WO2013104949A3 - Method for treating an object - Google Patents

Method for treating an object Download PDF

Info

Publication number
WO2013104949A3
WO2013104949A3 PCT/IB2012/002805 IB2012002805W WO2013104949A3 WO 2013104949 A3 WO2013104949 A3 WO 2013104949A3 IB 2012002805 W IB2012002805 W IB 2012002805W WO 2013104949 A3 WO2013104949 A3 WO 2013104949A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
discharge
conductive
order
electrode
Prior art date
Application number
PCT/IB2012/002805
Other languages
French (fr)
Other versions
WO2013104949A2 (en
Inventor
Jorge Cors
Oystein Fischer
Original Assignee
L'université De Genève
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by L'université De Genève filed Critical L'université De Genève
Publication of WO2013104949A2 publication Critical patent/WO2013104949A2/en
Publication of WO2013104949A3 publication Critical patent/WO2013104949A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/131—Wire arc spraying

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

The present invention relates to a method for treating the surface of an object having at least one conductive substrate (1). A voltage is applied between an electrode (20) and said substrate (1) of the object in order to activate at least one discharge, the electrode (20) being separated from the substrate (1) by a predetermined distance (d) or gap filled with a dielectric medium (3) in which the discharge takes place, said voltage and the discharge time being configured in order for said discharge to induce a breakdown in the dielectric medium (3) and to form a conductive ionised plasma channel (5). Then, an electric current from a current source is discharged through said conductive ionised plasma channel (5), said current being configured such that one surface (6) of the substrate (1) at the base of the electric arc melts in order to obtain a recess (7) on said substrate (1) having different chemical and/or physical and/or metallurgical properties.
PCT/IB2012/002805 2012-01-09 2012-12-28 Method for treating an object WO2013104949A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH00039/12 2012-01-09
CH00039/12A CH705973B1 (en) 2012-01-09 2012-01-09 A method of treating the surface of an object.

Publications (2)

Publication Number Publication Date
WO2013104949A2 WO2013104949A2 (en) 2013-07-18
WO2013104949A3 true WO2013104949A3 (en) 2014-03-20

Family

ID=47624373

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2012/002805 WO2013104949A2 (en) 2012-01-09 2012-12-28 Method for treating an object

Country Status (2)

Country Link
CH (1) CH705973B1 (en)
WO (1) WO2013104949A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB201914825D0 (en) * 2019-10-14 2019-11-27 Rolls Royce Plc A compound and a method of using the compound

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346055A2 (en) * 1988-06-06 1989-12-13 Research Development Corporation Of Japan Method for causing plasma reaction under atmospheric pressure
WO2007020493A1 (en) * 2005-08-19 2007-02-22 L'universite De Geneve Method, arrangement and sign for authenticating an object
WO2008010044A2 (en) * 2006-07-19 2008-01-24 L'universite De Geneve Method and installation for marking an object
EP2145978A1 (en) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Method and installation for depositing layers on a substrate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346055A2 (en) * 1988-06-06 1989-12-13 Research Development Corporation Of Japan Method for causing plasma reaction under atmospheric pressure
WO2007020493A1 (en) * 2005-08-19 2007-02-22 L'universite De Geneve Method, arrangement and sign for authenticating an object
WO2008010044A2 (en) * 2006-07-19 2008-01-24 L'universite De Geneve Method and installation for marking an object
EP2145978A1 (en) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Method and installation for depositing layers on a substrate

Also Published As

Publication number Publication date
CH705973B1 (en) 2016-09-15
CH705973A2 (en) 2013-07-15
WO2013104949A2 (en) 2013-07-18

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