WO2013051789A1

WO2013051789A1 - Method for manufacturing a pattern retarder

Info

Publication number: WO2013051789A1
Application number: PCT/KR2012/007127
Authority: WO
Inventors: 최봉진; 김용환; 하경수
Original assignee: 동우화인켐 주식회사
Priority date: 2011-10-05
Filing date: 2012-09-05
Publication date: 2013-04-11
Also published as: CN103858047A; KR20130036911A

Abstract

The present invention relates to a method for manufacturing a pattern retarder. The method for manufacturing the pattern retarder includes: a first step of emitting light onto a first pattern area of an alignment layer formed on a film to align the first pattern area in a predetermined direction; and a second step of emitting light onto at least one portion of the first pattern area aligned in the predetermined direction and onto a second pattern area of the alignment layer to align the second pattern area in a direction different from the aligned direction of the first pattern area without influencing the aligned direction of at least one portion of the first pattern area. Thus, pattern retarders having a uniform width and a clear interface may be quickly and continuously manufactured.

Description

Manufacturing method of pattern retarder

The present invention relates to a method of manufacturing a pattern retarder for implementing a stereoscopic image.

A patterned retarder (also called a birefringent medium or a retardation film) is applied to a stereoscopic image display device of polarized glasses and used to realize a stereoscopic image. In addition, the pattern retarder is provided on one surface of a transflective LCD, and functions as a compensation film for optimizing the optical characteristics of the reflecting and transmitting portions, respectively, so as to obtain good identification of the LCD image regardless of whether the external light is bright or dark. It can also be used to

In the method of manufacturing a pattern retarder, the process of forming a polarizing pattern by irradiating light after forming an oriented film in the part which was unwound while the film rolled up by a roll by the exposure system continuously unwinds and drying is included.

In this process, the mask may be misaligned or misaligned, or the film may meander and flicker when the film is unwound and moved, which causes irregular widths and boundaries of the polarization patterns formed on the film. Acts as.

Films with irregular polarization patterns have poor polarization performance, causing problems that also significantly degrade the performance of 3D displays attached thereto. Accordingly, various methods for regularly forming the exposure pattern on the film have been proposed.

In Korean Patent Laid-Open No. 2010-89782, after forming a polymer film on a substrate, a pattern mask in which light transmission regions and light blocking regions are alternately alternated vertically and horizontally so that different polarized light passes selectively over the polymer membrane. And a polarizing plate having two distinct regions each transmitting different polarizations on top of the pattern mask, and irradiating ultraviolet rays from the top of the polarizing plate to the polymer film to form alignment films having different alignment directions in the micro-regions of the polymer film. And the manufacturing method of the pattern retarder which forms a phase retardation layer on this alignment film is disclosed.

However, this method is designed to use two masks or a mask having two or more patterns in one mask, so that the pattern depends on the diffusion of light, the mismatch of masks between patterns, the meandering of the film, and the difference in reactivity of the alignment film material. The problem is that the width does not match or the pattern boundary is not uniform. In addition, as the frequency of use of the mask increases, there is a problem that continuous manufacture of the pattern retarder is inefficient.

[Preceding technical literature]

[Patent Documents]

(Patent Document 1) Korean Unexamined Patent Publication No. 2010-89782 (published Aug. 12, 2010)

It is an object of the present invention to provide a method for producing a pattern retarder having a uniform width and a distinct interface.

It is another object of the present invention to provide a method for producing a pattern retarder capable of performing uniform continuous exposure over a wide range of areas.

In addition, another object of the present invention is to provide a method that can minimize the shaking and meandering of the film in manufacturing the pattern retarder as described above.

1. A first step of irradiating light to the first pattern region of the alignment film formed on the film to orient in a predetermined direction; And irradiating light to at least a portion of the first pattern region oriented in a predetermined direction and a second pattern region of the alignment layer so that the second pattern region is changed to the first pattern region without affecting the alignment direction of at least a portion of the first pattern region. A method for producing a pattern retarder comprising a second step of orienting in a direction different from the orientation direction of.

