WO2014123319A1 - Method for producing graphene film - Google Patents

Method for producing graphene film Download PDF

Info

Publication number
WO2014123319A1
WO2014123319A1 PCT/KR2014/000732 KR2014000732W WO2014123319A1 WO 2014123319 A1 WO2014123319 A1 WO 2014123319A1 KR 2014000732 W KR2014000732 W KR 2014000732W WO 2014123319 A1 WO2014123319 A1 WO 2014123319A1
Authority
WO
WIPO (PCT)
Prior art keywords
temperature
graphene
carrier tape
film
graphene film
Prior art date
Application number
PCT/KR2014/000732
Other languages
French (fr)
Korean (ko)
Inventor
윤종혁
원동관
Original Assignee
삼성테크윈 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성테크윈 주식회사 filed Critical 삼성테크윈 주식회사
Publication of WO2014123319A1 publication Critical patent/WO2014123319A1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/182Graphene
    • C01B32/194After-treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/18Stationary reactors having moving elements inside
    • B01J19/1887Stationary reactors having moving elements inside forming a thin film
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/18Stationary reactors having moving elements inside
    • B01J19/22Stationary reactors having moving elements inside in the form of endless belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24Stationary reactors without moving elements inside
    • B01J19/247Suited for forming thin films

Definitions

  • An embodiment of the present invention relates to a method for producing a graphene film.
  • Graphene is a material in which carbon is connected to each other in a hexagonal shape to form a honeycomb two-dimensional planar structure, and its thickness is very thin, transparent, and has a very high electrical conductivity. Many attempts have been made to apply graphene to touch panels, transparent displays, or flexible displays by using these characteristics of graphene. As interest in graphene increases, a method for mass production of high quality graphene is required.
  • Graphene is synthesized on the surface of the catalyst metal by chemical vapor deposition or the like by adding a carbon source, and attaches a heat-peelable tape to the synthesized graphene.
  • the catalyst metal on one surface of the graphene was removed, and then a heat release tape was peeled off by applying a predetermined heat and pressure, and then the graphene was transferred to the target substrate.
  • the heat-peelable tape includes a foamed cell on the adhesive surface and has a principle that the graphene and the heat-peeled tape are peeled off by foaming the foamed cell when a predetermined heat is applied. Therefore, the heat-peeled tape once used cannot be reused.
  • graphene is susceptible to damage due to foaming of the foaming cell at the time of peeling of the heat release tape.
  • Embodiments of the present invention provide a method for producing a graphene film to obtain a low damage graphene.
  • preparing a catalytic metal substrate synthesized with graphene on at least one surface Adhering a carrier tape to the graphene at a first temperature; Removing the catalytic metal substrate and then bonding the exposed graphene to a target substrate; And peeling the carrier tape at a second temperature lower than the first temperature. It includes, it provides a method for producing a graphene film.
  • FIG. 1 is a perspective view schematically showing the graphene referred to herein.
  • FIG. 2 is a schematic perspective view of a carrier tape referred to herein.
  • FIG. 3 shows the characteristics of the carrier tape shown in FIG. 2.
  • 4 to 9 are schematic side cross-sectional views of a laminate including graphene corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention.
  • FIG. 10 is a graph schematically showing a temperature corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention and a method for producing a graphene film according to a comparative example of the present invention.
  • Figure 11 is a data showing the results of repeatedly performing the adhesion and peeling of the carrier tape of 2 in the manufacturing process of the graphene film shown in FIGS.
  • FIG. 12 illustrates a method of manufacturing a graphene film according to an embodiment of the present invention by a roll to roll method as mentioned.
  • preparing a catalytic metal substrate synthesized with graphene on at least one surface Adhering a carrier tape to the graphene at a first temperature; Removing the catalytic metal substrate and then bonding the exposed graphene to a target substrate; And peeling the carrier tape at a second temperature lower than the first temperature. It includes, it provides a method for producing a graphene film.
  • Bonding to the target substrate is performed at a third temperature, wherein the third temperature is higher than the second temperature.
  • the carrier tape has an adhesive force at a temperature higher than a switching temperature, and loses adhesive force at a temperature lower than the switching temperature, wherein the first temperature and the third temperature are higher than the switching temperature, and the second temperature is the switching temperature.
  • the carrier tape includes a base layer and an adhesive layer, wherein the adhesive layer comprises an intelligent polymer.
  • the intelligent polymer has an amorphous state at the first temperature and the third temperature, and has a crystalline state at the second temperature.
  • Bonding the graphene to the carrier tape, and bonding the graphene to the target substrate, is performed in a pressurized state.
  • the peeled carrier tape was repeatedly used to prepare a graphene film.
  • the catalytic metal substrate, carrier tape and target substrate are panel type.
  • preparing a roll-type catalyst metal film of graphene synthesized on at least one surface Adhering a roll-type carrier tape to the graphene at a first temperature by pressing with a heating roller; Removing the catalytic metal film, and then pressing the exposed graphene with a heating roller to bond it to a roll-type target film; And peeling the carrier tape at a second temperature lower than the first temperature. It comprises a and all the steps are carried out in a roll-to-roll manner, provides a method for producing a graphene film.
  • Bonding to the target substrate is performed at a third temperature, wherein the third temperature is higher than the second temperature.
  • the carrier tape has an adhesive force at a temperature higher than a switching temperature, and loses adhesive force at a temperature lower than the switching temperature, wherein the first temperature and the third temperature are higher than the switching temperature, and the second temperature is the switching temperature.
  • the peeled carrier tape was repeatedly used to prepare a graphene film.
  • FIG. 1 is a perspective view schematically showing the graphene referred to herein.
  • graphene refers to a graphene in which a plurality of carbon atoms are covalently linked to each other to form a polycyclic aromatic molecule, which is formed in a film form.
  • a 6-membered ring is formed as a repeating unit, it is also possible to further include a 5-membered ring and / or a 7-membered ring.
  • the graphene film thus forms a single layer of covalently bonded carbon atoms (C) (usually sp2 bonds).
  • C covalently bonded carbon atoms
  • the graphene film may have various structures, and such a structure may vary depending on the content of 5-membered and / or 7-membered rings that may be included in graphene.
  • the graphene film may be formed of a single layer of graphene as shown, but they may be stacked with each other to form a plurality of layers, and the side end portion of the graphene may be saturated with a hydrogen atom (H). .
  • graphene film may mean a laminate in which the graphene of FIG. 1 is transferred to a target substrate or a target film.
  • FIG. 2 is a perspective view schematically showing the carrier tape 120 mentioned herein. 3 illustrates the characteristics of the carrier tape 120 of FIG. 2.
  • the “carrier tape” is a member supporting the graphene until the graphene is transferred to the target substrate in the process of manufacturing the graphene film.
  • the carrier tape 120 undergoes a process of adhering and peeling the graphene, and the electrical and optical properties of the obtained graphene film vary depending on the degree of damage to the graphene.
  • the carrier tape 120 includes a base layer 121 and an adhesive layer 122 several tens of micrometers thick.
  • the adhesive layer 122 is characterized in that it comprises a semi crystalline graft copolymer (semi-crystalline graft copolymer), for example, an intelligent polymer (intelimer polymer).
  • the adhesive layer 122 including such a component has a different adhesive force based on the switching temperature Ts.
  • the intelligent polymer has a crystalline state at a temperature lower than the switching temperature Ts, resulting in a decrease in volume and loss of adhesion.
  • the intelligent polymer may have a small adhesive strength of about 0.001 N / 25 mm to about 0.1 N / 25 mm.
  • the intelligent polymer has an amorphous stste at a temperature higher than the switching temperature Ts, resulting in an increase in volume and adhesion.
  • it may have a large adhesive strength of about 1N / 25mm to about 10N / 25mm.
  • the switching temperature (Ts) of the intelligent polymer can be controlled through the length of the aliphatic side-chain crystallizing group and the amount of active ingredient added. For example, the longer the length of the aliphatic side chain crystallization group, the higher the switching temperature (Ts), and conversely, the shorter the length, the lower the switching temperature (Ts). In addition, as the amount of the active ingredient added is increased, the switching temperature Ts is lowered, and when the amount is reduced, the switching temperature Ts can be increased.
  • the adhesive force may be maintained at a range of about 0.05N / 25mm to 5N / 25mm. If, when the adhesive force exceeds 5N / 25mm at a higher temperature than the switching temperature, the damage of the graphene is large when peeling the carrier tape 120, there is a problem that the electrical and optical properties of the graphene deteriorate.
  • the switching temperature Ts of the carrier tape 120 is suitably in the range of about 30 degrees Celsius to 80 degrees Celsius. If the switching temperature (Ts) is less than 30 degrees Celsius, it is not advantageous in the process because it takes a long time to cool the graphene film when peeling the carrier tape 120. In addition, when the switching temperature Ts is 80 degrees Celsius or more, the process of removing the catalyst metal substrate while the carrier tape 120 is bonded is performed at 80 degrees Celsius or less, so that the carrier tape 120 is removed when the catalyst metal substrate is removed. Is separated from the graphene is a problem that the graphene transfer to the target film is impossible.
  • the base layer 121 included in the carrier tape 120 may be made of polyethylene terephthalate (PET), silicon, polyimide, or the like, and serves to support the adhesive layer 122.
  • the carrier tape 120 may further include a protective layer (not shown) disposed on the adhesive layer 122 and protecting the adhesive layer 122 until the carrier tape 120 is adhered to the graphene.
  • the protective layer is, for example, a release paper, and is peeled off when the carrier tape 120 is attached to graphene.
  • the catalyst metal substrate, the carrier tape and the target substrate used in the production of the graphene film are panel type discontinuous.
  • the present invention is not limited thereto, and the catalyst metal film, the carrier film, and the target film used in the production of the graphene film as shown in FIG. 12 may be in a continuous roll type in one direction. Therefore, in the case of a roll type, the term is described as a film distinguishing from the panel type. In the following description, for convenience of description, the panel type will be described first.
  • 4 to 9 are schematic side cross-sectional views of a laminate including graphene corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention.
  • 10 is a graph schematically showing a temperature corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention and a method for producing a graphene film according to a comparative example of the present invention.
  • a shown in Figure 10 is a temperature value used in the graphene film manufacturing step according to an embodiment of the present invention.
  • A is to prepare a graphene film using a carrier tape of FIG.
  • B is a temperature value used in the graphene film manufacturing step according to the comparative example of the present invention.
  • a graphene film is manufactured by using a thermal release tape mentioned in [Background of the Invention].
  • the x-axis is divided into respective processes, respectively, a graphene forming process (I), a carrier tape bonding process (II), a catalyst metal removal process (III), a target substrate bonding process (IV), and a carrier tape peeling process (V). )to be.
  • the term “laminate” refers to a plurality of layers including graphene 110, and includes a catalytic metal substrate 101 on graphene 110 according to the graphene 110 manufacturing process. It may represent a state including at least one layer of the carrier tape 120 and the target substrate 130.
  • a catalytic metal substrate 101 is prepared.
  • the catalytic metal substrate 101 may be formed in a discontinuous panel form as a catalyst thin film for graphene growth.
  • the catalytic metal substrate 101 includes copper (Cu), nickel (Ni), cobalt (Co), iron (Fe), platinum (Pt), gold (Au), silver (Ag), aluminum (Al), and chromium (Cr).
  • the catalytic metal substrate 101 may be a single layer, or one of the multilayer substrates consisting of at least two layers may be the catalytic metal layer 101. In this case, the catalytic metal layer 101 is disposed on the outermost side of the multilayer substrate.
  • a pretreatment process of cleaning the surface of the catalytic metal substrate 101 is performed.
  • the pretreatment process is to remove foreign substances present on the surface of the catalytic metal substrate 101, and may use hydrogen gas.
  • by cleaning the surface of the catalyst metal substrate 101 using an acid or an alkaline solution defects in the formation of the graphene 110, which is a subsequent process, may be reduced. This step of cleaning the surface of the catalytic metal substrate 101 may be omitted as necessary.
  • the graphene 110 forming process is performed.
  • the graphene 110 formation process includes chemical vapor deposition (CVD), thermal chemical vapor deposition (TCVD), rapid thermal chemical vapor deposition (PTCVD), and inductively coupled plasma.
  • CVD chemical vapor deposition
  • TCVD thermal chemical vapor deposition
  • PTCVD rapid thermal chemical vapor deposition
  • ICP-CVD Inductive Coupled Plasma Chemical Vapor Deposition
  • ALD Atomic Layer Deposition
  • the carbonaceous carbon source is introduced into the graphene formation chamber and heat treated.
  • the heat treatment consists of heating and cooling.
  • an inert gas or an inert gas is injected into the graphene forming chamber, and then the internal space is heated.
  • the temperature of the interior space may be about 500 ° C or 1000 ° C or more.
  • the gaseous source of carbon is then supplied to the interior space.
  • Gas sources of carbon dioxide are methane (CH 4 ), carbon monoxide (CO), ethane (C 2 H 6 ), ethylene (CH 2 ), ethanol (C 2 H 5 ), acetylene (C 2 H 2 ), propane (CH 3) CH 2 CH 3 ), propylene (C 3 H 6 ), butane (C 4 H 10 ), pentane (CH 3 (CH 2 ) 3 CH 3 ), pentene (C 5 H 10 ), cyclopentadiene (C 5 H 6 ), one or more selected from the group containing carbon atoms such as hexane (C 6 H 14 ), cyclohexane (C 6 H 12 ), benzene (C 6 H 6 ), toluene (C 7 H 8 ) may be used.
  • This gaseous carbon source is separated into carbon and hydrogen atoms at high temperatures.
  • the separated carbon atoms are deposited on the heated catalyst metal substrate 101, and the graphene 110 of FIG. 1 is formed while the catalyst metal substrate 101 is cooled.
  • the graphene 110 may be formed on at least one surface of the catalytic metal substrate 101.
  • the graphene 110 may be formed on both surfaces of the catalytic metal substrate 101, but is not limited thereto.
  • the graphene 110 may be formed only on one surface of the catalytic metal substrate 101.
  • the rest of the process will be described based on an example in which the graphene 110 is formed on one surface of the catalytic metal substrate 101.
  • the laminate 50 of FIG. 5 is bonded to one surface of the carrier tape 120 of FIG. 2.
  • the stack 50 of FIG. 5 and the carrier tape 120 of FIG. 2 are disposed such that the top surface of the graphene 110 and the adhesive layer 122 of FIG. 2 face each other.
  • the laminated body 50 of FIG. 5 and the carrier tape 120 are bonded together by applying heat and pressure.
  • the carrier tape 120 of FIG. 2 since the carrier tape 120 of FIG. 2 has an adhesive force at a temperature higher than the switching temperature Ts, the carrier tape 120 bonding process II is shown in FIG. 10.
  • the temperature is higher than the switching temperature Ts.
  • the switching temperature Ts of the carrier tape 120 is about 30 degrees Celsius, the process may be performed at about 50 degrees to 70 degrees Celsius.
  • bonding the carrier tape 120 is accompanied by a step of pressing to prevent wrinkles or voids (void) between the graphene 110 and the adhesive layer (122 of FIG. 2).
  • the process of adhering the heat-peelable tape to the laminate of FIG. 5 does not require high temperature, and thus may be mainly performed at room temperature.
  • the catalyst metal substrate 101 is removed from the laminate 60 of FIG. 6.
  • the process of removing the catalytic metal substrate 101 may use a wet etching process.
  • the present invention is not limited thereto, and a dry etching process of etching or polishing one surface of the catalytic metal substrate 101 before the wet etching process or adding a polishing process may be used to shorten the catalyst metal substrate 101 removal process time. have.
  • the catalyst metal removal liquid may vary depending on the type of catalyst metal, but is typically ammonium persulfate ((NH 4 ) 2 S 2 O 8 ), hydrogen fluoride (HF), buffered oxide etch (BOE), iron chloride (FeCl 3 ), Iron nitrate (Fe (NO 3 ) 3 ), copper chloride (CuCl 2 ), hydrogen peroxide (H 2 O 2 ), sulfuric acid (H 2 SO 4 ), sodium persulfate (Na 2 S 2 O 8 ), and the like can be used. .
  • the present invention is not limited thereto, and a solution of persulfate-based solution, which is a composition including hydrogen peroxide (H 2 O 2 ), sulfuric acid (H 2 SO 4 ), and water (H 2 O), may be used.
  • the catalytic metal removal process (III) may be performed at a temperature higher than the switching temperature Ts as shown in FIG. 10. Because, while removing the catalyst metal, the carrier tape 120 and the graphene 110 should be kept in a bonded state, and if the step of removing the catalyst metal is performed at low temperature, the removal rate of the catalyst metal is slow and efficient. Because it falls. For example, when the switching temperature Ts of the carrier tape 120 is about 30 degrees Celsius, the present process may be performed at about 30 degrees to 50 degrees Celsius.
  • Comparative Example B may also be made at a temperature higher than room temperature in order to speed up the catalyst metal removal rate.
  • Cu is used as the catalyst metal substrate 101, and H 2 O 2 , H 2 SO 4, and water are used as the catalyst metal removal liquid.
  • Persulfate-based solution containing a can be used.
  • Cu is oxidized by H 2 O 2 to be converted to CuO, and as shown in Scheme 2, CuO reacts with H 2 SO 4 to form CuSO 4 , which is a water-soluble salt.
  • the catalytic metal substrate 101 can be removed through the substrate.
  • the catalyst metal removal liquid remaining in the laminate may be further cleaned and dried.
  • the target substrate 130 refers to a substrate on which the graphene 110 is to be finally formed.
  • the target substrate 130 may include at least one of polyethylene terephthalate (PET), polyimide (PI), polydimethylsiloxane (PDMS), plastic, glass, and metal, but is not limited thereto. It is not.
  • the target substrate bonding process (IV) may be performed by pressing at a temperature higher than the switching temperature Ts as shown in FIG. 10. This is because the carrier tape 120 and the graphene 110 are bonded to each other while the target substrate 130 is bonded.
  • the step of bonding the target substrate 130 experimentally is performed only at room temperature, since the target substrate 130 is not bonded to the graphene 110, the target substrate 130 should be bonded at a high temperature.
  • the switching temperature Ts of the carrier tape 120 is about 30 degrees Celsius
  • the process may be performed at about 50 degrees to 70 degrees Celsius.
  • Comparative Example B does not require a temperature for maintaining the adhesion of the graphene 110 and the heat-peelable tape 120, so that the bonding of the target substrate 130 is performed only by pressing at room temperature. Can be.
  • the carrier tape 120 is peeled from the laminate 80 of FIG. 8.
  • FIG. 8 transfers the laminated body 80 to a peeling chamber, and then lowers an internal temperature below switching temperature Ts by a cooling apparatus.
  • the carrier tape 120 is peeled from the laminate 80 by applying a predetermined force.
  • the carrier tape peeling process (V) is switched as shown in FIG. 10.
  • the temperature is lower than the temperature Ts.
  • the switching temperature Td of the carrier tape 120 is about 30 degrees Celsius, the process may be performed at about 25 degrees Celsius or less, which is room temperature.
  • the heat peeling tape is peeled only when the foaming cell is foamed at a high temperature, so the process must be performed at a high temperature.
  • the process of removing the heat peeling tape may be performed at about 100 degrees Celsius or more.
  • the heat peeling tape peeling process is performed in a high temperature chamber.
  • the manufacture of the graphene film 90 is not limited to the thickness and the material of the target substrate 130.
  • the thickness of the target substrate 130 should be thinner.
  • the graphene film manufacturing process using the heat peeling tape involves a high temperature process after the target substrate 130 is transferred, the target substrate 130 must use a material having heat resistance, and the thickness of the target substrate 130 is increased.
  • the material of the target substrate 130 is not limited, and the thickness of the target substrate 130 may also be made as an ultra-thin film.
  • the present invention can be obtained a graphene film 90 less damage.
  • the graphene 110 was often damaged by the foaming of the foamed cell when the heat peeling tape was peeled off.
  • the carrier tape 120 of FIG. 2 when the carrier tape 120 of FIG. 2 is used, the graphene film 90 having good electrical and optical properties may be obtained since the carrier tape 120 is not related to the foam cell and thus fundamentally solves the problem.
  • Doping may be performed to improve the electrical characteristics of the exposed graphene 110, and may be performed by a dry doping or a wet doping method.
  • a protective film may be further attached onto the doped graphene 110.
  • the graphene film 110 thus produced may be further subjected to an analysis process to analyze whether there is no damage, what electrical characteristics.
  • the target substrate 130 coated with the graphene 110 may be referred to as a graphene film 90, and may be used as a transparent electrode film such as a flexible display, an organic light emitting diode, and a solar cell.
  • the manufacturing process of the graphene film 110 described above is not limited to the above description, some orders may be changed, some steps may be omitted or added.
  • 11 is a graph showing the degree of change in adhesive force when the carrier tape 120 of FIG. 2 is repeatedly used.
  • FIG. 11 is a data showing the results of repeatedly performing the adhesion and peeling of the carrier tape 120 of 2 in the manufacturing process of the graphene film shown in FIGS.
  • Each cycle shown in Figure 11 represents one time of the manufacturing process of the graphene film.
  • the process of adhering the carrier tape 120 is performed at a higher temperature than the switching temperature Ts
  • the process of peeling the carrier tape 120 is performed at a lower temperature than the switching temperature Ts.
  • the adhesive force may be maintained at about 50% or more of the initial adhesive force when repeated three or more times. Therefore, according to one embodiment of the present invention, by manufacturing the graphene film 90 using the carrier tape 120 of Figure 2 that can be repeatedly used, there is a feature that can reduce the process cost.
  • a cleaning process may be added to remove foreign matter or dust from the carrier tape 120 before the carrier tape 120 is reused.
  • FIG. 12 illustrates a method of manufacturing a graphene film according to an embodiment of the present invention by a roll to roll method as mentioned.
  • a continuous roll type catalyst metal film 101a carrier film 120a and a target film 130a are used.
  • the roll-type material is transferred while moving in one direction, thereby allowing mass production of graphene film.
  • the catalyst metal film 101a is prepared, but the catalyst metal film 101a is wound around the first unwinding roll 10.
  • the catalyst metal film 101a wound on the first take-up roll 10 is transferred to the graphene forming process (I) chamber, and then, on the at least one surface of the catalyst metal film 101 a as shown in the laminate 50 of FIG. A pin (110 in FIG. 5) is formed.
  • the carrier film 120a wound up on the 2nd unwinding roll 20 is unwinded, it is transferred to a carrier film bonding process (II) chamber, and is bonded by the 5th laminated body 50.
  • FIG. The carrier film 120a and the fifth laminated body 50 are bonded through the first heating-pressing roller set 21. That is, the first heating-pressing roller set 21 heats the carrier film 120a to have an adhesive force, and presses and adheres the carrier film 120a and the fifth laminated body 50 to the sixth laminated body 60. Manufacture).
  • the sixth laminated body 60 is transferred to the catalytic metal removal process (III) chamber to remove the catalytic metal film 101a, thereby producing the seventh laminated body 70.
  • the target film 130a wound on the third unwinding roll 30 is transferred to the target film bonding step (IV) chamber and bonded to the seventh laminated body 70.
  • the target film 130a and the frame 7 laminate 70 are bonded to each other through the second heating-pressing roller set 32. That is, the second heating-pressing roller set 32 heats the carrier film 120a to maintain adhesion, and presses and adheres the target film 130a and the seventh laminated body 70 to the eighth laminated body 80. Manufacture).
  • the carrier film 120a is peeled off from the eighth laminated body 80 transferred to the carrier film peeling process (V) chamber.
  • the chamber includes a cooling device to maintain an internal temperature lower than the switching temperature Ts of the carrier film 120a. Therefore, in this chamber, the adhesive force of the carrier film 120a is lost and the carrier film 120a is easily peeled off from the eighth laminated body 80. The carrier film 120a thus peeled off is recovered and reused in the fourth unwinding roll.
  • embodiments of the present invention may be applied to a transparent electrode including graphene, an active layer, a display device including the same, an electronic device, an optoelectronic device, a battery, a solar cell, and the like.

Abstract

The present invention provides a method for producing a graphene film, comprising the steps of: preparing a catalytic metal substrate having graphene synthesized on at least one surface thereof; bonding a carrier tape to the graphene at a first temperature; removing the catalytic metal substrate and then bonding the exposed graphene to a target substrate; and peeling the carrier tape at a second temperature, which is lower than the first temperature.

