WO2014083485A1 - Laser device for projecting a structured light pattern onto a scene - Google Patents

Laser device for projecting a structured light pattern onto a scene Download PDF

Info

Publication number
WO2014083485A1
WO2014083485A1 PCT/IB2013/060325 IB2013060325W WO2014083485A1 WO 2014083485 A1 WO2014083485 A1 WO 2014083485A1 IB 2013060325 W IB2013060325 W IB 2013060325W WO 2014083485 A1 WO2014083485 A1 WO 2014083485A1
Authority
WO
WIPO (PCT)
Prior art keywords
arrays
light pattern
vcsels
imaging
array
Prior art date
Application number
PCT/IB2013/060325
Other languages
French (fr)
Inventor
Holger Moench
Stephan Gronenborn
Mark Carpaij
Original Assignee
Koninklijke Philips N.V.
Philips Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips N.V., Philips Deutschland Gmbh filed Critical Koninklijke Philips N.V.
Priority to BR112015012073A priority Critical patent/BR112015012073A2/en
Priority to RU2015125550A priority patent/RU2655475C2/en
Priority to JP2015544580A priority patent/JP6270863B2/en
Priority to US14/647,836 priority patent/US10386178B2/en
Priority to EP13826602.8A priority patent/EP2926422B1/en
Priority to CN201380062417.4A priority patent/CN104798271B/en
Publication of WO2014083485A1 publication Critical patent/WO2014083485A1/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/254Projection of a pattern, viewing through a pattern, e.g. moiré
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2513Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object with several lines being projected in more than one direction, e.g. grids, patterns
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • G01S7/4814Constructional features, e.g. arrangements of optical elements of transmitters alone
    • G01S7/4815Constructional features, e.g. arrangements of optical elements of transmitters alone using multiple transmitters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/005Optical components external to the laser cavity, specially adapted therefor, e.g. for homogenisation or merging of the beams or for manipulating laser pulses, e.g. pulse shaping
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/40Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
    • H01S5/42Arrays of surface emitting lasers
    • H01S5/423Arrays of surface emitting lasers having a vertical cavity
    • H01S5/426Vertically stacked cavities
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/70Circuitry for compensating brightness variation in the scene
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/222Studio circuitry; Studio devices; Studio equipment
    • H04N5/262Studio circuits, e.g. for mixing, switching-over, change of character of image, other special effects ; Cameras specially adapted for the electronic generation of special effects
    • H04N5/265Mixing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02Systems using the reflection of electromagnetic waves other than radio waves
    • G01S17/06Systems determining position data of a target
    • G01S17/46Indirect determination of position data
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/88Lidar systems specially adapted for specific applications
    • G01S17/89Lidar systems specially adapted for specific applications for mapping or imaging
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/88Lidar systems specially adapted for specific applications
    • G01S17/93Lidar systems specially adapted for specific applications for anti-collision purposes
    • G01S17/931Lidar systems specially adapted for specific applications for anti-collision purposes of land vehicles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • H01S5/18394Apertures, e.g. defined by the shape of the upper electrode

