WO2013077483A1

WO2013077483A1 - Variable ion guide and electron cyclotron resonance ion source apparatus including same

Info

Publication number: WO2013077483A1
Application number: PCT/KR2011/009083
Authority: WO
Inventors: 이병섭; 원미숙; 윤장희; 최세용; 옥정우; 박진용; 김병철
Original assignee: 한국기초과학지원연구원
Priority date: 2011-11-25
Filing date: 2011-11-25
Publication date: 2013-05-30
Also published as: KR101658010B1; KR20140098077A

Abstract

The variable ion guide can include: a variable chamber having the length thereof adjusted in one direction; one or more guide electrodes connected to the variable chamber and having the position thereof determined through the adjustment of the length of the variable chamber; and an extraction electrode connected to one end of the variable chamber. With the variable ion guide, an electron cyclotron resonance (ECR) ion source can be configured by including the variable ion guide, a plasma chamber, a magnet unit, and a microwave generating unit. According to the variable ion guide and the ECR ion source apparatus, beams having excellent quality and beams of high current can be variously extracted for ion extraction by properly adjusting the electrode shapes and the sizes and positions of the holes formed in the electrodes.

Description

Variable ion guide and electron eddy resonance ion source device including the same

Embodiments relate to a variable ion guide and an Electron Cyclotron Resonance ion source device comprising the same.

In many applications requiring ion source devices, electron cyclone resonance (ECR) ion source devices are being used that can generate the required ions at a relatively low cost. For example, Korean Patent Publication No. 10-0927995 discloses an ECR ion source device that generates ions by an ECR phenomenon using a magnetic field and microwaves. ECR ion source devices can generate high energy ions and are also used as ion implantation sources such as cyclotron devices and heavy ion linear accelerators for generating radioisotopes for medical and material research purposes.

However, in order to realize a high intensity ion beam in an ECR ion source device, an optimal ion beam extraction condition must be obtained through experiments. There is a method of adjusting the ion guide inside the plasma chamber to adjust the ion beam extraction conditions, but there is a risk of damaging the high vacuum of the plasma chamber in the process of adjusting the ion guide in the plasma chamber. In addition, when the ion guide is also used as an electrode, care must be taken in insulation since a high voltage lead must be inserted into the plasma chamber. In addition, since the plasma chamber is relatively small, the shape of the ion guide is limited, and the exchange of the ion guide is inconvenient, making it difficult to realize various conditions in the application of the ECR ion source device to deposition equipment.

According to an aspect of the present invention, an electrode for ion withdrawal is located outside the plasma chamber, and the electrode is mounted in a variable and / or replaceable manner so that the extraction condition may be adjusted so as to conform to the Electron Cyclotron Resonance (ECR) region. It is possible to provide a variable ion guide and an ECR ion source device including the same that can be adjusted.

In one embodiment, a variable ion guide includes a variable chamber configured to adjust a length in one direction; One or more guide electrodes connected to the variable chamber such that the position is determined by adjusting the length of the variable chamber; And an extraction electrode connected to one end of the variable chamber and electrically separated from the guide electrode.

Electron eddy resonance (ECR) ion source device according to one embodiment, the plasma chamber is a plasma generation; A magnet unit for applying a magnetic field in the plasma chamber; A microwave generator for applying microwaves in the plasma chamber; And a variable ion guide for extracting ions generated from the plasma from the plasma chamber by electron eddy resonance caused by the magnetic field and the microwave.

In the ECR ion source device, the variable ion guide, one end is connected to the plasma chamber, the variable chamber configured to adjust the length of the ion traveling direction; One or more guide electrodes connected to the variable chamber such that the position is determined by adjusting the length of the variable chamber; And an extraction electrode connected to the other end of the variable chamber and electrically separated from the guide electrode.

According to the variable ion guide according to an aspect of the present invention and the electron eddy resonance (ECR) ion source device including the same, various extraction and deposition by adjusting the position of the electrode and the size of the electrode hole for ion extraction The condition can be satisfied and a high quality beam can be drawn and a high current beam can be drawn. The above ECR ion source device has high industrial applications to various devices such as X-ray devices and ion accelerators, and can also be used in various medical fields and research fields.

1 is a schematic cross-sectional view of an Electron Cyclotron Resonance (ECR) ion source device according to one embodiment.

2 is a schematic cross-sectional view of an ECR ion source device according to another embodiment.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a schematic diagram of an Electron Cyclotron Resonance (ECR) ion source device according to one embodiment.

