WO2013054844A1 - Low temperature gas supply device, heat transfer medium-cooling device, and low temperature reaction control device - Google Patents
Low temperature gas supply device, heat transfer medium-cooling device, and low temperature reaction control device Download PDFInfo
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- WO2013054844A1 WO2013054844A1 PCT/JP2012/076315 JP2012076315W WO2013054844A1 WO 2013054844 A1 WO2013054844 A1 WO 2013054844A1 JP 2012076315 W JP2012076315 W JP 2012076315W WO 2013054844 A1 WO2013054844 A1 WO 2013054844A1
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J5/00—Arrangements of cold exchangers or cold accumulators in separation or liquefaction plants
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25D—REFRIGERATORS; COLD ROOMS; ICE-BOXES; COOLING OR FREEZING APPARATUS NOT OTHERWISE PROVIDED FOR
- F25D3/00—Devices using other cold materials; Devices using cold-storage bodies
- F25D3/10—Devices using other cold materials; Devices using cold-storage bodies using liquefied gases, e.g. liquid air
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J1/00—Processes or apparatus for liquefying or solidifying gases or gaseous mixtures
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J5/00—Arrangements of cold exchangers or cold accumulators in separation or liquefaction plants
- F25J5/002—Arrangements of cold exchangers or cold accumulators in separation or liquefaction plants for continuously recuperating cold, i.e. in a so-called recuperative heat exchanger
Definitions
- the present invention relates to a low-temperature gas supply device, a heat medium cooling device, and a low-temperature reaction control device.
- a low-temperature reaction apparatus may be used as shown in the patent document described later.
- a double-structured container provided with an independent tank (jacket) through which the heat medium can flow is used outside the reaction tank, and the temperature-controlled heat medium is supplied to this jacket part.
- the reaction liquid inside the reaction tank is cooled and adjusted to a constant temperature.
- the heat medium supplied to the reaction tank is temperature controlled so that it is cooled below a predetermined temperature by heat exchange with a low-temperature liquefied gas (eg, liquefied nitrogen) having a temperature lower than the freezing point of the heat medium in the heat exchanger. Then, it is supplied to the jacket of the reaction vessel.
- a low-temperature liquefied gas eg, liquefied nitrogen
- the heat medium cooling temperature had to be set to a temperature sufficiently higher than the heat medium freezing point. In other words, the low temperature characteristics inherent to the heat medium could not be sufficiently exhibited.
- Patent Document 1 is realized by providing means for cutting off the supply of the low-temperature liquefied gas by the heat medium differential pressure at the heat medium inlet / outlet part of the heat exchanger or the evaporating gas temperature at the low-temperature liquefied gas outlet part of the heat exchanger. It has become.
- patent document 2 is implement
- the temperature of the low-temperature liquefied gas supplied to the heat exchanger is adjusted. Specifically, heat exchange is performed with the temperature of the low-temperature liquefied gas raised. A method of supplying to the vessel is conceivable.
- One method for raising the temperature of a low-temperature liquefied gas is to mix a low-temperature liquefied gas with a gas having a higher temperature, for example, the same kind of normal temperature gas.
- a simple mixer has a problem that temperature unevenness and pulsation occur in the low-temperature gas after mixing.
- the temperature difference between liquefied nitrogen and room temperature nitrogen gas is large, and liquefied nitrogen has a large amount of cold heat at a small flow rate.
- an efficient or large mixer as disclosed in Patent Document 3 is required, resulting in an increase in equipment cost.
- the present invention has been made in view of the above circumstances, and introduces a low-temperature gas supply device capable of supplying a low-temperature gas refrigerant accurately and stably controlled, and the low-temperature gas refrigerant, By heat exchange with it, the heat medium cooling device that can discharge the heat medium controlled accurately and stably without solidification, and stable control in a wide temperature range using the heat medium A low-temperature reaction control device that can be realized is provided.
- the present invention employs the following means in order to solve the above problems.
- a gas mixture obtained by mixing a vaporized gas obtained by vaporizing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and the low-temperature liquefied gas are introduced into each other to exchange heat with each other.
- a first heat exchanger that discharges as a gas refrigerant and discharges the low-temperature liquefied gas as the vaporized gas;
- Mixing means for mixing the gas and the vaporized gas discharged from the first heat exchanger and discharging the mixed gas as the mixed gas; Based on the difference between the temperature detected for the low-temperature gas refrigerant and its target temperature, the respective amounts of the gas and the vaporized gas introduced into the mixing means are adjusted so that the temperature of the low-temperature gas refrigerant is And a first control means for controlling to a target temperature.
- a first control means for adjusting the amount of the vaporized gas to control the temperature of the low-temperature gas refrigerant to the target temperature.
- a low-temperature reaction control apparatus comprising: a low-temperature reaction tank configured to introduce the temperature-controlled heating medium that circulates in the circulation path and to cool and adjust the reaction liquid inside the reaction tank to a desired temperature.
- a gas mixture obtained by mixing a vaporized gas obtained by vaporizing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and the low-temperature liquefied gas are introduced into each other to exchange heat with each other.
- a first heat exchanger that discharges as a gas refrigerant and discharges the low-temperature liquefied gas as the vaporized gas;
- Mixing means for mixing the gas and the vaporized gas discharged from the first heat exchanger and discharging the mixed gas as the mixed gas;
- the temperature of the low temperature gas refrigerant is controlled to the target temperature by adjusting the amount of the gas introduced into the mixing means based on the difference between the temperature detected for the low temperature gas refrigerant and the target temperature.
- a control means for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the first heat exchanger and a heat medium circulating in a circulation path; Second control means for adjusting the amount of the gas based on the difference between the temperature detected for the heat medium and the heat medium target temperature, and controlling the temperature of the heat medium to the heat medium target temperature; Heat medium cooling device provided. (7) After heat exchange, which is a vaporized gas obtained by vaporizing the low-temperature liquefied gas and the gas after heat exchange by introducing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and exchanging heat with each other.
- a first heat exchanger that discharges as gas;
- Mixing means for mixing the gas after heat exchange discharged from the first heat exchanger with the vaporized gas and discharging it as a low-temperature gas refrigerant; Based on the difference between the temperature detected for the low-temperature gas refrigerant and the target temperature, the amount of the vaporized gas introduced into the mixing means is adjusted to control the temperature of the low-temperature gas refrigerant to the target temperature.
- First control means A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the first heat exchanger and a heat medium circulating in a circulation path; Second control means for adjusting the amount of the gas based on the difference between the temperature detected for the heat medium and the heat medium target temperature, and controlling the temperature of the heat medium to the heat medium target temperature; Heat medium cooling device provided.
- the heat medium cooling device according to (6) or the heat medium cooling device according to (7), A low-temperature reaction control apparatus comprising: a low-temperature reaction tank configured to introduce the temperature-controlled heating medium that circulates through the circulation path and to cool and adjust the reaction liquid in the reaction tank to a desired temperature.
- the low-temperature gas supply apparatus of the present invention mixes the low-temperature liquefied gas and the higher-temperature gas after reducing the temperature difference. Therefore, to achieve uniform mixing, the peculiarity of the mixing means can be avoided.
- the range of choices expands. Moreover, since it mixes as two gas with near temperature, temperature control of the low temperature gas refrigerant
- the mixing means when an ejector is selected as the mixing means, mixing is easy even when the pressures of two gases close to each other are different from each other. Further, the apparatus can be downsized as compared with the case of using a general mixer.
- the heat medium cooling device of the present invention accurately and stably controls the temperature of the heat medium circulating in the circulation path by introducing a low-temperature gas refrigerant having a stable temperature into the second heat exchanger. Therefore, the target temperature of the heating medium can be set more ideally with the freezing point of the heating medium in mind. That is, the target temperature of the heat medium can be set close to its freezing point without causing the heat medium to freeze in the second heat exchanger. As a result, blockage of the circulation path due to freezing and pressure loss in the path due to freezing can be prevented, excessive heat intrusion can be suppressed, and the entire apparatus can be saved in labor.
- the low-temperature reaction control apparatus of the present invention can control the reaction tank at low temperature using a heat medium accurately and stably controlled at a low temperature close to its freezing point, so that stable control in a wide temperature range is possible.