Description

그래핀 필름의 제조 방법 Graphene Film Production Method
본 발명의 실시예는 그래핀 필름의 제조 방법에 관한 것이다. An embodiment of the present invention relates to a method for producing a graphene film.
그래핀(Graphene)은 탄소가 육각형의 형태로 서로 연결되어 벌집 모양의 2차원 평면 구조를 이루는 물질로서, 그 두께가 매우 얇고 투명하며 전기 전도성이 매우 큰 특성을 가진다. 그래핀의 이러한 특성을 이용하여 그래핀을 터치 패널, 투명 디스플레이 또는 플렉서블(flexible) 디스플레이 등에 적용하려는 시도가 많이 이루어지고 있다. 이와 같은 그래핀에 대한 관심이 증대됨에 따라 고품질의 그래핀을 대량 생산하기 위한 방법이 요구되고 있다.Graphene is a material in which carbon is connected to each other in a hexagonal shape to form a honeycomb two-dimensional planar structure, and its thickness is very thin, transparent, and has a very high electrical conductivity. Many attempts have been made to apply graphene to touch panels, transparent displays, or flexible displays by using these characteristics of graphene. As interest in graphene increases, a method for mass production of high quality graphene is required.
그래핀은 탄소 공급원을 투입하여 화학 기상 증착법 등에 의해 촉매 금속의 표면에 합성되며, 합성된 그래핀에 열박리 테이프를 붙인다. 다음으로 그래핀 일면의 촉매 금속을 제거한 후 소정의 열과 압력을 가하여 열박리 테이프(Thermal release tape)를 박리한 후, 그래핀을 타겟 기판에 전사하였다. 여기서, 열박리 테이프는 접착 면에 발포 셀을 포함하며 소정의 열을 가하는 경우 발포 셀이 발포하여 그래핀과 열박리 테이프가 박리되는 원리를 가진다. 따라서, 한 번 사용한 열박리 테이프는 재사용이 불가능하다. 또한, 열박리 테이프의 박리시 발포 셀의 발포에 의해 그래핀이 손상을 받기 쉽다.Graphene is synthesized on the surface of the catalyst metal by chemical vapor deposition or the like by adding a carbon source, and attaches a heat-peelable tape to the synthesized graphene. Next, the catalyst metal on one surface of the graphene was removed, and then a heat release tape was peeled off by applying a predetermined heat and pressure, and then the graphene was transferred to the target substrate. Here, the heat-peelable tape includes a foamed cell on the adhesive surface and has a principle that the graphene and the heat-peeled tape are peeled off by foaming the foamed cell when a predetermined heat is applied. Therefore, the heat-peeled tape once used cannot be reused. In addition, graphene is susceptible to damage due to foaming of the foaming cell at the time of peeling of the heat release tape.
본 발명의 실시예는 손상이 적은 그래핀을 얻기 위한 그래핀 필름의 제조 방법을 제공한다. Embodiments of the present invention provide a method for producing a graphene film to obtain a low damage graphene.
상술한 과제를 해결하기 위한 본 발명의 일 실시예에 의하면, 적어도 일면에 그래핀이 합성된 촉매 금속 기판을 준비하는 단계; 제1온도에서 상기 그래핀에 캐리어 테이프을 접착하는 단계; 상기 촉매 금속 기판을 제거한 후, 노출된 상기 그래핀을 타겟 기판에 접합하는 단계; 및 상기 제1온도 보다 낮은 제2온도에서 상기 캐리어 테이프를 박리하는 단계; 를 포함하는, 그래핀 필름의 제조 방법을 제공한다. According to an embodiment of the present invention for solving the above problems, preparing a catalytic metal substrate synthesized with graphene on at least one surface; Adhering a carrier tape to the graphene at a first temperature; Removing the catalytic metal substrate and then bonding the exposed graphene to a target substrate; And peeling the carrier tape at a second temperature lower than the first temperature. It includes, it provides a method for producing a graphene film.
본 발명의 실시예에 의하면, 손상이 적은 그래핀 필름을 얻을 수 있고, 캐리어 테이프의 재사용이 가능하여 경제적인 특징이 있다. According to the embodiment of the present invention, it is possible to obtain a graphene film with little damage, and it is possible to reuse the carrier tape, which is economical.
도 1은 본 명세서에서 언급되는 그래핀을 개략적으로 나타낸 사시도이다.1 is a perspective view schematically showing the graphene referred to herein.
도 2는 본 명세서에서 언급되는 캐리어 테이프를 개략적으로 나타낸 사시도이다. 2 is a schematic perspective view of a carrier tape referred to herein.
도 3은 도 2에 도시된 캐리어 테이프의 특성을 나타낸 것이다. FIG. 3 shows the characteristics of the carrier tape shown in FIG. 2.
도 4 내지 도 9는 본 발명의 일 실시예에 의한 그래핀 필름의 제조 방법의 각 단계에 대응되는 그래핀을 포함하는 적층체의 개략적인 측단면도이다. 4 to 9 are schematic side cross-sectional views of a laminate including graphene corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention.
도 10은 본 발명의 일 실시예에 의한 그래핀 필름의 제조 방법 및 본 발명의 비교예에 의한 그래핀 필름의 제조 방법의 각 단계에 대응하는 온도를 각각 개략적으로 표시한 그래프이다. 10 is a graph schematically showing a temperature corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention and a method for producing a graphene film according to a comparative example of the present invention.
도 11의 경우 도 4 내지 도 9에서 도시한 그래핀 필름의 제조 공정 중에서도 2의 캐리어 테이프의 접착 및 박리를 반복적으로 수행한 결과를 나타낸 데이터이다.In the case of Figure 11 is a data showing the results of repeatedly performing the adhesion and peeling of the carrier tape of 2 in the manufacturing process of the graphene film shown in FIGS.
도 12는 언급한 바와 같이 롤투롤(roll to roll) 방법으로 본 발명의 일 실시예에 의한 그래핀 필름을 제조하는 방법을 나타낸 것이다.12 illustrates a method of manufacturing a graphene film according to an embodiment of the present invention by a roll to roll method as mentioned.
상술한 과제를 해결하기 위한 본 발명의 일 실시예에 의하면, 적어도 일면에 그래핀이 합성된 촉매 금속 기판을 준비하는 단계; 제1온도에서 상기 그래핀에 캐리어 테이프을 접착하는 단계; 상기 촉매 금속 기판을 제거한 후, 노출된 상기 그래핀을 타겟 기판에 접합하는 단계; 및 상기 제1온도 보다 낮은 제2온도에서 상기 캐리어 테이프를 박리하는 단계; 를 포함하는, 그래핀 필름의 제조 방법을 제공한다. According to an embodiment of the present invention for solving the above problems, preparing a catalytic metal substrate synthesized with graphene on at least one surface; Adhering a carrier tape to the graphene at a first temperature; Removing the catalytic metal substrate and then bonding the exposed graphene to a target substrate; And peeling the carrier tape at a second temperature lower than the first temperature. It includes, it provides a method for producing a graphene film.
상기 타겟 기판에 접합하는 단계는 제3온도에서 수행되며, 상기 제3온도는 상기 제2온도보다 높다.Bonding to the target substrate is performed at a third temperature, wherein the third temperature is higher than the second temperature.
상기 캐리어 테이프는 스위칭 온도보다 높은 온도에서 접착력을 가지고, 상기 스위칭 온도보다 낮은 온도에서 접착력을 잃으며, 상기 제1온도 및 상기 제3온도는 상기 스위칭 온도보다 높고, 상기 제2온도는 상기 스위칭 온도보다 낮다.The carrier tape has an adhesive force at a temperature higher than a switching temperature, and loses adhesive force at a temperature lower than the switching temperature, wherein the first temperature and the third temperature are higher than the switching temperature, and the second temperature is the switching temperature. Lower than
상기 캐리어 테이프는 베이스층 및 접착층을 포함하며, 상기 접착층은 인텔리머 폴리머를 포함한다. The carrier tape includes a base layer and an adhesive layer, wherein the adhesive layer comprises an intelligent polymer.
상기 인텔리머 폴리머는 상기 제1온도 및 상기 제3온도에서 무정형 상태를 가지고, 상기 제2온도에서 결정 상태를 갖는다. The intelligent polymer has an amorphous state at the first temperature and the third temperature, and has a crystalline state at the second temperature.
상기 그래핀을 캐리어 테이프을 접착하는 단계, 및 상기 그래핀을 타겟 기판에 접합하는 단계는, 가압한 상태에서 수행된다. Bonding the graphene to the carrier tape, and bonding the graphene to the target substrate, is performed in a pressurized state.
박리된 상기 캐리어 테이프를 반복적으로 사용하여 그래핀 필름을 제조한다. The peeled carrier tape was repeatedly used to prepare a graphene film.
상기 촉매 금속 기판, 캐리어 테이프 및 타겟 기판은 패널 타입이다. The catalytic metal substrate, carrier tape and target substrate are panel type.
상술한 과제를 해결하기 위한 본 발명의 일 실시예에 의하면, 적어도 일면에 그래핀이 합성된 롤 타입의 촉매 금속 필름을 준비하는 단계; 가열 롤러로 가압하여 제1온도에서 상기 그래핀에 롤 타입의 캐리어 테이프을 접착하는 단계; 상기 촉매 금속 필름을 제거한 후, 노출된 상기 그래핀을 가열 롤러로 가압하여 롤 타입의 타겟 필름에 접합하는 단계; 및 상기 제1온도 보다 낮은 제2온도에서 상기 캐리어 테이프를 박리하는 단계; 를 포함하며 상기 단계는 모두 롤투롤 방식으로 진행되는, 그래핀 필름의 제조 방법을 제공한다. According to an embodiment of the present invention for solving the above problems, preparing a roll-type catalyst metal film of graphene synthesized on at least one surface; Adhering a roll-type carrier tape to the graphene at a first temperature by pressing with a heating roller; Removing the catalytic metal film, and then pressing the exposed graphene with a heating roller to bond it to a roll-type target film; And peeling the carrier tape at a second temperature lower than the first temperature. It comprises a and all the steps are carried out in a roll-to-roll manner, provides a method for producing a graphene film.
상기 타겟 기판에 접합하는 단계는 제3온도에서 수행되며, 상기 제3온도는 상기 제2온도보다 높다.Bonding to the target substrate is performed at a third temperature, wherein the third temperature is higher than the second temperature.
상기 캐리어 테이프는 스위칭 온도보다 높은 온도에서 접착력을 가지고, 상기 스위칭 온도보다 낮은 온도에서 접착력을 잃으며, 상기 제1온도 및 상기 제3온도는 상기 스위칭 온도보다 높고, 상기 제2온도는 상기 스위칭 온도보다 낮다.The carrier tape has an adhesive force at a temperature higher than a switching temperature, and loses adhesive force at a temperature lower than the switching temperature, wherein the first temperature and the third temperature are higher than the switching temperature, and the second temperature is the switching temperature. Lower than
박리된 상기 캐리어 테이프를 반복적으로 사용하여 그래핀 필름을 제조한다.The peeled carrier tape was repeatedly used to prepare a graphene film.
본 발명은 다양한 변환을 가할 수 있고 여러 가지 실시예를 가질 수 있는 바, 특정 실시예들을 도면에 예시하고 상세한 설명에 상세하게 설명하고자 한다. 그러나, 이는 본 발명을 특정한 실시 형태에 대해 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변환, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다. 본 발명을 설명함에 있어서 관련된 공지 기술에 대한 구체적인 설명이 본 발명의 요지를 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다. As the invention allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the written description. However, this is not intended to limit the present invention to specific embodiments, it should be understood to include all transformations, equivalents, and substitutes included in the spirit and scope of the present invention. In the following description of the present invention, if it is determined that the detailed description of the related known technology may obscure the gist of the present invention, the detailed description thereof will be omitted.
본 명세서에서 사용되는 제1, 제2 등의 용어는 다양한 구성요소들을 설명하는데 사용될 수 있지만, 구성요소들은 용어들에 의해 한정되어서는 안 된다. 용어들은 하나의 구성요소를 다른 구성요소로부터 구별하는 목적으로만 사용된다. The terms first, second, etc. used herein may be used to describe various components, but the components should not be limited by the terms. The terms are only used to distinguish one component from another.