Definitions

  • the present invention relates to a laser device for projecting a structured light pattern onto a scene using several arrays of semiconductor lasers, in particular vertical cavity surface emitting lasers (VCSELs). Structured light patterns projected onto a scene and observed with a camera enable the extraction of 3D information by image processing.
  • VCSELs vertical cavity surface emitting lasers
  • Such a method is applied e. g. in the Microsoft KinectTM game console and recently discussed for industrial applications, especially in the automotive field.
  • the new EU-NCAP safety norm enforces a distance measurement which is able to detect pedestrians and provides a resolution which allows autonomous measures taken by the car system.
  • the required structured light pattern can be generated by dedicated micro- optical systems like micro-lens arrays or diffractive optical elements (DOE) which are illuminated by a laser, e. g. by an array of VCSELs.
  • DOE diffractive optical elements
  • 2012/051588 Al which discloses a laser device for projecting a structured light pattern onto a scene using at least one VCSEL array.
  • the light from the VCSEL array is focused through a collimating micro-lens array which directs the beams from the VCSEL array to a DOE.
  • the DOE forms the beams into a variety of light patterns which then enable the desired 3D imaging.
  • the object is achieved with the laser device according to claim 1.
  • the proposed laser device is formed of several arrays of semiconductor lasers, each array comprising a preferably different irregular distribution of emission areas of the semiconductor lasers. This distribution deviates from a regular arrangement of the emission areas, e.g. in a grid or hexagonal pattern, preferably in a randomized fashion.
  • One or several optics are arranged in front of the arrays of semiconductor lasers to image said arrays to an imaging space and to superpose the images of said arrays in the imaging space thereby forming said light pattern.
  • the light pattern which may be projected to a scene or an imaging plane in the imaging space is composed of a plurality of beam spots originating from the semiconductor lasers of each array.
  • This image space corresponds to the capturing area of a 3D imaging system or system for extracting 3D information from a scene arranged in this image space. Due to the direct imaging a high efficiency of the laser device and a maximum contrast between bright and dark regions of the structured light pattern are achieved.
  • the fill factor is increased compared with known solutions since the images of the several semiconductor laser arrays are superimposed in the image space resulting in an increased density of beam spots due to the superposition.
  • the distribution of the emission areas of the semiconductor lasers of each array may be completely randomized with the condition that necessary distances between the emission areas due to the manufacturing process and construction of the lasers are maintained.
  • the distribution of the emission areas of each array may also be chosen such that the deviation of the position of these areas from a regular pattern is randomized but limited in the maximum distance of deviation, for example limited to a maximum distance of once or twice the diameter of the emission area in the corresponding direction of deviation. In the latter case preferably the distribution of the emission areas in each array and the superposition of the images of these arrays in the image space are selected such that not all but most of the beam spots do not overlap in the image space, preferably more than 80 %.
  • etch slopes and minimum oxide widths may be for example about 33 ⁇ for a small active area VCSEL of e. g. 3 ⁇ active diameter.
  • the active diameter corresponds to the emission area of the VCSEL. Larger active diameters require a larger pitch, e. g. a 10 ⁇ active area requires a 40 ⁇ pitch.
  • An irregular distribution or a randomization of the distribution of VCSELs means a freedom to move the position of a VCSEL mesa independent from the position of the neighboring VCSELs.
  • the irregular or randomized distribution of the emission areas of the semiconductor lasers is characterized by a random shift of the individual emitters in each array by position in the two directions of the surface with respect to an arrangement in a regular pattern. This shift covers a distance of at least the active diameter of the semiconductor laser, i.e. some of the lasers of each array are shifted by at least this distance.
  • the distribution of the emission areas or lasers in each array is completely randomized.
  • randomization means that this shift in the position with respect to a regular pattern of each individual emitter or the randomized distribution can be generated by a randomizing algorithm.
  • the term random or randomization in this context is however not restricted to the generation by a randomizing algorithm but also covers irregular distributions in which the shifts are only selected to avoid any periodicity or regularity in the distribution.
  • the imaging optics is adapted and arranged such that most of the beam spots on an image plane or scene in the image space comprise at least one neighboring beam spot which originates from a different array. This significantly reduces the problems of dead areas caused by failure patterns in the semiconductor arrays.
  • the semiconductor lasers are VCSELs. Since for small active diameters the pitch of VCSEL arrays is
  • the interlaced superposing results in an effective active ratio (bright versus dark) which is three times higher than with a single array.
  • a high effective aperture ratio is desirable, because on the one hand a bright spot should cover several pixels of a camera used for a extracting the 3D-information from the scene to which the light pattern is projected (determination of center of gravity is more accurate than single pixel).
  • the maximum number of pixels of a cheap camera is limited.
  • the laser device with VCSEL arrays also the shape of the emission area of the VCSELs, i. e. the emitting aperture or active region of the
  • VCSELs is varied. With such a variation of the VCSEL shape ambiguities in the recorded image for 3D information extraction are resolved more easily. As a consequence the number of spots can be reduced and less than 300 horizontal spots are required in the above mentioned application to fulfill the EU-NCAP safety norm. The need for a larger number of beam spots partially is based on the need to resolve ambiguities and not only for angular resolution. Using two different VCSEL shapes already reduces the ambiguities. Preferably at least three different VCSEL shapes are used, e. g. circle, horizontal rectangle and vertical rectangle. Such shapes can be distinguished by a camera observing the scene onto which the structured light pattern is projected, since the camera resolution is significantly higher than the array resolution.
  • the different VCSEL shapes can be provided on each array, on only one of the arrays or different arrays can provide different VCSEL shapes. If different VCSEL shapes are provided on one array, the different shapes are preferably selected such that all of these shapes have a similar threshold current which means that the emission area of the different shapes is substantially similar. This makes it possible to have different shapes on one single VCSEL chip. If the shapes on a chip are selected identical and several chips or arrays are provided with different shapes, the above need for similar threshold current is released.
  • a control unit for driving the semiconductor arrays which allows to switch on and off the individual arrays or chips sequentially.
  • the resulting image in the image space is then changing in time and this information can be used to resolve ambiguities further.
  • This method is well possible since light is only required for a small percentage of the total time, e. g. 1 % for the above automotive application.
  • the sequential switching also reduces the maximum power output which is advantageous in view of the laser safety and the maximum power requirement, e. g. layout of the driver and EMI (electromagnetic interference).
  • the proposed laser device may be implemented in a 3D imaging system or 3D measuring system.
  • a 3D imaging system comprises a camera which images a scene to which the structured light pattern is projected, a synchronization interface between the camera and the laser device and an evaluation unit extracting the required 3D information from the camera image.
  • the synchronization interface ensures that pictures of the scene are only taken during illumination with the structured light pattern.
  • Such a system also includes at least one power supply for the laser device. Also several power supplies can be used, one for each array or chip. For the sequential operation at least part of the circuitry can be shared.
  • Fig. 1 an example of the projection of one of the VCSEL arrays of the proposed device onto an image plane
  • Fig. 2 an example for the randomized distribution of the VCSELs in a VCSEL array of the proposed laser device
  • Fig. 3 a schematic view illustrating the superposition of different VCSEL arrays of the proposed laser device in the image space
  • Fig. 4 a schematic view showing a 3D imaging system including the proposed laser device.
  • the proposed laser device comprises several semiconductor arrays with corresponding optics to image the emission areas of the semiconductor lasers to an image space.
  • Figure 1 shows an example for a basic layout of one module of the proposed laser device. Each module comprises one of the VCSEL-arrays used in this example.
  • the VCSEL array is provided in a package providing electrical contacts and heat removal.
  • Figure 1 shows the corresponding VCSEL chip 1 carrying the VCSEL array with several VCSELs 2.
  • the VCSEL chip 1 is mounted on a heat sink 3 for heat removal.
  • An imaging lens 4 is arranged in front of the VCSEL-chip 1 to image the emission areas of the individual VCSELs 2 of the array to an image plane 7 in the desired image space.
  • the image space is a depth region, also called capturing area in case of a 3D imaging system, into which the VCSEL array is imaged by the lens 4.
  • the imaging conditions to image an e. g. a VCSEL 2 having a 4 ⁇ diameter active area to the image space are very similar to the conditions to image the scene in the image space onto the camera chip with equal pixel size, since this corresponds only to the reverse light path. Therefore a cheap and similar lens 4 can be used in the proposed laser device.
  • this imaging lens 4 the laser beams 5 emitted by the VCSELs 2 are focused to beam spots 6 in the image space.
  • the shape of these beam spots 6 on an image plane 7 corresponds to the shape of the emission areas of the VCSELs 2 of the VCSEL-chip 1.
  • this module has to be replicated. If several modules are placed next to each other on one mounting plane the overlap of the images of the VCSEL arrays in the far field, i.e. in the image space, is already good without any further adjustment. If necessary, the imaging lenses 4 of each of the modules may be slightly adjusted such that the beam spots of the VCSELs 2 of the different VCSEL-chips 1 do not overlap in the image space. In order to improve the adjustment of the lenses adjustment marks, in particular dedicated emission areas, may be provided on each array which have to be superposed in an image plane for an optimal adjustment.
  • the VCSEL-chips 1 of the proposed laser device are fabricated such that the position of the individual VCSELs 2 on the chip, in particular of the emission areas of the VCSELs 2, deviate from a regular pattern in a randomized fashion or are completely distributed in a randomized fashion.
  • Figure 2 shows a schematic view of an example of such a distribution of the emission areas 2a of the VCSELs 2 on the chip 1.
  • the bond pad 8 for electrical contacting the VCSELs 2 is also shown in this array layout.
  • the emission areas 2a of the VCSELs 2 are arranged in a randomized distribution without any periodicity or regularity.
  • the active diameter of the emission areas 2a of the single VCSELs 2 of the chip may be about 4 ⁇ . This diameter is sufficient for a 3 mW power in pulsed operation with e. g. 100 ⁇
  • three VCSEL-arrays or VCSEL-chips 1 are used in the laser device.
  • Each chip comprises 100 VCSELs in horizontal (x-) direction and 40 VCSELs in vertical (y-) direction resulting in a chip size of 4.2 mm x 1.68 mm.
  • the total chip area (all three chips) consumed is 21.2 mm 2 .
  • the superposing by the corresponding imaging optics is done mainly in the horizontal direction which means that the average distance between the beam spots is horizontally 3 times smaller than vertically in the imaging plane.
  • the vertical direction is additionally possible if desired. This enables a more equal spacing of the beam spots in horizontal and vertical direction in the above case in which the superposing is mainly performed in the horizontal direction.
  • the shape of the emission areas of the VCSELs can be adapted to such a squeezing, i.e. the vertical dimension (y-dimension) of the active areas of the VCSELs may be selected larger than the horizontal dimension (x- dimension) such that the above squeezing results in beam spots having nearly equal horizontal and vertical dimensions.
  • the imaging optics may also be adapted such that the images of the different arrays are slightly shifted in vertical direction in order to have similar spacing of the beam spots in both directions rather than an alignment along horizontal lines with dark regions in between.
  • the VCSELs of the different arrays may be selected to have different shapes of the active area.
  • Figure 3 shows three different array layouts having a rectangular shape in the vertical direction, a circular shape and a rectangular shape in the horizontal direction.
  • the three VCSEL chips 1 are imaged with the corresponding imaging lens 4 to the image plane 7 as schematically indicated in the figure.
  • the resulting light pattern 9 is shown in the upper portion of figure 3.
  • the beam spots 6 originating from each VCSEL chip 1 are imaged into spaces between the beam spots 6 of the remaining VCSEL chips, respectively. This results in a light pattern 9 in which the different VCSEL shapes of the different VCSEL chips 1 are mixed in the imaging plane 7.
  • the different VCSEL shapes are provided on different arrays. It is also possible to mix the different shapes on the single arrays. In such an embodiment the areas of the different shapes should be selected such that the VCSELs have a similar threshold current.
  • Figure 4 shows a schematic view of an example of a 3D measurement system including the proposed laser device 10.
  • This system also includes a camera 11 taking images of the structured light pattern projected onto a scene 15.
  • the camera 11 is connected via a synchronization unit 12 to the laser device 10 in order to be synchronized with the pulsed illumination of the scene.
  • the power supplies of the laser device 10 may be connected to a control unit 13 for a sequential operation of the different VCSEL chips of the device 10.
  • An evaluation unit 14 may be provided in order to extract the desired 3D information from the image or images captured with the camera 11.
  • Such a system may be used in the applications already described in the introductory portion of the description, in particular in automotive applications for capturing the scene in front of the car.
  • the arrays of the proposed laser device may be arranged in any configuration, for example in a line or in a triangle. Also only two arrays or more than three arrays may be provided in order to achieve the desired superposition. Furthermore, the number of semiconductor lasers of each array may be different from the above example, depending on the required resolution of the system. Instead of VCSELs also other types of semiconductor lasers may be used, e.g. edge emitters.
  • the word "comprising” does not exclude other elements or steps, and the indefinite article "a” or “an” does not exclude a plurality.