- FIG. 1 is a system diagram showing a low-temperature gas supply device, a heat medium cooling device, and a low-temperature reaction control device according to a first embodiment to which the present invention is applied. It is a systematic diagram which shows the low temperature gas supply apparatus, the heat-medium cooling device, and low temperature reaction control apparatus which are 2nd Embodiment to which this invention is applied. It is a systematic diagram which shows the low temperature gas supply apparatus, the heat-medium cooling device, and low temperature reaction control apparatus which are 3rd Embodiment to which this invention is applied. It is a systematic diagram which shows the low temperature gas supply apparatus which is 4th Embodiment to which this invention is applied, a heat-medium cooling device, and a low temperature reaction control apparatus.
- FIG. 1 is a system diagram of a first embodiment of the low-temperature gas supply device, the heat medium cooling device, and the low-temperature reaction control device of the present invention.
- the low temperature gas supply apparatus 100A includes a normal temperature path 1A through which normal temperature nitrogen gas (GN 2 ) NNG is introduced from one end as a gas having a temperature higher than a low temperature liquefied gas described later.
- GN 2 normal temperature nitrogen gas
- a first temperature detector 6A that detects the temperature of the first temperature
- a first temperature controller (first control means) 7A that outputs a first control signal CS1 based on the temperature detected by the first temperature detector 6A
- a first control A flow rate adjusting valve 8A that adjusts the flow rate of the room temperature nitrogen gas NNG that flows in the room temperature path 1A based on the signal CS1, and a liquid nitrogen vaporization that flows downstream of the first heat exchanger 5A in the low temperature path 2A based on the first control signal CS1.
- a first flow rate adjusting valve 9A that adjusts the flow rate of the gas LNG.
- the low temperature path 2A and the mixing path 3A run side by side, and the liquefied nitrogen LN and the mixed gas CG flowing through each of them are configured to exchange heat with each other.
- the low temperature path 2A and the mixing path 3A are arranged so that the liquefied nitrogen LN and the mixed gas CG flow in opposite directions, that is, in a counterflow.
- the heat medium cooling device 200A includes a low-temperature gas supply device 100A having the above-described configuration, a heat medium circulation path 21 through which the heat medium HM circulates, and a mixing path. 3A and the heat medium circulation path 21 run side by side so that the low-temperature nitrogen gas refrigerant CNG and the heat medium HM flowing through each of the heat exchangers 2A and 22B exchange heat with each other, A heat medium circulation pump 23 that circulates the medium HM in the heat medium circulation path 21, a second temperature detector 24 that detects the temperature of the heat medium HM that circulates in the heat medium circulation path 21, and a second temperature detector 24.
- a second temperature regulator 25 for outputting the second control signal CS2 based on the detected temperature by the second control valve CS, and a second flow rate adjusting valve for adjusting the flow rate of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3A based on the second control signal CS2.
- a reserve tank 27 for absorbing shrinkage in constructed.
- the low-temperature reaction control apparatus 300A includes the heat medium cooling apparatus 200A having the above-described configuration and the low-temperature reaction tank 31 in addition thereto.
- the low temperature reaction tank 31 includes at least a jacket 31a through which the heat medium HM can flow and a stirring motor 31b for stirring the reaction solution.
- Liquefied nitrogen (LN 2 ) LN is introduced from one end of the low temperature path 2A and introduced into the first heat exchanger 5A.
- the liquefied nitrogen LNG becomes liquefied nitrogen vaporized gas LNG by heat exchange with the mixed gas CG in the mixing path 3A in the first heat exchanger 5A.
- the liquefied nitrogen vaporized gas LNG discharged from the first heat exchanger 5A and the room temperature nitrogen gas NNG introduced from one end of the room temperature path 1A are introduced into the ejector 4A and mixed using the pressure difference between them. Is done.
- the mixed gas CG discharged from the ejector 4A is introduced into the first heat exchanger 5A, and heat exchange with the liquefied nitrogen LN in the low temperature path 2A is performed, and the temperature is equalized by a turbulent flow effect. It is discharged as refrigerant CNG.
- the first temperature detector 6A detects the temperature of the low-temperature nitrogen gas refrigerant CNG that flows downstream of the first heat exchanger 5A in the mixing path 3A.
- the first temperature controller 7A outputs a first control signal CS1 corresponding to the difference between the temperature detected by the first temperature detector 6A and the desired temperature (target temperature) of the low-temperature nitrogen gas refrigerant CNG.
- the flow rate adjusting valve 8A adjusts the flow rate of the room temperature nitrogen gas NNG flowing through the room temperature path 1A based on the first control signal CS1.
- the first flow rate adjusting valve 9A adjusts the flow rate of the liquefied nitrogen vaporized gas LNG flowing downstream of the first heat exchanger 5A in the low temperature path 2A based on the first control signal CS1.
- the low-temperature nitrogen gas refrigerant CNG is adjusted to a desired temperature by feedback control including the first temperature detector 6A, the first temperature controller 7A, the flow rate adjustment valve 8A, and the first flow rate adjustment valve 9A.
- the flow rate of the liquefied nitrogen vaporized gas LNG introduced into the ejector 4A may be adjusted on the primary side of the first heat exchanger 5A, but in this way, on the secondary side of the first heat exchanger 5A, that is, Since it is configured to adjust the flow rate of the liquefied nitrogen vaporized gas LNG, that is, the gas as a vaporized single phase, the primary side of the first heat exchanger 5A, that is, the flow rate of the liquefied nitrogen NL accompanying phase change is adjusted. In comparison, precise flow rate adjustment is possible.
- the low-temperature nitrogen gas refrigerant CNG adjusted to a desired temperature is supplied to the second heat exchanger 22 and cools the heat medium HM flowing through the heat medium circulation path 21 by heat exchange.
- the second temperature detector 24 detects the temperature of the heat medium HM circulating in the heat medium circulation path 21.
- the second temperature controller 25 outputs a second control signal CS2 corresponding to the difference between the temperature detected by the second temperature detector 24 and the desired temperature (target temperature) of the heating medium HM.
- the second flow rate adjustment valve 26 adjusts the flow rate of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3A based on the second control signal CS2. In this way, the heating medium HM is adjusted to a desired temperature by feedback control including the second temperature detector 24, the second temperature regulator 25, and the second flow rate adjustment valve 26.
- the heat medium HM adjusted to a desired temperature is supplied to the jacket 31 a of the low temperature reaction tank 31 by the operation of the heat medium circulation pump 23. Thereby, the reaction liquid inside the reaction tank is cooled and adjusted to a constant temperature.
- the liquefied nitrogen LNG is converted into the liquefied nitrogen vaporized gas LNG having a temperature close to the room temperature nitrogen gas NNG by the first heat exchanger 5A, and they are mixed. Therefore, uniform mixing can be realized.
- the ejector 4A is used for the mixing, the mixing can be easily realized even if the pressures are different from each other, and the apparatus is smaller than the case of using a general mixer. Can be
- the liquefied nitrogen LNG is converted into the liquefied nitrogen vaporized gas LNG having a temperature close to the normal temperature nitrogen gas NNG by the first heat exchanger 5A and mixed, the flow rates of the normal temperature nitrogen gas NNG and the liquefied nitrogen vaporized gas LNG
- the temperature control of the low-temperature nitrogen gas refrigerant CNG by adjustment is stabilized.
- flow rate pulsation control caused by temperature pulsation changes due to poor mixing is avoided, control is stabilized.
- the target temperature of the low-temperature nitrogen gas refrigerant CNG changes, the value can be appropriately followed.
- the cold energy of the liquefied nitrogen LN can be efficiently used for generating the low temperature nitrogen gas refrigerant CNG.
- the temperature of the heating medium HM circulating in the heating medium circulation path 21 is accurately and stably controlled.
- the target temperature of the heating medium HM can be set more ideally with the freezing point of the medium HM in mind. That is, the target temperature of the heat medium HM can be set near its freezing point without causing the heat medium HM to freeze in the second heat exchanger 22. This can prevent the heat medium circulation path 21 from being blocked due to freezing and the resulting pressure loss in the path, suppress excessive heat penetration, and save labor as the entire apparatus.
- the reaction tank 31 uses the heating medium HM that is accurately and stably controlled at a low temperature close to its freezing point, the reaction tank can be stably controlled at a lower temperature, and a wide range of temperature control is possible. .
