WO2013077691A1 - Superhydrophobic substrate and method for manufacturing same - Google Patents

Superhydrophobic substrate and method for manufacturing same Download PDF

Info

Publication number
WO2013077691A1
WO2013077691A1 PCT/KR2012/010040 KR2012010040W WO2013077691A1 WO 2013077691 A1 WO2013077691 A1 WO 2013077691A1 KR 2012010040 W KR2012010040 W KR 2012010040W WO 2013077691 A1 WO2013077691 A1 WO 2013077691A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
water
repellent
method
superhydrophobic
Prior art date
Application number
PCT/KR2012/010040
Other languages
French (fr)
Korean (ko)
Inventor
김태수
최현
신부건
김재진
이종병
김수진
Original Assignee
주식회사 엘지화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to KR10-2011-0124442 priority Critical
Priority to KR20110124442 priority
Priority to KR10-2012-0133682 priority
Priority to KR1020120133682A priority patent/KR101541583B1/en
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority claimed from JP2013553382A external-priority patent/JP5961906B2/en
Publication of WO2013077691A1 publication Critical patent/WO2013077691A1/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B17/00Methods preventing fouling
    • B08B17/02Preventing deposition of fouling or of dust
    • B08B17/06Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement
    • B08B17/065Preventing deposition of fouling or of dust by giving articles subject to fouling a special shape or arrangement the surface having a microscopic surface pattern to achieve the same effect as a lotus flower
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B27/00Other optical systems; Other optical apparatus
    • G02B27/0006Other optical systems; Other optical apparatus with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation

Abstract

The present invention relates to a superhydrophobic substrate, in which multiple protruding parts are arranged in a pseudo random distribution on one surface of the substrate and an average spacing between the protruding parts is larger than a visible light wavelength. The superhydrophobic substrate according to the present invention is advantageous in that the average spacing between the protruding parts is larger than the visible light wavelength to ensure durability, and the protruding parts are arranged in a pseudo random distribution to adjust the sizes and distribution of the protruding parts so as to ensure transparency of the substrate.

Description

【Specification】

- the title of the invention;

"Superhydrophobic substrate and its manufacturing method

[Technology]

The present invention relates to a water-repellent substrate, and more particularly relates to a water-contact angle more than 140 o C superhydrophobic substrate and a method of manufacturing the same.

[Background Art]

Seconds to form an air gap between the substrate and the water surface with a concave-convex shape formed on the surface of the substrate is water-repellent substrate refers to a substrate made of a larger contact angle than the conventional water-repellent substrate. For a conventional water-repellent substrate form a contact angle of between about 100 o C ~ L10, but is formed with a contact angle of at least 140 o C for superhydrophobic substrate.

In general, the superhydrophobic substrate is uneven intervals (average interval between irregularities) may be classified into a small structure and larger structures than the visible light wavelength than visible light, an uneven gap formed on the surface of second water repellent substrate visible light wavelength is formed on the surface If larger, the case, but the durability is larger unevenness spacing and a problem that can be to the substrate is opaque to secure the visibility, uneven gap formed on the surface of second water repellent substrate is smaller than the visible light wavelength, the substrate is transparent to ensure visibility this can be difficult, but there was a decrease in durability uneven intervals, so small and the manufacturing process problems. On the other hand, as a method for preparing a superhydrophobic substrate, generally a method of forming irregularities on the substrate by dispersing the nanoparticles, a method of forming the unevenness by using a photolithographic method of forming recesses and protrusions using an electrostatic spraying method (electrospray) wateuna is used, the above-mentioned methods has a problem not being able to control the surface properties of the optical characteristics (e.g., size and distribution, etc. of the pattern formed on the substrate surface and the substrate such as transparency) of the substrate.

[Detailed Description of the Invention]

[Technical Solution] The present invention been made in view of the above problems, an aspect of the invention provides a substrate having a superhydrophobic cheungbun durability and transparency at the same time. The present invention also provides a method for producing superhydrophobic substrate in another aspect, to control the optical properties of the substrate. In another aspect, the present invention In a another aspect, the durability and the transparency is secured seconds provides a display device including a substrate water repellent ol.

