WO2014007123A1

WO2014007123A1 - Implant caps with sterilizing function

Info

Publication number: WO2014007123A1
Application number: PCT/JP2013/067509
Authority: WO
Inventors: 河原　優一郎
Original assignee: Kawahara Yuichiro
Priority date: 2012-07-05
Filing date: 2013-06-26
Publication date: 2014-01-09
Also published as: JP2014012105A

Abstract

The purpose of the present invention is to make a cover cap and a healing cap to have an antibacterial activity to thereby inhibit bacteria from intruding from above the implant into the fixture part. The cover cap (10) and the healing cap (16) both for implants are used during the period of implantation treatment, and are characterized in that the surface of each cap is equipped with a sterilizing layer (14). The sterilizing layer (14) is formed by forming, on the surface of the implant cap, a layer of a photocatalytic material which exhibits a sterilizing function upon irradiation with light. As the photocatalytic material is used a photocatalytic coating material or titanium oxide that exhibits a photocatalytic function upon irradiation with light. For a sterilizing layer in which the photocatalyst can be activated in the visible-light region, use may be made of titanium oxide which has been rendered a non-photocatalytic material that needs no light irradiation, by nitrogen doping or by a change in photoexcitation structure.

Description

Cap for implant with sterilization function

The present invention relates to a cover cap that is attached to an implant in order to cope with infections such as peri-implantitis that occur during the period when the fixture and bone tissue of a dental implant achieve osseointegration and the maintenance period after the end of treatment. And a healing cap.

In order to regain the function of the lost tooth, as a means of supplementing the lost oral function by replacing with artificial materials such as metal and ceramics, if the denture is buried in the root or completely lost, it is healthy. In addition to treatment means such as placing a denture by bridging a tooth, oral implant treatment is performed as one of the advanced treatment methods. Oral implant treatment is a means of implanting a titanium artificial tooth root in the jawbone at the site of the lost tooth.

In 1952, Sweden's Per Ingvar Brönemark accidentally discovered that titanium and bone were completely combined, and when titanium was implanted in the bone under certain conditions, bone rejection to titanium Did not occur at all, and it was revealed that a strong bond was born through the oxygen film covering the titanium surface. In 1965, the first clinical application as an artificial tooth root was started. Since then, oral implant treatment has made tremendous progress. The bone connection method, in which titanium and bone are directly connected without intervening connective tissue, is called osseointegration, which is a combination of Latin male (os) for bone and English integration for bone. It is.

Osseointegration is a phenomenon in which bone and metal are directly bonded, and the function that acts on the contact surface between the oxide film on the titanium surface and the bone binds biological molecules to the oxide film and causes bone adhesion.

The success of the implant is important in how to obtain osseointegration, and there are various proposals for the surface properties of the fixture part of the implant.

Metal implants having a hydrophilic surface for at least partial insertion into bone, in particular dental implants and methods for producing the implants, in weak alkaline solutions in at least some areas for improved osseointegration properties By treating for a short time, an excellent hydrophilic surface can be obtained. This osseointegration property is the result of chemical treatment in alkaline solution at least part of the surface that is exposed to bone or soft tissue, either after pretreatment, mechanical surface modification by material removal, after chemical surface modification, or without treatment. It can be obtained by a modification method (see Patent Document 1).

For implants made from titanium or titanium alloys, the bone is suitable for implantation into the bone as a hydrophilic surface, as the surface is roughened and the implant is hydroxylated and treated with high energy UV radiation. It can be set as an affinity implant (refer patent document 2).

Ultraviolet irradiation of the implant fixture part is performed for various purposes, and typically there are those for the purpose of bactericidal action. Furthermore, in order to improve the osseointegration function of the implant, for example, the following I have a suggestion.

In the manufacturing method of the implant, a titanium oxide film is formed on the surface of the substrate by heat treatment, and then the titanium oxide film is irradiated with ultraviolet rays. Thereby, it becomes easy to form hydroxyapatite on the surface of the titanium oxide film, and an implant excellent in biocompatibility can be provided. It is not sufficient to irradiate ordinary titanium implants with ultraviolet rays, and when a titanium oxide film is formed on the surface, the apatite forming ability by ultraviolet irradiation is greatly improved. The titanium oxide film is formed on the surface of the substrate by heat treatment, and does not peel off. The temperature of the heat treatment is preferably 250 to 500 ° C. When the heating temperature is less than 250 ° C., the titanium oxide film is not sufficiently formed, and there is a possibility that the apatite forming ability is not improved even when irradiated with ultraviolet rays (see Patent Document 3).