본 명세서에서 층, 막, 영역, 판 등의 부분이 다른 부분 "위에" 또는 "상에" 있다고 할 때, 이는 다른 부분 "바로 위에" 있는 경우뿐 아니라 그 중간에 또 다른 부분이 있는 경우도 포함한다.In this specification, when a part such as a layer, film, region, plate, etc. is said to be "on" or "on" another part, this includes not only the case where the other part is "right on" but also another part in the middle. do.
이하, 본 발명에 따른 실시예를 도면을 참조하여 상세히 설명하기로 하며, 도면을 참조하여 설명함에 있어 실질적으로 동일하거나 대응하는 구성 요소는 동일한 도면번호를 부여하고 이에 대한 중복되는 설명은 생략하기로 한다. 도면에서 여러 층 및 영역을 명확하게 표현하기 위하여 두께를 확대하여 나타내었다. 그리고 도면에서, 설명의 편의를 위해 일부 층 및 영역의 두께를 과장되게 나타내었다.Hereinafter, embodiments according to the present invention will be described in detail with reference to the drawings, and in the following description with reference to the drawings, substantially the same or corresponding components will be given the same reference numerals, and redundant description thereof will be omitted. do. In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. In the drawings, the thicknesses of layers and regions are exaggerated for clarity.
도 1은 본 명세서에서 언급되는 그래핀을 개략적으로 나타낸 사시도이다.1 is a perspective view schematically showing the graphene referred to herein.
본 명세서에서 사용되는 "그래핀(graphene)" 이라는 용어는 복수개의 탄소원자들이 서로 공유결합으로 연결되어 폴리시클릭 방향족 분자를 형성하는 그래핀이 막 형태로 형성된 것으로서, 공유결합으로 연결된 탄소원자들은 기본 반복단위로서 6원환을 형성하나, 5원환 및/또는 7원환을 더 포함하는 것도 가능하다. 따라서 그래핀 막은 서로 공유 결합된 탄소원자(C)들(통상 sp2 결합)의 단일층을 이룬다. 그래핀 막은 다양한 구조를 가질 수 있으며, 이와 같은 구조는 그래핀 내에 포함될 수 있는 5원환 및/또는 7원환의 함량에 따라 달라질 수 있다. As used herein, the term "graphene" refers to a graphene in which a plurality of carbon atoms are covalently linked to each other to form a polycyclic aromatic molecule, which is formed in a film form. Although a 6-membered ring is formed as a repeating unit, it is also possible to further include a 5-membered ring and / or a 7-membered ring. The graphene film thus forms a single layer of covalently bonded carbon atoms (C) (usually sp2 bonds). The graphene film may have various structures, and such a structure may vary depending on the content of 5-membered and / or 7-membered rings that may be included in graphene.
그래핀 막은 도시된 바와 같이 그래핀의 단일층으로 이루어질 수 있으나, 이들이 여러 개 서로 적층되어 복수층을 형성하는 것도 가능하며, 통상 상기 그래핀의 측면 말단부는 수소원자(H)로 포화될 수 있다.The graphene film may be formed of a single layer of graphene as shown, but they may be stacked with each other to form a plurality of layers, and the side end portion of the graphene may be saturated with a hydrogen atom (H). .
한편, 본 명세서에서 사용되는 “그래핀 필름”은 도 1의 그래핀이 타겟 기판 또는 타겟 필름에 전사된 적층체를 의미할 수 있다. On the other hand, as used herein, "graphene film" may mean a laminate in which the graphene of FIG. 1 is transferred to a target substrate or a target film.
도 2는 본 명세서에서 언급되는 캐리어 테이프(120)를 개략적으로 나타낸 사시도이다. 도 3은 도 2의 캐리어 테이프(120)의 특성을 나타낸 것이다. 2 is a perspective view schematically showing the carrier tape 120 mentioned herein. 3 illustrates the characteristics of the carrier tape 120 of FIG. 2.
본 명세서에서 사용되는“캐리어 테이프”는 그래핀 필름을 제조하는 과정에서 그래핀이 타겟 기판에 전사되기 전까지 그래핀을 지지하는 부재이다. 캐리어 테이프(120)는 그래핀에 접착 및 박리되는 과정을 거치며, 이 과정에서 그래핀이 받는 손상의 정도에 따라 수득된 그래핀 필름의 전기적 특성 및 광학적 특성이 달라지게 된다. As used herein, the "carrier tape" is a member supporting the graphene until the graphene is transferred to the target substrate in the process of manufacturing the graphene film. The carrier tape 120 undergoes a process of adhering and peeling the graphene, and the electrical and optical properties of the obtained graphene film vary depending on the degree of damage to the graphene.
캐리어 테이프(120)는 베이스층(121) 및 수십 마이크로미터 두께의 접착층(122)을 포함한다. 접착층(122)은 반결정성 그래프트 공중합체(semi crystalline graft copolymer), 예를 들어 인텔리머 폴리머(intelimer polymer), 를 포함하는 것을 특징으로 한다. 이러한 성분을 포함하는 접착층(122)은 도 3(a)에 도시된 바와 같이 스위칭 온도(Ts)를 기준으로 접착력이 달라진다. 상세히, 도 3(b)와 같이 인텔리머 폴리머는 스위칭 온도(Ts)보다 낮은 온도에서 결정 상태(crystalline state)를 가져 부피가 줄어들고 접착력을 잃는다. 예를 들어, 약 0.001N/25mm 내지 0.1N/25mm 정도의 작은 접착력을 가질 수 있다. 그러나, 도 3(c)와 같이 인텔리머 폴리머는 스위칭 온도(Ts)보다 높은 온도에서 무정형 상태(amorphous stste)를 가져 부피가 늘어나며 접착력을 가지게 된다. 예를 들어, 약 1N/25mm 내지 10N/25mm 정도의 큰 접착력을 가질 수 있다. The carrier tape 120 includes a base layer 121 and an adhesive layer 122 several tens of micrometers thick. The adhesive layer 122 is characterized in that it comprises a semi crystalline graft copolymer (semi-crystalline graft copolymer), for example, an intelligent polymer (intelimer polymer). As shown in FIG. 3A, the adhesive layer 122 including such a component has a different adhesive force based on the switching temperature Ts. In detail, as shown in FIG. 3 (b), the intelligent polymer has a crystalline state at a temperature lower than the switching temperature Ts, resulting in a decrease in volume and loss of adhesion. For example, it may have a small adhesive strength of about 0.001 N / 25 mm to about 0.1 N / 25 mm. However, as shown in (c) of FIG. 3, the intelligent polymer has an amorphous stste at a temperature higher than the switching temperature Ts, resulting in an increase in volume and adhesion. For example, it may have a large adhesive strength of about 1N / 25mm to about 10N / 25mm.
인텔리머 폴리머의 스위칭 온도(Ts)는 지방족 곁사슬 결정화 그룹(aliphatic side-chain crystallizing group)의 길이 및 첨가되는 활성 성분(active ingredient)의 양을 통해 제어할 수 있다. 예를 들어, 지방족 곁사슬 결정화 그룹의 길이가 길어지면 스위칭 온도(Ts)도 높아지며, 반대로 길이가 짧아지면 스위칭 온도(Ts)도 낮아진다. 또한, 첨가되는 활성 성분의 양이 늘어나면 스위칭 온도(Ts)는 낮아지며, 양이 줄어들면 스위칭 온도(Ts)는 높아질 수 있다. The switching temperature (Ts) of the intelligent polymer can be controlled through the length of the aliphatic side-chain crystallizing group and the amount of active ingredient added. For example, the longer the length of the aliphatic side chain crystallization group, the higher the switching temperature (Ts), and conversely, the shorter the length, the lower the switching temperature (Ts). In addition, as the amount of the active ingredient added is increased, the switching temperature Ts is lowered, and when the amount is reduced, the switching temperature Ts can be increased.
본 발명의 일 실시예에 의하면 캐리어 테이프(120)는 그래핀에 직접 접착하고 그래핀으로부터 박리되므로 접착력의 범위가 약 0.05N/25mm 내지 5N/25mm 로 유지되는 것이 좋다. 만약, 스위칭 온도보다 고온에서 접착력이 5N/25mm를 초과하는 경우 캐리어 테이프(120)를 박리시 그래핀의 손상이 커서 그래핀의 전기적 특성 및 광학적 특성이 나빠지는 문제가 있다. According to an embodiment of the present invention, since the carrier tape 120 is directly adhered to graphene and peeled off from graphene, the adhesive force may be maintained at a range of about 0.05N / 25mm to 5N / 25mm. If, when the adhesive force exceeds 5N / 25mm at a higher temperature than the switching temperature, the damage of the graphene is large when peeling the carrier tape 120, there is a problem that the electrical and optical properties of the graphene deteriorate.
한편, 본 발명의 일 실시예에 의하면 캐리어 테이프(120)의 스위칭 온도(Ts)는 약 섭씨 30도 내지 80도 범위 내인 것이 적절하다. 만약 스위칭 온도(Ts)가 섭씨 30도 이하인 경우, 캐리어 테이프(120)을 박리할 때 그래핀 필름을 냉각하는데 장시간이 소요되므로 공정상 유리하지 않다. 또한 스위칭 온도(Ts)가 섭씨 80도 이상인 경우, 캐리어 테이프(120)를 접합한 상태에서 촉매 금속 기판을 제거하는 공정이 섭씨 80도 이하에서 진행되므로 촉매 금속 기판을 제거할 때 캐리어 테이프(120)가 그래핀으로부터 분리되어 타겟 필름에 그래핀 전사가 불가능한 문제가 있다. On the other hand, according to one embodiment of the present invention, the switching temperature Ts of the carrier tape 120 is suitably in the range of about 30 degrees Celsius to 80 degrees Celsius. If the switching temperature (Ts) is less than 30 degrees Celsius, it is not advantageous in the process because it takes a long time to cool the graphene film when peeling the carrier tape 120. In addition, when the switching temperature Ts is 80 degrees Celsius or more, the process of removing the catalyst metal substrate while the carrier tape 120 is bonded is performed at 80 degrees Celsius or less, so that the carrier tape 120 is removed when the catalyst metal substrate is removed. Is separated from the graphene is a problem that the graphene transfer to the target film is impossible.
캐리어 테이프(120)에 포함되는 베이스층(121)은 폴리에틸렌텔레프탈레이트(PET), 실리콘, 또는 폴리이미드 등으로 이루어 질 수 있으며, 접착층(122)을 지지하는 역할을 한다. 캐리어 테이프(120)는 접착층(122) 상부에 배치되며 캐리어 테이프(120)을 그래핀에 접착하기 전까지 접착층(122)을 보호하는 보호층(미도시)을 더 포함할 수 있다. 보호층은 예컨대 이형지로써, 캐리어 테이프(120)를 그래핀에 접착할 때 박리되어 제거된다.The base layer 121 included in the carrier tape 120 may be made of polyethylene terephthalate (PET), silicon, polyimide, or the like, and serves to support the adhesive layer 122. The carrier tape 120 may further include a protective layer (not shown) disposed on the adhesive layer 122 and protecting the adhesive layer 122 until the carrier tape 120 is adhered to the graphene. The protective layer is, for example, a release paper, and is peeled off when the carrier tape 120 is attached to graphene.
이하에서는 이러한 캐리어 테이프(120)를 사용하여 그래핀 필름을 제조하는 방법을 설명한다. Hereinafter, a method of manufacturing a graphene film using the carrier tape 120 will be described.
도 4 내지 도 9 에서는 그래핀 필름의 제조에 사용되는 촉매 금속 기판, 캐리어 테이프 및 타겟 기판이 불연속적이 패널 타입(panel) 인 것을 도시하였다. 그러나 본 발명은 이에 한정되지 않으며 도 12 와 같이 그래핀 필름의 제조에 사용되는 촉매 금속 필름, 캐리어 필름 및 타겟 필름이 일 방향으로 연속적인 롤 타입(roll type)일 수 있다. 따라서, 롤타입의 경우 패널 타입과 구별하여 용어를 필름으로 기재한다. 이하에서는 설명의 편의를 위하여 패널 타입인 경우를 기준으로 먼저 설명한다. 4 to 9 show that the catalyst metal substrate, the carrier tape and the target substrate used in the production of the graphene film are panel type discontinuous. However, the present invention is not limited thereto, and the catalyst metal film, the carrier film, and the target film used in the production of the graphene film as shown in FIG. 12 may be in a continuous roll type in one direction. Therefore, in the case of a roll type, the term is described as a film distinguishing from the panel type. In the following description, for convenience of description, the panel type will be described first.
