PATTERN OF A CAPACITIVE TOUCH DEVICE AND MANUFACTURING
METHOD THEREOF
TECHNICAL FIELD
This disclosure generally relates to a touch device,
and more particularly to pattern of a capacitive touch device and a
manufacturing method thereof.
DESCRIPTION OF THE PRIOR ART
With the rapid development of the electronic
materials, touch devices have already become a commonly used input interface.
Traditional input device, depending on pressure or manual operation, may also
be replaced by a touch device in near future. More recently, due to prosperous
development of liquid crystal panels, display screen integrated touch devices
have already been produced and sold in large amounts. Touch devices can be
divided into resistive touch devices and capacitive touch devices. Existing
consumer electronic products have substantially taken advantage of capacitive
touch devices and have integrated the capacitive devices with the display
screens.
Capacitive touch devices in integrated display screens
usually have a coordinate-sensing capacity for two axial directions on the flat
surface (X axis and Y axis). Figure 1 illustrates a pattern of a traditional
capacitive touch device. The pattern 10 of the capacitive touch device includes
a substrate 5. Multiple groups of two adjacent first axial electrodes 1 and a
first axial conductive wire 11 constitute sensor electrode units in the X axial
direction, which are used for sensing X axial coordinates of touch positions.
Multiple groups of two adjacent second axial electrodes 2 and a second axial
conductive wire 21 constitute sensor electrode units in the Y axial direction,
which are used for sensing Y axial coordinates of the touch positions. An
insulating layer 4 is used for making the first axial conductive wire 11 and
the second axial conductive wire 21 electrically insulated from each other. The
above mentioned sensor electrode units can be made by transparent conductive
materials such as Indium Tin Oxide. The insulating layer 4 usually is made of
transparent insulating materials such as Polyimide.
Response speed of a capacitive touch device is
restricted by resistance of the sensor electrode units in X axial direction and
Y axial direction. Resistance of the sensor electrode units is mainly subject
to an influence of neck formed by the transparent first axial conductive wire
11. Restricted to the pattern of the traditional capacitive touch devices, area
of the first axial conductive wire 11 is usually smaller and at the same time
possesses larger resistance. It is therefore a problem to reduce resistance in
the neck and improve response speed of the capacitive touch devices.
SUMMARY OF THE INVENTION
An objective of the present disclosure is to provide a
pattern of a capacitive touch device which can effectively reduce resistance of
the touch device and enhance response speed of the touch device by setting a
metal jumper across connection points of two adjacent first axial electrodes
and a first axial conductive wire.
In an embodiment, pattern of a capacitive touch device
comprises of: two adjacent first axial electrodes; a first axial conductive
wire set between the two adjacent first axial electrodes to connect them; and a
pair of metal jumpers electrically connected to connection point of the two
adjacent first axial electrodes and the first axial conductive wire.
Another objective of the present disclosure is to
provide a manufacturing method for pattern of a capacitive touch device, which
comprises of two adjacent first axial electrodes, a first axial conductive
wire, and two adjacent second axial electrodes formed on surface of a
substrate, wherein the first axial conductive wire is set between the two
adjacent first axial electrodes to connect them, and the two adjacent second
axial electrodes are disposed separately on two lateral sides of the first
axial conductive wire. Further, an insulating layer which covers part of the
first axial conductive wire is formed. Next, a pair of metal jumpers and a
second axial conductive wire is formed, wherein the pair of metal jumpers is
placed on connection point between the two adjacent first axial electrodes and
the first axial conductive wire. Further, the second axial conductive wire is
placed across the insulating layer and connected to the two adjacent second
axial electrodes making the first axial conductive wire and the second axial
conductive wire electrically insulated.
Another objective of the present disclosure is to
provide a manufacturing method of a pattern of a capacitive touch device
comprising of: forming a pair of metal jumpers and forming a second axial
conductive wire on a substrate, wherein the pair of metal jumpers are disposed
separately on both lateral sides of the second axial conductive wire. Further,
the second axial conductive wire is covered by an insulating layer. Next, the
two adjacent first axial electrodes, the first axial conductive wire, and the
two adjacent second axial electrodes are formed on the substrate, wherein the
two adjacent second axial electrodes are connected separately to both ends of
the second axial conductive wire. The two adjacent first axial electrodes are
disposed separately on two lateral sides of the second axial conductive wire,
wherein the first axial conductive wire is covered partially with the
insulating layer, further wherein the pair of metal jumpers is also covered.