S, the present invention In yet another aspect, there is provided an automobile including a glass substrate on which the second water-repellent durability, and transparency secured.

[Technical Solution]

In one aspect, the invention includes a plurality of projections arranged in a pseudo-random distribution (Pseudo random distribution) on one surface, and the average distance between the projections is provided with a large superhydrophobic substrate than the visible light wavelength. In another aspect, the invention provides a) the doctor has a large number of parts of the light transmitting or light shielding arranged in a random distribution, wherein the plurality of light transmitting portions or light shielding portion average interval is producing a large photomask than the visible light wavelength; And b) it provides a method for preparing a superhydrophobic substrate including forming a plurality of protrusions on the surface of the substrate using the produced photomask in the step a).

[Advantageous Effects]

Super water-repellent substrate according to the present invention have excellent durability and transparency, and is easy to manufacture and the manufacturing cost is inexpensive. In addition, according to the production process of the second water-repellent substrate according to the present invention can adjust the size and distribution of the protrusions formed on the surface of the substrate to control the transparency of the substrate, it is possible to easily manufacture a substrate having a large area.

[Brief Description of the Drawings] Figure 1 is a diagram showing a surface shape of the second water-repellent substrate according to one embodiment of the present invention.

Figure 2 is a diagram showing the contact angle of the second water-repellent substrate according to one embodiment of the present invention. 3 is a view showing the pattern design method using the Voronoi diagram to be used for the manufacture of a photomask used in the manufacturing method of the second water-repellent substrate according to one embodiment of the present invention.

Figure 4 is a SEM photograph showing the surface shape of the water-repellent substrate according to the comparative example.

[Best mode for practicing the invention;

With reference to the accompanying drawings will be described a preferred embodiment of the present invention. However, embodiments of the present invention can be modified in many different forms and is not limited to the embodiments and the scope of the present invention described below. In addition, embodiments of the present invention is provided to more completely describe the present invention come to those skilled in the art. The shapes of the elements in the figures and sizes and the like may be exaggerated for more clear explanation. 1 is a view showing a super water-repellent surface of the substrate shape in accordance with one embodiment of the invention. Referring to Figure 1, the second water-repellent substrate according to the present invention is characterized in that it comprises a plurality of projections (20) on one surface of the substrate 10. In this case, the substrate 10 is a transparent substrate in the visible region is not particularly limited, for example, glass, polymethyl methacrylate (PolyMethyl MethAcrylate, PMMA), polyethylene terephthalate (PolyEthylene Terephthalate, PET), polycarbonate (Polycarbonate , PC), polystyrene-block-poly (methyl methacrylate) has a (substrate made of polyStyrene-block-polyMethyl methAcrylate, PS ~ b- PMMA) or the like can be used. On the other hand, in the present invention, the plurality of protrusions 20 formed on one surface of the substrate 10 that are arranged in a pseudo-random distribution (Pseudo random distribution) with its features. At this time, the first pseudo compared to a random distribution (Pseudo random distribution) 1 is statistically is to mean a distribution that satisfies one or more rules randomly but, random (True random distribution) randomly distributed is distributed without any rule a concept. The pseudo-random distribution, to form a variety of pseudo-random distribution method known in the art, for example, a random number generating function, but can be formed by using a Voronoi diagram, the present invention is not limited thereto. On the other hand, that is used the random number generation function and the Voronoi diagram in various fields, including computers, building, communication, in the case of a random number generating function, a specific condition comes set, then a random distribution within the range satisfying the above conditions have to say that the method of generating value, may be implemented through a computer program to come. In addition, the Voronoi diagram is a method of forming a pseudo-random distribution which satisfies a specific condition by forming the region of each point in a vertical bisector between the plurality of dots which are randomly distributed on a plane.