Abstract

The present invention relates to a laser device (10) for projecting a structured light pattern (9) onto a scene (15). The device is formed of several arrays (1) of semiconductor lasers (2), each array (1) comprising an irregular distribution of emission areas (2a) of the semiconductor lasers (2). One or several imaging optics (4) image said arrays (1) to an imaging space and superpose the images of said arrays (1) in the imaging space to form said light pattern (9). The proposed laser device generates a light pattern with high contrast and efficiency which may be used for 3D imaging systems, e. g. in automotive applications.

Description

Laser device for projecting a structured light pattern onto a scene
FIELD AND BACKGROUND OF THE INVENTION
The present invention relates to a laser device for projecting a structured light pattern onto a scene using several arrays of semiconductor lasers, in particular vertical cavity surface emitting lasers (VCSELs). Structured light patterns projected onto a scene and observed with a camera enable the extraction of 3D information by image processing. Such a method is applied e. g. in the Microsoft Kinect™ game console and recently discussed for industrial applications, especially in the automotive field. In this field the new EU-NCAP safety norm enforces a distance measurement which is able to detect pedestrians and provides a resolution which allows autonomous measures taken by the car system.
The required structured light pattern can be generated by dedicated micro- optical systems like micro-lens arrays or diffractive optical elements (DOE) which are illuminated by a laser, e. g. by an array of VCSELs. An example is shown in US
2012/051588 Al, which discloses a laser device for projecting a structured light pattern onto a scene using at least one VCSEL array. The light from the VCSEL array is focused through a collimating micro-lens array which directs the beams from the VCSEL array to a DOE. The DOE forms the beams into a variety of light patterns which then enable the desired 3D imaging.
These known optical systems suffer from a loss in brightness and optical efficiency mainly because of two reasons. They are illuminated with an average brightness always lower than the maximum brightness of the laser source and their fill factor is limited since the need for a randomized pattern requires a non dense packing. Furthermore the maximum contrast between bright and dark regions is low.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a laser device for projecting a structured light pattern which does not have the above drawbacks and can be used in applications for extracting 3D information from a scene onto which the structured light pattern is projected. The object is achieved with the laser device according to claim 1.
Advantageous embodiments of the device are subject matter of the dependent claims or can be deduced from the subsequent portions of the description and preferred embodiments.
The proposed laser device is formed of several arrays of semiconductor lasers, each array comprising a preferably different irregular distribution of emission areas of the semiconductor lasers. This distribution deviates from a regular arrangement of the emission areas, e.g. in a grid or hexagonal pattern, preferably in a randomized fashion. One or several optics are arranged in front of the arrays of semiconductor lasers to image said arrays to an imaging space and to superpose the images of said arrays in the imaging space thereby forming said light pattern. The light pattern, which may be projected to a scene or an imaging plane in the imaging space is composed of a plurality of beam spots originating from the semiconductor lasers of each array.
With the proposed laser device the semiconductor lasers of each array are imaged directly into the image space. This image space corresponds to the capturing area of a 3D imaging system or system for extracting 3D information from a scene arranged in this image space. Due to the direct imaging a high efficiency of the laser device and a maximum contrast between bright and dark regions of the structured light pattern are achieved.
Furthermore, the fill factor is increased compared with known solutions since the images of the several semiconductor laser arrays are superimposed in the image space resulting in an increased density of beam spots due to the superposition. The distribution of the emission areas of the semiconductor lasers of each array may be completely randomized with the condition that necessary distances between the emission areas due to the manufacturing process and construction of the lasers are maintained. The distribution of the emission areas of each array may also be chosen such that the deviation of the position of these areas from a regular pattern is randomized but limited in the maximum distance of deviation, for example limited to a maximum distance of once or twice the diameter of the emission area in the corresponding direction of deviation. In the latter case preferably the distribution of the emission areas in each array and the superposition of the images of these arrays in the image space are selected such that not all but most of the beam spots do not overlap in the image space, preferably more than 80 %.
A sufficient resolution of the scene requires about 300 randomized beam spots in horizontal direction (x-direction) and about 40 beam spots vertical (y-direction) to meet the system requirements envisioned by EU-NCAP. When using VCSEL arrays as light sources the minimum pitch in such an array according to the design rules involving processing tolerances, etch slopes and minimum oxide widths may be for example about 33 μιη for a small active area VCSEL of e. g. 3 μιη active diameter. The active diameter corresponds to the emission area of the VCSEL. Larger active diameters require a larger pitch, e. g. a 10 μιη active area requires a 40 μιη pitch. An irregular distribution or a randomization of the distribution of VCSELs according to the present invention means a freedom to move the position of a VCSEL mesa independent from the position of the neighboring VCSELs. A meaningful randomization or distribution requires a shift of the active areas of the VCSELs (with respect to an arrangement in a regular pattern) by at least the active diameter in all directions. This shift has to be added to the pitch in a regular pattern, i. e. pitch = 30 μιη + 3*d, wherein d represents the active diameter. Therefore the minimum pitch is e.g. 40 to 60 μιη for relevant active diameters of the VCSELs between 3 μιη and 10 μιη. Multiplied by 300 required beam spots this would result in a chip size of 12 to 18 mm in the horizontal dimension when using only one VCSEL array as light source. Such a chip size is far too large to be hard soldered due to the CTE mismatch (CTE: coefficient of thermal expansion) of the materials in a chip package. Furthermore, such a large chip requires a huge area of the VCSEL wafer to be free of defects or in other words the production yield would be critically low. A simple split of the arrays into several parts would lead to problems with seams, i. e. dead regions, which have to be avoided. Taking into account the above
considerations the inventors of the present invention recognized that these problems can be avoided by superposing the images of several smaller semiconductor or VCSEL arrays in the image space. This superposition also has the further advantage that failure patterns of single VCSEL arrays which show a clustering of defective mesas do not lead to dead areas.
The irregular or randomized distribution of the emission areas of the semiconductor lasers according to one embodiment of the present invention is characterized by a random shift of the individual emitters in each array by position in the two directions of the surface with respect to an arrangement in a regular pattern. This shift covers a distance of at least the active diameter of the semiconductor laser, i.e. some of the lasers of each array are shifted by at least this distance. In another embodiment the distribution of the emission areas or lasers in each array is completely randomized. The term randomization means that this shift in the position with respect to a regular pattern of each individual emitter or the randomized distribution can be generated by a randomizing algorithm. The term random or randomization in this context is however not restricted to the generation by a randomizing algorithm but also covers irregular distributions in which the shifts are only selected to avoid any periodicity or regularity in the distribution. In one of the embodiments of the proposed laser device the imaging optics is adapted and arranged such that most of the beam spots on an image plane or scene in the image space comprise at least one neighboring beam spot which originates from a different array. This significantly reduces the problems of dead areas caused by failure patterns in the semiconductor arrays.
In the preferred embodiment of the proposed laser device the semiconductor lasers are VCSELs. Since for small active diameters the pitch of VCSEL arrays is
significantly larger than the active diameter of the VCSELs, there is sufficient space to interlace the beam spots of several arrays in the image space. This works best for VCSELs having small active diameters of < 10 μιη, e. g. of 4 μιη active diameter and a pitch of 40 μιη. Using three VCSEL arrays in the proposed laser device, the interlaced superposing results in an effective active ratio (bright versus dark) which is three times higher than with a single array. A high effective aperture ratio is desirable, because on the one hand a bright spot should cover several pixels of a camera used for a extracting the 3D-information from the scene to which the light pattern is projected (determination of center of gravity is more accurate than single pixel). On the other hand the maximum number of pixels of a cheap camera is limited.
In a further embodiment of the laser device with VCSEL arrays also the shape of the emission area of the VCSELs, i. e. the emitting aperture or active region of the
VCSELs, is varied. With such a variation of the VCSEL shape ambiguities in the recorded image for 3D information extraction are resolved more easily. As a consequence the number of spots can be reduced and less than 300 horizontal spots are required in the above mentioned application to fulfill the EU-NCAP safety norm. The need for a larger number of beam spots partially is based on the need to resolve ambiguities and not only for angular resolution. Using two different VCSEL shapes already reduces the ambiguities. Preferably at least three different VCSEL shapes are used, e. g. circle, horizontal rectangle and vertical rectangle. Such shapes can be distinguished by a camera observing the scene onto which the structured light pattern is projected, since the camera resolution is significantly higher than the array resolution. The different VCSEL shapes can be provided on each array, on only one of the arrays or different arrays can provide different VCSEL shapes. If different VCSEL shapes are provided on one array, the different shapes are preferably selected such that all of these shapes have a similar threshold current which means that the emission area of the different shapes is substantially similar. This makes it possible to have different shapes on one single VCSEL chip. If the shapes on a chip are selected identical and several chips or arrays are provided with different shapes, the above need for similar threshold current is released.
