WO2014006706A1 - Vapor deposition device - Google Patents
Vapor deposition device Download PDFInfo
- Publication number
- WO2014006706A1 WO2014006706A1 PCT/JP2012/067107 JP2012067107W WO2014006706A1 WO 2014006706 A1 WO2014006706 A1 WO 2014006706A1 JP 2012067107 W JP2012067107 W JP 2012067107W WO 2014006706 A1 WO2014006706 A1 WO 2014006706A1
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- WIPO (PCT)
- Prior art keywords
- vapor deposition
- deposition material
- material container
- opening
- preventing member
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Definitions
- the present invention provides a plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess whose upper surface is opened, on a rotatable rotating support body in the circumferential direction, and a specific vapor deposition material is accommodated by the rotary support body.
- a vapor deposition apparatus vapor deposition apparatus that guides a body to a heating position, heats a vapor deposition material accommodated in a recess of the vapor deposition material container, evaporates the vapor deposition material through the opening, and deposits the vapor deposition material on the surface of the material to be processed. Is.
- a vapor deposition material accommodated in a recess of a specific vapor deposition material container is irradiated with a beam and heated, and this vapor deposition material is evaporated, the evaporated vapor deposition material is transferred to another vapor deposition material container. It is characterized in that it is prevented from being mixed into the deposited vapor deposition material.
- vacuum deposition apparatuses have been used to deposit various materials on the surface of various materials to be processed such as glass substrates.
- various vapor deposition materials are accommodated in a concave portion of a vapor deposition material container such as a crucible, and a beam such as a plasma beam is emitted from a beam emission device such as a plasma gun.
- the vapor deposition material accommodated in the recess is irradiated from the opened upper surface of the vapor deposition material container to evaporate the vapor deposition material, and the vapor deposition material is vapor deposited on the surface of the material to be processed to form a film.
- a vapor deposition apparatus when different vapor deposition materials are sequentially deposited on the surface of the material to be treated, or when different vapor deposition materials are vapor deposited on the surface of the different material to be treated, In order to efficiently deposit various vapor deposition materials on the surface one after another, for example, as shown in Patent Documents 1 and 2, a plurality of vapor deposition material accommodating portions for accommodating the vapor deposition materials are provided on the upper surface of the rotatable rotating body.
- the vapor deposition material accommodated in the vapor deposition material container guided to the beam irradiation position is irradiated with the beam to evaporate the vapor deposition material
- the vapor deposition material evaporated from the vapor deposition material container
- the vaporized vapor deposition material is mixed into the vapor deposition material accommodated in the other vapor deposition material container. There was a problem.
- Patent Document 2 a protective cover provided with an opening in a portion facing the vapor deposition material container guided to the beam irradiation position is provided above the rotating body so as to cover the other vapor deposition material container.
- the vapor deposition material evaporated from the vapor deposition material container guided to the beam irradiation position is mixed into the vapor deposition material accommodated in another vapor deposition material container not guided to the beam irradiation position. It is shown to prevent this.
- the vapor deposition material evaporated from the vapor deposition material container guided to the beam irradiation position is not removed between the protective cover and the rotator.
- the vapor deposition material is guided to the other vapor deposition material container through the gap, and the vaporized vapor deposition material cannot be sufficiently prevented from being mixed into the vapor deposition material accommodated in the other vapor deposition material container, and is evaporated.
- the evaporated material adheres to the lower surface of the protective cover and the rotating body is rotated to guide the other evaporated material container to the beam irradiation position the evaporated material attached to the lower surface of the protective cover enters the other evaporated material container. There was a problem of falling and mixing in the deposited vapor deposition material.
- the gap between the protective cover and the rotating body is narrowed to prevent the evaporated vapor deposition material from being guided to another vapor deposition material container through the space between the protective cover and the rotating body.
- the gap between the protective cover and the rotating body because the rotating body is rotated and the deposition material container is sequentially guided to the beam irradiation position.
- the present invention provides a plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess whose upper surface is opened on a rotatable rotation support body in the circumferential direction.
- a specific vapor deposition material container is guided to a heating position such as a beam irradiation position, and the vapor deposition material is heated by irradiating the vapor deposition material accommodated in the recess through the opening of the vapor deposition material container to evaporate the vapor deposition material.
- the vapor deposition material accommodated in the concave portion of the vapor deposition material container guided to the heating position such as the beam irradiation position is irradiated with a beam to heat the vapor deposition material.
- the vapor deposition material is evaporated and vapor deposited on the surface of the material to be treated, it is possible to appropriately prevent the evaporated vapor deposition material from being mixed into the vapor deposition material accommodated in another vapor deposition material container. It is to be an issue.
- a plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess having an upper surface opened are provided on a rotatable rotating support body in the circumferential direction.
- the specific vapor deposition material container is guided to the heating position by the rotating support, the vapor deposition material accommodated in the recess of the vapor deposition material container is heated, and the vapor deposition material is evaporated through the opening to be processed.
- the deposition member provided with the opening for exposing the vapor deposition material container guided to the heating position is rotated so as to cover the upper surface of the other vapor deposition material container.
- the upper surface of the vapor deposition material container that was placed on the support and led to the heating position was positioned above the lower surface of the deposition-preventing member at the edge of the opening.
- the beam is irradiated.
- the vapor deposition material evaporated from the opened upper surface of the vapor deposition material container is suppressed from being led to the lower surface side of the deposition member through the gap between the vapor deposition material container and the opening. It is prevented from being led to another vapor deposition material container through between the lower surface of the substrate and the rotary support.
- the evaporated vapor deposition material is separated from the vapor deposition material container and the It is further suppressed from being led to the lower surface side of the adhesion preventing member through the opening of the adhesion preventing member from being led to another vapor deposition material container through between the lower surface of the adhesion preventing member and the rotary support. Become so.
- the adhesion preventing member having the opening for exposing the vapor deposition material container guided to the heating position as described above is disposed on the rotary support so as to cover the upper surface of the other vapor deposition material container.
- the deposition preventing member is placed between the lower step and the upper step.
- induced to the heating position can be provided in the lower step part of an adhesion prevention member.
- a separation convex portion that separates the vapor deposition material container guided to the heating position from another vapor deposition material container adjacent thereto is provided between the adhesion preventing member and the rotation support body.
- the gap between the lower surface of the deposition-preventing member provided with the separation convex portion and the rotary support body is further narrowed, and the vapor deposition material evaporated from the upper surface of the vapor deposition material container is accommodated in the vapor deposition material container. Even if it is led to the lower surface side of the deposition preventive member through between the body and the opening, the vapor deposition material is suppressed and evaporated between the lower surface of the deposition preventive member provided with the separation projection and the rotating support. Is further prevented from being led to another vapor deposition material container.
- the vapor deposition material is evaporated from the specific vapor deposition material container guided to the heating position, and this vapor deposition material is vapor deposited on the surface of the material to be treated, and then supported by the rotating support.
- an elevating device for elevating and lowering at least one of the deposition preventing member and the rotating support can be provided.
- the lower surface in the opening edge of the said opening part does not collide with the upper surface of the said vapor deposition material container by this raising / lowering apparatus.
- the rotary support is rotated so that the next vapor deposition material container is guided to the heating position.
- the deposition member is lowered by the lifting device, and the upper surface of the next vapor deposition material container is opened to the lip of the opening. It is made to position above the lower surface of the adhesion-preventing member.
- the heat-resistant ring when the heat-resistant ring is attached to the lip of the opening of the adhesion-preventing member and the upper surface portion of the heat-resistant ring is inclined downward from the inner peripheral side toward the outer peripheral side, the adhesion is prevented.
- the heat-resistant ring prevents the edge of the opening of the member from being deformed by heat, and the lump of vapor deposition material adhering to the opening of the opening is downward toward the outer peripheral side of the upper surface of the heat-resistant ring.
- the adhesion preventing member provided with the opening for exposing the vapor deposition material container guided to the heating position is placed on the rotating support so as to cover the upper surface of the other vapor deposition material container. Since the upper surface of the vapor deposition material container guided to the heating position is positioned above the lower surface of the deposition preventing member at the lip of the opening, the beam is irradiated. The vapor deposition material evaporated from the upper surface of the vapor deposition material container that is opened is suppressed from being led to the lower surface side of the deposition preventing member through the space between the vapor deposition material container and the opening. It is prevented from adhering or being led to another vapor deposition material container through the lower surface of the adhesion-preventing member and the rotary support.
- the vapor deposition material accommodated in the concave portion of the vapor deposition material container is irradiated with a beam through the opening of the vapor deposition material container guided to the heating position by the rotating support, thereby vapor deposition material.
