WO2014069314A1 - Laminate and color filter therewith, process for producing same and application of color filter - Google Patents

Laminate and color filter therewith, process for producing same and application of color filter Download PDF

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Publication number
WO2014069314A1
WO2014069314A1 PCT/JP2013/078762 JP2013078762W WO2014069314A1 WO 2014069314 A1 WO2014069314 A1 WO 2014069314A1 JP 2013078762 W JP2013078762 W JP 2013078762W WO 2014069314 A1 WO2014069314 A1 WO 2014069314A1
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group
colored
color filter
substituent
compound
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PCT/JP2013/078762
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French (fr)
Japanese (ja)
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俊人 空花
陽祐 村上
賢 鮫島
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富士フイルム株式会社
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02162Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • G02F1/133516Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/38Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]

Definitions

  • the present invention relates to a laminate, a color filter, a method for manufacturing a color filter, a liquid crystal display device, an organic electroluminescence element, and a solid-state imaging element.
  • the color filter is an indispensable component for a display of a solid-state image sensor or a liquid crystal display device.
  • a colored curable composition is employed (see, for example, Patent Documents 1 and 2).
  • the color filter is also required to be thin.
  • An object of the present invention is to provide a color filter that solves the above-described problems and is a colored layer having a high concentration of colorant, and is less likely to cause film surface roughness on the surface of the colored layer even under high temperature and high humidity. The purpose is to do.
  • a colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition.
  • a laminate in which an oxygen barrier film is formed on a colored layer formed by curing a certain colored curable composition is formed on a colored layer formed by curing a certain colored curable composition.
  • the colorant includes a halogenated phthalocyanine dye represented by the following general formula (1).
  • General formula (1) (In the general formula (1), Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one of the other substituents is aromatic. (M represents a hydrogen atom, a metal atom, a metal oxide, or a metal halide.)
  • the thermosetting compound is an epoxy compound.
  • ⁇ 4> The laminate according to any one of ⁇ 1> to ⁇ 3>, wherein the colorant further contains a yellow pigment.
  • ⁇ 5> The laminate according to any one of ⁇ 1> to ⁇ 4>, wherein the total content of the colorant is 60 to 90% by mass with respect to the total solid content of the colored curable composition.
  • ⁇ 6> The laminate according to any one of ⁇ 1> to ⁇ 5>, wherein the colored layer has a thickness of 0.1 to 1.0 ⁇ m.
  • ⁇ 7> The laminate according to any one of ⁇ 1> to ⁇ 6>, wherein the oxygen blocking film and the colored layer are adjacent to each other.
  • ⁇ 8> The laminate according to any one of ⁇ 1> to ⁇ 7>, wherein the oxygen blocking film has a thickness of 10 ⁇ m or less.
  • the oxygen barrier film includes an inorganic material.
  • a colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition.
  • a color filter that is a colored layer having a high colorant concentration and is less likely to cause film surface roughness on the colored layer surface even under high temperature and high humidity.
  • alkyl group includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • the “colored layer” in the present invention means a pixel used for a color filter.
  • the dye in the present invention means a coloring compound that is soluble in a specific organic solvent.
  • the specific organic solvent includes, for example, organic solvents exemplified in the column of a solvent that dissolves at least a dye and a thermosetting compound described later. Therefore, the coloring compound which dissolves in at least one organic solvent corresponds to the dye in the present invention.
  • the laminate, the color filter and the manufacturing method thereof, the solid-state imaging device, the liquid crystal display device, and the organic electroluminescence device of the present invention will be described in detail.
  • the description of the constituent elements described below may be made based on typical embodiments of the present invention, but the present invention is not limited to such embodiments.
  • an oxygen barrier film is formed on a colored layer obtained by curing a colored curable composition.
  • the colored curable composition used in the present invention is a colored curable composition containing a colorant, a thermosetting compound, and a solvent, and the total content of the colorant is the total solid content of the colored curable composition.
  • the content is 50 to 90% by mass.
  • the colorant is not particularly limited, and for example, a coloring matter including a dye or a pigment can be used, and it is particularly preferable that the dye is essential.
  • the total amount of the colorant is preferably 60 to 85% by mass and more preferably 70 to 80% by mass with respect to the total solid content of the colored curable composition.
  • dye There is no restriction
  • pyrazole azo anilinoazo, triphenylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, Phthalocyanine-based, benzopyran-based, indigo-based, pyromethene-based and methine-based dyes can be used. Moreover, you may use the multimer of these dyes.
  • an acidic dye and / or its derivative may be used suitably from a viewpoint that the binder and / or dye of a light non-irradiation part are removed completely by image development.
  • direct dyes, basic dyes, mordant dyes, acid mordant dyes, azoic dyes, disperse dyes, oil-soluble dyes, food dyes, and / or derivatives thereof can also be used effectively.
  • the dye include, for example, JP 2012-181512 A, JP 64-90403 A, JP 64-91102 A, JP 1-94301 A, JP 6-11614 A, Japanese Patent No. 2592207, Japanese Patent Application Laid-Open No.
  • the dyes described in JP-A-8-151531 and the like can be used.
  • phthalocyanine dyes having a phthalocyanine structure particularly halogenated phthalocyanine dyes are particularly preferable.
  • the halogenated phthalocyanine dye refers to a compound having a phthalocyanine skeleton and having one or more halogen atoms as a substituent. In the present invention, 5 to 15 halogen atoms per molecule are preferable, and 6 to 14 halogen atoms are more preferable.
  • the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom.
  • a chlorine atom, a fluorine atom, or a bromine atom is preferable, a chlorine atom or a fluorine atom is more preferable, and a chlorine atom is further preferable.
  • the halogenated phthalocyanine dye used in the present invention is usually a compound having a maximum absorption wavelength in the region of 600 to 800 nm, and preferably having a maximum absorption wavelength in the region of 630 to 750 nm.
  • the halogenated phthalocyanine dye used in the present invention is preferably a compound represented by the following general formula (1).
  • General formula (1) (In the general formula (1), Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one of the other substituents is aromatic. (M represents a hydrogen atom, a metal atom, a metal oxide, or a metal halide.)
  • Z 1 , Z 4 , Z 5 , Z 8 , Z 9 , Z 12 , Z 13 and Z 16 represent substituents substituted at eight ⁇ positions of the phthalocyanine nucleus. Therefore, these substituents are also referred to as ⁇ -position substituents.
  • Z 2 , Z 3 , Z 6 , Z 7 , Z 10 , Z 11 , Z 14 and Z 15 in the general formula (1) are substituents substituted at eight ⁇ -positions of the phthalocyanine nucleus. These substituents are also referred to as ⁇ -position substituents.
  • Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one other of the substituents is a group containing an aromatic group. It is preferable to have 5 to 15 halogen atoms in one molecule, and more preferable to have 6 to 14 halogen atoms.
  • the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom.
  • a chlorine atom, a fluorine atom, or a bromine atom is preferable, a chlorine atom or a fluorine atom is more preferable, and a chlorine atom is further preferable.
  • the aromatic group in the group containing an aromatic group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.
  • the number of groups having an aromatic group is preferably 1 to 11, more preferably 1 to 10, and further preferably 2 to 7 in one molecule.
  • Z 1 to Z 16 are all groups other than halogen atoms having an aromatic group.
  • the substituent is not particularly defined as long as the phthalocyanine compound does not lose its function as a dye, and examples thereof include substituent T described later.
  • 1 to 8 of Z 1 to Z 16 represent a group represented by the following general formula (1-2) or a group represented by the general formula (1-4), And at least one is preferably a group represented by the general formula (1-2), more preferably 2 to 6 of Z 1 to Z 16 are represented by the general formula (1-2). Or a group represented by the general formula (1-4), and at least one is a group represented by the general formula (1-2).
  • Formula (1-2) (In the general formula (1-2), X is an oxygen atom or a sulfur atom, and A 1 is a phenyl group which may have a substituent, or a naphthyl group which may have a substituent.
  • X represents an oxygen atom or a sulfur atom, and preferably an oxygen atom.
  • a 1 is a phenyl group which may have a substituent or a naphthyl group which may have a substituent, and is a phenyl group having 1 to 5 substituents or 1 to 7 substituents. And a phenyl group having 1 to 5 substituents is more preferable.
  • the group represented by the general formula (1-2) is more preferably a group represented by the following general formula (1-1-2).
  • Formula (1-1-2) (In the general formula (1-1-2), X 1 is an oxygen atom or a sulfur atom, and A 11 has a phenyl group having 1 to 5 substituents R, or 1 to 7 substituents R.
  • the substituent R is a nitro group, COOR 1 (R 1 is a group represented by the general formula (1-3) or an alkyl group having 1 to 8 carbon atoms), OR 2 (R 2 is a naphthyl group) An alkyl group having 1 to 8 carbon atoms), a halogen atom, an aryl group, a cyano group, an alkyl group having 1 to 8 carbon atoms, a group represented by any one of the general formulas (4) to (6), or a general formula Represents a group selected from (X).) (In the general formula (4), R 4 is a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, or a substituent.
  • d represents an integer of 0 to 2, and when d is 0 or 1, R 5 may have an alkyl group which may have a substituent, or may have a substituent. When d is 2, R 5 is an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, a substituted group; It represents a diarylamino group which may have a group, or an alkylarylamino group which may have a substituent.
  • R 6 and R 7 are each an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, The arylcarbonyl group which may have a substituent, the alkylsulfonyl group which may have a substituent, and the arylsulfonyl group which may have a substituent are represented.
  • R 11 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms.
  • N1 represents an integer of 1 to 3.
  • n1 is 2 or 3
  • a plurality of R 11 are Y 1 is —O—, —S—, —NR 13 — (R 13 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms), —SO 2 represents — or —C ( ⁇ O) —, and R 12 represents a monovalent substituent.
  • X 1 represents an oxygen atom or a sulfur atom, preferably an oxygen atom.
  • a 11 is a phenyl group having 1 to 5 substituents or a naphthyl group having 1 to 7 substituents, and more preferably a phenyl group having 1 to 5 substituents.
  • the number of substituents of the phenyl group is an integer of 1 to 5, but from the viewpoint of the gram extinction coefficient (absorbance per gram), an integer of 1 to 3 is more preferable.
  • the number of substituents is preferably any integer of 1 to 5.
  • the number of substituents of the naphthyl group is an integer of 1 to 7, but is preferably an integer of 1 to 5, more preferably an integer of 1 to 3, from the viewpoint of the gram extinction coefficient. More preferably it is.
  • the bonding position between the naphthyl group and X 1 is not particularly limited, and may be any of the following 1-position (1-naphthyl group) or 2-position (2-naphthyl group).
  • the bonding position of the substituent to the naphthalene ring is not particularly limited.
  • the bonding positions of the substituent to the naphthalene ring are the 2-position, 3-position, 4-position, 5-position, 6-position,
  • the 2nd and 3rd positions are preferable, and the 2nd position is more preferable.
  • the bonding positions of the substituent to the naphthalene ring are the 1-position, 3-position, 4-position, 5-position, 6-position,
  • the 3rd and 6th positions are preferable, and the 3rd position is more preferable in consideration of heat resistance and solvent solubility.
  • the substituent R of the phenyl group or naphthyl group is a nitro group, COOR 1 (R 1 is a group represented by the general formula (1-3) or an alkyl group having 1 to 8 carbon atoms), OR 2 (R 2 Is an alkyl group having 1 to 8 carbon atoms), a halogen atom, an aryl group, a cyano group, an alkyl group having 1 to 8 carbon atoms, a group represented by any one of the general formulas (4) to (6), or It is a group selected from the formula (X).
  • the plurality of Rs may be the same or different.
  • R 1 in the COOR 1 is represented by an alkyl group substituted by 1 carbon atoms which may be 1-8 or the following general formula, (1-3) Represents a group.
  • General formula (1-3) (In the general formula (1-3), R 3 represents an alkylene group having 1 to 3 carbon atoms, R 4 represents an alkyl group having 1 to 8 carbon atoms, and n represents an integer of 1 to 4).
  • R 1 is an alkyl group having 1 to 8 carbon atoms
  • the alkyl group having 1 to 8 carbon atoms is preferably an alkyl group having 1 to 3 carbon atoms from the viewpoint of solvent solubility.
  • the alkyl group having 1 to 8 carbon atoms include methyl group, ethyl group, n-propyl group, iso-propyl group, n-butyl group, iso-butyl group, sec-butyl group, t-butyl group, and n-pentyl.
  • a linear, branched or cyclic alkyl group such as a group, n-hexyl group, cyclohexyl group, n-heptyl group, n-octyl group and 2-ethylhexyl group.
  • substituent present in the alkyl group having 1 to 8 carbon atoms include an alkyloxy group having 1 to 8 carbon atoms, a halogen atom or an aryl group.
  • alkyloxy group having 1 to 8 carbon atoms which may be present as a substituent of the alkyl group, there are methoxy group, ethoxy group, n-propyloxy group, iso-propyloxy group, n-butyloxy group, iso- Straight chain such as butyloxy group, sec-butyloxy group, t-butyloxy group, n-pentyloxy group, n-hexyloxy group, cyclohexyloxy group, n-heptyloxy group, n-octyloxy group, 2-ethylhexyloxy group A branched or cyclic alkyloxy group.
  • an alkyloxy group having 1 to 4 carbon atoms is preferable.
  • the halogen atom that is a substituent of the alkyl group that may be present include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom or a chlorine atom is preferable.
  • the aryl group that is a substituent of the alkyl group that may be present include a phenyl group, a p-methoxyphenyl group, a pt-butylphenyl group, and a p-chlorophenyl group. Among these, a phenyl group is preferable.
  • a plurality of these substituents may be present. If there are a plurality of these substituents, they may be the same or different, and even if they are the same, they may be the same or different.
  • the number of substituents on the alkyl group is not particularly limited, but is preferably 1 to 3, more preferably 1 or 2.
  • R 3 in the group represented by the general formula (1-3) is From the viewpoint of the effect on ether solvent solubility, it is an alkylene group having 1 to 3 carbon atoms.
  • the alkylene group having 1 to 3 carbon atoms include a methylene group, an ethylene group, an n-propylene group, and an iso-propylene group. Preferably, they are an ethylene group and a propylene group.
  • R 4 in the group represented by the general formula (1-3) is an alkyl group of 1 to 8, more preferably an alkyl group of 1 to 4, from the viewpoint of molecular weight. Examples of the alkyl group having 1 to 8 carbon atoms include those described in the above R 1 column.
  • N in the group represented by the general formula (1-3) is an integer of 1 to 4, and preferably an integer of 1 to 3, from the viewpoint of molecular weight.
  • R 2 in OR 2 represents an alkyl group having 1 to 8 carbon atoms, preferably crystalline dye, from the viewpoint of handling of the good, a C1- 3 alkyl groups are shown.
  • Examples of the alkyl group having 1 to 8 carbon atoms represented by R 2 include the same substituents as those described for R 1 of COOR 1 , which is an example of the above-described substituent R, and the preferred range is also synonymous. is there.
  • the substituent R of the phenyl group or naphthyl group is a halogen atom
  • examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom, a chlorine atom or an iodine atom is preferable.
  • a chlorine atom and a fluorine atom are preferable because the molecular weight of the dye is reduced and the gram absorption coefficient is increased.
  • the substituent R of the phenyl group or naphthyl group is an aryl group
  • examples of the aryl group include aryl groups such as a phenyl group, a p-methoxyphenyl group, a pt-butylphenyl group, and a p-chlorophenyl group.
  • a phenyl group is preferable because the molecular weight of the dye is reduced and the gram extinction coefficient is increased.
  • the alkyl group having 1 to 8 carbon atoms is the same as that described in R 1 of COOR 1 as an example of the substituent R.
  • the preferable range is also synonymous.
  • An alkyl group having 1 to 3 carbon atoms is preferable from the viewpoint of the crystallinity and handleability of the dye.
  • a halogen atom is exemplified, and a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom or a chlorine atom is more preferable.
  • halogen atoms there may be a plurality of halogen atoms as substituents for the alkyl group, and when there are a plurality of halogen atoms, they may be the same or different.
  • the number of substituents on the alkyl group is not particularly limited, but is preferably 1 to 3.
  • R 4 in the general formula (4) represents a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, or a substituent.
  • a dialkylamino group having 2 to 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms in total, or an alkylarylamino group having 7 to 20 carbon atoms is preferable, an alkyl group having 1 to 20 carbon atoms in total, and 2 to 2 carbon atoms in total.
  • Dialkylamino group having 20 carbon atoms More preferred is a dialkylamino group having 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms, and a diarylamino group having 12 to 20 carbon atoms or a total carbon number. Dialkylamino groups to 20 are particularly preferred.
  • the alkyl moiety and the aryl moiety may further have a substituent, and the substituent is preferably an alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, an arylthio group or a halogen atom, and an alkoxy group Are more preferable, and a methoxy group or an ethoxy group is more preferable. Moreover, the aspect which does not have a substituent is also preferable.
  • d represents an integer of 0 to 2, and when d is 0 or 1, R 5 is an alkyl group that may have a substituent or an aryl that may have a substituent. And when d is 2, the alkyl group which may have a substituent, the aryl group which may have a substituent, the dialkylamino group which may have a substituent, and the substituent Or a diarylamino group which may be substituted or an alkylarylamino group which may have a substituent.
  • R 5 is preferably a dialkylamino group having 2 to 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms when d is 2.
  • the alkyl moiety and the aryl moiety may further have a substituent, and examples of the substituent include a substituent T described later.
  • An alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, and an arylthio group. Or a halogen atom etc. are preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further more preferable.
  • the aspect which does not have a substituent is also preferable.
  • R 6 and R 7 are each an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, An arylcarbonyl group which may have a substituent, an alkylsulfonyl group which may have a substituent, an arylsulfonyl group which may have a substituent, an alkyl group having 1 to 20 carbon atoms, a carbon number of 6 An aryl group having ⁇ 20, an alkylcarbonyl group having 2 to 20 carbon atoms, an arylcarbonyl group having 7 to 20 carbon atoms, an alkylsulfonyl group having 1 to 20 carbon atoms, and an arylsulfonyl group having 6 to 20 carbon atoms are preferable.
  • alkylcarbonyl group having 2 to 20 carbon atoms, an arylcarbonyl group having 7 to 20 carbon atoms, an alkylsulfonyl group having 1 to 20 carbon atoms, and an arylsulfonyl group having 6 to 20 carbon atoms are more preferable.
  • the alkyl moiety and the aryl moiety may further have a substituent, and examples of the substituent include a substituent T described later.
  • an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further more preferable.
  • the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
  • alkyl group that may have a substituent in the above general formula are shown below.
  • alkyl group which may have a substituent include a methyl group, an ethyl group, a propyl group, an isopropyl group, a tert-butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a 2-ethylhexyl group, a dodecyl group, Hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group, phenoxyethyl group, benzyl group, phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfon
  • methyl group ethyl group, propyl group, tert-butyl group, phenoxyethyl.
  • benzyl group phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group and ethoxyethoxyethyl group.
  • aryl groups which may have a substituent in the general formulas (4) to (6) are shown below.
  • Such aryl groups include phenyl, 2-chlorophenyl, 2-methoxyphenyl, 4-butoxycarbonylphenyl, 4-N, N-dibutylaminocarbonylphenyl, 4-N-butylaminosulfonylphenyl 4-N, N-dibutylaminosulfonylphenyl group, more preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N-butylaminosulfonylphenyl group.
  • 4-N, N-dibutylaminosulfonylphenyl group particularly preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N, N-dibutylaminosulfonyl group.
  • a phenyl group is mentioned.
  • dialkylamino group which may have a substituent in the general formulas (4) to (6) are shown below.
  • Examples of such a dialkylamino group include N, N-dimethylamino group, N, N-dibutylamino group, N, N-di (2-ethylhexyl) amino group, N-methyl-N-benzylamino group, N, N-di (2-ethoxyethyl) amino group, N.I. N-di (2-hydroxyethyl) amino group may be mentioned.
  • diarylamino group which may have a substituent in the general formulas (4) to (6) are shown below.
  • Examples of such a diarylamino group include an N, N-diphenylamino group, an N, N-di (4-methoxyphenyl) amino group, and an N, N-di (4-acylphenyl) amino group.
  • alkylarylamino group which may have a substituent in the general formulas (4) to (6) are shown below.
  • alkylarylamino group examples include an N-methyl-N-phenylamino group, an N-benzyl-N-phenylamino group, and an N-methyl-N- (4-methoxyphenyl) amino group.
  • alkylcarbonyl group which may have a substituent in the general formulas (4) to (6) are shown below.
  • Examples of such an alkylcarbonyl group include an acetyl group, a propylcarbonyl group, a heptyl-3-carbonyl group, a 2-ethylhexyloxymethylcarbonyl group, a phenoxymethylcarbonyl group, and a 2-ethylhexyloxycarbonylmethylcarbonyl group.
  • arylcarbonyl group which may have a substituent in the general formulas (4) to (6) are shown below.
  • arylcarbonyl groups include benzoyl group, 4-methoxybenzoyl group, and 4-ethoxycarbonylbenzoyl group.
  • alkylsulfonyl group which may have a substituent in the general formulas (4) to (6) are shown below.
  • alkylsulfonyl group examples include a methanesulfonyl group, an octanesulfonyl group, a dodecylsulfonyl group, a benzylsulfonyl group, and a phenoxypropylsulfonyl group.
  • arylsulfonyl group which may have a substituent in the general formulas (4) to (6) are shown below.
  • Examples of such an arylsulfonyl group include a phenylsulfonyl group, a 2-methoxyphenylsulfonyl group, and a 4-ethoxycarbonylphenylsulfonyl group.
  • alkylsulfonylamino group which may have a substituent in the general formulas (4) to (6) are shown below.
  • alkylsulfonylamino group examples include a methylsulfonylamino group, a butylsulfonylamino group, a hydroxypropylsulfonylamino group, a 2-ethylhexylsulfonylamino group, an n-octylsulfonylamino group, a phenoxyethylsulfonylamino group, and an allylsulfonylamino group. Is mentioned.
  • examples of the vinylsulfonylamino group which may have a substituent include a vinylsulfonylamino group and a 1-methylvinylsulfonylamino group.
  • the arylsulfonylamino group which may have a substituent includes a phenylsulfonylamino group, a p-methoxyphenylsulfonylamino group, a p-ethoxycarbonylsulfonylamino group, and the like. Is mentioned.
  • the alkylcarbonylamino group which may have a substituent is a methylcarbonylamino group, a 2-ethylhexanoylamino group, an n-heptylcarbonylamino group, an ethoxyethoxy group.
  • Examples include a methylcarbonylamino group.
  • examples of the arylcarbonylamino group which may have a substituent include a benzoylamino group, a 2-methoxybenzoylamino group, and a 4-vinylbenzoylamino group.
  • An alkyl group preferably a linear, branched or cyclic alkyl group having 1 to 24 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, Hexyl group, heptyl group, octyl group, 2-ethylhexyl group, dodecyl group, hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group), alkenyl group (preferably having a carbon number of 2 to 18 alkenyl groups such as vinyl group, allyl group, 3-buten-1-yl group), aryl groups (preferably aryl groups having 6 to 24 carbon atoms such as phenyl group, naphthyl group), heterocyclic ring Group (preferably a heterocyclic
  • Alkylthio group for example, methylthio group, ethylthio group, octylthio group, cyclohexylthio group), arylthio group (preferably arylthio group having 6 to 24 carbon atoms, for example, phenylthio group), heterocyclic thio group (preferably having carbon number) 1 to 18 heterocyclic thio groups such as 2-benzothiazolylthio group, 2-pyridylthio group, 1-phenyltetrazolylthio group), alkylsulfinyl group (preferably alkylsulfinyl group having 1 to 24 carbon atoms) For example, dodecanesulfinyl group), arylsulfinyl group (preferably having 6 to 2 carbon atoms) 4 arylsulfinyl groups such as phenylsulfinyl group, alkylsulfonyl groups (preferably alkylsulfonyl groups having
  • phosphonyl group preferably phosphonyl group having 1 to 24 carbon atoms, such as phenoxyphosphonyl group, octyloxyphosphonyl group, Phenylphosphonyl group
  • a phosphinoylamino group preferably a phosphinoylamino group
  • substituent When the above-described substituent is a substitutable group, it may be further substituted with any of the above-described groups. In addition, when it has two or more substituents, those substituents may be the same or different.
  • R 11 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom.
  • n1 represents an integer of 1 to 3, more preferably 1 or 2. When n1 is 2 or 3, the plurality of R 11 may be the same or different.
  • Y 1 represents —O—, —S—, —NR 13 —, —SO 2 —, or —C ( ⁇ O) —, and represents —O—, —SO 2 —, or —C ( ⁇ O).
  • -Is preferred, and -O- or -C ( O)-is more preferred.
  • R 12 represents a monovalent substituent, and examples of the substituent include the above-described substituent T.
  • the substituent T may be further substituted with the substituent T.
  • R 12 is preferably an alkyl group which may have a substituent, an acyl group which may have a substituent, a sulfonyl group which may have a substituent, an alkoxy group which may have a substituent, Or an alkylamino group which may have a substituent, more preferably an alkyl group having 1 to 12 carbon atoms which may have a substituent, and 1 to 12 carbon atoms which may have a substituent. And an alkylamino group having 1 to 12 carbon atoms which may have a substituent.
  • the mass of the R 12 portion per molecule is preferably 200 to 2500, and more preferably 250 to 1500.
  • R 13 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • R ′ is an alkylene group having 1 to 3 carbon atoms from the viewpoint of ether solubility and molecular weight.
  • the alkylene group having 1 to 3 carbon atoms include a methylene group, an ethylene group, an n-propylene group, and an iso-propylene group. Preferably, they are an ethylene group and a propylene group.
  • R ′′ is an alkyl group having 1 to 8 carbon atoms, and preferably an alkyl group having 1 to 2 carbon atoms, from the viewpoint of ether solubility and molecular weight. It is synonymous with R 3 in 1-3), and the preferred range is also synonymous.
  • n1 is an integer of 0 to 4, more preferably an integer of 1 to 2, from the viewpoint of ether solubility and molecular weight.
  • M which is the central part of the general formula (1), will be described.
  • M represents two hydrogen atoms, a metal atom, a metal oxide, or a metal halide.
  • the metal atom include iron, magnesium, nickel, cobalt, copper, palladium, zinc, vanadium, titanium, indium, and tin.
  • the metal oxide include titanyl and vanadyl.
  • the metal halide include aluminum chloride, indium chloride, germanium chloride, tin (II) chloride, tin (IV) chloride, and silicon chloride.
  • the central metal is zinc or copper because of high heat resistance.
  • the central metal is zinc because the transmittance in the vicinity of 520 nm to 545 nm, which is a green wavelength, is higher than that of copper, and the luminance can be improved when a color filter is formed.
  • it is particularly preferable because it has high solvent solubility in general-purpose solvents such as acetone, methanol, and methyl cellosolve, and has high solubility in resins and high contrast.
  • the compound represented by the general formula (1) is more preferably represented by the following general formula (1-1).
  • General formula (1-1) (In the general formula (1-1), Z 1 to Z 16 are each a hydrogen atom, a halogen atom, a group represented by the general formula (1-1-2), or a general formula (1-3). Or a group represented by the above general formula (1-4), and 1 to 8 of Z 1 to Z 16 are represented by the above general formula (1-1-2). Or at least one is a halogen atom and at least one is a group represented by the general formula (1-1-2) M represents two hydrogen atoms, metal atoms, metal oxides or metal halides.)
  • the general formula (1-1-2), the general formula (1-3), and the general formula (1-4) in the general formula (1-1) are represented by the general formula (1-1) described in the general formula (1).
  • M in the general formula (1-1) has the same meaning as M in the general formula (1), and a preferred range is also the same.
  • Pc represents a phthalocyanine nucleus
  • Zn represents a central metal
  • a substituent substituted at the ⁇ -position immediately after Pc represents a substituent substituted at the ⁇ -position immediately after Pc
  • a substituent substituted at the ⁇ -position after the substituent substituted at the ⁇ -position represents a substituent that does not depend on the substitution position after the substituent that is substituted at the ⁇ -position.
  • x and y are positive numbers whose number of substituents is an integer of 0 or more.
  • the phthalocyanine compound becomes a mixture having different substitution positions and substitution numbers, it is difficult to uniquely describe it as a structural formula. Further, the number of substitutions shown in the following table is a value obtained by approximating the average value of the number of substituents in the mixture, and may be a small number.
  • the method for producing the phthalocyanine compound used in the present invention is not particularly limited, and a conventionally known method can be used. A method of cyclizing a phthalonitrile compound and a metal salt in a molten state or an organic solvent is particularly preferable.
  • a method of cyclizing a phthalonitrile compound and a metal salt in a molten state or an organic solvent is particularly preferable.
  • preferred embodiments of the method for producing a phthalocyanine compound will be described. However, the present invention is not limited to the following preferred embodiments.
  • a phthalocyanine compound can be produced by cyclization reaction with one selected.
  • Z 1 to Z 16 are defined by the structure of the desired phthalocyanine compound (1). Specifically, in the above formulas (I) to (IV), Z 1 to Z 16 are the same as the definitions of Z 1 to Z 16 in the above formula (1), respectively, and thus description thereof is omitted here. To do.
  • the cyclization reaction can be synthesized by a conventionally known method such as the method described in JP-A No. 64-45474.
  • the cyclization reaction is carried out by melting one kind selected from the group consisting of the phthalonitrile compounds of formulas (I) to (IV) and a metal, a metal oxide, a metal carbonyl, a metal halide and an organic acid metal in a molten state or organic It is preferable to react in a solvent.
  • the metal, metal oxide, metal carbonyl, metal halide, and organic acid metal that can be used at this time are those corresponding to the central portion of the phthalocyanine compound obtained after the reaction (M in the general formula (1)). If there is, it is not particularly limited.
  • metals such as iron, copper, zinc, vanadium, titanium, indium, and tin listed in the item M in the general formula (1), metal halide compounds such as chloride, bromide, and iodide of the metal, Examples thereof include metal oxides such as vanadium oxide, titanyl oxide and copper oxide, organic acid metals such as acetate, complex compounds such as acetylacetonate, and metal carbonyls such as carbonyl iron. Specifically, metals such as iron, copper, zinc, vanadium, titanium, indium, magnesium, and tin; metal halides such as chloride, bromide, and iodide of the metal, such as vanadium chloride, titanium chloride, and chloride.
  • metals, metal oxides and metal halides are preferable, metal halides are more preferable, vanadium iodide, copper iodide and zinc iodide are more preferable, and iodine is particularly preferable. Copper iodide and zinc iodide, most preferably zinc iodide. When zinc iodide is used, the central metal is zinc.
  • metal halides it is preferable to use iodide because it has excellent solubility in solvents and resins, and the spectrum of the resulting phthalocyanine compound is sharp and easily fits within the desired wavelength range of 640 to 750 nm. is there.
  • the detailed mechanism of sharpening the spectrum when using iodide during the cyclization reaction is unknown, but when iodide is used, the iodine remaining in the phthalocyanine compound after the reaction may not interact with the phthalocyanine compound. It is presumed that iodine is present between the layers of the phthalocyanine compound due to the action. However, the mechanism is not limited to the above mechanism. In order to obtain the same effect as when metal iodide is used for the cyclization reaction, the obtained phthalocyanine compound may be treated with iodine.
  • the cyclization reaction can be performed in the absence of a solvent, but it is preferably performed using an organic solvent.
  • the organic solvent may be any inert solvent that has a low reactivity with the phthalonitrile compound as a starting material, and preferably exhibits no reactivity.
  • benzene, toluene, xylene, nitrobenzene, monochlorobenzene, o -Inert solvents such as chlorotoluene, dichlorobenzene, trichlorobenzene, 1-chloronaphthalene, 1-methylnaphthalene, ethylene glycol, and benzonitrile; methanol, ethanol, 1-propanol, 2-propanol, 1- Alcohols such as butanol, 1-hexanol, 1-pentanol, 1-octanol; and pyridine, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidinone, N, N-dimethylacetophenone, Triethylamine, tri n- butylamine, dimethyl sulfoxide, aprotic polar solvents such as sulfolane.
  • o -Inert solvents such as chlorotoluen
  • 1-chloronaphthalene, 1-methylnaphthalene, 1-octanol, dichlorobenzene and benzonitrile are preferably used, and more preferably 1-octanol, dichlorobenzene and benzonitrile are used.
  • These solvents may be used alone or in combination of two or more.
  • the reaction conditions for the phthalonitrile compound of formulas (I) to (IV) and the metal compound in the above embodiment are not particularly limited as long as the reaction proceeds.
  • the total amount of the phthalonitrile compounds of the above formulas (I) to (IV) is 1 to 500 parts by weight, preferably 10 to 350 parts by weight, and the metal compound is used with respect to 4 moles of the phthalonitrile compound. , Preferably 0.8 to 2.0 mol, more preferably 0.8 to 1.5 mol.
  • the cyclization is not particularly limited, but the reaction is preferably performed at a reaction temperature of 30 to 250 ° C., more preferably 80 to 200 ° C.
  • the reaction time is not particularly limited, but is preferably 3 to 20 hours.
  • a phthalocyanine compound that can be used in the next step can be efficiently and highly purified by filtration, washing, and drying according to a conventionally known method for synthesizing phthalocyanine compounds.
  • the starting phthalonitrile compounds of formulas (I) to (IV) can be synthesized by a conventionally known method, or commercially available products can also be used.
  • the amount of the dye described above in the composition used in the present invention is preferably 1 to 100% by mass, more preferably 50 to 100% by mass of the colorant contained in the composition used in the present invention, It is particularly preferably 80 to 100% by mass. Further, among the colorants contained in the composition used in the present invention, the blending amount of the phthalocyanine dye (preferably a halogenated phthalocyanine dye) is preferably 55 to 80% by mass, and preferably 60 to 75% by mass. It is more preferable.
  • the pigment used for the colorant examples include conventionally known various inorganic pigments or organic pigments.
  • a pigment having an average particle diameter as small as possible considering that high transmittance is preferable regardless of whether it is an inorganic pigment or an organic pigment.
  • the average particle size of the pigment is preferably 0.01 to 0.1 ⁇ m, more preferably 0.01 to 0.05 ⁇ m.
  • pigments that can be preferably used in the present invention include those described in paragraph No. 0026 of JP2012-181512A, the contents of which are incorporated herein.
  • the following can be mentioned as a pigment which can be preferably used in this invention.
  • the present invention is not limited to these. C. I.
  • the amount of the pigment described above in the composition used in the present invention may be 1 to 100% by mass of the colorant when included in the colored curable composition. By reducing the blending amount of the pigment, the blending amount of the colorant in the colored curable composition can be further increased, and the effects of the present invention tend to be exhibited more effectively.
  • a pigment When a pigment is used for adjusting the composition constituting the laminate of the present invention, it may be a pigment dispersion. From the viewpoint of improving the dispersibility of the pigment, a pigment dispersant may be further added.
  • the pigment dispersant that can be used in the present invention include polymer dispersants [for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meta ) Acrylate, (meth) acrylic copolymer, naphthalenesulfonic acid formalin condensate], and polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, alkanolamine, pigment derivative, and the like.
  • polymer dispersants for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meta ) Ac
  • the polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.
  • the polymer dispersant acts to adsorb on the surface of the pigment and prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures.
  • the pigment derivative has an effect of promoting adsorption of the polymer dispersant by modifying the pigment surface.
  • the pigment dispersant that can be used in the present invention is also available as a commercial product. Specific examples thereof include those described in paragraph No.
  • the content of the pigment dispersant in the composition of the present invention is preferably 1 to 80 parts by mass and more preferably 5 to 70 parts by mass with respect to 100 parts by mass of the pigment as the colorant.
  • the amount used is preferably in the range of 5 to 100 parts by mass in terms of mass with respect to 100 parts by mass of the pigment.
  • the amount of the pigment derivative used is preferably in the range of 1 to 30 parts by mass, preferably in the range of 3 to 20 parts by mass, with respect to 100 parts by mass of the pigment. Is more preferable.
  • the pigment derivative is a compound having a structure in which a part of an organic pigment is substituted with an acidic group, a basic group or a phthalimidomethyl group.
  • the pigment derivative preferably contains a pigment derivative having an acidic group or a basic group from the viewpoint of dispersibility and dispersion stability.
  • the content of the pigment derivative in the composition of the present invention is preferably 1 to 90% by mass, more preferably 3 to 80% by mass, based on the total mass of the pigment. Only one pigment derivative may be used, or two or more pigment derivatives may be used in combination.
  • the solvent in the pigment dispersion is not particularly limited as long as it is an organic solvent used in general pigment dispersible compositions.
  • the content of the solvent in the pigment dispersion is appropriately selected according to the use of the pigment dispersion.
  • the sum of the pigment and the pigment dispersant is 5 to 5 based on the total mass excluding the solvent of the pigment dispersion. It can contain so that it may become 50 mass%.
  • yellow pigment As an example of an embodiment of the present invention, the use of a phthalocyanine dye mixed with a yellow pigment is exemplified.
  • the yellow pigment may be a dye, a pigment, or a mixed system of a dye and a pigment, but a dye is preferred from the viewpoint of obtaining a uniformly dissolved composition without using a dispersant.
  • an azo dye for example, CI solvent yellow 162
  • methine dye a monomethine dye is preferable, and a monomethine dye represented by the following general formula (5) is more preferable.
  • R 11 represents an alkyl group or a vinyl group
  • R 12 represents an aromatic ring group having a substituent.
  • R 11 is preferably an alkyl group having 1 to 12 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
  • R 12 is preferably a phenyl group or a naphthyl group, and the substituent is preferably an alkylsulfonylamino group, a vinylsulfonylamino group, an arylsulfonylamino group, an alkylcarbonylamino group, a vinylcarbonylamino group, or an arylcarbonylamino group.
  • An alkylsulfonylamino group is preferred.
  • the alkyl group having 1 to 12 carbon atoms may have an unsaturated bond, and examples of such a substituent include an allylsulfonylamino group.
  • an acid dye and / or a derivative thereof may be suitably used.
  • a direct dye, a basic dye, a mordant dye, an acid mordant dye, an azoic dye, a disperse dye, an oil-soluble dye, a food dye, and / or a derivative thereof can be usefully used.
  • acid dye examples include acid yellow 1,3,7,9,11,17,23,25,29,34,36,38,40,42,54,65,72,73,76,79,98,99,111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251; Direct Yellow 2,33,34,35,38,39,43,47,50,54,58,68,69,70,71,86,93,94,95,98,102,108,109,129, 136, 138,
  • the above-described pigments can be used.
  • the blending amount of the above-described yellow pigment in the composition used in the present invention is preferably 10 to 120% by mass, more preferably 25 to 100% by mass with respect to 100% by mass of the phthalocyanine dye, It is particularly preferable that the content be ⁇ 90% by mass.
  • thermosetting compound refers to a compound that can be cured by heating, and generally refers to a compound that is cured by heating at 180 ° C. or higher.
  • thermosetting compound used in the present invention for example, a compound having a thermosetting functional group can be used.
  • thermosetting functional group for example, those having at least one group selected from an epoxy group, a methylol group, an alkoxymethyl group, an acyloxymethyl group, an isocyanate group, a vinyl ether group, and a mercapto group are preferable.
  • thermosetting compound those having two or more thermosetting functional groups in one molecule are more preferable, and compounds having two or more epoxy groups in one molecule are more preferable.
  • the thermosetting compound used in the present invention includes epoxy compounds, melamine compounds (for example, alkoxymethylated, acyloxymethylated melamine compounds), urea compounds (for example, alkoxymethylated, acyloxymethylated urea compounds), phenol compounds ( For example, preferred examples include hydroxymethylated or alkoxymethylated phenol compounds or resins, and alkoxymethyl etherified phenol compounds), epoxy compounds and melamine compounds are more preferred, and epoxy compounds are more preferred.
  • the thermosetting compound used in the present invention may be a low molecular compound (for example, a molecular weight of less than 2000, and further a molecular weight of less than 1000), or a high molecular compound (for example, a molecular weight of 1000 or more, in the case of a polymer, the weight average molecular weight is 1000 or more).
  • a molecular weight of 1000 or more are preferred, and those having a molecular weight of 2000 to 100,000 are more preferred.
  • a compound having 2 or more epoxy groups in one molecule and a molecular weight of 1000 or more is particularly preferable.
  • R EP1 to R EP3 each represent a hydrogen atom, a halogen atom, or an alkyl group, and the alkyl group may have a cyclic structure, and has a substituent. May be. R EP1 and R EP2 and R EP2 and R EP3 may be bonded to each other to form a ring structure.
  • alkyl group may have include a hydroxyl group, a cyano group, an alkoxy group, an alkylcarbonyl group, an alkoxycarbonyl group, an alkylcarbonyloxy group, an alkylthio group, an alkylsulfone group, an alkylsulfonyl group, and an alkylamino group.
  • QEP represents a single bond or an nEP- valent organic group.
  • R EP1 ⁇ R EP3 combines with Q EP may form a ring structure.
  • nEP represents an integer of 2 or more, preferably 2 to 10, and more preferably 2 to 6. However, n EP is 2 when Q EP is a single bond.
  • QEP is an nEP- valent organic group
  • a linear or cyclic nEP- valent saturated hydrocarbon group preferably having 2 to 20 carbon atoms
  • nEP- valent aromatic ring group preferably having 6 to 30 carbon atoms
  • a linear or cyclic saturated hydrocarbon or aromatic hydrocarbon such as an ether group, an ester group, an amide group, a sulfonamide group, an alkylene group (preferably having 1 to 4 carbon atoms, more preferably a methylene group), etc.
  • a divalent linking group, a trivalent linking group such as —N (—) 2, or an n EP valent organic group having a structure in which a combination thereof is linked is preferable.
  • the epoxy compound used in the present invention is also preferably an oligomer or polymer having an epoxy group in the side chain.
  • examples of such compounds include bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, aliphatic epoxy resins and the like. These compounds may be used as commercial products or can be obtained by introducing an epoxy group into the side chain of the polymer.
  • bisphenol A type epoxy resin JER827, JER828, JER834, JER1001, JER1002, JER1003, JER1055, JER1007, JER1009, JER1010 (above, Japan Epoxy Resin Co., Ltd.), EPICLON860, EPICLON1050, EPICLON1051, EPICLON1055 (manufactured by DIC Corporation), etc.
  • bisphenol F type epoxy resin is JER806, JER807, JER4004, JER4005, JER4007, JER4010 (above, Japan Epoxy Resin Co., Ltd.), EPICLON830, EPICLON835.
  • ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4010S, EP-4011S (above, manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (above, manufactured by ADEKA Corporation), JER1031S (manufactured by Japan Epoxy Resin Co., Ltd.) and the like.
  • the introduction reaction includes tertiary amines such as triethylamine and benzylmethylamine, quaternary ammonium salts such as dodecyltrimethylammonium chloride, tetramethylammonium chloride, tetraethylammonium chloride, pyridine,
  • the reaction can be carried out in an organic solvent at a reaction temperature of 50 to 150 ° C. for several hours to several tens of hours using triphenylphosphine as a catalyst.
  • the amount of the alicyclic epoxy unsaturated compound introduced is preferably controlled so that the acid value of the obtained polymer is in a range satisfying 5 to 200 KOH ⁇ mg / g.
  • the molecular weight is preferably in the range of 500 to 5000000, more preferably 1000 to 500000 on a weight average.
  • the epoxy unsaturated compound those having a glycidyl group as an epoxy group such as glycidyl (meth) acrylate and allyl glycidyl ether can be used, but preferred are unsaturated compounds having an alicyclic epoxy group. Examples of such compounds include the following compounds.
  • thermosetting compound used in the present invention compounds having the following N-hydroxymethyl group, N-alkoxymethyl group, or N-acyloxymethyl group are also preferable.
  • Such a compound is usually provided as a melamine compound or a urea compound.
  • the compound having an N-hydroxymethyl group, an N-alkoxymethyl group, or an N-acyloxymethyl group has two or more (more preferably 2 to 8) partial structures represented by the following general formula (CLNM-1). ) Is preferred.
  • R NM1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an oxoalkyl group.
  • the alkyl group represented by R NM1 is preferably a linear or branched alkyl group having 1 to 6 carbon atoms.
  • the cycloalkyl group of R NM1 is preferably a cycloalkyl group having 5 to 6 carbon atoms.
  • the oxoalkyl group of R NM1 is preferably an oxoalkyl group having 3 to 6 carbon atoms, and examples thereof include a ⁇ -oxopropyl group, a ⁇ -oxobutyl group, a ⁇ -oxopentyl group, and a ⁇ -oxohexyl group. it can.
  • R NM1 respectively, in formula (CLNM-1), is the same as R NM1.
  • R NM2 represents a hydrogen atom, an alkyl group (preferably having 1 to 6 carbon atoms), or a cycloalkyl group (preferably having 5 to 6 carbon atoms).
  • urea compound represented by the general formula (CLNM-2) include, for example, N, N-di (methoxymethyl) urea, N, N-di (ethoxymethyl) urea, N, N-di (propoxy).
  • Methyl) urea N, N-di (isopropoxymethyl) urea, N, N-di (butoxymethyl) urea, N, N-di (t-butoxymethyl) urea, N, N-di (cyclohexyloxymethyl) Examples include urea, N, N-di (cyclopentyloxymethyl) urea, N, N-di (adamantyloxymethyl) urea, N, N-di (norbornyloxymethyl) urea and the like.
  • R NM1 respectively, in formula (CLNM-1), is the same as R NM1.
  • R NM3 represents a hydrogen atom, a hydroxyl group, a linear or branched alkyl group (preferably having 1 to 6 carbon atoms), a cycloalkyl group (preferably having 5 to 6 carbon atoms), an oxoalkyl group (having 1 to 6 carbon atoms). 6), an alkoxy group (preferably having 1 to 6 carbon atoms) or an oxoalkoxy group (preferably having 1 to 6 carbon atoms).