In a further embodiment, a control unit for driving the semiconductor arrays is provided which allows to switch on and off the individual arrays or chips sequentially. The resulting image in the image space is then changing in time and this information can be used to resolve ambiguities further. This method is well possible since light is only required for a small percentage of the total time, e. g. 1 % for the above automotive application. The sequential switching also reduces the maximum power output which is advantageous in view of the laser safety and the maximum power requirement, e. g. layout of the driver and EMI (electromagnetic interference).
The proposed laser device may be implemented in a 3D imaging system or 3D measuring system. Such a system comprises a camera which images a scene to which the structured light pattern is projected, a synchronization interface between the camera and the laser device and an evaluation unit extracting the required 3D information from the camera image. The synchronization interface ensures that pictures of the scene are only taken during illumination with the structured light pattern. Such a system also includes at least one power supply for the laser device. Also several power supplies can be used, one for each array or chip. For the sequential operation at least part of the circuitry can be shared.
These and other aspects of the invention will be apparent from and elucidated with reference to the embodiments described herein after.
BRIEF DESCRIPTION OF THE DRAWINGS
The proposed laser device is described in the following by way of examples in connection with the accompanying drawings in further detail. The figures show:
Fig. 1 an example of the projection of one of the VCSEL arrays of the proposed device onto an image plane;
Fig. 2 an example for the randomized distribution of the VCSELs in a VCSEL array of the proposed laser device;
Fig. 3 a schematic view illustrating the superposition of different VCSEL arrays of the proposed laser device in the image space; and
Fig. 4 a schematic view showing a 3D imaging system including the proposed laser device.
DETAILED DESCRIPTION OF EMBODIMENTS The proposed laser device comprises several semiconductor arrays with corresponding optics to image the emission areas of the semiconductor lasers to an image space. Figure 1 shows an example for a basic layout of one module of the proposed laser device. Each module comprises one of the VCSEL-arrays used in this example. The VCSEL array is provided in a package providing electrical contacts and heat removal. Figure 1 shows the corresponding VCSEL chip 1 carrying the VCSEL array with several VCSELs 2. The VCSEL chip 1 is mounted on a heat sink 3 for heat removal. An imaging lens 4 is arranged in front of the VCSEL-chip 1 to image the emission areas of the individual VCSELs 2 of the array to an image plane 7 in the desired image space. The image space is a depth region, also called capturing area in case of a 3D imaging system, into which the VCSEL array is imaged by the lens 4. The imaging conditions to image an e. g. a VCSEL 2 having a 4 μιη diameter active area to the image space are very similar to the conditions to image the scene in the image space onto the camera chip with equal pixel size, since this corresponds only to the reverse light path. Therefore a cheap and similar lens 4 can be used in the proposed laser device. With this imaging lens 4 the laser beams 5 emitted by the VCSELs 2 are focused to beam spots 6 in the image space. The shape of these beam spots 6 on an image plane 7 corresponds to the shape of the emission areas of the VCSELs 2 of the VCSEL-chip 1.
In order to image several VCSEL-chips 1 this module has to be replicated. If several modules are placed next to each other on one mounting plane the overlap of the images of the VCSEL arrays in the far field, i.e. in the image space, is already good without any further adjustment. If necessary, the imaging lenses 4 of each of the modules may be slightly adjusted such that the beam spots of the VCSELs 2 of the different VCSEL-chips 1 do not overlap in the image space. In order to improve the adjustment of the lenses adjustment marks, in particular dedicated emission areas, may be provided on each array which have to be superposed in an image plane for an optimal adjustment. If an adjustment is not possible, electronic calibration by the camera picture taken from a test scene can account for slight inaccuracies in fabrication, in order to know the exact distribution of the beam spots in the image space which is necessary for 3D recognition of scenes. If desired a mechanical adjustment of e. g. the position of the imaging lens 4 relative to the VCSEL chipl can be provided. This would e.g. enable the adjustment of a spacing distribution of the beam spots in the image space equalized between vertical and horizontal direction.
The VCSEL-chips 1 of the proposed laser device are fabricated such that the position of the individual VCSELs 2 on the chip, in particular of the emission areas of the VCSELs 2, deviate from a regular pattern in a randomized fashion or are completely distributed in a randomized fashion. Figure 2 shows a schematic view of an example of such a distribution of the emission areas 2a of the VCSELs 2 on the chip 1. The bond pad 8 for electrical contacting the VCSELs 2 is also shown in this array layout. As can be seen from figure 2, the emission areas 2a of the VCSELs 2 are arranged in a randomized distribution without any periodicity or regularity.
In the following a numerical example of the chip-layout of the VCSEL chip 1 of the proposed laser device is given. The active diameter of the emission areas 2a of the single VCSELs 2 of the chip may be about 4 μιη. This diameter is sufficient for a 3 mW power in pulsed operation with e. g. 100 μβεα The corresponding pitch in a regular pattern of such emission areas or VCSELs on a chip may be 42 μιη leaving room for randomization by +/- 4 μιη. This is calculated according to the formula: pitch = 30 μιη + 3*d, wherein d represents the active diameter. In the present example three VCSEL-arrays or VCSEL-chips 1 are used in the laser device. Each chip comprises 100 VCSELs in horizontal (x-) direction and 40 VCSELs in vertical (y-) direction resulting in a chip size of 4.2 mm x 1.68 mm. The total chip area (all three chips) consumed is 21.2 mm2. The superposing by the corresponding imaging optics is done mainly in the horizontal direction which means that the average distance between the beam spots is horizontally 3 times smaller than vertically in the imaging plane.
By using an appropriate imaging optics, squeezing the vertical direction is additionally possible if desired. This enables a more equal spacing of the beam spots in horizontal and vertical direction in the above case in which the superposing is mainly performed in the horizontal direction. If required, the shape of the emission areas of the VCSELs can be adapted to such a squeezing, i.e. the vertical dimension (y-dimension) of the active areas of the VCSELs may be selected larger than the horizontal dimension (x- dimension) such that the above squeezing results in beam spots having nearly equal horizontal and vertical dimensions.
The imaging optics may also be adapted such that the images of the different arrays are slightly shifted in vertical direction in order to have similar spacing of the beam spots in both directions rather than an alignment along horizontal lines with dark regions in between.
The VCSELs of the different arrays may be selected to have different shapes of the active area. Figure 3 shows three different array layouts having a rectangular shape in the vertical direction, a circular shape and a rectangular shape in the horizontal direction. The three VCSEL chips 1 are imaged with the corresponding imaging lens 4 to the image plane 7 as schematically indicated in the figure. The resulting light pattern 9 is shown in the upper portion of figure 3. As can be seen from this light pattern 9, the beam spots 6 originating from each VCSEL chip 1 are imaged into spaces between the beam spots 6 of the remaining VCSEL chips, respectively. This results in a light pattern 9 in which the different VCSEL shapes of the different VCSEL chips 1 are mixed in the imaging plane 7.
The use of the above three different VCSEL shapes may reduce the required number of beam spots for 3D imaging systems by at least a factor of 2. Assuming that an equal portion of each shape is most efficient to avoid ambiguities, a number of 2000 VCSELs of each shape would be sufficient to substitute the 12000 beam spots according to the above requirements of the EU-NCAP safety norm. Splitting this number of VCSELs into three arrays, each array could have the dimensions of e.g. 2.75 mm x 2.2 mm. This dimension has been calculated with the assumption that circle area = rectangle area (4 x 8μιη2) = 32 μιη2, i.e. circle diameter = 6.4 μιη, and with a circle array pitch of 50 μιη minimum, preferably up to 55 μιη in order to have equal conditions with the rectangular arrays with a maximum dimension of 8 μιη.
In the example of figure 3, the different VCSEL shapes are provided on different arrays. It is also possible to mix the different shapes on the single arrays. In such an embodiment the areas of the different shapes should be selected such that the VCSELs have a similar threshold current.
Figure 4 shows a schematic view of an example of a 3D measurement system including the proposed laser device 10. This system also includes a camera 11 taking images of the structured light pattern projected onto a scene 15. The camera 11 is connected via a synchronization unit 12 to the laser device 10 in order to be synchronized with the pulsed illumination of the scene. The power supplies of the laser device 10 may be connected to a control unit 13 for a sequential operation of the different VCSEL chips of the device 10. An evaluation unit 14 may be provided in order to extract the desired 3D information from the image or images captured with the camera 11. Such a system may be used in the applications already described in the introductory portion of the description, in particular in automotive applications for capturing the scene in front of the car.
While the invention has been illustrated and described in detail in the drawings and forgoing description, such illustration and description are to be considered illustrative or exemplary and not restrictive; the invention is not limited to the disclosed embodiments.
Other variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed invention, from a study of the drawings, the disclosure, and the appended claims. The arrays of the proposed laser device may be arranged in any configuration, for example in a line or in a triangle. Also only two arrays or more than three arrays may be provided in order to achieve the desired superposition. Furthermore, the number of semiconductor lasers of each array may be different from the above example, depending on the required resolution of the system. Instead of VCSELs also other types of semiconductor lasers may be used, e.g. edge emitters. In the claims, the word "comprising" does not exclude other elements or steps, and the indefinite article "a" or "an" does not exclude a plurality. The mere fact that certain measures are recited in mutually different dependent claims does not indicate that a combination of these measures cannot be used to advantage. The features of all claims of the device can be freely combined. Any reference signs in the claims should not be construed as limiting the scope of the invention.
LIST OF REFERENCE SINGS
1 VCSEL chip
2 VCSEL
2a emission area of VCSEL
3 heat sink
4 imaging lens
5 laser beam
6 laser spot
7 image plane
8 bond pad
9 light pattern
10 laser device
11 camera
12 synchronization unit
13 control unit
14 evaluation unit
15 scene