2. The method of 1 above, wherein at least a part of the first pattern region includes a boundary between the first pattern region and the second pattern region.

3. In the above 1, the manufacturing method of irradiating more than 1.5 times the amount of light per unit area compared to the second step in the first step.

4. In the above 1, wherein the first pattern region is formed in the same or different direction of the conveying direction of the film manufacturing method.

5. The method of 1 above, wherein the first step is performed by placing a pattern forming part including a mask through which light is transmitted to a portion corresponding to the first pattern region on the alignment layer.

6. In the above 1, wherein the second step is performed by placing a pattern forming portion including a mask for transmitting light to at least a portion of the first pattern region and a portion corresponding to the second pattern region of the alignment layer on the alignment layer Manufacturing method.

7. In the above 1, wherein the second step is performed by irradiating light to the entire alignment film without a mask.

8. In the above 1, the first and second step is a pattern exposure unit for transmitting light to a portion corresponding to the first pattern region; And a mask including a front exposure part through which light is transmitted to portions corresponding to the first and second pattern regions.

9. The method of 1 above, wherein the film is conveyed in close contact with the film conveying portion having a curved surface of a circle, ellipse or a portion thereof.

10. In the above 9, wherein the first and second steps are performed by placing a pattern forming part including a mask bent at the same curvature as the film transfer part on the alignment layer.

11. In the above 1, the film conveying unit is a circular roller; Elliptical roller; Or a belt bent in curvature of a circle, ellipse or part thereof.

12. In the above 5, 6, 8 or 10, the pattern forming unit further comprises a polarizer.

13. The method of claim 12, wherein the pattern forming unit further comprises an internal pressure control chamber to allow the mask or mask and the polarizer is configured to be curved in the curvature of the circle, ellipse or a part thereof.

14. The method of 1 above, the method of irradiating more than twice the amount of light per unit area compared to the second step in the first step.

15. The method according to the above 1, wherein in the second step, a minimum integrated exposure amount for aligning the second pattern region in a direction different from that of the first pattern region is irradiated.

16. The method according to the above 9, wherein the surface of the film transfer part is provided with an adhesive layer or an anti-slip layer.

17. In the above 10, the method of manufacturing a constant distance between the film transfer unit and the pattern forming unit.

18. The method according to the above 1, wherein the alignment layer is formed of a polymer made of a repeating unit of Formula 1 having photocrosslinking properties:

[Formula 1]

(Wherein R1 is polycinnamate, polyalkoxycinnamate (alkoxy group has 1-20 carbon atoms) or polyallyloyloxycinnamate, R2 is polyfluorinated cinnamate, polychlorinated cinnamate or polydycinnamate, Molecular weight of the polymer is 10,000 to 50,000).

According to the method of the present invention, a pattern retarder having a uniform width and a distinct boundary surface can be produced.

The method of the present invention can prevent pattern damage due to the diffusion of light generated at the boundary of the light transmitting portion of the mask.

The method of the present invention can use the mask only once or at least so that the light transmission boundary of the mask is not located at the boundary of the patterns, thereby preventing pattern damage and crushing due to the position mismatch of the two masks.

The method of the present invention is suitable for use in the continuous manufacturing process of the pattern retarder.

The method of the present invention allows for uniform exposure over a wide range of areas. In particular, when bending the film to be in close contact with the ellipse or a part of the film to be in close contact with the film conveying portion can be exposed to a wider area.

The method of the present invention can minimize the shaking and meandering of the film during continuous pattern retarder manufacturing by allowing the conveyed film to be in close contact with the film conveying portion.

According to the method of the present invention, the curvature of the pattern forming portion and the film conveying portion is matched to make the distance between them uniform, so that light is uniformly incident on the contact surface of the film, and more uniform exposure and pattern formation are possible.

1 illustrates a film, an alignment film, a first pattern region, a second pattern region, a boundary between a first pattern region and a second pattern region, and a liquid crystal coating layer of the present invention.

2 illustrates a method of performing the first and second steps of the present invention.

3 illustrates a mask for performing the method of the present invention.