- FIG. 2 is a system diagram of a second embodiment of the low temperature gas supply device, the heat medium cooling device, and the low temperature reaction control device of the present invention.
- the low temperature gas supply apparatus 100B includes a normal temperature path 1B through which normal temperature nitrogen gas (GN 2 ) NNG is introduced from one end, and liquefied nitrogen (LN 2 ) LN ( For example, -196 ° C) is introduced from one end, a low-temperature path 2B through which a low-temperature nitrogen gas refrigerant described later flows, a room-temperature nitrogen gas NNG introduced from the room-temperature path 1B, and a liquefaction introduced from the low-temperature path 2B.
- GN 2 normal temperature nitrogen gas
- LN 2 liquefied nitrogen
- the first heat exchanger 5B is discharged as a gas LNG resulting from the vaporization of the nitrogen gas CNNG and the liquefied nitrogen LN (hereinafter referred to as “liquefied nitrogen vaporized gas”) LNG after heat exchange with the nitrogen LNG.
- an ejector 4B that mixes the nitrogen gas CNNG after heat exchange discharged from the first heat exchanger 5B and the liquefied nitrogen vaporized gas LNG to generate a low-temperature nitrogen gas refrigerant CNG
- a first temperature detector 6B that detects the temperature of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3B, and a first temperature controller 7B that outputs a first control signal CS1 based on the temperature detected by the first temperature detector 6B;
- the flow rate adjusting valve 8B Based on the first control signal CS1, the flow rate adjusting valve 8B for adjusting the flow rate of the room temperature nitrogen gas NNG flowing in the room temperature path 1B, and on the downstream side of the first heat exchanger 5B in the low temperature path 2B based on the first control signal CS1.
- a first flow rate adjusting valve 9B that adjusts the flow rate of the flowing liquefied nitrogen vaporized gas LNG.
- route 2B are running in parallel, and it is comprised so that the normal temperature nitrogen gas NNG and liquefied nitrogen LN which flow through each may mutually heat-exchange.
- the normal temperature path 1B and the low temperature path 2B are arranged so that the normal temperature nitrogen gas NNG and the liquefied nitrogen LN flow in the same direction.
- the heat medium cooling device 200B according to the second embodiment of the present invention is the same as the heat medium cooling device 200A according to the first embodiment except that the heat medium cooling device 200B includes the low-temperature gas supply device 100B configured as described above. is there.
- the low temperature reaction control apparatus 300B according to the second embodiment of the present invention is the same as the low temperature reaction control apparatus 300A according to the first embodiment except that the low temperature reaction control apparatus 300B includes the heat medium cooling device 200B having the above-described configuration. is there.
- the room temperature nitrogen gas NNG is introduced from one end of the room temperature path 1B and is introduced into the first heat exchanger 5B. Further, liquefied nitrogen (LN 2 ) LN is introduced from one end of the low temperature path 2B and introduced into the first heat exchanger 5B.
- the first heat exchanger 5B performs heat exchange between the room temperature nitrogen gas NNG introduced from the room temperature path 1B and the liquefied nitrogen LNG introduced from the low temperature path 2B, thereby reducing the temperature difference and the nitrogen gas after heat exchange.
- CNNG and gas resulting from vaporization of liquefied nitrogen LN hereinafter referred to as “liquefied nitrogen vaporized gas” LNG are discharged.
- the ejector 4B mixes the nitrogen gas CNNG after heat exchange discharged from the first heat exchanger 5B and the liquefied nitrogen vaporized gas LNG using their pressure difference to generate a low-temperature nitrogen gas refrigerant CNG.
- the first temperature detector 6B detects the temperature of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3B.
- the first temperature controller 7B outputs a first control signal CS1 corresponding to the difference between the temperature detected by the first temperature detector 6B and the desired temperature (target temperature) of the low-temperature nitrogen gas refrigerant CNG.
- the flow rate adjusting valve 8B adjusts the flow rate of the room temperature nitrogen gas NNG flowing upstream of the first heat exchanger 5B in the room temperature path 1B based on the first control signal CS1.
- the first flow rate adjusting valve 9B adjusts the flow rate of the liquefied nitrogen vaporized gas LNG flowing downstream of the first heat exchanger 5B in the low temperature path 2B based on the first control signal CS1.
- the low-temperature nitrogen gas refrigerant CNG is adjusted to a desired temperature by feedback control including the first temperature detector 6B, the first temperature regulator 7B, the flow rate adjustment valve 8B, and the first flow rate adjustment valve 9B.
- the flow rate of the vaporized gas introduced into the ejector 4B may be adjusted on the primary side of the first heat exchanger 5B.
- the secondary side of the first heat exchanger 5B that is, the liquefied nitrogen vaporized gas is used.
- the flow rate of the primary side of the first heat exchanger 5B that is, the liquefied nitrogen LN accompanying phase change
- the low-temperature nitrogen gas refrigerant CNG adjusted to a desired temperature is supplied to the second heat exchanger 22 and cools the heat medium HM flowing through the heat medium circulation path 21 by heat exchange.
- the second temperature detector 24 detects the temperature of the heat medium HM circulating in the heat medium circulation path 21.
- the second temperature controller 25 outputs a second control signal CS2 corresponding to the difference between the temperature detected by the second temperature detector 24 and the desired temperature of the heating medium HM.
- the second flow rate adjustment valve 26 adjusts the flow rate of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3B based on the second control signal CS2. In this way, the heating medium HM is adjusted to a desired temperature by feedback control including the second temperature detector 24, the second temperature regulator 25, and the second flow rate adjustment valve 26.
- the heat medium HM adjusted to a desired temperature is supplied to the jacket 31 a of the low temperature reaction tank 31 by the operation of the heat medium circulation pump 23. Thereby, the reaction liquid inside the reaction tank is cooled and adjusted to a constant temperature.
- the normal temperature nitrogen gas NNG and the liquefied nitrogen LNG are converted into the nitrogen gas CNNG and the liquefied nitrogen vaporized gas LNG after heat exchange with a reduced temperature difference by the first heat exchanger 5B, and they are mixed.
- the temperature control of the low-temperature nitrogen gas refrigerant CNG by adjusting the flow rates of the nitrogen gas NNG and the liquefied nitrogen vaporized gas LNG is stabilized.
- flow rate pulsation control caused by temperature pulsation changes due to poor mixing is avoided, control is stabilized.
- the target temperature of the low-temperature nitrogen gas refrigerant CNG changes, the value can be appropriately followed.
- the cold energy of the liquefied nitrogen LN can be efficiently used for generating the low temperature nitrogen gas refrigerant CNG.
- the temperature of the heating medium HM circulating in the heating medium circulation path 21 is accurately and stably controlled.
- the target temperature of the heating medium HM can be set more ideally with the freezing point of the medium HM in mind. That is, the target temperature of the heat medium HM can be set near its freezing point without causing the heat medium HM to freeze in the second heat exchanger 22. This can prevent the heat medium circulation path 21 from being blocked due to freezing and the resulting pressure loss in the path, suppress excessive heat penetration, and save labor as the entire apparatus.
- the reaction tank 31 uses the heating medium HM that is accurately and stably controlled at a low temperature close to its freezing point, the reaction tank can be stably controlled at a lower temperature, and a wide range of temperature control is possible. .
- FIG. 3 is a system diagram of a third embodiment of the low temperature gas supply device, the heat medium cooling device, and the low temperature reaction control device of the present invention.
- the low temperature gas supply apparatus 100C has a normal temperature path 1C through which normal temperature nitrogen gas (GN 2 ) NNG is introduced from one end as a gas having a temperature higher than a low temperature liquefied gas described later.
- GN 2 normal temperature nitrogen gas
- the ejector (mixing means) 4C for generating the mixed gas CG and the low temperature path 2C penetrate to introduce the liquefied nitrogen LN and discharge it as the liquefied nitrogen vaporized gas LNG.
- a first heat exchanger 5C that introduces the mixed gas CG and discharges it as a low-temperature nitrogen gas refrigerant CNG by passing through the path 3C, and a low-temperature nitrogen gas refrigerant CNG that flows downstream of the first heat exchanger 5C in the mixed path 3C.