Claims

CLAIMS:
1. A laser device for projecting a structured light pattern (9) onto a scene (15), said device being formed of
several arrays (1) of semiconductor lasers (2), each array (1) comprising an irregular distribution of emission areas (2a) of the semiconductor lasers (2), and
- one or several imaging optics (4) imaging said arrays (1) to an imaging space and superposing images of said arrays (1) in the imaging space to form said light pattern (9).
2. The device according to claim 1,
wherein said imaging optics (4) is adapted such that most of the beam spots (6) in said light pattern (9) comprise at least one neighbouring beam spot (6) which originates from the semiconductor laser (2) of a different array (1).
3. The device according to claim 1 or 2,
wherein said semiconductor lasers (2) are VCSELs.
4. The device according to claim 3,
wherein the VCSELs of at least one of said arrays (1) comprise emission areas (2a) with at least two different shapes.
5. The device according to claim 3,
wherein the VCSELs of each single array (1) comprise emission areas (2a) of identical shape, the shapes of the emission areas (2a) of at least two arrays (1) being different from one another.
6. The device according to claim 3,
wherein diameters of emission areas (2a) of the VCSELs in at least one direction in each array (1) are < 10 μιη, a minimum distance between said emission areas (2a) being≥ 20 μιη .
7. The device according to claim 1,
wherein said imaging optics (4) is adapted such that the superposed images of said arrays (1) are slightly shifted with respect to one another in at least a first direction in the imaging space.
8. The device according to claim 7,
wherein said imaging optics (4) is adapted to squeeze the superposed images of said arrays (1) in a second direction perpendicular to said first direction in the imaging space, said squeezing being selected to achieve a substantially equal density of beam spots (6) in both directions.
9. The device according to claim 1,
further comprising a control unit (13) for sequential switching of the different arrays (1).
10. The device according to claim 1,
further comprising a camera (11) arranged to take an image of a scene (15) in the image space onto which the light pattern (9) is projected.
11. The use of a device according to any one of claims 1 to 10 for a 3D
recognition or 3D detection of scenes.
12. The use of claim 11 for the detection of a car environment.
13. The use of claim 11 for the 3D recognition of scenes in industrial production or logistic areas.
14. The use of claim 11 for user interfaces.
PCT/IB2013/060325 2012-11-29 2013-11-22 Laser device for projecting a structured light pattern onto a scene WO2014083485A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
BR112015012073A BR112015012073A2 (en) 2012-11-29 2013-11-22 laser device to project a structured light pattern over a scene, and use a device
RU2015125550A RU2655475C2 (en) 2012-11-29 2013-11-22 Laser device for projecting structured light pattern onto scene
JP2015544580A JP6270863B2 (en) 2012-11-29 2013-11-22 Laser apparatus for projecting structured light patterns onto a scene
US14/647,836 US10386178B2 (en) 2012-11-29 2013-11-22 Laser device for projecting a structured light pattern onto a scene
EP13826602.8A EP2926422B1 (en) 2012-11-29 2013-11-22 Laser device for projecting a structured light pattern onto a scene
CN201380062417.4A CN104798271B (en) 2012-11-29 2013-11-22 Laser equipment for projecting structured light pattern in scene

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261731037P 2012-11-29 2012-11-29
US61/731,037 2012-11-29

Publications (1)