On the other hand, in the present invention, the 'The number of projections are arranged in a pseudo-random distribution. The position of each projection called "but is set at random (random), the average spacing of the entire projection means geotol is arranged is controlled so as to satisfy a predetermined range. Case of the arrangement of the protrusions on the substrate rules, it is difficult to ensure transparency by the diffraction and interference of light, when the arrangement of the protrusions on the substrate a completely random distribution can be improved in transparency. However, physical properties such as water repellency and water resistance the difficulty lies in the uniform implementation. On the other hand, it is possible to implement an excellent super water-repellent substrate, all of the plurality of the array of projections to the pseudo-random distribution, to control the average distance between the projections to a specific range, transparency, water repellency, and the characteristics of durability and the like as in the present invention. On the other hand, in the present invention, the average distance between the projections is preferably higher than the visible light wavelength. This is to ensure the durability of the superhydrophobic substrate. Specifically and the deulchul governmental mean spacing is approximately 0.4 to lOOj i, for example, about 1 to 50, 5 to 30 degree, To 10 / ΛΠ may be on the order or about 10 to 100. Eu the average distance between the projections is coming m at this time the water-repellent properties as well as the formation difficult by the etching process used is reduced is less than, is becomes greater than the diameter of the average distance between the projection droplets when it exceeded 100 to obtain the desired water-repellent properties the problem does not occur. In the present invention, the projections are preferably adjacent the spacing between the projections is formed so as to satisfy the normal distribution (distr normal ibut ion). This is because, the water repellency and transparency can all get excellent superhydrophobic substrate if the distance to satisfy the normal distribution between adjacent protrusions. At this time, the average value of the normal distribution is the average distance between the projections, a standard deviation value of the normal distribution is preferably 1/20 ~ 1/4 of the mean value. That is, the standard deviation of the normal distribution may be 1/20 to 1/4 of the average distance between the projections. When the standard deviation values ​​satisfy the above numerical value range, the physical properties of the substrate, because it is excellent in particular. The shape of the plurality of protrusions may vary, such as the prototype-type, cone-shaped, square pillar-like and not particularly limited. The diameter of the protrusion is dependent on the average distance between the projections arranged in a pseudo-random distribution (distr Pseudo random ibut ion). Here, means the diameter of the portion of the projecting portion in contact with the substrate is the diameter of the projection, for example, in the case of the conical diameter of the lower circle, in the case of type gideung mean diameter of the lower source. The diameter of the projection is about 5 to 30% of the average distance between the projections, for example, 10 to 25%, about 15% to 20%, may be on the order 2OT to 30%, or 5 to 20%. A problem occurs that the diameter of the protrusions, the transparency of the haze value is increased superhydrophobic substrate if one becomes to less than 5% of the average distance between the projections, weak and durability of the pattern formed on the second water-repellent substrate, greater than 30% decrease can. Further, dependent on the average distance between the projections arranged in a pseudo-random distribution of the height of the projecting portion (Pseudo random distribution). The height of the projections is about 15 to 90% of the average distance between the projections, for example, can be on the order of 20 to 60%, and 30 to 50%, about 40% to 90% or 15% to 40%. When the height of the projection is less than 15% of the average interval between the protrusions is difficult to indicate a super water-repellent properties, there is a problem that the durability is susceptible of a pattern formed on the second substrate water repellent is possible when more than 10. Because it is preferred that the haze value is less than or equal to 2 for clarity securing of: superhydrophobic substrate having a structure as described above, it is article eu which the superhydrophobic substrate applied preferably (cars, etc.) have a haze value of less than 2 . 100 as if in the context of the present invention, the haze is the incident light is scattered to be 100% through the substrate and is referred to as 0 if the scattering is not at all. Value between 0 and 100 represents the percentage value of the incident light is scattered by passing through the substrate. Alternatively, the second water-repellent substrate may have a haze value in the haze value of from 0.2 to 1.2, or 0.5 to 1.0. On the other hand, Figure 2 is a diagram showing the contact angle of the second water-repellent substrate according to one embodiment of the invention, Fig. 2, the second water-repellent substrate according to one embodiment of the present invention preferably has at least 140 ° C Contact angle and, for example, it is desirable to have more than l50 o C the contact angle. This is because the super water-repellent developer flowing without substantially condensing of water on the contact angle more than 140 ° C is expressed. Here refers to the angle with respect to the substrate surface when the liquid of the stationary phase in the contact