- a first temperature detector 6C that detects the temperature of the first temperature detector, a first temperature controller (first control means) 7C that outputs a first control signal CS1 based on the temperature detected by the first temperature detector 6C, and a first temperature detector to be described later.
- the flow rate adjusting valve 8C that adjusts the flow rate of the room temperature nitrogen gas NNG that flows in the room temperature path 1C based on the second control signal CS2 output from the 2 temperature controller 25, and the first line in the low temperature path 2C based on the first control signal CS1.
- a first flow rate adjusting valve 9C that adjusts the flow rate of the liquefied nitrogen vaporized gas LNG that flows downstream of the heat exchanger 5C.
- the low-temperature path 2C and the mixing path 3C run side by side, and the liquefied nitrogen LN and the mixed gas CG flowing through each of the low-temperature path 2C and the mixed gas CG are configured to exchange heat with each other.
- the low temperature path 2C and the mixing path 3C are arranged so that the liquefied nitrogen LN and the mixed gas CG flow in opposite directions, that is, in a counterflow.
- the heat medium cooling device 200C includes a low-temperature gas supply device 100C having the above-described configuration, a heat medium circulation path 21 through which the heat medium HM circulates, and a mixing path.
- the second heat exchanger 22 configured to exchange heat between the low-temperature nitrogen gas refrigerant CNG and the heat medium HM that flow through the 3C and the heat medium circulation path 21 in parallel with each other;
- a heat medium circulation pump 23 that circulates the medium HM in the heat medium circulation path 21, a second temperature detector 24 that detects the temperature of the heat medium HM that circulates in the heat medium circulation path 21, and a second temperature detector 24.
- the second temperature regulator 25 that outputs the second control signal CS2 on the basis of the detected temperature and the reserve tank 27 for absorbing the expansion and contraction accompanying the temperature change of the heating medium.
- the low temperature reaction control device 300C according to the third embodiment includes the low temperature reaction control devices 300A and 300B according to the first and second embodiments, except that the low temperature reaction control device 300C includes the heat medium cooling device 200C having the above-described configuration. The same.
- Liquefied nitrogen (LN 2 ) LN is introduced from one end of the low temperature path 2C and introduced into the first heat exchanger 5C.
- the liquefied nitrogen LNG becomes liquefied nitrogen vaporized gas LNG by heat exchange with the mixed gas CG in the mixing path 3C in the first heat exchanger 5C.
- the liquefied nitrogen vapor LNG discharged from the first heat exchanger 5C and the room temperature nitrogen gas NNG introduced from one end of the room temperature path 1C are introduced into the ejector 4C and mixed using the pressure difference between them. Is done.
- the mixed gas CG discharged from the ejector 4C is introduced into the first heat exchanger 5C, and heat exchange with the liquefied nitrogen LN in the low temperature path 2C is performed, and the temperature is equalized by the turbulent flow effect. It is discharged as refrigerant CNG.
- the first temperature detector 6C detects the temperature of the low-temperature nitrogen gas refrigerant CNG that flows downstream of the first heat exchanger 5C in the mixing path 3C.
- the first temperature controller 7C outputs a first control signal CS1 corresponding to the difference between the temperature detected by the first temperature detector 6C and the desired temperature (target temperature) of the low-temperature nitrogen gas refrigerant CNG.
- the flow rate adjusting valve 8C adjusts the flow rate of the room temperature nitrogen gas NNG flowing in the room temperature path 1C based on the second control signal CS2 output from the second temperature regulator 25.
- the first flow rate adjusting valve 9C adjusts the flow rate of the liquefied nitrogen vaporized gas LNG that flows downstream of the first heat exchanger 5C in the low temperature path 2C based on the first control signal CS1.
- the flow rate of the liquefied nitrogen vaporized gas LNG introduced into the ejector 4C may be adjusted on the primary side of the first heat exchanger 5C, but in this way, on the secondary side of the first heat exchanger 5C, that is, Since the flow rate of the liquefied nitrogen vaporized gas LNG, that is, the gas as a vaporized single phase, is adjusted, the primary side of the first heat exchanger 5C, that is, the flow rate of the liquefied nitrogen LNG accompanying phase change is adjusted. In comparison, precise flow rate adjustment is possible.
- the low-temperature nitrogen gas refrigerant CNG derived from the heat exchanger 5C is supplied to the second heat exchanger 22 and cools the heat medium HM flowing through the heat medium circulation path 21 by heat exchange.
- the second temperature detector 24 detects the temperature of the heat medium HM circulating in the heat medium circulation path 21.
- the second temperature controller 25 outputs a second control signal CS2 corresponding to the difference between the temperature detected by the second temperature detector 24 and the desired temperature (target temperature) of the heating medium HM.
- the first temperature detector 6C, the first temperature regulator 7C, the flow rate adjustment valve 8C, the first flow rate adjustment valve 9C, the second temperature detector 24, and the second temperature regulator 25 are configured as feedback.
- the control the low-temperature nitrogen gas refrigerant CNG and the heat medium HM are adjusted to desired temperatures.
- the heat medium HM adjusted to a desired temperature is supplied to the jacket 31 a of the low temperature reaction tank 31 by the operation of the heat medium circulation pump 23. Thereby, the reaction liquid inside the reaction tank is cooled and adjusted to a constant temperature.
- liquefied nitrogen LNG is converted into liquefied nitrogen vaporized gas LNG having a temperature close to room temperature nitrogen gas NNG by the first heat exchanger 5C and mixed. Therefore, uniform mixing can be realized.
- the ejector 4C is used for the mixing, even if the pressures are different from each other, the mixing can be easily realized, and the apparatus is smaller than the case of using a general mixer. Can be
- the liquefied nitrogen LNG is converted into the liquefied nitrogen vaporized gas LNG having a temperature close to the normal temperature nitrogen gas NNG by the first heat exchanger 5C and mixed, the flow rates of the normal temperature nitrogen gas NNG and the liquefied nitrogen vaporized gas LNG
- the temperature control of the low-temperature nitrogen gas refrigerant CNG by adjustment is stabilized.
- flow rate pulsation control caused by temperature pulsation changes due to poor mixing is avoided, control is stabilized.
- the target temperature of the low-temperature nitrogen gas refrigerant CNG changes, the value can be appropriately followed.
- the cold energy of the liquefied nitrogen LN can be efficiently used for generating the low temperature nitrogen gas refrigerant CNG.
- the temperature of the heat medium HM circulating in the heat medium circulation path 21 can be controlled accurately and stably. Therefore, the target temperature of the heating medium HM can be set more ideally with the freezing point of the heating medium HM in mind. That is, the target temperature of the heat medium HM can be set near its freezing point without causing the heat medium HM to freeze in the second heat exchanger 22. This can prevent the heat medium circulation path 21 from being blocked due to freezing and the resulting pressure loss in the path, suppress excessive heat penetration, and save labor as the entire apparatus.
- the reaction tank 31 uses the heating medium HM that is accurately and stably controlled at a low temperature close to its freezing point, the reaction tank can be stably controlled at a lower temperature, and a wide range of temperature control is possible. .
- the low-temperature gas supply device 100A, the heat medium cooling device 200A, and the low-temperature reaction control device 300A of the first embodiment described above are the temperatures of the low-temperature nitrogen gas refrigerant CNG detected by the temperature detector 6A (that is, in the mixing path 3A).
- the flow rate of the low-temperature nitrogen gas refrigerant CNG derived from the heat exchanger 5A does not change and is stable. There is an advantage of doing.
- the low-temperature nitrogen gas refrigerant CNG for heat exchange with the heating medium HM It may be necessary to increase the flow rate.
- the flow rate of the low-temperature nitrogen gas refrigerant CNG becomes maximum when the flow rate adjustment valve 26 is maximized. .
- the temperature of the heat medium HM detected by the second temperature detector 24 ie, heat Based on the temperature of the heat medium HM flowing downstream of the second heat exchanger 22 in the medium circulation path 21, the flow rate of the room temperature nitrogen gas NNG serving as a base flow rate for increasing or decreasing the flow rate of the low temperature nitrogen gas refrigerant CNG is adjusted. It has a configuration. For this reason, when the load in the low temperature reaction tank 31 increases, the cooling heat necessary for the heating medium HM increases, and it becomes necessary to increase the flow rate of the low temperature nitrogen gas refrigerant CNG for heat exchange with the heating medium HM.
