) multi-branched compound, the curable composition is more highly crosslinked at a low temperature and has high hardness. It is clear that the cured film is formed by comparing the curable composition according to the present invention in the examples described later and the curable composition according to the comparative example. That is, instead of the compound (A), a compound having no molecular weight of less than 1300 (for example, diethylene glycol hexaacrylate) having no secondary hydroxyl group and having at least two ethylenically unsaturated double bond groups, (B) It has the same composition as the curable composition according to the present invention except that it does not contain a hyperbranched compound and the (C) initiator, or the (B) hyperbranched compound. Compared with the curable composition, the curable composition according to the present invention has high ethylenically unsaturated double bonds and high hardness in the obtained cured film even when heated at the same heating temperature.
<(A)少なくとも二つのエチレン性不飽和二重結合基及び少なくとも一つの2級水酸基を有する分子量1300未満の化合物(以下、「特定重合性化合物」ともいう。)>
 特定重合性化合物は、前記(C)開始剤に由来するラジカルの作用を受けて、特定重合性化合物が有する少なくとも二つのエチレン性不飽和二重結合基が重合反応を起こして分子量が増大する、分子量1300未満の化合物である。特定重合性化合物が少なくとも一つの2級水酸基を有していることに起因して、特定重合性化合物の極性が向上していること、及び、2級水酸基に隣接する水素原子が引き抜かれ易いことに起因して、酸素による前記重合反応の阻害が抑制されて反応進行が速いことと、前記(B)多分岐化合物が共存していることが相俟って、重合反応が促進され、硬度の高い硬化膜が得られるものと思われる。
<(A) Compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group (hereinafter also referred to as “specific polymerizable compound”)>
The specific polymerizable compound is subjected to the action of the radical derived from the (C) initiator, and at least two ethylenically unsaturated double bond groups of the specific polymerizable compound cause a polymerization reaction to increase the molecular weight. A compound having a molecular weight of less than 1300. Due to the fact that the specific polymerizable compound has at least one secondary hydroxyl group, the polarity of the specific polymerizable compound is improved, and the hydrogen atom adjacent to the secondary hydroxyl group is easily extracted. In combination, the inhibition of the polymerization reaction by oxygen is suppressed and the reaction progress is fast, and the coexistence of the (B) multi-branched compound promotes the polymerization reaction and increases the hardness. It seems that a high cured film can be obtained.
 特定重合性化合物は、好ましくは下記一般式(1)で示される分子量1300未満の化合物である。 The specific polymerizable compound is preferably a compound having a molecular weight of less than 1300 represented by the following general formula (1).
Figure JPOXMLDOC01-appb-C000001

 
Figure JPOXMLDOC01-appb-C000001

 
(一般式(1)中、Xは水素原子又はメチル基を表す。nは、2以上6以下の整数を表す。Aは、m価の多価アルコールから、n個のヒドロキシ基の水素原子を除いたn価の基を表す。ここで、mは、2以上6以下の整数を表すが、m≧nである。) (In general formula (1), X represents a hydrogen atom or a methyl group. N represents an integer of 2 to 6. A represents a hydrogen atom of n hydroxy groups from an m-valent polyhydric alcohol. Represents an excluded n-valent group, where m represents an integer of 2 or more and 6 or less, and m ≧ n.
 上記m価の多価アルコールには、脂肪族アルコール及び芳香族ポリヒドロキシ化合物が含まれる。
 m価の脂肪族アルコールとしては、エチレングリコール、ジエチレングリコール、トリエチレングリコール、およびテトラエチレングリコール等のエチレングリコールオリゴマー、プロピレングリコール、ジプロピレングリコール、トリプロピレングリコール、1,3-プロパンジオール、1-メチル-1,3-プロパンジオール、2,2-ジメチル-1,3-プロパンジオール、1,4-ジメチロールシクロヘキサン、1,2,3-トリヒドロキシプロパン、1,1,1-トリメチロールプロパン、ペンタエリスリトール、ジペンタエリスリトールなどが挙げられる。
 m価の芳香族ポリヒドロキシ化合物としては、ビスフェールA、1,4-ジメタノールシクロヘキサンなどが挙げられる。
 これらのm価の多価アルコールのうち、重合時の系の粘度が低い方が重合進行性が良いという理由から、脂肪族アルコール系が好ましい。一方、架橋膜の硬度重視の場合には芳香族ポリヒドロキシ系の方が好ましいこともあり、要求性能により使い分けることが好ましい。
 以下、一般式(1)で表される化合物の好ましい具体例を挙げる。
 なお、下記化合物(35)は、一般式(1)で表される化合物には含まれないが、これも特定重合性化合物の好ましい例である。
The m-valent polyhydric alcohol includes aliphatic alcohols and aromatic polyhydroxy compounds.
Examples of m-valent aliphatic alcohols include ethylene glycol oligomers such as ethylene glycol, diethylene glycol, triethylene glycol, and tetraethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, 1,3-propanediol, 1-methyl- 1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 1,4-dimethylolcyclohexane, 1,2,3-trihydroxypropane, 1,1,1-trimethylolpropane, pentaerythritol And dipentaerythritol.
Examples of the m-valent aromatic polyhydroxy compound include bisfer A and 1,4-dimethanolcyclohexane.
Of these m-valent polyhydric alcohols, aliphatic alcohols are preferred because the lower the viscosity of the system during polymerization, the better the progress of polymerization. On the other hand, when importance is attached to the hardness of the crosslinked film, an aromatic polyhydroxy type may be preferable, and it is preferable to use them properly depending on the required performance.
Hereinafter, preferred specific examples of the compound represented by the general formula (1) will be given.
In addition, although the following compound (35) is not contained in the compound represented by General formula (1), this is also a preferable example of a specific polymerizable compound.
Figure JPOXMLDOC01-appb-C000002

 
Figure JPOXMLDOC01-appb-C000002

 
Figure JPOXMLDOC01-appb-C000003

 
Figure JPOXMLDOC01-appb-C000003

 
Figure JPOXMLDOC01-appb-C000004

 
Figure JPOXMLDOC01-appb-C000004

 
Figure JPOXMLDOC01-appb-C000005

 
Figure JPOXMLDOC01-appb-C000005

 
Figure JPOXMLDOC01-appb-C000006

 
Figure JPOXMLDOC01-appb-C000006

 
Figure JPOXMLDOC01-appb-C000007

 
Figure JPOXMLDOC01-appb-C000007

 
Figure JPOXMLDOC01-appb-C000008

 
Figure JPOXMLDOC01-appb-C000008

 
 特定重合性化合物の含有量は、硬化性組成物の固形分総質量を基準に、1質量%以上60質量%以下が適当であり、5質量%以上55質量%以下が好ましく、5質量%以上40質量%以下が特に好ましい。
 特定重合性化合物の含有量が1質量%以上であると、(C)開始剤として光重合開始剤を含有する場合には、露光による硬化が良好になり、更に、低温での加熱処理により、一段と高い硬度を有する硬化膜が得られ、且つ、この硬化膜を保護膜として使用した場合には劣化の少ないものとなる。他方、特定重合性化合物の含有量が60質量%以下の範囲であれば、硬化性組成物を塗布液とした場合における塗布液の粘度を適度の範囲に調整することが容易であり、且つ硬化膜の硬度などの調整、露光感度の調整も容易である。
The content of the specific polymerizable compound is suitably 1% by mass or more and 60% by mass or less, preferably 5% by mass or more and 55% by mass or less, preferably 5% by mass or more, based on the total solid content of the curable composition. 40 mass% or less is especially preferable.
When the content of the specific polymerizable compound is 1% by mass or more, when it contains a photopolymerization initiator (C) as an initiator, curing by exposure becomes good, and further, by heat treatment at a low temperature, A cured film having a much higher hardness can be obtained, and when this cured film is used as a protective film, there is little deterioration. On the other hand, if the content of the specific polymerizable compound is in the range of 60% by mass or less, it is easy to adjust the viscosity of the coating liquid to an appropriate range when the curable composition is used as the coating liquid, and curing is performed. It is easy to adjust the hardness of the film and the exposure sensitivity.
[(B)多分岐化合物]
 (B)多分岐化合物は、いわゆる櫛型、星型等の部分構造を二段階以上繰り返し有する高次の分枝構造を有する分子量1300以上の化合物である。(B)多分岐化合物は、その末端基が、カルボキシル基、アミノ基、エポキシ基、アクリロイル基、及びメタクリロイル基からなる群から選ばれた基であるものが含まれる。このうち、特に好ましい末端基は、アクリロイル基又はメタクリロイル基である。以下、末端基にアクリロイル基及びメタクリロイル基(以下、これらの基を包括的に「(メタ)アクリロイル基」ともいう。)からなる群から選ばれた少なくとも一つの基を有する分子量1300以上の化合物を「重合性多分岐化合物」ともいう。)
 (B)多分岐化合物は、重合性多分岐化合物であることが好ましい。重合性多分岐化合物は、末端(メタ)アクリロイル基の数が少なくとも10個のものが好ましく、更に12個以上32以下のものが更に好ましい。
 (B)多分岐化合物は、分子量1300以上の化合物であるが、分子量は、1300以上100000以下であり、より好ましくは1300以上20000以下のものが更に好ましく、特に1300以上15000以下のものが最も好ましい。1300以上の分子量を有する場合は、重量平均分子量を意味する。
[(B) Multi-branched compound]
(B) The hyperbranched compound is a compound having a molecular weight of 1300 or more having a higher-order branched structure having a partial structure such as a comb shape or a star shape repeatedly in two or more stages. (B) Multi-branched compounds include those whose terminal group is a group selected from the group consisting of a carboxyl group, an amino group, an epoxy group, an acryloyl group, and a methacryloyl group. Among these, a particularly preferred terminal group is an acryloyl group or a methacryloyl group. Hereinafter, a compound having a molecular weight of 1300 or more having at least one group selected from the group consisting of an acryloyl group and a methacryloyl group (hereinafter, these groups are also collectively referred to as “(meth) acryloyl group”) as a terminal group. Also referred to as “polymerizable hyperbranched compound”. )
(B) The hyperbranched compound is preferably a polymerizable hyperbranched compound. The polymerizable multi-branched compound preferably has at least 10 terminal (meth) acryloyl groups, more preferably 12 or more and 32 or less.
(B) The hyperbranched compound is a compound having a molecular weight of 1300 or more, but the molecular weight is 1300 or more and 100,000 or less, more preferably 1300 or more and 20000 or less, and particularly preferably 1300 or more and 15000 or less. . When it has a molecular weight of 1300 or more, it means a weight average molecular weight.
 本発明においては、(B)多分岐化合物が、デンドリマー及びハイパーブランチポリマーからなる群より選ばれることが、高い硬度の硬化膜が容易に得られる点で好ましい。
 デンドリマーは、コアを構成する化学構造(以下、「コア部」ともいう。)から、その外側へ規則的に分岐を繰り返した化学構造を有するものであり、球状の高度に制御された化学構造及び分子量を有している。ハイパーブランチポリマーは、デンドリマーと類似の化学構造を有するが、デンドリマーにおける程の高度に規則的な分岐構造又は分子量の高度な制御はなされておらず、分岐は確率分布に従って形成され、広い分子量分布を有するものである。
 デンドリマー及びハイパーブランチポリマーは溶解性に優れ、溶液とした場合の粘性が低く、多数の官能基(例えば、カルボキシル基、アミノ基、エポキシ基、アクリロイル基、及びメタクリロイル基など)を有している。このような、化学構造上の特徴が、前記(A)特定重合性化合物との組み合わせによって、低い加熱温度によって、高い硬度を有する硬化膜が得られる要因となっているものと思われる。
In the present invention, it is preferable that the (B) multi-branched compound is selected from the group consisting of a dendrimer and a hyperbranched polymer because a cured film having high hardness can be easily obtained.
A dendrimer has a chemical structure in which a chemical structure constituting a core (hereinafter also referred to as “core part”) is regularly branched to the outside thereof, and has a spherical, highly controlled chemical structure and Has a molecular weight. Hyperbranched polymers have a chemical structure similar to dendrimers, but are not as highly regular branching structures or high molecular weight controls as in dendrimers, and the branches are formed according to a probability distribution and have a broad molecular weight distribution. It is what you have.
Dendrimers and hyperbranched polymers are excellent in solubility, have low viscosity when made into a solution, and have a large number of functional groups (for example, carboxyl group, amino group, epoxy group, acryloyl group, and methacryloyl group). Such a characteristic on the chemical structure is considered to be a factor for obtaining a cured film having a high hardness at a low heating temperature by the combination with the specific polymerizable compound (A).
 デンドリマー及びハイパーブランチポリマーは、例えば、特開2012-173549号公報、国際公開第2008-047620号公報、特開2012-83594号公報などに記載されている。これらの化合物は、コア部と、該コア部に結合した分岐鎖部と、さらに該分岐鎖部に結合した末端基を有する。分岐鎖部においては、二次元又は三次元に枝分かれした部分構造を二段階以上繰り返した高度に分岐した構造を含み、末端基には、多数の官能基(例えば、ヒドロキシ基、カルボキシル基、アミノ基、エポキシ基、アクリロイル基、及びメタクリロイル基など)を有している。このようなデンドリマー及びハイパーブランチポリマーは、分子量1300以上の樹枝状化合物である。
 コア部を構成する化合物として、末端にメチロール基を有する鎖状の基を3つ以上有する分岐構造の多価アルコールを使用して合成したものが好ましく、更に、末端にメチロール基を有する鎖状の基を4つ以上有する分岐構造の多価アルコールを使用して合成したものが特に好ましい。
 上記多価アルコールの好ましい具体的には、例えば、ペンタエリスリトール、ジペンタエリスリトール、トリメチロールプロパン等が含まれる。多価アルコールのヒドロキシ基に分岐構造を有する連結基(以下、分岐鎖部ともいう。)を二段階以上結合させて分岐を繰り返した構造とされる。即ち、多価アルコールのヒドロキシ基に最も近い分岐構造の各分岐鎖末端の各々に、分岐鎖部を結合させて、高度に分岐した構造の化合物とし、その末端に少なくとも一部に前述の官能基が結合される。末端に官能基以外の基が含まれる場合、それらの基には、メチル基等のアルキル基が含まれる。
 コア部としては、例えば、下記の構造(1)~構造(4)で示される構造単位が挙げられる。
Dendrimers and hyperbranched polymers are described in, for example, Japanese Patent Application Laid-Open No. 2012-173549, International Publication No. 2008-047620, Japanese Patent Application Laid-Open No. 2012-83594, and the like. These compounds have a core portion, a branched chain portion bonded to the core portion, and an end group bonded to the branched chain portion. The branched chain portion includes a highly branched structure in which a two-dimensional or three-dimensional branched partial structure is repeated two or more steps, and the terminal group has a large number of functional groups (for example, a hydroxy group, a carboxyl group, an amino group). , Epoxy group, acryloyl group, and methacryloyl group). Such dendrimers and hyperbranched polymers are dendritic compounds having a molecular weight of 1300 or more.
The compound constituting the core is preferably synthesized using a branched polyhydric alcohol having three or more chain groups having a methylol group at the end, and further having a chain shape having a methylol group at the end. Those synthesized using a branched polyhydric alcohol having 4 or more groups are particularly preferred.
Preferable specific examples of the polyhydric alcohol include, for example, pentaerythritol, dipentaerythritol, trimethylolpropane and the like. A structure in which branching is repeated by connecting a linking group having a branched structure (hereinafter also referred to as a branched chain portion) to the hydroxy group of the polyhydric alcohol in two or more stages. That is, a branched chain part is bonded to each branched chain end of the branched structure closest to the hydroxy group of the polyhydric alcohol to form a highly branched compound, and at least a part of the functional group described above is formed at the terminal. Are combined. When a group other than a functional group is included at the terminal, these groups include an alkyl group such as a methyl group.
Examples of the core part include structural units represented by the following structures (1) to (4).
Figure JPOXMLDOC01-appb-C000009

 
Figure JPOXMLDOC01-appb-C000009

 
〔構造(1)中、*部は分岐鎖部との結合部位を表す。〕 [In structure (1), * part represents a binding site with a branched chain part. ]
Figure JPOXMLDOC01-appb-C000010

 
Figure JPOXMLDOC01-appb-C000010

 
〔構造(2)中、nは0~2の整数を表し、*部は前記と同じ意味を有する。〕 [In the structure (2), n represents an integer of 0 to 2, and the * part has the same meaning as described above. ]
Figure JPOXMLDOC01-appb-C000011

 
Figure JPOXMLDOC01-appb-C000011

 
〔構造(3)中、*部は前記と同じ意味を有する。〕 [In structure (3), the * part has the same meaning as described above. ]
Figure JPOXMLDOC01-appb-C000012

 
Figure JPOXMLDOC01-appb-C000012

 
〔構造(4)中、*部は前記と同じ意味を有する。〕 [In structure (4), the * part has the same meaning as described above. ]
 分岐鎖部としては、分岐構造を3つ以上有する構造単位が好ましく、例えば、ポリアミド、ポリエステル、ポリエーテル、ポリウレタン、ポリウレア等が挙げられる。中でも、ポリエステル単位及びポリウレタン単位が好ましい。分岐鎖部としては、ポリヒドロキシカルボン酸単位が好ましく、下記の構造(5)又は構造(6)で示される単位であることがより好ましい。 The branched chain portion is preferably a structural unit having three or more branched structures, and examples thereof include polyamide, polyester, polyether, polyurethane, and polyurea. Of these, polyester units and polyurethane units are preferred. As the branched chain part, a polyhydroxycarboxylic acid unit is preferable, and a unit represented by the following structure (5) or structure (6) is more preferable.
Figure JPOXMLDOC01-appb-C000013

 
Figure JPOXMLDOC01-appb-C000013

 
〔構造(5)中、*部はコア部又は分岐鎖部単位との結合部位を表す。 [In structure (5), * part represents a binding site with a core part or a branched chain unit.
Figure JPOXMLDOC01-appb-C000014

 
Figure JPOXMLDOC01-appb-C000014

 
〔構造(6)中、*部はコア部又は分岐鎖部単位との結合部位を表す。 [In structure (6), * part represents a binding site with a core part or a branched chain unit.
 前記コア部と分岐鎖部は、単結合により結合していてもよく、またエチレンオキシドやプロピレンオキシド等のアルキレンオキシドに由来する結合部位を介して結合していてもよい。アルキレンオキシドに由来する結合部位を介して結合する場合、アルキレンオキシドの酸素末端側が分岐鎖部の*部と結合することが好ましい。 The core portion and the branched chain portion may be bonded by a single bond, or may be bonded via a bonding site derived from an alkylene oxide such as ethylene oxide or propylene oxide. In the case of bonding through a bonding site derived from alkylene oxide, it is preferable that the oxygen terminal side of alkylene oxide is bonded to the * part of the branched chain.
 多分岐化合物の末端に結合している基はエチレン性不飽和結合を有する基であることが好ましく、そのような基としては、例えば、(メタ)アクリロイル基、ビニルオキシ基等が挙げられる。中でも、(メタ)アクリロイル基が好ましい。 The group bonded to the terminal of the multi-branched compound is preferably a group having an ethylenically unsaturated bond, and examples of such a group include a (meth) acryloyl group and a vinyloxy group. Of these, a (meth) acryloyl group is preferable.
 又、国際公開第2008-047620に記載のあるアルカリ現像型の多分岐ポリマーは放射線による硬化前の溶解性が増大している為、アルカリ現像によるパターン形成に一層有利である。 Moreover, the alkali-developable multi-branched polymer described in International Publication No. 2008-047620 is more advantageous for pattern formation by alkali development because of increased solubility before curing by radiation.
 これらの化合物は、例えば、国際公開第2008/047620号パンフレットや特開2008-174518号公報に記載された方法等により製造することができる。
 これらの化合物の分子量又は重量平均分子量は、1300以上100000以下であり、より好ましくは1300以上20000以下のものが更に好ましく、特に1300以上15000以下である。25℃における粘度は、好ましくは100Pa・s~500000Pa・sであり、より好ましくは300~300000Pa・sである。
These compounds can be produced, for example, by a method described in International Publication No. 2008/047620 pamphlet or Japanese Patent Application Laid-Open No. 2008-174518.
The molecular weight or the weight average molecular weight of these compounds is 1300 or more and 100,000 or less, more preferably 1300 or more and 20000 or less, further preferably 1300 or more and 15000 or less. The viscosity at 25 ° C. is preferably 100 Pa · s to 500,000 Pa · s, more preferably 300 to 300,000 Pa · s.
 具体的には、例えば、下記の構造式(B-1)~構造式(B-5)で示される化合物が挙げられる。 Specifically, for example, compounds represented by the following structural formulas (B-1) to (B-5) can be given.
Figure JPOXMLDOC01-appb-C000015

 
Figure JPOXMLDOC01-appb-C000015

 
Figure JPOXMLDOC01-appb-C000016

 
Figure JPOXMLDOC01-appb-C000016

 
 また、商品名でエスドリマーHU-22(新日鉄住金化学(株)製)、ビスコート#1000(大阪有機化学株式会社製、重量平均分子量:4000)、STAR-501(大阪有機化学株式会社製、重量平均分子量:11000)、A-HBR-5(新中村化学株式会社製、重量平均分子量:8000)、ニューフロンティアR-1150(第一工業製薬株式会社製、重量平均分子量:11500)、SN-2301(サートマー社製、重量平均分子量:7500)、日産化学工業(株)製の「ハイパーテック」の名称で販売されている製品、UR―101(重量平均分子量:8000)、デンドロン 製品番号 686581(SIGMA-ALDRICH社製、重量平均分子量:3803等を用いることができる。これらのデンドリマー及びハイパーブランチポリマーからなる群から選ばれた化合物は、単独でも、2種以上を組み合わせて含有させてもよい。 Also, under the trade names, Esdrimer HU-22 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), Biscoat # 1000 (manufactured by Osaka Organic Chemical Co., Ltd., weight average molecular weight: 4000), STAR-501 (manufactured by Osaka Organic Chemical Co., Ltd., weight average Molecular weight: 11000), A-HBR-5 (Shin Nakamura Chemical Co., Ltd., weight average molecular weight: 8000), New Frontier R-1150 (Daiichi Kogyo Seiyaku Co., Ltd., weight average molecular weight: 11500), SN-2301 ( Sartomer, weight average molecular weight: 7500), products sold under the name “Hypertech” manufactured by Nissan Chemical Industries, UR-101 (weight average molecular weight: 8000), Dendron product number 686581 (SIGMA- A product made by ALDRICH, weight average molecular weight: 3803, etc. can be used. Compound selected from the group consisting of chromatography, and the hyperbranched polymer by itself, may be contained in combination of two or more.
 (B)多分岐化合物の含有量は、硬化性組成物の固形分総質量を基準として、好ましくは5質量%以上70質量%以下であり、特に好ましくは10質量%以上65質量%以下である。 (B) The content of the multi-branched compound is preferably 5% by mass or more and 70% by mass or less, and particularly preferably 10% by mass or more and 65% by mass or less, based on the total solid content of the curable composition. .
 硬化性組成物は、前記(A)特定重合性化合物及び前記(B)多分岐化合物のいずれとも異なる重合性化合物(以下、「追加的重合性化合物」ともいう。)を含んでいてもよい。このような追加的重合性化合物は、(C)開始剤から発生した活性ラジカル又は酸ラジカル等によって重合しうる化合物であって、例えば、重合性のエチレン性不飽和結合を有する化合物等が挙げられる。
 具体的には、例えば、少なくとも一個のエチレン性不飽和二重結合を有する重合性化合物であり、特開2006-23696号公報の段落番号[0010]~[0020]に記載の成分や、特開2006-64921号公報の段落番号[0027]~[0053]に記載の成分を挙げることができる。重合性化合物としては、好ましくは、末端エチレン性不飽和結合を有する化合物であり、より好ましくは末端エチレン性不飽和結合を2個以上有する化合物から選ばれる。
The curable composition may contain a polymerizable compound (hereinafter also referred to as “additionally polymerizable compound”) that is different from both the (A) specific polymerizable compound and the (B) hyperbranched compound. Such an additional polymerizable compound is a compound that can be polymerized by an active radical or an acid radical generated from (C) an initiator, and examples thereof include a compound having a polymerizable ethylenically unsaturated bond. .
Specifically, for example, a polymerizable compound having at least one ethylenically unsaturated double bond, the components described in paragraphs [0010] to [0020] of JP-A-2006-23696, Mention may be made of the components described in paragraph numbers [0027] to [0053] of 2006-64921. The polymerizable compound is preferably a compound having a terminal ethylenically unsaturated bond, and more preferably selected from compounds having two or more terminal ethylenically unsaturated bonds.
 このような化合物群は当該産業分野において広く知られているものであり、本発明においてはこれらを特に限定なく用いることができる。これらは、例えば、モノマー、プレポリマー、すなわち2量体、3量体及びオリゴマー、又はそれらの混合物並びにそれらの多量体などの化学的形態のいずれであってもよい。
 また、イソシアネートと水酸基との付加反応を用いて製造されるウレタン付加の重合性化合物も好適であり、特開昭51-37193号公報、特公平2-32293号公報、特公平2-16765号公報に記載されているようなウレタンアクリレート類や、特公昭58-49860号公報、特公昭56-17654号公報、特公昭62-39417号公報、特公昭62-39418号公報に記載のエチレンオキサイド骨格を有するウレタン化合物類も好適である。
 その他の例としては、特開昭48-64183号公報、特公昭49-43191号公報、特公昭52-30490号公報の各公報に記載されているようなポリエステルアクリレート類、エポキシ樹脂と(メタ)アクリル酸とを反応させて得られるエポキシアクリレート類等の多官能のアクリレートやメタクリレートを挙げることができる。更に日本接着協会誌vol.20、No.7、300~308ページ(1984年)に光硬化性モノマー及びオリゴマーとして紹介されているものも使用することができる。
Such a compound group is widely known in the industrial field, and these can be used without particular limitation in the present invention. These may be in any chemical form such as, for example, monomers, prepolymers, ie dimers, trimers and oligomers, or mixtures thereof and multimers thereof.
In addition, a urethane-added polymerizable compound produced by an addition reaction between an isocyanate and a hydroxyl group is also suitable, such as JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765. And the ethylene oxide skeletons described in JP-B-58-49860, JP-B-56-17654, JP-B-62-39417, and JP-B-62-39418. Urethane compounds having them are also suitable.
Other examples include polyester acrylates, epoxy resins and (meth) described in JP-A-48-64183, JP-B-49-43191 and JP-B-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as epoxy acrylates obtained by reacting with acrylic acid. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.
 具体例としては、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、トリ((メタ)アクリロイルオキシエチル)イソシアヌレート、ペンタエリスリトールテトラ(メタ)アクリレートEO変性体、ジペンタエリスリトールヘキサ(メタ)アクリレートEO変性体などが、並びに、市販品としては、NKエステル A-TMMT、NKエステル A-TMM-3、NKオリゴUA-32P、NKオリゴUA-7200(以上、新中村化学工業(株)製)、アロニックス M-305、アロニックス M-306、アロニックス M-309、アロニックス M-450、アロニックス M-402、TO-1382、TO-2349(以上、東亞合成(株)製)、V#802(大阪有機化学工業(株)製)、KAYARAD D-330、D-320、D-310、DPHA(以上、日本化薬株式会社製)を好ましい例として挙げることができる。
 これらの重合性化合物は単独で、或いは2種以上の併用で用いることができる。
Specific examples include pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, tri ((meth) acryloyloxyethyl) isocyanurate. , Pentaerythritol tetra (meth) acrylate EO modified products, dipentaerythritol hexa (meth) acrylate EO modified products, etc., and commercially available products include NK ester A-TMMT, NK ester A-TMM-3, and NK oligo UA. -32P, NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), Aronix M-305, Aronix M-306, Aronix M-309, Aronix M-450, Aronix M -402, TO-1382, TO-2349 (above, manufactured by Toagosei Co., Ltd.), V # 802 (produced by Osaka Organic Chemical Industry Co., Ltd.), KAYARAD D-330, D-320, D-310, DPHA ( As mentioned above, Nippon Kayaku Co., Ltd.) can be mentioned as a preferable example.
These polymerizable compounds can be used alone or in combination of two or more.
 硬化性組成物に、追加的重合性化合物を含有させる場合、その含有量は、硬化性組成物の全固形分総質量を基準として、0.01質量%以上20質量%以下が好ましく、0.1質量%~10質量%がより好ましく、0.5質量%~8質量%が特に好ましい。 When an additional polymerizable compound is contained in the curable composition, the content is preferably 0.01% by mass or more and 20% by mass or less based on the total mass of the total solid content of the curable composition. 1% by mass to 10% by mass is more preferable, and 0.5% by mass to 8% by mass is particularly preferable.
[(C)開始剤]
 (C)開始剤は、光重合開始剤及び熱重合開始剤からなる群から選ばれる少なくとも1種の化合物である。
 (C)開始剤として、光重合開始剤を含有させた場合には、パターン状の硬化膜をリソグラフィック・プロセスにより形成することができ、カラーフィルタの色分解用画素を形成する場合に有利である。もちろん、全面ベタ露光を行うことにより、保護膜の形成に供することもできる。
 (C)開始剤として、熱重合開始剤を含有させた場合においても、赤外レーザ光のような赤外線を光源として用いれば、パターン状の硬化膜をリソグラフィック・プロセスにより形成することができる。更に、全面ベタ露光を行うことにより、保護膜の形成に供することもできる。
 (C)開始剤として、光重合開始剤及び熱重合開始剤の両者を含有させた場合には、例えば紫外線を光源としてリソグラフィック・プロセスによりパターン状の硬化膜を光源として形成し、更にこれを加熱することにより、一段と高い硬度を有するパターン状の硬化膜が得られるので好ましい。
[(C) initiator]
(C) The initiator is at least one compound selected from the group consisting of a photopolymerization initiator and a thermal polymerization initiator.
(C) When a photopolymerization initiator is contained as an initiator, a patterned cured film can be formed by a lithographic process, which is advantageous when forming a color separation pixel of a color filter. is there. Of course, it is also possible to form a protective film by performing full-surface solid exposure.
(C) Even when a thermal polymerization initiator is contained as an initiator, if an infrared ray such as an infrared laser beam is used as a light source, a patterned cured film can be formed by a lithographic process. Furthermore, it can also be used for formation of a protective film by performing whole surface solid exposure.
(C) When both a photopolymerization initiator and a thermal polymerization initiator are contained as an initiator, for example, a patterned cured film is formed as a light source by a lithographic process using ultraviolet rays as a light source. Heating is preferable because a patterned cured film having a much higher hardness can be obtained.
〈(C-1)光重合開始剤〉
 光重合開始剤としては、公知の化合物を好適に用いることができ、例えば、トリアジン誘導体、オキサジアゾール誘導体、オキシム系開始剤、アセトフェノン系開始剤、チタノセン系開始剤、アシルフォスフィンオキサイド系開始剤などが好ましく挙げられる。
 具体的には、例えば、特開2006-23696号公報の段落番号[0012]~[0020]に記載の成分や、特開2006-64921号公報の段落番号[0050]~[0053]に記載の成分が挙げられる。
<(C-1) Photopolymerization initiator>
As the photopolymerization initiator, known compounds can be suitably used. For example, triazine derivatives, oxadiazole derivatives, oxime initiators, acetophenone initiators, titanocene initiators, acylphosphine oxide initiators. Etc. are preferred.
Specifically, for example, the components described in paragraph numbers [0012] to [0020] of JP-A-2006-23696, and the paragraphs [0050] to [0053] of JP-A-2006-64921 are described. Ingredients.
 本発明に使用しうる好ましい(C-1)光重合開始剤としては、例えば、2-トリクロロメチル-5-(p-スチリルメチル)-1,3,4-オキサジアゾール、2,4-ビス(トリクロロメチル)-6-[4-(N,N-ジエトキシカルボニルメチル)-3-ブロモフェニル]-s-トリアジン、7-[2-[4-(3-ヒドロキシメチルピペリジノ)-6-ジエチルアミノ]トリアジニルアミノ]-3-フェニルクマリン、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、1-ヒドロキシシクロヘキシル-フェニルケトン、2-ヒドロキシ-2-メチル-1-フェニル-プロパン-1-オン、1-[4-2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン、2-ヒロドキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピ
オニル)-ベンジル]フェニル}-2-メチル-プロパン-1-オン、2-メチル-1-(4-メチルチオフェニル)-2-モルフォリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタノン-1、2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノン、2,4,6-トリメチルベンゾイル-ジフェニルフォスフィンオキサイド、ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド、ビス(η5-2,4-シクロペンタジエン-1-イル)-ビス(2,6-ジフルオロ-3-(1H-ピロール-1-イル)-フェニル)チタニウム、1-[4-(フェニルチオ)フェニル]-1,2-オクタンジオン2-(O-ベンゾイルオキシム)、1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタノン(O-アセチルオキシム)、オキシフェニル酢酸2-[2-オキソ-2-フェニルアセトキシエトキシ]エチルエステルとオキシフェニル酢酸2-(2-ヒドロキシエトキシ)エチルエステルの混合物等が挙げられる。
Preferred (C-1) photopolymerization initiators usable in the present invention include, for example, 2-trichloromethyl-5- (p-styrylmethyl) -1,3,4-oxadiazole, 2,4-bis (Trichloromethyl) -6- [4- (N, N-diethoxycarbonylmethyl) -3-bromophenyl] -s-triazine, 7- [2- [4- (3-hydroxymethylpiperidino) -6 -Diethylamino] triazinylamino] -3-phenylcoumarin, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexyl-phenylketone, 2-hydroxy-2-methyl-1-phenyl -Propan-1-one, 1- [4-2-2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1 {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] phenyl} -2-methyl-propan-1-one, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopro Pan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone, 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, bis (η5- 2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium 1- [4- (phenylthio) phenyl] -1,2-octanedione 2- (O-benzoyloxime), 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl And ethanone (O-acetyloxime), a mixture of oxyphenylacetic acid 2- [2-oxo-2-phenylacetoxyethoxy] ethyl ester and oxyphenylacetic acid 2- (2-hydroxyethoxy) ethyl ester, and the like.
 なかでも、2-トリクロロメチル-5-(p-スチリルメチル)-1,3,4-オキサジアゾール、2,4-ビス(トリクロロメチル)-6-[4-(N,N-ジエトキシカルボニルメチル)-3-ブロモフェニル]-s-トリアジン、7-[2-[4-(3-ヒドロキシメチルピペリジノ)-6-ジエチルアミノ]トリアジニルアミノ]-3-フェニルクマリン、2,2-ジメトキシ-1,2-ジフェニルエタン-1-オン、1-ヒドロキシシクロヘキシル-フェニルケトン、2-ヒドロキシ-2-メチル-1-フェニル-プロパン-1-オン、1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン、2-メチル-1-(4-メチルチオフェニル)-2-モルフォリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルフォリノフェニル)-ブタノン-1、2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-[4-(4-モルホリニル)フェニル]-1-ブタノン、1-[4-(フェニルチオ)フェニル]-1,2-オクタンジオン2-(O-ベンゾイルオキシム)、1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]エタノン(O-アセチルオキシム)、オキシフェニル酢酸2-[2-オキソ-2-フェニルアセトキシエトキシ]エチルエステルとオキシフェニル酢酸2-(2-ヒドロキシエトキシ)エチルエステルの混合物が特に好ましいが、これに限定されない。 Among them, 2-trichloromethyl-5- (p-styrylmethyl) -1,3,4-oxadiazole, 2,4-bis (trichloromethyl) -6- [4- (N, N-diethoxycarbonyl) Methyl) -3-bromophenyl] -s-triazine, 7- [2- [4- (3-hydroxymethylpiperidino) -6-diethylamino] triazinylamino] -3-phenylcoumarin, 2,2- Dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexyl-phenylketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1- [4- (2-hydroxyethoxy) -Phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropane- -One, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone, 1- [4- (phenylthio) phenyl] -1,2-octanedione 2- (O-benzoyloxime), 1- [9-ethyl-6- (2- Methylbenzoyl) -9H-carbazol-3-yl] ethanone (O-acetyloxime), oxyphenylacetic acid 2- [2-oxo-2-phenylacetoxyethoxy] ethyl ester and oxyphenylacetic acid 2- (2-hydroxyethoxy) A mixture of ethyl esters is particularly preferred, but not limited thereto.
 更に、下記一般式(a)で表されるカルバゾール構造を有する光重合開始剤を少なくとも一種含有することも好ましい。 Furthermore, it is also preferable to contain at least one photopolymerization initiator having a carbazole structure represented by the following general formula (a).
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
 一般式(a)中、RおよびXは、それぞれ、1価の置換基を表し、Aは、2価の有機基を表し、Arは、アリール基を表す。nは、1~5の整数である。Rとしては、高感度化の点から、アシル基が好ましく、具体的には、アセチル基、プロピオニル基、ベンゾイル基、トルイル基が好ましい。Aとしては、感度を高め、加熱経時による着色を抑制する点から、無置換のアルキレン基、アルキル基(例えば、メチル基、エチル基、tert-ブチル基、ドデシル基)で置換されたアルキレン基、アルケニル基(例えば、ビニル基、アリル基)で置換されたアルキレン基、アリール基(例えば、フェニル基、p-トリル基、キシリル基、クメニル基、ナフチル基、アンスリル基、フェナントリル基、スチリル基)で置換されたアルキレン基が好ましい。 In general formula (a), R and X each represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group. n is an integer of 1 to 5. R is preferably an acyl group from the viewpoint of increasing sensitivity, and specifically, an acetyl group, a propionyl group, a benzoyl group, and a toluyl group are preferable. A is an unsubstituted alkylene group, an alkylene group substituted with an alkyl group (for example, a methyl group, an ethyl group, a tert-butyl group, or a dodecyl group) from the viewpoint of increasing sensitivity and suppressing coloration due to heating, An alkylene group substituted with an alkenyl group (for example, vinyl group, allyl group), aryl group (for example, phenyl group, p-tolyl group, xylyl group, cumenyl group, naphthyl group, anthryl group, phenanthryl group, styryl group) A substituted alkylene group is preferred.
 Arとしては、感度を高め、加熱経時による着色を抑制する点から、置換または無置換のフェニル基が好ましい。置換フェニル基の場合、その置換基としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子等のハロゲン基が好ましい。Xとしては、溶剤溶解性と長波長領域の吸収効率向上の点から、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルケニル基、置換基を有してもよいアルキニル基、置換基を有してもよいアルコキシ基、置換基を有してもよいアリールオキシ基、置換基を有してもよいアルキルチオキシ基、置換基を有してもよいアリールチオキシ基、置換基を有してもよいアミノ基が好ましい。
 また、一般式(a)におけるnは1~2の整数が好ましい。
Ar is preferably a substituted or unsubstituted phenyl group from the viewpoint of increasing sensitivity and suppressing coloring due to heating. In the case of a substituted phenyl group, the substituent is preferably a halogen group such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. X is an alkyl group that may have a substituent, an aryl group that may have a substituent, or an alkenyl that may have a substituent from the viewpoint of improving solvent solubility and absorption efficiency in the long wavelength region. Group, an alkynyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylthioxy group which may have a substituent, a substituent An arylthioxy group which may have an amino group and an amino group which may have a substituent are preferable.
In general formula (a), n is preferably an integer of 1 to 2.
 上記一般式(a)で表される光重合開始剤の具体例としては、下記の例示化合物(V-3)が挙げられる。 Specific examples of the photopolymerization initiator represented by the general formula (a) include the following exemplary compound (V-3).
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
〈(C-2)熱重合開始剤〉
 熱重合開始剤としては、公知の化合物を好適に用いることができ、例えば、ケトンパーオキサイド系化合物、パーオキシケタール系化合物、ハイドロパーオキサイド系化合物、ジアルキルパーオキサイド系化合物、ジアシルパーオキサイド系化合物、パーオキシジカーボネート系化合物、パーオキシエステル系化合物等が用いられ、これらの熱重合開始剤は企業の製品カタログ等で公開されている。又、特表2012-521573に記載のヒドロキシルアミンエステルを含む熱重合開始剤が本発明では好適に使用される。具体的な化合物例は下記である。
<(C-2) Thermal polymerization initiator>
As the thermal polymerization initiator, known compounds can be suitably used. For example, ketone peroxide compounds, peroxyketal compounds, hydroperoxide compounds, dialkyl peroxide compounds, diacyl peroxide compounds, Peroxydicarbonate compounds, peroxyester compounds and the like are used, and these thermal polymerization initiators are disclosed in company product catalogs and the like. In addition, a thermal polymerization initiator containing a hydroxylamine ester described in JP 2012-521573 is preferably used in the present invention. Specific compound examples are as follows.
Figure JPOXMLDOC01-appb-C000019