The surface of the implant material is provided with a metal oxide layer having photocatalytic activity and biocompatibility, and when it is implanted in the living body, it is possible to increase the adhesion area with osteoblasts. As a result, the cell adhesion and cell proliferation of the implant can be improved. Thereby, it becomes possible to more reliably join the bone tissue and the implant in a short period of time. In addition, the photocatalytic activity makes it possible to sterilize bacteria and the like attached to the implant surface, thereby completely removing the infection foci and detoxifying (see Patent Document 4).

In this way, technology development is being promoted mainly for the fixture part of implants with the aim of promoting osseointegration and sterilization, but reports on cover caps and healing caps used in the implant surgery process. There is no example.

The completed implant uses a dental implant to attach the prosthetic crown, so that the abutment crosses the gingival margin and covers the top of the abutment exposed from the gingival margin A dental prosthesis is attached. In such a dental prosthesis, there is a gap between the dental prosthesis and the gingival margin, and a part of the abutment may be exposed, and plaque is accumulated most in the exposed part of the abutment. It becomes easy. For this purpose, it is proposed that the outer surface of the abutment located between the gingival margin and the dental prosthetic crown is provided with a coating part in which a film containing titanium oxide powder coated with hydroxyapatite or fluorinated hydroxyapatite is formed. (See Patent Document 5).

Special table 2010-501212 Reference 2005-505352 WO2008 / 143219 Japanese Patent Laid-Open No. 2008-80102 Japanese Unexamined Patent Publication No. 2007-98054

Osseointegrated implants based on osseointegration are prosthetic treatments to restore oral function resulting from tooth defects, and the establishment and maintenance of osseointegration is essential for long-term success.

However, in order to promote this osseointegration, many proposals have been made on the surface properties of the implant, and the target is the fixture part that is in direct contact with the alveolar bone. Slightly, with regard to abutments, it has been proposed to have a plaque removal function after completion of the implant, but there were no examples in which additional functions were considered for the cover cap and healing cap used during implant treatment. .

The present invention focuses on a cover cap and a healing cap used during the period of promoting osseointegration of an implant treatment, makes it difficult for the sutured portion to tear and exhibits an antibacterial activity. An object of the present invention is to provide a cover cap and a healing cap that can prevent bacteria from entering the fixture portion.

The present invention is provided with a bactericidal layer on the surface of an implant cap used during the treatment period of an implant, improves biocompatibility by utilizing superhydrophilicity and bactericidal effect due to photocatalytic activity, and contamination due to invasion of bacteria. This is characterized in that it has a function that prevents the sutured portion from tearing. Implant caps used during the treatment period of the implant are a cover cap and a healing cap.

The sterilization layer provided on the surface of the cap for implants is formed in a layer shape on the surface of the cap for implants using a photocatalyst material that exhibits a sterilization function when irradiated with light. As the photocatalyst material, a photocatalyst coating agent or titanium oxide that exhibits a photocatalytic function when irradiated with light is used.

Generally, titanium oxide exhibits a photocatalytic function by ultraviolet light, but by doping nitrogen in the titanium oxide crystal, an energy gap is narrowed and a photocatalytic function is exhibited by visible light. In addition, by doping silver in the titanium oxide crystal, the photocatalytic action can be maintained for a long time even in a dark place after the photocatalytic function is exhibited. For this reason, when using a titanium oxide as a sterilizing layer for the cap for implants, the titanium oxide crystal may be doped with nitrogen.

Titanium oxide generally exhibits a photocatalytic function with respect to ultraviolet light. However, the titanium oxide layer formed on the implant cap is irradiated with laser light, ultraviolet light, or X-rays, and the energy of titanium oxide is changed by photoexcitation structure change. By narrowing the gap, it is possible to develop the photocatalytic function with visible light.

Also, a titanium oxide coating agent for a photocatalyst can be applied as a sterilizing layer and heated and fired.

