WO2014005531A1 - Confocal measurement device utilizing elliptical mirror based illumination - Google Patents
Confocal measurement device utilizing elliptical mirror based illumination Download PDFInfo
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- WO2014005531A1 WO2014005531A1 PCT/CN2013/078827 CN2013078827W WO2014005531A1 WO 2014005531 A1 WO2014005531 A1 WO 2014005531A1 CN 2013078827 W CN2013078827 W CN 2013078827W WO 2014005531 A1 WO2014005531 A1 WO 2014005531A1
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- elliptical mirror
- pinhole
- mirror
- laser
- numerical aperture
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B9/00—Measuring instruments characterised by the use of optical techniques
- G01B9/04—Measuring microscopes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
Definitions
- This invention relates to an optical microscopic measurement device, and to an ultra-precision non-contact measuring device used to measure the surface profile of a 3D fine structure in a micro industrial specimen in particular.
- Confocal scanning measurement is one of the important technologies used in the fields of micro-optics, micro-mechanics and micro-electronics to measure the line width, depth and surface profile of micro-step and micro groove fine structures.
- Conventional confocal scanning measurement systems illuminated by traditional lens have been disclosed in several patent or patent applications for example, CN101526341 published on September 9, 2009, disclosed a Differential Confocal Curvature Radius Measurement Device and Method thereof), CN1392962 published on January 22, 2003 disclosed a Confocal Microscope and the method of using the same to Measure height, and CN101182992 published on May 21, 2008 disclosed a Multicolor Super-resolution Differential Confocal Measurement Device and the method thereof.
- the axial and lateral resolutions are closely related to the numerical aperture of the lens, and the resolutions of the system increase as their Numerical Apertures (NA) increase.
- NA Numerical Apertures
- the confocal measurement system based on reflected illumination can be used to solve the aforementioned problem.
- a parabolic reflection system has been proposed and well developed: a parabolic mirror can be used to meet the requirement of a high Numerical Aperture.
- This invention aims at providing a confocal measurement device under illumination based on elliptical mirror, which uses a pair of conjugate focus of elliptical mirror to break through the numerical aperture limitation of a conventional detecting light and to achieve the illumination with a high numerical aperture, so that both axial and lateral resolutions can be greatly improved.
- a confocal measurement device utilizing elliptical mirror based illumination which comprises a laser, a beam collimating and expanding module, an objective lens with high numerical aperture, a pinhole, a three-axis stage, a collector, a detecting pinhole and a detector all of which are placed on the direct light path of the laser, the device further comprises an elliptical mirror placed on the direct light path of the laser and between the focusing objective lens and the detecting pinhole such that the far focus of the elliptical mirror is located on the pinhole and the near focus of the elliptical mirror is located on a specimen that is placed on the three-axis stage.
- This invention utilizes the detecting light coming from a focal point which focuses on another focal point via the reflection of an elliptical mirror to increase the numerical aperture of a detecting light. Due to the increased numerical aperture, both axial and lateral resolutions can be greatly improved, and due to the modified optical structure, it can be easier to find an ideal light source to match the device.
- the other purpose of this invention is to provide a confocal measurement device based on separated mirror set, the separated mirror set comprising a an elliptical mirror and compensating mirror set to enlarge the field of the view of the mirrors by correcting off-axis difference in a step by step manner and in the meantime reducing the design difficulty by the provided compensating mirror set.
- a confocal measurement device based on separated mirror set comprises a laser, a beam collimating and expanding module, an objective lens with high numerical aperture, a pinhole, a beam splitter, a three-axis stage all of which are placed on the direct light path of the laser, wherein the pinhole and detector are placed on the deflective light path of the beam splitter, the device further comprises a separated mirror set that is equivalent to an the elliptical mirror with high numerical aperture, the separated mirror set consisted of an elliptical mirror with high numerical aperture and two compensating mirrors placed on the direct light path of the laser, the separated mirror set is located between the beam splitter and the three-axis stage, and the elliptical mirror with high numerical aperture is located upstream the three-axis stage such that a far focus of the equivalent elliptical mirror is located on the pinhole and a near focus of the equivalent elliptical mirror is located on the specimen on the three-axis stage, wherein all the three
- the invention uses the detecting light which comes from a focal point and focuses on another focal point via the reflection of an elliptical mirror to break through the conventional numerical aperture limitation of detecting light, to improve both axial and lateral resolutions.
- the off-axis aberration and mechanical error can be corrected by the compensating mirror set, as a result, the field of view can be increased and the difficulties in fabrication can be alleviated.