angle is superhydrophobic substrate to draw a straight line to the liquid surface at the point in contact with the substrate. Meanwhile, the second water-repellent substrate according to the "Other embodiments of the present invention, the hydrophobic (hydrophobic) coating layer of a material on the surface including the plurality of protrusions may further include. That for the coating layer of the hydrophobic substance is enhanced early water repellency of the substrate, and the hydrophobic material may include a fluorine-based compound, a silane-based compound can be used, such as poly-tetra-ethylene (PolyTetraFluoroEthylene, PTFE) fluoro, siloxane ( siioxane the like) it may be used. The above-described super water-repellent substrate according to the present invention can be applied to various fields such as a transparent substrate, the cell phone display, camera lenses of automotive glass display device. Further, the second water-repellent substrate of the present invention using a since the average distance between the projections larger than the visible wavelengths, a relatively long photolithography process using a light source with a wavelength band, or an embossing, the method prints the pitcher, such as to form a protrusion because, it is easy to be applied to a substrate having a large area. Next, an embodiment of the manufacturing method of the second water-repellent substrate according to the present invention. Production method of the second water-repellent substrate according to the present invention a) The photomask manufacturing step, and b) comprises forming a plurality of protrusions on the surface of the substrate by using the photomask prepared in step a). Wherein step a) it is characterized in that for producing a photomask having a case of applying the negative photosensitive agent to a plurality of light transmitting portions (a substrate arranged in a pseudo-random distribution) or a light shielding portion (in the case of applying a positive photosensitive agent to a substrate) . Which when a projection is formed on a substrate using the photo mask doctor arranging the projections in a random as for arranged in a distribution, the pseudo-random distribution can adjust the size and spacing between the projections of the projections it is possible to control the optical characteristics such as transparency of the substrate because. The doctor plurality of light transmitting portions are arranged in a random distribution or a light shielding portion formed by a pattern designing method using a method generally formed pseudo-random distribution which is used in the art, for example, a random number generation function or the Voronoi diagram, etc. can do. For example, the plurality of light transmitting portions or light shielding portion of the present invention, and the resulting values ​​after setting the mean spacing and / or the standard deviation value of the desired projection using a random number generation function that satisfies the pseudo-random distribution, the It may be formed in a way to form a pattern that corresponds to the light transmitting portions or light blocking position of the generated value. On the other hand, Fig. 3 shows a pattern design method using a Voronoi diagram. 3, the pattern design method using the Voronoi diagram is a step of forming a unit cell area considering the average interval of the desired projection (see <A> in Fig. 3); Forming a pattern corresponding to the light transmitting portion or the light shielding in the center of gravity of the unit cells (see <B> in FIG. 3); And it may be formed of a step (see Fig. 3 O) removing the Voronoi diagram pattern. On the other hand, the mean spacing between the light transmission or the light shielding portion is preferably larger than the wavelength of visible light. Specifically, the light transmitting or light shielding governmental average spacing is about 0.4 to 100, for example, 1/50 to an extent of 5 to 30 degree, 10 degree, or 0.4 to 10 / m to 100 may be on the order. The light transmitting or light shielding governmental average interval 0.½m photo current product is difficult to form a pattern by using a lithography method, 100 / ztn than the desired water-repellent properties are the average distance between the projections is to be greater than if the water droplets that are less than the problem can occur that can not be obtained. Further, the diameter of the light transmitting or light shielding portions pattern is dependent on the light transmitting or light shielding governmental average interval. Specifically, the light transmitting or light shielding portion diameter is about 5 to 30% of the average distance the light transmitting or light shielding governmental, e.g., 10 to 25%, and 15% to 20%, 20% and 30 percent or 5 to 20% may be on the order. The light transmission or the light shielding portion diameter of the light transmitting portions or light blocking when a case governmental less than 5% of the average interval becomes vulnerable, the durability of the pattern formed on the second water-repellent substrate, greater than 30%, the haze value is increased superhydrophobic substrate which decreases the transparency can cause problems. On the other hand, the step b) may be coated with a photosensitive agent to the surface of the substrate, and performing a method of forming a plurality of protrusions on the surface of the a) the substrate was irradiated by ultraviolet light coming via the photomask manufactured in this step. Here, as the photosensitive material may be used for both negative photosensitive agent, a positive photosensitive agent. For example, although the like Su- 8 photosensitizer, AZ 4230, not necessarily limited to this is the fact that the apparent to those skilled in the art.