4 illustrates a manufacturing apparatus in which the method of the present invention is implemented.

5 illustrates an exposure system used in the method of the present invention.

6 shows embodiments of the film conveying part of the present invention.

7 illustrates the structure of the pattern forming portion of the present invention.

8 illustrates the structure of a pattern forming portion of the present invention.

The present invention provides a light emitting device comprising: a first step of irradiating light to a first pattern region of an alignment film formed on a film to align it in a predetermined direction; And irradiating light to at least a portion of the first pattern region oriented in a predetermined direction and a second pattern region of the alignment layer so that the second pattern region is changed to the first pattern region without affecting the alignment direction of at least a portion of the first pattern region. The present invention relates to a method for manufacturing a pattern retarder capable of continuously producing a pattern retarder having a uniform width and a distinct boundary surface at a high speed by including a second step of aligning in a direction different from the orientation direction of a.

Hereinafter, the present invention will be described in detail.

In the present invention, the film, the alignment film, the first pattern region, the second pattern region, the boundary between the first pattern region and the second pattern region, and the liquid crystal coating layer are as shown in FIG. 1.

The manufacturing method of the present invention includes a first step of irradiating light to the first pattern region of the alignment film formed on the film to orient the light in a predetermined direction.

The film serves as a base film for forming an alignment film as a transparent optical film. The film of the present invention may be a polarizing plate, for example. When the pattern retarder is formed on a separate base film other than the polarizing plate, and then bonded to the polarizing plate, a step of bonding the pattern retarder to the polarizing plate with an adhesive or the like is additionally required, and the thickness of the polarizing plate becomes thicker. It is preferable to use it as a film.

Optical films, such as a polarizing plate, can be used without particular limitation what is known in the LCD manufacturing field. For example, the polarizer may include a polarizer and a polarizer protective film laminated on at least one side of the polarizer. As a polarizer, the thing by which the dichroic dye was adsorption-oriented to the film which consists of polyvinyl alcohol-type resin can be used. As a polyvinyl alcohol-type resin which comprises a polarizer, the copolymer of polyvinyl acetate which is a homopolymer of vinyl acetate, and vinyl acetate and the other monomer copolymerizable with this can be used. As the other monomer copolymerizable with vinyl acetate, unsaturated carboxylic acids, unsaturated sulfonic acids, olefins, vinyl ethers and acrylamides having an ammonium group may be used. The thickness of the polarizer is not particularly limited and may be prepared in the conventional thickness used in the art.

It is preferable that a polarizer protective film is excellent in transparency, mechanical strength, thermal stability, moisture shielding property, isotropy, etc., For example, polyester-based films, such as polyethylene terephthalate, polyethylene isophthalate, polybutylene terephthalate; Cellulose films such as diacetyl cellulose and triacetyl cellulose; Polycarbonate film; Acrylic films such as polymethyl (meth) acrylate and polyethyl (meth) acrylate; Styrene-based films such as polystyrene acrylonitrile-styrene copolymer; Polyolefin-based films such as polyethylene, polypropylene, cyclo- or polyolefin-based films having a norbornene structure, and ethylene propylene copolymers; Polyimide film; Polyether sulfone-based film; A sulfone film etc. can be used, The thickness of these is also not specifically limited.

An alignment film is formed on the film above. The alignment film is formed by forming a polymer film on the film and then irradiating polarized light to the polymer film to crosslink the light. By this first step, the first pattern region of the alignment film is oriented in the intended constant direction. The orientation direction of the first pattern region may or may not coincide with the conveyance direction of the film.

The composition for forming the alignment film contains a polymer resin to which orientation is imparted by light irradiation. The polymer resin may be at least one selected from the group consisting of polyamide, polyimide, polyvinyl alcohol, polyamic acid and polycinnamate, for example.

For example, a polymer that exhibits photocrosslinking properties, including a monomer including a cinnamate group capable of photoalignment of Formula 1 as a photoalignment agent, may be preferably used.

