WO2013035677A1 - Touch panel, method for manufacturing same, and display device - Google Patents

Touch panel, method for manufacturing same, and display device Download PDF

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Publication number
WO2013035677A1
WO2013035677A1 PCT/JP2012/072393 JP2012072393W WO2013035677A1 WO 2013035677 A1 WO2013035677 A1 WO 2013035677A1 JP 2012072393 W JP2012072393 W JP 2012072393W WO 2013035677 A1 WO2013035677 A1 WO 2013035677A1
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WIPO (PCT)
Prior art keywords
electrode
unit
layer
electrodes
circuit prevention
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PCT/JP2012/072393
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French (fr)
Japanese (ja)
Inventor
美崎　克紀
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シャープ株式会社
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Publication of WO2013035677A1 publication Critical patent/WO2013035677A1/en

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to a touch panel, a touch panel manufacturing method, and a display device with a touch panel.
  • a touch panel implements a function that allows a finger or an input pen as an input means to touch a display surface and is selected according to the contact position.
  • Display devices have been generalized.
  • a resistance film method (a method in which an input position is detected by contact between an upper conductive substrate and a lower conductive substrate when pressed) or capacitance
  • the system (method of detecting the input position by detecting the change in the capacity of the touched place) has been mainly used.
  • the capacitive touch panel is capable of detecting the contact position with a simple operation and is capable of multi-touch (detecting multiple touch positions simultaneously). It has become.
  • FIG. 11 shows an example of a conventional capacitive touch panel.
  • the drive electrode line 101D and the sense electrode line 101S which are thin and have high detection performance, are on the same plane.
  • 1 is a diagram showing a schematic configuration of a formed single-layer mutual capacitance touch panel 100.
  • diamond-shaped unit electrodes 101U are arranged so as to be adjacent to each other in the left-right direction in the figure, and each unit electrode 101U is connected via a connecting portion 101C.
  • a plurality of electrically connected drive electrode lines 101D are formed in parallel with each other in the vertical direction in the figure, while the diamond-shaped unit electrodes 101U 'are adjacent to each other in the vertical direction in the figure.
  • a plurality of sense electrode lines 101S are arranged in parallel to each other in the left-right direction in the figure.
  • the plurality of drive electrode lines 101D and the plurality of sense electrode lines 101S are provided so as to be electrically separated from each other and intersect each other.
  • the unit electrode 101U and the unit electrode 101U ′ are formed on the same plane so as not to overlap each other in a plan view.
  • the unit electrode 101U, the unit electrode 101U ′, the connection portion 101C, and the bridge electrode 104 are all formed of ITO (Indium Tin Oxide), which is a transparent conductive layer, and the unit electrode 101U and the unit electrode 101U ′ and the connecting portion 101C are formed in the same layer on the same plane.
  • ITO Indium Tin Oxide
  • the bridge electrode is interposed via the interlayer insulating film 103 formed on the connection portion 101C. Since 104 is formed, the plurality of drive electrode lines 101D and the plurality of sense electrode lines 101S are electrically separated from each other.
  • a plurality of drive electrode lines 101D and a plurality of sense electrode lines 101S are connected to a plurality of terminal portions 101F via a metal wiring 102, respectively.
  • a wiring formation region R ⁇ b> 2 that is a region electrically connected to each of these is provided.
  • connection electrode 101E for electrically connecting the drive electrode line 101D or the sense electrode line 101S to the metal wiring 102 is provided.
  • connection electrode 101E and the terminal portion 101F are formed of an ITO layer that is the same layer as the unit electrodes 101U and 101U ′ and the connection portion 101C.
  • connection electrode 101E connected to the drive electrode line 101D or the sense electrode line 101S and the terminal portion 101F are directly electrically connected by the metal wiring 102, the drive The electrode line 101D or the sense electrode line 101S can be electrically connected to the terminal portion 101F.
  • FIG. 12 is a partial enlarged view of a portion where the drive electrode line 101D and the sense electrode line 101S intersect in the touch panel 100 shown in FIG.
  • the unit electrodes 101U and 101U ′ are separated at the portion where the drive electrode line 101D and the sense electrode line 101S intersect.
  • An interlayer insulating film 103 is formed on the connecting portion 101C formed of the same layer, and a bridge electrode 104 for electrically connecting adjacent unit electrodes 101U ′ is formed on the interlayer insulating film 103.
  • 13 (a) to 13 (e) show a cross section taken along line B1-B1 ', a cross section taken along line B2-B2', and a cross section taken along line B3-B3 'in FIG. 100 manufacturing steps are shown.
  • FIG. 13A shows a process of forming the unit electrode 101U, the unit electrode 101U ′, the connecting portion 101C, and the terminal portion 101F with the same ITO layer
  • FIG. 13B shows the MoNb / Al / MoNb.
  • the metal wiring 102 is provided on the terminal portion 101F. Further, the terminal portion 101F formed at one end portion outside the wiring forming region R2 is exposed for electrical connection with the outside as shown in the figure.
  • FIG. 13C shows a process of forming the interlayer insulating film 103.
  • a portion where the metal wiring 102 is provided on the terminal portion 101F and one end portion outside the wiring formation region R2.
  • the interlayer insulating film 103 is not formed on the formed terminal portion 101F.
  • FIG. 13D shows a process for forming the bridge electrode 104
  • FIG. 13E shows a process for forming the protective film 105.
  • the metal wiring 102 is provided on the terminal portion 101F.
  • the protective film 105 is formed in the part where the protective film 105 is formed, and the protective film 105 is not formed in the terminal portion 101F formed at one end portion outside the wiring formation region R2.
  • the unit electrode 101U of the illustrated drive electrode line 101D and the unit electrode 101U ′ of the sense electrode line 101S are formed so as to be adjacent to each other, and there is a capacitance C F between the adjacent unit electrodes 101U and 101U ′.
  • the capacitance C F is different between when the detection object such as a finger or a pen is not touched and when it is touched.
  • the non-touch capacity becomes larger than the touch capacity (C F_untouch > C F_touch ). Using this principle, the touch position can be detected.
  • a signal having a predetermined waveform is sequentially input from the terminal portion 101F electrically connected to the drive electrode line 101D, and a detection signal is output from the terminal portion 101F electrically connected to the sense electrode line 101S. It has come to be.
  • FIG. 14 is a diagram showing a schematic configuration of another conventional single-layer type mutual capacitance touch panel 110.
  • FIG. 15 is a partial enlarged view of a portion where the drive electrode line 101D and the sense electrode line 101S intersect in the touch panel 110 shown in FIG.
  • a bridge electrode 104 for electrically connecting adjacent unit electrodes 101 ⁇ / b> U ′ is provided at a portion where the drive electrode line 101 ⁇ / b> D and the sense electrode line 101 ⁇ / b> S intersect.
  • An interlayer insulating film 103 is formed on the lowermost layer so as to partially cover the bridge electrode 104, and a connection portion 101 ⁇ / b> C formed in the same layer as the unit electrodes 101 ⁇ / b> U and 101 ⁇ / b> U ′ is formed on the interlayer insulating film 103.
  • the adjacent unit electrodes 101U ′ are different from the configuration of the conventional single-layered mutual capacitive touch panel 100 shown in FIG. 11 in that the unit electrodes 101U ′ are formed in contact with the bridge electrode 104.
  • FIG. 110 shows the manufacturing process.