- the flow rate of the low-temperature nitrogen gas refrigerant CNG derived from the first heat exchanger 5C can be increased or decreased to a desired value according to the temperature of the heat medium HM. Therefore, both the temperature and flow rate of the low-temperature nitrogen gas refrigerant CNG are adjusted in order to obtain cold heat necessary for cooling the heat medium HM, and more stable temperature control of the heat medium HM can be realized.
- the apparatus can be reduced in size and cost.
- FIG. 4 is a system diagram of a fourth embodiment of the low-temperature gas supply device, the heat medium cooling device, and the low-temperature reaction control device of the present invention.
- a low temperature gas supply apparatus 100D includes a normal temperature path 1D through which normal temperature nitrogen gas (GN 2 ) NNG is introduced from one end, and liquefied nitrogen (LN 2 ) LN ( For example, -196 ° C.) is introduced from one end, a low-temperature path 2D through which a low-temperature nitrogen gas refrigerant described later flows, a room-temperature nitrogen gas NNG introduced from the room-temperature path 1D, and a liquefaction introduced from the low-temperature path 2D.
- GN 2 normal temperature nitrogen gas
- LN 2 liquefied nitrogen
- the first heat exchanger 5D is discharged as a gas LNG resulting from the vaporization of the nitrogen gas CNNG and the liquefied nitrogen LN (hereinafter referred to as “liquefied nitrogen vaporized gas”) LNG after heat exchange with the nitrogen LNG, respectively.
- an ejector 4D that mixes the nitrogen gas CNNG after heat exchange discharged from the first heat exchanger 5D and the liquefied nitrogen vaporized gas LNG to generate a low-temperature nitrogen gas refrigerant CNG
- a first temperature detector 6D that detects the temperature of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3D, and a first temperature controller 7D that outputs a first control signal CS1 based on the temperature detected by the first temperature detector 6D;
- the flow rate adjusting valve 8D for adjusting the flow rate of the normal temperature nitrogen gas NNG flowing in the normal temperature path 1D based on a second control signal CS2 to be described later, and the first heat exchanger 5D in the low temperature path 2D based on the first control signal CS1.
- a first flow rate adjusting valve 9D that adjusts the flow rate of the liquefied nitrogen vaporized gas LNG that flows downstream.
- route 2D are running in parallel, and it is comprised so that the normal temperature nitrogen gas NNG and liquefied nitrogen LN which flow through each may mutually heat-exchange.
- the normal temperature path 1D and the low temperature path 2D are arranged so that the normal temperature nitrogen gas NNG and the liquefied nitrogen LN flow in the same direction.
- the heat medium cooling device 200D includes a low-temperature gas supply device 100D configured as described above, a heat medium circulation path 21 through which the heat medium HM circulates, and a mixing path. 3A and the heat medium circulation path 21 run side by side so that the low-temperature nitrogen gas refrigerant CNG and the heat medium HM flowing through each of the heat exchangers 2A and 22B exchange heat with each other, A heat medium circulation pump 23 that circulates the medium HM in the heat medium circulation path 21, a second temperature detector 24 that detects the temperature of the heat medium HM that circulates in the heat medium circulation path 21, and a second temperature detector 24.
- the second temperature regulator 25 that outputs the second control signal CS2 on the basis of the detected temperature and the reserve tank 27 for absorbing the expansion and contraction accompanying the temperature change of the heating medium.
- the low temperature reaction control apparatus 300D includes a heat medium cooling apparatus 200D having the above-described configuration, except that the low temperature reaction control apparatus 300A according to the first to third embodiments. , 300B, 300C.
- the room temperature nitrogen gas NNG is introduced from one end of the room temperature path 1D and introduced into the first heat exchanger 5D. Further, liquefied nitrogen (LN 2 ) LN is introduced from one end of the low-temperature path 2D and introduced into the first heat exchanger 5D.
- the first heat exchanger 5D performs heat exchange between the room temperature nitrogen gas NNG introduced from the room temperature path 1D and the liquefied nitrogen LN introduced from the low temperature path 2D, thereby reducing the temperature difference and the nitrogen gas after heat exchange.
- CNNG and gas resulting from vaporization of liquefied nitrogen LN hereinafter referred to as “liquefied nitrogen vaporized gas”) LNG are discharged.
- the ejector 4D mixes the nitrogen gas CNNG after heat exchange discharged from the first heat exchanger 5D and the liquefied nitrogen vaporized gas LNG using their pressure difference to generate a low-temperature nitrogen gas refrigerant CNG.
- the first temperature detector 6D detects the temperature of the low-temperature nitrogen gas refrigerant CNG flowing through the mixing path 3D.
- the first temperature controller 7D outputs a first control signal CS1 corresponding to the difference between the temperature detected by the first temperature detector 6D and the desired temperature (target temperature) of the low-temperature nitrogen gas refrigerant CNG.
- the flow rate adjusting valve 8D adjusts the flow rate of the room temperature nitrogen gas NNG flowing upstream of the first heat exchanger 5D in the room temperature path 1D based on the second control signal CS2 output from the second temperature regulator 25.
- the first flow rate adjusting valve 9D adjusts the flow rate of the liquefied nitrogen vaporized gas LNG flowing downstream of the first heat exchanger 5D in the low temperature path 2D based on the first control signal CS1.
- the flow rate of the vaporized gas introduced into the ejector 4D may be adjusted on the primary side of the first heat exchanger 5D.
- the secondary side of the first heat exchanger 5D that is, the liquefied nitrogen vaporized gas is used. Since the flow rate of LNG, that is, gas as a vaporized single phase, is adjusted, the flow rate of the primary side of the first heat exchanger 5D, that is, liquefied nitrogen LN accompanying phase change, is adjusted. Therefore, precise flow rate adjustment is possible.
- the low-temperature nitrogen gas refrigerant CNG derived from the ejector 4D is supplied to the second heat exchanger 22 and cools the heat medium HM flowing through the heat medium circulation path 21 by heat exchange.
- the second temperature detector 24 detects the temperature of the heat medium HM circulating in the heat medium circulation path 21.
- the second temperature controller 25 outputs a second control signal CS2 corresponding to the difference between the temperature detected by the second temperature detector 24 and the desired temperature of the heating medium HM.
- the feedback includes the first temperature detector 6D, the first temperature regulator 7D, the flow rate adjustment valve 8D, the first flow rate adjustment valve 9D, the second temperature detector 24, and the second temperature regulator 25.
- the low-temperature nitrogen gas refrigerant CNG and the heat medium HM are adjusted to desired temperatures.
- the heat medium HM adjusted to a desired temperature is supplied to the jacket 31 a of the low temperature reaction tank 31 by the operation of the heat medium circulation pump 23. Thereby, the reaction liquid inside the reaction tank is cooled and adjusted to a constant temperature.
- the temperature of the heat medium HM circulating in the heat medium circulation path 21 can be controlled accurately and stably. Therefore, the target temperature of the heating medium HM can be set more ideally with the freezing point of the heating medium HM in mind. That is, the target temperature of the heat medium HM can be set near its freezing point without causing the heat medium HM to freeze in the second heat exchanger 22. This can prevent the heat medium circulation path 21 from being blocked due to freezing and the resulting pressure loss in the path, suppress excessive heat penetration, and save labor as the entire apparatus.
- the reaction tank 31 uses the heating medium HM that is accurately and stably controlled at a low temperature close to its freezing point, the reaction tank can be stably controlled at a lower temperature, and a wide range of temperature control is possible. .
- the low-temperature gas supply device 100B, the heat medium cooling device 200B, and the low-temperature reaction control device 300B of the second embodiment described above have the temperature of the low-temperature nitrogen gas refrigerant CNG detected by the temperature detector 6B (that is, in the mixing path 3B). Based on the temperature of the low-temperature nitrogen gas refrigerant CNG flowing downstream of the ejector 4B), the flow rates of the normal-temperature nitrogen gas NNG introduced into the normal-temperature path 1B and the liquefied nitrogen vaporized gas LNG introduced into the low-temperature path 2B are adjusted. .
- the flow rate of the low-temperature nitrogen gas refrigerant CNG derived from the ejector 4B is stable without fluctuation.