[Formula 1]

The first step may be performed by any method capable of photo-crosslinking the first pattern region of the alignment film in a certain direction and should not be performed by a specific method. For example, as shown in FIG. 2A, the mask may be irradiated with light after positioning a mask on which the light is transmitted through the first pattern region and not (blocked) to the second pattern region. Alternatively, for example, a method may be used in which the light source is regularly flashed as the film is transferred to form an exposure pattern.

The region oriented in a certain direction in this first step does not change the orientation direction even after light irradiation in the second step. To this end, it is preferable to irradiate 1.5 times or more, preferably 2 times or more, the amount of light (energy) per unit area in comparison with the second step described later in the first step.

The method of the present invention irradiates light to at least a portion of the first pattern region oriented in a predetermined direction and to a second pattern region of the alignment layer so that the second pattern region is not affected without affecting the alignment direction of at least a portion of the first pattern region. And a second step of orienting in a direction different from that of the first pattern region.

The alignment layer portions exposed in the second step are at least a portion of the first pattern region and the second pattern region. At least a portion of the first pattern region may include a portion of the first pattern region (eg, a first pattern region portion adjacent to the second pattern region, a first pattern region portion in contact with the boundary of the second pattern region, etc.) and the first pattern region. It covers the whole area. When at least a portion of the first pattern region is the entire first pattern region, it means that the entire alignment layer is exposed in the second step.

By the exposure in the second step, the orientation direction of at least part of the first pattern region is not changed, and only the second pattern region is oriented in a direction different from that of the first pattern region. In the orientation of the light crosslinking method, when the amount of light (energy) of 1.5 times or more, preferably 2 times or more, per unit area is irradiated in the first step to the second step, the orientation direction of the first pattern area may be fixed. Because there is.

In the second step, the minimum integrated exposure amount for aligning the second pattern region in a direction different from that of the first pattern region is preferably irradiated. This is because the amount of light (energy) irradiated in the first step can be lowered.

The second pattern region must be oriented in a direction different from the alignment direction of the first pattern region to function as a pattern retarder for a stereoscopic image display device. The pattern retarder exhibits different polarization characteristics between the first and second pattern regions so that the images transmitted to the left and right eyes are different.

The second step may be performed by any method capable of orienting the second pattern region in a direction different from that of the first pattern region without affecting the orientation direction of at least a portion of the first pattern region. It does not have to be done by the method.

For example, as shown in FIG. 2B, a mask is disposed on the alignment layer in which light is transmitted to half of the first and second pattern regions adjacent to each other and no light is transmitted to the other half of the first pattern region. And then irradiated with light.

For example, as shown in FIG. 2C, a mask for transmitting light to both the first and second pattern regions may be disposed on the alignment layer and then irradiated with light.

For example, it may be performed by irradiating polarized light to the entire alignment layer including the first and second pattern regions without a mask.

The mask used in the present invention includes a conventional pattern mask in which a light transmitting region and a light blocking region are alternately formed so that different polarized light selectively passes. Masks for the first and second stages may be present, respectively, but one mask may include both the configuration for performing the first and second stages.

For example, as shown in FIG. 3, a pattern exposure unit (a configuration for performing the first step) to allow light to pass through the first pattern region and a front surface exposure unit (to perform the second step) to allow light to be transmitted through the first and second pattern regions. Configuration for) may be provided in one mask. 3A and 3B, the pattern exposure part may be formed in accordance with the pattern formation direction.

In the case of using the mask of FIG. 3, when the second step for the n th region is performed after the first step for the n th region is performed in the process of continuously performing the pattern retarder while the film is unwound and transported, At the same time it is convenient to perform the first step of the n + 1 th region.

The method of the invention can be implemented, for example, in the retarder manufacturing apparatus of FIG. 4. The manufacturing apparatus of FIG. 4 may include a light alignment unit 100 for aligning the first and second pattern regions and a retarder forming unit 200 for forming a liquid crystal coating layer on the aligned first and second pattern regions. .

The light alignment unit 100 continuously forms the first alignment unit 10 on which the first step of the present invention is performed, the second alignment unit 20 on which the second step of the present invention is performed, and the film 40 on which the alignment layer is formed. It may include a film transfer unit 30 to be transferred to.

