WO2013105297A1 - Method for manufacturing amorphous plate and device for manufacturing same - Google Patents
Method for manufacturing amorphous plate and device for manufacturing same Download PDFInfo
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- WO2013105297A1 WO2013105297A1 PCT/JP2012/070649 JP2012070649W WO2013105297A1 WO 2013105297 A1 WO2013105297 A1 WO 2013105297A1 JP 2012070649 W JP2012070649 W JP 2012070649W WO 2013105297 A1 WO2013105297 A1 WO 2013105297A1
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- thin plate
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
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- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/11—Making amorphous alloys
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/06—Metallic material
- C23C4/08—Metallic material containing only metal elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/18—After-treatment
- C23C4/185—Separation of the coating from the substrate
Definitions
- the present invention relates to a method and an apparatus for producing an amorphous plate (amorphous film coated plate having an amorphous alloy film on a thin plate base material and an amorphous alloy thin plate formed by separating the film from the thin plate base material). is there.
- Amorphous alloys have not been widely deployed as industrial members, although they have many excellent performances such as corrosion resistance, wear resistance, soft magnetism, and catalytic properties.
- the reason is that the conventional industrial amorphous alloy sheet manufacturing equipment is mainly a single roll or twin roll method, and the manufacturing dimensions are limited to a small size with a thickness of 100 ⁇ m or less and a width of 200 mm or less.
- twin roll method was introduced in a paper published by H.S. Chen et al. In 1970 in the United States. Single roll technology was published by Masumoto et al. In 1970, and a patent was issued in 1975 by Allied Chemical Company in the United States. Recently, many patents such as twin rolls, Japanese Patent Laid-Open Nos. 6-7902 and 6-114504 have been filed. That is, there are the following non-patent documents and patent documents as prior art documents.
- the conventional twin roll method and single roll method are methods in which a molten alloy is directly contacted with a roll and rapidly cooled to produce an amorphous alloy sheet. For this reason, it is impossible to produce an amorphous alloy sheet with a thickness of 100 ⁇ m or more at the limit of roll cooling. In addition, it is difficult to produce an amorphous alloy sheet with a wide width and a uniform thickness, and as a result, the maximum width is 220 mm. As an actual industrial material, such a small size has a narrow range of use.
- amorphous alloy thin plate if a large plate exceeding the maximum dimensions (plate thickness 100 ⁇ m, width 220mm) manufactured by conventional manufacturing equipment, for example, a plate thickness of 300 ⁇ m or more, width 300mm or more, can be used as an industrial member.
- the development of The present invention provides a new production method and production apparatus for an amorphous plate (amorphous film coating plate having an amorphous alloy film on a thin plate substrate, and an amorphous alloy thin plate formed by separating the film from the thin plate substrate), Thus, for example, a thin plate having a thickness of 300 ⁇ m or more and a width of 300 mm or more can be manufactured.
- a film of an amorphous alloy (including metal glass, including a non-amorphous rate of 100%) is formed on the surface of a preheated thin plate substrate by thermal spraying, and the plastic fluidity temperature range of the amorphous alloy (The thin plate substrate with an amorphous alloy film is passed through a rolling mill at approximately 200 to 520 ° C.). As a result, the surface of the amorphous alloy thin plate is smoothed and the consistent holes and vacancies therein are eliminated.
- the thin plate base material is heated before the thermal spraying, and when passing through a rolling mill, the amorphous alloy film becomes 200 to 520 ° C. It is preferable to do this.
- the thin plate substrate with the film can be passed through a rolling mill in a state where the film is in the plastic fluidity temperature range, thereby eliminating the consistent holes and voids inside the amorphous alloy film, and further, In some cases, the adhesion between the thin plate substrate and the amorphous alloy is improved.
- the purpose of pre-heating the thin plate substrate is to keep the amorphous alloy at the plastic fluidity temperature during rolling.
- the temperature of the amorphous alloy film when it is passed through a rolling mill is lower than 200 ° C.
- the sprayed amorphous alloy film is rolled, the plastic fluidity is insufficient and cracks occur without deformation.
- the film is heated to be higher than 520 ° C., the amorphous alloy film is not formed because the temperature becomes higher than the crystallization temperature during the thermal spraying of the amorphous alloy. It is more preferable that the roll of the rolling mill is heated so that the surface temperature becomes 200 to 520 ° C. This is because the amorphous alloy being rolled can be easily maintained at the plastic fluidity temperature.
- the metal sheet with an amorphous alloy film is passed through a rolling mill and then the amorphous alloy film is peeled from the sheet material, an amorphous alloy sheet having excellent internal and surface properties can be obtained.
- the amorphous coating and the thin plate substrate must be in close contact immediately after spraying and during rolling and peel off after rolling.
- the thin plate base material is pickled and iron with a surface roughness Ra of 1 to 2 ⁇ m and a linear expansion coefficient of 11 ⁇ 10 -6 / ° C, there are various materials such as stainless steel and aluminum for the thin plate base material.
- an amorphous film with poor adhesion for example, Ni base having a linear expansion coefficient of 17 ⁇ 10 ⁇ 6 / ° C.
- the surface of the thin plate base material is polished and the surface roughness is set to 2 to 5 ⁇ m in Ra to improve the adhesion between the amorphous film and the thin plate base material and roll.
- an amorphous film for example, Fe base having a linear expansion coefficient of 11 ⁇ 10 ⁇ 6 / ° C.
- a separating material is applied or sprayed on the surface of an amorphous alloy film (eg Fe base) having good adhesion.
- an amorphous alloy film eg Fe base
- the alloy thin plate is preferably peeled from the thin plate base material. Separating agent and different diameter single drive rolling are for peeling the amorphous alloy sheet from the sheet substrate.
- a pay-off reel for paying out a thin plate base material
- a surface treatment device for example, air blast
- a four-stage (two-stage) rolling mill an apparatus for heat insulation and cooling after forming the amorphous alloy thin plate, a winder for winding the thin plate base material, and a winder for winding the amorphous alloy thin plate are preferable.
- the surface roughness of the thin plate substrate is set to 2 to 5 ⁇ m in Ra, and the upper and lower rolls have the same upper and lower roll diameters as the rolling mill.
- a payoff reel for paying out a thin plate substrate
- a leveler for correcting the shape of the thin plate substrate
- a surface treatment device for smoothing the surface of the thin plate substrate.
- Equipment for example, air blasting
- heating device for thin plate base material for example, thermal spraying device for forming amorphous alloy coating
- rolling mill driven by the same diameter for winding the produced amorphous alloy coating coated thin plate
- winding for winding the produced amorphous alloy coating coated thin plate
- the injection device large-scale ultra-quick transition transition injection device for forming an amorphous alloy film
- a wide amorphous plate can be efficiently manufactured by using such a wide injection device.
- a high-power flame including material particles
- it is necessary to properly rectify the flame and cool it sufficiently, but with the above device, it flows just outside the flame
- the inert gas performs its rectification and partial cooling, and the liquid mist that flows to the outside strongly supplements the cooling of the flame, thus realizing the necessary rectification and cooling to form a wide amorphous film. enable.
- a dust collection hood is provided in the vicinity of the flame of the injection device that forms the amorphous alloy film, and the dust collection hood is cooled while being cooled by water mist separately supplied to the dust collection hood. It is preferable that the hood is sucked and sent to the dust collector.
- a thin plate made of only an amorphous alloy or a coating plate having an amorphous alloy film on its surface can be smoothly produced, and the thickness is increased to, for example, 300 ⁇ m or more, and the width dimension, for example, to 300 mm or more.
- the thickness is increased to, for example, 300 ⁇ m or more, and the width dimension, for example, to 300 mm or more.
- the amorphous alloy film coating plate can be applied in place of the plating material to increase the durability of building materials, wall materials, and roof materials.
- Figure 1 shows a large quench transition control injector.
- Each of the figures (a), (b) and (c) is a front view, a side view and a bottom view of the whole including the water mist injection port.
- a plurality of material particle injection ports, flame injection ports, and rectifying / cooling nitrogen gas injection ports are continuously arranged in the horizontal direction along a straight line.
- (d) is an external photograph showing a flame or the like during actual injection.
- FIG. 2 shows the cross section of the amorphous alloy thin plate and the X-ray diffraction analysis result. The composition of this amorphous alloy is 64.5Ni-10Cr-7.5Mo-18B (at%).
- FIG. 3 is a drawing in which a separating material is applied to a thin plate substrate by a coating apparatus, and a configuration diagram of the separating agent coating apparatus.
- FIG. 4 is a drawing for separating the single-diameter single-drive rolling mill and the amorphous alloy sheet from the sheet substrate.
- FIG. 5 is a view showing a dust collector (dust collection hood) around the rolling mill.
- FIG. 6 (a) is a side view showing an overview of the production line for amorphous alloy thin plates
- FIG. 6 (b) is a diagram showing the temperature transition of the substrate and the amorphous sprayed alloy thin plate.
- FIG. 7 is a detailed view showing a part of the production line of FIG. FIG.
- FIG. 8 is a side view conceptually showing an example of amorphous alloy film temperature measurement.
- FIG. 9 is an appearance photograph showing an example of the manufactured amorphous alloy thin plate coil.
- FIG. 10 shows the cross section of the amorphous film coating plate and the result of X-ray diffraction analysis. The composition of this amorphous alloy is 64.5Ni-10Cr-7.5Mo-18B (at%).
- FIG. 11 is an appearance photograph showing an example of the manufactured amorphous film-coated plate.
- FIG. 12 is a photograph showing heating by a heating / soaking device and injection from a large quench transition control injector in a line showing production of an amorphous alloy film.
- the apparatus of the present invention is a continuous production equipped with a large-scale ultra-quenching transition control injector (that is, an injection device. Cooling capacity: more than 1 million degrees per second. Fig. 1) that enables the production of amorphous alloy with a thickness of 300 ⁇ m or more. Equipment (FIG. 6).
- the large super rapid cooling transition control injector has material injection holes arranged at equal intervals in the width direction, and has gas injection holes on the outer side. The gas is injected from there to melt the material, and quenching with water mist etc.
- the gas gun has a structure, and since a material is uniformly injected in the width direction, a thin plate having a uniform thickness in the width direction can be formed.
- the large ultra-quenching transition control injector is configured as shown in FIG. That is, a) A plurality of material particle injection holes 25 and a plurality of flame injection holes 26 are provided along the straight line on the front surface of the spray gun 21 so that the cross section of the flame a containing the material particles is a horizontally long (about 300 mm width). They are arranged continuously. b) A plurality of nitrogen gas (inert gas) b injection ports 27 for rectifying and cooling the flame a at the positions on both sides of the material particle injection port 25 and the flame injection port 26 along the straight line. They are arranged continuously.
- the water mist c injection port 24 for cooling the flame a is aligned along the straight line.
- a slit is provided in the mist nozzle 23.
- the water mist c injection port 24 is angled so that the mist c to be injected approaches the flame a, and the angle can be changed according to the chemical composition of the material particles. Further, the injection pressures of the nitrogen gas b and the water mist c can be similarly changed. Due to the action of nitrogen gas b and water mist c, the cooling rate of flame (a flame containing material particles) a reaches 400,000 to 1 million ° C./second.
- the water mist c is decomposed into oxygen and hydrogen by contact with the high thermal power flame a, and the amount of oxygen in the flame a is excessively reduced, so the amount of oxygen injected from the flame injection port 26 is reduced. , 50-80% of the amount of oxygen required for complete combustion.
- the pickled thin plate base material (coil) is fitted into a payoff reel, the tip of the thin plate base material is guided to a line with a pinch roll, and the shape correction and curl of the thin plate base material are corrected through the leveler.
- the sheet width and length direction are made uniform ( ⁇ 10 degrees) with a heating device including an infrared heater up to a temperature (200 to 520 degrees) that can maintain the plastic fluidity of the amorphous metal injected later on the thin plate substrate. Heat.
- the powder material is sprayed on the base material with a large ultra-quick quench transition control jet to form an amorphous alloy film, and the amorphous alloy film does not cool, and is rolled with a rolling mill while the plastic fluidity is good. To do.
- an amorphous metal thin plate (FIG. 2 cross-section of the amorphous thin plate) having no consistent holes or voids inside the thin plate is produced.
- amorphous alloy film after rolling down with a rolling mill, what was separated from the thin plate substrate, amorphous alloy thin plate, when not separating from the thin plate substrate, The plate is called an amorphous alloy film coated plate.
- an amorphous alloy thin plate and an amorphous alloy film coating plate are generically called an amorphous plate.
- the rolling temperature at the time of rolling is a plastic fluid region (temperature of 200 to 520 degrees) regardless of whether the amorphous metal thin plate is an amorphous alloy or metal glass.
- the rolling reduction in the rolling mill is 2-30% of the thickness of the amorphous alloy sheet, and the rolling speed is 2-20 m / min.
- a separating agent applicator Fig. 3
- the amorphous alloy thin plate is separated from the thin plate base material, and the thin plate base material and the amorphous alloy thin plate are wound up separately to form an amorphous alloy. Thin plates can be manufactured. This is to obtain an amorphous alloy thin plate exceeding the conventional manufacturing dimensions.
- the rolling mill system used here may be an ordinary four-stage (two-stage) system, but a different diameter piece drive system (FIG. 4) may be employed in order to improve the separability.
- the advantage of rolling with a different diameter single drive method is that the upper and lower roll diameters are larger when the roll diameter of the upper and lower rolls is different, and the smaller the roll diameter, the higher the roll diameter of the upper roll. If it is smaller, the thin metal substrate and the amorphous alloy thin plate can be separated by utilizing the fact that the amorphous metal thin plate warps upward.
- FIG. 3 shows a conceptual diagram showing the state of application (application by spraying) of the separating agent to the surface of the thin plate substrate, and a configuration diagram (system diagram) of the separating agent applying apparatus.
- the separating agent application device sprays a separating agent (such as grease) in a grease tank onto a thin plate substrate through a plurality of systems each having a pump and an injection nozzle.
- the separating agent used here consists of a surfactant with a particle size of 1 to 10 ⁇ m and a solid lubricant (Si, etc.) with the same particle size.
- Si solid lubricant
- FIGS. 6 and 7 Equipment for producing amorphous alloy sheets is shown in FIGS. 6 and 7.
- FIG. In this equipment, an amorphous alloy film is formed on the surface of a thin plate substrate by thermal spraying, and thereafter rolled to eliminate voids / consistent holes, and the amorphous alloy thin plate is peeled off from the thin plate substrate and collected. This facility will be described in detail below.
- the basic equipment and functions that make up the line in FIG. 6 are as follows.
- Payoff reel For receiving a thin plate base coil.
- Polishing device Abrasive material is sprayed onto the substrate surface using compressed air made by a compressor.