- FIG 1 is a schematic of the confocal measurement device utilizing elliptical mirror based illumination according to one embodiment of the invention
- FIG 2 is a schematic showing the definition of coordinate for point spread function analysis of elliptical mirror in the confocal measurement device utilizing elliptical mirror based illumination of FIG 1;
- FIG 3 is a diagram showing respective lateral response curve of the confocal measurement device utilizing elliptical mirror based illumination of FIG 1;
- FIG 4 is a diagram showing axial respective response curve of the confocal measurement device utilizing elliptical mirror based illumination of FIG 1;
- FIG 5 is a schematic showing the structure of a confocal measurement device based on separated mirror set according another embodiment of the invention.
- 1 laser 2 beam collimating and expanding module; 3 objective lens with high numerical aperture; 4 pinhole; 5 three-axis stage; 6 elliptical mirror; 7 collector; 8 detecting pinhole; 9 detector, 15 detecting pinhole; 16 beam splitter; 17 detector; 18 separated mirror set; 18-1 elliptical mirror with high numerical aperture; 18-2 compensating lens; 19 three-axis stage;
- a first embodiment of the invention provides a confocal measurement device under illumination based on elliptical mirror, which comprises laser 1 , a beam collimating and expanding module 2, an objective lens with high numerical aperture 3, a pinhole 4, a three-axis stage 5, a collector 7, a detecting pinhole 8 and a detector 9.
- Elliptical mirror 6 is placed on the direct light path of laser 1 and disposed between the collector 7 and the detecting pinhole 8.
- the pinhole 4 is located at a far focus of elliptical mirror 6, and the specimen carried by the three-axis stage 5 is located at a near focus of elliptical mirror 6.
- Measurement can be done in following steps:
- Step 1 Illuminating of specimen to be measured.
- the parallel beam comes out from laser 1, and is expanded into an ideal plane wave thorough beam collimating and expanding module 2; the ideal plane wave is then focused on pinhole 4 through focusing objective lens with high numerical aperture 3; a spherical wave is formed after the focused light passes the pinhole 4; the spherical wave is focused through elliptical mirror 6 on the specimen on three-axis stage 5 to achieve an high numerical aperture illumination to the specimen under measurement.
- the elliptical mirror 6 is different from a conventional lens model, and so a theoretical derivation based on optical diffraction theory is needed.
- physical part S of elliptical mirror 6 is represented by solid line. In the actual system, the top of S is the acquisition system, so the physical part of elliptical mirror 6 is equivalent to a ring form as part of S.
- So represents an ellipsoid
- S represents an elliptical mirror.
- Green theorem is used to analyze the focusing characteristics of elliptical mirror 6 and to solve it with Kirchhoff diffraction formula.
- O represents the origin of coordinates.
- Pi represents the far focus of the elliptical mirror with coordinates (x ls y ls zi) where plane reflection mirror 8 is.
- P 2 represents the near focus of elliptical mirror with coordinates (x 2 , _y 2 , z 2 ) where the specimen is placed. represents the point on elliptical mirror where light is reflected from Pi to P 2 n represents the unit normal vector of the elliptical surface at point M;
- fpiM represents the distance from Pjto M
- I"MP2 represents the distance from to P2,'
- U P 2 represents the light wave function at point P 2;
- UM represents the light wave function at point M; So represents the ellipsoid where elliptical mirror 6 is; S represents elliptical mirror 6;
- the distance between the two points can be expressed as:
- h pl p2 represents the point spread function from pi to p2, and it can be as shown below through simplification:
- the detecting beam reflected from the specimen focuses via second focusing mirror enters detector 9 via detecting pinhole 8.
- h(x 3 y 3 z 3 ) h L - h pl _ p2 sin ⁇ ⁇
- FIG.3 and FIG.4 show the comparison of resolutions obtained through simulation using Matlab. It can be seen through the comparison that, compared to those obtained through traditional confocal measurement, the axial and lateral resolutions obtained using the system have been greatly improved.
- FIG 5 A second embodiment which is an improvement to the aforementioned embodiment is shown in FIG 5 wherein the identical components of the second embodiment are represented using identical reference signs.