The first alignment unit 10 includes a first light source 11 and a first mask 12 for aligning the first pattern region of the alignment layer on the film 40 in a predetermined direction, and the second alignment unit 20 ) Includes a second light source 21 and a second mask 22 for aligning the second pattern region of the alignment layer on the film 40 in a direction different from that of the first pattern region. It is preferable that the orientation direction of a 2nd pattern area | region is a direction perpendicular to the orientation direction of a 1st pattern area | region.

For example, the mask of FIG. 2A may be used as the first mask 12 and the mask of FIG. 2B may be used as the second mask 22. In addition, when using the mask of FIGS. 3A and 3B, the first mask 12 and the second mask 22 may not be physically separated.

It is preferable that the 1st light source 11 and the 2nd light source 21 can irradiate an electron beam or a polarized electromagnetic wave. Among polarized electromagnetic waves, ultraviolet rays are more preferable in terms of ease of handling. The light sources can be selected according to the type of alignment film on the film 40 and any can be made as long as contactless orientation is possible.

The first light source 11 or the second light source 21 may be configured to be capable of irradiating an unpolarized electron beam or electromagnetic wave. In this case, the polarizer may be included to add the polarization filter function to the first mask 12 or the second mask 22.

The film conveyance part 30 includes the 1st roll 31 which unwinds the film 40, and the 2nd roll 32 which the film 40 winds up. The first roll 31 and the second roll 32 are independently connected to a drive source (not shown) such as a motor and a power transmission member (not shown) such as a belt or a chain to be rotated by receiving a driving force. Can be. In addition, a guide roll (not shown) and a accumulator (not shown) for controlling the transfer amount of the film according to the process for maintaining the tension and the stable transfer of the film may be provided.

An alignment layer forming unit (not shown) for forming an alignment layer on the film 40 before the first alignment unit 10 is included. In forming the alignment film, it may be formed by a flow casting method, or a conventional apparatus such as an air knife, gravure, reverse roll, kiss roll, spray, or blade. The method can be used.

The alignment layer may be formed in the process immediately before the alignment by the alignment layer forming unit, or in some cases, through a separate alignment layer forming process. In addition, in order to harden the formed alignment film in an orientation film formation part, a normal drying apparatus can be used as needed.

The retarder forming unit 200 includes a mixed solution applying unit 210, a mixed solution drying unit 220, and a curing unit 230.

The mixed solution coating part 210 is for uniformly applying a coating liquid containing a liquid crystal compound, a monomer and a solvent onto the alignment film. In the application, conventional apparatuses such as air knife, gravure, reverse roll, kiss roll, spray, blade and the like can be used.

The mixed solution drying unit 220 is for drying the mixed solution applied by the mixed solution applying unit 210 to form a coating layer, which may also be a general drying apparatus.

The curing unit 230 is to harden by irradiating light to the formed coating layer using a third light source (not shown), a conventional device such as a light source for irradiating electromagnetic waves may be used.

5 is a type of exposure system for forming a retarder pattern by irradiating light onto the polarizing film F for 3D display.

The exposure system includes a lamp 310, a reflector-1 320, a light collector 330, a reflector-2 340, a pattern forming unit 350, and a film transfer unit 360.

The lamp 310 generates light and outputs the light to the reflector- 1320. The reflector-1320 reflects the light output from the lamp 310 toward the light collector 330.

The light collector 330 collects the light reflected from the reflector-1320 and transmits the light reflected to the reflector-2340. The reflector-2 340 reflects the light received from the light collector 330 to the pattern forming unit 350.

The pattern forming unit 350 receives the light irradiated from the lamp 310 by the optical system including the reflector-1320, the light collector 330, and the reflector-2340.

The film transfer part 360 is a means for moving the film F in close contact with the arrow direction shown in FIG. 6 through a rotational motion. The film F moves in close contact with the curved surface of the film transfer part 360 to prevent shaking and meandering generated during the transfer process. The curved surface of the film conveying part 360 corresponds to the close contact surface where the film F is in close contact, and the film F is in close contact with the surface of the film conveying part 360 and moves while being curved at the curvature of a circle, an ellipse, or a part thereof. .