[Mode for Carrying out the invention]

It is to be described in detail for the second water-repellent substrate, and a manufacturing method in accordance with one embodiment described below, the present invention using the embodiment. However, the present invention is not limited to this. Example

(1) Preparation of the photomask

1) and then by setting the mean spacing to form a unit cell of a Voronoi diagram, the design patterns of circular shapes with a diameter of 3 卿 the center of gravity of the Voronoi diagram pattern of unit cells, by removing the Voronoi diagram pattern and designing a plurality of patterns of circular shapes arranged in a pseudo-random distribution.

2) keureum thin film is formed, and transferring the design pattern on a substrate of the chromium thin film of photoresist is coated on the quartz material, and shaping the transferred photoresist.

3) developing the film with a photoresist pattern produced after the after etching the chromium film to remove the remaining photoresist.

4) After the photo resist removal and cleaning, by examining the defect to on the mask, to repair a defect will be completing a photomask. The photomask prepared as described above is formed of a plurality of light transmitting portions of a circular shape with a diameter of the plurality of light transmission is arranged in a pseudo-random distribution, average distance between the light transmission is 20 eu.

(2) manufacturing a plurality of protrusions on a substrate

1) Preparation of poly (methyl methacrylate) (Polymethyl Methacrylate, PMMA) substrate, and applying a photosensitive agent Su-8 on one surface of the substrate.

Via a photomask produced in 2) (1) is developed on the photosensitive material layer was irradiated by ultraviolet ray. By removing the unexposed areas after development to prepare a super water-repellent substrate comprising a plurality of protrusions.

A plurality of protrusions formed on one surface of the resulting superhydrophobic substrate are arranged in a pseudo-random distribution, the diameter of the projecting portion 3 and a height of 10 and a mean spacing between the projections 20,.

(3) a hydrophobic coating material to the substrate surface

To the surface of the polytetrafluoroethylene in the manufacture superhydrophobic substrate is coated all-ethylene (PolyTetraFluoroEthylene, PTFE). Comparative Example

A plurality of diamond-shaped was prepared and the substrate is water-repellent in the same manner as in Example, except that the formation of the pattern of the photomask to design a pattern arranged in a line. 4 is a diagram showing the surface shape of the water-repellent substrate according to the comparative example. 4, the plurality of protrusions are formed on one surface of a water-repellent substrate according to the comparative example is diamond-shaped and arranged in a line in two dimensions, and the average spacing of 20 between the projections, the diameter of the projection is 3 / / m, the height lOim. Comparative Examples in that the water-repellent substrate according to the embodiment from the above results, one similar to the water-repellent substrate according to the Comparative Example in an average distance that is greater than the visible light wavelength between the protrusions formed on its surface, the protrusions are arranged in a pseudo-random distribution according to the. other it is different from the water-repellent substrate. Experimental Example

(1) Measurement on the contact angle

Using a Kruss dsa 100-meter to measure the contact angle of the superhydrophobic surface of the substrate.

(2) Measurement of haze

The transparency of the water-repellent substrate was measured in seconds, using the HR-100 of Murakami color research lab. The superhydrophobic substrate manufactured by the embodiment, were measured by 154. As a result of measuring a contact angle at its surface, and the haze value was 1.7. The water repellent substrate prepared by the comparative examples, the result of measuring a contact angle of 151 0 in the surface, to rise value was 18.7.