- the vapor deposition material evaporated from the vapor deposition material container is guided to the other vapor deposition material container and enters the other vapor deposition material container. Mixing into the stored vapor deposition material is appropriately prevented.
- a vapor is emitted from a beam emitting device toward a vapor deposition material container guided to a beam irradiation position by a rotating support, and the vapor deposition material accommodated in the vapor deposition material container
- a vapor deposition material container guided to a beam irradiation position by a rotating support
- the vapor deposition material accommodated in the vapor deposition material container It is the schematic explanatory drawing which showed the state which irradiates a beam to evaporate vapor deposition material and vapor-deposits this vapor deposition material on the surface of a to-be-processed material. It is the disassembled perspective view which showed the adhesion preventing member, the vapor deposition material container, and the rotation support body in the vapor deposition apparatus in the said embodiment.
- each holding member provided with a plurality of vapor deposition material containers in which a vapor deposition material is contained in a recess having an upper surface opened is provided on the upper surface of the rotating support body in a circumferential direction with a required interval. It is the schematic perspective view which showed the state hold
- a heat-resistant ring is attached to the lip of the opening of the adhesion-preventing member, and the upper surface of the heat-resistant ring is inclined downward from the inner peripheral side toward the outer peripheral side. It is partial sectional explanatory drawing shown.
- a vapor deposition apparatus according to an embodiment of the present invention will be specifically described with reference to the accompanying drawings.
- the vapor deposition apparatus which concerns on this invention is not limited to what was shown to the following embodiment, In the range which does not change the summary of invention, it can change suitably and can implement.
- the rotating shaft 2 a of the rotating device 2 is introduced into the vacuum chamber 1 from the bottom of the vacuum chamber 1, and the center of the disk-shaped rotating support 10 is formed.
- the rotating support 10 is rotated around the rotating shaft 2a by holding the portion on the rotating shaft 2a.
- a sealing member 2 b is provided so that outside air does not enter the vacuum chamber 1 from a portion where the rotating shaft 2 a of the rotating device 2 is introduced into the vacuum chamber 1.
- a plurality of (four in the example shown in the figure) holding recesses 11 are provided on the upper surface of the rotary support 10 with a required interval in the circumferential direction.
- the separation protrusions 12 having triangular protrusions are provided radially from the center, and on the outer periphery of the upper surface of the rotary support 10.
- An annular convex portion 13 protruding upward is provided.
- each vapor deposition material container 3 in which the vapor deposition material T is accommodated in the concave portions whose upper surfaces are opened are held in the respective holding concave portions 11 provided on the upper surface of the rotary support 10.
- the upper surface of each vapor deposition material container 3 is positioned above the separating projection 12.
- planar circular deposition preventing member 20 provided with the opening 21 for exposing the vapor deposition material container 3 guided to the beam irradiation position is covered with the above-described upper surface of the other vapor deposition material container 3. It is arranged on the rotating support 10.
- the outer diameter of the anti-adhesion member 20 is slightly larger than that of the rotary support 10, and the side wall 20c extending downward along the outer periphery of the anti-adhesion member 20 The outer peripheral side of the rotary support 10 is covered.
- projecting pieces 22 projecting in opposite directions from the outer periphery of the deposition preventing member 20 are provided at positions on both sides in the diameter direction of the deposition preventing member 20, and the projecting pieces 22 on both sides are vacuumed from the bottom of the vacuum chamber 1, respectively.
- the lifting / lowering rod 4a of the lifting / lowering device 4 introduced into the chamber 1 is held by the lifting / lowering rod 4a.
- a sealing member 4 b is provided so that outside air does not enter the vacuum chamber 1 from a portion where the lifting rod 4 a in the lifting device 4 is introduced into the vacuum chamber 1.
- the said adhesion prevention member 20 is formed in the level
- a beam B such as a plasma beam is emitted from a beam emitting apparatus 5 such as a plasma gun provided on the side of the vacuum chamber 1, and the beam
- the vapor deposition material T accommodated in the recess of the vapor deposition material container 3 guided to the irradiation position is irradiated with the beam B to evaporate the vapor deposition material T, and the evaporated vapor deposition material T is disposed in the upper part of the vacuum chamber 1. Vapor deposition is performed on the surface of the processed material W.
- the rotating device 2 rotates the rotating shaft.
- the rotating support body 10 holding the vapor deposition material container 3 around the center 2a is rotated, and the vapor deposition material container 3 containing the vapor deposition material T to be vapor-deposited on the workpiece W is guided to the beam irradiation position.
- the deposition preventing member 20 is lowered by the lifting rod 4 a provided in the lifting device 4.
- the adhesion preventing member 20 is lowered in this way, and the opening 21 provided in the lower step portion 20a of the adhesion preventing member 20 as shown in FIGS. 1, 4 and 5A, 5B.
- the vapor deposition material container 3 guided to the beam irradiation position is introduced into the inside, and the upper surface of the vapor deposition material container 3 guided to the beam irradiation position is placed on the edge of the opening 21 provided in the adhesion preventing member 20. Projecting above the upper surface of the adhesion-preventing member 20, and two portions provided radially on the upper surface of the rotary support 10 so as to define a portion for holding the vapor deposition material container 3 guided to the beam irradiation position.
- the separation convex portion 12 is positioned below the lower surface of the fan-shaped lower step portion 20 a provided with the opening 21, and the gap between the lower surface of the lower step portion 20 a of the deposition preventing member 20 and the upper surface of the rotation support 10 is very narrow. It is trying to become.
- the beam B is irradiated to the vapor deposition material T accommodated in the vapor deposition material container 3 to evaporate the vapor deposition material T accommodated in the vapor deposition material container 3.
- the vapor deposition material T which evaporated from the upper surface opened of the vapor deposition material container 3 will flow into the lower surface side of the deposition preventing member 20 through between the vapor deposition material container 3 and the opening part 21 of the deposition preventing member 20.
- the rotation support is performed so as to partition the portion that holds the vapor deposition material container 3 guided to the beam irradiation position.
- the gap between the lower surface of the lower step portion 20a of the anti-adhesion member 20 and the upper surface of the rotary support 10 is very narrow due to the two separating projections 12 provided on the upper surface of the body 10.
- the vapor deposition material T flowing into the lower surface side of the member 20 is prevented from being guided to another vapor deposition material container 3 through the gap between the lower surface of the lower step portion 20a of the deposition preventing member 20 and the upper surface of the rotary support 10.
- the vapor deposition apparatus of this embodiment when the vapor deposition material T accommodated in the vapor deposition material container 3 guided to the beam irradiation position is evaporated and vapor deposited on the surface of the material W to be processed, the vapor deposition material T evaporated from the vapor deposition material container 3 is appropriately prevented from being introduced into the other vapor deposition material container 3 and mixed into the vapor deposition material T accommodated in the other vapor deposition material container 3. It becomes like this.
- the said separation convex part 12 is a triangular protrusion, when raising and lowering the adhesion prevention member 20 as mentioned above, on this separation convex part 12 Even if the lump of the vapor deposition material T falls, the lump of the vapor deposition material T falls down on the rotary support 10 from the separation convex portion 12, and the lump of the vapor deposition material T falls on the separation convex portion 12 and the lower surface of the adhesion preventing member 20. It will not be caught between.
- the separation convex portion 12 and the annular convex portion 13 are provided on the upper surface of the rotary support 10 itself.
- a disk member 30 to be mounted is used, and a mounting hole 31 to be mounted on the rotary support 10 is provided at the center of the disk member 30 and a through hole corresponding to the holding recess 11 in the rotary support 10 is provided.
- 32, and a separation convex portion 33 having a triangular projection radially from the central mounting hole 31 is provided on the upper surface of the disk member 30 and protrudes upward along the outer periphery of the upper surface of the disk member 30.
- An annular convex portion 34 may be provided.
- the disk member 30 when the disk member 30 is detachably mounted on the upper surface of the rotary support 10, the vapor deposition material T flows into the lower surface side of the deposition preventing member 20, and the vapor deposition material T adheres to the disk member 30.
- the disk member 30 can be easily replaced by being detached from the upper surface of the rotary support 10.
- the upper surface of the vapor deposition material container 3 guided to the beam irradiation position as described above is arranged from the upper surface of the deposition preventing member 20 at the rim of the opening 21 provided in the deposition preventing member 20.
- the upper surface of the vapor deposition material container 3 guided to the beam irradiation position is positioned above the lower surface of the deposition preventing member 20 at the lip of the opening 21 provided in the deposition preventing member 20.
