WO2013109023A1 - Method for optical bonding and hardening - Google Patents

Method for optical bonding and hardening Download PDF

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Publication number
WO2013109023A1
WO2013109023A1 PCT/KR2013/000272 KR2013000272W WO2013109023A1 WO 2013109023 A1 WO2013109023 A1 WO 2013109023A1 KR 2013000272 W KR2013000272 W KR 2013000272W WO 2013109023 A1 WO2013109023 A1 WO 2013109023A1
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Prior art keywords
substrate
light source
curing
wavelength
hardening
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PCT/KR2013/000272
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French (fr)
Korean (ko)
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유승명
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주식회사 디엠케이
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Publication of WO2013109023A1 publication Critical patent/WO2013109023A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00Materials and properties
    • G02F2202/28Adhesive materials or arrangements

Definitions

  • the present invention relates to a light-bonding curing method, and more particularly, to reduce the heat generated during the curing of the heat-sensitive bonding substrate by the second curing step to overcome the disadvantages of bending the substrate, the existing long multi-wavelength curing
  • the present invention relates to a light bonding curing method having an effect of shortening time and improving productivity of a substrate.
  • LCDs liquid crystal display devices
  • PDPs plasma display panels
  • ELDs electro luminescent displays
  • VFDs vacuum fluorescence
  • liquid crystal display is the most widely used, replacing the CRT (Cathode Ray Tube) for mobile image display devices due to the advantages of excellent image quality, light weight, thinness, and low power consumption.
  • CTR Cathode Ray Tube
  • various developments have been made such as a television and a computer monitor for receiving and displaying broadcast signals.
  • liquid crystal display device As described above, although various technical advances have been made in the liquid crystal display device to serve as a screen display device in various fields, there are many aspects in which the operation of improving the image quality as the screen display device is arranged with the above characteristics and advantages. .
  • the key to power generation is how to realize high quality images such as high brightness and large area while maintaining the characteristics of light weight, thinness, and low power consumption.
  • a liquid crystal injection method of injecting a liquid crystal through an injection hole of a sealing material after a pattern drawing of a sealing material so as to form an injection hole on one substrate, and then bonding the substrate in vacuum, and a liquid crystal are suitable.
  • the other substrate prepared by the pattern which cut off the sealing material was prepared so that one board
  • the present invention overcomes the disadvantages of the bending of the substrate by reducing the heat generated during curing of the weakly bonded substrate, and improves the productivity of the substrate by shortening the existing long multi-wavelength curing time.
  • An object of the present invention is to provide a light bonding curing method.
  • the present invention is a surface of the bonded substrate after the first curing step and the first curing step of curing by irradiating with a UV light source of a single wavelength on the surface of the bonded substrate bonded to the lower substrate and the upper substrate It provides a light bonding curing method comprising a second curing step of curing by irradiating with a UV light source of a multi-wavelength.
  • the heat generated during curing of the weakly bonded substrate through the single wavelength and the multi-wavelength curing is reduced to overcome the disadvantages of the warpage of the substrate, and the existing long multi-wavelength curing time is shortened. This has the effect of improving productivity.
  • Figure 1 schematically shows a UV light source device of a single wavelength used in the first curing step.
  • Figure 2 schematically shows a multi-wavelength UV light source device used in the second curing step .
  • FIG. 3 schematically shows a UV light source of multiple wavelengths used in the second curing step .
  • the present invention is a UV light source device having a multi-wavelength on the surface of the bonded substrate after the first curing step and the first curing step of curing the irradiation by irradiating with a UV light source device of a single wavelength on the surface of the bonded substrate bonded to the lower substrate and the upper substrate It relates to a light bonding curing method comprising a second curing step of curing by irradiation with.
  • Figure 2 below schematically shows a second curing step of curing using a multi-wavelength UV light source device.
  • the coupling member 2 is disposed on the lower end of the housing portion 1 can move to the left or right.
  • the coupling member 2 is not particularly limited.
  • the upper portion of the coupling member 2 may be configured in a wheel shape or the like so that the coupling member 2 may move.
  • the electrical connection configuration is not particularly limited.
  • the temperature is increased by the heat generation of the UV light source.
  • an additional circulation cooling tube (not shown) may be further disposed in order to prevent excessive temperature rise.
  • a rotating blowing fan may be further arranged.
  • the present invention effectively prevents an increase in the device internal temperature and the curing temperature due to the multi-wavelength UV light source device.
  • the first curing step was performed by irradiating UV with a UV light source (LED UV) having a single wavelength (365 nm).
  • LED UV UV light source
  • the temperature of the three parts of the substrate was measured at a 30 second interval using a non-contact infrared temperature meter as shown in FIG. 4 (and FIG. 5) below, and the results are shown in Table 1 below.
  • the second curing step was performed by irradiating UV on the (three) substrates subjected to the first curing step using a multi-wavelength UV light source (mercury UV lamp) having a wavelength of 320 to 420 nm.
  • a multi-wavelength UV light source curcury UV lamp
  • the temperature of the three parts of the substrate was measured at 30 second intervals using a non-contact infrared temperature meter, and the results are shown in Table 2 below.
  • Example 2 In the same manner as in Example 1, without performing the first curing step with a UV light source having a single wavelength, two curing steps were performed with a multi-wavelength UV light source, as described above, the non-contact temperature of the three parts of the substrate The measurement was performed using an infrared thermometer and the results are shown in Tables 3 to 4 below.