도 4 내지 도 9는 본 발명의 일 실시예에 의한 그래핀 필름의 제조 방법의 각 단계에 대응되는 그래핀을 포함하는 적층체의 개략적인 측단면도이다. 도 10은 본 발명의 일 실시예에 의한 그래핀 필름의 제조 방법 및 본 발명의 비교예에 의한 그래핀 필름의 제조 방법의 각 단계에 대응하는 온도를 각각 개략적으로 표시한 그래프이다. 4 to 9 are schematic side cross-sectional views of a laminate including graphene corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention. 10 is a graph schematically showing a temperature corresponding to each step of the method for producing a graphene film according to an embodiment of the present invention and a method for producing a graphene film according to a comparative example of the present invention.
도 10에 도시된 A는 본 발명의 일 실시예에 의한 그래핀 필름 제조 단계에 사용된 온도 값이다. A의 경우 도 2의 캐리어 테이프를 사용하여 그래핀 필름을 제조하는 것이다. 한편, B는 본 발명의 비교예에 의한 그래핀 필름 제조 단계에서 사용된 온도 값이다. B의 경우 [발명의 배경이 되는 기술]에서 언급한 열박리 테이프(Thermal release tape)를 사용하여 그래핀 필름을 제조하는 것이다. 도 10에서 x축은 각 공정으로 구별되는데, 각각 그래핀 형성 공정(Ⅰ), 캐리어 테이프 접합 공정(Ⅱ), 촉매 금속 제거 공정(Ⅲ), 타겟 기판 접합 공정(Ⅳ) 및 캐리어 테이프 박리 공정(Ⅴ)이다. A shown in Figure 10 is a temperature value used in the graphene film manufacturing step according to an embodiment of the present invention. In the case of A is to prepare a graphene film using a carrier tape of FIG. On the other hand, B is a temperature value used in the graphene film manufacturing step according to the comparative example of the present invention. In the case of B, a graphene film is manufactured by using a thermal release tape mentioned in [Background of the Invention]. In FIG. 10, the x-axis is divided into respective processes, respectively, a graphene forming process (I), a carrier tape bonding process (II), a catalyst metal removal process (III), a target substrate bonding process (IV), and a carrier tape peeling process (V). )to be.
본 명세서에서 사용되는 "적층체" 라는 용어는 그래핀(110)을 포함하는 복수의 층을 지칭하는 것으로서, 그래핀(110) 제조 과정에 따라 그래핀(110)에 촉매 금속 기판(101), 캐리어 테이프(120), 및 타겟 기판(130) 중 적어도 하나 이상의 층을 포함한 상태를 나타낼 수 있다.As used herein, the term “laminate” refers to a plurality of layers including graphene 110, and includes a catalytic metal substrate 101 on graphene 110 according to the graphene 110 manufacturing process. It may represent a state including at least one layer of the carrier tape 120 and the target substrate 130.
도 4를 참조하면, 먼저 촉매 금속 기판(101)을 준비 한다.Referring to FIG. 4, first, a catalytic metal substrate 101 is prepared.
촉매 금속 기판(101)은 그래핀 성장을 위한 촉매 박막으로서 불연속적인 패널 형태로 이루어질 수 있다. 촉매 금속 기판(101)은 구리(Cu), 니켈(Ni), 코발트(Co), 철(Fe), 백금(Pt), 금(Au), 은(Ag), 알루미늄(Al), 크롬(Cr), 마그네슘(Mg), 망간(Mn), 몰리브덴(Mo), 로듐(Rh), 실리콘(Si), 탄탈럼(Ta), 티타늄(Ti), 텅스텐(W), 우라늄(U), 바나듐(V), 팔라듐(Pd), 이트리움(Y), 지르코늄(Zr), 게르마늄(Ge), 황동(brass), 청동(bronze), 백동(white brass) 및 스테인레스 스틸(stainless steel) 중 적어도 하나의 금속 또는 합금을 포함할 수 있으나, 이에 제한되는 것은 아니다. The catalytic metal substrate 101 may be formed in a discontinuous panel form as a catalyst thin film for graphene growth. The catalytic metal substrate 101 includes copper (Cu), nickel (Ni), cobalt (Co), iron (Fe), platinum (Pt), gold (Au), silver (Ag), aluminum (Al), and chromium (Cr). ), Magnesium (Mg), manganese (Mn), molybdenum (Mo), rhodium (Rh), silicon (Si), tantalum (Ta), titanium (Ti), tungsten (W), uranium (U), vanadium ( V), at least one of palladium (Pd), yttrium (Y), zirconium (Zr), germanium (Ge), brass, bronze, white brass and stainless steel It may include a metal or an alloy, but is not limited thereto.
촉매 금속 기판(101)은 단일 층일 수도 있고, 적어도 2개의 층으로 이루어진 다층 기판 중 한 개의 층이 촉매 금속층(101)일 수 있다. 이 경우 촉매 금속층(101)은 다층 기판의 최외곽에 배치된다.The catalytic metal substrate 101 may be a single layer, or one of the multilayer substrates consisting of at least two layers may be the catalytic metal layer 101. In this case, the catalytic metal layer 101 is disposed on the outermost side of the multilayer substrate.
그래핀(110)을 형성하기 전에 촉매 금속 기판(101)의 표면을 세정하는 전처리 과정을 진행한다. 전처리 과정은 촉매 금속 기판(101)의 표면에 존재하는 이물질을 제거하기 위한 것으로, 수소 기체를 사용할 수 있다. 또한, 산 또는 알칼리 용액 등을 사용하여 촉매 금속 기판(101)의 표면을 세정함으로써, 이후의 공정인 그래핀(110) 형성 시 결함을 줄일 수 있다. 촉매 금속 기판(101)의 표면을 세정하는 본 단계는 필요에 따라 생략될 수 있다.Before the graphene 110 is formed, a pretreatment process of cleaning the surface of the catalytic metal substrate 101 is performed. The pretreatment process is to remove foreign substances present on the surface of the catalytic metal substrate 101, and may use hydrogen gas. In addition, by cleaning the surface of the catalyst metal substrate 101 using an acid or an alkaline solution, defects in the formation of the graphene 110, which is a subsequent process, may be reduced. This step of cleaning the surface of the catalytic metal substrate 101 may be omitted as necessary.
다음으로, 도 5를 참조하면 그래핀(110) 형성 공정이 진행된다.Next, referring to FIG. 5, the graphene 110 forming process is performed.
그래핀(110) 형성 공정에는 화학기상증착법(Chemical Vapor Deposition: CVD), 열 화학기상증착법(Thermal Chemical Vapor Deposition: TCVD), 급속 열 화학기상증착법(Rapid Thermal Chemical Vapor Deposition: PTCVD), 유도결합플라즈마 화학기상증착법(Inductive Coupled Plasma Chemical Vapor Deposition: ICP-CVD), 원자층증착법(Atomic Layer Deposition: ATLD) 등 다양한 공정이 이용될 수 있다. The graphene 110 formation process includes chemical vapor deposition (CVD), thermal chemical vapor deposition (TCVD), rapid thermal chemical vapor deposition (PTCVD), and inductively coupled plasma. Various processes, such as Inductive Coupled Plasma Chemical Vapor Deposition (ICP-CVD) and Atomic Layer Deposition (ATLD), may be used.
촉매 금속 기판(101)이 그래핀 형성 챔버로 이송되면, 그래핀 형성 챔버 내에 기상의 탄소공급원을 투입하고 열처리한다. 열처리는 가열 및 냉각으로 이루어진다. 상세히, 그래핀 형성 챔버에 불활성 가스 또는 비활성 가스를 주입한 후 내부 공간을 가열한다. 예컨대 내부 공간의 온도는 약 500 ℃ 또는 1000℃ 또는 그 이상이 될 수 있다. 이 후 내부 공간에 기상의 탄소 공급원을 공급한다. When the catalytic metal substrate 101 is transferred to the graphene formation chamber, the carbonaceous carbon source is introduced into the graphene formation chamber and heat treated. The heat treatment consists of heating and cooling. In detail, an inert gas or an inert gas is injected into the graphene forming chamber, and then the internal space is heated. For example, the temperature of the interior space may be about 500 ° C or 1000 ° C or more. The gaseous source of carbon is then supplied to the interior space.
기상의 탄소 공급원은 메탄(CH4), 일산화탄소(CO), 에탄(C2H6), 에틸렌(CH2), 에탄올(C2H5), 아세틸렌(C2H2), 프로판(CH3CH2CH3), 프로필렌(C3H6), 부탄(C4H10), 펜탄(CH3(CH2)3CH3), 펜텐(C5H10), 사이클로펜타디엔(C5H6), 헥산(C6H14), 시클로헥산(C6H12), 벤젠(C6H6), 톨루엔(C7H8) 등 탄소 원자가 포함된 군에서 선택된 하나 이상이 사용될 수 있다. Gas sources of carbon dioxide are methane (CH 4 ), carbon monoxide (CO), ethane (C 2 H 6 ), ethylene (CH 2 ), ethanol (C 2 H 5 ), acetylene (C 2 H 2 ), propane (CH 3) CH 2 CH 3 ), propylene (C 3 H 6 ), butane (C 4 H 10 ), pentane (CH 3 (CH 2 ) 3 CH 3 ), pentene (C 5 H 10 ), cyclopentadiene (C 5 H 6 ), one or more selected from the group containing carbon atoms such as hexane (C 6 H 14 ), cyclohexane (C 6 H 12 ), benzene (C 6 H 6 ), toluene (C 7 H 8 ) may be used.
이와 같은 기상의 탄소 공급원은 고온에서 탄소 원자와 수소 원자로 분리된다. 분리된 탄소 원자는 가열된 촉매 금속 기판(101)에 증착되고, 촉매 금속 기판(101)이 냉각되면서 도 1의 그래핀(110)이 형성된다. This gaseous carbon source is separated into carbon and hydrogen atoms at high temperatures. The separated carbon atoms are deposited on the heated catalyst metal substrate 101, and the graphene 110 of FIG. 1 is formed while the catalyst metal substrate 101 is cooled.
도 10에는 그래핀 형성 공정(Ⅰ) 중 내부 공간 가열시 그래핀 형성 챔버의 온도를 표시한 것이다. 그래핀 형성 공정(Ⅰ) 의 경우 본 발명의 일 실시예 A 및 비교예 B 에 공통적인 공정이므로 온도 값이 동일하다. 10 shows the temperature of the graphene formation chamber during the internal space heating of the graphene formation process (I). In the case of the graphene forming process (I), since the process is common to one embodiment A and Comparative Example B of the present invention, temperature values are the same.
그래핀(110)은 촉매 금속 기판(101)의 적어도 한 면에 형성될 수 있다. 촉매 금속 기판(101)의 양 면에 그래핀(110)이 형성될 수 있으나, 이에 한정되는 것은 아니며, 촉매 금속 기판(101)의 한 면에만 그래핀(110)이 형성할 수도 있다. 이하에서는 그래핀(110)이 촉매 금속 기판(101)의 일 면에 형성된 예를 기준으로 나머지 공정에 대해서도 설명한다. The graphene 110 may be formed on at least one surface of the catalytic metal substrate 101. The graphene 110 may be formed on both surfaces of the catalytic metal substrate 101, but is not limited thereto. The graphene 110 may be formed only on one surface of the catalytic metal substrate 101. Hereinafter, the rest of the process will be described based on an example in which the graphene 110 is formed on one surface of the catalytic metal substrate 101.
다음으로, 도 6를 참조하면 도 2의 캐리어 테이프(120)의 일면에 도 5의 적층체(50)를 접합한다.Next, referring to FIG. 6, the laminate 50 of FIG. 5 is bonded to one surface of the carrier tape 120 of FIG. 2.
먼저, 그래핀(110) 상면과 접착층(도 2의 122)이 마주보도록 도 5의 적층체(50) 및 도 2의 캐리어 테이프(120)를 배치한다. 다음으로, 열과 압력을 가하여 도 5의 적층체(50)와 캐리어 테이프(120)를 접합한다. First, the stack 50 of FIG. 5 and the carrier tape 120 of FIG. 2 are disposed such that the top surface of the graphene 110 and the adhesive layer 122 of FIG. 2 face each other. Next, the laminated body 50 of FIG. 5 and the carrier tape 120 are bonded together by applying heat and pressure.
본 발명의 일 실시예 A에 의하면, 도 2의 캐리어 테이프(120)는 스위칭 온도(Ts)보다 높은 온도에서 접착력을 가지므로, 캐리어 테이프(120) 접합 공정(Ⅱ)은 도 10에 도시된 바와 같이 스위칭 온도(Ts)보다 높은 온도에서 이루어 진다. 예를 들어, 캐리어 테이프(120)의 스위칭 온도(Ts)가 약 섭씨 30도 인 경우 본 공정은 약 섭씨 50도 내지 70도에서 수행될 수 있다. 한편, 캐리어 테이프(120)를 접합할 때 그래핀(110)과 접착층(도 2의 122) 사이에 주름이나 보이드(void)가 생기지 않게 하기 위해 가압하는 공정이 수반된다.According to an embodiment A of the present invention, since the carrier tape 120 of FIG. 2 has an adhesive force at a temperature higher than the switching temperature Ts, the carrier tape 120 bonding process II is shown in FIG. 10. Likewise, the temperature is higher than the switching temperature Ts. For example, when the switching temperature Ts of the carrier tape 120 is about 30 degrees Celsius, the process may be performed at about 50 degrees to 70 degrees Celsius. On the other hand, when bonding the carrier tape 120 is accompanied by a step of pressing to prevent wrinkles or voids (void) between the graphene 110 and the adhesive layer (122 of FIG. 2).