  • G represents a single bond, an oxygen atom, a sulfur atom, an alkylene group (preferably having 1 to 3 carbon atoms) or a carbonyl group. More specific examples include a methylene group, an ethylene group, a propylene group, a 1-methylethylene group, a hydroxymethylene group, a cyanomethylene group, and the like.
  • alkylene urea compound represented by the general formula (CLNM-3) include, for example, N, N-di (methoxymethyl) -4,5-di (methoxymethyl) ethylene urea, N, N-di ( Ethoxymethyl) -4,5-di (ethoxymethyl) ethyleneurea, N, N-di (propoxymethyl) -4,5-di (propoxymethyl) ethyleneurea, N, N-di (isopropoxymethyl) -4 , 5-Di (isopropoxymethyl) ethyleneurea, N, N-di (butoxymethyl) -4,5-di (butoxymethyl) ethyleneurea, N, N-di (t-butoxymethyl) -4,5- Di (t-butoxymethyl) ethyleneurea, N, N-di (cyclohexyloxymethyl) -4,5-di (cyclohexyloxymethyl) ethyleneurea, N, N-di (cyclo Nthyloxymethyl)
  • R NM1 in formula (CLNM-1), is the same as R NM1.
  • R NM4 represents a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group or an alkoxy group, respectively.
  • R NM4 alkyl group preferably having 1 to 6 carbon atoms
  • cycloalkyl group preferably having 5 to 6 carbon atoms
  • alkoxy group preferably having 1 to 6 carbon atoms
  • Examples include an ethyl group, a butyl group, a cyclopentyl group, a cyclohexyl group, a methoxy group, an ethoxy group, and a butoxy group.
  • glycoluril compound represented by the general formula (CLNM-4) include, for example, N, N, N, N, N-tetra (methoxymethyl) glycoluril, N, N, N, N-tetra (ethoxymethyl) ) Glycoluril, N, N, N, N-tetra (propoxymethyl) glycoluril, N, N, N, N-tetra (isopropoxymethyl) glycoluril, N, N, N, N-tetra (butoxymethyl) Glycoluril, N, N, N, N-tetra (t-butoxymethyl) glycoluril, N, N, N, N-tetra (cyclohexyloxymethyl) glycoluril, N, N, N, N-tetra (cyclopentyloxy) Methyl) glycoluril, N, N, N, N-tetra (adamantyloxymethyl) glycoluril, N, N, N, N- Tiger (norbornyl
  • R NM1 respectively, in formula (CLNM-1), is the same as R NM1.
  • R NM5 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an atomic group represented by the following general formula (CLNM-5 ′).
  • R NM6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an atomic group represented by the following general formula (CLNM-5 ′′).
  • R NM1 is in the general formula (CLNM-1), is the same as R NM1.
  • R NM1 is in the general formula (CLNM-1), is similar to the R NM1, R NM5, like the R NM5 in formula (CLNM-5) Is.
  • Alkyl group R NM5 and R NM6 (preferably having 1 to 6 carbon atoms), a cycloalkyl group (preferably 5 to 6 carbon atoms), aryl group (preferably 6 to 10 carbon atoms), and more specifically, Examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a pentyl group, a cyclopentyl group, a hexyl group, a cyclohexyl group, a phenyl group, and a naphthyl group.
  • Examples of the melamine compound represented by the general formula (CLNM-5) include N, N, N, N, N, N-hexa (methoxymethyl) melamine, N, N, N, N, N-hexa (Ethoxymethyl) melamine, N, N, N, N, N-hexa (propoxymethyl) melamine, N, N, N, N, N-hexa (isopropoxymethyl) melamine, N, N, N , N, N-hexa (butoxymethyl) melamine, N, N, N, N, N-hexa (t-butoxymethyl) melamine, N, N, N, N, N, N-hexa (cyclohexyl) Oxymethyl) melamine, N, N, N, N, N, N, N-hexa (cyclopentyloxymethyl) melamine, N, N, N, N, N, N-hexa (adamantyloxymethyl) melamine
  • the groups represented by R NM1 to R NM6 in the general formulas (CLNM-1) to (CLNM-5) may further have a substituent.
  • substituents that R NM1 to R NM6 may have include, for example, a halogen atom, a hydroxyl group, a nitro group, a cyano group, a carboxyl group, a cycloalkyl group (preferably having 3 to 20 carbon atoms), an aryl group (preferably 6 to 14 carbon atoms), alkoxy group (preferably 1 to 20 carbon atoms), cycloalkoxy group (preferably 3 to 20 carbon atoms), acyl group (preferably 2 to 20 carbon atoms), acyloxy group (preferably carbon atoms) 2 to 20).
  • the phenol compound contains 3 to 5 benzene rings in the molecule, and further has two or more hydroxymethyl groups or alkoxymethyl groups. Mention may be made of phenolic compounds which are concentrated or distributed and bonded. As the alkoxymethyl group bonded to the benzene ring, those having 6 or less carbon atoms are preferable. Specifically, methoxymethyl group, ethoxymethyl group, n-propoxymethyl group, i-propoxymethyl group, n-butoxymethyl group, i-butoxymethyl group, sec-butoxymethyl group, and t-butoxymethyl group are preferable.
  • thermosetting compound is more preferably a phenol compound having two or more benzene rings in the molecule, and is preferably a phenol compound containing no nitrogen atom.
  • the thermosetting compound is preferably a phenol compound having 2 to 8 thermosetting functional groups per molecule, and more preferably 3 to 6 thermosetting functional groups.
  • L 1 to L 8 represent a thermosetting functional group such as an alkoxymethyl group, which may be the same or different, and the thermosetting functional group is preferably a hydroxymethyl group, a methoxymethyl group or An ethoxymethyl group is shown.
  • thermosetting compound a commercially available one can be used, or it can be synthesized by a known method.
  • a phenol compound having a hydroxymethyl group is obtained by reacting a corresponding phenol compound having no hydroxymethyl group (a compound in which L 1 to L 8 are hydrogen atoms in the above formula) with formaldehyde in the presence of a base catalyst. be able to.
  • the reaction temperature is preferably 60 ° C. or lower.
  • they can be synthesized by the methods described in JP-A-6-282067, JP-A-7-64285 and the like.
  • a phenol compound having an alkoxymethyl group can be obtained by reacting a corresponding phenol compound having a hydroxymethyl group with an alcohol in the presence of an acid catalyst.
  • the reaction temperature is preferably 100 ° C. or lower.
  • a phenol compound having a hydroxymethyl group or an alkoxymethyl group synthesized in this manner is preferable from the viewpoint of stability during storage, but a phenol compound having an alkoxymethyl group is particularly preferable from the viewpoint of stability during storage.
  • Such a phenol compound having two or more hydroxymethyl groups or alkoxymethyl groups in total and concentrated on any benzene ring or distributed and bonded may be used alone or in combination of two kinds. A combination of the above may also be used.
  • thermosetting compound may be used alone or in combination of two or more.
  • the total content of the thermosetting compound in the colored curable composition constituting the laminate of the present invention varies depending on the material, but is 5 to 40 with respect to the total solid content (mass) of the colored curable composition. % By mass is preferable, 7 to 35% by mass is more preferable, and 10 to 30% by mass is particularly preferable. In this invention, the effect that the cured film excellent in chemical-resistance can be obtained by setting it as the compounding quantity of such a thermosetting compound is acquired.
  • the colored curable composition which comprises the laminated body of this invention contains the solvent (usually organic solvent) which melt
  • organic solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate.
  • Alkyl oxyacetates eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)
  • alkyl 3-oxypropionate Esters eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc.
  • 2- Xylpropionic acid alkyl esters eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc.
  • ethers For example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, etc., and ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc., and aromatic hydrocarbons such as, for example, Preferred examples include ruene and xylene.
  • solvents are preferably mixed in two or more types from the viewpoint of improving the coated surface.
  • It is a mixed solution composed of two or more selected from carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.
  • the content of the solvent in the colored curable composition is preferably such that the total solid concentration of the colored curable composition is 5 to 30% by mass, and 7 to 25% by mass from the viewpoint of applicability. More preferred is 10 to 20% by mass.
  • the colored curable composition constituting the laminate of the present invention is, as necessary, various additives such as surfactants, acid anhydrides, curing agents, curing catalysts, as long as the effects of the present invention are not impaired.
  • a filler, an adhesion promoter, an antioxidant, an ultraviolet absorber, an aggregation inhibitor, and the like can be blended.
  • Various surfactants may be added to the colored curable composition constituting the laminate of the present invention from the viewpoint of further improving coatability.
  • various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
  • the colored curable composition constituting the laminate of the present invention contains a fluorine-based surfactant
  • liquid properties (particularly, fluidity) when prepared as a coating liquid are further improved.
  • the uniformity of coating thickness and liquid-saving property can be further improved. That is, in the case of forming a film using a coating liquid to which a colored curable composition containing a fluorosurfactant is applied, by reducing the interfacial tension between the coated surface and the coating liquid, The wettability is improved, and the coating property to the coated surface is improved. For this reason, even when a thin film of about several ⁇ m is formed with a small amount of liquid, it is effective in that it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
  • the fluorine content in the fluorosurfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass.
  • a fluorine-based surfactant having a fluorine content in this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in a colored curable composition.
  • fluorosurfactant examples include MegaFuck F781 (manufactured by DIC Corporation).
  • the colored curable composition may or may not contain a surfactant, but when it is contained, the addition amount of the surfactant is 0.001% by mass relative to the total mass of the colored curable composition.
  • the content is preferably -2.0% by mass, more preferably 0.005% -1.0% by mass.
  • the solid content acid value of the polymer compound is 80 mgKOH / g or less.
  • the colored curable composition constituting the laminate of the present invention may contain an acid anhydride.
  • an acid anhydride By containing an acid anhydride, it is possible to improve the crosslinkability of the thermosetting compound, particularly the epoxy compound, by thermosetting.
  • the acid anhydride examples include phthalic acid anhydride, nadic acid anhydride, maleic acid anhydride, and succinic acid anhydride.
  • phthalic anhydride is preferable because the acid anhydride has little influence on pigment dispersion.
  • An amine compound is generally used as an epoxy curing agent, but has advantages such as a relatively long pot life.
  • the content of the acid anhydride in the colored curable composition is preferably in the range of 10 to 40% by mass, and in the range of 15 to 30% by mass with respect to the content of the thermosetting compound (particularly the epoxy compound). More preferred.
  • the content of the acid anhydride is 10% by mass or more, the crosslinking density of the thermosetting compound, particularly epoxy, can be improved, and the mechanical strength can be increased. Curing components are suppressed, which is advantageous for increasing the concentration of the coloring material.
  • ⁇ Curing agent> When using an epoxy resin as the thermosetting compound, it is preferable to add a curing agent.
  • curing agents for epoxy resins, and the properties, the pot life of the mixture of resin and curing agent, viscosity, curing temperature, curing time, heat generation, etc. vary greatly depending on the type of curing agent used.
  • An appropriate curing agent must be selected according to the purpose of use, use conditions, working conditions, and the like. The curing agent is explained in detail in Chapter 5 of Hiroshi Kakiuchi “Epoxy resin (Shojodo)”. Examples of curing agents are shown below.
  • Those that act catalytically include tertiary amines, boron trifluoride-amine complexes, those that react stoichiometrically with functional groups of epoxy resins, polyamines, acid anhydrides, etc .;
  • Examples include diethylenetriamine, polyamide resin, and medium temperature curing examples such as diethylaminopropylamine and tris (dimethylaminomethyl) phenol;
  • examples of high temperature curing include phthalic anhydride and metaphenylenediamine.
  • amines diethylenetriamine as an aliphatic polyamine; metaphenylenediamine as an aromatic polyamine; tris (dimethylaminomethyl) phenol as a tertiary amine; phthalic anhydride as an acid anhydride; polyamide resin Polysulfide resin, boron trifluoride-monoethylamine complex; Synthetic resin initial condensate includes phenol resin, dicyandiamide and the like.
  • both the binder and the curing agent are preferably as small as possible.
  • the curing agent is 35% by mass or less, preferably 30% by mass or less, more preferably 25% by mass or less with respect to the thermosetting compound. It is preferable that
  • ⁇ Curing catalyst> In order to realize a composition having a high colorant concentration, curing by reaction between epoxy groups is effective in addition to curing by reaction with a curing agent. For this reason, a curing catalyst can be used without using a curing agent.
  • the addition amount of the curing catalyst is about 1/10 to 1/1000, preferably about 1/20 to 1/500, more preferably about 1/30, based on the weight of the epoxy resin having an epoxy equivalent of about 150 to 200. It can be cured with a small amount of about 1/250.
  • the colorant is a dye, dissolve it in a solvent together with the thermosetting compound.
  • a pigment is included as a colorant, it is usually blended after preparing as a pigment dispersion as described above.
  • thermosetting compound is an epoxy compound
  • a thermosetting compound and a curing catalyst or a curing agent are added to the pigment dispersion or dye solution thus obtained, or the binder is already thermosetting.
  • the colored curable composition constituting the laminate of the present invention is preferably filtered with a filter for the purpose of removing foreign substances or reducing defects.
  • a filter used for filter filtration if it is a filter conventionally used for the filtration use etc., it can use without being specifically limited.
  • the material of the filter include: a fluororesin such as PTFE (polytetrafluoroethylene); a polyamide resin such as nylon-6 and nylon-6, 6; a polyolefin resin such as polyethylene and polypropylene (PP) (high density, Including ultra high molecular weight); Among these materials, polypropylene (including high density polypropylene) is preferable.
  • the pore size of the filter is not particularly limited, but is, for example, about 0.01 to 20.0 ⁇ m, preferably about 0.01 to 5 ⁇ m, and more preferably about 0.01 to 2.0 ⁇ m.
  • the pore size of the filter can refer to the nominal value of the filter manufacturer.
  • a commercially available filter for example, it can be selected from various filters provided by Nippon Pole Co., Ltd., Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.) or KITZ Micro Filter Co., Ltd. .
  • two or more filters may be used in combination.
  • the filtration can be performed first using a first filter and then using a second filter having a pore diameter different from that of the first filter.
  • the filtering by the first filter and the filtering by the second filter may be performed only once or may be performed twice or more, respectively.
  • the second filter a filter formed of the same material as the first filter described above can be used.
  • Color layer It can be set as the colored layer which comprises the laminated body of this invention by hardening the colored curable composition mentioned above. A method for forming the colored layer will be described later.
  • This colored layer can be preferably used as a colored layer of a color filter. In particular, it can be preferably used as a colored curable composition for dry etching.
  • the thickness of the colored layer is preferably 0.1 to 1.0 ⁇ m, and more preferably 0.3 to 0.8 ⁇ m. In this invention, since the density
  • the laminate of the present invention has an oxygen barrier film on the above-described colored layer.
  • This oxygen blocking film is formed using an oxygen blocking compound and exhibits high oxygen blocking ability, high transparency, and low light scattering.
  • the film surface roughness means a state in which a large number of aggregates are generated on the surface of the colored layer, so that a large number of irregularities are formed on the surface of the colored layer.
  • the cause of film surface roughness on the surface of the colored layer is that singlet oxygen decomposes the polymer component (cured product of the thermosetting compound) in the colored layer, causing color separation from the polymer component and coloration. It is thought that this occurs when the agents form aggregates.
  • the oxygen barrier compound contained in the oxygen barrier film may be either an inorganic material or an organic material, and an inorganic material is preferred.
  • membrane is substantially comprised only with the said oxygen interruption
  • substantially oxygen-blocking compound only means, for example, that the content of the oxygen-blocking compound in the oxygen-blocking film is 99% by mass or more.
  • SiO 2 and SiN are preferable, and SiO 2 is particularly preferable.
  • metal alkoxy group-containing compound examples include tetraethoxysilane, tetraethyl orthotitanate, tetramethoxysilane, ethyltriethoxysilane, and methyltrimethoxysilane.
  • Organic polymers include polyvinyl alcohol (PVA), polyvinyl pyrrolidone, polyacrylamides, water-soluble polyamides, water-soluble salts of polyacrylic acid, polymers of polyvinyl ether and maleic anhydride, ethylene oxide polymers, ethyl cellulose, hydroxyethyl cellulose , Celluloses such as water-soluble salts of carboxyethyl cellulose, gum arabic, alkoxysilane-containing polymers and the like, and mixtures of two or more thereof.
  • PVA polyvinyl alcohol
  • Polyvinyl pyrrolidone or a mixture of polyvinyl alcohol and polyvinyl pyrrolidone is preferred, and polyvinyl alcohol is particularly preferred.
  • the polyvinyl alcohol preferably has a weight average molecular weight of 300 to 2400 and is preferably hydrolyzed 71 to 100 mol%.
  • PVA-101, PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124 all trade names, manufactured by Kuraray Co., Ltd., saponification rate 97 to 98%)
  • the last two digits ⁇ 100 of the three-digit numbers after PVA indicate the degree of polymerization.
  • the content of PVA in the mixture of polyvinyl alcohol and polyvinyl pyrrolidone is preferably 25 to 99% by mass, more preferably 50 to 90% by mass, and particularly preferably 50 to 80% by mass.
  • the amount of these polymers added is 1 to 40% by mass, more preferably 10 to 35% by mass, based on the entire layer.
  • the content of polyvinyl pyrrolidone is preferably 1 to 75% by mass, more preferably 1 to 50% by mass, and still more preferably 10 to 40% by mass, based on the total solid content of the oxygen barrier film.
  • the thickness of the oxygen blocking film is preferably 10 ⁇ m or less.
  • the oxygen blocking film is excellent in sensitivity and flatness of the formed color pixel and functions suitably as an oxygen blocking film for the color filter.
  • the thickness of the oxygen blocking film exceeds 10 ⁇ m, the oxygen permeability of the oxygen blocking film can be suppressed, but the intensity of light passing through the color filter layer may be reduced.
  • the film thickness of the oxygen barrier film is more preferably 5 ⁇ m or less, and further preferably 1 ⁇ m or less.
  • the lower limit of the thickness of the oxygen blocking film is not particularly defined, but is 0.05 ⁇ m or more.
  • the oxygen barrier layer preferably has an oxygen permeability of 200 ml / m 2 ⁇ day ⁇ atm or less, more preferably 100 ml / m 2 ⁇ day ⁇ atm or less, and 50 ml / m 2 ⁇ day ⁇ atm or less. It is particularly preferred.
  • the lower limit of the oxygen transmission rate is not particularly limited, but 0 ml / m 2 ⁇ day ⁇ atm is preferable. When the oxygen permeability is in the above range, it functions suitably from the viewpoint of roughening the surface of the colored film.
  • the oxygen permeability of the oxygen blocking layer As a method for measuring the oxygen permeability of the oxygen blocking layer, for example, it can be measured as follows. Orbis Fair Laboratories Japan Inc. model 3600 is used as the oxygen electrode. As the electrode diaphragm, polyfluoroalkoxy (PFA) 2956A having excellent response speed and sensitivity is used. Silicone grease (SH111, manufactured by Toray Dow Corning Co., Ltd.) is applied thinly (for example, 1.0 ⁇ m) to the electrode diaphragm, and a thin film material to be measured is applied thereon, and the oxygen concentration value is measured. It has been confirmed that the coating film of silicone grease does not affect the oxygen transmission rate. Next, the oxygen transmission rate (ml / m 2 ⁇ day ⁇ atm) with respect to the oxygen concentration value is converted.
  • PFA polyfluoroalkoxy
  • the oxygen blocking compound when the oxygen blocking compound is made of an inorganic material, a physical film forming method such as vapor deposition and sputtering, a chemical film forming method such as CVD, a wet process such as CLD and spraying method, etc.
  • a physical film forming method such as vapor deposition and sputtering
  • CVD chemical film forming method
  • a wet process such as CLD and spraying method
  • Various film forming methods such as a film method can be used.
  • various coaters such as a roll coater, an air knife coater, a blade coater, a rod coater, a bar coater, a spin coater, and a spray coater can be used.
  • an oxygen barrier film contains an inorganic material.
  • An embodiment in which the thickness of the colored layer is 0.1 to 1.0 ⁇ m.
  • Eighth embodiment A mode in which the oxygen barrier film and the colored layer are adjacent to each other.
  • Neth embodiment A mode in which the thickness of the oxygen barrier film is 10 ⁇ m or less.
  • Teth embodiment A form comprising a combination of two or more of the first to ninth embodiments.
  • the manufacturing method of the color filter of this invention forms a 1st colored layer using the colored curable composition (it is also mentioned 1st colored curable composition) mentioned above.
  • the first colored layer is excellent in solvent resistance and alkali developer resistance.
  • a developer used when forming a resist pattern (patterned photoresist layer) as an etching mask on the first colored layer which will be described in detail later, or a second on the first colored layer.
  • the first colored layer exposes the organic solvent in the second or third colored radiation-sensitive composition or the second or third colored radiation-sensitive layer formed by the second or third colored radiation-sensitive composition;
  • the color component in the first colored layer is dissolved in the developer used for development, and the color component in the second or third colored radiation-sensitive composition may be dissolved in the solvent or developer.
  • Mixed in 1 colored layer Etc. can be suppressed Ruosore.
  • a solid-state imaging device that is required to have a minute size such that the thickness is 0.1 to 1.0 ⁇ m and / or the pixel pattern size (one side in a square pattern) is 2 ⁇ m or less (for example, 0.5 to 2.0 ⁇ m) It is effective in producing a color filter for use.
  • a color filter of the present invention it is possible to provide a color filter that is a colored layer having a high concentration of a colorant and that hardly causes film surface roughness on the surface of the colored layer even under high temperature and high humidity. it can.
  • the solid-state imaging device 10 includes a light receiving element (photodiode) 42 provided on a silicon substrate, a color filter 13, a planarizing film 14, a microlens 15, and the like.
  • the planarizing film 14 is not necessarily provided.
  • the ratios of the thicknesses and widths are disregarded and some of them are exaggerated.
  • the support is not particularly limited as long as it is used for a color filter in addition to a silicon substrate.
  • soda glass, borosilicate glass, quartz glass, and a transparent conductive film attached to these are used for liquid crystal display elements.
  • a photoelectric conversion element substrate used for a solid-state imaging device such as an oxide film or silicon nitride.
  • an intermediate layer or the like may be provided between the support and the color filter 13 as long as the present invention is not impaired.
  • a P well 41 is provided on the silicon substrate, and a photodiode 42 is provided on a part of the surface of the P well.
  • the photodiode 42 is formed by performing heat treatment after ion-implanting N-type impurities such as P and As into a part of the surface of the P-well.
  • an impurity diffusion layer 43 having an N-type impurity concentration higher than that of the photodiode 42 is provided in a region different from the above portion on the surface of the P well 41 of the silicon substrate.
  • the impurity diffusion layer 43 is formed by ion implantation of N-type impurities such as P and As and then performing heat treatment, and the role of the floating diffusion layer that transfers charges generated when the photodiode 42 receives incident light.
  • the well 41 is a P-type impurity layer and the photodiode 42 and the impurity diffusion layer 43 being an N-type impurity layer
  • the well 41 is an N-type impurity layer and the photodiode 42 and the impurity diffusion layer 43 being a P-type impurity layer.
  • An insulating film 47 such as SiO 2 or SiO 2 / SiN / SiO 2 is provided on the P well 41, the photodiode 42, and the impurity diffusion layer 43.
  • An electrode 44 made of tungsten silicide, Al, Cu or the like is provided on the insulating film 47.
  • the electrode 44 serves as the gate of the gate MOS transistor, and can serve as a transfer gate for transferring charges generated in the photodiode 42 to the impurity diffusion layer 43.
  • a wiring layer 45 is formed above the electrode 44. Above the wiring layer 45, a BPSG film 46 and a P-SiN film 48 are provided.
  • the interface between the BPSG film 46 and the P-SiN film 48 is formed so as to be curved downward above the photodiode 42, and serves as an in-layer lens for efficiently guiding incident light to the photodiode 42. Fulfill.
  • a planarizing film layer 49 is formed for the purpose of planarizing the surface of the P-SiN film 48 or uneven portions other than the pixel region.
  • the color filter 13 is formed on the planarizing film layer 49.
  • a colored film (so-called solid film) formed on a silicon substrate without dividing the region is referred to as a “colored (colored radiation sensitive) layer”, and is formed by dividing the region into a pattern.
  • a colored film (for example, a film patterned in a stripe shape) is referred to as a “colored pattern”.
  • a colored pattern that is an element constituting the color filter 13 for example, a colored pattern patterned into a square or a rectangle
  • a colored (red, green, blue) pixel is referred to as a “colored (red, green, blue) pixel”.
  • the color filter 13 includes a plurality of two-dimensionally arranged green pixels (first color pixels) 20G, red pixels (second color pixels) 20R, and blue pixels (third color pixels) 20B.
  • Each of the colored pixels 20R, 20G, and 20B is formed above the light receiving element 42.
  • the green pixels 20G are formed in a checkered pattern, and the blue pixels 20B and the red pixels 20R are formed between the green pixels 20G.
  • the color filter 13 is composed of pixels of three colors, the colored pixels 20R, 20G, and 20B are displayed in a line.
  • the planarization film 14 is formed so as to cover the upper surface of the color filter 13 and planarizes the color filter surface.
  • the microlens 15 is a condensing lens arranged with the convex surface facing upward, and is provided above the planarizing film 14 (or a color filter when no planarizing film is provided) and above the light receiving element 42. Each microlens 15 efficiently guides light from the subject to each light receiving element 42.
  • the manufacturing method of the color filter which concerns on embodiment of this invention is demonstrated.
  • the first colored layer 11 is formed from the first colored curable composition (step (a)).
  • the first colored curable composition is the above-described colored curable composition.
  • the first colored layer 11 can be formed by applying a colored curable composition on a support by a coating method such as spin coating, slit coating or spray coating, and drying to form a colored layer.
  • a coating method such as spin coating, slit coating or spray coating, and drying to form a colored layer.
  • the thickness of the first colored layer 11 is preferably in the range of 0.3 to 1.0 ⁇ m, more preferably in the range of 0.35 to 0.8 ⁇ m, and more preferably in the range of 0.35 to 0.7 ⁇ m.
  • the first colored layer 11 is preferably heated and cured by a heating device such as a hot plate or an oven.
  • the heating temperature is preferably 120 to 250 ° C, and more preferably 160 to 230 ° C.
  • the heating time varies depending on the heating means, but is usually about 3 to 30 minutes when heated on a hot plate, and usually about 30 to 90 minutes when heated in an oven.
  • step (A) patterning is performed by dry etching so that a group of through holes is formed in the first colored layer 11 (step (A)).
  • a first colored pattern is formed.
  • a through-hole having a desired shape is formed as compared with the case where a first colored layer is formed from a colored radiation-sensitive composition and the first colored layer is exposed and developed to provide a group of through-holes.
  • a group can be provided more reliably. This is because, in a colored radiation-sensitive composition in which the content of the colorant with respect to the total solid content of the colored curable composition is 50% by mass or more, there is room for adding a component that contributes to developability to the composition. This is because reliable patterning becomes difficult due to the limitation.
  • the first coloring pattern may be a coloring pattern provided as the first color on the support, or depending on the case, for example, a coloring provided as a second color pattern or a pattern after the third color on the support having the existing pattern. It may be a pattern.
  • Dry etching can be performed on the first colored layer 11 using an etching gas with the patterned photoresist layer as a mask. For example, as shown in the schematic cross-sectional view of FIG. 3, first, a photoresist layer 51 is formed on the first colored layer 11.
  • a positive or negative radiation-sensitive composition is applied (preferably applied) on the colored layer and dried to form a photoresist layer.
  • a pre-bake treatment it is preferable to further perform a pre-bake treatment.
  • a positive type radiation sensitive composition As the photoresist, for example, a positive type radiation sensitive composition is used.
  • positive type radiation sensitive composition positive type photo sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays.
  • a positive resist composition suitable for resist can be used.
  • the radiation g-line, h-line and i-line are preferable, and i-line is particularly preferable.
  • a composition containing a quinonediazide compound and an alkali-soluble resin is preferable.
  • a positive radiation-sensitive composition containing a quinonediazide compound and an alkali-soluble resin indicates that a quinonediazide group is decomposed by irradiation with light having a wavelength of 500 nm or less to produce a carboxyl group, resulting in alkali-solubility from an alkali-insoluble state. It is what you use. Since this positive photoresist has remarkably excellent resolution, it is used for manufacturing integrated circuits such as ICs and LSIs.
  • the quinonediazide compound include a naphthoquinonediazide compound.
  • the thickness of the photoresist layer 51 is preferably 0.1 to 3 ⁇ m, more preferably 0.2 to 2.5 ⁇ m, and still more preferably 0.3 to 2 ⁇ m.
  • the application of the photoresist layer 51 can be suitably performed using the application method for the first colored layer 11 described above.
  • the photoresist layer 51 is exposed and developed to form a resist pattern (patterned photoresist layer) 52 provided with a resist through-hole group 51A.
  • the formation of the resist pattern 52 is not particularly limited, and can be performed by appropriately optimizing a conventionally known photolithography technique.
  • a resist pattern 52 as an etching mask used in the next etching is provided on the first colored layer 11.
  • the exposure of the photoresist layer 51 is performed by exposing the positive-type or negative-type radiation-sensitive composition with g-line, h-line, i-line, etc., preferably i-line, through a predetermined mask pattern. be able to. After the exposure, the photoresist is removed in accordance with a region where a colored pattern is to be formed by developing with a developer.
  • Any developer can be used as long as it dissolves the exposed portion of the positive resist and the uncured portion of the negative resist without affecting the first colored layer containing the colorant.
  • a combination of these organic solvents or an alkaline aqueous solution can be used.
  • an alkaline aqueous solution prepared by dissolving an alkaline compound so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 5% by mass is suitable.
  • alkaline compounds include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, Examples include pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene.
  • alkaline aqueous solution is used as a developing solution, generally a washing process is performed with water after development.
  • the through-hole group 120 has a first through-hole part group 121 and a second through-hole part group 122.
  • the through-hole group 120 is provided in a checkered pattern in the first colored layer 11. Therefore, the 1st coloring pattern 12 by which the through-hole group 120 is provided in the 1st coloring layer 11 has a some square-shaped 1st coloring pixel in checkered form.
  • the first colored layer 11 is dry etched using the resist pattern 52 as an etching mask.
  • Representative examples of dry etching include JP-A-59-126506, JP-A-59-46628, JP-A-58-9108, JP-A-58-2809, JP-A-57-148706, JP-A-61-41102, and the like. There is a method described in this publication.
  • Dry etching is preferably performed in the following manner from the viewpoint of forming a pattern cross section closer to a rectangle and reducing damage to the support.
  • a mixed gas of fluorine-based gas and oxygen gas (O 2 ) the first stage etching is performed up to a region (depth) where the support is not exposed, and after this first stage etching, nitrogen gas ( N 2 ) and oxygen gas (O 2 ), and a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • N 2 nitrogen gas
  • O 2 oxygen gas
  • a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • the form containing these is preferable.
  • a specific method of dry etching, and the first stage etching, the second stage etching, and the overetching will be described.
  • Dry etching is performed by obtaining etching conditions in advance by the following method.
  • (1) The etching rate (nm / min) in the first stage etching and the etching rate (nm / min) in the second stage etching are calculated respectively.
  • (2) The time for etching the desired thickness in the first stage etching and the time for etching the desired thickness in the second stage etching are respectively calculated.
  • (3) The first stage etching is performed according to the etching time calculated in (2) above.
  • the second stage etching is performed according to the etching time calculated in (2) above. Alternatively, the etching time may be determined by endpoint detection, and the second stage etching may be performed according to the determined etching time.
  • Overetching time is calculated with respect to the total time of (3) and (4) above, and overetching is performed.
  • the mixed gas used in the first stage etching step preferably contains a fluorine-based gas and an oxygen gas (O 2 ) from the viewpoint of processing the organic material that is the film to be etched into a rectangular shape.
  • the first stage etching process can avoid damage to the support body by etching to a region where the support body is not exposed.
  • the second etching step and the over-etching step are performed in the first etching step after etching to a region where the support is not exposed by the mixed gas of fluorine-based gas and oxygen gas. From the viewpoint of avoidance, it is preferable to perform the etching process using a mixed gas of nitrogen gas and oxygen gas.
  • the latter ratio in the total etching amount (the sum of the etching amount in the first-stage etching process and the etching amount in the second-stage etching process) is preferably in the range of more than 0% and not more than 50%. 10 to 20% is more preferable.
  • the etching amount refers to the remaining film thickness of the film to be etched.
  • the etching preferably includes an over-etching process.
  • the overetching process is preferably performed by setting an overetching ratio. Moreover, it is preferable to calculate the overetching ratio from the etching process time to be performed first.
  • the over-etching ratio can be arbitrarily set, but it is preferably 30% or less of the etching processing time in the etching process, and preferably 5 to 25% from the viewpoint of etching resistance of the photoresist and maintaining the rectangularity of the pattern to be etched. Is more preferable, and 10 to 15% is particularly preferable.
  • the resist pattern (that is, etching mask) 52 remaining after the etching is removed.
  • the removal of the resist pattern 52 includes a step of applying a stripping solution or a solvent to the resist pattern 52 so that the resist pattern 52 can be removed, and a step of removing the resist pattern 52 using cleaning water. Is preferred.
  • a stripping solution or solvent is applied on at least the resist pattern 52, and the paddle is stagnated for a predetermined time.
  • a step of developing can be mentioned. Although there is no restriction
  • Examples of the step of removing the resist pattern 52 using cleaning water include a step of removing the resist pattern 52 by spraying cleaning water onto the resist pattern 52 from a spray type or shower type spray nozzle. it can.
  • As the washing water pure water can be preferably used.
  • examples of the injection nozzle include an injection nozzle in which the entire support is included in the injection range, and an injection nozzle that is a movable injection nozzle and in which the movable range includes the entire support. When the spray nozzle is movable, the resist pattern 52 is more effectively moved by spraying the cleaning water by moving from the support center to the support end twice or more during the step of removing the resist pattern 52. Can be removed.
  • the stripping solution generally contains an organic solvent, but may further contain an inorganic solvent.
  • organic solvents include 1) hydrocarbon compounds, 2) halogenated hydrocarbon compounds, 3) alcohol compounds, 4) ether or acetal compounds, 5) ketones or aldehyde compounds, and 6) ester compounds.
  • the stripping solution preferably contains a nitrogen-containing compound, and more preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
  • the acyclic nitrogen-containing compound is preferably an acyclic nitrogen-containing compound having a hydroxyl group.
  • Specific examples include monoisopropanolamine, diisopropanolamine, triisopropanolamine, N-ethylethanolamine, N, N-dibutylethanolamine, N-butylethanolamine, monoethanolamine, diethanolamine, and triethanolamine.
  • they are monoethanolamine, diethanolamine, and triethanolamine, and more preferably monoethanolamine (H 2 NCH 2 CH 2 OH).
  • cyclic nitrogen-containing compounds include isoquinoline, imidazole, N-ethylmorpholine, ⁇ -caprolactam, quinoline, 1,3-dimethyl-2-imidazolidinone, ⁇ -picoline, ⁇ -picoline, ⁇ -picoline, 2- Preferred examples include pipecoline, 3-pipecoline, 4-pipecoline, piperazine, piperidine, pyrazine, pyridine, pyrrolidine, N-methyl-2-pyrrolidone, N-phenylmorpholine, 2,4-lutidine, and 2,6-lutidine.
  • NMP N-methyl-2-pyrrolidone
  • NMP N-methyl-2-pyrrolidone
  • the stripping solution preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
  • acyclic nitrogen-containing compound at least one selected from monoethanolamine, diethanolamine, and triethanolamine, and cyclic
  • the nitrogen-containing compound preferably includes at least one selected from N-methyl-2-pyrrolidone and N-ethylmorpholine, and more preferably includes monoethanolamine and N-methyl-2-pyrrolidone.
  • a deposit means an etching product deposited and deposited on the side wall of a colored layer.
  • the content of the non-cyclic nitrogen-containing compound is 9 parts by weight or more and 11 parts by weight or less with respect to 100 parts by weight of the stripping solution, and the content of the cyclic nitrogen-containing compound is 100 parts by weight of the stripping solution. On the other hand, what is 65 to 70 mass parts is desirable. Further, the stripping solution is preferably obtained by diluting a mixture of an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound with pure water.
  • the second colored radiation-sensitive composition is embedded in each through-hole in the first through-hole portion group 121 and the second through-hole portion group 122 to obtain a plurality of
  • the second colored radiation-sensitive composition is formed on the first colored layer (that is, the first colored pattern 12 in which the through-hole group 120 is formed in the first colored layer 11) so that the second colored pixel is formed.
  • the second colored radiation-sensitive layer 21 is laminated (step (c)). Thereby, the 2nd coloring pattern 22 which has a some 2nd coloring pixel in the through-hole group 120 of the 1st coloring layer 11 is formed.
  • the second colored pixel is a square pixel.
  • the second colored radiation sensitive layer 21 can be formed in the same manner as the method for forming the first colored layer 11 described above.
  • the thickness of the second colored radiation-sensitive layer 21 is preferably in the range of 0.3 to 1 ⁇ m, more preferably in the range of 0.35 to 0.8 ⁇ m, and more preferably in the range of 0.35 to 0.7 ⁇ m. preferable.
  • the second colored radiation-sensitive layer 21 is exposed and developed at a position 21A corresponding to the first through-hole portion group 121 provided in the first colored layer 11 of the second colored radiation-sensitive layer 21. Then, the plurality of second colored pixels 22R provided inside each through hole of the second through hole portion group 122 are removed (step (D)) (see the schematic sectional view of FIG. 8).
  • a third colored radiation-sensitive composition is embedded in each through hole in the second through hole portion group 122 to form a plurality of third colored pixels.
  • the third coloring radiation sensitive composition is used for the third coloring on the first coloring layer (that is, the first coloring pattern 12 in which the second coloring pattern 22 is formed in the first through-hole portion group 121).
  • the radiation sensitive layer 31 is formed (process (e)).
  • the third colored pattern 32 having a plurality of third colored pixels is formed in the second through-hole portion group 122 of the first colored layer 11.
  • the third colored pixel is a square pixel.
  • the third colored radiation-sensitive layer 31 can be formed in the same manner as the method for forming the first colored layer 11 described above.
  • the thickness of the third colored radiation-sensitive layer 31 here is preferably in the range of 0.3 to 1 ⁇ m, more preferably in the range of 0.35 to 0.8 ⁇ m, and more preferably in the range of 0.35 to 0.7 ⁇ m. preferable.
  • the third colored radiation-sensitive layer 31 is exposed and developed at a position 31A corresponding to the second through-hole portion group 122 provided in the first colored layer 11 of the third colored radiation-sensitive layer 31.
  • the colored layer 60 having the first colored pattern 12, the second colored pattern 22, and the third colored pattern 32 is manufactured (process (capacitor). )).
  • the color filter 100 in which the oxygen blocking film 61 is formed on the colored layer 60 by forming the oxygen blocking film 61 described above on the colored layer 60. can be manufactured.
  • the second colored radiation-sensitive composition and the third colored radiation-sensitive composition described above each contain a colorant.
  • the colorant those of the above-described colored curable composition can be mentioned in the same manner, but it is preferable that one of the second colored pixel and the third colored pixel is a red transmissive part and the other is a blue transmissive part. .
  • the colorant contained in the colored curable composition for forming the red transmission part is C.I. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, And C.I. I.
  • the colorant contained in the colored curable composition for forming the blue transmission part is C.I. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, and C.I. I. Pigment Blue 1, 2, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 66, 79, 80 or more It is preferable.
  • the content of the colorant composition with respect to the total solid content is preferably 30% by mass or more, and 35% by mass. More preferably, it is more preferably 40% by mass or more. Moreover, content with respect to the total solid of the composition of a coloring agent is 90 mass% or less normally, and it is preferable that it is 80 mass% or less.
  • a negative radiation sensitive composition is used for each of the second colored radiation sensitive composition and the third colored radiation sensitive composition.
  • this negative type radiation sensitive composition there is a negative type feeling sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays.
  • a radiation composition can be used.
  • g-line, h-line and i-line are preferable, and i-line is particularly preferable.
  • a composition containing a photopolymerization initiator, a polymerization component (polymerizable compound), a binder resin (alkali-soluble resin, etc.) is preferable. Examples described in paragraph Nos. [0017] to [0064] of JP-A-2005-326453.
  • Such a negative radiation sensitive composition utilizes the fact that the photopolymerization initiator initiates the polymerization reaction of the polymerizable compound upon irradiation with radiation, and as a result, the alkali soluble state becomes alkali insoluble. To do.
  • the exposure with respect to the 2nd colored radiation sensitive layer 21 and the 3rd colored radiation sensitive layer 31 can be performed by exposing with g line
  • the development performed after exposure is usually performed by developing with a developer. Examples of the developer include the same developers as those already described in the exposure and development of the photoresist layer 51. When an alkaline aqueous solution is used as a developer, a washing treatment with water is generally performed after development.
  • the length of one side of the first colored pixel, the second colored pixel, and the third colored pixel is From the viewpoint of image resolution, 0.5 to 1.7 ⁇ m is preferable, and 0.6 to 1.5 ⁇ m is more preferable.
  • a color filter having a high colorant concentration which is less likely to cause film surface roughness on the color layer surface even under high temperature and high humidity, is provided. be able to.
  • a 1st colored layer, especially a 1st colored pixel is formed with the colored curable composition with the high density
  • the thickness of the pixel can be extremely reduced (for example, 0.7 ⁇ m or less). Thereby, a color filter in which crosstalk (mixture of light) is suppressed can be manufactured.
  • the 1st colored pixel formed with the colored curable composition mentioned above becomes what was excellent in solvent resistance and alkali developing solution resistance. Therefore, it is possible to reduce the occurrence of overlap regions overlapping with colors in other colored layers and other colored patterns, and as a result, a high-performance color filter can be manufactured.
  • the color filter of the present invention can be suitably used for a liquid crystal display (LCD) or a solid-state imaging device (for example, CCD, CMOS, etc.). Moreover, it can use suitably also for image display devices, such as electronic paper and organic electroluminescence. In particular, the color filter of the present invention can be suitably used for a solid-state imaging device such as a CCD and a CMOS.
  • the color filter of the present invention is also suitable as a color filter for a liquid crystal display device.
  • a liquid crystal display device provided with such a color filter can display a high-quality image having a good display image color tone and excellent display characteristics.
  • display devices For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year).
  • the liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”.
  • the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
  • the color filter of the present invention is useful for a color TFT type liquid crystal display device.
  • the color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”.
  • the present invention is applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
  • the color filter of the present invention can also be used for a bright and high-definition COA (Color-filter On Array) system.
  • COA Color-filter On Array
  • the colored layer formed by the COA method has a rectangular shape with a side length of about 1 to 15 ⁇ m in order to connect the ITO electrode arranged on the colored layer and the terminal of the driving substrate below the colored layer. It is necessary to form a conduction path such as a through hole or a U-shaped depression, and the dimension of the conduction path (that is, the length of one side) is particularly preferably 5 ⁇ m or less, but by using the present invention, It is also possible to form a conduction path of 5 ⁇ m or less.
  • the liquid crystal display device of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film in addition to the color filter of the present invention.
  • the color filter of the present invention can be applied to a liquid crystal display element composed of these known members.
  • these materials for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima, CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
  • backlights SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Takaaki Yagi), etc. Are listed.
  • the color filter of the present invention When the color filter of the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, but further, red, green and blue LED light sources (RGB-LED).
  • RGB-LED red, green and blue LED light sources
  • ⁇ Preparation of pigment dispersion> The mixed liquid containing the following compound was mixed for 3 hours using a zirconia bead having a diameter of 0.3 mm in a bead mill (high pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.)). Dispersed to prepare a pigment dispersion.
  • the types of pigments are those described in the following table, and the blending amounts of the respective components are blended so that the composition ratio in the finally obtained colored curable composition is the ratio described in the following table.
  • Halogenated phthalocyanine dye B
  • Non-halogenated phthalocyanine dye E
  • Yellow dye A (azo dye (pigment)): P.I. Y150 Yellow pigment B (methine pigment (azomethine pigment) (dye)): (Synthesis examples will be described later.)
  • a is 2.0
  • b is 4.0
  • acid value is 10 mgKOH / g
  • Mw20000 is 10 mgKOH / g
  • Thermosetting compound B Melamine compound: Nicalac MW-30M (manufactured by Sanwa Chemical Co., Ltd.)
  • Methine dye B was synthesized according to the following scheme.
  • Example 1 to 3 and Comparative Example 2 the produced glass substrate was sputtered with SiO 2 or SiN using a sputtering apparatus (SRV-4300 manufactured by Shinko Seiki Co., Ltd.) to form an oxygen blocking film with a thickness of 0.1 ⁇ m. Formed on the colored layer. Further, in Example 4 and Example 5, the produced glass substrate was subjected to an aqueous solution of polyvinyl alcohol (weight average molecular weight: 2000) or polyvinyl pyrrolidone (weight average molecular weight: 1800) using a spin coater (1H-D7 manufactured by Mikasa).
  • SRV-4300 manufactured by Shinko Seiki Co., Ltd.
  • a colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition.
  • the laminates Examples 1 to 10 in which the oxygen blocking film was formed on the colored layer had suppressed film surface roughness.
  • Examples 1 to 10 were found to have excellent spectral characteristics and good light resistance.
  • the laminate Comparative Example 1 in which the oxygen barrier film was not formed did not have a good film surface roughness.

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Abstract

A laminate provided with a colored layer which has a high colorant concentration and the surface of which is not susceptible to roughening even under high-temperature and high-humidity conditions; a color filter and a process for producing the same; and application of a color filter. This laminate comprises a colored layer and an oxygen barrier film formed thereon, wherein the colored layer is a layer obtained by curing a curable colored composition which comprises a colorant, a thermosetting compound and a solvent and in which the total content of the colorant is 50 to 90 mass% relative to the total amount of the solid constituents of the curable colored composition.