  • Example 1 (unit: °C)
  • Example 2 (unit: °C)
  • Example 3 (unit: °C) One 2 3 One 2 3 One 2 3 0 30 32 30 29 32 29 31 32 31 30 22 25 22 24 26 24 25 27 24 60 22 23 22 22 24 21 24 25 24 90 20 22 20 22 23 21 22 24 22 120 20 21 20 21 22 20 21 22 20 150 20 21 20 21 20 21 20 21 20 180 20 20 20 21 21 20 21 20 21 20
  • Example 1 (unit: °C)
  • Example 2 (unit: °C)
  • Example 3 (unit: °C) One 2 3 One 2 3 One 2 3 0 33 34 34 34 33 34 35 34 35 30 28 26 28 29 27 27 29 27 27 60 27 24 26 26 25 26 26 25 25 90 26 24 26 25 24 24 24 24 24 120 24 23 24 24 23 23 23 23 23 150 23 23 23 22 22 23 22 22 180 23 22 22 22 22 22 22 22 22 210 22 23 22 22 22 22 22 22 22 22 22 240 22 22 21 22 21 22 21 21 270 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21 21
  • the sample temperature measured immediately after taking out from the curing device is 50 ⁇ 60 °C and the temperature goes down to 20 ⁇ 30 °C. It took a long time
  • the sample temperature measured immediately after removal from the curing device with a single wavelength was 29 to 32 °C (Table 1), and the sample temperature measured immediately after taking out from the curing device was 33 ⁇ 35 °C (Table 2), the time was lowered to 21 °C was 270 seconds, it took a short time compared to Comparative Examples 1 to 3 .
  • the internal temperature can be lowered by eliminating the factor of heat rise due to overheating by changing the irradiation area.

Abstract

The present invention relates to a method for optical bonding and hardening, and more specifically, to a method for optical bonding and hardening comprising: a first hardening step of irradiating with a single wavelength UV light source device a surface of a coupled substrate comprising a lower substrate and an upper substrate that are coupled, and hardening same; and a second hardening step of irradiating with a multi-wavelength UV light source device the surface of the coupled substrate that has undergone the first hardening step, and hardening same, thereby using the two hardening steps to overcome the shortcoming of bending in the substrate by reducing heat that is generated when hardening the coupled substrate, which is vulnerable to heat, and to enhance productivity of the substrate by reducing the long time required for multi-wavelength hardening in existing methods.

Description

광 합착 경화 방법Light bonding curing method
본 발명은 광 합착 경화 방법에 관한 것으로, 보다 상세하게는 2차에 걸친 경화단계에 의해 열에 약한 합착 기판의 경화 시 발생하는 열을 감소시켜 기판이 휘는 단점을 극복하고, 기존의 긴 다중 파장 경화 시간을 단축시켜 기판의 생산성이 향상되는 효과가 있는 광 합착 경화 방법에 관한 것이다.The present invention relates to a light-bonding curing method, and more particularly, to reduce the heat generated during the curing of the heat-sensitive bonding substrate by the second curing step to overcome the disadvantages of bending the substrate, the existing long multi-wavelength curing The present invention relates to a light bonding curing method having an effect of shortening time and improving productivity of a substrate.
정보화 사회가 발전함에 따라 표시 장치에 대한 요구도 다양한 형태로 점증하고 있으며, 이에 부응하여 근래에는 LCD(Liquid Crystal Display Device), PDP(Plasma Display Panel), ELD(Electro Luminescent Display), VFD(Vacuum Fluorescent Display) 등 여러 가지 평판 표시 장치가 연구되어 왔고 일부는 이미 여러 장비에서 표시 장치로 활용되고 있다.As the information society develops, the demand for display devices is increasing in various forms, and in recent years, liquid crystal display devices (LCDs), plasma display panels (PDPs), electro luminescent displays (ELDs), and vacuum fluorescence (VFDs) have been developed. Various flat panel display devices such as displays have been studied, and some of them are already used as display devices in various devices.
그 중에, 현재 화질이 우수하고 경량, 박형, 저소비 전력의 특징에 따른 장점으로 인하여 이동형 화상 표시 장치의 용도로 CRT(Cathode Ray Tube)을 대체하면서 액정표시소자(LCD)가 가장 많이 사용되고 있으며, 노트북 컴퓨터의 모니터와 같은 이동형의 용도 이외에도 방송신호를 수신하여 디스플레이하는 텔레비전 및 컴퓨터의 모니터 등으로 다양하게 개발되고 있다.Among them, liquid crystal display (LCD) is the most widely used, replacing the CRT (Cathode Ray Tube) for mobile image display devices due to the advantages of excellent image quality, light weight, thinness, and low power consumption. In addition to the mobile use such as a computer monitor, various developments have been made such as a television and a computer monitor for receiving and displaying broadcast signals.
이와 같이 액정표시소자는 여러 분야에서 화면 표시 장치로서의 역할을 하기 위해 여러 가지 기술적인 발전이 이루어졌음에도 불구하고 화면 표시 장치로서 화상의 품질을 높이는 작업은 상기 특징 및 장점과 배치되는 면이 많이 있다.As described above, although various technical advances have been made in the liquid crystal display device to serve as a screen display device in various fields, there are many aspects in which the operation of improving the image quality as the screen display device is arranged with the above characteristics and advantages. .