그러나, 본 발명의 일 실시예 A와 달리 비교예 B의 경우 도 5의 적층체에 열박리 테이프를 접착하는 공정은 고온의 요하지 않으므로, 주로 실온에서 이루어질 수 있다. However, unlike Example A of the present invention, in the case of Comparative Example B, the process of adhering the heat-peelable tape to the laminate of FIG. 5 does not require high temperature, and thus may be mainly performed at room temperature.
다음으로 도 7을 참조하면, 도 6의 적층체(60)에서 촉매 금속 기판(101)을 제거한다. Next, referring to FIG. 7, the catalyst metal substrate 101 is removed from the laminate 60 of FIG. 6.
촉매 금속 기판(101)을 제거하는 공정은 습식 에칭 공정을 사용할 수 있다. 그러나 이에 한정되지 않고 습식 에칭 공정 전에 촉매 금속 기판(101)의 일면을 플라즈마(plasma)로 에칭 하거나, 폴리싱(polishing) 하는 건식 에칭 공정을 추가함으로써 촉매 금속 기판(101) 제거 공정 시간을 단축할 수 있다. The process of removing the catalytic metal substrate 101 may use a wet etching process. However, the present invention is not limited thereto, and a dry etching process of etching or polishing one surface of the catalytic metal substrate 101 before the wet etching process or adding a polishing process may be used to shorten the catalyst metal substrate 101 removal process time. have.
촉매 금속 제거액은 촉매 금속의 종류에 따라 달라질 수 있으나, 대표적으로 암모늄퍼설페이트((NH4)2S2O8), 불화수소(HF), BOE(buffered oxide etch), 염화철(FeCl3), 질산철(Fe(NO3)3), 염화동(CuCl2), 과산화수소(H2O2), 황산(H2SO4), 및 소듐퍼설페이트(Na2S2O8) 등이 사용될 수 있다. 그러나 이에 제한되는 것은 아니며 과산화수소(H2O2), 황산(H2SO4) 및 물(H2O)을 포함하는 조성물인 과수황산계의 용액을 사용할 수도 있다.The catalyst metal removal liquid may vary depending on the type of catalyst metal, but is typically ammonium persulfate ((NH 4 ) 2 S 2 O 8 ), hydrogen fluoride (HF), buffered oxide etch (BOE), iron chloride (FeCl 3 ), Iron nitrate (Fe (NO 3 ) 3 ), copper chloride (CuCl 2 ), hydrogen peroxide (H 2 O 2 ), sulfuric acid (H 2 SO 4 ), sodium persulfate (Na 2 S 2 O 8 ), and the like can be used. . However, the present invention is not limited thereto, and a solution of persulfate-based solution, which is a composition including hydrogen peroxide (H 2 O 2 ), sulfuric acid (H 2 SO 4 ), and water (H 2 O), may be used.
본 발명의 일 실시예 A에 의하면, 촉매 금속 제거 공정(Ⅲ)는 도 10에 도시된 바와 같이 스위칭 온도(Ts)보다 높은 온도에서 이루어질 수 있다. 왜냐하면, 촉매 금속을 제거하는 동안, 캐리어 테이프(120)와 그래핀(110)은 접합된 상태가 유지되어야 하며, 촉매 금속을 제거하는 단계가 저온에서 이루어질 경우 촉매 금속을 제거하는 속도가 느려 효율이 떨어지기 때문이다. 예를 들어, 캐리어 테이프(120)의 스위칭 온도(Ts)가 약 섭씨 30도 인 경우 본 공정은 약 섭씨 30도 내지 50도에서 수행될 수 있다. According to Example A of the present invention, the catalytic metal removal process (III) may be performed at a temperature higher than the switching temperature Ts as shown in FIG. 10. Because, while removing the catalyst metal, the carrier tape 120 and the graphene 110 should be kept in a bonded state, and if the step of removing the catalyst metal is performed at low temperature, the removal rate of the catalyst metal is slow and efficient. Because it falls. For example, when the switching temperature Ts of the carrier tape 120 is about 30 degrees Celsius, the present process may be performed at about 30 degrees to 50 degrees Celsius.
한편, 본 발명의 일 실시예 A와 유사하게 비교예 B의 경우도 촉매 금속 제거 속도를 빠르게 하기 위해 실온보다 높은 온도에서 이루어질 수 있다.On the other hand, similar to Example A of the present invention, Comparative Example B may also be made at a temperature higher than room temperature in order to speed up the catalyst metal removal rate.
촉매 금속 제거액을 사용하여 촉매 금속 기판(101)을 제거하는 과정의 비제한적인 예시로서, 촉매 금속 기판(101)으로 Cu를 사용하고, 촉매 금속 제거액으로 H2O2, H2SO4 및 물을 포함하는 과수황산계의 용액을 사용할 수 있다. 하기 반응식 1에 나타낸 바와 같이 Cu가 H2O2에 의해 산화되어 CuO로 전환되고, 하기 반응식 2에 나타낸 바와 같이 상기 CuO는 H2SO4와 반응하여 수용성 염인 CuSO4를 생성하므로, 이러한 반응을 통하여 촉매 금속 기판(101)을 제거할 수 있다. As a non-limiting example of removing the catalyst metal substrate 101 using the catalyst metal removal liquid, Cu is used as the catalyst metal substrate 101, and H 2 O 2 , H 2 SO 4, and water are used as the catalyst metal removal liquid. Persulfate-based solution containing a can be used. As shown in Scheme 1, Cu is oxidized by H 2 O 2 to be converted to CuO, and as shown in Scheme 2, CuO reacts with H 2 SO 4 to form CuSO 4 , which is a water-soluble salt. The catalytic metal substrate 101 can be removed through the substrate.
[반응식 1]Scheme 1
Cu + H2O2 → CuO + H2OCu + H 2 O 2 → CuO + H 2 O
[반응식 2]Scheme 2
CuO + H2SO4 → CuSO4 + H2OCuO + H 2 SO 4 → CuSO 4 + H 2 O
촉매 금속 기판(101) 제거 단계 이후에는 적층체에 잔류하는 촉매 금속 제거액을 세정하는 단계 및 건조 하는 단계를 더 포함할 수도 있다. After removing the catalyst metal substrate 101, the catalyst metal removal liquid remaining in the laminate may be further cleaned and dried.
다음으로, 도 8을 참조하면, 도 7의 적층체(70)에 타겟 기판(130)에 접합하는 공정이 진행된다.Next, referring to FIG. 8, a process of bonding the laminate 70 of FIG. 7 to the target substrate 130 is performed.
타겟 기판(130)은 최종적으로 그래핀(110)이 형성될 기재를 의미한다. 타겟 기판(130)으로는 폴리에틸렌테레프탈레이트 (polyethylene terephthalate:PET), 폴리이미드 (polyimide:PI), 폴리디메틸실록산(PDMS: polydimethylsiloxane), 플라스틱, 유리 및 금속 중 적어도 하나를 사용할 수 있으나, 이에 제한되는 것은 아니다. The target substrate 130 refers to a substrate on which the graphene 110 is to be finally formed. The target substrate 130 may include at least one of polyethylene terephthalate (PET), polyimide (PI), polydimethylsiloxane (PDMS), plastic, glass, and metal, but is not limited thereto. It is not.
본 발명의 일 실시예 A에 의하면, 타겟 기판 접합 공정(Ⅳ)는 도 10에 도시된 바와 같이 스위칭 온도(Ts)보다 높은 온도에서 가압함으로써 수행될 수 있다. 왜냐하면, 타겟 기판(130)을 접합하는 동안, 캐리어 테이프(120)와 그래핀(110)이 접합된 상태가 유지되어야 하기 때문이다. 또한 실험적으로 타겟 기판(130)을 접합하는 단계를 실온에서 가압만을 수행한 경우 타겟 기판(130)이 그래핀(110)에 접합되지 않았기 때문에 고온에서 타겟 기판(130)을 접합하여야 한다. 예를 들어, 캐리어 테이프(120)의 스위칭 온도(Ts)가 약 섭씨 30도 인 경우 본 공정은 약 섭씨 50도 내지 70도에서 수행될 수 있다.According to an embodiment A of the present invention, the target substrate bonding process (IV) may be performed by pressing at a temperature higher than the switching temperature Ts as shown in FIG. 10. This is because the carrier tape 120 and the graphene 110 are bonded to each other while the target substrate 130 is bonded. In addition, when the step of bonding the target substrate 130 experimentally is performed only at room temperature, since the target substrate 130 is not bonded to the graphene 110, the target substrate 130 should be bonded at a high temperature. For example, when the switching temperature Ts of the carrier tape 120 is about 30 degrees Celsius, the process may be performed at about 50 degrees to 70 degrees Celsius.
그러나, 본 발명의 일 실시예 A와 달리 비교예 B의 경우 그래핀(110)과 열박리 테이프(120)의 접착을 유지하는 온도를 요하지 않으므로, 실온에서 가압만으로 타겟 기판(130) 접합이 수행될 수 있다. However, unlike Example A of the present invention, Comparative Example B does not require a temperature for maintaining the adhesion of the graphene 110 and the heat-peelable tape 120, so that the bonding of the target substrate 130 is performed only by pressing at room temperature. Can be.
다음으로 도 9를 참조하며 캐리어 테이프(120)를 도 8의 적층체(80)로부터 박리한다. Next, referring to FIG. 9, the carrier tape 120 is peeled from the laminate 80 of FIG. 8.
먼저, 도 8이 적층체(80)를 박리 챔버로 이송한 후 냉각 장치에 의해 내부 온도를 스위칭 온도(Ts) 이하로 낮춘다. 다음으로 소정의 힘을 가하여 캐리어 테이프(120)를 도 8이 적층체(80)로부터 박리한다. First, FIG. 8 transfers the laminated body 80 to a peeling chamber, and then lowers an internal temperature below switching temperature Ts by a cooling apparatus. Next, the carrier tape 120 is peeled from the laminate 80 by applying a predetermined force.
본 발명의 일 실시예 A에 의하면, 도 2의 캐리어 테이프(120)는 스위칭 온도(Ts)보다 낮은 온도에서 접착력을 잃어버리므로, 캐리어 테이프 박리 공정(Ⅴ)은 도 10에 도시된 바와 같이 스위칭 온도(Ts)보다 낮은 온도에서 이루어 진다. 예를 들어, 캐리어 테이프(120)의 스위칭 온도(Td)가 약 섭씨 30도 인 경우 본 공정은 실온인, 약 섭씨 25도 이하에서 수행될 수 있다. According to one embodiment of the present invention, since the carrier tape 120 of FIG. 2 loses the adhesive force at a temperature lower than the switching temperature Ts, the carrier tape peeling process (V) is switched as shown in FIG. 10. The temperature is lower than the temperature Ts. For example, when the switching temperature Td of the carrier tape 120 is about 30 degrees Celsius, the process may be performed at about 25 degrees Celsius or less, which is room temperature.
그러나, 본 발명의 일 실시예 A와 달리 비교예 B의 경우, 열박리 테이프는 발포 셀이 고온에서 발포해야 박리되므로 해당 공정은 고온에서 수행되어야 한다. 예를 들어, 열박리 테이프를 제거하는 공정은 약 섭씨 100도 이상에서 수행될 수 있다. 따라서, 비교예 B의 경우 열박리 테이프 박리 공정은 고온의 챔버에서 수행된다. However, unlike Example A of the present invention, in Comparative Example B, the heat peeling tape is peeled only when the foaming cell is foamed at a high temperature, so the process must be performed at a high temperature. For example, the process of removing the heat peeling tape may be performed at about 100 degrees Celsius or more. Thus, for Comparative Example B, the heat peeling tape peeling process is performed in a high temperature chamber.
이와 같이, 본 발명의 일 실시예에 의하면 캐리어 테이프(120)를 박리할 때 고온 공정을 필요로 하지 않으므로, 타겟 기판(130)의 두께 및 재료에 제한되지 않는 그래핀 필름(90)의 제조가 가능한 특징이 있다. 사용자의 요구에 따라 그래핀 필름(90)을 보다 박막으로 형성하고자 하는 시도가 이루어지고 있으며, 이를 위해서는 타겟 기판(130)의 두께가 얇아져야 한다. 그런데, 열박리 테이프를 사용하는 그래핀 필름 제조 공정은 타겟 기판(130) 전사 후에 고온 공정이 수반되므로, 타겟 기판(130)이 내열성을 가지는 소재를 사용해야만 하고, 타겟 기판(130)의 두께를 일정 수준 이상 박막으로 할 수 없는 제약이 있다. 그런데, 본 발명의 일 실시예에 의하면 타겟 기판(130) 전사 후에 고온 공정이 없으므로 타겟 기판(130)의 소재가 한정되지 않고 타겟 기판(130)의 두께도 초박막으로 할 수 있는 특징이 있다. As such, according to one embodiment of the present invention, since the high temperature process is not required when peeling the carrier tape 120, the manufacture of the graphene film 90 is not limited to the thickness and the material of the target substrate 130. There are possible features. Attempts have been made to form the graphene film 90 into a thinner film according to a user's request. For this purpose, the thickness of the target substrate 130 should be thinner. However, since the graphene film manufacturing process using the heat peeling tape involves a high temperature process after the target substrate 130 is transferred, the target substrate 130 must use a material having heat resistance, and the thickness of the target substrate 130 is increased. There is a limitation that cannot be made into a thin film above a certain level. However, according to the exemplary embodiment of the present invention, since there is no high temperature process after the target substrate 130 is transferred, the material of the target substrate 130 is not limited, and the thickness of the target substrate 130 may also be made as an ultra-thin film.