Description

積層体およびこれを有するカラーフィルタ、その製造方法および、カラーフィルタの応用LAMINATE, COLOR FILTER HAVING THE SAME, ITS MANUFACTURING METHOD, AND APPLICATION OF COLOR FILTER
 本発明は、積層体、カラーフィルタ、カラーフィルタの製造方法、液晶表示装置、有機エレクトロルミネッセンス素子および固体撮像素子に関する。 The present invention relates to a laminate, a color filter, a method for manufacturing a color filter, a liquid crystal display device, an organic electroluminescence element, and a solid-state imaging element.
 カラーフィルタは、固体撮像素子や液晶表示装置のディスプレイに不可欠な構成部品である。このようなカラーフィルタを形成するために、着色硬化性組成物が採用されている(例えば、特許文献1、2を参照)。
 一方、カラーフィルタにおいても、薄膜化が求められている。
The color filter is an indispensable component for a display of a solid-state image sensor or a liquid crystal display device. In order to form such a color filter, a colored curable composition is employed (see, for example, Patent Documents 1 and 2).
On the other hand, the color filter is also required to be thin.
特開2011-248197号公報JP 2011-248197 A 特開2009-251563号公報JP 2009-251563 A
 カラーフィルタを薄膜化しても優れた分光特性を有するカラーレジストを作製するためには、着色層中の着色剤の濃度を高くすることが考えられる。しかしながら、本発明者が検討したところ、着色剤の濃度を高くすると、形成される着色層を高温高湿下においた際に、着色層表面における膜面荒れが発生しやすいことが分かった。膜面荒れが発生してしまうと、デバイス感度および色再現性の低下を引き起こしてしまう。
 本発明の課題は、上記問題点を解決することであって、着色剤の濃度が高い着色層であって、高温高湿下においても、着色層表面における膜面荒れが起こりにくいカラーフィルタを提供することを目的とする。
In order to produce a color resist having excellent spectral characteristics even if the color filter is made thin, it is conceivable to increase the concentration of the colorant in the colored layer. However, as a result of studies by the present inventors, it has been found that when the concentration of the colorant is increased, film surface roughness on the surface of the colored layer tends to occur when the formed colored layer is placed under high temperature and high humidity. When film surface roughness occurs, device sensitivity and color reproducibility are reduced.
An object of the present invention is to provide a color filter that solves the above-described problems and is a colored layer having a high concentration of colorant, and is less likely to cause film surface roughness on the surface of the colored layer even under high temperature and high humidity. The purpose is to do.
 かかる状況のもと本発明者が鋭意検討を行った結果、着色層上に酸素遮断膜を形成することにより、着色剤の濃度が高くても高温高湿下で着色層表面における膜面荒れを抑制できることを見出し、本発明を完成させるに至った。
 具体的には、以下の解決手段<1>により、好ましくは、<2>~<13>により、上記課題は解決された。
<1>着色剤、熱硬化性化合物および溶剤を含む着色硬化性組成物であって、前記着色剤の含有量の合計が前記着色硬化性組成物の全固形分に対し50~90質量%である着色硬化性組成物を硬化してなる着色層上に酸素遮断膜が形成された積層体。
<2>前記着色剤が、下記一般式(1)で表されるハロゲン化フタロシアニン染料を含む、<1>に記載の積層体。
一般式(1)
Figure JPOXMLDOC01-appb-C000002
(一般式(1)中、Z1~Z16は、それぞれ、水素原子または置換基であり、置換基の少なくとも1つは、ハロゲン原子であり、置換基の他の少なくとも1つは、芳香族基を含む基である。Mは2つの水素原子、金属原子、金属酸化物または金属ハロゲン化物を表す。)
<3>前記熱硬化性化合物がエポキシ化合物である、<1>または<2>に記載の積層体。
<4>前記着色剤が、さらに黄色色素を含む、<1>~<3>のいずれかに記載の積層体。
<5>前記着色剤の含有量の合計が前記着色硬化性組成物の全固形分に対し60~90質量%である、<1>~<4>のいずれかに記載の積層体。
<6>前記着色層の厚さが0.1~1.0μmである、<1>~<5>のいずれかに記載の積層体。
<7>前記酸素遮断膜と前記着色層とが隣接している、<1>~<6>のいずれかに記載の積層体。
<8>前記酸素遮断膜の厚さが10μm以下である、<1>~<7>のいずれかに記載の積層体。
<9>前記酸素遮断膜が無機材料を含む、<1>~<8>のいずれかに記載の積層体。
<10><1>~<9>のいずれかに記載の積層体を有するカラーフィルタ。
<11>着色剤、熱硬化性化合物および溶剤を含む着色硬化性組成物であって、前記着色剤の含有量の合計が前記着色硬化性組成物の全固形分に対し50~90質量%である着色硬化性組成物を硬化して着色層を形成する工程、前記着色層上にフォトレジスト層を形成する工程、露光および現像することにより前記フォトレジスト層をパターニングしてレジストパターンを得る工程および前記レジストパターンをエッチングマスクとして前記着色層をドライエッチングする工程、前記ドライエッチング後の着色層上に酸素遮断膜を形成する工程を含む、カラーフィルタの製造方法。
<12>前記酸素遮断膜を、スパッタリングにより形成する、<11>に記載のカラーフィルタの製造方法。
<13><10>に記載のカラーフィルタ、または、<11>または<12>に記載のカラーフィルタの製造方法により作製されたカラーフィルタを有する液晶表示装置、有機エレクトロルミネッセンス素子または固体撮像素子。
As a result of intensive studies by the present inventors under such circumstances, by forming an oxygen-blocking film on the colored layer, even if the concentration of the colorant is high, the film surface roughness on the colored layer surface can be reduced under high temperature and high humidity. The inventors have found that it can be suppressed, and have completed the present invention.
Specifically, the above problem has been solved by the following means <1>, preferably <2> to <13>.
<1> A colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition. A laminate in which an oxygen barrier film is formed on a colored layer formed by curing a certain colored curable composition.
<2> The laminate according to <1>, wherein the colorant includes a halogenated phthalocyanine dye represented by the following general formula (1).
General formula (1)
Figure JPOXMLDOC01-appb-C000002
(In the general formula (1), Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one of the other substituents is aromatic. (M represents a hydrogen atom, a metal atom, a metal oxide, or a metal halide.)
<3> The laminate according to <1> or <2>, wherein the thermosetting compound is an epoxy compound.
<4> The laminate according to any one of <1> to <3>, wherein the colorant further contains a yellow pigment.
<5> The laminate according to any one of <1> to <4>, wherein the total content of the colorant is 60 to 90% by mass with respect to the total solid content of the colored curable composition.
<6> The laminate according to any one of <1> to <5>, wherein the colored layer has a thickness of 0.1 to 1.0 μm.
<7> The laminate according to any one of <1> to <6>, wherein the oxygen blocking film and the colored layer are adjacent to each other.
<8> The laminate according to any one of <1> to <7>, wherein the oxygen blocking film has a thickness of 10 μm or less.
<9> The laminate according to any one of <1> to <8>, wherein the oxygen barrier film includes an inorganic material.
<10> A color filter having the laminate according to any one of <1> to <9>.
<11> A colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition. A step of curing a colored curable composition to form a colored layer, a step of forming a photoresist layer on the colored layer, a step of patterning the photoresist layer by exposure and development to obtain a resist pattern, and A method for producing a color filter, comprising: a step of dry etching the colored layer using the resist pattern as an etching mask; and a step of forming an oxygen blocking film on the colored layer after the dry etching.
<12> The method for producing a color filter according to <11>, wherein the oxygen blocking film is formed by sputtering.
<13> A liquid crystal display device, an organic electroluminescence element, or a solid-state imaging device having the color filter according to <10> or the color filter produced by the method for producing a color filter according to <11> or <12>.
 本発明によれば、着色剤の濃度が高い着色層であって、高温高湿下においても、着色層表面における膜面荒れが起こりにくいカラーフィルタを提供することができる。 According to the present invention, it is possible to provide a color filter that is a colored layer having a high colorant concentration and is less likely to cause film surface roughness on the colored layer surface even under high temperature and high humidity.
カラーフィルタおよび固体撮像素子の構成例を示す概略断面図である。It is a schematic sectional drawing which shows the structural example of a color filter and a solid-state image sensor. 第1着色層の概略断面図である。It is a schematic sectional drawing of a 1st colored layer. 第1着色層の上にフォトレジスト層が形成された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state in which the photoresist layer was formed on the 1st colored layer. 第1着色層の上にレジストパターンが形成された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state in which the resist pattern was formed on the 1st colored layer. エッチングによって第1着色層に貫通孔群が設けられることにより、第1着色パターンが形成された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state in which the 1st colored pattern was formed by providing a through-hole group in the 1st colored layer by etching. 図5におけるレジストパターンが除去された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state from which the resist pattern in FIG. 5 was removed. 第2着色パターンおよび第2着色感放射線性層が形成された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state in which the 2nd coloring pattern and the 2nd coloring radiation sensitive layer were formed. 図7における第2着色感放射線性層と、第2着色パターンを構成する第2着色画素の一部とが、除去された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state from which the 2nd coloring radiation sensitive layer in FIG. 7 and a part of 2nd coloring pixel which comprises a 2nd coloring pattern were removed. 第3着色パターンおよび第3着色感放射線性層が形成された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state in which the 3rd coloring pattern and the 3rd coloring radiation sensitive layer were formed. 図9における第3着色感放射線性層が除去された状態を示す概略断面図である。It is a schematic sectional drawing which shows the state from which the 3rd coloring radiation sensitive layer in FIG. 9 was removed. 本発明のカラーフィルタの一例を示す概略断面図である。It is a schematic sectional drawing which shows an example of the color filter of this invention.
 以下において、本発明の内容について詳細に説明する。尚、本明細書において「~」とはその前後に記載される数値を下限値および上限値として含む意味で使用される。
 尚、本明細書における基(原子団)の表記において、置換および無置換を記していない表記は置換基を有さないものと共に置換基を有するものをも包含するものである。例えば「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
 また、本明細書中において、“(メタ)アクリレート”はアクリレートおよびメタクリレートを表し、“(メタ)アクリル”はアクリルおよびメタクリルを表し、“(メタ)アクリロイル”はアクリロイルおよびメタクリロイルを表す。
 本発明でいう「着色層」は、カラーフィルタに用いられる画素を意味する。
 本発明における染料とは、特定の有機溶剤に可溶する色素化合物を意味する。ここで、特定の有機溶剤とは、例えば、後述する染料および熱硬化性化合物を少なくとも溶解する溶剤の欄で例示する有機溶剤が挙げられる。従って、これらの少なくとも1種の有機溶剤に溶解する色素化合物は本発明における染料に該当する。
Hereinafter, the contents of the present invention will be described in detail. In this specification, “to” is used to mean that the numerical values described before and after it are included as a lower limit value and an upper limit value.
In addition, in the description of group (atomic group) in this specification, the description which is not describing substitution and non-substitution includes what does not have a substituent and what has a substituent. For example, the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, “(meth) acrylate” represents acrylate and methacrylate, “(meth) acryl” represents acryl and methacryl, and “(meth) acryloyl” represents acryloyl and methacryloyl.
The “colored layer” in the present invention means a pixel used for a color filter.
The dye in the present invention means a coloring compound that is soluble in a specific organic solvent. Here, the specific organic solvent includes, for example, organic solvents exemplified in the column of a solvent that dissolves at least a dye and a thermosetting compound described later. Therefore, the coloring compound which dissolves in at least one organic solvent corresponds to the dye in the present invention.
 以下、本発明の積層体、カラーフィルタおよびその製造方法、固体撮像素子、液晶表示装置ならびに有機エレクトロルミネッセンス素子について詳述する。以下に記載する構成要件の説明は、本発明の代表的な実施態様に基づいてなされることがあるが、本発明はそのような実施態様に限定されるものではない。 Hereinafter, the laminate, the color filter and the manufacturing method thereof, the solid-state imaging device, the liquid crystal display device, and the organic electroluminescence device of the present invention will be described in detail. The description of the constituent elements described below may be made based on typical embodiments of the present invention, but the present invention is not limited to such embodiments.
[積層体]
 本発明の積層体は、着色硬化性組成物を硬化してなる着色層上に酸素遮断膜が形成されたものである。
[Laminate]
In the laminate of the present invention, an oxygen barrier film is formed on a colored layer obtained by curing a colored curable composition.
<着色硬化性組成物>
 本発明で用いられる着色硬化性組成物は、着色剤、熱硬化性化合物および溶剤を含む着色硬化性組成物であって、着色剤の含有量の合計が着色硬化性組成物の全固形分に対し50~90質量%である。
<Colored curable composition>
The colored curable composition used in the present invention is a colored curable composition containing a colorant, a thermosetting compound, and a solvent, and the total content of the colorant is the total solid content of the colored curable composition. The content is 50 to 90% by mass.
<着色剤>
 着色剤としては、特に制限されず、例えば、染料や顔料を含む色素を用いることができ、特に、染料を必須としていることが好ましい。本発明では、着色剤の合計量が、着色硬化性組成物の全固形分に対し60~85質量%であることが好ましく、70~80質量%であることがより好ましい。
(染料)
 染料は、特に制限はなく、従来カラーフィルタ用として公知の染料が使用できる。例えば、ピラゾールアゾ系、アニリノアゾ系、トリフェニルメタン系、アントラキノン系、アンスラピリドン系、ベンジリデン系、オキソノール系、ピラゾロトリアゾールアゾ系、ピリドンアゾ系、シアニン系、フェノチアジン系、ピロロピラゾールアゾメチン系、キサテン系、フタロシアニン系、ベンゾピラン系、インジゴ系、ピロメテン系、メチン系等の染料が使用できる。また、これらの染料の多量体を用いてもよい。
 また、水又はアルカリ現像を行う場合、現像により光未照射部のバインダー及び/又は染料を完全に除去するという観点では、酸性染料及び/又はその誘導体が好適に使用できる場合がある。
 その他、直接染料、塩基性染料、媒染染料、酸性媒染染料、アゾイック染料、分散染料、油溶染料、食品染料、及び/又は、これらの誘導体等も有用に使用することができる。
 また、染料としては、例えば、特開2012-181512号公報、特開昭64-90403号公報、特開昭64-91102号公報、特開平1-94301号公報、特開平6-11614号公報、特許第2592207号公報、特開平5-333207号公報、特開平6-35183号公報、特開平6-51115号公報、特開平6-194828号公報、特開平8-211599号公報、特開平4-249549号公報、特開平10-123316号公報、特開平11-302283号公報、特開平7-286107号公報、特開2001-4823号公報、特開平8-15522号公報、特開平8-29771号公報、特開平8-146215号公報、特開平11-343437号公報、特開平8-62416号公報、特開2002-14220号公報、特開2002-14221号公報、特開2002-14222号公報、特開2002-14223号公報、特開平8-302224号公報、特開平8-73758号公報、特開平8-179120号公報、特開平8-151531号公報等に記載の色素を用いることができる。
<Colorant>
The colorant is not particularly limited, and for example, a coloring matter including a dye or a pigment can be used, and it is particularly preferable that the dye is essential. In the present invention, the total amount of the colorant is preferably 60 to 85% by mass and more preferably 70 to 80% by mass with respect to the total solid content of the colored curable composition.
(dye)
There is no restriction | limiting in particular in dye, A well-known dye can be used for color filters conventionally. For example, pyrazole azo, anilinoazo, triphenylmethane, anthraquinone, anthrapyridone, benzylidene, oxonol, pyrazolotriazole azo, pyridone azo, cyanine, phenothiazine, pyrrolopyrazole azomethine, xanthene, Phthalocyanine-based, benzopyran-based, indigo-based, pyromethene-based and methine-based dyes can be used. Moreover, you may use the multimer of these dyes.
Moreover, when performing water or alkali image development, an acidic dye and / or its derivative may be used suitably from a viewpoint that the binder and / or dye of a light non-irradiation part are removed completely by image development.
In addition, direct dyes, basic dyes, mordant dyes, acid mordant dyes, azoic dyes, disperse dyes, oil-soluble dyes, food dyes, and / or derivatives thereof can also be used effectively.
Examples of the dye include, for example, JP 2012-181512 A, JP 64-90403 A, JP 64-91102 A, JP 1-94301 A, JP 6-11614 A, Japanese Patent No. 2592207, Japanese Patent Application Laid-Open No. 5-333207, Japanese Patent Application Laid-Open No. 6-35183, Japanese Patent Application Laid-Open No. 6-51115, Japanese Patent Application Laid-Open No. 6-194828, Japanese Patent Application Laid-Open No. No. 249549, JP-A-10-123316, JP-A-11-302283, JP-A-7-286107, JP-A-2001-4823, JP-A-8-15522, JP-A-8-29771. JP-A-8-146215, JP-A-11-343437, JP-A-8-62416, JP2002-2002 No. 4220, JP-A No. 2002-14221, JP-A No. 2002-14222, JP-A No. 2002-14223, JP-A No. 8-302224, JP-A No. 8-73758, JP-A No. 8-179120 The dyes described in JP-A-8-151531 and the like can be used.
 これらの染料の中でも、フタロシアニン構造を有するフタロシアニン染料、特に、ハロゲン化フタロシアニン染料が特に好ましい。ハロゲン化フタロシアニン染料は、フタロシアニン骨格を有し、かつ、その置換基としてハロゲン原子を1つ以上含む化合物をいう。本発明では、ハロゲン原子を1分子中に5~15つ有することが好ましく、6~14つ有することがより好ましい。ハロゲン原子としては、塩素原子、フッ素原子、臭素原子、ヨウ素原子等が例示され、塩素原子、フッ素原子または臭素原子が好ましく、塩素原子またはフッ素原子がより好ましく、塩素原子がさらに好ましい。
 本発明で用いられるハロゲン化フタロシアニン染料は、通常、極大吸収波長を600~800nmの領域に有し、好ましくは極大吸収波長を630~750nmの領域に有する化合物である。
Among these dyes, phthalocyanine dyes having a phthalocyanine structure, particularly halogenated phthalocyanine dyes are particularly preferable. The halogenated phthalocyanine dye refers to a compound having a phthalocyanine skeleton and having one or more halogen atoms as a substituent. In the present invention, 5 to 15 halogen atoms per molecule are preferable, and 6 to 14 halogen atoms are more preferable. Examples of the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom. A chlorine atom, a fluorine atom, or a bromine atom is preferable, a chlorine atom or a fluorine atom is more preferable, and a chlorine atom is further preferable.
The halogenated phthalocyanine dye used in the present invention is usually a compound having a maximum absorption wavelength in the region of 600 to 800 nm, and preferably having a maximum absorption wavelength in the region of 630 to 750 nm.
 本発明で用いるハロゲン化フタロシアニン染料は、下記一般式(1)で表される化合物が好ましい。
一般式(1)
Figure JPOXMLDOC01-appb-C000003
(一般式(1)中、Z1~Z16は、それぞれ、水素原子または置換基であり、置換基の少なくとも1つは、ハロゲン原子であり、置換基の他の少なくとも1つは、芳香族基を含む基である。Mは2つの水素原子、金属原子、金属酸化物または金属ハロゲン化物を表す。)
The halogenated phthalocyanine dye used in the present invention is preferably a compound represented by the following general formula (1).
General formula (1)
Figure JPOXMLDOC01-appb-C000003
(In the general formula (1), Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one of the other substituents is aromatic. (M represents a hydrogen atom, a metal atom, a metal oxide, or a metal halide.)
 ここで、一般式(1)における、Z1、Z4、Z5、Z8、Z9、Z12、Z13およびZ16は、フタロシアニン核の8箇所のα位に置換する置換基を表すため、これらの置換基をα位の置換基とも称する。また、同様に、一般式(1)における、Z2、Z3、Z6、Z7、Z10、Z11、Z14およびZ15は、フタロシアニン核の8箇所のβ位に置換する置換基を表すため、これらの置換基をβ位の置換基とも称する。
 Z1~Z16は、それぞれ、水素原子または置換基であり、置換基の少なくとも1つは、ハロゲン原子であり、置換基の他の少なくとも1つは、芳香族基を含む基である。ハロゲン原子を1分子中に5~15つ有することが好ましく、6~14つ有することがより好ましい。ハロゲン原子としては、塩素原子、フッ素原子、臭素原子、ヨウ素原子等が例示され、塩素原子、フッ素原子または臭素原子が好ましく、塩素原子またはフッ素原子がより好ましく、塩素原子がさらに好ましい。芳香族基を含む基(好ましくは、後述する一般式(1-2)で表される基)中の芳香族基は、ベンゼン環基またはナフタレン環基が好ましく、ベンゼン環基がより好ましい。芳香族基を有する基の数は、1分子中、1~11つであることが好ましく、1~10つであることがより好ましく、2~7つであることがさらに好ましい。また、Z1~Z16は、ハロゲン原子以外の置換基がすべて、芳香族基を有する基である態様も好ましい。
 置換基としては、フタロシアニン化合物が染料としての機能を失わない限り特に定めるものではないが、後述する置換基Tが例示される。
Here, in the general formula (1), Z 1 , Z 4 , Z 5 , Z 8 , Z 9 , Z 12 , Z 13 and Z 16 represent substituents substituted at eight α positions of the phthalocyanine nucleus. Therefore, these substituents are also referred to as α-position substituents. Similarly, Z 2 , Z 3 , Z 6 , Z 7 , Z 10 , Z 11 , Z 14 and Z 15 in the general formula (1) are substituents substituted at eight β-positions of the phthalocyanine nucleus. These substituents are also referred to as β-position substituents.
Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one other of the substituents is a group containing an aromatic group. It is preferable to have 5 to 15 halogen atoms in one molecule, and more preferable to have 6 to 14 halogen atoms. Examples of the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, and an iodine atom. A chlorine atom, a fluorine atom, or a bromine atom is preferable, a chlorine atom or a fluorine atom is more preferable, and a chlorine atom is further preferable. The aromatic group in the group containing an aromatic group (preferably a group represented by the general formula (1-2) described later) is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. The number of groups having an aromatic group is preferably 1 to 11, more preferably 1 to 10, and further preferably 2 to 7 in one molecule. Also preferred is an embodiment in which Z 1 to Z 16 are all groups other than halogen atoms having an aromatic group.
The substituent is not particularly defined as long as the phthalocyanine compound does not lose its function as a dye, and examples thereof include substituent T described later.
 一般式(1)において、Z1~Z16のうち、1~8つは、下記一般式(1-2)で表される基または一般式(1-4)で表される基を表し、かつ、少なくとも1つは一般式(1-2)で表される基であることが好ましく、より好ましくは、Z1~Z16のうち、2~6つが一般式(1-2)で表される基または一般式(1-4)で表される基であり、かつ、少なくとも1つは一般式(1-2)で表される基である。
一般式(1-2)
Figure JPOXMLDOC01-appb-C000004
(一般式(1-2)中、Xは酸素原子または硫黄原子であり、A1は、置換基を有していてもよいフェニル基、または、置換基を有していてもよいナフチル基である。)
一般式(1-4)
Figure JPOXMLDOC01-appb-C000005
(一般式(1-4)中、R'は炭素数1~3のアルキレン基を表し、R”は炭素数1~8のアルキル基を表す。n1は0~4の整数を表す。)
In the general formula (1), 1 to 8 of Z 1 to Z 16 represent a group represented by the following general formula (1-2) or a group represented by the general formula (1-4), And at least one is preferably a group represented by the general formula (1-2), more preferably 2 to 6 of Z 1 to Z 16 are represented by the general formula (1-2). Or a group represented by the general formula (1-4), and at least one is a group represented by the general formula (1-2).
Formula (1-2)
Figure JPOXMLDOC01-appb-C000004
(In the general formula (1-2), X is an oxygen atom or a sulfur atom, and A 1 is a phenyl group which may have a substituent, or a naphthyl group which may have a substituent. is there.)
General formula (1-4)
Figure JPOXMLDOC01-appb-C000005
(In the general formula (1-4), R ′ represents an alkylene group having 1 to 3 carbon atoms, R ″ represents an alkyl group having 1 to 8 carbon atoms, and n1 represents an integer of 0 to 4)
 一般式(1-2)中、Xは、酸素原子または硫黄原子であり、酸素原子が好ましい。Xが酸素原子であると、得られるフタロシアニン化合物の最大吸収波長を短波長側にシフトできる。
 A1は、置換基を有していてもよいフェニル基、または、置換基を有していてもよいナフチル基であり、1~5つの置換基を有するフェニル基または1~7つの置換基を有するナフチル基が好ましく、1~5つの置換基を有するフェニル基がより好ましい。
In general formula (1-2), X represents an oxygen atom or a sulfur atom, and preferably an oxygen atom. When X is an oxygen atom, the maximum absorption wavelength of the obtained phthalocyanine compound can be shifted to the short wavelength side.
A 1 is a phenyl group which may have a substituent or a naphthyl group which may have a substituent, and is a phenyl group having 1 to 5 substituents or 1 to 7 substituents. And a phenyl group having 1 to 5 substituents is more preferable.
 一般式(1-2)で表される基は、下記一般式(1-1-2)で表される基であることがより好ましい。
一般式(1-1-2)
Figure JPOXMLDOC01-appb-C000006
(一般式(1-1-2)中、X1は、酸素原子または硫黄原子であり、A11は、1~5つの置換基Rを有するフェニル基、または1~7つの置換基Rを有するナフチル基であり、置換基Rは、ニトロ基、COOR1(R1は一般式(1-3)で表される基または炭素数1~8のアルキル基である)、OR2(R2は炭素数1~8のアルキル基)、ハロゲン原子、アリール基、シアノ基、炭素数1~8のアルキル基、一般式(4)~(6)のいずれかで表される基、または、一般式(X)から選択される基を表す。)
Figure JPOXMLDOC01-appb-C000007
(一般式(4)中、R4は水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいジアリールアミノ基、または置換基を有してもよいアルキルアリールアミノ基を表す。
 一般式(5)中、dは、0~2の整数を表し、dが0または1のとき、R5は、置換基を有してもよいアルキル基、または置換基を有してもよいアリール基であり、dが2のとき、R5は、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいジアリールアミノ基、または置換基を有してもよいアルキルアリールアミノ基を表す。
 一般式(6)中、R6およびR7は、それぞれ、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルキルカルボニル基、置換基を有してもよいアリールカルボニル基、置換基を有してもよいアルキルスルホニル基、置換基を有してもよいアリールスルホニル基を表す。)
Figure JPOXMLDOC01-appb-C000008
(一般式(X)中、R11は、水素原子または炭素数1~8のアルキル基を表す。n1は1~3の整数を表す。n1が2または3の場合、複数のR11は、ぞれぞれ、同じでも異なっても良い。Y1は-O-、-S-、-NR13-(R13は、水素原子または炭素数1~4のアルキル基を表す。)、-SO2-、または、-C(=O)-を表す。R12は、1価の置換基を表す。)
The group represented by the general formula (1-2) is more preferably a group represented by the following general formula (1-1-2).
Formula (1-1-2)
Figure JPOXMLDOC01-appb-C000006
(In the general formula (1-1-2), X 1 is an oxygen atom or a sulfur atom, and A 11 has a phenyl group having 1 to 5 substituents R, or 1 to 7 substituents R. The substituent R is a nitro group, COOR 1 (R 1 is a group represented by the general formula (1-3) or an alkyl group having 1 to 8 carbon atoms), OR 2 (R 2 is a naphthyl group) An alkyl group having 1 to 8 carbon atoms), a halogen atom, an aryl group, a cyano group, an alkyl group having 1 to 8 carbon atoms, a group represented by any one of the general formulas (4) to (6), or a general formula Represents a group selected from (X).)
Figure JPOXMLDOC01-appb-C000007
(In the general formula (4), R 4 is a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, or a substituent. Represents a diarylamino group which may have a substituent or an alkylarylamino group which may have a substituent.
In the general formula (5), d represents an integer of 0 to 2, and when d is 0 or 1, R 5 may have an alkyl group which may have a substituent, or may have a substituent. When d is 2, R 5 is an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, a substituted group; It represents a diarylamino group which may have a group, or an alkylarylamino group which may have a substituent.
In general formula (6), R 6 and R 7 are each an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, The arylcarbonyl group which may have a substituent, the alkylsulfonyl group which may have a substituent, and the arylsulfonyl group which may have a substituent are represented. )
Figure JPOXMLDOC01-appb-C000008
(In the general formula (X), R 11 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms. N1 represents an integer of 1 to 3. When n1 is 2 or 3, a plurality of R 11 are Y 1 is —O—, —S—, —NR 13 — (R 13 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms), —SO 2 represents — or —C (═O) —, and R 12 represents a monovalent substituent.
 一般式(1-1-2)中、X1は、酸素原子または硫黄原子であり、酸素原子が好ましい。X1が酸素原子であると、得られるフタロシアニン化合物の最大吸収波長を短波長側にシフトできる。
 A11は、1~5つの置換基を有するフェニル基または1~7つの置換基を有するナフチル基であり、1~5つの置換基を有するフェニル基がより好ましい。
In general formula (1-1-2), X 1 represents an oxygen atom or a sulfur atom, preferably an oxygen atom. When X 1 is an oxygen atom, the maximum absorption wavelength of the obtained phthalocyanine compound can be shifted to the short wavelength side.
A 11 is a phenyl group having 1 to 5 substituents or a naphthyl group having 1 to 7 substituents, and more preferably a phenyl group having 1 to 5 substituents.
 フェニル基の置換基数は、1~5の整数であるが、グラム吸光係数(グラム当たりの吸光度)の観点から、より好ましくは1~3の整数を示し、置換基がハロゲン原子の場合には、置換基数は、1~5の整数のいずれも好ましい。ナフチル基の置換基数は、1~7の整数であるが、グラム吸光係数の観点から、1~5の整数であることが好ましく、1~3の整数であることがより好ましく、1または2であることがさらに好ましい。 The number of substituents of the phenyl group is an integer of 1 to 5, but from the viewpoint of the gram extinction coefficient (absorbance per gram), an integer of 1 to 3 is more preferable. When the substituent is a halogen atom, The number of substituents is preferably any integer of 1 to 5. The number of substituents of the naphthyl group is an integer of 1 to 7, but is preferably an integer of 1 to 5, more preferably an integer of 1 to 3, from the viewpoint of the gram extinction coefficient. More preferably it is.
 ナフチル基とX1との結合位置は、特に限定されず、下記1位(1-ナフチル基)または2位(2-ナフチル基)のいずれであってもよい。
Figure JPOXMLDOC01-appb-C000009
 同様にして、置換基のナフタレン環への結合位置もまた、特に制限されない。例えば、ナフチル基とX1との結合位置が1位(1-ナフチル基)である場合には、置換基のナフタレン環への結合位置は、2位、3位、4位、5位、6位、7位または8位のいずれでもよいが、耐熱性や溶剤溶解性などを考慮すると、好ましくは2位、3位であり、2位がより好ましい。また、ナフチル基とX1との結合位置が2位(2-ナフチル基)である場合には、置換基のナフタレン環への結合位置は、1位、3位、4位、5位、6位、7位または8位のいずれでもよいが、3位、6位が好ましく、耐熱性や溶剤溶解性などを考慮すると、3位がより好ましい。
The bonding position between the naphthyl group and X 1 is not particularly limited, and may be any of the following 1-position (1-naphthyl group) or 2-position (2-naphthyl group).
Figure JPOXMLDOC01-appb-C000009
Similarly, the bonding position of the substituent to the naphthalene ring is not particularly limited. For example, when the bonding position between the naphthyl group and X 1 is the 1-position (1-naphthyl group), the bonding positions of the substituent to the naphthalene ring are the 2-position, 3-position, 4-position, 5-position, 6-position, However, in view of heat resistance, solvent solubility, etc., the 2nd and 3rd positions are preferable, and the 2nd position is more preferable. When the bonding position between the naphthyl group and X 1 is the 2-position (2-naphthyl group), the bonding positions of the substituent to the naphthalene ring are the 1-position, 3-position, 4-position, 5-position, 6-position, However, the 3rd and 6th positions are preferable, and the 3rd position is more preferable in consideration of heat resistance and solvent solubility.
 フェニル基またはナフチル基の置換基Rは、ニトロ基、COOR1(R1は一般式(1-3)で表される基または炭素数1~8のアルキル基である)、OR2(R2は炭素数1~8のアルキル基)、ハロゲン原子、アリール基、シアノ基、炭素数1~8のアルキル基、一般式(4)~(6)のいずれかで表される基、または、一般式(X)から選択される基である。 The substituent R of the phenyl group or naphthyl group is a nitro group, COOR 1 (R 1 is a group represented by the general formula (1-3) or an alkyl group having 1 to 8 carbon atoms), OR 2 (R 2 Is an alkyl group having 1 to 8 carbon atoms), a halogen atom, an aryl group, a cyano group, an alkyl group having 1 to 8 carbon atoms, a group represented by any one of the general formulas (4) to (6), or It is a group selected from the formula (X).
 フェニル基またはナフチル基に置換基Rが複数存在する場合、複数のRは、同一であっても異なるものであってもよい。 When a plurality of substituents R are present in the phenyl group or naphthyl group, the plurality of Rs may be the same or different.
 フェニル基またはナフチル基の置換基RがCOOR1の場合、COOR1におけるR1は、置換されていてもよい炭素数1~8のアルキル基、または下記一般式(1-3)で表される基を表す。
一般式(1-3)
Figure JPOXMLDOC01-appb-C000010
(一般式(1-3)中、R3は、炭素数1~3のアルキレン基を表し、R4は炭素数1~8のアルキル基を表し、nは、1~4の整数を表す。)
When the substituent R of the phenyl or naphthyl group is COOR 1, R 1 in the COOR 1 is represented by an alkyl group substituted by 1 carbon atoms which may be 1-8 or the following general formula, (1-3) Represents a group.
General formula (1-3)
Figure JPOXMLDOC01-appb-C000010
(In the general formula (1-3), R 3 represents an alkylene group having 1 to 3 carbon atoms, R 4 represents an alkyl group having 1 to 8 carbon atoms, and n represents an integer of 1 to 4). )
 R1が炭素数1~8のアルキル基の場合、炭素数1~8のアルキル基は、溶剤溶解性の点から、好ましくは炭素数1~3のアルキル基である。炭素数1~8のアルキル基としては、メチル基、エチル基、n-プロピル基、iso-プロピル基、n-ブチル基、iso-ブチル基、sec-ブチル基、t-ブチル基、n-ペンチル基、n-ヘキシル基、シクロヘキシル基、n-ヘプチル基、n-オクチル基、2-エチルヘキシル基等の直鎖、分岐または環状のアルキル基が挙げられる。場合によっては炭素数1~8のアルキル基に存在する置換基としては、炭素数1~8のアルキルオキシ基、ハロゲン原子またはアリール基が例示される。
 場合によっては存在する、アルキル基の置換基である炭素数1~8のアルキルオキシ基としては、メトキシ基、エトキシ基、n-プロピルオキシ基、iso-プロピルオキシ基、n-ブチルオキシ基、iso-ブチルオキシ基、sec-ブチルオキシ基、t-ブチルオキシ基、n-ペンチルオキシ基、n-ヘキシルオキシ基、シクロヘキシルオキシ基、n-ヘプチルオキシ基、n-オクチルオキシ基、2-エチルヘキシルオキシ基などの直鎖、分岐または環状のアルキルオキシ基が挙げられる。これらの中でも、炭素数1~4のアルキルオキシ基が好ましい。場合によっては存在する、アルキル基の置換基であるハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子が挙げられる。これらの中でも、フッ素原子または塩素原子が好ましい。場合によっては存在する、アルキル基の置換基であるアリール基としては、フェニル基、p-メトキシフェニル基、p-t-ブチルフェニル基、p-クロロフェニル基などが挙げられる。これらの中でも、フェニル基が好ましい。これらの置換基は複数個存在していても良く、複数個存在する場合には同種もしくは異種のいずれであっても良く、同種の場合においても同一もしくは異なっていても良い。アルキル基の置換基の数は特に限定されるものではないが、1~3個であることが好ましく、1または2個であることがより好ましい。
When R 1 is an alkyl group having 1 to 8 carbon atoms, the alkyl group having 1 to 8 carbon atoms is preferably an alkyl group having 1 to 3 carbon atoms from the viewpoint of solvent solubility. Examples of the alkyl group having 1 to 8 carbon atoms include methyl group, ethyl group, n-propyl group, iso-propyl group, n-butyl group, iso-butyl group, sec-butyl group, t-butyl group, and n-pentyl. A linear, branched or cyclic alkyl group such as a group, n-hexyl group, cyclohexyl group, n-heptyl group, n-octyl group and 2-ethylhexyl group. Examples of the substituent present in the alkyl group having 1 to 8 carbon atoms include an alkyloxy group having 1 to 8 carbon atoms, a halogen atom or an aryl group.
As the alkyloxy group having 1 to 8 carbon atoms, which may be present as a substituent of the alkyl group, there are methoxy group, ethoxy group, n-propyloxy group, iso-propyloxy group, n-butyloxy group, iso- Straight chain such as butyloxy group, sec-butyloxy group, t-butyloxy group, n-pentyloxy group, n-hexyloxy group, cyclohexyloxy group, n-heptyloxy group, n-octyloxy group, 2-ethylhexyloxy group A branched or cyclic alkyloxy group. Among these, an alkyloxy group having 1 to 4 carbon atoms is preferable. Examples of the halogen atom that is a substituent of the alkyl group that may be present include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Among these, a fluorine atom or a chlorine atom is preferable. Examples of the aryl group that is a substituent of the alkyl group that may be present include a phenyl group, a p-methoxyphenyl group, a pt-butylphenyl group, and a p-chlorophenyl group. Among these, a phenyl group is preferable. A plurality of these substituents may be present. If there are a plurality of these substituents, they may be the same or different, and even if they are the same, they may be the same or different. The number of substituents on the alkyl group is not particularly limited, but is preferably 1 to 3, more preferably 1 or 2.
 フェニル基またはナフチル基の置換基RがCOOR1であり、R1が一般式(1-3)で表される基の場合、一般式(1-3)で表される基におけるR3は、エーテル溶剤溶解性への効果の点から炭素数1~3のアルキレン基である。
 炭素数1~3のアルキレン基としては、メチレン基、エチレン基、n-プロピレン基、iso-プロピレン基が挙げられる。好ましくは、エチレン基、プロピレン基である。
 また、一般式(1-3)で表される基におけるR4は、分子量の観点から1~8のアルキル基であり、より好ましくは1~4のアルキル基である。炭素数1~8のアルキル基としては、上記R1の欄で記載されたものが挙げられる。一般式(1-3)で表される基におけるnは、分子量の観点から、1~4の整数であり、1~3の整数であることが好ましい。
When the substituent R of the phenyl group or naphthyl group is COOR 1 and R 1 is a group represented by the general formula (1-3), R 3 in the group represented by the general formula (1-3) is From the viewpoint of the effect on ether solvent solubility, it is an alkylene group having 1 to 3 carbon atoms.
Examples of the alkylene group having 1 to 3 carbon atoms include a methylene group, an ethylene group, an n-propylene group, and an iso-propylene group. Preferably, they are an ethylene group and a propylene group.
R 4 in the group represented by the general formula (1-3) is an alkyl group of 1 to 8, more preferably an alkyl group of 1 to 4, from the viewpoint of molecular weight. Examples of the alkyl group having 1 to 8 carbon atoms include those described in the above R 1 column. N in the group represented by the general formula (1-3) is an integer of 1 to 4, and preferably an integer of 1 to 3, from the viewpoint of molecular weight.
 フェニル基またはナフチル基の置換基RがOR2の場合、OR2におけるR2は、炭素数1~8のアルキル基、好ましくは色素の結晶性、取扱性の良さの点から、炭素数1~3のアルキル基を示す。
 R2で表される炭素数1~8のアルキル基としては、上記置換基Rの一例である、COOR1のR1において、記載したものと同様の置換基が挙げられ、好ましい範囲も同義である。
When the substituent R of the phenyl or naphthyl group is OR 2, R 2 in OR 2 represents an alkyl group having 1 to 8 carbon atoms, preferably crystalline dye, from the viewpoint of handling of the good, a C1- 3 alkyl groups are shown.
Examples of the alkyl group having 1 to 8 carbon atoms represented by R 2 include the same substituents as those described for R 1 of COOR 1 , which is an example of the above-described substituent R, and the preferred range is also synonymous. is there.
 フェニル基またはナフチル基の置換基Rがハロゲン原子の場合、ハロゲン原子としては、フッ素原子、塩素原子、臭素原子およびヨウ素原子が挙げられ、フッ素原子、塩素原子またはヨウ素原子であることが好ましい。中でも、色素の分子量が小さくなり、グラム吸光係数が高くなるため、塩素原子、フッ素原子が好ましい。 When the substituent R of the phenyl group or naphthyl group is a halogen atom, examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom, and a fluorine atom, a chlorine atom or an iodine atom is preferable. Among them, a chlorine atom and a fluorine atom are preferable because the molecular weight of the dye is reduced and the gram absorption coefficient is increased.
 フェニル基またはナフチル基の置換基Rがアリール基の場合、アリール基としては、フェニル基、p-メトキシフェニル基、p-t-ブチルフェニル基、p-クロロフェニル基、等のアリール基が挙げられる。中でも、色素の分子量が小さくなり、グラム吸光係数が高くなるため、フェニル基が好ましい。 When the substituent R of the phenyl group or naphthyl group is an aryl group, examples of the aryl group include aryl groups such as a phenyl group, a p-methoxyphenyl group, a pt-butylphenyl group, and a p-chlorophenyl group. Among them, a phenyl group is preferable because the molecular weight of the dye is reduced and the gram extinction coefficient is increased.
 フェニル基またはナフチル基の置換基Rがアルキル基の場合、炭素数1~8のアルキル基としては、上記置換基Rの一例である、COOR1のR1において、記載したものと同様の置換基が挙げられ、好ましい範囲も同義である。
 好ましくは、色素の結晶性、取扱性の良さの点から、炭素数1~3のアルキル基である。
 場合によっては存在する、アルキル基の置換基としては、ハロゲン原子が例示され、フッ素原子、塩素原子、臭素原子およびヨウ素原子が好ましく、フッ素原子または塩素原子がより好ましい。アルキル基の置換基であるハロゲン原子は複数個存在していても良く、複数個存在する場合には同一もしくは異なっていても良い。アルキル基の置換基の数は特に限定されるものではないが、1~3個であることが好ましい。
In the case where the substituent R of the phenyl group or naphthyl group is an alkyl group, the alkyl group having 1 to 8 carbon atoms is the same as that described in R 1 of COOR 1 as an example of the substituent R. The preferable range is also synonymous.
An alkyl group having 1 to 3 carbon atoms is preferable from the viewpoint of the crystallinity and handleability of the dye.
As the substituent of the alkyl group which may be present in some cases, a halogen atom is exemplified, and a fluorine atom, a chlorine atom, a bromine atom and an iodine atom are preferable, and a fluorine atom or a chlorine atom is more preferable. There may be a plurality of halogen atoms as substituents for the alkyl group, and when there are a plurality of halogen atoms, they may be the same or different. The number of substituents on the alkyl group is not particularly limited, but is preferably 1 to 3.
 フェニル基またはナフチル基の置換基Rが下記一般式(4)~(6)から選択される基である場合について説明する。 The case where the substituent R of the phenyl group or naphthyl group is a group selected from the following general formulas (4) to (6) will be described.
 一般式(4)中のR4は水素原子、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいジアリールアミノ基、または置換基を有してもよいアルキルアリールアミノ基を表し、水素原子、総炭素数1~20のアルキル基、総炭素数6~20のアリール基、総炭素数2~20のジアルキルアミノ基、総炭素数12~20のジアリールアミノ基、または、総炭素数7~20アルキルアリールアミノ基が好ましく、総炭素数1~20のアルキル基、総炭素数2~20のジアルキルアミノ基、総炭素数12~20のジアリールアミノ基、または総炭素数7~20アルキルアリールアミノ基がさらに好ましく、総炭素数12~20のジアリールアミノ基または総炭素数2~20のジアルキルアミノ基が特に好ましい。
 上記アルキル部位およびアリール部位はさらに置換基を有しても良く、置換基としては、アルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。
R 4 in the general formula (4) represents a hydrogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, a dialkylamino group which may have a substituent, or a substituent. A diarylamino group which may have, or an alkylarylamino group which may have a substituent, a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 20 carbon atoms, a total carbon atom A dialkylamino group having 2 to 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms in total, or an alkylarylamino group having 7 to 20 carbon atoms is preferable, an alkyl group having 1 to 20 carbon atoms in total, and 2 to 2 carbon atoms in total. More preferred is a dialkylamino group having 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms, and a diarylamino group having 12 to 20 carbon atoms or a total carbon number. Dialkylamino groups to 20 are particularly preferred.
The alkyl moiety and the aryl moiety may further have a substituent, and the substituent is preferably an alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, an arylthio group or a halogen atom, and an alkoxy group Are more preferable, and a methoxy group or an ethoxy group is more preferable. Moreover, the aspect which does not have a substituent is also preferable.
 一般式(5)中、dは0~2の整数を表し、dが0または1のとき、R5は、置換基を有してもよいアルキル基、または置換基を有してもよいアリール基であり、dが2のとき、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいジアルキルアミノ基、置換基を有してもよいジアリールアミノ基、または置換基を有してもよいアルキルアリールアミノ基を表す。R5は、dが2のとき、炭素数2~20のジアルキルアミノ基、炭素数12~20のジアリールアミノ基、炭素数7~20アルキルアリールアミノ基が好ましい。
 上記アルキル部位およびアリール部位はさらに置換基を有しても良く、その置換基は、後述する置換基Tが例示され、アルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。
In the general formula (5), d represents an integer of 0 to 2, and when d is 0 or 1, R 5 is an alkyl group that may have a substituent or an aryl that may have a substituent. And when d is 2, the alkyl group which may have a substituent, the aryl group which may have a substituent, the dialkylamino group which may have a substituent, and the substituent Or a diarylamino group which may be substituted or an alkylarylamino group which may have a substituent. R 5 is preferably a dialkylamino group having 2 to 20 carbon atoms, a diarylamino group having 12 to 20 carbon atoms, or an alkylarylamino group having 7 to 20 carbon atoms when d is 2.