- the low-temperature nitrogen gas refrigerant CNG for heat exchange with the heating medium HM It may be necessary to increase the flow rate.
- the flow rate of the low temperature nitrogen gas refrigerant CNG becomes maximum when the flow rate adjustment valve 26 is maximized. .
- the temperature of the heat medium HM detected by the second temperature detector 24 (that is, Based on the temperature of the heat medium HM flowing downstream of the second heat exchanger 22 in the heat medium circulation path 21), the flow rate of the room temperature nitrogen gas NNG serving as a base flow rate for increasing or decreasing the flow rate of the low temperature nitrogen gas refrigerant CNG is adjusted. It is the composition to do. For this reason, when the load in the low temperature reaction tank 31 increases, the cooling heat necessary for the heating medium HM increases, and it becomes necessary to increase the flow rate of the low temperature nitrogen gas refrigerant CNG for heat exchange with the heating medium HM.
- the flow rate of the low-temperature nitrogen gas refrigerant CNG derived from the ejector 4D can be increased or decreased to a desired value according to the temperature of the heating medium HM. Therefore, both the temperature and flow rate of the low-temperature nitrogen gas refrigerant CNG are adjusted in order to obtain cold heat necessary for cooling the heat medium HM, and more stable temperature control of the heat medium HM can be realized.
- the apparatus can be reduced in size and cost.
- the low-temperature gas supply devices 100A to 100D according to the first to fourth embodiments described above can be applied to the following devices in addition to the heat medium cooling devices 200A to 200D.
- the object can be uniformly cooled without the need for a stirring fan or the like.
- it has a reaction tank that stores the reaction liquid, a jacket around the reaction tank or a heat exchanger installed in the reaction tank, and can be applied to a low-temperature reaction control device that supplies low-temperature gas to the jacket or the heat exchanger.
- a low-temperature reaction control device that supplies low-temperature gas to the jacket or the heat exchanger.
- the flow rate adjusting valve is shown as the flow rate adjusting means for the room temperature nitrogen gas NNG and the flow rate adjusting means for the liquefied nitrogen vaporized gas LNG.
- the present invention is not limited to this.
- other flow rate adjusting means such as a mass flow controller can be used as appropriate.
- the second heat exchanger 22 for example, a double tube heat exchanger, a plate heat exchanger, a plate fin heat exchanger, a shell & tube heat exchanger, a tank & coil heat exchanger, or the like. Can be adopted.
- a plate heat exchanger is desirable. This is because it is highly efficient and contributes to downsizing of the apparatus.
- a highly efficient heat exchanger like a plate type is desirable. This is because the warm-end temperature difference is small, so that mixing is easy and miniaturization is possible.
- the room temperature nitrogen gas NNG and the liquefied nitrogen LN are employed, but they are not necessarily the same type, and different gases may be mixed.
- the target gas in addition to nitrogen, oxygen, argon, carbon dioxide, LNG, fluorine-based refrigerants such as chlorofluorocarbon and hydrofluorocarbon, and the like can be used.
- the temperature is higher than that of the low-temperature liquefied gas, not only normal temperature but also any temperature gas can be mixed with the low-temperature liquefied gas.
- the low-temperature gas supply device, heat medium cooling device, and low-temperature reaction control device of the present invention can be used for temperature control in chemical reaction processes such as organic synthesis and crystallization.
- Low temperature gas supply devices 1A, 1B, 1C, 1D ... Normal temperature paths 2A, 2B, 2C, 2D ... Low temperature paths 3A, 3B, 3C, 3D ...
- First regulating valves 200A, 200B, 200C, 200D ... Heat medium cooling device 21 ... Heat medium circulation path 22 2nd heat exchanger 23 ... Heat medium circulation pump 24 ... 2nd temperature detector 25 ... 2nd temperature controller 26 ... 2nd control valve 27 ... Reserve tank 300A, 300B, 300C, 300D ... low temperature reaction control device 31 ... low temperature reaction tank 31a ... jacket 31b ... stirring motor
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Abstract
Description
本願は、2011年10月11日に、日本に出願された特願2011-223716号に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to a low-temperature gas supply device, a heat medium cooling device, and a low-temperature reaction control device.
This application claims priority based on Japanese Patent Application No. 2011-223716 filed in Japan on October 11, 2011, the contents of which are incorporated herein by reference.
(1)低温液化ガスが気化した気化ガス及び前記低温液化ガスよりも温度の高いガスが混合された混合ガスと前記低温液化ガスとを導入して互いに熱交換させることにより、前記混合ガスを低温ガス冷媒として排出するとともに、前記低温液化ガスを前記気化ガスとして排出する第一熱交換器と、
前記ガスと、前記第一熱交換器から排出された前記気化ガスとを混合して、前記混合ガスとして排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記混合手段に導入される前記ガス及び前記気化ガスのそれぞれの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、を備える低温ガス供給装置。
(2)低温液化ガス及び前記低温液化ガスよりも温度の高いガスを導入して互いに熱交換させることにより、それぞれ前記低温液化ガスが気化した気化ガス及び熱交換後の前記ガスである熱交換後ガスとして排出する第一熱交換器と、
前記第一熱交換器から排出された前記熱交換後ガスと前記気化ガスとを混合して、低温ガス冷媒として排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記第一熱交換器に導入される前記低温液化ガスよりも温度の高いガスの量と、前記混合手段に導入される前記気化ガスの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、を備える低温ガス供給装置。
(3)前記混合手段は、エゼクタである(1)又は(2)に記載の低温ガス供給装置。
(4)(1)に記載の低温ガス供給装置又は(2)に記載の低温ガス供給装置と、
前記低温ガス供給装置から排出される、前記温度制御された前記低温ガス冷媒と、循環経路を巡廻する熱媒とを互いに熱交換させる第二熱交換器と、
前記熱媒について検出された温度と、その熱媒目標温度との差異に基づき、前記第二熱交換器に導入される前記低温ガス冷媒の量を調整して、前記熱媒の温度を前記熱媒目標温度に制御する第二制御手段と、を備える熱媒冷却装置。
(5)(4)に記載の熱媒冷却装置と、
前記循環経路を循環する、前記温度制御された前記熱媒を導入して、反応槽内部の反応液を所望温度に冷却調整するように構成された低温反応槽と、を備える低温反応制御装置。
(6)低温液化ガスが気化した気化ガス及び前記低温液化ガスよりも温度の高いガスが混合された混合ガスと前記低温液化ガスとを導入して互いに熱交換させることにより、前記混合ガスを低温ガス冷媒として排出するとともに、前記低温液化ガスを前記気化ガスとして排出する第一熱交換器と、
前記ガスと、前記第一熱交換器から排出された前記気化ガスとを混合して、前記混合ガスとして排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記混合手段に導入される前記ガスの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、
前記第一熱交換器から排出される、前記温度制御された前記低温ガス冷媒と、循環経路を巡廻する熱媒とを互いに熱交換させる第二熱交換器と、
前記熱媒について検出された温度と、その熱媒目標温度との差異に基づき、前記ガスの量を調整して、前記熱媒の温度を前記熱媒目標温度に制御する第二制御手段とを備える熱媒冷却装置。
(7)低温液化ガス及び前記低温液化ガスよりも温度の高いガスを導入して互いに熱交換させることにより、それぞれ前記低温液化ガスが気化した気化ガス及び熱交換後の前記ガスである熱交換後ガスとして排出する第一熱交換器と、
前記第一熱交換器から排出された前記熱交換後ガスと前記気化ガスとを混合して、低温ガス冷媒として排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記混合手段に導入される前記気化ガスの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、
前記第一熱交換器から排出される、前記温度制御された前記低温ガス冷媒と、循環経路を巡廻する熱媒とを互いに熱交換させる第二熱交換器と、
前記熱媒について検出された温度と、その熱媒目標温度との差異に基づき、前記ガスの量を調整して、前記熱媒の温度を前記熱媒目標温度に制御する第二制御手段とを備える熱媒冷却装置。
(8)(6)に記載の熱媒冷却装置又は(7)に記載の熱媒冷却装置と、
前記循環経路を循環する、前記温度制御された前記熱媒を導入して、反応槽内部の反応液を所望温度に冷却調整するように構成された低温反応槽と、を備える低温反応制御装置。 The present invention employs the following means in order to solve the above problems.