- a confocal measurement device based on separated mirror set comprised of a laser 1, a beam collimating and expanding module 2, an objective lens with high numerical aperture 3, a pinhole 4, a beam splitter 16, a three-axis stage 19; a detecting pinhole 15 and a detector 17 are placed on the reflective light path of beam splitter 16; separated mirror setl8 consisting of an elliptical mirror with high numerical aperture 18-1 and compensating lens 18-2 placed on the direct light path of laser 1, the compensating lens 18-2 is located between the beam splitter 16 and the three-axis stage 19, the elliptical mirror with high numerical aperture 18-1 is located upstream of the 3-dimentional movable object stage 19.
- the separated mirror set 18 can function as an elliptical mirror, its far focus is located on the pinhole 4, and its near focus is located on the specimen placed on the three-axis stage 19.
- the compensating lens 18-2 consists of two mirrors, holes are provided at the centers of two mirrors in the compensating lens 18-2 and at the center of the elliptical mirror with high numerical aperture 18-1.
- measurement can be done in following steps:
- Step 1 illumination of specimen to be measured:
- the parallel beam comes out from the laser 1 and becomes an ideal plane wave after passing through the beam collimating and expanding module 2.
- the ideal plane wave is focused on the pinhole 4 through the objective lens with high numerical aperture 3 and a spherical detective wave is formed after it is focused since the separated mirror set 18 is equivalent to an elliptical mirror, and its far focus is located on the pinhole 4 and its near focus is located on the specimen placed on the three-axis stage 19.
- the spherical detective wave is directed through the pinhole 4, and then focused on the specimen on the three-axis stage 19 through the separated mirror set 18 to achieve a high numerical aperture illumination.
- the spherical detective beam irradiated on the specimen forms a diffused reflection, and reflects on beam splitter 5 via separated mirror set 18, and focuses on detecting pinhole 5 via beam splitter 16, and then enters detector 17 through detecting pinhole 15.
Abstract
A confocal measurement device utilizing elliptical mirror (6) based illumination is disclosed which comprises a laser (1), a beam collimating and expanding module (2), an objective lens (3) with high numerical aperture, a pinhole (4), a three-axis stage (5), a collector (7), a detecting pinhole (8) and a detector (9) that are placed on the direct light path of the laser; the device further comprises an elliptical mirror (6) placed on the direct light path of the laser (1) and between the focusing objective lens (3) and the detecting pinhole (8) such that a far focus of the elliptical mirror (6) is located on the pinhole (8) and a near focus of the elliptical mirror (6) is located on a specimen that is placed on the three-axis stage (5).
Description
CONFOCAL MEASUREMENT DEVICE UTILIZING ELLIPTICAL MIRROR BASED
ILLUMINATION
TECHNICAL FIELD
This invention relates to an optical microscopic measurement device, and to an ultra-precision non-contact measuring device used to measure the surface profile of a 3D fine structure in a micro industrial specimen in particular.
BACKGROUND ART
Confocal scanning measurement is one of the important technologies used in the fields of micro-optics, micro-mechanics and micro-electronics to measure the line width, depth and surface profile of micro-step and micro groove fine structures. Conventional confocal scanning measurement systems illuminated by traditional lens have been disclosed in several patent or patent applications for example, CN101526341 published on September 9, 2009, disclosed a Differential Confocal Curvature Radius Measurement Device and Method thereof), CN1392962 published on January 22, 2003 disclosed a Confocal Microscope and the method of using the same to Measure height, and CN101182992 published on May 21, 2008 disclosed a Multicolor Super-resolution Differential Confocal Measurement Device and the method thereof.
In these disclosures, the axial and lateral resolutions are closely related to the numerical aperture of the lens, and the resolutions of the system increase as their Numerical Apertures (NA) increase. However, due to the existence of diffraction limitation, it is very difficult for a confocal scanning system based on lens to make a breakthrough in improving the detective resolution by increasing Numerical Aperture only.
The confocal measurement system based on reflected illumination can be used to solve the aforementioned problem. For example, a parabolic reflection system has been proposed and well developed: a parabolic mirror can be used to meet the requirement of a high Numerical Aperture. However, it is very difficult to produce a plane wave illumination source with a large diameter to match the diameter of the mirror which is required to have a large diameter in order to reduce the
blocking ratio of illumination resulting from the specimen stage.
SUMMARY OF THE INVENTION
This invention aims at providing a confocal measurement device under illumination based on elliptical mirror, which uses a pair of conjugate focus of elliptical mirror to break through the numerical aperture limitation of a conventional detecting light and to achieve the illumination with a high numerical aperture, so that both axial and lateral resolutions can be greatly improved.