An adhesive layer or an anti-slip layer may be formed on the surface of the film conveying part if necessary to convey the film in close contact. If sufficient tension is applied to the film to be transported, a separate layer for adhesion may not be formed.

Although the film transfer part 360 is represented by an elliptical roller in FIG. 5, it may be embodied as a circular roller or may be implemented by using a plurality of circular rollers as shown in FIG. 6.

As shown in FIG. 6 (a), an endless track type formed by connecting two circular rollers with a belt is possible, and as shown in FIG. 6 (b), a plurality of circular rollers are arranged to be spaced apart by a trajectory having an ellipse or a portion thereof. As shown in Fig. 7 (c), a plurality of circular rollers may be arranged closely and closely adjacent to a locus having a curvature of an ellipse or a part thereof. 6 (d) and 6 (e), it is also possible to provide double or multiple support rolls in the lower part of the configuration of Figs. 6 (b) and 6 (c).

The pattern forming unit 350 is a film in which the light irradiated from the lamp 310 received through the reflector-1320, the collector 330, and the reflector-2340 is in close contact with the curved surface of the film transfer unit 360 ( F) to pass. Thereby, a polarization pattern is formed in a part of the film F in close contact with the curved surface of the film transfer part 360.

Light transmitted from the pattern forming unit 350 to the film F in close contact with the film transfer unit 360 may be directed toward the center of the elliptical roller of the film transfer unit 360. In this case, the light may be uniformly incident on the portion of the film F that is in close contact with the curved surface of the film transfer part 360.

In addition, the curved surface of the film transfer part 360 may be anti-reflective and scattering-free treatment. As a result, since the incident light is not reflected or scattered on the curved surface of the film transfer part 360, the polarization pattern is uniformly formed on the portion of the film F that is in close contact with the curved surface of the film transfer part 360.

The detailed structure of the pattern forming unit 350 is, for example, as shown in FIG. 7.

As shown in FIG. 7A, the pattern forming unit 350 may include a chamber 351, a polarizer 353, a polarizer fixing part 355, a mask fixing part 357, and a mask 359.

The polarizing plate 353 may be composed of COP (cycloolefin polymer) / polarizer PVA (polyvinyl alcohol) / COP. At this time, the PVA to be used may be a iodine stained, or may be used for other polarization means. The polarizer fixing part 355 fixes both ends of the polarizer 353 to the pattern forming part 350. In addition, in some cases, only a polarizer may be used without a protective film such as COP (cycloolefin polymer) or TAC (triacetylcellulose).

When irradiating the polarized light from the light source, the pattern forming unit 350 may be formed of only the mask 359 without the polarizer 353 or the polarizer as shown in FIG. 8A.

The mask 359 may be implemented with a film or quartz glass material capable of forming a polarization pattern. The mask fixing part 357 fixes both ends of the mask 359 to the pattern forming part 350.

In detail, the mask 359 has a quadrangular shape having four sides, and a side facing the one side is fixedly connected to the mask fixing part 357 and another pair of two facing each other except these two sides. The side is not fixed to the mask fixing part 357.

The chamber 351 is a means for adjusting the internal air pressure so that the distance between the curved surface of the polarizing plate 353 and the mask 359 and the curved surface of the film transfer part 360 is constant. The internal pressure of the chamber 351 is lowered to reduce the radius of curvature of the polarizing plate 353 and the mask 359 so that the distance between the curved surface of the polarizing plate 353 and the mask 359 and the curved surface of the film transfer part 360 is constant. The adjusted result is shown in FIG. 7B and FIG. 8B. 5, it can be seen that the distance between the curved surface of the mask provided in the pattern forming unit 350 and the curved surface of the film transfer unit 360 is constant (AA ′ = BB ′ = CC ′).

Preferably, the distance between the curved surface of the polarizing plate 353 and the mask 359 and the curved surface of the film transfer part 360 is kept constant. This is to allow light to be uniformly incident on the portion of the film F that is in close contact with the curved surface of the film transfer part 360.