- the vapor deposition material T evaporated from the opened upper surface of the vapor deposition material container 3 passes between the vapor deposition material container 3 and the opening 21 of the adhesion preventing member 20 and the lower surface of the adhesion preventing member 20. Inflow to the side is suppressed.
- a heat-resistant ring 23 is attached to the rim of the opening 21 of the deposition preventing member 20, and the upper surface of the heat-resistant ring 23 is set on the inner peripheral side.
- the edge of the opening 21 of the deposition preventing member 20 is prevented from being deformed by heat by the heat-resistant ring 23 and attached to the edge of the opening 21.
- the vapor deposition material T is peeled off when the adhesion preventing member 20 is moved up and down, the vapor deposition material T is formed on the adhesion preventing member 20 along the surface inclined downward toward the outer peripheral side of the upper surface portion of the heat-resistant ring 23. As a result, it is prevented from falling on the rotary support 10 or in the other vapor deposition material container 3.
- the vapor deposition material T is irradiated with the beam B from the beam emitting device 5 to heat the vapor deposition material T.
- heating means such as an electric heater (not shown) It is also possible to heat the vapor deposition material T by providing.
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Abstract
When a plurality of vapor deposition material holders are placed on a rotary support and the vapor deposition material held in a specific vapor deposition material holder is heated and vaporized, the present invention prevents the vapor deposition material from coming into the vapor deposition materials held in the other vapor deposition material holders.
A plurality of vapor deposition material holders (3) in each of which a vapor deposition material (T) is held in a recessed part that is open at the upper end are disposed on a rotatable rotary support (10), and a specific vapor deposition material holder is led to a heating position to heat and vaporize the vapor deposition material within the specific vapor deposition material holder in such a manner that a deposition-preventing member (20) having an opening (21) for exposing a vapor deposition material holder led to the beam irradiation position is disposed over the rotary support so as to cover the upper ends of the other vapor deposition material holders and that the open upper end of the vapor deposition material holder led to the beam irradiation position is positioned above the lower surface of the deposition-preventing member which surrounds the periphery of the opening.
Description
本発明は、上面が開口された凹部内に蒸着材料が収容された蒸着材料収容体を、回転可能な回転支持体の上に周方向に複数設け、前記の回転支持体により特定の蒸着材料収容体を加熱位置に導き、この蒸着材料収容体の凹部内に収容された蒸着材料を加熱して、この蒸着材料を前記の開口を通して蒸発させて被処理材の表面に蒸着させる蒸着装置蒸着装置に関するものである。特に、特定の蒸着材料収容体の凹部内に収容された蒸着材料にビームを照射して加熱させ、この蒸着材料を蒸発させた場合に、蒸発された蒸着材料が、他の蒸着材料収容体に収容された蒸着材料に混入するのを防止する点に特徴を有するものである。
The present invention provides a plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess whose upper surface is opened, on a rotatable rotating support body in the circumferential direction, and a specific vapor deposition material is accommodated by the rotary support body. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition apparatus vapor deposition apparatus that guides a body to a heating position, heats a vapor deposition material accommodated in a recess of the vapor deposition material container, evaporates the vapor deposition material through the opening, and deposits the vapor deposition material on the surface of the material to be processed. Is. In particular, when a vapor deposition material accommodated in a recess of a specific vapor deposition material container is irradiated with a beam and heated, and this vapor deposition material is evaporated, the evaporated vapor deposition material is transferred to another vapor deposition material container. It is characterized in that it is prevented from being mixed into the deposited vapor deposition material.
従来から、ガラス基板等の各種の被処理材の表面に各種の材料を成膜させるのに真空蒸着装置が使用されている。
Conventionally, vacuum deposition apparatuses have been used to deposit various materials on the surface of various materials to be processed such as glass substrates.
そして、このような蒸着装置においては、各種の蒸着材料を坩堝等の蒸着材料収容体の凹部内に収容させ、プラズマガン等のビーム出射装置からプラズマビーム等のビームを出射し、このビームを前記の蒸着材料収容体の開口された上面から凹部内に収容された蒸着材料に照射させて蒸着材料を蒸発させ、この蒸着材料を被処理材の表面に蒸着させて成膜させるようにしている。
In such a vapor deposition apparatus, various vapor deposition materials are accommodated in a concave portion of a vapor deposition material container such as a crucible, and a beam such as a plasma beam is emitted from a beam emission device such as a plasma gun. The vapor deposition material accommodated in the recess is irradiated from the opened upper surface of the vapor deposition material container to evaporate the vapor deposition material, and the vapor deposition material is vapor deposited on the surface of the material to be processed to form a film.
また、このような蒸着装置においては、被処理材の表面に異なる蒸着材料を順々に蒸着させたり、異なる被処理材の表面に異なる蒸着材料を蒸着させたりする場合等において、被処理材の表面に様々な蒸着材料を順々に効率よく蒸着させるため、例えば、特許文献1,2に示されるように、蒸着材料を収容する複数の蒸着材料収容部を、回転可能な回転体の上面にその周方向に所要間隔を介して凹設し、この回転体に設けられた特定の蒸着材料収容部をビーム照射位置に導き、この蒸着材料収容部内に収容された蒸着材料にビームを照射させて、蒸着材料を蒸発させるようにしたものが用いられている。
In such a vapor deposition apparatus, when different vapor deposition materials are sequentially deposited on the surface of the material to be treated, or when different vapor deposition materials are vapor deposited on the surface of the different material to be treated, In order to efficiently deposit various vapor deposition materials on the surface one after another, for example, as shown in Patent Documents 1 and 2, a plurality of vapor deposition material accommodating portions for accommodating the vapor deposition materials are provided on the upper surface of the rotatable rotating body. Concave in the circumferential direction with a required interval, guide the specific vapor deposition material container provided in this rotating body to the beam irradiation position, and irradiate the vapor deposition material accommodated in this vapor deposition material container with the beam In this case, an evaporation material is evaporated.
しかし、このようにビーム照射位置に導かれた蒸着材料収容部に収容された蒸着材料にビームを照射させて、蒸着材料を蒸発させるようにした場合、この蒸着材料収容部から蒸発された蒸着材料が被処理材の表面だけではなく、回転体に設けられた他の蒸着材料収容部にも導かれ、蒸発された蒸着材料が、他の蒸着材料収容部に収容された蒸着材料に混入するという問題があった。
However, when the vapor deposition material accommodated in the vapor deposition material container guided to the beam irradiation position is irradiated with the beam to evaporate the vapor deposition material, the vapor deposition material evaporated from the vapor deposition material container However, not only the surface of the material to be treated but also other vapor deposition material container provided in the rotating body, the vaporized vapor deposition material is mixed into the vapor deposition material accommodated in the other vapor deposition material container. There was a problem.
このため、特許文献2においては、ビーム照射位置に導かれた蒸着材料収容部と対向する部分に開口部が設けられた保護カバーを、他の蒸着材料収容部を覆うようにして回転体の上方に所要間隔を介して設け、ビーム照射位置に導かれた蒸着材料収容部から蒸発された蒸着材料が、ビーム照射位置に導かれていない他の蒸着材料収容部内に収容された蒸着材料に混入するのを防止するようにしたものが示されている。
For this reason, in Patent Document 2, a protective cover provided with an opening in a portion facing the vapor deposition material container guided to the beam irradiation position is provided above the rotating body so as to cover the other vapor deposition material container. The vapor deposition material evaporated from the vapor deposition material container guided to the beam irradiation position is mixed into the vapor deposition material accommodated in another vapor deposition material container not guided to the beam irradiation position. It is shown to prevent this.
しかし、このように保護カバーを回転体の上方に所要間隔を介して設けた場合においても、ビーム照射位置に導かれた蒸着材料収容部から蒸発された蒸着材料が、保護カバーと回転体との間を通して他の蒸着材料収容体に導かれるようになり、蒸発された蒸着材料が他の蒸着材料収容部に収容された蒸着材料に混入するのを十分に防止することができず、また蒸発された蒸着材料が保護カバーの下面に付着し、回転体を回転させて他の蒸着材料収容部をビーム照射位置に導く際に、保護カバーの下面に付着した蒸着材料が他の蒸着材料収容部内に落下して収容された蒸着材料に混入するという問題があった。
However, even when the protective cover is provided above the rotator with a required interval, the vapor deposition material evaporated from the vapor deposition material container guided to the beam irradiation position is not removed between the protective cover and the rotator. The vapor deposition material is guided to the other vapor deposition material container through the gap, and the vaporized vapor deposition material cannot be sufficiently prevented from being mixed into the vapor deposition material accommodated in the other vapor deposition material container, and is evaporated. When the evaporated material adheres to the lower surface of the protective cover and the rotating body is rotated to guide the other evaporated material container to the beam irradiation position, the evaporated material attached to the lower surface of the protective cover enters the other evaporated material container. There was a problem of falling and mixing in the deposited vapor deposition material.