  • FIG. 16A shows a process of forming the bridge electrode 104 and the terminal portion 101F with the same ITO layer
  • FIG. 16B shows a metal wiring 102 having a three-layer structure of MoNb / Al / MoNb.
  • the metal wiring 102 is provided on the terminal portion 101F. Further, the terminal portion 101F formed at one end portion outside the wiring forming region R2 is exposed for electrical connection with the outside as shown in the figure.
  • FIG. 16C shows a process for forming the interlayer insulating film 103.
  • a portion where the metal wiring 102 is provided on the terminal portion 101F and one end portion outside the wiring formation region R2.
  • the interlayer insulating film 103 is not formed on the terminal portion 101F formed in the above.
  • FIG. 16D shows a process of forming the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C with the same ITO layer
  • FIG. 16E shows the process of forming the protective film 105.
  • a protective film 105 is formed on a portion where the metal wiring 102 is provided on the terminal portion 101F, and the terminal portion 101F formed at one end portion outside the wiring formation region R2. In this case, the protective film 105 is not formed.
  • the touch panels 100 and 110 manufactured in this way are thin and have high detection performance.
  • JP 2011-76155 A (published on April 14, 2011)”
  • the interlayer insulating film 103 has an isolated island pattern only at a portion where the drive electrode line 101D and the sense electrode line 101S intersect. Is formed.
  • the formation process of the conductive layer such as the metal wiring 102 and the bridge electrode 104 is performed by a film forming process, a photolithography process, an etching process, and a resist stripping process to form a pattern with a predetermined shape
  • patterning is performed using the foreign matter or particles as a mask, resulting in a pattern defect.
  • the resist thickness is increased due to the foreign matter or particles, and a pattern defect due to insufficient exposure occurs.
  • FIG. 17A is a plan view showing a case where the above-described pattern defect of the conductive layer occurs in the touch panel 100 shown in FIG. 11, and FIG. 17B shows the case shown in FIG. A sectional view taken along line AA ′ is shown.
  • the touch panel 110 shown in FIG. 14 similarly, due to the presence of conductive foreign matters due to pattern defects generated in the process of forming the conductive layer such as the metal wiring 102 and the bridge electrode 104, There is a possibility that a short circuit occurs between adjacent unit electrodes 101U and unit electrode 101U ′ formed in the same layer, causing a touch detection function failure.
  • Patent Document 1 describes a touch panel in which a second bridge wiring film is formed using a droplet discharge method which is a kind of printing method.
  • the X electrode film 210 electrically connects the plurality of first island electrode portions 212 arranged in the X axis direction and the first island electrode portions 212 adjacent in the X axis direction.
  • the first bridge wiring film 211 is connected to each other, and the Y electrode film 220 includes a plurality of second island-shaped electrode portions 222 arranged in the Y-axis direction and second island-shaped adjacent to the Y-axis direction. And a second bridge wiring film 221 that connects the electrode portions 222 to each other.
  • the second bridge wiring film 221 and the first bridge wiring film 211 intersect at the intersection K, and are electrically insulated by interposing an insulating film 230 formed on the first bridge wiring film 211. Is secured.
  • the film width W1 of the insulating film 230 is formed in the range of the interval W2 between the adjacent first island-shaped electrode portions 212, and the formation length L1 of the insulating film 230 in the Y-axis direction is also the second adjacent. It is formed in the range of the interval L2 between the island-like electrode portions 222.
  • a surface treatment process is performed before the process of forming the second bridge wiring film 221, and the formation range of the second bridge wiring film 221 becomes lyophilic, and the outside of the formation range of the second bridge wiring film 221 becomes lyophobic. .
  • the discharged functional liquid that becomes the second bridge wiring film 221 has a large contact angle in the liquid repellent treatment portion, it is possible to prevent the functional liquid from spreading out from the formation range of the insulating film 230, although it is described that an electrical short circuit between the second bridge wiring film 221 and the first bridge wiring film 211 can be prevented, in the case of using a droplet discharge method which is a kind of such a printing method. Since the materials that can be used are limited and it is difficult to flexibly control the film thickness and film quality, it is difficult to reduce the resistance of the conductive film formed by the droplet discharge method. For the above-described reason, it is difficult to control the transmittance of the conductive film formed by the droplet discharge method.
  • the present invention has been made in view of the above problems, and can prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process, and has a high touch detection performance.
  • An object of the present invention is to provide a method for manufacturing such a touch panel and a display device including such a touch panel.
  • the touch panel of the present invention has a plurality of first electrodes arranged in a first direction and a plurality of second electrodes arranged in a second direction different from the first direction.
  • a touch panel formed on an insulating substrate such that the electrodes cross each other, wherein the plurality of first electrodes and the plurality of second electrodes are electrically separated, and the first electrode
  • Each of the second electrodes is formed by electrically connecting a plurality of unit electrodes having a predetermined shape, and the unit electrode of the first electrode and the unit electrode of the second electrode overlap each other in plan view.
  • the unit electrode of the first electrode and the second electrode are formed on the same plane by the same layer so as to be adjacent to each other, and electrically connect adjacent unit electrodes in each of the first electrodes.
  • No Yu A unit electrode of the first electrode and a unit of the second electrode for electrically connecting the first connection part formed of a layer different from the first electrode and the adjacent unit electrodes in each of the second electrodes
  • a second connection part formed of the same layer as the electrode, and at the intersection of the first electrode and the second electrode, one of the first connection part and the second connection part is the other
  • a transparent short-circuit prevention layer is formed on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion.
  • each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is formed inside the transparent short-circuit prevention layer in a plan view. It is a feature.
  • the said structure is a transparent short circuit prevention layer on each formation layer of the unit electrode of the said 1st electrode which is the electroconductive film with which the touch panel was equipped, the unit electrode of the said 2nd electrode, and the said 2nd connection part.
  • the transparent short-circuit prevention layer is formed wider than the respective formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion in plan view. .
  • it is a process for forming another conductive film provided in the touch panel, for example, a process for forming the first connection part or a process for forming a wiring for electrically connecting adjacent unit electrodes in each of the first electrodes.
  • the transparent short-circuit prevention layer, the unit electrode of the first electrode, the unit electrode of the second electrode, and the second electrode Since there is a step between each forming layer and the connection portion, the remaining film of the conductive film is cut (disconnected) at this step portion. A short circuit between the provided conductive films can be prevented.
  • each said formation layer of the said transparent short circuit prevention layer with which the said touch panel was equipped, the unit electrode of the said 1st electrode, the unit electrode of the said 2nd electrode, and the said 2nd connection part Since there is a step between them, the remaining film portion of the conductive film is cut (disconnected) at this step portion, which is a process of forming another conductive film provided in the touch panel, for example,
  • the materials that can be used in the first connecting portion forming step and the wiring forming step for electrically connecting adjacent unit electrodes in each first electrode are limited, and the film thickness and film quality are flexible. Therefore, it is not necessary to perform a special method such as a droplet discharge method that is difficult to control.
  • the degree of freedom in selecting the type, film thickness, and film quality of the conductive film such as the first connection part and the wiring is high, the resistance of the conductive film provided in the touch panel and the high transmittance can be realized. it can.
  • the display device of the present invention is characterized by including the touch panel and a display panel in order to solve the above-described problems.
  • the touch panel manufacturing method of the present invention intersects each other on the insulating substrate and is electrically connected to each terminal portion through each wiring in the first direction.