The purpose of this invention is achieved by providing a confocal measurement device utilizing elliptical mirror based illumination which comprises a laser, a beam collimating and expanding module, an objective lens with high numerical aperture, a pinhole, a three-axis stage, a collector, a detecting pinhole and a detector all of which are placed on the direct light path of the laser, the device further comprises an elliptical mirror placed on the direct light path of the laser and between the focusing objective lens and the detecting pinhole such that the far focus of the elliptical mirror is located on the pinhole and the near focus of the elliptical mirror is located on a specimen that is placed on the three-axis stage.
This invention utilizes the detecting light coming from a focal point which focuses on another focal point via the reflection of an elliptical mirror to increase the numerical aperture of a detecting light. Due to the increased numerical aperture, both axial and lateral resolutions can be greatly improved, and due to the modified optical structure, it can be easier to find an ideal light source to match the device.
To further overcome the drawback of the possible small vision field and the difficulties to manufacture an elliptical mirror with large aperture, the other purpose of this invention is to provide a confocal measurement device based on separated mirror set, the separated mirror set comprising a an elliptical mirror and compensating mirror set to enlarge the field of the view of the mirrors by correcting off-axis difference in a step by step manner and in the meantime reducing the design difficulty by the provided compensating mirror set.
The purpose of this invention is achieved as detailed below:
A confocal measurement device based on separated mirror set comprises a laser, a beam collimating and expanding module, an objective lens with high numerical aperture, a pinhole, a beam splitter, a three-axis stage all of which are placed on the direct light path of the laser, wherein the pinhole and detector are placed on the deflective light path of the beam splitter, the device further comprises a separated mirror set that is equivalent to an the elliptical mirror with high numerical aperture, the separated mirror set consisted of an elliptical mirror with high numerical aperture and two compensating mirrors placed on the direct light path of the laser, the separated mirror set is located between the beam splitter and the three-axis stage, and the elliptical mirror with high numerical aperture is located upstream the three-axis stage such that a far focus of the equivalent elliptical mirror is located on the pinhole and a near focus of the equivalent elliptical mirror is located on the specimen on the three-axis stage, wherein all the three mirrors that compose the separate mirror have a hole at their spherical vertexes.
The invention uses the detecting light which comes from a focal point and focuses on another focal point via the reflection of an elliptical mirror to break through the conventional numerical aperture limitation of detecting light, to improve both axial and lateral resolutions. In the meantime, in this device, the off-axis aberration and mechanical error can be corrected by the compensating mirror set, as a result, the field of view can be increased and the difficulties in fabrication can be alleviated.
DESCRIPTION OF DRAWINGS
FIG 1 is a schematic of the confocal measurement device utilizing elliptical mirror based illumination according to one embodiment of the invention;
FIG 2 is a schematic showing the definition of coordinate for point spread function analysis of elliptical mirror in the confocal measurement device utilizing elliptical mirror based illumination of FIG 1;
FIG 3 is a diagram showing respective lateral response curve of the confocal measurement device utilizing elliptical mirror based illumination of FIG 1;
FIG 4 is a diagram showing axial respective response curve of the confocal measurement
device utilizing elliptical mirror based illumination of FIG 1;
FIG 5 is a schematic showing the structure of a confocal measurement device based on separated mirror set according another embodiment of the invention. wherein 1 laser; 2 beam collimating and expanding module; 3 objective lens with high numerical aperture; 4 pinhole; 5 three-axis stage; 6 elliptical mirror; 7 collector; 8 detecting pinhole; 9 detector, 15 detecting pinhole; 16 beam splitter; 17 detector; 18 separated mirror set; 18-1 elliptical mirror with high numerical aperture; 18-2 compensating lens; 19 three-axis stage;
DESCRIPTION OF THE PREFERRED EMBODIMENTS
Typical implementations of this invention are illustrated in the accompanied drawing.
A first embodiment of the invention provides a confocal measurement device under illumination based on elliptical mirror, which comprises laser 1 , a beam collimating and expanding module 2, an objective lens with high numerical aperture 3, a pinhole 4, a three-axis stage 5, a collector 7, a detecting pinhole 8 and a detector 9. Elliptical mirror 6 is placed on the direct light path of laser 1 and disposed between the collector 7 and the detecting pinhole 8. The pinhole 4 is located at a far focus of elliptical mirror 6, and the specimen carried by the three-axis stage 5 is located at a near focus of elliptical mirror 6.
Measurement can be done in following steps:
Step 1 Illuminating of specimen to be measured.