Water-repellent substrate according to the embodiment from the above-mentioned results, while the contact angle is greater when compared to the water-repellent substrate according to the comparative example at the same time was confirmed that transparency is also excellent. This projecting portion according to the embodiment, unlike the comparative example there is the gap are arranged in a visible light wavelength or more or a pseudo-random distribution because it can secure the transparency. Although detailed description will be given of an embodiment of the present invention at least the scope of the present invention, this limited rather, various changes and modifications may be that it is the art may be made without departing from the scope of the invention as set forth in the claims it will be apparent to those skilled in the art.

Claims

[Claims]
11. The
One pseudo-random distribution in (Pseudo random distribution) includes a plurality of projections arranged in, and the average interval is greater than the second water-repellent substrate visible light between said projection surface.
[Claim 2]
According to claim 1,
The average interval is 0.4 to 100 Domain superhydrophobic substrate between the protruding portion.
[Claim 3]
According to claim 1,
Superhydrophobic substrate to a distance between the plurality of projections adjacent protrusions satisfies a normal distribution.
[Claim 4]
4. The method of claim 3,
The standard deviation of the normal distribution of the super water-repellent substrate 1/20 to 1/4 of the average distance between the projections.
[5.]
I in the U, wherein
The diameter of the protrusions is 5% to 30% of the super water-repellent substrate of the mean spacing between the projections.
[6.]
According to claim 1,
The haze of the second water-repellent substrate is not more than 2 seconds, the water-repellent substrate.
[7.]
According to claim 1,
Superhydrophobic substrate further comprising a coating of hydrophobic material on a charging surface comprising a plurality of protrusions.
[Claim 8]
In going to 17,
The hydrophobic materials are fluorine-based compound or a silane-based compound is a superhydrophobic substrate.
[Claim 9] a) the doctor has a large number of parts of the light transmitting or light shielding arranged in a random distribution, wherein the plurality of light transmitting portions or light shielding portion average interval is producing a large photomask than the visible light wavelength; And
b) method for producing the a) superhydrophobic substrate using the produced photomask, comprising: forming a plurality of protrusions on the surface of the substrate in the step.
[Claim 10]
In to 9,
The a) step is a Voronoi diagram (diagram voronoi) a method of producing a superhydrophobic substrate using the pattern design method.
[Claim 11]
In going to 19,
The a) method for producing the diameter of the light transmission or the light intercepting parts of the light transmitting or light shielding step governmental average distance of 5% to 30% of a super water-repellent substrate.
[12.]
10. The method of claim 9,
Method of producing a superhydrophobic substrate further comprises the step of coating a hydrophobic substance on the surface of the substrate on which the plurality of protrusions are formed.
[13.]
A first display device including any one of the second substrate of the water-repellent to claim 8. [14.]
Claim 1 to automotive glass that includes any one of the super water-repellent substrate of claim 8 wherein all.
PCT/KR2012/010040 2011-11-25 2012-11-26 Superhydrophobic substrate and method for manufacturing same WO2013077691A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR10-2011-0124442 2011-11-25
KR20110124442 2011-11-25
KR10-2012-0133682 2012-11-23
KR1020120133682A KR101541583B1 (en) 2011-11-25 2012-11-23 Superhydrophobic substrate and the method manufacturing the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013553382A JP5961906B2 (en) 2011-11-25 2012-11-26 Superhydrophobic substrate and a manufacturing method thereof
CN201280012424.9A CN103443660B (en) 2011-11-25 2012-11-26 Superhydrophobic substrate and manufacturing method thereof
US13/951,180 US9376341B2 (en) 2011-11-25 2013-07-25 Superhydrophobic substrate and method of manufacturing the same

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/951,180 Continuation US9376341B2 (en) 2011-11-25 2013-07-25 Superhydrophobic substrate and method of manufacturing the same

Publications (1)

Publication Number Publication Date
WO2013077691A1 true WO2013077691A1 (en) 2013-05-30

Family

ID=48470065

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/010040 WO2013077691A1 (en) 2011-11-25 2012-11-26 Superhydrophobic substrate and method for manufacturing same