また、前記の保護カバーと回転体との間の隙間を狭くして、蒸発された蒸着材料が、保護カバーと回転体との間を通して他の蒸着材料収容体に導かれるのを防止することが考えられるが、回転体を回転させて、蒸着材料収容部を順々にビーム照射位置に導く関係上、保護カバーと回転体との間の隙間を狭くするのには限界があり、特定の蒸着材料収容部から蒸発された蒸着材料が、保護カバーの下面に付着したり、保護カバーと回転体との間を通して他の蒸着材料収容部に収容された蒸着材料に混入したりするのを適切に防止することは困難であった。
In addition, the gap between the protective cover and the rotating body is narrowed to prevent the evaporated vapor deposition material from being guided to another vapor deposition material container through the space between the protective cover and the rotating body. Although it is conceivable, there is a limit to narrowing the gap between the protective cover and the rotating body because the rotating body is rotated and the deposition material container is sequentially guided to the beam irradiation position. Appropriately prevent vapor deposition material evaporated from the material container from adhering to the lower surface of the protective cover or mixing into the vapor deposition material accommodated in another vapor deposition material container through the protective cover and the rotating body. It was difficult to prevent.
特に、回転支持体の上面に蒸着材料が収容された蒸着材料収容体を設け、この蒸着材料収容体が回転支持体から上方に突出する場合においては、前記のような保護カバーを設けても、回転支持体と保護カバーとの間の隙間が大きくなり、特定の蒸着材料収容体から蒸発された蒸着材料が、他の蒸着材料収容体に収容された蒸着材料に混入するのを十分に防止することは困難であった。
In particular, in the case where a vapor deposition material container in which a vapor deposition material is accommodated is provided on the upper surface of the rotary support, and this vapor deposition material container protrudes upward from the rotary support, even if a protective cover as described above is provided, The gap between the rotating support and the protective cover is increased, and the vapor deposition material evaporated from a specific vapor deposition material container is sufficiently prevented from entering the vapor deposition material accommodated in another vapor deposition material container. It was difficult.
本発明は、前記のように、上面が開口された凹部内に蒸着材料が収容された蒸着材料収容体を、回転可能な回転支持体の上に周方向に複数設け、前記の回転支持体により特定の蒸着材料収容体をビーム照射位置等の加熱位置に導き、この蒸着材料収容体の開口を通して凹部内に収容された蒸着材料にビームを照射させて蒸着材料を加熱させ、この蒸着材料を蒸発させて被処理材の表面に蒸着させる蒸着装置における前記のような問題を解決することを課題とするものである。
As described above, the present invention provides a plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess whose upper surface is opened on a rotatable rotation support body in the circumferential direction. A specific vapor deposition material container is guided to a heating position such as a beam irradiation position, and the vapor deposition material is heated by irradiating the vapor deposition material accommodated in the recess through the opening of the vapor deposition material container to evaporate the vapor deposition material. Thus, an object of the present invention is to solve the above-described problems in a vapor deposition apparatus for vapor deposition on the surface of a material to be treated.
すなわち、本発明においては、前記のような蒸着装置において、ビーム照射位置等の加熱位置に導かれた蒸着材料収容体の凹部内に収容された蒸着材料に、ビームを照射させて蒸着材料を加熱させ、この蒸着材料を蒸発させて被処理材の表面に蒸着させる場合に、蒸発された蒸着材料が、他の蒸着材料収容体に収容された蒸着材料に混入するのを適切に防止することを課題とするものである。
That is, in the present invention, in the vapor deposition apparatus as described above, the vapor deposition material accommodated in the concave portion of the vapor deposition material container guided to the heating position such as the beam irradiation position is irradiated with a beam to heat the vapor deposition material. In the case where the vapor deposition material is evaporated and vapor deposited on the surface of the material to be treated, it is possible to appropriately prevent the evaporated vapor deposition material from being mixed into the vapor deposition material accommodated in another vapor deposition material container. It is to be an issue.
本発明においては、前記のような課題を解決するため、上面が開口された凹部内に蒸着材料が収容された蒸着材料収容体を、回転可能な回転支持体の上に周方向に複数設け、前記の回転支持体により特定の蒸着材料収容体を加熱位置に導き、この蒸着材料収容体の凹部内に収容された蒸着材料を加熱して、この蒸着材料を前記の開口を通して蒸発させて被処理材の表面に蒸着させる蒸着装置において、前記の加熱位置に導かれた蒸着材料収容体を露出させる開口部が設けられた防着部材を、他の蒸着材料収容体の上面を覆うようにして回転支持体の上に配置させ、加熱位置に導かれた蒸着材料収容体の開口された上面が、前記の開口部の口縁における防着部材の下面よりも上に位置するようにした。
In the present invention, in order to solve the problems as described above, a plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess having an upper surface opened are provided on a rotatable rotating support body in the circumferential direction. The specific vapor deposition material container is guided to the heating position by the rotating support, the vapor deposition material accommodated in the recess of the vapor deposition material container is heated, and the vapor deposition material is evaporated through the opening to be processed. In the vapor deposition apparatus for vapor deposition on the surface of the material, the deposition member provided with the opening for exposing the vapor deposition material container guided to the heating position is rotated so as to cover the upper surface of the other vapor deposition material container. The upper surface of the vapor deposition material container that was placed on the support and led to the heating position was positioned above the lower surface of the deposition-preventing member at the edge of the opening.
このように、加熱位置に導かれた蒸着材料収容体の開口された上面を、蒸着材料収容体を露出させる開口部の口縁における防着部材の下面よりも上に位置させると、ビームが照射されて蒸着材料収容体の開口された上面から蒸発した蒸着材料が、この蒸着材料収容体と前記の開口部との間を通して防着部材の下面側に導かれるのが抑制され、この防着部材の下面と回転支持体との間を通して他の蒸着材料収容体に導かれるのが防止される。特に、加熱位置に導かれた蒸着材料収容体の上面を、前記の開口部の口縁における防着部材の上面よりも上に位置させると、蒸発した蒸着材料が、この蒸着材料収容体と前記の開口部との間を通して防着部材の下面側に導かれるのが一層抑制され、この防着部材の下面と回転支持体との間を通して他の蒸着材料収容体に導かれるのが一層防止されるようになる。
In this way, when the upper surface of the vapor deposition material container guided to the heating position is positioned above the lower surface of the deposition preventing member at the lip of the opening that exposes the vapor deposition material container, the beam is irradiated. The vapor deposition material evaporated from the opened upper surface of the vapor deposition material container is suppressed from being led to the lower surface side of the deposition member through the gap between the vapor deposition material container and the opening. It is prevented from being led to another vapor deposition material container through between the lower surface of the substrate and the rotary support. In particular, when the upper surface of the vapor deposition material container guided to the heating position is positioned above the upper surface of the deposition preventing member at the lip of the opening, the evaporated vapor deposition material is separated from the vapor deposition material container and the It is further suppressed from being led to the lower surface side of the adhesion preventing member through the opening of the adhesion preventing member from being led to another vapor deposition material container through between the lower surface of the adhesion preventing member and the rotary support. Become so.
ここで、前記のように加熱位置に導かれた蒸着材料収容体を露出させる開口部を有する防着部材を、他の蒸着材料収容体の上面を覆うようにして回転支持体の上に配置させ、加熱位置に導かれた蒸着材料収容体の開口された上面を、前記の開口部の口縁における防着部材の下面よりも上に位置させるにあたっては、前記の防着部材を下段部と上段部とを有する段差状に形成し、加熱位置に導かれた蒸着材料収容体を露出させる開口部を防着部材の下段部に設けるようにすることができる。
Here, the adhesion preventing member having the opening for exposing the vapor deposition material container guided to the heating position as described above is disposed on the rotary support so as to cover the upper surface of the other vapor deposition material container. In order to position the opened upper surface of the vapor deposition material container guided to the heating position above the lower surface of the deposition preventing member at the lip of the opening, the deposition preventing member is placed between the lower step and the upper step. The opening part which exposes the vapor deposition material container guide | induced to the heating position can be provided in the lower step part of an adhesion prevention member.