따라서, 액정표시소자가 일반적인 화면 표시 장치로서 다양한 부분에 사용되기 위해서는 경량, 박형, 저 소비전력의 특징을 유지하면서도 고휘도, 대면적 등 고품위 화상을 얼마나 구현할 수 있는가가 발전의 관건이라 할 수 있다.Therefore, in order to use a liquid crystal display device in various parts as a general screen display device, the key to power generation is how to realize high quality images such as high brightness and large area while maintaining the characteristics of light weight, thinness, and low power consumption.
상기와 같은 액정표시소자의 제조 방법으로는 한쪽의 기판상에 주입구가 형성되도록 시일재를 패턴 묘화하여 진공 중에서 기판을 접합한 후에 시일재의 주입구를 통해 액정을 주입하는 액정 주입 방식과, 액정을 적합한 어느 하나의 기판과 주입구를 설치하지 않도록 시일재를 차단한 패턴으로 묘화한 다른 하나의 기판을 준비하고, 그 후 상기 다른 하나의 기판을 상기 어느 하나의 기판상에 배치하여 진공 중에서 상하의 기판을 근접시켜 접합하는 액정 적합 방식 등이 있으며, 상기와 같은 합착 방식을 통하여 기판의 합착이 완료되면 경화과정을 거친다. As a method for manufacturing a liquid crystal display device as described above, a liquid crystal injection method of injecting a liquid crystal through an injection hole of a sealing material after a pattern drawing of a sealing material so as to form an injection hole on one substrate, and then bonding the substrate in vacuum, and a liquid crystal are suitable. The other substrate prepared by the pattern which cut off the sealing material was prepared so that one board | substrate and an injection hole may not be provided, Then, the said other board | substrate is arrange | positioned on the said one board | substrate, and the upper and lower board | substrate are closely approached in vacuum. There is a liquid crystal compatibility method to be bonded to each other, and when the bonding of the substrate is completed through the bonding method as described above is subjected to a curing process.
그러나, 상기의 경화과정 시 발생하는 열에 의하여 합판에 휨 현상이 발생하고 경화열로 인하여 제품이 변형되는 문제점이 있다.However, there is a problem that warpage occurs in the plywood due to the heat generated during the curing process and the product is deformed due to the heat of curing.
상기와 같은 종래기술의 문제점을 해결하고자, 본 발명은 열에 약한 합착 기판의 경화 시 발생하는 열을 감소시킴으로써 기판이 휘는 단점을 극복하고, 기존의 긴 다중 파장 경화 시간을 단축시켜 기판의 생산성이 향상되는 광 합착 경화 방법을 제공하는 것을 목적으로 한다.In order to solve the problems of the prior art as described above, the present invention overcomes the disadvantages of the bending of the substrate by reducing the heat generated during curing of the weakly bonded substrate, and improves the productivity of the substrate by shortening the existing long multi-wavelength curing time. An object of the present invention is to provide a light bonding curing method.
본 발명의 상기 목적 및 기타 목적들은 하기 설명된 본 발명에 의하여 모두 달성될 수 있다.The above and other objects of the present invention can be achieved by the present invention described below.
상기의 목적을 달성하기 위하여, 본 발명은 하부 기판과 상부 기판을 합착한 합착 기판의 표면에 단일 파장의 UV 광원으로 조사하여 경화하는 제1 경화단계 및 상기 제1 경화단계를 거친 합착 기판의 표면에 다중 파장의 UV 광원으로 조사하여 경화하는 제2 경화단계를 포함하는 광 합착 경화 방법을 제공한다.In order to achieve the above object, the present invention is a surface of the bonded substrate after the first curing step and the first curing step of curing by irradiating with a UV light source of a single wavelength on the surface of the bonded substrate bonded to the lower substrate and the upper substrate It provides a light bonding curing method comprising a second curing step of curing by irradiating with a UV light source of a multi-wavelength.
상기에서 살펴본 바와 같이, 본 발명에 따르면 단일 파장과 다중 파장 경화를 통해 열에 약한 합착 기판의 경화 시 발생하는 열을 감소시켜 기판이 휘는 단점을 극복하고, 기존의 긴 다중 파장 경화 시간을 단축하여 기판의 생산성이 향상되는 효과가 있다.As described above, according to the present invention, the heat generated during curing of the weakly bonded substrate through the single wavelength and the multi-wavelength curing is reduced to overcome the disadvantages of the warpage of the substrate, and the existing long multi-wavelength curing time is shortened. This has the effect of improving productivity.
도 1은 제1 경화단계에서 사용하는 단일 파장의 UV 광원 장치를 개략적으로 나타낸 것이다.Figure 1 schematically shows a UV light source device of a single wavelength used in the first curing step.
도 2는 제2 경화단계에서 사용하는 다중 파장의 UV 광원 장치를 개략적으로 나타낸 것이다. Figure 2 schematically shows a multi-wavelength UV light source device used in the second curing step .
도 3은 제2 경화단계에서 사용하는 다중 파장의 UV 광원을 개략적으로 나타낸 것이다. 3 schematically shows a UV light source of multiple wavelengths used in the second curing step .
도 4 및 5는 아래 실시예와 비교예의 결과를 측정하기 위한 기판의 일부를 나타낸 것이다.4 and 5 show a part of the substrate for measuring the results of the following Examples and Comparative Examples.