  • a method of manufacturing a touch panel comprising a plurality of first electrodes arranged and a plurality of second electrodes arranged in a second direction different from the first direction, wherein the unit electrode of the first electrode and A first step of forming a conductive layer on the entire surface to form a connecting portion for electrically connecting unit electrodes of the second electrode and adjacent unit electrodes in the second electrode and the terminal portion; and on the conductive layer A second step of forming a transparent short-circuit prevention layer on the entire surface of the substrate, and patterning the transparent short-circuit prevention layer into a shape of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion.
  • the conductive layer is etched, and the unit electrode of the first electrode, the unit electrode of the second electrode, the connection layer, and the formation layer of each of the terminal portions are viewed in plan view.
  • the fourth step of forming on the inner side of the transparent short-circuit prevention layer, the unit electrode of the first electrode and the terminal on the transparent short-circuit prevention layer formed on the unit electrode of the first electrode and on the terminal portion The transparent short-circuit preventing layer formed on the terminal portion, the fifth step of forming an opening so that the portion is exposed, and each of the first electrode and the second electrode and each of the terminal portions.
  • the above transparent short-circuit prevention layer A seventh step of forming an insulating layer so as to cover, and adjacent unit electrodes in each of the first electrodes, the opening of the transparent short-circuit prevention layer formed on the unit electrode of the first electrode and an eighth step of forming a bridge electrode to be electrically connected.
  • the conductive film is appropriately removed in the bridge electrode forming step and the wiring forming step for electrically connecting adjacent unit electrodes in each of the first electrodes provided in the touch panel.
  • the transparent short-circuit prevention layer provided on the touch panel, the unit electrode of the first electrode, the unit electrode of the second electrode, and the formation layer of each of the second connection portions Since there is a level difference between the gaps, the remaining film of the conductive film is cut (disconnected) at the level difference part, so that the bridge electrode formation process and the wiring formation process can be used.
  • a special method such as a droplet discharge method in which it is difficult to flexibly control the film thickness and film quality.
  • the degree of freedom in selecting the type, film thickness, and film quality of the conductive film such as the bridge electrode and the wiring is high, it is possible to realize low resistance and high transmittance of the conductive film provided in the touch panel.
  • the touch panel manufacturing method of the present invention intersects each other on the insulating substrate and is electrically connected to each terminal portion through each wiring in the first direction.
  • a method for manufacturing a touch panel comprising a plurality of first electrodes arranged and a plurality of second electrodes arranged in a second direction different from the first direction, wherein the adjacent first electrodes are adjacent to each other.
  • Forming an insulating layer on the bridge electrode at the intersection of the first electrode and the second electrode, and a first step of forming the bridge electrode and the terminal portion for electrically connecting the unit electrodes to each other Forming a conductive layer on the entire surface to form a second step, a unit electrode of the first electrode, a unit electrode of the second electrode, and a connecting portion for electrically connecting adjacent unit electrodes of the second electrode
  • the conductive layer is patterned using the patterned transparent short-circuit prevention layer as a mask, and a fifth step of forming the bridge electrode so that both ends of the bridge electrode and the transparent short-circuit prevention layer overlap in plan view.
  • the transparent short-circuit preventing layer and the first electrode are formed. Since there is a step between the unit electrode, the unit electrode of the second electrode, and each forming layer of the connection portion, the film residue of the conductive film is cut (disconnected) at the step portion. Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
  • the degree of freedom in selecting the type, film thickness, and film quality of the conductive film used for forming the wiring is high, the resistance can be reduced relatively easily.
  • the touch panel manufacturing method of the present invention intersects each other on the insulating substrate and is electrically connected to each terminal portion through each wiring in the first direction.
  • a method of manufacturing a touch panel comprising a plurality of first electrodes arranged and a plurality of second electrodes arranged in a second direction different from the first direction, wherein the unit electrode of the first electrode and A first step of forming a conductive layer on the entire surface to form a connecting portion for electrically connecting unit electrodes of the second electrode and adjacent unit electrodes in the second electrode and the terminal portion; and on the conductive layer A second step of forming a transparent short-circuit prevention layer on the entire surface of the substrate, and patterning the transparent short-circuit prevention layer into a shape of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion.
  • the third step Using the patterned transparent short-circuit prevention layer as a mask, the conductive layer is etched, and each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion is formed.
  • the fourth step formed inside the transparent short-circuit prevention layer, the fifth step for forming an insulating layer on the entire surface, and the unit electrode formed on the unit electrode and the terminal portion of the first electrode.
  • the insulating layer is formed together with the transparent short-circuit preventing layer on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion, The step difference between the formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion and the insulating layer is relatively large.
  • the step of forming the bridge electrode and the step of forming the wiring even if the conductive film is not properly removed and the remaining film of the conductive film is generated, the insulating layer, the unit electrode of the first electrode, Since a relatively large step is formed between the unit electrode of the second electrode and each forming layer of the connection portion, the remaining film of the conductive film is cut (disconnected) at the step portion. Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
  • the plurality of first electrodes and the plurality of second electrodes are electrically separated, and each of the first electrode and the second electrode includes a plurality of the first electrodes and the plurality of second electrodes.
  • the unit electrodes of the predetermined shape are electrically connected to each other, and the unit electrode of the first electrode and the unit electrode of the second electrode do not overlap each other in plan view and are adjacent to each other.
  • the first electrode unit electrode and the second electrode unit electrode are formed in different layers, which are formed on the same plane by one layer and electrically connect adjacent unit electrodes in each of the first electrodes.
  • the first connecting portion and the unit electrode of the first electrode and the unit electrode of the second electrode that electrically connect adjacent unit electrodes in each of the second electrodes Therefore, at the intersection of the first electrode and the second electrode, at least one of the first connection portion and the second connection portion is insulated on the other side.
  • a transparent short-circuit prevention layer is formed on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, Each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is configured to be formed inside the transparent short-circuit prevention layer in a plan view.
  • the display device of the present invention is configured to include the touch panel and the display panel.
  • the method for manufacturing a touch panel includes the connection unit that electrically connects the unit electrode of the first electrode, the unit electrode of the second electrode, and the adjacent unit electrodes of the second electrode; A first step of forming a conductive layer forming a terminal portion on the entire surface; a second step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer; and the transparent short-circuit prevention layer as a unit of the first electrode.
  • a fourth step of forming the unit electrode of the second electrode, the unit electrode of the second electrode, the connection layer, and the terminal layer on the inner side of the transparent short-circuit prevention layer in plan view, and the first step A fifth step of forming an opening so that the unit electrode of the first electrode and the terminal portion are exposed on the transparent short-circuit prevention layer formed on the electrode unit electrode and the terminal portion; Forming a wiring for electrically connecting each of the electrode and the second electrode and each of the terminal portions through an opening of the transparent short-circuit preventing layer formed on the terminal portion; And a seventh step of forming an insulating layer so as to cover the connecting portion and the transparent short-circuit preventing layer formed on the connecting portion at the intersection of the step and the first electrode and the second electrode And a bridge electrode that electrically connects adjacent unit electrodes in
  • the manufacturing method of the touch panel of the present invention includes the first step of forming the bridge electrode and the terminal portion that electrically connect the adjacent unit electrodes in the first electrodes, and the first step.