 
Figure JPOXMLDOC01-appb-C000019

 
 (C)開始剤の含有量は、硬化性組成物の全固形分総量を基準として、0.1質量%以上20質量%以下であることが好ましく、0.5質量%以上10質量%以下であることがより好ましく、1質量%以上5質量%以下が最も好ましい。 (C) The content of the initiator is preferably 0.1% by mass or more and 20% by mass or less, and 0.5% by mass or more and 10% by mass or less based on the total amount of the total solid content of the curable composition. More preferably, it is more preferably 1% by mass or more and 5% by mass or less.
[(D)側鎖に酸性基を有する樹脂]
 本発明に係る硬化性組成物には、(D)側鎖に酸性基を有する樹脂(以下、「特定樹脂」ともいう。)を含有させてもよい。
 特定樹脂は、側鎖に酸性基を有するものであれば特に制限はないが、酸性基を有する基:Y(yモル%)の他、さらに、側鎖に分岐および/または脂環構造を有する基:X(xモル%)と、エチレン性不飽和基を有する基:Z(zモル%)を含有することが好ましく、必要に応じてその他の基(L)(lモル%)を有していてもよい。また、特定樹脂中のひとつの基の中に、X、Y及びZから選ばれた少なくとも二種以上の基が含まれていてもよい。
[(D) Resin having acidic group in side chain]
The curable composition according to the present invention may contain (D) a resin having an acidic group in the side chain (hereinafter also referred to as “specific resin”).
The specific resin is not particularly limited as long as it has an acidic group in the side chain, but has a branched and / or alicyclic structure in the side chain in addition to the group having an acidic group: Y (y mol%). It preferably contains a group: X (x mol%) and a group having an ethylenically unsaturated group: Z (z mol%), and optionally has other groups (L) (1 mol%). It may be. Moreover, at least 2 or more types of groups selected from X, Y, and Z may be contained in one group in specific resin.
 前記酸性基としては、特に制限はなく、公知のものの中から適宜選択することができ、例えば、カルボキシル基、スルホン酸基、スルホンアミド基、リン酸基、フェノール性水酸基等が挙げられる。これらの中でも、現像性、及び硬化膜の耐水性が優れる点から、カルボキシ基、フェノール性水酸基であることが好ましい。 The acidic group is not particularly limited and may be appropriately selected from known ones, and examples thereof include a carboxyl group, a sulfonic acid group, a sulfonamide group, a phosphoric acid group, and a phenolic hydroxyl group. Among these, a carboxy group and a phenolic hydroxyl group are preferable from the viewpoint of excellent developability and water resistance of the cured film.
 前記特定樹脂の側鎖に酸性基を導入するために用いられる単量体(酸性基を有する単量体)としては、特に制限はなく、スチレン類、(メタ)アクリレート類、ビニルエーテル類、ビニルエステル類、(メタ)アクリルアミド類などに上記カルボキシル基等の酸性基を導入したものが挙げられ、(メタ)アクリレート類、ビニルエステル類、(メタ)アクリルアミド類に酸性基を導入したものが好ましく、さらに好ましくは(メタ)アクリレート類に酸性基を導入したものである。
 なお、本明細書において、「アクリル」及び「メタクリル」の双方或いはいずれかを指す場合、「(メタ)アクリル」と、「アクリレート」及び「メタクリレート」の双方或いはいずれかを指す場合、「(メタ)アクリレート」と、それぞれ表記することがある。
The monomer used for introducing an acidic group into the side chain of the specific resin (a monomer having an acidic group) is not particularly limited, and styrenes, (meth) acrylates, vinyl ethers, vinyl esters. And those obtained by introducing an acidic group such as the above carboxyl group into (meth) acrylamides and the like, (meth) acrylates, vinyl esters, and those having an acidic group introduced into (meth) acrylamides are preferred. Preferably, an acid group is introduced into (meth) acrylates.
In this specification, when referring to “acryl” and / or “methacryl”, when referring to “(meth) acryl” and / or “acrylate” and / or “methacrylate”, “(meth) )) Acrylate ".
 前記酸性基を有する単量体の具体例としては、公知のものの中から適宜選択することができ、例えば、(メタ)アクリル酸、ビニル安息香酸、マレイン酸、マレイン酸モノアルキルエステル、フマル酸、イタコン酸、クロトン酸、桂皮酸、ソルビン酸、α-シアノ桂皮酸、アクリル酸ダイマー、水酸基を有する単量体と環状酸無水物との付加反応物、ω-カルボキシ-ポリカプロラクトンモノ(メタ)アクリレート等が挙げられる。これらは、適宜製造したものを使用してもよいし、市販品を使用してもよい。 Specific examples of the monomer having an acidic group can be appropriately selected from known ones such as (meth) acrylic acid, vinyl benzoic acid, maleic acid, maleic acid monoalkyl ester, fumaric acid, Itaconic acid, crotonic acid, cinnamic acid, sorbic acid, α-cyanocinnamic acid, acrylic acid dimer, addition reaction product of hydroxyl group-containing monomer and cyclic acid anhydride, ω-carboxy-polycaprolactone mono (meth) acrylate Etc. As these, those produced as appropriate may be used, or commercially available products may be used.
 前記水酸基を有する単量体と環状酸無水物との付加反応物に用いられる水酸基を有する単量体としては、例えば、2-ヒドロキシエチル(メタ)アクリレート等が挙げられる。前記環状酸無水物としては、例えば、無水マレイン酸、無水フタル酸、シクロヘキサンジカルボン酸無水物等が挙げられる。これらの中でも現像性に優れ、低コストである点で(メタ)アクリル酸等が好ましい。 Examples of the monomer having a hydroxyl group used in the addition reaction product of the monomer having a hydroxyl group and a cyclic acid anhydride include 2-hydroxyethyl (meth) acrylate. Examples of the cyclic acid anhydride include maleic anhydride, phthalic anhydride, and cyclohexanedicarboxylic anhydride. Among these, (meth) acrylic acid and the like are preferable in terms of excellent developability and low cost.
 特定樹脂における側鎖に酸性基を有する単量体の導入量は、5~70モル%が好ましく、10~60モル%が更に好ましく、20~50モル%が特に好ましい。側鎖に酸性基を有する基が前記範囲内であると、良好な硬化性、現像性が得られる。
 また、特定樹脂として好適な酸価は、とりうる分子構造により好ましい範囲は変動するが、一般には20mgKOH/g以上であることが好ましく、50mgKOH/g以上であることはより好ましく、70~130mgKOH/gであることが特に好ましい。酸価が前記好ましい範囲内であると、良好な絶縁性、透明性、耐水性、耐アルカリ性、耐酸性に優れた絶縁層及びオーバーコート層が得られる。このため、酸価が上記範囲となるように、側鎖に酸性基を有する単量体の使用量を決定すればよい。
The amount of the monomer having an acidic group in the side chain in the specific resin is preferably 5 to 70 mol%, more preferably 10 to 60 mol%, and particularly preferably 20 to 50 mol%. When the group having an acidic group in the side chain is within the above range, good curability and developability can be obtained.
In addition, the acid value suitable as the specific resin varies within a preferable range depending on the molecular structure that can be taken, but is generally preferably 20 mgKOH / g or more, more preferably 50 mgKOH / g or more, and 70 to 130 mgKOH / g. Particularly preferred is g. When the acid value is within the preferable range, an insulating layer and an overcoat layer excellent in good insulation, transparency, water resistance, alkali resistance and acid resistance can be obtained. For this reason, what is necessary is just to determine the usage-amount of the monomer which has an acidic group in a side chain so that an acid value may become the said range.
 また、特定樹脂は、既述のように、さらに、側鎖に「分岐および/または脂環構造を有する基」や、「エチレン性不飽和基」を有していてもよい。
 即ち、本発明における特定樹脂は、前記側鎖に分岐および/または脂環構造を有する基:X(xモル%)と、酸性基を有する基:Y(yモル%)と、エチレン性不飽和基を有する基:Z(zモル%)とをそれぞれ別の共重合単位に有する少なくとも3元共重合以上の共重合体であることが、形成される樹脂パターンの絶縁性、透明性、耐水性、耐アルカリ性、耐酸性現像残渣低減、レチキュレーションの観点から好ましい。具体的には、前記X,Y,Zを構成する各々の単量体を少なくとも1つ共重合させてなる共重合体が好ましい。
Further, as described above, the specific resin may further have a “group having a branched and / or alicyclic structure” or an “ethylenically unsaturated group” in the side chain.
That is, the specific resin in the present invention includes a group having a branched and / or alicyclic structure in the side chain: X (x mol%), a group having an acidic group: Y (y mol%), and ethylenically unsaturated. The group having a group: Z (z mol%) and a copolymer having at least ternary copolymer each having a different copolymer unit, the insulation, transparency and water resistance of the formed resin pattern From the viewpoints of alkali resistance, acid-resistant development residue reduction, and reticulation. Specifically, a copolymer obtained by copolymerizing at least one of the monomers constituting the X, Y, and Z is preferable.
 以下、「側鎖に分岐および/または脂環構造を有する基」について説明する。
 分岐を有する基としては、炭素原子数3~12個の分岐状のアルキル基を示し、例えば、i-プロピル基、i-ブチル基、s-ブチル基、t-ブチル基、イソペンチル基、ネオペンチル基、2-メチルブチル基、イソヘキシル基、2-エチルヘキシル基、2-メチルヘキシル基、i-アミル基、t-アミル基、3-オクチル、t-オクチル等が挙げられる。これらの中でも、i-プロピル基、s-ブチル基、t-ブチル基、イソペンチル基等が好ましく、さらにi-プロピル基、s-ブチル基、t-ブチル基等が好ましい。
Hereinafter, the “group having a branched and / or alicyclic structure in the side chain” will be described.
Examples of the branched group include branched alkyl groups having 3 to 12 carbon atoms, such as i-propyl group, i-butyl group, s-butyl group, t-butyl group, isopentyl group, and neopentyl group. 2-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, i-amyl group, t-amyl group, 3-octyl, t-octyl and the like. Among these, i-propyl group, s-butyl group, t-butyl group, isopentyl group and the like are preferable, and i-propyl group, s-butyl group, t-butyl group and the like are more preferable.
 脂環構造を有する基としては、炭素原子数5~20個の脂環式炭化水素基を示し、例えば、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基、ノルボルニル基、イソボルニル基、アダマンチル基、トリシクロデシル基、ジシクロペンテニル基、ジシクロペンタニル基、トリシクロペンテニル基、及びトリシクロペンタニル基等が挙げられる。これらの中でも、シクロヘキシル基、ノルボルニル基、イソボルニル基、アダマンチル基、トリシクロデシル基、トリシクロペンテニル基、トリシクロペンタニル基等が好ましく、更にシクロヘキシル基、ノルボルニル基、イソボルニル基、トリシクロペンテニル基等が好ましい。 Examples of the group having an alicyclic structure include an alicyclic hydrocarbon group having 5 to 20 carbon atoms, such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, a cyclooctyl group, a norbornyl group, an isobornyl group, an adamantyl group. , Tricyclodecyl group, dicyclopentenyl group, dicyclopentanyl group, tricyclopentenyl group, and tricyclopentanyl group. Among these, a cyclohexyl group, a norbornyl group, an isobornyl group, an adamantyl group, a tricyclodecyl group, a tricyclopentenyl group, a tricyclopentanyl group, and the like are preferable, and a cyclohexyl group, a norbornyl group, an isobornyl group, a tricyclopentenyl group, and the like. Is preferred.
 前記側鎖に分岐および/または脂環構造を有する基を含有する単量体としては、スチレン類、(メタ)アクリレート類、ビニルエーテル類、ビニルエステル類、(メタ)アクリルアミド類などが挙げられ、(メタ)アクリレート類、ビニルエステル類、(メタ)アクリルアミド類が好ましく、さらに好ましくは(メタ)アクリレート類である。 Examples of the monomer containing a group having a branched and / or alicyclic structure in the side chain include styrenes, (meth) acrylates, vinyl ethers, vinyl esters, (meth) acrylamides, and the like ( (Meth) acrylates, vinyl esters and (meth) acrylamides are preferred, and (meth) acrylates are more preferred.
 前記側鎖に分岐構造を有する基を含有する単量体の具体例としては、(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、(メタ)アクリル酸s-ブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸i-アミル、(メタ)アクリル酸t-アミル、(メタ)アクリル酸sec-iso-アミル、(メタ)アクリル酸2-オクチル、(メタ)アクリル酸3-オクチル、(メタ)アクリル酸t-オクチル等が挙げられ、その中でも、(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、メタクリル酸t-ブチル等が好ましく、さらに好ましくは、メタクリル酸i-プロピル、メタクリル酸t-ブチル等である。 Specific examples of the monomer containing a group having a branched structure in the side chain include i-propyl (meth) acrylate, i-butyl (meth) acrylate, s-butyl (meth) acrylate, (meth ) T-butyl acrylate, i-amyl (meth) acrylate, t-amyl (meth) acrylate, sec-iso-amyl (meth) acrylate, 2-octyl (meth) acrylate, (meth) acrylic acid 3-octyl, t-octyl (meth) acrylate, and the like, among which i-propyl (meth) acrylate, i-butyl (meth) acrylate, t-butyl methacrylate, and the like are preferable, and more preferable. I-propyl methacrylate, t-butyl methacrylate and the like.
 次に、前記側鎖に脂環構造を有する基を含有する単量体の具体例としては、炭素原子数5~20個の脂環式炭化水素基を有する(メタ)アクリレートである。具体的な例としては、(メタ)アクリル酸(ビシクロ〔2.2.1〕ヘプチル-2)、(メタ)アクリル酸-1-アダマンチル、(メタ)アクリル酸-2-アダマンチル、(メタ)アクリル酸-3-メチル-1-アダマンチル、(メタ)アクリル酸-3,5-ジメチル-1-アダマンチル、(メタ)アクリル酸-3-エチルアダマンチル、(メタ)アクリル酸-3-メチル-5-エチル-1-アダマンチル、(メタ)アクリル酸-3,5,8-トリエチル-1-アダマンチル、(メタ)アクリル酸-3,5-ジメチル-8-エチル-1-アダマンチル、(メタ)アクリル酸 2-メチル-2-アダマンチル、(メタ)アクリル酸 2-エチル-2-アダマンチル、(メタ)アクリル酸 3-ヒドロキシ-1-アダマンチル、(メタ)アクリル酸オクタヒドロ-4,7-メンタノインデン-5-イル、(メタ)アクリル酸オクタヒドロ-4,7-メンタノインデン-1-イルメチル、(メタ)アクリル酸-1-メンチル、(メタ)アクリル酸トリシクロデシル、(メタ)アクリル酸-3-ヒドロキシ-2,6,6-トリメチル-ビシクロ〔3.1.1〕ヘプチル、(メタ)アクリル酸-3,7,7-トリメチル-4-ヒドロキシ-ビシクロ〔4.1.0〕ヘプチル、(メタ)アクリル酸(ノル)ボルニル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸フエンチル、(メタ)アクリル酸-2,2,5-トリメチルシクロヘキシル、(メタ)アクリル酸シクロヘキシル、などが挙げられる。
 これら(メタ)アクリル酸エステルのなかでも、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸(ノル)ボルニル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸-1-アダマンチル、(メタ)アクリル酸-2-アダマンチル、(メタ)アクリル酸フエンチル、(メタ)アクリル酸1-メンチル、(メタ)アクリル酸トリシクロデシルなどが好ましく、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸(ノル)ボルニル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸-2-アダマンチルが特に好ましい。
Next, a specific example of the monomer containing a group having an alicyclic structure in the side chain is (meth) acrylate having an alicyclic hydrocarbon group having 5 to 20 carbon atoms. Specific examples include (meth) acrylic acid (bicyclo [2.2.1] heptyl-2), (meth) acrylic acid-1-adamantyl, (meth) acrylic acid-2-adamantyl, (meth) acrylic. Acid-3-methyl-1-adamantyl, (meth) acrylic acid-3,5-dimethyl-1-adamantyl, (meth) acrylic acid-3-ethyladamantyl, (meth) acrylic acid-3-methyl-5-ethyl 1-adamantyl, (meth) acrylic acid-3,5,8-triethyl-1-adamantyl, (meth) acrylic acid-3,5-dimethyl-8-ethyl-1-adamantyl, (meth) acrylic acid 2- Methyl-2-adamantyl, (meth) acrylic acid 2-ethyl-2-adamantyl, (meth) acrylic acid 3-hydroxy-1-adamantyl, (meth) acrylic acid Tahydro-4,7-mentanoinden-5-yl, octahydro-4,7-mentanoinden-1-ylmethyl (meth) acrylate, (meth) acrylate-1-menthyl, tricyclo (meth) acrylate Decyl, (meth) acrylic acid-3-hydroxy-2,6,6-trimethyl-bicyclo [3.1.1] heptyl, (meth) acrylic acid-3,7,7-trimethyl-4-hydroxy-bicyclo [ 4.1.0] heptyl, (nor) bornyl (meth) acrylate, isobornyl (meth) acrylate, fuentyl (meth) acrylate, 2,2,5-trimethylcyclohexyl (meth) acrylate, (meth) And cyclohexyl acrylate.
Among these (meth) acrylate esters, cyclohexyl (meth) acrylate, (nor) bornyl (meth) acrylate, isobornyl (meth) acrylate, (meth) acrylic acid-1-adamantyl, (meth) acrylic acid -2-adamantyl, fuentyl (meth) acrylate, 1-menthyl (meth) acrylate, tricyclodecyl (meth) acrylate, and the like, cyclohexyl (meth) acrylate, (nor) bornyl (meth) acrylate, Particularly preferred are isobornyl (meth) acrylate and 2-adamantyl (meth) acrylate.
 前記特定樹脂の前記各成分の共重合組成比については、ガラス転移温度と酸価を勘案して決定され、一概に言えないが、「側鎖に分岐および/または脂環構造を有する基」を有する繰り返し単位の含有量は10モル%~70モル%が好ましく、15モル%~65モル%が更に好ましく、20モル%~60モル%が特に好ましい。側鎖に分岐および/または脂環構造を有する基を有する繰り返し単位の含有量が前記範囲内であると、良好な現像性が得られると共に、画像部の現像液耐性も良好である。 The copolymer composition ratio of the respective components of the specific resin is determined in consideration of the glass transition temperature and the acid value, and cannot be generally stated, but “group having a branched and / or alicyclic structure in the side chain” The content of the repeating unit is preferably 10 mol% to 70 mol%, more preferably 15 mol% to 65 mol%, and particularly preferably 20 mol% to 60 mol%. When the content of the repeating unit having a group having a branched and / or alicyclic structure in the side chain is within the above range, good developability is obtained and the developer resistance of the image area is also good.
 前記「エチレン性不飽和基」としては、特に制限はないが、アリル基や(メタ)アクリロイル基が好ましい。また、エチレン性不飽和基と単量体との連結はエステル基、アミド基、カルバモイル基などの2価の連結基であれば特に制限はない。側鎖にエチレン性不飽和基を導入する方法は公知のものの中から適宜選択することができ、例えば、酸性基を持つ化合物(例えば、アクリル酸、メタクリル酸、ビニル安息香酸、マレイン酸、マレイン酸モノアルキルエステル、フマル酸、イタコン酸、クロトン酸、桂皮酸、ソルビン酸、α-シアノ桂皮酸等)にエポキシ基を持つ(メタ)アクリレートを付加する方法、ヒドロキシル基を持つ基(例えば、2-ヒドロキシエチルメタクリレート、2-ヒドロキシエチルアクリレート等)にイソシアネート基を持つ(メタ)アクリレートを付加する方法、イソシアネート基を持つ基にヒドロキシ基を持つ(メタ)アクリレートを付加する方法などが挙げられる。 The “ethylenically unsaturated group” is not particularly limited, but is preferably an allyl group or a (meth) acryloyl group. The connection between the ethylenically unsaturated group and the monomer is not particularly limited as long as it is a divalent linking group such as an ester group, an amide group, or a carbamoyl group. The method for introducing an ethylenically unsaturated group into the side chain can be appropriately selected from known ones. For example, a compound having an acidic group (for example, acrylic acid, methacrylic acid, vinylbenzoic acid, maleic acid, maleic acid) A method of adding a (meth) acrylate having an epoxy group to a monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, sorbic acid, α-cyanocinnamic acid, etc., a group having a hydroxyl group (for example, 2- Examples thereof include a method of adding (meth) acrylate having an isocyanate group to hydroxyethyl methacrylate, 2-hydroxyethyl acrylate and the like, and a method of adding (meth) acrylate having a hydroxy group to a group having an isocyanate group.
 その中でも、酸性基を持つ繰り返し単位にエポキシ基を持つ(メタ)アクリレートを付加する方法が最も製造が容易であり、低コストである点で好ましい。
 エチレン性不飽和結合及びエポキシ基を有する(メタ)アクリレートとしては、これらを有すれば特に制限はない。
Among these, the method of adding (meth) acrylate having an epoxy group to a repeating unit having an acidic group is most preferable because it is the easiest to produce and is low in cost.
The (meth) acrylate having an ethylenically unsaturated bond and an epoxy group is not particularly limited as long as it has these.
 「側鎖にエチレン性不飽和基」を有する繰り返し単位の含有量は10~70モル%が好ましく、20~70モル%が更に好ましく、30~70モル%が特に好ましい。側鎖にエチレン性不飽和基を有する基が前記範囲内であると、現像性及び硬化性も良好である。 The content of the repeating unit having an “ethylenically unsaturated group in the side chain” is preferably 10 to 70 mol%, more preferably 20 to 70 mol%, particularly preferably 30 to 70 mol%. When the group having an ethylenically unsaturated group in the side chain is within the above range, developability and curability are also good.
 特定樹脂には、前記3種の繰り返し単位の他、他の単量体に由来する繰り返し単
位を含んでもよい。そのような他の単量体としては、特に制限はなく、例えば分岐および/または脂環構造をもたない(メタ)アクリル酸エステル、スチレン、ビニルエーテル、二塩基酸無水物基、ビニルエステル基、炭化水素アルケニル基等を有する単量体などが挙げられる。
The specific resin may contain a repeating unit derived from another monomer in addition to the three kinds of repeating units. Such other monomer is not particularly limited, for example, (meth) acrylic acid ester having no branched and / or alicyclic structure, styrene, vinyl ether, dibasic acid anhydride group, vinyl ester group, And monomers having a hydrocarbon alkenyl group.
 前記ビニルエーテル基としては、特に制限はなく、例えば、ブチルビニルエーテル基などが挙げられる。
 前記二塩基酸無水物基としては、特に制限はなく、例えば、無水マレイン酸基、無水イタコン酸基などが挙げられる。
 前記ビニルエステル基としては、特に制限はなく、例えば、酢酸ビニル基などが挙げられる。
 前記炭化水素アルケニル基としては、特に制限はなく、例えば、ブタジエン基、イソプレン基などが挙げられる。
There is no restriction | limiting in particular as said vinyl ether group, For example, a butyl vinyl ether group etc. are mentioned.
The dibasic acid anhydride group is not particularly limited, and examples thereof include a maleic anhydride group and an itaconic anhydride group.
There is no restriction | limiting in particular as said vinyl ester group, For example, a vinyl acetate group etc. are mentioned.
There is no restriction | limiting in particular as said hydrocarbon alkenyl group, For example, a butadiene group, an isoprene group, etc. are mentioned.
 前記特定樹脂におけるその他の単量体に由来する繰り返し単位の含有率としては、モル組成比が、0モル%~30モル%であることが好ましく、0モル%~20モル%であることがより好ましい。 As the content of the repeating unit derived from the other monomer in the specific resin, the molar composition ratio is preferably 0 mol% to 30 mol%, more preferably 0 mol% to 20 mol%. preferable.
 特定樹脂の具体例としては、例えば、特開2008-146018公報の段落番号[0057]~[0063]に記載される化合物P-1~P-35で表される化合物が挙げられる。 Specific examples of the specific resin include compounds represented by compounds P-1 to P-35 described in paragraph numbers [0057] to [0063] of JP-A-2008-146018.
 前記特定樹脂は、モノマーの(共)重合反応の工程とエチレン性不飽和基を導入する工程の二段階の工程から作られる。 まず、(共)重合反応は種々のモノマーの(共)重合反応によって作られ、特に制限はなく公知のものの中から適宜選択することができる。例えば、重合の活性種については、ラジカル重合、カチオン重合、アニオン重合、配位重合などを適宜選択することができる。これらの中でも合成が容易であり、低コストである点からラジカル重合であることが好ましい。また、重合方法についても特に制限はなく公知のものの中から適宜選択することができる。例えば、バルク重合法、懸濁重合法、乳化重合法、溶液重合法などを適宜選択することができる。これらの中でも、溶液重合法であることがより望ましい。 The specific resin is made from a two-stage process including a monomer (co) polymerization reaction process and an ethylenically unsaturated group introduction process. First, the (co) polymerization reaction is made by a (co) polymerization reaction of various monomers, and is not particularly limited and can be appropriately selected from known ones. For example, radical polymerization, cationic polymerization, anionic polymerization, coordination polymerization and the like can be appropriately selected for the active species of polymerization. Among these, radical polymerization is preferable from the viewpoint of easy synthesis and low cost. Moreover, there is no restriction | limiting in particular also about the polymerization method, It can select suitably from well-known things. For example, a bulk polymerization method, a suspension polymerization method, an emulsion polymerization method, a solution polymerization method and the like can be appropriately selected. Among these, the solution polymerization method is more desirable.
 特定樹脂として好適な前記共重合体の重量平均分子量は、特定樹脂を含有させたことによる硬化膜の強度の向上が得られるという点、及びリソグラフィック・プロセスによるパターン状の硬化膜の作製が容易であるという点から、1万~10万が好ましく、1.2万~6万が更に好ましく、1.5万~4.5万が特に好ましい。 The weight average molecular weight of the copolymer suitable as the specific resin is that the strength of the cured film can be improved by including the specific resin, and that a patterned cured film can be easily produced by a lithographic process. In this respect, it is preferably 10,000 to 100,000, more preferably 12,000 to 60,000, and particularly preferably 15,000 to 45,000.
 特定樹脂として好適なガラス転移温度(Tg)は、40~180℃であることが好ましく、45~140℃であることはより好ましく、50~130℃であることが特に好ましい。ガラス転移温度(Tg)が前記好ましい範囲内であると、良好な絶縁性、透明性、耐水性、耐アルカリ性、耐酸性に優れた絶縁層及びオーバーコート層が得られる。 The glass transition temperature (Tg) suitable as the specific resin is preferably 40 to 180 ° C., more preferably 45 to 140 ° C., and particularly preferably 50 to 130 ° C. When the glass transition temperature (Tg) is within the preferred range, an insulating layer and an overcoat layer excellent in good insulation, transparency, water resistance, alkali resistance and acid resistance can be obtained.
 前記特定樹脂のガラス転移温度(Tg)が40~180℃であり、かつ重量平均分子量が10,000~100,000であることが良好な絶縁性、透明性、耐水性、耐アルカリ性、耐酸性に優れた絶縁層及びオーバーコート層が得られる点で好ましい。
 更に、前記特定樹脂の好ましい例の中でも、分子量、ガラス転移温度(Tg)、及び酸価のいずれもが前記好ましい範囲にある樹脂がより好ましい。
The specific resin has a glass transition temperature (Tg) of 40 to 180 ° C. and a weight average molecular weight of 10,000 to 100,000. Good insulation, transparency, water resistance, alkali resistance, acid resistance It is preferable in that an insulating layer and an overcoat layer excellent in the above can be obtained.
Furthermore, among the preferable examples of the specific resin, a resin in which all of the molecular weight, the glass transition temperature (Tg), and the acid value are in the preferable range is more preferable.
 前記特定樹脂の含有量としては、前記硬化性組成物全固形分に対して、5質量%~70質量%が好ましく、10~50質量%がより好ましい。
 なお、ここで固形分とは、硬化性組成物において溶剤を除いた他の成分の合計量を指す

 本発明に係る硬化性組成物には、特定樹脂の他に、本発明の効果を損なわない限りにおいて、側鎖に酸性基を有する樹脂以外の樹脂(他の樹脂)を含有してもよい。他の樹脂を含有する場合、その含有量は、特定樹脂の含有量100質量部に対して30質量部以下であることが好ましく、効果の観点からは、樹脂として特定樹脂のみを含む態様がより好ましい。
The content of the specific resin is preferably 5% by mass to 70% by mass and more preferably 10% by mass to 50% by mass with respect to the total solid content of the curable composition.
Here, the solid content refers to the total amount of other components excluding the solvent in the curable composition.
In addition to the specific resin, the curable composition according to the present invention may contain a resin (other resin) other than the resin having an acidic group in the side chain, as long as the effects of the present invention are not impaired. When other resins are contained, the content thereof is preferably 30 parts by mass or less with respect to 100 parts by mass of the specific resin, and from the viewpoint of the effect, an embodiment including only the specific resin as the resin is more preferable. preferable.
[(E)着色剤]
 本発明の硬化性組成物は、(E)着色剤として、顔料及び染料のいずれを用いることも可能である。本発明の硬化性組成物を感光性樹脂組成物としてカラーフィルタに用いる場合、高い輝度を持つ組成物を得る目的では、染料を用いることが望ましい。この場合、染料は単独で用いても良く、また、要求される色相に応じて複数の染料を混合しても良い。多くの場合、単一の染料で得られる吸収スペクトルではカラーフィルタに要求される色を得ることは困難であるため、複数の染料を用いることが実際的である。
また、一般的に染料よりも耐熱性が高い顔料を染料と併用することも可能である。特に一部の用途において、染料では要求される特性を満たせない場合は、輝度は低下するものの顔料のみで着色剤を構成することも考えられる。
 着色剤として染料と顔料のいずれを用いる場合であっても、本発明の硬化性組成物中における着色剤の含有量は、該組成物の全固形分に対して、0.5~70質量%であることが好ましく、1~60質量%がより好ましい。顔料の含有量が前記範囲内であると、優れた色特性を確保し、かつ硬化性組成物としての性能を両立するのに有効である。
[(E) Colorant]
In the curable composition of the present invention, any of a pigment and a dye can be used as the colorant (E). When the curable composition of the present invention is used as a photosensitive resin composition in a color filter, it is desirable to use a dye for the purpose of obtaining a composition having high luminance. In this case, the dye may be used alone, or a plurality of dyes may be mixed according to the required hue. In many cases, it is difficult to obtain the color required for the color filter in the absorption spectrum obtained with a single dye, so it is practical to use a plurality of dyes.
In general, a pigment having higher heat resistance than the dye can be used in combination with the dye. In particular, in some applications, if the dye does not satisfy the required characteristics, it may be considered that the colorant is composed of only the pigment, although the luminance is reduced.
Regardless of whether a dye or a pigment is used as the colorant, the content of the colorant in the curable composition of the present invention is 0.5 to 70% by mass relative to the total solid content of the composition. Preferably, 1 to 60% by mass is more preferable. When the content of the pigment is within the above range, it is effective to secure excellent color characteristics and achieve both performance as a curable composition.
 染料としては、Colour Index Numberにて公知のものを含む様々な染料を用いることが可能であるが、特にバルビツール酸アゾ染料、ピリミジンアゾ系染料、ピラゾールアゾ系染料、ピリドンアゾ系染料、キサンテン系染料、トリアリールメタン系染料、ジピロメテン系染料、アザピロメテン系染料、メチン系染料、シアニン系染料、スクアリリウム系染料、フタロシアニン系染料、ポルフィリン系染料、アントラキノン系染料、メロシアニン系、ベンゾピラン系、インジゴ系染料から少なくとも一種が使用されることが好ましい。
 上記のいずれの染料を用いるかは、要求される色相等によって適宜選択すればよい。
As the dye, various dyes including those known from Color Index Number can be used. Particularly, barbituric acid azo dyes, pyrimidine azo dyes, pyrazole azo dyes, pyridone azo dyes, xanthene dyes. , Triarylmethane dyes, dipyrromethene dyes, azapyromethene dyes, methine dyes, cyanine dyes, squarylium dyes, phthalocyanine dyes, porphyrin dyes, anthraquinone dyes, merocyanine dyes, benzopyran dyes, indigo dyes One type is preferably used.
Which of the above dyes is used may be appropriately selected depending on a required hue or the like.
<一般式(I)で表される染料>
 (E)着色剤として、例えば一般式(I)で表される染料を用いることが出来る。
<Dye represented by general formula (I)>
As the colorant (E), for example, a dye represented by the general formula (I) can be used.
Figure JPOXMLDOC01-appb-C000020