また、前記の蒸着装置において、前記の加熱位置に導かれた蒸着材料収容体と隣接する他の蒸着材料収容体とを分離させる分離凸部を、前記の防着部材と回転支持体との間に設けると、分離凸部が設けられた防着部材の下面と回転支持体との間の隙間が一層狭くなり、蒸着材料収容体の開口された上面から蒸発した蒸着材料が、この蒸着材料収容体と前記の開口部との間を通して防着部材の下面側に導かれたとしも、分離凸部が設けられた防着部材の下面と回転支持体との間において抑止され、蒸発した蒸着材料が他の蒸着材料収容体に導かれるのが一層防止されるようになる。
In the vapor deposition apparatus, a separation convex portion that separates the vapor deposition material container guided to the heating position from another vapor deposition material container adjacent thereto is provided between the adhesion preventing member and the rotation support body. The gap between the lower surface of the deposition-preventing member provided with the separation convex portion and the rotary support body is further narrowed, and the vapor deposition material evaporated from the upper surface of the vapor deposition material container is accommodated in the vapor deposition material container. Even if it is led to the lower surface side of the deposition preventive member through between the body and the opening, the vapor deposition material is suppressed and evaporated between the lower surface of the deposition preventive member provided with the separation projection and the rotating support. Is further prevented from being led to another vapor deposition material container.
また、前記の蒸着装置において、加熱位置に導かれた特定の蒸着材料収容体から蒸着材料を蒸発させて、この蒸着材料を被処理材の表面に蒸着させた後、回転支持体に支持された他の蒸着材料収容体を加熱位置に導くにあたっては、前記の防着部材と回転支持体との少なくとも一方を昇降させる昇降装置を設けるようにすることができる。
Further, in the above vapor deposition apparatus, the vapor deposition material is evaporated from the specific vapor deposition material container guided to the heating position, and this vapor deposition material is vapor deposited on the surface of the material to be treated, and then supported by the rotating support. In order to guide the other vapor deposition material container to the heating position, an elevating device for elevating and lowering at least one of the deposition preventing member and the rotating support can be provided.
そして、前記の昇降装置によって防着部材を昇降させる場合には、この昇降装置により前記の防着部材を、前記の開口部の口縁における下面が、前記の蒸着材料収容体の上面と衝突しない位置まで上昇させた状態で、前記の回転支持体を回転させ、次の蒸着材料収容体を加熱位置に導くようにする。そして、このように次の蒸着材料収容体を加熱位置に導いた後は、前記の昇降装置によって防着部材を下降させ、次の蒸着材料収容体の開口された上面を、開口部の口縁における防着部材の下面よりも上に位置させるようにする。
And when raising / lowering an adhesion prevention member by the said raising / lowering apparatus, the lower surface in the opening edge of the said opening part does not collide with the upper surface of the said vapor deposition material container by this raising / lowering apparatus. In the state raised to the position, the rotary support is rotated so that the next vapor deposition material container is guided to the heating position. And after guiding the next vapor deposition material container to the heating position in this way, the deposition member is lowered by the lifting device, and the upper surface of the next vapor deposition material container is opened to the lip of the opening. It is made to position above the lower surface of the adhesion-preventing member.
また、前記の蒸着装置において、前記の防着部材の開口部の口縁に耐熱リングを装着させ、この耐熱リングの上面部を内周側から外周側に向かって下方に傾斜させると、防着部材の開口部の口縁が熱によって変形するのが耐熱リングによって抑制されると共に、開口部の口縁に付着する蒸着材料の塊が、この耐熱リングの上面部における外周側に向かって下方に傾斜した面に沿って防着部材の上に導かれ、防着部材を昇降させる場合等に、開口部の口縁に付着した蒸着材料の塊が、回転支持体の上や他の蒸着材料収容体内に落ちたりするのが防止される。
Further, in the vapor deposition apparatus, when the heat-resistant ring is attached to the lip of the opening of the adhesion-preventing member and the upper surface portion of the heat-resistant ring is inclined downward from the inner peripheral side toward the outer peripheral side, the adhesion is prevented. The heat-resistant ring prevents the edge of the opening of the member from being deformed by heat, and the lump of vapor deposition material adhering to the opening of the opening is downward toward the outer peripheral side of the upper surface of the heat-resistant ring. A lump of vapor deposition material that is guided along the inclined surface onto the adhesion prevention member and lifts the adhesion prevention member, etc., adheres to the lip of the opening. It is prevented from falling into the body.
本発明の蒸着装置においては、加熱位置に導かれた蒸着材料収容体を露出させる開口部が設けられた防着部材を、他の蒸着材料収容体の上面を覆うようにして回転支持体の上に配置させるにあたり、加熱位置に導かれた蒸着材料収容体の開口された上面を、前記の開口部の口縁における防着部材の下面よりも上に位置させるようにしたため、ビームが照射されて蒸着材料収容体の開口された上面から蒸発した蒸着材料が、この蒸着材料収容体と前記の開口部との間を通して防着部材の下面側に導かれるのが抑制され、防着部材の下面に付着したり、この防着部材の下面と回転支持体との間を通して他の蒸着材料収容体に導かれるのが防止される。
In the vapor deposition apparatus of the present invention, the adhesion preventing member provided with the opening for exposing the vapor deposition material container guided to the heating position is placed on the rotating support so as to cover the upper surface of the other vapor deposition material container. Since the upper surface of the vapor deposition material container guided to the heating position is positioned above the lower surface of the deposition preventing member at the lip of the opening, the beam is irradiated. The vapor deposition material evaporated from the upper surface of the vapor deposition material container that is opened is suppressed from being led to the lower surface side of the deposition preventing member through the space between the vapor deposition material container and the opening. It is prevented from adhering or being led to another vapor deposition material container through the lower surface of the adhesion-preventing member and the rotary support.
この結果、本発明の蒸着装置においては、回転支持体により加熱位置に導かれた蒸着材料収容体の開口を通して、蒸着材料収容体の凹部内に収容された蒸着材料にビームを照射させて蒸着材料を蒸発させ、この蒸着材料を被処理材の表面に蒸着させる際に、前記の蒸着材料収容体から蒸発された蒸着材料が、他の蒸着材料収容体に導かれて他の蒸着材料収容体内に収容された蒸着材料に混入するのが適切に防止されるようになる。
As a result, in the vapor deposition apparatus of the present invention, the vapor deposition material accommodated in the concave portion of the vapor deposition material container is irradiated with a beam through the opening of the vapor deposition material container guided to the heating position by the rotating support, thereby vapor deposition material. When the vapor deposition material is vapor-deposited on the surface of the material to be treated, the vapor deposition material evaporated from the vapor deposition material container is guided to the other vapor deposition material container and enters the other vapor deposition material container. Mixing into the stored vapor deposition material is appropriately prevented.
以下、本発明の実施形態に係る蒸着装置を添付図面に基づいて具体的に説明する。なお、本発明に係る蒸着装置は下記の実施形態に示したものに限定されず、発明の要旨を変更しない範囲において、適宜変更して実施できるものである。
Hereinafter, a vapor deposition apparatus according to an embodiment of the present invention will be specifically described with reference to the accompanying drawings. In addition, the vapor deposition apparatus which concerns on this invention is not limited to what was shown to the following embodiment, In the range which does not change the summary of invention, it can change suitably and can implement.
この実施形態の蒸着装置においては、図1に示すように、真空チャンバー1の底部から回転装置2の回転軸2aを真空チャンバー1内に導入させ、円板状になった回転支持体10の中心部をこの回転軸2aに保持させて、この回転軸2aを中心にして前記の回転支持体10を回転させるようにしている。なお、回転装置2の回転軸2aを真空チャンバー1内に導入させる部分から、外気が真空チャンバー1内に侵入しないようにシール部材2bを設けている。
In the vapor deposition apparatus of this embodiment, as shown in FIG. 1, the rotating shaft 2 a of the rotating device 2 is introduced into the vacuum chamber 1 from the bottom of the vacuum chamber 1, and the center of the disk-shaped rotating support 10 is formed. The rotating support 10 is rotated around the rotating shaft 2a by holding the portion on the rotating shaft 2a. A sealing member 2 b is provided so that outside air does not enter the vacuum chamber 1 from a portion where the rotating shaft 2 a of the rotating device 2 is introduced into the vacuum chamber 1.
また、前記の回転支持体10の上面に、図2及び図3に示すように、その周方向に所要間隔を介して複数(図に示す例では4つ)の保持凹部11を設けると共に、各保持凹部11間を分離させて回転支持体10の上面を4等分するように、三角形の突状からなる分離凸部12を中心部から放射状に設けると共に、回転支持体10の上面の外周に沿って上方に突出した環状凸部13を設けている。
Further, as shown in FIGS. 2 and 3, a plurality of (four in the example shown in the figure) holding recesses 11 are provided on the upper surface of the rotary support 10 with a required interval in the circumferential direction. In order to separate the holding recesses 11 and divide the upper surface of the rotary support 10 into four equal parts, the separation protrusions 12 having triangular protrusions are provided radially from the center, and on the outer periphery of the upper surface of the rotary support 10. An annular convex portion 13 protruding upward is provided.