또한, 본 발명의 일 실시예에 의하면 보다 손상이 적은 그래핀 필름(90)이 수득할 수 있다. 열박리 테이프를 사용하는 경우 열박리 테이프의 박리시 발포 셀의 발포에 의해 그래핀(110)이 손상되는 경우가 많았다. 그러나, 도 2의 캐리어 테이프(120)를 사용하면 발포셀과 관련이 없어 이러한 문제를 근본적으로 해결하므로, 전기적 및 광학적 특성이 좋은 그래핀 필름(90)을 얻을 수 있다. In addition, according to an embodiment of the present invention can be obtained a graphene film 90 less damage. In the case of using the heat peeling tape, the graphene 110 was often damaged by the foaming of the foamed cell when the heat peeling tape was peeled off. However, when the carrier tape 120 of FIG. 2 is used, the graphene film 90 having good electrical and optical properties may be obtained since the carrier tape 120 is not related to the foam cell and thus fundamentally solves the problem.
다음으로, 도시되지 않았으나 그래핀 (110) 도핑 공정이 진행된다.Next, although not shown, the graphene 110 doping process is performed.
노출된 그래핀 (110)의 전기적 특성을 향상시키기 위하여 도핑을 수행할 수 있는데, 건식 도핑 또는 습식 도핑 방법으로 진행될 수 있다. 또한, 도핑된 그래핀(110) 상에 보호 필름을 더 부착할 수도 있다. Doping may be performed to improve the electrical characteristics of the exposed graphene 110, and may be performed by a dry doping or a wet doping method. In addition, a protective film may be further attached onto the doped graphene 110.
다음으로, 이렇게 제작된 그래핀 필름(110)는 손상이 없는지, 어떠한 전기적 특성을 가지는 분석하는 분석 공정 등을 더 진행할 수도 있다. Next, the graphene film 110 thus produced may be further subjected to an analysis process to analyze whether there is no damage, what electrical characteristics.
상술한 바와 같이 그래핀(110)이 코팅된 타겟 기판(130)은 그래핀 필름(90)으로 지칭될 수 있으며, 플렉시블 디스플레이, 유기발광소자, 태양 전지 등의 투명전극 필름으로 사용될 수 있다. As described above, the target substrate 130 coated with the graphene 110 may be referred to as a graphene film 90, and may be used as a transparent electrode film such as a flexible display, an organic light emitting diode, and a solar cell.
상술한 그래핀 필름(110)의 제조 공정은 기술한 바에 한정되지 않으며, 일부 순서가 바뀔 수도 있고, 일부 단계가 생략되거나 추가될 수도 있다.The manufacturing process of the graphene film 110 described above is not limited to the above description, some orders may be changed, some steps may be omitted or added.
도 11는 도 2의 캐리어 테이프(120)를 반복적으로 사용하였을 때 접착력의 변화 정도를 나타낸 그래프이다. 11 is a graph showing the degree of change in adhesive force when the carrier tape 120 of FIG. 2 is repeatedly used.
도 11의 경우 도 4 내지 도 9에서 도시한 그래핀 필름의 제조 공정 중에서도 2의 캐리어 테이프(120)의 접착 및 박리를 반복적으로 수행한 결과를 나타낸 데이터이다. 도 11에서 표시한 각 회차는 그래핀 필름의 제조 공정 한 회를 나타낸 것이다. 각 회차에서 캐리어 테이프(120)를 접착하는 공정은 스위칭 온도(Ts)보다 고온에서 수행되며, 캐리어 테이프(120)를 박리하는 공정은 스위칭 온도(Ts)보다 저온에서 수행된다. In the case of Figure 11 is a data showing the results of repeatedly performing the adhesion and peeling of the carrier tape 120 of 2 in the manufacturing process of the graphene film shown in FIGS. Each cycle shown in Figure 11 represents one time of the manufacturing process of the graphene film. In each turn, the process of adhering the carrier tape 120 is performed at a higher temperature than the switching temperature Ts, and the process of peeling the carrier tape 120 is performed at a lower temperature than the switching temperature Ts.
도 11에서 확인할 수 있는 바와 같이, 도 2의 캐리어 테이프(120)의 경우 5회까지 반복하여 사용하더라도 접착력이 유지되는 것을 확인할 수 있다. 실험적으로, 도 2의 캐리어 테이프(120)의 경우 3회 이상 반복 사용시 접착력은 최초 사용 접착력의 약 50% 이상을 유지하는 특징이 있다. 따라서, 본 발명의 일 실시예에 의하면, 반복 사용 가능한 도 2의 캐리어 테이프(120)를 사용하여 그래핀 필름(90)을 제조함으로써, 공정 비용을 줄일 수 있는 특징이 있다. As can be seen in Figure 11, in the case of the carrier tape 120 of Figure 2 it can be confirmed that even if used repeatedly up to five times the adhesive force is maintained. Experimentally, in the case of the carrier tape 120 of FIG. 2, the adhesive force may be maintained at about 50% or more of the initial adhesive force when repeated three or more times. Therefore, according to one embodiment of the present invention, by manufacturing the graphene film 90 using the carrier tape 120 of Figure 2 that can be repeatedly used, there is a feature that can reduce the process cost.
한편, 캐리어 테이프(120)를 재사용하기 전에 캐리어 테이프(120)에 붙은 이물이나 먼지를 제거하는 세정 공정이 추가될 수 있다. Meanwhile, a cleaning process may be added to remove foreign matter or dust from the carrier tape 120 before the carrier tape 120 is reused.
도 12는 언급한 바와 같이 롤투롤(roll to roll) 방법으로 본 발명의 일 실시예에 의한 그래핀 필름을 제조하는 방법을 나타낸 것이다. 롤투롤 방법의 경우 연속적인 롤 타입의 촉매 금속 필름(101a) 캐리어 필름(120a) 및 타겟 필름(130a)을 사용한다. 롤투롤 방법의 경우 롤 타입의 재료를 일방향으로 이송하면서 진행하므로, 그래핀 필름의 대량 생산이 가능하다.12 illustrates a method of manufacturing a graphene film according to an embodiment of the present invention by a roll to roll method as mentioned. In the roll-to-roll method, a continuous roll type catalyst metal film 101a carrier film 120a and a target film 130a are used. In the roll-to-roll method, the roll-type material is transferred while moving in one direction, thereby allowing mass production of graphene film.
먼저, 촉매 금속 필름(101a)을 준비하는데, 촉매 금속 필름(101a)은 제1권출롤(10)에 권취되어 있다. 제1권출롤(10)에 권취된 촉매 금속 필름(101a)이 그래핀 형성 공정(Ⅰ) 챔버로 이송되어 도 5의 적층체(50)와 같이 촉매 금속 필름(101 a)의 적어도 일면에 그래핀(도 5의 110)이 형성된다. First, the catalyst metal film 101a is prepared, but the catalyst metal film 101a is wound around the first unwinding roll 10. The catalyst metal film 101a wound on the first take-up roll 10 is transferred to the graphene forming process (I) chamber, and then, on the at least one surface of the catalyst metal film 101 a as shown in the laminate 50 of FIG. A pin (110 in FIG. 5) is formed.
다음으로 제2권출롤(20)에 권취되어 있던 캐리어 필름(120a)이 풀리면서 캐리어 필름 접합 공정(Ⅱ) 챔버로 이송되며, 제5적층체(50)와 접합된다. 캐리어 필름(120a)과 제5적층체(50)는 제1가열-가압 롤러 세트(21)를 통해 접착된다. 즉, 제1가열-가압 롤러 세트(21)가 캐리어 필름(120a)을 가열하여 접착력을 갖도록 하고, 캐리어 필름(120a) 및 제5적층체(50)를 가압하여 접착하여 제6적층체(60)를 제조 한다. Next, while the carrier film 120a wound up on the 2nd unwinding roll 20 is unwinded, it is transferred to a carrier film bonding process (II) chamber, and is bonded by the 5th laminated body 50. FIG. The carrier film 120a and the fifth laminated body 50 are bonded through the first heating-pressing roller set 21. That is, the first heating-pressing roller set 21 heats the carrier film 120a to have an adhesive force, and presses and adheres the carrier film 120a and the fifth laminated body 50 to the sixth laminated body 60. Manufacture).
다음으로, 제6적층체(60)는 촉매 금속 제거 공정(Ⅲ) 챔버로 이송되어 촉매 금속 필름(101a)이 제거되며, 이로써 제7적층체(70)가 제조된다. Next, the sixth laminated body 60 is transferred to the catalytic metal removal process (III) chamber to remove the catalytic metal film 101a, thereby producing the seventh laminated body 70.
다음으로, 제3권출롤(30)에 권취된 타겟 필름(130a)이 타겟 필름 접합 공정 (Ⅳ) 챔버로 이송되어 제7적층체(70)와 접합한다. 타겟 필름(130a)과 테7적층체(70)는 제2가열-가압 롤러 세트(32)를 통해 접합한다. 즉, 제2가열-가압 롤러 세트(32)가 캐리어 필름(120a)을 가열하여 접착력을 유지시키고, 타겟 필름(130a) 및 제7적층체(70)를 가압하여 접착하여 제8적층체(80)를 제조 한다.Next, the target film 130a wound on the third unwinding roll 30 is transferred to the target film bonding step (IV) chamber and bonded to the seventh laminated body 70. The target film 130a and the frame 7 laminate 70 are bonded to each other through the second heating-pressing roller set 32. That is, the second heating-pressing roller set 32 heats the carrier film 120a to maintain adhesion, and presses and adheres the target film 130a and the seventh laminated body 70 to the eighth laminated body 80. Manufacture).
마지막으로, 캐리어 필름 박리 공정(Ⅴ) 챔버로 이송된 제8적층체(80)로부터 캐리어 필름(120a)이 박리된다. 이 챔버는 냉각 장치를 포함하여 캐리어 필름(120a)의 스위칭 온도(Ts)보다 낮은 내부 온도를 유지한다. 따라서, 이 챔버에서 캐리어 필름(120a)의 접착력이 소실되어 제8적층체(80)로부터 캐리어 필름(120a)이 쉽게 박리된다. 이렇게 박리된 캐리어 필름(120a)은 다시 제4권출롤에 회수되어 재사용된다. Finally, the carrier film 120a is peeled off from the eighth laminated body 80 transferred to the carrier film peeling process (V) chamber. The chamber includes a cooling device to maintain an internal temperature lower than the switching temperature Ts of the carrier film 120a. Therefore, in this chamber, the adhesive force of the carrier film 120a is lost and the carrier film 120a is easily peeled off from the eighth laminated body 80. The carrier film 120a thus peeled off is recovered and reused in the fourth unwinding roll.
도 12의 각 단계에 대한 자세한 설명은 도 4 내지 도 9 및 도 10을 통해 이미 설명하였으므로 중복되는 기재는 생략한다. A detailed description of each step of FIG. 12 has already been described with reference to FIGS. 4 through 9 and 10, and thus redundant descriptions are omitted.
본 발명은 도면에 도시된 실시 예를 참고로 설명되었으나 이는 예시적인 것에 불과하며, 당해 기술 분야에서 통상의 지식을 가진 자라면 이로부터 다양한 변형 및 균등한 다른 실시 예가 가능하다는 점을 이해할 것이다. 따라서, 본 발명의 진정한 기술적 보호 범위는 첨부된 특허청구범위의 기술적 사상에 의하여 정해져야 할 것이다.Although the present invention has been described with reference to the embodiments illustrated in the drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and equivalent other embodiments are possible. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.
본 발명의 일 실시예에 의하면, 그래핀을 포함하는 투명전극, 활성층, 이를 구비하는 표시소자, 전자소자, 광전소자, 배터리, 태양전지 등에 본 발명의 실시예들을 적용할 수 있다. According to an embodiment of the present invention, embodiments of the present invention may be applied to a transparent electrode including graphene, an active layer, a display device including the same, an electronic device, an optoelectronic device, a battery, a solar cell, and the like.

