WO2013093612A1 - Stereolithography machine with improved optical unit - Google Patents
Stereolithography machine with improved optical unit Download PDFInfo
- Publication number
- WO2013093612A1 WO2013093612A1 PCT/IB2012/002789 IB2012002789W WO2013093612A1 WO 2013093612 A1 WO2013093612 A1 WO 2013093612A1 IB 2012002789 W IB2012002789 W IB 2012002789W WO 2013093612 A1 WO2013093612 A1 WO 2013093612A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radiation
- mirror
- stereolithography machine
- reference surface
- around
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/165—Processes of additive manufacturing using a combination of solid and fluid materials, e.g. a powder selectively bound by a liquid binder, catalyst, inhibitor or energy absorber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/268—Arrangements for irradiation using laser beams; using electron beams [EB]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y30/00—Apparatus for additive manufacturing; Details thereof or accessories therefor
Definitions
- the invention concerns a stereolithography machine of the type suitable for making three-dimensional objects by means of a plurality of superimposed layers, wherein each layer is obtained through the selective solidification of a fluid substance in the areas corresponding to the volume of the object to be produced.
- a stereolithography machine of the known type comprises a container that contains a fluid substance, generally a light-sensitive resin in the liquid or paste state.
- the machine comprises also a source, generally of the luminous type, which emits radiation suited to solidify the fluid substance.
- An optical unit provides for conveying said radiation towards a reference surface arranged inside the container, which corresponds to the position of the layer of the object to be solidified.
- the three-dimensional object being formed is supported by a modelling plate, which can be moved vertically with respect to the container, in such a way that it is possible to arrange the last solidified layer of the object in a position adjacent to said reference surface.
- the modelling plate is moved so as to arrange again the solidified layer adjacent to the reference surface, after which the process can be repeated for the successive layer.
- stereolithography machines of the said type are divided in two main embodiments that are described, for example, in the Italian Patent application for industrial invention no. VI2010A000004, in the name of the same applicant who is filing the present invention.
- the reference surface is arranged adjacent to the bottom of the container, which is transparent to radiation.
- the fluid substance is irradiated from below and the three- dimensional object is formed under the modelling plate.
- the reference surface is arranged at the level of the free surface of the fluid substance.
- the fluid substance is irradiated from above and the three- dimensional object is formed over the modelling plate.
- the radiation can be conveyed to the different points of the reference surface using different optical units of the known type.
- a first type of optical unit comprises a matrix of mirrors that can be controlled individually in such a way as to project the image of the layer of the object on the predefined surface.
- each mirror can assume two different positions, an active position from which the radiation is reflected towards a corresponding point of the reference surface and a passive position from which the radiation is reflected towards a dispersion area.
- Said matrices of mirrors are capable of lighting the entire reference surface at the same time, thus making it possible to obtain each layer by means of a single exposure and, consequently, in a particularly quick manner.
- the matrices of mirrors have limited definition, with the inconvenience that objects with irregular edges are obtained.
- a further drawback of the systems mentioned above lies in that the image they generate has uniform luminous intensity on its entire surface.
- the radiation is conveyed to a single point of the reference surface and said point is moved in such a way as to progressively light the entire portion of the reference surface corresponding to the volume of the object.
- this optical unit offers the advantage that it is possible to direct the light beam towards any point on the reference surface, making it cover continuous trajectories and thus obtaining objects that are free from the irregularities caused by the optical units of the type previously described.
- this type of optical units advantageously makes it possible to modify light intensity in the different areas of the reference surface.
- a laser light source is provided that is moved on two orthogonal axes by means of a mechanical device.
- This embodiment poses the drawbacks that the movements of the light beam are rather slow and that, furthermore, the mechanical device used to move the light beam runs the risk of breaking and therefore needs a certain amount of maintenance.
- a fixed source and one pair of galvanometric mirrors are used to direct the light beam, arranged in series one after the other.
- Each mirror is motorised, in such a way as to allow it to rotate around a corresponding rotation axis that is orthogonal to the axis of the other mirror, so that the combination of their rotations makes it possible to direct the beam towards any point of the reference surface.