- Separating agent coating and spraying device A device for applying a separating material to facilitate separation of the amorphous alloy thin plate and the thin plate base material. In addition, it is good also to provide between a thin-plate base-material heating apparatus and a super quenching transition control injector.
- Preheater A device for heating a thin plate base material from room temperature to 350 degrees. This time, two rows of propane burners were arranged in the width direction.
- the thin plate base material uses a pickling material to which no rust preventive oil is applied, but since it is manufactured on the same pickling line as the thin plate coated with the rust preventive oil, a very small amount of the rust preventive oil remains.
- carbides appear on the surface, reducing the adhesion between the amorphous alloy film and the thin plate substrate. Therefore, reducing the required amount of oxygen to propane burner to 0.8 to 0.7 will result in a reducing atmosphere, and will also play a role in preventing the generation of graphite due to rust-preventing oil.
- Leveler Shape correction broken by heating the thin plate base material Is what you do.
- Thin plate substrate heating / soaking device A device for heating a thin plate to 200 to 520 ° C.
- the thin plate heating temperature is lower than 200 ° C.
- the plastic fluidity is insufficient and the amorphous film is cracked.
- the thin plate base material is heated to a temperature higher than 520 ° C.
- the molten alloy powder becomes higher than the crystallization temperature at the time of injection with a large ultra-cooled transition control injector, so that an amorphous alloy film is not generated.
- Large-scale ultra-quick transition control injector Amorphous alloy film production equipment.
- Dust collector installed at the front of the rolling mill is to recover the amorphous gas residue after injection and surplus gas used in the large ultra-quick transition control injector.
- the gas energy used to melt the amorphous alloy powder is less than 10% of the total. Therefore, if the surplus gas is not recovered, the ambient temperature around the rolling mill will be 450 degrees, the surface of the amorphous alloy film on the thin plate substrate will be 600 degrees or more, and the amorphous film will begin to crystallize.
- Fig. 5 shows the arrangement of dust collection hoods.
- the dust collection hood is provided at the left and right of the passage position of the thin plate base material and the position surrounding the upper part of the rolling mill, and sprays water mist for cooling toward them. Water mist for cooling is also injected into suction ducts connected to each dust collection hood, and suction gas is sent to the dust collector main body (not shown) through the ducts.
- Different-diameter single-drive rolling mill or 2-stage, 4-stage same-diameter rolling mill: The amorphous alloy film is crushed to crush consistent holes and pores, and at the same time, above and below the thin plate substrate and amorphous alloy film By changing the degree of processing, the amorphous alloy film is warped, and the amorphous alloy film and the thin plate base material are separated to form an amorphous alloy thin plate. In this rolling mill, it is preferable that at least the work roll on the side in contact with the amorphous alloy film is a temperature-adjustable one incorporating a bar heater or the like. (10) Thin plate substrate winding machine: Winds the separated thin plate substrate.
- Amorphous alloy sheet take-up machine Takes up the separated amorphous alloy sheet.
- the equipment shown in the figure is basically an amorphous alloy thin plate production line composed of (1) to (11). Furthermore, facilities such as (12) to (13) may be added.
- (12) Amorphous alloy thin plate heating device A device for holding a separated amorphous alloy thin plate in a plastic flow temperature range.
- (13) Warm processing machine A machine that processes and molds an amorphous alloy sheet kept at a plastic flow temperature.
- Table 2 shows the equipment configuration according to the product type.
- the procedure is as follows.
- (1) Setting of thin plate base material In other words, the thin plate base material is previously placed on the payoff reel to the tension reel.
- (2) Start of threading When the above setting is completed, the payoff reel is activated to feed the thin plate base material from left to right in the figure.
- the following operations are simultaneously performed by each device on the thin plate substrate to be sent.
- (ii) Using a separating material coating apparatus a separating agent is coated on the entire width of the thin plate base material for the required amorphous alloy.
- a small amount of remaining rust preventive oil is burned in a thin plate base material preheating device so as not to leave graphite.
- the shape of the thin plate base material is corrected with a leveler.
- Preheat in the range of 200 ° C to 520 ° C while passing through a thin plate substrate, heating and soaking device.
- An amorphous alloy film is formed with a large ultra-quickly cooled transition controlled injector.
- Roll the amorphous alloy film and the thin plate base material with a rolling mill. Due to the difference in the amorphous alloy composition and production conditions, the rolling reduction is reduced from 2% to 30% 0.1 to 10 seconds after the amorphous alloy film is injected with a large ultra-quick transition control injector. As shown in FIG.
- the surface temperature of the amorphous film 16 is measured using a thermocouple 17, and the heating of the thin plate base material is controlled accordingly.
- the base material temperature depends on the temperature of the outside air, and the target temperature ⁇ 30 degrees may vary on the heating and soaking furnace exit side. For variations of 20 degrees or more, adjust the burner heating power of the preheater, and within 20 degrees, adjust it by infrared heating and the electrical output of the soaking furnace. If the temperature of the work roll on the side in contact with the amorphous alloy film in the rolling mill is adjustable, the surface temperature of the roll may be kept in the range of 200 to 520 ° C. during rolling.
- each device on the thin plate substrate to be sent.
- the surface is ground by air blasting to increase the roughness of the surface of the thin plate substrate.
- a small amount of remaining rust preventive oil is burned so as not to leave graphite.
- the shape of the thin plate substrate is corrected with a leveler.
- An amorphous alloy film is formed with a large ultra-quickly cooled transition controlled injector.
- An amorphous alloy sheet with a thickness of 300 ⁇ m and a width of 300mm will be manufactured using a super-quenching transition control injector.
- Table 3 shows the manufacturing test conditions. The surface temperature of the thin plate substrate before thermal spraying of the amorphous alloy is heated to 400 ° C., and the powder of 64.5Ni-10Cr-7.5Mo-18B (at%) is melted and sprayed from the ultra-quenching transition control injector. In this example, the substrate feed speed is 5.7 m / min and the roll is reduced by 10% with the same diameter roll of ⁇ 115. The rolling load after 10% rolling was 24 t.
- FIG. 9 shows the amorphous alloy sheet.
- the amorphization rate and cross-sectional photograph are shown in FIG.
- An amorphous alloy coating sheet with a thickness of 250 ⁇ m and a width of 300mm will be manufactured using a super-quenching transition control injector.
- Table 4 shows the main manufacturing test conditions. The surface temperature of the thin plate substrate before thermal spraying of the amorphous alloy is heated to 450 ° C., 64.5Ni-10Cr-7.5Mo-18B (at%) powder is melted and sprayed from an ultra-quenching transition control injector. In this example, the substrate feed speed is 5.7 m / min, and the sheet is reduced by 7% with the same diameter roll of ⁇ 115. The rolling load after 7% rolling was 15 t.
- FIG. 10 shows the amorphous alloy film coated plate.
- An amorphous alloy film coated plate having a thickness of 2.25 mm ⁇ amorphous film thickness 250 ⁇ m ⁇ and a width of 300 mm and a length of 150 mm could be obtained.
- the amorphization rate and cross-sectional photograph are shown in FIG.
- the present invention provides a new production method and production apparatus for an amorphous plate (amorphous film coating plate having an amorphous alloy film on a thin plate substrate, and an amorphous alloy thin plate formed by separating the film from the thin plate substrate), Thereby, for example, it is possible to produce a thin plate having a thickness of 300 ⁇ m or more and a width of 300 mm or more. If such a large-sized thing can be manufactured, development as an industrial member will spread greatly.
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Abstract
[Problem] To provide an amorphous alloy sheet and an amorphous alloy film-coated sheet having greater thicknesses and widths compared to conventional manufacturing dimensions. [Solution] An amorphous alloy film is formed by performing spraying on a surface of a heated sheet base material, and the metal sheet with the amorphous alloy film is passed through a rolling machine in a state where the amorphous alloy is maintained in a temperature range in which the amorphous alloy has plastic flowability. Particularly, it is preferable to heat the sheet base material so that the sheet base material is 200-520°C at the time when the amorphous alloy film is formed.
Description
本発明は、アモルファス板(薄板基材上にアモルファス合金皮膜を有するアモルファス皮膜コーティング板、および、当該皮膜を薄板基材から分離してなるアモルファス合金薄板)を製造するための方法および装置に関するものである。
The present invention relates to a method and an apparatus for producing an amorphous plate (amorphous film coated plate having an amorphous alloy film on a thin plate base material and an amorphous alloy thin plate formed by separating the film from the thin plate base material). is there.
アモルファス合金は、耐食性、耐摩耗性、軟磁性、触媒性等多くの優れた性能を持ちながらも工業用部材として大きくは展開されてこなかった。理由として、従来の工業用アモルファス合金薄板製造設備は主に片ロール、双ロール法であり、そのために製造寸法が、厚み100μm以下、巾200mm以下と小サイズに限られていることが挙げられる。
Amorphous alloys have not been widely deployed as industrial members, although they have many excellent performances such as corrosion resistance, wear resistance, soft magnetism, and catalytic properties. The reason is that the conventional industrial amorphous alloy sheet manufacturing equipment is mainly a single roll or twin roll method, and the manufacturing dimensions are limited to a small size with a thickness of 100 μm or less and a width of 200 mm or less.
双ロール法は1970年の米国のH.S.Chenらによる発表論文で紹介されている。又、単ロールの技術は1970年に増本らにより発表されており、特許は1975年に米国のAllied Chemical社でだされている。直近では双ロール特開平6-7902,特開平6-114504等多くの特許が出願されている。すなわち、先行技術文献として下記のような非特許文献および特許文献がある。
The twin roll method was introduced in a paper published by H.S. Chen et al. In 1970 in the United States. Single roll technology was published by Masumoto et al. In 1970, and a patent was issued in 1975 by Allied Chemical Company in the United States. Recently, many patents such as twin rolls, Japanese Patent Laid-Open Nos. 6-7902 and 6-114504 have been filed. That is, there are the following non-patent documents and patent documents as prior art documents.
従来の双ロール法、片ロール法は、溶融合金を直接ロールに直接接触させ急速冷却し、アモルファス合金薄板を製造する方法である。その為に、ロール冷却の限界で、厚み100μm以上のアモルファス合金薄板の製造は不可能となる。又、幅を広くして均一な厚みにしてアモルファス合金薄板を製造することは難しく、実績として最大幅は220mmである。現実の工業材料としてはこのような小サイズでは利用範囲が狭い。アモルファス合金薄板としては、従来の製造設備で製造される最大寸法(板厚100μm、幅220mm)を超えた大寸法、例えば板厚300μm以上、幅300mm以上の薄板を製造すれば、工業用部材としての展開が大きく広がる。
本発明は、アモルファス板(薄板基材上にアモルファス合金皮膜を有するアモルファス皮膜コーティング板、および、当該皮膜を薄板基材から分離してなるアモルファス合金薄板)の新しい製造方法および製造装置を提供し、それによって例えば板厚300μm以上、幅300mm以上の薄板の製造を可能にしようとするものである。 The conventional twin roll method and single roll method are methods in which a molten alloy is directly contacted with a roll and rapidly cooled to produce an amorphous alloy sheet. For this reason, it is impossible to produce an amorphous alloy sheet with a thickness of 100 μm or more at the limit of roll cooling. In addition, it is difficult to produce an amorphous alloy sheet with a wide width and a uniform thickness, and as a result, the maximum width is 220 mm. As an actual industrial material, such a small size has a narrow range of use. As an amorphous alloy thin plate, if a large plate exceeding the maximum dimensions (plate thickness 100μm, width 220mm) manufactured by conventional manufacturing equipment, for example, a plate thickness of 300μm or more, width 300mm or more, can be used as an industrial member. The development of
The present invention provides a new production method and production apparatus for an amorphous plate (amorphous film coating plate having an amorphous alloy film on a thin plate substrate, and an amorphous alloy thin plate formed by separating the film from the thin plate substrate), Thus, for example, a thin plate having a thickness of 300 μm or more and a width of 300 mm or more can be manufactured.
本発明は、アモルファス板(薄板基材上にアモルファス合金皮膜を有するアモルファス皮膜コーティング板、および、当該皮膜を薄板基材から分離してなるアモルファス合金薄板)の新しい製造方法および製造装置を提供し、それによって例えば板厚300μm以上、幅300mm以上の薄板の製造を可能にしようとするものである。 The conventional twin roll method and single roll method are methods in which a molten alloy is directly contacted with a roll and rapidly cooled to produce an amorphous alloy sheet. For this reason, it is impossible to produce an amorphous alloy sheet with a thickness of 100 μm or more at the limit of roll cooling. In addition, it is difficult to produce an amorphous alloy sheet with a wide width and a uniform thickness, and as a result, the maximum width is 220 mm. As an actual industrial material, such a small size has a narrow range of use. As an amorphous alloy thin plate, if a large plate exceeding the maximum dimensions (plate thickness 100μm, width 220mm) manufactured by conventional manufacturing equipment, for example, a plate thickness of 300μm or more, width 300mm or more, can be used as an industrial member. The development of
The present invention provides a new production method and production apparatus for an amorphous plate (amorphous film coating plate having an amorphous alloy film on a thin plate substrate, and an amorphous alloy thin plate formed by separating the film from the thin plate substrate), Thus, for example, a thin plate having a thickness of 300 μm or more and a width of 300 mm or more can be manufactured.
本発明は、予め加熱した薄板基材の表面に溶射によってアモルファス合金(金属ガラスも含む。アモルファス化率が100%でないものも含む)の皮膜を形成し、そのアモルファス合金の塑性流動性温度域(概ね200~520℃)で、アモルファス合金皮膜付きの薄板基材を圧延機に通すことを特徴とする。これによってアモルファス合金薄板の表面を平滑にするとともにその内部の一貫孔、空孔を無くす。
アモルファス合金皮膜を形成させ、アモルファス合金皮膜が冷えない(塑性流動性良好な状態)内に、圧延機で圧延をすると、アモルファス合金皮膜内部の一貫孔や空孔が無いアモルファス板(図2 アモルファス合金薄板の断面)が作製される。
薄板基材に分離剤塗布機で分離剤(図3)を塗布していない場合は、薄板基材の上にアモルファス合金がメッキされた薄板を生成することもできる。その場合、圧延機に通すことにより、薄板基材とアモルファス合金皮膜との密着力を向上させる効果も得られる。 In the present invention, a film of an amorphous alloy (including metal glass, including a non-amorphous rate of 100%) is formed on the surface of a preheated thin plate substrate by thermal spraying, and the plastic fluidity temperature range of the amorphous alloy ( The thin plate substrate with an amorphous alloy film is passed through a rolling mill at approximately 200 to 520 ° C.). As a result, the surface of the amorphous alloy thin plate is smoothed and the consistent holes and vacancies therein are eliminated.