The implant cap in which the titanium oxide layer is formed in this way is irradiated with light having a wavelength shorter than the wavelength for exciting the electrons of the titanium oxide immediately before being attached to the implant, and exhibits a bactericidal action due to photocatalytic activity. The irradiation light is gamma rays, X-rays, or ultraviolet rays, and natural light or illuminating lamp light may be used in an implant cap in which the energy gap of titanium oxide is narrowed to enable photocatalytic activity in the visible light region.

Further, the photocatalytic activity of the implant cap in which the titanium oxide layer is formed can also be performed by irradiating the implant cap with ultrasonic waves in water.

Further, the sterilizing layer may be formed of a non-photocatalytic material that is photocatalytically active without irradiating light. As the non-photocatalytic material, for example, there is a titanium phosphate compound. If there is oxygen and moisture, negative ions are generated to maintain the active effect.

In addition, a CT catalyst may be used for the sterilizing layer. A CT catalyst is composed of an electron donor and an electron acceptor, and has a function of decomposing bacteria by simultaneous oxidation and reduction reactions.

In the present invention, by providing a bactericidal layer on the implant cap, it is possible to prevent bacteria from entering the fixture portion of the implant that binds to the living body during the implant treatment period. The sterilization layer utilizes the sterilization effect by the photocatalytic function, and the sterilization action is generated by irradiating light immediately before mounting on the implant.

The photocatalyst material can be formed of a photocatalyst coating agent or titanium oxide. In the case of titanium oxide, photocatalytic activity in the visible light region is manifested by nitrogen doping or photoexcitation structure change, and a bactericidal effect is obtained. Further, the use of the non-photocatalytic material can exhibit a photocatalytic function in the presence of oxygen and water, and has an effect of bactericidal action due to the ingress of air from the sutured portion even when the implant cap is covered with the epithelium.

Furthermore, a bactericidal effect that does not require light irradiation can be obtained by using a CT catalyst in the bactericidal layer.

Thus, by providing the sterilizing layer on the implant cap, the contamination of the fixture part generated by the osseointegration can be suppressed, so that the success rate of the implant can be increased.

Fig. 3 shows a cover abutment and a healing abutment for an implant according to the invention. The figure explaining the implant mounting | wearing of the cover abutment and healing abutment for implants by this invention. The flowchart of the twice method of an implant operation. The flowchart of the once method of an implant operation. Ideal healing state with cover abutment embedded. General healing state with cover abutment embedded. The figure explaining the general contamination state at the time of the suture part tearing after cover abutment embedding. The figure explaining the general state which transfers to a secondary operation without fully acquiring osseointegration. Contamination has progressed to the fixture section where osseointegration should be obtained. The figure explaining the ideal healing state at the end of the unloading period. The figure explaining the general healing state at the time of the end of an unloading period. Diagram explaining the state where the unloading period has ended due to insufficient osseointegration

A dental implant as a substitute tooth is embedded in a bone and combined with a living tissue. For this reason, the fixture part which is in direct contact with the alveolar bone has been subjected to various trials such as surface properties, and has obtained the effect of promoting osseointegration. However, in actual clinical settings, contamination due to the invasion of bacteria present in the mouth reaches the fixture area, which is a major problem in inhibiting osseointegration. The expression is an important issue for successful implant treatment.

Conventionally, there has been no attempt to modify the surface properties of dental implant covers and healing abutments for the purpose of successful implant treatment, and the biocompatibility is insufficient. The part is easy to tear apart.

From such a background, the present invention has devised a structure in which biocompatibility and bactericidal action are expressed in the cover cap and the healing cap by paying attention to the cover cap and the healing cap used during the implant treatment period.

FIG. 1 shows a cover attachment 2 and a healing abutment 4 according to the present invention. The cover cap 10 and the healing cap 16 are cross-sectional views. FIG. 1A shows a cover abutment 2. The cover abutment 2 is a whole, and a disc-shaped portion at the top is a cover cap 10 and a portion including a screw portion which is a connecting portion with an implant is an abutment. Say twelve. Similarly, it is the cover abutment of FIG. 1 (B), the healing abutment 4 is the whole, and the cylindrical portion at the top is the healing cap 10 and the portion including the screw portion which is the connecting portion with the implant. Say Abutment 18. The cover cap 10 and the healing cap 16 are collectively referred to as an implant cap or simply a cap.