- the system just illustrated above offers the advantages that it allows the beam to be moved very quickly, which is due to the lower inertia of the galvanometric mirrors, and that it ensures more reliability, thanks to the smaller number of mechanical components used.
- the optical unit just described requires that the two mirrors are aligned during the construction of the machine, in such a way as to obtain the correct reflection of the light beam.
- An optical unit based on galvanometric mirrors poses the further drawback of being relatively bulky.
- Galvanometric mirrors have some mechanical components that are subject to wear and therefore limit their advantages compared to the mechanical movement devices mentioned above.
- Galvanometric mirrors furthermore, are characterized by non- negligible inertia, which affects the deviation speed of the light beam and thus also the overall processing time.
- the present invention intends to overcome all the above mentioned drawbacks that are typical of the known art.
- the stereolithography machine of the invention has smaller overall dimensions than the machines of the known type with equivalent potentialities.
- FIG. 1 shows a stereolithography machine according to the invention
- FIG. 1 shows a detail of the stereolithography machine shown in Figure 1.
- the stereolithography machine that is the subject of the invention indicated as a whole by 1 in Figure 1 , makes it possible to produce a three-dimensional object 15 by means of a process according to which a plurality of layers are superimposed to one another, said layers being obtained through the selective exposure of a fluid substance 14 to predefined radiation 3a suited to solidify it.
- said fluid substance 14 is a liquid light-sensitive resin and the predefined radiation 3a is a laser light with frequency in the field of the visible or ultraviolet.
- the fluid substance 14 can be of any kind, liquid or paste, provided that it is suited to solidify when exposed to predefined radiation 3a.
- said source 3 of radiation 3a can emit a type of radiation 3a that is different from the one mentioned above, provided that it can solidify the fluid substance 14.
- the stereolithography machine 1 comprises a container 2 for said fluid substance 14 and a modelling plate 16 that is suited to support the object 15 being formed and motorised according to a vertical movement axis Z.
- the machine 1 comprises also a source 3 suited to emit the predefined radiation 3a and an optical unit 4 suited to direct the radiation 3a towards any point on a reference surface arranged inside the container 2, at the level of the volume occupied by the fluid substance 14.
- said reference surface is plane and is arranged so that it is adjacent to the bottom 2a of the container 2.
- the optical unit 4 is configured so as to direct the predefined radiation 3a from bottom to top, so that it is incident on the bottom 2a.
- the bottom 2a is transparent to the radiation 3a so that the latter can hit the fluid substance 14 arranged in proximity to the bottom and solidify it.
- the three-dimensional object 15 is created under the modelling plate 16, as shown in Figure 1.
- the optical unit is configured so as to direct the radiation 3a from top to bottom on the free surface of the fluid substance 14 present in the container 2.
- the object is created over the modelling plate 16.
- the stereolithography machine 1 comprises a logic control unit 6 configured so as to control the optical unit 4 and/or the source 3 in such a way as to selectively expose the fluid substance 14 to the radiation 3a at the level of a predefined portion of the reference surface.
- said predefined portion corresponds to the portion of volume that corresponds, from time to time, to each layer of the three-dimensional object 15.
- the optical unit 4 comprises a micro-opto-electro- mechanical system 7 that in integrated circuit technology is known by the acronym "MOEMS".
- MOEMS devices are produced using the same technology used in microelectronics to make integrated circuits, for example through solid deposition, photolithography, etching etc.
- Said micro-opto-electro-mechanical system 7 a possible embodiment of which is schematically shown in Figure 2 by way of non-limiting example, comprises a miniaturised mirror 8, associated with a supporting structure 9 through articulation means 7b configured in such a way as to define two different axes X, Y of rotation of the mirror 8 with respect to the structure 9, mutually incident on and preferably orthogonal to each other.
- Said micro-opto-electro-mechanical system 7 also comprises actuator means 7a, of a type known per se, suited to move the mirror 8 around each one of said two axes X and Y independently of the movement around the other axis.
- Said actuator means 7a can be of the electrostatic, magnetic, thermo- mechanical type, or of any other known type that can be obtained by means of said MOEMS technology.
- the mirror 8 is arranged, with respect to the source 3 and the container 2, so that it can reflect the predefined radiation 3a so as to direct it towards any point of the reference surface through a corresponding combination of the rotations around the two axes X, Y.