When an amorphous alloy film is formed and rolled with a rolling mill while the amorphous alloy film does not cool (with good plastic fluidity), an amorphous plate with no consistent holes or voids inside the amorphous alloy film (Figure 2 Amorphous Alloy) A cross section of the thin plate) is produced.
In the case where the separating agent (FIG. 3) is not applied to the thin plate base material with a separating agent applicator, it is also possible to produce a thin plate in which an amorphous alloy is plated on the thin plate base material. In that case, the effect which improves the adhesive force of a thin-plate base material and an amorphous alloy membrane | film | coat is also acquired by letting it pass through a rolling mill.
アモルファス合金皮膜を形成させ、アモルファス合金皮膜が冷えない(塑性流動性良好な状態)内に、圧延機で圧延をすると、アモルファス合金皮膜内部の一貫孔や空孔が無いアモルファス板(図2 アモルファス合金薄板の断面)が作製される。
薄板基材に分離剤塗布機で分離剤(図3)を塗布していない場合は、薄板基材の上にアモルファス合金がメッキされた薄板を生成することもできる。その場合、圧延機に通すことにより、薄板基材とアモルファス合金皮膜との密着力を向上させる効果も得られる。 In the present invention, a film of an amorphous alloy (including metal glass, including a non-amorphous rate of 100%) is formed on the surface of a preheated thin plate substrate by thermal spraying, and the plastic fluidity temperature range of the amorphous alloy ( The thin plate substrate with an amorphous alloy film is passed through a rolling mill at approximately 200 to 520 ° C.). As a result, the surface of the amorphous alloy thin plate is smoothed and the consistent holes and vacancies therein are eliminated.
When an amorphous alloy film is formed and rolled with a rolling mill while the amorphous alloy film does not cool (with good plastic fluidity), an amorphous plate with no consistent holes or voids inside the amorphous alloy film (Figure 2 Amorphous Alloy) A cross section of the thin plate) is produced.
In the case where the separating agent (FIG. 3) is not applied to the thin plate base material with a separating agent applicator, it is also possible to produce a thin plate in which an amorphous alloy is plated on the thin plate base material. In that case, the effect which improves the adhesive force of a thin-plate base material and an amorphous alloy membrane | film | coat is also acquired by letting it pass through a rolling mill.
アモルファス合金を上記のとおり塑性流動性のある温度域に保つためには、上記薄板基材を上記溶射の前に加熱し、圧延機に通す時点でアモルファス合金皮膜が200~520℃となるようにするのが好ましい。これにより、上記皮膜付きの薄板基材を、当該皮膜が塑性流動性温度域にある状態で圧延機に通すことができ、もってアモルファス合金皮膜内部の一貫孔や空孔を無くし、さらに、必要な場合には薄板基材とアモルファス合金との密着力を向上させる。薄板基材を予め加熱するのは、圧延時にアモルファス合金を塑性流動性温度に保持する目的がある。圧延機に通す時点でのアモルファス合金皮膜の温度が200℃より低い場合は、溶射したアモルファス合金皮膜を圧延する場合に塑性流動性が不足し変形しないで割れが発生する。一方、当該皮膜が520℃より高くなるように加熱すると、アモルファス合金溶射時に結晶化温度以上になるためアモルファス合金皮膜が生成しない。なお、上記圧延機のロールを、表面温度が200~520℃となるように加熱しておくとさらに好ましい。そのようにすれば、圧延中のアモルファス合金を塑性流動性温度に保持しやすいからである。
In order to keep the amorphous alloy in a temperature range having plastic fluidity as described above, the thin plate base material is heated before the thermal spraying, and when passing through a rolling mill, the amorphous alloy film becomes 200 to 520 ° C. It is preferable to do this. Thereby, the thin plate substrate with the film can be passed through a rolling mill in a state where the film is in the plastic fluidity temperature range, thereby eliminating the consistent holes and voids inside the amorphous alloy film, and further, In some cases, the adhesion between the thin plate substrate and the amorphous alloy is improved. The purpose of pre-heating the thin plate substrate is to keep the amorphous alloy at the plastic fluidity temperature during rolling. When the temperature of the amorphous alloy film when it is passed through a rolling mill is lower than 200 ° C., when the sprayed amorphous alloy film is rolled, the plastic fluidity is insufficient and cracks occur without deformation. On the other hand, when the film is heated to be higher than 520 ° C., the amorphous alloy film is not formed because the temperature becomes higher than the crystallization temperature during the thermal spraying of the amorphous alloy. It is more preferable that the roll of the rolling mill is heated so that the surface temperature becomes 200 to 520 ° C. This is because the amorphous alloy being rolled can be easily maintained at the plastic fluidity temperature.
アモルファス合金皮膜付きの上記金属薄板を圧延機に通したのち、当該アモルファス合金皮膜を上記薄板基材から剥離させると、内部および表面の性状にも優れたアモルファス合金薄板が得られる。
このプロセスに関し、アモルファス皮膜と薄板基材は、噴射直後と圧延中は密着し、圧延後に剥離するものでなければならない。薄板基材が酸洗し表面粗さRaで1~2μmかつ線膨張係数11×10-6/℃の鉄の場合、(薄板基材にはステンレスやアルミ等いろいろな材料ありアモルファス合金皮膜の熱膨張係数に合わせることも可能)、熱収縮率が大きく異なるため密着性の悪いアモルファス皮膜(例えば線膨張係数17×10-6/℃のNi基)は圧延前に剥離することがある。そのため薄板基材の表面を研磨し表面粗さをRaで2~5μmとし、アモルファス皮膜と薄板基材の密着性を向上させ圧延する。
一方、薄板基材と熱収縮率が近く密着性の良いアモルファス皮膜(例えば線膨張係数11×10-6/℃のFe基)は、圧延前に剥離しないため研磨しない。密着性の良いアモルファス合金皮膜(例Fe基)には表面に分離材を塗布または噴霧する。上記圧延機に上下のロールが径差を有していて上下一方のロールのみが駆動される異径片駆動方式圧延機か通常の4段{2段}圧延機かを使用することにより、アモルファス合金薄板を薄板基材から剥離させるのがよい。分離剤や異径片駆動圧延はアモルファス合金薄板を薄板基材から剥離させるためのものである。 When the metal sheet with an amorphous alloy film is passed through a rolling mill and then the amorphous alloy film is peeled from the sheet material, an amorphous alloy sheet having excellent internal and surface properties can be obtained.
With respect to this process, the amorphous coating and the thin plate substrate must be in close contact immediately after spraying and during rolling and peel off after rolling. When the thin plate base material is pickled and iron with a surface roughness Ra of 1 to 2 μm and a linear expansion coefficient of 11 × 10 -6 / ° C, there are various materials such as stainless steel and aluminum for the thin plate base material. It is also possible to match the expansion coefficient), and since the thermal shrinkage rate differs greatly, an amorphous film with poor adhesion (for example, Ni base having a linear expansion coefficient of 17 × 10 −6 / ° C.) may be peeled off before rolling. Therefore, the surface of the thin plate base material is polished and the surface roughness is set to 2 to 5 μm in Ra to improve the adhesion between the amorphous film and the thin plate base material and roll.
On the other hand, an amorphous film (for example, Fe base having a linear expansion coefficient of 11 × 10 −6 / ° C.) having a close thermal contraction rate and good adhesion to the thin plate base material is not polished because it does not peel before rolling. A separating material is applied or sprayed on the surface of an amorphous alloy film (eg Fe base) having good adhesion. By using a different diameter single-drive rolling mill in which the upper and lower rolls have a diameter difference and only one of the upper and lower rolls is driven or an ordinary four-stage {two-stage} rolling mill, The alloy thin plate is preferably peeled from the thin plate base material. Separating agent and different diameter single drive rolling are for peeling the amorphous alloy sheet from the sheet substrate.
このプロセスに関し、アモルファス皮膜と薄板基材は、噴射直後と圧延中は密着し、圧延後に剥離するものでなければならない。薄板基材が酸洗し表面粗さRaで1~2μmかつ線膨張係数11×10-6/℃の鉄の場合、(薄板基材にはステンレスやアルミ等いろいろな材料ありアモルファス合金皮膜の熱膨張係数に合わせることも可能)、熱収縮率が大きく異なるため密着性の悪いアモルファス皮膜(例えば線膨張係数17×10-6/℃のNi基)は圧延前に剥離することがある。そのため薄板基材の表面を研磨し表面粗さをRaで2~5μmとし、アモルファス皮膜と薄板基材の密着性を向上させ圧延する。
一方、薄板基材と熱収縮率が近く密着性の良いアモルファス皮膜(例えば線膨張係数11×10-6/℃のFe基)は、圧延前に剥離しないため研磨しない。密着性の良いアモルファス合金皮膜(例Fe基)には表面に分離材を塗布または噴霧する。上記圧延機に上下のロールが径差を有していて上下一方のロールのみが駆動される異径片駆動方式圧延機か通常の4段{2段}圧延機かを使用することにより、アモルファス合金薄板を薄板基材から剥離させるのがよい。分離剤や異径片駆動圧延はアモルファス合金薄板を薄板基材から剥離させるためのものである。 When the metal sheet with an amorphous alloy film is passed through a rolling mill and then the amorphous alloy film is peeled from the sheet material, an amorphous alloy sheet having excellent internal and surface properties can be obtained.
With respect to this process, the amorphous coating and the thin plate substrate must be in close contact immediately after spraying and during rolling and peel off after rolling. When the thin plate base material is pickled and iron with a surface roughness Ra of 1 to 2 μm and a linear expansion coefficient of 11 × 10 -6 / ° C, there are various materials such as stainless steel and aluminum for the thin plate base material. It is also possible to match the expansion coefficient), and since the thermal shrinkage rate differs greatly, an amorphous film with poor adhesion (for example, Ni base having a linear expansion coefficient of 17 × 10 −6 / ° C.) may be peeled off before rolling. Therefore, the surface of the thin plate base material is polished and the surface roughness is set to 2 to 5 μm in Ra to improve the adhesion between the amorphous film and the thin plate base material and roll.
On the other hand, an amorphous film (for example, Fe base having a linear expansion coefficient of 11 × 10 −6 / ° C.) having a close thermal contraction rate and good adhesion to the thin plate base material is not polished because it does not peel before rolling. A separating material is applied or sprayed on the surface of an amorphous alloy film (eg Fe base) having good adhesion. By using a different diameter single-drive rolling mill in which the upper and lower rolls have a diameter difference and only one of the upper and lower rolls is driven or an ordinary four-stage {two-stage} rolling mill, The alloy thin plate is preferably peeled from the thin plate base material. Separating agent and different diameter single drive rolling are for peeling the amorphous alloy sheet from the sheet substrate.
上記発明を実施するための装置としては、薄板基材を払い出すペイオフリールと、当該薄板基材の表面を平滑にする表面処理装置(研磨装置。たとえばエアーブラスト)と当該基材薄板の形状補正を行うためのレベラーと、分離材の塗布機もしくは噴霧機と、基材薄板の加熱装置と、アモルファス合金皮膜を形成する噴射装置(大型超急冷遷移制御装置)と、異径片駆動又は通常の4段(2段)圧延機と、アモルファス合金薄板形成後の保温・冷却用の装置と上記薄板基材を巻き取る巻取機と、アモルファス合金薄板を巻き取る巻取機を有するものが好ましい。使用する圧延機のロールにヒーターを内蔵させ、ロールを加熱してその表面温度を調整できるようにすると有利である。
As an apparatus for carrying out the invention, there are a pay-off reel for paying out a thin plate base material, a surface treatment device (abrasive device, for example, air blast) for smoothing the surface of the thin plate base material, and shape correction of the base plate thin plate. Leveler, separator applicator or sprayer, substrate thin plate heating device, amorphous alloy film-forming injection device (large super-quenching transition control device), different diameter single drive or normal A four-stage (two-stage) rolling mill, an apparatus for heat insulation and cooling after forming the amorphous alloy thin plate, a winder for winding the thin plate base material, and a winder for winding the amorphous alloy thin plate are preferable. It is advantageous to incorporate a heater in the roll of the rolling mill to be used so that the surface temperature can be adjusted by heating the roll.
あるいはまた上記のようにアモルファス合金薄板と基材薄板を分離するのではなく、薄板基材の表面粗さをRaで2~5μmにするとともに、上記圧延機として上下ロール径が等しく上下両ロールが駆動される同径両駆動方式を使用することにより、アモルファス合金皮膜の一貫孔や空孔を低減するだけでなく、薄板基材に対するアモルファス合金皮膜コーティング層の密着度を向上させる(アモルファス皮膜コーティング板を得る)こともできる。
上記発明を実施するための装置としては、薄板基材を払い出すペイオフリールと、当該薄板基材の形状補正を行うためのレベラーと、当該薄板基材の表面を平滑にする表面処理装置(研磨装置。たとえばエアーブラスト)と、薄板基材の加熱装置と、アモルファス合金皮膜を形成する溶射装置と、同径両駆動とされる圧延機と、作製されたアモルファス合金皮膜コーティング薄板を巻き取る巻取機とアモルファス合金薄板形成時の保温・冷却用の装置を有するものがよい。これについて使用する同径両駆動の圧延機に関しても、ロールにヒーターを内蔵させ、ロールを加熱してその表面温度を調整できるようにすると有利である。 Alternatively, instead of separating the amorphous alloy thin plate and the substrate thin plate as described above, the surface roughness of the thin plate substrate is set to 2 to 5 μm in Ra, and the upper and lower rolls have the same upper and lower roll diameters as the rolling mill. By using the same-diameter dual drive system that is driven, not only the consistent holes and voids of the amorphous alloy film are reduced, but also the adhesion of the amorphous alloy film coating layer to the thin plate substrate is improved (amorphous film coating plate Can also be obtained).
As an apparatus for carrying out the invention, there are a payoff reel for paying out a thin plate substrate, a leveler for correcting the shape of the thin plate substrate, and a surface treatment device (polishing) for smoothing the surface of the thin plate substrate. Equipment (for example, air blasting), heating device for thin plate base material, thermal spraying device for forming amorphous alloy coating, rolling mill driven by the same diameter, and winding for winding the produced amorphous alloy coating coated thin plate It is preferable to have a machine and a device for heat insulation and cooling when forming an amorphous alloy thin plate. For the same-diameter dual-drive rolling mill used for this, it is advantageous to incorporate a heater in the roll so that the roll can be heated to adjust the surface temperature.