(1) A gas mixture obtained by mixing a vaporized gas obtained by vaporizing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and the low-temperature liquefied gas are introduced into each other to exchange heat with each other. A first heat exchanger that discharges as a gas refrigerant and discharges the low-temperature liquefied gas as the vaporized gas;
Mixing means for mixing the gas and the vaporized gas discharged from the first heat exchanger and discharging the mixed gas as the mixed gas;
Based on the difference between the temperature detected for the low-temperature gas refrigerant and its target temperature, the respective amounts of the gas and the vaporized gas introduced into the mixing means are adjusted so that the temperature of the low-temperature gas refrigerant is And a first control means for controlling to a target temperature.
(2) After the heat exchange, which is the vaporized gas obtained by vaporizing the low-temperature liquefied gas and the gas after the heat exchange by introducing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and exchanging heat with each other. A first heat exchanger that discharges as gas;
Mixing means for mixing the gas after heat exchange discharged from the first heat exchanger with the vaporized gas and discharging it as a low-temperature gas refrigerant;
Based on the difference between the temperature detected for the low-temperature gas refrigerant and its target temperature, the amount of gas having a temperature higher than that of the low-temperature liquefied gas introduced into the first heat exchanger and the mixing means are introduced. A first control means for adjusting the amount of the vaporized gas to control the temperature of the low-temperature gas refrigerant to the target temperature.
(3) The low temperature gas supply device according to (1) or (2), wherein the mixing means is an ejector.
(4) The low-temperature gas supply device according to (1) or the low-temperature gas supply device according to (2),
A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the low-temperature gas supply device and a heat medium circulating in a circulation path;
Based on the difference between the detected temperature of the heat medium and the target temperature of the heat medium, the amount of the low-temperature gas refrigerant introduced into the second heat exchanger is adjusted to control the temperature of the heat medium. And a second control means for controlling to the medium target temperature.
(5) The heat medium cooling device according to (4),
A low-temperature reaction control apparatus comprising: a low-temperature reaction tank configured to introduce the temperature-controlled heating medium that circulates in the circulation path and to cool and adjust the reaction liquid inside the reaction tank to a desired temperature.
(6) A gas mixture obtained by mixing a vaporized gas obtained by vaporizing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and the low-temperature liquefied gas are introduced into each other to exchange heat with each other. A first heat exchanger that discharges as a gas refrigerant and discharges the low-temperature liquefied gas as the vaporized gas;
Mixing means for mixing the gas and the vaporized gas discharged from the first heat exchanger and discharging the mixed gas as the mixed gas;
The temperature of the low temperature gas refrigerant is controlled to the target temperature by adjusting the amount of the gas introduced into the mixing means based on the difference between the temperature detected for the low temperature gas refrigerant and the target temperature. A control means;
A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the first heat exchanger and a heat medium circulating in a circulation path;
Second control means for adjusting the amount of the gas based on the difference between the temperature detected for the heat medium and the heat medium target temperature, and controlling the temperature of the heat medium to the heat medium target temperature; Heat medium cooling device provided.
(7) After heat exchange, which is a vaporized gas obtained by vaporizing the low-temperature liquefied gas and the gas after heat exchange by introducing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and exchanging heat with each other. A first heat exchanger that discharges as gas;
Mixing means for mixing the gas after heat exchange discharged from the first heat exchanger with the vaporized gas and discharging it as a low-temperature gas refrigerant;
Based on the difference between the temperature detected for the low-temperature gas refrigerant and the target temperature, the amount of the vaporized gas introduced into the mixing means is adjusted to control the temperature of the low-temperature gas refrigerant to the target temperature. First control means;
A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the first heat exchanger and a heat medium circulating in a circulation path;
Second control means for adjusting the amount of the gas based on the difference between the temperature detected for the heat medium and the heat medium target temperature, and controlling the temperature of the heat medium to the heat medium target temperature; Heat medium cooling device provided.
(8) The heat medium cooling device according to (6) or the heat medium cooling device according to (7),
A low-temperature reaction control apparatus comprising: a low-temperature reaction tank configured to introduce the temperature-controlled heating medium that circulates through the circulation path and to cool and adjust the reaction liquid in the reaction tank to a desired temperature.
なお、以下の説明で用いる図面は、特徴をわかりやすくするために、便宜上特徴となる部分を拡大して示している場合があり、各構成要素の寸法比率などが実際と同じであるとは限らない。 Hereinafter, a low-temperature gas supply device, a heat medium cooling device, and a low-temperature reaction control device, which are embodiments to which the present invention is applied, will be described in detail with reference to the drawings.
In addition, in the drawings used in the following description, in order to make the features easy to understand, there are cases where the portions that become the features are enlarged for the sake of convenience, and the dimensional ratios of the respective components are not always the same as the actual ones. Absent.
先ず、本発明を適用した第1実施形態に係る低温ガス供給装置100A、熱媒冷却装置200A、及び低温反応制御装置300Aの構成について説明する。図1は、本発明の低温ガス供給装置、熱媒冷却装置、及び低温反応制御装置における第1実施形態の系統図である。 <First Embodiment>
First, the configuration of the low-temperature
次に、本発明における第2実施形態を説明する。図2は、本発明の低温ガス供給装置、熱媒冷却装置、及び低温反応制御装置における第2実施形態の系統図である。 <Second Embodiment>
Next, a second embodiment of the present invention will be described. FIG. 2 is a system diagram of a second embodiment of the low temperature gas supply device, the heat medium cooling device, and the low temperature reaction control device of the present invention.
次に、本発明における第3実施形態を説明する。図3は、本発明の低温ガス供給装置、熱媒冷却装置、及び低温反応制御装置における第3実施形態の系統図である。 <Third Embodiment>
Next, a third embodiment of the present invention will be described. FIG. 3 is a system diagram of a third embodiment of the low temperature gas supply device, the heat medium cooling device, and the low temperature reaction control device of the present invention.
次に、本発明における第4実施形態を説明する。図4は、本発明の低温ガス供給装置、熱媒冷却装置、及び低温反応制御装置における第4実施形態の系統図である。 <Fourth embodiment>
Next, a fourth embodiment of the present invention will be described. FIG. 4 is a system diagram of a fourth embodiment of the low-temperature gas supply device, the heat medium cooling device, and the low-temperature reaction control device of the present invention.
上述した第1~第4の実施形態に係る低温ガス供給装置100A~100Dは、熱媒冷却装置200A~200Dの他に、以下の装置にも適用することができる。 <Modification of each embodiment>
The low-temperature
1A,1B,1C,1D・・・常温経路
2A,2B,2C,2D・・・低温経路
3A,3B,3C,3D・・・混合経路
4A,4B,4C,4D・・・エゼクタ(混合手段)
5A,5B,5C,5D・・・第1熱交換器
6A,6B,6C,6D・・・第1温度検出器
7A,7B,7C,7D・・・第1温度調節器(第一制御手段)
8A,8B,8C,8D・・・流量調整弁
9A,9B,9C,9D・・・第1調節弁
200A,200B,200C,200D・・・熱媒冷却装置
21・・・熱媒循環経路
22・・・第2熱交換器
23・・・熱媒循環ポンプ
24・・・第2温度検出器
25・・・第2温度調節器
26・・・第2調節弁
27・・・リザーブタンク
300A,300B,300C,300D・・・低温反応制御装置
31・・・低温反応槽
31a・・・ジャケット
31b・・・攪拌モータ 100A, 100B, 100C, 100D ... Low temperature
5A, 5B, 5C, 5D ...