As shown in FIG.1, the parallel beam comes out from laser 1, and is expanded into an ideal plane wave thorough beam collimating and expanding module 2; the ideal plane wave is then focused on pinhole 4 through focusing objective lens with high numerical aperture 3; a spherical wave is formed after the focused light passes the pinhole 4; the spherical wave is focused through elliptical mirror 6 on the specimen on three-axis stage 5 to achieve an high numerical aperture
illumination to the specimen under measurement.
As shown in FIG.2, the elliptical mirror 6 is different from a conventional lens model, and so a theoretical derivation based on optical diffraction theory is needed. The geometric expression of elliptical mirror 6 is z1 / a + y' llb2 + x2lb2 = 1 , where, a and b are the long and short axes of elliptical mirror 6 respectively, c is half of the focal length, Pi and P2 are the foci of elliptical mirror 6 and the illumination point and the measurement point of detecting system respectively. In FIG.2, physical part S of elliptical mirror 6 is represented by solid line. In the actual system, the top of S is the acquisition system, so the physical part of elliptical mirror 6 is equivalent to a ring form as part of S.
As shown in FIG.1, So represents an ellipsoid and S represents an elliptical mirror. To understand the integral function of the system, Green theorem is used to analyze the focusing characteristics of elliptical mirror 6 and to solve it with Kirchhoff diffraction formula.
Its response function is:
-dS0dxldyldzl ( 1 )
where,
O represents the origin of coordinates.
Pi represents the far focus of the elliptical mirror with coordinates (xls yls zi) where plane reflection mirror 8 is.
P2 represents the near focus of elliptical mirror with coordinates (x2, _y2, z2 ) where the specimen is placed. represents the point on elliptical mirror where light is reflected from Pi to P2
n represents the unit normal vector of the elliptical surface at point M;
fpiM represents the distance from Pjto M;
I"MP2 represents the distance from to P2,'
UP2 represents the light wave function at point P 2;
UM represents the light wave function at point M; So represents the ellipsoid where elliptical mirror 6 is; S represents elliptical mirror 6;
To derive the formula above, it is assumed that Pi,P2,M is located in a closed ellipsoid So. The boundary condition is UM =0 d UMI d n=0 in physical part S. Ω represents a 3-dimentional closed space of Pi surrounding.
To satisfy the following condition:
Qxp (-jkrnM )
UM (x, y, z) = Upl (xl , yl , zl - c)
If the approximation of rp »X and ΓΜΡ2 »λ are satisfied, then
U
Meanwhile, it is assumed that the micro fields around Pi and P2 represent point light source and focus respectively.
So,
∞(η.Γ™) = -∞(η. 2) and cos(n,rplM) = cos ZPXMP2
The distance between the two points can be expressed as:
The complex amplitude for the points to be measured can be expressed as the polar ordinates of a cylinder: x2 - r2 cos ? x = r cos
Plane Λ y1 = r( sm a Plane i¾, y2 = r2 sin ? Spacial surface S, y = r sin γ
x, + y. r - x + y
and so,
^(χ-χ2)2+(Υ-Υ2)2+[ζ-(ζ2+ϋ)]2
^r2 +r2 2 +(z-z2)2 +c2 - 2r2rcos(,/J-f )-2c(z-z2)
= /χ2 +y2 +z2 +Xj 2 + +Zj 2 + c2 -2(xXj +yyj +zz1)-2z1c-2z(z1 ~c)
= ^r2 +r( 2 +z2 +Zj 2 +c2 -2r1r(sinasinf + cos a cos f )-2z1c-2z(z1 ~c)
= ^r2 +r( 2 +(z-Zj)2 +c2 ^^rcos^-f ) + 2c(z~z1)
cos(n,rplM) = cos +— ZPlMP2
ZPlMP2
In the usual case which has been taken into consideration, hpl p2 represents the point spread function from pi to p2, and it can be as shown below through simplification:
Step 2, light collection and detection
The detecting beam reflected from the specimen focuses via second focusing mirror enters detector 9 via detecting pinhole 8.
0, y = 0, z3)
sin^ 2 sin2ψ/ 1 ν = -η η (ψ/2) , ψ = arcsin(A¾1)
h(x3y3z3 ) = hL - hpl_p2 sin θάθ■
FIG.3 and FIG.4 show the comparison of resolutions obtained through simulation using Matlab. It can be seen through the comparison that, compared to those obtained through traditional confocal measurement, the axial and lateral resolutions obtained using the system have been greatly improved.
A second embodiment which is an improvement to the aforementioned embodiment is shown in FIG 5 wherein the identical components of the second embodiment are represented using identical reference signs.