上記発明を実施するための装置としては、薄板基材を払い出すペイオフリールと、当該薄板基材の形状補正を行うためのレベラーと、当該薄板基材の表面を平滑にする表面処理装置(研磨装置。たとえばエアーブラスト)と、薄板基材の加熱装置と、アモルファス合金皮膜を形成する溶射装置と、同径両駆動とされる圧延機と、作製されたアモルファス合金皮膜コーティング薄板を巻き取る巻取機とアモルファス合金薄板形成時の保温・冷却用の装置を有するものがよい。これについて使用する同径両駆動の圧延機に関しても、ロールにヒーターを内蔵させ、ロールを加熱してその表面温度を調整できるようにすると有利である。 Alternatively, instead of separating the amorphous alloy thin plate and the substrate thin plate as described above, the surface roughness of the thin plate substrate is set to 2 to 5 μm in Ra, and the upper and lower rolls have the same upper and lower roll diameters as the rolling mill. By using the same-diameter dual drive system that is driven, not only the consistent holes and voids of the amorphous alloy film are reduced, but also the adhesion of the amorphous alloy film coating layer to the thin plate substrate is improved (amorphous film coating plate Can also be obtained).
As an apparatus for carrying out the invention, there are a payoff reel for paying out a thin plate substrate, a leveler for correcting the shape of the thin plate substrate, and a surface treatment device (polishing) for smoothing the surface of the thin plate substrate. Equipment (for example, air blasting), heating device for thin plate base material, thermal spraying device for forming amorphous alloy coating, rolling mill driven by the same diameter, and winding for winding the produced amorphous alloy coating coated thin plate It is preferable to have a machine and a device for heat insulation and cooling when forming an amorphous alloy thin plate. For the same-diameter dual-drive rolling mill used for this, it is advantageous to incorporate a heater in the roll so that the roll can be heated to adjust the surface temperature.
上記のようなアモルファス板の製造装置において、アモルファス合金皮膜を形成する上記噴射装置(大型超急冷遷移制御噴射機)としては、
・材料粒子を含む火炎を上記基材に向けて噴射ガンより噴射し、当該材料粒子を火炎によって溶融させたうえ、当該材料粒子および火炎を上記基材に達する前から冷却する装置であって、
・噴射ガンの前面に、材料粒子噴射口および火炎噴射口が上記基材の幅方向に150mm以上連続的に設けられるとともに、
・それら材料粒子噴射口および火炎噴射口をはさむ両側の位置に、火炎を整流し冷却するための不活性ガス(窒素ガス等)の噴射口と、火炎を冷却するための液体ミスト(水ミスト等)の噴射口とが、上記基材の幅方向に150mm以上連続的に設けられている装置
を使用するのがよい。
そのように幅の広い噴射装置を使用することにより、幅の広いアモルファス板を効率的に製造できるからである。幅が150mm以上ある高火力の火炎(材料粒子を含むもの)を噴射する場合には、火炎を適切に整流するとともに十分に冷却する必要があるが、上記の装置なら、火炎のすぐ外側に流す不活性ガスがその整流と部分的な冷却とを行い、さらに外側に流す液体ミストが火炎の冷却を強力に補うため、必要な整流と冷却とを実現して、幅の広いアモルファス皮膜の形成を可能にする。
また、アモルファス合金皮膜を形成する噴射装置の火炎の付近には集塵フードを設け、噴射装置からの大量の発生ガスを、集塵フードに向けて別途供給する水ミストにより冷却しながら当該集塵フードより吸引して集塵機へ送るよう構成するのが好ましい。 In the amorphous plate manufacturing apparatus as described above, as the above-mentioned injection device (large-scale ultra-quick transition transition injection device) for forming an amorphous alloy film,
A device that sprays a flame containing material particles from the spray gun toward the base material, melts the material particles by the flame, and cools the material particles and the flame before reaching the base material,
-On the front surface of the spray gun, the material particle spray port and the flame spray port are continuously provided in the width direction of the substrate at least 150 mm,
・ Inert gas (nitrogen gas, etc.) injection ports for rectifying and cooling the flame, and liquid mist (water mist, etc.) for cooling the flames at positions on both sides of the material particle injection port and flame injection port It is advisable to use an apparatus in which the nozzle is continuously provided with 150 mm or more in the width direction of the substrate.
This is because a wide amorphous plate can be efficiently manufactured by using such a wide injection device. When injecting a high-power flame (including material particles) with a width of 150 mm or more, it is necessary to properly rectify the flame and cool it sufficiently, but with the above device, it flows just outside the flame The inert gas performs its rectification and partial cooling, and the liquid mist that flows to the outside strongly supplements the cooling of the flame, thus realizing the necessary rectification and cooling to form a wide amorphous film. enable.
In addition, a dust collection hood is provided in the vicinity of the flame of the injection device that forms the amorphous alloy film, and the dust collection hood is cooled while being cooled by water mist separately supplied to the dust collection hood. It is preferable that the hood is sucked and sent to the dust collector.
・材料粒子を含む火炎を上記基材に向けて噴射ガンより噴射し、当該材料粒子を火炎によって溶融させたうえ、当該材料粒子および火炎を上記基材に達する前から冷却する装置であって、
・噴射ガンの前面に、材料粒子噴射口および火炎噴射口が上記基材の幅方向に150mm以上連続的に設けられるとともに、
・それら材料粒子噴射口および火炎噴射口をはさむ両側の位置に、火炎を整流し冷却するための不活性ガス(窒素ガス等)の噴射口と、火炎を冷却するための液体ミスト(水ミスト等)の噴射口とが、上記基材の幅方向に150mm以上連続的に設けられている装置
を使用するのがよい。
そのように幅の広い噴射装置を使用することにより、幅の広いアモルファス板を効率的に製造できるからである。幅が150mm以上ある高火力の火炎(材料粒子を含むもの)を噴射する場合には、火炎を適切に整流するとともに十分に冷却する必要があるが、上記の装置なら、火炎のすぐ外側に流す不活性ガスがその整流と部分的な冷却とを行い、さらに外側に流す液体ミストが火炎の冷却を強力に補うため、必要な整流と冷却とを実現して、幅の広いアモルファス皮膜の形成を可能にする。
また、アモルファス合金皮膜を形成する噴射装置の火炎の付近には集塵フードを設け、噴射装置からの大量の発生ガスを、集塵フードに向けて別途供給する水ミストにより冷却しながら当該集塵フードより吸引して集塵機へ送るよう構成するのが好ましい。 In the amorphous plate manufacturing apparatus as described above, as the above-mentioned injection device (large-scale ultra-quick transition transition injection device) for forming an amorphous alloy film,
A device that sprays a flame containing material particles from the spray gun toward the base material, melts the material particles by the flame, and cools the material particles and the flame before reaching the base material,
-On the front surface of the spray gun, the material particle spray port and the flame spray port are continuously provided in the width direction of the substrate at least 150 mm,
・ Inert gas (nitrogen gas, etc.) injection ports for rectifying and cooling the flame, and liquid mist (water mist, etc.) for cooling the flames at positions on both sides of the material particle injection port and flame injection port It is advisable to use an apparatus in which the nozzle is continuously provided with 150 mm or more in the width direction of the substrate.
This is because a wide amorphous plate can be efficiently manufactured by using such a wide injection device. When injecting a high-power flame (including material particles) with a width of 150 mm or more, it is necessary to properly rectify the flame and cool it sufficiently, but with the above device, it flows just outside the flame The inert gas performs its rectification and partial cooling, and the liquid mist that flows to the outside strongly supplements the cooling of the flame, thus realizing the necessary rectification and cooling to form a wide amorphous film. enable.
In addition, a dust collection hood is provided in the vicinity of the flame of the injection device that forms the amorphous alloy film, and the dust collection hood is cooled while being cooled by water mist separately supplied to the dust collection hood. It is preferable that the hood is sucked and sent to the dust collector.
本発明によれば、アモルファス合金のみからなる薄板、または表面にアモルファス合金皮膜を有するコーティング板を円滑に製造することができ、その厚みをたとえば300μm以上に、幅寸法をたとえば300mm以上に拡大することも可能である。圧延機で圧下することでアモルファス合金について表面を平滑にするとともに内部に空孔を含まないようにできる効果もある。
上記のように好ましい薄板を製造できることから、アモルファス合金薄板が工業用部材として適用できる範囲が大幅に増える。又、アモルファス合金皮膜コーティング板はメッキ材の代わりに適用することで建材、壁材、屋根材の耐久性を上げることができる。 According to the present invention, a thin plate made of only an amorphous alloy or a coating plate having an amorphous alloy film on its surface can be smoothly produced, and the thickness is increased to, for example, 300 μm or more, and the width dimension, for example, to 300 mm or more. Is also possible. By rolling down with a rolling mill, there is an effect that the surface of the amorphous alloy can be smoothed and no voids can be contained therein.
Since a preferable thin plate can be manufactured as described above, the range in which an amorphous alloy thin plate can be applied as an industrial member is greatly increased. In addition, the amorphous alloy film coating plate can be applied in place of the plating material to increase the durability of building materials, wall materials, and roof materials.
上記のように好ましい薄板を製造できることから、アモルファス合金薄板が工業用部材として適用できる範囲が大幅に増える。又、アモルファス合金皮膜コーティング板はメッキ材の代わりに適用することで建材、壁材、屋根材の耐久性を上げることができる。 According to the present invention, a thin plate made of only an amorphous alloy or a coating plate having an amorphous alloy film on its surface can be smoothly produced, and the thickness is increased to, for example, 300 μm or more, and the width dimension, for example, to 300 mm or more. Is also possible. By rolling down with a rolling mill, there is an effect that the surface of the amorphous alloy can be smoothed and no voids can be contained therein.
Since a preferable thin plate can be manufactured as described above, the range in which an amorphous alloy thin plate can be applied as an industrial member is greatly increased. In addition, the amorphous alloy film coating plate can be applied in place of the plating material to increase the durability of building materials, wall materials, and roof materials.
本発明の装置は、アモルファス合金の板厚300μm 以上の製造を可能とする大型超急冷遷移制御噴射機(すなわち噴射装置。冷却能力;最大百万度/秒以上。図1)を装備した連続製造設備(図6)である。大型超急冷遷移制御噴射機は、幅方向に均等間隔で材料噴射孔が配列されて、その外側にガス噴射孔があり、そこからガスを噴射し材料を溶融し、水ミスト等で急冷をする構造をもったガスガンであって、幅方向に均一に材料を噴射する為、幅方向に均一厚みの薄板が出来るものである。
The apparatus of the present invention is a continuous production equipped with a large-scale ultra-quenching transition control injector (that is, an injection device. Cooling capacity: more than 1 million degrees per second. Fig. 1) that enables the production of amorphous alloy with a thickness of 300 µm or more. Equipment (FIG. 6). The large super rapid cooling transition control injector has material injection holes arranged at equal intervals in the width direction, and has gas injection holes on the outer side. The gas is injected from there to melt the material, and quenching with water mist etc. The gas gun has a structure, and since a material is uniformly injected in the width direction, a thin plate having a uniform thickness in the width direction can be formed.
大型超急冷遷移制御噴射機は、図1のように構成されている。すなわち、
a)材料粒子を含む火炎aの横断面を横長(幅約300mm)のものにするよう、溶射ガン21の前面に、材料粒子噴射口25および火炎噴射口26を、直線に沿ってそれぞれ複数個連続的に配置している。
b)それら材料粒子噴射口25および火炎噴射口26をはさむ両側の位置に、火炎aを整流し冷却するための窒素ガス(不活性ガス)bの噴射口27を、上記直線に沿って複数個連続的に配置している。
c)上記の材料粒子噴射口25、火炎噴射口26および不活性ガスの噴射口27をはさむ両側の位置に、火炎aを冷却するための水ミストcの噴射口24を、上記直線に沿ったスリットとして、ミストノズル23に設けている。
水ミストcの噴射口24は、噴射するミストcが上記火炎aに接近するように角度を定めていて、かつその角度は材料粒子の化学成分等に応じて変更することができる。また、窒素ガスbおよび水ミストcの噴射圧力も同様に変更可能である。窒素ガスbおよび水ミストcの作用によって、火炎(材料粒子を含む火炎)aの冷却速度は40万~100万℃/秒に達する。
なお、水ミストcは、高火力の火炎aとの接触によって酸素と水素とに分解し、火炎a中の酸素量を過剰気味にするため、火炎噴射口26から噴射される酸素の量を減らし、完全燃焼に必要な酸素量の50~80%とする。 The large ultra-quenching transition control injector is configured as shown in FIG. That is,
a) A plurality of material particle injection holes 25 and a plurality of flame injection holes 26 are provided along the straight line on the front surface of thespray gun 21 so that the cross section of the flame a containing the material particles is a horizontally long (about 300 mm width). They are arranged continuously.
b) A plurality of nitrogen gas (inert gas)b injection ports 27 for rectifying and cooling the flame a at the positions on both sides of the material particle injection port 25 and the flame injection port 26 along the straight line. They are arranged continuously.
c) At the positions on both sides of the materialparticle injection port 25, the flame injection port 26 and the inert gas injection port 27, the water mist c injection port 24 for cooling the flame a is aligned along the straight line. A slit is provided in the mist nozzle 23.
The water mistc injection port 24 is angled so that the mist c to be injected approaches the flame a, and the angle can be changed according to the chemical composition of the material particles. Further, the injection pressures of the nitrogen gas b and the water mist c can be similarly changed. Due to the action of nitrogen gas b and water mist c, the cooling rate of flame (a flame containing material particles) a reaches 400,000 to 1 million ° C./second.