 
Figure JPOXMLDOC01-appb-C000020

 
 前記一般式(I)中、R、R、R、R、R、及びRは、各々独立に、水素原子、又は1価の置換基を表し、Rは水素原子、ハロゲン原子、アルキル基、アリール基、又はヘテロ環基を表す。 In the general formula (I), R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 each independently represent a hydrogen atom or a monovalent substituent, R 7 represents a hydrogen atom, A halogen atom, an alkyl group, an aryl group, or a heterocyclic group is represented.
 一般式(I)中、R~Rが表す一価の置換基としては、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子が挙げられる。)、アルキル基(好ましくは炭素数1~48、より好ましくは炭素数1~24の、直鎖、分岐鎖、又は環状のアルキル基であり、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、t-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、2-エチルヘキシル基、ドデシル基、ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、1-ノルボルニル基、1-アダマンチル基が挙げられる。)、アルケニル基(好ましくは炭素数2~48、より好ましくは炭素数2~18のアルケニル基であり、例えば、ビニル基、アリル基、3-ブテン-1-イル基が挙げられる。)、アリール基(好ましくは炭素数6~48、より好ましくは炭素数6~24のアリール基であり、例えば、フェニル基、ナフチル基が挙げられる。)、ヘテロ環基(好ましくは炭素数1~32、より好ましくは炭素数1~18のヘテロ環基であり、例えば、2-チエニル基、4-ピリジル基、2-フリル基、2-ピリミジニル基、1-ピリジル基、2-ベンゾチアゾリル基、1-イミダゾリル基、1-ピラゾリル基、ベンゾトリアゾール-1-イル基が挙げられる。)、 In the general formula (I), examples of the monovalent substituent represented by R 1 to R 6 include a halogen atom (for example, a fluorine atom, a chlorine atom and a bromine atom), an alkyl group (preferably having a carbon number of 1 to 48, more preferably a linear, branched or cyclic alkyl group having 1 to 24 carbon atoms, for example, methyl group, ethyl group, propyl group, isopropyl group, butyl group, t-butyl group, pentyl group Hexyl group, heptyl group, octyl group, 2-ethylhexyl group, dodecyl group, hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group), alkenyl group (preferably). Is an alkenyl group having 2 to 48 carbon atoms, more preferably 2 to 18 carbon atoms, such as a vinyl group, an allyl group, or a 3-buten-1-yl group. An aryl group (preferably an aryl group having 6 to 48 carbon atoms, more preferably an aryl group having 6 to 24 carbon atoms, such as a phenyl group or a naphthyl group), a heterocyclic group (preferably a carbon group). A heterocyclic group having 1 to 32, more preferably 1 to 18 carbon atoms, such as 2-thienyl, 4-pyridyl, 2-furyl, 2-pyrimidinyl, 1-pyridyl, 2-benzothiazolyl Group, 1-imidazolyl group, 1-pyrazolyl group, benzotriazol-1-yl group).
シリル基(好ましくは炭素数3~38、より好ましくは炭素数3~18のシリル基であり、例えば、トリメチルシリル基、トリエチルシリル基、トリブチルシリル基、t-ブチルジメチルシリル基、t-ヘキシルジメチルシリル基が挙げられる)、ヒドロキシル基、シアノ基、ニトロ基、アルコキシ基(好ましくは炭素数1~48、より好ましくは炭素数1~24のアルコキシ基であり、例えば、メトキシ基、エトキシ基、1-ブトキシ基、2-ブトキシ基、イソプロポキシ基、t-ブトキシ基、ドデシルオキシ基が挙げられる。また、シクロアルキルオキシ基であれば、例えば、シクロペンチルオキシ基、シクロヘキシルオキシ基が挙げられる。)、アリールオキシ基(好ましくは炭素数6~48、より好ましくは炭素数6~24のアリールオキシ基であり、例えば、フェノキシ基、1-ナフトキシ基が挙げられる。)、ヘテロ環オキシ基(好ましくは炭素数1~32、より好ましくは炭素数1~18のヘテロ環オキシ基であり、例えば、1-フェニルテトラゾール-5-オキシ基、2-テトラヒドロピラニルオキシ基が挙げられる。)、シリルオキシ基(好ましくは炭素数1~32、より好ましくは炭素数1~18のシリルオキシ基であり、例えば、トリメチルシリルオキシ基、t-ブチルジメチルシリルオキシ基、ジフェニルメチルシリルオキシ基が挙げられる。)、アシルオキシ基(好ましくは炭素数2~48、より好ましくは炭素数2~24のアシルオキシ基であり、例えば、アセトキシ基、ピバロイルオキシ基、ベンゾイルオキシ基、ドデカノイルオキシ基が挙げられる。)、アルコキシカルボニルオキシ基(好ましくは炭素数2~48、より好ましくは炭素数2~24のアルコキシカルボニルオキシ基であり、例えば、エトキシカルボニルオキシ基、t-ブトキシカルボニルオキシ基、また、シクロアルキルオキシカルボニルオキシ基であれば、例えば、シクロヘキシルオキシカルボニルオキシ基が挙げられる。)、アリールオキシカルボニルオキシ基(好ましくは炭素数7~32、より好ましくは炭素数7~24のアリールオキシカルボニルオキシ基であり、例えば、フェノキシカルボニルオキシ基が挙げられる。)、 Silyl group (preferably a silyl group having 3 to 38 carbon atoms, more preferably 3 to 18 carbon atoms, such as trimethylsilyl group, triethylsilyl group, tributylsilyl group, t-butyldimethylsilyl group, t-hexyldimethylsilyl group) A hydroxyl group, a cyano group, a nitro group, an alkoxy group (preferably an alkoxy group having 1 to 48 carbon atoms, more preferably an alkoxy group having 1 to 24 carbon atoms, such as a methoxy group, an ethoxy group, 1- A butoxy group, a 2-butoxy group, an isopropoxy group, a t-butoxy group, a dodecyloxy group, and a cycloalkyloxy group such as a cyclopentyloxy group and a cyclohexyloxy group), an aryl An oxy group (preferably an aryl having 6 to 48 carbon atoms, more preferably 6 to 24 carbon atoms) An oxy group, for example, a phenoxy group and a 1-naphthoxy group), a heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 32 carbon atoms, more preferably 1 to 18 carbon atoms, 1-phenyltetrazol-5-oxy group, 2-tetrahydropyranyloxy group), silyloxy group (preferably a silyloxy group having 1 to 32 carbon atoms, more preferably 1 to 18 carbon atoms, , Trimethylsilyloxy group, t-butyldimethylsilyloxy group, diphenylmethylsilyloxy group), acyloxy group (preferably an acyloxy group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, , Acetoxy group, pivaloyloxy group, benzoyloxy group, dodecanoyloxy group ), An alkoxycarbonyloxy group (preferably an alkoxycarbonyloxy group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, such as an ethoxycarbonyloxy group, a t-butoxycarbonyloxy group, and a cycloalkyl group) Examples of the oxycarbonyloxy group include a cyclohexyloxycarbonyloxy group), an aryloxycarbonyloxy group (preferably an aryloxycarbonyloxy group having 7 to 32 carbon atoms, more preferably 7 to 24 carbon atoms). For example, a phenoxycarbonyloxy group).
カルバモイルオキシ基(好ましくは炭素数1~48、よりこの好ましくは炭素数1~24のカルバモイルオキシ基であり、例えば、N,N-ジメチルカルバモイルオキシ基、N-ブチルカルバモイルオキシ基、N-フェニルカルバモイルオキシ基、N-エチル-N-フェニルカルバモイルオキシ基が挙げられる。)、スルファモイルオキシ基(好ましくは炭素数1~32、より好ましくは炭素数1~24のスルファモイルオキシ基であり、例えば、N,N-ジエチルスルファモイルオキシ基、N-プロピルスルファモイルオキシ基が挙げられる。)、アルキルスルホニルオキシ基(好ましくは炭素数1~38、より好ましくは炭素数1~24のアルキルスルホニルオキシ基であり、例えば、メチルスルホニルオキシ基、ヘキサデシルスルホニルオキシ基、シクロヘキシルスルホニルオキシ基が挙げられる。)、アリールスルホニルオキシ基(好ましくは炭素数6~32、より好ましくは炭素数6~24のアリールスルホニルオキシ基であり、例えば、フェニルスルホニルオキシ基が挙げられる。)、アシル基(好ましくは炭素数1~48、より好ましくは炭素数1~24のアシル基であり、例えば、ホルミル基、アセチル基、ピバロイル基、ベンゾイル基、テトラデカノイル基、シクロヘキサノイル基が挙げられる。)、 A carbamoyloxy group (preferably a carbamoyloxy group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as N, N-dimethylcarbamoyloxy group, N-butylcarbamoyloxy group, N-phenylcarbamoyl group) An oxy group, an N-ethyl-N-phenylcarbamoyloxy group), a sulfamoyloxy group (preferably a sulfamoyloxy group having 1 to 32 carbon atoms, more preferably 1 to 24 carbon atoms, Examples thereof include N, N-diethylsulfamoyloxy group and N-propylsulfamoyloxy group), alkylsulfonyloxy group (preferably alkyl having 1 to 38 carbon atoms, more preferably 1 to 24 carbon atoms). A sulfonyloxy group, for example, a methylsulfonyloxy group, hexadecylsulfonyl An oxy group, a cyclohexylsulfonyloxy group), an arylsulfonyloxy group (preferably an arylsulfonyloxy group having 6 to 32 carbon atoms, more preferably 6 to 24 carbon atoms, such as a phenylsulfonyloxy group). An acyl group (preferably an acyl group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as formyl group, acetyl group, pivaloyl group, benzoyl group, tetradecanoyl group, cyclohexa Noyl group).
アルコキシカルボニル基(好ましくは炭素数2~48、より好ましくは炭素数2~24のアルコキシカルボニル基であり、例えば、メトキシカルボニル基、エトキシカルボニル基、オクタデシルオキシカルボニル基、シクロヘキシルオキシカルボニル基、2,6-ジ-tert-ブチル-4-メチルシクロヘキシルオキシカルボニル基が挙げられる。)、アリールオキシカルボニル基(好ましくは炭素数7~32、より好ましくは炭素数7~24のアリールオキシカルボニル基であり、例えば、フェノキシカルボニル基が挙げられる。)、カルバモイル基(好ましくは炭素数1~48、より好ましくは炭素数1~24のカルバモイル基であり、例えば、カルバモイル基、N,N-ジエチルカルバモイル基、N-エチル-N-オクチルカルバモイル基、N,N-ジブチルカルバモイル基、N-プロピルカルバモイル基、N-フェニルカルバモイル基、N-メチルN-フェニルカルバモイル基、N,N-ジシクロへキシルカルバモイル基が挙げられる。)、アミノ基(好ましくは炭素数32以下、より好ましくは炭素数24以下のアミノ基であり、例えば、アミノ基、メチルアミノ基、N,N-ジブチルアミノ基、テトラデシルアミノ基、2-エチルへキシルアミノ基、シクロヘキシルアミノ基が挙げられる。)、アニリノ基(好ましくは炭素数6~32、より好ましくは6~24のアニリノ基であり、例えば、アニリノ基、N-メチルアニリノ基が挙げられる。)、ヘテロ環アミノ基(好ましくは炭素数1~32、より好ましくは1~18のヘテロ環アミノ基であり、例えば、4-ピリジルアミノ基が挙げられる。)、カルボンアミド基(好ましくは炭素数2~48、より好ましくは2~24のカルボンアミド基であり、例えば、アセトアミド基、ベンズアミド基、テトラデカンアミド基、ピバロイルアミド基、シクロヘキサンアミド基が挙げられる。)、 An alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, an octadecyloxycarbonyl group, a cyclohexyloxycarbonyl group, 2, 6 -Di-tert-butyl-4-methylcyclohexyloxycarbonyl group), an aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 32 carbon atoms, more preferably 7 to 24 carbon atoms, ), A carbamoyl group (preferably a carbamoyl group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as a carbamoyl group, N, N-diethylcarbamoyl group, N- Ethyl-N-octylcarbamo , N, N-dibutylcarbamoyl group, N-propylcarbamoyl group, N-phenylcarbamoyl group, N-methylN-phenylcarbamoyl group, N, N-dicyclohexylcarbamoyl group), amino group ( Preferred is an amino group having 32 or less carbon atoms, more preferably 24 or less carbon atoms. For example, an amino group, a methylamino group, an N, N-dibutylamino group, a tetradecylamino group, a 2-ethylhexylamino group, a cyclohexyl group. Anilino group (preferably an anilino group having 6 to 32 carbon atoms, more preferably 6 to 24 carbon atoms, such as an anilino group and an N-methylanilino group), a heterocyclic amino group (Preferably a heterocyclic amino group having 1 to 32 carbon atoms, more preferably 1 to 18 carbon atoms. And a carbonamido group (preferably a carbonamido group having 2 to 48 carbon atoms, more preferably 2 to 24 carbon atoms, such as an acetamido group, a benzamido group, a tetradecanamido group, a pivaloylamido group, a cyclohexaneamido). Group).
ウレイド基(好ましくは炭素数1~32、より好ましくは炭素数1~24のウレイド基であり、例えば、ウレイド基、N,N-ジメチルウレイド基、N-フェニルウレイド基が挙げられる。)、イミド基(好ましくは炭素数36以下、より好ましくは炭素数24以下のイミド基であり、例えば、N-スクシンイミド基、N-フタルイミド基が挙げられる。)、アルコキシカルボニルアミノ基(好ましくは炭素数2~48、より好ましくは炭素数2~24のアルコキシカルボニルアミノ基であり、例えば、メトキシカルボニルアミノ基、エトキシカルボニルアミノ基、t-ブトキシカルボニルアミノ基、オクタデシルオキシカルボニルアミノ基、シクロヘキシルオキシカルボニルアミノ基が挙げられる。)、アリールオキシカルボニルアミノ基(好ましくは炭素数7~32、より好ましくは炭素数7~24のアリールオキシカルボニルアミノ基であり、例えば、フェノキシカルボニルアミノ基が挙げられる。)、スルホンアミド基(好ましくは炭素数1~48、より好ましくは炭素数1~24のスルホンアミド基であり、例えば、メタンスルホンアミド基、ブタンスルホンアミド基、ベンゼンスルホンアミド基、ヘキサデカンスルホンアミド基、シクロヘキサンスルホンアミド基が挙げられる。)、スルファモイルアミノ基(好ましくは炭素数1~48、より好ましくは炭素数1~24のスルファモイルアミノ基であり、例えば、N、N-ジプロピルスルファモイルアミノ基、N-エチル-N-ドデシルスルファモイルアミノ基が挙げられる。)、アゾ基(好ましくは炭素数1~32、より好ましくは炭素数1~24のアゾ基であり、例えば、フェニルアゾ基、3-ピラゾリルアゾ基が挙げられる。)、アルキルチオ基(好ましくは炭素数1~48、より好ましくは炭素数1~24のアルキルチオ基であり、例えば、メチルチオ基、エチルチオ基、オクチルチオ基、シクロヘキシルチオ基が挙げられる。)、アリールチオ基(好ましくは炭素数6~48、より好ましくは炭素数6~24のアリールチオ基であり、例えば、フェニルチオ基が挙げられる。)、ヘテロ環チオ基(好ましくは炭素数1~32、より好ましくは炭素数1~18のヘテロ環チオ基であり、例えば、2-ベンゾチアゾリルチオ基、2-ピリジルチオ基、1-フェニルテトラゾリルチオ基が挙げられる。)、 Ureido group (preferably a ureido group having 1 to 32 carbon atoms, more preferably 1 to 24 carbon atoms, and examples thereof include ureido group, N, N-dimethylureido group and N-phenylureido group), imide. A group (preferably an imide group having 36 or less carbon atoms, more preferably 24 or less carbon atoms, such as N-succinimide group and N-phthalimide group), an alkoxycarbonylamino group (preferably having 2 to 48, more preferably an alkoxycarbonylamino group having 2 to 24 carbon atoms, and examples thereof include a methoxycarbonylamino group, an ethoxycarbonylamino group, a t-butoxycarbonylamino group, an octadecyloxycarbonylamino group, and a cyclohexyloxycarbonylamino group. Aryloxycarbonylamino group An aryloxycarbonylamino group having 7 to 32 carbon atoms, more preferably 7 to 24 carbon atoms is preferable, and examples thereof include a phenoxycarbonylamino group. A sulfonamide group (preferably having 1 to 48 carbon atoms, more Preferred is a sulfonamide group having 1 to 24 carbon atoms, and examples thereof include a methanesulfonamide group, a butanesulfonamide group, a benzenesulfonamide group, a hexadecanesulfonamide group, and a cyclohexanesulfonamide group.), Sulfamoylamino A group (preferably a sulfamoylamino group having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms, such as N, N-dipropylsulfamoylamino group, N-ethyl-N-dodecylsulfamoyl group). An amino group), an azo group (preferably having 1 to 32 carbon atoms). An azo group having 1 to 24 carbon atoms is more preferable, and examples thereof include a phenylazo group and a 3-pyrazolylazo group), an alkylthio group (preferably having 1 to 48 carbon atoms, more preferably 1 to 24 carbon atoms). An alkylthio group, for example, a methylthio group, an ethylthio group, an octylthio group, a cyclohexylthio group), an arylthio group (preferably an arylthio group having 6 to 48 carbon atoms, more preferably 6 to 24 carbon atoms, For example, a phenylthio group), a heterocyclic thio group (preferably a heterocyclic thio group having 1 to 32 carbon atoms, more preferably 1 to 18 carbon atoms, such as a 2-benzothiazolylthio group, 2 -Pyridylthio group, 1-phenyltetrazolylthio group).
アルキルスルフィニル基(好ましくは炭素数1~32、より好ましくは炭素数1~24のアルキルスルフィニル基であり、例えば、ドデカンスルフィニル基が挙げられる。)、アリールスルフィニル基(好ましくは炭素数6~32、より好ましくは炭素数6~24のアリールスルフィニル基であり、例えば、フェニルスルフィニル基が挙げられる。)、アルキルスルホニル基(好ましくは炭素数1~48、より好ましくは炭素数1~24のアルキルスルホニル基であり、例えば、メチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、ブチルスルホニル基、イソプロピルスルホニル基、2-エチルヘキシルスルホニル基、ヘキサデシルスルホニル基、オクチルスルホニル基、シクロヘキシルスルホニル基が挙げられる。)、アリールスルホニル基(好ましくは炭素数6~48、より好ましくは炭素数6~24のアリールスルホニル基であり、例えば、フェニルスルホニル基、1-ナフチルスルホニル基が挙げられる。)、スルファモイル基(好ましくは炭素数32以下、より好ましくは炭素数24以下のスルファモイル基であり、例えば、スルファモイル基、N,N-ジプロピルスルファモイル基、N-エチル-N-ドデシルスルファモイル基、N-エチル-N-フェニルスルファモイル基、N-シクロヘキシルスルファモイル基が挙げられる。)、スルホ基、ホスホニル基(好ましくは炭素数1~32、より好ましくは炭素数1~24のホスホニル基であり、例えば、フェノキシホスホニル基、オクチルオキシホスホニル基、フェニルホスホニル基が挙げられる。)、ホスフィノイルアミノ基(好ましくは炭素数1~32、より好ましくは炭素数1~24のホスフィノイルアミノ基であり、例えば、ジエトキシホスフィノイルアミノ基、ジオクチルオキシホスフィノイルアミノ基が挙げられる。)を表す。 An alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 32 carbon atoms, more preferably an alkylsulfinyl group having 1 to 24 carbon atoms, such as a dodecanesulfinyl group), an arylsulfinyl group (preferably having 6 to 32 carbon atoms, More preferably, it is an arylsulfinyl group having 6 to 24 carbon atoms, such as a phenylsulfinyl group, and an alkylsulfonyl group (preferably having 1 to 48 carbon atoms, more preferably an alkylsulfonyl group having 1 to 24 carbon atoms). And examples thereof include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, a butylsulfonyl group, an isopropylsulfonyl group, a 2-ethylhexylsulfonyl group, a hexadecylsulfonyl group, an octylsulfonyl group, and a cyclohexylsulfonyl group. A rusulfonyl group (preferably an arylsulfonyl group having 6 to 48 carbon atoms, more preferably an arylsulfonyl group having 6 to 24 carbon atoms, such as a phenylsulfonyl group and a 1-naphthylsulfonyl group), a sulfamoyl group (preferably a carbon Sulfamoyl group having 32 or less, more preferably 24 or less carbon atoms, such as sulfamoyl group, N, N-dipropylsulfamoyl group, N-ethyl-N-dodecylsulfamoyl group, N-ethyl-N— Phenylsulfamoyl group, N-cyclohexylsulfamoyl group), sulfo group, phosphonyl group (preferably a phosphonyl group having 1 to 32 carbon atoms, more preferably 1 to 24 carbon atoms, such as phenoxy (A phosphonyl group, an octyloxy phosphonyl group, and a phenyl phosphonyl group are mentioned.) Phosphinoylamino group (preferably phosphinoylamino group having 1 to 32 carbon atoms, more preferably 1 to 24 carbon atoms, such as diethoxyphosphinoylamino group and dioctyloxyphosphinoylamino group) Represents.).
 上述した1価の置換基が更に置換可能な基である場合には、上述した各基のいずれかによって更に置換されていてもよい。なお、2個以上の置換基を有している場合には、それらの置換基は同一であっても異なっていてもよい。 In the case where the monovalent substituent described above is a further substitutable group, it may be further substituted with any of the groups described above. In addition, when it has two or more substituents, those substituents may be the same or different.
 一般式(I)において、RとR、RとR、RとR、及びRとRは、各々独立に、互いに結合して5員、6員、又は7員の環を形成していてもよい。なお、形成される環としては、飽和環、又は不飽和環のいずれであってもよい。この5員、6員、又は7員の飽和環、又は不飽和環としては、例えば、ピロール環、フラン環、チオフェン環、ピラゾール環、イミダゾール環、トリアゾール環、オキサゾール環、チアゾール環、ピロリジン環、ピペリジン環、シクロペンテン環、シクロヘキセン環、ベンゼン環、ピリジン環、ピラジン環、ピリダジン環が挙げられ、好ましくは、ベンゼン環、ピリジン環が挙げられる。 In the general formula (I), R 1 and R 2 , R 2 and R 3 , R 4 and R 5 , and R 5 and R 6 are each independently bonded to each other to form 5, 6 or 7 members. The ring may be formed. In addition, as a ring formed, either a saturated ring or an unsaturated ring may be sufficient. Examples of the 5-membered, 6-membered, or 7-membered saturated ring or unsaturated ring include a pyrrole ring, a furan ring, a thiophene ring, a pyrazole ring, an imidazole ring, a triazole ring, an oxazole ring, a thiazole ring, a pyrrolidine ring, Examples include a piperidine ring, a cyclopentene ring, a cyclohexene ring, a benzene ring, a pyridine ring, a pyrazine ring and a pyridazine ring, and preferably a benzene ring and a pyridine ring.
 なお、形成される5員、6員、及び7員の環が、更に置換可能な基である場合には、前記一般式(I)における1価の置換基として例示した基のいずれかで置換されていてもよく、2個以上の置換基で置換されている場合には、それらの置換基は同一であっても異なっていてもよい。
 なお、RとRとは、環を形成しないことが好ましい。
 また、一般式(I)において、Rがハロゲン原子、アルキル基、アリール基、又はヘテロ環基である場合、これらの好ましい範囲は、前述のR~Rとしてのハロゲン原子、アルキル基、アリール基、又はヘテロ環基の好ましい範囲と同様である。
In addition, when the formed 5-membered, 6-membered and 7-membered rings are further substitutable groups, they are substituted with any of the groups exemplified as the monovalent substituent in the general formula (I). When it is substituted with two or more substituents, these substituents may be the same or different.
R 1 and R 6 preferably do not form a ring.
In the general formula (I), when R 7 is a halogen atom, an alkyl group, an aryl group, or a heterocyclic group, these preferred ranges are the halogen atom, alkyl group, R 1 to R 6 described above, This is the same as the preferred range of the aryl group or heterocyclic group.
  次に、金属錯体化合物を形成する金属原子又は金属化合物について説明する。
 金属又は金属化合物としては、錯体を形成可能な金属原子又は金属化合物であればいずれであってもよく、2価の金属原子、2価の金属酸化物、2価の金属水酸化物、又は2価の金属塩化物が含まれる。例えば、Zn、Mg、Si、Sn、Rh、Pt、Pd、Mo、Mn、Pb、Cu、Ni、Co、Fe、B等の他に、AlCl、InCl、FeCl、TiCl、SnCl、SiCl、GeClなどの金属塩化物、TiO、VO等の金属酸化物、Si(OH)等の金属水酸化物も含まれる。
 これらの中でも、錯体の安定性、分光特性、耐熱、耐光性、及び製造適性等の観点から、Fe、Zn、Mg、Si、Pt、Pd、Mo、Mn、Cu、Ni、Co、TiO、B、又はVOが好ましく、Fe、Zn、Mg、Si、Pt、Pd、Cu、Ni、Co、B、又はVOが更に好ましく、Fe、Zn、Cu、Co、B、又はVOが最も好ましい。これらの中でも、特にZnが好ましい。
Next, the metal atom or metal compound that forms the metal complex compound will be described.
The metal or metal compound may be any metal atom or metal compound capable of forming a complex, and may be any divalent metal atom, divalent metal oxide, divalent metal hydroxide, or 2 Valent metal chlorides are included. For example, in addition to Zn, Mg, Si, Sn, Rh, Pt, Pd, Mo, Mn, Pb, Cu, Ni, Co, Fe, B, etc., AlCl, InCl, FeCl, TiCl 2 , SnCl 2 , SiCl 2 Further, metal chlorides such as GeCl 2 , metal oxides such as TiO and VO, and metal hydroxides such as Si (OH) 2 are also included.
Among these, Fe, Zn, Mg, Si, Pt, Pd, Mo, Mn, Cu, Ni, Co, TiO, B from the viewpoints of stability, spectral characteristics, heat resistance, light resistance, and production suitability of the complex Or VO is preferable, Fe, Zn, Mg, Si, Pt, Pd, Cu, Ni, Co, B, or VO is more preferable, and Fe, Zn, Cu, Co, B, or VO is most preferable. Among these, Zn is particularly preferable.
 前記一般式(I)で表される構造が金属原子又は金属化合物に配位した金属錯体化合物において、好ましい態様を以下に示す。
 すなわち、前記一般式(I)において、R及びRが、各々独立に、水素原子、アルキル基、アルケニル基、アリール基、ヘテロ環基、シアノ基、アシル基、アルコキシカルボニル基、カルバモイル基、アミノ基、ヘテロ環アミノ基、カルボンアミド基、ウレイド基、イミド基、アルコキシカルボニルアミノ基、アリールオキシカルボニルアミノ基、スルホンアミド基、アゾ基、アルキルスルホニル基、アリールスルホニル基、又はホスフィノイルアミノ基を表し、R及びRが、各々独立に、アルキル基、アルケニル基、アリール基、ヘテロ環基、シアノ基、ニトロ基、アシル基、アルコキシカルボニル基、アリールオキシカルボニル基、カルバモイル基、イミド基、アルキルスルホニル基、アリールスルホニル基、又はスルファモイル基を表し、R及びRが、各々独立に、水素原子、アルキル基、アルケニル基、アリール基、ヘテロ環基、シアノ基、アシル基、アルコキシカルボニル基、カルバモイル基、カルボンアミド基、ウレイド基、イミド基、アルコキシカルボニルアミノ基、スルホンアミド基、アルキルチオ基、アリールチオ基、ヘテロ環チオ基、アルキルスルホニル基、アリールスルホニル基、又はスルファモイル基を表し、Rが、水素原子、ハロゲン原子、アルキル基、アリール基、又はヘテロ環基を表し、金属原子又は金属化合物が、Zn、Mg、Si、Pt、Pd、Cu、Ni、Co、B又はVOである態様が挙げられる。
In the metal complex compound in which the structure represented by the general formula (I) is coordinated to a metal atom or a metal compound, preferred embodiments are shown below.
That is, in the general formula (I), R 1 and R 6 are each independently a hydrogen atom, alkyl group, alkenyl group, aryl group, heterocyclic group, cyano group, acyl group, alkoxycarbonyl group, carbamoyl group, Amino group, heterocyclic amino group, carbonamido group, ureido group, imide group, alkoxycarbonylamino group, aryloxycarbonylamino group, sulfonamido group, azo group, alkylsulfonyl group, arylsulfonyl group, or phosphinoylamino group R 2 and R 5 are each independently an alkyl group, alkenyl group, aryl group, heterocyclic group, cyano group, nitro group, acyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, imide group , Alkylsulfonyl group, arylsulfonyl group, or sulfamo And R 3 and R 4 are each independently a hydrogen atom, alkyl group, alkenyl group, aryl group, heterocyclic group, cyano group, acyl group, alkoxycarbonyl group, carbamoyl group, carbonamido group, ureido Represents a group, an imide group, an alkoxycarbonylamino group, a sulfonamido group, an alkylthio group, an arylthio group, a heterocyclic thio group, an alkylsulfonyl group, an arylsulfonyl group, or a sulfamoyl group, and R 7 represents a hydrogen atom, a halogen atom, an alkyl A group, an aryl group, or a heterocyclic group, in which the metal atom or metal compound is Zn, Mg, Si, Pt, Pd, Cu, Ni, Co, B, or VO.
<一般式(II)で表される染料>
 (E)着色剤として、例えば一般式(II)で表される染料を用いることが出来る。
<Dye represented by formula (II)>
(E) As a coloring agent, the dye represented, for example by general formula (II) can be used.
Figure JPOXMLDOC01-appb-C000021

 
Figure JPOXMLDOC01-appb-C000021

 
 前記一般式(II)中、R、R、R、R、R及びRは、それぞれ独立に、水素原子または一価の置換基を表す。
 上記R~Rが一価の置換基を表す場合の一価の置換基としては、前記一般式(I)におけるR~Rで例示した一価の置換基が挙げられ、好ましい例も同様である。
 なお、RとR、RとR、RとR、及びRとRの少なくとも1組は、それぞれ互いに結合して5員、6員、または7員の飽和環、または不飽和環を形成していてもよい。形成される5員、6員、及び7員の環が、更に置換可能な基である場合には、前記一般式(I)におけるR~Rで説明した置換基でさらに置換されていてもよく、2個以上の置換基で置換されている場合には、それらの置換基は同一であっても異なっていてもよい。
In the general formula (II), R 1 , R 2 , R 3 , R 4 , R 5 and R 6 each independently represent a hydrogen atom or a monovalent substituent.
Examples of the monovalent substituent when R 1 to R 6 represent a monovalent substituent include the monovalent substituents exemplified for R 1 to R 6 in the general formula (I). Is the same.
Note that at least one pair of R 1 and R 2 , R 2 and R 3 , R 4 and R 5 , and R 5 and R 6 is bonded to each other to form a 5-membered, 6-membered, or 7-membered saturated ring, Alternatively, an unsaturated ring may be formed. When the formed 5-membered, 6-membered, and 7-membered rings are further substitutable groups, they are further substituted with the substituents described for R 1 to R 6 in the general formula (I). In the case where it is substituted with two or more substituents, these substituents may be the same or different.
 一般式(II)で表される化合物が金属錯体を形成する場合、その金属は、好ましくは、Zn、Mg、Sc、Fe、Al、Cr、Si、Pt、Pd、Mo、Mn、Cu、Ni、Co、TiO、またはVOであり、より好ましくは、Zn、Mg、Sc、Fe、Al、Mn、Cu、Ni、Co、TiO、またはVOであり、特に好ましくは、Zn、CuまたはCoである。 When the compound represented by the general formula (II) forms a metal complex, the metal is preferably Zn, Mg, Sc, Fe, Al, Cr, Si, Pt, Pd, Mo, Mn, Cu, Ni , Co, TiO, or VO, more preferably Zn, Mg, Sc, Fe, Al, Mn, Cu, Ni, Co, TiO, or VO, and particularly preferably Zn, Cu, or Co. .
<一般式(III)で表される染料>
 (E)着色剤として、例えば一般式(III)で表される染料を用いることが出来る。
<Dye represented by general formula (III)>
(E) As the colorant, for example, a dye represented by the general formula (III) can be used.
Figure JPOXMLDOC01-appb-C000022

 
Figure JPOXMLDOC01-appb-C000022

 
 前記一般式(III)において、R、R、R10、及びR11は、各々独立に、水素原子、炭素数1~10の飽和炭化水素基、又は炭素数6~10の芳香族炭化水素基を表す。
前記炭素数1~10の飽和炭化水素基としては、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、ペンチル、イソペンチル、ネオペンチル、シクロペンチル、ヘキシル、シクロヘキシル、ヘプチル、シクロヘプチル、オクチル、2-エチルヘキシル、シクロオクチル、ノニル、デカニル、トリシクロデカニル、メトキシプロピル、エトキシプロピル、ヘキシロキシプロピル、2-エチルヘキシロキシプロピル、メトキシヘキシル、エトキシプロピル等の基が挙げられる。中でも、好ましくは炭素数1~9のアルキル基であり、より好ましくは炭素数1~8のアルキル基である。
In the general formula (III), R 8 , R 9 , R 10 , and R 11 are each independently a hydrogen atom, a saturated hydrocarbon group having 1 to 10 carbon atoms, or an aromatic carbon atom having 6 to 10 carbon atoms. Represents a hydrogen group.
Examples of the saturated hydrocarbon group having 1 to 10 carbon atoms include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neopentyl, cyclopentyl, hexyl, cyclohexyl, heptyl, cycloheptyl, octyl, 2-ethylhexyl. , Cyclooctyl, nonyl, decanyl, tricyclodecanyl, methoxypropyl, ethoxypropyl, hexyloxypropyl, 2-ethylhexyloxypropyl, methoxyhexyl, ethoxypropyl, and the like. Among them, preferred is an alkyl group having 1 to 9 carbon atoms, and more preferred is an alkyl group having 1 to 8 carbon atoms.
 前記炭素数6~10の芳香族炭化水素基としては、例えば、フェニル、ナフチル等の基が挙げられる。炭素数6~10の芳香族炭化水素基は、ハロゲン原子、炭素数1~10の飽和炭化水素基、-OH、-OR、-SO 、-SOH、-SOM、-COH、-CO13、-SO13、-SONHR14、又は-SONR1415で置換されていてもよい。R及びR13は、炭素数1~10の飽和炭化水素基を表し、前記R~R11における「炭素数1~10の飽和炭化水素基」と同義であり、好ましい態様も同様である。R14、R15、及びMの詳細については、後述する。 Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms include groups such as phenyl and naphthyl. The aromatic hydrocarbon group having 6 to 10 carbon atoms includes a halogen atom, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OH, —OR, —SO 3 , —SO 3 H, —SO 3 M, —CO It may be substituted with 2 H, —CO 2 R 13 , —SO 3 R 13 , —SO 2 NHR 14 , or —SO 2 NR 14 R 15 . R and R 13 each represent a saturated hydrocarbon group having 1 to 10 carbon atoms, and have the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in R 8 to R 11 , and the preferred embodiments are also the same. Details of R 14 , R 15 , and M will be described later.
 前記ハロゲン原子としては、例えば、フッ素、塩素、臭素等が挙げられる。
 前記「-SO13」としては、例えば、メタンスルホニル、エタンスルホニル、ヘキサンスルホニル、デカンスルホニル等が挙げられる。
 前記「-CO13」としては、例えば、メチルオキシカルボニル、エチルオキシカルボニル、プロピルオキシカルボニル、イソプロピルオキシカルボニル、ブチルオキシカルボニル、イソブチルオキシカルボニル、ペンチルオキシカルボニル、イソペンチルオキシカルボニル、ネオペンチルオキシカルボニル、シクロペンチルオキシカルボニル、ヘキシルオキシカルボニル、シクロヘキシルオキシカルボニル、ヘプチルオキシカルボニル、シクロヘプチルオキシカルボニル、オクチルオキシカルボニル、2-エチルヘキシルオキシカルボニル、シクロオクチルオキシカルボニル、ノニルオキシカルボニル、デカニルオキシカルボニル、トリシクロデカニルオキシカルボニル、メトキシプロピルオキシカルボニル、エトキシプロピルオキシカルボニル、ヘキシロキシプロピルオキシカルボニル、2-エチルヘキシロキシプロピルオキシカルボニル、メトキシヘキシルオキシカルボニル等が挙げられる。
Examples of the halogen atom include fluorine, chlorine, bromine and the like.
Examples of the “—SO 3 R 13 ” include methanesulfonyl, ethanesulfonyl, hexanesulfonyl, decanesulfonyl and the like.
Examples of the “—CO 2 R 13 ” include methyloxycarbonyl, ethyloxycarbonyl, propyloxycarbonyl, isopropyloxycarbonyl, butyloxycarbonyl, isobutyloxycarbonyl, pentyloxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl. , Cyclopentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxycarbonyl, heptyloxycarbonyl, cycloheptyloxycarbonyl, octyloxycarbonyl, 2-ethylhexyloxycarbonyl, cyclooctyloxycarbonyl, nonyloxycarbonyl, decanyloxycarbonyl, tricyclodecanyl Oxycarbonyl, methoxypropyloxycarbonyl, ethoxypropyloxy Examples include cicarbonyl, hexyloxypropyloxycarbonyl, 2-ethylhexyloxypropyloxycarbonyl, methoxyhexyloxycarbonyl and the like.
 R14及びR15は、各々独立に、水素原子、炭素数1~10の直鎖又は分岐のアルキル基、炭素数3~30のシクロアルキル基、炭素数6~10の芳香族炭化水素基、又は炭素数5~10の芳香族複素環基を表し、R14とR15とは互いに結合して炭素数1~10の複素環を形成してもよい。また、R14及びR15で表される前記芳香族炭化水素基及び前記芳香族複素環基は、-OH、炭素数1~10の飽和炭化水素基、-OR、-NO、-CH=CH、-CH=CHR、又はハロゲン原子で置換されていてもよい。Rは、炭素数1~10の飽和炭化水素基を表す。炭素数1~10の飽和炭化水素基は、前記R~R11における「炭素数1~10の飽和炭化水素基」と同義であり、好ましい態様も同様である。 R 14 and R 15 are each independently a hydrogen atom, a linear or branched alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 10 carbon atoms, Alternatively, it represents an aromatic heterocyclic group having 5 to 10 carbon atoms, and R 14 and R 15 may be bonded to each other to form a heterocyclic ring having 1 to 10 carbon atoms. In addition, the aromatic hydrocarbon group and the aromatic heterocyclic group represented by R 14 and R 15 are —OH, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OR, —NO 2 , —CH═ It may be substituted with CH 2 , —CH═CHR, or a halogen atom. R represents a saturated hydrocarbon group having 1 to 10 carbon atoms. The saturated hydrocarbon group having 1 to 10 carbon atoms has the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in the above R 8 to R 11 , and the preferred embodiment is also the same.
 R14、R15で表される炭素数1~10の直鎖又は分岐のアルキル基は、無置換でも置換基を有してもよく、例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、ペンチル、イソペンチル、ヘキシル、2-エチルヘキシル、1,5-ジメチルヘキシル、オクチル等の基が挙げられる。中でも、炭素数1~8の直鎖又は分岐のアルキル基が好ましい。 The linear or branched alkyl group having 1 to 10 carbon atoms represented by R 14 and R 15 may be unsubstituted or substituted, and examples thereof include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, Examples include pentyl, isopentyl, hexyl, 2-ethylhexyl, 1,5-dimethylhexyl, octyl and the like. Of these, a linear or branched alkyl group having 1 to 8 carbon atoms is preferable.
 R14、R15で表される炭素数3~30のシクロアルキル基は、無置換でも置換基を有してもよく、例えば、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル、トリシクロデシル等の基が挙げられる。中でも、炭素数3~15のシクロアルキル基が好ましい。 The cycloalkyl group having 3 to 30 carbon atoms represented by R 14 and R 15 may be unsubstituted or substituted, and examples thereof include groups such as cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, and tricyclodecyl. Is mentioned. Of these, a cycloalkyl group having 3 to 15 carbon atoms is preferable.
 R14、R15で表される炭素数6~10の芳香族炭化水素基は、例えば、フェニル、ナフチル等の基が挙げられる。 Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms represented by R 14 and R 15 include groups such as phenyl and naphthyl.
 R14、R15で表される炭素数5~10の芳香族複素環基は、複素原子として酸素原子、窒素原子等を有する芳香族複素環基が挙げられ、例えば、ピロール環基、ピラジン環、ピリジン環基、チアジン環基、トリアジン環基、ピラン環基、フラン環基、モルホリン環基、等が挙げられる。 Examples of the aromatic heterocyclic group having 5 to 10 carbon atoms represented by R 14 and R 15 include aromatic heterocyclic groups having an oxygen atom, a nitrogen atom or the like as a hetero atom, such as a pyrrole ring group and a pyrazine ring. Pyridine ring group, thiazine ring group, triazine ring group, pyran ring group, furan ring group, morpholine ring group, and the like.
 前記炭素数1~10の直鎖又は分岐のアルキル基、及び前記炭素数3~30のシクロアルキル基は、置換されていてもよい。これらが置換されている場合の置換基としては、例えば、水酸基、ハロゲン原子、炭素数6~10の芳香族炭化水素基、炭素数5~10の芳香族複素環基、-CH=CH、又は-CH=CHR(R:炭素数1~10の飽和炭化水素基)が挙げられる。前記シクロアルキル基に含まれるメチレン基は、酸素原子、カルボニル基、又は-NR-(R:炭素数1~10の飽和炭化水素基)で置換されてもよい。炭素数1~10の飽和炭化水素基は、前記R~Rにおける「炭素数1~10の飽和炭化水素基」と同義であり、好ましい態様も同様である。
 前記炭素数6~10の芳香族炭化水素基は、置換されていてもよい。置換されている場合の置換基としては、例えば、エチル、プロピル、フェニル、ジメチルフェニル、-SOR(R:炭素数1~10の飽和炭化水素基)又は-SONHR14が好ましい。
The linear or branched alkyl group having 1 to 10 carbon atoms and the cycloalkyl group having 3 to 30 carbon atoms may be substituted. Examples of the substituent when they are substituted include a hydroxyl group, a halogen atom, an aromatic hydrocarbon group having 6 to 10 carbon atoms, an aromatic heterocyclic group having 5 to 10 carbon atoms, —CH═CH 2 , Or —CH═CHR 6 (R 6 : a saturated hydrocarbon group having 1 to 10 carbon atoms). The methylene group contained in the cycloalkyl group may be substituted with an oxygen atom, a carbonyl group, or —NR 6 — (R 6 : a saturated hydrocarbon group having 1 to 10 carbon atoms). The saturated hydrocarbon group having 1 to 10 carbon atoms has the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in R 1 to R 4 , and the preferred embodiment is also the same.
The aromatic hydrocarbon group having 6 to 10 carbon atoms may be substituted. As the substituent when it is substituted, for example, ethyl, propyl, phenyl, dimethylphenyl, —SO 3 R (R: a saturated hydrocarbon group having 1 to 10 carbon atoms) or —SO 2 NHR 14 is preferable.
 置換されている炭素数6~10の芳香族炭化水素基としては、例えば、メチルフェニル、ジメチルフェニル、トリメチルフェニル、エチルフェニル、ヘキシルフェニル、デカニルフェニル、フルオロフェニル、クロロフェニル、ブロモフェニル、ヒドロキシフェニル、メトキシフェニル、ジメトキシフェニル、エトキシフェニル、ヘキシロキシフェニル、デカニロキシフェニル、トリフルオロメチルフェニル等が挙げられる。 Examples of the substituted aromatic hydrocarbon group having 6 to 10 carbon atoms include methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, hexylphenyl, decanylphenyl, fluorophenyl, chlorophenyl, bromophenyl, hydroxyphenyl, Examples include methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, decanyloxyphenyl, and trifluoromethylphenyl.
 また、R14とR15とが互いに結合して炭素数1~10の複素環を形成している場合、炭素数1~10の複素環は、炭素数1~10の飽和炭化水素基、水酸基、炭素数6~10の芳香族炭化水素基、又は炭素数5~10の芳香族複素環基で置換されていてもよい。 In addition, when R 14 and R 15 are bonded to each other to form a heterocyclic ring having 1 to 10 carbon atoms, the heterocyclic ring having 1 to 10 carbon atoms is a saturated hydrocarbon group having 1 to 10 carbon atoms, a hydroxyl group , An aromatic hydrocarbon group having 6 to 10 carbon atoms, or an aromatic heterocyclic group having 5 to 10 carbon atoms may be substituted.
 上記の中でも、R14及びR15としては、炭素数6~8の分枝状アルキル基、炭素数5~7のシクロアルキル基、アリル基、フェニル基、炭素数8~10のアラルキル基、炭素数2~8の水酸基含有アルキル、炭素数2~8の水酸基含有アリール基、又は炭素数2~8のアルコキシル基含有アルキル、炭素数2~8のアルコキシル基含有アリール基が好ましく、2-エチルヘキシルが特に好ましい。 Among them, R 14 and R 15 are each a branched alkyl group having 6 to 8 carbon atoms, a cycloalkyl group having 5 to 7 carbon atoms, an allyl group, a phenyl group, an aralkyl group having 8 to 10 carbon atoms, carbon A hydroxyl group-containing alkyl group having 2 to 8 carbon atoms, a hydroxyl group-containing aryl group having 2 to 8 carbon atoms, or an alkoxyl group-containing alkyl group having 2 to 8 carbon atoms, an alkoxyl group-containing aryl group having 2 to 8 carbon atoms is preferable, and 2-ethylhexyl is preferable. Particularly preferred.
 -SOM中、Mは、ナトリウム原子又はカリウム原子を表す。
 R12は、-SO 、-SOH、-SOM、-COH、-COR、-SOR、-SONHR14、又は-SONR1415を表す。R、R14、R15、及びMは、上記の通りであり、好ましい態様も同様である。
In —SO 3 M, M represents a sodium atom or a potassium atom.
R 12 represents —SO 3 , —SO 3 H, —SO 3 M, —CO 2 H, —CO 2 R, —SO 3 R, —SO 2 NHR 14 , or —SO 2 NR 14 R 15 . . R, R 14 , R 15 , and M are as described above, and the preferred embodiments are also the same.
 中でも、R12は、-COH、エチルオキシカルボニル、スルホキシル、2-エチルヘキシロキシプロパンスルファモイル、1,5-ジメチルヘキサンスルファモイル、3-フェニル-1-メチルプロパンスルファモイル、イソプロポキシプロパンスルファモイルである態様が好ましい。 Among them, R 12 is —CO 2 H, ethyloxycarbonyl, sulfoxyl, 2-ethylhexyloxypropane sulfamoyl, 1,5-dimethylhexanesulfamoyl, 3-phenyl-1-methylpropanesulfamoyl, iso An embodiment that is propoxypropane sulfamoyl is preferred.
 また、mは、0~5の整数を表す。mが2以上の整数である場合、複数のR12は同一でも異なっていてもよい。n1、n2、n3及びn4は、各々独立に、0又は1を表す。但し、n1~n4の総和は3または4である。
 Xは、ハロゲン原子を表す。ハロゲン原子としては、フッ素原子、塩素原子、及び臭素原子などが挙げられる。
 aは、0又は1の整数を表す。n1~n4の全てが1を表しかつR12が-SO を表さない場合はa=1であり、それ以外の場合は、窒素原子上の正電荷は存在せず、a=0である。a=0の場合、R~R11、及びR12の少なくとも1つの基は、水素原子が1つ外れたアニオン基として存在していてもよい。
M represents an integer of 0 to 5. When m is an integer of 2 or more, the plurality of R 12 may be the same or different. n1, n2, n3 and n4 each independently represents 0 or 1. However, the sum of n1 to n4 is 3 or 4.
X represents a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom.
a represents an integer of 0 or 1. a = 1 when all of n1 to n4 represent 1 and R 12 does not represent —SO 3 , otherwise there is no positive charge on the nitrogen atom, and a = 0 is there. When a = 0, at least one group of R 8 to R 11 and R 12 may exist as an anion group from which one hydrogen atom is removed.
 上記のうち、R及びRの少なくとも1つ又はR10及びR11の少なくとも1つが、炭素数1~4のアルキル基、又は炭素数6~10の芳香族炭化水素基である態様が好ましく、R及びRの少なくとも1つ及びR10及びR11の少なくとも1つが、炭素数1~4のアルキル基又は炭素数6~10の芳香族炭化水素基である態様がより好ましく、更には、R及びRの少なくとも1つ及びR10及びR11の少なくとも1つが、炭素数6~10の芳香族炭化水素基である態様が好ましい。
 前記一般式(III)で表される染料の具体例としては、特許第3387541号の段落番号0010に記載の化合物が挙げられる。
Among the above, an embodiment in which at least one of R 8 and R 9 or at least one of R 10 and R 11 is an alkyl group having 1 to 4 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms is preferable. More preferably, at least one of R 8 and R 9 and at least one of R 10 and R 11 is an alkyl group having 1 to 4 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, An embodiment in which at least one of R 8 and R 9 and at least one of R 10 and R 11 is an aromatic hydrocarbon group having 6 to 10 carbon atoms is preferred.
Specific examples of the dye represented by the general formula (III) include compounds described in paragraph No. 0010 of Japanese Patent No. 3387541.
<一般式(IV)で表される染料>
 (E)着色剤として、例えば一般式(IV)で表される染料を用いることが出来る。
<Dye represented by formula (IV)>
(E) As a coloring agent, the dye represented, for example by general formula (IV) can be used.
Figure JPOXMLDOC01-appb-C000023