  • a second step of forming an insulating layer on the bridge electrode at the intersection of one electrode and the second electrode; the unit electrode of the first electrode; the unit electrode of the second electrode; and the adjacent second electrode A third step of forming a conductive layer on the entire surface to form a connection part for electrically connecting the unit electrodes to be performed, a fourth step of forming a transparent short-circuit preventing layer on the entire surface of the conductive layer, and the transparent short circuit
  • the prevention layer is patterned into a shape of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion, and in plan view, both ends of the bridge electrode and the transparent short
  • the method for manufacturing a touch panel includes the connection unit that electrically connects the unit electrode of the first electrode, the unit electrode of the second electrode, and the adjacent unit electrodes of the second electrode; A first step of forming a conductive layer forming a terminal portion on the entire surface; a second step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer; and the transparent short-circuit prevention layer as a unit of the first electrode. A third step of patterning the electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion; and etching the conductive layer using the patterned transparent short-circuit prevention layer as a mask.
  • a fifth step of forming an insulating layer on the first electrode, the transparent short-circuit preventing layer formed on the unit electrode of the first electrode and the terminal portion, and the insulating layer, the unit electrode of the first electrode and the terminal A sixth step of forming an opening so that the portion is exposed, and each of the first electrode and the second electrode and each of the terminal portions via the opening formed on the terminal portion.
  • the seventh step of forming wirings for electrical connection and the adjacent unit electrodes in each of the first electrodes are connected to each other via the opening formed on the unit electrode of the first electrode.
  • a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process can be prevented, a touch panel with high touch detection performance, a manufacturing method of such a touch panel, and such a touch panel
  • the display device provided can be realized.
  • FIG. 1 It is a figure which shows schematic structure of the touchscreen of one embodiment of this invention. It is a figure which shows the manufacturing process of the touchscreen of one embodiment of this invention shown in FIG. A short circuit between the unit electrode of the sense electrode line and the unit electrode of the drive electrode line that may occur in the manufacturing process by the transparent short circuit preventing layer provided in the touch panel of the embodiment of the present invention shown in FIG. It is a figure for demonstrating the mechanism which can prevent. It is a figure which shows an example of 2D liquid crystal display device provided with the touchscreen of one embodiment of this invention. It is a figure which shows an example of the liquid crystal display device provided with the on-cell type touch panel of one embodiment of this invention.
  • FIG. 1 It is a figure which shows an example of 3D liquid crystal display device provided with the touch panel of one embodiment of this invention. It is a figure which shows schematic structure of the touchscreen of other one Embodiment of this invention. It is a figure which shows the manufacturing process of the touchscreen of one embodiment of this invention shown in FIG. It is a figure which shows schematic structure of the touchscreen of further another embodiment of this invention. It is a figure which shows the manufacturing process of the touchscreen of one embodiment of this invention shown in FIG. It is a figure which shows schematic structure of the conventional touch panel. It is a figure which shows the cross section of the B1-B1 'line of the conventional touch panel shown in FIG. It is a figure which shows the manufacturing process of the conventional touch panel shown in FIG.
  • FIG. 1 It is a figure which shows schematic structure of another conventional touch panel. It is a figure which shows the cross section of the B1-B1 'line of the conventional touch panel shown in FIG. It is a figure which shows the manufacturing process of the conventional touch panel shown in FIG. It is a figure for demonstrating the problem of the conventional touch panel. It is a figure which shows schematic structure of the conventional touch panel described in patent document 1.
  • FIG. 1 shows schematic structure of another conventional touch panel.
  • FIG. 1 is a diagram showing a schematic configuration of the touch panel 1.
  • the plurality of drive electrode lines 101D arranged on the substrate 106 are formed on the substrate 106 so as to cross each other.
  • connection part 101C second connection part
  • sense electrode line 101D intersects each other
  • connection part 101C second connection part
  • sense electrode line An interlayer insulating film 103 (insulating layer) made of, for example, a photosensitive acrylic resin is formed between the adjacent unit electrodes 101U ′ in 101S and the bridge electrode 104 (first connecting portion) that electrically connects the unit electrodes 101U ′.
  • the sense electrode line 101S and the drive electrode line 101D are electrically separated.
  • the transparent short-circuit preventing layer 2 is provided on the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C formed in the same layer, as shown in FIGS. Is different from the conventional touch panel 100 described above, and the other configurations are as described in the touch panel 100.
  • members having the same functions as those shown in the drawing of the touch panel 100 are denoted by the same reference numerals and description thereof is omitted.
  • the respective formation layers of the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C are formed inside the transparent short-circuit prevention layer 2 in plan view.
  • FIG. 1 only the touch detection region R1 of the touch panel 1 is shown and the wiring formation region R2 is not shown, but the wiring formation region R2 is the same as the wiring formation region R2 shown in FIG.
  • the transparent short-circuit prevention layer 2 is formed using a positive photosensitive acrylic resin, but the present invention is not limited to this, and a silicon nitride film, a silicon oxide film, a silicon nitride oxide film, etc. Inorganic materials or hybrid materials in which organic materials and inorganic materials are mixed can also be used.
  • FIG. 2 shows a cross section taken along line B1-B1 'of the touch panel 1 shown in FIG. 11 shows a cross section taken along line B2-B2 ′ and a cross section taken along line B3-B3 ′ corresponding to the wiring formation region R2 shown in FIG.
  • the conductive layer is etched, and unit electrode 101U ′, unit electrode 101U, and connecting portion 1 are etched.
  • Each of the forming layer and 1C and the terminal portion 101F shows in a plan view, a step of forming on the inside of the transparent circuit
  • the third step there are portions where the opening 2c is formed in the transparent short-circuit prevention layer 2 and portions where the transparent short-circuit prevention layer 2 needs to be removed (on the terminal portion 101F). And halftone exposure.
  • the conductive layer is side-etched, unit electrode 101U ′, unit electrode 101U, connection portion 101C, and terminal portion 101F
  • the transparent short-circuit prevention layer 2 can be formed in an eaves shape on each of the formation layers.
  • FIG. 2B shows that the opening 2c is formed in the transparent short-circuit prevention layer 2 formed on the unit electrode 101U ′ and the transparent short-circuit prevention layer 2 formed on the terminal portion 101F is also provided with a terminal portion.
  • a step (fifth step) is shown in which an opening is formed so that 101F is exposed.
  • the transparent short-circuit prevention layer 2 that has been halftone exposed and thinly remains is ashed and removed, thereby forming an opening 2c in the transparent short-circuit prevention layer 2 and forming on the terminal portion 101F.
  • the transparent short-circuit prevention layer 2 thus formed can be removed.
  • the transparent short-circuit prevention layer 2 other than the halftone exposure part is also thinned but remains.
  • ashing method for example, photoexcited ashing or gas that irradiates light such as ultraviolet rays in a ashing chamber into which a gas such as ozone is introduced and peels the resist using a chemical reaction between the gas and the resist.
  • Plasma ashing or the like can be used in which plasma is generated with a high frequency or the like and the resist is stripped using the plasma.
  • FIG. 2C shows a step (sixth step) of forming a wiring 102 for electrically connecting each of the sense electrode line 101S and the drive electrode line 101D to each terminal portion 101F.
  • 2 (d) shows an interlayer insulating film 103 so as to cover the connection portion 101C and the transparent short-circuit prevention layer 2 formed on the connection portion 101C at the intersection of the sense electrode line 101S and the drive electrode line 101D.