Claims (12)

  1. 적어도 일면에 그래핀이 합성된 촉매 금속 기판을 준비하는 단계;
    제1온도에서 상기 그래핀에 캐리어 테이프를 접착하는 단계;
    상기 촉매 금속 기판을 제거한 후, 노출된 상기 그래핀을 타겟 기판에 접합하는 단계; 및
    상기 제1온도 보다 낮은 제2온도에서 상기 캐리어 테이프를 박리하는 단계;
    를 포함하는, 그래핀 필름의 제조 방법.
    Preparing a catalytic metal substrate having graphene synthesized on at least one surface thereof;
    Adhering a carrier tape to the graphene at a first temperature;
    Removing the catalytic metal substrate and then bonding the exposed graphene to a target substrate; And
    Peeling the carrier tape at a second temperature lower than the first temperature;
    Comprising a graphene film.
  2. 제1항에 있어서,
    상기 타겟 기판에 접합하는 단계는 제3온도에서 수행되며, 상기 제3온도는 상기 제2온도보다 높은, 그래핀 필름의 제조 방법.
    The method of claim 1,
    Bonding to the target substrate is performed at a third temperature, wherein the third temperature is higher than the second temperature, a method for producing a graphene film.
  3. 제2항에 있어서,
    상기 캐리어 테이프는 스위칭 온도보다 높은 온도에서 접착력을 가지고, 상기 스위칭 온도보다 낮은 온도에서 접착력을 잃으며,
    상기 제1온도 및 상기 제3온도는 상기 스위칭 온도보다 높고, 상기 제2온도는 상기 스위칭 온도보다 낮은, 그래핀 필름의 제조 방법.
    The method of claim 2,
    The carrier tape has adhesion at temperatures above the switching temperature, and loses adhesion at temperatures below the switching temperature,
    And the first temperature and the third temperature are higher than the switching temperature, and the second temperature is lower than the switching temperature.
  4. 제1항에 있어서,
    상기 캐리어 테이프는 베이스층 및 접착층을 포함하며,
    상기 접착층은 인텔리머 폴리머를 포함하는, 그래핀 필름의 제조 방법.
    The method of claim 1,
    The carrier tape comprises a base layer and an adhesive layer,
    The adhesive layer comprises an intelligent polymer, a method for producing a graphene film.
  5. 제4항에 있어서,
    상기 인텔리머 폴리머는 상기 제1온도 및 상기 제3온도에서 무정형 상태를 가지고, 상기 제2온도에서 결정 상태를 갖는, 그래핀 필름의 제조 방법.
    The method of claim 4, wherein
    The intelligent polymer has an amorphous state at the first temperature and the third temperature, and has a crystalline state at the second temperature.
  6. 제1항에 있어서,
    상기 그래핀에 캐리어 테이프를 접착하는 단계, 및 상기 그래핀을 타겟 기판에 접합하는 단계는, 가압한 상태에서 수행되는, 그래핀 필름의 제조 방법.
    The method of claim 1,
    Adhering a carrier tape to the graphene, and bonding the graphene to a target substrate, are performed in a pressurized state.
  7. 제1항에 있어서,
    박리된 상기 캐리어 테이프를 반복적으로 사용하여 그래핀 필름을 제조하는, 그래핀 필름의 제조 방법.
    The method of claim 1,
    Method for producing a graphene film, by repeatedly using the peeled carrier tape to produce a graphene film.
  8. 제1항에 있어서,
    상기 촉매 금속 기판, 캐리어 테이프 및 타겟 기판은 패널 타입인, 그래핀 필름의 제조 방법.
    The method of claim 1,
    The catalyst metal substrate, the carrier tape and the target substrate is a panel type, a method for producing a graphene film.
  9. 적어도 일면에 그래핀이 합성된 롤 타입의 촉매 금속 필름을 준비하는 단계;
    가열 롤러로 가압하여 제1온도에서 상기 그래핀에 롤 타입의 캐리어 테이프을 접착하는 단계;
    상기 촉매 금속 필름을 제거한 후, 노출된 상기 그래핀을 가열 롤러로 가압하여 롤 타입의 타겟 필름에 접합하는 단계; 및
    상기 제1온도 보다 낮은 제2온도에서 상기 캐리어 테이프를 박리하는 단계;
    를 포함하며 상기 단계는 모두 롤투롤 방식으로 진행되는, 그래핀 필름의 제조 방법.
    Preparing a roll type catalyst metal film having graphene synthesized on at least one surface thereof;
    Adhering a roll-type carrier tape to the graphene at a first temperature by pressing with a heating roller;
    Removing the catalytic metal film, and then pressing the exposed graphene with a heating roller to bond it to a roll-type target film; And
    Peeling the carrier tape at a second temperature lower than the first temperature;
    Including the steps are all roll-to-roll method, the graphene film production method.
  10. 제9항에 있어서,
    상기 타겟 기판에 접합하는 단계는 제3온도에서 수행되며, 상기 제3온도는 상기 제2온도보다 높은, 그래핀 필름의 제조 방법.
    The method of claim 9,
    Bonding to the target substrate is performed at a third temperature, wherein the third temperature is higher than the second temperature, a method for producing a graphene film.
  11. 제10항에 있어서,
    상기 캐리어 테이프는 스위칭 온도보다 높은 온도에서 접착력을 가지고, 상기 스위칭 온도보다 낮은 온도에서 접착력을 잃으며,
    상기 제1온도 및 상기 제3온도는 상기 스위칭 온도보다 높고, 상기 제2온도는 상기 스위칭 온도보다 낮은, 그래핀 필름의 제조 방법.
    The method of claim 10,
    The carrier tape has adhesion at temperatures above the switching temperature, and loses adhesion at temperatures below the switching temperature,
    And the first temperature and the third temperature are higher than the switching temperature, and the second temperature is lower than the switching temperature.
  12. 제9항에 있어서,
    박리된 상기 캐리어 테이프를 반복적으로 사용하여 그래핀 필름을 제조하는, 그래핀 필름의 제조 방법.