 
Figure JPOXMLDOC01-appb-C000023

 
 前記一般式(IV)において、R16、R17、R18、R19、R20、及びR21は、各々独立に、水素原子、炭素数1~10の飽和炭化水素基、又は炭素数6~10の芳香族炭化水素基を表す。 In the general formula (IV), R 16 , R 17 , R 18 , R 19 , R 20 , and R 21 are each independently a hydrogen atom, a saturated hydrocarbon group having 1 to 10 carbon atoms, or 6 carbon atoms. Represents 10 to 10 aromatic hydrocarbon groups.
 前記炭素数1~10の飽和炭化水素基としては、例えば、アルキル基(例えば、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、ペンチル、イソペンチル、ネオペンチル、シクロペンチル、ヘキシル、シクロヘキシル、ヘプチル、シクロヘプチル、オクチル、2-エチルヘキシル、シクロオクチル、ノニル、デカニル、トリシクロデカニル、メトキシプロピル、エトキシプロピル、ヘキシロキシプロピル、2-エチルヘキシロキシプロピル、メトキシヘキシル、エトキシプロピル等)、アルケニル基(例えばブテニル基、ヘキセニル基、ペンテニル基、オクテニル基等の直鎖状のアルケニル基)が挙げられる。中でも、好ましくは炭素数1~10のアルキル基であり、より好ましくは炭素数1~9のアルキル基であり、更に好ましくは炭素数1~8のアルキル基である。 Examples of the saturated hydrocarbon group having 1 to 10 carbon atoms include alkyl groups (for example, methyl, ethyl, propyl, isopropyl, butyl, isobutyl, pentyl, isopentyl, neopentyl, cyclopentyl, hexyl, cyclohexyl, heptyl, cycloheptyl, Octyl, 2-ethylhexyl, cyclooctyl, nonyl, decanyl, tricyclodecanyl, methoxypropyl, ethoxypropyl, hexyloxypropyl, 2-ethylhexyloxypropyl, methoxyhexyl, ethoxypropyl, etc.), alkenyl group (for example, butenyl group, Straight-chain alkenyl groups such as hexenyl group, pentenyl group, octenyl group). Among them, an alkyl group having 1 to 10 carbon atoms is preferable, an alkyl group having 1 to 9 carbon atoms is more preferable, and an alkyl group having 1 to 8 carbon atoms is still more preferable.
 前記炭素数6~10の芳香族炭化水素基としては、例えば、フェニル、ナフチル等の基が挙げられる。炭素数6~10の芳香族炭化水素基は、ハロゲン原子、炭素数6~10の芳香族炭化水素基、炭素数1~10の飽和炭化水素基、-OH、-OR、-SO 、-SOH、-SOM、-COH、-COR、-SOR、-SONHRで置換されていてもよい。 Examples of the aromatic hydrocarbon group having 6 to 10 carbon atoms include groups such as phenyl and naphthyl. The aromatic hydrocarbon group having 6 to 10 carbon atoms includes a halogen atom, an aromatic hydrocarbon group having 6 to 10 carbon atoms, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OH, —OR, —SO 3 , It may be substituted with —SO 3 H, —SO 3 M, —CO 2 H, —CO 2 R, —SO 3 R, —SO 2 NHR.
 Rは、炭素数6~10の芳香族炭化水素基、又は炭素数1~10の飽和炭化水素基を表し、前記R16~R21における「炭素数6~10の芳香族炭化水素基」、「炭素数1~10の飽和炭化水素基」とそれぞれ同義であり、好ましい態様も同様である。また、Rで表される「炭素数6~10の芳香族炭化水素基」及び「炭素数1~10の飽和炭化水素基」は、ハロゲン原子で置換されていてもよい。炭素数1~10の飽和炭化水素基に含まれるメチレン基は、酸素原子、カルボニル基、又は-NR-で置換されていてもよい。
 前記ハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子などが挙げられる。
 前記「-SOR」としては、例えば、メタンスルホニル、エタンスルホニル、ヘキサンスルホニル、デカンスルホニル等が挙げられる。
R represents an aromatic hydrocarbon group having 6 to 10 carbon atoms or a saturated hydrocarbon group having 1 to 10 carbon atoms, and the “aromatic hydrocarbon group having 6 to 10 carbon atoms” in the above R 16 to R 21 ; It is synonymous with “saturated hydrocarbon group having 1 to 10 carbon atoms”, and preferred embodiments are also the same. In addition, the “aromatic hydrocarbon group having 6 to 10 carbon atoms” and the “saturated hydrocarbon group having 1 to 10 carbon atoms” represented by R may be substituted with a halogen atom. The methylene group contained in the saturated hydrocarbon group having 1 to 10 carbon atoms may be substituted with an oxygen atom, a carbonyl group, or —NR—.
Examples of the halogen atom include a fluorine atom, a chlorine atom, and a bromine atom.
Examples of the “—SO 3 R” include methanesulfonyl, ethanesulfonyl, hexanesulfonyl, decanesulfonyl and the like.
 前記「-COR」としては、例えば、メチルオキシカルボニル、エチルオキシカルボニル、プロピルオキシカルボニル、イソプロピルオキシカルボニル、ブチルオキシカルボニル、イソブチルオキシカルボニル、ペンチルオキシカルボニル、イソペンチルオキシカルボニル、ネオペンチルオキシカルボニル、シクロペンチルオキシカルボニル、ヘキシルオキシカルボニル、シクロヘキシルオキシカルボニル、ヘプチルオキシカルボニル、シクロヘプチルオキシカルボニル、オクチルオキシカルボニル、2-エチルヘキシルオキシカルボニル、シクロオクチルオキシカルボニル、ノニルオキシカルボニル、デカニルオキシカルボニル、トリシクロデカニルオキシカルボニル、メトキシプロピルオキシカルボニル、エトキシプロピルオキシカルボニル、ヘキシロキシプロピルオキシカルボニル、2-エチルヘキシロキシプロピルオキシカルボニル、メトキシヘキシルオキシカルボニル等が挙げられる。 Examples of the “—CO 2 R” include methyloxycarbonyl, ethyloxycarbonyl, propyloxycarbonyl, isopropyloxycarbonyl, butyloxycarbonyl, isobutyloxycarbonyl, pentyloxycarbonyl, isopentyloxycarbonyl, neopentyloxycarbonyl, Cyclopentyloxycarbonyl, hexyloxycarbonyl, cyclohexyloxycarbonyl, heptyloxycarbonyl, cycloheptyloxycarbonyl, octyloxycarbonyl, 2-ethylhexyloxycarbonyl, cyclooctyloxycarbonyl, nonyloxycarbonyl, decanyloxycarbonyl, tricyclodecanyloxy Carbonyl, methoxypropyloxycarbonyl, ethoxypropyloxyca Boniru, hexyloxy propyl oxycarbonyl, 2-ethylhexyloxy propyloxy, methoxy hexyloxycarbonyl and the like.
 前記「-SONHR」としては、例えば、スルファモイル、メタンスルファモイル、エタンスルファモイル、プロパンスルファモイル、イソプロパンスルファモイル、ブタンスルファモイル、イソブタンスルファモイル、ペンタンスルファモイル、イソペンタンスルファモイル、ネオペンタンスルファモイル、シクロペンタンスルファモイル、ヘキサンスルファモイル、シクロヘキサンスルファモイル、ヘプタンスルファモイル、シクロヘプタンスルファモイル、オクタンスルファモイル、2-エチルヘキサンスルファモイル、1,5-ジメチルヘキサンスルファモイル、シクロオクタンスルファモイル、ノナンスルファモイル、デカンスルファモイル、トリシクロデカンスルファモイル、メトキシプロパンスルファモイル、エトキシプロパンスルファモイル、プロポキシプロパンスルファモイル、イソプロポキシプロパンスルファモイル、ヘキシロキシプロパンスルファモイル、2-エチルヘキシロキシプロパンスルファモイル、メトキシヘキサンスルファモイル、3-フェニル-1-メチルプロパンスルファモイル等が挙げられる。
 前記「-OR」としては、例えば、メトキシ基、エトキシ基、プロポキシ基、ヘキシロキシ基等が挙げられる。
 前記炭素数6~10の芳香族炭化水素基が置換されている場合の好ましい置換基としては、エチル、プロピル、フェニル、ジメチルフェニル、-SOR、又は-SONHRなどである。-SOR及び-SONHRは、既述の通りである。
Examples of the “—SO 2 NHR” include sulfamoyl, methanesulfamoyl, ethanesulfamoyl, propanesulfamoyl, isopropanesulfamoyl, butanesulfamoyl, isobutanesulfamoyl, pentansulfamoyl, isopentane. Sulfamoyl, neopentanesulfamoyl, cyclopentanesulfamoyl, hexanesulfamoyl, cyclohexanesulfamoyl, heptanesulfamoyl, cycloheptanesulfamoyl, octanessulfamoyl, 2-ethylhexanesulfamoyl, 1,5-dimethylhexanesulfamoyl, cyclooctanesulfamoyl, nonanesulfamoyl, decanesulfamoyl, tricyclodecanesulfamoyl, methoxypropanesulfamoyl, ethoxypropyl Pansulfamoyl, propoxypropane sulfamoyl, isopropoxypropane sulfamoyl, hexyloxypropane sulfamoyl, 2-ethylhexyloxypropane sulfamoyl, methoxyhexanesulfamoyl, 3-phenyl-1-methylpropanesulfa Moyl etc. are mentioned.
Examples of the “—OR” include a methoxy group, an ethoxy group, a propoxy group, and a hexyloxy group.
Preferable substituents when the aromatic hydrocarbon group having 6 to 10 carbon atoms is substituted include ethyl, propyl, phenyl, dimethylphenyl, —SO 3 R, —SO 2 NHR, and the like. —SO 3 R and —SO 2 NHR are as described above.
 置換されている炭素数6~10の芳香族炭化水素基の具体例としては、メチルフェニル、ジメチルフェニル、トリメチルフェニル、エチルフェニル、ヘキシルフェニル、デカニルフェニル、フルオロフェニル、クロロフェニル、ブロモフェニル、ヒドロキシフェニル、メトキシフェニル、ジメトキシフェニル、エトキシフェニル、ヘキシロキシフェニル、デカニロキシフェニル、トリフルオロメチルフェニル等が挙げられる。
 前記-SOM中、Mは、ナトリウム原子又はカリウム原子を表す。
 R22及びR23は、各々独立に、水素原子、又は炭素数4~8の飽和炭化水素基を表す。炭素数4~8の飽和炭化水素基としては、ブチル基、ヘプチル基、ヘキシル基、オクチル基などが挙げられる。
 R22とR23は、互いに結合して芳香族炭化水素環を形成していてもよい。この場合の芳香族炭化水素環としては、ベンゼン環、ナフタレン環などが好適に挙げられる。
 R24は、水素原子、又は炭素数1~10の飽和炭化水素基を表す。R24で表される炭素数1~10の飽和炭化水素基は、前記R16~R21における「炭素数1~10の飽和炭化水素基」と同義である。R24は、好ましくは、水素原子又は炭素数1~3のアルキル基である。
 Xは、ハロゲン原子、BF、PF、ClO、N(SOCF、又はArSOを表す。ArSO中のArは、炭素数6~10の芳香族炭化水素基を表す。炭素数6~10の芳香族炭化水素基は、前記R16~R21における「炭素数6~10の芳香族炭化水素基」と同義であり、好ましい態様も同様である。
 Xで表されるハロゲン原子としては、フッ素原子、塩素原子、及び臭素原子などが挙げられる。
Specific examples of the substituted aromatic hydrocarbon group having 6 to 10 carbon atoms include methylphenyl, dimethylphenyl, trimethylphenyl, ethylphenyl, hexylphenyl, decanylphenyl, fluorophenyl, chlorophenyl, bromophenyl, and hydroxyphenyl. , Methoxyphenyl, dimethoxyphenyl, ethoxyphenyl, hexyloxyphenyl, decanyloxyphenyl, trifluoromethylphenyl and the like.
In the —SO 3 M, M represents a sodium atom or a potassium atom.
R 22 and R 23 each independently represents a hydrogen atom or a saturated hydrocarbon group having 4 to 8 carbon atoms. Examples of the saturated hydrocarbon group having 4 to 8 carbon atoms include butyl group, heptyl group, hexyl group, octyl group and the like.
R 22 and R 23 may be bonded to each other to form an aromatic hydrocarbon ring. Preferred examples of the aromatic hydrocarbon ring in this case include a benzene ring and a naphthalene ring.
R 24 represents a hydrogen atom or a saturated hydrocarbon group having 1 to 10 carbon atoms. The saturated hydrocarbon group having 1 to 10 carbon atoms represented by R 24 has the same meaning as the “saturated hydrocarbon group having 1 to 10 carbon atoms” in R 16 to R 21 . R 24 is preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
X represents a halogen atom, BF 4 , PF 6 , ClO 4 , N (SO 2 CF 3 ) 2 , or ArSO 3 . Ar in ArSO 3 represents an aromatic hydrocarbon group having 6 to 10 carbon atoms. The aromatic hydrocarbon group having 6 to 10 carbon atoms has the same meaning as the “aromatic hydrocarbon group having 6 to 10 carbon atoms” in R 16 to R 21 , and the preferred embodiment is also the same.
Examples of the halogen atom represented by X include a fluorine atom, a chlorine atom, and a bromine atom.
 Arで表される炭素数6~10の芳香族炭化水素基は、R16~R21で表される炭素数6~10の芳香族炭化水素基と同義であり、好ましい態様も同様である。炭素数6~10の芳香族炭化水素基は、ハロゲン原子、炭素数6~10の芳香族炭化水素基、炭素数1~10の飽和炭化水素基、-OH、-OR、-SO 、-SOH、-SOM、-COH、-COR、-SOR、-SONHR、-SON(R)で置換されていてもよい。中でも、Arとしては、フェニル基、ナフチル基が好ましい。
 また、aは、0又は1の整数を表し、R16~R21のいずれかが-SO を含む場合はa=0であり、R16~R21がいずれも-SO を含まない場合はa=1である。一般式(IV)で表される染料の具体例としては、以下の化合物が挙げられる。
The aromatic hydrocarbon group having 6 to 10 carbon atoms represented by Ar is synonymous with the aromatic hydrocarbon group having 6 to 10 carbon atoms represented by R 16 to R 21 , and preferred embodiments thereof are also the same. The aromatic hydrocarbon group having 6 to 10 carbon atoms is a halogen atom, an aromatic hydrocarbon group having 6 to 10 carbon atoms, a saturated hydrocarbon group having 1 to 10 carbon atoms, —OH, —OR, —SO 3 , It may be substituted with —SO 3 H, —SO 3 M, —CO 2 H, —CO 2 R, —SO 3 R, —SO 2 NHR, —SO 2 N (R) 2 . Among these, as Ar, a phenyl group and a naphthyl group are preferable.
A represents an integer of 0 or 1, and when any of R 16 to R 21 contains —SO 3 , a = 0, and each of R 16 to R 21 contains —SO 3 . If not, a = 1. Specific examples of the dye represented by formula (IV) include the following compounds.
Figure JPOXMLDOC01-appb-C000024

 
 
Figure JPOXMLDOC01-appb-C000024

 
 
Figure JPOXMLDOC01-appb-C000025

 
Figure JPOXMLDOC01-appb-C000025

 
<一般式(V)で表される染料>
 (E)着色剤として、例えば一般式(V)で表される染料を用いることが出来る。
<Dye represented by formula (V)>
(E) As a coloring agent, the dye represented, for example by general formula (V) can be used.
Figure JPOXMLDOC01-appb-C000026

 
Figure JPOXMLDOC01-appb-C000026

 
 一般式(V)中、複数存在するXは、それぞれ独立に、ハロゲン原子を表す。複数存在するR25は、それぞれ独立に、下記一般式(VI)又は一般式(VII)で表される基を表す。複数存在するRは、それぞれ独立に、水素原子又は1価の置換基を表す。Mは、Cu、Zn、V(=O)、Mg、Ni、Ti(=O)、Mg、Sn、又はSiを表す。複数のaは、それぞれ独立に、0~4の整数を表し、複数のnは、それぞれ独立に、0~4の整数を表し、複数のrは、それぞれ独立に、0~4の整数を表す。但し、複数のaのうち少なくとも1つは、1以上であり、複数のnのうち少なくとも1つは1以上である。複数のaと複数のnと複数のrとの総和は16である。複数存在するR25が全て同じ置換基である場合は、複数のaが全て同じであり、且つ、複数のnの全てが同じとなることはない。 In the general formula (V), a plurality of Xs each independently represent a halogen atom. A plurality of R 25 each independently represents a group represented by the following general formula (VI) or general formula (VII). Plural Rs each independently represent a hydrogen atom or a monovalent substituent. M represents Cu, Zn, V (═O), Mg, Ni, Ti (═O), Mg, Sn, or Si. A plurality of a's each independently represents an integer of 0 to 4, a plurality of n's each independently represents an integer of 0 to 4, and a plurality of r's each independently represents an integer of 0 to 4. . However, at least one of the plurality of a is 1 or more, and at least one of the plurality of n is 1 or more. The sum of the plurality of a, the plurality of n, and the plurality of r is 16. When a plurality of R 25 are all the same substituent, a plurality of a are all the same, and a plurality of n are not all the same.
Figure JPOXMLDOC01-appb-C000027

 
Figure JPOXMLDOC01-appb-C000027

 
 一般式(VI)及び一般式(VII)中、b個あるR26は、それぞれ独立に、下記一般式(VIII)~一般式(X)からなる群から選ばれる1価の置換基を表す。R27は1価の置換基を表す。bは1~5の整数を表し、cは0~4の整数を表す。ただし、一般式(VI)において、bとcとの合計が5を超えることはない。一般式(VII)において、bとcとの合計が7を超えることはない。Yは-O-、-S-、-SO-、又は-NR28-を表す。R28は水素原子、置換基を有してもよいアルキル基、又は置換基を有してもよいアリール基を表す。 In general formula (VI) and general formula (VII), b R 26s each independently represents a monovalent substituent selected from the group consisting of the following general formulas (VIII) to (X). R 27 represents a monovalent substituent. b represents an integer of 1 to 5, and c represents an integer of 0 to 4. However, in the general formula (VI), the sum of b and c does not exceed 5. In the general formula (VII), the sum of b and c does not exceed 7. Y represents —O—, —S—, —SO 2 —, or —NR 28 —. R 28 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent.
Figure JPOXMLDOC01-appb-C000028