  • the process (7th process) to form is shown.
  • an interlayer insulating film 103 is formed so as to cover the terminal portion 101F and the wiring 102 in the wiring formation region R2, as shown in the drawing.
  • the point that the interlayer insulating film 103 is formed in the wiring formation region R2 is different from the wiring formation region R2 in the touch panel 100 shown in FIG.
  • FIG. 2E shows a step of forming a bridge electrode 104 that electrically connects adjacent unit electrodes 101U ′ in the sense electrode line 101S through the opening 2c formed in the transparent short-circuit prevention layer 2. (Eighth step) is shown, and FIG. 2 (f) shows a portion other than the exposed portion for electrically connecting the terminal portion 101F formed at one end portion outside the wiring formation region R2 to the outside. The process of forming the protective film 105 on the entire surface is shown.
  • FIG. 3A shows a case where a conductive foreign material is present across the unit electrode 101U ′ of the adjacent sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D in the touch panel 1 shown in FIG. FIG.
  • the conductive foreign matter is generated when the conductive film is not properly removed in the formation process of the wiring 102 and the bridge electrode 104 and the conductive film is left behind.
  • FIG. 3B is a view showing a cross section taken along line AA ′ of FIG.
  • a step is formed between the transparent short-circuit prevention layer 2 and the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D.
  • the transparent short-circuit prevention layer 2 formed on each formation layer with the unit electrode 101U is formed in an eaves shape.
  • the film residue of the conductive film generated in the process of forming the wiring 102 and the bridge electrode 104 is cut (disconnected), so that sense that may occur in the manufacturing process is generated.
  • a short circuit between the unit electrode 101U ′ of the electrode line 101S and the unit electrode 101U of the drive electrode line 101D can be prevented.
  • the material that can be used for the formation process of the wiring 102 and the bridge electrode 104 is limited, and the film thickness and There is no need to use a special method such as a droplet discharge method in which it is difficult to control the film quality flexibly.
  • the wiring 102 and the bridge electrode 104 can be formed using IZO (Indium Zinc Oxide) other than ITO (Indium Tin Oxide), and further, for example, titanium (Ti), copper (Cu), gold (Au), aluminum (Al), tungsten (W), zinc (Zn), nickel (Ni), tin (Sn), chromium (Cr), molybdenum (Mo), tantalum (Ta), etc. It can also be formed of a metal having low resistance, a metal compound thereof, and a metal material such as metal silicide. Alternatively, a material in which the above metal materials are stacked can be used.
  • the touch panel 1 with high touch detection performance can be realized.
  • the method that can be used in the formation process of the wiring 102 and the bridge electrode 104 is not limited to a special method such as a droplet discharge method. Since the degree of freedom of selection is high, it is possible to easily realize low resistance and high transmittance of the conductive film provided in the touch panel 1, so that it is possible to realize the touch panel 1 having high touch detection performance and high transmittance.
  • each formation layer of the unit electrode 101 ⁇ / b> U and the unit electrode 101 ⁇ / b> U ′ is 0 from the end of the transparent short-circuit prevention layer 2 in a plan view. It is preferable to be formed inside 1 ⁇ m or more.
  • the transparent short-circuit prevention layer 2 formed on the respective formation layers of the unit electrode 101U and the unit electrode 101U ′ can be formed in a more complete eaves shape, and the wiring 102 and the bridge
  • the step of forming the electrode 104 even if the conductive film is not properly removed and the film residue of the conductive film is generated, the film residue of the conductive film is cut (disconnected) by the eaves-shaped stepped portion. Therefore, it is possible to prevent a short circuit between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D, which may occur in the manufacturing process.
  • a liquid crystal display device will be described as an example of the display device including the touch panel 1 described above.
  • FIG. 4 is a diagram illustrating an example of the 2D liquid crystal display device 10 including a touch panel.
  • a touch panel 61 corresponding to the touch panel described above includes a substrate 106, a substrate 61b provided so as to face the substrate 106, and between the substrates, and either of the substrates 106 and 61b. And a plurality of films 61a (a plurality of films provided in the touch panel 1) formed on one side.
  • the liquid crystal panel 62 includes a TFT substrate 62a, a color filter substrate 62b, a sealing material 62c for bonding the two substrates, a liquid crystal layer 62d sealed between the bonded substrates, and a TFT substrate 62a. And a polarizing plate 62e provided on the opposite side of the surface in contact with the liquid crystal layer 62d, and a polarizing plate 62f provided on the opposite side of the surface in contact with the liquid crystal layer 62d in the color filter substrate 62b.
  • touch panel 61 and the liquid crystal panel 62 are not shown, they can be bonded together using an adhesive layer (not shown) or the like to complete the 2D liquid crystal display device 10 with a touch panel.
  • FIG. 5 is a diagram illustrating an example of the liquid crystal display device 20 including an on-cell type touch panel.
  • a plurality of films 61a are formed on the color filter substrate 62b on the surface opposite to the surface in contact with the liquid crystal layer 62d. It is different from the 2D liquid crystal display device 10 provided with the touch panel shown in FIG. 4 in that a polarizing plate 62f is formed thereon and finally a substrate 61b is formed.
  • the liquid crystal display device 20 can be thinned by one less substrate provided on the touch panel side.
  • FIG. 6 is a diagram illustrating an example of a 3D liquid crystal display device 30 including a touch panel.
  • the 3D liquid crystal display device 30 is provided with a switch liquid layer panel 63 between the touch panel 61 and the liquid crystal panel 62 in addition to the touch panel 61 and the liquid crystal panel 62.
  • a lower switch substrate 63a and an upper switch substrate 63b are bonded together by a sealing material 63c, and a liquid crystal layer 63d is provided between the two substrates.
  • a common electrode 64 is formed on the surface of the lower switch substrate 63a that is in contact with the liquid crystal layer 63d, while a plurality of segment electrodes are formed on the surface of the upper switch substrate 63b that is in contact with the liquid crystal layer 63d. 65 is formed.
  • a polarizing plate 63e is provided on the surface in contact with the touch panel 61, and an adhesive layer 66 is formed on the surface in contact with the liquid crystal panel 62 in the lower switch substrate 63a. ing.
  • the switch liquid crystal panel 63 plays a role of alternately displaying a right image and a left image having binocular parallax displayed by the liquid crystal panel 62 at a predetermined cycle.
  • the liquid crystal display device provided with the touch panel has been described as an example.
  • the type of the display unit is not limited to the liquid crystal panel, and for example, an organic EL display provided with the touch panel. Of course, it may be a device or the like.
  • the bridge electrode 104 is formed in the lowermost layer, the formation layers of the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F, the transparent short-circuit prevention layer 2, and the like.
  • the order of lamination with the interlayer insulating film 103 is different from that of the first embodiment.
  • FIG. 7 is a diagram showing a schematic configuration of the touch panel 1a.
  • the bridge electrode 104 is formed on the lowermost layer of the substrate 106, and from above, the interlayer insulating film 103, the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F.
  • the formation layers and the transparent short-circuit prevention layer 2 are laminated in order.
  • the transparent short-circuit prevention layer 2 is provided on the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C formed of the same layer, as shown in FIG. Based on FIG. 16, it is different from the above-described conventional touch panel 110, and the other configuration is as described in the touch panel 110.