The cover abutment 2 includes a sterilizing layer 14 on the surface of the cover cap 10. The sterilization layer 14 prevents bacteria from entering from the mouth. Similarly, the healing abutment 4 is provided with a sterilizing layer 14 on the surface of the healing cap 16 and suppresses invasion of bacteria from the mouth.

FIG. 2 shows a state in which the cover abutment 2 and the healing abutment 4 are attached to the implant 20. The implant 20 includes a collar portion 22 and a fixture portion 24. The fixture portion 24 is embedded in the alveolar bone, and the bond with the living tissue, that is, osseointegration is promoted, and the implant is fixed to the alveolar bone. .

During the implant treatment period, first, the cover abutment 2 is attached with screws from the upper part of the implant 20, and when the osseointegration is advanced, the cover abutment 2 is removed and the healing abutment 4 is attached. There are two types of implant surgery methods, the first method and the cover abutment 2 and the healing abutment 4 are used.

FIG. 3 is a flowchart 26 of the twice-implant method. First, in step S1, an alveolar bone in a portion where an implant is to be implanted is anesthetized, and an implant hole is formed with a drill in accordance with the length of the implant to be implanted. Next, in step 2, the implant is placed in the formed planting hole up to the intended placement position. In the implanted implant, the upper surface of the collar portion is open. In step S3, a cover abutment is attached to the opening, and in step S4, the gums are sutured and sealed. In step S5, the gingival is sutured and left for 2 to 6 months until osseointegration is promoted. The period of cleaning varies slightly depending on the case, but is about 3 to 6 months for the upper jaw and about 2 to 4 months for the lower jaw.

後に After osseointegration is promoted, move on to secondary surgery. In step S6, the gum is cut open and the cover abutment attached to the implant is removed. Next, in step S7, a healing abutment is attached to the implant. The healing abutment sews the gum with the upper part of the healing cap protruding from the gum, and forms a gum when the superstructure (denture) is attached. In step S8, the mixture is allowed to stand for 2 to 4 weeks until a gum is formed. After the gums are formed, the healing abutment is removed in step 9.

Next, in step 10, an impression coping is attached to the implant, and an impression is taken with a silicon impression material.

In the final step 11, the impression coping is removed from the fixture, and the analog is attached to the removed impression coping and returned to the impression. Furthermore, silicon for gum model is poured into the impression, and an analog model is made by pouring gypsum over it. Remove the impression coping after setting the plaster. Further, an upper structure (denture) is produced, and the upper structure is attached to the implant via an abutment, thereby completing the implant.

FIG. 4 is a flowchart of the single implant method. For a single implant procedure, a healing abutment is attached to the implant from the beginning without using a cover abutment. Anesthesia is performed on the alveolar bone of the portion where the implant of Step S1 is to be implanted, and an implant hole is formed with a drill according to the length of the implant to be implanted. It is the same as the double implant method up to the place where it is to be placed.

In the one-time implant method, a healing abutment is attached to the implant in Step 3 and left to stand for 2 to 6 months in Step 4 to promote osseointegration. Since the healing cap protrudes from the gums, gums are formed at the same time. The subsequent steps 5 to 7 are the same as in the twice-implant method.

In the case of the one-time method, treatment can be performed by a single operation, but if bone augmentation is required, such as when the height or thickness of the bone is insufficient, the risk of infection by bacteria increases. In patients who receive implant treatment, the cause of tooth loss is mainly due to infection, i.e. periodontal disease, dental caries, apical lesions, or when the root is broken. Peripheral tissue is also lost, and bone augmentation is often required to place the implant in the ideal location. For this reason, in many cases, the implant treatment is performed twice. Hereinafter, the state of contamination by bacteria will be described by taking the twice method as an example.