そして、前記の回転支持体10の上面に設けられた各保持凹部11に、図3に示すように、上面が開口された凹部内に蒸着材料Tが収容された各蒸着材料収容体3を保持させ、各蒸着材料収容体3の上面が前記の分離凸部12よりも上方に位置するようにしている。
Then, as shown in FIG. 3, the respective vapor deposition material containers 3 in which the vapor deposition material T is accommodated in the concave portions whose upper surfaces are opened are held in the respective holding concave portions 11 provided on the upper surface of the rotary support 10. The upper surface of each vapor deposition material container 3 is positioned above the separating projection 12.
また、ビーム照射位置に導かれた蒸着材料収容体3を露出させる開口部21が設けられた平面円形状の防着部材20を、他の蒸着材料収容体3の上面を覆うようにして前記の回転支持体10の上に配置させるようにしている。
Further, the planar circular deposition preventing member 20 provided with the opening 21 for exposing the vapor deposition material container 3 guided to the beam irradiation position is covered with the above-described upper surface of the other vapor deposition material container 3. It is arranged on the rotating support 10.
また、この防着部材20は、その外径が前記の回転支持体10よりも若干大径になっており、この防着部材20の外周に沿って下方に延出された側壁部20cによって、前記の回転支持体10の外周側を覆うようにしている。
In addition, the outer diameter of the anti-adhesion member 20 is slightly larger than that of the rotary support 10, and the side wall 20c extending downward along the outer periphery of the anti-adhesion member 20 The outer peripheral side of the rotary support 10 is covered.
また、この防着部材20の直径方向両側の位置に、それぞれ防着部材20の外周からそれぞれ反対方向に突出する突出片22を設け、この両側の突出片22をそれぞれ真空チャンバー1の底部から真空チャンバー1内に導入された昇降装置4における昇降ロッド4aに保持させ、この昇降装置4における昇降ロッド4aによって前記の防着部材20を回転支持体10の上方において昇降させるようにしている。なお、昇降装置4における昇降ロッド4aを真空チャンバー1内に導入させる部分から、外気が真空チャンバー1内に侵入しないようにシール部材4bを設けている。
Further, projecting pieces 22 projecting in opposite directions from the outer periphery of the deposition preventing member 20 are provided at positions on both sides in the diameter direction of the deposition preventing member 20, and the projecting pieces 22 on both sides are vacuumed from the bottom of the vacuum chamber 1, respectively. The lifting / lowering rod 4a of the lifting / lowering device 4 introduced into the chamber 1 is held by the lifting / lowering rod 4a. A sealing member 4 b is provided so that outside air does not enter the vacuum chamber 1 from a portion where the lifting rod 4 a in the lifting device 4 is introduced into the vacuum chamber 1.
ここで、前記の防着部材20は、前記の開口部21が設けられた扇形状の下段部20aと、この下段部20aよりも高くなったその他の上段部20bとを有する段差状に形成されている。
Here, the said adhesion prevention member 20 is formed in the level | step difference shape which has the fan-shaped lower step part 20a provided with the said opening part 21, and the other upper step part 20b higher than this lower step part 20a. ing.
そして、この実施形態の蒸着装置においては、前記の図1に示すように、真空チャンバー1の側部に設けられたプラズマガン等のビーム出射装置5からプラズマビーム等のビームBを出射させ、ビーム照射位置に導かれた蒸着材料収容体3の凹部内に収容された蒸着材料TにビームBを照射させて蒸着材料Tを蒸発させ、蒸発された蒸着材料Tを真空チャンバー1内の上部に配置された被処理材Wの表面に蒸着させるようにしている。
In the vapor deposition apparatus of this embodiment, as shown in FIG. 1, a beam B such as a plasma beam is emitted from a beam emitting apparatus 5 such as a plasma gun provided on the side of the vacuum chamber 1, and the beam The vapor deposition material T accommodated in the recess of the vapor deposition material container 3 guided to the irradiation position is irradiated with the beam B to evaporate the vapor deposition material T, and the evaporated vapor deposition material T is disposed in the upper part of the vacuum chamber 1. Vapor deposition is performed on the surface of the processed material W.
ここで、この実施形態においては、図6に示すように、前記の昇降装置4に設けられた昇降ロッド4aにより、前記の防着部材20を上昇させた後、前記の回転装置2により回転軸2aを中心にして蒸着材料収容体3が保持された回転支持体10を回転させ、被処理材Wに蒸着させる蒸着材料Tが収容された蒸着材料収容体3をビーム照射位置に導き、その後、前記の昇降装置4に設けられた昇降ロッド4aにより、防着部材20を下降させるようにする。
Here, in this embodiment, as shown in FIG. 6, after the elevating rod 4a provided in the elevating device 4 raises the adhesion-preventing member 20, the rotating device 2 rotates the rotating shaft. The rotating support body 10 holding the vapor deposition material container 3 around the center 2a is rotated, and the vapor deposition material container 3 containing the vapor deposition material T to be vapor-deposited on the workpiece W is guided to the beam irradiation position. The deposition preventing member 20 is lowered by the lifting rod 4 a provided in the lifting device 4.
そして、このように防着部材20を下降させて、図1、図4及び図5(A),(B)に示すように、この防着部材20の下段部20aに設けられた開口部21内にビーム照射位置に導かれた蒸着材料収容体3を導き入れ、ビーム照射位置に導かれた蒸着材料収容体3の上面を、前記の防着部材20に設けられた開口部21の口縁における防着部材20の上面より上に突出させると共に、ビーム照射位置に導かれた蒸着材料収容体3を保持する部分を区画するようにして回転支持体10の上面に放射状に設けられた2つの分離凸部12を、開口部21が設けられた扇形の下段部20aの下面の下に位置させ、防着部材20の下段部20aの下面と回転支持体10の上面との隙間が非常に狭くなるようにしている。
Then, the adhesion preventing member 20 is lowered in this way, and the opening 21 provided in the lower step portion 20a of the adhesion preventing member 20 as shown in FIGS. 1, 4 and 5A, 5B. The vapor deposition material container 3 guided to the beam irradiation position is introduced into the inside, and the upper surface of the vapor deposition material container 3 guided to the beam irradiation position is placed on the edge of the opening 21 provided in the adhesion preventing member 20. Projecting above the upper surface of the adhesion-preventing member 20, and two portions provided radially on the upper surface of the rotary support 10 so as to define a portion for holding the vapor deposition material container 3 guided to the beam irradiation position. The separation convex portion 12 is positioned below the lower surface of the fan-shaped lower step portion 20 a provided with the opening 21, and the gap between the lower surface of the lower step portion 20 a of the deposition preventing member 20 and the upper surface of the rotation support 10 is very narrow. It is trying to become.
そして、このようにビーム照射位置に導かれた蒸着材料収容体3の上面を、防着部材20に設けられた開口部21の口縁における防着部材20の上面よりも突出させた状態で、前記のようにビームBをこの蒸着材料収容体3内に収容された蒸着材料Tに照射させて、この蒸着材料収容体3内に収容された蒸着材料Tを蒸発させる。
And in the state which made the upper surface of the vapor deposition material container 3 thus guided to the beam irradiation position protrude from the upper surface of the deposition preventing member 20 at the lip of the opening 21 provided in the deposition preventing member 20, As described above, the beam B is irradiated to the vapor deposition material T accommodated in the vapor deposition material container 3 to evaporate the vapor deposition material T accommodated in the vapor deposition material container 3.