  • members having the same functions as those shown in the drawing of the touch panel 110 are denoted by the same reference numerals and description thereof is omitted.
  • FIG. 8 shows a cross section taken along line B1-B1 ′ of the touch panel 1a shown in FIG. 7, and a diagram of the touch panel 1a not shown in FIG. 14 shows a cross section taken along line B2-B2 ′ and a cross section taken along line B3-B3 ′ corresponding to the wiring formation region R2 shown in FIG.
  • FIG. 8A shows a step (first step) of forming the bridge electrode 104 and the terminal portion 101F that electrically connect adjacent unit electrodes 101U ′ in the sense electrode line 101S.
  • FIG. 6B shows a step (second step) of forming the interlayer insulating film 103 on the bridge electrode 104 at the intersection of the sense electrode line 101S and the drive electrode line 101D.
  • FIG. 8C shows the ITO that forms the unit electrode 101U ′ of the sense electrode line 101S, the unit electrode 101U of the drive electrode line 101D, and the connection portion 101C that connects the adjacent unit electrodes 101U in the drive electrode line 101D.
  • a step of forming a conductive layer comprising the entire surface (third step), a step of forming the transparent short-circuit prevention layer 2 on the entire surface of the conductive layer (fourth step), and the transparent short-circuit prevention layer 2 as unit electrodes.
  • the patterning is performed by exposing and developing the shape forming the 101U ′, the unit electrode 101U, and the connection portion 101C, and forming the both ends of the bridge electrode 104 and the transparent short-circuit prevention layer 2 so as to overlap in plan view.
  • each of the forming layer and the unit electrode 101U 'and the unit electrode 101U connecting portions 101C shows in a plan view, a step of forming on the inside of the transparent circuit preventing layer 2 (sixth step), the.
  • the terminal portion 101F is formed of the same layer as the bridge electrode 104, and the terminal portion 101F is patterned together when the bridge electrode 104 is patterned.
  • the electrical connection between the unit electrodes 101U ′ adjacent to each other in the bridge electrode 104 and the sense electrode line 101S is performed by forming the unit electrode 101U ′ in direct contact with the bridge electrode 104.
  • the opening 2c is formed in the transparent short-circuit prevention layer 2 formed on the unit electrode 101U ′ as in the first embodiment, and the transparent short-circuit prevention formed on the terminal portion 101F. Since it is not necessary to form an opening in the layer 2 so that the terminal portion 101F is exposed, halftone exposure is not necessary.
  • FIG. 8D shows a step (seventh step) of forming the wiring 102 for electrically connecting each of the sense electrode line 101S and the drive electrode line 101D and each terminal portion 101F.
  • the protective film 105 is formed on the entire surface other than the exposed portion of the terminal portion 101F formed at one end portion outside the wiring formation region R2 for electrical connection with the outside. The process is shown.
  • the transparent short-circuit prevention layer 2 Since there is a step between each of the forming layers of the connecting portion 101C and the connection portion 101C, the remaining film of the conductive film is cut (disconnected) at the step portion, which may occur in the manufacturing process.
  • a short circuit between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D can be prevented.
  • the touch panel 1a having high touch detection performance can be realized.
  • FIG. 9 is a diagram showing a schematic configuration of the touch panel 1b.
  • an interlayer insulating film 103 is formed on the entire surface of the transparent short-circuit prevention layer 2a, not only at a portion where the sense electrode line 101S and the drive electrode line 101D intersect with each other.
  • An opening 103c is provided in the portion.
  • a step is formed between the film in which the transparent short-circuit prevention layer 2a and the interlayer insulating film 103 are laminated and the respective formation layers of the unit electrode 101U ′, the unit electrode 101U, and the connection portion 101C. It has become.
  • the transparent short-circuit prevention layer 2a is formed using a silicon oxide film.
  • FIG. 10 is a cross-sectional view taken along line B1-B1 ′ of the touch panel 1b shown in FIG. 11 shows a cross section taken along line B2-B2 ′ and a cross section taken along line B3-B3 ′ corresponding to the wiring formation region R2 shown in FIG.
  • the unit electrode 101U ′ of the sense electrode line 101S, the unit electrode 101U of the drive electrode line 101D, and the connection portion 101C and the terminal portion 101F that connect the adjacent unit electrodes 101U in the drive electrode line 101D are formed.
  • a step of forming a conductive layer made of ITO or the like on the entire surface (first step), a step of forming a transparent short-circuit prevention layer 2a on the entire surface of the conductive layer (second step), and a transparent short-circuit prevention layer 2a, Etching the conductive layer using the patterned transparent short-circuit prevention layer 2a as a mask, and a patterning step (third step) to form the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F.
  • Unit electrode 101U ', unit electrode 101U, connecting portion 101C, and terminal portion Each of the forming layer and 01F, show in a plan view, a step of forming on the inside of the transparent circuit preventing layer 2a (step 4), the.
  • the transparent short-circuit prevention layer 2a is formed using a non-photosensitive silicon oxide film
  • the resist film is subjected to an exposure / development process and formed into a predetermined shape.
  • the transparent short-circuit prevention layer 2a is patterned using the resist film as a mask.
  • the conductive layer is side-etched, unit electrode 101U ′, unit electrode 101U, connection portion 101C, and terminal portion 101F
  • the transparent short-circuit prevention layer 2a can be formed in an eaves shape on each of the formation layers.
  • FIG. 10B shows a step (fifth step) of forming the interlayer insulating film 103 on the entire surface, and the transparent short-circuit preventing layer 2a and the interlayer insulating film 103 formed on the unit electrode 101U ′ and the terminal portion 101F.
  • a step of forming the openings 2c and 103c (sixth step).
  • an opening 103c of the interlayer insulating film 103 is formed on the unit electrode 101U ′ and the terminal portion 101F by performing a development / exposure process.
  • dry etching is performed to form the opening 2c of the transparent short-circuit prevention layer 2a on the unit electrode 101U ′ and the terminal portion 101F. Can do.
  • FIG. 10C shows a step (seventh step) of forming a wiring 102 for electrically connecting each of the sense electrode line 101S and the drive electrode line 101D to each terminal portion 101F.
  • the opening portion 2c formed on the terminal portion 101F since there is no step of removing the transparent short-circuit prevention layer 2a formed on the terminal portion 101F, as described with reference to FIG. 10B, the opening portion 2c formed on the terminal portion 101F.
  • the terminal portion 101F and the wiring 102 are electrically connected via 103c.
  • FIG. 10E shows a step of forming the bridge electrode 104 (eighth step).
  • FIG. 10E is for electrically connecting the terminal portion 101F formed at one end portion outside the wiring formation region R2 to the outside. The process of forming the protective film 105 on the entire surface other than the exposed portion is shown.
  • the interlayer insulating film 103 is formed together with the transparent short-circuit preventing layer 2a on each of the formation layers of the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F, The steps formed between the formation layers of the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F and the interlayer insulating film 103 are relatively large.
  • the conductive film is not properly removed, and even if a film residue of the conductive film occurs, the relatively large step portion exists.
  • the remaining film of the conductive film is cut (disconnected), so that a short circuit between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D that may occur in the manufacturing process. (Short circuit) can be prevented.
  • the touch panel 1b described above since the relatively large step portion exists, it is not necessary to perform the bridge electrode 104 formation process and the wiring 102 formation process by a special method such as a droplet discharge method. .
  • the touch panel 1b having high touch detection performance and high transmittance can be realized.