 
Figure JPOXMLDOC01-appb-C000028

 
Figure JPOXMLDOC01-appb-C000029

 
Figure JPOXMLDOC01-appb-C000029

 
 一般式(VIII)中、R29は水素原子、置換基を有してもよいアルキル基、置換基を有してもよいオキシアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルキルアミノ基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいアリールアミノ基、置換基を有してもよいジアリールアミノ基、又は置換基を有してもよいアルキルアリールアミノ基を表す。一般式(IX)中、dは0~2の整数を表し、dが0又は1の場合、R30は置換基を有してもよいアルキル基、又は置換基を有してもよいアリール基を表し、dが2の場合、R30は置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいジアリールアミノ基、又は置換基を有してもよいアルキルアリールアミノ基を表す。 In general formula (VIII), R 29 represents a hydrogen atom, an alkyl group which may have a substituent, an oxyalkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. An alkylamino group which may have a substituent, a dialkylamino group which may have a substituent, an arylamino group which may have a substituent, a diarylamino group which may have a substituent, or a substituent. Represents an alkylarylamino group which may be substituted. In general formula (IX), d represents an integer of 0 to 2, and when d is 0 or 1, R 30 is an alkyl group which may have a substituent, or an aryl group which may have a substituent. And when d is 2, R 30 has an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, and a substituent. It represents a diarylamino group which may be substituted, or an alkylarylamino group which may have a substituent.
 一般式(X)中、R31は、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルキルカルボニル基、置換基を有してもよいアリールカルボニル基、置換基を有してもよいアルキルスルホニル基、置換基を有してもよいアリールスルホニル基を表し、R32は水素原子、置換基を有してもよいアルキル基、又は置換基を有してもよいアリール基を表す。 In general formula (X), R 31 has an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, and a substituent. An optionally substituted arylcarbonyl group, an optionally substituted alkylsulfonyl group, an optionally substituted arylsulfonyl group, R 32 represents a hydrogen atom, an optionally substituted alkyl group, Or the aryl group which may have a substituent is represented.
 本発明で用いる一般式(V)で表される化合物が、置換数の異なる2種類以上の混合物の場合、a、n、rは、それぞれ、混合物中の化合物の平均値を意味する。 In the case where the compound represented by the general formula (V) used in the present invention is a mixture of two or more kinds having different numbers of substitutions, a, n and r each mean an average value of the compounds in the mixture.
 一般式(V)において、Xはハロゲン原子を表し、塩素原子又は臭素原子であることが好ましく、塩素原子であることがより好ましい。また、Xの置換位置は、フタロシアニン骨格のα位であると、吸収波長が長波化し、グリーン色のカラーフィルタ用として好適に用いることができる。
 複数のnは、それぞれ独立に、0~4の整数を表し、1~3の整数が好ましい。複数のnの合計は、1~14が好ましく、6~14がより好ましく、9~12が特に好ましい。
 R25は、一般式(VI)または一般式(VII)で表される基を表し、一般式(VI)で表される基であることがより好ましい。
 複数のaは、それぞれ独立に、0~4の整数を表し、1または2が好ましい。複数のaの合計は、1~14が好ましく、特に好ましくは2~8であり、さらに好ましくは3~5である。
 Mは、Cu、Zn、V(=O)、Mg、Ni、Ti(=O)、Mg、Sn、又はSiを表し、Zn、又はCuが好ましい。
 Rは水素原子又は1価の置換基を表す。1価の置換基の例としては、後述の置換基Tが例示される。Rとしては、水素原子、アルキル基、アルコキシ基、アリール基、又はアリールオキシ基が好ましく、水素原子、炭素数1~3のアルキル基、炭素数1~3のアルコキシ基、フェノキシ基がより好ましく、水素原子がさらに好ましい。
 複数のrは、それぞれ独立に、0~4の整数を表す。
In the general formula (V), X represents a halogen atom, preferably a chlorine atom or a bromine atom, and more preferably a chlorine atom. Further, when the substitution position of X is the α-position of the phthalocyanine skeleton, the absorption wavelength becomes longer, and it can be suitably used for a green color filter.
A plurality of n's independently represents an integer of 0 to 4, preferably an integer of 1 to 3. The total number of n is preferably 1 to 14, more preferably 6 to 14, and particularly preferably 9 to 12.
R 25 represents a group represented by General Formula (VI) or General Formula (VII), and more preferably a group represented by General Formula (VI).
A plurality of a's each independently represents an integer of 0 to 4, preferably 1 or 2. The total number of a is preferably 1 to 14, particularly preferably 2 to 8, and more preferably 3 to 5.
M represents Cu, Zn, V (═O), Mg, Ni, Ti (═O), Mg, Sn, or Si, and Zn or Cu is preferable.
R represents a hydrogen atom or a monovalent substituent. Examples of the monovalent substituent include the substituent T described later. R is preferably a hydrogen atom, an alkyl group, an alkoxy group, an aryl group, or an aryloxy group, more preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, an alkoxy group having 1 to 3 carbon atoms, or a phenoxy group, More preferred is a hydrogen atom.
A plurality of r each independently represents an integer of 0 to 4.
 一般式(V)において、フタロシアニン骨格におけるRの置換位置については、フタロシアニン骨格のα位、β位のいずれであってもよいが、α位置換体の方が分子会合を抑制する効果が大きく、着色組成物層の吸光係数を高める点で好ましい。
 一般式(VI)及び一般式(VII)におけるR26は、それぞれ独立に、一般式(VIII)~一般式(X)からなる群から選ばれる1価の置換基を表し、特に、一般式(VIII)または(IX)で表される1価の置換基が好ましい。
 bは、1~5の整数であり、1または2が好ましい。bが2以上の場合は、複数存在するR26は、同一であってもよいし、異なっていてもよい。
In general formula (V), the substitution position of R in the phthalocyanine skeleton may be either the α-position or the β-position of the phthalocyanine skeleton, but the α-position substitution product has a greater effect of suppressing molecular association and is colored. This is preferable in terms of increasing the extinction coefficient of the composition layer.
R 26 in general formula (VI) and general formula (VII) each independently represents a monovalent substituent selected from the group consisting of general formula (VIII) to general formula (X). A monovalent substituent represented by VIII) or (IX) is preferred.
b is an integer of 1 to 5, preferably 1 or 2. When b is 2 or more, a plurality of R 26 may be the same or different.
 一般式(VI)及び一般式(VII)におけるR27は、1価の置換基を表す。R27で表される1価の置換基は、後述する置換基Tから選択でき、ハロゲン原子(好ましくは塩素原子または臭素原子)、シアノ基、ニトロ基、水酸基、アミノ基、アリール基、総炭素数2~20のアルコキシカルボニル基、総炭素数1~20のアルキルオキシ基、総炭素数6~20のアリールオキシ基、総炭素数1~20のアルキルチオ基、または、総炭素数6~20のアリールチオ基、総炭素数1~20のアルキル基、総炭素数1~20のアルコキシ基が好ましく、メチル基またはメトキシ基がより好ましい。
 cは、0~4の整数であり、0または1が好ましく、0がさらに好ましい。cが2以上の場合は、複数存在するRは、同一であってもよいし、異なっていてもよい。
R < 27 > in general formula (VI) and general formula (VII) represents a monovalent substituent. The monovalent substituent represented by R 27 can be selected from the substituent T described later, and is a halogen atom (preferably a chlorine atom or a bromine atom), a cyano group, a nitro group, a hydroxyl group, an amino group, an aryl group, or a total carbon. An alkoxycarbonyl group having 2 to 20 carbon atoms, an alkyloxy group having 1 to 20 carbon atoms, an aryloxy group having 6 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, or a carbon atom having 6 to 20 carbon atoms An arylthio group, an alkyl group having 1 to 20 carbon atoms, and an alkoxy group having 1 to 20 carbon atoms are preferable, and a methyl group or a methoxy group is more preferable.
c is an integer of 0 to 4, preferably 0 or 1, and more preferably 0. When c is 2 or more, a plurality of R 3 may be the same or different.
 一般式(VI)及び一般式(VII)中、Yは、-O-、-S-、-SO-、又は-NR28-を表し、-O-又は-SO-が好ましく、-O-がより好ましい。
 Yを-O-または-SO-とすることにより、soret帯の吸収を短波長化することができ、吸収のコントラストがより効果的に発揮される傾向にある。
 R28は、水素原子、置換基を有してもよいアルキル基、又は置換基を有してもよいアリール基を表し、水素原子、炭素数1~3のアルキル基、フェニル基が好ましく、水素原子又はメチル基がより好ましく、水素原子がさらに好ましい。置換基を有していてもよいアルキル基等の例は、後述する。
In the general formula (VI) and the general formula (VII), Y is, -O -, - S -, - SO 2 -, or -NR 28 - represents, -O- or -SO 2 - are preferred, -O -Is more preferable.
By setting Y to —O— or —SO 2 —, the absorption in the soret band can be shortened, and the absorption contrast tends to be exhibited more effectively.
R 28 represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group, preferably a hydrogen atom, an alkyl group having 1 to 3 carbon atoms, or a phenyl group, An atom or a methyl group is more preferable, and a hydrogen atom is more preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
 一般式(VIII)中におけるR29は、水素原子、置換基を有してもよいアルキル基、置換基を有してもよいオキシアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルキルアミノ基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいアリールアミノ基、置換基を有してもよいジアリールアミノ基、又は置換基を有してもよいアルキルアリールアミノ基を表し、水素原子、総炭素数1~20のアルキル基、総炭素数6~20のアリール基、総炭素数2~20のジアルキルアミノ基、総炭素数12~20のジアリールアミノ基、または、総炭素数7~20アルキルアリールアミノ基が好ましく、総炭素数1~20のアルキル基、総炭素数2~20のジアルキルアミノ基、総炭素数12~20のジアリールアミノ基、または総炭素数7~20アルキルアリールアミノ基がさらに好ましく、総炭素数12~20のジアリールアミノ基または総炭素数2~20のジアルキルアミノ基が特に好ましい。 R 29 in the general formula (VIII) is a hydrogen atom, an alkyl group which may have a substituent, an oxyalkyl group which may have a substituent, an aryl group which may have a substituent, or a substituent. An alkylamino group which may have a substituent, a dialkylamino group which may have a substituent, an arylamino group which may have a substituent, a diarylamino group which may have a substituent, or a substituent Represents an alkylarylamino group which may have a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, a dialkylamino group having 2 to 20 carbon atoms, a total carbon number of 12 A diarylamino group having 20 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms in total, an alkyl group having 1 to 20 carbon atoms in total, a dialkylamino group having 2 to 20 carbon atoms in total, and 12 to 20 carbon atoms in total. Jary A ruamino group or an alkylarylamino group having 7 to 20 carbon atoms is more preferable, and a diarylamino group having 12 to 20 carbon atoms or a dialkylamino group having 2 to 20 carbon atoms is particularly preferable.
 上記したアルキル基、アリール基等のアルキル部位及びアリール部位はさらに置換基を有してもよい。置換基としてはアルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基、またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。置換基を有していてもよいアルキル基等の例は、後述する。 The alkyl moiety and aryl moiety such as the alkyl group and aryl group described above may further have a substituent. As the substituent, an alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, an arylthio group, or a halogen atom is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
 一般式(IX)中、dは0~2の整数を表し、dが0または1の場合、R30は、置換基を有してもよいアルキル基、または置換基を有してもよいアリール基であり、dが2の場合、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいジアリールアミノ基、または置換基を有してもよいアルキルアリールアミノ基を表す。R30は、dが2の場合、炭素数2~20のジアルキルアミノ基、炭素数12~20のジアリールアミノ基、炭素数7~20アルキルアリールアミノ基が好ましい。 In general formula (IX), d represents an integer of 0 to 2, and when d is 0 or 1, R 30 is an alkyl group which may have a substituent, or an aryl which may have a substituent. And when d is 2, the alkyl group which may have a substituent, the aryl group which may have a substituent, the dialkylamino group which may have a substituent, and the substituent Or a diarylamino group which may be substituted or an alkylarylamino group which may have a substituent. R 30 is preferably a dialkylamino group having 2 to 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms when d is 2.
 上記したアルキル基、アリール基等のアルキル部位及びアリール部位はさらに置換基を有してもよく、その置換基としては、後述する置換基Tが例示され、アルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。置換基を有していてもよいアルキル基等の例は、後述する。 The alkyl moiety and the aryl moiety such as the above-described alkyl group and aryl group may further have a substituent, and examples of the substituent include a substituent T described later, an alkoxy group, an aryl group, an aryloxy group, An alkoxycarbonyl group, an alkylthio group, an arylthio group, a halogen atom or the like is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
 一般式(X)中、R31は、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルキルカルボニル基、置換基を有してもよいアリールカルボニル基、置換基を有してもよいアルキルスルホニル基、置換基を有してもよいアリールスルホニル基を表し、炭素数1~20のアルキル基、炭素数6~20のアリール基、炭素数2~20のアルキルカルボニル基、炭素数7~20のアリールカルボニル基、炭素数1~20のアルキルスルホニル基、炭素数6~20のアリールスルホニル基が好ましく、炭素数2~20のアルキルカルボニル基、炭素数7~20のアリールカルボニル基、炭素数1~20のアルキルスルホニル基、炭素数6~20のアリールスルホニル基がより好ましい。 In general formula (X), R 31 has an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, and a substituent. Represents an optionally substituted arylcarbonyl group, an optionally substituted alkylsulfonyl group, an optionally substituted arylsulfonyl group, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms , An alkylcarbonyl group having 2 to 20 carbon atoms, an arylcarbonyl group having 7 to 20 carbon atoms, an alkylsulfonyl group having 1 to 20 carbon atoms, and an arylsulfonyl group having 6 to 20 carbon atoms, preferably an alkyl having 2 to 20 carbon atoms. More preferred are a carbonyl group, an arylcarbonyl group having 7 to 20 carbon atoms, an alkylsulfonyl group having 1 to 20 carbon atoms, and an arylsulfonyl group having 6 to 20 carbon atoms.
 上記したアルキル基、アリール基等のアルキル部位及びアリール部位はさらに置換基を有してもよく、その置換基としては、後述する置換基Tが例示され、アルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。置換基を有していてもよいアルキル基等の例は、後述する。 The alkyl moiety and the aryl moiety such as the above-described alkyl group and aryl group may further have a substituent, and examples of the substituent include a substituent T described later, an alkoxy group, an aryl group, an aryloxy group, An alkoxycarbonyl group, an alkylthio group, an arylthio group, a halogen atom or the like is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
 一般式(X)中、R32は水素原子、置換基を有してもよいアルキル基、又は置換基を有してもよいアリール基を表し、炭素数1~20のアルキル基又は炭素数6~20のアリール基が好ましい。 In the general formula (X), R 32 represents a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent, an alkyl group having 1 to 20 carbon atoms or a carbon number of 6 ~ 20 aryl groups are preferred.
 上記したアルキル基、アリール基等のアルキル部位及びアリール部位はさらに置換基を有してもよく、その置換基としては、後述する置換基Tが例示され、アルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。置換基を有していてもよいアルキル基等の例は、後述する。 The alkyl moiety and the aryl moiety such as the above-described alkyl group and aryl group may further have a substituent, and examples of the substituent include a substituent T described later, an alkoxy group, an aryl group, an aryloxy group, An alkoxycarbonyl group, an alkylthio group, an arylthio group, a halogen atom or the like is preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
 上記一般式(VI)~(X)中の、置換基を有してもよいアルキル基の好適な例を示す。置換基を有してもよいアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、2-エチルヘキシル基、ドデシル基、ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、1-ノルボルニル基、1-アダマンチル基、フェノキシエチル基、ベンジル基、フェニルエチル基、N-ブチルアミノスルホニルプロピル基、N-ブチルアミノカルボニルメチル基、N,N-ジブチルアミノスルホニルプロピル基、エトキシエトキシエチル基、2-クロロエチル基が挙げられ、さらに好ましくはメチル基、エチル基、プロピル基、イソプロピル基、tert-ブチル基、フェノキシエチル基、ベンジル基、フェニルエチル基、N-ブチルアミノスルホニルプロピル基、N-ブチルアミノカルボニルメチル基、N,N-ジブチルアミノスルホニルプロピル基、エトキシエトキシエチル基が挙げられ、特に好ましくはメチル基、エチル基、プロピル基、tert-ブチル基、フェノキシエチル基、ベンジル基、フェニルエチル基、N-ブチルアミノスルホニルプロピル基、N-ブチルアミノカルボニルメチル基、N,N-ジブチルアミノスルホニルプロピル基、エトキシエトキシエチル基が挙げられる。 Preferred examples of the alkyl group which may have a substituent in the general formulas (VI) to (X) are shown below. Examples of the alkyl group which may have a substituent include a methyl group, an ethyl group, a propyl group, an isopropyl group, a tert-butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a 2-ethylhexyl group, a dodecyl group, Hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group, phenoxyethyl group, benzyl group, phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group, ethoxyethoxyethyl group, 2-chloroethyl group can be mentioned, more preferably methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, phenoxyethyl group, benzyl group, Phenylethyl group, N-butyl Examples thereof include aminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group, and ethoxyethoxyethyl group. Particularly preferred are methyl group, ethyl group, propyl group, tert-butyl group, phenoxyethyl. Group, benzyl group, phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group and ethoxyethoxyethyl group.
 上記一般式(VI)~(X)中の、置換基を有してもよいアリール基の好適な例を示す。置換基を有してもよいアリール基としては、フェニル基、2-クロロフェニル基、2-メトキシフェニル基、4-ブトキシカルボニルフェニル基、4-N,N-ジブチルアミノカルボニルフェニル基、4-N-ブチルアミノスルホニルフェニル基、4-N,N-ジブチルアミノスルホニルフェニル基が挙げられ、さらに好ましくはフェニル基、4-ブトキシカルボニルフェニル基、4-N,N-ジブチルアミノカルボニルフェニル基、4-N-ブチルアミノスルホニルフェニル基、4-N,N-ジブチルアミノスルホニルフェニル基が挙げられ、特に好ましくはフェニル基、4-ブトキシカルボニルフェニル基、4-N,N-ジブチルアミノカルボニルフェニル基、4-N,N-ジブチルアミノスルホニルフェニル基が挙げられる。 Preferred examples of the aryl group that may have a substituent in the general formulas (VI) to (X) are shown below. Examples of the aryl group which may have a substituent include a phenyl group, 2-chlorophenyl group, 2-methoxyphenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N— And butylaminosulfonylphenyl group, 4-N, N-dibutylaminosulfonylphenyl group, and more preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N- Butylaminosulfonylphenyl group, 4-N, N-dibutylaminosulfonylphenyl group, and particularly preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N, N-dibutylaminosulfonylphenyl group may be mentioned.
 上記一般式(VI)~(X)中の、置換基を有してもよいジアルキルアミノ基の好適な例を示す。置換基を有してもよいジアルキルアミノ基としては、N,N-ジメチルアミノ基、N,N-ジブチルアミノ基、N,N-ジ(2-エチルヘキシル)アミノ基、N-メチル-N-ベンジルアミノ基、N,N-ジ(2-エトキシエチル)アミノ基、N.N-ジ(2-ヒドロキシエチル)アミノ基が挙げられる。 Preferred examples of the dialkylamino group which may have a substituent in the above general formulas (VI) to (X) are shown below. Examples of the dialkylamino group which may have a substituent include N, N-dimethylamino group, N, N-dibutylamino group, N, N-di (2-ethylhexyl) amino group, and N-methyl-N-benzyl. Amino group, N, N-di (2-ethoxyethyl) amino group, N.I. N-di (2-hydroxyethyl) amino group may be mentioned.
 上記一般式(VI)~(X)中の、置換基を有してもよいジアリールアミノ基の好適な例を示す。置換基を有してもよいジアリールアミノ基としては、N,N-ジフェニルアミノ基、N,N-ジ(4-メトキシフェニル)アミノ基、N,N-ジ(4-アシルフェニル)アミノ基が挙げられる。 Preferred examples of the diarylamino group which may have a substituent in the above general formulas (VI) to (X) are shown below. Examples of the diarylamino group that may have a substituent include N, N-diphenylamino group, N, N-di (4-methoxyphenyl) amino group, and N, N-di (4-acylphenyl) amino group. Can be mentioned.
 上記一般式(VI)~(X)中の、置換基を有してもよいアルキルアリールアミノ基の好適な例を示す。置換基を有してもよいアルキルアリールアミノ基としては、N-メチル-N-フェニルアミノ基、N-ベンジル-N-フェニルアミノ基、N-メチル-N-(4-メトキシフェニル)アミノ基が挙げられる。 Preferred examples of the alkylarylamino group which may have a substituent in the general formulas (VI) to (X) are shown below. Examples of the alkylarylamino group which may have a substituent include N-methyl-N-phenylamino group, N-benzyl-N-phenylamino group, and N-methyl-N- (4-methoxyphenyl) amino group. Can be mentioned.
 上記一般式(VI)~(X)中の、置換基を有してもよいアルキルカルボニル基の好適な例を示す。置換基を有してもよいアルキルカルボニル基としては、アセチル基、プロピルカルボニル基、ヘプチル-3-カルボニル基、2-エチルヘキシルオキシメチルカルボニル基、フェノキシメチルカルボニル基、2-エチルヘキシルオキシカルボニルメチルカルボニル基が挙げられる。 Preferred examples of the alkylcarbonyl group which may have a substituent in the above general formulas (VI) to (X) are shown below. Examples of the alkylcarbonyl group which may have a substituent include an acetyl group, a propylcarbonyl group, a heptyl-3-carbonyl group, a 2-ethylhexyloxymethylcarbonyl group, a phenoxymethylcarbonyl group, and a 2-ethylhexyloxycarbonylmethylcarbonyl group. Can be mentioned.
 上記一般式(VI)~(X)中の、置換基を有してもよいアリールカルボニル基の好適な例を示す。置換基を有してもよいアリールカルボニル基としては、ベンゾイル基、4-メトキシベンゾイル基、4-エトキシカルボニルベンゾイル基が挙げられる。 Preferred examples of the arylcarbonyl group which may have a substituent in the above general formulas (VI) to (X) are shown below. Examples of the arylcarbonyl group which may have a substituent include a benzoyl group, a 4-methoxybenzoyl group, and a 4-ethoxycarbonylbenzoyl group.
 上記一般式(VI)~(X)中の、置換基を有してもよいアルキルスルホニル基の好適な例を示す。置換基を有してもよいアルキルスルホニル基としては、メタンスルホニル基、オクタンスルホニル基、ドデシルスルホニル基、ベンジルスルホニル基、フェノキシプロピルスルホニル基が挙げられる。 Preferred examples of the alkylsulfonyl group that may have a substituent in the general formulas (VI) to (X) are shown below. Examples of the alkylsulfonyl group which may have a substituent include a methanesulfonyl group, an octanesulfonyl group, a dodecylsulfonyl group, a benzylsulfonyl group, and a phenoxypropylsulfonyl group.
 上記一般式(VI)~(X)中の、置換基を有してもよいアリールスルホニル基の好適な例を示す。置換基を有してもよいアリールスルホニル基としては、フェニルスルホニル基、2-メトキシフェニルスルホニル基、4-エトキシカルボニルフェニルスルホニル基が挙げられる。 Preferred examples of the arylsulfonyl group which may have a substituent in the general formulas (VI) to (X) are shown below. Examples of the arylsulfonyl group which may have a substituent include a phenylsulfonyl group, a 2-methoxyphenylsulfonyl group, and a 4-ethoxycarbonylphenylsulfonyl group.
 上記一般式(VI)~(X)中の、置換基を有してもよいアルキルスルホニルアミノ基の好適な例を示す。置換基を有してもよいアルキルスルホニルアミノ基としては、メチルスルホニルアミノ基、ブチルスルホニルアミノ基、ヒドロキシプロピルスルホニルアミノ基、2-エチルヘキシルスルホニルアミノ基、n-オクチルスルホニルアミノ基、フェノキシエチルスルホニルアミノ基、アリルスルホニルアミノ基が挙げられる。 Preferred examples of the alkylsulfonylamino group which may have a substituent in the general formulas (VI) to (X) are shown below. Examples of the alkylsulfonylamino group which may have a substituent include a methylsulfonylamino group, a butylsulfonylamino group, a hydroxypropylsulfonylamino group, a 2-ethylhexylsulfonylamino group, an n-octylsulfonylamino group, and a phenoxyethylsulfonylamino group. And an allylsulfonylamino group.
 上記一般式(VI)~(X)中の、置換基を有してもよいビニルスルホニルアミノ基としては、ビニルスルホニルアミノ基、1-メチルビニルスルホニルアミノ基が挙げられる。 In the general formulas (VI) to (X), examples of the vinylsulfonylamino group which may have a substituent include a vinylsulfonylamino group and a 1-methylvinylsulfonylamino group.
 上記一般式(VI)~(X)中の、置換基を有してもよいアリールスルホニルアミノ基としては、フェニルスルホニルアミノ基、p-メトキシフェニルスルホニルアミノ基、p-エトキシカルボニルスルホニルアミノ基等が挙げられる。 In the general formulas (VI) to (X), the arylsulfonylamino group which may have a substituent includes a phenylsulfonylamino group, a p-methoxyphenylsulfonylamino group, a p-ethoxycarbonylsulfonylamino group, and the like. Can be mentioned.
 上記一般式(VI)~(X)中の、置換基を有してもよいアルキルカルボニルアミノ基としては、メチルカルボニルアミノ基、2-エチルヘキサノイルアミノ基、n-ヘプチルカルボニルアミノ基、エトキシエトキシメチルカルボニルアミノ基等が挙げられる。 In the above general formulas (VI) to (X), the alkylcarbonylamino group which may have a substituent is a methylcarbonylamino group, a 2-ethylhexanoylamino group, an n-heptylcarbonylamino group, an ethoxyethoxy group. Examples include a methylcarbonylamino group.
 上記一般式(VI)~(X)中の、置換基を有してもよいアリールカルボニルアミノ基としては、ベンゾイルアミノ基、2-メトキシベンゾイルアミノ基、4-ビニルベンゾイルアミノ基等が挙げられる。 In the above general formulas (VI) to (X), examples of the arylcarbonylamino group which may have a substituent include a benzoylamino group, a 2-methoxybenzoylamino group, and a 4-vinylbenzoylamino group.
 以下に、置換基Tの例を示す。
 アルキル基(好ましくは炭素数1~24の、直鎖、分岐鎖、または環状のアルキル基で、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、2-エチルヘキシル基、ドデシル基、ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、1-ノルボルニル基、1-アダマンチル基)、アルケニル基(好ましくは炭素数2~18のアルケニル基で、例えば、ビニル基、アリル基、3-ブテン-1-イル基)、アリール基(好ましくは炭素数6~24のアリール基で、例えば、フェニル基、ナフチル基)、ヘテロ環基(好ましくは炭素数1~18のヘテロ環基で、例えば、2-チエニル基、4-ピリジル基、2-フリル基、2-ピリミジニル基、1-ピリジル基、2-ベンゾチアゾリル基、1-イミダゾリル基、1-ピラゾリル基、ベンゾトリアゾール-1-イル基)、シリル基(好ましくは炭素数3~18のシリル基で、例えば、トリメチルシリル基、トリエチルシリル基、トリブチルシリル基、tert-ブチルジメチルシリル基、tert-ヘキシルジメチルシリル基)、ヒドロキシル基、シアノ基、ニトロ基、アルコキシ基(好ましくは炭素数1~24のアルコキシ基で、例えば、メトキシ基、エトキシ基、1-ブトキシ基、2-ブトキシ基、イソプロポキシ基、tert-ブトキシ基、ドデシルオキシ基、シクロペンチルオキシ基、シクロヘキシルオキシ基)、アリールオキシ基(好ましくは炭素数6~24のアリールオキシ基で、例えば、フェノキシ基、1-ナフトキシ基)、
Examples of the substituent T are shown below.
An alkyl group (preferably a linear, branched or cyclic alkyl group having 1 to 24 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, Hexyl group, heptyl group, octyl group, 2-ethylhexyl group, dodecyl group, hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group), alkenyl group (preferably having a carbon number of 2 to 18 alkenyl groups such as vinyl group, allyl group, 3-buten-1-yl group), aryl groups (preferably aryl groups having 6 to 24 carbon atoms such as phenyl group, naphthyl group), heterocyclic ring Group (preferably a heterocyclic group having 1 to 18 carbon atoms such as 2-thienyl group, 4-pyridyl group, 2-furyl group, 2- Limidinyl group, 1-pyridyl group, 2-benzothiazolyl group, 1-imidazolyl group, 1-pyrazolyl group, benzotriazol-1-yl group), silyl group (preferably a silyl group having 3 to 18 carbon atoms, for example, trimethylsilyl Group, triethylsilyl group, tributylsilyl group, tert-butyldimethylsilyl group, tert-hexyldimethylsilyl group), hydroxyl group, cyano group, nitro group, alkoxy group (preferably an alkoxy group having 1 to 24 carbon atoms, , Methoxy group, ethoxy group, 1-butoxy group, 2-butoxy group, isopropoxy group, tert-butoxy group, dodecyloxy group, cyclopentyloxy group, cyclohexyloxy group), aryloxy group (preferably having 6 to 24 carbon atoms) An aryloxy group such as a phenoxy group, - naphthoxy),
ヘテロ環オキシ基(好ましくは炭素数1~18のヘテロ環オキシ基で、例えば、1-フェニルテトラゾール-5-オキシ基、2-テトラヒドロピラニルオキシ基)、シリルオキシ基(好ましくは炭素数1~18のシリルオキシ基で、例えば、トリメチルシリルオキシ基、tert-ブチルジメチルシリルオキシ基、ジフェニルメチルシリルオキシ基)、アシルオキシ基(好ましくは炭素数2~24のアシルオキシ基で、例えば、アセトキシ基、ピバロイルオキシ基、ベンゾイルオキシ基、ドデカノイルオキシ基)、アルコキシカルボニルオキシ基(好ましくは炭素数2~24のアルコキシカルボニルオキシ基で、例えば、エトキシカルボニルオキシ基、tert-ブトキシカルボニルオキシ基、シクロヘキシルオキシカルボニルオキシ基)、アリールオキシカルボニルオキシ基(好ましくは炭素数7~24のアリールオキシカルボニルオキシ基で、例えば、フェノキシカルボニルオキシ基)、カルバモイルオキシ基(好ましくは炭素数1~24のカルバモイルオキシ基で、例えば、N,N-ジメチルカルバモイルオキシ基、N-ブチルカルバモイルオキシ基、N-フェニルカルバモイルオキシ基、N-エチル-N-フェニルカルバモイルオキシ基)、スルファモイルオキシ基(好ましくは炭素数1~24のスルファモイルオキシ基で、例えば、N,N-ジエチルスルファモイルオキシ基、N-プロピルスルファモイルオキシ基)、アルキルスルホニルオキシ基(好ましくは炭素数1~24のアルキルスルホニルオキシ基で、例えば、メチルスルホニルオキシ基、ヘキサデシルスルホニルオキシ基、シクロヘキシルスルホニルオキシ基)、アリールスルホニルオキシ基(好ましくは炭素数6~24のアリールスルホニルオキシ基で、例えば、フェニルスルホニルオキシ基)、 A heterocyclic oxy group (preferably a heterocyclic oxy group having 1 to 18 carbon atoms, for example, 1-phenyltetrazol-5-oxy group, 2-tetrahydropyranyloxy group), silyloxy group (preferably having 1 to 18 carbon atoms) Silyloxy groups such as trimethylsilyloxy group, tert-butyldimethylsilyloxy group, diphenylmethylsilyloxy group), acyloxy groups (preferably acyloxy groups having 2 to 24 carbon atoms, such as acetoxy group, pivaloyloxy group, benzoyl group) Oxy group, dodecanoyloxy group), alkoxycarbonyloxy group (preferably an alkoxycarbonyloxy group having 2 to 24 carbon atoms, such as ethoxycarbonyloxy group, tert-butoxycarbonyloxy group, cyclohexyloxycarbonyloxy group), A reeloxycarbonyloxy group (preferably an aryloxycarbonyloxy group having 7 to 24 carbon atoms such as phenoxycarbonyloxy group), a carbamoyloxy group (preferably a carbamoyloxy group having 1 to 24 carbon atoms such as N, N-dimethylcarbamoyloxy group, N-butylcarbamoyloxy group, N-phenylcarbamoyloxy group, N-ethyl-N-phenylcarbamoyloxy group), sulfamoyloxy group (preferably sulfamoyl having 1 to 24 carbon atoms) An oxy group, for example, N, N-diethylsulfamoyloxy group, N-propylsulfamoyloxy group), an alkylsulfonyloxy group (preferably an alkylsulfonyloxy group having 1 to 24 carbon atoms, for example, methylsulfonyl Oxy group, hexadecyl sulfo Aryloxy group, cyclohexyl sulfonyloxy group), an aryl sulfonyloxy group (preferably an arylsulfonyloxy group having 6 to 24 carbon atoms, e.g., phenylsulfonyl group),
アシル基(好ましくは炭素数1~24のアシル基で、例えば、ホルミル基、アセチル基、ピバロイル基、ベンゾイル基、テトラデカノイル基、シクロヘキサノイル基)、アルコキシカルボニル基(好ましくは炭素数2~24のアルコキシカルボニル基で、例えば、メトキシカルボニル基、エトキシカルボニル基、オクタデシルオキシカルボニル基、シクロヘキシルオキシカルボニル基、2,6-ジ-tert-ブチル-4-メチルシクロヘキシルオキシカルボニル基)、アリールオキシカルボニル基(好ましくは炭素数7~24のアリールオキシカルボニル基で、例えば、フェノキシカルボニル基)、カルバモイル基(好ましくは炭素数1~24のカルバモイル基で、例えば、カルバモイル基、N,N-ジエチルカルバモイル基、N-エチル-N-オクチルカルバモイル基、N,N-ジブチルカルバモイル基、N-プロピルカルバモイル基、N-フェニルカルバモイル基、N-メチルN-フェニルカルバモイル基、N,N-ジシクロへキシルカルバモイル基)、アミノ基(好ましくは炭素数24以下のアミノ基で、例えば、アミノ基、メチルアミノ基、N,N-ジブチルアミノ基、テトラデシルアミノ基、2-エチルへキシルアミノ基、シクロヘキシルアミノ基)、アニリノ基(好ましくは6~24のアニリノ基で、例えば、アニリノ基、N-メチルアニリノ基)、ヘテロ環アミノ基(好ましくは1~18のヘテロ環アミノ基で、例えば、4-ピリジルアミノ基)、カルボンアミド基(好ましくは2~24のカルボンアミド基で、例えば、アセトアミド基、ベンズアミド基、テトラデカンアミド基、ピバロイルアミド基、シクロヘキサンアミド基)、ウレイド基(好ましくは炭素数1~24のウレイド基で、例えば、ウレイド基、N,N-ジメチルウレイド基、N-フェニルウレイド基)、イミド基(好ましくは炭素数24以下のイミド基で、例えば、N-スクシンイミド基、N-フタルイミド基)、アルコキシカルボニルアミノ基(好ましくは炭素数2~24のアルコキシカルボニルアミノ基で、例えば、メトキシカルボニルアミノ基、エトキシカルボニルアミノ基、tert-ブトキシカルボニルアミノ基、オクタデシルオキシカルボニルアミノ基、シクロヘキシルオキシカルボニルアミノ基)、 An acyl group (preferably an acyl group having 1 to 24 carbon atoms, for example, formyl group, acetyl group, pivaloyl group, benzoyl group, tetradecanoyl group, cyclohexanoyl group), alkoxycarbonyl group (preferably having 2 to 2 carbon atoms) 24 alkoxycarbonyl groups, for example, methoxycarbonyl group, ethoxycarbonyl group, octadecyloxycarbonyl group, cyclohexyloxycarbonyl group, 2,6-di-tert-butyl-4-methylcyclohexyloxycarbonyl group), aryloxycarbonyl group (Preferably an aryloxycarbonyl group having 7 to 24 carbon atoms such as phenoxycarbonyl group), carbamoyl group (preferably a carbamoyl group having 1 to 24 carbon atoms such as carbamoyl group, N, N-diethylcarbamoyl group, N-ethyl N-octylcarbamoyl group, N, N-dibutylcarbamoyl group, N-propylcarbamoyl group, N-phenylcarbamoyl group, N-methylN-phenylcarbamoyl group, N, N-dicyclohexylcarbamoyl group), amino group (preferably Is an amino group having 24 or less carbon atoms, such as an amino group, methylamino group, N, N-dibutylamino group, tetradecylamino group, 2-ethylhexylamino group, cyclohexylamino group), anilino group (preferably 6 To 24 anilino groups, for example, anilino group, N-methylanilino group), heterocyclic amino groups (preferably 1-18 heterocyclic amino groups, for example 4-pyridylamino group), carbonamido groups (preferably 2 To 24 carbonamido groups such as acetamide group, benzamide group, tetra Canamide group, pivaloylamide group, cyclohexaneamide group), ureido group (preferably a ureido group having 1 to 24 carbon atoms, for example, ureido group, N, N-dimethylureido group, N-phenylureido group), imide group (preferably Is an imide group having 24 or less carbon atoms, such as an N-succinimide group or an N-phthalimide group, or an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 24 carbon atoms, such as a methoxycarbonylamino group, ethoxy Carbonylamino group, tert-butoxycarbonylamino group, octadecyloxycarbonylamino group, cyclohexyloxycarbonylamino group),
アリールオキシカルボニルアミノ基(好ましくは炭素数7~24のアリールオキシカルボニルアミノ基で、例えば、フェノキシカルボニルアミノ基)、スルホンアミド基(好ましくは炭素数1~24のスルホンアミド基で、例えば、メタンスルホンアミド基、ブタンスルホンアミド基、ベンゼンスルホンアミド基、ヘキサデカンスルホンアミド基、シクロヘキサンスルホンアミド基)、スルファモイルアミノ基(好ましくは炭素数1~24のスルファモイルアミノ基で、例えば、N、N-ジプロピルスルファモイルアミノ基、N-エチル-N-ドデシルスルファモイルアミノ基)、アゾ基(好ましくは炭素数1~24のアゾ基で、例えば、フェニルアゾ基、3-ピラゾリルアゾ基)、アルキルチオ基(好ましくは炭素数1~24のアルキルチオ基で、例えば、メチルチオ基、エチルチオ基、オクチルチオ基、シクロヘキシルチオ基)、アリールチオ基(好ましくは炭素数6~24のアリールチオ基で、例えば、フェニルチオ基)、ヘテロ環チオ基(好ましくは炭素数1~18のヘテロ環チオ基で、例えば、2-ベンゾチアゾリルチオ基、2-ピリジルチオ基、1-フェニルテトラゾリルチオ基)、アルキルスルフィニル基(好ましくは炭素数1~24のアルキルスルフィニル基で、例えば、ドデカンスルフィニル基)、アリールスルフィニル基(好ましくは炭素数6~24のアリールスルフィニル基で、例えば、フェニルスルフィニル基)、アルキルスルホニル基(好ましくは炭素数1~24のアルキルスルホニル基で、例えば、メチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、ブチルスルホニル基、イソプロピルスルホニル基、2-エチルヘキシルスルホニル基、ヘキサデシルスルホニル基、オクチルスルホニル基、シクロヘキシルスルホニル基)、アリールスルホニル基(好ましくは炭素数6~24のアリールスルホニル基で、例えば、フェニルスルホニル基、1-ナフチルスルホニル基)、 An aryloxycarbonylamino group (preferably an aryloxycarbonylamino group having 7 to 24 carbon atoms, such as a phenoxycarbonylamino group), a sulfonamide group (preferably a sulfonamide group having 1 to 24 carbon atoms, such as methanesulfone Amide group, butanesulfonamide group, benzenesulfonamide group, hexadecanesulfonamide group, cyclohexanesulfonamide group), sulfamoylamino group (preferably a sulfamoylamino group having 1 to 24 carbon atoms, for example, N, N -Dipropylsulfamoylamino group, N-ethyl-N-dodecylsulfamoylamino group), azo group (preferably an azo group having 1 to 24 carbon atoms, such as phenylazo group, 3-pyrazolylazo group), alkylthio Group (preferably an alkyl group having 1 to 24 carbon atoms) Group, for example, methylthio group, ethylthio group, octylthio group, cyclohexylthio group), arylthio group (preferably arylthio group having 6 to 24 carbon atoms, for example, phenylthio group), heterocyclic thio group (preferably having 1 carbon atom) A heterocyclic thio group having ˜18, for example, 2-benzothiazolylthio group, 2-pyridylthio group, 1-phenyltetrazolylthio group), alkylsulfinyl group (preferably an alkylsulfinyl group having 1 to 24 carbon atoms, For example, dodecanesulfinyl group), arylsulfinyl group (preferably arylsulfinyl group having 6 to 24 carbon atoms, such as phenylsulfinyl group), alkylsulfonyl group (preferably alkylsulfonyl group having 1 to 24 carbon atoms, for example, Methylsulfonyl group, ethylsulfonyl group, propylene A sulfonyl group, a butylsulfonyl group, an isopropylsulfonyl group, a 2-ethylhexylsulfonyl group, a hexadecylsulfonyl group, an octylsulfonyl group, a cyclohexylsulfonyl group), an arylsulfonyl group (preferably an arylsulfonyl group having 6 to 24 carbon atoms, Phenylsulfonyl group, 1-naphthylsulfonyl group),
スルファモイル基(好ましくは炭素数24以下のスルファモイル基で、例えば、スルファモイル基、N,N-ジプロピルスルファモイル基、N-エチル-N-ドデシルスルファモイル基、N-エチル-N-フェニルスルファモイル基、N-シクロヘキシルスルファモイル基)、スルホ基、ホスホニル基(好ましくは炭素数1~24のホスホニル基で、例えば、フェノキシホスホニル基、オクチルオキシホスホニル基、フェニルホスホニル基)、ホスフィノイルアミノ基(好ましくは炭素数1~24のホスフィノイルアミノ基で、例えば、ジエトキシホスフィノイルアミノ基、ジオクチルオキシホスフィノイルアミノ基)を表す。 Sulfamoyl group (preferably a sulfamoyl group having 24 or less carbon atoms, such as sulfamoyl group, N, N-dipropylsulfamoyl group, N-ethyl-N-dodecylsulfamoyl group, N-ethyl-N-phenylsulfa group) Moyl group, N-cyclohexylsulfamoyl group), sulfo group, phosphonyl group (preferably phosphonyl group having 1 to 24 carbon atoms, such as phenoxyphosphonyl group, octyloxyphosphonyl group, phenylphosphonyl group), phosphine group It represents a finoylamino group (preferably a phosphinoylamino group having 1 to 24 carbon atoms, such as a diethoxyphosphinoylamino group or a dioctyloxyphosphinoylamino group).
 また、置換基Tは、特にアルカリ性現像液に対する現像性を向上させる目的で、アルカリ性水溶液可溶化部、例えば、カルボン酸基、スルホン酸基、リン酸基、スルホンイミド基、フェノール性水酸基、アセトアセタミド基、アセト酢酸エステル基等の置換基及び、それらの基が置換されるアルキル基、アルキルオキシ基、アルキルチオ基、アリールオキシ基、アリールチオ基、アルキルスルホニル基、アリールスルホニル基等の置換基が好ましく用いられる。 Further, the substituent T is an alkaline aqueous solution solubilized part, for example, a carboxylic acid group, a sulfonic acid group, a phosphoric acid group, a sulfonimide group, a phenolic hydroxyl group, an acetoacetamide group, for the purpose of improving developability with respect to an alkaline developer. Substituents such as acetoacetic ester groups and substituents such as alkyl groups, alkyloxy groups, alkylthio groups, aryloxy groups, arylthio groups, alkylsulfonyl groups, arylsulfonyl groups and the like in which these groups are substituted are preferably used. .
 上述した置換基がさらに置換可能な基である場合には、上述した各置換基のいずれかによってさらに置換されていてもよい。なお、2個以上の置換基を有している場合には、それらの置換基は同一であっても異なっていてもよい。ただし、本発明における置換基は、1分子あたりの質量が、500以下であることが好ましい。 When the above-described substituent is a further substitutable group, it may be further substituted with any of the above-described substituents. In addition, when it has two or more substituents, those substituents may be the same or different. However, the substituent in the present invention preferably has a mass per molecule of 500 or less.
<一般式(XI)ないし一般式(XII)で表される染料>
 (E)着色剤として、一般式(XI)ないしは一般式(XII)で表される染料を用いることが出来る。
<Dyes represented by general formula (XI) to general formula (XII)>
(E) As the colorant, a dye represented by formula (XI) or formula (XII) can be used.
Figure JPOXMLDOC01-appb-C000030

 
 
Figure JPOXMLDOC01-appb-C000030

 
 
 一般式(XI)中、R33、R34、R35及びR36は、それぞれ独立に、水素原子、アルキル基、アルコキシ基、アルコキシカルボニル基、カルバモイル基、スルファモイル基、スルホニルアミノ基、カルボニルアミノ基、シアノ基、アリール基、又はヘテロアリール基を表し、分子内に複数存在するR33及びR34は、それぞれ互いに同じでも、異なっていてもよい。 In the general formula (XI), R 33 , R 34 , R 35 and R 36 are each independently a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a sulfonylamino group, or a carbonylamino group. , A cyano group, an aryl group, or a heteroaryl group, and a plurality of R 33 and R 34 present in the molecule may be the same as or different from each other.
Figure JPOXMLDOC01-appb-C000031

 
Figure JPOXMLDOC01-appb-C000031

 
 一般式(XII)中、R36、R37、R38、R39、及びR40は、それぞれ独立に、水素原子、アルキル基、アルコキシ基、アルコキシカルボニル基、カルバモイル基、スルファモイル基、スルホニルアミノ基、カルボニルアミノ基、シアノ基、アリール基、又はヘテロアリール基を表し、分子内に複数存在するR37は、互いに同じでも、異なっていてもよい。 In general formula (XII), R 36 , R 37 , R 38 , R 39 , and R 40 are each independently a hydrogen atom, an alkyl group, an alkoxy group, an alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, or a sulfonylamino group. , A carbonylamino group, a cyano group, an aryl group, or a heteroaryl group, and a plurality of R 37 present in the molecule may be the same as or different from each other.
 一般式(XI)ないし(XII)で表される染料の構造としてより好ましい置換基について説明する。一般式(XI)におけるR33及び一般式(XII)におけるR37としては、アルキル基、アリール基、又はシアノ基が好ましく、アルキル基、及び、アリール基はさらに置換基を有していてもよい。ここで、アルキル基及びアリール基に導入可能な置換基としては、アルコキシ基、チオアルコキシ基、シアノ基、及びハロゲン原子などが挙げられる。
 R33及びR37としては、より好ましくはt-ブチル基、フェニル基、又はo-メチルフェニル基が挙げられる。
Substituents that are more preferable as the structures of the dyes represented by the general formulas (XI) to (XII) will be described. R 33 in the general formula (XI) and R 37 in the general formula (XII) are preferably an alkyl group, an aryl group, or a cyano group, and the alkyl group and the aryl group may further have a substituent. . Here, examples of the substituent that can be introduced into the alkyl group and the aryl group include an alkoxy group, a thioalkoxy group, a cyano group, and a halogen atom.
R 33 and R 37 are more preferably a t-butyl group, a phenyl group, or an o-methylphenyl group.
 一般式(XI)におけるR35としてより好ましくは水素原子であり、一般式(XI)及び一般式(XII)におけるR36として好ましくは水素原子、又はメチル基であり、より好ましくは水素原子である。R34、R39、及びR40はそれぞれ、水素原子、アルキル基、アルコキシ基、アルコキシカルボニル基、カルバモイル基、スルファモイル基、スルホニルアミノ基、カルボニルアミノ基、シアノ基、アリール基、及び、ヘテロアリール基のいずれであってもよいが、その構造中に置換アルキル基、PEO鎖(ポリエチレングリコール)、PPO鎖(ポリプロピレングリコール)、アンモニウム塩、及び重合性基から選択される部分構造を有する、アリール基、アルコキシカルボニル基、カルバモイル基、スルファモイル基、スルホニルアミノ基、又は、カルボニルアミノ基であることが好ましく、より好ましくは前記部分構造を有するスルホニルアミノ基である。分子内に複数存在するR34は互いに同じでも、異なっていてもよいが、同じであることが好ましい。
好適な染料としては以下があげられる。
R 35 in general formula (XI) is more preferably a hydrogen atom, and R 36 in general formula (XI) and general formula (XII) is preferably a hydrogen atom or a methyl group, more preferably a hydrogen atom. . R 34 , R 39 , and R 40 are each a hydrogen atom, alkyl group, alkoxy group, alkoxycarbonyl group, carbamoyl group, sulfamoyl group, sulfonylamino group, carbonylamino group, cyano group, aryl group, and heteroaryl group An aryl group having a partial structure selected from a substituted alkyl group, a PEO chain (polyethylene glycol), a PPO chain (polypropylene glycol), an ammonium salt, and a polymerizable group in the structure thereof, An alkoxycarbonyl group, a carbamoyl group, a sulfamoyl group, a sulfonylamino group, or a carbonylamino group is preferable, and a sulfonylamino group having the partial structure is more preferable. A plurality of R 34 present in the molecule may be the same or different from each other, but are preferably the same.
Suitable dyes include the following.
Figure JPOXMLDOC01-appb-C000032

 
Figure JPOXMLDOC01-appb-C000032

 
<一般式(XIII)で表される染料>
 (E)着色剤として、一般式(XIII)で表される染料を用いることが出来る。
<Dye represented by general formula (XIII)>
(E) As a coloring agent, the dye represented by general formula (XIII) can be used.
Figure JPOXMLDOC01-appb-C000033