The first axial conductive wire is connected to the two adjacent first axial
electrodes. Formation of the insulating layer between the first axial
conductive wire and the second axial conductive wire results in electrical
insulation.
Summarized from the above, the pattern of the
capacitive touch device provided in the disclosure can effectively reduce the
resistance caused by connection of the two adjacent first axial electrodes and
the first axial conductive wire; thereby enhancing response speed of the
capacitive touch device. During manufacturing process, etching is necessary to
finish a pair of metal jumpers and a second axial conductive wire, and also to
decrease the extra production cost.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 shows a traditional touch device pattern.
Fig. 2 shows flowchart of a manufacturing method of a
touch device pattern in accordance with an embodiment of the present disclosure
.
FIG. 3-FIG. 5 illustrate structures corresponding to
various steps in the manufacturing method of the touch device pattern in
accordance with the embodiment of the present disclosure .
FIG. 6 is illustrates a schematic diagram of the
touch device pattern in accordance with the embodiment of the present
disclosure .
FIG. 7A is a cross-sectional figure of a touch device
pattern along A axis.
FIG. 7B is a cross-sectional figure of a touch device
pattern along B axis.
FIG. 8 shows a flowchart of a manufacturing method of
a touch device pattern.
FIG. 9-FIG. 11 are schematic diagrams of structures
corresponding to various steps in the manufacturing method of the touch device
pattern.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
For those skilled in the art, embodiments and
drawings described below are for illustration purposes only and do not limit
the scope of the present disclosure in any manner.
FIG. 2 shows flowchart of a manufacturing method of a
pattern of a touch device. FIG. 3, 4 and 5 are planar figures of patterns
produced by the steps in the manufacturing method of FIG. 2. The manufacturing
method of patterns of a touch device can either be a yellow-light process or
can use a circuit-printing technique. The manufacturing method of the pattern
of the touch device of the present disclosure comprises;
Step S11: forming two adjacent first axial electrodes
1, a first axial conductive wire 11, and two adjacent second axial electrodes 2
on surface of a substrate 5. As shown in FIG. 3, the first axial conductive
wire 11 is set between the two adjacent first axial electrodes 1 to link them
together. The two adjacent second axial electrodes 2 are disposed separately on
two lateral sides of the first axial conductive wire 11. The two adjacent first
axial electrodes 1, the first axial conductive wire 11, and the two adjacent
second axial electrodes 2 can be made from transparent conductive materials.
The transparent conductive materials have properties of visible light
transparency and conductivity. The transparent conductive materials can include
Indium Tin Oxide, but even other types of transparent conductive materials, not
listed here to avoid limitation of disclosure, can also be used. The first
axial electrodes 1 and the first axial conductive wire 11 can be a structure of
integral molding.
Step S12: covering the first axial conductive wire 11
by an insulating layer 4 as shown in FIG 4. The insulating layer 4 can be made
by transparent insulating materials such as Polyimide, but the types of
transparent insulating materials are not listed to avoid the limitation of the
disclosure.
Step S13: forming a pair of metal jumpers 3 and a
second axial conductive wire 21 as shown in FIG. 5. This pair of metal jumpers
3 is placed on a connection point of two adjacent first axial electrodes 1 and
the first axial conductive wire 11. The second axial conductive wire 21 across
the insulating layer 4 is connected to the two adjacent second axial electrodes
2 making an electrical insulation between the first axial conductive wire 11
and the second axial conductive wire 21. Pattern 40 of the touch device in FIG.
5 can be formed through steps S11- S13.
In pattern 40 of the capacitive touch device in FIG.