FIG. 5 shows an ideal state before the secondary operation with the cover abutment embedded. The fixture portion 24 of the implant 20 embedded in the alveolar bone 30 is coupled to a living body by osseointegration. After the cover abutment 2 is mounted, the incised portion of the gum is sutured, but the epithelial tissue proliferates to block traffic with the outside world, and the bone is absorbed while avoiding the downgrowth of the epithelial tissue. The periosteum 32, connective tissue 34, and epithelial tissue 36 cover the upper portion of the collar portion 22 and the cover cap 10 in a layered manner. The sutured portion 38 incised at the time of implant placement is healed by tissue bonding.
FIG. 6 shows a general state of healing prior to the secondary operation. In contrast to the ideal state of FIG. 5, the periosteum 32 does not grow up to the cover cap 10 but covers only the collar portion 22 of the implant 24. Not. For this reason, it will be in the state which a suture part is easy to tear.
FIG. 7 shows a tearing state of the sutured portion 38 that occurs relatively early. The stitching portion 38 is cleaved, and bacteria enter the cleaved portion, resulting in contamination 40. Even if the stitching portion 38 is torn, it is ideal that the contamination 40 stays only in the cleavage portion, which is a desirable contamination state.

FIG. 8 shows that the connective tissue adhesion is lost due to the contamination 40 at the cleaved portion, and the epithelial tissue 36 grows down along the cover cap 10 and reaches the cover portion 24. As the epithelial tissue 36 is down-growth, the connective tissue 34 and the periosteum 32 are also down-growth. For this reason, the cover cap 10 and the upper part of the collar portion 12 are contaminated in a pocket shape. Contamination of the stitched portion occurs more or less, and such a state is a general state of contamination.

FIG. 9 shows a state in which the contamination has progressed due to the tearing of the suture part 38 and has reached the fixture part 24 of the implant 20. Contamination has occurred in the fixture unit 24 where osseointegration is to be obtained, and in such a case, it is difficult to shift to secondary surgery.

FIG. 10 shows a contamination state at the end of the unloading period when the healing cap 16 is attached to the implant 20 in the secondary operation. Since the healing cap 16 communicates with the outside, the incision is not covered with gums, and the periphery of the healing cap 16 is simply in contact with epithelial tissue or connective tissue. For this reason, contamination 40 due to the ingress of bacteria is unavoidable, and at the end of the unloading period, the downgrowth of the epithelial tissue 36 is in the region of the healing cap 16, and the pocket-like contamination 40 remains only around the healing cap 16. Ideally.

FIG. 11 shows a general contamination state at the end of the unloading period when the healing cap 16 is attached to the implant 20 in the secondary operation. The downgrowth of the epithelial tissue 36 extends beyond the area of the healing cap 16 and reaches a part of the collar part, and the periphery of the healing cap 16 and the part of the collar part 22 are contaminated in a pocket shape.

FIG. 12 shows a contamination state in the case where excessive contamination occurs at the end of the unloading period when the healing cap 16 is attached to the implant 20 in the secondary operation. The downgrowth of the epithelial tissue 36 proceeds to the fixture portion of the implant 20, and the periphery of the healing cap 16, the collar portion 22 and the fixture portion 24 is contaminated in a pocket shape.

So far, the contamination state during the treatment period of the implant operation has been described. However, the contamination cannot be completely prevented, and in the case of dehiscence, it stays at the dehiscence part, and when the healing cap 16 is attached, it remains around the healing cap 16. It is desirable. For this purpose, the cover cap 10 and the healing cap 16 according to the present invention are provided with a sterilizing layer 14 on the surface of the cover cap 10 and the healing cap 16 as shown in FIG.

When the surface of the cover cap 10 is covered with the sterilizing layer 14 and exhibits a sterilizing action, the bacteria are sterilized by the sterilizing layer 14 and the contamination 40 does not further spread and remains in the contamination state shown in FIG. . When the surface of the healing cap 16 is covered with the sterilization layer 14 and exhibits antibacterial action, the bacteria are sterilized with the sterilization layer 14 and the contamination 40 does not spread, and at least the contamination state shown in FIG. Stay in.

Examples of the sterilizing layer of the present invention include cases where a sterilizing effect is exhibited using light and cases where a sterilizing effect is exhibited even without light, which will be described in detail below. In either case, the standard type of POI EX manufactured by Nippon Medical Material Co., Ltd. was used for the cover abutment and the healing abutment.
(Example 1)

Titanium oxide composed of anatase type crystals has an energy band of 3.2 eV, and is activated by excitation of electrons with respect to light having a wavelength of 380 nm or less, thereby exhibiting a photocatalytic function. Because of its photocatalytic activity, it exhibits superhydrophilicity and oxidative decomposition reaction, so it has a bactericidal effect.