Publication Number Publication Date
WO2014083485A1 true WO2014083485A1 (en) 2014-06-05

Family

ID=50030351

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2013/060325 WO2014083485A1 (en) 2012-11-29 2013-11-22 Laser device for projecting a structured light pattern onto a scene

Country Status (7)

Country Link
US (1) US10386178B2 (en)
EP (1) EP2926422B1 (en)
JP (1) JP6270863B2 (en)
CN (1) CN104798271B (en)
BR (1) BR112015012073A2 (en)
RU (1) RU2655475C2 (en)
WO (1) WO2014083485A1 (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016018550A1 (en) * 2014-07-28 2016-02-04 Apple Inc. Overlapping pattern projector
WO2016020073A1 (en) * 2014-08-08 2016-02-11 Cemb S.P.A. Vehicle equipment with scanning system for contactless measurement
US9273846B1 (en) 2015-01-29 2016-03-01 Heptagon Micro Optics Pte. Ltd. Apparatus for producing patterned illumination including at least one array of light sources and at least one array of microlenses
WO2016154218A1 (en) * 2015-03-22 2016-09-29 Oculus Vr, Llc Depth mapping with a head mounted display using stereo cameras and structured light
US9553423B2 (en) 2015-02-27 2017-01-24 Princeton Optronics Inc. Miniature structured light illuminator
US9825425B2 (en) 2013-06-19 2017-11-21 Apple Inc. Integrated structured-light projector comprising light-emitting elements on a substrate
WO2017213902A1 (en) * 2016-06-06 2017-12-14 Microsoft Technology Licensing, Llc Pulsed gated structured light systems and methods
US9870068B2 (en) 2010-09-19 2018-01-16 Facebook, Inc. Depth mapping with a head mounted display using stereo cameras and structured light
US10091494B2 (en) 2013-10-23 2018-10-02 Facebook, Inc. Three dimensional depth mapping using dynamic structured light
US10153614B1 (en) 2017-08-31 2018-12-11 Apple Inc. Creating arbitrary patterns on a 2-D uniform grid VCSEL array
CN109155801A (en) * 2016-05-27 2019-01-04 Lg电子株式会社 Mobile terminal
US10509147B2 (en) 2015-01-29 2019-12-17 ams Sensors Singapore Pte. Ltd Apparatus for producing patterned illumination using arrays of light sources and lenses
US10627709B2 (en) 2018-06-29 2020-04-21 Ricoh Company, Ltd. Light source, projection device, measurement device, robot, electronic device, mobile object, and shaping apparatus
US11555926B2 (en) 2018-08-27 2023-01-17 Ricoh Company, Ltd. Optical device, measurement device, robot, electronic apparatus, mobile object, and shaping device