  • the first connection part is formed on the second connection part via the insulating layer and the transparent short-circuit prevention layer.
  • the opening of the transparent short-circuit prevention layer is formed on the unit electrode of the first electrode, and the adjacent unit electrodes in the first electrodes are openings of the transparent short-circuit prevention layer. It is preferable that they are electrically connected by the first connecting portion formed via the.
  • the conductive film is appropriately removed in the first connection portion forming step and the wiring forming step for electrically connecting adjacent unit electrodes in each of the first electrodes provided in the touch panel. Even if a film residue of the conductive film occurs, the transparent short-circuit preventing layer, the unit electrode of the first electrode, the unit electrode of the second electrode, and the formation layer of each of the second connection portions, In this step portion, the remaining film of the conductive film is cut (disconnected), and thus a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process. (Short circuit) can be prevented.
  • the second connection part is formed on the first connection part via the insulating layer,
  • the adjacent unit electrodes in the first electrode are preferably formed so as to be in contact with the first connection portion.
  • the transparent short-circuit preventing layer and the first electrode are formed. Since there is a step between the unit electrode, the unit electrode of the second electrode, and each of the formation layers of the second connection portion, the remaining film of the conductive film is cut off at this step portion ( Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
  • the first connection part is formed on the second connection part via the insulating layer and the transparent short-circuit prevention layer.
  • the transparent short-circuit preventing layer and the insulating layer are formed on the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, respectively.
  • the opening of the transparent short-circuit prevention layer and the opening of the insulating layer overlap at least partially in plan view, and are formed on the unit electrode of the first electrode. It is preferable that adjacent unit electrodes are electrically connected by the first connection part formed through the opening of the transparent short-circuit prevention layer and the opening of the insulating layer.
  • the transparent short circuit prevention is provided on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, which is a conductive film provided in the touch panel. Since the insulating layer is formed together with the layer, the step difference between the forming layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connecting portion and the insulating layer is compared. Become bigger.
  • a process for forming the first connection part for example, a process for forming the first connection part or a process for forming a wiring for electrically connecting adjacent unit electrodes in each of the first electrodes.
  • the insulating layer, the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion Since there is a relatively large step between each of the forming layers, the remaining portion of the conductive film is cut (disconnected) at this step portion, so that the touch panel that may occur in the manufacturing process It is possible to prevent a short circuit between the conductive films provided in the.
  • each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is from an end of the transparent short-circuit prevention layer in a plan view. It is preferable to be formed inside 0.1 ⁇ m or more.
  • the said transparent short-circuit prevention layer formed on each formation layer of the unit electrode of the said 1st electrode, the unit electrode of the said 2nd electrode, and the said 2nd connection part is more complete eaves shape
  • the step of forming the first connection portion that electrically connects adjacent unit electrodes in each of the first electrodes is a step of forming another conductive film included in the touch panel. Even when the conductive film is not properly removed in the wiring formation process and the film residue of the conductive film is generated, the film residue of the conductive film is cut (disconnected) by the eaves-shaped stepped portion. Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
  • the transparent short-circuit prevention layer is preferably formed of any one of a silicon nitride film, a silicon oxide film, and a silicon oxynitride film.
  • the display panel may be a liquid crystal panel including a liquid crystal layer.
  • the display panel may be an organic EL panel including an organic EL layer.
  • the transparent short-circuit prevention layer is a transparent resin layer having photosensitivity
  • the patterning of the transparent short-circuit prevention layer includes exposure and development including halftone exposure.
  • a transparent resin layer having photosensitivity can be used as the transparent short circuit preventing layer.
  • the present invention can be suitably used for a touch panel and a display device including the touch panel.
  • Liquid crystal display device 20 Liquid crystal display device (display device) 30 Liquid crystal display device (display device) 101D Drive electrode line (second electrode) 101S sense electrode line (first electrode) 101U, 101U ′ unit electrode 101C connection part (second connection part) 101E Connection electrode 101F Terminal portion 102 Wiring 103 Interlayer insulating film (insulating film) 103c opening 104 first bridge electrode (first connecting portion) 105 Protective film 106 Substrate (insulating substrate)

Abstract

A transparent short circuit prevention layer (2) is installed on unit electrodes (101U, 101U') and a connection portion (101C) which are formed on the same layer. In a planar view, the respective layer where the unit electrodes (101U, 101U') and the connection portion (101C) are formed is formed in the transparent short circuit prevention layer (2). Therefore, a short circuit between conductive films of a touch panel which may occur during a manufacturing process may be prevented, and the touch panel may provide a high touch detection performance.

Description

タッチパネル、タッチパネルの製造方法および表示装置Touch panel, touch panel manufacturing method, and display device
　本発明は、タッチパネル、タッチパネルの製造方法およびタッチパネル付き表示装置に関するものである。 The present invention relates to a touch panel, a touch panel manufacturing method, and a display device with a touch panel.
　近年、特にスマートフォンや携帯電話などの携帯機器の分野においては、入力手段としての指や入力ペンなどを表示面上に接触させ、その接触位置に応じて選択される機能が具現されるタッチパネルを備えた表示装置が一般化されている。 In recent years, particularly in the field of mobile devices such as smartphones and mobile phones, a touch panel is provided that implements a function that allows a finger or an input pen as an input means to touch a display surface and is selected according to the contact position. Display devices have been generalized.
　従来から、このような表示装置に備えられるタッチパネルとしては、抵抗膜方式（押されると上の導電性基板と下の導電性基板とが接触することによって入力位置を検知する方式）や静電容量方式（触った場所の容量変化を検知することによって入力位置を検知する方式）のものが主に用いられてきた。 Conventionally, as a touch panel provided in such a display device, a resistance film method (a method in which an input position is detected by contact between an upper conductive substrate and a lower conductive substrate when pressed) or capacitance The system (method of detecting the input position by detecting the change in the capacity of the touched place) has been mainly used.
　その中でも、静電容量方式のタッチパネルは、簡便な操作で接触位置を検出することができることと、マルチタッチ（複数のタッチ位置を同時に検出）に対応可能であることから、現在、タッチパネルの主流となっている。 Among them, the capacitive touch panel is capable of detecting the contact position with a simple operation and is capable of multi-touch (detecting multiple touch positions simultaneously). It has become.
　図１１は、従来の静電容量方式のタッチパネルの一例を示しており、静電容量方式のタッチパネルの中でも、薄型で検出性能の高い、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとが同一平面上に形成された単層式の相互容量方式のタッチパネル１００の概略構成を示す図である。 FIG. 11 shows an example of a conventional capacitive touch panel. Among the capacitive touch panels, the drive electrode line 101D and the sense electrode line 101S, which are thin and have high detection performance, are on the same plane. 1 is a diagram showing a schematic configuration of a formed single-layer mutual capacitance touch panel 100. FIG.