Referring to FIG. 1, an ECR ion source device according to an embodiment may include a plasma chamber 1, a magnet part 2, a microwave generator 3, and a variable ion guide 4. Plasma is generated from the reaction gas injected into the plasma chamber 1, and electrons in the plasma are heated by a resonance phenomenon of a magnetic field applied by the magnet part 2 and a high frequency electromagnetic field applied by the microwave generator 3. The multi-charged ions may be generated by the heated electrons. In the variable ion guide 4, the generated ions can be selectively extracted and integrated in the form of an ion beam.

FIG. 1 shows a cross section of each component of an ECR ion source device according to one embodiment, where each component of the actual ECR ion source device has at least partially any cross section as shown in FIG. 1. It may have a three-dimensional shape. For example, each portion of the plasma chamber 1, the magnet portion 2 and the variable ion guide 4 may be in the shape of a hollow ring or cylinder having a cross section shown in FIG. 1. However, this is exemplary and each component of the ECR ion source device according to an embodiment is not limited to having a specific shape or form.

The plasma chamber 1 may include a source inlet 11, a microwave inlet 12, and an ion outlet 13. Reaction gas for plasma generation may be injected into the plasma chamber 1 through the source injection hole 11. As a reaction gas injected through the source injection unit 11, various materials capable of generating plasma may be used. For example, argon (Ar) or xenon (Xe) gas may be used as the reaction gas, but is not limited thereto. In addition, the source injection hole 11 may be used to adjust the degree of vacuum in the plasma chamber (1). For example, the source inlet 11 may be connected to a vacuum pump (not shown) or the like and used to exhaust the gas in the plasma chamber 1. The degree of vacuum in the plasma chamber 1 may be appropriately determined to the extent that an ECR plasma can be generated according to the type of reaction gas. The microwave injection hole 12 may be aligned with the microwave generator 3 as a portion to which microwaves are irradiated. In addition, the ion extractor 13 may be connected to the variable ion guide 4 as a portion from which the ions are extracted from the plasma chamber 1.

The magnet part 2 may include a mirror magnet 21, a correction magnet 22, and a pole magnet 23. The mirror magnets 21 may be located at both ends of the space for generating the ECR plasma, and the pole magnets 23 may be located between the two mirror magnets 21. Electrons can be trapped in the plasma chamber 1 by the mirror magnetic field applied by the mirror magnet 21 and the magnetic field applied by the pole magnet 23. The correction magnet 22 may be configured to be positioned adjacent to the point where the size of the mirror magnetic field is minimum to adjust the size of the minimum magnetic field in the plasma chamber 1. The correction magnet 22 may be configured to adjust the magnitude of the magnetic field applied by the correction magnet 22 without changing the structure. For example, the correction magnet 22 may be made of an electromagnet or the like that can adjust the magnetic field in software.

In FIG. 1, each

magnet

21, 22, 23 of the magnet part 2 has a rectangular cross section and is positioned surrounding the plasma chamber 1. For example, each of the

magnets

21, 22, and 23 may have a hollow ring shape, and the plasma chamber 1 may be disposed at an empty center portion of each of the

magnets

21, 22, and 23. For example, the mirror magnet 21 and the correction magnet 22 may be in the form of a solenoid and the pole magnet 23 may be made of six combinations of magnets in the form of racetracks. However, this is exemplary and each

magnet

21, 22, 23 may have another suitable shape capable of applying a magnetic field in the plasma chamber 1.

The microwave generator 3 is a device for generating microwaves and injecting them into the plasma chamber 1. For example, the microwave generator 3 may include an oscillator such as a magnetron or a gyrotron. The microwave generator 3 may apply microwaves to the reaction gas in the plasma chamber 1 through the microwave injection hole 13 of the plasma chamber 1. When microwaves are applied to the reaction gas in the plasma chamber 1 in an appropriate magnetic field and gas atmosphere, electron eddy resonance may occur to generate polyvalent ions from the plasma.

The variable ion guide 4 may include a variable chamber 40, one or more guide electrodes 41, and an extraction electrode 42. The variable chamber 40 may be configured to adjust the length in one direction. By adjusting the length of the variable chamber 40, the positions of the one or more guide electrodes 41 and the drawing electrodes 42 can be determined. In FIG. 1, arrows in both directions marked on the guide electrode 41 and the extraction electrode 42 indicate that the position of each electrode may be changed. That is, the position of the guide electrode 41 and the extraction electrode 42 in the ion traveling direction may be changed by adjusting the length of the variable chamber 40.