The water mist c is decomposed into oxygen and hydrogen by contact with the high thermal power flame a, and the amount of oxygen in the flame a is excessively reduced, so the amount of oxygen injected from theflame injection port 26 is reduced. , 50-80% of the amount of oxygen required for complete combustion.
a)材料粒子を含む火炎aの横断面を横長(幅約300mm)のものにするよう、溶射ガン21の前面に、材料粒子噴射口25および火炎噴射口26を、直線に沿ってそれぞれ複数個連続的に配置している。
b)それら材料粒子噴射口25および火炎噴射口26をはさむ両側の位置に、火炎aを整流し冷却するための窒素ガス(不活性ガス)bの噴射口27を、上記直線に沿って複数個連続的に配置している。
c)上記の材料粒子噴射口25、火炎噴射口26および不活性ガスの噴射口27をはさむ両側の位置に、火炎aを冷却するための水ミストcの噴射口24を、上記直線に沿ったスリットとして、ミストノズル23に設けている。
水ミストcの噴射口24は、噴射するミストcが上記火炎aに接近するように角度を定めていて、かつその角度は材料粒子の化学成分等に応じて変更することができる。また、窒素ガスbおよび水ミストcの噴射圧力も同様に変更可能である。窒素ガスbおよび水ミストcの作用によって、火炎(材料粒子を含む火炎)aの冷却速度は40万~100万℃/秒に達する。
なお、水ミストcは、高火力の火炎aとの接触によって酸素と水素とに分解し、火炎a中の酸素量を過剰気味にするため、火炎噴射口26から噴射される酸素の量を減らし、完全燃焼に必要な酸素量の50~80%とする。 The large ultra-quenching transition control injector is configured as shown in FIG. That is,
a) A plurality of material particle injection holes 25 and a plurality of flame injection holes 26 are provided along the straight line on the front surface of the
b) A plurality of nitrogen gas (inert gas)
c) At the positions on both sides of the material
The water mist
The water mist c is decomposed into oxygen and hydrogen by contact with the high thermal power flame a, and the amount of oxygen in the flame a is excessively reduced, so the amount of oxygen injected from the
酸洗した薄板基材(コイル)をペイオフリールにはめ込み、薄板基材の先端をピンチロールでラインに誘導して、レベラーを通して、薄板基材の形状修正や巻き癖を修正する。薄板基材を、後に噴射されるアモルファス金属の塑性流動性を維持できる温度(200~520度)まで、赤外線加熱機を含めた加熱装置で板幅、長さ方向を均一(±10度)に加熱する。そして、その基材上に粉末材料を大型超急冷遷移制御噴射機によって溶射し、アモルファス合金皮膜を形成させ、アモルファス合金皮膜が冷えない塑性流動性が良好な状態の内に、圧延機で圧延をする。此れで、薄板内部の一貫孔や空孔が無いアモルファス金属薄板(図2 アモルファス薄板の断面)が作製される。
以降、大型超急冷遷移制御噴射機で薄板基材に噴射したものをアモルファス合金皮膜、圧延機で圧下した後、薄板基材から分離したものをアモルファス合金薄板、薄板基材から分離させない場合は、その板をアモルファス合金皮膜コーティング板と呼ぶ。また、アモルファス合金薄板とアモルファス合金皮膜コーティング板とを総称して、アモルファス板と呼ぶ。
上記圧延の時の圧延温度はアモルファス金属薄板がアモルファス合金であっても金属ガラスであっても、塑性流動体領域(温度200~520度)である。圧延機での圧下率はアモルファス合金薄板の厚みの2~30%で圧延速度は2~20m/分である。
あらかじめ基材に分離剤塗布機で分離剤を塗布した場合は(図3)、圧延後、薄板基材よりアモルファス合金薄板を分離し、薄板基材とアモルファス合金薄板を別々に巻取り、アモルファス合金薄板を製造することができる。此れは、従来の製造寸法を超えたアモルファス合金薄板を得ようとするものである。又ここで使用する圧延機の方式は普通の4段(2段)でも良いが、より良い分離性を良くする為に異径片駆動方式(図4)を採用しても良い。異径片駆動方式で圧延する利点は、上下ロール径が違う事により、薄板の表面の加工度がロール径の小さい方が大きくなることを利用し、上ロールのロール径が下ロールのロール径より小さい場合は、上側にアモルファス金属薄板が反ることを利用し、薄板基材とアモルファス合金薄板を分離できることである。
図3には、薄板基材表面への分離剤の塗布(噴霧による塗布)状態を示す概念図、および分離剤塗布装置の構成図(系統図)を示している。分離剤塗布装置は、グリースタンク内にある分離剤(グリース等)を、それぞれにポンプおよび噴射ノズルを有する複数の系統を介して薄板基材上に噴射する。
なお、ここで使用している分離剤は、粒子径が1~10μmの界面活性剤と、同様の粒子径の固体潤滑剤(Si等)からなり、薄板基材に塗布することで、アモルファス合金皮膜形成時に当該皮膜と薄板基材との剥離性をよくする。表1に代表的なものの成分と分離効果を示す。
The pickled thin plate base material (coil) is fitted into a payoff reel, the tip of the thin plate base material is guided to a line with a pinch roll, and the shape correction and curl of the thin plate base material are corrected through the leveler. The sheet width and length direction are made uniform (± 10 degrees) with a heating device including an infrared heater up to a temperature (200 to 520 degrees) that can maintain the plastic fluidity of the amorphous metal injected later on the thin plate substrate. Heat. Then, the powder material is sprayed on the base material with a large ultra-quick quench transition control jet to form an amorphous alloy film, and the amorphous alloy film does not cool, and is rolled with a rolling mill while the plastic fluidity is good. To do. Thus, an amorphous metal thin plate (FIG. 2 cross-section of the amorphous thin plate) having no consistent holes or voids inside the thin plate is produced.
After that, what was sprayed on the thin plate substrate with a large ultra-quick transition control injector, amorphous alloy film, after rolling down with a rolling mill, what was separated from the thin plate substrate, amorphous alloy thin plate, when not separating from the thin plate substrate, The plate is called an amorphous alloy film coated plate. Moreover, an amorphous alloy thin plate and an amorphous alloy film coating plate are generically called an amorphous plate.
The rolling temperature at the time of rolling is a plastic fluid region (temperature of 200 to 520 degrees) regardless of whether the amorphous metal thin plate is an amorphous alloy or metal glass. The rolling reduction in the rolling mill is 2-30% of the thickness of the amorphous alloy sheet, and the rolling speed is 2-20 m / min.
When the separating agent is applied to the base material in advance with a separating agent applicator (Fig. 3), after rolling, the amorphous alloy thin plate is separated from the thin plate base material, and the thin plate base material and the amorphous alloy thin plate are wound up separately to form an amorphous alloy. Thin plates can be manufactured. This is to obtain an amorphous alloy thin plate exceeding the conventional manufacturing dimensions. The rolling mill system used here may be an ordinary four-stage (two-stage) system, but a different diameter piece drive system (FIG. 4) may be employed in order to improve the separability. The advantage of rolling with a different diameter single drive method is that the upper and lower roll diameters are larger when the roll diameter of the upper and lower rolls is different, and the smaller the roll diameter, the higher the roll diameter of the upper roll. If it is smaller, the thin metal substrate and the amorphous alloy thin plate can be separated by utilizing the fact that the amorphous metal thin plate warps upward.
FIG. 3 shows a conceptual diagram showing the state of application (application by spraying) of the separating agent to the surface of the thin plate substrate, and a configuration diagram (system diagram) of the separating agent applying apparatus. The separating agent application device sprays a separating agent (such as grease) in a grease tank onto a thin plate substrate through a plurality of systems each having a pump and an injection nozzle.
The separating agent used here consists of a surfactant with a particle size of 1 to 10 μm and a solid lubricant (Si, etc.) with the same particle size. When the film is formed, the peelability between the film and the thin plate substrate is improved. Table 1 shows typical components and separation effects.
以降、大型超急冷遷移制御噴射機で薄板基材に噴射したものをアモルファス合金皮膜、圧延機で圧下した後、薄板基材から分離したものをアモルファス合金薄板、薄板基材から分離させない場合は、その板をアモルファス合金皮膜コーティング板と呼ぶ。また、アモルファス合金薄板とアモルファス合金皮膜コーティング板とを総称して、アモルファス板と呼ぶ。
上記圧延の時の圧延温度はアモルファス金属薄板がアモルファス合金であっても金属ガラスであっても、塑性流動体領域(温度200~520度)である。圧延機での圧下率はアモルファス合金薄板の厚みの2~30%で圧延速度は2~20m/分である。
あらかじめ基材に分離剤塗布機で分離剤を塗布した場合は(図3)、圧延後、薄板基材よりアモルファス合金薄板を分離し、薄板基材とアモルファス合金薄板を別々に巻取り、アモルファス合金薄板を製造することができる。此れは、従来の製造寸法を超えたアモルファス合金薄板を得ようとするものである。又ここで使用する圧延機の方式は普通の4段(2段)でも良いが、より良い分離性を良くする為に異径片駆動方式(図4)を採用しても良い。異径片駆動方式で圧延する利点は、上下ロール径が違う事により、薄板の表面の加工度がロール径の小さい方が大きくなることを利用し、上ロールのロール径が下ロールのロール径より小さい場合は、上側にアモルファス金属薄板が反ることを利用し、薄板基材とアモルファス合金薄板を分離できることである。
図3には、薄板基材表面への分離剤の塗布(噴霧による塗布)状態を示す概念図、および分離剤塗布装置の構成図(系統図)を示している。分離剤塗布装置は、グリースタンク内にある分離剤(グリース等)を、それぞれにポンプおよび噴射ノズルを有する複数の系統を介して薄板基材上に噴射する。
なお、ここで使用している分離剤は、粒子径が1~10μmの界面活性剤と、同様の粒子径の固体潤滑剤(Si等)からなり、薄板基材に塗布することで、アモルファス合金皮膜形成時に当該皮膜と薄板基材との剥離性をよくする。表1に代表的なものの成分と分離効果を示す。
After that, what was sprayed on the thin plate substrate with a large ultra-quick transition control injector, amorphous alloy film, after rolling down with a rolling mill, what was separated from the thin plate substrate, amorphous alloy thin plate, when not separating from the thin plate substrate, The plate is called an amorphous alloy film coated plate. Moreover, an amorphous alloy thin plate and an amorphous alloy film coating plate are generically called an amorphous plate.
The rolling temperature at the time of rolling is a plastic fluid region (temperature of 200 to 520 degrees) regardless of whether the amorphous metal thin plate is an amorphous alloy or metal glass. The rolling reduction in the rolling mill is 2-30% of the thickness of the amorphous alloy sheet, and the rolling speed is 2-20 m / min.
When the separating agent is applied to the base material in advance with a separating agent applicator (Fig. 3), after rolling, the amorphous alloy thin plate is separated from the thin plate base material, and the thin plate base material and the amorphous alloy thin plate are wound up separately to form an amorphous alloy. Thin plates can be manufactured. This is to obtain an amorphous alloy thin plate exceeding the conventional manufacturing dimensions. The rolling mill system used here may be an ordinary four-stage (two-stage) system, but a different diameter piece drive system (FIG. 4) may be employed in order to improve the separability. The advantage of rolling with a different diameter single drive method is that the upper and lower roll diameters are larger when the roll diameter of the upper and lower rolls is different, and the smaller the roll diameter, the higher the roll diameter of the upper roll. If it is smaller, the thin metal substrate and the amorphous alloy thin plate can be separated by utilizing the fact that the amorphous metal thin plate warps upward.
FIG. 3 shows a conceptual diagram showing the state of application (application by spraying) of the separating agent to the surface of the thin plate substrate, and a configuration diagram (system diagram) of the separating agent applying apparatus. The separating agent application device sprays a separating agent (such as grease) in a grease tank onto a thin plate substrate through a plurality of systems each having a pump and an injection nozzle.
The separating agent used here consists of a surfactant with a particle size of 1 to 10 μm and a solid lubricant (Si, etc.) with the same particle size. When the film is formed, the peelability between the film and the thin plate substrate is improved. Table 1 shows typical components and separation effects.
アモルファス合金薄板を製造するための設備を図6および図7に示す。
この設備は、薄板基材の表面に溶射によってアモルファス合金皮膜を形成し、その後、圧延して空孔・一貫孔をなくし、アモルファス合金薄板を薄板基材から剥離して回収するものである。以下、この設備について詳説する。 Equipment for producing amorphous alloy sheets is shown in FIGS. 6 and 7. FIG.
In this equipment, an amorphous alloy film is formed on the surface of a thin plate substrate by thermal spraying, and thereafter rolled to eliminate voids / consistent holes, and the amorphous alloy thin plate is peeled off from the thin plate substrate and collected. This facility will be described in detail below.
この設備は、薄板基材の表面に溶射によってアモルファス合金皮膜を形成し、その後、圧延して空孔・一貫孔をなくし、アモルファス合金薄板を薄板基材から剥離して回収するものである。以下、この設備について詳説する。 Equipment for producing amorphous alloy sheets is shown in FIGS. 6 and 7. FIG.
In this equipment, an amorphous alloy film is formed on the surface of a thin plate substrate by thermal spraying, and thereafter rolled to eliminate voids / consistent holes, and the amorphous alloy thin plate is peeled off from the thin plate substrate and collected. This facility will be described in detail below.
設備の具体的な形態
図6のラインを構成する基本的な機器とその機能は、つぎのとおりである。
(1)ペイオフリール:薄板基材コイルを受け入れるためのものである。
(2)研磨装置:コンプレッサーで作った圧縮エアーを使って基材表面に研削材を噴射するものである。
(3)分離剤塗布及び噴霧装置:アモルファス合金薄板と薄板基材を分離し易くするため分離材を塗布する装置である。なお、薄板基材加熱装置と超急冷遷移制御噴射機の間に設けるのもよい。
(4)予熱機:薄板基材を常温から350度まで加熱するものである。今回はプロパンバーナーを幅方向に2列配列した。ここで薄板基材は防錆油の塗布されていない酸洗材を使用するが、防錆油を塗布した薄板と同一酸洗ラインで製造されるために、極少量の防錆油が残る。此れが加熱されて表面に炭化物がでて、アモルファス合金皮膜と薄板基材の密着性を低下させる。そこでプロパンバーナーに対して必要酸素量を0.8~0.7まで減らし加熱すると還元性雰囲気となり、防錆油起因の黒鉛を発生させない役割も担う
(5)レベラー: 薄板基材の加熱により崩れた形状補正を行うものである。
(6)薄板基材加熱、均熱装置:薄板を200~520℃に加熱するものである。薄板加熱温度が200℃より低い場合は、噴射により生成したアモルファス合金を圧延する場合、塑性流動性が不足しアモルファス皮膜が割れる。一方、薄板基材を520℃より高く加熱すると、合金粉末を溶融したものを大型超急冷遷移制御噴射機にて噴射時に結晶化温度以上になるためアモルファス合金皮膜が生成しない。ここでの設備は赤外線方式を採用した。
(7)大型超急冷遷移制御噴射機: アモルファス合金皮膜作製装置。本アモルファス合金皮膜およびアモルファス合金薄板製造の根幹をなす装置である。構成等は前記(図1参照)のとおりである。
(8)集塵機:圧延機前面に設置している集塵機は、噴射後のアモルファス合金残粉の回収と大型超急冷遷移制御噴射機で使用した余剰ガスを回収する事である。アモルファス合金粉末を溶融するために使用するガスエネルギーは全体の10%以下である。そのために余剰ガスの回収を行わないと、圧延機周りの雰囲気温度は450度、薄板基材上のアモルファス合金皮膜表面は600度以上にもなり、アモルファス化した皮膜が結晶化しはじめる。集塵機内部は大量のガスを回収するため高温となる為、集塵機は勿論、集塵機前の配管内も含めて水ミストで冷却し集塵機内温度が80℃以下になるよう制御している。集塵フード等の配置を図5に示す。集塵フードは図示のように、薄板基材の通過位置の左右と、圧延機の上部を囲む位置とに設け、それらに向けて冷却用の水ミストを噴射する。各集塵フードに接続された吸引ダクト内にも冷却用の水ミストを噴射し、そのダクトを通じて吸引ガスを集塵機本体(図示省略)に送っている。
(9)異径片駆動圧延機(又は2段、4段同径ロール圧延機):アモルファス合金皮膜を圧下し一貫孔・空孔を潰すと同時に、薄板基材およびアモルファス合金皮膜の上・下の加工度を変えることで、アモルファス合金皮膜に上反りを与え、アモルファス合金皮膜と薄板基材を分離させ、アモルファス合金薄板とする。この圧延機のうち少なくともアモルファス合金皮膜と接する側の作業ロールを、バーヒーター等を内蔵した温度調節可能なものとすると好ましい。
(10)薄板基材巻取り機:分離させた薄板基材を巻き取る。
(11)アモルファス合金薄板巻き取り機:分離したアモルファス合金薄板を巻き取る。
図示の設備は、基本的にはこれら(1)~(11)からなるアモルファス合金薄板製造ラインである。
さらに(12)~(13)のような設備を追加してもよい。
(12)アモルファス合金薄板加熱装置:分離させたアモルファス合金薄板を塑性流動温度域で保持するもの。
(13)温間加工機:塑性流動温度に保持したアモルファス合金薄板を加工して成型するもの。 Specific Form of Equipment The basic equipment and functions that make up the line in FIG. 6 are as follows.