5, the first axial conductive wire 11 is narrow and lengthy, and is made of a
transparent conductive material, making resistance between the two adjacent
first axial electrodes 1 relatively high. However, after the pair of metal
jumpers 3 is disposed on the connection point between the two adjacent first
axial electrodes 1 and the first axial conductive wire 11, resistance between
the two adjacent first axial electrodes 1 can be reduced and the sensing speed
of the integral touch device can be enhanced .
Pattern 40 of the capacitive touch device can further
be connected to an outer controlling unit via peripheral lines with favorable
conductivity (not given in FIG. 1 - FIG. 4) after completion of the pattern 40
of the touch device. For illustration, first axial peripheral lines (not given
in FIG. 1 - FIG.4) and second axial peripheral lines (not given in FIG. 2 -
FIG. 5) are formed on two adjacent lateral sides of the substrate 5 so as to
connect the first axial peripheral line with the first axial electrode 1 and
connect the second axial peripheral line with the second axial electrode 2.
FIG. 6 is a planar view of the pattern of the
capacitive touch device in accordance with the present embodiment . Pattern 50
of the touch device is formed by arranging the pattern 40 of the touch device
in arrays in FIG. 5. The pattern 40 of the touch device can be finished using
the method of the touch device pattern described in the following embodiment .
FIG. 7A shows a cross-sectional view of the pattern
40 of the touch device alongside A axis. FIG. 7B is a cross-sectional view of
the pattern 40 of the touch device alongside B axis. In an embodiment, pattern
40 of a touch device includes a substrate 5, two adjacent first axial
electrodes 1, a first axial conductive wire 11, two adjacent second axial
electrodes 2, a second axial conductive wire 21, an insulating layer 4, and a
pair of metal jumpers 3. The two adjacent first axial electrodes 1, the first
axial conductive wire 11, and the two adjacent second axial electrodes 2 are
placed on surface of the substrate 5. The first axial conductive wire 11 is
formed between the two adjacent first axial electrodes 1 so as to connect them.
The two adjacent second axial electrodes 2 are disposed separately on two
lateral sides of the first axial conductive wire 11. The second axial
conductive wire 21 stretches across the first axial conductive wire 11 and is
connected to the two adjacent second axial electrodes 2. The insulating layer 4
is formed between the transparent first axial conductive wire 11 and the second
axial conductive wire 21 so as to make them electrically insulated. The pair of
metal jumpers 3 is placed on the connection point between the two adjacent
first axial electrodes 1 and the first axial conductive wire 11.
Referring to FIG. 5 and FIG. 6, multiple groups of
the two adjacent first axial electrodes 1 and the first axial conductive wire
11 constitute sensor electrode units in X axial direction. The sensor electrode
units are used for sensing X axial coordinates of touch positions. Multiple
groups of two adjacent transparent second axial electrodes 2 and the second
axial conductive wire 21 constitute sensor electrode units in Y axial
direction, which are used for sensing Y axial coordinates of the touch
positions. The two adjacent transparent second axial electrodes 2 are composed
of transparent conductive materials such as ITO. The second axial conductive
wire 21 can be a metallic film composed of molybdenum/ aluminum /molybdenum or
any other metal with good conductivity. The metallic film of molybdenum /
aluminum/molybdenum is suitable being used in the etching process to finish the
second axial conductive wire 21.
The insulating layer 4 is formed between the
transparent first axial conductive wire 11 and the second axial conductive wire
21. Based on width of the second axial conductive wire 21, an insulating layer
with a proper area can be selected so that appropriate electrical insulation
can be made between the first axial conductive wire 11 and the second axial
conductive wire 21. The insulating layer 4 can be made of a Polyimide or any
other compatible/well known material.
A pair of metal jumpers 3 is used for reducing
resistance of the electrode units in X axial direction constituted by the
transparent first axial electrode 1 and the transparent first axial conductive
wire 11. The pair of metal jumpers 3 can be located near the connection point
of the two adjacent first axial electrodes 1 and the first conductive wire 11.