이하, 본 발명의 바람직한 실시예들을 첨부된 도면 등을 참고하여 더욱 상세히 설명한다. 본 발명의 실시예들은 여러 가지 형태로 변형될 수 있으며, 본 발명의 범위가 아래에서 설명하는 실시예들에 한정되는 것으로 해석되어서는 안 된다. 본 실시예들은 당해 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에게 본 발명을 더욱 상세하게 설명하기 위해서 제공되는 것이다. Hereinafter, preferred embodiments of the present invention will be described in more detail with reference to the accompanying drawings. Embodiments of the invention may be modified in various forms, the scope of the invention should not be construed as limited to the embodiments described below. These embodiments are provided to explain in detail the present invention to those skilled in the art.
본 발명은 하부 기판과 상부 기판을 합착한 합착 기판의 표면에 단일 파장의 UV 광원 장치로 조사하여 경화하는 제1 경화단계 및 상기 제1 경화단계를 거친 합착 기판의 표면에 다중 파장의 UV 광원 장치로 조사하여 경화하는 제2 경화단계를 포함하는 광 합착 경화 방법에 관한 것이다.The present invention is a UV light source device having a multi-wavelength on the surface of the bonded substrate after the first curing step and the first curing step of curing the irradiation by irradiating with a UV light source device of a single wavelength on the surface of the bonded substrate bonded to the lower substrate and the upper substrate It relates to a light bonding curing method comprising a second curing step of curing by irradiation with.
본 발명의 하부 기판과 상부 기판은 액정 패널과 커버 글라스일 수 있으나, 반드시 이에 한정되는 것은 아니며, 당 분야에서 사용하는 통상의 것을 채택할 수 있다.The lower substrate and the upper substrate of the present invention may be a liquid crystal panel and a cover glass, but are not necessarily limited thereto, and may employ a conventional one used in the art.
상기 하부 기판과 상부 기판의 합착을 위한 점착액 도포 시나 하부 기판과 상부 기판의 합착 시 지그와 베젤 등을 통상적으로 사용한다. 상기 지그의 형태 또는 재질 등은 특별히 한정되지 않는다.A jig and a bezel are generally used when the adhesive liquid is applied for bonding the lower substrate and the upper substrate, or when the lower substrate and the upper substrate are bonded. The form or material of the jig is not particularly limited.
본 발명의 제1 경화단계는 상기의 하부 기판과 상부 기판에 점착액 등을 도포하여 합착된 기판의 표면을 단일 파장의 UV 광원 장치로 경화하는 것이다. 즉, 합착 기판 표면을 UV 광원을 사용하여 초벌 경화하는 단계를 말하는 것이다.The first curing step of the present invention is to apply a pressure-sensitive adhesive and the like on the lower substrate and the upper substrate to cure the surface of the bonded substrate with a single wavelength UV light source device. That is, it refers to the step of first curing the bonded substrate surface using a UV light source.
상기 제1 경화단계에서, UV 광원 파장의 크기는 320 ~ 420 nm 범위 중 하나의 파장을 선택할 수 있고, 광량은 점착제의 경화 조건에 따라 달라지고, 경화 시간은 기판의 UV 투과율에 따라 변경될 수 있으며, 이 범위 내에서는 합착 기판에 경화 시 UV 광원으로부터 과다하게 발생하는 열을 억제하는 효과가 있다. 상기 제1 경화단계의 경화 시간은 각 기판의 재질 등에 따라 다르기 때문에 특별히 한정되지 않는다.In the first curing step, the size of the UV light source wavelength can be selected from one of the wavelength range of 320 ~ 420 nm, the amount of light depends on the curing conditions of the pressure-sensitive adhesive, the curing time can be changed according to the UV transmittance of the substrate Within this range, there is an effect of suppressing heat generated excessively from the UV light source when curing to the bonded substrate. The curing time of the first curing step is not particularly limited because it depends on the material of each substrate.
상기 제1 경화단계에서 사용하는 단일 파장의 UV 광원의 형태 등은 당 분야에서 통상적으로 사용하는 것을 채택할 수 있으며, 특별히 한정되지 않는다. 구체적인 일례를 아래 도 1에 도시하였다.The form of the UV light source of a single wavelength used in the first curing step, etc. may be used that is commonly used in the art, it is not particularly limited. A specific example is shown in FIG. 1 below.
상기 단일 파장 UV 광원 장치의 UV 램프는 LED 또는 레이저(Laser) 등을 사용할 수 있다.As the UV lamp of the single wavelength UV light source device, an LED or a laser may be used.
본 발명의 제2 경화단계는 상기 제1 경화단계를 거친 합착된 기판을 다중 파장의 UV 광원 장치로 경화하는 것이다. 즉, 초벌 경화한 합착 기판 표면을 UV 광원을 사용하여 본 경화하는 단계를 말하는 것이다. 상기 제2 경화단계에서 사용하는 UV 광원 파장의 크기는 320 ~ 420 nm일 수 있으며, 이 범위 내에서는 합착 기판 경화 시 UV 광원으로부터 과다하게 발생하는 열을 억제하는 효과가 있다.The second curing step of the present invention is to cure the bonded substrates subjected to the first curing step with a multi-wavelength UV light source device. That is, this refers to the step of main hardening the surface of the first cured bonded substrate using a UV light source. The size of the UV light source wavelength used in the second curing step may be 320 ~ 420 nm, within this range there is an effect of suppressing excessive heat generated from the UV light source when curing the bonded substrate.
아래 도 2는 다중 파장 UV 광원 장치를 이용하여 경화하는 제2 경화단계를 개략적으로 나타낸 것이다.Figure 2 below schematically shows a second curing step of curing using a multi-wavelength UV light source device.