(1) Payoff reel: For receiving a thin plate base coil.
(2) Polishing device: Abrasive material is sprayed onto the substrate surface using compressed air made by a compressor.
(3) Separating agent coating and spraying device: A device for applying a separating material to facilitate separation of the amorphous alloy thin plate and the thin plate base material. In addition, it is good also to provide between a thin-plate base-material heating apparatus and a super quenching transition control injector.
(4) Preheater: A device for heating a thin plate base material from room temperature to 350 degrees. This time, two rows of propane burners were arranged in the width direction. Here, the thin plate base material uses a pickling material to which no rust preventive oil is applied, but since it is manufactured on the same pickling line as the thin plate coated with the rust preventive oil, a very small amount of the rust preventive oil remains. When this is heated, carbides appear on the surface, reducing the adhesion between the amorphous alloy film and the thin plate substrate. Therefore, reducing the required amount of oxygen to propane burner to 0.8 to 0.7 will result in a reducing atmosphere, and will also play a role in preventing the generation of graphite due to rust-preventing oil. (5) Leveler: Shape correction broken by heating the thin plate base material Is what you do.
(6) Thin plate substrate heating / soaking device: A device for heating a thin plate to 200 to 520 ° C. When the thin plate heating temperature is lower than 200 ° C., when rolling an amorphous alloy produced by injection, the plastic fluidity is insufficient and the amorphous film is cracked. On the other hand, when the thin plate base material is heated to a temperature higher than 520 ° C., the molten alloy powder becomes higher than the crystallization temperature at the time of injection with a large ultra-cooled transition control injector, so that an amorphous alloy film is not generated. The equipment here adopted an infrared system.
(7) Large-scale ultra-quick transition control injector: Amorphous alloy film production equipment. It is an apparatus that forms the basis of the production of this amorphous alloy film and amorphous alloy sheet. The configuration and the like are as described above (see FIG. 1).
(8) Dust collector: The dust collector installed at the front of the rolling mill is to recover the amorphous gas residue after injection and surplus gas used in the large ultra-quick transition control injector. The gas energy used to melt the amorphous alloy powder is less than 10% of the total. Therefore, if the surplus gas is not recovered, the ambient temperature around the rolling mill will be 450 degrees, the surface of the amorphous alloy film on the thin plate substrate will be 600 degrees or more, and the amorphous film will begin to crystallize. Since the inside of the dust collector becomes hot because a large amount of gas is collected, the dust collector and the piping before the dust collector are cooled with water mist and the temperature inside the dust collector is controlled to be 80 ° C or lower. Fig. 5 shows the arrangement of dust collection hoods. As shown in the figure, the dust collection hood is provided at the left and right of the passage position of the thin plate base material and the position surrounding the upper part of the rolling mill, and sprays water mist for cooling toward them. Water mist for cooling is also injected into suction ducts connected to each dust collection hood, and suction gas is sent to the dust collector main body (not shown) through the ducts.
(9) Different-diameter single-drive rolling mill (or 2-stage, 4-stage same-diameter rolling mill): The amorphous alloy film is crushed to crush consistent holes and pores, and at the same time, above and below the thin plate substrate and amorphous alloy film By changing the degree of processing, the amorphous alloy film is warped, and the amorphous alloy film and the thin plate base material are separated to form an amorphous alloy thin plate. In this rolling mill, it is preferable that at least the work roll on the side in contact with the amorphous alloy film is a temperature-adjustable one incorporating a bar heater or the like.
(10) Thin plate substrate winding machine: Winds the separated thin plate substrate.
(11) Amorphous alloy sheet take-up machine: Takes up the separated amorphous alloy sheet.
The equipment shown in the figure is basically an amorphous alloy thin plate production line composed of (1) to (11).
Furthermore, facilities such as (12) to (13) may be added.
(12) Amorphous alloy thin plate heating device: A device for holding a separated amorphous alloy thin plate in a plastic flow temperature range.
(13) Warm processing machine: A machine that processes and molds an amorphous alloy sheet kept at a plastic flow temperature.
図6のラインを構成する基本的な機器とその機能は、つぎのとおりである。
(1)ペイオフリール:薄板基材コイルを受け入れるためのものである。
(2)研磨装置:コンプレッサーで作った圧縮エアーを使って基材表面に研削材を噴射するものである。
(3)分離剤塗布及び噴霧装置:アモルファス合金薄板と薄板基材を分離し易くするため分離材を塗布する装置である。なお、薄板基材加熱装置と超急冷遷移制御噴射機の間に設けるのもよい。
(4)予熱機:薄板基材を常温から350度まで加熱するものである。今回はプロパンバーナーを幅方向に2列配列した。ここで薄板基材は防錆油の塗布されていない酸洗材を使用するが、防錆油を塗布した薄板と同一酸洗ラインで製造されるために、極少量の防錆油が残る。此れが加熱されて表面に炭化物がでて、アモルファス合金皮膜と薄板基材の密着性を低下させる。そこでプロパンバーナーに対して必要酸素量を0.8~0.7まで減らし加熱すると還元性雰囲気となり、防錆油起因の黒鉛を発生させない役割も担う
(5)レベラー: 薄板基材の加熱により崩れた形状補正を行うものである。
(6)薄板基材加熱、均熱装置:薄板を200~520℃に加熱するものである。薄板加熱温度が200℃より低い場合は、噴射により生成したアモルファス合金を圧延する場合、塑性流動性が不足しアモルファス皮膜が割れる。一方、薄板基材を520℃より高く加熱すると、合金粉末を溶融したものを大型超急冷遷移制御噴射機にて噴射時に結晶化温度以上になるためアモルファス合金皮膜が生成しない。ここでの設備は赤外線方式を採用した。
(7)大型超急冷遷移制御噴射機: アモルファス合金皮膜作製装置。本アモルファス合金皮膜およびアモルファス合金薄板製造の根幹をなす装置である。構成等は前記(図1参照)のとおりである。
(8)集塵機:圧延機前面に設置している集塵機は、噴射後のアモルファス合金残粉の回収と大型超急冷遷移制御噴射機で使用した余剰ガスを回収する事である。アモルファス合金粉末を溶融するために使用するガスエネルギーは全体の10%以下である。そのために余剰ガスの回収を行わないと、圧延機周りの雰囲気温度は450度、薄板基材上のアモルファス合金皮膜表面は600度以上にもなり、アモルファス化した皮膜が結晶化しはじめる。集塵機内部は大量のガスを回収するため高温となる為、集塵機は勿論、集塵機前の配管内も含めて水ミストで冷却し集塵機内温度が80℃以下になるよう制御している。集塵フード等の配置を図5に示す。集塵フードは図示のように、薄板基材の通過位置の左右と、圧延機の上部を囲む位置とに設け、それらに向けて冷却用の水ミストを噴射する。各集塵フードに接続された吸引ダクト内にも冷却用の水ミストを噴射し、そのダクトを通じて吸引ガスを集塵機本体(図示省略)に送っている。
(9)異径片駆動圧延機(又は2段、4段同径ロール圧延機):アモルファス合金皮膜を圧下し一貫孔・空孔を潰すと同時に、薄板基材およびアモルファス合金皮膜の上・下の加工度を変えることで、アモルファス合金皮膜に上反りを与え、アモルファス合金皮膜と薄板基材を分離させ、アモルファス合金薄板とする。この圧延機のうち少なくともアモルファス合金皮膜と接する側の作業ロールを、バーヒーター等を内蔵した温度調節可能なものとすると好ましい。
(10)薄板基材巻取り機:分離させた薄板基材を巻き取る。
(11)アモルファス合金薄板巻き取り機:分離したアモルファス合金薄板を巻き取る。
図示の設備は、基本的にはこれら(1)~(11)からなるアモルファス合金薄板製造ラインである。
さらに(12)~(13)のような設備を追加してもよい。
(12)アモルファス合金薄板加熱装置:分離させたアモルファス合金薄板を塑性流動温度域で保持するもの。
(13)温間加工機:塑性流動温度に保持したアモルファス合金薄板を加工して成型するもの。 Specific Form of Equipment The basic equipment and functions that make up the line in FIG. 6 are as follows.
(1) Payoff reel: For receiving a thin plate base coil.
(2) Polishing device: Abrasive material is sprayed onto the substrate surface using compressed air made by a compressor.
(3) Separating agent coating and spraying device: A device for applying a separating material to facilitate separation of the amorphous alloy thin plate and the thin plate base material. In addition, it is good also to provide between a thin-plate base-material heating apparatus and a super quenching transition control injector.
(4) Preheater: A device for heating a thin plate base material from room temperature to 350 degrees. This time, two rows of propane burners were arranged in the width direction. Here, the thin plate base material uses a pickling material to which no rust preventive oil is applied, but since it is manufactured on the same pickling line as the thin plate coated with the rust preventive oil, a very small amount of the rust preventive oil remains. When this is heated, carbides appear on the surface, reducing the adhesion between the amorphous alloy film and the thin plate substrate. Therefore, reducing the required amount of oxygen to propane burner to 0.8 to 0.7 will result in a reducing atmosphere, and will also play a role in preventing the generation of graphite due to rust-preventing oil. (5) Leveler: Shape correction broken by heating the thin plate base material Is what you do.
(6) Thin plate substrate heating / soaking device: A device for heating a thin plate to 200 to 520 ° C. When the thin plate heating temperature is lower than 200 ° C., when rolling an amorphous alloy produced by injection, the plastic fluidity is insufficient and the amorphous film is cracked. On the other hand, when the thin plate base material is heated to a temperature higher than 520 ° C., the molten alloy powder becomes higher than the crystallization temperature at the time of injection with a large ultra-cooled transition control injector, so that an amorphous alloy film is not generated. The equipment here adopted an infrared system.
(7) Large-scale ultra-quick transition control injector: Amorphous alloy film production equipment. It is an apparatus that forms the basis of the production of this amorphous alloy film and amorphous alloy sheet. The configuration and the like are as described above (see FIG. 1).
(8) Dust collector: The dust collector installed at the front of the rolling mill is to recover the amorphous gas residue after injection and surplus gas used in the large ultra-quick transition control injector. The gas energy used to melt the amorphous alloy powder is less than 10% of the total. Therefore, if the surplus gas is not recovered, the ambient temperature around the rolling mill will be 450 degrees, the surface of the amorphous alloy film on the thin plate substrate will be 600 degrees or more, and the amorphous film will begin to crystallize. Since the inside of the dust collector becomes hot because a large amount of gas is collected, the dust collector and the piping before the dust collector are cooled with water mist and the temperature inside the dust collector is controlled to be 80 ° C or lower. Fig. 5 shows the arrangement of dust collection hoods. As shown in the figure, the dust collection hood is provided at the left and right of the passage position of the thin plate base material and the position surrounding the upper part of the rolling mill, and sprays water mist for cooling toward them. Water mist for cooling is also injected into suction ducts connected to each dust collection hood, and suction gas is sent to the dust collector main body (not shown) through the ducts.
(9) Different-diameter single-drive rolling mill (or 2-stage, 4-stage same-diameter rolling mill): The amorphous alloy film is crushed to crush consistent holes and pores, and at the same time, above and below the thin plate substrate and amorphous alloy film By changing the degree of processing, the amorphous alloy film is warped, and the amorphous alloy film and the thin plate base material are separated to form an amorphous alloy thin plate. In this rolling mill, it is preferable that at least the work roll on the side in contact with the amorphous alloy film is a temperature-adjustable one incorporating a bar heater or the like.
(10) Thin plate substrate winding machine: Winds the separated thin plate substrate.
(11) Amorphous alloy sheet take-up machine: Takes up the separated amorphous alloy sheet.
The equipment shown in the figure is basically an amorphous alloy thin plate production line composed of (1) to (11).
Furthermore, facilities such as (12) to (13) may be added.
(12) Amorphous alloy thin plate heating device: A device for holding a separated amorphous alloy thin plate in a plastic flow temperature range.
(13) Warm processing machine: A machine that processes and molds an amorphous alloy sheet kept at a plastic flow temperature.