The first axial conductive wire 11 has relatively a small cross section
compared to that of the first axial electrode 1, which makes resistance of
neck, which includes the two adjacent first axial electrodes 1 and the first
axial conductive wire 11, larger. This increases resistance of the electrode
units of the X axial direction constituted by the first axial electrode 1 and
the transparent first axial conductive wire 11.
Resistance of electrode units of X axial direction
that comprise of the first axial electrode 1 and of the transparent conductive
wire 11 can be reduced via a pair of metallic conductive wires 3. Reduction of
this resistance can shorten the response time of the touch device, thereby
enhancing response speed of the touch device. A method to calculate resistance
of the X axial electrode units is mentioned herein. When value of the first
axial electrodes 1 is represented by N, then N-1 represents the number of the
first axial conductive wires 11. Resistance of the electrode units of the X
axial direction represents resistance acquired from serial wounding of the
first axial electrode 1 and the first axial conductive wire 11. In other words,
resistance of the electrode units of the X axial direction is the resistance of
the first axial electrode 1 multiplied by number of the first axial electrodes
1 and then next adding resistance of the neck, which constitutes the two
adjacent first axial electrodes and the first axial conductive wire 11, and
then finally multiplying the number of the necks.
Illustratively, resistance of each first axial
electrode 1 is 100Ω, and the resistance of each individual neck is 200Ω. When N
is 11, resistance of the electrode units of the X axial direction is equivalent
to 3100Ω (11×100+10×200=3100Ω). Assuming that after adding a pair of metallic
conductive wires 3, resistance of the neck becomes 10Ω. Then, resistance of the
electrode units of the X axial direction is equivalent to 1200Ω.
(11×100+10×10=1200Ω).
A pair of metal jumpers 3 can comprise of any
metallic conductive wire, and more specifically a metallic film that comprises
of molybdenum, aluminum, or molybdenum. Using an etching process, the pair of
metal jumpers 3 and the second axial conductive wire 21 can be finished.
FIG. 8 shows flowchart of a manufacturing method of
the touch device pattern. FIG. 9 - FIG. 11 are schematic diagrams of structures
corresponding to various steps in the manufacturing method of the touch device
pattern. The manufacturing method of the touch device pattern can be a
yellow-light process or a circuit-printing technique. As shown in FIG. 11, the
touch device pattern 90, produced in the manufacturing method of the touch
device pattern, has structure of an adverse superposition of the touch device
pattern 40. The manufacturing method of the touch device pattern comprises;
Step S61: forming a pair of metal jumpers 3 and a
second axial conductive wire 21 on a substrate 5, wherein the pair of metal
jumpers 3 is disposed separately on two lateral sides of the second axial
conductive wire 21, as shown in FIG. 9. The pair of metal jumpers 3 and the
second axial conductive wire 21 can be made of a metallic film of molybdenum/
aluminum/ molybdenum.
Step S62: covering the second axial conductive wire
21 by an insulating layer 4, as shown in FIG. 10. The insulating layer 4 can be
a Polyimide, but the disclosure is not confined to this.
Step S63: forming two adjacent first axial electrodes
1, a first axial conductive wire 11, and two adjacent second axial electrodes 2
on a substrate 50. As shown in FIG. 11, the two adjacent second axial
electrodes 2 are connected to both ends of the second axial conductive wire 21.
The two adjacent first axial electrodes 1 are disposed separately on two
lateral sides of the second axial conductive wire 21. The first axial
conductive wire 11 is covered partially over the insulating layer 4 and
partially over the pair of metal jumpers 3. The first axial conductive wire 11
is connected to the two adjacent first axial electrodes 1. The insulating layer
4 positioned between the first axial conductive wire 11 and the second axial
conductive wire 21 makes the wires 11 and 21 electrically insulated. The two
adjacent first axial electrodes 1, the first axial conductive wire 11, and the
two adjacent second axial electrodes 2 can be made of Indium Tin Oxide. The
touch control circuit pattern 90 is formed via steps S61 - S63.
In accordance with the embodiments , touch device
pattern of the present disclosure and its manufacturing method reduces
resistance caused by a neck, which comprises of two adjacent first axial
electrodes and a first axial conductive wire, thereby enhancing response speed
of the touch device pattern.