 
Figure JPOXMLDOC01-appb-C000033

 
 一般式(XIII)中、R41及びR42は、各々独立に、水素原子、又は1価の置換基を表す。R43は、水素原子、脂肪族基、アリール基、ヘテロ環基、カルバモイル基、アルコキシカルボニル基、アリールオキシカルボニル基、アシル基、アルキルスルホニル基、アリールスルホニル基、又はスルファモイル基を表す。Qはジアゾ成分残基を表す。一般式(XIII)で表される色素は、任意の位置で2量体以上の多量体を形成してもよい。 In General Formula (XIII), R 41 and R 42 each independently represent a hydrogen atom or a monovalent substituent. R 43 represents a hydrogen atom, an aliphatic group, an aryl group, a heterocyclic group, a carbamoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group, or a sulfamoyl group. Q represents a diazo component residue. The dye represented by the general formula (XIII) may form a dimer or more multimer at an arbitrary position.
 R41及びR42で表される1価の置換基として具体的には、各々独立して、ハロゲン原子、脂肪族基、アリール基、ヘテロ環基、シアノ基、カルボキシル基、カルバモイル基、脂肪族オキシカルボニル基、アリールオキシカルボニル基、アシル基、ヒドロキシ基、脂肪族オキシ基、アリールオキシ基、アシルオキシ基、カルバモイルオキシ基、ヘテロ環オキシ基、アミノ基、脂肪族アミノ基、アリールアミノ基、ヘテロ環アミノ基、アシルアミノ基、カルバモイルアミノ基、スルファモイルアミノ基、脂肪族オキシカルボニルアミノ基、アリールオキシカルボニルアミノ基、脂肪族スルホニルアミノ基、アリールスルホニルアミノ基、ニトロ基、脂肪族チオ基、アリールチオ基、脂肪族スルホニル基、アリールスルホニル基、スルファモイル基、スルホ基、イミド基、又はヘテロ環チオ基を表す。これらのうち、脂肪族基、アリール基、ヘテロ環基、シアノ基、カルバモイル基、脂肪族オキシカルボニル基、アリールオキシカルボニル基、アシル基、脂肪族オキシ基、アリールオキシ基、脂肪族アミノ基、又はアリールアミノ基であることが、主に溶解性付与の観点で好ましい。 Specifically, the monovalent substituents represented by R 41 and R 42 are each independently a halogen atom, an aliphatic group, an aryl group, a heterocyclic group, a cyano group, a carboxyl group, a carbamoyl group, an aliphatic group. Oxycarbonyl group, aryloxycarbonyl group, acyl group, hydroxy group, aliphatic oxy group, aryloxy group, acyloxy group, carbamoyloxy group, heterocyclic oxy group, amino group, aliphatic amino group, arylamino group, heterocyclic ring Amino group, acylamino group, carbamoylamino group, sulfamoylamino group, aliphatic oxycarbonylamino group, aryloxycarbonylamino group, aliphatic sulfonylamino group, arylsulfonylamino group, nitro group, aliphatic thio group, arylthio group , Aliphatic sulfonyl group, arylsulfonyl group, sulfamo Group, a sulfo group, an imide group, or a heterocyclic thio group. Among these, aliphatic group, aryl group, heterocyclic group, cyano group, carbamoyl group, aliphatic oxycarbonyl group, aryloxycarbonyl group, acyl group, aliphatic oxy group, aryloxy group, aliphatic amino group, or An arylamino group is preferred mainly from the viewpoint of imparting solubility.
 これらの各基は更に置換されていてもよく、R~Rで表される各1価の置換基は総炭素数が1~40の範囲であり、3~25の範囲が好ましい。この範囲とすることで着色硬化性組成物の保存安定性が良好であり、且つ、輝度の高い着色硬化性組成物が得られる。 Each of these groups may be further substituted, and each monovalent substituent represented by R 1 to R 5 has a total carbon number of 1 to 40, preferably 3 to 25. By setting it as this range, the storage stability of the colored curable composition is good, and a colored curable composition having high brightness can be obtained.
 R41~R43で表される脂肪族基は、置換基を有していてもよく、飽和であっても不飽和であってもよく、環状であってもよい。具体的には、例えば、アルキル基、置換アルキル基、アルケニル基、置換アルケニル基、アルキニル基、置換アルキニル基、アラルキル基及び置換アラルキル基等が挙げられる。脂肪族基の総炭素数は、1~30であることが好ましく、1~16であることが更に好ましい。脂肪族基の具体例としては、例えば、メチル基、エチル基、ブチル基、イソプロピル基、t-ブチル基、ヒドロキシエチル基、メトキシエチル基、シアノエチル基、トリフルオロメチル基、3-スルホプロピル基、4-スルホブチル基、シクロヘキシル基、ベンジル基、2-フェネチル基、ビニル基、及びアリル基等が挙げられる。 The aliphatic group represented by R 41 to R 43 may have a substituent, may be saturated or unsaturated, and may be cyclic. Specific examples include alkyl groups, substituted alkyl groups, alkenyl groups, substituted alkenyl groups, alkynyl groups, substituted alkynyl groups, aralkyl groups, and substituted aralkyl groups. The total number of carbon atoms in the aliphatic group is preferably 1-30, and more preferably 1-16. Specific examples of the aliphatic group include, for example, methyl group, ethyl group, butyl group, isopropyl group, t-butyl group, hydroxyethyl group, methoxyethyl group, cyanoethyl group, trifluoromethyl group, 3-sulfopropyl group, Examples include 4-sulfobutyl group, cyclohexyl group, benzyl group, 2-phenethyl group, vinyl group, and allyl group.
 R41~R43で表されるアリール基は、置換基を有していてもよく、総炭素数は6~30のアリール基が好ましく、6~16のアリール基が更に好ましい。具体的には、例えば、フェニル基、4-トリル基、4-メトキシフェニル基、2-クロロフェニル基、3-(3-スルホプロピルアミノ)フェニル基、4-スルファモイル基、4-エトキシエチルスルファモイル及び3-ジメチルカルバモイル基等が挙げられる。 The aryl group represented by R 41 to R 43 may have a substituent, preferably an aryl group having 6 to 30 carbon atoms, and more preferably an aryl group having 6 to 16 carbon atoms. Specifically, for example, phenyl group, 4-tolyl group, 4-methoxyphenyl group, 2-chlorophenyl group, 3- (3-sulfopropylamino) phenyl group, 4-sulfamoyl group, 4-ethoxyethylsulfamoyl And 3-dimethylcarbamoyl group and the like.
 R41~R43で表されるヘテロ環基としては、飽和であっても不飽和であってもよく、以下の芳香族ヘテロ環基を含み、環内に窒素原子、イオウ原子、酸素原子等のヘテロ原子のいずれかを含むものが挙げられ、更に置換基を有していてもよく、総炭素数1~30のヘテロ環基であることが好ましく、1~15のヘテロ環基であることは更に好ましい。具体的には、例えば、2-ピリジル基、2-チエニル基、2-チアゾリル基、2-ベンゾチアゾリル基、2-ベンゾオキサゾリル基及び2-フリル基等が挙げられる。 The heterocyclic group represented by R 41 to R 43 may be saturated or unsaturated, and includes the following aromatic heterocyclic groups, including a nitrogen atom, a sulfur atom, an oxygen atom, etc. Including any of the above heteroatoms, may further have a substituent, and is preferably a heterocyclic group having 1 to 30 carbon atoms in total, and a heterocyclic group having 1 to 15 carbon atoms. Is more preferable. Specific examples include 2-pyridyl group, 2-thienyl group, 2-thiazolyl group, 2-benzothiazolyl group, 2-benzoxazolyl group, 2-furyl group and the like.
 R41~R43で表されるカルバモイル基は、置換基を有していてもよく、総炭素数1~30のカルバモイル基が好ましく、炭素原子数1~16のカルバモイル基であることが更に好ましい。具体的には、例えば、メチルカルバモイル基、ジメチルカルバモイル基、フェニルカルバモイル及びN-メチル-N-フェニルカルバモイル基等が挙げられる。 The carbamoyl group represented by R 41 to R 43 may have a substituent, is preferably a carbamoyl group having 1 to 30 carbon atoms, and more preferably a carbamoyl group having 1 to 16 carbon atoms. . Specific examples include a methylcarbamoyl group, a dimethylcarbamoyl group, a phenylcarbamoyl group, and an N-methyl-N-phenylcarbamoyl group.
 R41~R43で表される脂肪族オキシカルボニル基は、置換基を有していてもよく、飽和であっても不飽和であってもよく、環状であってもよく、総炭素数2~30の脂肪族オキシカルボニル基が好ましく、総炭素数2~16の脂肪族オキシカルボニル基であることが更に好ましい。具体的には、例えば、メトキシカルボニル基、エトキシカルボニル基及び2-メトキシエトキシカルボニル基等が挙げられる。 The aliphatic oxycarbonyl group represented by R 41 to R 43 may have a substituent, may be saturated or unsaturated, may be cyclic, and has a total number of carbon atoms of 2 An aliphatic oxycarbonyl group having 30 to 30 carbon atoms is preferable, and an aliphatic oxycarbonyl group having 2 to 16 carbon atoms in total is more preferable. Specific examples include a methoxycarbonyl group, an ethoxycarbonyl group, and a 2-methoxyethoxycarbonyl group.
 R41~R43で表されるアリールオキシカルボニル基は、置換基を有していてもよく、総炭素数7~30のアリールオキシカルボニル基が好ましく、炭素原子数7~16のアリールオキシカルボニル基が更に好ましい。具体的には、例えば、フェノキシカルボニル基、4-メチルフェノキシカルボニル基及び3-クロルフェノキシカルボニル基等が挙げられる。 The aryloxycarbonyl group represented by R 41 to R 43 may have a substituent, preferably an aryloxycarbonyl group having 7 to 30 carbon atoms in total, and an aryloxycarbonyl group having 7 to 16 carbon atoms. Is more preferable. Specific examples include a phenoxycarbonyl group, a 4-methylphenoxycarbonyl group, and a 3-chlorophenoxycarbonyl group.
 R41~R43で表されるアシル基には、脂肪族カルボニル基、アリールカルボニル基、及び、ヘテロ環カルボニル基が含まれ、総炭素数が1~30である態様が好ましく、総炭素数が1~16である態様が更に好ましい。具体的には、例えば、アセチル基、メトキシアセチル基、チエノイル基及びベンゾイル基等が挙げられる。 The acyl group represented by R 41 to R 43 includes an aliphatic carbonyl group, an arylcarbonyl group, and a heterocyclic carbonyl group, and preferably has a total carbon number of 1 to 30, and has a total carbon number of An embodiment having 1 to 16 is more preferable. Specific examples include an acetyl group, a methoxyacetyl group, a thienoyl group, and a benzoyl group.
 R41~R43で表される脂肪族スルホニル基は、置換基を有していてもよく、飽和であっても不飽和であってもよく、環状であってもよく、総炭素数1~30である態様が好ましく、総炭素数1~16である態様が更に好ましい。具体的には、例えば、メタンスルホニル基、メトキシメタンスルホニル及びエトキシエタンスルホニル基等が挙げられる。 The aliphatic sulfonyl group represented by R 41 to R 43 may have a substituent, may be saturated or unsaturated, may be cyclic, and has a total carbon number of 1 to An embodiment having 30 is preferable, and an embodiment having 1 to 16 total carbon atoms is more preferable. Specifically, a methanesulfonyl group, a methoxymethanesulfonyl, an ethoxyethanesulfonyl group, etc. are mentioned, for example.
 R41~R43で表されるアリールスルホニル基は、置換基を有していてもよく、総炭素数6~30である態様が好ましく、総炭素数6~18である態様が更に好ましい。具体的には、例えば、ベンゼンスルホニル及びトルエンスルホニル基等が挙げられる。 The arylsulfonyl group represented by R 41 to R 43 may have a substituent, and preferably has a total carbon number of 6 to 30, and more preferably has a total carbon number of 6 to 18. Specific examples include benzenesulfonyl and toluenesulfonyl groups.
 R41~R43で表されるスルファモイル基は、置換基を有していてもよく、総炭素数0~30である態様が好ましく、総炭素数0~16である態様が更に好ましい。具体的には、例えば、スルファモイル基、ジメチルスルファモイル基及びジ-(2-ヒドロキシエチル)スルファモイル基等が挙げられる。 The sulfamoyl group represented by R 41 to R 43 may have a substituent, and preferably has a total carbon number of 0 to 30, more preferably a total carbon number of 0 to 16. Specific examples include a sulfamoyl group, a dimethylsulfamoyl group, and a di- (2-hydroxyethyl) sulfamoyl group.
 R41~R43で表されるイミド基は、置換基を有していてもよく、5~6員環のイミド基が好ましい。また、イミド基の総炭素数は4~30である態様が好ましく、4~20である態様が更に好ましい。具体的には、例えば、コハク酸イミド及びフタル酸イミド基等が挙げられる。 The imide group represented by R 41 to R 43 may have a substituent and is preferably a 5- to 6-membered imide group. In addition, an embodiment in which the total number of carbon atoms in the imide group is 4 to 30 is preferable, and an embodiment in which 4 to 20 carbon atoms are more preferable. Specific examples include succinimide and phthalimide groups.
 Qで表されるジアゾ成分残基は、ジアゾ成分「B-NH」の残基であることを意味する。特に、目標とする色再現性の点から、Qはアリール基又は芳香族ヘテロ環基であることが好ましい。が好ましい。 The diazo component residue represented by Q means the residue of the diazo component “B—NH 2 ”. In particular, from the viewpoint of target color reproducibility, Q is preferably an aryl group or an aromatic heterocyclic group. Is preferred.
 ここで、芳香族ヘテロ環基とは、環内に窒素原子、イオウ原子、酸素原子等のヘテロ原子のいずれかを含む芳香族環であって、5~6員環が好ましい。芳香族ヘテロ環基の炭素原子数としては、1~25が好ましく、1~15が更に好ましい。芳香族ヘテロ環としては、具体的には、ピラゾール基、1,2,4-トリアゾール基、イソチアゾール基、ベンゾイソチアゾール基、チアゾール基、ベンゾチアゾール基、オキサゾール基、1,2,4チアジアゾール基等が挙げられる。 Here, the aromatic heterocyclic group is an aromatic ring containing any one of hetero atoms such as nitrogen atom, sulfur atom and oxygen atom in the ring, and preferably a 5- to 6-membered ring. The number of carbon atoms in the aromatic heterocyclic group is preferably 1 to 25, and more preferably 1 to 15. Specific examples of the aromatic heterocycle include pyrazole group, 1,2,4-triazole group, isothiazole group, benzoisothiazole group, thiazole group, benzothiazole group, oxazole group, 1,2,4 thiadiazole group. Etc.
 特に、一般式(XIII)で表される化合物は、以下の態様であることが好ましい。
 即ち、R41がシアノ基、脂肪族オキシカルボニル基又はカルバモイル基であり、R42が脂肪族基であり、R43が脂肪族基、アシル基、アリール基、脂肪族カルボニル基、脂肪族スルホニル基又はアリールスルホニル基であり、Qがアリール基である態様。
In particular, the compound represented by the general formula (XIII) preferably has the following mode.
That is, R 41 is a cyano group, aliphatic oxycarbonyl group or carbamoyl group, R 42 is an aliphatic group, R 43 is an aliphatic group, acyl group, aryl group, aliphatic carbonyl group, aliphatic sulfonyl group Or an arylsulfonyl group, and Q is an aryl group.
 以上、一般式(I)~一般式(XIII)で示された化合物の具体的な例としては、例えば特開2008-292970号公報、特開2010-32999号公報、特開2008-304766号公報、特開2010-168531号公報、特開平06-230210号公報、特開2010-256598号公報、特開2012-237996号公報、特許公報第3387541号、特開2011-164564号公報、特開2012-32754号公報に記載の化合物を挙げることができるが、本発明の趣旨を超えない限り、これらの例の記載に限定されるものではない。 As described above, specific examples of the compounds represented by the general formulas (I) to (XIII) include, for example, Japanese Patent Application Laid-Open Nos. 2008-292970, 2010-32999, and 2008-304766. JP 2010-168531, JP 06230210, JP 2010-256598, JP 2012-237996, JP 3387541, JP 2011-164564, JP 2012. Although the compounds described in Japanese Patent No. -32754 can be mentioned, it is not limited to the description of these examples as long as the gist of the present invention is not exceeded.
<その他の着色剤>
 前述の通り、本発明の着色剤は、顔料を染料と併用する、ないしは耐熱性を重視するなどの理由から顔料のみから構成されることも可能である。
 顔料としては、従来公知の種々の無機顔料又は有機顔料を用いることができるが、信頼性の観点で有機顔料を用いることが好ましい。本発明において有機顔料として、例えば、特開2009-256572号公報の段落〔0093〕に記載の有機顔料が挙げられる。
<Other colorants>
As described above, the colorant of the present invention can be composed of only a pigment for reasons such as using a pigment in combination with a dye, or placing importance on heat resistance.
Conventionally known various inorganic pigments or organic pigments can be used as the pigment, but organic pigments are preferably used from the viewpoint of reliability. Examples of the organic pigment in the present invention include organic pigments described in paragraph [0093] of JP-A-2009-256572.
 また特に、以下に示す顔料が、色再現性の観点で好適であるが、本発明においてはこれらに限定されるものではない。これら有機顔料は、単独で、または、色純度を上げるため種々組合せて用いることもできる。 In particular, the following pigments are suitable from the viewpoint of color reproducibility, but are not limited to these in the present invention. These organic pigments can be used alone or in various combinations in order to increase color purity.
 C.I.Pigment Red 1、2、3、4、5、6、7、9、10、14、17、22、23、31、38、41、48:1、48:2、48:3、48:4、49、49:1、49:2、52:1、52:2、53:1、57:1、60:1、63:1、66、67、81:1、81:2、81:3、83、88、90、105、112、119、122、123、144、146、149、150、155、166、168、169、170、171、172、175、176、177、178、179、184、185、187、188、190、200、202、206、207、208、209、210、216、220、224、226、242、246、254、255、264、270、272、279 C. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 52: 1, 52: 2, 53: 1, 57: 1, 60: 1, 63: 1, 66, 67, 81: 1, 81: 2, 81: 3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184, 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 270, 272, 279
 C.I.Pigment Yellow 1、2、3、4、5、6、10、11、12、13、14、15、16、17、18、20、24、31、32、34、35、35:1、36、36:1、37、37:1、40、42、43、53、55、60、61、62、63、65、73、74、77、81、83、86、93、94、95、97、98、100、101、104、106、108、109、110、113、114、115、116、117、118、119、120、123、125、126、127、128、129、137、138、139、147、148、150、151、152、153、154、155、156、161、162、164、166、167、168、169、170、171、172、173、174、175、176、177、179、180、181、182、185、187、188、193、194、199、213、214 C. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 1 4,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214
 C.I.Pigment Orange 2、5、13、16、17:1、31、34、36、38、43、46、48、49、51、52、55、59、60、61、62、64、71、73
 C.I.Pigment Blue 1、2、15、15:1、15:2、15:3、15:4、15:6、16、22、60、64、66、79、79のCl置換基をOHに変更したもの、80
 C.I.Pigment Violet 1、19、23、27、32、37、42
 C.I.Pigment Brown 25、28
 C.I.Pigment Black 1、樹脂で被覆されたカーボンブラックなど。
カーボンブラックの例としては、以下のようなカーボンブラックが挙げられる。
C. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73
C. I. Pigment Blue 1, 2, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 66, 79, 79 Cl substituent was changed to OH Stuff, 80
C. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42
C. I. Pigment Brown 25, 28
C. I. Pigment Black 1, carbon black coated with resin, and the like.
Examples of carbon black include the following carbon black.
 三菱化学社製:MA7、MA8、MA11、MA100、MA100R、MA220、MA230、MA600、#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#3050、#3150、#3250、#3600、#3750、#3950、#4000、#4010、OIL7B、OIL9B、OIL11B、OIL30B、OIL31B デグサ社製:Printex3、Printex3OP、Printex30、Printex30OP、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V、PrintexG、SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、Color Black FW1、Color Black FW2、Color Black FW2V、Color Black FW18、Color Black FW18、Color Black FW200、Color Black S160、Color Black S170 Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA100, MA100R, MA220, MA230, MA600, # 5, # 10, # 20, # 25, # 30, # 32, # 33, # 40, # 44, # 45 # 47, # 50, # 52, # 55, # 650, # 750, # 850, # 950, # 960, # 970, # 980, # 990, # 1000, # 2200, # 2300, # 2350, # 2400, # 2600, # 3050, # 3150, # 3250, # 3600, # 3750, # 3950, # 4000, # 4010, OIL7B, OIL9B, OIL11B, OIL30B, OIL31B Made by Degussa: Printex3, Printex3OP, Printex30, Printex30OP Printex40, Printex45, P intex55, Printex60, Printex75, Printex80, Printex85, Printex90, Printex A, Printex L, Printex G, Printex P, Printex U, Printex V, PrintexG, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW18, Color Black FW20 , Color Black S160, Color Black S170
 キャボット社製:Monarch120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACK PEARLS480、PEARLS130、VULCAN XC72R、ELFTEX-8、コロンビヤン カーボン社製:RAVEN11、RAVEN14、RAVEN15、RAVEN16、RAVEN22RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000 Cabot Corporation: Monarch120, Monarch280, Monarch460, Monarch800, Monarch880, Monarch900, Monarch1000, Monarch1100, Monarch1300, Monarch1400, Monarch4630, REGAL99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R, REGAL55R0, REGAL660R, BLACK PEARLS480, PEARLS130 , VULCAN XC72R, ELFTEX-8, Colombian Carbon Corporation: RAVEN11, RAVEN14, RAVEN15, RAVEN16, RAVEN22RAV N30, Raven35, Raven40, Raven410, Raven420, Raven450, Raven450, Raven500, Raven780, Raven850, Raven890H, Raven1000, Raven1020, Raven1040, Raven1060U, Raven1080U, Raven1170, Raven1190U, Raven1170, Raven1170U RAVEN7000
 また特に、以下に示す顔料が、色再現性の観点で好適であるが、本発明においてはこれらに限定されるものではない。これら有機顔料は、単独で、または、色純度を上げるため種々組合せて用いることもできる。
 C.I.Pigment Red 177、224、242、254、255、264、C.I.Pigment Yellow 138、139、150、180、185、C.I.Pigment Orange 36、38、71、C.I.Pigment Green 7、36、58、C.I.Pigment Blue 15:6、C.I.Pigment Violet 23、樹脂で被覆されたカーボンブラックを使用することが有効である。例えば特開平09-71733号公報に記載されているカーボンブラック等が好適に使用できる。
In particular, the following pigments are suitable from the viewpoint of color reproducibility, but are not limited to these in the present invention. These organic pigments can be used alone or in various combinations in order to increase color purity.
C. I. Pigment Red 177, 224, 242, 254, 255, 264, C.I. I. Pigment Yellow 138, 139, 150, 180, 185, C.I. I. Pigment Orange 36, 38, 71, C.I. I. Pigment Green 7, 36, 58, C.I. I. Pigment Blue 15: 6, C.I. I. It is effective to use Pigment Violet 23, a carbon black coated with a resin. For example, carbon black described in JP-A No. 09-71733 can be suitably used.
[(F)屈折率調整材料]
 電子機器では、近年、液晶装置などの表面にタブレット型の入力装置が配置され、液晶装置の画像表示領域に表示された指示画像を参照しながら、この指示画像が表示されている箇所に指またはタッチペンなどを触れることで、指示画像に対応する情報の入力が行えるものがある。
 このような入力装置(タッチパネル)には、抵抗膜型、静電容量型などがあり、静電容量型の入力装置では、例えば、互いに交差する方向に電極パターンを延在させて、指などが接触した際、電極間の静電容量が変化することを検知して入力位置を検出するタイプのものがある。これらの静電容量型入力装置を使用するにあたり、例えば、光源が映り込んだ場合の正反射近傍から少し離れた位置において、透明電極パターンが目立ち、見栄えが優れないなどの視認性の問題があった。
[(F) Refractive index adjusting material]
In recent years, in electronic devices, a tablet-type input device is disposed on the surface of a liquid crystal device or the like, and while referring to an instruction image displayed in an image display area of the liquid crystal device, a finger or There is a type that can input information corresponding to an instruction image by touching a touch pen or the like.
Such an input device (touch panel) includes a resistance film type, a capacitance type, and the like. In the capacitance type input device, for example, an electrode pattern is extended in a direction crossing each other, and a finger or the like is extended. There is a type of detecting the input position by detecting that the capacitance between the electrodes changes when contacted. When using these capacitance-type input devices, for example, the transparent electrode pattern is conspicuous at a position slightly away from the vicinity of regular reflection when the light source is reflected, and there is a problem of visibility such as poor appearance. It was.
 透明電極パターンが視認される問題がない透明積層体の開発が進められており、これは高屈折率材料を使用した透明保護膜である。この透明保護膜はガラス基板上以外にプラスティック基板上にも形成されることが検討されており、本発明の硬化性組成物に高屈折率材料を含有させると有用である。
 本発明の硬化性組成物は、このような屈折率や光透過性を調節することを目的として含有させる屈折率調整材料として、金属酸化物粒子を含有することが好ましい。金属酸化物粒子は、透明性が高く、光透過性を有するため、高屈折率で、透明性に優れた硬化性組成物が得られる。
The development of a transparent laminate free from the problem of visually recognizing the transparent electrode pattern is underway, which is a transparent protective film using a high refractive index material. It has been studied that this transparent protective film is formed on a plastic substrate in addition to a glass substrate, and it is useful to incorporate a high refractive index material into the curable composition of the present invention.
The curable composition of the present invention preferably contains metal oxide particles as a refractive index adjusting material to be included for the purpose of adjusting such refractive index and light transmittance. Since the metal oxide particles have high transparency and light transmittance, a curable composition having a high refractive index and excellent transparency can be obtained.
 前記金属酸化物粒子は、当該粒子を除いた材料からなる硬化性組成物の屈折率より屈折率が高いものであることが好ましく、具体的には、400nm~750nmの波長を有する光における屈折率が1.50以上の粒子がより好ましく、屈折率が1.70以上の粒子が更に好ましく、1.90以上の粒子が特に好ましい。
 ここで、400~750nmの波長を有する光における屈折率が1.50以上であるとは、上記範囲の波長を有する光における平均屈折率が1.50以上であることを意味し、上記範囲の波長を有する全ての光における屈折率が1.50以上であることを要しない。また、平均屈折率は、上記範囲の波長を有する各光に対する屈折率の測定値の総和を、測定点の数で割った値である。
The metal oxide particles preferably have a refractive index higher than the refractive index of the curable composition made of a material excluding the particles, and specifically, the refractive index in light having a wavelength of 400 nm to 750 nm. Are more preferably particles having a refractive index of 1.70 or more, particularly preferably particles having a refractive index of 1.90 or more.
Here, the refractive index of light having a wavelength of 400 to 750 nm being 1.50 or more means that the average refractive index of light having a wavelength in the above range is 1.50 or more. It is not necessary that the refractive index of all light having a wavelength is 1.50 or more. The average refractive index is a value obtained by dividing the sum of the measured values of the refractive index for each light having a wavelength in the above range by the number of measurement points.
 なお、前記金属酸化物粒子の金属には、B、Si、Ge、As、Sb、Te等の半金属も含まれるものとする。
 光透過性で屈折率の高い金属酸化物粒子としては、Be、Mg、Ca、Sr、Ba、Sc、Y、La、Ce、Gd、Tb、Dy、Yb、Lu、Ti、Zr、Hf、Nb、Mo、W、Zn、B、Al、Si、Ge、Sn、Pb、Sb、Bi、Te等の原子を含む酸化物粒子が好ましく、酸化チタン、チタン複合酸化物、酸化亜鉛、酸化ジルコニウム、インジウム/スズ酸化物、アンチモン/スズ酸化物がより好ましく、酸化チタン、チタン複合酸化物、酸化ジルコニウムが更に好ましく、酸化チタン、酸化ジルコニウムが特に好ましく、二酸化チタンが最も好ましい。二酸化チタンとしては、特に屈折率の高いルチル型が好ましい。これら金属酸化物粒子は、分散安定性付与のために表面を有機材料で処理することもできる。又、日産化学工業(株)製ハイパーテックUR―101も好適に用いられる。
In addition, the metal of the metal oxide particles includes semimetals such as B, Si, Ge, As, Sb, and Te.
The light-transmitting and high refractive index metal oxide particles include Be, Mg, Ca, Sr, Ba, Sc, Y, La, Ce, Gd, Tb, Dy, Yb, Lu, Ti, Zr, Hf, and Nb. Oxide particles containing atoms such as Mo, W, Zn, B, Al, Si, Ge, Sn, Pb, Sb, Bi, and Te are preferable. Titanium oxide, titanium composite oxide, zinc oxide, zirconium oxide, indium / Tin oxide and antimony / tin oxide are more preferable, titanium oxide, titanium composite oxide and zirconium oxide are more preferable, titanium oxide and zirconium oxide are particularly preferable, and titanium dioxide is most preferable. Titanium dioxide is particularly preferably a rutile type having a high refractive index. The surface of these metal oxide particles can be treated with an organic material in order to impart dispersion stability. Further, Hypertech UR-101 manufactured by Nissan Chemical Industries, Ltd. is also preferably used.
 硬化性組成物の透明性の観点から、前記金属酸化物粒子の平均一次粒子径は、1~200nmが好ましく、3~80nmが特に好ましい。ここで粒子の平均一次粒子径は、電子顕微鏡により任意の粒子200個の粒子径を測定し、その算術平均をいう。また、粒子の形状が球形でない場合には、最も長い辺を径とする。
 また、前記金属酸化物粒子は、1種単独で使用してよいし、2種以上を併用することもできる。
From the viewpoint of the transparency of the curable composition, the average primary particle diameter of the metal oxide particles is preferably 1 to 200 nm, particularly preferably 3 to 80 nm. Here, the average primary particle diameter of the particles refers to an arithmetic average obtained by measuring the particle diameter of 200 arbitrary particles with an electron microscope. When the particle shape is not spherical, the longest side is the diameter.
Moreover, the said metal oxide particle may be used individually by 1 type, and can also use 2 or more types together.
 前記硬化性組成物における金属酸化物粒子の含有量は、硬化性組成物により得られる光学部材に要求される屈折率や、光透過性等を考慮して、適宜決定すればよいが、前記硬化性組成物の全固形分に対して、5~80質量%とすることが好ましく、10~70質量%とすることがより好ましい。
 本発明の高屈折率材料を含んでいてもよい硬化性組成物は、前記透明保護膜が、ZrO粒子及びTiO粒子のうち少なくとも一方を有することが、屈折率を制御する観点から好ましく、ZrO粒子がより好ましい。
The content of the metal oxide particles in the curable composition may be appropriately determined in consideration of the refractive index required for the optical member obtained from the curable composition, light transmittance, and the like. The content is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, based on the total solid content of the composition.
In the curable composition which may contain the high refractive index material of the present invention, the transparent protective film preferably has at least one of ZrO 2 particles and TiO 2 particles from the viewpoint of controlling the refractive index, ZrO 2 particles are more preferred.
(有機溶剤)
 本発明の硬化性組成物は、有機溶剤を含有することができる。
 有機溶剤は、並存する各成分の溶解性や硬化性組成物とした場合の塗布性を満足できるものであれば、基本的には特に制限はなく、特に、固形分の溶解性、塗布性、安全性を考慮して選ばれることが好ましい。
(Organic solvent)
The curable composition of the present invention can contain an organic solvent.
The organic solvent is basically not particularly limited as long as it can satisfy the solubility of each of the coexisting components and the applicability when a curable composition is used, and in particular, the solubility of the solids, applicability, It is preferable to select in consideration of safety.
 有機溶剤としては、エステル類として、例えば、酢酸エチル、酢酸-n-ブチル、酢酸イソブチル、ギ酸アミル、酢酸イソアミル、酢酸イソブチル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、乳酸メチル、乳酸エチル、オキシ酢酸アルキルエステル類(例:オキシ酢酸メチル、オキシ酢酸エチル、オキシ酢酸ブチル(具体的には、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル等が挙げられる。))、3-オキシプロピオン酸アルキルエステル類、2-オキシプロピオン酸アルキルエステル類、2-オキシ-2-メチルプロピオン酸メチル、2-オキシ-2-メチルプロピオン酸エチル、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、2-オキソブタン酸メチル、2-オキソブタン酸エチル等が挙げられる。 Examples of organic solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate. Oxyacetic acid alkyl esters (eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (specific examples include methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate). )), 3-oxypropionic acid alkyl esters, 2-oxypropionic acid alkyl esters, methyl 2-oxy-2-methylpropionate, ethyl 2-oxy-2-methylpropionate, methyl pyruvate, ethyl pyruvate , Propyl pyruvate, Seto methyl acetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, and the like.
 また、エーテル類としては、例えば、ジエチレングリコールジメチルエーテル、テトラヒドロフラン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、メチルセロソルブアセテート、エチルセロソルブアセテート、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート等が挙げられる。
 ケトン類としては、例えば、メチルエチルケトン、シクロヘキサノン、2-ヘプタノン、3-ヘプタノン等が挙げられる。
 芳香族炭化水素類としては、例えば、トルエン、キシレン等が好適に挙げられる。
Examples of ethers include diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether. Propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate and the like.
Examples of ketones include methyl ethyl ketone, cyclohexanone, 2-heptanone, and 3-heptanone.
Preferable examples of aromatic hydrocarbons include toluene and xylene.
 これらの有機溶剤は、前述の各成分の溶解性、及びアルカリ可溶性バインダーを含む場合はその溶解性、塗布面状の改良などの観点から、2種以上を混合することも好ましい。この場合、特に好ましくは、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、シクロヘキサノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールメチルエーテル、及びプロピレングリコールメチルエーテルアセテートから選択される2種以上で構成される混合溶液である。 These organic solvents are also preferably mixed in a combination of two or more from the viewpoints of the solubility of each of the aforementioned components and, when an alkali-soluble binder is included, the solubility of the components and the improvement of the coated surface. In this case, particularly preferably, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol It is a mixed solution composed of two or more selected from acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.
 有機溶剤の硬化性組成物中における含有量としては、硬化性組成物中の全固形分濃度が10質量%~80質量%になる量が好ましく、15質量%~60質量%になる量がより好ましい。 The content of the organic solvent in the curable composition is preferably such that the total solid concentration in the curable composition is 10% by mass to 80% by mass, more preferably 15% by mass to 60% by mass. preferable.
(界面活性剤)
 本発明の硬化性組成物は、界面活性剤を含有してもよい。
 界面活性剤としては、アニオン系、カチオン系、ノニオン系、又は、両性のいずれでも使用することができるが、好ましい界面活性剤はノニオン系界面活性剤である。具体的には、特開2009-098616号公報の段落0058に記載のノニオン系界面活性剤が挙げられ、中でもフッ素系界面活性剤が好ましい。
 本発明に用いることができるこの他の界面活性剤としては、例えば、市販品である、メガファックF142D、同F172、同F173、同F176、同F177、同F183、同F479、同F482、同F554、同F780、同F781、同F781-F、同R30、同R08、同F-472SF、同BL20、同R-61、同R-90(DIC(株)製)、フロラードFC-135、同FC-170C、同FC-430、同FC-431、Novec FC-4430(住友スリーエム(株)製)、アサヒガードAG7105,7000,950,7600、サーフロンS-112、同S-113、同S-131、同S-141、同S-145、同S-382、同SC-101、同SC-102、同SC-103、同SC-104、同SC-105、同SC-106(旭硝子(株)製)、エフトップEF351、同352、同801、同802(三菱マテリアル電子化成(株)製
)、フタージェント250(ネオス(株)製)などが挙げられる。
 また、界面活性剤として、下記式(W)で表される構成単位A及び構成単位Bを含み、テトラヒドロフランを溶媒としてゲルパーミエーションクロマトグラフィで測定されるポリスチレン換算の重量平均分子量(Mw)が1,000以上10,000以下である共重合体を好ましい例として挙げることができる。
(Surfactant)
The curable composition of the present invention may contain a surfactant.
As the surfactant, any of anionic, cationic, nonionic, or amphoteric surfactants can be used, but a preferred surfactant is a nonionic surfactant. Specific examples include nonionic surfactants described in paragraph 0058 of JP-A-2009-098616, and among them, fluorine surfactants are preferable.
Other surfactants that can be used in the present invention include, for example, commercially available products such as MegaFuck F142D, F172, F173, F176, F177, F183, F479, F482, and F554. F780, F781, F781-F, R30, R08, F-472SF, BL20, R-61, R-90 (manufactured by DIC Corporation), Florard FC-135, FC -170C, FC-430, FC-431, Novec FC-4430 (manufactured by Sumitomo 3M), Asahi Guard AG7105,7000,950,7600, Surflon S-112, S-113, S-131 S-141, S-145, S-382, SC-101, SC-102, SC-103, SC-104, SC-105, SC-106 (manufactured by Asahi Glass Co., Ltd.), Ftop EF351, 352, 801, 802 (manufactured by Mitsubishi Materials Electronic Chemicals Co., Ltd.), Footgent 250 (manufactured by Neos Co., Ltd.), etc. Is mentioned.
Further, as the surfactant, the structural unit A and the structural unit B represented by the following formula (W) are included, and the weight average molecular weight (Mw) in terms of polystyrene measured by gel permeation chromatography using tetrahydrofuran as a solvent is 1, A copolymer having a molecular weight of 000 or more and 10,000 or less can be given as a preferred example.
Figure JPOXMLDOC01-appb-C000034

 
Figure JPOXMLDOC01-appb-C000034

 
 (式(W)中、R及びRはそれぞれ独立に、水素原子又はメチル基を表し、Rは炭素数1以上4以下の直鎖アルキレン基を表し、Rは水素原子又は炭素数1以上4以下のアルキル基を表し、Lは炭素数3以上6以下のアルキレン基を表し、p及びqは重合比を表す重量百分率であり、pは10質量%以上80質量%以下の数値を表し、qは20質量%以上90質量%以下の数値を表し、rは1以上18以下の整数を表し、nは1以上10以下の整数を表す。) (In Formula (W), R 1 and R 3 each independently represent a hydrogen atom or a methyl group, R 2 represents a linear alkylene group having 1 to 4 carbon atoms, and R 4 represents a hydrogen atom or carbon number. 1 represents an alkyl group having 4 or less, L represents an alkylene group having 3 to 6 carbon atoms, p and q are weight percentages representing a polymerization ratio, and p is a numerical value of 10% by mass to 80% by mass. Q represents a numerical value of 20% to 90% by mass, r represents an integer of 1 to 18, and n represents an integer of 1 to 10.
 前記Lは、下記式(W-2)で表される分岐アルキレン基であることが好ましい。式(W-2)におけるRは、炭素数1以上4以下のアルキル基を表し、相溶性と被塗布面に対する濡れ性の点で、炭素数1以上3以下のアルキル基が好ましく、炭素数2又は3のアルキル基がより好ましい。
 式(W)におけるpとqとの和(p+q)は、p+q=100、すなわち、100質量%であることが好ましい。
 前記共重合体の重量平均分子量(Mw)は、1,500以上5,000以下がより好ましい。
L is preferably a branched alkylene group represented by the following formula (W-2). R 5 in Formula (W-2) represents an alkyl group having 1 to 4 carbon atoms, and is preferably an alkyl group having 1 to 3 carbon atoms in terms of compatibility and wettability with respect to the coated surface. Two or three alkyl groups are more preferred.
The sum (p + q) of p and q in the formula (W) is preferably p + q = 100, that is, 100% by mass.
The weight average molecular weight (Mw) of the copolymer is more preferably from 1,500 to 5,000.
Figure JPOXMLDOC01-appb-C000035