作業内容
アモルファス合金薄板を製造する場合、その手順を次のように行う。
(1) 薄板基材のセッティング
すなわち、薄板基材を予めペイオフリール~テンションリールにまでかけた状態にしておく。
(2) 通板の開始
上記のセッティングが完了するとペイオフリールを起動して、薄板基材を図示左から右の向きに送る。送られる薄板基材に対し、各機器によって同時に次の作業を行わせる。
(i)必要に応じてエヤーブラストにて表面を研削する。
(ii)分離材塗布装置により、分離剤を必要なアモルファス合金については薄板基材の全巾に塗布する。
(iii)薄板基材予熱装置で、残存している少量の防錆油を、黒鉛を残さないよう燃焼させる
(iv)レベラーで薄板基材の形状補正を実施する。
(v)薄板基材、加熱、均熱装置で通板しながら200℃から520℃の範囲で予熱する。
(vi)大型超急冷遷移制御噴射機でアモルファス合金皮膜を形成する。
(vii)圧延機にてアモルファス合金皮膜および薄板基材を圧延する。アモルファス合金成分・作製条件の違いから、大型超急冷遷移制御噴射機にてアモルファス合金皮膜を噴射してから0.1秒から10秒後に圧下率は2%から30%で圧下する。図8のように、熱電対17を用いてアモルファス皮膜16の表面温度を測定し、それに応じて薄板基材の加熱を制御する。基材温度は外気の気温に左右されて加熱、均熱炉出側で目標温度±30度のばらつきがでることがある。20度以上のバラツキについては予熱機のバーナー火力の調整し、20度以内では赤外線加熱、均熱炉の電気の出力で調整する。圧延機のうちアモルファス合金皮膜と接する側の作業ロール等が温度調節可能なものである場合には、圧延の際、そのロールの表面温度を200~520℃の範囲に保つとよい。
(viii)圧延後、分離したアモルファス合金薄板、薄板基材それぞれの巻き取り機にて巻き取りを行う。またアモルファス合金薄板巻き取り機の前に、アモルファス合金薄板予熱装置と温間加工機を置いて、アモルファス合金薄板から連続的に製品を製造する場合もある。
一方、アモルファス皮膜コーティング薄板を製造する場合は、その手順を次のように行う。
(1) 薄板基材のセッティング
すなわち、薄板基材を予めペイオフリール~テンションリールにまでかけた状態にしておく。
(2) 通板の開始
上記のセッティングが完了するとペイオフリールを起動して、薄板基材を図示左から右の向きに送る。送られる薄板基材に対し、各機器によって同時に次の作業を行わせる。
(i)必要に応じてエヤーブラストにて表面を研削して薄板基材表面の粗度を上げる。
(ii)分離材は塗布しない。
(iii)薄板基材予熱装置で、残存している少量の防錆油を、黒鉛を残さないよう燃焼させる。
(iv)レベラーで薄板基材の形状補正を実施する。
(v)薄板基材、加熱、均熱装置で通板しながら200℃から520℃の範囲で予熱する。
(vi)大型超急冷遷移制御噴射機でアモルファス合金皮膜を形成する。
(vii)圧延機にてアモルファス合金皮膜および薄板基材を圧延する。アモルファス合金成分・作製条件の違いから、大型超急冷遷移制御噴射機にてアモルファス合金皮膜を噴射してから0.1秒から10秒後に、同径ロールにおいて圧下率は2%から30%で圧下する。アモルファス皮膜コーティング薄板を製造する場合にも、圧延機のうち少なくともアモルファス合金皮膜と接する側の作業ロールを、バーヒーター等を内蔵した温度調節可能なものにするとよい。圧延の際、そのロール等の表面温度を200~520℃の範囲に保つことにより、アモルファス合金皮膜を塑性流動性温度に保持しやすいからである。
(viii)圧延後、アモルファス合金薄板と薄板を分離せず、薄板基材巻取り装置にて巻き取る。 Contents of work When manufacturing amorphous alloy sheet, the procedure is as follows.
(1) Setting of thin plate base material In other words, the thin plate base material is previously placed on the payoff reel to the tension reel.
(2) Start of threading When the above setting is completed, the payoff reel is activated to feed the thin plate base material from left to right in the figure. The following operations are simultaneously performed by each device on the thin plate substrate to be sent.
(i) Grind the surface with air blast as necessary.
(ii) Using a separating material coating apparatus, a separating agent is coated on the entire width of the thin plate base material for the required amorphous alloy.
(iii) A small amount of remaining rust preventive oil is burned in a thin plate base material preheating device so as not to leave graphite. (iv) The shape of the thin plate base material is corrected with a leveler.
(v) Preheat in the range of 200 ° C to 520 ° C while passing through a thin plate substrate, heating and soaking device.
(vi) An amorphous alloy film is formed with a large ultra-quickly cooled transition controlled injector.
(vii) Roll the amorphous alloy film and the thin plate base material with a rolling mill. Due to the difference in the amorphous alloy composition and production conditions, the rolling reduction is reduced from 2% to 30% 0.1 to 10 seconds after the amorphous alloy film is injected with a large ultra-quick transition control injector. As shown in FIG. 8, the surface temperature of theamorphous film 16 is measured using a thermocouple 17, and the heating of the thin plate base material is controlled accordingly. The base material temperature depends on the temperature of the outside air, and the target temperature ± 30 degrees may vary on the heating and soaking furnace exit side. For variations of 20 degrees or more, adjust the burner heating power of the preheater, and within 20 degrees, adjust it by infrared heating and the electrical output of the soaking furnace. If the temperature of the work roll on the side in contact with the amorphous alloy film in the rolling mill is adjustable, the surface temperature of the roll may be kept in the range of 200 to 520 ° C. during rolling.
(viii) After rolling, winding is performed with a winding machine for each of the separated amorphous alloy thin plate and thin plate base material. In some cases, an amorphous alloy thin plate preheating device and a warm processing machine are placed in front of the amorphous alloy thin plate winder to continuously produce products from the amorphous alloy thin plate.
On the other hand, when producing an amorphous film-coated thin plate, the procedure is performed as follows.
(1) Setting of thin plate base material In other words, the thin plate base material is previously placed on the payoff reel to the tension reel.
(2) Start of threading When the above setting is completed, the payoff reel is activated to feed the thin plate base material from left to right in the figure. The following operations are simultaneously performed by each device on the thin plate substrate to be sent.
(i) If necessary, the surface is ground by air blasting to increase the roughness of the surface of the thin plate substrate.
(ii) Do not apply separation material.
(iii) In a thin plate base material preheating device, a small amount of remaining rust preventive oil is burned so as not to leave graphite.
(iv) The shape of the thin plate substrate is corrected with a leveler.
(v) Preheat in the range of 200 ° C to 520 ° C while passing through a thin plate substrate, heating and soaking device.
(vi) An amorphous alloy film is formed with a large ultra-quickly cooled transition controlled injector.
(vii) Roll the amorphous alloy film and the thin plate base material with a rolling mill. Due to the difference in the amorphous alloy composition and production conditions, the rolling reduction ratio is 2% to 30% in the same diameter roll 0.1 to 10 seconds after the amorphous alloy film is sprayed with a large ultra-quick transition control injector. Even in the case of manufacturing an amorphous coating coated thin plate, it is preferable that the work roll on the side in contact with the amorphous alloy coating at least in the rolling mill is a temperature-adjustable one incorporating a bar heater or the like. This is because by maintaining the surface temperature of the roll or the like in the range of 200 to 520 ° C. during rolling, the amorphous alloy film can be easily maintained at the plastic fluidity temperature.
(viii) After rolling, the amorphous alloy thin plate and the thin plate are not separated and wound by a thin plate substrate winding device.
アモルファス合金薄板を製造する場合、その手順を次のように行う。
(1) 薄板基材のセッティング
すなわち、薄板基材を予めペイオフリール~テンションリールにまでかけた状態にしておく。
(2) 通板の開始
上記のセッティングが完了するとペイオフリールを起動して、薄板基材を図示左から右の向きに送る。送られる薄板基材に対し、各機器によって同時に次の作業を行わせる。
(i)必要に応じてエヤーブラストにて表面を研削する。
(ii)分離材塗布装置により、分離剤を必要なアモルファス合金については薄板基材の全巾に塗布する。
(iii)薄板基材予熱装置で、残存している少量の防錆油を、黒鉛を残さないよう燃焼させる
(iv)レベラーで薄板基材の形状補正を実施する。
(v)薄板基材、加熱、均熱装置で通板しながら200℃から520℃の範囲で予熱する。
(vi)大型超急冷遷移制御噴射機でアモルファス合金皮膜を形成する。
(vii)圧延機にてアモルファス合金皮膜および薄板基材を圧延する。アモルファス合金成分・作製条件の違いから、大型超急冷遷移制御噴射機にてアモルファス合金皮膜を噴射してから0.1秒から10秒後に圧下率は2%から30%で圧下する。図8のように、熱電対17を用いてアモルファス皮膜16の表面温度を測定し、それに応じて薄板基材の加熱を制御する。基材温度は外気の気温に左右されて加熱、均熱炉出側で目標温度±30度のばらつきがでることがある。20度以上のバラツキについては予熱機のバーナー火力の調整し、20度以内では赤外線加熱、均熱炉の電気の出力で調整する。圧延機のうちアモルファス合金皮膜と接する側の作業ロール等が温度調節可能なものである場合には、圧延の際、そのロールの表面温度を200~520℃の範囲に保つとよい。
(viii)圧延後、分離したアモルファス合金薄板、薄板基材それぞれの巻き取り機にて巻き取りを行う。またアモルファス合金薄板巻き取り機の前に、アモルファス合金薄板予熱装置と温間加工機を置いて、アモルファス合金薄板から連続的に製品を製造する場合もある。
一方、アモルファス皮膜コーティング薄板を製造する場合は、その手順を次のように行う。
(1) 薄板基材のセッティング
すなわち、薄板基材を予めペイオフリール~テンションリールにまでかけた状態にしておく。
(2) 通板の開始
上記のセッティングが完了するとペイオフリールを起動して、薄板基材を図示左から右の向きに送る。送られる薄板基材に対し、各機器によって同時に次の作業を行わせる。
(i)必要に応じてエヤーブラストにて表面を研削して薄板基材表面の粗度を上げる。
(ii)分離材は塗布しない。
(iii)薄板基材予熱装置で、残存している少量の防錆油を、黒鉛を残さないよう燃焼させる。
(iv)レベラーで薄板基材の形状補正を実施する。
(v)薄板基材、加熱、均熱装置で通板しながら200℃から520℃の範囲で予熱する。
(vi)大型超急冷遷移制御噴射機でアモルファス合金皮膜を形成する。
(vii)圧延機にてアモルファス合金皮膜および薄板基材を圧延する。アモルファス合金成分・作製条件の違いから、大型超急冷遷移制御噴射機にてアモルファス合金皮膜を噴射してから0.1秒から10秒後に、同径ロールにおいて圧下率は2%から30%で圧下する。アモルファス皮膜コーティング薄板を製造する場合にも、圧延機のうち少なくともアモルファス合金皮膜と接する側の作業ロールを、バーヒーター等を内蔵した温度調節可能なものにするとよい。圧延の際、そのロール等の表面温度を200~520℃の範囲に保つことにより、アモルファス合金皮膜を塑性流動性温度に保持しやすいからである。
(viii)圧延後、アモルファス合金薄板と薄板を分離せず、薄板基材巻取り装置にて巻き取る。 Contents of work When manufacturing amorphous alloy sheet, the procedure is as follows.
(1) Setting of thin plate base material In other words, the thin plate base material is previously placed on the payoff reel to the tension reel.
(2) Start of threading When the above setting is completed, the payoff reel is activated to feed the thin plate base material from left to right in the figure. The following operations are simultaneously performed by each device on the thin plate substrate to be sent.
(i) Grind the surface with air blast as necessary.
(ii) Using a separating material coating apparatus, a separating agent is coated on the entire width of the thin plate base material for the required amorphous alloy.
(iii) A small amount of remaining rust preventive oil is burned in a thin plate base material preheating device so as not to leave graphite. (iv) The shape of the thin plate base material is corrected with a leveler.
(v) Preheat in the range of 200 ° C to 520 ° C while passing through a thin plate substrate, heating and soaking device.
(vi) An amorphous alloy film is formed with a large ultra-quickly cooled transition controlled injector.
(vii) Roll the amorphous alloy film and the thin plate base material with a rolling mill. Due to the difference in the amorphous alloy composition and production conditions, the rolling reduction is reduced from 2% to 30% 0.1 to 10 seconds after the amorphous alloy film is injected with a large ultra-quick transition control injector. As shown in FIG. 8, the surface temperature of the
(viii) After rolling, winding is performed with a winding machine for each of the separated amorphous alloy thin plate and thin plate base material. In some cases, an amorphous alloy thin plate preheating device and a warm processing machine are placed in front of the amorphous alloy thin plate winder to continuously produce products from the amorphous alloy thin plate.
On the other hand, when producing an amorphous film-coated thin plate, the procedure is performed as follows.
(1) Setting of thin plate base material In other words, the thin plate base material is previously placed on the payoff reel to the tension reel.
(2) Start of threading When the above setting is completed, the payoff reel is activated to feed the thin plate base material from left to right in the figure. The following operations are simultaneously performed by each device on the thin plate substrate to be sent.
(i) If necessary, the surface is ground by air blasting to increase the roughness of the surface of the thin plate substrate.
(ii) Do not apply separation material.
(iii) In a thin plate base material preheating device, a small amount of remaining rust preventive oil is burned so as not to leave graphite.
(iv) The shape of the thin plate substrate is corrected with a leveler.
(v) Preheat in the range of 200 ° C to 520 ° C while passing through a thin plate substrate, heating and soaking device.
(vi) An amorphous alloy film is formed with a large ultra-quickly cooled transition controlled injector.
(vii) Roll the amorphous alloy film and the thin plate base material with a rolling mill. Due to the difference in the amorphous alloy composition and production conditions, the rolling reduction ratio is 2% to 30% in the same diameter roll 0.1 to 10 seconds after the amorphous alloy film is sprayed with a large ultra-quick transition control injector. Even in the case of manufacturing an amorphous coating coated thin plate, it is preferable that the work roll on the side in contact with the amorphous alloy coating at least in the rolling mill is a temperature-adjustable one incorporating a bar heater or the like. This is because by maintaining the surface temperature of the roll or the like in the range of 200 to 520 ° C. during rolling, the amorphous alloy film can be easily maintained at the plastic fluidity temperature.
(viii) After rolling, the amorphous alloy thin plate and the thin plate are not separated and wound by a thin plate substrate winding device.
図6および図7に示す設備にて行ったアモルファス合金薄板の製造試験につき、以下に紹介する。この試験では、上記の圧延機として、同径両駆動の圧延機を使用した。
Introduced below are the production tests of amorphous alloy sheets performed with the equipment shown in Figs. 6 and 7. In this test, the same-diameter dual-drive rolling mill was used as the rolling mill.
超急冷遷移制御噴射機を使用し厚み300μm、幅300mmのアモルファス合金薄板を製造することする。製造試験条件を表3に示す。アモルファス合金溶射前の薄板基材表面温度を400℃まで加熱し、64.5Ni-10Cr-7.5Mo-18B(at%) の粉末を溶融させ超急冷遷移制御噴射機から噴射する。基材送り速度は5.7m/minで、φ115の同径ロールにて10%圧下した例である。10%圧延した圧延荷重は24tであった。
An amorphous alloy sheet with a thickness of 300μm and a width of 300mm will be manufactured using a super-quenching transition control injector. Table 3 shows the manufacturing test conditions. The surface temperature of the thin plate substrate before thermal spraying of the amorphous alloy is heated to 400 ° C., and the powder of 64.5Ni-10Cr-7.5Mo-18B (at%) is melted and sprayed from the ultra-quenching transition control injector. In this example, the substrate feed speed is 5.7 m / min and the roll is reduced by 10% with the same diameter roll of φ115. The rolling load after 10% rolling was 24 t.
(2)試験結果
アモルファス合金薄板を図9に示す。厚さ300μm、幅300mm、の長さ4mの帯状に連続したアモルファス合金薄板を得ることができた。アモルファス化率及び断面写真は図2に示す。 (2) Test results Fig. 9 shows the amorphous alloy sheet. A thin amorphous alloy sheet with a thickness of 300 μm, a width of 300 mm and a length of 4 m was obtained. The amorphization rate and cross-sectional photograph are shown in FIG.
