WO2013191481A3 - 주석-은 합금 도금액의 제조방법 - Google Patents

주석-은 합금 도금액의 제조방법 Download PDF

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Publication number
WO2013191481A3
WO2013191481A3 PCT/KR2013/005431 KR2013005431W WO2013191481A3 WO 2013191481 A3 WO2013191481 A3 WO 2013191481A3 KR 2013005431 W KR2013005431 W KR 2013005431W WO 2013191481 A3 WO2013191481 A3 WO 2013191481A3
Authority
WO
WIPO (PCT)
Prior art keywords
sulfonic acid
methane sulfonic
silver
tin
plating solution
Prior art date
Application number
PCT/KR2013/005431
Other languages
English (en)
French (fr)
Other versions
WO2013191481A2 (ko
Inventor
김동현
방태조
오정훈
손진호
육영란
이형근
Original Assignee
주식회사 에스앤에스켐
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 에스앤에스켐 filed Critical 주식회사 에스앤에스켐
Publication of WO2013191481A2 publication Critical patent/WO2013191481A2/ko
Publication of WO2013191481A3 publication Critical patent/WO2013191481A3/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/60—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/64—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of silver

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

본 발명은 메탄술폰산 주석, 메탄술폰산 은, 메탄술폰산, 비이온 계면활성제 및 첨가제로 구성된 주석-은 합금 도금액의 제조방법에 관련되며, 그 구성의 특징으로서 상기 메탄술폰산과 비이온 계면활성제 내에 존재하는 유리된 양이온 금속 불순물을 제거하는 제1단계; 상기 불순물이 제거된 메탄술폰산에 각각 주석과 은을 전해법으로 용해하여 메탄술폰산 주석과 메탄술폰산 은을 각각 생성하는 제2단계; 상기 메탄술폰산, 메탄술폰산 주석, 메탄술폰산 은, 비이온 계면활성제 및 첨가제를 투입하여 혼합액을 생성하는 제3단계; 및 상기 혼합액을 여과하는 제4단계;를 포함하는 것을 특징으로 한다. 이에 따라, 본 발명은 도금액 제조에 들어가는 각 원재료들의 양이온 금속 불순물을 제거함과 함께 정제된 원료들로 도금액을 제조함으로 고속 도금에서도 도금 피막이 균일하고, 은 석출함량이 일정한 도금액을 제조하는 효과가 있다.
PCT/KR2013/005431 2012-06-22 2013-06-20 주석-은 합금 도금액의 제조방법 WO2013191481A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020120067141A KR101342408B1 (ko) 2012-06-22 2012-06-22 주석-은 합금 도금액의 제조방법
KR10-2012-0067141 2012-06-22

Publications (2)

Publication Number Publication Date
WO2013191481A2 WO2013191481A2 (ko) 2013-12-27
WO2013191481A3 true WO2013191481A3 (ko) 2014-02-13

Family

ID=49769636

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2013/005431 WO2013191481A2 (ko) 2012-06-22 2013-06-20 주석-은 합금 도금액의 제조방법

Country Status (2)

Country Link
KR (1) KR101342408B1 (ko)
WO (1) WO2013191481A2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103952718A (zh) * 2014-05-22 2014-07-30 云南锡业股份有限公司 一种甲基磺酸亚锡稳定溶液制备方法
CN106757213A (zh) * 2016-11-15 2017-05-31 惠州市力道电子材料有限公司 一种无氰镀银锡合金的电镀液及其电镀方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030025857A (ko) * 2001-09-20 2003-03-29 가부시끼가이샤 다이와 가세이 겐뀨쇼 주석 또는 주석계열합금도금욕, 이 도금욕의 건욕용 또는유지 보급용의 주석염 및 산 또는 착화제용액 및 이도금욕을 사용해서 제작한 전기 전자 부품
KR20050092132A (ko) * 2003-01-24 2005-09-20 이시하라 야쿠힌 가부시끼가이샤 주석 함유 도금욕
KR20110118821A (ko) * 2009-02-20 2011-11-01 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030025857A (ko) * 2001-09-20 2003-03-29 가부시끼가이샤 다이와 가세이 겐뀨쇼 주석 또는 주석계열합금도금욕, 이 도금욕의 건욕용 또는유지 보급용의 주석염 및 산 또는 착화제용액 및 이도금욕을 사용해서 제작한 전기 전자 부품
KR20050092132A (ko) * 2003-01-24 2005-09-20 이시하라 야쿠힌 가부시끼가이샤 주석 함유 도금욕
KR20110118821A (ko) * 2009-02-20 2011-11-01 산아프로 가부시키가이샤 술포늄염, 광산 발생제 및 감광성 수지 조성물

Also Published As

Publication number Publication date
KR101342408B1 (ko) 2013-12-17
WO2013191481A2 (ko) 2013-12-27

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