The alkyl moiety and the aryl moiety may further have a substituent, and examples of the substituent include a substituent T described later. An alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, and an arylthio group. Or a halogen atom etc. are preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further more preferable. Moreover, the aspect which does not have a substituent is also preferable.
 一般式(6)中、R6およびR7は、それぞれ、置換基を有してもよいアルキル基、置換基を有してもよいアリール基、置換基を有してもよいアルキルカルボニル基、置換基を有してもよいアリールカルボニル基、置換基を有してもよいアルキルスルホニル基、置換基を有してもよいアリールスルホニル基を表し、炭素数1~20のアルキル基、炭素数6~20のアリール基、炭素数2~20のアルキルカルボニル基、炭素数7~20のアリールカルボニル基、炭素数1~20のアルキルスルホニル基、炭素数6~20のアリールスルホニル基が好ましく、炭素数2~20のアルキルカルボニル基、炭素数7~20のアリールカルボニル基、炭素数1~20のアルキルスルホニル基、炭素数6~20のアリールスルホニル基がより好ましい。
 上記アルキル部位およびアリール部位はさらに置換基を有しても良く、その置換基は、後述する置換基Tが例示され、アルコキシ基、アリール基、アリールオキシ基、アルコキシカルボニル基、アルキルチオ基、アリールチオ基またはハロゲン原子等が好ましく、アルコキシ基がより好ましく、メトキシ基またはエトキシ基がさらに好ましい。また、置換基を有していない態様も好ましい。置換基を有していてもよいアルキル基等の例は、後述する。
In general formula (6), R 6 and R 7 are each an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkylcarbonyl group which may have a substituent, An arylcarbonyl group which may have a substituent, an alkylsulfonyl group which may have a substituent, an arylsulfonyl group which may have a substituent, an alkyl group having 1 to 20 carbon atoms, a carbon number of 6 An aryl group having ˜20, an alkylcarbonyl group having 2 to 20 carbon atoms, an arylcarbonyl group having 7 to 20 carbon atoms, an alkylsulfonyl group having 1 to 20 carbon atoms, and an arylsulfonyl group having 6 to 20 carbon atoms are preferable. An alkylcarbonyl group having 2 to 20 carbon atoms, an arylcarbonyl group having 7 to 20 carbon atoms, an alkylsulfonyl group having 1 to 20 carbon atoms, and an arylsulfonyl group having 6 to 20 carbon atoms are more preferable.
The alkyl moiety and the aryl moiety may further have a substituent, and examples of the substituent include a substituent T described later. An alkoxy group, an aryl group, an aryloxy group, an alkoxycarbonyl group, an alkylthio group, and an arylthio group. Or a halogen atom etc. are preferable, an alkoxy group is more preferable, and a methoxy group or an ethoxy group is further more preferable. Moreover, the aspect which does not have a substituent is also preferable. Examples of the alkyl group and the like which may have a substituent will be described later.
 上記一般式中の、置換基を有しても良いアルキル基の好適な例を示す。置換基を有してもよいアルキル基としては、メチル基、エチル基、プロピル基、イソプロピル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、2-エチルヘキシル基、ドデシル基、ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、1-ノルボルニル基、1-アダマンチル基、フェノキシエチル基、ベンジル基、フェニルエチル基、N-ブチルアミノスルホニルプロピル基、N-ブチルアミノカルボニルメチル基、N,N-ジブチルアミノスルホニルプロピル基、エトキシエトキシエチル基、2-クロロエチル基が挙げられ、さらに好ましくはメチル基、エチル基、プロピル基、イソプロピル基、tert-ブチル基、フェノキシエチル基、ベンジル基、フェニルエチル基、N-ブチルアミノスルホニルプロピル基、N-ブチルアミノカルボニルメチル基、N,N-ジブチルアミノスルホニルプロピル基、エトキシエトキシエチル基が挙げられ、特に好ましくはメチル基、エチル基、プロピル基、tert-ブチル基、フェノキシエチル基、ベンジル基、フェニルエチル基、N-ブチルアミノスルホニルプロピル基、N-ブチルアミノカルボニルメチル基、N,N-ジブチルアミノスルホニルプロピル基、エトキシエトキシエチル基が挙げられる。 Preferred examples of the alkyl group that may have a substituent in the above general formula are shown below. Examples of the alkyl group which may have a substituent include a methyl group, an ethyl group, a propyl group, an isopropyl group, a tert-butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a 2-ethylhexyl group, a dodecyl group, Hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group, phenoxyethyl group, benzyl group, phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group, ethoxyethoxyethyl group, 2-chloroethyl group can be mentioned, more preferably methyl group, ethyl group, propyl group, isopropyl group, tert-butyl group, phenoxyethyl group, benzyl group, Phenylethyl group, N-butyl Examples thereof include aminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group, and ethoxyethoxyethyl group. Particularly preferred are methyl group, ethyl group, propyl group, tert-butyl group, phenoxyethyl. Group, benzyl group, phenylethyl group, N-butylaminosulfonylpropyl group, N-butylaminocarbonylmethyl group, N, N-dibutylaminosulfonylpropyl group and ethoxyethoxyethyl group.
 上記一般式(4)~(6)中の、置換基を有しても良いアリール基の好適な例を示す。この様なアリール基としては、フェニル基、2-クロロフェニル基、2-メトキシフェニル基、4-ブトキシカルボニルフェニル基、4-N,N-ジブチルアミノカルボニルフェニル基、4-N-ブチルアミノスルホニルフェニル基、4-N,N-ジブチルアミノスルホニルフェニル基が挙げられ、さらに好ましくはフェニル基、4-ブトキシカルボニルフェニル基、4-N,N-ジブチルアミノカルボニルフェニル基、4-N-ブチルアミノスルホニルフェニル基、4-N,N-ジブチルアミノスルホニルフェニル基が挙げられ、特に好ましくはフェニル基、4-ブトキシカルボニルフェニル基、4-N,N-ジブチルアミノカルボニルフェニル基、4-N,N-ジブチルアミノスルホニルフェニル基が挙げられる。 Preferred examples of the aryl group which may have a substituent in the general formulas (4) to (6) are shown below. Such aryl groups include phenyl, 2-chlorophenyl, 2-methoxyphenyl, 4-butoxycarbonylphenyl, 4-N, N-dibutylaminocarbonylphenyl, 4-N-butylaminosulfonylphenyl 4-N, N-dibutylaminosulfonylphenyl group, more preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N-butylaminosulfonylphenyl group. 4-N, N-dibutylaminosulfonylphenyl group, particularly preferably phenyl group, 4-butoxycarbonylphenyl group, 4-N, N-dibutylaminocarbonylphenyl group, 4-N, N-dibutylaminosulfonyl group. A phenyl group is mentioned.
 上記一般式(4)~(6)中の、置換基を有しても良いジアルキルアミノ基の好適な例を示す。この様なジアルキルアミノ基としては、N,N-ジメチルアミノ基、N,N-ジブチルアミノ基、N,N-ジ(2-エチルヘキシル)アミノ基、N-メチル-N-ベンジルアミノ基、N,N-ジ(2-エトキシエチル)アミノ基、N.N-ジ(2-ヒドロキシエチル)アミノ基が挙げられる。 Preferred examples of the dialkylamino group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such a dialkylamino group include N, N-dimethylamino group, N, N-dibutylamino group, N, N-di (2-ethylhexyl) amino group, N-methyl-N-benzylamino group, N, N-di (2-ethoxyethyl) amino group, N.I. N-di (2-hydroxyethyl) amino group may be mentioned.
 上記一般式(4)~(6)中の、置換基を有しても良いジアリールアミノ基の好適な例を示す。この様なジアリールアミノ基としては、N,N-ジフェニルアミノ基、N,N-ジ(4-メトキシフェニル)アミノ基、N,N-ジ(4-アシルフェニル)アミノ基が挙げられる。 Preferred examples of the diarylamino group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such a diarylamino group include an N, N-diphenylamino group, an N, N-di (4-methoxyphenyl) amino group, and an N, N-di (4-acylphenyl) amino group.
 上記一般式(4)~(6)中の、置換基を有しても良いアルキルアリールアミノ基の好適な例を示す。この様なアルキルアリールアミノ基としては、N-メチルーN-フェニルアミノ基、N-ベンジル-N-フェニルアミノ基、N-メチル-N-(4-メトキシフェニル)アミノ基が挙げられる。 Preferred examples of the alkylarylamino group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such an alkylarylamino group include an N-methyl-N-phenylamino group, an N-benzyl-N-phenylamino group, and an N-methyl-N- (4-methoxyphenyl) amino group.
 上記一般式(4)~(6)中の、置換基を有しても良いアルキルカルボニル基の好適な例を示す。この様なアルキルカルボニル基としては、アセチル基、プロピルカルボニル基、ヘプチル-3-カルボニル基、2-エチルヘキシルオキシメチルカルボニル基、フェノキシメチルカルボニル基、2-エチルヘキシルオキシカルボニルメチルカルボニル基が挙げられる。 Preferred examples of the alkylcarbonyl group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such an alkylcarbonyl group include an acetyl group, a propylcarbonyl group, a heptyl-3-carbonyl group, a 2-ethylhexyloxymethylcarbonyl group, a phenoxymethylcarbonyl group, and a 2-ethylhexyloxycarbonylmethylcarbonyl group.
 上記一般式(4)~(6)中の、置換基を有しても良いアリールカルボニル基の好適な例を示す。この様なアリールカルボニル基としては、ベンゾイル基、4-メトキシベンゾイル基、4-エトキシカルボニルベンゾイル基、が挙げられる。 Preferred examples of the arylcarbonyl group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such arylcarbonyl groups include benzoyl group, 4-methoxybenzoyl group, and 4-ethoxycarbonylbenzoyl group.
 上記一般式(4)~(6)中の、置換基を有しても良いアルキルスルホニル基の好適な例を示す。この様なアルキルスルホニル基としては、メタンスルホニル基、オクタンスルホニル基、ドデシルスルホニル基、ベンジルスルホニル基、フェノキシプロピルスルホニル基が挙げられる。 Preferred examples of the alkylsulfonyl group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such an alkylsulfonyl group include a methanesulfonyl group, an octanesulfonyl group, a dodecylsulfonyl group, a benzylsulfonyl group, and a phenoxypropylsulfonyl group.
 上記一般式(4)~(6)中の、置換基を有しても良いアリールスルホニル基の好適な例を示す。この様なアリールスルホニル基としては、フェニルスルホニル基、2-メトキシフェニルスルホニル基、4-エトキシカルボニルフェニルスルホニル基、が挙げられる。 Preferred examples of the arylsulfonyl group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such an arylsulfonyl group include a phenylsulfonyl group, a 2-methoxyphenylsulfonyl group, and a 4-ethoxycarbonylphenylsulfonyl group.
 上記一般式(4)~(6)中の、置換基を有しても良いアルキルスルホニルアミノ基の好適な例を示す。この様なアルキルスルホニルアミノ基としては、メチルスルホニルアミノ基、ブチルスルホニルアミノ基、ヒドロキシプロピルスルホニルアミノ基、2-エチルヘキシルスルホニルアミノ基、n-オクチルスルホニルアミノ基、フェノキシエチルスルホニルアミノ基、アリルスルホニルアミノ基が挙げられる。 Preferred examples of the alkylsulfonylamino group which may have a substituent in the general formulas (4) to (6) are shown below. Examples of such an alkylsulfonylamino group include a methylsulfonylamino group, a butylsulfonylamino group, a hydroxypropylsulfonylamino group, a 2-ethylhexylsulfonylamino group, an n-octylsulfonylamino group, a phenoxyethylsulfonylamino group, and an allylsulfonylamino group. Is mentioned.
 上記一般式(4)~(6)中の、置換基を有してもよいビニルスルホニルアミノ基としては、ビニルスルホニルアミノ基、1-メチルビニルスルホニルアミノ基が挙げられる。 In the general formulas (4) to (6), examples of the vinylsulfonylamino group which may have a substituent include a vinylsulfonylamino group and a 1-methylvinylsulfonylamino group.
 上記一般式(4)~(6)中の、置換基を有しても良いアリールスルホニルアミノ基としては、フェニルスルホニルアミノ基、p-メトキシフェニルスルホニルアミノ基、p-エトキシカルボニルスルホニルアミノ基、等が挙げられる。 In the general formulas (4) to (6), the arylsulfonylamino group which may have a substituent includes a phenylsulfonylamino group, a p-methoxyphenylsulfonylamino group, a p-ethoxycarbonylsulfonylamino group, and the like. Is mentioned.
 上記一般式(4)~(6)中の、置換基を有しても良いアルキルカルボニルアミノ基としては、メチルカルボニルアミノ基、2-エチルヘキサノイルアミノ基、n-ヘプチルカルボニルアミノ基、エトキシエトキシメチルカルボニルアミノ基等が挙げられる。 In the above general formulas (4) to (6), the alkylcarbonylamino group which may have a substituent is a methylcarbonylamino group, a 2-ethylhexanoylamino group, an n-heptylcarbonylamino group, an ethoxyethoxy group. Examples include a methylcarbonylamino group.
 上記一般式(4)~(6)中の、置換基を有しても良いアリールカルボニルアミノ基としては、ベンゾイルアミノ基、2-メトキシベンゾイルアミノ基、4-ビニルベンゾイルアミノ基等が挙げられる。 In the general formulas (4) to (6), examples of the arylcarbonylamino group which may have a substituent include a benzoylamino group, a 2-methoxybenzoylamino group, and a 4-vinylbenzoylamino group.
 以下に、置換基Tの例を示す。
 アルキル基(好ましくは炭素数1~24の、直鎖、分岐鎖、または環状のアルキル基で、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、tert-ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、2-エチルヘキシル基、ドデシル基、ヘキサデシル基、シクロプロピル基、シクロペンチル基、シクロヘキシル基、1-ノルボルニル基、1-アダマンチル基)、アルケニル基(好ましくは炭素数2~18のアルケニル基で、例えば、ビニル基、アリル基、3-ブテン-1-イル基)、アリール基(好ましくは炭素数6~24のアリール基で、例えば、フェニル基、ナフチル基)、ヘテロ環基(好ましくは炭素数1~18のヘテロ環基で、例えば、2-チエニル基、4-ピリジル基、2-フリル基、2-ピリミジニル基、1-ピリジル基、2-ベンゾチアゾリル基、1-イミダゾリル基、1-ピラゾリル基、ベンゾトリアゾール-1-イル基)、シリル基(好ましくは炭素数3~18のシリル基で、例えば、トリメチルシリル基、トリエチルシリル基、トリブチルシリル基、tert-ブチルジメチルシリル基、tert-ヘキシルジメチルシリル基)、ヒドロキシル基、シアノ基、ニトロ基、アルコキシ基(好ましくは炭素数1~24のアルコキシ基で、例えば、メトキシ基、エトキシ基、1-ブトキシ基、2-ブトキシ基、イソプロポキシ基、tert-ブトキシ基、ドデシルオキシ基、また、シクロアルキルオキシ基であれば、例えば、シクロペンチルオキシ基、シクロヘキシルオキシ基)、アリールオキシ基(好ましくは炭素数6~24のアリールオキシ基で、例えば、フェノキシ基、1-ナフトキシ基)、ヘテロ環オキシ基(好ましくは炭素数1~18のヘテロ環オキシ基で、例えば、1-フェニルテトラゾール-5-オキシ基、2-テトラヒドロピラニルオキシ基)、シリルオキシ基(好ましくは炭素数1~18のシリルオキシ基で、例えば、トリメチルシリルオキシ基、tert-ブチルジメチルシリルオキシ基、ジフェニルメチルシリルオキシ基)、アシルオキシ基(好ましくは炭素数2~24のアシルオキシ基で、例えば、アセトキシ基、ピバロイルオキシ基、ベンゾイルオキシ基、ドデカノイルオキシ基)、アルコキシカルボニルオキシ基(好ましくは炭素数2~24のアルコキシカルボニルオキシ基で、例えば、エトキシカルボニルオキシ基、tert-ブトキシカルボニルオキシ基、また、シクロアルキルオキシカルボニルオキシ基であれば、例えば、シクロヘキシルオキシカルボニルオキシ基)、アリールオキシカルボニルオキシ基(好ましくは炭素数7~24のアリールオキシカルボニルオキシ基で、例えば、フェノキシカルボニルオキシ基)、カルバモイルオキシ基(この好ましくは炭素数1~24のカルバモイルオキシ基で、例えば、N,N-ジメチルカルバモイルオキシ基、N-ブチルカルバモイルオキシ基、N-フェニルカルバモイルオキシ基、N-エチル-N-フェニルカルバモイルオキシ基)、スルファモイルオキシ基(好ましくは炭素数1~24のスルファモイルオキシ基で、例えば、N,N-ジエチルスルファモイルオキシ基、N-プロピルスルファモイルオキシ基)、アルキルスルホニルオキシ基(好ましくは炭素数1~24のアルキルスルホニルオキシ基で、例えば、メチルスルホニルオキシ基、ヘキサデシルスルホニルオキシ基、シクロヘキシルスルホニルオキシ基)、アリールスルホニルオキシ基(好ましくは炭素数6~24のアリールスルホニルオキシ基で、例えば、フェニルスルホニルオキシ基)、アシル基(好ましくは炭素数1~24のアシル基で、例えば、ホルミル基、アセチル基、ピバロイル基、ベンゾイル基、テトラデカノイル基、シクロヘキサノイル基)、アルコキシカルボニル基(好ましくは炭素数2~24のアルコキシカルボニル基で、例えば、メトキシカルボニル基、エトキシカルボニル基、オクタデシルオキシカルボニル基、シクロヘキシルオキシカルボニル基、2,6-ジ-tert-ブチル-4-メチルシクロヘキシルオキシカルボニル基)、アリールオキシカルボニル基(好ましくは炭素数7~24のアリールオキシカルボニル基で、例えば、フェノキシカルボニル基)、カルバモイル基(好ましくは炭素数1~24のカルバモイル基で、例えば、カルバモイル基、N,N-ジエチルカルバモイル基、N-エチル-N-オクチルカルバモイル基、N,N-ジブチルカルバモイル基、N-プロピルカルバモイル基、N-フェニルカルバモイル基、N-メチルN-フェニルカルバモイル基、N,N-ジシクロへキシルカルバモイル基)、アミノ基(好ましくは炭素数24以下のアミノ基で、例えば、アミノ基、メチルアミノ基、N,N-ジブチルアミノ基、テトラデシルアミノ基、2-エチルへキシルアミノ基、シクロヘキシルアミノ基)、アニリノ基(好ましくは6~24のアニリノ基で、例えば、アニリノ基、N-メチルアニリノ基)、ヘテロ環アミノ基(好ましくは1~18のヘテロ環アミノ基で、例えば、4-ピリジルアミノ基)、カルボンアミド基(好ましくは2~24のカルボンアミド基で、例えば、アセトアミド基、ベンズアミド基、テトラデカンアミド基、ピバロイルアミド基、シクロヘキサンアミド基)、ウレイド基(好ましくは炭素数1~24のウレイド基で、例えば、ウレイド基、N,N-ジメチルウレイド基、N-フェニルウレイド基)、イミド基(好ましくは炭素数24以下のイミド基で、例えば、N-スクシンイミド基、N-フタルイミド基)、アルコキシカルボニルアミノ基(好ましくは炭素数2~24のアルコキシカルボニルアミノ基で、例えば、メトキシカルボニルアミノ基、エトキシカルボニルアミノ基、tert-ブトキシカルボニルアミノ基、オクタデシルオキシカルボニルアミノ基、シクロヘキシルオキシカルボニルアミノ基)、アリールオキシカルボニルアミノ基(好ましくは炭素数7~24のアリールオキシカルボニルアミノ基で、例えば、フェノキシカルボニルアミノ基)、スルホンアミド基(好ましくは炭素数1~24のスルホンアミド基で、例えば、メタンスルホンアミド基、ブタンスルホンアミド基、ベンゼンスルホンアミド基、ヘキサデカンスルホンアミド基、シクロヘキサンスルホンアミド基)、スルファモイルアミノ基(好ましくは炭素数1~24のスルファモイルアミノ基で、例えば、N、N-ジプロピルスルファモイルアミノ基、N-エチル-N-ドデシルスルファモイルアミノ基)、アゾ基(好ましくは炭素数1~24のアゾ基で、例えば、フェニルアゾ基、3-ピラゾリルアゾ基)、アルキルチオ基(好ましくは炭素数1~24のアルキルチオ基で、例えば、メチルチオ基、エチルチオ基、オクチルチオ基、シクロヘキシルチオ基)、アリールチオ基(好ましくは炭素数6~24のアリールチオ基で、例えば、フェニルチオ基)、ヘテロ環チオ基(好ましくは炭素数1~18のヘテロ環チオ基で、例えば、2-ベンゾチアゾリルチオ基、2-ピリジルチオ基、1-フェニルテトラゾリルチオ基)、アルキルスルフィニル基(好ましくは炭素数1~24のアルキルスルフィニル基で、例えば、ドデカンスルフィニル基)、アリールスルフィニル基(好ましくは炭素数6~24のアリールスルフィニル基で、例えば、フェニルスルフィニル基)、アルキルスルホニル基(好ましくは炭素数1~24のアルキルスルホニル基で、例えば、メチルスルホニル基、エチルスルホニル基、プロピルスルホニル基、ブチルスルホニル基、イソプロピルスルホニル基、2-エチルヘキシルスルホニル基、ヘキサデシルスルホニル基、オクチルスルホニル基、シクロヘキシルスルホニル基)、アリールスルホニル基(好ましくは炭素数6~24のアリールスルホニル基で、例えば、フェニルスルホニル基、1-ナフチルスルホニル基)、スルファモイル基(好ましくは炭素数24以下のスルファモイル基で、例えば、スルファモイル基、N,N-ジプロピルスルファモイル基、N-エチル-N-ドデシルスルファモイル基、N-エチル-N-フェニルスルファモイル基、N-シクロヘキシルスルファモイル基)、スルホ基、ホスホニル基(好ましくは炭素数1~24のホスホニル基で、例えば、フェノキシホスホニル基、オクチルオキシホスホニル基、フェニルホスホニル基)、ホスフィノイルアミノ基(好ましくは炭素数1~24のホスフィノイルアミノ基で、例えば、ジエトキシホスフィノイルアミノ基、ジオクチルオキシホスフィノイルアミノ基)を表す。
Examples of the substituent T are shown below.
An alkyl group (preferably a linear, branched or cyclic alkyl group having 1 to 24 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, Hexyl group, heptyl group, octyl group, 2-ethylhexyl group, dodecyl group, hexadecyl group, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-norbornyl group, 1-adamantyl group), alkenyl group (preferably having a carbon number of 2 to 18 alkenyl groups such as vinyl group, allyl group, 3-buten-1-yl group), aryl groups (preferably aryl groups having 6 to 24 carbon atoms such as phenyl group, naphthyl group), heterocyclic ring Group (preferably a heterocyclic group having 1 to 18 carbon atoms such as 2-thienyl group, 4-pyridyl group, 2-furyl group, 2- Limidinyl group, 1-pyridyl group, 2-benzothiazolyl group, 1-imidazolyl group, 1-pyrazolyl group, benzotriazol-1-yl group), silyl group (preferably a silyl group having 3 to 18 carbon atoms, for example, trimethylsilyl Group, triethylsilyl group, tributylsilyl group, tert-butyldimethylsilyl group, tert-hexyldimethylsilyl group), hydroxyl group, cyano group, nitro group, alkoxy group (preferably an alkoxy group having 1 to 24 carbon atoms, , Methoxy group, ethoxy group, 1-butoxy group, 2-butoxy group, isopropoxy group, tert-butoxy group, dodecyloxy group, and cycloalkyloxy group, for example, cyclopentyloxy group, cyclohexyloxy group) An aryloxy group (preferably having 6 to 2 carbon atoms) Aryloxy groups such as phenoxy group and 1-naphthoxy group, and heterocyclic oxy groups (preferably heterocyclic oxy groups having 1 to 18 carbon atoms such as 1-phenyltetrazole-5-oxy group, 2- Tetrahydropyranyloxy group), silyloxy group (preferably a silyloxy group having 1 to 18 carbon atoms, for example, trimethylsilyloxy group, tert-butyldimethylsilyloxy group, diphenylmethylsilyloxy group), acyloxy group (preferably carbon number) An acyloxy group having 2 to 24, for example, an acetoxy group, a pivaloyloxy group, a benzoyloxy group, a dodecanoyloxy group), an alkoxycarbonyloxy group (preferably an alkoxycarbonyloxy group having 2 to 24 carbon atoms, for example, ethoxycarbonyloxy Tert-butoki In the case of a sicarbonyloxy group or a cycloalkyloxycarbonyloxy group, for example, a cyclohexyloxycarbonyloxy group, an aryloxycarbonyloxy group (preferably an aryloxycarbonyloxy group having 7 to 24 carbon atoms, for example, phenoxy Carbonyloxy group), carbamoyloxy group (preferably a carbamoyloxy group having 1 to 24 carbon atoms such as N, N-dimethylcarbamoyloxy group, N-butylcarbamoyloxy group, N-phenylcarbamoyloxy group, N- Ethyl-N-phenylcarbamoyloxy group), sulfamoyloxy group (preferably a sulfamoyloxy group having 1 to 24 carbon atoms, for example, N, N-diethylsulfamoyloxy group, N-propylsulfamoyl group) Oxy group), alkyl A sulfonyloxy group (preferably an alkylsulfonyloxy group having 1 to 24 carbon atoms, such as a methylsulfonyloxy group, a hexadecylsulfonyloxy group, a cyclohexylsulfonyloxy group), an arylsulfonyloxy group (preferably having a carbon number of 6 to 24) An arylsulfonyloxy group such as a phenylsulfonyloxy group, an acyl group (preferably an acyl group having 1 to 24 carbon atoms, such as a formyl group, acetyl group, pivaloyl group, benzoyl group, tetradecanoyl group, cyclohexayl group, Noyl group), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 24 carbon atoms, such as a methoxycarbonyl group, an ethoxycarbonyl group, an octadecyloxycarbonyl group, a cyclohexyloxycarbonyl group, 2,6-di-ter -Butyl-4-methylcyclohexyloxycarbonyl group), aryloxycarbonyl group (preferably an aryloxycarbonyl group having 7 to 24 carbon atoms, such as phenoxycarbonyl group), carbamoyl group (preferably carbamoyl having 1 to 24 carbon atoms) Groups such as carbamoyl, N, N-diethylcarbamoyl, N-ethyl-N-octylcarbamoyl, N, N-dibutylcarbamoyl, N-propylcarbamoyl, N-phenylcarbamoyl, N-methylN -Phenylcarbamoyl group, N, N-dicyclohexylcarbamoyl group), amino group (preferably an amino group having 24 or less carbon atoms, for example, amino group, methylamino group, N, N-dibutylamino group, tetradecylamino group) Group, 2-ethylhexylamino group, cyclohexyl Silamino group), anilino group (preferably 6 to 24 anilino group such as anilino group, N-methylanilino group), heterocyclic amino group (preferably 1 to 18 heterocyclic amino group such as 4-pyridylamino) Group), a carbonamide group (preferably a carbonamide group having 2 to 24 carbon atoms, such as an acetamido group, a benzamide group, a tetradecanamide group, a pivaloylamide group, a cyclohexaneamide group), a ureido group (preferably a ureido having 1 to 24 carbon atoms Group, for example, ureido group, N, N-dimethylureido group, N-phenylureido group), imide group (preferably an imide group having 24 or less carbon atoms, for example, N-succinimide group, N-phthalimide group), Alkoxycarbonylamino group (preferably an alkoxycarbonyl group having 2 to 24 carbon atoms) Group, for example, methoxycarbonylamino group, ethoxycarbonylamino group, tert-butoxycarbonylamino group, octadecyloxycarbonylamino group, cyclohexyloxycarbonylamino group), aryloxycarbonylamino group (preferably having 7 to 24 carbon atoms) An aryloxycarbonylamino group such as a phenoxycarbonylamino group, a sulfonamide group (preferably a sulfonamide group having 1 to 24 carbon atoms, such as a methanesulfonamide group, a butanesulfonamide group, a benzenesulfonamide group, hexadecane Sulfonamido group, cyclohexanesulfonamido group), sulfamoylamino group (preferably a sulfamoylamino group having 1 to 24 carbon atoms, such as N, N-dipropylsulfamoylamino group, N Ethyl-N-dodecylsulfamoylamino group), azo group (preferably an azo group having 1 to 24 carbon atoms, for example, phenylazo group, 3-pyrazolylazo group), alkylthio group (preferably having 1 to 24 carbon atoms). Alkylthio group, for example, methylthio group, ethylthio group, octylthio group, cyclohexylthio group), arylthio group (preferably arylthio group having 6 to 24 carbon atoms, for example, phenylthio group), heterocyclic thio group (preferably having carbon number) 1 to 18 heterocyclic thio groups such as 2-benzothiazolylthio group, 2-pyridylthio group, 1-phenyltetrazolylthio group), alkylsulfinyl group (preferably alkylsulfinyl group having 1 to 24 carbon atoms) For example, dodecanesulfinyl group), arylsulfinyl group (preferably having 6 to 2 carbon atoms) 4 arylsulfinyl groups such as phenylsulfinyl group, alkylsulfonyl groups (preferably alkylsulfonyl groups having 1 to 24 carbon atoms such as methylsulfonyl group, ethylsulfonyl group, propylsulfonyl group, butylsulfonyl group, isopropyl Sulfonyl group, 2-ethylhexylsulfonyl group, hexadecylsulfonyl group, octylsulfonyl group, cyclohexylsulfonyl group), arylsulfonyl group (preferably arylsulfonyl group having 6 to 24 carbon atoms, for example, phenylsulfonyl group, 1-naphthylsulfonyl group) Group), a sulfamoyl group (preferably a sulfamoyl group having 24 or less carbon atoms, such as a sulfamoyl group, an N, N-dipropylsulfamoyl group, an N-ethyl-N-dodecylsulfamoyl group, an N-ethyl group). Ru-N-phenylsulfamoyl group, N-cyclohexylsulfamoyl group), sulfo group, phosphonyl group (preferably phosphonyl group having 1 to 24 carbon atoms, such as phenoxyphosphonyl group, octyloxyphosphonyl group, Phenylphosphonyl group) and a phosphinoylamino group (preferably a phosphinoylamino group having 1 to 24 carbon atoms, such as a diethoxyphosphinoylamino group and a dioctyloxyphosphinoylamino group).
 上述した置換基が置換可能な基である場合には、上述した各基のいずれかによってさらに置換されていてもよい。なお、2個以上の置換基を有している場合には、それらの置換基は同一であっても異なっていてもよい。 When the above-described substituent is a substitutable group, it may be further substituted with any of the above-described groups. In addition, when it has two or more substituents, those substituents may be the same or different.
 フェニル基またはナフチル基の置換基Rが、一般式(X)で表される基である場合について説明する。 The case where the substituent R of the phenyl group or naphthyl group is a group represented by the general formula (X) will be described.
 R11は水素原子または炭素数1~8のアルキル基を表し、水素原子またはメチル基が好ましく、水素原子がさらに好ましい。
 n1は1~3の整数を表し、1または2がより好ましい。n1が2または3の場合、複数のR11は同じでも異なっても良い。
 Y1は-O-、-S-、-NR13-、-SO2-、または、-C(=O)-を表し、-O-、-SO2-、または、-C(=O)-が好ましく、-O-または-C(=O)-がより好ましい。
 R12は1価の置換基を表し、置換基としては、上記の置換基Tが例示され、これらの置換基Tは、さらに、置換基Tによって置換されていてもよい。R12は好ましくは、置換基を有しても良いアルキル基、置換基を有しても良いアシル基、置換基を有しても良いスルホニル基、置換基を有しても良いアルコキシ基、または置換基を有しても良いアルキルアミノ基であり、より好ましくは置換基を有していてもよい炭素数1~12のアルキル基、置換基を有していてもよい炭素数1~12のアルコキシ基、置換基を有していてもよい炭素数1~12のアルキルアミノ基である。
 1分子あたりのR12の部分の質量は、200~2500であることが好ましく、250~1500であることがより好ましい。
 R13は、それぞれ、水素原子または炭素数1~4のアルキル基を表す。
R 11 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom.
n1 represents an integer of 1 to 3, more preferably 1 or 2. When n1 is 2 or 3, the plurality of R 11 may be the same or different.
Y 1 represents —O—, —S—, —NR 13 —, —SO 2 —, or —C (═O) —, and represents —O—, —SO 2 —, or —C (═O). -Is preferred, and -O- or -C (= O)-is more preferred.
R 12 represents a monovalent substituent, and examples of the substituent include the above-described substituent T. The substituent T may be further substituted with the substituent T. R 12 is preferably an alkyl group which may have a substituent, an acyl group which may have a substituent, a sulfonyl group which may have a substituent, an alkoxy group which may have a substituent, Or an alkylamino group which may have a substituent, more preferably an alkyl group having 1 to 12 carbon atoms which may have a substituent, and 1 to 12 carbon atoms which may have a substituent. And an alkylamino group having 1 to 12 carbon atoms which may have a substituent.
The mass of the R 12 portion per molecule is preferably 200 to 2500, and more preferably 250 to 1500.
R 13 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
 上述した1価の基がさらに置換可能な基である場合には、上述した各基のいずれかによってさらに置換されていてもよい。なお、2個以上の置換基を有している場合には、それらの置換基は同一であっても異なっていてもよい。 When the above-described monovalent group is a further substitutable group, it may be further substituted with any of the above-described groups. In addition, when it has two or more substituents, those substituents may be the same or different.
 次に、一般式(1-4)について説明する。
 一般式(1-4)において、R’はエーテル溶解性への効果と分子量の点から、炭素数1~3のアルキレン基である。炭素数1~3のアルキレン基としては、メチレン基、エチレン基、n-プロピレン基、iso-プロピレン基が挙げられる。好ましくは、エチレン基、プロピレン基である。
 R”は、エーテル溶解性への効果と分子量の点から、炭素数1~8のアルキル基であり、好ましくは1~2のアルキル基である。1~8のアルキル基としては、一般式(1-3)におけるR3と同義であり、好ましい範囲も同義である。
 n1は、エーテル溶解性への効果と分子量の観点から、0~4の整数であり、1~2の整数であることがより好ましい。
Next, general formula (1-4) will be described.
In the general formula (1-4), R ′ is an alkylene group having 1 to 3 carbon atoms from the viewpoint of ether solubility and molecular weight. Examples of the alkylene group having 1 to 3 carbon atoms include a methylene group, an ethylene group, an n-propylene group, and an iso-propylene group. Preferably, they are an ethylene group and a propylene group.
R ″ is an alkyl group having 1 to 8 carbon atoms, and preferably an alkyl group having 1 to 2 carbon atoms, from the viewpoint of ether solubility and molecular weight. It is synonymous with R 3 in 1-3), and the preferred range is also synonymous.
n1 is an integer of 0 to 4, more preferably an integer of 1 to 2, from the viewpoint of ether solubility and molecular weight.
 次に、一般式(1)の中心部分であるMについて述べる。一般式(1)において、Mは、2つの水素原子、金属原子、金属酸化物または金属ハロゲン化物を表す。また、金属原子としては、鉄、マグネシウム、ニッケル、コバルト、銅、パラジウム、亜鉛、バナジウム、チタン、インジウム、錫等が挙げられる。金属酸化物としては、チタニル、バナジル等が挙げられる。金属ハロゲン化物としては、塩化アルミニウム、塩化インジウム、塩化ゲルマニウム、塩化錫(II)、塩化錫(IV)、塩化珪素等が挙げられる。好ましくは、金属原子、金属酸化物または金属ハロゲン化物であり、具体的には、銅、亜鉛、コバルト、ニッケル、鉄、バナジル、チタニル、塩化インジウム、塩化錫(II)であり、より好ましくは銅、バナジルおよび亜鉛であり、さらに好ましくは亜鉛、銅であり、最も好ましくは亜鉛である。中心金属が亜鉛、銅であると、耐熱性が高いため好ましい。また、中心金属が亜鉛であると、銅の場合よりも緑色の波長である520nm~545nm付近の透過率が高くカラーフィルタにした際に輝度が向上できるので特に好ましい。また、アセトン、メタノール、メチルセルソルブといった汎用性溶剤に対する溶剤溶解性が高く、また樹脂に対する溶解性が高くコントラストが高くなるため、特に好ましい。 Next, M, which is the central part of the general formula (1), will be described. In the general formula (1), M represents two hydrogen atoms, a metal atom, a metal oxide, or a metal halide. Examples of the metal atom include iron, magnesium, nickel, cobalt, copper, palladium, zinc, vanadium, titanium, indium, and tin. Examples of the metal oxide include titanyl and vanadyl. Examples of the metal halide include aluminum chloride, indium chloride, germanium chloride, tin (II) chloride, tin (IV) chloride, and silicon chloride. Preferably, it is a metal atom, a metal oxide or a metal halide, specifically, copper, zinc, cobalt, nickel, iron, vanadyl, titanyl, indium chloride, tin (II) chloride, more preferably copper. Vanadyl and zinc, more preferably zinc and copper, and most preferably zinc. It is preferable that the central metal is zinc or copper because of high heat resistance. Further, it is particularly preferable that the central metal is zinc because the transmittance in the vicinity of 520 nm to 545 nm, which is a green wavelength, is higher than that of copper, and the luminance can be improved when a color filter is formed. Further, it is particularly preferable because it has high solvent solubility in general-purpose solvents such as acetone, methanol, and methyl cellosolve, and has high solubility in resins and high contrast.
 一般式(1)で表される化合物は、下記一般式(1-1)で表されることがより好ましい。
一般式(1-1)
Figure JPOXMLDOC01-appb-C000011
(一般式(1-1)中、Z1~Z16は、それぞれ、水素原子、ハロゲン原子、上記一般式(1-1-2)で表される基、上記一般式(1-3)で表される基、または、上記一般式(1-4)で表される基を表し、Z1~Z16のうち、1~8つは、上記一般式(1-1-2)で表される基または上記一般式(1-4)で表される基を表し、少なくとも1つはハロゲン原子であり、かつ、少なくとも1つは上記一般式(1-1-2)で表される基である。Mは、2つの水素原子、金属原子、金属酸化物または金属ハロゲン化物を表す。)
The compound represented by the general formula (1) is more preferably represented by the following general formula (1-1).
General formula (1-1)
Figure JPOXMLDOC01-appb-C000011
(In the general formula (1-1), Z 1 to Z 16 are each a hydrogen atom, a halogen atom, a group represented by the general formula (1-1-2), or a general formula (1-3). Or a group represented by the above general formula (1-4), and 1 to 8 of Z 1 to Z 16 are represented by the above general formula (1-1-2). Or at least one is a halogen atom and at least one is a group represented by the general formula (1-1-2) M represents two hydrogen atoms, metal atoms, metal oxides or metal halides.)
 一般式(1-1)における一般式(1-1-2)、一般式(1-3)、一般式(1-4)は、上記一般式(1)で説明した一般式(1-1-2)、一般式(1-3)、一般式(1-4)と同義であり、好ましい範囲も同義である。従って、一般式(1-1)におけるZ1~Z16は、それぞれ、一般式(1)のZ1~Z16は、同じ範囲がより好ましい。
 一般式(1-1)のMは、上記一般式(1)におけるMと同義であり、好ましい範囲も同義である。
The general formula (1-1-2), the general formula (1-3), and the general formula (1-4) in the general formula (1-1) are represented by the general formula (1-1) described in the general formula (1). -2), synonymous with general formula (1-3) and general formula (1-4), and a preferred range is also synonymous. Therefore, Z 1 to Z 16 in the general formula (1-1) are more preferably in the same range as Z 1 to Z 16 in the general formula (1).
M in the general formula (1-1) has the same meaning as M in the general formula (1), and a preferred range is also the same.
 以下に本発明で用いられる一般式(1)および一般式(1-1)における、Z1~Z16の例を挙げるが、本発明はこれらに限定されるものではない。
Figure JPOXMLDOC01-appb-C000012
Examples of Z 1 to Z 16 in the general formula (1) and general formula (1-1) used in the present invention will be given below, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 以下に本発明で用いられるフタロシアニン化合物の例を挙げるが、本発明がこれらに限定されるものではないことはいうまでもない。
 下記表は下記一般式に示される置換基とその数を表す。
Figure JPOXMLDOC01-appb-C000014
 下記表中のArは下記構造を表す。
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-T000016
 上記式において、Phは、フェニル基である。
Although the example of the phthalocyanine compound used by this invention is given to the following, it cannot be overemphasized that this invention is not limited to these.
The following table shows the substituents represented by the following general formula and their numbers.
Figure JPOXMLDOC01-appb-C000014
Ar in the following table represents the following structure.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-T000016
In the above formula, Ph is a phenyl group.
Figure JPOXMLDOC01-appb-C000017
 上記において、Pcは、フタロシアニン核を表し、Znは、中心金属を表し、Pcのすぐ後にα位に置換する置換基を表し、そのα位に置換する置換基の後にβ位に置換する置換基を表し、そのβ位に置換する置換基の後に置換位置に依らない置換基を表す。x、yは、置換基数が0以上の整数となる正数である。
Figure JPOXMLDOC01-appb-C000017
In the above, Pc represents a phthalocyanine nucleus, Zn represents a central metal, represents a substituent substituted at the α-position immediately after Pc, and a substituent substituted at the β-position after the substituent substituted at the α-position Represents a substituent that does not depend on the substitution position after the substituent that is substituted at the β-position. x and y are positive numbers whose number of substituents is an integer of 0 or more.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000019
 フタロシアニン化合物は、置換位置や置換数が異なる混合物となるため、構造式として一義的に記述することが難しい。また、次の表で示す置換数は混合物中の置換基の数の平均値が近似された値であり、少数も取り得る。 Since the phthalocyanine compound becomes a mixture having different substitution positions and substitution numbers, it is difficult to uniquely describe it as a structural formula. Further, the number of substitutions shown in the following table is a value obtained by approximating the average value of the number of substituents in the mixture, and may be a small number.
ハロゲン化フタロシアニン化合物の製造方法
 本発明で用いるフタロシアニン化合物の製造方法は、特に制限されるものではなく、従来公知の方法を利用することができる。好ましくは、溶融状態または有機溶剤中で、フタロニトリル化合物と金属塩とを環化反応する方法が特に好ましい。以下、フタロシアニン化合物の製造方法の好ましい実施形態を記載する。しかしながら、本発明は、下記好ましい実施形態に制限されるものではない。
 すなわち、下記式(I):
Figure JPOXMLDOC01-appb-C000020
で表されるフタロニトリル化合物(1)、下記式(II):
Figure JPOXMLDOC01-appb-C000021
で表されるフタロニトリル化合物(2)、下記式(III):
Figure JPOXMLDOC01-appb-C000022
で表されるフタロニトリル化合物(3)、および下記式(IV):
Figure JPOXMLDOC01-appb-C000023
で表されるフタロニトリル化合物(4)を、金属原子、金属酸化物、金属カルボニル、金属ハロゲン化物および有機酸金属(本明細書中では、一括して「金属化合物」とも称する)からなる群から選ばれる一種と環化反応させることによって、フタロシアニン化合物が製造できる。
 なお、上記式(I)~(IV)中、Z1~Z16は、所望のフタロシアニン化合物(1)の構造によって規定される。具体的には、上記式(I)~(IV)中、Z1~Z16は、それぞれ、上記式(1)中のZ1~Z16の定義と同様であるため、ここでは説明を省略する。
Method for Producing Halogenated Phthalocyanine Compound The method for producing the phthalocyanine compound used in the present invention is not particularly limited, and a conventionally known method can be used. A method of cyclizing a phthalonitrile compound and a metal salt in a molten state or an organic solvent is particularly preferable. Hereinafter, preferred embodiments of the method for producing a phthalocyanine compound will be described. However, the present invention is not limited to the following preferred embodiments.
That is, the following formula (I):
Figure JPOXMLDOC01-appb-C000020
A phthalonitrile compound (1) represented by the following formula (II):
Figure JPOXMLDOC01-appb-C000021
A phthalonitrile compound (2) represented by the following formula (III):
Figure JPOXMLDOC01-appb-C000022
And a phthalonitrile compound (3) represented by the following formula (IV):
Figure JPOXMLDOC01-appb-C000023
A phthalonitrile compound (4) represented by the formula: from the group consisting of metal atoms, metal oxides, metal carbonyls, metal halides and organic acid metals (also collectively referred to as “metal compounds” in this specification). A phthalocyanine compound can be produced by cyclization reaction with one selected.
In the above formulas (I) to (IV), Z 1 to Z 16 are defined by the structure of the desired phthalocyanine compound (1). Specifically, in the above formulas (I) to (IV), Z 1 to Z 16 are the same as the definitions of Z 1 to Z 16 in the above formula (1), respectively, and thus description thereof is omitted here. To do.