상기 제2 경화단계에서 사용하는 다중 파장 UV 광원 장치는 아래 도 3에 도시한 바와 같이 하우징부(1), 결합부재(2) 및 램프(10) 등을 포함하여 구성될 수 있다. The multi-wavelength UV light source device used in the second curing step may be configured to include a housing 1, the coupling member 2 and the lamp 10, as shown in Figure 3 below.
상기 다중 파장 UV 광원 장치는 하우징부(1)와 상기 하우징부(1)의 하부에 램프(10)가 배치될 수 있으며, 상기 하우징부(1)는 상기 램프(10)를 견고하게 지지하는 역할을 한다. 이때 하우징부(1)는 당 분야에서 사용하는 것으로 본 발명의 효과를 저해하는 것이 아니라면 어떠한 형태나 재질 등을 사용해도 무방하며, 특별히 한정되지 않는다. 상기 램프(10)는 당 분야에서 사용하는 통상적인 것으로, 구체적으로 고압수은 UV 램프, 메탈 할라이드 UV 램프 및 메탈 UV 램프 등 중에서 선택하여 사용할 수 있다.In the multi-wavelength UV light source device, a lamp 10 may be disposed under the housing part 1 and the housing part 1, and the housing part 1 serves to firmly support the lamp 10. Do it. In this case, the housing 1 is used in the art, and may be used in any form, material, and the like as long as it does not impair the effects of the present invention, and is not particularly limited. The lamp 10 is a conventional one used in the art, and specifically, may be selected and used from a high pressure mercury UV lamp, a metal halide UV lamp, a metal UV lamp, and the like.
상기 램프(10)와 하우징부(1) 사이는 결합부재(2)로 연결되며, 상기 결합부재(2)가 하우징부(1) 하단부에 배치되어 좌측 또는 우측으로 이동 운동할 수 있다.Between the lamp 10 and the housing portion 1 is connected to the coupling member 2, the coupling member 2 is disposed on the lower end of the housing portion 1 can move to the left or right.
상기 결합부재(2)의 재질, 형태 등의 특성은 특별히 한정되지 않는다. 상기 결합부재(2)를 하우징부(1)에 연결 시 결합부재(2)가 이동 운동할 수 있게 결합부재(2)의 상부는 바퀴형상 등으로 구성할 수 있으나, 이동 운동할 수 있는 형상 및 전기적인 연결 구성 등은 특별히 한정되지 않는다.Properties such as the material, shape, etc. of the coupling member 2 is not particularly limited. When the coupling member 2 is connected to the housing part 1, the upper portion of the coupling member 2 may be configured in a wheel shape or the like so that the coupling member 2 may move. The electrical connection configuration is not particularly limited.
본 발명의 합착 기판은 상부 기판과 하부 기판 사이에 점착액을 도포하여 합착한 것으로, UV 경화형 점착액 등을 사용할 수 있으나, 반드시 이에 한정되는 것은 아니다.The bonded substrate of the present invention is formed by applying an adhesive liquid between the upper substrate and the lower substrate, and bonding the UV-curable adhesive liquid, but is not necessarily limited thereto.
상기 다중 파장 UV 광원 장치는 UV 램프 등과 같은 UV 광원이 상부에 1개 이상 장착되고, 광원 조사 장치의 하부에 합착 기판이 로딩되어 안착되는 합착 기판 지지부(픽스쳐)가 배치되며, 상기 합착 기판이 로딩되도록 합착 기판 지지부(픽스쳐)를 상하로 구동시키는 구동 유닛 등을 포함하여 구성될 수 있다.In the multi-wavelength UV light source device, at least one UV light source, such as a UV lamp, is mounted on an upper portion thereof, and a bonded substrate support (fixture) on which a bonded substrate is loaded and seated is disposed at a lower portion of the light source irradiation device, and the bonded substrate is loaded. It may be configured to include a drive unit for driving the bonded substrate support (fixture) up and down as possible.
또한, 상기 다중 파장 UV 광원 장치에는 UV 광원의 발열에 의해 온도가 상승하게 되는데, 이때 지나친 온도 상승을 방지하기 위하여 추가적으로 순환냉각관(미도시)을 더 배치할 수 있으며, 상기 순환냉각관에는 광원 조사 장치 내의 공기를 제어하기 위해 회전하는 송풍팬을 추가적으로 더 배치할 수 있다.In addition, in the multi-wavelength UV light source device, the temperature is increased by the heat generation of the UV light source. In this case, an additional circulation cooling tube (not shown) may be further disposed in order to prevent excessive temperature rise. In order to control the air in the irradiation apparatus, a rotating blowing fan may be further arranged.
본 발명은 상기 다중 파장 UV 광원 장치로 인하여 장치 내부 온도와 경화 온도의 상승을 효과적으로 방지한다. The present invention effectively prevents an increase in the device internal temperature and the curing temperature due to the multi-wavelength UV light source device.
이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범주 및 기술사상 범위 내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속하는 것도 당연한 것이다.Hereinafter, preferred examples are provided to help understanding of the present invention, but the following examples are only exemplified by the present invention, and various changes and modifications within the scope and spirit of the present invention are apparent to those skilled in the art. It is natural that such variations and modifications fall within the scope of the appended claims.