- the invention makes it possible to use a single mirror 8 to direct the radiation 3a towards any point of the reference surface.
- micro-opto-electro-mechanical system 7 described above does not require high precision in angular positioning during assembly.
- any slight angular variation in the arrangement of the micro-opto- electro-mechanical system 7 involves only a movement of the reference surface with respect to the container 2, however without producing considerable distortions of the shape of the reference surface and of the predefined portion that is exposed.
- the micro-opto-electro-mechanical system 7 has a lower cost compared to a system based on galvanometric mirrors, which adds the further advantage of reducing the cost of the stereolithography machine 1. Furthermore, advantageously, the micro-opto-electro-mechanical system 7 has lower inertia than galvanometric mirrors, thus making it possible to obtain higher angular speeds and thus to reduce the time necessary to make the three-dimensional object 15 compared to the stereolithography machines of the known type, still obtaining the same shape of the object.
- the micro-opto-electro-mechanical system 7 has smaller overall dimensions compared to the typical overall dimensions of the optical units with galvanometric mirrors having the same potentiality, thus making it possible to reduce the overall dimensions of the stereolithography machine . Consequently, the invention makes it possible to produce a stereolithography machine 1 that, thanks to its reduced cost and limited overall dimensions, is suited to be used also in applications for which the stereolithography machines of the known type are not suitable.
- micro-opto-electro-mechanical system 7 lies in that it absorbs much less energy than the systems with galvanometric mirrors of the known type having equivalent potentiality.
- the reduced energy consumption combined with the considerable compactness, allows the stereolithography machine 1 to be battery powered, making it portable.
- the stereolithography machine 1 described above has all the advantages that are typical of the systems using optical units with galvanometric mirrors, in particular the same precision and the possibility of modulating the power of the radiation 3a in the different areas of the object 15.
- the articulation means 7b comprise a movable frame 10 that revolvingly supports the mirror 8 around the rotation axis X and is revolvingly associated with the supporting structure 9 according to the rotation axis Y.
- This type of connection makes it possible to obtain independent rotations of the mirror 8 according to each one of the above mentioned rotation axes X and Y.
- the mirror 8, the frame 10 and the supporting structure 9 are obtained in a single piece and are connected to each other through corresponding connection areas 11 and 12 that belong to the articulation means 7b and are thin enough to be able to yield elastically according to the respective rotation axes X and Y, so as to allow the mirror 8 to rotate with respect to the frame 10 and the latter to rotate with respect to the supporting structure 9.
- each one of said connection areas 11 , 12 operates as a torsion spring that can be deformed to a degree that depends on the pilot voltage of the device.
- micro-opto-electro- mechanical system 7 can be carried out in any shape, provided that the mirror 8 can rotate around two axes that are independent of and incident on each other.
- actuator means 7a that move the mirror 8 they are preferably configured so as to rotate the latter around each axis X, Y based on the value of a control signal sent by the logic control unit 6 and representing the angular position that the mirror 8 must assume.
- the logic control unit 6 is configured so as to move the mirror 8 in such a manner that the radiation 3a falls inside the predefined portion corresponding to the layer of the object 15 to be produced following one or more continuous trajectories.
- said movement is performed according to a single continuous trajectory that covers the entirety of the predefined portion.
- the micro-opto-electro- mechanical system 7 and the corresponding actuator means 7a are configured so as to generate a cyclic movement of the mirror 8, such that the radiation 3a can progressively stimulate the entire reference surface at each cycle.
- said cyclic movement may comprise an oscillation of the mirror 8 according to one of the two rotation axes X, Y alternatively in the two rotation directions, preferably obtained by exploiting the resonance frequency of the respective connection areas 11 or 12, which is combined with a rotation on the other axis according to a single direction.
- the radiation 3a is incident on the reference surface 5 and describes a zigzag trajectory that with each one of its segments crosses the reference surface 5 in one of its dimensions and at the same time moves according to the other dimension.
- the logic control unit 6 is configured so as to modify the intensity of the source 3 during said cyclic movement of the mirror 8.