Through an optical system of a type different from that of the type shown in FIG. 5, it is possible to implement light to be transmitted from the lamp 310 to the pattern forming part 350. In addition, it is of course possible to implement such that the light is transmitted directly from the lamp 310 to the pattern forming unit 350 without the optical system.

In addition, it is assumed that the curved surface of the polarizing plate 353 and the mask 359 by using the chamber 351, the internal air pressure is adjustable, but this is also merely an example for the description of the invention, other than the chamber 351 It is also possible to implement to adjust the curved surface of the polarizing plate 353 and the mask 359 using other means. For example, it is possible to control the means for applying external pressure to both ends of the polarizing plate 353 and the mask 359 to adjust the curved surfaces of the polarizing plate 353 and the mask 359.

On the other hand, it is assumed that the curved surface of the polarizing plate 353 and the mask 359 is variable above, but this is also merely an example for convenience of description. Accordingly, the curved surfaces of the polarizing plate 353 and the mask 359 may be maintained in a fixed state. In this case, the means for adjusting the curved surfaces of the polarizing plate 353 and the mask 359, such as the chamber 351, may be used. This is not necessary.

In addition, in the above embodiment, the film F is assumed to be the elliptical roller film transfer unit 360, but the elliptical roller is only an example of a means for moving to the curvature of the ellipse or a portion thereof in close contact with the film (F). It is possible to replace this with various means, including the circular roller or the examples of FIG. 6.

In addition, in the above, the polarizing plate 353 and the mask 359 are stacked in the order of the polarizing plate 353 and the mask 359 with respect to the surface of the film transfer part 360, but they are spaced apart within an appropriate range or the lamination order thereof is changed. You can do the same.

In addition, although the polarizer 353 and the mask 359 are sequentially stacked on the top, the polarizer may also be lost when the light emitted from the light source is polarized light. In addition, only the polarizer of the polarizing plate 353 may be used.

In addition, although the curved surface of the portion including the mask 359 is adjusted using the chamber 351 above, this is merely an example of a means for adjusting the curved surface, and thus the curved surface of the mask may be adjusted and the curved surface may be maintained. As long as the means capable of applying an external force, any one can replace the chamber 351.

For example, the radius of curvature of the mask can be implemented to be adjusted by a fixing device that can adjust the distance between two sides of the mask fixed to the pattern forming portion.

The exposure system of FIG. 5 is a system for forming a polarization pattern on a polarizing film for 3D display. However, the technical idea of the present invention is also applicable to the case of forming a pattern on a film other than the polarizing film for 3D display.

실시예EXAMPLE

An orientation film was apply | coated to the TAC film of Fuji Corporation of Japan, and it dried at 100 degreeC for 1 minute. The pattern exposure is performed so that the first pattern region is oriented at + 45 ° by irradiating with the A light quantity (energy, mJ / cm ² ) shown in Table 1 below in the film advancing direction using a mask that irradiates light to the first pattern region. It was.

Thereafter, the entirety of the first and second pattern regions is irradiated with the B light quantity (energy) shown in Table 1 below without a mask, so that the orientation direction of the second pattern region is maintained while the alignment direction of + 45 ° is maintained. It confirmed that it became -45 degree with respect to the film advancing direction.

A liquid crystal was applied on the alignment film, dried at 60 ° C. for 1 minute, and then subjected to curing exposure to obtain a pattern retarder sample. The obtained samples were evaluated according to the following criteria by measuring the angle of orientation with Axoscan.

(Excellent): The orientation direction of a 2nd pattern area | region becomes -45 degree with respect to a film advancing direction, while the orientation direction of +45 degree is maintained as it is a 1st pattern area | region.

Good (○): The first pattern region exhibits an orientation direction of ± 2 degrees at +45 degrees while the orientation direction of the second pattern region is -45 degrees with respect to the film advancing direction.

-Poor (X): The orientation direction of the second pattern region becomes -45 ° with respect to the film advancing direction while the orientation direction of the first pattern region is greater than + 47 ° or less than + 43 °.