 
Figure JPOXMLDOC01-appb-C000035

 
 これら界面活性剤は、1種単独で又は2種以上を使用することができる。
 本発明の硬化性組成物における界面活性剤の添加量は、硬化性組成物の全固形分中0.01~2.0質量%が好ましく、0.02~1.0質量%が特に好ましい。この範囲であると、塗布性及び硬化膜の均一性が良好となる。
These surfactants can be used alone or in combination of two or more.
The addition amount of the surfactant in the curable composition of the present invention is preferably 0.01 to 2.0% by mass, particularly preferably 0.02 to 1.0% by mass in the total solid content of the curable composition. Within this range, the coatability and the uniformity of the cured film are good.
(密着改良剤)
 本発明の硬化性組成物は、密着改良剤を含有してもよい。
 密着改良剤は、支持体となる無機物、例えば、ガラス、シリコン、酸化シリコン、窒化シリコン等のシリコン化合物、金、銅、アルミニウム等と着色硬化性組成物層の硬化膜との密着性を向上させる化合物である。具体的には、シランカップリング剤等が挙げられる。密着改良剤としてのシランカップリング剤は、界面の改質を目的とするものであり、特に限定することなく、公知のものを使用することができる。
 シランカップリング剤としては、特開2009-98616号公報の段落0048に記載のシランカップリング剤が好ましく、中でもγ-グリシドキシプロピルトリアルコキシシランやγ-メタクリロキシプロピルトリアルコキシシランがより好ましい。これらは1種単独又は2種以上を併用できる。
 本発明の硬化性組成物における密着改良剤の含有量は、硬化性組成物の全固形分量に対して、0.1~20質量%が好ましく、0.2~5質量%がより好ましい。
(Adhesion improver)
The curable composition of the present invention may contain an adhesion improving agent.
The adhesion improver improves the adhesion between the inorganic material serving as the support, for example, a silicon compound such as glass, silicon, silicon oxide, and silicon nitride, gold, copper, aluminum, and the cured film of the colored curable composition layer. A compound. Specific examples include silane coupling agents. The silane coupling agent as the adhesion improving agent is for the purpose of modifying the interface, and any known silane coupling agent can be used without any particular limitation.
As the silane coupling agent, a silane coupling agent described in paragraph 0048 of JP-A-2009-98616 is preferable, and γ-glycidoxypropyltrialkoxysilane and γ-methacryloxypropyltrialkoxysilane are more preferable. These can be used alone or in combination of two or more.
The content of the adhesion improving agent in the curable composition of the present invention is preferably 0.1 to 20% by mass, more preferably 0.2 to 5% by mass, based on the total solid content of the curable composition.
(架橋剤)
 本発明の硬化性組成物に補足的に架橋剤を用い、硬化性組成物を硬化させてなる硬化層の硬度をより高めることもできる。
 架橋剤としては、架橋反応により膜硬化を行なえるものであれば、特に限定はなく、例えば、(a)エポキシ樹脂、(b)メチロール基、アルコキシメチル基、及びアシロキシメチル基から選ばれる少なくとも1つの置換基で置換された、メラミン化合物、グアナミン化合物、グリコールウリル化合物又はウレア化合物、(c)メチロール基、アルコキシメチル基、及びアシロキシメチル基から選ばれる少なくとも1つの置換基で置換された、フェノール化合物、ナフトール化合物又はヒドロキシアントラセン化合物、が挙げられる。中でも、多官能エポキシ樹脂が好ましい。
 架橋剤の具体例などの詳細については、特開2004-295116号公報の段落〔0134〕~〔0147〕の記載を参照することができる。
(Crosslinking agent)
It is also possible to supplement the curable composition of the present invention with a crosslinking agent to increase the hardness of the cured layer obtained by curing the curable composition.
The crosslinking agent is not particularly limited as long as the film can be cured by a crosslinking reaction. For example, at least selected from (a) an epoxy resin, (b) a methylol group, an alkoxymethyl group, and an acyloxymethyl group. Substituted with at least one substituent selected from a melamine compound, a guanamine compound, a glycoluril compound or a urea compound, (c) a methylol group, an alkoxymethyl group, and an acyloxymethyl group, substituted with one substituent, Phenol compounds, naphthol compounds or hydroxyanthracene compounds are mentioned. Of these, polyfunctional epoxy resins are preferred.
For details such as specific examples of the crosslinking agent, the description in paragraphs [0134] to [0147] of JP-A No. 2004-295116 can be referred to.
(現像促進剤)
 硬化性組成物層を露光した場合の非露光領域のアルカリ溶解性を促進し、硬化性組成物の現像性の更なる向上を図る場合には、現像促進剤を添加することもできる。現像促進剤は好ましくは分子量1000以下の低分子量有機カルボン酸化合物、分子量1000以下の低分子量フェノール化合物である。
 具体的には、例えば、ギ酸、酢酸、プロピオン酸、酪酸、吉草酸、ピバル酸、カプロン酸、ジエチル酢酸、エナント酸、カプリル酸等の脂肪族モノカルボン酸;シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸、ブラシル酸、メチルマロン酸、エチルマロン酸、ジメチルマロン酸、メチルコハク酸、テトラメチルコハク酸、シトラコン酸等の脂肪族ジカルボン酸;トリカルバリル酸、アコニット酸、カンホロン酸等の脂肪族トリカルボン酸;安息香酸、トルイル酸、クミン酸、ヘメリト酸、メシチレン酸等の芳香族モノカルボン酸;フタル酸、イソフタル酸、テレフタル酸、トリメリト酸、トリメシン酸、メロファン酸、ピロメリト酸等の芳香族ポリカルボン酸;フェニル酢酸、ヒドロアトロパ酸、ヒドロケイ皮酸、マンデル酸、フェニルコハク酸、アトロパ酸、ケイ皮酸、ケイ皮酸メチル、ケイ皮酸ベンジル、シンナミリデン酢酸、クマル酸、ウンベル酸等が挙げられる。
(Development accelerator)
A development accelerator can also be added when the alkali solubility of the non-exposed area when the curable composition layer is exposed is promoted and the developability of the curable composition is further improved. The development accelerator is preferably a low molecular weight organic carboxylic acid compound having a molecular weight of 1000 or less and a low molecular weight phenol compound having a molecular weight of 1000 or less.
Specifically, for example, aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, enanthic acid, caprylic acid; oxalic acid, malonic acid, succinic acid, Aliphatic dicarboxylic acids such as glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, brassic acid, methylmalonic acid, ethylmalonic acid, dimethylmalonic acid, methylsuccinic acid, tetramethylsuccinic acid, citraconic acid; Aliphatic tricarboxylic acids such as tricarballylic acid, aconitic acid, camphoric acid; aromatic monocarboxylic acids such as benzoic acid, toluic acid, cumic acid, hemelitic acid, mesitylene acid; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, Aromatic polycarboxylic acids such as trimesic acid, melophanoic acid, pyromellitic acid; phenylacetic acid Hydratropic acid, hydrocinnamic acid, mandelic acid, phenyl succinic acid, atropic acid, cinnamic acid, methyl cinnamate, benzyl cinnamate, cinnamylidene acetic acid, coumaric acid, and umbellic acid.
(その他の添加物)
 本発明の硬化性組成物には、さらに必要に応じて、各種添加物、例えば、充填剤、上記以外の高分子化合物、紫外線吸収剤、酸化防止剤等を配合することができる。これらの添加物としては、特開2004-295116号公報の段落〔0155〕~〔0156〕に記載のものを挙げることができる。
 本発明の硬化性組成物は、特開2004-295116号公報の段落〔0078〕に記載の光安定剤、同公報の段落〔0081〕に記載の熱重合防止剤を含有することができる。
(Other additives)
If necessary, the curable composition of the present invention may further contain various additives such as fillers, polymer compounds other than those described above, ultraviolet absorbers, antioxidants and the like. Examples of these additives include those described in paragraphs [0155] to [0156] of JP-A No. 2004-295116.
The curable composition of the present invention may contain a light stabilizer described in paragraph [0078] of JP-A No. 2004-295116 and a thermal polymerization inhibitor described in paragraph [0081] of the publication.
(硬化性組成物の調製方法)
 本発明の硬化性組成物は、前述の各成分と必要に応じて任意成分とを混合することで調製される。(E)着色剤を含有させる場合、顔料、染料、又は顔料と染料の混合系などのいずれでもよい。
 なお、硬化性組成物の調製に際しては、硬化性組成物を構成する各成分を一括配合してもよいし、各成分を溶剤に溶解・分散した後に逐次配合してもよい。また、配合する際の投入順序や作業条件は特に制約を受けない。例えば、全成分を同時に溶剤に溶解・分散して組成物を調製してもよいし、必要に応じては、各成分を適宜2つ以上の溶液・分散液としておいて、使用時(塗布時)にこれらを混合して硬化性組成物として調製してもよい。
 上記のようにして調製された着色硬化性組成物は、好ましくは、孔径0.01μm~3.0μm程度のフィルタなどを用いて濾別した後、使用に供することができる。
(Method for preparing curable composition)
The curable composition of the present invention is prepared by mixing the above-described components and optional components as necessary. (E) When a colorant is contained, any of a pigment, a dye, or a mixed system of a pigment and a dye may be used.
In preparing the curable composition, the components constituting the curable composition may be combined at once, or may be sequentially mixed after each component is dissolved and dispersed in a solvent. In addition, there are no particular restrictions on the charging order and working conditions when blending. For example, the composition may be prepared by dissolving and dispersing all components in a solvent at the same time. If necessary, each component may be suitably used as two or more solutions / dispersions at the time of use (at the time of application). ) May be mixed to prepare a curable composition.
The colored curable composition prepared as described above can be used after being preferably filtered using a filter having a pore size of about 0.01 μm to 3.0 μm.
 本発明の硬化性組成物が着色剤を含有する場合には、色相及びコントラストに優れた着色硬化膜を形成することができるため、液晶表示装置に用いられるカラーフィルタなどの着色画素形成用として、また、印刷インキ、インクジェットインキ、及び塗料などの作製用途として好適に用いることができる。 When the curable composition of the present invention contains a colorant, a colored cured film excellent in hue and contrast can be formed, so that for forming a colored pixel such as a color filter used in a liquid crystal display device, Moreover, it can use suitably as preparation uses, such as printing ink, inkjet ink, and a coating material.
(カラーフィルタ及びその製造方法)
 本発明のカラーフィルタは、基板と、該基板上に本発明の着色硬化性組成物からなる着色領域と、を設けて構成されたものである。基板上の着色領域は、カラーフィルタの各画素をなす例えば赤(R)、緑(G)、青(B)等の着色層で構成されている。
 本発明のカラーフィルタの製造方法は、既述の着色硬化性組成物を支持体上に付与して着色層(着色硬化性組成物層)を形成する着色層形成工程(A)と、工程(A)にて形成された着色層に対してパターン様の露光をして潜像を形成する露光工程(B)と、前記潜像が形成された着色層を現像してパターンを形成する現像工程(C)と、を有する。
 また、本発明のカラーフィルタの製造方法では、特に、工程(C)で得られた着色パターンに対して加熱処理を行なう工程(D)を更に設けた態様が好ましい。
 以下、本発明のカラーフィルタの製造方法について、より具体的に説明する。
(Color filter and manufacturing method thereof)
The color filter of the present invention is configured by providing a substrate and a colored region made of the colored curable composition of the present invention on the substrate. The colored region on the substrate is composed of colored layers such as red (R), green (G), and blue (B) that form each pixel of the color filter.
The method for producing a color filter of the present invention includes a colored layer forming step (A) in which a colored layer (colored curable composition layer) is formed by applying the above-described colored curable composition on a support, and a step ( An exposure step (B) for forming a latent image by performing pattern-like exposure on the colored layer formed in A), and a developing step for developing the colored layer on which the latent image is formed to form a pattern (C).
Moreover, in the manufacturing method of the color filter of this invention, the aspect which further provided the process (D) which heat-processes with respect to the coloring pattern obtained at the process (C) is preferable.
Hereinafter, the manufacturing method of the color filter of the present invention will be described more specifically.
-工程(A)-
 本発明のカラーフィルタの製造方法では、まず、支持体上に、既述の本発明の着色硬化性組成物を回転塗布、スリット塗布、流延塗布、ロール塗布、バー塗布、インクジェット等の塗布方法により付与して着色層を形成し、その後、該着色層を加熱(プリベーク)又は真空乾燥などで乾燥させる。
-Process (A)-
In the method for producing a color filter of the present invention, first, the above-described colored curable composition of the present invention is applied onto a support by spin coating, slit coating, cast coating, roll coating, bar coating, ink jet, or the like. Is applied to form a colored layer, and then the colored layer is dried by heating (pre-baking) or vacuum drying.
 支持体としては、例えば、液晶表示装置に用いられるソーダガラス、無アルカリガラス、ホウケイ酸ガラス、石英ガラス、シリコン基板、樹脂基板などが挙げられる。また、これらの支持体上には、必要により、上部の層との密着改良、物質の拡散防止、或いは表面の平坦化のために、下塗り層を設けてもよい。 Examples of the support include soda glass, alkali-free glass, borosilicate glass, quartz glass, a silicon substrate, and a resin substrate used for liquid crystal display devices. Further, an undercoat layer may be provided on these supports, if necessary, in order to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the surface.
 プリベークの条件としては、ホットプレートやオーブンを用いて、70℃~130℃で、0.5分間~15分間程度加熱する条件が挙げられる。
また、着色硬化性組成物により形成される着色層の厚みは、目的に応じて適宜選択される。液晶表示装置用カラーフィルタにおいては、0.2μm~5.0μmの範囲が好ましく、1.0μm~4.0μmの範囲が更に好ましい。なお、着色層の厚みは、乾燥後の膜厚である。
Examples of the pre-baking condition include a condition of heating at 70 to 130 ° C. for about 0.5 to 15 minutes using a hot plate or an oven.
Moreover, the thickness of the colored layer formed with a colored curable composition is suitably selected according to the objective. In the color filter for liquid crystal display devices, the range of 0.2 μm to 5.0 μm is preferable, and the range of 1.0 μm to 4.0 μm is more preferable. In addition, the thickness of a colored layer is a film thickness after drying.
-工程(B)-
 続いて、本発明のカラーフィルタの製造方法では、支持体上に形成された着色層に対して、パターン様の露光が行なわれる。露光に適用し得る光もしくは放射線としては、g線、h線、i線、各種レーザー光が好ましく、特にi線が好ましい。照射光にi線を用いる場合、5mJ/cm~500mJ/cmの露光量で照射することが好ましい。
-Process (B)-
Subsequently, in the method for producing a color filter of the present invention, pattern-like exposure is performed on the colored layer formed on the support. As light or radiation applicable to exposure, g-line, h-line, i-line and various laser beams are preferable, and i-line is particularly preferable. When using the i-line to the irradiation light is preferably irradiated at an exposure dose of 5mJ / cm 2 ~ 500mJ / cm 2.
 また、その他の露光光源としては、超高圧、高圧、中圧、低圧の各水銀灯、ケミカルランプ、カーボンアーク灯、キセノン灯、メタルハライド灯、各種レーザー光源、等が使用できる。 Also, as other exposure light sources, ultrahigh pressure, high pressure, medium pressure, and low pressure mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, various laser light sources, and the like can be used.
~レーザー光源を用いた露光工程~
 レーザー光源を用いた露光方式では照射光は、300nm~410nmの範囲内の波長の紫外光レーザーが好ましく、さらに好ましくは300nm~360nmの範囲内の波長の紫外光レーザーである。具体的には、特に出力が大きく、比較的安価な固体レーザーのNd:YAGレーザーの第三高調波(355nm)や、エキシマレーザーのXeCl(308nm)、XeF(353nm)を好適に用いることができる。パターン露光量としては、生産性の観点から、1mJ/cm~100mJ/cmの範囲が好ましく、1mJ/cm~50mJ/cmの範囲がより好ましい。
-Exposure process using laser light source-
In the exposure method using a laser light source, the irradiation light is preferably an ultraviolet laser having a wavelength in the range of 300 nm to 410 nm, and more preferably an ultraviolet laser having a wavelength in the range of 300 nm to 360 nm. Specifically, the Nd: YAG laser third harmonic (355 nm), which is a relatively inexpensive solid output, and the excimer laser XeCl (308 nm), XeF (353 nm) can be suitably used. . The pattern exposure, from the viewpoint of productivity, preferably in the range of 1mJ / cm 2 ~ 100mJ / cm 2, the range of 1mJ / cm 2 ~ 50mJ / cm 2 is more preferable.
 露光装置としては、特に制限はないが市販されているものとしては、Callisto(ブイテクノロジー株式会社製)やEGIS(ブイテクノロジー株式会社製)やDF2200G(大日本スクリーン株式会社製)などが使用可能である。また上記以外の装置も好適に用いられる。 There are no particular restrictions on the exposure apparatus, but commercially available devices such as Callisto (buoy technology), EGIS (buoy technology), and DF2200G (Dainippon Screen) can be used. is there. Further, devices other than those described above are also preferably used.
-工程(C)-
 続いて、露光後の着色層に対して、現像液にて現像が行なわれる。これにより、着色パターンを形成することができる。現像液は、着色層の未硬化部を溶解し、硬化部を溶解しないものであれば、種々の有機溶剤の組み合わせやアルカリ性水溶液を用いることができる。現像液がアルカリ性水溶液である場合、アルカリ濃度が好ましくはpH10~13となるように調整するのがよい。前記アルカリ性水溶液としては、例えば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸水素ナトリウム、硅酸ナトリウム、メタ硅酸ナトリウム、アンモニア水、エチルアミン、ジエチルアミン、ジメチルエタノールアミン、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、コリン、ピロール、ピペリジン、1,8-ジアザビシクロ-[5.4.0]-7-ウンデセン等のアルカリ性水溶液が挙げられる。
 現像時間は、30秒~300秒が好ましく、更に好ましくは30秒~120秒である。現像温度は、20℃~40℃が好ましく、更に好ましくは23℃である。
 現像は、パドル方式、シャワー方式、スプレー方式等で行なうことができる。
 また、アルカリ性水溶液を用いて現像した後は、水で洗浄することが好ましい。
-Process (C)-
Subsequently, the colored layer after exposure is developed with a developer. Thereby, a colored pattern can be formed. As long as the developing solution dissolves the uncured portion of the colored layer and does not dissolve the cured portion, a combination of various organic solvents or an alkaline aqueous solution can be used. When the developer is an alkaline aqueous solution, the alkali concentration is preferably adjusted to pH 10-13. Examples of the alkaline aqueous solution include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethyl. Examples include alkaline aqueous solutions such as ammonium hydroxide, choline, pyrrole, piperidine, and 1,8-diazabicyclo- [5.4.0] -7-undecene.
The development time is preferably from 30 seconds to 300 seconds, more preferably from 30 seconds to 120 seconds. The development temperature is preferably 20 ° C. to 40 ° C., more preferably 23 ° C.
Development can be performed by a paddle method, a shower method, a spray method, or the like.
Moreover, after developing using alkaline aqueous solution, it is preferable to wash | clean with water.
 本発明のカラーフィルタの製造方法では、特に、着色硬化性組成物を用いて形成された着色パターン(画素)に対して、紫外線照射による後露光を行なうことも好ましい。 In the method for producing a color filter of the present invention, it is also preferable to perform post-exposure by ultraviolet irradiation on a colored pattern (pixel) formed using a colored curable composition.
-工程(D)-
 現像後の着色パターンに対して、あるいは上記のような紫外線照射による後露光が行なわれた着色パターンに対して、さらに加熱処理を行なうことが好ましい。形成された着色パターンを加熱処理(いわゆるポストベーク処理)することにより、着色パターンを更に硬化させることができる。この加熱処理は、例えば、ホットプレート、各種ヒーター、オーブンなどにより行なうことができる。
 加熱処理の際の温度としては、100℃~300℃であることが好ましく、更に好ましくは、120℃~250℃である。また、加熱時間は、10分~120分程度が好ましい。
-Process (D)-
It is preferable to further heat-treat the colored pattern after development or the colored pattern subjected to post-exposure by ultraviolet irradiation as described above. By heating the formed color pattern (so-called post-bake process), the color pattern can be further cured. This heat treatment can be performed by, for example, a hot plate, various heaters, an oven, or the like.
The temperature during the heat treatment is preferably 100 ° C. to 300 ° C., more preferably 120 ° C. to 250 ° C. The heating time is preferably about 10 minutes to 120 minutes.
 このようにして得られた着色パターンは、カラーフィルタにおける画素を構成する。複数の色相の画素を有するカラーフィルタの作製においては、上記の工程(A)、工程(B)、工程(C)、及び工程(D)を所望の色数に合わせて繰り返せばよい。
 なお、単色の着色層の形成、露光、現像が終了する毎に(1色毎に)、前記工程(D)を行なってもよいし、所望の色数の全ての着色層の形成、露光、現像が終了した後に、一括して前記工程(D)を行なってもよい。
The colored pattern thus obtained constitutes a pixel in the color filter. In manufacturing a color filter having a plurality of hue pixels, the above-described step (A), step (B), step (C), and step (D) may be repeated in accordance with the desired number of colors.
In addition, whenever formation, exposure, and development of a single color layer are completed (for each color), the step (D) may be performed, or formation, exposure, and formation of all colored layers having a desired number of colors. After the development is completed, the step (D) may be performed collectively.
 本発明のカラーフィルタの製造方法により得られたカラーフィルタ(本発明のカラーフィルタ)は、本発明の着色硬化性組成物を用いていることから、色相及びコントラストに優れている。液晶表示装置等に用いた場合、良好な色相を達成しながら、分光特性及びコントラストに優れた画像の表示が可能になる。 The color filter obtained by the method for producing a color filter of the present invention (the color filter of the present invention) is excellent in hue and contrast since the colored curable composition of the present invention is used. When used in a liquid crystal display device or the like, it is possible to display an image excellent in spectral characteristics and contrast while achieving a good hue.
<液晶表示装置>
 本発明の液晶表示装置は、既述の本発明のカラーフィルタを備えたものである。液晶表示装置の定義や各表示装置の詳細については、例えば「電子ディスプレイデバイス(佐々木 昭夫著、(株)工業調査会 1990年発行)」、「ディスプレイデバイス(伊吹 順章著、産業図書(株)平成元年発行)」などに記載されている。また、液晶表示装置については、例えば「次世代液晶ディスプレイ技術(内田 龍男編集、(株)工業調査会 1994年発行)」に記載されている。本発明が適用できる液晶表示装置に特に制限はなく、例えば、上記の「次世代液晶ディスプレイ技術」に記載されている色々な方式の液晶表示装置に適用できる。
<Liquid crystal display device>
The liquid crystal display device of the present invention includes the above-described color filter of the present invention. For the definition of liquid crystal display devices and details of each display device, refer to, for example, “Electronic Display Devices (Akio Sasaki, published by Kogyo Kenkyukai 1990)”, “Display Devices (written by Junaki Ibuki, Sangyo Tosho) Issued in 1989). The liquid crystal display device is described in, for example, “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, published by Kogyo Kenkyukai 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
 本発明のカラーフィルタは、中でも特に、カラーTFT方式の液晶表示装置に対して有効である。カラーTFT方式の液晶表示装置については、例えば「カラーTFT液晶ディスプレイ(共立出版(株)1996年発行)」に記載されている。更に、本発明はIPSなどの横電界駆動方式、MVAなどの画素分割方式などの視野角が拡大された液晶表示装置や、STN、TN、VA、OCS、FFS、及びR-OCB等にも適用できる。また、本発明のカラーフィルタは、COA(Color-filter On Array)方式にも供することが可能である。 The color filter of the present invention is particularly effective for a color TFT liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Further, the present invention is applied to a liquid crystal display device with a wide viewing angle, such as a horizontal electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can. The color filter of the present invention can also be used for a COA (Color-filter On Array) system.
 本発明のカラーフィルタを液晶表示装置に用いると、従来公知の冷陰極管の三波長管と組み合わせた場合に高いコントラストを実現できるが、更に、赤、緑、青のLED光源(RGB-LED)をバックライトとすることによって輝度が高く、また、色純度の高い色再現性の良好な液晶表示装置を提供することができる。 When the color filter of the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, but further, red, green and blue LED light sources (RGB-LED). By using as a backlight, a liquid crystal display device having high luminance and high color purity and good color reproducibility can be provided.
<固体撮像素子>
 本発明の固体撮像素子は、既述の本発明のカラーフィルタを備える。本発明の固体撮像素子の構成としては、本発明のカラーフィルタが備えられた構成であり、固体撮像素子として機能する構成であれば特に限定はないが、例えば、以下のような構成が挙げられる。
<Solid-state imaging device>
The solid-state imaging device of the present invention includes the above-described color filter of the present invention. The configuration of the solid-state imaging device of the present invention is a configuration provided with the color filter of the present invention, and is not particularly limited as long as it is a configuration that functions as a solid-state imaging device. .
 支持体上に、固体撮像素子(CCDイメージセンサー、CMOSイメージセンサー等)の受光エリアを構成する複数のフォトダイオード及びポリシリコン等からなる転送電極を有し、前記フォトダイオード及び前記転送電極上にフォトダイオードの受光部のみ開口したタングステン等からなる遮光膜を有し、遮光膜上に遮光膜全面及びフォトダイオード受光部を覆うように形成された窒化シリコン等からなるデバイス保護膜を有し、前記デバイス保護膜上に、本発明のカラーフィルタを有する構成である。
 更に、前記デバイス保護層上であってカラーフィルタの下(支持体に近い側)に集光手段(例えば、マイクロレンズ等。以下同じ。)を有する構成や、カラーフィルタ上に集光手段を有する構成等であってもよい。
A transfer electrode made of a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and a photo is formed on the photodiode and the transfer electrode. A device having a light-shielding film made of tungsten or the like that is opened only in the light-receiving portion of the diode, and a device protective film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire surface of the light-shielding film and the photodiode light-receiving portion; The color filter of the present invention is provided on the protective film.
Furthermore, it has a condensing means (for example, a microlens etc. The same shall apply hereinafter) on the device protective layer and below the color filter (on the side close to the support), or a condensing means on the color filter. It may be a configuration or the like.
(保護膜の形成方法)
 本発明の保護膜は、既述の本発明の硬化性組成物を用いて形成されたものである。
 本発明の保護膜は、本発明の硬化性組成物を用いて構成されるので、低い加熱温度又は加熱処理無しで形成された場合においても高い硬度、膜厚均一性に優れる。
(Protective film formation method)
The protective film of the present invention is formed using the curable composition of the present invention described above.
Since the protective film of the present invention is constituted using the curable composition of the present invention, it is excellent in high hardness and film thickness uniformity even when formed at a low heating temperature or without heat treatment.
 本発明の保護膜は、本発明の硬化性組成物を用いた方法であれば、いずれの方法で形成されてもよいが、前述のカラーフィルタの製造方法と同様の方法により形成できる。ここで、保護膜にパターニングを施さない場合、即ち、保護膜をいわゆるベタ膜として形成する場合には、前記(ロ)露光工程において、被膜を全面露光する方法が好適である。タッチパネルなどに使用されている透明保護膜部材を形成できる硬化性組成物としてはITOパターン視認性の改善特性が組み込まれていてもよい。 The protective film of the present invention may be formed by any method as long as it is a method using the curable composition of the present invention, but can be formed by a method similar to the above-described method for producing a color filter. Here, when the protective film is not patterned, that is, when the protective film is formed as a so-called solid film, a method of exposing the entire surface of the film in the (b) exposure step is preferable. As a curable composition capable of forming a transparent protective film member used for a touch panel or the like, an ITO pattern visibility improving property may be incorporated.
 基板上に硬化性組成物層を形成する方法としては、(a)既述の樹脂、重合性化合物、及び光重合開始剤を少なくとも含む硬化性組成物を塗布する塗布法、及び(b)前記硬化性組成物層を有する転写材料を用い、加熱及び/又は加圧により硬化性組成物層をラミネート、転写する転写型のドライフィルム形態が好適に挙げられる。 As a method of forming a curable composition layer on a substrate, (a) a coating method of applying a curable composition containing at least the resin, the polymerizable compound, and the photopolymerization initiator described above, and (b) the above-mentioned A transfer-type dry film form in which a transfer material having a curable composition layer is used, and the curable composition layer is laminated and transferred by heating and / or pressurization is preferable.
(a)塗布法
 硬化性組成物の塗布は、公知の塗布法、例えば、スピンコート法、カーテンコート法、スリットコート法、ディップコート法、エアーナイフコート法、ローラーコート法、ワイヤーバーコート法、グラビアコート法、あるいは米国特許第2681294号明細書に記載のポッパーを使用するエクストルージョンコート法等により行なうことができる。中でも、特開2004-89851号公報、特開2004-17043号公報、特開2003-170098号公報、特開2003-164787号公報、特開2003-10767号公報、特開2002-79163号公報、特開2001-310147号公報等に記載のスリットノズルあるいはスリットコーターによる方法が好適である。
(A) Coating method The curable composition can be coated by a known coating method such as spin coating, curtain coating, slit coating, dip coating, air knife coating, roller coating, wire bar coating, It can be carried out by a gravure coating method or an extrusion coating method using a popper described in US Pat. No. 2,681,294. Among them, JP 2004-89851 A, JP 2004-17043 A, JP 2003-170098 A, JP 2003-164787 A, JP 2003-10767 A, JP 2002-79163 A, A method using a slit nozzle or a slit coater described in JP 2001-310147 A is suitable.
(b)転写法
 転写は、感光性転写材料を用いて、仮支持体上に膜状に形成された硬化性組成物層を所望の基板面に例えば加熱及び/又は加圧したローラー又は平板を用いて圧着又は加熱圧着することによって貼り合せた後、仮支持体の剥離により硬化性組成物層を基板上に転写する。具体的には、特開平7-110575号公報、特開平11-77942号公報、特開2000-334836号公報、特開2002-148794号公報に記載のラミネーター及びラミネート方法が挙げられ、低異物の観点で、特開平7-110575号公報に記載の方法を用いるのが好ましい。
(B) Transfer method Transfer is performed by using a photosensitive transfer material, for example, a roller or flat plate in which a curable composition layer formed in a film shape on a temporary support is heated and / or pressed on a desired substrate surface. After being bonded together by pressure bonding or thermocompression bonding, the curable composition layer is transferred onto the substrate by peeling off the temporary support. Specific examples include laminators and laminating methods described in JP-A-7-110575, JP-A-11-77942, JP-A-2000-334836, and JP-A-2002-148794. From the viewpoint, it is preferable to use the method described in JP-A-7-110575.
 硬化性組成物層を形成する場合、硬化性組成物層と仮支持体との間には更に酸素遮断層(以下、「酸素遮断膜」又は「中間層」ともいう。)を設けることができる。これにより、露光感度をアップすることができる。また、転写性を向上させるために、クッション性を有する熱可塑性樹脂層を設けてもよい。
 感光性転写材料を構成する仮支持体、酸素遮断層、熱可塑性樹脂層、その他の層や該感光性転写材料の作製方法については、特開2006-23696号公報の段落番号[0024]~[0030]に記載の構成、作製方法を適用することができる。
When the curable composition layer is formed, an oxygen barrier layer (hereinafter also referred to as “oxygen barrier film” or “intermediate layer”) can be further provided between the curable composition layer and the temporary support. . Thereby, exposure sensitivity can be improved. In order to improve transferability, a thermoplastic resin layer having cushioning properties may be provided.
Regarding the temporary support, the oxygen blocking layer, the thermoplastic resin layer, and other layers constituting the photosensitive transfer material and the method for producing the photosensitive transfer material, paragraph numbers [0024] to [0024] of [Japanese Patent Laid-Open No. 2006-23696] The structure and manufacturing method described in [0030] can be applied.
 硬化性組成物層をその上に形成する基板としては、例えば、透明基板(例えばガラス基板やプラスチックス基板)、透明導電膜(例えばITO膜)付基板、カラーフィルタ付きの基板(カラーフィルタ基板ともいう。)、駆動素子(例えば、薄膜トランジスタ[TFT])付駆動基板、などが挙げられる。基板の厚みとしては、700~1200μmが一般に好ましい。 Examples of the substrate on which the curable composition layer is formed include, for example, a transparent substrate (for example, a glass substrate or a plastics substrate), a substrate with a transparent conductive film (for example, an ITO film), and a substrate with a color filter (also called a color filter substrate). And a driving substrate with a driving element (for example, a thin film transistor [TFT]). The thickness of the substrate is generally preferably 700 to 1200 μm.
 以下、本発明を実施例により更に具体的に説明するが、本発明はその主旨を越えない限り、以下の実施例に限定されるものではない。なお、特に断りのない限り、「部」、「%」は質量基準である。 Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to the following examples as long as the gist thereof is not exceeded. Unless otherwise specified, “part” and “%” are based on mass.
-硬化性組成物1の調製-
 下記の各成分を混合、溶解し、硬化性組成物を調製した。
・有機溶剤1:プロピレングリコールモノメチルエーテルアセテート
                      77.41部
・側鎖に酸性基を有する樹脂:下記アルカリ可溶性バインダーP-1(1-メトキシ-2-プロパノール/1-メトキシ-2-プロピルアセテート45%溶液)                     6.31部
・重合性化合物1:ナガセケムテックス(株)製、DA-314(例示化合物(34)                    3.1部
・ハイパーブランチポリマー:大阪有機化学(株)製、STAR-501(重量平均分子量:11000)         12.39部
・重合禁止剤:p-メトキシフェノール    0.003部
・開始剤1:チバスペシャリティ ケミカルズ製、CGI-242
                       0.45部
・密着改良材:3-メタクリロキシプロピルトリメトキシシラン
                        0.2部
・フッ素系界面活性剤:DIC社製 メガファックF-554、固形分2%のプロピレングリコールモノメチルエーテルアセテート溶液)
                        0.6部
-Preparation of curable composition 1-
The following components were mixed and dissolved to prepare a curable composition.
Organic solvent 1: Propylene glycol monomethyl ether acetate 77.41 parts Resin having an acidic group in the side chain: Alkali-soluble binder P-1 (1-methoxy-2-propanol / 1-methoxy-2-propyl acetate 45% below) Solution) 6.31 parts Polymerizable compound 1: Nagase ChemteX Co., Ltd., DA-314 (Exemplary compound (34) 3.1 parts Hyperbranched polymer: Osaka Organic Chemical Co., Ltd., STAR-501 (Weight average molecular weight: 11000) 12.39 parts ・ Polymerization inhibitor: 0.003 part of p-methoxyphenol ・ Initiator 1: CGI Specialty Chemicals, CGI-242
0.45 parts, adhesion improver: 3-methacryloxypropyltrimethoxysilane 0.2 parts, fluorosurfactant: DIC's MegaFuck F-554, 2% solid content propylene glycol monomethyl ether acetate solution)
0.6 parts
Figure JPOXMLDOC01-appb-C000036

 
Figure JPOXMLDOC01-appb-C000036

 
-硬化性組成物2~9、及び硬化性組成物C1~C5(比較用)の調製-
 硬化性組成物1と同様にして、下記表1に記載の組成(単位は質量部)を有する硬化性組成物2~9、及び硬化性組成物C1~C5を調製した。
-Preparation of curable compositions 2-9 and curable compositions C1-C5 (for comparison)-
In the same manner as the curable composition 1, curable compositions 2 to 9 and curable compositions C1 to C5 having the compositions shown in Table 1 below (unit: parts by mass) were prepared.
Figure JPOXMLDOC01-appb-T000037

 
Figure JPOXMLDOC01-appb-T000037

 
-硬化性組成物層の形成-
 ガラス(#1737;コーニング社製)基板あるいはポリエチレンテレフタレートフィルム(PET)基板上に、各硬化性組成物をスピンコート法で塗布した後、ガラス基板に塗布したものは、80℃で120秒間、PET基板に塗布したものは、50℃で120秒間、乾燥させることにより揮発成分を揮発させて、硬化性組成物層を形成した。硬化性組成物層の膜厚は、いずれも2.1μmとなるように調整した。この硬化性組成物層にi線(波長365nm)を照射した。i線の光源には超高圧水銀ランプを用い、平行光としてから光源の照射光量が40mJ/cmとなるようにベタ露光した。その後、下記表2に記載した熱処理条件で熱処理して硬化膜を得た。これら各実験番号の硬化膜について、後述する方法で、二重結合消費率の測定と鉛筆硬度の測定を行い、下記評価基準に従って、ランク付けした。その結果を下記表2に記載した。
-Formation of curable composition layer-
After applying each curable composition on a glass (# 1737; made by Corning) substrate or a polyethylene terephthalate film (PET) substrate by a spin coat method, the one applied to the glass substrate is PET at 120C for 120 seconds. What was apply | coated to the board | substrate was made to volatilize a volatile component by making it dry at 50 degreeC for 120 second, and formed the curable composition layer. The film thickness of the curable composition layer was adjusted to be 2.1 μm. This curable composition layer was irradiated with i-line (wavelength 365 nm). An ultra-high pressure mercury lamp was used as the i-line light source, and solid exposure was carried out so that the irradiation light quantity of the light source was 40 mJ / cm 2 after being converted into parallel light. Then, it heat-processed on the heat processing conditions described in following Table 2, and obtained the cured film. About the cured film of each experiment number, the double bond consumption rate and the pencil hardness were measured by the method described later, and ranked according to the following evaluation criteria. The results are shown in Table 2 below.
<二重結合消費率の測定>
 FT-IR装置(サーモ・ニコレー・ジャパン製、ニコレット710)を用いて、400cm-1~4000cm-1の波長領域を測定し、C=C結合由来の810cm-1のピーク強度を求めた。各硬化膜について、塗布・乾燥のみのUV未硬化品のピーク強度(=二重結合残存量)Aと、UV硬化及び熱処理を行った後の硬化膜のピーク強度Bを、下記式にしたがって、二重結合消費率を算出した。
式:二重結合消費率={1-(B/A)}×100%
《評価基準》
A:二重結合消費率が80%以上
B:二重結合消費率が50%以上80%未満
C:二重結合消費率が50%未満
<Measurement of double bond consumption rate>
FT-IR apparatus (Thermo Nicolet Japan Ltd., Nicolet 710) was used to measure the wavelength region of 400 cm -1 ~ 4000 cm -1, was determined peak intensity of 810 cm -1 derived from C = C bond. For each cured film, the peak strength (= double bond residual amount) A of the UV uncured product only applied and dried, and the peak strength B of the cured film after UV curing and heat treatment are performed according to the following formula: The double bond consumption rate was calculated.
Formula: Double bond consumption rate = {1- (B / A)} × 100%
"Evaluation criteria"
A: Double bond consumption rate is 80% or more B: Double bond consumption rate is 50% or more and less than 80% C: Double bond consumption rate is less than 50%
<鉛筆硬度の評価>
耐傷性の指標としてJIS K 5400に記載の鉛筆硬度評価を行った。各実施例及び比較例の硬化物切片を、温度25℃、相対湿度60%で1時間調湿した後、JIS S 6006に規定する2Hの試験用鉛筆を用いて、500gの荷重にてn=7の評価を行った。
《評価基準》
A:傷が3つ未満である。
B:傷が3つ以上、5つ未満である。
C:傷が5つ以上、6つ未満である。
D:傷が6つ以上である。
<Evaluation of pencil hardness>
As an index of scratch resistance, pencil hardness evaluation described in JIS K 5400 was performed. The cured product sections of each Example and Comparative Example were conditioned for 1 hour at a temperature of 25 ° C. and a relative humidity of 60%, and then n = with a load of 500 g using a 2H test pencil specified in JIS S 6006. An evaluation of 7 was made.
"Evaluation criteria"
A: There are less than 3 scratches.
B: There are 3 or more and less than 5 scratches.
C: There are 5 or more and less than 6 scratches.
D: There are 6 or more scratches.
Figure JPOXMLDOC01-appb-T000038

 
Figure JPOXMLDOC01-appb-T000038

 
 表2から以下のことがわかる。
 本発明の実施例に係る硬化性組成物1~9は、比較例に係る硬化性組成物C1~C5に比べて、いずれの加熱処理条件においても二重結合消費率が高く、重合が効率よく進んでおり、高い鉛筆硬度を有する硬化膜が得られる。特に150℃の低温で加熱処理した硬化膜、又は加熱処理を行わずにi線での露光のみで硬化した硬化膜においても、十分な鉛筆硬度を有する硬化膜が得られる。
 更に、基板として、プラスチィックベースであるPETを使用した場合においても、130℃の熱処理条件で、高い硬度を有する硬化膜が得られている。
Table 2 shows the following.
The curable compositions 1 to 9 according to the examples of the present invention have a high double bond consumption rate under any heat treatment conditions and the polymerization is efficient as compared with the curable compositions C1 to C5 according to the comparative examples. A cured film having high pencil hardness is obtained. In particular, a cured film having sufficient pencil hardness can be obtained even in a cured film that is heat-treated at a low temperature of 150 ° C. or a cured film that is cured only by i-line exposure without performing the heat treatment.
Furthermore, even when PET, which is a plastic base, is used as a substrate, a cured film having high hardness is obtained under a heat treatment condition of 130 ° C.
-硬化性組成物10(着色剤含有)の調製-
 下記の各成分を混合、溶解又は分散し、硬化性組成物10を調製した。
・有機溶剤1:プロピレングリコールモノメチルエーテルアセテート
                          9部
・有機溶剤2:ジエチレングリコールエチルメチルエーテル
                         25部
・側鎖に酸性基を有する樹脂:前記アルカリ可溶性バインダーP-1
                          6部
・重合性化合物1:ナガセケムテックス(株)製、DA-314
                        1.6部
・ハイパーブランチポリマー:大阪有機化学(株)製、STAR-501
                        6.4部
・重合禁止剤:p-メトキシフェノール    0.003部
・開始剤:例示化合物(V-3)        0.26部
・密着改良剤:3-メタクリロキシプロピルトリメトキシシラン
                       0.22部
・フッ素系界面活性剤(DIC社製 メガファックF-554、固形分0.2%のプロピレングリコールモノメチルエーテルアセテート溶液)
                          5部
・顔料分散液A: ・下記処方の顔料分散液1    25部
         ・下記処方の顔料分散液2    20部
-Preparation of curable composition 10 (containing colorant)-
The following components were mixed, dissolved or dispersed to prepare curable composition 10.
Organic solvent 1: 9 parts of propylene glycol monomethyl ether acetate Organic solvent 2: 25 parts of diethylene glycol ethyl methyl ether Resin having acidic group in side chain: Alkali-soluble binder P-1
6 parts, polymerizable compound 1: manufactured by Nagase ChemteX Corporation, DA-314
1.6 parts hyperbranched polymer: made by Osaka Organic Chemical Co., Ltd., STAR-501
6.4 parts ・ Polymerization inhibitor: 0.003 part of p-methoxyphenol ・ Initiator: 0.26 part of exemplary compound (V-3) ・ Adhesion improver: 0.22 part of 3-methacryloxypropyltrimethoxysilane Fluorine-based surfactant (Megafac F-554 manufactured by DIC, propylene glycol monomethyl ether acetate solution with a solid content of 0.2%)
5 parts-Pigment dispersion A:-25 parts of pigment dispersion 1 with the following formulation-20 parts of pigment dispersion 2 with the following formulation
 前記顔料分散液1は、以下のようにして調製した。
 C.I.ピグメントブルー15:6を12.8部と分散剤(日本ルーブリゾール社製ソルスパース24000)7.2部とを、プロピレングリコールモノメチルエーテルアセテート80.0部と混合し、ビーズミルを用いて顔料を十分に分散させて、顔料分散液1を調製した。
The pigment dispersion 1 was prepared as follows.
C. I. 12.8 parts of Pigment Blue 15: 6 and 7.2 parts of a dispersant (Solsperse 24000 manufactured by Nihon Lubrizol Co., Ltd.) are mixed with 80.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently mixed using a bead mill. Dispersion was carried out to prepare Pigment Dispersion Liquid 1.
 前記顔料分散液2は、以下のようにして調製した。
 C.I.ピグメントバイオレット23を5部と分散剤(日本ルーブリゾール社製ソルスパース24000)5部とを、プロピレングリコールモノメチルエーテルアセテート90.0部と混合し、ビーズミルを用いて顔料を十分に分散させて、顔料分散液2を調製した。
The pigment dispersion 2 was prepared as follows.
C. I. 5 parts of Pigment Violet 23 and 5 parts of a dispersant (Solsperse 24000 manufactured by Nihon Lubrizol Corporation) are mixed with 90.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently dispersed using a bead mill. Liquid 2 was prepared.
-硬化性組成物11~20、及び硬化性組成物C-6~C-8の調製-
 硬化性組成物10の調製と同様にして、表3に記載の組成(単位は質量部)を有する硬化性組成物11~20、及び硬化性組成物C-6~C-8(比較用)を調製した。
 使用した顔料分散3~5、及び染料溶液1~6は、下記のとおりである。
-Preparation of curable compositions 11-20 and curable compositions C-6-C-8-
In the same manner as the preparation of the curable composition 10, the curable compositions 11 to 20 having the composition shown in Table 3 (unit: parts by mass) and the curable compositions C-6 to C-8 (for comparison) Was prepared.
The pigment dispersions 3 to 5 and the dye solutions 1 to 6 used are as follows.
~顔料分散液3~
 C.I.ピグメントグリーン58を12.8部と分散剤(日本ルーブリゾール社製ソルスパース24000)7.2部とを、プロピレングリコールモノメチルエーテルアセテート80.0部と混合し、ビーズミルを用いて顔料を十分に分散させて、顔料分散液3を調製した。
~ Pigment dispersion 3 ~
C. I. 12.8 parts of Pigment Green 58 and 7.2 parts of a dispersant (Solsperse 24000 manufactured by Nihon Lubrizol) are mixed with 80.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently dispersed using a bead mill. Thus, a pigment dispersion 3 was prepared.
~顔料分散液4~
 C.I.ピグメントイエロー138を5部と分散剤(日本ルーブリゾール社製ソルスパース32000)5部とを、プロピレングリコールモノメチルエーテルアセテート90.0部と混合し、ビーズミルを用いて顔料を十分に分散させて、顔料分散液4を調製した。
~ Pigment dispersion 4 ~
C. I. 5 parts of Pigment Yellow 138 and 5 parts of a dispersant (Solsperse 32000 manufactured by Nippon Lubrizol) were mixed with 90.0 parts of propylene glycol monomethyl ether acetate, and the pigment was sufficiently dispersed using a bead mill. Liquid 4 was prepared.
~顔料分散液5~
 C.I.ピグメントレッド254を12.8部と分散剤(日本ルーブリゾール社製ソルスパース24000)7.2部とを、プロピレングリコールモノメチルエーテルアセテート80.0部と混合し、ビーズミルを用いて顔料を十分に分散させて、顔料分散液5を調製した。
~ Pigment dispersion 5 ~
C. I. 12.8 parts of Pigment Red 254 and 7.2 parts of a dispersant (Solsperse 24000 manufactured by Nippon Lubrizol Corporation) are mixed with 80.0 parts of propylene glycol monomethyl ether acetate, and the pigment is sufficiently dispersed using a bead mill. Thus, a pigment dispersion 5 was prepared.
 染料溶液1は下記の各成分を混合、溶解して調製した。
・有機溶剤(プロピレングリコールモノメチルエーテルアセテート)
                         95部
・染料(下記化合物(A))             5部
The dye solution 1 was prepared by mixing and dissolving the following components.
・ Organic solvent (propylene glycol monomethyl ether acetate)
95 parts · Dye (the following compound (A)) 5 parts
Figure JPOXMLDOC01-appb-C000039

 
Figure JPOXMLDOC01-appb-C000039

 
 染料溶液2~6は、染料として、下記化合物(B)~(F)を用いた以外は、染料溶液1の調製と同様にして調製した。 Dye solutions 2 to 6 were prepared in the same manner as the dye solution 1 except that the following compounds (B) to (F) were used as dyes.
Figure JPOXMLDOC01-appb-C000040