- the intensity of the source 3 is increased in such a way as to solidify the fluid substance 14 in that point, while when the point of incidence is outside the predefined portion the intensity is decreased in such a way as to avoid solidifying the corresponding portion of fluid substance 14.
- the micro-opto-electro-mechanical system 7 described above preferably belongs to an integrated circuit provided with pins for the electric connection to the machine 1, which is provided with a corresponding connector, or with a base, configured in such a way as to house said pins and allow the integrated circuit to be mechanically fixed to the machine 1.
- said connector or base is of the type whose insertion requires a limited amount of force.
- the micro-opto-electro-mechanical system 7 can be welded directly on the support electronic circuit, avoiding the use of the connector or base.
- the optical unit 4 preferably comprises one or more lenses 13 configured so as to focus the radiation 3a on the reference surface 5.
- said lens 13 is of the so-called "flat field” type, such as to focus the radiation 3a on a plane reference surface.
- the micro-opto-electro-mechanical system 7 is arranged in the stereolithography machine 1 so that the mirror 8 is aligned with the radiation 3a produced by the source 3.
- the positions of the source 3 and of the micro-opto-electro- mechanical system 7 are such that when the mirror 8 is in a condition in which there is no rotation, that is, when the connection areas 11 , 12 are not subjected to torsion, the radiation 3a is reflected towards the central point of the reference surface 5.
- any slight angular misalignments of the micro-opto-electro-mechanical system 7 do not affect the functionality of the machine 1.
- the stereolithography machine of the invention allows all the set objects to be achieved.
- the replacement of the galvanometric mirrors with a micro-opto- electro-mechanical system makes it possible to use a single mirror moving on two independent axes, instead of two mirrors, each moving on a single axis.
- MOEMS micro-opto- electro-mechanical system
- the micro-opto-electro-mechanical system is more economical, less bulky and less energy-consuming than the galvanometric systems, which makes it possible to produce stereolithography machines that are suitable for small series production and may even be portable.
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- Optics & Photonics (AREA)
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Abstract
Description
Claims
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2014128189/05A RU2593448C2 (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
JP2014548241A JP6331096B2 (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
BR112014015284A BR112014015284A8 (en) | 2011-12-23 | 2012-12-24 | stereolithography machine and use of micro-opto-electromechanical system (moems) in the same |
EP12818576.6A EP2794242B1 (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
KR1020147018305A KR20140097554A (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
MX2014007386A MX350109B (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit. |
CN201280063954.6A CN104039533B (en) | 2011-12-23 | 2012-12-24 | There is the stereolithography machine of the optical unit of improvement |
US14/367,431 US9550326B2 (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
CA2860143A CA2860143C (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
SG11201403198VA SG11201403198VA (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
IL233120A IL233120B (en) | 2011-12-23 | 2014-06-12 | Stereolithography machine with improved optical unit |
HK15101552.1A HK1201054A1 (en) | 2011-12-23 | 2015-02-12 | Stereolithography machine with improved optical unit |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT000333A ITVI20110333A1 (en) | 2011-12-23 | 2011-12-23 | STEREOLITHOGRAPHIC MACHINE WITH PERFECT OPTICAL GROUP |