    The method of claim 9,
    Method for producing a graphene film, by repeatedly using the peeled carrier tape to produce a graphene film.

PCT/KR2014/000732 2013-02-06 2014-01-27 Method for producing graphene film WO2014123319A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2013-0013495 2013-02-06
KR1020130013495A KR101926488B1 (en) 2013-02-06 2013-02-06 Method of manufacturing grapheme film

Publications (1)

Publication Number Publication Date
WO2014123319A1 true WO2014123319A1 (en) 2014-08-14

Family

ID=51299881

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2014/000732 WO2014123319A1 (en) 2013-02-06 2014-01-27 Method for producing graphene film

Country Status (2)

Country Link
KR (1) KR101926488B1 (en)
WO (1) WO2014123319A1 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017131302A1 (en) * 2016-01-28 2017-08-03 주식회사 참트론 Method for transferring graphene
WO2018164522A1 (en) * 2017-03-09 2018-09-13 이화여자대학교 산학협력단 Method for manufacturing electronic device and method for removing impurity using same
US10811162B2 (en) 2015-06-30 2020-10-20 Industry-Academic Cooperation Foundation, Yonsei University Method for healing defect of conductive layer, method for forming metal-carbon compound layer, 2D nano materials, transparent electrode and method for manufacturing the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101982616B1 (en) * 2017-01-25 2019-05-28 한국과학기술연구원 Methods of manufacturing graphene thin film

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007521372A (en) * 2003-07-03 2007-08-02 スリーエム イノベイティブ プロパティズ カンパニー Cling goods
KR20110042023A (en) * 2009-10-16 2011-04-22 성균관대학교산학협력단 Graphene roll-to-roll transfer method, graphene roll-to-roll transfer apparatus, and graphene roll
KR20120007998A (en) * 2010-07-15 2012-01-25 성균관대학교산학협력단 Low-temperature forming method of graphene, and direct transfer of graphene and graphene sheet using the same
KR20120052648A (en) * 2010-11-16 2012-05-24 삼성테크윈 주식회사 Apparatus for transferring graphene and method for transferring graphene
KR20120111659A (en) * 2011-04-01 2012-10-10 삼성테크윈 주식회사 Method for manufacturing film comprising graphene

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007521372A (en) * 2003-07-03 2007-08-02 スリーエム イノベイティブ プロパティズ カンパニー Cling goods
KR20110042023A (en) * 2009-10-16 2011-04-22 성균관대학교산학협력단 Graphene roll-to-roll transfer method, graphene roll-to-roll transfer apparatus, and graphene roll
KR20120007998A (en) * 2010-07-15 2012-01-25 성균관대학교산학협력단 Low-temperature forming method of graphene, and direct transfer of graphene and graphene sheet using the same
KR20120052648A (en) * 2010-11-16 2012-05-24 삼성테크윈 주식회사 Apparatus for transferring graphene and method for transferring graphene
KR20120111659A (en) * 2011-04-01 2012-10-10 삼성테크윈 주식회사 Method for manufacturing film comprising graphene

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10811162B2 (en) 2015-06-30 2020-10-20 Industry-Academic Cooperation Foundation, Yonsei University Method for healing defect of conductive layer, method for forming metal-carbon compound layer, 2D nano materials, transparent electrode and method for manufacturing the same
WO2017131302A1 (en) * 2016-01-28 2017-08-03 주식회사 참트론 Method for transferring graphene
KR101870643B1 (en) * 2016-01-28 2018-06-25 주식회사 참트론 Graphene transfer method
CN108602637A (en) * 2016-01-28 2018-09-28 株式会社参特伦 The transfer method of graphene
US20190061328A1 (en) * 2016-01-28 2019-02-28 Charmtron Co., Ltd. Method for transferring graphene
US10661542B2 (en) 2016-01-28 2020-05-26 Charmgraphene Co., Ltd. Method for transferring graphene
WO2018164522A1 (en) * 2017-03-09 2018-09-13 이화여자대학교 산학협력단 Method for manufacturing electronic device and method for removing impurity using same
US11038110B2 (en) 2017-03-09 2021-06-15 EWHA University—Industry Collaboration Foundation Method for manufacturing electronic device and method for removing impurity using same

Also Published As

Publication number Publication date
KR101926488B1 (en) 2018-12-07
KR20140100326A (en) 2014-08-14

Similar Documents

Publication Publication Date Title
KR101842018B1 (en) Method for manufacturing film comprising graphene
Yang et al. Chemical vapour deposition of graphene: Layer control, the transfer process, characterisation, and related applications
KR101813172B1 (en) Process for preparing multiple layered graphene
JP5787113B2 (en) Graphene roll and element
KR101858642B1 (en) Graphene transfer method
KR101982154B1 (en) Method of manufacturing Graphene film
KR101905646B1 (en) Low-temperature transfer method of graphene
KR101429518B1 (en) Method and apparatus for transferring graphene
US20160005881A1 (en) Stacked films and method for producing stacked films
KR101284535B1 (en) Transferring method of graphene, and graphene transferred flexible substrate thereby
JP5739175B2 (en) Graphene / polymer laminate and use thereof
WO2014123319A1 (en) Method for producing graphene film
KR20140032266A (en) Method for manufacturing grapheme layer
TW201627247A (en) Transfer of monolayer graphene onto flexible glass substrates
CN106276863A (en) A kind of method shifting Graphene
KR101723769B1 (en) Direct Transfer Method of Graphene and Method for Selective Atomic Layer Deposition onto Graphene Layer
KR102283976B1 (en) Defect-free method for transcripting graphene
KR101926485B1 (en) Method for getting graphene
KR102434700B1 (en) Method of fabricating graphene nano-mesh
KR101915192B1 (en) Method for gaining graphene
KR102347214B1 (en) Graphene composite barrier film and method for manufacturing the same
KR102274206B1 (en) Method for forming bi-layer graphene
KR101550301B1 (en) Laminate Apparatus and Method of Laminate
US20160365415A1 (en) Manufacturing method of graphene device
KR20140001371A (en) Graphene substrate and manufacturing method thereof

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14749689

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 14749689

Country of ref document: EP

Kind code of ref document: A1