실시예 1 ~ 3Examples 1 to 3
단일 파장(365nm)을 지닌 UV 광원(LED UV)으로 UV를 조사하여 제1 경화단계를 수행하였다. 제1 경화단계 후 아래 도 4(및 도 5)와 같이 기판의 3 부분의 온도를 비 접촉식 적외선 온도 측정기를 이용하여 30초 간격으로 측정하였으며 그 결과를 아래 표 1에 나타내었다.The first curing step was performed by irradiating UV with a UV light source (LED UV) having a single wavelength (365 nm). After the first curing step, the temperature of the three parts of the substrate was measured at a 30 second interval using a non-contact infrared temperature meter as shown in FIG. 4 (and FIG. 5) below, and the results are shown in Table 1 below.
제1 경화단계를 거친 (3개의) 기판을 각각 파장이 320 ~ 420 nm인 다중 파장 UV 광원(수은 UV 램프)을 이용하여 UV를 조사하여 제2 경화단계를 수행하였다. 제2 경화단계 후 상기와 같이 기판의 3 부분의 온도를 비 접촉식 적외선 온도 측정기를 이용하여 30초 간격으로 측정하였으며 그 결과를 아래 표 2에 나타내었다.The second curing step was performed by irradiating UV on the (three) substrates subjected to the first curing step using a multi-wavelength UV light source (mercury UV lamp) having a wavelength of 320 to 420 nm. After the second curing step, as described above, the temperature of the three parts of the substrate was measured at 30 second intervals using a non-contact infrared temperature meter, and the results are shown in Table 2 below.
비교예 1 ~ 3Comparative Examples 1 to 3
실시예 1과 동일하게 실시하되, 단일 파장을 지닌 UV 광원으로 제1 경화단계를 수행하지 않고, 다중 파장 UV 광원으로 2차례 경화단계를 수행하였으며, 상기와 같이 기판의 3 부분의 온도를 비 접촉식 적외선 온도 측정기를 이용하여 측정하였으며 그 결과를 아래 표 3 ~ 4에 나타내었다.In the same manner as in Example 1, without performing the first curing step with a UV light source having a single wavelength, two curing steps were performed with a multi-wavelength UV light source, as described above, the non-contact temperature of the three parts of the substrate The measurement was performed using an infrared thermometer and the results are shown in Tables 3 to 4 below.
표 1
TIME(sec) 실시예 1(단위: ℃) 실시예 2(단위: ℃) 실시예 3(단위: ℃)
1 2 3 1 2 3 1 2 3
0 30 32 30 29 32 29 31 32 31
30 22 25 22 24 26 24 25 27 24
60 22 23 22 22 24 21 24 25 24
90 20 22 20 22 23 21 22 24 22
120 20 21 20 21 22 20 21 22 20
150 20 21 20 20 21 20 20 21 20
180 20 20 20 20 21 21 20 21 20
Table 1
TIME (sec) Example 1 (unit: ℃) Example 2 (unit: ℃) Example 3 (unit: ℃)
One 2 3 One 2 3 One 2 3
0 30 32 30 29 32 29 31 32 31
30 22 25 22 24 26 24 25 27 24
60 22 23 22 22 24 21 24 25 24
90 20 22 20 22 23 21 22 24 22
120 20 21 20 21 22 20 21 22 20
150 20 21 20 20 21 20 20 21 20
180 20 20 20 20 21 21 20 21 20
표 2
TIME(sec) 실시예 1(단위: ℃) 실시예 2(단위: ℃) 실시예 3(단위: ℃)
1 2 3 1 2 3 1 2 3
0 33 34 34 34 33 34 35 34 35
30 28 26 28 29 27 27 29 27 27
60 27 24 26 26 25 26 26 25 25
90 26 24 26 25 24 24 24 24 24
120 24 23 24 24 23 23 23 23 23
150 23 23 23 23 22 22 23 22 22
180 23 22 22 22 22 22 22 22 22
210 22 23 22 22 22 22 22 22 22
240 22 22 21 22 22 21 22 21 21
270 21 21 21 21 21 21 21 21 21
TABLE 2
TIME (sec) Example 1 (unit: ℃) Example 2 (unit: ℃) Example 3 (unit: ℃)
One 2 3 One 2 3 One 2 3
0 33 34 34 34 33 34 35 34 35
30 28 26 28 29 27 27 29 27 27
60 27 24 26 26 25 26 26 25 25
90 26 24 26 25 24 24 24 24 24
120 24 23 24 24 23 23 23 23 23
150 23 23 23 23 22 22 23 22 22
180 23 22 22 22 22 22 22 22 22
210 22 23 22 22 22 22 22 22 22
240 22 22 21 22 22 21 22 21 21
270 21 21 21 21 21 21 21 21 21
표 3
TIME(sec) 비교예 1(단위: ℃) 비교예 2(단위: ℃) 비교예 3(단위: ℃)
1 2 3 1 2 3 1 2 3
0 57 59 59 58 59 58 57 62 60
30 46 49 51 47 49 51 51 55 56
60 41 45 48 43 44 49 47 51 52
90 38 42 45 40 41 46 44 48 50
120 35 39 43 38 39 44 41 46 48
150 33 37 40 37 37 42 38 43 45
180 31 34 39 35 36 40 36 41 43
210 30 33 37 34 35 38 35 40 41