ITVI2011A000333 | 2011-12-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013093612A1 true WO2013093612A1 (en) | 2013-06-27 |
Family
ID=45581966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IB2012/002789 WO2013093612A1 (en) | 2011-12-23 | 2012-12-24 | Stereolithography machine with improved optical unit |
Country Status (14)
Country | Link |
---|---|
US (1) | US9550326B2 (en) |
EP (1) | EP2794242B1 (en) |
JP (1) | JP6331096B2 (en) |
KR (1) | KR20140097554A (en) |
CN (1) | CN104039533B (en) |
BR (1) | BR112014015284A8 (en) |
CA (1) | CA2860143C (en) |
HK (1) | HK1201054A1 (en) |
IL (1) | IL233120B (en) |
IT (1) | ITVI20110333A1 (en) |
MX (1) | MX350109B (en) |
RU (1) | RU2593448C2 (en) |
SG (1) | SG11201403198VA (en) |
WO (1) | WO2013093612A1 (en) |
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---|---|---|---|---|
ITVI20130229A1 (en) * | 2013-09-18 | 2015-03-19 | Ettore Maurizio Costabeber | STEREOLITHOGRAPHIC MACHINE WITH PERFECT OPTICAL GROUP |
WO2016146185A1 (en) * | 2015-03-18 | 2016-09-22 | Ettore Maurizio Costabeber | STEREOLlTHOGRAPHY MACHINE WITH IMPROVED OPTICAL UNIT |
WO2017052237A1 (en) * | 2015-09-22 | 2017-03-30 | 주식회사 캐리마 | Photocurable 3d forming method and photocurable 3d forming apparatus |
WO2017066584A1 (en) * | 2015-10-15 | 2017-04-20 | Saint-Gobain Ceramics & Plastics, Inc. | Method for forming a three dimensional body from a mixture with a high content of solid particles |
CN107073813A (en) * | 2014-06-20 | 2017-08-18 | 卡本有限公司 | Use the 3 D-printing of the reciprocal feeding of polymerizable liquid |
TWI622488B (en) * | 2014-02-28 | 2018-05-01 | 艾托瑞 莫利齊奧 寇斯塔貝伯爾 | Improved stereolithography machine |
US10953597B2 (en) | 2017-07-21 | 2021-03-23 | Saint-Gobain Performance Plastics Corporation | Method of forming a three-dimensional body |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITVI20120183A1 (en) * | 2012-07-27 | 2014-01-28 | Dws Srl | CARTRIDGE FOR STEREOLITHOGRAPHIC MACHINE, STEREOLITHOGRAPHIC MACHINE INCLUDING SUCH CARTRIDGE AND METHOD OF PRODUCTION OF SUCH CARTRIDGE |
WO2017079774A2 (en) * | 2015-11-12 | 2017-05-18 | Klaus Stadlmann | Stereolithography apparatus comprising a cartridge device |
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Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4996010A (en) * | 1988-04-18 | 1991-02-26 | 3D Systems, Inc. | Methods and apparatus for production of three-dimensional objects by stereolithography |
US5258146A (en) * | 1988-09-26 | 1993-11-02 | 3D Systems, Inc. | Method of and apparatus for measuring and controlling fluid level in stereolithography |
NL193122C (en) * | 1991-05-01 | 1998-11-03 | Allied Signal Inc | Stereolithography using vinyl ether epoxide polymers. |
US5259146A (en) * | 1992-08-11 | 1993-11-09 | Jinkins Perry L | Device and method for shaping the end of a rod |
JP2722314B2 (en) | 1993-12-20 | 1998-03-04 | 日本信号株式会社 | Planar type galvanometer mirror and method of manufacturing the same |
JP2003080604A (en) * | 2001-09-10 | 2003-03-19 | Fuji Photo Film Co Ltd | Laminate shaping apparatus |
US6924915B2 (en) | 2002-08-26 | 2005-08-02 | Canon Kabushiki Kaisha | Oscillation device, optical deflector using the oscillation device, and image display device and image forming apparatus using the optical deflector, and method of manufacturing the oscillation device |
US7659918B2 (en) | 2003-10-08 | 2010-02-09 | Texas Instruments Incorporated | Apparatus and methods for adjusting the rotational frequency of a scanning device |
US20050078345A1 (en) | 2003-10-09 | 2005-04-14 | Turner Arthur Monroe | Scanning device with improved magnetic drive |
US7133061B2 (en) * | 2004-06-14 | 2006-11-07 | Texas Instruments Incorporated | Multilaser bi-directional printer with an oscillating scanning mirror |