Families Citing this family (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8908995B2 (en) 2009-01-12 2014-12-09 Intermec Ip Corp. Semi-automatic dimensioning with imager on a portable device
US9779546B2 (en) 2012-05-04 2017-10-03 Intermec Ip Corp. Volume dimensioning systems and methods
US10007858B2 (en) 2012-05-15 2018-06-26 Honeywell International Inc. Terminals and methods for dimensioning objects
US10321127B2 (en) 2012-08-20 2019-06-11 Intermec Ip Corp. Volume dimensioning system calibration systems and methods
US9939259B2 (en) 2012-10-04 2018-04-10 Hand Held Products, Inc. Measuring object dimensions using mobile computer
US9841311B2 (en) 2012-10-16 2017-12-12 Hand Held Products, Inc. Dimensioning system
US20140307055A1 (en) 2013-04-15 2014-10-16 Microsoft Corporation Intensity-modulated light pattern for active stereo
US10228452B2 (en) 2013-06-07 2019-03-12 Hand Held Products, Inc. Method of error correction for 3D imaging device
WO2015134794A2 (en) 2014-03-05 2015-09-11 Smart Picture Technologies, Inc. Method and system for 3d capture based on structure from motion with simplified pose detection
WO2015137880A1 (en) * 2014-03-13 2015-09-17 National University Of Singapore An optical interference device
US20150369593A1 (en) * 2014-06-19 2015-12-24 Kari MYLLYKOSKI Orthographic image capture system
US9823059B2 (en) 2014-08-06 2017-11-21 Hand Held Products, Inc. Dimensioning system with guided alignment
US20160072258A1 (en) * 2014-09-10 2016-03-10 Princeton Optronics Inc. High Resolution Structured Light Source
US10810715B2 (en) 2014-10-10 2020-10-20 Hand Held Products, Inc System and method for picking validation
US9779276B2 (en) 2014-10-10 2017-10-03 Hand Held Products, Inc. Depth sensor based auto-focus system for an indicia scanner
US10775165B2 (en) 2014-10-10 2020-09-15 Hand Held Products, Inc. Methods for improving the accuracy of dimensioning-system measurements
US9752864B2 (en) 2014-10-21 2017-09-05 Hand Held Products, Inc. Handheld dimensioning system with feedback
US9897434B2 (en) 2014-10-21 2018-02-20 Hand Held Products, Inc. Handheld dimensioning system with measurement-conformance feedback
US10060729B2 (en) 2014-10-21 2018-08-28 Hand Held Products, Inc. Handheld dimensioner with data-quality indication
US10001583B2 (en) * 2015-04-06 2018-06-19 Heptagon Micro Optics Pte. Ltd. Structured light projection using a compound patterned mask
US9786101B2 (en) 2015-05-19 2017-10-10 Hand Held Products, Inc. Evaluating image values
US10066982B2 (en) 2015-06-16 2018-09-04 Hand Held Products, Inc. Calibrating a volume dimensioner
KR102311688B1 (en) 2015-06-17 2021-10-12 엘지전자 주식회사 Mobile terminal and method for controlling the same
US10083522B2 (en) 2015-06-19 2018-09-25 Smart Picture Technologies, Inc. Image based measurement system
US20160377414A1 (en) * 2015-06-23 2016-12-29 Hand Held Products, Inc. Optical pattern projector
US9835486B2 (en) 2015-07-07 2017-12-05 Hand Held Products, Inc. Mobile dimensioner apparatus for use in commerce
EP3396313B1 (en) 2015-07-15 2020-10-21 Hand Held Products, Inc. Mobile dimensioning method and device with dynamic accuracy compatible with nist standard
US10094650B2 (en) 2015-07-16 2018-10-09 Hand Held Products, Inc. Dimensioning and imaging items
US20170017301A1 (en) 2015-07-16 2017-01-19 Hand Held Products, Inc. Adjusting dimensioning results using augmented reality
CN105222729A (en) * 2015-10-30 2016-01-06 上海斐讯数据通信技术有限公司 Road surface evenness degree detection method and device
US10249030B2 (en) 2015-10-30 2019-04-02 Hand Held Products, Inc. Image transformation for indicia reading
US10225544B2 (en) * 2015-11-19 2019-03-05 Hand Held Products, Inc. High resolution dot pattern
US10025314B2 (en) 2016-01-27 2018-07-17 Hand Held Products, Inc. Vehicle positioning and object avoidance
CN108779982B (en) * 2016-02-01 2020-10-09 赫普塔冈微光有限公司 Lighting module and optoelectronic system
CN108885849A (en) * 2016-03-23 2018-11-23 皇家飞利浦有限公司 System and method multiple images being incident upon on the common field of the outer surface of shell
US10761195B2 (en) 2016-04-22 2020-09-01 OPSYS Tech Ltd. Multi-wavelength LIDAR system
WO2017210418A1 (en) 2016-06-01 2017-12-07 Velodyne Lidar, Inc. Multiple pixel scanning lidar
US10339352B2 (en) 2016-06-03 2019-07-02 Hand Held Products, Inc. Wearable metrological apparatus
US9940721B2 (en) 2016-06-10 2018-04-10 Hand Held Products, Inc. Scene change detection in a dimensioner
US10163216B2 (en) 2016-06-15 2018-12-25 Hand Held Products, Inc. Automatic mode switching in a volume dimensioner
US9947099B2 (en) * 2016-07-27 2018-04-17 Microsoft Technology Licensing, Llc Reflectivity map estimate from dot based structured light systems
US10241244B2 (en) 2016-07-29 2019-03-26 Lumentum Operations Llc Thin film total internal reflection diffraction grating for single polarization or dual polarization
US10909708B2 (en) 2016-12-09 2021-02-02 Hand Held Products, Inc. Calibrating a dimensioner using ratios of measurable parameters of optic ally-perceptible geometric elements
KR102326493B1 (en) 2017-03-13 2021-11-17 옵시스 테크 엘티디 Eye-Safe Scanning LIDAR System
US11047672B2 (en) 2017-03-28 2021-06-29 Hand Held Products, Inc. System for optically dimensioning
EP3593166B1 (en) 2017-03-31 2024-04-17 Velodyne Lidar USA, Inc. Integrated lidar illumination power control
CN107039885B (en) * 2017-05-04 2023-04-18 奥比中光科技集团股份有限公司 Laser array applied to 3D imaging
CN106972347B (en) * 2017-05-04 2019-04-09 深圳奥比中光科技有限公司 Laser array for 3D imaging
WO2018208843A1 (en) 2017-05-08 2018-11-15 Velodyne Lidar, Inc. Lidar data acquisition and control
CN107026392B (en) * 2017-05-15 2022-12-09 奥比中光科技集团股份有限公司 VCSEL array light source
CN106997603B (en) * 2017-05-19 2020-04-17 深圳奥比中光科技有限公司 Depth camera based on VCSEL array light source
CN107424188B (en) * 2017-05-19 2020-06-30 深圳奥比中光科技有限公司 Structured light projection module based on VCSEL array light source
US10733748B2 (en) 2017-07-24 2020-08-04 Hand Held Products, Inc. Dual-pattern optical 3D dimensioning
KR102435970B1 (en) 2017-07-28 2022-08-25 옵시스 테크 엘티디 Vcsel array lidar transmitter with small angular divergence
WO2019032736A1 (en) 2017-08-08 2019-02-14 Smart Picture Technologies, Inc. Method for measuring and modeling spaces using markerless augmented reality
DE102017215850B4 (en) * 2017-09-08 2019-12-24 Robert Bosch Gmbh Process for producing a diffractive optical element, LIDAR system with a diffractive optical element and motor vehicle with a LIDAR system
CN107678225A (en) * 2017-09-19 2018-02-09 深圳奥比中光科技有限公司 Structured light projection module based on high density VCSEL array light source
CN109521578B (en) 2017-09-19 2021-02-26 奥比中光科技集团股份有限公司 Depth camera
EP3710855A4 (en) 2017-11-15 2021-08-04 Opsys Tech Ltd. Noise adaptive solid-state lidar system
EP3518356A1 (en) * 2018-01-24 2019-07-31 Koninklijke Philips N.V. Laser arrangement with irregular emission pattern
CN108363267A (en) * 2018-02-14 2018-08-03 深圳奥比中光科技有限公司 The structured light projection module of regular array light source
CN108493767B (en) * 2018-03-12 2019-09-27 Oppo广东移动通信有限公司 Laser generator, structured light projector, image obtain structure and electronic device
KR102506579B1 (en) 2018-04-01 2023-03-06 옵시스 테크 엘티디 Noise Adaptive Solid-State LIDAR System
US10584962B2 (en) 2018-05-01 2020-03-10 Hand Held Products, Inc System and method for validating physical-item security
DE102018210282A1 (en) * 2018-06-25 2020-01-02 Volkswagen Aktiengesellschaft Device and method for producing a three-dimensional object made up of at least one material layer
EP3598591A1 (en) * 2018-07-17 2020-01-22 Koninklijke Philips N.V. Laser arrangement with reduced building height
US10712434B2 (en) 2018-09-18 2020-07-14 Velodyne Lidar, Inc. Multi-channel LIDAR illumination driver
CN113169522B (en) * 2018-09-25 2022-12-30 瑞识科技(深圳)有限公司 Vertical Cavity Surface Emitting Laser (VCSEL) array
US11633083B2 (en) 2018-12-20 2023-04-25 Acclarent, Inc. 3D scanning of nasal tract with deflectable endoscope
US11137246B2 (en) * 2019-01-31 2021-10-05 Himax Technologies Limited Optical device
JP7251240B2 (en) * 2019-03-20 2023-04-04 株式会社リコー Optical devices, detection devices and electronics
CN109904718B (en) * 2019-03-25 2020-09-04 Oppo广东移动通信有限公司 Control system and control method of time-of-flight assembly and terminal
DE102019112340A1 (en) * 2019-05-10 2020-11-12 Bircher Reglomat Ag TOF sensor system with a lighting device with an array of individual light sources
AU2020274025B2 (en) 2019-05-10 2022-10-20 Smart Picture Technologies, Inc. Methods and systems for measuring and modeling spaces using markerless photo-based augmented reality process
JP2022534500A (en) 2019-05-30 2022-08-01 オプシス テック リミテッド Eye-safe long-range LIDAR system using actuators
RU2718125C1 (en) * 2019-07-11 2020-03-30 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный университет геодезии и картографии" (МИИГАиК) Device for increasing projection range of structured illumination for 3d scanning
CN110412544A (en) * 2019-08-23 2019-11-05 上海禾赛光电科技有限公司 Laser transmitting system and laser radar including the laser transmitting system
EP4025869B1 (en) * 2019-09-04 2023-07-05 ams Sensors Singapore Pte. Ltd. Designing and constructing dot projectors for three-dimensional sensor modules
US11450083B2 (en) * 2019-09-27 2022-09-20 Honeywell International Inc. Dual-pattern optical 3D dimensioning
US11639846B2 (en) 2019-09-27 2023-05-02 Honeywell International Inc. Dual-pattern optical 3D dimensioning

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009153699A1 (en) * 2008-06-18 2009-12-23 Philips Intellectual Property & Standards Gmbh Driver assistance system
US20120051588A1 (en) 2009-12-21 2012-03-01 Microsoft Corporation Depth projector system with integrated vcsel array
US20120162631A1 (en) * 2010-03-11 2012-06-28 Hutchin Richard A Active imaging system and method
US20120293625A1 (en) * 2011-05-18 2012-11-22 Sick Ag 3d-camera and method for the three-dimensional monitoring of a monitoring area