The variable chamber 40 may be coupled to the ion outlet 13 of the plasma chamber 1 so as to adjust the length of the traveling direction of the ions. The variable chamber 40 may be made of one or more corrugated pipes 400. As the shape of the corrugated pipe 400 is deformed, the length of the corrugated pipe 400 decreases or extends, so that the lead pipe 41 connected between the corrugated pipe 400 and one end of the variable chamber 40 is connected to each other. The position of the electrode 42 can be adjusted. In order to change the shape of the corrugated pipe 400, the variable chamber 40 may be connected to the power source 44 through the connecting portion 43. For example, the power source 44 may consist of a motor and a voltage source and the variable chamber 40 may be mechanically and / or electrically connected to the motor through the connection 43. The variable chamber 40 may be made of an insulating material.

One or more guide electrodes 41 may serve to accumulate ions and plasma generated in the plasma chamber 1 and to accelerate ions. One or more guide electrodes 41 are connected to the variable chamber 40, and the position in the ion propagation direction may be determined by adjusting the length of the variable chamber 40. One or more guide electrodes 41 may be detachably connected to the variable chamber 40. For example, by separating each corrugated pipe 400 of the variable chamber 40, the guide electrode 41 between each corrugated pipe 400 may be separated from the variable chamber 40. Therefore, the guide electrode 41 can be easily replaced, and an appropriate guide electrode 41 can be used according to the withdrawal conditions to be achieved. Each guide electrode 41 may include a hole for passing ions. In addition, each of the guide electrodes 41 may have a shape of a cone in which the surface of the guide electrode 41 is inclined with respect to the ion traveling direction. However, as an example, the guide electrode 41 may be a flat plate shape including one or more holes, or another suitable shape for accelerating and withdrawing ions.

The extraction electrode 42 may serve to extract ions accelerated by the guide electrode 41 and output the ions in the form of an ion beam. The lead electrode 42 may be connected to one end of the variable chamber 40. For example, one end of the variable chamber 40 may be connected to the outlet 13 of the plasma chamber 1, and the lead electrode 42 may be connected to the other end of the variable chamber 40. As with the one or more guide electrodes 41, the position of the lead-out electrode 42 may be adjusted by adjusting the length of the variable chamber 40. The extraction electrode 42 is an electrode for focusing ions in the form of a beam, and may have a suitable shape for focusing and outputting ions, and is not limited to a specific shape.

The one or more guide electrodes 41 and the drawing electrodes 42 may be electrically connected to the power source 46 through the leads 45. The power source 46 may apply a voltage to the one or more guide electrodes 41 and the drawing electrodes 42 through the lead 45, and accumulate and accelerate ions in the plasma chamber 1 by the applied voltage. It can output in the form of a beam. In FIG. 1, the one or more guide electrodes 41 and the drawing electrodes 42 are all shown to be electrically connected to the same power source 46, but the voltages applied to the respective guide electrodes 41 and the drawing electrodes 42 are It may be different from each other. For example, the lead electrode 42 may be electrically connected to a ground source to remain in the ground state. In addition, a voltage may be applied to only some of the one or more guide electrodes 41 and the voltages applied to the respective guide electrodes 41 may be different from each other.

In the above-described ECR ion source device, by using the variable chamber 40, the positions of one or more guide electrodes 41 and the extraction electrodes 42 for ion extraction can be properly adjusted, and the guide electrodes 41 can be easily replaced. can do. By using the variable ion guide 4 configured as described above, it is possible to take out a high quality beam by satisfying various drawing conditions and deposition conditions, and to extract a beam of high current. The ECR ion source device may not only have high industrial application to various devices such as X-ray devices and ion accelerators, but also may be variously used in medical related fields and research fields.

2 is a schematic cross-sectional view of an ECR ion source device according to another embodiment. In the description of the embodiment illustrated in FIG. 2, descriptions of parts easily understood by those skilled in the art from the embodiments described above with reference to FIG. 1 will be omitted, and differences from the embodiment illustrated in FIG. 1 will be described. do.

Referring to FIG. 2, in the ECR ion source device according to the present exemplary embodiment, the variable ion guide 4 may include a variable chamber 40, one or more guide electrodes, and an extraction electrode 42. Here, the one or more guide electrodes may include a first electrode 411 and a second electrode 412. In addition, the one or more guide electrodes may further include a third electrode 413. The first electrode 411, the third electrode 413, and the lead electrode 42 may be electrically connected to the power source 46 through the lead 45. However, voltages applied to each of the first electrode 411, the third electrode 413, and the extraction electrode 42 may be different from each other, or a voltage may be applied to only some of these electrodes. This can be easily understood from the above-described embodiment with reference to FIG. 1, so a detailed description thereof will be omitted.

The first electrode 411 may include a hole 4110 through which ions pass. In addition, the second electrode 412 may include a hole 4120 through which ions pass. The second electrode 412 may be located in the hole 4110 of the first electrode 411, so that the size of the second hole 4120 may be smaller than the size of the first hole 4110. The first electrode 411 and the second electrode 412 may have the shape of a cone in which the surfaces of each electrode are inclined with respect to the ion propagation direction.