JP4161971B2 (en) | 2005-02-16 | 2008-10-08 | セイコーエプソン株式会社 | Optical scanning device and image display device |
JP2009508723A (en) * | 2005-09-20 | 2009-03-05 | ピーティーエス ソフトウェア ビーブイ | Apparatus for constructing three-dimensional article and method for constructing three-dimensional article |
US7784933B2 (en) | 2006-06-29 | 2010-08-31 | Lexmark International, Inc. | Smart projector guides for handprinters |
KR100766600B1 (en) | 2006-07-18 | 2007-10-12 | 삼성전자주식회사 | Scanner |
JP5735803B2 (en) | 2007-08-23 | 2015-06-17 | スリーディー システムズ インコーポレーテッド | Automatic shape calibration method using laser scanning reflectometer |
WO2009044901A1 (en) * | 2007-10-05 | 2009-04-09 | Kyoto University | X method for forming flow passage using rotating tilt exposure method |
WO2010043275A1 (en) * | 2008-10-17 | 2010-04-22 | Huntsman Advanced Materials (Switzerland) Gmbh | Improvements for rapid prototyping apparatus |
JP2013530418A (en) * | 2010-04-28 | 2013-07-25 | レモプティックス ソシエテ アノニム | Microprojection device with anti-speckle imaging mode |
CN101950079A (en) | 2010-05-26 | 2011-01-19 | 香港应用科技研究院有限公司 | Biaxial scanning mirror with tunable resonant frequency |
ITVI20130229A1 (en) * | 2013-09-18 | 2015-03-19 | Ettore Maurizio Costabeber | STEREOLITHOGRAPHIC MACHINE WITH PERFECT OPTICAL GROUP |
RU150514U1 (en) * | 2013-12-24 | 2015-02-20 | Федеральное государственное бюджетное учреждение науки Институт проблем лазерных и информационных технологий Российской академии наук | INSTALLATION FOR FORMING BIOS-COMPATIBLE STRUCTURES |
-
2011
- 2011-12-23 IT IT000333A patent/ITVI20110333A1/en unknown
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2012
- 2012-12-24 RU RU2014128189/05A patent/RU2593448C2/en not_active IP Right Cessation
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2014
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2015
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Non-Patent Citations (2)
Title |
---|
JOSÉ CARVALHO FERREIRA: "Microstereolithography using digital micromirror devices", INFORMATION TECHNOLOGY AND ELECTRICAL ENGINEERING - DEVICES AND SYSTEMS, MATERIALS AND TECHNOLOGIES FOR THE FUTURE, 7 July 2006 (2006-07-07), XP055032918, ISBN: 978-3-93-884315-4 * |
YALCINKAYA ET AL: "Two-axis electromagnetic microscanner for high resolution displays", JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, IEEE SERVICE CENTER, US, vol. 15, no. 4, 1 August 2006 (2006-08-01), pages 786 - 794, XP008145248, ISSN: 1057-7157, DOI: 10.1109/JMEMS.2006.879380 * |
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TWI622488B (en) * | 2014-02-28 | 2018-05-01 | 艾托瑞 莫利齊奧 寇斯塔貝伯爾 | Improved stereolithography machine |
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WO2017066584A1 (en) * | 2015-10-15 | 2017-04-20 | Saint-Gobain Ceramics & Plastics, Inc. | Method for forming a three dimensional body from a mixture with a high content of solid particles |
US10953597B2 (en) | 2017-07-21 | 2021-03-23 | Saint-Gobain Performance Plastics Corporation | Method of forming a three-dimensional body |
Also Published As
Publication number | Publication date |
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JP2015506286A (en) | 2015-03-02 |
MX2014007386A (en) | 2014-09-11 |
RU2014128189A (en) | 2016-02-10 |
KR20140097554A (en) | 2014-08-06 |
ITVI20110333A1 (en) | 2013-06-24 |
IL233120A0 (en) | 2014-07-31 |
CN104039533A (en) | 2014-09-10 |
MX350109B (en) | 2017-08-28 |
RU2593448C2 (en) | 2016-08-10 |
BR112014015284A2 (en) | 2017-06-13 |
EP2794242A1 (en) | 2014-10-29 |
US9550326B2 (en) | 2017-01-24 |
HK1201054A1 (en) | 2015-08-21 |
CA2860143C (en) | 2016-11-22 |
SG11201403198VA (en) | 2014-09-26 |
EP2794242B1 (en) | 2020-06-17 |
BR112014015284A8 (en) | 2017-07-04 |
CA2860143A1 (en) | 2013-06-27 |
US20150070674A1 (en) | 2015-03-12 |
CN104039533B (en) | 2016-12-07 |
IL233120B (en) | 2019-01-31 |
JP6331096B2 (en) | 2018-05-30 |
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