In the second embodiment, a confocal measurement device based on separated mirror setis comprised of a laser 1, a beam collimating and expanding module 2, an objective lens with high numerical aperture 3, a pinhole 4, a beam splitter 16, a three-axis stage 19; a detecting pinhole 15 and a detector 17 are placed on the reflective light path of beam splitter 16; separated mirror setl8 consisting of an elliptical mirror with high numerical aperture 18-1 and compensating lens 18-2 placed on the direct light path of laser 1, the compensating lens 18-2 is located between the beam splitter 16 and the three-axis stage 19, the elliptical mirror with high numerical aperture 18-1 is located upstream of the 3-dimentional movable object stage 19. The separated mirror set 18 can function as an elliptical mirror, its far focus is located on the pinhole 4, and its near focus is located on the specimen placed on the three-axis stage 19. The compensating lens 18-2 consists of two mirrors, holes are provided at the centers of two mirrors in the compensating lens 18-2 and at the center of the elliptical mirror with high numerical aperture 18-1.
Similarly, measurement can be done in following steps:
Step 1 , illumination of specimen to be measured:
The parallel beam comes out from the laser 1 and becomes an ideal plane wave after passing
through the beam collimating and expanding module 2. The ideal plane wave is focused on the pinhole 4 through the objective lens with high numerical aperture 3 and a spherical detective wave is formed after it is focused since the separated mirror set 18 is equivalent to an elliptical mirror, and its far focus is located on the pinhole 4 and its near focus is located on the specimen placed on the three-axis stage 19. The spherical detective wave is directed through the pinhole 4, and then focused on the specimen on the three-axis stage 19 through the separated mirror set 18 to achieve a high numerical aperture illumination.
Step 2, light collection and detection
The spherical detective beam irradiated on the specimen forms a diffused reflection, and reflects on beam splitter 5 via separated mirror set 18, and focuses on detecting pinhole 5 via beam splitter 16, and then enters detector 17 through detecting pinhole 15.
Claims
WHAT IS CLAIMED IS:
1 , A confocal measurement device utilizing elliptical mirror based illumination, comprising a laser, a beam collimating and expanding module, an objective lens with high numerical aperture, a pinhole, a three-axis stage, a collector, a detecting pinhole and a detector that are placed on the direct light path of the laser; the device further comprises an elliptical mirror placed on the direct light path of the laser and between the focusing objective lens and the detecting pinhole such that a far focus of the elliptical mirror is located on the pinhole and a near focus of the elliptical mirror is located on a specimen that is placed on the three-axis stage.
2, A confocal measurement device based on separated mirror set, comprising: a laser, a beam collimating and expanding module, an objective lens with high numerical aperture, a pinhole, a beam splitter, a three-axis stage all of which are placed on the direct light path of the laser, wherein the pinhole and detector are placed on the deflective light path of the beam splitter, the device further comprises a separated mirror set that is equivalent to an the elliptical mirror with high numerical aperture, the separated mirror set consisted of an elliptical mirror with high numerical aperture and two compensating mirrors placed on the direct light path of the laser, the separated mirror set is located between the beam splitter and the three-axis stage, and the elliptical mirror with high numerical aperture is located upstream the three-axis stage such that a far focus of the equivalent elliptical mirror is located on the pinhole and a near focus of the equivalent elliptical mirror is located on the specimen on the three-axis stage, wherein all the three mirrors that compose the separate mirror have a hole at their spherical vertexes.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB1422447.1A GB2517866B (en) | 2012-07-05 | 2013-07-04 | Confocal measurement device utilizing elliptical mirror based illumination |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201210244367.9 | 2012-07-05 | ||
| CN201210244377.2 | 2012-07-05 | ||
| CN201210244377.2A CN102818521B (en) | 2012-07-05 | 2012-07-05 | Based on ellipsoid indirect illumination confocal measuring apparatus |
| CN201210244367.9A CN102768024B (en) | 2012-07-05 | 2012-07-05 | Confocal measuring device based on separable reflector set |
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| WO2014005531A1 true WO2014005531A1 (en) | 2014-01-09 |
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Cited By (1)
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| CN106814446A (en) * | 2017-01-17 | 2017-06-09 | 哈尔滨工业大学 | Cellular type moving sweep device is determined in revolution |
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- 2013-07-04 GB GB1422447.1A patent/GB2517866B/en not_active Expired - Fee Related
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| GB2517866B (en) | 2018-05-23 |
| GB2517866A (en) | 2015-03-04 |
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