For this reason, the titanium oxide thin film which is a layer of a photocatalyst material was formed in the cover abutment and the healing abutment. The titanium oxide thin film was produced by sputtering. Titanium having a purity of 99% or more was used as the target of the sputtering apparatus, and a cover abutment or a healing abutment was attached to the anode. The inside of the chamber of the sputtering apparatus was evacuated to 5 × 10 ⁻⁴ Pa, and a film was formed using a mixed gas obtained by adding 40% oxygen to argon gas. The film thickness of titanium oxide is 0.5 to 1 μm.

Photocatalytic activation of titanium oxide requires irradiation with light having a wavelength of 380 nm or less, and is light in the ultraviolet region. For this reason, in order to perform photocatalytic activation even in the visible light region, doping titanium oxide with nitrogen is effective. For this purpose, a mixed gas in the above sputtering apparatus was formed by adding 20% nitrogen in addition to 20% oxygen to argon gas. The nitrogen-doped titanium oxide thin film has a thickness of 0.5 to 1 μm.

Also, a sterilization layer can be formed by coating a photocatalyst coating agent on the cover cap and the healing cap. For example, trade names TKC-303 and TKC304, which are coating agents manufactured by Teika Co., Ltd., and trade names TPX-VB and TPK-HL, which are photocatalytic sagan coat coating agents, can be used.

The cover abutment and healing abutment provided with a sterilization layer using a photocatalytic function are irradiated with light immediately before being attached to the implant. As the light, in order to perform photocatalytic activation of titanium oxide, ultraviolet rays having a wavelength of 380 nm or less, X-rays or gamma rays can be used. Nitrogen-doped titanium oxide capable of light-explant activation in the visible light region may be natural light or fluorescent light. All of the trial sterilized layers obtained photocatalytic activity.

In addition, the photocatalytic layer produced as a sterilizing layer was also able to obtain photocatalytic activity by ultrasonic irradiation in water. For this reason, the cleaning effect and the photocatalytic activity effect can be obtained simultaneously by performing ultrasonic cleaning immediately before attaching the cover abutment and the healing abutment to the implant.
(Example 2)

Cover abutment and healing abutment formed by sputtering a titanium oxide thin film that is a layer of photocatalyst material uses the photoexcited structural change phenomenon of titanium oxide to enable photocatalytic activation of titanium oxide even in the visible light region. did.

The photocatalytic activation in the visible light region due to the change in the photoexcitation structure is thought to be because the potential of the light in the visible light region with a long wavelength is excited by narrowing the band gap of titanium oxide.

The covalent semiconductor surface of titanium oxide forms a surface-specific structure (surface structure) limited to an atomic layer near the surface including the surface atomic layer. The main cause of the formation of this surface structure is the existence of unshared electron pairs (dangling bonds). In order to reduce the energy increase of the electron system due to this existence, atoms in the surface layer cause surface relaxation and reconfiguration. As a result, it takes various forms depending on the crystal plane, the composition of surface constituent atoms, temperature, and the like. A surface-specific electronic state characteristic of each structure is formed. Thus, the semiconductor surface forms a new “pseudo two-dimensional condensed phase” that is composed of the same atoms as the crystal but is no longer characterized by the properties of the crystal alone. This is a photoexcitation structure change.

The photoexcitation structural change is based on the principle of electronic excitation, and the light energy to be irradiated may be light of a short wavelength or an electromagnetic wave necessary for the electron to exceed the band gap of titanium oxide, such as laser light, ultraviolet rays or X-rays. . More precisely, the light energy to be irradiated is light containing a short wavelength necessary for electrons to exceed the band gap of titanium oxide, or electromagnetic waves. Further, the photoexcitation structure change may be promoted by heating at a temperature of 200 ° C. to 500 ° C.