アモルファス合金薄板を図9に示す。厚さ300μm、幅300mm、の長さ4mの帯状に連続したアモルファス合金薄板を得ることができた。アモルファス化率及び断面写真は図2に示す。 (2) Test results Fig. 9 shows the amorphous alloy sheet. A thin amorphous alloy sheet with a thickness of 300 μm, a width of 300 mm and a length of 4 m was obtained. The amorphization rate and cross-sectional photograph are shown in FIG.
図6および図7に示す設備にて行ったアモルファス合金皮膜コーティング板の製造試験は表2に示した工程に従った。この試験では、上記の圧延機として、同径両駆動の圧延機を使用した。
The production test of the amorphous alloy film coating plate carried out with the equipment shown in FIGS. 6 and 7 followed the steps shown in Table 2. In this test, the same-diameter dual-drive rolling mill was used as the rolling mill.
超急冷遷移制御噴射機を使用し厚み250μm、幅300mmのアモルファス合金皮膜コーティング板を製造することする。主な製造試験条件を表4に示す。アモルファス合金溶射前の薄板基材表面温度を450℃まで加熱し、64.5Ni-10Cr-7.5Mo-18B(at%) の粉末を溶融させ超急冷遷移制御噴射機から噴射する。基材送り速度は5.7m/minで、φ115の同径ロールにて7%圧下した例である。7%圧延した圧延荷重は15tであった。
An amorphous alloy coating sheet with a thickness of 250μm and a width of 300mm will be manufactured using a super-quenching transition control injector. Table 4 shows the main manufacturing test conditions. The surface temperature of the thin plate substrate before thermal spraying of the amorphous alloy is heated to 450 ° C., 64.5Ni-10Cr-7.5Mo-18B (at%) powder is melted and sprayed from an ultra-quenching transition control injector. In this example, the substrate feed speed is 5.7 m / min, and the sheet is reduced by 7% with the same diameter roll of φ115. The rolling load after 7% rolling was 15 t.
(2)試験結果
アモルファス合金皮膜コーティング板を図10に示す。厚さ2.25mm{アモルファス皮膜厚み250μm}幅300mmの長さ150mmのアモルファス合金皮膜コーティング板を得ることができた。アモルファス化率及び断面写真は図11に示す。 (2) Test results Fig. 10 shows the amorphous alloy film coated plate. An amorphous alloy film coated plate having a thickness of 2.25 mm {amorphous film thickness 250 μm} and a width of 300 mm and a length of 150 mm could be obtained. The amorphization rate and cross-sectional photograph are shown in FIG.
アモルファス合金皮膜コーティング板を図10に示す。厚さ2.25mm{アモルファス皮膜厚み250μm}幅300mmの長さ150mmのアモルファス合金皮膜コーティング板を得ることができた。アモルファス化率及び断面写真は図11に示す。 (2) Test results Fig. 10 shows the amorphous alloy film coated plate. An amorphous alloy film coated plate having a thickness of 2.25 mm {amorphous film thickness 250 μm} and a width of 300 mm and a length of 150 mm could be obtained. The amorphization rate and cross-sectional photograph are shown in FIG.
本発明は、アモルファス板(薄板基材上にアモルファス合金皮膜を有するアモルファス皮膜コーティング板、および、当該皮膜を薄板基材から分離してなるアモルファス合金薄板)の新しい製造方法および製造装置を提供し、それによって例えば板厚300μm以上、幅300mm以上の薄板の製造を可能にする。そのような大寸法のものを製造できると、工業用部材としての展開が大きく広がる。
The present invention provides a new production method and production apparatus for an amorphous plate (amorphous film coating plate having an amorphous alloy film on a thin plate substrate, and an amorphous alloy thin plate formed by separating the film from the thin plate substrate), Thereby, for example, it is possible to produce a thin plate having a thickness of 300 μm or more and a width of 300 mm or more. If such a large-sized thing can be manufactured, development as an industrial member will spread greatly.
1 ペイオフリール
2 表面研磨装置
3 分離材塗布および噴射機
4 予熱器
5 レベラー
6 薄板基材加熱、均熱装置
7 超急冷遷移制御噴射装置
8 異径片駆動圧延機(2段もしくは4段圧延機)
9 集塵装置
10 薄板基材巻取機
11 アモルファス合金薄板巻取機
12 アモルファス合金薄板加熱装置
13 温間加工機
14 薄板基材
15 分離材
16 アモルファス合金薄板
17 熱電対
21 噴射ガン
23 ミスト噴射ノズル
24 ミスト噴射口
25 材料噴射口
26 火炎噴射口
27 不活性ガス噴射口
28 アモルファス合金粉末供給管
29 プロパンガス供給管
30 分岐経路
31 酸素供給管
32 不活性ガス供給管
a 火炎
b 不活性ガス
c ミスト 1 Payoff reel
2 Surface polishing equipment
3 Separating material application and jetting machine
4 Preheater
5 Leveler
6 Thin plate substrate heating, soaking device
7 Ultra-cooled transition control injection device
8 Different diameter single drive rolling mill (2 or 4 rolling mill)
9 Dust collector
10 Sheet base material winder
11 Amorphous alloy sheet winding machine
12 Amorphous alloy sheet heating device
13 Warm processing machine
14 Thin plate base material
15 Separation material
16 Amorphous alloy sheet
17 Thermocouple
21 spray gun
23 Mist spray nozzle
24 Mist injection port
25 Material injection port
26 Flame outlet
27 Inert gas outlet
28 Amorphous alloy powder supply pipe
29 Propane gas supply pipe
30 branch route
31 Oxygen supply pipe
32 Inert gas supply pipe
a flame
b Inert gas
c mist
2 表面研磨装置
3 分離材塗布および噴射機
4 予熱器
5 レベラー
6 薄板基材加熱、均熱装置
7 超急冷遷移制御噴射装置
8 異径片駆動圧延機(2段もしくは4段圧延機)
9 集塵装置
10 薄板基材巻取機
11 アモルファス合金薄板巻取機
12 アモルファス合金薄板加熱装置
13 温間加工機
14 薄板基材
15 分離材
16 アモルファス合金薄板
17 熱電対
21 噴射ガン
23 ミスト噴射ノズル
24 ミスト噴射口
25 材料噴射口
26 火炎噴射口
27 不活性ガス噴射口
28 アモルファス合金粉末供給管
29 プロパンガス供給管
30 分岐経路
31 酸素供給管
32 不活性ガス供給管
a 火炎
b 不活性ガス
c ミスト 1 Payoff reel
2 Surface polishing equipment
3 Separating material application and jetting machine
4 Preheater
5 Leveler
6 Thin plate substrate heating, soaking device
7 Ultra-cooled transition control injection device
8 Different diameter single drive rolling mill (2 or 4 rolling mill)
9 Dust collector
10 Sheet base material winder
11 Amorphous alloy sheet winding machine
12 Amorphous alloy sheet heating device
13 Warm processing machine
14 Thin plate base material
15 Separation material
16 Amorphous alloy sheet
17 Thermocouple
21 spray gun
23 Mist spray nozzle
24 Mist injection port
25 Material injection port
26 Flame outlet
27 Inert gas outlet
28 Amorphous alloy powder supply pipe
29 Propane gas supply pipe
30 branch route
31 Oxygen supply pipe
32 Inert gas supply pipe
a flame
b Inert gas
c mist
Claims (10)
- 加熱した薄板基材の表面に噴射によってアモルファス合金皮膜を形成し、そのアモルファス合金を塑性流動性のある温度域に保った状態で、当該皮膜付きの金属薄板を圧延機に通すことを特徴とするアモルファス板の製造方法。 An amorphous alloy film is formed by jetting on the surface of a heated thin plate base material, and the thin metal plate with the film is passed through a rolling mill in a state where the amorphous alloy is maintained in a temperature range having plastic fluidity. A method for producing an amorphous plate.
- アモルファス合金を上記のとおり塑性流動性のある温度域に保つべく、上記薄板基材を上記噴射の前に加熱し、圧延機に通す時点でアモルファス合金皮膜が200℃~520℃となるようにすることを特徴とする請求項1に記載したアモルファス板の製造方法。 In order to keep the amorphous alloy in the temperature range having plastic fluidity as described above, the thin plate substrate is heated before the injection, and the amorphous alloy film is set to 200 ° C. to 520 ° C. when passing through a rolling mill. 2. The method for producing an amorphous plate according to claim 1, wherein:
- アモルファス合金皮膜付きの上記金属薄板を圧延機に通したのち、当該アモルファス合金皮膜を上記薄板基材から剥離させることを特徴とする請求項2に記載したアモルファス板の製造方法。 3. The method for producing an amorphous plate according to claim 2, wherein after the metal thin plate with the amorphous alloy film is passed through a rolling mill, the amorphous alloy film is peeled off from the thin plate base material.
- アモルファス合金皮膜を形成する前の上記薄板基材の表面に分離材を塗布または噴霧するとともに、上記圧延機に上下のロールが径差を有していて上下一方のロールのみが駆動される異径片駆動とされるものを使用することにより、アモルファス合金皮膜を上記薄板基材から剥離させることを特徴とする請求項3に記載したアモルファス板の製造方法。 Different diameters in which the separating material is applied or sprayed on the surface of the thin plate substrate before forming the amorphous alloy film, and the upper and lower rolls have a diameter difference in the rolling mill and only one of the upper and lower rolls is driven. 4. The method for producing an amorphous plate according to claim 3, wherein the amorphous alloy film is peeled off from the thin plate base material by using a single drive.
- 請求項4に記載したアモルファス板の製造方法を実施するため、薄板基材を払い出すペイオフリールと、当該薄板基材の表面粗度を調整する表面処理装置と、当該薄板基材の形状補正を行うためのレベラーと、分離材の塗布機または噴霧機と、薄板基材の加熱装置と、アモルファス合金皮膜を形成する噴射装置と、異径片駆動とされる上記圧延機と、上記薄板基材を巻き取る巻取機と、アモルファス合金薄板の保温・冷却用の装置と、アモルファス合金薄板を巻き取る巻取機とを有することを特徴とするアモルファス板の製造装置。 In order to carry out the method for producing an amorphous plate according to claim 4, a payoff reel for paying out the thin plate substrate, a surface treatment device for adjusting the surface roughness of the thin plate substrate, and shape correction of the thin plate substrate A leveler for carrying out, a separating material applicator or sprayer, a heating device for a thin plate substrate, an injection device for forming an amorphous alloy film, the rolling machine driven by different diameter pieces, and the thin plate substrate A device for producing an amorphous plate, comprising: a winder that winds up, a device for heat insulation and cooling of the amorphous alloy thin plate, and a winder that winds up the amorphous alloy thin plate.
- アモルファス合金皮膜を形成する前の薄板基材の表面を研磨するとともに、上記圧延機として上下ロール径が等しく上下両ロールが駆動される同径両駆動方式を使用することにより、アモルファス合金皮膜の上記薄板基材に対する密着度を向上させることを特徴とする請求項2に記載したアモルファス板の製造方法。 By polishing the surface of the thin plate substrate before forming the amorphous alloy film, and using the same diameter double drive system in which the upper and lower roll diameters are equally driven as the rolling mill, the amorphous alloy film The method for producing an amorphous plate according to claim 2, wherein the degree of adhesion to the thin plate base material is improved.
- 請求項6に記載したアモルファス板の製造方法を実施するため、薄板基材を払い出すペイオフリールと、当該薄板基材の表面粗度を調整する表面処理装置と、当該薄板基材の形状補正を行うためのレベラーと、薄板基材の加熱装置と、アモルファス合金皮膜を形成する噴射装置と、同径両駆動とされる上記圧延機と、アモルファス合金皮膜コーティング形成時の保温・冷却用の装置と、作製されたアモルファス合金皮膜コーティング薄板を巻き取る巻取機とを有することを特徴とするアモルファス板の製造装置。 In order to carry out the method for producing an amorphous plate according to claim 6, a payoff reel for paying out the thin plate base material, a surface treatment device for adjusting the surface roughness of the thin plate base material, and shape correction of the thin plate base material A leveler for performing, a heating device for a thin plate base material, an injection device for forming an amorphous alloy film, the above-mentioned rolling mill driven by the same diameter, and an apparatus for heat insulation and cooling at the time of forming an amorphous alloy film coating And a winding machine for winding the produced amorphous alloy film-coated thin plate.
- 上記の圧延機が、ヒーターを内蔵されたロールを、少なくともアモルファス合金皮膜と接する側の作業ロールとして有することを特徴とする請求項5または7に記載したアモルファス板の製造装置。 The apparatus for producing an amorphous plate according to claim 5 or 7, wherein the rolling mill has a roll with a built-in heater as a work roll at least in contact with the amorphous alloy film.
- アモルファス合金皮膜を形成する上記噴射装置として、
材料粒子を含む火炎を上記基材に向けて噴射ガンより噴射し、当該材料粒子を火炎によって溶融させたうえ、当該材料粒子および火炎を上記基材に達する前から冷却する装置であって、噴射ガンの前面に、材料粒子噴射口および火炎噴射口が上記基材の幅方向に150mm以上連続的に設けられるとともに、それら材料粒子噴射口および火炎噴射口をはさむ両側の位置に、火炎を整流し冷却するための不活性ガスの噴射口と、火炎を冷却するための液体ミストの噴射口とが、上記基材の幅方向に150mm以上連続的に設けられている装置を有すること、
を特徴とする請求項5または7に記載したアモルファス板の製造装置。 As the above injection device for forming an amorphous alloy film,
A device that injects a flame containing material particles toward the substrate from an injection gun, melts the material particles by the flame, and cools the material particles and the flame before reaching the substrate. At the front of the gun, material particle injection ports and flame injection ports are continuously provided in the width direction of the base material by 150 mm or more, and the flame is rectified at positions on both sides of the material particle injection port and flame injection port. Having an apparatus in which an inert gas injection port for cooling and a liquid mist injection port for cooling a flame are continuously provided in a width direction of 150 mm or more in the base material;
The apparatus for producing an amorphous plate according to claim 5 or 7, wherein: - アモルファス合金皮膜を形成する上記溶射装置の火炎の付近に集塵フードが設けられ、当該噴射装置からの発生ガスを水ミストで冷却しながら当該集塵フードより吸引して集塵機へ送るよう構成されていることを特徴とする請求項5、7または9に記載したアモルファス板の製造装置。
A dust collection hood is provided in the vicinity of the flame of the thermal spraying device that forms the amorphous alloy film, and the generated gas from the injection device is sucked from the dust collection hood while being cooled with water mist and sent to the dust collector. An apparatus for producing an amorphous plate according to claim 5, 7 or 9, wherein
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CN106622837A (en) * | 2016-11-25 | 2017-05-10 | 北京首钢股份有限公司 | Control method for telescope of silicon-steel magnesium oxide coating |
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