 環化反応は、特開昭64-45474号公報に記載の方法などの、従来公知方法により合成できる。
 上記態様において、環化反応は、式(I)~(IV)のフタロニトリル化合物と金属、金属酸化物、金属カルボニル、金属ハロゲン化物および有機酸金属からなる群から選ばれる一種を溶融状態または有機溶剤中で反応させることが好ましい。この際使用できる金属、金属酸化物、金属カルボニル、金属ハロゲン化物および有機酸金属としては、反応後に得られるフタロシアニン化合物の中心部分(一般式(1)のM)に相当するものが得られるものであれば、特に制限されるものではない。従って、上記一般式(1)におけるMの項で列挙された鉄、銅、亜鉛、バナジウム、チタン、インジウムおよびスズ等の金属、当該金属の、塩化物、臭化物、ヨウ化物等の金属ハロゲン化合物、酸化バナジウム、酸化チタニルおよび酸化銅等の金属酸化物、酢酸塩等の有機酸金属、ならびにアセチルアセトナート等の錯体化合物およびカルボニル鉄等の金属カルボニル等が挙げられる。具体的には、鉄、銅、亜鉛、バナジウム、チタン、インジウム、マグネシウムおよびスズ等の金属;当該金属の、塩化物、臭化物、ヨウ化物等の金属ハロゲン化合物、例えば、塩化バナジウム、塩化チタン、塩化銅、塩化亜鉛、塩化コバルト、塩化ニッケル、塩化鉄、塩化インジウム、塩化アルミニウム、塩化錫、塩化ガリウム、塩化ゲルマニウム、塩化マグネシウム、ヨウ化銅、ヨウ化亜鉛、ヨウ化コバルト、ヨウ化インジウム、ヨウ化アルミニウム、ヨウ化ガリウム、臭化銅、臭化亜鉛、臭化コバルト、臭化アルミニウム、臭化ガリウム;一酸化バナジウム、三酸化バナジウム、四酸化バナジウム、五酸化バナジウム、二酸化チタン、一酸化鉄、三二酸化鉄、四三酸化鉄、酸化マンガン、一酸化ニッケル、一酸化コバルト、三二酸化コバルト、二酸化コバルト、酸化第一銅、酸化第二銅、三二酸化銅、酸化バラジウム、酸化亜鉛、一酸化ゲルマニウム、および二酸化ゲルマニウム等の金属酸化物;酢酸銅、酢酸亜鉛、酢酸コバルト、安息香酸銅、安息香酸亜鉛等の有機酸金属;ならびにアセチルアセトナート等の錯体化合物およびコバルトカルボニル、鉄カルボニル、ニッケルカルボニル等の金属カルボニルなどが挙げられる。これらのうち、好ましくは金属、金属酸化物および金属ハロゲン化物であり、より好ましくは金属ハロゲン化物であり、さらに好ましくは、ヨウ化バナジウム、ヨウ化銅およびヨウ化亜鉛であり、特に好ましくは、ヨウ化銅およびヨウ化亜鉛であり、最も好ましくはヨウ化亜鉛である。ヨウ化亜鉛を用いる場合、中心金属は、亜鉛ということになる。金属ハロゲン化物のうち、ヨウ化物を用いることが好適な理由は、溶剤や樹脂に対する溶解性に優れ、得られるフタロシアニン化合物のスペクトルがシャープであり、所望の波長である640~750nmに収まりやすいためである。環化反応の際にヨウ化物を用いた場合にスペクトルがシャープになる詳細なメカニズムは不明であるが、ヨウ化物を用いた場合、反応後にフタロシアニン化合物中に残存するヨウ素が、フタロシアニン化合物と何らかの相互作用を起こして、フタロシアニン化合物の層間にヨウ素が存在するようになるためであると推定される。しかしながら、上記メカニズムに限定されるものではない。環化反応に金属ヨウ化物を用いた場合と同様の効果を得るために、得られたフタロシアニン化合物をヨウ素で処理してもよい。
The cyclization reaction can be synthesized by a conventionally known method such as the method described in JP-A No. 64-45474.
In the above embodiment, the cyclization reaction is carried out by melting one kind selected from the group consisting of the phthalonitrile compounds of formulas (I) to (IV) and a metal, a metal oxide, a metal carbonyl, a metal halide and an organic acid metal in a molten state or organic It is preferable to react in a solvent. The metal, metal oxide, metal carbonyl, metal halide, and organic acid metal that can be used at this time are those corresponding to the central portion of the phthalocyanine compound obtained after the reaction (M in the general formula (1)). If there is, it is not particularly limited. Therefore, metals such as iron, copper, zinc, vanadium, titanium, indium, and tin listed in the item M in the general formula (1), metal halide compounds such as chloride, bromide, and iodide of the metal, Examples thereof include metal oxides such as vanadium oxide, titanyl oxide and copper oxide, organic acid metals such as acetate, complex compounds such as acetylacetonate, and metal carbonyls such as carbonyl iron. Specifically, metals such as iron, copper, zinc, vanadium, titanium, indium, magnesium, and tin; metal halides such as chloride, bromide, and iodide of the metal, such as vanadium chloride, titanium chloride, and chloride. Copper, zinc chloride, cobalt chloride, nickel chloride, iron chloride, indium chloride, aluminum chloride, tin chloride, gallium chloride, germanium chloride, magnesium chloride, copper iodide, zinc iodide, cobalt iodide, indium iodide, iodide Aluminum, gallium iodide, copper bromide, zinc bromide, cobalt bromide, aluminum bromide, gallium bromide; vanadium monoxide, vanadium trioxide, vanadium tetroxide, vanadium pentoxide, titanium dioxide, iron monoxide, three Iron dioxide, triiron tetroxide, manganese oxide, nickel monoxide, cobalt monoxide, cobalt dioxide Metal oxides such as cobalt dioxide, cuprous oxide, cuprous oxide, cupric oxide, copper trioxide, barium oxide, zinc oxide, germanium monoxide, and germanium dioxide; copper acetate, zinc acetate, cobalt acetate, copper benzoate And organic acid metals such as zinc benzoate; and complex compounds such as acetylacetonate and metal carbonyls such as cobalt carbonyl, iron carbonyl and nickel carbonyl. Of these, metals, metal oxides and metal halides are preferable, metal halides are more preferable, vanadium iodide, copper iodide and zinc iodide are more preferable, and iodine is particularly preferable. Copper iodide and zinc iodide, most preferably zinc iodide. When zinc iodide is used, the central metal is zinc. Among metal halides, it is preferable to use iodide because it has excellent solubility in solvents and resins, and the spectrum of the resulting phthalocyanine compound is sharp and easily fits within the desired wavelength range of 640 to 750 nm. is there. The detailed mechanism of sharpening the spectrum when using iodide during the cyclization reaction is unknown, but when iodide is used, the iodine remaining in the phthalocyanine compound after the reaction may not interact with the phthalocyanine compound. It is presumed that iodine is present between the layers of the phthalocyanine compound due to the action. However, the mechanism is not limited to the above mechanism. In order to obtain the same effect as when metal iodide is used for the cyclization reaction, the obtained phthalocyanine compound may be treated with iodine.
 また、上記態様において、また、環化反応は、無溶剤中でも行なえるが、有機溶剤を使用して行なうのが好ましい。有機溶剤は、出発原料としてのフタロニトリル化合物との反応性の低い、好ましくは反応性を示さない不活性な溶剤であればいずれでもよく、例えば、ベンゼン、トルエン、キシレン、ニトロベンゼン、モノクロロベンゼン、o-クロロトルエン、ジクロロベンゼン、トリクロロベンゼン、1-クロロナフタレン、1-メチルナフタレン、エチレングリコール、およびベンゾニトリル等の不活性溶剤;メタノール、エタノール、1-プロパノ-ル、2-プロパノ-ル、1-ブタノール、1-ヘキサノール、1-ペンタノール、1-オクタノール等のアルコール;ならびにピリジン、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリジノン、N,N-ジメチルアセトフェノン、トリエチルアミン、トリ-n-ブチルアミン、ジメチルスルホキシド、スルホラン等の非プロトン性極性溶剤等が挙げられる。
 これらのうち、好ましくは、1-クロロナフタレン、1-メチルナフタレン、1-オクタノール、ジクロロベンゼンおよびベンゾニトリルが、より好ましくは、1-オクタノール、ジクロロベンゼンおよびベンゾニトリルが使用される。これらの溶剤は1種単独で用いてもよいし、2種以上併用してもよい。
In the above embodiment, the cyclization reaction can be performed in the absence of a solvent, but it is preferably performed using an organic solvent. The organic solvent may be any inert solvent that has a low reactivity with the phthalonitrile compound as a starting material, and preferably exhibits no reactivity. For example, benzene, toluene, xylene, nitrobenzene, monochlorobenzene, o -Inert solvents such as chlorotoluene, dichlorobenzene, trichlorobenzene, 1-chloronaphthalene, 1-methylnaphthalene, ethylene glycol, and benzonitrile; methanol, ethanol, 1-propanol, 2-propanol, 1- Alcohols such as butanol, 1-hexanol, 1-pentanol, 1-octanol; and pyridine, N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidinone, N, N-dimethylacetophenone, Triethylamine, tri n- butylamine, dimethyl sulfoxide, aprotic polar solvents such as sulfolane.
Of these, 1-chloronaphthalene, 1-methylnaphthalene, 1-octanol, dichlorobenzene and benzonitrile are preferably used, and more preferably 1-octanol, dichlorobenzene and benzonitrile are used. These solvents may be used alone or in combination of two or more.
 上記態様における式(I)~(IV)のフタロニトリル化合物と金属化合物との反応条件は、当該反応が進行する条件であれば特に制限されるものではないが、例えば、有機溶剤100質量部に対して、上記式(I)~(IV)のフタロニトリル化合物を1~500質量部、好ましくは10~350質量部の範囲の合計量で、かつ金属化合物を該フタロニトリル化合物4モルに対して、好ましくは0.8~2.0モル、より好ましくは0.8~1.5モルの範囲で仕込む。環化の際は、特に限定されるものではないが、好ましくは反応温度30~250℃、より好ましくは80~200℃の範囲で反応させる。反応時間は、特に限定されるものではないが、好ましくは3~20時間である。なお、反応後は、従来公知のフタロシアニン化合物の合成方法に従って、ろ過、洗浄、乾燥することにより、次工程に用いることのできるフタロシアニン化合物を効率よく、しかも高純度で得ることができる。 The reaction conditions for the phthalonitrile compound of formulas (I) to (IV) and the metal compound in the above embodiment are not particularly limited as long as the reaction proceeds. On the other hand, the total amount of the phthalonitrile compounds of the above formulas (I) to (IV) is 1 to 500 parts by weight, preferably 10 to 350 parts by weight, and the metal compound is used with respect to 4 moles of the phthalonitrile compound. , Preferably 0.8 to 2.0 mol, more preferably 0.8 to 1.5 mol. The cyclization is not particularly limited, but the reaction is preferably performed at a reaction temperature of 30 to 250 ° C., more preferably 80 to 200 ° C. The reaction time is not particularly limited, but is preferably 3 to 20 hours. After the reaction, a phthalocyanine compound that can be used in the next step can be efficiently and highly purified by filtration, washing, and drying according to a conventionally known method for synthesizing phthalocyanine compounds.
 上記態様において、出発原料である式(I)~(IV)のフタロニトリル化合物は、従来既知の方法により合成でき、また、市販品を用いることもできる。 In the above embodiment, the starting phthalonitrile compounds of formulas (I) to (IV) can be synthesized by a conventionally known method, or commercially available products can also be used.
 本発明で用いる組成物における上述した染料の配合量は、本発明で用いる組成物に含まれる着色剤の1~100質量%であることが好ましく、50~100質量%であることがさらに好ましく、80~100質量%であることが特に好ましい。
 また、本発明で用いる組成物に含まれる着色剤のうち、フタロシアニン染料(好ましくは、ハロゲン化フタロシアニン染料)の配合量は、55~80質量%であることが好ましく、60~75質量%であることがより好ましい。
The amount of the dye described above in the composition used in the present invention is preferably 1 to 100% by mass, more preferably 50 to 100% by mass of the colorant contained in the composition used in the present invention, It is particularly preferably 80 to 100% by mass.
Further, among the colorants contained in the composition used in the present invention, the blending amount of the phthalocyanine dye (preferably a halogenated phthalocyanine dye) is preferably 55 to 80% by mass, and preferably 60 to 75% by mass. It is more preferable.
(顔料)
 着色剤に用いられる顔料としては、従来公知の種々の無機顔料または有機顔料を挙げることができる。また、無機顔料でも有機顔料であっても、高透過率であることが好ましいことを考慮すると、平均粒子径がなるべく小さい顔料の使用が好ましい。ハンドリング性も考慮すると、顔料の平均粒子径は、0.01~0.1μmが好ましく、0.01~0.05μmがより好ましい。
 本発明において好ましく用いることができる顔料として、例えば、特開2012-181512号公報の段落番号0026に記載のものが挙げられ、この内容は、本明細書に組み込まれる。
 また、本発明において好ましく用いることができる顔料として、以下のものを挙げることができる。但し本発明は、これらに限定されるものではない。
 C.I.Pigment Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34,35,35:1,36,36:1,37,37:1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86,93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174,175,176,177,179,180,181,182,185,187,188,193,194,199,213,214
 これら有機顔料は、単独もしくは色純度を上げるため種々組合せて用いることができる。
(Pigment)
Examples of the pigment used for the colorant include conventionally known various inorganic pigments or organic pigments. In addition, it is preferable to use a pigment having an average particle diameter as small as possible considering that high transmittance is preferable regardless of whether it is an inorganic pigment or an organic pigment. Considering handling properties, the average particle size of the pigment is preferably 0.01 to 0.1 μm, more preferably 0.01 to 0.05 μm.
Examples of pigments that can be preferably used in the present invention include those described in paragraph No. 0026 of JP2012-181512A, the contents of which are incorporated herein.
Moreover, the following can be mentioned as a pigment which can be preferably used in this invention. However, the present invention is not limited to these.
C. I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 17 , 175,176,177,179,180,181,182,185,187,188,193,194,199,213,214
These organic pigments can be used alone or in various combinations in order to increase color purity.
 本発明で用いる組成物における上述した顔料の配合量は、着色硬化性組成物に含まれる場合、着色剤の1~100質量%とすることができる。顔料の配合量を少なくすることにより、着色硬化性組成物中における着色剤の配合量をより高めることができ、本発明の効果がより効果的に発揮される傾向にある。 The amount of the pigment described above in the composition used in the present invention may be 1 to 100% by mass of the colorant when included in the colored curable composition. By reducing the blending amount of the pigment, the blending amount of the colorant in the colored curable composition can be further increased, and the effects of the present invention tend to be exhibited more effectively.
(顔料分散物)
 本発明の積層体を構成する組成物の調整に顔料を用いる場合には、顔料分散物としてもよい。顔料の分散性を向上させる観点から、さらに顔料分散剤を添加してもよい。
 本発明に用いることができる顔料分散剤としては、高分子分散剤[例えば、ポリアミドアミンとその塩、ポリカルボン酸とその塩、高分子量不飽和酸エステル、変性ポリウレタン、変性ポリエステル、変性ポリ(メタ)アクリレート、(メタ)アクリル系共重合体、ナフタレンスルホン酸ホルマリン縮合物]、および、ポリオキシエチレンアルキルリン酸エステル、ポリオキシエチレンアルキルアミン、アルカノールアミン、顔料誘導体等を挙げることができる。
 高分子分散剤は、その構造から更に直鎖状高分子、末端変性型高分子、グラフト型高分子、ブロック型高分子に分類することができる。
 高分子分散剤は、顔料の表面に吸着し、再凝集を防止するように作用する。そのため、顔料表面へのアンカー部位を有する末端変性型高分子、グラフト型高分子、ブロック型高分子が好ましい構造として挙げることができる。一方で、顔料誘導体は、顔料表面を改質することで、高分子分散剤の吸着を促進させる効果を有する。
 本発明に用いうる顔料分散剤は、市販品としても入手可能であり、そのような具体例としては、特開2012-173635号公報の段落番号0050に記載のものや、特開2012-93396号公報の段落番号0206に記載のものが用いられ、これらの内容は本明細書に組み込まれる。また、特開2011-070156号公報の段落番号0028~0124に記載の分散剤や特開2007-277514号公報に記載の分散剤も好ましく用いられ、これらの内容は本明細書に組み込まれる。
 これらの顔料分散剤は、単独で使用してもよく、2種以上を組み合わせて使用してもよい。本発明においては、特に、顔料誘導体と高分子分散剤とを組み合わせて使用することが好ましい。
(Pigment dispersion)
When a pigment is used for adjusting the composition constituting the laminate of the present invention, it may be a pigment dispersion. From the viewpoint of improving the dispersibility of the pigment, a pigment dispersant may be further added.
Examples of the pigment dispersant that can be used in the present invention include polymer dispersants [for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meta ) Acrylate, (meth) acrylic copolymer, naphthalenesulfonic acid formalin condensate], and polyoxyethylene alkyl phosphate ester, polyoxyethylene alkyl amine, alkanolamine, pigment derivative, and the like.
The polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.
The polymer dispersant acts to adsorb on the surface of the pigment and prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures. On the other hand, the pigment derivative has an effect of promoting adsorption of the polymer dispersant by modifying the pigment surface.
The pigment dispersant that can be used in the present invention is also available as a commercial product. Specific examples thereof include those described in paragraph No. 0050 of JP2012-173635A and JP2012-93396A. Those described in paragraph number 0206 of the publication are used, and the contents thereof are incorporated in the present specification. In addition, a dispersant described in paragraphs 0028 to 0124 of JP2011-070156A and a dispersant described in JP2007-277514A are also preferably used, and the contents thereof are incorporated herein.
These pigment dispersants may be used alone or in combination of two or more. In the present invention, it is particularly preferable to use a combination of a pigment derivative and a polymer dispersant.
 本発明の組成物における顔料分散剤の含有量としては、着色剤である顔料100質量部に対して、1~80質量部であることが好ましく、5~70質量部がより好ましい。
 具体的には、高分子分散剤を用いる場合であれば、その使用量としては、顔料100質量部に対して、質量換算で5~100質量部の範囲が好ましい。
 また、顔料誘導体を併用する場合、顔料誘導体の使用量としては、顔料100質量部に対し、質量換算で1~30質量部の範囲にあることが好ましく、3~20質量部の範囲にあることがより好ましい。
The content of the pigment dispersant in the composition of the present invention is preferably 1 to 80 parts by mass and more preferably 5 to 70 parts by mass with respect to 100 parts by mass of the pigment as the colorant.
Specifically, when a polymer dispersant is used, the amount used is preferably in the range of 5 to 100 parts by mass in terms of mass with respect to 100 parts by mass of the pigment.
When the pigment derivative is used in combination, the amount of the pigment derivative used is preferably in the range of 1 to 30 parts by mass, preferably in the range of 3 to 20 parts by mass, with respect to 100 parts by mass of the pigment. Is more preferable.
(顔料誘導体)
 着色剤として顔料を含有する場合、顔料に対する分散樹脂の吸着性を上げるため、更に、顔料誘導体を含有することが好ましい。顔料誘導体とは、有機顔料の一部分を、酸性基、塩基性基またはフタルイミドメチル基で置換した構造を有する化合物である。顔料誘導体としては、分散性および分散安定性の観点から、酸性基または塩基性基を有する顔料誘導体を含有することが好ましい。
 顔料誘導体としては、例えば、特開2011-137125号公報の段落番号0100~0119に記載のものが用いられ、この内容は本明細書に組み込まれる。
 本発明の組成物における顔料誘導体の含有量は、顔料の全質量に対し、1~90質量%が好ましく、3~80質量%がさらに好ましい。顔料誘導体は、1種のみを用いてもよいし、2種以上を併用してもよい。
(Pigment derivative)
When a pigment is contained as a colorant, it is preferable to further contain a pigment derivative in order to increase the adsorptivity of the dispersion resin to the pigment. The pigment derivative is a compound having a structure in which a part of an organic pigment is substituted with an acidic group, a basic group or a phthalimidomethyl group. The pigment derivative preferably contains a pigment derivative having an acidic group or a basic group from the viewpoint of dispersibility and dispersion stability.
As the pigment derivative, for example, those described in JP-A-2011-137125, paragraphs 0100 to 0119 are used, the contents of which are incorporated herein.
The content of the pigment derivative in the composition of the present invention is preferably 1 to 90% by mass, more preferably 3 to 80% by mass, based on the total mass of the pigment. Only one pigment derivative may be used, or two or more pigment derivatives may be used in combination.
(溶剤)
 顔料分散物における溶剤としては、一般の顔料分散性組成物に用いられる有機溶剤であれば特に限定されない。例えば、1-メトキシ-2-プロピルアセテート、1-メトキシ-2-プロパノール、エチレングリコールモノメチルエーテル、ジエチレングリコールモノメチルエーテル、酢酸エチル、酢酸ブチル、乳酸エチル、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン、n-プロパノール、2-プロパノール、n-ブタノール、シクロヘキサノール、エチレングリコール、ジエチレングリコール、トルエン、キシレンなどの溶剤を挙げることができ、融点や粘度、顔料の分散性を調整するためにこれらのうち複数を併用することも可能である。
(solvent)
The solvent in the pigment dispersion is not particularly limited as long as it is an organic solvent used in general pigment dispersible compositions. For example, 1-methoxy-2-propyl acetate, 1-methoxy-2-propanol, ethylene glycol monomethyl ether, diethylene glycol monomethyl ether, ethyl acetate, butyl acetate, ethyl lactate, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, n-propanol , 2-propanol, n-butanol, cyclohexanol, ethylene glycol, diethylene glycol, toluene, xylene, and the like, and a plurality of these may be used in combination to adjust the melting point, viscosity, and pigment dispersibility. Is also possible.
 顔料分散物における溶剤の含有量は、顔料分散物の用途などに応じて適宜選択される。
 顔料分散物が後述する着色硬化性組成物の調製に用いられる場合には、取り扱い性の観点から、顔料と顔料分散剤との総和が顔料分散物の溶剤を除いた総質量に対して5~50質量%となるように含有することができる。
The content of the solvent in the pigment dispersion is appropriately selected according to the use of the pigment dispersion.
When the pigment dispersion is used for the preparation of a colored curable composition to be described later, from the viewpoint of handleability, the sum of the pigment and the pigment dispersant is 5 to 5 based on the total mass excluding the solvent of the pigment dispersion. It can contain so that it may become 50 mass%.
(黄色色素)
 本発明の実施形態の一例として、フタロシアニン染料に黄色色素を配合して、用いることが例示される。
 黄色色素としては、染料でも顔料でも、染料と顔料との混合系でもよいが、分散剤を用いなくても均一に溶解した状態の組成物を得ることができる観点から染料が好ましい。例えば、アゾ系(例えば、C.I.solvent yellow 162)、メチン系(C.I.solvent yellow 93)染料などが好ましい。
 メチン系染料としては、モノメチン染料が好ましく、下記一般式(5)で表されるモノメチン染料がより好ましい。ハロゲン化フタロシアニン染料とメチン系染料を組み合わせると本発明の効果がより効果的に発揮される傾向にある。
Figure JPOXMLDOC01-appb-C000024
(一般式(5)中、R11は、それぞれ、アルキル基またはビニル基を表し、R12は、それぞれ、置換基を有する芳香族環基を表す。)
 R11は炭素数1~12のアルキル基が好ましく、炭素数1~6のアルキル基がより好ましい。
 R12は、フェニル基、ナフチル基が好ましく、置換基としては、アルキルスルホニルアミノ基、ビニルスルホニルアミノ基、アリールスルホニルアミノ基、アルキルカルボニルアミノ基、ビニルカルボニルアミノ基、アリールカルボニルアミノ基が好ましく、特にアルキルスルホニルアミノ基が好ましい。炭素数1~12アルキル基は、不飽和結合を有しても良く、その様な置換基としては、アリルスルホニルアミノ基が挙げられる。
(Yellow pigment)
As an example of an embodiment of the present invention, the use of a phthalocyanine dye mixed with a yellow pigment is exemplified.
The yellow pigment may be a dye, a pigment, or a mixed system of a dye and a pigment, but a dye is preferred from the viewpoint of obtaining a uniformly dissolved composition without using a dispersant. For example, an azo dye (for example, CI solvent yellow 162), a methine dye (CI solvent yellow 93) dye, or the like is preferable.
As the methine dye, a monomethine dye is preferable, and a monomethine dye represented by the following general formula (5) is more preferable. When a halogenated phthalocyanine dye and a methine dye are combined, the effects of the present invention tend to be more effectively exhibited.
Figure JPOXMLDOC01-appb-C000024
(In General Formula (5), R 11 represents an alkyl group or a vinyl group, and R 12 represents an aromatic ring group having a substituent.)
R 11 is preferably an alkyl group having 1 to 12 carbon atoms, and more preferably an alkyl group having 1 to 6 carbon atoms.
R 12 is preferably a phenyl group or a naphthyl group, and the substituent is preferably an alkylsulfonylamino group, a vinylsulfonylamino group, an arylsulfonylamino group, an alkylcarbonylamino group, a vinylcarbonylamino group, or an arylcarbonylamino group. An alkylsulfonylamino group is preferred. The alkyl group having 1 to 12 carbon atoms may have an unsaturated bond, and examples of such a substituent include an allylsulfonylamino group.
 また、着色剤としては、酸性染料および/またはその誘導体が好適に使用できる場合がある。その他、直接染料、塩基性染料、媒染染料、酸性媒染染料、アゾイック染料、分散染料、油溶染料、食品染料、および/または、これらの誘導体等も有用に使用することができる。 In addition, as a colorant, an acid dye and / or a derivative thereof may be suitably used. In addition, a direct dye, a basic dye, a mordant dye, an acid mordant dye, an azoic dye, a disperse dye, an oil-soluble dye, a food dye, and / or a derivative thereof can be usefully used.
 以下に酸性染料の具体例を挙げるが、これらに限定されるものではない。例えば、 acid yellow 1,3,7,9,11,17,23,25,29,34,36,38,40、42,54,65,72,73,76,79,98,99,111,112,113,114,116,119,123,128,134,135,138,139,140,144,150、155,157,160,161,163,168,169,172,177,178,179,184,190,193,196,197,199,202,203,204,205,207,212,214,220,221,228,230,232,235,238,240,242,243,251;
 Direct Yellow 2,33,34,35,38,39,43,47,50,54,58,68,69,70,71,86,93,94,95,98,102,108,109,129,136,138,141;Food Yellow 3; Mordant Yellow 5,8,10,16,20,26,30,31,33,42,43,45,56,50,61,62,65;およびこれらの染料の誘導体が挙げられる。
Specific examples of the acid dye are shown below, but are not limited thereto. For example, acid yellow 1,3,7,9,11,17,23,25,29,34,36,38,40,42,54,65,72,73,76,79,98,99,111, 112, 113, 114, 116, 119, 123, 128, 134, 135, 138, 139, 140, 144, 150, 155, 157, 160, 161, 163, 168, 169, 172, 177, 178, 179, 184, 190, 193, 196, 197, 199, 202, 203, 204, 205, 207, 212, 214, 220, 221, 228, 230, 232, 235, 238, 240, 242, 243, 251;
Direct Yellow 2,33,34,35,38,39,43,47,50,54,58,68,69,70,71,86,93,94,95,98,102,108,109,129, 136, 138, 141; Food Yellow 3; Modern Yellow 5, 8, 10, 16, 20, 26, 30, 31, 33, 42, 43, 45, 56, 50, 61, 62, 65; and these dyes And derivatives thereof.
 また、顔料としては、上述した顔料を用いることができる。 Further, as the pigment, the above-described pigments can be used.
 本発明で用いる組成物における上述した黄色色素の配合量は、フタロシアニン染料100質量%に対し、好ましくは10~120質量%であることが好ましく、25~100質量%であることがさらに好ましく、50~90質量%であることが特に好ましい。 The blending amount of the above-described yellow pigment in the composition used in the present invention is preferably 10 to 120% by mass, more preferably 25 to 100% by mass with respect to 100% by mass of the phthalocyanine dye, It is particularly preferable that the content be ˜90% by mass.
[熱硬化性化合物]
 本発明の積層体を構成する着色硬化性組成物は、熱硬化性化合物を少なくとも一種を含有する。ここで、熱硬化性化合物とは、加熱により膜硬化が行なえるものをいい、通常、180℃以上の加熱で硬化する化合物をいう。
 本発明で用いる熱硬化性化合物は、例えば、熱硬化性官能基を有する化合物を用いることができる。熱硬化性官能基としては、例えば、エポキシ基、メチロール基、アルコキシメチル基、アシルオキシメチル基、イソシアネート基、ビニルエーテル基、およびメルカプト基から選ばれる少なくとも1つの基を有するものが好ましい。熱硬化性化合物としては、一分子内に熱硬化性官能基を2つ以上で有するものがより好ましく、1分子内にエポキシ基を2つ以上有する化合物がさらに好ましい。
 また、本発明で用いる熱硬化性化合物は、エポシキ化合物、メラミン化合物(例えば、アルコキシメチル化、アシルオキシメチル化メラミン化合物)、ウレア化合物(例えば、アルコキシメチル化、アシルオキシメチル化ウレア化合物)、フェノール化合物(例えば、ヒドロキシメチル化またはアルコキシメチル化フェノール化合物または樹脂、およびアルコキシメチルエーテル化フェノール化合物)等が好ましい例として挙げられ、エポキシ化合物、メラミン化合物がより好ましく、エポキシ化合物がさらに好ましい。
[Thermosetting compound]
The colored curable composition constituting the laminate of the present invention contains at least one thermosetting compound. Here, the thermosetting compound refers to a compound that can be cured by heating, and generally refers to a compound that is cured by heating at 180 ° C. or higher.
As the thermosetting compound used in the present invention, for example, a compound having a thermosetting functional group can be used. As the thermosetting functional group, for example, those having at least one group selected from an epoxy group, a methylol group, an alkoxymethyl group, an acyloxymethyl group, an isocyanate group, a vinyl ether group, and a mercapto group are preferable. As the thermosetting compound, those having two or more thermosetting functional groups in one molecule are more preferable, and compounds having two or more epoxy groups in one molecule are more preferable.
The thermosetting compound used in the present invention includes epoxy compounds, melamine compounds (for example, alkoxymethylated, acyloxymethylated melamine compounds), urea compounds (for example, alkoxymethylated, acyloxymethylated urea compounds), phenol compounds ( For example, preferred examples include hydroxymethylated or alkoxymethylated phenol compounds or resins, and alkoxymethyl etherified phenol compounds), epoxy compounds and melamine compounds are more preferred, and epoxy compounds are more preferred.
 本発明で用いる熱硬化性化合物は、低分子化合物(例えば、分子量2000未満、さらには、分子量1000未満)でもよいし、高分子化合物(例えば、分子量1000以上、ポリマーの場合は、重量平均分子量が1000以上)のいずれでもよい。本発明では、分子量1000以上のものが好ましく、2000~100000のものがより好ましい。本発明では、特に、1分子中に2つ以上のエポキシ基を有し、分子量が1000以上の化合物が好ましい。 The thermosetting compound used in the present invention may be a low molecular compound (for example, a molecular weight of less than 2000, and further a molecular weight of less than 1000), or a high molecular compound (for example, a molecular weight of 1000 or more, in the case of a polymer, the weight average molecular weight is 1000 or more). In the present invention, those having a molecular weight of 1000 or more are preferred, and those having a molecular weight of 2000 to 100,000 are more preferred. In the present invention, a compound having 2 or more epoxy groups in one molecule and a molecular weight of 1000 or more is particularly preferable.
<エポキシ化合物>
 エポキシ化合物が低分子化合物の場合、下記一般式(EP1)で表される化合物が挙げられる。
<Epoxy compound>
When the epoxy compound is a low molecular compound, a compound represented by the following general formula (EP1) can be mentioned.
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
 式(EP1)中、REP1~REP3は、それぞれ、水素原子、ハロゲン原子、アルキル基を表し、該アルキル基は、環状構造を有するものであってもよく、また、置換基を有していてもよい。またREP1とREP2、REP2とREP3は、互いに結合して環構造を形成していてもよい。アルキル基が有していてもよい置換基としては例えば、ヒドロキシル基、シアノ基、アルコキシ基、アルキルカルボニル基、アルコキシカルボニル基、アルキルカルボニルオキシ基、アルキルチオ基、アルキルスルホン基、アルキルスルホニル基、アルキルアミノ基、アルキルアミド基、などが挙げられる。
 QEPは、単結合もしくはnEP価の有機基を表す。REP1~REP3は、QEPとも結合して環構造を形成していても良い。
 nEPは、2以上の整数を表し、好ましくは2~10、更に好ましくは2~6である。但しQEPが単結合の場合、nEPは、2である。
In the formula (EP1), R EP1 to R EP3 each represent a hydrogen atom, a halogen atom, or an alkyl group, and the alkyl group may have a cyclic structure, and has a substituent. May be. R EP1 and R EP2 and R EP2 and R EP3 may be bonded to each other to form a ring structure. Examples of the substituent that the alkyl group may have include a hydroxyl group, a cyano group, an alkoxy group, an alkylcarbonyl group, an alkoxycarbonyl group, an alkylcarbonyloxy group, an alkylthio group, an alkylsulfone group, an alkylsulfonyl group, and an alkylamino group. Groups, alkylamide groups, and the like.
QEP represents a single bond or an nEP- valent organic group. R EP1 ~ R EP3 combines with Q EP may form a ring structure.
nEP represents an integer of 2 or more, preferably 2 to 10, and more preferably 2 to 6. However, n EP is 2 when Q EP is a single bond.
 QEPがnEP価の有機基の場合、鎖状もしくは環状のnEP価の飽和炭化水素基(炭素数2~20が好ましい)、nEP価の芳香環基(炭素数6~30が好ましい)、または鎖状もしくは環状の飽和炭化水素もしくは芳香族炭化水素に、エーテル基、エステル基、アミド基、スルホンアミド基、アルキレン基(炭素数1~4が好ましく、メチレン基がより好ましい)等の2価の連結基、-N(-)2等の3価の連結基またはこれらの組み合わせが連結した構造を有するnEP価の有機基などが好ましい。 When QEP is an nEP- valent organic group, a linear or cyclic nEP- valent saturated hydrocarbon group (preferably having 2 to 20 carbon atoms), nEP- valent aromatic ring group (preferably having 6 to 30 carbon atoms) ), Or a linear or cyclic saturated hydrocarbon or aromatic hydrocarbon such as an ether group, an ester group, an amide group, a sulfonamide group, an alkylene group (preferably having 1 to 4 carbon atoms, more preferably a methylene group), etc. A divalent linking group, a trivalent linking group such as —N (—) 2, or an n EP valent organic group having a structure in which a combination thereof is linked is preferable.
 以下にエポキシ構造を有する化合物の具体例を例示するが、本発明はこれらに限定されるものではない。 Specific examples of the compound having an epoxy structure are illustrated below, but the present invention is not limited thereto.
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 本発明で用いるエポキシ化合物は、側鎖にエポキシ基を有するオリゴマーやポリマーも好ましい。このような化合物としては、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、脂肪族エポキシ樹脂等を挙げることができる。
 これらの化合物は、市販品を用いてもよいし、ポリマーの側鎖へエポキシ基を導入することによっても得られる。
The epoxy compound used in the present invention is also preferably an oligomer or polymer having an epoxy group in the side chain. Examples of such compounds include bisphenol A type epoxy resins, bisphenol F type epoxy resins, phenol novolac type epoxy resins, cresol novolac type epoxy resins, aliphatic epoxy resins and the like.
These compounds may be used as commercial products or can be obtained by introducing an epoxy group into the side chain of the polymer.
 市販品としては、例えば、ビスフェノールA型エポキシ樹脂としては、JER827、JER828、JER834、JER1001、JER1002、JER1003、JER1055、JER1007、JER1009、JER1010(以上、ジャパンエポキシレジン(株)製)、EPICLON860、EPICLON1050、EPICLON1051、EPICLON1055(以上、DIC(株)製)等であり、ビスフェノールF型エポキシ樹脂としては、JER806、JER807、JER4004、JER4005、JER4007、JER4010(以上、ジャパンエポキシレジン(株)製)、EPICLON830、EPICLON835(以上、DIC(株)製)、LCE-21、RE-602S(以上、日本化薬(株)製)等であり、フェノールノボラック型エポキシ樹脂としては、JER152、JER154、JER157S70、JER157S65(以上、ジャパンエポキシレジン(株)製)、EPICLON N-740、EPICLON N-770、EPICLON N-775(以上、DIC(株)製)等であり、クレゾールノボラック型エポキシ樹脂としては、EPICLON N-660、EPICLON N-665、EPICLON N-670、EPICLON N-673、EPICLON N-680、EPICLON N-690、EPICLON N-695(以上、DIC(株)製)、EOCN-1020(以上、日本化薬(株)製)等であり、脂肪族エポキシ樹脂としては、ADEKA RESIN EP-4080S、同EP-4085S、同EP-4088S(以上、(株)ADEKA製)セロキサイド2021P、セロキサイド2081、セロキサイド2083、セロキサイド2085、EHPE3150、EPOLEAD PB 3600、同PB 4700(以上、ダイセル化学工業(株)製)、デナコール EX-212L、EX-214L、EX-216L、EX-321L、EX-850L(以上、ナガセケムテックス(株)製)等である。その他にも、ADEKA RESIN EP-4000S、同EP-4003S、同EP-4010S、同EP-4011S(以上、(株)ADEKA製)、NC-2000、NC-3000、NC-7300、XD-1000、EPPN-501、EPPN-502(以上、(株)ADEKA製)、JER1031S(ジャパンエポキシレジン(株)製)等が挙げられる。 As a commercial product, for example, as bisphenol A type epoxy resin, JER827, JER828, JER834, JER1001, JER1002, JER1003, JER1055, JER1007, JER1009, JER1010 (above, Japan Epoxy Resin Co., Ltd.), EPICLON860, EPICLON1050, EPICLON1051, EPICLON1055 (manufactured by DIC Corporation), etc., and bisphenol F type epoxy resin is JER806, JER807, JER4004, JER4005, JER4007, JER4010 (above, Japan Epoxy Resin Co., Ltd.), EPICLON830, EPICLON835. (Above DIC Corporation), LCE-21, RE-602S (above, Japan) YER152, JER154, JER157S70, JER157S65 (above, Japan Epoxy Resin Co., Ltd.), EPICLON N-740, EPICLON N-770, EPICLON N- 775 (manufactured by DIC Corporation), etc., and cresol novolak type epoxy resins include EPICLON N-660, EPICLON N-665, EPICLON N-670, EPICLON N-673, EPICLON N-680, EPICLON N- 690, EPICLON N-695 (manufactured by DIC Corporation), EOCN-1020 (manufactured by Nippon Kayaku Co., Ltd.), etc., and ADEKA RESIN EP as an aliphatic epoxy resin 4080S, EP-4085S, EP-4088S (above, manufactured by ADEKA Corporation) Celoxide 2021P, Celoxide 2081, Celoxide 2083, Celoxide 2085, EHPE3150, EPOLEEAD PB 3600, PB 4700 (above, Daicel Chemical Industries, Ltd.) Manufactured), Denacor EX-212L, EX-214L, EX-216L, EX-321L, EX-850L (above, manufactured by Nagase ChemteX Corporation). In addition, ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4010S, EP-4011S (above, manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, EPPN-501, EPPN-502 (above, manufactured by ADEKA Corporation), JER1031S (manufactured by Japan Epoxy Resin Co., Ltd.) and the like.
 ポリマー側鎖へ導入して合成する場合、導入反応は、例えばトリエチルアミン、ベンジルメチルアミン等の3級アミン、ドデシルトリメチルアンモニウムクロライド、テトラメチルアンモニウムクロライド、テトラエチルアンモニウムクロライド、等の4級アンモニウム塩、ピリジン、トリフェニルフォスフィン等を触媒として有機溶剤中、反応温度50~150℃で数時間~数十時間反応させることにより行える。脂環式エポキシ不飽和化合物の導入量は得られるポリマーの酸価が5~200KOH・mg/gを満たす範囲になるように制御すると好ましい。また、分子量は重量平均で500~5000000、更には1000~500000の範囲が好ましい。
 エポキシ不飽和化合物としてはグリシジル(メタ)アクリレートやアリルグリシジルエーテル等のエポキシ基としてグリシジル基を有するものも使用可能であるが、好ましいものは脂環式エポキシ基を有する不飽和化合物である。このようなものとしては例えば以下の化合物を例示することができる。
In the case of synthesizing by introducing into a polymer side chain, for example, the introduction reaction includes tertiary amines such as triethylamine and benzylmethylamine, quaternary ammonium salts such as dodecyltrimethylammonium chloride, tetramethylammonium chloride, tetraethylammonium chloride, pyridine, The reaction can be carried out in an organic solvent at a reaction temperature of 50 to 150 ° C. for several hours to several tens of hours using triphenylphosphine as a catalyst. The amount of the alicyclic epoxy unsaturated compound introduced is preferably controlled so that the acid value of the obtained polymer is in a range satisfying 5 to 200 KOH · mg / g. The molecular weight is preferably in the range of 500 to 5000000, more preferably 1000 to 500000 on a weight average.
As the epoxy unsaturated compound, those having a glycidyl group as an epoxy group such as glycidyl (meth) acrylate and allyl glycidyl ether can be used, but preferred are unsaturated compounds having an alicyclic epoxy group. Examples of such compounds include the following compounds.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
<メラミン化合物、ウレア化合物、その他の熱硬化性化合物>
 本発明で用いる熱硬化性化合物としては、以下のN-ヒドロキシメチル基、N-アルコキシメチル基、もしくはN-アシルオキシメチル基を有する化合物も好ましい。このような化合物は、通常、メラミン化合物、ウレア化合物として提供される。
<Melamine compounds, urea compounds, other thermosetting compounds>
As the thermosetting compound used in the present invention, compounds having the following N-hydroxymethyl group, N-alkoxymethyl group, or N-acyloxymethyl group are also preferable. Such a compound is usually provided as a melamine compound or a urea compound.
 N-ヒドロキシメチル基、N-アルコキシメチル基、もしくはN-アシルオキシメチル基を有する化合物としては、下記一般式(CLNM-1)で表される部分構造を2個以上(より好ましくは2~8個)有する化合物が好ましい。 The compound having an N-hydroxymethyl group, an N-alkoxymethyl group, or an N-acyloxymethyl group has two or more (more preferably 2 to 8) partial structures represented by the following general formula (CLNM-1). ) Is preferred.
Figure JPOXMLDOC01-appb-C000028
 一般式(CLNM-1)において、RNM1は、水素原子、アルキル基、シクロアルキル基またはオキソアルキル基を表す。
Figure JPOXMLDOC01-appb-C000028
In the general formula (CLNM-1), R NM1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an oxoalkyl group.
 一般式(CLNM-1)における、RNM1のアルキル基は、炭素数1~6の直鎖または分岐のアルキル基が好ましい。RNM1のシクロアルキル基は、炭素数5~6のシクロアルキル基が好ましい。RNM1のオキソアルキル基は、炭素数3~6のオキソアルキル基が好ましく、例えば、β‐オキソプロピル基、β‐オキソブチル基、β‐オキソペンチル基、β‐オキソへキシル基等を挙げることができる。 In general formula (CLNM-1), the alkyl group represented by R NM1 is preferably a linear or branched alkyl group having 1 to 6 carbon atoms. The cycloalkyl group of R NM1 is preferably a cycloalkyl group having 5 to 6 carbon atoms. The oxoalkyl group of R NM1 is preferably an oxoalkyl group having 3 to 6 carbon atoms, and examples thereof include a β-oxopropyl group, a β-oxobutyl group, a β-oxopentyl group, and a β-oxohexyl group. it can.
 一般式(CLNM-1)で表される部分構造を2個以上有する化合物のより好ましい態様として、下記一般式(CLNM-2)で表されるウレア化合物、下記一般式(CLNM-3)で表されるアルキレンウレア化合物、下記一般式(CLNM-4)で表されるグリコールウリル化合物、下記一般式(CLNM-5)で表されるメラミン化合物が挙げられる。 As a more preferable embodiment of the compound having two or more partial structures represented by the general formula (CLNM-1), a urea compound represented by the following general formula (CLNM-2), a compound represented by the following general formula (CLNM-3) An alkylene urea compound represented by the following general formula (CLNM-4), and a melamine compound represented by the following general formula (CLNM-5).
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 一般式(CLNM-2)において、RNM1は、それぞれ、一般式(CLNM-1)における、RNM1と同様のものである。RNM2は、それぞれ、水素原子、アルキル基(炭素数1~6が好ましい)、またはシクロアルキル基(炭素数5~6が好ましい)を表す。 In formula (CLNM-2), R NM1 respectively, in formula (CLNM-1), is the same as R NM1. R NM2 represents a hydrogen atom, an alkyl group (preferably having 1 to 6 carbon atoms), or a cycloalkyl group (preferably having 5 to 6 carbon atoms).
 一般式(CLNM-2)で表されるウレア化合物の具体例としては、例えば、N,N-ジ(メトキシメチル)ウレア、N,N-ジ(エトキシメチル)ウレア、N,N-ジ(プロポキシメチル)ウレア、N,N-ジ(イソプロポキシメチル)ウレア、N,N-ジ(ブトキシメチル)ウレア、N,N-ジ(t-ブトキシメチル)ウレア、N,N-ジ(シクロヘキシルオキシメチル)ウレア、N,N-ジ(シクロペンチルオキシメチル)ウレア、N,N-ジ(アダマンチルオキシメチル)ウレア、N,N-ジ(ノルボルニルオキシメチル)ウレア等が挙げられる。 Specific examples of the urea compound represented by the general formula (CLNM-2) include, for example, N, N-di (methoxymethyl) urea, N, N-di (ethoxymethyl) urea, N, N-di (propoxy). Methyl) urea, N, N-di (isopropoxymethyl) urea, N, N-di (butoxymethyl) urea, N, N-di (t-butoxymethyl) urea, N, N-di (cyclohexyloxymethyl) Examples include urea, N, N-di (cyclopentyloxymethyl) urea, N, N-di (adamantyloxymethyl) urea, N, N-di (norbornyloxymethyl) urea and the like.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
 一般式(CLNM-3)において、RNM1は、それぞれ、一般式(CLNM-1)における、RNM1と同様のものである。RNM3は、それぞれ、水素原子、ヒドロキシル基、直鎖または分岐のアルキル基(炭素数1~6が好ましい)、シクロアルキル基(炭素数5~6が好ましい)、オキソアルキル基(炭素数1~6が好ましい)、アルコキシ基(炭素数1~6が好ましい)またはオキソアルコキシ基(炭素数1~6が好ましい)を表す。
 Gは、単結合、酸素原子、硫黄原子、アルキレン基(炭素数1~3が好ましい)またはカルボニル基を表す。より具体的には、メチレン基、エチレン基、プロピレン基、1-メチルエチレン基、ヒドロキシメチレン基、シアノメチレン基等が挙げられる。
In formula (CLNM-3), R NM1 respectively, in formula (CLNM-1), is the same as R NM1. R NM3 represents a hydrogen atom, a hydroxyl group, a linear or branched alkyl group (preferably having 1 to 6 carbon atoms), a cycloalkyl group (preferably having 5 to 6 carbon atoms), an oxoalkyl group (having 1 to 6 carbon atoms). 6), an alkoxy group (preferably having 1 to 6 carbon atoms) or an oxoalkoxy group (preferably having 1 to 6 carbon atoms).