Table 1

As shown in Table 1, when the A light amount (mJ / cm ² ) is 1.5 times or more than the B light amount (mJ / cm ² ), a good quality pattern retarder can be manufactured, and the A light amount (mJ / cm ² ) is B When the amount of light (mJ / cm ² ) or more than 1.5 times it was confirmed that it is possible to manufacture a pattern retarder of excellent quality.

[Description of the code]

10: first alignment portion 11: first light source

12: first mask 20: second alignment portion

21: second light source 22: second mask

30: film transfer part 31: first roll

32: second roll 40: film

100: light alignment portion 200: retarder forming portion

210: mixed solution coating unit 220: mixed solution drying unit

230: hardened part

310: lamp 320: reflector-1

330: light collector 340: reflector-2

350: pattern forming unit 351: chamber

353: polarizer 355: polarizer fixing portion

357: mask fixing part 359: mask

360: film transfer unit

Claims

A first step of irradiating light to the first pattern region of the alignment layer formed on the film to orient the light in a predetermined direction; And

Irradiating light to at least a portion of the first pattern region oriented in a predetermined direction and a second pattern region of the alignment layer to change the second pattern region without affecting the alignment direction of at least a portion of the first pattern region. A second step of aligning in a direction different from that of the first pattern region;

Method of producing a pattern retarder comprising a.
The method of claim 1, wherein at least a portion of the first pattern region includes a boundary between the first pattern region and the second pattern region.
The method according to claim 1, wherein in the first step, the amount of light irradiated 1.5 times or more per unit area compared to the second step.
The method of claim 1, wherein the first pattern region is formed in the same or different direction as the transport direction of the film.
The method of claim 1, wherein the first step is performed by placing a pattern forming part including a mask through which light is transmitted to a portion corresponding to the first pattern region on the alignment layer.
The method of claim 1, wherein the second step is performed by placing a pattern forming part including a mask on which the light is transmitted to at least a portion of the first pattern region and a portion corresponding to the second pattern region of the alignment layer on the alignment layer. Manufacturing method.
The method of claim 1, wherein the second step is performed by irradiating light to the entire alignment layer without a mask.
The display apparatus of claim 1, wherein the first and second steps include: a pattern exposure part through which light is transmitted to a portion corresponding to the first pattern area; And a mask including a front exposure part through which light is transmitted to portions corresponding to the first and second pattern regions.
The method according to claim 1, wherein the film is conveyed in close contact with a film conveying part having a curved surface with a curvature of a circle, an ellipse or a part thereof.
The method of claim 9, wherein the first and second steps are performed by placing a pattern forming part including a mask bent at the same curvature as the film transfer part on an alignment layer.
The method of claim 1, wherein the film transfer unit is a circular roller; Elliptical roller; Or a belt bent in curvature of a circle, ellipse or part thereof.
The manufacturing method of Claim 5, 6, 8, or 10 further containing a polarizer.
The manufacturing method of claim 12, wherein the pattern forming unit further includes an internal pressure adjusting chamber for allowing the mask or the mask and the polarizer to be curved in a curvature of a circle, an ellipse, or a part thereof.
The method according to claim 1, wherein in the first step, the amount of light irradiated at least twice per unit area compared to the second step.
The method according to claim 1, wherein in the second step, a minimum integrated exposure amount for aligning the second pattern region in a direction different from that of the first pattern region is irradiated.
The manufacturing method of Claim 9 with which the adhesion layer or the anti-slip layer is provided in the surface of the said film conveyance part.
The manufacturing method of Claim 10 with which the distance of the said film conveyance part and the said pattern formation part is constant.
The method according to claim 1, wherein the alignment layer is formed of a polymer made of a repeating unit of Formula 1 having photocrosslinking characteristics:

[Formula 1]

(Wherein R1 is polycinnamate, polyalkoxycinnamate (alkoxy group has 1-20 carbon atoms) or polyallyloyloxycinnamate, R2 is polyfluorinated cinnamate, polychlorinated cinnamate or polydycinnamate, Molecular weight of the polymer is 10,000 to 50,000).