8A, 8B, 8C, 8D ... Flow
Claims (8)
- 低温液化ガスが気化した気化ガス及び前記低温液化ガスよりも温度の高いガスが混合された混合ガスと前記低温液化ガスとを導入して互いに熱交換させることにより、前記混合ガスを低温ガス冷媒として排出するとともに、前記低温液化ガスを前記気化ガスとして排出する第一熱交換器と、
前記ガスと、前記第一熱交換器から排出された前記気化ガスとを混合して、前記混合ガスとして排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記混合手段に導入される前記ガス及び前記気化ガスのそれぞれの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、を備える低温ガス供給装置。 A gas mixture obtained by mixing a vaporized gas obtained by vaporizing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and the low-temperature liquefied gas are introduced into each other to exchange heat with each other. A first heat exchanger for discharging and discharging the low-temperature liquefied gas as the vaporized gas;
Mixing means for mixing the gas and the vaporized gas discharged from the first heat exchanger and discharging the mixed gas as the mixed gas;
Based on the difference between the temperature detected for the low-temperature gas refrigerant and its target temperature, the respective amounts of the gas and the vaporized gas introduced into the mixing means are adjusted so that the temperature of the low-temperature gas refrigerant is And a first control means for controlling to a target temperature. - 低温液化ガス及び前記低温液化ガスよりも温度の高いガスを導入して互いに熱交換させることにより、それぞれ前記低温液化ガスが気化した気化ガス及び熱交換後の前記ガスである熱交換後ガスとして排出する第一熱交換器と、
前記第一熱交換器から排出された前記熱交換後ガスと前記気化ガスとを混合して、低温ガス冷媒として排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記第一熱交換器に導入される前記低温液化ガスよりも温度の高いガスの量と、前記混合手段に導入される前記気化ガスの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、を備える低温ガス供給装置。 By introducing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and exchanging heat with each other, the low-temperature liquefied gas is discharged as a vaporized gas that is vaporized and a heat-exchanged gas that is the gas after heat exchange, respectively. A first heat exchanger to
Mixing means for mixing the gas after heat exchange discharged from the first heat exchanger with the vaporized gas and discharging it as a low-temperature gas refrigerant;
Based on the difference between the temperature detected for the low-temperature gas refrigerant and its target temperature, the amount of gas having a temperature higher than that of the low-temperature liquefied gas introduced into the first heat exchanger and the mixing means are introduced. A first control means for adjusting the amount of the vaporized gas to control the temperature of the low-temperature gas refrigerant to the target temperature. - 前記混合手段は、エゼクタである請求項1又は2に記載の低温ガス供給装置。 The low-temperature gas supply device according to claim 1 or 2, wherein the mixing means is an ejector.
- 請求項1に記載の低温ガス供給装置又は請求項2に記載の低温ガス供給装置と、
前記低温ガス供給装置から排出される、前記温度制御された前記低温ガス冷媒と、循環経路を巡廻する熱媒とを互いに熱交換させる第二熱交換器と、
前記熱媒について検出された温度と、その熱媒目標温度との差異に基づき、前記第二熱交換器に導入される前記低温ガス冷媒の量を調整して、前記熱媒の温度を前記熱媒目標温度に制御する第二制御手段と、を備える熱媒冷却装置。 The low temperature gas supply device according to claim 1 or the low temperature gas supply device according to claim 2,
A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the low-temperature gas supply device and a heat medium circulating in a circulation path;
Based on the difference between the detected temperature of the heat medium and the target temperature of the heat medium, the amount of the low-temperature gas refrigerant introduced into the second heat exchanger is adjusted to control the temperature of the heat medium. And a second control means for controlling to the medium target temperature. - 請求項4に記載の熱媒冷却装置と、
前記循環経路を循環する、前記温度制御された前記熱媒を導入して、反応槽内部の反応液を所望温度に冷却調整するように構成された低温反応槽と、を備える低温反応制御装置。 The heat medium cooling device according to claim 4;
A low-temperature reaction control apparatus comprising: a low-temperature reaction tank configured to introduce the temperature-controlled heating medium that circulates in the circulation path and to cool and adjust the reaction liquid inside the reaction tank to a desired temperature. - 低温液化ガスが気化した気化ガス及び前記低温液化ガスよりも温度の高いガスが混合された混合ガスと前記低温液化ガスとを導入して互いに熱交換させることにより、前記混合ガスを低温ガス冷媒として排出するとともに、前記低温液化ガスを前記気化ガスとして排出する第一熱交換器と、
前記ガスと、前記第一熱交換器から排出された前記気化ガスとを混合して、前記混合ガスとして排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記混合手段に導入される前記ガスの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、
前記第一熱交換器から排出される、前記温度制御された前記低温ガス冷媒と、循環経路を巡廻する熱媒とを互いに熱交換させる第二熱交換器と、
前記熱媒について検出された温度と、その熱媒目標温度との差異に基づき、前記ガスの量を調整して、前記熱媒の温度を前記熱媒目標温度に制御する第二制御手段とを備える熱媒冷却装置。 A gas mixture obtained by mixing a vaporized gas obtained by vaporizing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and the low-temperature liquefied gas are introduced into each other to exchange heat with each other. A first heat exchanger for discharging and discharging the low-temperature liquefied gas as the vaporized gas;
Mixing means for mixing the gas and the vaporized gas discharged from the first heat exchanger and discharging the mixed gas as the mixed gas;
The temperature of the low temperature gas refrigerant is controlled to the target temperature by adjusting the amount of the gas introduced into the mixing means based on the difference between the temperature detected for the low temperature gas refrigerant and the target temperature. A control means;
A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the first heat exchanger and a heat medium circulating in a circulation path;
Second control means for adjusting the amount of the gas based on the difference between the temperature detected for the heat medium and the heat medium target temperature, and controlling the temperature of the heat medium to the heat medium target temperature; Heat medium cooling device provided. - 低温液化ガス及び前記低温液化ガスよりも温度の高いガスを導入して互いに熱交換させることにより、それぞれ前記低温液化ガスが気化した気化ガス及び熱交換後の前記ガスである熱交換後ガスとして排出する第一熱交換器と、
前記第一熱交換器から排出された前記熱交換後ガスと前記気化ガスとを混合して、低温ガス冷媒として排出する混合手段と、
前記低温ガス冷媒について検出された温度と、その目標温度との差異に基づき、前記混合手段に導入される前記気化ガスの量を調整して、前記低温ガス冷媒の温度を前記目標温度に制御する第一制御手段と、
前記第一熱交換器から排出される、前記温度制御された前記低温ガス冷媒と、循環経路を巡廻する熱媒とを互いに熱交換させる第二熱交換器と、
前記熱媒について検出された温度と、その熱媒目標温度との差異に基づき、前記ガスの量を調整して、前記熱媒の温度を前記熱媒目標温度に制御する第二制御手段とを備える熱媒冷却装置。 By introducing a low-temperature liquefied gas and a gas having a temperature higher than that of the low-temperature liquefied gas and exchanging heat with each other, the low-temperature liquefied gas is discharged as a vaporized gas that is vaporized and a heat-exchanged gas that is the gas after heat exchange, respectively. A first heat exchanger to
Mixing means for mixing the gas after heat exchange discharged from the first heat exchanger with the vaporized gas and discharging it as a low-temperature gas refrigerant;
Based on the difference between the temperature detected for the low-temperature gas refrigerant and the target temperature, the amount of the vaporized gas introduced into the mixing means is adjusted to control the temperature of the low-temperature gas refrigerant to the target temperature. First control means;
A second heat exchanger for exchanging heat between the temperature-controlled low-temperature gas refrigerant discharged from the first heat exchanger and a heat medium circulating in a circulation path;
Second control means for adjusting the amount of the gas based on the difference between the temperature detected for the heat medium and the heat medium target temperature, and controlling the temperature of the heat medium to the heat medium target temperature; Heat medium cooling device provided. - 請求項6に記載の熱媒冷却装置又は請求項7に記載の熱媒冷却装置と、
前記循環経路を循環する、前記温度制御された前記熱媒を導入して、反応槽内部の反応液を所望温度に冷却調整するように構成された低温反応槽と、を備える低温反応制御装置。 The heat medium cooling device according to claim 6 or the heat medium cooling device according to claim 7,
A low-temperature reaction control apparatus comprising: a low-temperature reaction tank configured to introduce the temperature-controlled heating medium that circulates in the circulation path and to cool and adjust the reaction liquid inside the reaction tank to a desired temperature.
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JP2013538566A JP5651246B2 (en) | 2011-10-11 | 2012-10-11 | Low temperature gas supply device, heat medium cooling device, and low temperature reaction control device |
CN201280048779.3A CN103874898B (en) | 2011-10-11 | 2012-10-11 | Cryogenic gas feedway, thermophore cooling device and low-temp reaction control device |
US14/345,523 US20140366575A1 (en) | 2011-10-11 | 2012-10-11 | Low-temperature gas supply device, heat transfer medium-cooling device, and low-temperature reaction control device |
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