240 29 32 36 33 34 37 35 38 39
270 28 31 34 32 34 36 34 36 36
300 28 30 33 31 33 35 32 34 35
330 27 29 32 30 31 34 31 31 34
360 27 29 31 29 30 33 31 30 33
390 26 27 30 28 29 32 30 29 31
420 26 27 30 28 29 31 29 29 30
450 26 27 29 27 27 30 28 28 29
480 26 27 29 26 26 28 27 28 27
TABLE 3
TIME (sec) Comparative Example 1 (Unit: ℃) Comparative Example 2 (unit: ℃) Comparative Example 3 (Unit: ° C)
One 2 3 One 2 3 One 2 3
0 57 59 59 58 59 58 57 62 60
30 46 49 51 47 49 51 51 55 56
60 41 45 48 43 44 49 47 51 52
90 38 42 45 40 41 46 44 48 50
120 35 39 43 38 39 44 41 46 48
150 33 37 40 37 37 42 38 43 45
180 31 34 39 35 36 40 36 41 43
210 30 33 37 34 35 38 35 40 41
240 29 32 36 33 34 37 35 38 39
270 28 31 34 32 34 36 34 36 36
300 28 30 33 31 33 35 32 34 35
330 27 29 32 30 31 34 31 31 34
360 27 29 31 29 30 33 31 30 33
390 26 27 30 28 29 32 30 29 31
420 26 27 30 28 29 31 29 29 30
450 26 27 29 27 27 30 28 28 29
480 26 27 29 26 26 28 27 28 27
표 4
TIME(sec) 비교예 1(단위: ℃) 비교예 2(단위: ℃) 비교예 3(단위: ℃)
1 2 3 1 2 3 1 2 3
0 51 52 55 54 55 56 50 53 54
30 42 44 47 48 46 48 45 47 48
60 39 41 44 45 43 44 42 44 46
90 36 38 43 43 40 41 40 42 44
120 34 37 40 42 40 41 40 41 44
150 33 35 39 41 39 41 39 40 43
180 31 34 37 41 39 40 39 40 43
210 31 33 36 39 37 39 39 39 43
240 30 32 35 38 37 38 38 39 42
270 30 31 34 38 36 38 37 37 41
300 29 30 33 37 35 36 35 36 40
330 29 30 32 37 34 36 35 35 39
360 28 29 32 36 34 35 34 34 38
390 28 29 31 35 33 34 33 34 36
420 28 29 30 34 32 33 32 33 35
450 28 28 30 32 31 33 31 32 34
480 28 28 29 31 30 32 31 31 32
510 28 28 29 30 29 31 30 30 31
540 27 28 28 29 29 30 30 29 31
570 27 28 28 27 28 29 29 29 30
Table 4
TIME (sec) Comparative Example 1 (Unit: ℃) Comparative Example 2 (unit: ℃) Comparative Example 3 (Unit: ° C)
One 2 3 One 2 3 One 2 3
0 51 52 55 54 55 56 50 53 54
30 42 44 47 48 46 48 45 47 48
60 39 41 44 45 43 44 42 44 46
90 36 38 43 43 40 41 40 42 44
120 34 37 40 42 40 41 40 41 44
150 33 35 39 41 39 41 39 40 43
180 31 34 37 41 39 40 39 40 43
210 31 33 36 39 37 39 39 39 43
240 30 32 35 38 37 38 38 39 42
270 30 31 34 38 36 38 37 37 41
300 29 30 33 37 35 36 35 36 40
330 29 30 32 37 34 36 35 35 39
360 28 29 32 36 34 35 34 34 38
390 28 29 31 35 33 34 33 34 36
420 28 29 30 34 32 33 32 33 35
450 28 28 30 32 31 33 31 32 34
480 28 28 29 31 30 32 31 31 32
510 28 28 29 30 29 31 30 30 31
540 27 28 28 29 29 30 30 29 31
570 27 28 28 27 28 29 29 29 30
다중 파장을 가진 UV 경화 장치만 이용한 경우(비교예 1 ~ 3) 경화 장치에서 꺼낸 후 바로 측정한 샘플 온도가 50 ~ 60℃로 높고 20 ~ 30℃로 온도가 내려가는데 480 ~ 570초로 시간이 비교적 오래 걸렸다. 단일 파장을 가진 UV 경화 장치로 초벌 경화하고 다중 파장을 가진 본 UV 경화 장치를 이용한 경우(실시예 1 ~ 3) 단일 파장을 가진 경화 장치에서 꺼낸 후 바로 측정한 샘플 온도가 29 ~ 32℃였고(표 1), 그 후 본 경화 장치에서 꺼낸 후 바로 측정한 샘플 온도가 33 ~ 35℃(표 2)였으며, 21℃로 온도가 내려가는데 시간이 270초로 비교예 1 ~ 3 대비 짧은 시간이 소요되었다.In case of using only UV curing device with multiple wavelengths (Comparative Examples 1 to 3), the sample temperature measured immediately after taking out from the curing device is 50 ~ 60 ℃ and the temperature goes down to 20 ~ 30 ℃. It took a long time When using the present UV curing device with a single wavelength UV curing device and a multi-wavelength UV curing device (Examples 1 to 3), the sample temperature measured immediately after removal from the curing device with a single wavelength was 29 to 32 ℃ ( Table 1), and the sample temperature measured immediately after taking out from the curing device was 33 ~ 35 ℃ (Table 2), the time was lowered to 21 ℃ was 270 seconds, it took a short time compared to Comparative Examples 1 to 3 .