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6975659B2 (en) * 2001-09-10 2005-12-13 Fuji Photo Film Co., Ltd. Laser diode array, laser device, wave-coupling laser source, and exposure device
US7440590B1 (en) 2002-05-21 2008-10-21 University Of Kentucky Research Foundation System and technique for retrieving depth information about a surface by projecting a composite image of modulated light patterns
US20070019181A1 (en) * 2003-04-17 2007-01-25 Sinclair Kenneth H Object detection system
EP1766552A2 (en) * 2004-06-23 2007-03-28 Strider Labs, Inc. System and method for 3d object recognition using range and intensity
US20080232679A1 (en) 2005-08-17 2008-09-25 Hahn Daniel V Apparatus and Method for 3-Dimensional Scanning of an Object
US8294833B2 (en) 2007-10-05 2012-10-23 Koninklijke Philips Electronics N.V. Image projection method
US8159682B2 (en) 2007-11-12 2012-04-17 Intellectual Ventures Holding 67 Llc Lens system
US8531650B2 (en) * 2008-07-08 2013-09-10 Chiaro Technologies LLC Multiple channel locating
DE202008017962U1 (en) * 2008-09-23 2011-02-10 Sick Ag Illumination unit for generating a self-similar pattern
US8215776B2 (en) 2009-01-07 2012-07-10 Eastman Kodak Company Line illumination apparatus using laser arrays
JP2010251113A (en) * 2009-04-15 2010-11-04 Sony Corp Method of manufacturing solid electrolyte battery, and solid electrolyte battery
US9582889B2 (en) 2009-07-30 2017-02-28 Apple Inc. Depth mapping based on pattern matching and stereoscopic information
JP5894529B2 (en) 2009-08-20 2016-03-30 コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. Laser device with brightness distribution that can be changed
JP2012177671A (en) 2011-02-27 2012-09-13 Plex International Design Co Ltd Fine aperiodic pattern projection device and method and three-dimensional measuring device using the same
CN102760234B (en) 2011-04-14 2014-08-20 财团法人工业技术研究院 Depth image acquisition device, system and method
EP2849644A1 (en) 2012-05-14 2015-03-25 Koninklijke Philips N.V. Apparatus and method for profiling a depth of a surface of a target object

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009153699A1 (en) * 2008-06-18 2009-12-23 Philips Intellectual Property & Standards Gmbh Driver assistance system
US20120051588A1 (en) 2009-12-21 2012-03-01 Microsoft Corporation Depth projector system with integrated vcsel array
US20120162631A1 (en) * 2010-03-11 2012-06-28 Hutchin Richard A Active imaging system and method
US20120293625A1 (en) * 2011-05-18 2012-11-22 Sick Ag 3d-camera and method for the three-dimensional monitoring of a monitoring area

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9870068B2 (en) 2010-09-19 2018-01-16 Facebook, Inc. Depth mapping with a head mounted display using stereo cameras and structured light
US9825425B2 (en) 2013-06-19 2017-11-21 Apple Inc. Integrated structured-light projector comprising light-emitting elements on a substrate
US11962748B2 (en) 2013-10-23 2024-04-16 Meta Platforms Technologies, Llc Three dimensional depth mapping using dynamic structured light
US11057610B2 (en) 2013-10-23 2021-07-06 Facebook Technologies, Llc Three dimensional depth mapping using dynamic structured light
US10687047B2 (en) 2013-10-23 2020-06-16 Facebook Technologies, Llc Three dimensional depth mapping using dynamic structured light
US10091494B2 (en) 2013-10-23 2018-10-02 Facebook, Inc. Three dimensional depth mapping using dynamic structured light
CN105319811A (en) * 2014-07-28 2016-02-10 苹果公司 Overlapping pattern projector
EP3598063A1 (en) * 2014-07-28 2020-01-22 Apple Inc. Overlapping pattern projector
WO2016018550A1 (en) * 2014-07-28 2016-02-04 Apple Inc. Overlapping pattern projector
CN105319811B (en) * 2014-07-28 2017-07-28 苹果公司 Overlapping pattern projecting apparatus
CN106461378A (en) * 2014-08-08 2017-02-22 塞姆布有限公司 Vehicle equipment with scanning system for contactless measurement
WO2016020073A1 (en) * 2014-08-08 2016-02-11 Cemb S.P.A. Vehicle equipment with scanning system for contactless measurement
US10612914B2 (en) 2014-08-08 2020-04-07 Cemb S.P.A. Vehicle equipment with scanning system for contactless measurement
US9273846B1 (en) 2015-01-29 2016-03-01 Heptagon Micro Optics Pte. Ltd. Apparatus for producing patterned illumination including at least one array of light sources and at least one array of microlenses
US10509147B2 (en) 2015-01-29 2019-12-17 ams Sensors Singapore Pte. Ltd Apparatus for producing patterned illumination using arrays of light sources and lenses
US9553423B2 (en) 2015-02-27 2017-01-24 Princeton Optronics Inc. Miniature structured light illuminator
WO2016154218A1 (en) * 2015-03-22 2016-09-29 Oculus Vr, Llc Depth mapping with a head mounted display using stereo cameras and structured light
US10031588B2 (en) 2015-03-22 2018-07-24 Facebook, Inc. Depth mapping with a head mounted display using stereo cameras and structured light
EP3468158A4 (en) * 2016-05-27 2020-01-15 LG Electronics Inc. -1- Mobile terminal
CN109155801A (en) * 2016-05-27 2019-01-04 Lg电子株式会社 Mobile terminal
US11409119B2 (en) 2016-05-27 2022-08-09 Lg Electronics Inc. Mobile terminal
WO2017213902A1 (en) * 2016-06-06 2017-12-14 Microsoft Technology Licensing, Llc Pulsed gated structured light systems and methods
US10153614B1 (en) 2017-08-31 2018-12-11 Apple Inc. Creating arbitrary patterns on a 2-D uniform grid VCSEL array
US10627709B2 (en) 2018-06-29 2020-04-21 Ricoh Company, Ltd. Light source, projection device, measurement device, robot, electronic device, mobile object, and shaping apparatus
US11555926B2 (en) 2018-08-27 2023-01-17 Ricoh Company, Ltd. Optical device, measurement device, robot, electronic apparatus, mobile object, and shaping device

Also Published As

Publication number Publication date
BR112015012073A2 (en) 2017-07-11
US10386178B2 (en) 2019-08-20
RU2015125550A (en) 2017-01-10
RU2655475C2 (en) 2018-05-28
JP2016507886A (en) 2016-03-10
EP2926422B1 (en) 2017-11-22
EP2926422A1 (en) 2015-10-07
CN104798271B (en) 2018-08-28
JP6270863B2 (en) 2018-01-31
US20150316368A1 (en) 2015-11-05
CN104798271A (en) 2015-07-22

Similar Documents

Publication Publication Date Title
US10386178B2 (en) Laser device for projecting a structured light pattern onto a scene
US10958893B2 (en) VCSEL array light source
US11320666B2 (en) Integrated structured-light projector
US10551178B2 (en) Overlapping pattern projector
US11445164B2 (en) Structured light projection module based on VCSEL array light source
US9825425B2 (en) Integrated structured-light projector comprising light-emitting elements on a substrate
KR20200043952A (en) Projectors of structured light
EP3598063A1 (en) Overlapping pattern projector
CN109597211B (en) Projection module, depth camera and depth image acquisition method
US20220123530A1 (en) Vertical cavity surface emitting laser (vcsel) based pattern projector
CN220171253U (en) 3D module and electronic equipment
US20150369588A1 (en) Optical measurement apparatus and method of controlling the same
CN111771311B (en) Laser arrangement with irregular emission pattern
CN110707530A (en) VCSEL array for 3D depth acquisition equipment and 3D depth acquisition equipment
JP2009085689A (en) Three-dimensional measuring device for electronic component

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 13826602

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 2015544580

Country of ref document: JP

Kind code of ref document: A

REEP Request for entry into the european phase

Ref document number: 2013826602

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 14647836

Country of ref document: US

Ref document number: 2013826602

Country of ref document: EP

NENP Non-entry into the national phase

Ref country code: DE

REG Reference to national code

Ref country code: BR

Ref legal event code: B01A

Ref document number: 112015012073

Country of ref document: BR

ENP Entry into the national phase

Ref document number: 2015125550

Country of ref document: RU

Kind code of ref document: A

ENP Entry into the national phase

Ref document number: 112015012073

Country of ref document: BR

Kind code of ref document: A2

Effective date: 20150526