Country Status (1)

Country Link
WO (1) WO2013077691A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003236955A (en) * 2002-02-19 2003-08-26 Sentan Gijutsu Incubation Systems:Kk Ultra-water-repellent material
JP2006083244A (en) * 2004-09-15 2006-03-30 Citizen Seimitsu Co Ltd Molded article having extremely water-repelling surface and method for producing the same
KR20100008579A (en) * 2008-07-16 2010-01-26 한국과학기술원 Patterns having super-hydrophobic and super-hydrorepellent surface and method of forming the same
US20100021692A1 (en) * 2006-09-21 2010-01-28 Edward Bormashenko Superhydrophobic nanotextured polymer and metal surfaces
KR20100099387A (en) * 2009-03-03 2010-09-13 주식회사 엘지화학 Method for desigining diffusing film having irregular spherical shaped patterns

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003236955A (en) * 2002-02-19 2003-08-26 Sentan Gijutsu Incubation Systems:Kk Ultra-water-repellent material
JP2006083244A (en) * 2004-09-15 2006-03-30 Citizen Seimitsu Co Ltd Molded article having extremely water-repelling surface and method for producing the same
US20100021692A1 (en) * 2006-09-21 2010-01-28 Edward Bormashenko Superhydrophobic nanotextured polymer and metal surfaces
KR20100008579A (en) * 2008-07-16 2010-01-26 한국과학기술원 Patterns having super-hydrophobic and super-hydrorepellent surface and method of forming the same
KR20100099387A (en) * 2009-03-03 2010-09-13 주식회사 엘지화학 Method for desigining diffusing film having irregular spherical shaped patterns

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
SAMAHA ET AL.: "Modeling drag reduction and meniscus stability of superhydrophobic surfaces comprised of random roughness", PHYSICS OF FLUIDS, vol. 23, no. 012001, January 2011 (2011-01-01), pages 1 - 8, XP055069901 *

Similar Documents

Publication Publication Date Title
del Campo et al. SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography
EP1377853B1 (en) Microlens for projection lithography and method of preparation thereof
US7695887B2 (en) Method for producing pattern-forming body
Wu et al. High numerical aperture microlens arrays of close packing
JP5808913B2 (en) Array manufacturing method and mold
US6828068B2 (en) Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
Yang et al. High fill-factor microlens array mold insert fabrication using a thermal reflow process
Wu et al. A deep sub-wavelength process for the formation of highly uniform arrays of nanoholes and nanopillars
US7479318B2 (en) Fibrillar microstructure and processes for the production thereof
US6958207B1 (en) Method for producing large area antireflective microtextured surfaces
CN101930085B (en) Antireflection optical element, and method for producing original board
Park et al. Nanotextured silica surfaces with robust superhydrophobicity and omnidirectional broadband supertransmissivity
US9000353B2 (en) Light absorption and filtering properties of vertically oriented semiconductor nano wires
EP2632614B1 (en) Superhydrophobic film constructions
KR20110003266A (en) Optical element, method for producing the same, and display apparatus
Ji et al. Optimal moth eye nanostructure array on transparent glass towards broadband antireflection
US20100033818A1 (en) Microstructures to reduce the appearance of fingerprints on surfaces
JP4380522B2 (en) Method for producing a replicative microlens array
US20060237881A1 (en) Combined nanoimprinting and photolithography for micro and nano devices fabrication
CN101160219A (en) Transfer film containing a layer with wale structure
JP2005234538A (en) Optical film for display
JP2012001000A (en) Molding die for optical device having antireflective structure, and optical device
WO2009023169A1 (en) Structured smudge-resistant coatings and methods of making and using the same
US8753526B2 (en) Porous thin film having holes and a production method therefor
US8840258B2 (en) Antireflection structure formation method and antireflection structure

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12850790

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase in:

Ref document number: 2013553382

Country of ref document: JP

Kind code of ref document: A

NENP Non-entry into the national phase in:

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12850790

Country of ref document: EP

Kind code of ref document: A1