G represents a single bond, an oxygen atom, a sulfur atom, an alkylene group (preferably having 1 to 3 carbon atoms) or a carbonyl group. More specific examples include a methylene group, an ethylene group, a propylene group, a 1-methylethylene group, a hydroxymethylene group, a cyanomethylene group, and the like.
 一般式(CLNM-3)で表されるアルキレンウレア化合物の具体例としては、例えば、N,N-ジ(メトキシメチル)‐4,5-ジ(メトキシメチル)エチレンウレア、N,N-ジ(エトキシメチル)‐4,5-ジ(エトキシメチル)エチレンウレア、N,N-ジ(プロポキシメチル)‐4,5-ジ(プロポキシメチル)エチレンウレア、N,N-ジ(イソプロポキシメチル)‐4,5-ジ(イソプロポキシメチル)エチレンウレア、N,N-ジ(ブトキシメチル)‐4,5-ジ(ブトキシメチル)エチレンウレア、N,N-ジ(t-ブトキシメチル)‐4,5-ジ(t-ブトキシメチル)エチレンウレア、N,N-ジ(シクロヘキシルオキシメチル)‐4,5-ジ(シクロヘキシルオキシメチル)エチレンウレア、N,N-ジ(シクロペンチルオキシメチル)‐4,5-ジ(シクロペンチルオキシメチル)エチレンウレア、N,N-ジ(アダマンチルオキシメチル)‐4,5-ジ(アダマンチルオキシメチル)エチレンウレア、N,N-ジ(ノルボルニルオキシメチル)‐4,5-ジ(ノルボルニルオキシメチル)エチレンウレア等が挙げられる。 Specific examples of the alkylene urea compound represented by the general formula (CLNM-3) include, for example, N, N-di (methoxymethyl) -4,5-di (methoxymethyl) ethylene urea, N, N-di ( Ethoxymethyl) -4,5-di (ethoxymethyl) ethyleneurea, N, N-di (propoxymethyl) -4,5-di (propoxymethyl) ethyleneurea, N, N-di (isopropoxymethyl) -4 , 5-Di (isopropoxymethyl) ethyleneurea, N, N-di (butoxymethyl) -4,5-di (butoxymethyl) ethyleneurea, N, N-di (t-butoxymethyl) -4,5- Di (t-butoxymethyl) ethyleneurea, N, N-di (cyclohexyloxymethyl) -4,5-di (cyclohexyloxymethyl) ethyleneurea, N, N-di (cyclo Nthyloxymethyl) -4,5-di (cyclopentyloxymethyl) ethylene urea, N, N-di (adamantyloxymethyl) -4,5-di (adamantyloxymethyl) ethylene urea, N, N-di (nor And bornyloxymethyl) -4,5-di (norbornyloxymethyl) ethyleneurea.
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 一般式(CLNM-4)において、
NM1は、それぞれ、一般式(CLNM-1)における、RNM1と同様のものである。
NM4は、それぞれ、水素原子、ヒドロキシル基、アルキル基、シクロアルキル基またはアルコキシ基を表す。
In the general formula (CLNM-4),
R NM1 respectively, in formula (CLNM-1), is the same as R NM1.
R NM4 represents a hydrogen atom, a hydroxyl group, an alkyl group, a cycloalkyl group or an alkoxy group, respectively.
 RNM4のアルキル基(炭素数1~6が好ましい)、シクロアルキル基(炭素数5~6が好ましい)、アルコキシ基(炭素数1~6が好ましい)として、より具体的には、メチル基、エチル基、ブチル基、シクロペンチル基、シクロヘキシル基、メトキシ基、エトキシ基、ブトキシ基等が挙げられる。 R NM4 alkyl group (preferably having 1 to 6 carbon atoms), cycloalkyl group (preferably having 5 to 6 carbon atoms), alkoxy group (preferably having 1 to 6 carbon atoms), more specifically, methyl group, Examples include an ethyl group, a butyl group, a cyclopentyl group, a cyclohexyl group, a methoxy group, an ethoxy group, and a butoxy group.
 一般式(CLNM-4)で表されるグリコールウリル化合物の具体例としては、例えば、N,N,N,N-テトラ(メトキシメチル)グリコールウリル、N,N,N,N-テトラ(エトキシメチル)グリコールウリル、N,N,N,N-テトラ(プロポキシメチル)グリコールウリル、N,N,N,N-テトラ(イソプロポキシメチル)グリコールウリル、N,N,N,N-テトラ(ブトキシメチル)グリコールウリル、N,N,N,N-テトラ(t-ブトキシメチル)グリコールウリル、N,N,N,N-テトラ(シクロヘキシルオキシメチル)グリコールウリル、N,N,N,N-テトラ(シクロペンチルオキシメチル)グリコールウリル、N,N,N,N-テトラ(アダマンチルオキシメチル)グリコールウリル、N,N,N,N-テトラ(ノルボルニルオキシメチル)グリコールウリル等が挙げられる。 Specific examples of the glycoluril compound represented by the general formula (CLNM-4) include, for example, N, N, N, N-tetra (methoxymethyl) glycoluril, N, N, N, N-tetra (ethoxymethyl) ) Glycoluril, N, N, N, N-tetra (propoxymethyl) glycoluril, N, N, N, N-tetra (isopropoxymethyl) glycoluril, N, N, N, N-tetra (butoxymethyl) Glycoluril, N, N, N, N-tetra (t-butoxymethyl) glycoluril, N, N, N, N-tetra (cyclohexyloxymethyl) glycoluril, N, N, N, N-tetra (cyclopentyloxy) Methyl) glycoluril, N, N, N, N-tetra (adamantyloxymethyl) glycoluril, N, N, N, N- Tiger (norbornyloxymethyl) glycoluril, and the like.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
 一般式(CLNM-5)において、RNM1は、それぞれ、一般式(CLNM-1)における、RNM1と同様のものである。RNM5は、それぞれ、水素原子、アルキル基、シクロアルキル基、アリール基、または下記一般式(CLNM-5´)で表される原子団を表す。RNM6は、水素原子、アルキル基、シクロアルキル基、アリール基、または下記一般式(CLNM-5´´)で表される原子団を表す。 In formula (CLNM-5), R NM1 respectively, in formula (CLNM-1), is the same as R NM1. R NM5 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an atomic group represented by the following general formula (CLNM-5 ′). R NM6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an atomic group represented by the following general formula (CLNM-5 ″).
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 一般式(CLNM-5´)において、RNM1は、一般式(CLNM-1)における、RNM1と同様のものである。一般式(CLNM-5´´)において、RNM1は、一般式(CLNM-1)における、RNM1と同様のものであり、RNM5は、一般式(CLNM-5)におけるRNM5と同様のものである。 In formula (CLNM-5'), R NM1 is in the general formula (CLNM-1), is the same as R NM1. In formula (CLNM-5''), R NM1 is in the general formula (CLNM-1), is similar to the R NM1, R NM5, like the R NM5 in formula (CLNM-5) Is.
 RNM5およびRNM6のアルキル基(炭素数1~6が好ましい)、シクロアルキル基(炭素数5~6が好ましい)、アリール基(炭素数6~10が好ましい)として、より具体的には、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、t‐ブチル基、ペンチル基、シクロペンチル基、ヘキシル基、シクロヘキシル基、フェニル基、ナフチル基等が挙げられる。 Alkyl group R NM5 and R NM6 (preferably having 1 to 6 carbon atoms), a cycloalkyl group (preferably 5 to 6 carbon atoms), aryl group (preferably 6 to 10 carbon atoms), and more specifically, Examples thereof include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a t-butyl group, a pentyl group, a cyclopentyl group, a hexyl group, a cyclohexyl group, a phenyl group, and a naphthyl group.
 一般式(CLNM-5)で表されるメラミン化合物としては、例えば、N,N,N,N,N,N-ヘキサ(メトキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(エトキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(プロポキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(イソプロポキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(ブトキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(t-ブトキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(シクロヘキシルオキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(シクロペンチルオキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(アダマンチルオキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(ノルボルニルオキシメチル)メラミン、N,N,N,N,N,N-ヘキサ(メトキシメチル)アセトグアナミン、N,N,N,N,N,N-ヘキサ(エトキシメチル)アセトグアナミン、N,N,N,N,N,N-ヘキサ(プロポキシメチル)アセトグアナミン、N,N,N,N,N,N-ヘキサ(イソプロポキシメチル)アセトグアナミン、N,N,N,N,N,N-ヘキサ(ブトキシメチル)アセトグアナミン、N,N,N,N,N,N-ヘキサ(t-ブトキシメチル)アセトグアナミン、N,N,N,N,N,N-ヘキサ(メトキシメチル)ベンゾグアナミン、N,N,N,N,N,N-ヘキサ(エトキシメチル)ベンゾグアナミン、N,N,N,N,N,N-ヘキサ(プロポキシメチル)ベンゾグアナミン、N,N,N,N,N,N-ヘキサ(イソプロポキシメチル)ベンゾグアナミン、N,N,N,N,N,N-ヘキサ(ブトキシメチル)ベンゾグアナミン、N,N,N,N,N,N-ヘキサ(t-ブトキシメチル)ベンゾグアナミン、等が挙げられる。 Examples of the melamine compound represented by the general formula (CLNM-5) include N, N, N, N, N, N-hexa (methoxymethyl) melamine, N, N, N, N, N, N-hexa (Ethoxymethyl) melamine, N, N, N, N, N, N-hexa (propoxymethyl) melamine, N, N, N, N, N, N-hexa (isopropoxymethyl) melamine, N, N, N , N, N, N-hexa (butoxymethyl) melamine, N, N, N, N, N, N-hexa (t-butoxymethyl) melamine, N, N, N, N, N, N-hexa (cyclohexyl) Oxymethyl) melamine, N, N, N, N, N, N-hexa (cyclopentyloxymethyl) melamine, N, N, N, N, N, N-hexa (adamantyloxymethyl) melamine, N, N, N , N, N, N-hexa ( Rubornyloxymethyl) melamine, N, N, N, N, N, N-hexa (methoxymethyl) acetoguanamine, N, N, N, N, N, N-hexa (ethoxymethyl) acetoguanamine, N, N, N, N, N, N-hexa (propoxymethyl) acetoguanamine, N, N, N, N, N, N-hexa (isopropoxymethyl) acetoguanamine, N, N, N, N, N, N -Hexa (butoxymethyl) acetoguanamine, N, N, N, N, N, N-hexa (t-butoxymethyl) acetoguanamine, N, N, N, N, N, N-hexa (methoxymethyl) benzoguanamine, N, N, N, N, N, N-hexa (ethoxymethyl) benzoguanamine, N, N, N, N, N, N-hexa (propoxymethyl) benzoguanamine, N, N, N, N, N, N Hexa (isopropoxymethyl) benzoguanamine, N, N, N, N, N, N-hexa (butoxymethyl) benzoguanamine, N, N, N, N, N, N-hexa (t-butoxymethyl) benzoguanamine, etc. Can be mentioned.
 一般式(CLNM-1)~(CLNM-5)における、RNM1~RNM6で表される基は、更に置換基を有してもよい。RNM1~RNM6が有してもよい置換基としては、例えば、ハロゲン原子、水酸基、ニトロ基、シアノ基、カルボキシル基、シクロアルキル基(好ましくは炭素数3~20)、アリール基(好ましくは炭素数6~14)、アルコキシ基(好ましくは炭素数1~20)、シクロアルコキシ基(好ましくは炭素数3~20)、アシル基(好ましくは炭素数2~20)、アシルオキシ基(好ましくは炭素数2~20)等を挙げることができる。
 以下に、上記一般式(CLNM-1)で表される部分構造を2個以上有する化合物の具体例を例示するが、本発明はこれらに限定されるものではない。下記に示す化合物に加え、下記に例示されていない三和ケミカル社製、ニカラックシリーズの化合物も好ましく用いることができる。
The groups represented by R NM1 to R NM6 in the general formulas (CLNM-1) to (CLNM-5) may further have a substituent. Examples of the substituent that R NM1 to R NM6 may have include, for example, a halogen atom, a hydroxyl group, a nitro group, a cyano group, a carboxyl group, a cycloalkyl group (preferably having 3 to 20 carbon atoms), an aryl group (preferably 6 to 14 carbon atoms), alkoxy group (preferably 1 to 20 carbon atoms), cycloalkoxy group (preferably 3 to 20 carbon atoms), acyl group (preferably 2 to 20 carbon atoms), acyloxy group (preferably carbon atoms) 2 to 20).
Specific examples of the compound having two or more partial structures represented by the general formula (CLNM-1) are illustrated below, but the present invention is not limited thereto. In addition to the compounds shown below, compounds from Sanwa Chemical Co., Ltd. and Nicarac series which are not exemplified below can also be preferably used.
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
<フェノール化合物>
 フェノール化合物としては、分子内にベンゼン環を3~5個含み、更にヒドロキシメチル基またはアルコキシメチル基を合わせて2個以上有し、そのヒドロキシメチル基、アルコキシメチル基を少なくともいずれかのベンゼン環に集中させ、あるいは振り分けて結合してなるフェノール化合物を挙げることができる。ベンゼン環に結合するアルコキシメチル基としては、炭素数6個以下のものが好ましい。具体的にはメトキシメチル基、エトキシメチル基、n-プロポキシメチル基、i-プロポキシメチル基、n-ブトキシメチル基、i-ブトキシメチル基、sec-ブトキシメチル基、t-ブトキシメチル基が好ましい。更に、2-メトキシエトキシ基および、2-メトキシ-1-プロポキシ基の様に、アルコキシ置換されたアルコキシ基も好ましい。
 熱硬化性化合物は、分子内にベンゼン環を2個以上有するフェノール化合物であることがより好ましく、また、窒素原子を含まないフェノール化合物であることが好ましい。
 熱硬化性化合物は、熱硬化性官能基を1分子あたり2~8個有するフェノール化合物であることが好ましく、熱硬化性官能基を3~6個有することがより好ましい。
<Phenol compound>
The phenol compound contains 3 to 5 benzene rings in the molecule, and further has two or more hydroxymethyl groups or alkoxymethyl groups. Mention may be made of phenolic compounds which are concentrated or distributed and bonded. As the alkoxymethyl group bonded to the benzene ring, those having 6 or less carbon atoms are preferable. Specifically, methoxymethyl group, ethoxymethyl group, n-propoxymethyl group, i-propoxymethyl group, n-butoxymethyl group, i-butoxymethyl group, sec-butoxymethyl group, and t-butoxymethyl group are preferable. Furthermore, alkoxy-substituted alkoxy groups such as 2-methoxyethoxy group and 2-methoxy-1-propoxy group are also preferable.
The thermosetting compound is more preferably a phenol compound having two or more benzene rings in the molecule, and is preferably a phenol compound containing no nitrogen atom.
The thermosetting compound is preferably a phenol compound having 2 to 8 thermosetting functional groups per molecule, and more preferably 3 to 6 thermosetting functional groups.
 これらのフェノール化合物の内、特に好ましいものを以下に挙げる。式中、L1~L8はアルコキシメチル基等の熱硬化性官能基を示し、同じであっても異なっていてもよく、熱硬化性官能基としては好ましくはヒドロキシメチル基、メトキシメチル基またはエトキシメチル基を示す。 Among these phenol compounds, particularly preferable ones are listed below. In the formula, L 1 to L 8 represent a thermosetting functional group such as an alkoxymethyl group, which may be the same or different, and the thermosetting functional group is preferably a hydroxymethyl group, a methoxymethyl group or An ethoxymethyl group is shown.
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
 熱硬化性化合物は、市販されているものを用いることもでき、また公知の方法で合成することもできる。例えば、ヒドロキシメチル基を有するフェノール化合物は、対応するヒドロキシメチル基を有さないフェノール化合物(上記式においてL1~L8が水素原子である化合物)とホルムアルデヒドを塩基触媒下で反応させることによって得ることができる。この際、樹脂化やゲル化を防ぐために、反応温度を60℃以下で行うことが好ましい。具体的には、特開平6-282067号、特開平7-64285号公報等に記載されている方法にて合成することができる。 As the thermosetting compound, a commercially available one can be used, or it can be synthesized by a known method. For example, a phenol compound having a hydroxymethyl group is obtained by reacting a corresponding phenol compound having no hydroxymethyl group (a compound in which L 1 to L 8 are hydrogen atoms in the above formula) with formaldehyde in the presence of a base catalyst. be able to. At this time, in order to prevent resinification or gelation, the reaction temperature is preferably 60 ° C. or lower. Specifically, they can be synthesized by the methods described in JP-A-6-282067, JP-A-7-64285 and the like.
 アルコキシメチル基を有するフェノール化合物は、対応するヒドロキシメチル基を有するフェノール化合物とアルコールを酸触媒下で反応させることによって得ることができる。この際、樹脂化やゲル化を防ぐために、反応温度を100℃以下で行うことが好ましい。具体的には、EP632003A1等に記載されている方法にて合成することができる。このようにして合成されたヒドロキシメチル基またはアルコキシメチル基を有するフェノール化合物は、保存時の安定性の点で好ましいが、アルコキシメチル基を有するフェノール化合物は保存時の安定性の観点から特に好ましい。ヒドロキシメチル基またはアルコキシメチル基を合わせて2個以上有し、いずれかのベンゼン環に集中させ、あるいは振り分けて結合してなるこのようなフェノール化合物は、単独で使用してもよく、また2種以上を組み合わせて使用してもよい。 A phenol compound having an alkoxymethyl group can be obtained by reacting a corresponding phenol compound having a hydroxymethyl group with an alcohol in the presence of an acid catalyst. At this time, in order to prevent resinification and gelation, the reaction temperature is preferably 100 ° C. or lower. Specifically, it can be synthesized by the method described in EP632003A1 and the like. A phenol compound having a hydroxymethyl group or an alkoxymethyl group synthesized in this manner is preferable from the viewpoint of stability during storage, but a phenol compound having an alkoxymethyl group is particularly preferable from the viewpoint of stability during storage. Such a phenol compound having two or more hydroxymethyl groups or alkoxymethyl groups in total and concentrated on any benzene ring or distributed and bonded may be used alone or in combination of two kinds. A combination of the above may also be used.
 本発明において、熱硬化性化合物は単独で用いてもよいし、2種以上組み合わせて用いてもよい。 In the present invention, the thermosetting compound may be used alone or in combination of two or more.
 本発明の積層体を構成する着色硬化性組成物中における熱硬化性化合物の総含有量としては、素材により異なるが、着色硬化性組成物の全固形分(質量)に対して、5~40質量%が好ましく、7~35質量%がより好ましく、10~30質量%が特に好ましい。本発明では、このような熱硬化性化合物の配合量とすることにより、耐薬品性に優れた硬化膜を得られるという効果が得られる。 The total content of the thermosetting compound in the colored curable composition constituting the laminate of the present invention varies depending on the material, but is 5 to 40 with respect to the total solid content (mass) of the colored curable composition. % By mass is preferable, 7 to 35% by mass is more preferable, and 10 to 30% by mass is particularly preferable. In this invention, the effect that the cured film excellent in chemical-resistance can be obtained by setting it as the compounding quantity of such a thermosetting compound is acquired.
[溶剤]
 本発明の積層体を構成する着色硬化性組成物は、染料および熱硬化性化合物を少なくとも溶解する溶剤(通常、有機溶剤)を含む。
 有機溶剤としては、エステル類として、例えば、酢酸エチル、酢酸-n-ブチル、酢酸イソブチル、ギ酸アミル、酢酸イソアミル、酢酸イソブチル、プロピオン酸ブチル、酪酸イソプロピル、酪酸エチル、酪酸ブチル、乳酸メチル、乳酸エチル、オキシ酢酸アルキル(例:オキシ酢酸メチル、オキシ酢酸エチル、オキシ酢酸ブチル(例えば、メトキシ酢酸メチル、メトキシ酢酸エチル、メトキシ酢酸ブチル、エトキシ酢酸メチル、エトキシ酢酸エチル等))、3-オキシプロピオン酸アルキルエステル類(例:3-オキシプロピオン酸メチル、3-オキシプロピオン酸エチル等(例えば、3-メトキシプロピオン酸メチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル等))、2-オキシプロピオン酸アルキルエステル類(例:2-オキシプロピオン酸メチル、2-オキシプロピオン酸エチル、2-オキシプロピオン酸プロピル等(例えば、2-メトキシプロピオン酸メチル、2-メトキシプロピオン酸エチル、2-メトキシプロピオン酸プロピル、2-エトキシプロピオン酸メチル、2-エトキシプロピオン酸エチル))、2-オキシ-2-メチルプロピオン酸メチルおよび2-オキシ-2-メチルプロピオン酸エチル(例えば、2-メトキシ-2-メチルプロピオン酸メチル、2-エトキシ-2-メチルプロピオン酸エチル等)、ピルビン酸メチル、ピルビン酸エチル、ピルビン酸プロピル、アセト酢酸メチル、アセト酢酸エチル、2-オキソブタン酸メチル、2-オキソブタン酸エチル等、ならびに、エーテル類として、例えば、ジエチレングリコールジメチルエーテル、テトラヒドロフラン、エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、メチルセロソルブアセテート、エチルセロソルブアセテート、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノブチルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテルアセテート、プロピレングリコールモノプロピルエーテルアセテート等、ならびに、ケトン類として、例えば、メチルエチルケトン、シクロヘキサノン、2-ヘプタノン、3-ヘプタノン等、ならびに、芳香族炭化水素類として、例えば、トルエン、キシレン等が好適に挙げられる。
[solvent]
The colored curable composition which comprises the laminated body of this invention contains the solvent (usually organic solvent) which melt | dissolves a dye and a thermosetting compound at least.
Examples of organic solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and ethyl lactate. , Alkyl oxyacetates (eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)), alkyl 3-oxypropionate Esters (eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, etc.) )), 2- Xylpropionic acid alkyl esters (eg, methyl 2-oxypropionate, ethyl 2-oxypropionate, propyl 2-oxypropionate, etc. (eg, methyl 2-methoxypropionate, ethyl 2-methoxypropionate, 2-methoxy) Propyl propionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), methyl 2-oxy-2-methylpropionate and ethyl 2-oxy-2-methylpropionate (for example, 2-methoxy-2- Methyl methyl propionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, methyl 2-oxobutanoate, ethyl 2-oxobutanoate, etc. As well as ethers For example, diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, etc., and ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc., and aromatic hydrocarbons such as, for example, Preferred examples include ruene and xylene.
 これらの溶剤は、塗布面状の改良などの観点から、2種以上を混合する形態も好ましい。この場合、特に好ましくは、上記の3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、シクロヘキサノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールメチルエーテル、およびプロピレングリコールメチルエーテルアセテートから選択される2種以上で構成される混合溶液である。 These solvents are preferably mixed in two or more types from the viewpoint of improving the coated surface. In this case, particularly preferably, the above-mentioned methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl It is a mixed solution composed of two or more selected from carbitol acetate, butyl carbitol acetate, propylene glycol methyl ether, and propylene glycol methyl ether acetate.
 着色硬化性組成物中における溶剤の含有量は、塗布性の観点から、着色硬化性組成物の全固形分濃度が5~30質量%になる量とすることが好ましく、7~25質量%が更に好ましく、10~20質量%が特に好ましい。 The content of the solvent in the colored curable composition is preferably such that the total solid concentration of the colored curable composition is 5 to 30% by mass, and 7 to 25% by mass from the viewpoint of applicability. More preferred is 10 to 20% by mass.
<各種添加物>
 本発明の積層体を構成する着色硬化性組成物は、本発明の効果を損なわない範囲で、必要に応じて、各種添加物、例えば、界面活性剤、酸無水物、硬化剤、硬化触媒、充填剤、密着促進剤、酸化防止剤、紫外線吸収剤、凝集防止剤等を配合することができる。
<Various additives>
The colored curable composition constituting the laminate of the present invention is, as necessary, various additives such as surfactants, acid anhydrides, curing agents, curing catalysts, as long as the effects of the present invention are not impaired. A filler, an adhesion promoter, an antioxidant, an ultraviolet absorber, an aggregation inhibitor, and the like can be blended.
<界面活性剤>
 本発明の積層体を構成する着色硬化性組成物は、塗布性をより向上させる観点から、各種の界面活性剤を添加してもよい。界面活性剤としては、フッ素系界面活性剤、ノニオン系界面活性剤、カチオン系界面活性剤、アニオン系界面活性剤、シリコーン系界面活性剤などの各種界面活性剤を使用できる。
<Surfactant>
Various surfactants may be added to the colored curable composition constituting the laminate of the present invention from the viewpoint of further improving coatability. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
 特に、本発明の積層体を構成する着色硬化性組成物は、フッ素系界面活性剤を含有することで、塗布液として調製したときの液特性(特に、流動性)がより向上することから、塗布厚の均一性や省液性をより改善することができる。
 すなわち、フッ素系界面活性剤を含有する着色硬化性組成物を適用した塗布液を用いて膜形成する場合においては、被塗布面と塗布液との界面張力を低下させることにより、被塗布面への濡れ性が改善され、被塗布面への塗布性が向上する。このため、少量の液量で数μm程度の薄膜を形成した場合であっても、厚みムラの小さい均一厚の膜形成をより好適に行える点で有効である。
In particular, since the colored curable composition constituting the laminate of the present invention contains a fluorine-based surfactant, liquid properties (particularly, fluidity) when prepared as a coating liquid are further improved. The uniformity of coating thickness and liquid-saving property can be further improved.
That is, in the case of forming a film using a coating liquid to which a colored curable composition containing a fluorosurfactant is applied, by reducing the interfacial tension between the coated surface and the coating liquid, The wettability is improved, and the coating property to the coated surface is improved. For this reason, even when a thin film of about several μm is formed with a small amount of liquid, it is effective in that it is possible to more suitably form a film having a uniform thickness with small thickness unevenness.
 フッ素系界面活性剤中のフッ素含有率は、3質量%~40質量%が好適であり、より好ましくは5質量%~30質量%であり、特に好ましくは7質量%~25質量%である。フッ素含有率がこの範囲内であるフッ素系界面活性剤は、塗布膜の厚さの均一性や省液性の点で効果的であり、着色硬化性組成物中における溶解性も良好である。 The fluorine content in the fluorosurfactant is preferably 3% by mass to 40% by mass, more preferably 5% by mass to 30% by mass, and particularly preferably 7% by mass to 25% by mass. A fluorine-based surfactant having a fluorine content in this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in a colored curable composition.
 フッ素系界面活性剤としては、例えば、メガファックF781(以上、DIC(株)製)等が挙げられる。 Examples of the fluorosurfactant include MegaFuck F781 (manufactured by DIC Corporation).
 界面活性剤は、1種のみを用いてもよいし、2種類以上を組み合わせてもよい。 Only one type of surfactant may be used, or two or more types may be combined.
 着色硬化性組成物は、界面活性剤を含有してもしなくても良いが、含有する場合、界面活性剤の添加量は、着色硬化性組成物の全質量に対して、0.001質量%~2.0質量%が好ましく、より好ましくは0.005質量%~1.0質量%である。 The colored curable composition may or may not contain a surfactant, but when it is contained, the addition amount of the surfactant is 0.001% by mass relative to the total mass of the colored curable composition. The content is preferably -2.0% by mass, more preferably 0.005% -1.0% by mass.
 なお、界面活性剤が高分子化合物(すなわち樹脂)である場合、その高分子化合物の固形分酸価は、80mgKOH/g以下とされる。 In addition, when the surfactant is a polymer compound (that is, a resin), the solid content acid value of the polymer compound is 80 mgKOH / g or less.
<酸無水物>
 本発明の積層体を構成する着色硬化性組成物は、酸無水物を含有しても良い。酸無水物を含有することにより、熱硬化性化合物、特にエポキシ化合物の熱硬化による架橋性を向上させることができる。
<Acid anhydride>
The colored curable composition constituting the laminate of the present invention may contain an acid anhydride. By containing an acid anhydride, it is possible to improve the crosslinkability of the thermosetting compound, particularly the epoxy compound, by thermosetting.
 酸無水物としては、例えば、フタル酸無水物、ナジック酸無水物、マレイン酸無水物、琥珀酸無水物などが挙げられる。中でも、酸無水物は、顔料分散への影響が少ない点で、フタル酸無水物が好ましい。 エポキシ硬化剤としてアミン系化合物も一般的であるが、ポットライフが比較的長いなどの利点がある。 Examples of the acid anhydride include phthalic acid anhydride, nadic acid anhydride, maleic acid anhydride, and succinic acid anhydride. Among these, phthalic anhydride is preferable because the acid anhydride has little influence on pigment dispersion. An amine compound is generally used as an epoxy curing agent, but has advantages such as a relatively long pot life.
 酸無水物の着色硬化性組成物中における含有量としては、熱硬化性化合物(特にエポキシ化合物)の含有量に対して、10~40質量%の範囲が好ましく、15~30質量%の範囲がより好ましい。酸無水物の含有量は、10質量%以上であると熱硬化性化合物、特にエポキシの架橋密度が向上し、機械的強度を高めることができ、30質量%以下であると塗膜中の熱硬化成分が抑制され、色材の濃度を高めるのに有利である。 The content of the acid anhydride in the colored curable composition is preferably in the range of 10 to 40% by mass, and in the range of 15 to 30% by mass with respect to the content of the thermosetting compound (particularly the epoxy compound). More preferred. When the content of the acid anhydride is 10% by mass or more, the crosslinking density of the thermosetting compound, particularly epoxy, can be improved, and the mechanical strength can be increased. Curing components are suppressed, which is advantageous for increasing the concentration of the coloring material.
<硬化剤>
 熱硬化性化合物としてエポキシ樹脂を使用する場合、硬化剤を添加することが好ましい。エポキシ樹脂の硬化剤は種類が非常に多く、性質、樹脂と硬化剤との混合物の可使時間、粘度、硬化温度、硬化時間、発熱などが使用する硬化剤の種類によって非常に異なるため、硬化剤の使用目的、使用条件、作業条件などによって適当な硬化剤を選ばねばならない。硬化剤に関しては、垣内弘編「エポキシ樹脂(昇晃堂)」第5章に詳しく解説されている。以下、硬化剤の例を示す。
<Curing agent>
When using an epoxy resin as the thermosetting compound, it is preferable to add a curing agent. There are many types of curing agents for epoxy resins, and the properties, the pot life of the mixture of resin and curing agent, viscosity, curing temperature, curing time, heat generation, etc. vary greatly depending on the type of curing agent used. An appropriate curing agent must be selected according to the purpose of use, use conditions, working conditions, and the like. The curing agent is explained in detail in Chapter 5 of Hiroshi Kakiuchi “Epoxy resin (Shojodo)”. Examples of curing agents are shown below.
 触媒的に作用するものとしては、第三アミン類、三フッ化ホウ素-アミンコンプレックス、エポキシ樹脂の官能基と化学量論的に反応するものとして、ポリアミン、酸無水物等;また、常温硬化のものとして、ジエチレントリアミン、ポリアミド樹脂、中温硬化のものの例としてジエチルアミノプロピルアミン、トリス(ジメチルアミノメチル)フェノール;高温硬化の例として、無水フタル酸、メタフェニレンジアミン等がある。また化学構造別にみるとアミン類では、脂肪族ポリアミンとしてはジエチレントリアミン;芳香族ポリアミンとしてはメタフェニレンジアミン;第三アミンとしてはトリス(ジメチルアミノメチル)フェノール;酸無水物としては無水フタル酸、ポリアミド樹脂、ポリスルフィド樹脂、三フッ化ホウ素-モノエチルアミンコンプレックス;合成樹脂初期縮合物としてはフェノール樹脂、その他ジシアンジアミド等が挙げられる。 Those that act catalytically include tertiary amines, boron trifluoride-amine complexes, those that react stoichiometrically with functional groups of epoxy resins, polyamines, acid anhydrides, etc .; Examples include diethylenetriamine, polyamide resin, and medium temperature curing examples such as diethylaminopropylamine and tris (dimethylaminomethyl) phenol; examples of high temperature curing include phthalic anhydride and metaphenylenediamine. In terms of chemical structure, for amines, diethylenetriamine as an aliphatic polyamine; metaphenylenediamine as an aromatic polyamine; tris (dimethylaminomethyl) phenol as a tertiary amine; phthalic anhydride as an acid anhydride; polyamide resin Polysulfide resin, boron trifluoride-monoethylamine complex; Synthetic resin initial condensate includes phenol resin, dicyandiamide and the like.
 これら硬化剤は、加熱によりエポキシ基と反応し、重合することによって架橋密度が上がり硬化するものである。薄膜化のためには、バインダー、硬化剤とも極力少量の方が好ましく、特に硬化剤に関しては熱硬化性化合物に対して35質量%以下、好ましくは30質量%以下、さらに好ましくは25質量%以下とすることが好ましい。 These curing agents react with an epoxy group by heating and polymerize to increase the crosslinking density and cure. For thinning, both the binder and the curing agent are preferably as small as possible. In particular, the curing agent is 35% by mass or less, preferably 30% by mass or less, more preferably 25% by mass or less with respect to the thermosetting compound. It is preferable that
<硬化触媒>
 着色剤濃度の高い組成を実現するためには、硬化剤との反応による硬化のほか、主としてエポキシ基同士の反応による硬化が有効である。このため、硬化剤は用いず、硬化触媒を使用することもできる。硬化触媒の添加量としては、エポキシ当量が150~200程度のエポキシ樹脂に対して、質量基準で1/10~1/1000程度、好ましくは1/20~1/500程度さらに好ましくは1/30~1/250程度のわずかな量で硬化させることが可能である。
<Curing catalyst>
In order to realize a composition having a high colorant concentration, curing by reaction between epoxy groups is effective in addition to curing by reaction with a curing agent. For this reason, a curing catalyst can be used without using a curing agent. The addition amount of the curing catalyst is about 1/10 to 1/1000, preferably about 1/20 to 1/500, more preferably about 1/30, based on the weight of the epoxy resin having an epoxy equivalent of about 150 to 200. It can be cured with a small amount of about 1/250.
<着色硬化性組成物の調製方法>
 本発明の積層体を構成する着色硬化性組成物の好ましい調製方法について説明する。但し、本発明はこれに限定されるものではない。
<Preparation method of colored curable composition>
The preferable preparation method of the colored curable composition which comprises the laminated body of this invention is demonstrated. However, the present invention is not limited to this.
 着色剤が染料の場合は、熱硬化性化合物とともに溶剤に溶解させる。着色剤として顔料を含む場合、通常、上述したように顔料分散物として調製してから配合する。 If the colorant is a dye, dissolve it in a solvent together with the thermosetting compound. When a pigment is included as a colorant, it is usually blended after preparing as a pigment dispersion as described above.
 特に、熱硬化性化合物がエポキシ化合物である場合、このようにして得られた顔料の分散物または染料の溶液に熱硬化性化合物と硬化触媒や硬化剤とを添加、あるいは既にバインダーが熱硬化性化合物である場合には、硬化触媒や硬化剤を添加して熱硬化機能を付与し、必要に応じて溶剤を添加することで本発明における着色硬化性組成物を調製することが好ましい。 In particular, when the thermosetting compound is an epoxy compound, a thermosetting compound and a curing catalyst or a curing agent are added to the pigment dispersion or dye solution thus obtained, or the binder is already thermosetting. In the case of a compound, it is preferable to prepare the colored curable composition in the present invention by adding a curing catalyst or a curing agent to impart a thermosetting function, and adding a solvent as necessary.
<フィルターろ過>
 本発明の積層体を構成する着色硬化性組成物は、異物の除去や欠陥の低減などの目的で、フィルターで濾過することが好ましい。
 フィルターろ過に用いるフィルターとしては、従来からろ過用途等に用いられているフィルターであれば特に限定されることなく用いることができる。
 上記フィルターの材質の例としては、PTFE(ポリテトラフルオロエチレン)等のフッ素樹脂;ナイロン-6、ナイロン-6,6等のポリアミド系樹脂;ポリエチレン、ポリプロピレン(PP)等のポリオレフィン樹脂(高密度、超高分子量を含む);等が挙げられる。これら素材の中でもポリプロピレン(高密度ポリプロピレンを含む)が好ましい。
<Filter filtration>
The colored curable composition constituting the laminate of the present invention is preferably filtered with a filter for the purpose of removing foreign substances or reducing defects.
As a filter used for filter filtration, if it is a filter conventionally used for the filtration use etc., it can use without being specifically limited.
Examples of the material of the filter include: a fluororesin such as PTFE (polytetrafluoroethylene); a polyamide resin such as nylon-6 and nylon-6, 6; a polyolefin resin such as polyethylene and polypropylene (PP) (high density, Including ultra high molecular weight); Among these materials, polypropylene (including high density polypropylene) is preferable.
 上記フィルターの孔径には特に限定はないが、例えば0.01~20.0μm程度であり、好ましくは0.01~5μm程度であり、さらに好ましくは0.01~2.0μm程度である。
 フィルターの孔径を上記範囲とすることにより、微細な粒子をより効果的に取り除くことができ、濁度をより低減することができる。
 ここで、フィルターの孔径は、フィルタメーカーの公称値を参照することができる。市販のフィルターとしては、例えば、日本ポール株式会社、アドバンテック東洋株式会社、日本インテグリス株式会社(旧日本マイクロリス株式会社)または株式会社キッツマイクロフィルタ等が提供する各種フィルターの中から選択することができる。
The pore size of the filter is not particularly limited, but is, for example, about 0.01 to 20.0 μm, preferably about 0.01 to 5 μm, and more preferably about 0.01 to 2.0 μm.
By setting the pore size of the filter within the above range, fine particles can be more effectively removed and turbidity can be further reduced.
Here, the pore size of the filter can refer to the nominal value of the filter manufacturer. As a commercially available filter, for example, it can be selected from various filters provided by Nippon Pole Co., Ltd., Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.) or KITZ Micro Filter Co., Ltd. .
 上記フィルターろ過では、2種以上のフィルターを組み合わせて用いてもよい。
 例えば、まず第1のフィルターを用いてろ過を行い、次に、第1のフィルターとは孔径が異なる第2のフィルターを用いてろ過を行うことができる。
 その際、第1のフィルターでのフィルタリングおよび第2のフィルターでのフィルタリングは、それぞれ、1回のみでもよいし、2回以上行ってもよい。
 第2のフィルターは、上述した第1のフィルターと同様の材料等で形成されたものを使用することができる。
In the filter filtration, two or more filters may be used in combination.
For example, the filtration can be performed first using a first filter and then using a second filter having a pore diameter different from that of the first filter.
At that time, the filtering by the first filter and the filtering by the second filter may be performed only once or may be performed twice or more, respectively.
As the second filter, a filter formed of the same material as the first filter described above can be used.
[着色層]
 上述した着色硬化性組成物を硬化させることにより、本発明の積層体を構成する着色層とすることができる。着色層の形成方法については、後述する。この着色層は、カラーフィルタの着色層として好ましく用いることができる。特に、ドライエッチング用着色硬化性組成物として好ましく用いることができる。
 本発明において、着色層の厚さは、0.1~1.0μmであることが好ましく、0.3~0.8μmであることがより好ましい。本発明では、着色層における着色剤の濃度を高めることができるので、このような薄膜化が可能になる。
[Colored layer]
It can be set as the colored layer which comprises the laminated body of this invention by hardening the colored curable composition mentioned above. A method for forming the colored layer will be described later. This colored layer can be preferably used as a colored layer of a color filter. In particular, it can be preferably used as a colored curable composition for dry etching.
In the present invention, the thickness of the colored layer is preferably 0.1 to 1.0 μm, and more preferably 0.3 to 0.8 μm. In this invention, since the density | concentration of the coloring agent in a colored layer can be raised, such a film thinning is attained.
[酸素遮断膜]
 本発明の積層体は、上述した着色層上に、酸素遮断膜を有する。この酸素遮断膜は、酸素遮断性化合物を用いて形成され、高い酸素遮断能、高透明性および低光散乱性を示す。
 ここで、膜面荒れとは、着色層の表面に凝集物が多数発生することにより、着色層の表面に多数の凹凸が形成された状態をいう。着色層表面において膜面荒れが発生する要因としては、一重項酸素が着色層中のポリマー成分(熱硬化性化合物の硬化物)を分解し、着色剤とポリマー成分が相分離を起こして、着色剤同士が凝集体を形成することで発生すると考えられる。そして、着色剤の濃度が高いほど、着色層中のポリマー成分の量が少なくなるため、着色剤同士が凝集体をより形成しやすくなり、着色層表面における膜面荒れが発生やすくなると考えられる。特に、本願発明者が検討したところ、着色硬化性組成物中の着色剤の固形分濃度が50質量%を超える場合に、さらには60質量%を超える場合に顕著に膜面荒れが発生することを見出した。特にこの傾向は、高温高湿下において、顕著に起こりやすいことも分かった。
 酸素遮断膜に含有される酸素遮断性化合物としては、無機材料および有機材料のいずれでもよく、無機材料が好ましい。具体的には、金属酸化物、金属アルコキシ基含有化合物、有機ポリマーなどを用いることができる。なお、酸素遮断膜は、酸素遮断能により優れる点で、実質的に上記酸素遮断性化合物のみで構成されることが好ましい。実質的に酸素遮断性化合物のみとは、例えば、酸素遮断膜中の酸素遮断性化合物の含有量が99質量%以上であることをいう。
[Oxygen barrier film]
The laminate of the present invention has an oxygen barrier film on the above-described colored layer. This oxygen blocking film is formed using an oxygen blocking compound and exhibits high oxygen blocking ability, high transparency, and low light scattering.
Here, the film surface roughness means a state in which a large number of aggregates are generated on the surface of the colored layer, so that a large number of irregularities are formed on the surface of the colored layer. The cause of film surface roughness on the surface of the colored layer is that singlet oxygen decomposes the polymer component (cured product of the thermosetting compound) in the colored layer, causing color separation from the polymer component and coloration. It is thought that this occurs when the agents form aggregates. And since the quantity of the polymer component in a colored layer decreases, so that the density | concentration of a coloring agent is high, colorants will form an aggregate more easily and it will be thought that the film surface roughness on the surface of a colored layer becomes easy to generate | occur | produce. In particular, the inventors of the present application have examined that when the solid content concentration of the colorant in the colored curable composition exceeds 50% by mass, and further exceeds 60% by mass, the film surface is significantly roughened. I found. It was also found that this tendency is particularly likely to occur under high temperature and high humidity.
The oxygen barrier compound contained in the oxygen barrier film may be either an inorganic material or an organic material, and an inorganic material is preferred. Specifically, a metal oxide, a metal alkoxy group-containing compound, an organic polymer, or the like can be used. In addition, it is preferable that an oxygen interruption | blocking film | membrane is substantially comprised only with the said oxygen interruption | blocking compound from the point which is excellent by oxygen interruption | blocking ability. The term “substantially oxygen-blocking compound only” means, for example, that the content of the oxygen-blocking compound in the oxygen-blocking film is 99% by mass or more.
 金属酸化物としては、SiO2、SiN、Al23、CaO、Fe23、MgO、Ga2O、ZrO2、TiO2、CaF2などが挙げられる。これらの中でも、酸素遮断性および透明性に優れている観点から、SiO2、SiNが好ましく、SiO2が特に好ましい。 As the metal oxide, SiO 2, SiN, Al 2 O 3, CaO, Fe 2 O 3, MgO, Ga 2 O, ZrO 2, TiO 2, etc. CaF 2 and the like. Among these, from the viewpoint of excellent oxygen barrier properties and transparency, SiO 2 and SiN are preferable, and SiO 2 is particularly preferable.
 金属アルコキシ基含有化合物としては、テトラエトキシシラン、オルトチタン酸テトラエチル、テトラメトキシシラン、エチルトリエトキシシラン、メチルトリメトキシシランなどが挙げられる。 Examples of the metal alkoxy group-containing compound include tetraethoxysilane, tetraethyl orthotitanate, tetramethoxysilane, ethyltriethoxysilane, and methyltrimethoxysilane.
 有機ポリマーとしては、ポリビニルアルコール(PVA)、ポリビニルピロリドン、ポリアクリルアミド類、水溶性ポリアミド、ポリアクリル酸の水溶性塩、ポリビニルエーテルと無水マレイン酸との重合体、エチレンオキサイド重合体、エチルセルロース、ヒドロキシエチルセルロース、カルボキシエチルセルロースの水溶性塩等のセルロース類、アラビアゴム、含アルコキシシラン基ポリマー等やこれらの2種以上の混合物が挙げられ、これらの中でも、酸素遮断性に優れている観点から、ポリビニルアルコール、ポリビニルピロリドンまたはポリビニルアルコールとポリビニルピロリドンとの混合物が好ましく、ポリビニルアルコールが特に好ましい。 Organic polymers include polyvinyl alcohol (PVA), polyvinyl pyrrolidone, polyacrylamides, water-soluble polyamides, water-soluble salts of polyacrylic acid, polymers of polyvinyl ether and maleic anhydride, ethylene oxide polymers, ethyl cellulose, hydroxyethyl cellulose , Celluloses such as water-soluble salts of carboxyethyl cellulose, gum arabic, alkoxysilane-containing polymers and the like, and mixtures of two or more thereof. Among these, from the viewpoint of excellent oxygen barrier properties, polyvinyl alcohol, Polyvinyl pyrrolidone or a mixture of polyvinyl alcohol and polyvinyl pyrrolidone is preferred, and polyvinyl alcohol is particularly preferred.