In one embodiment, the second electrode 412 may be a variable electrode capable of adjusting the position in the ion traveling direction, the size of the second hole 4120 and / or the surface inclination angle θ. For example, the second electrode 412 has a shape in which a plurality of plates overlap each other, and the size of the second hole 4120 and the surface inclination angle θ of the second electrode 412 can be adjusted by adjusting the angle between the plates. It may be configured. In order to vary the second electrode 412, the second electrode 412 may be connected to the power source 48 through the connection 47. For example, the power source 48 may consist of a motor and a voltage source, and the second electrode 412 may be mechanically and / or electrically connected to the motor through the connection 47.

The third electrode 413 is another electrode for focusing and accelerating ions, and may have a flat plate shape including one or more holes 4130. However, this is exemplary, and the third electrode 413 may have a conical shape in which the surface is inclined with respect to the direction of ion migration, similar to the first electrode 411 and the second electrode 412, or focuses and accelerates the ion. Other different shapes may be used.

In one embodiment, the variable chamber 40 may include one or more channels 401 into which cooling material is injected. The first electrode 411 may be used as a positive electrode to accelerate the ions, and at this time, a temperature increase may occur due to the microwave and the plasma. To compensate for this, one or more channels 401 are formed in which the cooling material is injected into the variable chamber 40, and the first electrode 411 contacts the surface of the variable chamber 40 adjacent to the one or more channels 401. The first electrode 411 can be cooled. In this case, in order to improve the cooling efficiency, the contact surface of the first electrode 411 and the variable chamber 40 may be increased.

In the ECR ion source device, the region with the highest ion density is a region moved somewhat outward from the center rather than the center in the ion propagation direction in the plasma chamber 1. In order to withdraw as much ions as possible from the ECR ion source device, it must be possible to withdraw at a place where the ion density is relatively high. In the ECR ion source device according to the above-described embodiment, as the second electrode 412 is variable in the variable ion guide, the position and width of the hole from which the ions are extracted are changed, so that the extraction condition may be changed. Therefore, it is possible to satisfy various drawing conditions and deposition conditions, to draw a beam of high quality, and to draw a beam of high current.

Although the present invention described above has been described with reference to the embodiments shown in the drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and variations may be made therefrom. However, such modifications should be considered to be within the technical protection scope of the present invention. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims

A variable chamber configured to adjust a length in one direction;

One or more guide electrodes connected to the variable chamber such that the position is determined by adjusting the length of the variable chamber; And

And a lead electrode connected to one end of the variable chamber.
The method of claim 1,

The one or more guide electrodes,

A first electrode including a first hole; And

And a second electrode positioned in the first hole and including a second hole.
The method of claim 2,

The second electrode is a variable ion guide, characterized in that the variable electrode that can adjust at least one of the position in the one direction, the size of the second hole and the surface tilt angle with respect to the one direction.
The method of claim 2,

The one or more guide electrodes,

And a third electrode including one or more third holes.
The method of claim 4, wherein

At least one of the first electrode, the second electrode, and the third electrode is detachably connected to the variable chamber.
The method of claim 1,

The variable chamber is a variable ion guide, characterized in that made of an insulating material.
The method of claim 1,

And the variable chamber comprises one or more channels into which cooling material is injected.
A plasma chamber in which plasma is generated;

A magnet unit for applying a magnetic field in the plasma chamber;

A microwave generator for applying microwaves in the plasma chamber; And

It includes a variable ion guide for extracting the ions generated from the plasma from the plasma chamber by the electromagnetic eddy resonance by the magnetic field and the microwave,

The variable ion guide,

A variable chamber having one end connected to the plasma chamber and configured to adjust a length of an ion traveling direction;

One or more guide electrodes connected to the variable chamber such that the position is determined by adjusting the length of the variable chamber; And

And an extraction electrode connected to the other end of the variable chamber.
The method of claim 8,

The one or more guide electrodes,

A first electrode including a first hole; And

And a second electrode positioned in the first hole and including a second hole.
The method of claim 9,

And the second electrode is a variable electrode capable of adjusting at least one of a position in one direction, a size of the second hole, and a surface inclination angle with respect to the one direction.
The method of claim 9,

The one or more guide electrodes,

Electron eddy resonance ion source device further comprises a third electrode comprising one or more third holes.
The method of claim 11,

At least one of the first electrode, the second electrode and the third electrode is an electron eddy resonant ion source device, characterized in that detachably connected to the variable chamber.
The method of claim 8,

And said variable chamber comprises an insulating material.
The method of claim 8,

And said variable chamber comprises one or more channels into which cooling material is injected.