 
Figure JPOXMLDOC01-appb-C000040

 
Figure JPOXMLDOC01-appb-C000041

 
Figure JPOXMLDOC01-appb-C000041

 
Figure JPOXMLDOC01-appb-T000042

 
Figure JPOXMLDOC01-appb-T000042

 
-着色硬化性組成物層(着色層)の形成-
 ガラス(#1737;コーニング社製)基板上に、上記で調製した硬化性組成物をスピンコート法で塗布した後、室温で30分間乾燥させることにより揮発成分を揮発させて、着色硬化性組成物層(着色硬化性組成物層A)を形成した。この着色硬化性組成物層に、ライン/スペースが20μm/20μmのマスクを通してi線(波長365nm)を照射した。i線の光源には超高圧水銀ランプを用い、平行光としてから照射するようにした。照射光量は40mJ/cmとした。次いで、i線をパターン状に照射した上記着色硬化性組成物層に対して、炭酸ナトリウム/炭酸水素ナトリウムの水溶液(濃度2.4%、pH10)を用いて26℃で45秒間現像し、次いで、流水で20秒間リンスした後、乾燥して、細線パターン画像を得た。得られた細線パターン画像を表4に示す加熱処理条件でポストベーク処理を行ない、膜厚2μmのパターン状の着色硬化膜(着色層B)を得た。
-Formation of colored curable composition layer (colored layer)-
After applying the curable composition prepared above on a glass (# 1737; Corning) substrate by a spin coat method, the volatile component is volatilized by drying at room temperature for 30 minutes, thereby coloring the curable composition. A layer (colored curable composition layer A) was formed. This colored curable composition layer was irradiated with i-line (wavelength 365 nm) through a mask having a line / space of 20 μm / 20 μm. An ultra-high pressure mercury lamp was used as the i-line light source, and it was irradiated as parallel light. The amount of irradiation light was 40 mJ / cm 2 . Next, the colored curable composition layer irradiated with i-line in a pattern was developed with an aqueous solution of sodium carbonate / sodium bicarbonate (concentration 2.4%, pH 10) at 26 ° C. for 45 seconds, After rinsing with running water for 20 seconds, it was dried to obtain a fine line pattern image. The obtained fine line pattern image was post-baked under the heat treatment conditions shown in Table 4 to obtain a colored cured film (colored layer B) having a pattern thickness of 2 μm.
-評価-
 上記で得られた着色硬化膜に基づいて、下記に記載の方法で、着色硬化性組成物の感度、液晶の比抵抗、分光特性、コントラスト、密着性及び耐薬品性について評価した。液晶の比抵抗及び耐薬品性については、下記の評価基準に従ってランク分けした。結果を後述の表4に示す。
-Evaluation-
Based on the colored cured film obtained above, the sensitivity of the colored curable composition, the specific resistance of the liquid crystal, the spectral characteristics, the contrast, the adhesion and the chemical resistance were evaluated by the methods described below. The specific resistance and chemical resistance of the liquid crystals were ranked according to the following evaluation criteria. The results are shown in Table 4 below.
(1)感度
 得られた細線パターン画像を光学顕微鏡により200倍の倍率で撮影し、着色ライン画像の細線の幅を測定した。感度が高いほど、細線の幅は太くなるため、マスク幅からの細線幅の太り幅を線幅感度とした。数字が大きい方が高感度となり好ましい。
(1) Sensitivity The obtained fine line pattern image was photographed with an optical microscope at a magnification of 200 times, and the width of the fine line of the colored line image was measured. Since the width of the fine line becomes thicker as the sensitivity is higher, the width of the fine line width from the mask width is defined as the line width sensitivity. Larger numbers are preferred because of higher sensitivity.
(2)液晶の比抵抗
 上記で得た着色層Bを基板から掻き取り、掻き取った物9.0mgを液晶材料ZLI-4792(メルク社製)2.00gに加えて120℃で5時間加熱した。その後、濾過し、液晶材料の比抵抗を液晶比抵抗測定装置(型番ADVANTEST R8340 ULTRA HIGHT RESISTANCE ME(株)アドバンテスト製)により測定した。金属イオンの溶出により液晶材料の比抵抗は低下するため、その比抵抗の程度で金属イオンの溶出を評価できる。
<評価基準>
 A:比抵抗≧1.0×1011MΩであり、液晶表示装置に組み込んでパネルとした際に焼付き故障がみられなかった。
 B:比抵抗<1.0×1011MΩであり、液晶表示装置に組み込んでパネルとした際の焼付き故障が生じた。
(2) Specific resistance of liquid crystal The colored layer B obtained above was scraped from the substrate, and 9.0 mg of the scraped material was added to 2.00 g of liquid crystal material ZLI-4792 (Merck) and heated at 120 ° C. for 5 hours. did. Then, it filtered and the specific resistance of liquid crystal material was measured with the liquid crystal specific resistance measuring apparatus (model number ADVANTEST R8340 ULTRA HIGH RESISTANCE ME Co., Ltd. product made by Advantest). Since the specific resistance of the liquid crystal material decreases due to the elution of metal ions, the elution of metal ions can be evaluated by the degree of the specific resistance.
<Evaluation criteria>
A: Specific resistance ≧ 1.0 × 10 11 MΩ, and no seizure failure was observed when the panel was assembled in a liquid crystal display device.
B: Specific resistance <1.0 × 10 11 MΩ, and a seizure failure occurred when a panel was assembled in a liquid crystal display device.
(3)分光特性
 上記で得た着色層Bの透過スペクトルを、オリンパス(株)製の顕微分光測定装置OSP-SP200(商品名)を用いて測定した。得られた透過スペクトルより、CIE1931表色系における色座標x値、y値、Y値を求めた。
 分光特性は、(x、y)=(0.138、0.085)におけるY値が高い場合、優れた分光特性を有しているといえる。Y値が大きいほど分光特性に優れているといえる。
(3) Spectral characteristics The transmission spectrum of the colored layer B obtained above was measured using a microspectrophotometer OSP-SP200 (trade name) manufactured by Olympus Corporation. From the obtained transmission spectrum, the color coordinate x value, y value, and Y value in the CIE 1931 color system were determined.
The spectral characteristics can be said to have excellent spectral characteristics when the Y value at (x, y) = (0.138, 0.085) is high. It can be said that the larger the Y value, the better the spectral characteristics.
(4)コントラスト
 また、得られた各着色層Bを有する基板を2枚の偏光フィルムの間に挟み、2枚の偏光フィルムの偏光軸が平行な場合、及び垂直な場合の輝度の値を色彩輝度計(トプコン(株)製、型番:BM-5A)を使用して測定し、2枚の偏光フィルムの偏光軸が平行な場合の輝度を垂直な場合の輝度で除して、得られた値をコントラストとして求めた。コントラストが高いほど、液晶表示装置用のカラーフィルタとして良好な性能を示す。
(4) Contrast In addition, when the obtained substrate having each colored layer B is sandwiched between two polarizing films, the luminance values when the polarizing axes of the two polarizing films are parallel and perpendicular are colored. Measured using a luminance meter (Topcon Co., Ltd., model number: BM-5A), and obtained by dividing the luminance when the polarization axes of the two polarizing films are parallel by the luminance when vertical. The value was determined as contrast. The higher the contrast, the better the performance as a color filter for a liquid crystal display device.
(5)密着性
 上記で得た着色硬化性組成物層Aについて、i線縮小投影露光装置を使用して、着色硬化性組成物層Aに365nmの波長で、5、10、15、20、及び25μmのマスク幅を有するマスクを通して露光量40mJ/cmで照射した。照射後、前記現像液を使用して、23℃で60秒間現像した。次いで、流水で20秒間リンスした後、スプレーで乾燥して、細線パターン画像を得た。画像形成は光学顕微鏡及びSEM写真観察により通常の方法で観察した。そして、基板に残っている最も細い細線パターンのパターン寸法を密着性の評価とした。
 より細い細線が残っているほうが密着性に優れているとすることができる。
(5) Adhesiveness About the colored curable composition layer A obtained above, using an i-line reduction projection exposure apparatus, the colored curable composition layer A has a wavelength of 365 nm, 5, 10, 15, 20, And an exposure dose of 40 mJ / cm 2 through a mask having a mask width of 25 μm. After irradiation, the developer was used and developed at 23 ° C. for 60 seconds. Subsequently, after rinsing with running water for 20 seconds, the film was dried by spraying to obtain a fine line pattern image. Image formation was observed by an ordinary method using an optical microscope and SEM photograph observation. The pattern dimension of the thinnest fine line pattern remaining on the substrate was used as the evaluation of adhesion.
It can be said that the thinner the fine wire remains, the better the adhesion.
(6)耐薬品性(耐溶剤性)
 ガラス基板(コーニング1737、0.7mm厚(コーニング社製))上に、スピンナーを用いて、各着色硬化性組成物を塗布した後、90℃にて2分間ホットプレート上でプレベークして膜厚2.1μmの着色層を形成した。得られた着色層を、キャノン(株)製PLA-501F露光機(超高圧水銀ランプ)で積算照射量が40mJ/cm(照度:20mW/cm)となるように全面露光し、その後、この基板をオーブンにて表4に記載の条件で加熱して着色硬化膜を得た。
 得られた着色硬化膜の色度を測定した。そして、この硬化膜が形成された基板を23℃に温度制御されたN-メチル-2-ピロリドン中に20分間浸漬させた後、当該着色硬化膜の色度を測定し、浸漬による色度変化をΔE*abで算出したこの値が3以下の場合、硬化膜の耐溶剤性は良好であるといえる。
〔評価基準〕
A:浸漬前後のΔE*abが、2.0未満
B:浸漬前後のΔE*abが、2.0以上~3.0以下
C:浸漬前後のΔE*abが、3.0を超える
(6) Chemical resistance (solvent resistance)
Each colored curable composition was applied on a glass substrate (Corning 1737, 0.7 mm thick (manufactured by Corning)) using a spinner, and then pre-baked on a hot plate at 90 ° C. for 2 minutes. A 2.1 μm colored layer was formed. The obtained colored layer was exposed on the entire surface with a PLA-501F exposure machine (extra-high pressure mercury lamp) manufactured by Canon Inc. so that the integrated irradiation amount was 40 mJ / cm 2 (illuminance: 20 mW / cm 2 ). This substrate was heated in an oven under the conditions described in Table 4 to obtain a colored cured film.
The chromaticity of the obtained colored cured film was measured. Then, the substrate on which this cured film was formed was immersed in N-methyl-2-pyrrolidone controlled at 23 ° C. for 20 minutes, and then the chromaticity of the colored cured film was measured, and the chromaticity change due to immersion was measured. When this value calculated by ΔE * ab is 3 or less, it can be said that the solvent resistance of the cured film is good.
〔Evaluation criteria〕
A: ΔE * ab before and after immersion is less than 2.0 B: ΔE * ab before and after immersion is 2.0 to 3.0 or less C: ΔE * ab before and after immersion exceeds 3.0
Figure JPOXMLDOC01-appb-T000043

 
Figure JPOXMLDOC01-appb-T000043

 
 表4から以下のことがわかる。
 本発明の実施例に係る硬化性組成物10~20は、感度、分光特性(Y値)に優れ、コントラストが高く、密着性に優れ、液晶の比抵抗が大きく、かつ耐薬品性良好であることがわかる。その効果は基板としてプラスチィックベースであるPETを使用した場合においても、130℃熱処理条件で有効に発現している。また、硬化性組成物10~20を用いて得られた液晶表示装置は、焼きつきが生じなかった。
これに対し比較例としての硬化性組成物C6~C8の場合には、加熱処理の温度が150℃と低い処理で作製された場合に、液晶の比抵抗が低く、また、密着性も低かった。
Table 4 shows the following.
The curable compositions 10 to 20 according to the examples of the present invention have excellent sensitivity and spectral characteristics (Y value), high contrast, excellent adhesion, high specific resistance of liquid crystal, and good chemical resistance. I understand that. The effect is effectively manifested under heat treatment conditions at 130 ° C. even when plastic base PET is used as the substrate. In addition, the liquid crystal display device obtained using the curable compositions 10 to 20 did not cause burn-in.
On the other hand, in the case of the curable compositions C6 to C8 as comparative examples, when the heat treatment temperature was as low as 150 ° C., the specific resistance of the liquid crystal was low and the adhesion was low. .
-屈折率調整部材の調製-
〔転写フィルムの作製〕
<熱可塑性樹脂層及び中間層の形成>
 仮支持体としての厚さ75μmのポリエチレンテレフタレートフィルム上に、スリット状ノズルを用いて、下記処方H1の熱可塑性樹脂層用塗布液を塗布し、乾燥して、膜厚が15μmの熱可塑性樹脂層を形成した。その上に、下記処方P1の中間層用塗布液を塗布し、乾燥して、膜厚が1.6μmの中間層を形成した。
-Preparation of refractive index adjusting member-
[Production of transfer film]
<Formation of thermoplastic resin layer and intermediate layer>
A thermoplastic resin layer having a film thickness of 15 μm is applied on a polyethylene terephthalate film having a thickness of 75 μm as a temporary support using a slit-like nozzle and dried by applying a coating solution for a thermoplastic resin layer having the following formulation H1. Formed. On top of that, an intermediate layer coating solution having the following formulation P1 was applied and dried to form an intermediate layer having a thickness of 1.6 μm.
(熱可塑性樹脂層用塗布液:処方H1)
・メタノール                 11.1部
・プロピレングリコールモノメチルエーテルアセテート
                       6.36部
・メチルエチルケトン             52.4部
・メチルメタクリレート/2-エチルヘキシルアクリレート/ベンジルメタクリレート/メタクリル酸共重合体(共重合組成比(モル比)=55/11.7/4.5/28.8、分子量=10万、Tg≒70℃)
                       5.83部
・スチレン/アクリル酸共重合体(共重合組成比(モル比)=63/37、重量平均分子量=1万、Tg≒100℃)     13.6部
・モノマー1(商品名:BPE-500、新中村化学工業(株)製)
                        9.1部
・フッ素系ポリマーの30%メチルエチルケトン溶液
                       0.54部
(上記フッ素系ポリマーは、C13CHCHOCOCH=CHと、H(OCH(CH)CHOCOCH=CHと、H(OCHCHOCOCH=CHの40:55:5(質量比)との共重合体で、重量平均分子量3万である(商品名:メガファックF780F、DIC(株)製)
(Coating solution for thermoplastic resin layer: Formulation H1)
・ Methanol 11.1 parts ・ Propylene glycol monomethyl ether acetate 6.36 parts ・ Methyl ethyl ketone 52.4 parts ・ Methyl methacrylate / 2-ethylhexyl acrylate / benzyl methacrylate / methacrylic acid copolymer (copolymerization composition ratio (molar ratio) = 55) /11.7/4.5/28.8, molecular weight = 100,000, Tg≈70 ° C.)
5.83 parts styrene / acrylic acid copolymer (copolymerization composition ratio (molar ratio) = 63/37, weight average molecular weight = 10,000, Tg≈100 ° C.) 13.6 parts monomer 1 (trade name: BPE -500, Shin-Nakamura Chemical Co., Ltd.)
30% methyl ethyl ketone solution 0.54 parts of 9.1 parts Fluorine-based polymer (the above fluorine-based polymer, and C 6 F 13 CH 2 CH 2 OCOCH = CH 2, H (OCH (CH 3) CH 2) 7 OCOCH = CH 2 and a copolymer of 40: 55: 5 (mass ratio) of H (OCH 2 CH 2 ) 7 OCOCH═CH 2 and having a weight average molecular weight of 30,000 (trade name: Megafax F780F, DIC) (Made by Co., Ltd.)
(中間層用塗布液:処方P1)
・ポリビニルアルコール(商品名:PVA205、(株)クラレ製、鹸化度=88%、重合度550)            32.2部
・ポリビニルピロリドン(商品名:K-30、アイエスピー・ジャパン(株)製)                     14.9部
・蒸留水                    524部
・メタノール                  429部
(Coating liquid for intermediate layer: prescription P1)
・ Polyvinyl alcohol (trade name: PVA205, manufactured by Kuraray Co., Ltd., degree of saponification = 88%, polymerization degree 550) 32.2 parts ・ Polyvinylpyrrolidone (trade name: K-30, manufactured by IP Japan Co., Ltd.) 14 .9 parts ・ Distilled water 524 parts ・ Methanol 429 parts
<第一の硬化性透明樹脂層>
次に、上記中間層上に、下記表5(単位は質量部)に記す組成によって調製した第一の硬化性透明樹脂層用の硬化性組成物21、22、23、C9、C10又はC11を、塗布量を変更しながら、下記表6に記載した乾燥後の膜厚になるように、塗布し、乾燥して、第一の硬化性透明樹脂層を形成した。
<First curable transparent resin layer>
Next, on the intermediate layer, the curable composition 21, 22, 23, C9, C10 or C11 for the first curable transparent resin layer prepared by the composition described in the following Table 5 (unit is part by mass). The first curable transparent resin layer was formed by applying and drying while changing the coating amount so as to obtain the film thickness after drying described in Table 6 below.
Figure JPOXMLDOC01-appb-T000044

 
Figure JPOXMLDOC01-appb-T000044

 
Figure JPOXMLDOC01-appb-C000045

 
Figure JPOXMLDOC01-appb-C000045

 
第一の硬化性透明樹脂層を塗布及び乾燥した時点で、この第一の硬化性透明樹脂層を、ミクロトームを用いて表面から切片を切削した。この切片0.1mgに対して、KBr粉末2mgを加え、黄色灯下でよく混合し、後述の二重結合消費率の測定におけるUV未硬化品の測定試料とした。 When the first curable transparent resin layer was applied and dried, a section of this first curable transparent resin layer was cut from the surface using a microtome. To 0.1 mg of this slice, 2 mg of KBr powder was added and mixed well under a yellow lamp to obtain a UV uncured product measurement sample in the measurement of the double bond consumption rate described later.
 得られた各サンプルの第一の硬化性透明樹脂層に、紫外線照射(露光量:300mJ/cm、光源:メタンハライドランプ)を照射し硬化させた。
 このようにして得られた第一の硬化性透明樹脂層の硬化膜を、ミクロトームを用いて表面から切片を切削した。この切片0.1mgに対して、KBr粉末2mgを加え、黄色灯下でよく混合し、後述の二重結合消費率の測定における塗布・乾燥・硬化後の測定試料とした。
The first curable transparent resin layer of each obtained sample was cured by irradiation with ultraviolet irradiation (exposure amount: 300 mJ / cm 2 , light source: methane halide lamp).
A section of the cured film of the first curable transparent resin layer thus obtained was cut from the surface using a microtome. To 0.1 mg of this slice, 2 mg of KBr powder was added and mixed well under a yellow lamp to obtain a measurement sample after coating, drying and curing in the measurement of the double bond consumption rate described later.
(二重結合消費率の測定)
 FT-IR装置(サーモ・ニコレー・ジャパン製、ニコレット710)を用いて、400cm-1~4000cm-1の波長領域を測定し、C=C結合由来の810cm-1のピーク強度を求めた。各サンプルの第一の硬化性透明樹脂層について、塗布・乾燥のみのUV未硬化品のピーク強度(=二重結合残存量)Aと、硬化後のピーク強度Bを求め、下記式にしたがって、二重結合消費率を算出した。
式:二重結合消費率={1-(B/A)}×100%
《評価基準》
 A:二重結合消費率が10%以上
 B:二重結合消費率が10%未満
 なお、二重結合消費率は、第一層と第二層の界面混合の程度の指標になる。
(Measurement of double bond consumption rate)
FT-IR apparatus (Thermo Nicolet Japan Ltd., Nicolet 710) was used to measure the wavelength region of 400 cm -1 ~ 4000 cm -1, was determined peak intensity of 810 cm -1 derived from C = C bond. For the first curable transparent resin layer of each sample, the peak intensity (= double bond residual amount) A of the UV uncured product only by coating and drying and the peak intensity B after curing are obtained, according to the following formula: The double bond consumption rate was calculated.
Formula: Double bond consumption rate = {1- (B / A)} × 100%
"Evaluation criteria"
A: Double bond consumption rate is 10% or more B: Double bond consumption rate is less than 10% Note that the double bond consumption rate is an index of the degree of interfacial mixing between the first layer and the second layer.
<第二の硬化性透明樹脂層の形成>
 前述の第一の硬化性透明樹脂層(未硬化)上に、前記表5に記載した硬化性組成物24又はC12を、塗布量を変更しながら、乾燥後の膜厚が下記表6に記載のとおりになるように塗布し、乾燥して、第二の硬化性透明樹脂層を形成した。
<Formation of second curable transparent resin layer>
On the first curable transparent resin layer (uncured) described above, the curable composition 24 or C12 described in Table 5 described above has a film thickness after drying described in Table 6 while changing the coating amount. It apply | coated so that it might become, and it dried and formed the 2nd curable transparent resin layer.
<保護フィルムの圧着>
 このようにして仮支持体の上に乾燥膜厚が15.1μmの熱可塑性樹脂層と、乾燥膜厚が1.7μmの中間層と、下記表6中の乾燥膜厚になるような第一の硬化性透明樹脂層及び第二の硬化性透明樹脂層を設け、最後に保護フィルム(厚さ12μmポリプロピレンフィルム)を圧着した。
<Press bonding of protective film>
In this way, the thermoplastic resin layer having a dry film thickness of 15.1 μm, the intermediate layer having a dry film thickness of 1.7 μm, and the dry film thickness in Table 6 below are provided on the temporary support. The curable transparent resin layer and the second curable transparent resin layer were provided, and finally a protective film (thickness 12 μm polypropylene film) was pressure-bonded.
 こうして仮支持体と熱可塑性樹脂層と中間層(酸素遮断膜)と第一の硬化性透明樹脂層と第二の硬化性透明樹脂層と保護フィルムとが一体となった転写フィルム21~23、及び転写フィルムC9~C11を作製した。 Transfer films 21 to 23 in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), the first curable transparent resin layer, the second curable transparent resin layer, and the protective film are integrated. Transfer films C9 to C11 were prepared.
〔透明積層体の作製〕
 上記の転写フィルムを用いて、以下の方法で透明積層体を作製した。
(Production of transparent laminate)
Using the above transfer film, a transparent laminate was produced by the following method.
<1.透明膜の形成>
 屈折率1.51のガラス製透明基板上に、上記表5中に示す硬化性組成物22を用いた屈折率1.7、膜厚65nmの透明膜を以下の方法で積層した。
<1. Formation of transparent film>
A transparent film having a refractive index of 1.7 and a film thickness of 65 nm using the curable composition 22 shown in Table 5 above was laminated on a glass transparent substrate having a refractive index of 1.51 by the following method.
(転写材料の調製)
 厚さ75μmのポリエチレンテレフタレートフィルム仮支持体の上に、スリット状ノズルを用いて、前述の処方H1の熱可塑性樹脂層用塗布液を塗布し、乾燥した。次に、前述の処方P1の中間層用塗布液を塗布し、乾燥した。更に、上記表5に記載の硬化性組成物22を塗布し、乾燥した。このようにして、仮支持体の上に膜厚が15.1μmの熱可塑性樹脂層と、膜厚が1.7μmの中間層と、膜厚が65nmの透明硬化性組成物層を形成し、最後に保護フィルム(厚さ12μmポリプロピレンフィルム)を圧着した。こうして仮支持体と熱可塑性樹脂層と中間層(酸素遮断膜)と透明硬化性組成物層と保護フィルムとが一体となった転写材料を作製した。
(Preparation of transfer material)
On the 75-micrometer-thick polyethylene terephthalate film temporary support body, the coating liquid for thermoplastic resin layers of the above-mentioned prescription H1 was apply | coated and dried using the slit-shaped nozzle. Next, the coating liquid for intermediate layer of the above-mentioned prescription P1 was applied and dried. Furthermore, the curable composition 22 described in Table 5 was applied and dried. In this way, a thermoplastic resin layer having a film thickness of 15.1 μm, an intermediate layer having a film thickness of 1.7 μm, and a transparent curable composition layer having a film thickness of 65 nm are formed on the temporary support, Finally, a protective film (12 μm thick polypropylene film) was pressure-bonded. Thus, a transfer material in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), the transparent curable composition layer, and the protective film were integrated was produced.
(透明膜の形成)
 この転写材料の保護フィルムを剥離して透明硬化性組成物層を露出させ、露出した透明硬化性組成物層の表面が接するように、ガラス製透明基板上に透明硬化性組成物層、中間層、熱可塑性樹脂層及びPET仮支持体を共に積層し、PET仮支持体を剥離した。
 次に、超高圧水銀灯を有するプロキシミティー型露光機(日立ハイテク電子エンジニアリング(株)製)を用いて、熱可塑性樹脂層側からi線、40mJ/cmにて全面露光した。次に、トリエタノールアミン系現像液(トリエタノールアミン30%含有、商品名:T-PD2(富士フイルム(株)製)を純水で10倍(T-PD2を1部と純水9部の割合で混合)に希釈した液)を30Cで60秒間、フラットノズル圧力0.04MPaでシャワー現像し、熱可塑性樹脂と中間層を除去した。引き続き、このガラス製透明基板の上面(透明硬化性樹脂層側)にエアを吹きかけて液きりした後、純水をシャワーにより
10秒間吹きつけて洗浄し、エアを吹きかけてガラス製透明基板上の液だまりを減らした。次に、基板を下記表6に示す条件で加熱処理(ポストベーク)を行い、ガラス製透明基板上に透明硬化性組成物層の硬化膜(以下、「透明膜」という。)が積層された基板を得た。
(Formation of transparent film)
The protective film of the transfer material is peeled to expose the transparent curable composition layer, and the transparent curable composition layer and the intermediate layer are formed on the glass transparent substrate so that the exposed surface of the transparent curable composition layer is in contact with the transfer material. The thermoplastic resin layer and the PET temporary support were laminated together, and the PET temporary support was peeled off.
Next, using a proximity type exposure machine (manufactured by Hitachi High-Tech Electronics Engineering Co., Ltd.) having an ultrahigh pressure mercury lamp, the entire surface was exposed from the thermoplastic resin layer side at i line and 40 mJ / cm 2 . Next, triethanolamine developer (containing 30% triethanolamine, trade name: T-PD2 (manufactured by FUJIFILM Corporation) 10 times with pure water (1 part of T-PD2 and 9 parts of pure water). The mixture was diluted to 30) at 30 C for 60 seconds at a flat nozzle pressure of 0.04 MPa to remove the thermoplastic resin and the intermediate layer. Subsequently, air was blown onto the upper surface (transparent curable resin layer side) of the glass transparent substrate to drain the liquid, and then pure water was blown for 10 seconds in a shower to wash, and air was blown onto the glass transparent substrate. Reduced the puddle. Next, the substrate was heat-treated (post-baked) under the conditions shown in Table 6 below, and a cured film (hereinafter referred to as “transparent film”) of the transparent curable composition layer was laminated on the glass transparent substrate. A substrate was obtained.
<2.透明電極パターンの形成>
 上記のようにして透明膜が積層されたガラス製透明基板を、真空チャンバー内に導入し、SnO含有率が10%のITOターゲット(インジウム:錫=95:5(モル比))を用いて、DCマグネトロンスパッタリング(条件:基材の温度250℃、アルゴン圧0.13Pa、酸素圧0.01Pa)により、厚さ40nm、屈折率1.82のITO薄膜を形成し、透明電極層を形成した前面板を得た。ITO薄膜の表面抵抗は80Ω/□であった。
<2. Formation of transparent electrode pattern>
The glass transparent substrate on which the transparent film is laminated as described above is introduced into a vacuum chamber, and an ITO target (indium: tin = 95: 5 (molar ratio)) with a SnO 2 content of 10% is used. An ITO thin film having a thickness of 40 nm and a refractive index of 1.82 was formed by DC magnetron sputtering (conditions: substrate temperature 250 ° C., argon pressure 0.13 Pa, oxygen pressure 0.01 Pa), and a transparent electrode layer was formed. A front plate was obtained. The surface resistance of the ITO thin film was 80Ω / □.
(エッチング用感光性フィルムE1の調製)
 厚さ75μmのポリエチレンテレフタレートフィルム仮支持体の上に、スリット状ノズルを用いて、上述の処方H1からなる熱可塑性樹脂層用塗布液を塗布し、乾燥した。次に、上述の処方P1からなる中間層用塗布液を塗布し、乾燥した。更に、下記エッチング用光硬化性樹脂層用塗布液:処方E1を塗布、乾燥させた。このようにして仮支持体の上に乾燥膜厚が15.1μmの熱可塑性樹脂層と、乾燥膜厚が1.6μmの中間層と、膜厚2.0μmエッチング用光硬化性樹脂層から成る積層体を得、最後に保護フイルム(厚さ12μmポリプロピレンフィルム)を圧着した。こうして仮支持体と熱可塑性樹脂層と中間層(酸素遮断膜)と透明硬化性樹脂層とが一体となったエッチング用感光性転写材料を作製した。
(Preparation of photosensitive film E1 for etching)
On a 75 μm thick polyethylene terephthalate film temporary support, a coating solution for a thermoplastic resin layer composed of the above-mentioned formulation H1 was applied using a slit nozzle and dried. Next, the coating liquid for intermediate | middle layer which consists of the above-mentioned prescription P1 was apply | coated, and it dried. Further, the following photocurable resin layer coating solution for etching: Formulation E1 was applied and dried. Thus, the thermoplastic resin layer having a dry film thickness of 15.1 μm, the intermediate layer having a dry film thickness of 1.6 μm, and the photocurable resin layer for etching having a film thickness of 2.0 μm are formed on the temporary support. A laminate was obtained, and finally a protective film (12 μm thick polypropylene film) was pressure-bonded. Thus, a photosensitive transfer material for etching in which the temporary support, the thermoplastic resin layer, the intermediate layer (oxygen barrier film), and the transparent curable resin layer were integrated was produced.
(エッチング用光硬化性樹脂層用塗布液:処方E1)
・メチルメタクリレート/スチレン/メタクリル酸共重合体(質量比=31/40/29、重量平均分子量60000、酸価163mgKOH/g)
                         16部
・モノマー1(商品名:BPE-500、新中村化学工業(株)製)
                        5.6部
・ヘキサメチレンジイソシアネートのテトラエチレンオキシドモノメタクリレート0.5モル付加物                7部
・分子中に重合性基を1つ有する化合物としてのシクロヘキサンジメタノールモノアクリレート :            2.8質量部
・2-クロロ-N-ブチルアクリドン :  0.42質量部
・2,2-ビス(o-クロロフェニル)-4,4’,5,5’-テトラフェニルビイミダゾール               2.17部
・マラカイトグリーンシュウ酸塩        0.02部
・ロイコクリスタルバイオレット        0.26部
・フェノチアジン              0.013部
・界面活性剤(商品名:メガファックF-780F、DIC(株)製)
                       0.03部
・メチルエチルケトン               40部
・1-メトキシ-2-プロパノール         20部
 なお、エッチング用光硬化性樹脂層用塗布液E1の溶剤除去後の100℃の粘度は2500Pa・secであった。
(Coating liquid for photocurable resin layer for etching: prescription E1)
Methyl methacrylate / styrene / methacrylic acid copolymer (mass ratio = 31/40/29, weight average molecular weight 60000, acid value 163 mgKOH / g)
16 parts Monomer 1 (Brand name: BPE-500, manufactured by Shin-Nakamura Chemical Co., Ltd.)
5.6 parts, 0.5 part adduct of tetramethylene oxide monomethacrylate of hexamethylene diisocyanate 7 parts, cyclohexanedimethanol monoacrylate as a compound having one polymerizable group in the molecule: 2.8 parts by mass, 2-chloro -N-butylacridone: 0.42 parts by mass 2,2-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole 2.17 parts malachite green oxalate 02 parts, 0.26 parts of leuco crystal violet, 0.013 parts of phenothiazine, surfactant (trade name: Megafac F-780F, manufactured by DIC Corporation)
0.03 parts · Methyl ethyl ketone 40 parts · 1-methoxy-2-propanol 20 parts The viscosity of the coating solution E1 for photocurable resin layer for etching after removing the solvent at 100 ° C. was 2500 Pa · sec.
(透明電極パターンの形成)
 前記前面板の透明電極層を洗浄し、その表面に、保護フィルムを除去したエッチング用感光性転写材料を、エッチング用光硬化性樹脂層が接するようにラミネートした(基材温度:130℃、ゴムローラー温度120℃、線圧100N/cm、搬送速度2.2m/分)。エッチング用感光性転写材料の仮支持体を剥離後、露光マスク(透明電極パターンを有す石英露光マスク)面と該エッチング用光硬化性樹脂層との間の距離を200μmに設定し、露光量50mJ/cm(i線)でパターン露光した。次に、トリエタノールアミン系現像液(トリエタノールアミン30質量%含有、商品名:T-PD2(富士フイルム(株)製)を純水で10倍に希釈した液)を25℃で100秒間、界面活性剤含有洗浄液(商品名:T-SD3(富士フイルム(株)製)を純水で10倍に希釈した液)を用いて33℃で20秒間処理し、回転ブラシ、超高圧洗浄ノズルで残渣除去を行い、さらに130℃30分間のポストベーク処理を行って、透明電極層とエッチング用光硬化性樹脂層パターンとを形成した前面板を得た。
 透明電極層とエッチング用光硬化性樹脂層パターンとを形成した前面板を、ITOエッチャント(塩酸、塩化カリウム水溶液。液温30℃)を入れたエッチング槽に浸漬し、100秒処理し、エッチング用光硬化性樹脂層で覆われていない露出した領域の透明電極層を溶解除去し、エッチング用光硬化性樹脂層パターンのついた透明電極層パターン付の前面板を得た。
 次に、エッチング用光硬化性樹脂層パターンのついた透明電極層パターン付の前面板を、レジスト剥離液(N-メチル-2-ピロリドン、モノエタノールアミン、界面活性剤(商品名:サーフィノール465、エアープロダクツ製)液温45℃)を入れたレジスト剥離槽に浸漬し、200秒処理し、エッチング用光硬化性樹脂層を除去し、ガラス製透明基板上に透明膜及び透明電極パターンを形成した基板を得た。
(Formation of transparent electrode pattern)
The transparent electrode layer of the front plate was washed, and the photosensitive transfer material for etching from which the protective film was removed was laminated on the surface so that the photocurable resin layer for etching was in contact (base material temperature: 130 ° C., rubber Roller temperature 120 ° C., linear pressure 100 N / cm, conveyance speed 2.2 m / min). After removing the temporary support of the photosensitive photosensitive transfer material for etching, the distance between the exposure mask (quartz exposure mask having a transparent electrode pattern) surface and the photocurable resin layer for etching is set to 200 μm, and the exposure amount Pattern exposure was performed at 50 mJ / cm 2 (i-line). Next, a triethanolamine developer (containing 30% by mass of triethanolamine, a trade name: T-PD2 (manufactured by Fuji Film Co., Ltd.) diluted 10 times with pure water) at 25 ° C. for 100 seconds, A surfactant-containing cleaning solution (trade name: T-SD3 (manufactured by FUJIFILM Corporation) diluted 10-fold with pure water) was treated at 33 ° C. for 20 seconds, using a rotating brush and an ultra-high pressure cleaning nozzle. Residue removal was performed, and a post-bake treatment at 130 ° C. for 30 minutes was further performed to obtain a front plate on which a transparent electrode layer and a photocurable resin layer pattern for etching were formed.
The front plate on which the transparent electrode layer and the photocurable resin layer pattern for etching are formed is immersed in an etching bath containing ITO etchant (hydrochloric acid, potassium chloride aqueous solution, liquid temperature 30 ° C.), treated for 100 seconds, and used for etching. The exposed transparent electrode layer not covered with the photocurable resin layer was dissolved and removed to obtain a front plate with a transparent electrode layer pattern having a photocurable resin layer pattern for etching.
Next, a front plate with a transparent electrode layer pattern with a photocurable resin layer pattern for etching is applied to a resist stripping solution (N-methyl-2-pyrrolidone, monoethanolamine, a surfactant (trade name: Surfynol 465). , Made by Air Products) immersed in a resist stripping tank containing a liquid temperature of 45 ° C., treated for 200 seconds, removed the photocurable resin layer for etching, and formed a transparent film and transparent electrode pattern on a glass transparent substrate. The obtained substrate was obtained.
 透明電極パターンの端部をPtコート(約20nm厚)により、導電性付与及び表面保護を行った後、FEI製Nova200型FIB/SEM複合機を用いて、透明電極パターン端部の形状観察(二次電子像、加速電圧20kV)を行った。
 形成したITOパターンは、図1の様なテーパー形状となっており、テーパー角α=約3°であった。なお、図1はパターン4におけるテーパー角αを説明しているものである。
After imparting conductivity and surface protection to the end of the transparent electrode pattern with Pt coating (about 20 nm thick), using a FEI Nova200 type FIB / SEM compound machine, shape observation of the transparent electrode pattern end (two Next electron image, acceleration voltage 20 kV).
The formed ITO pattern had a tapered shape as shown in FIG. 1, and the taper angle α was about 3 °. FIG. 1 illustrates the taper angle α in the pattern 4.
<3.第一の硬化性透明樹脂層と第二の硬化性透明樹脂層の形成>
 上記にて得られたガラス製透明基板上に透明膜及び透明電極パターンを形成した基板と、前述の転写フィルム21~23、転写フィルムC9~C11を用いて、ガラス製透明基板上への透明膜の形成と同様の方法により、透明電極パターン上に、転写フィルムの第二の硬化性透明樹脂層の硬化膜及び第一の硬化性透明樹脂層の硬化膜がこの順で形成された積層体を作製し、更に、表6に記載の条件で熱処理して12種類のサンプルを得た。これらのサンプルについて、下記の評価を行った。
<3. Formation of first curable transparent resin layer and second curable transparent resin layer>
A transparent film on a glass-made transparent substrate using the substrate obtained by forming a transparent film and a transparent electrode pattern on the glass-made transparent substrate obtained above, and the transfer films 21 to 23 and transfer films C9 to C11 described above. A laminate in which the cured film of the second curable transparent resin layer and the cured film of the first curable transparent resin layer of the transfer film are formed in this order on the transparent electrode pattern by the same method as in the above. Then, the sample was further heat-treated under the conditions shown in Table 6 to obtain 12 types of samples. The following evaluation was performed about these samples.
〔透明積層体の評価〕
<透明電極パターンの視認性の評価>
 透明接着テープ(3M社製、商品名、OCAテープ8171CL)を介して、上記サンプルの第一の硬化性透明樹脂層の表面を全面に亘って黒色PET材を接着させて遮光した。
 透明電極パターン視認性は、暗室において、蛍光灯(光源)と作成した基板を、ガラス面側から光を入射させ、ガラス表面からの反射光を、斜めから目視観察することにより行った。
[Evaluation of transparent laminate]
<Evaluation of visibility of transparent electrode pattern>
A black PET material was adhered to the entire surface of the first curable transparent resin layer of the sample through a transparent adhesive tape (trade name, OCA tape 8171CL, manufactured by 3M Co., Ltd.) to shield the light.
The visibility of the transparent electrode pattern was performed by making light incident on the fluorescent lamp (light source) and the prepared substrate from the glass surface side and visually observing reflected light from the glass surface obliquely in a dark room.
《評価基準》
 A:透明電極パターンが全く見えない。
 B:透明電極パターンがわずかに見えるが、ほとんど見えない。
 C:透明電極パターンが見える(分かりにくい)。
 D:透明電極パターンが見えるが、実用上許容できる。
 E:透明電極パターンがはっきり見える(分かりやすい)。
 得られた結果を下記表6に記載した。
"Evaluation criteria"
A: The transparent electrode pattern is not visible at all.
B: The transparent electrode pattern is slightly visible but hardly visible.
C: A transparent electrode pattern is visible (unclear).
D: Although a transparent electrode pattern can be seen, it is practically acceptable.
E: The transparent electrode pattern is clearly visible (easy to understand).
The obtained results are shown in Table 6 below.
<鉛筆硬度の評価>
 耐傷性の指標としてJIS K 5400に記載の鉛筆硬度評価を行った。各実施例および比較例の転写フィルムを、ガラス製透明基板、透明膜及び透明電極パターンを有する基板に転写製膜して得られた各実施例及び比較例の透明積層体を、温度25℃、相対湿度60%で1時間調湿した後、JIS S 6006に規定する2Hの試験用鉛筆を用いて、500gの荷重にてn=7の評価を行った。
《評価基準》
 A:傷が3つ未満である。
 B:傷が3つ以上、5つ未満である。
 C:傷が5つ以上、6つ未満である。
 D:傷が6つ以上である。
 得られた結果を下記表6に記載した。
<Evaluation of pencil hardness>
As an index of scratch resistance, pencil hardness evaluation described in JIS K 5400 was performed. The transparent laminated body of each Example and Comparative Example obtained by transferring the transfer film of each Example and Comparative Example to a glass transparent substrate, a substrate having a transparent film and a transparent electrode pattern, and a temperature of 25 ° C. After conditioning at a relative humidity of 60% for 1 hour, n = 7 was evaluated with a load of 500 g using a 2H test pencil specified in JIS S 6006.
"Evaluation criteria"
A: There are less than 3 scratches.
B: There are 3 or more and less than 5 scratches.
C: There are 5 or more and less than 6 scratches.
D: There are 6 or more scratches.
The obtained results are shown in Table 6 below.
Figure JPOXMLDOC01-appb-T000046

 
Figure JPOXMLDOC01-appb-T000046

 
 上記表6より、本発明の実施例に係る硬化性組成物21~23による硬化膜を備えるものは、透明電極パターンの視認性を維持したまま、低温(150℃)ベイク処理でも十分な鉛筆硬度を有していることがわかる。
 他方、比較例に係る硬化性組成物C9~C11のいずれかと、硬化性組成物C12による硬化膜を備えるものは、透明電極パターンの視認性は良好であるが、鉛筆硬度は低い。
From Table 6 above, those provided with cured films of the curable compositions 21 to 23 according to the examples of the present invention have sufficient pencil hardness even at low temperature (150 ° C.) baking while maintaining the visibility of the transparent electrode pattern. It can be seen that
On the other hand, any of the curable compositions C9 to C11 according to the comparative example and a cured film made of the curable composition C12 has good visibility of the transparent electrode pattern, but has low pencil hardness.
 2013年3月26日に出願された日本国特許出願2013-064599号の開示および2013年9月9日に出願された日本国特許出願2013-186394号は、その全体が参照により本明細書に取り込まれる。本明細書に記載された全ての文献、特許出願、および技術規格は、個々の文献、特許出願、および技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。 The disclosure of Japanese Patent Application No. 2013-064599 filed on March 26, 2013 and the Japanese Patent Application No. 2013-186394 filed on September 9, 2013 are hereby incorporated by reference in their entirety. It is captured. All documents, patent applications, and technical standards mentioned in this specification are to the same extent as if each individual document, patent application, and technical standard were specifically and individually described to be incorporated by reference, Incorporated herein by reference.

Claims (13)

  1.  (A)少なくとも二つのエチレン性不飽和二重結合基及び少なくとも一つの2級水酸基を有する分子量1300未満の化合物と、
     (B)分子量1300以上の多分岐化合物と、
     (C)光重合開始剤及び熱重合開始剤からなる群より選ばれた少なくとも1種の開始剤と、
     を含む硬化性組成物。
    (A) a compound having a molecular weight of less than 1300 having at least two ethylenically unsaturated double bond groups and at least one secondary hydroxyl group;
    (B) a hyperbranched compound having a molecular weight of 1300 or more;
    (C) at least one initiator selected from the group consisting of a photopolymerization initiator and a thermal polymerization initiator;
    A curable composition comprising:
  2.  前記(B)多分岐化合物が、デンドリマー及びハイパーブランチポリマーからなる群より選ばれる少なくとも1種である請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein the (B) multi-branched compound is at least one selected from the group consisting of dendrimers and hyperbranched polymers.
  3.  更に、(D)側鎖に酸性基を有する樹脂を含む請求項1又は請求項2に記載の硬化性組成物。 Furthermore, (D) The curable composition of Claim 1 or Claim 2 containing resin which has an acidic group in a side chain.
  4.  更に、(E)着色剤を含む請求項1~請求項3のいずれか一項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 3, further comprising (E) a colorant.
  5.  更に、(F)屈折率調整材料を含む請求項1~請求項4のいずれか一項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 4, further comprising (F) a refractive index adjusting material.
  6.  前記(F)屈折率調整材料が、金属微粒子及び金属酸化物微粒子から選ばれた少なくとも一種の無機微粒子である請求項5に記載の硬化性組成物。 6. The curable composition according to claim 5, wherein the (F) refractive index adjusting material is at least one kind of inorganic fine particles selected from metal fine particles and metal oxide fine particles.
  7.  請求項1~請求項6のいずれか一項に記載の硬化性組成物を硬化してなる硬化膜。 A cured film formed by curing the curable composition according to any one of claims 1 to 6.
  8.  請求項7に記載の硬化膜を含むカラーフィルタ。 A color filter comprising the cured film according to claim 7.
  9.  請求項7項に記載の硬化膜を含む保護膜。 A protective film comprising the cured film according to claim 7.
  10.  請求項8に記載のカラーフィルタを含む表示装置。 A display device including the color filter according to claim 8.
  11.  請求項9に記載の保護膜を含む表示装置。 A display device comprising the protective film according to claim 9.
  12.  請求項8に記載のカラーフィルタを含む固体撮像素子。 A solid-state imaging device including the color filter according to claim 8.
  13.  請求項9に記載の保護膜を含む固体撮像素子。 A solid-state imaging device including the protective film according to claim 9.
PCT/JP2014/058700 2013-03-26 2014-03-26 Curable composition, cured film, color filter, protective film, display device and solid-state imaging element WO2014157427A1 (en)

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