Since the titanium oxide layer with the photoexcited structure changed has an energy gap of about 2.5 eV, a sufficient photocatalytic activity effect was obtained even by irradiation with natural light or fluorescent light.
(Example 3)

The sterilizing layer using a photocatalyst is effective in the initial stage of cap embedding, but the effect is gradually diminished because the mouth is not directly irradiated with light. For this reason, the non-photocatalytic material which does not require light irradiation was used. As the non-catalytic catalyst material, a titania phosphate compound is used. Phosphoric titania compound reacts phosphoric acid with photocatalytic titanium oxide to obtain photocatalytic activity in the dark. If oxygen and moisture are present, negative ions are generated to maintain the active effect and antibacterial effect is obtained. . Non-photocatalyst of the titania phosphate compound includes, for example, non-photocatalytic ecochimera (registered trademark) of YOO Corporation. The antibacterial ecochimera S series (product number: SW-50) was used to coat the cover cap and the healing cap to form a sterilization layer.

Also, the CT catalyst developed by Phylak International Co., Ltd. is a catalyst that does not use light and can be used for the sterilization layer. A CT (Change Transfer) catalyst is composed of an electron donor and an electron acceptor, and decomposes malodorous components and bacteria by simultaneous oxidation and reduction reactions. The sterilizing layer using this oxidation and reduction reaction was prepared by coating the cover cap and the healing cap.

By using the cover abutment and healing abutment according to the present invention, the implantable implant can be irradiated with ultrasonic waves to maintain the biocompatibility and bactericidal effect during the treatment period, as well as the maintenance period. Even when the peri-implantitis of this occurs, the denture can be removed and returned to the healing abutment to develop a bactericidal effect and be cured.

As mentioned above, although the Example of this invention was described, this invention contains the appropriate deformation | transformation which does not impair the objective and advantage, Furthermore, the limitation by said embodiment is not received.

DESCRIPTION OF SYMBOLS 2 Cover abutment 4 Healing abutment 10 Cover cap 12, 18 Abutment 14 Bactericidal layer 16 Healing cap 18 Guide protrusion 20 Implant 22 Collar part 24 Fixture part 26 Flow chart of twice-implant method 28 Flow chart of once-implant method 30 Alveolar Bone 32 Periosteum 34 Connective tissue 36 Epithelial tissue 38 Suture 40 Contamination

Claims

An implant cap characterized by having a sterilization layer that is used during implant treatment and that exhibits a sterilization function on the surface.
The implant cap according to claim 1,
The implant cap is a cover cap or a healing cap;
An implant cap characterized by the following.
The implant cap according to claim 1,
The sterilization layer is a layer of a photocatalyst material that exhibits a sterilization function by light irradiation,
An implant cap characterized by the following.
The implant cap according to claim 3, wherein
The photocatalyst material is a photocatalyst coating agent;
An implant cap characterized by the following.
The implant cap according to claim 3, wherein
The photocatalytic material is titanium oxide;
An implant cap characterized by the following.
The implant cap according to claim 5, wherein
The titanium oxide is doped with nitrogen,
An implant cap characterized by the following.
The implant cap according to claim 5, wherein
The titanium oxide layer formed on the implant cap is irradiated with laser light, ultraviolet rays or X-rays, and the energy gap of the titanium oxide is narrowed by the photoexcitation structure change, enabling photocatalytic activity with visible light,
An implant cap characterized by the following.
The implant cap according to claim 5, wherein
The titanium oxide layer is formed by applying a titanium oxide coating agent to the implant and baking it.
An implant cap characterized by the following.
The implant cap according to claim 5,
Immediately before mounting on the implant, irradiation with light of a wavelength that excites the electrons of titanium oxide,
An implant cap characterized by the following.
The implant cap according to claim 9,
The light irradiated immediately before mounting on the implant is gamma rays, X-rays or ultraviolet rays,
An implant cap characterized by the following.
The implant cap according to claim 6 or 7,
The light emitted immediately before mounting on the implant is natural light or light of an illumination lamp,
An implant cap characterized by the following.
The implant cap according to claim 5,
Ultrasonic irradiation in water immediately before mounting on the implant,
An implant cap characterized by the following.
The implant cap according to claim 1,
The sterilizing layer is a layer of a non-photocatalytic material;
An implant cap characterized by the following.
The implant cap according to claim 12, wherein
The non-photocatalytic material is a titania phosphate compound;
An implant cap characterized by the following.
The implant cap according to claim 1,
The sterilizing layer is a layer of CT catalyst material;
An implant cap characterized by the following.