 ポリビニルアルコールとしては、重量平均分子量が300~2400であることが好ましく、また、71~100モル%加水分解されるものが好ましい。具体的には、PVA-101,PVA-105,PVA-110,PVA-117,PVA-117H,PVA-120,PVA-124,(以上すべて商品名、クラレ株式会社製、鹸化率97~98%)、PVA-203,PVA-204,PVA-205,PVA-210,PVA-220,PBA-224,PVA-217E(同、鹸化率87~88%)、PVA-405,PVA-420,(同、鹸化率78~82%)、PVA-613(同、鹸化率92~95%)を挙げることができる。なお、PVAの後ろの3桁の番号のうちの下2桁×100がそれぞれ重合度を示す。 The polyvinyl alcohol preferably has a weight average molecular weight of 300 to 2400 and is preferably hydrolyzed 71 to 100 mol%. Specifically, PVA-101, PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124 (all trade names, manufactured by Kuraray Co., Ltd., saponification rate 97 to 98%) ), PVA-203, PVA-204, PVA-205, PVA-210, PVA-220, PBA-224, PVA-217E (saponification rate 87-88%), PVA-405, PVA-420, (same as above) Saponification rate 78 to 82%) and PVA-613 (saponification rate 92 to 95%). In addition, the last two digits × 100 of the three-digit numbers after PVA indicate the degree of polymerization.
 ポリビニルアルコールとポリビニルピロリドンとの混合物中におけるPVAの含有量としては、25~99質量%が好ましく、50~90質量%がより好ましく、50~80質量%が特に好ましい。これらのポリマーの添加量は、層全体の1~40質量%、より好ましくは10~35質量%である。ポリビニルピロリドンの含有量は、酸素遮断膜の全固形分の1~75質量%とすることが好ましく、より好ましくは1~50質量%、更に好ましくは10~40質量%である。ポリビニルピロリドンの添加量を酸素遮断膜の全固形分の1~75質量%とすることにより、酸素遮断性をより良好にすることができる。 The content of PVA in the mixture of polyvinyl alcohol and polyvinyl pyrrolidone is preferably 25 to 99% by mass, more preferably 50 to 90% by mass, and particularly preferably 50 to 80% by mass. The amount of these polymers added is 1 to 40% by mass, more preferably 10 to 35% by mass, based on the entire layer. The content of polyvinyl pyrrolidone is preferably 1 to 75% by mass, more preferably 1 to 50% by mass, and still more preferably 10 to 40% by mass, based on the total solid content of the oxygen barrier film. By adding polyvinylpyrrolidone in an amount of 1 to 75% by mass based on the total solid content of the oxygen barrier film, the oxygen barrier property can be improved.
 本発明において、酸素遮断膜の膜厚は、10μm以下であることが好ましい。酸素遮断膜は、膜厚が上記範囲にあるとき、形成される色画素の感度や平坦性などが優れ、カラーフィルタの酸素遮断膜として好適に機能する。酸素遮断膜の膜厚が10μmを超える場合は、酸素遮断膜の酸素透過性を抑制することはできるが、カラーフィルタ層を通過する光の強度が低下してしまうおそれがある。酸素遮断膜の膜厚は、より好ましくは5μm以下であり、さらに好ましくは1μm以下である。酸素遮断膜の膜厚の下限値は、特に定めるものではないが、0.05μm以上である。 In the present invention, the thickness of the oxygen blocking film is preferably 10 μm or less. When the film thickness is in the above range, the oxygen blocking film is excellent in sensitivity and flatness of the formed color pixel and functions suitably as an oxygen blocking film for the color filter. When the thickness of the oxygen blocking film exceeds 10 μm, the oxygen permeability of the oxygen blocking film can be suppressed, but the intensity of light passing through the color filter layer may be reduced. The film thickness of the oxygen barrier film is more preferably 5 μm or less, and further preferably 1 μm or less. The lower limit of the thickness of the oxygen blocking film is not particularly defined, but is 0.05 μm or more.
 酸素遮断層は、酸素透過率が200ml/m2・day・atm以下であることが好ましく、100ml/m2・day・atm以下であることがより好ましく、50ml/m2・day・atm以下であることが特に好ましい。酸素透過率の下限は特に限定されないが、0ml/m2・day・atmが好ましい。酸素透過率が上記範囲の場合、着色膜の膜面荒れの観点で好適に機能する。 The oxygen barrier layer preferably has an oxygen permeability of 200 ml / m 2 · day · atm or less, more preferably 100 ml / m 2 · day · atm or less, and 50 ml / m 2 · day · atm or less. It is particularly preferred. The lower limit of the oxygen transmission rate is not particularly limited, but 0 ml / m 2 · day · atm is preferable. When the oxygen permeability is in the above range, it functions suitably from the viewpoint of roughening the surface of the colored film.
 酸素遮断層の酸素透過率を測定する方法としては、例えば、以下のようにして測定することができる。酸素電極としてオービスフェアラボラトリーズジャパンインク製model3600を使用する。電極隔膜としては、応答速度および感度に優れたポリフルオロアルコキシ(PFA)2956Aを使用する。電極隔膜にシリコーングリス(SH111、東レダウコーニング(株)製)を薄く(例えば、1.0μm)塗布し、その上に測定する薄膜材料を貼付し、酸素濃度値を測定する。なお、シリコーングリスの塗布膜は、酸素透過速度に影響を与えないことが確認されている。次に、酸素濃度値に対する酸素透過速度(ml/m2・day・atm)を換算する。 As a method for measuring the oxygen permeability of the oxygen blocking layer, for example, it can be measured as follows. Orbis Fair Laboratories Japan Inc. model 3600 is used as the oxygen electrode. As the electrode diaphragm, polyfluoroalkoxy (PFA) 2956A having excellent response speed and sensitivity is used. Silicone grease (SH111, manufactured by Toray Dow Corning Co., Ltd.) is applied thinly (for example, 1.0 μm) to the electrode diaphragm, and a thin film material to be measured is applied thereon, and the oxygen concentration value is measured. It has been confirmed that the coating film of silicone grease does not affect the oxygen transmission rate. Next, the oxygen transmission rate (ml / m 2 · day · atm) with respect to the oxygen concentration value is converted.
 酸素遮断膜を形成する方法としては、酸素遮断性化合物が無機材料からなる場合は、蒸着、スパッタ等の物理的製膜法、CVD等の化学的製膜法、CLD、スプレー法等の湿式製膜法など、各種の製膜法を用いることができる。酸素遮断性化合物が金属アルコキシ基含有化合物、有機ポリマーからなる場合は、ロールコーター、エアナイフコーター、ブレードコーター、ロッドコーター、バーコーター、スピンコーター、スプレーコーター等の各種コーターを用いることができる。 As the method for forming the oxygen blocking film, when the oxygen blocking compound is made of an inorganic material, a physical film forming method such as vapor deposition and sputtering, a chemical film forming method such as CVD, a wet process such as CLD and spraying method, etc. Various film forming methods such as a film method can be used. When the oxygen-blocking compound is composed of a metal alkoxy group-containing compound or an organic polymer, various coaters such as a roll coater, an air knife coater, a blade coater, a rod coater, a bar coater, a spin coater, and a spray coater can be used.
 以下に、本発明の積層体の好ましい実施形態を挙げるが、本発明はこれらに限定されるものではない。
(第1の実施形態)
 着色剤、熱硬化性化合物および溶剤を含む着色硬化性組成物であって、着色剤の含有量の合計が着色硬化性組成物の全固形分に対し50~90質量%である着色硬化性組成物を硬化してなる着色層上に酸素遮断膜が形成された態様。
(第2の実施形態)
 着色剤が上記一般式(1)で表されるハロゲン化フタロシアニン染料を含む態様。
(第3の実施形態)
 着色剤が、さらに黄色色素を含む態様。
(第4の実施形態)
 熱硬化性化合物がエポキシ化合物である態様。
(第5の実施形態)
 酸素遮断膜が無機材料を含む態様。
(第6の実施形態)
 着色剤の含有量の合計が着色硬化性組成物の全固形分に対し60~90質量%である態様。
(第7の実施形態)
 着色層の厚さが0.1~1.0μmである態様。
(第8の実施形態)
 酸素遮断膜と上記着色層とが隣接している態様。
(第9の実施形態)
 酸素遮断膜の厚さが10μm以下である態様。
(第10の実施形態)
 第1~第9の実施形態の2以上の組み合わせからなる形態。
Although preferable embodiment of the laminated body of this invention is given to the following, this invention is not limited to these.
(First embodiment)
A colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition An embodiment in which an oxygen barrier film is formed on a colored layer formed by curing a product.
(Second Embodiment)
The aspect in which a coloring agent contains the halogenated phthalocyanine dye represented by the said General formula (1).
(Third embodiment)
A mode in which the colorant further contains a yellow pigment.
(Fourth embodiment)
An embodiment in which the thermosetting compound is an epoxy compound.
(Fifth embodiment)
The aspect in which an oxygen barrier film contains an inorganic material.
(Sixth embodiment)
An embodiment in which the total content of the colorants is 60 to 90% by mass with respect to the total solid content of the colored curable composition.
(Seventh embodiment)
An embodiment in which the thickness of the colored layer is 0.1 to 1.0 μm.
(Eighth embodiment)
A mode in which the oxygen barrier film and the colored layer are adjacent to each other.
(Ninth embodiment)
A mode in which the thickness of the oxygen barrier film is 10 μm or less.
(Tenth embodiment)
A form comprising a combination of two or more of the first to ninth embodiments.
[カラーフィルタおよびその製造方法]
 本発明のカラーフィルタの製造方法の一例としては、上述した着色硬化性組成物を用いて着色層を形成する工程、着色層上にフォトレジスト層を形成する工程、露光および現像することによりフォトレジスト層をパターニングしてレジストパターンを得る工程およびレジストパターンをエッチングマスクとして着色層をドライエッチングする工程、ドライエッチング後の着色層上に酸素遮断膜を形成する工程を含む。
[Color filter and manufacturing method thereof]
As an example of the method for producing the color filter of the present invention, a step of forming a colored layer using the above-described colored curable composition, a step of forming a photoresist layer on the colored layer, a photoresist by exposure and development A step of patterning the layer to obtain a resist pattern, a step of dry-etching the colored layer using the resist pattern as an etching mask, and a step of forming an oxygen blocking film on the colored layer after dry etching.
 本発明のカラーフィルタの製造方法は、上述した着色硬化性組成物(第1の着色硬化性組成物とも言う)を用いて第1の着色層を形成する。ここで、第1着色層は、上述したように、耐溶剤性および耐アルカリ現像液性に優れている。これにより、後に詳細に述べる、第1着色層の上にエッチング用のマスクとしてレジストパターン(パターニングされたフォトレジスト層)を形成する際に使用する現像液や、第1着色層の上に第2着色感放射線性組成物により第2着色感放射線性層を形成する工程、および、第1着色層の上に第3着色感放射線性組成物により第3着色感放射線性層を形成する工程において、第1着色層が、第2または第3着色感放射線性組成物における有機溶剤や、第2または第3着色感放射線性組成物により形成された第2または第3着色感放射線性層を露光、現像する際に使用される現像液に溶解し、第1着色層における色成分が、上記溶剤や現像液に溶出するおそれや、第2または第3着色感放射線性組成物における色成分が、第1の着色層に混入するおそれなどを抑制できる。その結果、第1着色層における色成分の色落ちの発生や複数の色が互いに重なり合うオーバーラップ領域の発生を抑制できるため、最終的に得られるカラーフィルタの性能を向上させることができる。
 特に、例えば、厚みが0.1~1.0μmおよび/または画素パターンサイズ(正方パターンにおける一辺)が2μm以下(例えば0.5~2.0μm)となるような微小サイズが求められる固体撮像素子用のカラーフィルタを作製するのに有効である。
 また、本発明のカラーフィルタの製造方法によれば、着色剤の濃度が高い着色層であって、高温高湿下においても、着色層表面における膜面荒れが起こりにくいカラーフィルタを提供することができる。
The manufacturing method of the color filter of this invention forms a 1st colored layer using the colored curable composition (it is also mentioned 1st colored curable composition) mentioned above. Here, as described above, the first colored layer is excellent in solvent resistance and alkali developer resistance. As a result, a developer used when forming a resist pattern (patterned photoresist layer) as an etching mask on the first colored layer, which will be described in detail later, or a second on the first colored layer. In the step of forming the second colored radiation-sensitive layer with the colored radiation-sensitive composition and the step of forming the third colored radiation-sensitive layer with the third colored radiation-sensitive composition on the first colored layer, The first colored layer exposes the organic solvent in the second or third colored radiation-sensitive composition or the second or third colored radiation-sensitive layer formed by the second or third colored radiation-sensitive composition; The color component in the first colored layer is dissolved in the developer used for development, and the color component in the second or third colored radiation-sensitive composition may be dissolved in the solvent or developer. Mixed in 1 colored layer Etc. can be suppressed Ruosore. As a result, it is possible to suppress the occurrence of color fading in the first colored layer and the occurrence of overlapping regions in which a plurality of colors overlap each other, so that the performance of the finally obtained color filter can be improved.
In particular, for example, a solid-state imaging device that is required to have a minute size such that the thickness is 0.1 to 1.0 μm and / or the pixel pattern size (one side in a square pattern) is 2 μm or less (for example, 0.5 to 2.0 μm) It is effective in producing a color filter for use.
In addition, according to the method for producing a color filter of the present invention, it is possible to provide a color filter that is a colored layer having a high concentration of a colorant and that hardly causes film surface roughness on the surface of the colored layer even under high temperature and high humidity. it can.
 ここで、固体撮像素子について、一例として図1を参照して略説する。
 図1に示すように、固体撮像素子10は、シリコン基板上に設けられた受光素子(フォトダイオード)42、カラーフィルタ13、平坦化膜14、マイクロレンズ15等から構成される。本発明においては、平坦化膜14は必ずしも設ける必要はない。なお、図1では、各部を明確にするため、相互の厚みや幅の比率は無視して一部誇張して表示している。
Here, the solid-state imaging device will be briefly described with reference to FIG. 1 as an example.
As shown in FIG. 1, the solid-state imaging device 10 includes a light receiving element (photodiode) 42 provided on a silicon substrate, a color filter 13, a planarizing film 14, a microlens 15, and the like. In the present invention, the planarizing film 14 is not necessarily provided. In FIG. 1, in order to clarify each part, the ratios of the thicknesses and widths are disregarded and some of them are exaggerated.
 支持体としては、シリコン基板のほか、カラーフィルタに用いられるものであれば特に制限はなく、例えば、液晶表示素子等に用いられるソーダガラス、ホウケイ酸ガラス、石英ガラスおよびこれらに透明導電膜を付着させたものや、固体撮像素子等に用いられる光電変換素子基板、例えば酸化膜、窒化シリコン等が挙げられる。また、これら支持体とカラーフィルタ13との間には本発明を損なわない限り中間層などを設けてもよい。 The support is not particularly limited as long as it is used for a color filter in addition to a silicon substrate. For example, soda glass, borosilicate glass, quartz glass, and a transparent conductive film attached to these are used for liquid crystal display elements. And a photoelectric conversion element substrate used for a solid-state imaging device, such as an oxide film or silicon nitride. Further, an intermediate layer or the like may be provided between the support and the color filter 13 as long as the present invention is not impaired.
 シリコン基板上には、Pウエル41を有し、このPウエルの表面の一部にフォトダイオード42を有している。フォトダイオード42は、Pウエルの表面の一部にPやAs等のN型不純物をイオン注入した後、熱処理を行うことにより形成される。また、シリコン基板のPウエル41の表面であって上記一部とは異なる領域には、フォトダイオード42よりN型不純物濃度の高い不純物拡散層43を有している。この不純物拡散層43は、PやAs等のN型不純物をイオン注入した後、熱処理を行うことにより形成され、フォトダイオード42が入射光を受けることにより発生した電荷を転送する浮遊拡散層の役割を果たす。ウエル41をP型不純物層、フォトダイオード42および不純物拡散層43をN型不純物層とする以外にも、ウエル41をN型不純物層、フォトダイオード42および不純物拡散層43をP型不純物層として実施することもできる。 A P well 41 is provided on the silicon substrate, and a photodiode 42 is provided on a part of the surface of the P well. The photodiode 42 is formed by performing heat treatment after ion-implanting N-type impurities such as P and As into a part of the surface of the P-well. In addition, an impurity diffusion layer 43 having an N-type impurity concentration higher than that of the photodiode 42 is provided in a region different from the above portion on the surface of the P well 41 of the silicon substrate. The impurity diffusion layer 43 is formed by ion implantation of N-type impurities such as P and As and then performing heat treatment, and the role of the floating diffusion layer that transfers charges generated when the photodiode 42 receives incident light. Fulfill. In addition to the well 41 being a P-type impurity layer and the photodiode 42 and the impurity diffusion layer 43 being an N-type impurity layer, the well 41 is an N-type impurity layer and the photodiode 42 and the impurity diffusion layer 43 being a P-type impurity layer. You can also
 Pウエル41、フォトダイオード42、および不純物拡散層43上には、SiO2またはSiO2/SiN/SiO2等の絶縁膜47を有しており、この絶縁膜47上にはポリSi、タングステン、タングステンシリサイド、Al、Cu等からなる電極44が設けられている。電極44は、ゲートMOSトランジスタのゲートの役割を果たし、フォトダイオード42に発生した電荷を不純物拡散層43に転送するための転送ゲートとしての役割を果たすことができる。さらに、電極44の上方には、配線層45が形成されている。配線層45の更に上方には、BPSG膜46、P-SiN膜48を有している。BPSG膜46とP-SiN膜48の界面がフォトダイオード42の上方で下に湾曲する形状になるように形成されており、入射光を効率よくフォトダイオード42に導くための層内レンズの役割を果たす。BPSG膜46上には、P-SiN膜48表面または画素領域以外の凹凸部を平坦化する目的で平坦化膜層49が形成されている。 An insulating film 47 such as SiO 2 or SiO 2 / SiN / SiO 2 is provided on the P well 41, the photodiode 42, and the impurity diffusion layer 43. On the insulating film 47, poly-Si, tungsten, An electrode 44 made of tungsten silicide, Al, Cu or the like is provided. The electrode 44 serves as the gate of the gate MOS transistor, and can serve as a transfer gate for transferring charges generated in the photodiode 42 to the impurity diffusion layer 43. Further, a wiring layer 45 is formed above the electrode 44. Above the wiring layer 45, a BPSG film 46 and a P-SiN film 48 are provided. The interface between the BPSG film 46 and the P-SiN film 48 is formed so as to be curved downward above the photodiode 42, and serves as an in-layer lens for efficiently guiding incident light to the photodiode 42. Fulfill. On the BPSG film 46, a planarizing film layer 49 is formed for the purpose of planarizing the surface of the P-SiN film 48 or uneven portions other than the pixel region.
 この平坦化膜層49上にカラーフィルタ13が形成されている。なお、以下の説明では、領域を区切らずにシリコン基板上に形成されている着色膜(いわゆるベタ膜)を「着色(着色感放射線性)層」といい、パターン状に領域を区切って形成されている着色膜(例えば、ストライプ状にパターニングされている膜等)を「着色パターン」という。また、着色パターンのうち、カラーフィルタ13を構成する要素となっている着色パターン(例えば、正方形や長方形にパターン化された着色パターン等)を「着色(赤色、緑色、青色)画素」という。 The color filter 13 is formed on the planarizing film layer 49. In the following description, a colored film (so-called solid film) formed on a silicon substrate without dividing the region is referred to as a “colored (colored radiation sensitive) layer”, and is formed by dividing the region into a pattern. A colored film (for example, a film patterned in a stripe shape) is referred to as a “colored pattern”. In addition, among the colored patterns, a colored pattern that is an element constituting the color filter 13 (for example, a colored pattern patterned into a square or a rectangle) is referred to as a “colored (red, green, blue) pixel”.
 カラーフィルタ13は、2次元配列された複数の緑色画素(第1色画素)20G、赤色画素(第2色画素)20R、および青色画素(第3色画素)20Bから構成されている。各着色画素20R,20G,20Bは、それぞれ受光素子42の上方位置に形成されている。緑色画素20Gが市松模様に形成されるとともに、青色画素20Bおよび赤色画素20Rは、各緑色画素20Gの間に形成されている。なお、図1では、カラーフィルタ13が3色の画素から構成されていることを説明するために、各着色画素20R,20G,20Bを1列に並べて表示している。 The color filter 13 includes a plurality of two-dimensionally arranged green pixels (first color pixels) 20G, red pixels (second color pixels) 20R, and blue pixels (third color pixels) 20B. Each of the colored pixels 20R, 20G, and 20B is formed above the light receiving element 42. The green pixels 20G are formed in a checkered pattern, and the blue pixels 20B and the red pixels 20R are formed between the green pixels 20G. In FIG. 1, in order to explain that the color filter 13 is composed of pixels of three colors, the colored pixels 20R, 20G, and 20B are displayed in a line.
 平坦化膜14は、カラーフィルタ13の上面を覆うように形成されており、カラーフィルタ表面を平坦化している。 The planarization film 14 is formed so as to cover the upper surface of the color filter 13 and planarizes the color filter surface.
 マイクロレンズ15は、凸面を上にして配置された集光レンズであり、平坦化膜14(平坦化膜を有しない場合はカラーフィルタ)の上方でかつ受光素子42の上方に設けられている。各マイクロレンズ15は、被写体からの光を効率良く各受光素子42へ導く。 The microlens 15 is a condensing lens arranged with the convex surface facing upward, and is provided above the planarizing film 14 (or a color filter when no planarizing film is provided) and above the light receiving element 42. Each microlens 15 efficiently guides light from the subject to each light receiving element 42.
 次に、本発明の実施形態に係るカラーフィルタの製造方法について説明する。
 本発明の実施形態に係るカラーフィルタの製造方法においては、先ず、図2の概略断面図に示すように、第1着色硬化性組成物によって第1着色層11を形成する(工程(ア))。ここで、第1着色硬化性組成物は、上述した着色硬化性組成物である。
Next, the manufacturing method of the color filter which concerns on embodiment of this invention is demonstrated.
In the method for producing a color filter according to the embodiment of the present invention, first, as shown in the schematic cross-sectional view of FIG. 2, the first colored layer 11 is formed from the first colored curable composition (step (a)). . Here, the first colored curable composition is the above-described colored curable composition.
 第1着色層11の形成は、着色硬化性組成物を支持体上に回転塗布、スリット塗布、スプレー塗布等の塗布方法により塗布し、乾燥させて着色層を形成することにより行なえる。 The first colored layer 11 can be formed by applying a colored curable composition on a support by a coating method such as spin coating, slit coating or spray coating, and drying to form a colored layer.
 第1着色層11の厚みとしては、0.3~1.0μmの範囲が好ましく、0.35~0.8μmの範囲がより好ましく、0.35~0.7μmの範囲がより好ましい。 The thickness of the first colored layer 11 is preferably in the range of 0.3 to 1.0 μm, more preferably in the range of 0.35 to 0.8 μm, and more preferably in the range of 0.35 to 0.7 μm.
 第1着色硬化性組成物が熱硬化性化合物を含有している場合、ホットプレート、オーブン等の加熱装置により、第1着色層11を加熱して、硬化させることが好ましい。加熱温度は、120~250℃であることが好ましく、160~230℃であることがより好ましい。加熱時間は、加熱手段により異なるが、ホットプレート上で加熱する場合、通常3~30分間程度であり、オーブン中で加熱する場合、通常、30~90分間程度である。 When the first colored curable composition contains a thermosetting compound, the first colored layer 11 is preferably heated and cured by a heating device such as a hot plate or an oven. The heating temperature is preferably 120 to 250 ° C, and more preferably 160 to 230 ° C. The heating time varies depending on the heating means, but is usually about 3 to 30 minutes when heated on a hot plate, and usually about 30 to 90 minutes when heated in an oven.
 次いで、第1着色層11に貫通孔群が形成されるようにドライエッチングによりパターニングする(工程(イ))。これにより第1の着色パターンを形成する。この手法によれば、着色感放射線性組成物により第1着色層を形成し、当該第1着色層を露光、現像することによって貫通孔群を設ける場合と比較して、所望の形状の貫通孔群をより確実に設けることができる。これは、着色硬化性組成物の全固形分に対する着色剤の含有量が50質量%以上とされた着色感放射線性組成物においては、組成物中に現像能に寄与する成分を添加できる余地が限られてくるため、確実なパターニングが困難になるためである。 Next, patterning is performed by dry etching so that a group of through holes is formed in the first colored layer 11 (step (A)). Thereby, a first colored pattern is formed. According to this technique, a through-hole having a desired shape is formed as compared with the case where a first colored layer is formed from a colored radiation-sensitive composition and the first colored layer is exposed and developed to provide a group of through-holes. A group can be provided more reliably. This is because, in a colored radiation-sensitive composition in which the content of the colorant with respect to the total solid content of the colored curable composition is 50% by mass or more, there is room for adding a component that contributes to developability to the composition. This is because reliable patterning becomes difficult due to the limitation.
 第1着色パターンは、支持体上に第1色目として設けられる着色パターンでもよいし、場合によっては、既設のパターンを有する支持体上に例えば第2色目あるいは第3色目以降のパターンとして設けられる着色パターンでもよい。 The first coloring pattern may be a coloring pattern provided as the first color on the support, or depending on the case, for example, a coloring provided as a second color pattern or a pattern after the third color on the support having the existing pattern. It may be a pattern.
 ドライエッチングは、第1着色層11を、パターニングされたフォトレジスト層をマスクとしてエッチングガスを用いて行うことができる。例えば、図3の概略断面図に示すように、先ず、第1着色層11の上にフォトレジスト層51を形成する。 Dry etching can be performed on the first colored layer 11 using an etching gas with the patterned photoresist layer as a mask. For example, as shown in the schematic cross-sectional view of FIG. 3, first, a photoresist layer 51 is formed on the first colored layer 11.
 具体的には、着色層上にポジまたはネガ型の感放射線性組成物を適用(好ましくは塗布)し、これを乾燥させることによりフォトレジスト層を形成する。フォトレジスト層51の形成においては、更にプリベーク処理を施すことが好ましい。特に、フォトレジストの形成プロセスとしては、露光後の加熱処理(PEB)、現像後の加熱処理(ポストベーク処理)を実施する形態が望ましい。 Specifically, a positive or negative radiation-sensitive composition is applied (preferably applied) on the colored layer and dried to form a photoresist layer. In forming the photoresist layer 51, it is preferable to further perform a pre-bake treatment. In particular, as a process for forming a photoresist, a mode in which heat treatment after exposure (PEB) and heat treatment after development (post-bake treatment) are desirable.
 フォトレジストとしては、例えば、ポジ型の感放射線性組成物が用いられる。このポジ型の感放射線性組成物としては、紫外線(g線、h線、i線)、エキシマー・レーザー等を含む遠紫外線、電子線、イオンビームおよびX線等の放射線に感応するポジ型フォトレジスト用に好適なポジ型レジスト組成物が使用できる。放射線のうち、g線、h線、i線が好ましく、中でもi線が好ましい。
 具体的には、ポジ型の感放射線性組成物として、キノンジアジド化合物およびアルカリ可溶性樹脂を含有する組成物が好ましい。キノンジアジド化合物およびアルカリ可溶性樹脂を含有するポジ型の感放射線性組成物は、500nm以下の波長の光照射によりキノンジアジド基が分解してカルボキシル基を生じ、結果としてアルカリ不溶状態からアルカリ可溶性になることを利用するものである。このポジ型フォトレジストは解像力が著しく優れているので、ICやLSI等の集積回路の作製に用いられている。キノンジアジド化合物としては、ナフトキノンジアジド化合物が挙げられる。
As the photoresist, for example, a positive type radiation sensitive composition is used. As this positive type radiation sensitive composition, positive type photo sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays. A positive resist composition suitable for resist can be used. Of the radiation, g-line, h-line and i-line are preferable, and i-line is particularly preferable.
Specifically, as the positive radiation sensitive composition, a composition containing a quinonediazide compound and an alkali-soluble resin is preferable. A positive radiation-sensitive composition containing a quinonediazide compound and an alkali-soluble resin indicates that a quinonediazide group is decomposed by irradiation with light having a wavelength of 500 nm or less to produce a carboxyl group, resulting in alkali-solubility from an alkali-insoluble state. It is what you use. Since this positive photoresist has remarkably excellent resolution, it is used for manufacturing integrated circuits such as ICs and LSIs. Examples of the quinonediazide compound include a naphthoquinonediazide compound.
 フォトレジスト層51の厚みとしては、0.1~3μmが好ましく、0.2~2.5μmがより好ましく、0.3~2μmが更に好ましい。なお、フォトレジスト層51の塗布は、既述の第1着色層11における塗布方法を用いて好適に行なえる。 The thickness of the photoresist layer 51 is preferably 0.1 to 3 μm, more preferably 0.2 to 2.5 μm, and still more preferably 0.3 to 2 μm. The application of the photoresist layer 51 can be suitably performed using the application method for the first colored layer 11 described above.
 次いで、図4の概略断面図に示すように、このフォトレジスト層51を露光、現像することにより、レジスト貫通孔群51Aが設けられたレジストパターン(パターニングされたフォトレジスト層)52を形成する。
 レジストパターン52の形成は、特に制限なく、従来公知のフォトリソグラフィーの技術を適宜最適化して行なうことができる。露光、現像によりフォトレジスト層51に、レジスト貫通孔群51Aが設けられることによって、次のエッチングで用いられるエッチングマスクとしてのレジストパターン52が、第1着色層11上に設けられる。
Next, as shown in the schematic cross-sectional view of FIG. 4, the photoresist layer 51 is exposed and developed to form a resist pattern (patterned photoresist layer) 52 provided with a resist through-hole group 51A.
The formation of the resist pattern 52 is not particularly limited, and can be performed by appropriately optimizing a conventionally known photolithography technique. By providing the resist through hole group 51 </ b> A in the photoresist layer 51 by exposure and development, a resist pattern 52 as an etching mask used in the next etching is provided on the first colored layer 11.
 フォトレジスト層51の露光は、所定のマスクパターンを介して、ポジ型またはネガ型の感放射線性組成物に、g線、h線、i線等、好ましくはi線で露光を施すことにより行なうことができる。露光後は、現像液で現像処理することにより、着色パターンを形成しようとする領域に合わせてフォトレジストが除去される。 The exposure of the photoresist layer 51 is performed by exposing the positive-type or negative-type radiation-sensitive composition with g-line, h-line, i-line, etc., preferably i-line, through a predetermined mask pattern. be able to. After the exposure, the photoresist is removed in accordance with a region where a colored pattern is to be formed by developing with a developer.
 上記現像液としては、着色剤を含む第1着色層には影響を与えず、ポジレジストの露光部およびネガレジストの未硬化部を溶解するものであればいずれも使用可能であり、例えば、種々の有機溶剤の組み合わせやアルカリ性の水溶液を用いることができる。アルカリ性の水溶液としては、アルカリ性化合物を濃度が0.001~10質量%、好ましくは0.01~5質量%となるように溶解して調製されたアルカリ性水溶液が好適である。アルカリ性化合物は、例えば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム,硅酸ナトリウム、メタ硅酸ナトリウム、アンモニア水、エチルアミン、ジエチルアミン、ジメチルエタノールアミン、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、コリン、ピロール、ピペリジン、1,8-ジアザビシクロ[5.4.0]-7-ウンデセン等が挙げられる。尚、アルカリ性水溶液を現像液として用いた場合は、一般に現像後に水で洗浄処理が施される。 Any developer can be used as long as it dissolves the exposed portion of the positive resist and the uncured portion of the negative resist without affecting the first colored layer containing the colorant. A combination of these organic solvents or an alkaline aqueous solution can be used. As the alkaline aqueous solution, an alkaline aqueous solution prepared by dissolving an alkaline compound so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 5% by mass is suitable. Examples of alkaline compounds include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, Examples include pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene. In addition, when alkaline aqueous solution is used as a developing solution, generally a washing process is performed with water after development.
 次に、図5の概略断面図に示すように、レジストパターン52をエッチングマスクとして、第1着色層11に貫通孔群120が形成されるようにドライエッチングによりパターニングする。これにより、第1着色パターン12が形成される。ここで、貫通孔群120は、第1貫通孔部分群121と第2貫通孔部分群122とを有している。
 貫通孔群120は、第1着色層11に、市松状に設けられている。よって、第1着色層11に貫通孔群120が設けられてなる第1着色パターン12は、複数の四角形状の第1着色画素を市松状に有している。
Next, as shown in the schematic cross-sectional view of FIG. 5, patterning is performed by dry etching so that the through hole group 120 is formed in the first colored layer 11 using the resist pattern 52 as an etching mask. Thereby, the 1st coloring pattern 12 is formed. Here, the through-hole group 120 has a first through-hole part group 121 and a second through-hole part group 122.
The through-hole group 120 is provided in a checkered pattern in the first colored layer 11. Therefore, the 1st coloring pattern 12 by which the through-hole group 120 is provided in the 1st coloring layer 11 has a some square-shaped 1st coloring pixel in checkered form.
 具体的には、ドライエッチングは、レジストパターン52をエッチングマスクとして、第1着色層11をドライエッチングする。ドライエッチングの代表的な例としては、特開昭59-126506号、特開昭59-46628号、同58-9108号、同58-2809号、同57-148706号、同61-41102号などの公報に記載の方法がある。 Specifically, in the dry etching, the first colored layer 11 is dry etched using the resist pattern 52 as an etching mask. Representative examples of dry etching include JP-A-59-126506, JP-A-59-46628, JP-A-58-9108, JP-A-58-2809, JP-A-57-148706, JP-A-61-41102, and the like. There is a method described in this publication.
 ドライエッチングとしては、パターン断面をより矩形に近く形成する観点や支持体へのダメージをより低減する観点から、以下の形態で行なうのが好ましい。
 フッ素系ガスと酸素ガス(O2)との混合ガスを用い、支持体が露出しない領域(深さ)までエッチングを行なう第1段階のエッチングと、この第1段階のエッチングの後に、窒素ガス(N2)と酸素ガス(O2)との混合ガスを用い、好ましくは支持体が露出する領域(深さ)付近までエッチングを行なう第2段階のエッチングと、支持体が露出した後に行なうオーバーエッチングとを含む形態が好ましい。以下、ドライエッチングの具体的手法、ならびに第1段階のエッチング、第2段階のエッチング、およびオーバーエッチングについて説明する。
Dry etching is preferably performed in the following manner from the viewpoint of forming a pattern cross section closer to a rectangle and reducing damage to the support.
Using a mixed gas of fluorine-based gas and oxygen gas (O 2 ), the first stage etching is performed up to a region (depth) where the support is not exposed, and after this first stage etching, nitrogen gas ( N 2 ) and oxygen gas (O 2 ), and a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed. The form containing these is preferable. Hereinafter, a specific method of dry etching, and the first stage etching, the second stage etching, and the overetching will be described.
 ドライエッチングは、下記手法により事前にエッチング条件を求めて行なう。
(1)第1段階のエッチングにおけるエッチングレート(nm/min)と、第2段階のエッチングにおけるエッチングレート(nm/min)とをそれぞれ算出する。
(2)第1段階のエッチングで所望の厚さをエッチングする時間と、第2段階のエッチングで所望の厚さをエッチングする時間とをそれぞれ算出する。
(3)上記(2)で算出したエッチング時間に従って第1段階のエッチングを実施する。(4)上記(2)で算出したエッチング時間に従って第2段階のエッチングを実施する。あるいはエンドポイント検出でエッチング時間を決定し、決定したエッチング時間に従って第2段階のエッチングを実施してもよい。
(5)上記(3)、(4)の合計時間に対してオーバーエッチング時間を算出し、オーバーエッチングを実施する。
Dry etching is performed by obtaining etching conditions in advance by the following method.
(1) The etching rate (nm / min) in the first stage etching and the etching rate (nm / min) in the second stage etching are calculated respectively.
(2) The time for etching the desired thickness in the first stage etching and the time for etching the desired thickness in the second stage etching are respectively calculated.
(3) The first stage etching is performed according to the etching time calculated in (2) above. (4) The second stage etching is performed according to the etching time calculated in (2) above. Alternatively, the etching time may be determined by endpoint detection, and the second stage etching may be performed according to the determined etching time.
(5) Overetching time is calculated with respect to the total time of (3) and (4) above, and overetching is performed.
 上記第1段階のエッチング工程で用いる混合ガスとしては、被エッチング膜である有機材料を矩形に加工する観点から、フッ素系ガスおよび酸素ガス(O2)を含むことが好ましい。また、第1段階のエッチング工程は、支持体が露出しない領域までエッチングする形態にすることで、支持体のダメージを回避することができる。
 また、上記第2段階のエッチング工程および上記オーバーエッチング工程は、第1段階のエッチング工程でフッ素系ガスおよび酸素ガスの混合ガスにより支持体が露出しない領域までエッチングを実施した後、支持体のダメージ回避の観点から、窒素ガスおよび酸素ガスの混合ガスを用いてエッチング処理を行なうのが好ましい。
The mixed gas used in the first stage etching step preferably contains a fluorine-based gas and an oxygen gas (O 2 ) from the viewpoint of processing the organic material that is the film to be etched into a rectangular shape. In addition, the first stage etching process can avoid damage to the support body by etching to a region where the support body is not exposed.
The second etching step and the over-etching step are performed in the first etching step after etching to a region where the support is not exposed by the mixed gas of fluorine-based gas and oxygen gas. From the viewpoint of avoidance, it is preferable to perform the etching process using a mixed gas of nitrogen gas and oxygen gas.
 第1段階のエッチング工程でのエッチング量と、第2段階のエッチング工程でのエッチング量との比率は、第1段階のエッチング工程でのエッチング処理による矩形性を損なわないように決定することが重要である。なお、全エッチング量(第1段階のエッチング工程でのエッチング量と第2段階のエッチング工程でのエッチング量との総和)中における後者の比率は、0%より大きく50%以下である範囲が好ましく、10~20%がより好ましい。エッチング量とは、被エッチング膜の残存する膜厚のことをいう。 It is important to determine the ratio between the etching amount in the first stage etching process and the etching amount in the second stage etching process so as not to impair the rectangularity due to the etching process in the first stage etching process. It is. The latter ratio in the total etching amount (the sum of the etching amount in the first-stage etching process and the etching amount in the second-stage etching process) is preferably in the range of more than 0% and not more than 50%. 10 to 20% is more preferable. The etching amount refers to the remaining film thickness of the film to be etched.
 また、エッチングは、オーバーエッチング処理を含むことが好ましい。オーバーエッチング処理は、オーバーエッチング比率を設定して行なうことが好ましい。また、オーバーエッチング比率は、初めに行なうエッチング処理時間より算出することが好ましい。オーバーエッチング比率は任意に設定できるが、フォトレジストのエッチング耐性と被エッチングパターンの矩形性維持の点で、エッチング工程におけるエッチング処理時間の30%以下であることが好ましく、5~25%であることがより好ましく、10~15%であることが特に好ましい。 Further, the etching preferably includes an over-etching process. The overetching process is preferably performed by setting an overetching ratio. Moreover, it is preferable to calculate the overetching ratio from the etching process time to be performed first. The over-etching ratio can be arbitrarily set, but it is preferably 30% or less of the etching processing time in the etching process, and preferably 5 to 25% from the viewpoint of etching resistance of the photoresist and maintaining the rectangularity of the pattern to be etched. Is more preferable, and 10 to 15% is particularly preferable.
 次いで、図6の概略断面図に示すように、エッチング後に残存するレジストパターン(すなわちエッチングマスク)52を除去する。レジストパターン52の除去は、レジストパターン52上に剥離液または溶剤を付与して、レジストパターン52を除去可能な状態にする工程と、レジストパターン52を洗浄水を用いて除去する工程とを含むことが好ましい。 Next, as shown in the schematic cross-sectional view of FIG. 6, the resist pattern (that is, etching mask) 52 remaining after the etching is removed. The removal of the resist pattern 52 includes a step of applying a stripping solution or a solvent to the resist pattern 52 so that the resist pattern 52 can be removed, and a step of removing the resist pattern 52 using cleaning water. Is preferred.
 レジストパターン52上に剥離液または溶剤を付与し、レジストパターン52を除去可能な状態にする工程としては、例えば、剥離液または溶剤を少なくともレジストパターン52上に付与し、所定の時間停滞させてパドル現像する工程を挙げることができる。剥離液または溶剤を停滞させる時間としては、特に制限はないが、数十秒から数分であることが好ましい。 As a step of applying a stripping solution or solvent on the resist pattern 52 to make the resist pattern 52 removable, for example, a stripping solution or solvent is applied on at least the resist pattern 52, and the paddle is stagnated for a predetermined time. A step of developing can be mentioned. Although there is no restriction | limiting in particular as time to make stripping solution or a solvent stagnant, It is preferable that it is several dozen seconds to several minutes.
 また、レジストパターン52を洗浄水を用いて除去する工程としては、例えば、スプレー式またはシャワー式の噴射ノズルからレジストパターン52に洗浄水を噴射して、レジストパターン52を除去する工程を挙げることができる。洗浄水としては、純水を好ましく用いることができる。また、噴射ノズルとしては、その噴射範囲内に支持体全体が包含される噴射ノズルや、可動式の噴射ノズルであってその可動範囲が支持体全体を包含する噴射ノズルを挙げることができる。噴射ノズルが可動式の場合、レジストパターン52を除去する工程中に支持体中心部から支持体端部までを2回以上移動して洗浄水を噴射することで、より効果的にレジストパターン52を除去することができる。 Examples of the step of removing the resist pattern 52 using cleaning water include a step of removing the resist pattern 52 by spraying cleaning water onto the resist pattern 52 from a spray type or shower type spray nozzle. it can. As the washing water, pure water can be preferably used. Further, examples of the injection nozzle include an injection nozzle in which the entire support is included in the injection range, and an injection nozzle that is a movable injection nozzle and in which the movable range includes the entire support. When the spray nozzle is movable, the resist pattern 52 is more effectively moved by spraying the cleaning water by moving from the support center to the support end twice or more during the step of removing the resist pattern 52. Can be removed.
 剥離液は、一般には有機溶剤を含有するが、無機溶剤を更に含有してもよい。有機溶剤としては、例えば、1)炭化水素系化合物、2)ハロゲン化炭化水素系化合物、3)アルコール系化合物、4)エーテルまたはアセタール系化合物、5)ケトンまたはアルデヒド系化合物、6)エステル系化合物、7)多価アルコール系化合物、8)カルボン酸またはその酸無水物系化合物、9)フェノール系化合物、10)含窒素化合物、11)含硫黄化合物、12)含フッ素化合物が挙げられる。剥離液としては、含窒素化合物を含有することが好ましく、非環状含窒素化合物と環状含窒素化合物とを含むことがより好ましい。 The stripping solution generally contains an organic solvent, but may further contain an inorganic solvent. Examples of organic solvents include 1) hydrocarbon compounds, 2) halogenated hydrocarbon compounds, 3) alcohol compounds, 4) ether or acetal compounds, 5) ketones or aldehyde compounds, and 6) ester compounds. 7) polyhydric alcohol compounds, 8) carboxylic acids or acid anhydride compounds thereof, 9) phenol compounds, 10) nitrogen compounds, 11) sulfur compounds, and 12) fluorine compounds. The stripping solution preferably contains a nitrogen-containing compound, and more preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound.
 非環状含窒素化合物としては、水酸基を有する非環状含窒素化合物であることが好ましい。具体的には、例えば、モノイソプロパノールアミン、ジイソプロパノールアミン、トリイソプロパノールアミン、N-エチルエタノールアミン、N,N-ジブチルエタノールアミン、N-ブチルエタノールアミン、モノエタノールアミン、ジエタノールアミン、トリエタノールアミンなどが挙げられ、好ましくはモノエタノールアミン、ジエタノールアミン、トリエタノールアミンであり、より好ましくはモノエタノールアミン(H2NCH2CH2OH)である。また、環状含窒素化合物としては、イソキノリン、イミダゾール、N-エチルモルホリン、ε-カプロラクタム、キノリン、1,3-ジメチル-2-イミダゾリジノン、α-ピコリン、β-ピコリン、γ-ピコリン、2-ピペコリン、3-ピペコリン、4-ピペコリン、ピペラジン、ピペリジン、ピラジン、ピリジン、ピロリジン、N-メチル-2-ピロリドン、N-フェニルモルホリン、2,4-ルチジン、2,6-ルチジンなどが挙げられ、好ましくは、N-メチル-2-ピロリドン、N-エチルモルホリンであり、より好ましくはN-メチル-2-ピロリドン(NMP)である。 The acyclic nitrogen-containing compound is preferably an acyclic nitrogen-containing compound having a hydroxyl group. Specific examples include monoisopropanolamine, diisopropanolamine, triisopropanolamine, N-ethylethanolamine, N, N-dibutylethanolamine, N-butylethanolamine, monoethanolamine, diethanolamine, and triethanolamine. Preferably, they are monoethanolamine, diethanolamine, and triethanolamine, and more preferably monoethanolamine (H 2 NCH 2 CH 2 OH). Examples of cyclic nitrogen-containing compounds include isoquinoline, imidazole, N-ethylmorpholine, ε-caprolactam, quinoline, 1,3-dimethyl-2-imidazolidinone, α-picoline, β-picoline, γ-picoline, 2- Preferred examples include pipecoline, 3-pipecoline, 4-pipecoline, piperazine, piperidine, pyrazine, pyridine, pyrrolidine, N-methyl-2-pyrrolidone, N-phenylmorpholine, 2,4-lutidine, and 2,6-lutidine. Are N-methyl-2-pyrrolidone and N-ethylmorpholine, more preferably N-methyl-2-pyrrolidone (NMP).
 剥離液は、非環状含窒素化合物と環状含窒素化合物とを含むことが好ましいが、中でも、非環状含窒素化合物として、モノエタノールアミン、ジエタノールアミン、およびトリエタノールアミンから選ばれる少なくとも1種と、環状含窒素化合物として、N-メチル-2-ピロリドンおよびN-エチルモルホリンから選ばれる少なくとも1種とを含むことがより好ましく、モノエタノールアミンとN-メチル-2-ピロリドンとを含むことが更に好ましい。 The stripping solution preferably contains an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound. Among these, as the acyclic nitrogen-containing compound, at least one selected from monoethanolamine, diethanolamine, and triethanolamine, and cyclic The nitrogen-containing compound preferably includes at least one selected from N-methyl-2-pyrrolidone and N-ethylmorpholine, and more preferably includes monoethanolamine and N-methyl-2-pyrrolidone.