このようにすると、蒸着材料収容体3の開口された上面から蒸発した蒸着材料Tが、蒸着材料収容体3と防着部材20の開口部21との間を通して防着部材20の下面側に流れ込むのが防止されると共に、蒸発した蒸着材料Tが防着部材20の下面側に流れ込んだとしても、ビーム照射位置に導かれた蒸着材料収容体3を保持する部分を区画するようにして回転支持体10の上面に設けられた前記の2つの分離凸部12により、この防着部材20の下段部20aの下面と回転支持体10の上面との隙間が非常に狭くなっているため、防着部材20の下面側に流れ込んだ蒸着材料Tが、防着部材20の下段部20aの下面と回転支持体10の上面との隙間を通して他の蒸着材料収容体3に導かれるのが防止される。
If it does in this way, the vapor deposition material T which evaporated from the upper surface opened of the vapor deposition material container 3 will flow into the lower surface side of the deposition preventing member 20 through between the vapor deposition material container 3 and the opening part 21 of the deposition preventing member 20. In addition, even if the evaporated vapor deposition material T flows into the lower surface side of the deposition preventing member 20, the rotation support is performed so as to partition the portion that holds the vapor deposition material container 3 guided to the beam irradiation position. The gap between the lower surface of the lower step portion 20a of the anti-adhesion member 20 and the upper surface of the rotary support 10 is very narrow due to the two separating projections 12 provided on the upper surface of the body 10. The vapor deposition material T flowing into the lower surface side of the member 20 is prevented from being guided to another vapor deposition material container 3 through the gap between the lower surface of the lower step portion 20a of the deposition preventing member 20 and the upper surface of the rotary support 10.
この結果、この実施形態の蒸着装置においては、ビーム照射位置に導かれた蒸着材料収容体3内に収容された蒸着材料Tを蒸発させて被処理材Wの表面に蒸着させる際に、前記の蒸着材料収容体3から蒸発された蒸着材料Tが、他の蒸着材料収容体3に導かれて他の蒸着材料収容体3内に収容された蒸着材料Tに混入するのが適切に防止されるようになる。
As a result, in the vapor deposition apparatus of this embodiment, when the vapor deposition material T accommodated in the vapor deposition material container 3 guided to the beam irradiation position is evaporated and vapor deposited on the surface of the material W to be processed, The vapor deposition material T evaporated from the vapor deposition material container 3 is appropriately prevented from being introduced into the other vapor deposition material container 3 and mixed into the vapor deposition material T accommodated in the other vapor deposition material container 3. It becomes like this.
また、この実施形態の蒸着装置においては、前記の分離凸部12が三角形の突状になっているため、前記のように防着部材20を昇降させる際に、この分離凸部12の上に蒸着材料Tの塊が落ちたとしても、この蒸着材料Tの塊が分離凸部12から回転支持体10の上に転げ落ちて、蒸着材料Tの塊が分離凸部12と防着部材20の下面との間に挟まるということもなくなる。
Moreover, in the vapor deposition apparatus of this embodiment, since the said separation convex part 12 is a triangular protrusion, when raising and lowering the adhesion prevention member 20 as mentioned above, on this separation convex part 12 Even if the lump of the vapor deposition material T falls, the lump of the vapor deposition material T falls down on the rotary support 10 from the separation convex portion 12, and the lump of the vapor deposition material T falls on the separation convex portion 12 and the lower surface of the adhesion preventing member 20. It will not be caught between.
なお、この実施形態においては、回転支持体10の上面自体に分離凸部12と環状凸部13とを設けるようにしたが、図7に示すように、回転支持体10の上面に着脱自在に装着させる円板部材30を用いるようにし、この円板部材30の中央部に回転支持体10に装着させる取付穴部31を設けると共に、前記の回転支持体10における保持凹部11に対応した貫通孔32を設け、この円板部材30の上面に、中央の取付穴部31から放射状に三角形の突状からなる分離凸部33を設けると共に、円板部材30の上面の外周に沿って上方に突出した環状凸部34を設けるようにすることもできる。このように、回転支持体10の上面に円板部材30を着脱自在に装着させると、防着部材20の下面側に蒸着材料Tが流れ込んで、この円板部材30に蒸着材料Tが付着したとしても、この円板部材30を回転支持体10の上面から離脱させて簡単に交換できるようになる。
In this embodiment, the separation convex portion 12 and the annular convex portion 13 are provided on the upper surface of the rotary support 10 itself. However, as shown in FIG. A disk member 30 to be mounted is used, and a mounting hole 31 to be mounted on the rotary support 10 is provided at the center of the disk member 30 and a through hole corresponding to the holding recess 11 in the rotary support 10 is provided. 32, and a separation convex portion 33 having a triangular projection radially from the central mounting hole 31 is provided on the upper surface of the disk member 30 and protrudes upward along the outer periphery of the upper surface of the disk member 30. An annular convex portion 34 may be provided. As described above, when the disk member 30 is detachably mounted on the upper surface of the rotary support 10, the vapor deposition material T flows into the lower surface side of the deposition preventing member 20, and the vapor deposition material T adheres to the disk member 30. However, the disk member 30 can be easily replaced by being detached from the upper surface of the rotary support 10.
また、この実施形態においては、前記のようにビーム照射位置に導かれた蒸着材料収容体3の上面を、防着部材20に設けられた開口部21の口縁における防着部材20の上面より上に突出させるようにしたが、ビーム照射位置に導かれた蒸着材料収容体3の上面を、防着部材20に設けられた開口部21の口縁における防着部材20の下面より上に位置させるようにした場合においても、蒸着材料収容体3の開口された上面から蒸発した蒸着材料Tが、蒸着材料収容体3と防着部材20の開口部21との間を通して防着部材20の下面側に流れ込むのが抑制されるようになる。
Further, in this embodiment, the upper surface of the vapor deposition material container 3 guided to the beam irradiation position as described above is arranged from the upper surface of the deposition preventing member 20 at the rim of the opening 21 provided in the deposition preventing member 20. The upper surface of the vapor deposition material container 3 guided to the beam irradiation position is positioned above the lower surface of the deposition preventing member 20 at the lip of the opening 21 provided in the deposition preventing member 20. Even in the case where the vapor deposition material T is evaporated, the vapor deposition material T evaporated from the opened upper surface of the vapor deposition material container 3 passes between the vapor deposition material container 3 and the opening 21 of the adhesion preventing member 20 and the lower surface of the adhesion preventing member 20. Inflow to the side is suppressed.
また、前記の実施形態の蒸着装置において、図8に示すように、前記の防着部材20の開口部21の口縁に耐熱リング23を装着させ、この耐熱リング23の上面部を内周側から外周側に向かって下方に傾斜させるようにすると、防着部材20の開口部21の口縁が熱によって変形するのが耐熱リング23によって抑制されると共に、開口部21の口縁に付着した蒸着材料Tが、防着部材20を昇降させる際に剥がれて片鱗となっても、この耐熱リング23の上面部における外周側に向かって下方に傾斜した面に沿って防着部材20の上に導かれ、回転支持体10の上や他の蒸着材料収容体3内に落ちたりするのが防止されるようになる。
Further, in the vapor deposition apparatus of the above embodiment, as shown in FIG. 8, a heat-resistant ring 23 is attached to the rim of the opening 21 of the deposition preventing member 20, and the upper surface of the heat-resistant ring 23 is set on the inner peripheral side. When it is made to incline downward toward the outer peripheral side, the edge of the opening 21 of the deposition preventing member 20 is prevented from being deformed by heat by the heat-resistant ring 23 and attached to the edge of the opening 21. Even if the vapor deposition material T is peeled off when the adhesion preventing member 20 is moved up and down, the vapor deposition material T is formed on the adhesion preventing member 20 along the surface inclined downward toward the outer peripheral side of the upper surface portion of the heat-resistant ring 23. As a result, it is prevented from falling on the rotary support 10 or in the other vapor deposition material container 3.
さらに、前記の実施形態の蒸着装置においては、蒸着材料Tにビーム出射装置5からビームBを照射させて、蒸着材料Tを加熱させるようにしたが、電気ヒーター等の加熱手段(図示せず)を設けて、蒸着材料Tを加熱させることも可能である。
Furthermore, in the vapor deposition apparatus of the above-described embodiment, the vapor deposition material T is irradiated with the beam B from the beam emitting device 5 to heat the vapor deposition material T. However, heating means such as an electric heater (not shown) It is also possible to heat the vapor deposition material T by providing.