즉, 실시예 1 ~ 3은 경화 시 발생하는 열이 적어 열 제어가 가능하고, 발생하는 열이 적기 때문에 경화장치에서 꺼낸 제품을 20 ~ 30℃로 낮추는데 비교예 1 ~ 3에 비하여 많은 시간이 필요하지 않아 생산성이 향상된다. That is, in Examples 1 to 3, the heat generated during curing is low, and heat control is possible, and since the generated heat is low, the time taken out from the curing apparatus is lowered to 20 to 30 ° C., which requires more time than Comparative Examples 1 to 3. Productivity is improved.
나아가, UV 광원장치의 램프 헤드(head)를 고정 방식에서 헤드(head) 이동 방식으로 변경함으로써, 조사 영역의 변경을 통해 과열로 인한 열의 상승 요인을 없애 내부 온도를 낮출 수 있다.Furthermore, by changing the lamp head of the UV light source device from the fixed method to the head moving method, the internal temperature can be lowered by eliminating the factor of heat rise due to overheating by changing the irradiation area.
[부호의 설명][Description of the code]
1: 하우징부1: housing part
2: 결합부재2: coupling member
10: 램프 10: lamp
20: 기판20: substrate
30: 합착 기판 지지부(픽스쳐)30: bonded substrate support (fixture)
40: 구동 유닛(컨베이어)40: drive unit (conveyor)

Claims (7)

  1. 하부 기판과 상부 기판을 합착한 합착 기판의 표면을 단일 파장 UV 광원 장치로 조사하여 경화하는 제1 경화단계; 및A first curing step of irradiating and curing the surface of the bonded substrate on which the lower substrate and the upper substrate are bonded with a single wavelength UV light source device; And
    상기 제1 경화단계를 거친 합착 기판의 표면을 다중 파장 UV 광원 장치로 조사하여 경화하는 제2 경화단계를 포함하는 것을 특징으로 하는 광 합착 경화 방법.And a second curing step of irradiating and curing the surface of the bonded substrate having passed through the first curing step with a multi-wavelength UV light source device.
  2. 제 1 항에 있어서,The method of claim 1,
    상기 단일 파장 UV 광원 장치의 광원과 다중 파장 UV 광원 장치의 광원의 파장의 크기는 320 ~ 420 nm인 것을 특징으로 하는 광 합착 경화 방법.The size of the wavelength of the light source of the single wavelength UV light source device and the light source of the multi-wavelength UV light source device is 320 ~ 420 nm characterized in that the light bonding curing method.
  3. 제 1 항에 있어서,The method of claim 1,
    상기 다중 파장 UV 광원 장치는 램프를 포함하며,The multi-wavelength UV light source device includes a lamp,
    상기 램프 상부에 하우징부가 배치되는 것을 특징으로 하는 광 합착 경화 방법.And a housing part disposed above the lamp.
  4. 제 3 항에 있어서,The method of claim 3, wherein
    상기 하우징부와 램프 사이는 결합부재로 연결되며,Between the housing portion and the lamp is connected to the coupling member,
    상기 결합부재가 하우징부 하단부에 배치되어 좌측 또는 우측으로 이동 운동 하는 것을 특징으로 하는 광 합착 경화 방법.And the coupling member is disposed at the lower end of the housing to move left or right.
  5. 제 1 항에 있어서,The method of claim 1,
    상기 단일 파장 UV 광원 장치의 램프는 LED 또는 레이저(Laser)인 것을 특징으로 하는 광 합착 경화 방법.And the lamp of the single wavelength UV light source device is an LED or a laser.
  6. 제 1 항에 있어서,The method of claim 1,
    상기 다중 파장 UV 광원 장치의 램프는 고압수은 UV 램프, 메탈 할라이드 UV 램프 및 메탈 UV 램프 중에서 선택되는 것을 특징으로 하는 광 합착 경화 방법.The lamp of the multi-wavelength UV light source device is a light bonding curing method, characterized in that selected from high-pressure mercury UV lamp, metal halide UV lamp and metal UV lamp.
  7. 제 1 항에 있어서,The method of claim 1,
    상기 상부 기판과 하부 기판 사이에 UV 경화형 점착액을 도포하여 합착한 것을 특징으로 하는 광 합착 경화 방법.And a UV-curable adhesive liquid applied between the upper substrate and the lower substrate and bonded to each other.
PCT/KR2013/000272 2012-01-20 2013-01-14 Method for optical bonding and hardening WO2013109023A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2012-0006579 2012-01-20
KR1020120006579A KR20130085657A (en) 2012-01-20 2012-01-20 Harding method of optical bonding

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WO2013109023A1 true WO2013109023A1 (en) 2013-07-25

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KR101649931B1 (en) * 2015-03-10 2016-08-23 주식회사지엘에스 Apparatus for uv hardening and method for adjusting the illumination thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003243161A (en) * 2002-02-12 2003-08-29 Seiko Epson Corp Manufacturing method and device of electro-optic device, electro-optic device and electronic apparatus
JP2010008564A (en) * 2008-06-25 2010-01-14 Citizen Holdings Co Ltd Method for manufacturing of liquid crystal display device
KR20110074351A (en) * 2009-12-24 2011-06-30 엘지디스플레이 주식회사 Sealant curing method for liquid crystal display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003243161A (en) * 2002-02-12 2003-08-29 Seiko Epson Corp Manufacturing method and device of electro-optic device, electro-optic device and electronic apparatus
JP2010008564A (en) * 2008-06-25 2010-01-14 Citizen Holdings Co Ltd Method for manufacturing of liquid crystal display device
KR20110074351A (en) * 2009-12-24 2011-06-30 엘지디스플레이 주식회사 Sealant curing method for liquid crystal display device

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