 剥離液で除去するときには、第1着色パターン12の上に形成されたレジストパターン52が除去されていればよく、第1着色パターン12の側壁にエッチング生成物であるデポ物が付着している場合でも、該デポ物が完全に除去されていなくてもよい。デポ物とは、エッチング生成物が着色層の側壁に付着し堆積したものをいう。 When removing with the stripping solution, it is sufficient that the resist pattern 52 formed on the first colored pattern 12 is removed, and a deposit as an etching product adheres to the side wall of the first colored pattern 12 However, the deposit may not be completely removed. A deposit means an etching product deposited and deposited on the side wall of a colored layer.
 剥離液としては、非環状含窒素化合物の含有量が、剥離液100質量部に対して9質量部以上11質量部以下であって、環状含窒素化合物の含有量が、剥離液100質量部に対して65質量部以上70質量部以下であるものが望ましい。また、剥離液は、非環状含窒素化合物と環状含窒素化合物との混合物を純水で希釈したものが好ましい。 As the stripping solution, the content of the non-cyclic nitrogen-containing compound is 9 parts by weight or more and 11 parts by weight or less with respect to 100 parts by weight of the stripping solution, and the content of the cyclic nitrogen-containing compound is 100 parts by weight of the stripping solution. On the other hand, what is 65 to 70 mass parts is desirable. Further, the stripping solution is preferably obtained by diluting a mixture of an acyclic nitrogen-containing compound and a cyclic nitrogen-containing compound with pure water.
 次いで、図7の概略断面図に示すように、第1貫通孔部分群121および第2貫通孔部分群122における各貫通孔の内部に第2着色感放射線性組成物を埋設させて、複数の第2着色画素が形成されるように、第1着色層(すなわち、第1着色層11に貫通孔群120が形成されてなる第1着色パターン12)上に第2着色感放射線性組成物により第2着色感放射線性層21を積層する(工程(ウ))。これにより、第1着色層11の貫通孔群120の中に、複数の第2着色画素を有する第2着色パターン22が形成される。ここで、第2着色画素は四角形状の画素となっている。第2着色感放射線性層21の形成は、既述の第1着色層11を形成する方法と同様にして行なえる。
 ここでの第2着色感放射線性層21の厚みとしては、0.3~1μmの範囲が好ましく、0.35~0.8μmの範囲がより好ましく、0.35~0.7μmの範囲がより好ましい。
Next, as shown in the schematic cross-sectional view of FIG. 7, the second colored radiation-sensitive composition is embedded in each through-hole in the first through-hole portion group 121 and the second through-hole portion group 122 to obtain a plurality of The second colored radiation-sensitive composition is formed on the first colored layer (that is, the first colored pattern 12 in which the through-hole group 120 is formed in the first colored layer 11) so that the second colored pixel is formed. The second colored radiation-sensitive layer 21 is laminated (step (c)). Thereby, the 2nd coloring pattern 22 which has a some 2nd coloring pixel in the through-hole group 120 of the 1st coloring layer 11 is formed. Here, the second colored pixel is a square pixel. The second colored radiation sensitive layer 21 can be formed in the same manner as the method for forming the first colored layer 11 described above.
Here, the thickness of the second colored radiation-sensitive layer 21 is preferably in the range of 0.3 to 1 μm, more preferably in the range of 0.35 to 0.8 μm, and more preferably in the range of 0.35 to 0.7 μm. preferable.
 そして、第2着色感放射線性層21の、第1着色層11に設けられた第1貫通孔部分群121に対応する位置21Aを露光し、現像することによって、第2着色感放射線性層21と、第2貫通孔部分群122の各貫通孔の内部に設けられた複数の第2着色画素22Rとを除去する(工程(エ))(図8の概略断面図を参照)。 Then, the second colored radiation-sensitive layer 21 is exposed and developed at a position 21A corresponding to the first through-hole portion group 121 provided in the first colored layer 11 of the second colored radiation-sensitive layer 21. Then, the plurality of second colored pixels 22R provided inside each through hole of the second through hole portion group 122 are removed (step (D)) (see the schematic sectional view of FIG. 8).
 次いで、図9の概略断面図に示すように、第2貫通孔部分群122における各貫通孔の内部に第3着色感放射線性組成物を埋設させて、複数の第3着色画素が形成されるように、第1着色層(すなわち、第1貫通孔部分群121の中に第2着色パターン22が形成されてなる第1着色パターン12)上に第3着色感放射線性組成物により第3着色感放射線性層31を形成する(工程(オ))。これにより、第1着色層11の第2貫通孔部分群122の中に、複数の第3着色画素を有する第3着色パターン32が形成される。ここで、第3着色画素は四角形状の画素となっている。第3着色感放射線性層31の形成は、既述の第1着色層11を形成する方法と同様にして行なえる。
 ここでの第3着色感放射線性層31の厚みとしては、0.3~1μmの範囲が好ましく、0.35~0.8μmの範囲がより好ましく、0.35~0.7μmの範囲がより好ましい。
Next, as shown in the schematic cross-sectional view of FIG. 9, a third colored radiation-sensitive composition is embedded in each through hole in the second through hole portion group 122 to form a plurality of third colored pixels. As described above, the third coloring radiation sensitive composition is used for the third coloring on the first coloring layer (that is, the first coloring pattern 12 in which the second coloring pattern 22 is formed in the first through-hole portion group 121). The radiation sensitive layer 31 is formed (process (e)). Thereby, the third colored pattern 32 having a plurality of third colored pixels is formed in the second through-hole portion group 122 of the first colored layer 11. Here, the third colored pixel is a square pixel. The third colored radiation-sensitive layer 31 can be formed in the same manner as the method for forming the first colored layer 11 described above.
The thickness of the third colored radiation-sensitive layer 31 here is preferably in the range of 0.3 to 1 μm, more preferably in the range of 0.35 to 0.8 μm, and more preferably in the range of 0.35 to 0.7 μm. preferable.
 そして、第3着色感放射線性層31の、第1着色層11に設けられた第2貫通孔部分群122に対応する位置31Aを露光し、現像することによって、第3着色感放射線性層31を除去することで、図10の概略断面図に示すように、第1着色パターン12と、第2着色パターン22と、第3着色パターン32とを有する着色層60が製造される(工程(カ))。 Then, the third colored radiation-sensitive layer 31 is exposed and developed at a position 31A corresponding to the second through-hole portion group 122 provided in the first colored layer 11 of the third colored radiation-sensitive layer 31. As shown in the schematic cross-sectional view of FIG. 10, the colored layer 60 having the first colored pattern 12, the second colored pattern 22, and the third colored pattern 32 is manufactured (process (capacitor). )).
 本発明のカラーフィルタの製造方法では、図11に示すように、着色層60に、上述した酸素遮断膜61を形成することにより、着色層60上に酸素遮断膜61が形成されたカラーフィルタ100を製造することができる。 In the color filter manufacturing method of the present invention, as shown in FIG. 11, the color filter 100 in which the oxygen blocking film 61 is formed on the colored layer 60 by forming the oxygen blocking film 61 described above on the colored layer 60. Can be manufactured.
 上述した第2着色感放射線性組成物、および、第3着色感放射線性組成物は、それぞれ、着色剤を含有する。着色剤は、上述した着色硬化性組成物のものを同様に挙げることができるが、第2着色画素および第3着色画素の一方が赤色透過部であり、他方が青色透過部であることが好ましい。
 赤色透過部を形成するための着色硬化性組成物に含有される着色剤は、C.I.Pigment Orange 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73、および、C.I.Pigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279から選択される1種以上であることが好ましい。
 青色透過部を形成するための着色硬化性組成物に含有される着色剤は、C.I.Pigment Violet 1,19,23,27,32,37,42、および、C.I.Pigment Blue 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,60,64,66,79,80から選択される1種以上であることが好ましい。
The second colored radiation-sensitive composition and the third colored radiation-sensitive composition described above each contain a colorant. As the colorant, those of the above-described colored curable composition can be mentioned in the same manner, but it is preferable that one of the second colored pixel and the third colored pixel is a red transmissive part and the other is a blue transmissive part. .
The colorant contained in the colored curable composition for forming the red transmission part is C.I. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, And C.I. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48: 1, 48: 2, 48: 3, 48: 4 49, 49: 1, 49: 2, 52: 1, 52: 2, 53: 1, 57: 1, 60: 1, 63: 1, 66, 67, 81: 1, 81: 2, 81: 3 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176, 177, 178, 179, 184 185, 187, 188, 190, 200, 202, 206, 207, 208, 209, 210, 216, 220, 224, 226, 242, 246, 254, 255, 264, 270, 272, 279 Species It is preferable that.
The colorant contained in the colored curable composition for forming the blue transmission part is C.I. I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, and C.I. I. Pigment Blue 1, 2, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 22, 60, 64, 66, 79, 80 or more It is preferable.
 第2着色感放射線性組成物、および、第3着色感放射線性組成物の各々において、着色剤の組成物の全固形分に対する含有量は、30質量%以上であることが好ましく、35質量%以上であることがより好ましく、40質量%以上であることが更に好ましい。また、着色剤の組成物の全固形分に対する含有量は、通常、90質量%以下であり、80質量%以下であることが好ましい。 In each of the second colored radiation-sensitive composition and the third colored radiation-sensitive composition, the content of the colorant composition with respect to the total solid content is preferably 30% by mass or more, and 35% by mass. More preferably, it is more preferably 40% by mass or more. Moreover, content with respect to the total solid of the composition of a coloring agent is 90 mass% or less normally, and it is preferable that it is 80 mass% or less.
 また、第2着色感放射線性組成物、および、第3着色感放射線性組成物は、それぞれ、ネガ型の感放射線性組成物が用いられることが好ましい。このネガ型の感放射線性組成物としては、紫外線(g線、h線、i線)、エキシマー・レーザー等を含む遠紫外線、電子線、イオンビームおよびX線等の放射線に感応するネガ型感放射線性組成物が使用できる。放射線のうち、g線、h線、i線が好ましく、中でもi線が好ましい。 Also, it is preferable that a negative radiation sensitive composition is used for each of the second colored radiation sensitive composition and the third colored radiation sensitive composition. As this negative type radiation sensitive composition, there is a negative type feeling sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays. A radiation composition can be used. Of the radiation, g-line, h-line and i-line are preferable, and i-line is particularly preferable.
 具体的には、ネガ型の感放射線性組成物として、光重合開始剤、重合成分(重合性化合物)、および、バインダー樹脂(アルカリ可溶性樹脂等)などを含有する組成物が好ましく、例えば、特開2005-326453号公報の段落番号[0017]~[0064]に記載のものを挙げることができる。このようなネガ型の感放射線性組成物は、放射線の照射により、光重合開始剤が、重合性化合物の重合反応を開始させ、結果として、アルカリ可溶状態から、アルカリ不溶性になることを利用するものである。 Specifically, as the negative radiation sensitive composition, a composition containing a photopolymerization initiator, a polymerization component (polymerizable compound), a binder resin (alkali-soluble resin, etc.) is preferable. Examples described in paragraph Nos. [0017] to [0064] of JP-A-2005-326453. Such a negative radiation sensitive composition utilizes the fact that the photopolymerization initiator initiates the polymerization reaction of the polymerizable compound upon irradiation with radiation, and as a result, the alkali soluble state becomes alkali insoluble. To do.
 第2着色感放射線性層21および第3着色感放射線性層31に対する露光は、g線、h線、i線等、好ましくはi線で露光を施すことにより行なうことができる。
 また、露光後に実施される現像は、通常、現像液で現像処理することにより行われる。
 現像液としては、フォトレジスト層51に対する露光、現像において既述した現像液と同様のものを挙げることができる。
 また、アルカリ性水溶液を現像液として用いた場合は、一般に現像後に水で洗浄処理が施される。
The exposure with respect to the 2nd colored radiation sensitive layer 21 and the 3rd colored radiation sensitive layer 31 can be performed by exposing with g line | wire, h line | wire, i line | wire, etc., Preferably i line | wire.
The development performed after exposure is usually performed by developing with a developer.
Examples of the developer include the same developers as those already described in the exposure and development of the photoresist layer 51.
When an alkaline aqueous solution is used as a developer, a washing treatment with water is generally performed after development.
 第1着色画素、第2着色画素および第3着色画素における一辺の長さ(画素が長方形である場合は短辺の長さであり、画素が正方形である場合は一辺の長さを指す)は、画像解像度の観点から、0.5~1.7μmが好ましく、0.6~1.5μmがより好ましい。 The length of one side of the first colored pixel, the second colored pixel, and the third colored pixel (the length of the short side when the pixel is a rectangle, and the length of one side when the pixel is a square) is From the viewpoint of image resolution, 0.5 to 1.7 μm is preferable, and 0.6 to 1.5 μm is more preferable.
 以上に説明した本発明のカラーフィルタの製造方法によれば、着色剤の濃度が高い着色層であって、高温高湿下においても、着色層表面における膜面荒れが起こりにくいカラーフィルタを提供することができる。
 また、本発明のカラーフィルタの製造方法によれば、第1着色層、特に、第1着色画素が、本発明の着色剤の濃度が高い着色硬化性組成物により形成されるため、第1着色画素の厚みを極めて薄くできる(例えば、0.7μm以下)。これにより、クロストーク(光の混色)が抑制されたカラーフィルタを製造することができる。
 また、上述した着色硬化性組成物により形成された第1着色画素は、耐溶剤性および耐アルカリ現像液性が優れたものとなる。そのため、他の着色層および他の着色パターンにおける色と重なり合うオーバーラップ領域の発生を低減でき、その結果、高性能のカラーフィルタを製造することができる。
According to the method for producing a color filter of the present invention described above, a color filter having a high colorant concentration, which is less likely to cause film surface roughness on the color layer surface even under high temperature and high humidity, is provided. be able to.
Moreover, according to the manufacturing method of the color filter of this invention, since a 1st colored layer, especially a 1st colored pixel is formed with the colored curable composition with the high density | concentration of the coloring agent of this invention, 1st coloring The thickness of the pixel can be extremely reduced (for example, 0.7 μm or less). Thereby, a color filter in which crosstalk (mixture of light) is suppressed can be manufactured.
Moreover, the 1st colored pixel formed with the colored curable composition mentioned above becomes what was excellent in solvent resistance and alkali developing solution resistance. Therefore, it is possible to reduce the occurrence of overlap regions overlapping with colors in other colored layers and other colored patterns, and as a result, a high-performance color filter can be manufactured.
 本発明のカラーフィルタは、液晶表示装置(LCD)や固体撮像素子(例えば、CCD、CMOS等)用として好適に用いることができる。また電子ペーパーや有機エレクトロルミネッセンス等の画像表示デバイスにも好適に用いることができる。特に、本発明のカラーフィルタは、CCD、およびCMOS等の固体撮像素子用として好適に用いることができる。 The color filter of the present invention can be suitably used for a liquid crystal display (LCD) or a solid-state imaging device (for example, CCD, CMOS, etc.). Moreover, it can use suitably also for image display devices, such as electronic paper and organic electroluminescence. In particular, the color filter of the present invention can be suitably used for a solid-state imaging device such as a CCD and a CMOS.
 また、本発明のカラーフィルタは、液晶表示装置用のカラーフィルタとしても好適である。このようなカラーフィルタを備えた液晶表示装置は、表示画像の色合いが良好で表示特性に優れた高画質画像を表示することができる。 The color filter of the present invention is also suitable as a color filter for a liquid crystal display device. A liquid crystal display device provided with such a color filter can display a high-quality image having a good display image color tone and excellent display characteristics.
 表示装置の定義や各表示装置の詳細については、例えば「電子ディスプレイデバイス(佐々木 昭夫著、(株)工業調査会 1990年発行)」、「ディスプレイデバイス(伊吹 順章著、産業図書(株)平成元年発行)」などに記載されている。また、液晶表示装置については、例えば「次世代液晶ディスプレイ技術(内田 龍男編集、(株)工業調査会 1994年発行)」に記載されている。本発明が適用できる液晶表示装置に特に制限はなく、例えば、上記の「次世代液晶ディスプレイ技術」に記載されている色々な方式の液晶表示装置に適用できる。 For the definition of display devices and details of each display device, refer to, for example, “Electronic Display Device (Akio Sasaki, Kogyo Kenkyukai, 1990)”, “Display Device (Junsho Ibuki, Industrial Books Co., Ltd.) Issued in the first year). The liquid crystal display device is described, for example, in “Next-generation liquid crystal display technology (edited by Tatsuo Uchida, Industrial Research Co., Ltd., published in 1994)”. The liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the “next generation liquid crystal display technology”.
 本発明のカラーフィルタは、カラーTFT方式の液晶表示装置に対して有用である。カラーTFT方式の液晶表示装置については、例えば「カラーTFT液晶ディスプレイ(共立出版(株)1996年発行)」に記載されている。更に、本発明はIPSなどの横電界駆動方式、MVAなどの画素分割方式などの視野角が拡大された液晶表示装置や、STN、TN、VA、OCS、FFS、およびR-OCB等にも適用できる。
 また、本発明のカラーフィルタは、明るく高精細なCOA(Color-filter On Array)方式にも供することが可能である。
 COA方式により形成される着色層には、着色層上に配置されるITO電極と着色層の下方の駆動用基板の端子とを導通させるために、一辺の長さが1~15μm程度の矩形のスルーホールあるいはコの字型の窪み等の導通路を形成する必要であり、導通路の寸法(すなわち、一辺の長さ)を特に5μm以下にすることが好ましいが、本発明を用いることにより、5μm以下の導通路を形成することも可能である。これらの画像表示方式については、例えば、「EL、PDP、LCDディスプレイ-技術と市場の最新動向-(東レリサーチセンター調査研究部門 2001年発行)」の43ページなどに記載されている。
The color filter of the present invention is useful for a color TFT type liquid crystal display device. The color TFT liquid crystal display device is described in, for example, “Color TFT liquid crystal display (issued in 1996 by Kyoritsu Publishing Co., Ltd.)”. Furthermore, the present invention is applied to a liquid crystal display device with a wide viewing angle such as a lateral electric field driving method such as IPS, a pixel division method such as MVA, STN, TN, VA, OCS, FFS, and R-OCB. it can.
The color filter of the present invention can also be used for a bright and high-definition COA (Color-filter On Array) system.
The colored layer formed by the COA method has a rectangular shape with a side length of about 1 to 15 μm in order to connect the ITO electrode arranged on the colored layer and the terminal of the driving substrate below the colored layer. It is necessary to form a conduction path such as a through hole or a U-shaped depression, and the dimension of the conduction path (that is, the length of one side) is particularly preferably 5 μm or less, but by using the present invention, It is also possible to form a conduction path of 5 μm or less. These image display methods are described, for example, on page 43 of "EL, PDP, LCD display-latest technology and market trends (issued in 2001 by Toray Research Center Research Division)".
 本発明の液晶表示装置は、本発明のカラーフィルタ以外に、電極基板、偏光フィルム、位相差フィルム、バックライト、スペーサ、視野角保障フィルムなど様々な部材から構成される。本発明のカラーフィルタは、これらの公知の部材で構成される液晶表示素子に適用することができる。これらの部材については、例えば、「‘94液晶ディスプレイ周辺材料・ケミカルズの市場(島 健太郎 (株)シーエムシー 1994年発行)」、「2003液晶関連市場の現状と将来展望(下巻)(表 良吉(株)富士キメラ総研、2003年発行)」に記載されている。
 バックライトに関しては、SID meeting Digest 1380(2005)(A.Konno et.al)や、月刊ディスプレイ 2005年12月号の18~24ページ(島 康裕)、同25~30ページ(八木隆明)などに記載されている。
The liquid crystal display device of the present invention includes various members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle guarantee film in addition to the color filter of the present invention. The color filter of the present invention can be applied to a liquid crystal display element composed of these known members. Regarding these materials, for example, “'94 Liquid Crystal Display Peripheral Materials / Chemicals Market (Kentaro Shima, CMC 1994)”, “2003 Liquid Crystal Related Markets Current Status and Future Prospects (Volume 2)” Fuji Chimera Research Institute, Ltd., published in 2003) ”.
Regarding backlights, SID meeting Digest 1380 (2005) (A. Konno et.al), Monthly Display December 2005, pages 18-24 (Yasuhiro Shima), pages 25-30 (Takaaki Yagi), etc. Are listed.
 本発明のカラーフィルタを液晶表示装置に用いると、従来公知の冷陰極管の三波長管と組み合わせたときに高いコントラストを実現できるが、更に、赤、緑、青のLED光源(RGB-LED)をバックライトとすることによって輝度が高く、また、色純度の高い色再現性の良好な液晶表示装置を提供することができる。 When the color filter of the present invention is used in a liquid crystal display device, a high contrast can be realized when combined with a conventionally known three-wavelength tube of a cold cathode tube, but further, red, green and blue LED light sources (RGB-LED). By using as a backlight, a liquid crystal display device having high luminance and high color purity and good color reproducibility can be provided.
 以下に実施例を挙げて本発明をさらに具体的に説明する。以下の実施例に示す材料、使用量、割合、処理内容、処理手順等は、本発明の趣旨を逸脱しない限り、適宜、変更することができる。従って、本発明の範囲は以下に示す具体例に限定されるものではない。なお、特に断りのない限り、「部」、「%」は、質量基準である。 The present invention will be described more specifically with reference to the following examples. The materials, amounts used, ratios, processing details, processing procedures, and the like shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Unless otherwise specified, “part” and “%” are based on mass.
<合成例1-染料Aの合成>
(中間体Aの合成)
 フラスコにテトラクロロフタロニトリル(15.0g、56.4mmol)とHO-C64-COOC24OCH3(12.65g、56.4mmol)、アセトニロリル75.0gを投入し、マグネチックスターラーを用いて、内温が40℃に安定するまで30分間攪拌した後、炭酸カリウム(8.58g、62.1mmol)を投入して約3時間反応させた。冷却後、吸引ろ過して得た溶液を40℃、1時間で減圧濃縮し、溶剤を溜去した。さらに、110℃で一晩真空乾燥し、約23.0g(89.9%)の中間体Aが得られた。
<Synthesis Example 1 Synthesis of Dye A>
(Synthesis of Intermediate A)
A flask was charged with tetrachlorophthalonitrile (15.0 g, 56.4 mmol), HO—C 6 H 4 —COOC 2 H 4 OCH 3 (12.65 g, 56.4 mmol), and 75.0 g of acetonitrile, and a magnetic stirrer. After stirring for 30 minutes until the internal temperature was stabilized at 40 ° C., potassium carbonate (8.58 g, 62.1 mmol) was added and allowed to react for about 3 hours. After cooling, the solution obtained by suction filtration was concentrated under reduced pressure at 40 ° C. for 1 hour, and the solvent was distilled off. Furthermore, it vacuum-dried at 110 degreeC overnight, and about 23.0 g (89.9%) of intermediate body A was obtained.
(染料Aの合成)
 フラスコに中間体A(2.13g、4.7mmol)、ベンゾニトリル2.35mLを投入し、窒素気流下(10mL/min)、マグネチックスターラーを用いて内温150℃に安定するまで約1時間攪拌した後、ヨウ化亜鉛0.43g(1.3mmol)を投入して、約35時間反応させた。冷却後メタノール30mLを加え、マグネチックスターラーを用いて室温にて攪拌することで晶析溶液とした。晶析溶液をデカンテーションし、残った残渣をシリカゲルカラムクロマトグラフィー(クロロホルム/メタノール)にて精製した。得られた精製物にメタノール20mLを加え、マグネチックスターラーを用いて60℃で1時間加熱攪拌した。冷却後、吸引ろ過し、得られた結晶にメタノール20mLを加え、マグネチックスターラーを用いて60℃で1時間加熱攪拌した。冷却後、吸引ろ過し、得られた結晶を40℃で一晩送風乾燥し、約1.95g(88.2%)の染料Aが得られた。
(Synthesis of Dye A)
Intermediate A (2.13 g, 4.7 mmol) and 2.35 mL of benzonitrile were added to the flask, and about 1 hour until the internal temperature was stabilized at 150 ° C. using a magnetic stirrer under a nitrogen stream (10 mL / min). After stirring, 0.43 g (1.3 mmol) of zinc iodide was added and allowed to react for about 35 hours. 30 mL of methanol was added after cooling, and it was set as the crystallization solution by stirring at room temperature using a magnetic stirrer. The crystallization solution was decanted and the remaining residue was purified by silica gel column chromatography (chloroform / methanol). 20 mL of methanol was added to the purified product obtained, and the mixture was heated and stirred at 60 ° C. for 1 hour using a magnetic stirrer. After cooling, suction filtration was performed, 20 mL of methanol was added to the obtained crystals, and the mixture was heated and stirred at 60 ° C. for 1 hour using a magnetic stirrer. After cooling, suction filtration was carried out, and the resulting crystals were air-dried overnight at 40 ° C. to obtain about 1.95 g (88.2%) of dye A.
<合成例2-他の染料の合成>
上記合成例1に従って、染料B~染料Eを合成した。
<Synthesis Example 2-Synthesis of other dyes>
Dye B to Dye E were synthesized according to Synthesis Example 1 above.
<顔料分散液の調製>
 下記化合物を配合した混合液を、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合、分散して、顔料分散液を調製した。顔料の種類は下記表に記載のものとし、また、各成分の配合量は、最終的に得られる着色硬化性組成物中の組成比が下記表に記載の割合となるように配合した。
・顔料(下記表に示す顔料)
・誘導体
・分散剤
・溶剤:プロピレングリコールモノメチルエーテルアセテート(PGMEA)
 上記合成例1に従って、他のフタロシアニン染料を合成した。
<Preparation of pigment dispersion>
The mixed liquid containing the following compound was mixed for 3 hours using a zirconia bead having a diameter of 0.3 mm in a bead mill (high pressure disperser NANO-3000-10 with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.)). Dispersed to prepare a pigment dispersion. The types of pigments are those described in the following table, and the blending amounts of the respective components are blended so that the composition ratio in the finally obtained colored curable composition is the ratio described in the following table.
・ Pigments (Pigments shown in the table below)
・ Derivatives ・ Dispersants ・ Solvent: Propylene glycol monomethyl ether acetate (PGMEA)
According to Synthesis Example 1, another phthalocyanine dye was synthesized.
<着色硬化性組成物の調製>
 下記表に記載の組成となるように各成分を混合し、撹拌して着色硬化性組成物を調製した。
・染料(着色剤)
・黄色色素(着色剤)
・熱硬化性化合物
・溶剤・・・最終固形分濃度が15質量%となる量
<Preparation of colored curable composition>
Each component was mixed so that it might become a composition of the following table | surface, and it stirred and prepared the colored curable composition.
・ Dyes (colorants)
・ Yellow pigment (colorant)
・ Thermosetting compound ・ Solvent: The amount that the final solid content concentration becomes 15 mass%
ハロゲン化フタロシアニン染料A:
Figure JPOXMLDOC01-appb-C000039
Halogenated phthalocyanine dye A:
Figure JPOXMLDOC01-appb-C000039
ハロゲン化フタロシアニン染料B:
Figure JPOXMLDOC01-appb-C000040
Halogenated phthalocyanine dye B:
Figure JPOXMLDOC01-appb-C000040
ハロゲン化フタロシアニン染料C:
Figure JPOXMLDOC01-appb-C000041
Halogenated phthalocyanine dye C:
Figure JPOXMLDOC01-appb-C000041
ハロゲン化フタロシアニン染料D:
Figure JPOXMLDOC01-appb-C000042
Halogenated phthalocyanine dye D:
Figure JPOXMLDOC01-appb-C000042
非ハロゲン化フタロシアニン染料E:
Figure JPOXMLDOC01-appb-C000043
Non-halogenated phthalocyanine dye E:
Figure JPOXMLDOC01-appb-C000043
<他の着色剤>
黄色色素A(アゾ系色素(顔料)):P.Y150
黄色色素B(メチン系色素(アゾメチン色素)(染料)):(合成例は後述する。)
Figure JPOXMLDOC01-appb-C000044
<Other colorants>
Yellow dye A (azo dye (pigment)): P.I. Y150
Yellow pigment B (methine pigment (azomethine pigment) (dye)): (Synthesis examples will be described later.)
Figure JPOXMLDOC01-appb-C000044
<誘導体>
Figure JPOXMLDOC01-appb-C000045
<Derivative>
Figure JPOXMLDOC01-appb-C000045
<分散剤>
Figure JPOXMLDOC01-appb-C000046
上記において、aは、2.0、bは4.0、酸価10mgKOH/g、Mw20000である。
また、分散剤Aにおけるa及びbは、それぞれ、括弧内で表される部分構造の数を表し、a+b=6を満たす。
<Dispersant>
Figure JPOXMLDOC01-appb-C000046
In the above, a is 2.0, b is 4.0, acid value is 10 mgKOH / g, and Mw20000.
Further, a and b in the dispersant A each represent the number of partial structures represented in parentheses and satisfy a + b = 6.
<熱硬化性化合物>
熱硬化性化合物A:エポキシ化合物:EHPE3150(ダイセル化学工業(株)製 分子量=2234)
熱硬化性化合物B:メラミン化合物:ニカラックMW-30M(三和ケミカル(株)製)
<界面活性剤>
界面活性剤:F-781(DIC(株)製 フッ素系界面活性剤)
<Thermosetting compound>
Thermosetting compound A: Epoxy compound: EHPE3150 (Daicel Chemical Industries, Ltd. molecular weight = 2234)
Thermosetting compound B: Melamine compound: Nicalac MW-30M (manufactured by Sanwa Chemical Co., Ltd.)
<Surfactant>
Surfactant: F-781 (Fluorosurfactant manufactured by DIC Corporation)
<メチン系色素Bの合成>
 メチン系色素Bは、以下のスキームで合成した。
Figure JPOXMLDOC01-appb-C000047
<Synthesis of methine dye B>
Methine dye B was synthesized according to the following scheme.
Figure JPOXMLDOC01-appb-C000047
(中間体Aの合成)
 上記化合物(A)(EP0571959A2公報に記載の方法にて合成)100重量部、ピリジン390mlの混合溶液を5℃まで冷却し、オクタンスルホニルクロライド87重量部を、反応温度25℃以下で滴下した。反応液を室温で2時間撹拌後、4N 塩酸水溶液 2Lを加え、室温で攪拌した後、濾取した。濾取した結晶をメタノール500mlで洗浄後、乾燥することにより、中間体Aを153g(収率91%)得た。
1H-NMR  CDCl3 δ0.8(t, 3H) 1.0-1.4(m, 19), 1.6(m, 2H) 3.2(t, 2H) 5.6(s, 1H) 7.3(d, 2H) 7.9(d, 2H) 10.2(s, 1H) 12.9(s, 1H)
(Synthesis of Intermediate A)
A mixed solution of 100 parts by weight of the above compound (A) (synthesized by the method described in EP 0571959A2) and 390 ml of pyridine was cooled to 5 ° C., and 87 parts by weight of octanesulfonyl chloride was added dropwise at a reaction temperature of 25 ° C. or less. The reaction mixture was stirred at room temperature for 2 hours, 2 L of 4N aqueous hydrochloric acid solution was added, and the mixture was stirred at room temperature and collected by filtration. The crystals collected by filtration were washed with 500 ml of methanol and dried to obtain 153 g of intermediate A (yield 91%).
1 H-NMR CDCl 3 δ0.8 (t, 3H) 1.0-1.4 (m, 19), 1.6 (m, 2H) 3.2 (t, 2H) 5.6 (s, 1H) 7.3 (d, 2H) 7.9 (d , 2H) 10.2 (s, 1H) 12.9 (s, 1H)
(メチン系色素Bの合成)
 中間体A 110g、酢酸650mlの懸濁溶液に室温で、オルトギ酸エチル68gを加え、反応液を80℃で3時間攪拌させた。反応液にメタノール1.1Lを加え、冷却後、濾取、メタノール洗浄することにより、メチン系色素Bを96g(収率88%)得た。
1H-NMR  CDCl3 δ0.8(t, 6H) 1.2-2.0(m, 41H) 3.3(t, 4H) 7.3(d, 4H), 7.6(br, 2H) 7.8(d, 4H) 8.4(s, 1H)
(Synthesis of methine dye B)
To a suspension of 110 g of Intermediate A and 650 ml of acetic acid, 68 g of ethyl orthoformate was added at room temperature, and the reaction solution was allowed to stir at 80 ° C. for 3 hours. Methanol 1.1L was added to the reaction liquid, and after cooling, it was filtered and washed with methanol to obtain 96 g (yield 88%) of methine dye B.
1 H-NMR CDCl 3 δ0.8 (t, 6H) 1.2-2.0 (m, 41H) 3.3 (t, 4H) 7.3 (d, 4H), 7.6 (br, 2H) 7.8 (d, 4H) 8.4 (s , 1H)
 得られた組成物について、以下の評価を行った。 The following evaluation was performed about the obtained composition.
<膜面荒れ評価基板の作製>
 7.5cm×7.5cmのガラス基板上にスピンコーターにて、上述の組成物を膜厚0.5μmの塗布膜となるように塗布した後、ホットプレートを使用して100℃で2分間加熱乾燥し、次いで200℃で5分間の加熱を行い、塗布膜の硬化を行って着色層を形成した。
<Production of film surface roughness evaluation substrate>
After applying the above composition to a 0.5 μm-thick coating film on a 7.5 cm × 7.5 cm glass substrate with a spin coater, heating at 100 ° C. for 2 minutes using a hot plate It dried and then heated at 200 ° C. for 5 minutes to cure the coating film to form a colored layer.
<酸素遮断膜の形成>
 実施例1~3および比較例2において、作製したガラス基板をスパッタリング装置(神港精機社製SRV-4300)を用いて、SiO2またはSiNをスパッタリングし、膜厚0.1μmの酸素遮断膜を着色層上に形成した。また、実施例4および実施例5において、作製したガラス基板をスピンコーター(ミカサ社製1H-D7)を用いて、ポリビニルアルコール(重量平均分子量:2000)水溶液またはポリビニルピロリドン(重量平均分子量:1800)水溶液をそれぞれ塗布し、膜厚1.0μmの酸素遮断膜を着色層上に形成した。結果を表1に示す。なお、表1において、無機材料AはSiO2、無機材料BはSiN、有機材料Aはポリビニルアルコール、有機材料Bはポリビニルピロリドンを示し、比較例1においては、いずれの酸素遮断膜も形成しなかった。
<Formation of oxygen barrier film>
In Examples 1 to 3 and Comparative Example 2, the produced glass substrate was sputtered with SiO 2 or SiN using a sputtering apparatus (SRV-4300 manufactured by Shinko Seiki Co., Ltd.) to form an oxygen blocking film with a thickness of 0.1 μm. Formed on the colored layer. Further, in Example 4 and Example 5, the produced glass substrate was subjected to an aqueous solution of polyvinyl alcohol (weight average molecular weight: 2000) or polyvinyl pyrrolidone (weight average molecular weight: 1800) using a spin coater (1H-D7 manufactured by Mikasa). Each aqueous solution was applied to form an oxygen barrier film having a thickness of 1.0 μm on the colored layer. The results are shown in Table 1. In Table 1, inorganic material A is SiO 2 , inorganic material B is SiN, organic material A is polyvinyl alcohol, and organic material B is polyvinyl pyrrolidone. In Comparative Example 1, no oxygen blocking film is formed. It was.
<高温高湿試験>
 酸素遮断膜を形成したガラス基板を、高加速度寿命試験装置(エスペック社製EHS-221)を用いて温度85℃、湿度85%の条件下で168時間、高温高湿試験を実施した。
<High temperature and high humidity test>
The glass substrate on which the oxygen barrier film was formed was subjected to a high temperature and high humidity test for 168 hours under conditions of a temperature of 85 ° C. and a humidity of 85% using a high acceleration life test apparatus (EHS-221 manufactured by Espec Corp.).
<膜面荒れ評価>
 高温高湿試験後の酸素遮断膜を形成したガラス基板を、光学顕微鏡(オリンパス社製MX-50)を用いて反射200倍の条件で凝集異物を目視評価した。結果を以下の表に示す。下記基準で3~5を実用上問題のないレベルと評価する。
-評価基準-
5:凝集異物の発生がまったく無い。
4:凝集異物が極めて小数(5視野領域に5個以上25個未満)発生した。
3:凝集異物が小数(5視野領域に25個以上100個未満)発生した。
2:凝集異物が多数(5視野領域に100個以上500個未満)発生した。
1:凝集異物が著しく(5視野領域に500個以上)発生した。
<Roughness evaluation of film surface>
The glass substrate on which the oxygen barrier film after the high-temperature and high-humidity test was formed was visually evaluated for aggregated foreign substances using an optical microscope (MX-50 manufactured by Olympus Corporation) under the condition of reflection 200 times. The results are shown in the table below. Based on the following criteria, 3 to 5 are evaluated as having no practical problem.
-Evaluation criteria-
5: There is no occurrence of aggregated foreign matters.
4: An extremely small number of aggregated foreign matters (5 or more and less than 25 in 5 visual field regions) was generated.
3: A small number of aggregated foreign substances (25 or more and less than 100 in 5 fields of view) occurred.
2: A large number of aggregated foreign matters (100 or more and less than 500 in 5 fields of view) were generated.
1: Agglomerated foreign matter was remarkably generated (500 or more in 5 fields of view).
Figure JPOXMLDOC01-appb-T000048
Figure JPOXMLDOC01-appb-T000048
 上記表から明らかなように、着色剤、熱硬化性化合物および溶剤を含み、着色剤の含有量の合計が着色硬化性組成物の全固形分に対し50~90質量%である着色硬化性組成物を用いて形成された着色層において、着色層上に酸素遮断膜が形成された積層体(実施例1~10)は、膜面荒れが抑制されていることが分かった。
 また、実施例1~10では、優れた分光特性を有し、良好な耐光性を有することが分かった。
 これに対し、酸素遮断膜を形成していない積層体(比較例1)は、膜面荒れの結果が良好ではないことが分かった。また、酸素遮断膜が形成されているが着色剤の含有量の合計が着色硬化性組成物の全固形分に対し50%未満の場合(比較例2)には、膜面荒れが抑制されていたが、着色剤の濃度が低いので、薄膜化ができない。
As is apparent from the above table, a colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass relative to the total solid content of the colored curable composition. In the colored layer formed using the product, it was found that the laminates (Examples 1 to 10) in which the oxygen blocking film was formed on the colored layer had suppressed film surface roughness.
In addition, Examples 1 to 10 were found to have excellent spectral characteristics and good light resistance.
On the other hand, it was found that the laminate (Comparative Example 1) in which the oxygen barrier film was not formed did not have a good film surface roughness. In addition, when the oxygen barrier film is formed but the total content of the colorants is less than 50% with respect to the total solid content of the colored curable composition (Comparative Example 2), film surface roughness is suppressed. However, since the concentration of the colorant is low, it cannot be thinned.
 10 固体撮像素子
 11 第1着色層
 12 第1着色パターン
 13,100 カラーフィルタ
 14 平坦化膜
 15 マイクロレンズ
 20G 緑色画素(第1色画素)
 20R 赤色画素(第2色画素)
 20B 青色画素(第3色画素)
 21 第2着色感放射線性層
 21A 第1貫通孔部分群121に対応する位置
 22 第2着色パターン
 22R 第2貫通孔部分群122の各貫通孔の内部に設けられた複数の第2着色画素
 31 第3着色感放射線性層
 31A 第2貫通孔部分群122に対応する位置
 32 第3着色パターン
 41 Pウエル
 42 受光素子(フォトダイオード)
 43 不純物拡散層
 44 電極
 45 配線層
 46 BPSG膜
 47 絶縁膜
 48 P-SiN膜
 49 平坦化膜層
 51 フォトレジスト層
 51A レジスト貫通孔
 52 レジストパターン(パターニングされたフォトレジスト層)
 60 着色層
 61 酸素遮断膜
 120 貫通孔群
 121 第1貫通孔部分群
 122 第2貫通孔部分群
DESCRIPTION OF SYMBOLS 10 Solid-state image sensor 11 1st colored layer 12 1st colored pattern 13,100 Color filter 14 Flattening film 15 Microlens 20G Green pixel (1st color pixel)
20R red pixel (second color pixel)
20B Blue pixel (third color pixel)
21 2nd coloring radiation sensitive layer 21A The position corresponding to the 1st through-hole part group 121 22 2nd coloring pattern 22R The some 2nd coloring pixel 31 provided in the inside of each through-hole of the 2nd through-hole part group 122 Third colored radiation-sensitive layer 31A Position corresponding to second through-hole portion group 32 Third colored pattern 41 P well 42 Light receiving element (photodiode)
43 Impurity diffusion layer 44 Electrode 45 Wiring layer 46 BPSG film 47 Insulating film 48 P-SiN film 49 Planarizing film layer 51 Photoresist layer 51A Resist through hole 52 Resist pattern (patterned photoresist layer)
60 colored layer 61 oxygen blocking film 120 through-hole group 121 first through-hole part group 122 second through-hole part group

Claims (13)

  1. 着色剤、熱硬化性化合物および溶剤を含む着色硬化性組成物であって、前記着色剤の含有量の合計が前記着色硬化性組成物の全固形分に対し50~90質量%である着色硬化性組成物を硬化してなる着色層上に酸素遮断膜が形成された積層体。 A colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass with respect to the total solid content of the colored curable composition. The laminated body in which the oxygen barrier film was formed on the colored layer formed by hardening an adhesive composition.
  2. 前記着色剤が、下記一般式(1)で表されるハロゲン化フタロシアニン染料を含む、請求項1に記載の積層体。
    一般式(1)
    Figure JPOXMLDOC01-appb-C000001
    (一般式(1)中、Z1~Z16は、それぞれ、水素原子または置換基であり、置換基の少なくとも1つは、ハロゲン原子であり、置換基の他の少なくとも1つは、芳香族基を含む基である。Mは2つの水素原子、金属原子、金属酸化物または金属ハロゲン化物を表す。)
    The laminate according to claim 1, wherein the colorant contains a halogenated phthalocyanine dye represented by the following general formula (1).
    General formula (1)
    Figure JPOXMLDOC01-appb-C000001
    (In the general formula (1), Z 1 to Z 16 are each a hydrogen atom or a substituent, at least one of the substituents is a halogen atom, and at least one of the other substituents is aromatic. (M represents a hydrogen atom, a metal atom, a metal oxide, or a metal halide.)
  3. 前記熱硬化性化合物がエポキシ化合物である、請求項1または2に記載の積層体。 The laminate according to claim 1 or 2, wherein the thermosetting compound is an epoxy compound.
  4. 前記着色剤が、さらに黄色色素を含む、請求項1~3のいずれか1項に記載の積層体。 The laminate according to any one of claims 1 to 3, wherein the colorant further contains a yellow pigment.
  5. 前記着色剤の含有量の合計が前記着色硬化性組成物の全固形分に対し60~90質量%である、請求項1~4のいずれか1項に記載の積層体。 The laminate according to any one of claims 1 to 4, wherein the total content of the colorant is 60 to 90% by mass with respect to the total solid content of the colored curable composition.
  6. 前記着色層の厚さが0.1~1.0μmである、請求項1~5のいずれか1項に記載の積層体。 The laminate according to any one of claims 1 to 5, wherein the colored layer has a thickness of 0.1 to 1.0 µm.
  7. 前記酸素遮断膜と前記着色層とが隣接している、請求項1~6のいずれか1項に記載の積層体。 The laminate according to any one of claims 1 to 6, wherein the oxygen blocking film and the colored layer are adjacent to each other.
  8. 前記酸素遮断膜の厚さが10μm以下である、請求項1~7のいずれか1項に記載の積層体。 The laminate according to any one of claims 1 to 7, wherein the oxygen barrier film has a thickness of 10 袖 m or less.
  9. 前記酸素遮断膜が無機材料を含む、請求項1~8のいずれか1項に記載の積層体。 The laminate according to any one of claims 1 to 8, wherein the oxygen barrier film includes an inorganic material.
  10. 請求項1~9のいずれか1項に記載の積層体を有するカラーフィルタ。 A color filter having the laminate according to any one of claims 1 to 9.
  11. 着色剤、熱硬化性化合物および溶剤を含む着色硬化性組成物であって、前記着色剤の含有量の合計が前記着色硬化性組成物の全固形分に対し50~90質量%である着色硬化性組成物を硬化して着色層を形成する工程、前記着色層上にフォトレジスト層を形成する工程、露光および現像することにより前記フォトレジスト層をパターニングしてレジストパターンを得る工程および前記レジストパターンをエッチングマスクとして前記着色層をドライエッチングする工程、前記ドライエッチング後の着色層上に酸素遮断膜を形成する工程を含む、カラーフィルタの製造方法。 A colored curable composition comprising a colorant, a thermosetting compound and a solvent, wherein the total content of the colorant is 50 to 90% by mass with respect to the total solid content of the colored curable composition. A step of curing the adhesive composition to form a colored layer, a step of forming a photoresist layer on the colored layer, a step of patterning the photoresist layer by exposure and development to obtain a resist pattern, and the resist pattern A method for producing a color filter, comprising: a step of dry-etching the colored layer using an etching mask; and a step of forming an oxygen blocking film on the colored layer after the dry etching.
  12. 前記酸素遮断膜を、スパッタリングにより形成する、請求項11に記載のカラーフィルタの製造方法。 The method for producing a color filter according to claim 11, wherein the oxygen blocking film is formed by sputtering.
  13. 請求項10に記載のカラーフィルタ、または、請求項11または12に記載のカラーフィルタの製造方法により作製されたカラーフィルタを有する液晶表示装置、有機エレクトロルミネッセンス素子または固体撮像素子。 A liquid crystal display device, an organic electroluminescence element, or a solid-state imaging device having the color filter according to claim 10 or the color filter produced by the method for producing a color filter according to claim 11 or 12.
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