1 真空チャンバー
2 回転装置、2a 回転軸、2b シール部材
3 蒸着材料収容体
4 昇降装置、4a 昇降ロッド、4b シール部材
5 ビーム出射装置
10 回転支持体
11 保持凹部
12 分離凸部
13 環状凸部
20 防着部材、20a 下段部、20b 上段部、20c 側壁部
21 開口部
22 突出片
23 耐熱リング
30 円板部材
31 取付穴部
32 貫通孔
33 分離凸部
34 環状凸部
B ビーム
T 蒸着材料
W 被処理材
DESCRIPTION OFSYMBOLS 1 Vacuum chamber 2 Rotating device, 2a Rotating shaft, 2b Sealing member 3 Vapor deposition material container 4 Lifting device, 4a Lifting rod, 4b Sealing member 5 Beam emitting device 10 Rotating support 11 Holding recessed part 12 Separation convex part 13 Annular convex part 20 Deposition member, 20a Lower step portion, 20b Upper step portion, 20c Side wall portion 21 Opening portion 22 Projection piece 23 Heat-resistant ring 30 Disc member 31 Mounting hole portion 32 Through hole 33 Separation convex portion 34 Annular convex portion B Beam T Deposition material W Covered Treatment material
2 回転装置、2a 回転軸、2b シール部材
3 蒸着材料収容体
4 昇降装置、4a 昇降ロッド、4b シール部材
5 ビーム出射装置
10 回転支持体
11 保持凹部
12 分離凸部
13 環状凸部
20 防着部材、20a 下段部、20b 上段部、20c 側壁部
21 開口部
22 突出片
23 耐熱リング
30 円板部材
31 取付穴部
32 貫通孔
33 分離凸部
34 環状凸部
B ビーム
T 蒸着材料
W 被処理材
DESCRIPTION OF
Claims (7)
- 上面が開口された凹部内に蒸着材料が収容された蒸着材料収容体を、回転可能な回転支持体の上に周方向に複数設け、前記の回転支持体により特定の蒸着材料収容体を加熱位置に導き、この蒸着材料収容体の凹部内に収容された蒸着材料を加熱して、この蒸着材料を前記の開口を通して蒸発させて被処理材の表面に蒸着させる蒸着装置において、前記の加熱位置に導かれた蒸着材料収容体を露出させる開口部が設けられた防着部材を、他の蒸着材料収容体の上面を覆うようにして回転支持体の上に配置させ、加熱位置に導かれた蒸着材料収容体の開口された上面が、前記の開口部の口縁における防着部材の下面よりも上に位置するようにしたことを特徴とする蒸着装置。 A plurality of vapor deposition material containers in which a vapor deposition material is accommodated in a recess whose upper surface is opened are provided in a circumferential direction on a rotatable rotary support, and the specific vapor deposition material container is heated by the rotary support. In the vapor deposition apparatus for heating the vapor deposition material accommodated in the recess of the vapor deposition material container and evaporating the vapor deposition material through the opening to deposit on the surface of the material to be treated, the heating position is set at the heating position. A deposition member provided with an opening for exposing the led deposition material container is placed on the rotating support so as to cover the upper surface of the other deposition material container, and the deposition led to the heating position The vapor deposition apparatus characterized in that the upper surface of the material container opened is positioned above the lower surface of the deposition preventing member at the edge of the opening.
- 請求項1に記載の蒸着装置において、前記の防着部材を下段部と上段部とを有する段差状に形成し、加熱位置に導かれた蒸着材料収容体を露出させる開口部を、防着部材の下段部に設けたことを特徴とする蒸着装置。 The vapor deposition apparatus according to claim 1, wherein the deposition member is formed in a step shape having a lower step portion and an upper step portion, and an opening for exposing the vapor deposition material container guided to the heating position is formed as the deposition member. The vapor deposition apparatus characterized by being provided in the lower stage part.
- 請求項1又は請求項2に記載の蒸着装置において、前記の加熱位置に導かれた蒸着材料収容体と隣接する他の蒸着材料収容体とを分離させる分離凸部を、前記の防着部材と回転支持体との間に設けたことを特徴とする蒸着装置。 3. The vapor deposition apparatus according to claim 1, wherein a separation convex portion that separates the vapor deposition material container guided to the heating position from another vapor deposition material container adjacent to the vapor deposition material container and the adhesion preventing member. A vapor deposition apparatus provided between the rotary support and the vapor deposition apparatus.
- 請求項1~請求項3の何れか1項に記載の蒸着装置において、前記の防着部材と回転支持体との少なくとも一方を昇降させる昇降装置を設けたことを特徴とする蒸着装置。 The vapor deposition apparatus according to any one of claims 1 to 3, further comprising a lifting device that lifts and lowers at least one of the adhesion-preventing member and the rotating support.
- 請求項4に記載の蒸着装置において、前記の昇降装置によって防着部材を昇降させるようにし、この昇降装置により前記の防着部材を、前記の開口部の口縁における下面が、前記の蒸着材料収容体の上面と衝突しない位置まで上昇させた状態で、前記の回転支持体を回転させることを特徴とする蒸着装置。 5. The vapor deposition apparatus according to claim 4, wherein the deposition member is moved up and down by the lifting device, and the bottom surface of the opening edge of the deposition member is made up of the deposition material by the lifting device. The vapor deposition apparatus, wherein the rotary support is rotated in a state where it is raised to a position where it does not collide with the upper surface of the container.
- 請求項1~請求項5の何れか1項に記載の蒸着装置において、前記の防着部材における開口部の口縁に耐熱リングを装着させ、この耐熱リングの上面部を内周側から外周側に向かって下方に傾斜させたことを特徴とする蒸着装置。 The vapor deposition apparatus according to any one of claims 1 to 5, wherein a heat-resistant ring is attached to a lip of the opening of the adhesion preventing member, and an upper surface portion of the heat-resistant ring is changed from the inner peripheral side to the outer peripheral side. An evaporation apparatus characterized by being inclined downward toward the surface.
- 請求項1~請求項6の何れか1項に記載の蒸着装置において、前記の蒸着材料収容体内に収容された蒸着材料を加熱させるにあたり、蒸着材料にビームを照射させることを特徴とする蒸着装置。 The vapor deposition apparatus according to any one of claims 1 to 6, wherein the vapor deposition material is irradiated with a beam when the vapor deposition material accommodated in the vapor deposition material container is heated. .
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PCT/JP2012/067107 WO2014006706A1 (en) | 2012-07-04 | 2012-07-04 | Vapor deposition device |
TW102117717A TWI600781B (en) | 2012-07-04 | 2013-05-20 | Vapor deposition equipment |
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JP2022520307A (en) * | 2018-11-30 | 2022-03-30 | フェローテック(ユーエスエー)コーポレイション | Crucible cover for coating with electron beam source |
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JPH07166335A (en) * | 1993-12-15 | 1995-06-27 | Nikon Corp | Ion plating device |
JPH08225927A (en) * | 1995-02-22 | 1996-09-03 | Nikon Corp | Crucible for evaporation |
JP2002038256A (en) * | 2000-06-01 | 2002-02-06 | Boc Group Inc:The | Electron beam source with more than one pocket |
JP2002097566A (en) * | 2000-09-18 | 2002-04-02 | Toyo Commun Equip Co Ltd | Electron gun for electron beam vapor deposition |
JP2006200040A (en) * | 2005-01-21 | 2006-08-03 | Samsung Sdi Co Ltd | Supporting device for heating vessel and deposition apparatus having the same |
JP2007332433A (en) * | 2006-06-16 | 2007-12-27 | Seiko Epson Corp | Vacuum vapor-deposition apparatus |
-
2012
- 2012-07-04 JP JP2014523485A patent/JP5832650B2/en active Active
- 2012-07-04 WO PCT/JP2012/067107 patent/WO2014006706A1/en active Application Filing
-
2013
- 2013-05-20 TW TW102117717A patent/TWI600781B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07166335A (en) * | 1993-12-15 | 1995-06-27 | Nikon Corp | Ion plating device |
JPH08225927A (en) * | 1995-02-22 | 1996-09-03 | Nikon Corp | Crucible for evaporation |
JP2002038256A (en) * | 2000-06-01 | 2002-02-06 | Boc Group Inc:The | Electron beam source with more than one pocket |
JP2002097566A (en) * | 2000-09-18 | 2002-04-02 | Toyo Commun Equip Co Ltd | Electron gun for electron beam vapor deposition |
JP2006200040A (en) * | 2005-01-21 | 2006-08-03 | Samsung Sdi Co Ltd | Supporting device for heating vessel and deposition apparatus having the same |
JP2007332433A (en) * | 2006-06-16 | 2007-12-27 | Seiko Epson Corp | Vacuum vapor-deposition apparatus |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022520307A (en) * | 2018-11-30 | 2022-03-30 | フェローテック(ユーエスエー)コーポレイション | Crucible cover for coating with electron beam source |
US11807935B2 (en) | 2018-11-30 | 2023-11-07 | Ferrotec (Usa) Corporation | Crucible cover for coating with an electron beam source |
JP7394134B2 (en) | 2018-11-30 | 2023-12-07 | フェローテック(ユーエスエー)コーポレイション | Crucible cover for coating with electron beam source |
Also Published As
Publication number | Publication date |
---|---|
TW201402845A (en) | 2014-01-16 |
JP5832650B2 (en) | 2015-12-16 |
TWI600781B (en) | 2017-10-01 |
JPWO2014006706A1 (en) | 2016-06-02 |
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