　図示されているように、基板１０６上のタッチ検出領域Ｒ１には、菱形のユニット電極１０１Ｕが、図中の左右方向に互いに隣接するように配置され、各々のユニット電極１０１Ｕが接続部１０１Ｃを介して、電気的に接続されたドライブ電極ライン１０１Ｄが、図中の上下方向に互いに平行に複数個形成されており、一方、菱形のユニット電極１０１Ｕ′は、図中の上下方向に互いに隣接するように配置され、各々のユニット電極１０１Ｕ′がブリッジ電極１０４を介して、電気的に接続されたセンス電極ライン１０１Ｓは、図中の左右方向に互いに平行に複数個形成されている。 As shown in the figure, in the touch detection region R1 on the substrate 106, diamond-shaped unit electrodes 101U are arranged so as to be adjacent to each other in the left-right direction in the figure, and each unit electrode 101U is connected via a connecting portion 101C. A plurality of electrically connected drive electrode lines 101D are formed in parallel with each other in the vertical direction in the figure, while the diamond-shaped unit electrodes 101U 'are adjacent to each other in the vertical direction in the figure. A plurality of sense electrode lines 101S are arranged in parallel to each other in the left-right direction in the figure.
　複数のドライブ電極ライン１０１Ｄと複数のセンス電極ライン１０１Ｓとは、互いに電気的に分離され、かつ、互いに交差するように設けられている。 The plurality of drive electrode lines 101D and the plurality of sense electrode lines 101S are provided so as to be electrically separated from each other and intersect each other.
　そして、基板１０６上のタッチ検出領域Ｒ１においては、ユニット電極１０１Ｕとユニット電極１０１Ｕ′とは、平面視において重ならず、互いに隣接するように、同一平面上に形成されている。 In the touch detection region R1 on the substrate 106, the unit electrode 101U and the unit electrode 101U ′ are formed on the same plane so as not to overlap each other in a plan view.
　なお、タッチパネル１００においては、ユニット電極１０１Ｕ、ユニット電極１０１Ｕ′、接続部１０１Ｃおよびブリッジ電極１０４は、何れも透明導電層であるＩＴＯ（Ｉｎｄｉｕｍ　Ｔｉｎ　Ｏｘｉｄｅ）で形成されており、ユニット電極１０１Ｕとユニット電極１０１Ｕ′と接続部１０１Ｃとは、同一平面上に同一層で形成されている。 In the touch panel 100, the unit electrode 101U, the unit electrode 101U ′, the connection portion 101C, and the bridge electrode 104 are all formed of ITO (Indium Tin Oxide), which is a transparent conductive layer, and the unit electrode 101U and the unit electrode 101U ′ and the connecting portion 101C are formed in the same layer on the same plane.
　そして、図示されているように、複数のドライブ電極ライン１０１Ｄと複数のセンス電極ライン１０１Ｓとが、互いに交差する箇所においては、接続部１０１Ｃ上に形成された層間絶縁膜１０３を介して、ブリッジ電極１０４が形成されているので、複数のドライブ電極ライン１０１Ｄと複数のセンス電極ライン１０１Ｓとは、互いに電気的に分離されている。 As shown in the drawing, at a location where the plurality of drive electrode lines 101D and the plurality of sense electrode lines 101S intersect with each other, the bridge electrode is interposed via the interlayer insulating film 103 formed on the connection portion 101C. Since 104 is formed, the plurality of drive electrode lines 101D and the plurality of sense electrode lines 101S are electrically separated from each other.
　一方、図示されているように、タッチ検出領域Ｒ１の周辺には、複数のドライブ電極ライン１０１Ｄの各々と複数のセンス電極ライン１０１Ｓの各々とを、金属配線１０２を介して、複数の端子部１０１Ｆの各々に電気的に接続する領域である配線形成領域Ｒ２が設けられている。 On the other hand, as shown in the drawing, in the periphery of the touch detection region R1, a plurality of drive electrode lines 101D and a plurality of sense electrode lines 101S are connected to a plurality of terminal portions 101F via a metal wiring 102, respectively. A wiring formation region R <b> 2 that is a region electrically connected to each of these is provided.
　配線形成領域Ｒ２には、ドライブ電極ライン１０１Ｄまたはセンス電極ライン１０１Ｓを金属配線１０２と電気的に接続するための接続電極１０１Ｅが設けられている。 In the wiring formation region R2, a connection electrode 101E for electrically connecting the drive electrode line 101D or the sense electrode line 101S to the metal wiring 102 is provided.
　接続電極１０１Ｅと端子部１０１Ｆとは、ユニット電極１０１Ｕ・１０１Ｕ′と接続部１０１Ｃと同一層であるＩＴＯ層で形成されている。 The connection electrode 101E and the terminal portion 101F are formed of an ITO layer that is the same layer as the unit electrodes 101U and 101U ′ and the connection portion 101C.
　そして、図示されているように、ドライブ電極ライン１０１Ｄまたはセンス電極ライン１０１Ｓに接続されている接続電極１０１Ｅと端子部１０１Ｆとは、金属配線１０２によって、直接、電気的に接続されているので、ドライブ電極ライン１０１Ｄまたはセンス電極ライン１０１Ｓを端子部１０１Ｆと電気的に接続することができる。 As shown in the drawing, since the connection electrode 101E connected to the drive electrode line 101D or the sense electrode line 101S and the terminal portion 101F are directly electrically connected by the metal wiring 102, the drive The electrode line 101D or the sense electrode line 101S can be electrically connected to the terminal portion 101F.
　図１２は、図１１に示すタッチパネル１００において、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとが交差する部分の部分拡大図である。 FIG. 12 is a partial enlarged view of a portion where the drive electrode line 101D and the sense electrode line 101S intersect in the touch panel 100 shown in FIG.
　図示されているように、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとを互いに電気的に分離するため、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとが交差する部分においては、ユニット電極１０１Ｕ・１０１Ｕ′と同一層で形成された接続部１０１Ｃ上に層間絶縁膜１０３を形成しており、層間絶縁膜１０３上には隣接するユニット電極１０１Ｕ′同士を電気的に接続するためのブリッジ電極１０４が形成されている。 As shown in the drawing, in order to electrically isolate the drive electrode line 101D and the sense electrode line 101S from each other, the unit electrodes 101U and 101U ′ are separated at the portion where the drive electrode line 101D and the sense electrode line 101S intersect. An interlayer insulating film 103 is formed on the connecting portion 101C formed of the same layer, and a bridge electrode 104 for electrically connecting adjacent unit electrodes 101U ′ is formed on the interlayer insulating film 103. Yes.
　図１３（ａ）から図１３（ｅ）は、図１１におけるＢ１－Ｂ１′線の断面と、Ｂ２－Ｂ２′線の断面と、Ｂ３－Ｂ３′線の断面と、をそれぞれ示しており、タッチパネル１００の製造工程を示している。 13 (a) to 13 (e) show a cross section taken along line B1-B1 ', a cross section taken along line B2-B2', and a cross section taken along line B3-B3 'in FIG. 100 manufacturing steps are shown.
　図１３（ａ）はユニット電極１０１Ｕとユニット電極１０１Ｕ′と接続部１０１Ｃと端子部１０１Ｆとを、同一層であるＩＴＯ層で形成する工程を示し、図１３（ｂ）は、ＭｏＮｂ/Ａｌ/ＭｏＮｂの３層構造からなる金属配線１０２の形成工程を示しており、端子部１０１Ｆ近傍の配線形成領域Ｒ２においては、端子部１０１Ｆ上に、金属配線１０２が設けられている。また、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆは、図示されているように、外部と電気的に接続するため露出されている。 FIG. 13A shows a process of forming the unit electrode 101U, the unit electrode 101U ′, the connecting portion 101C, and the terminal portion 101F with the same ITO layer, and FIG. 13B shows the MoNb / Al / MoNb. In the wiring forming region R2 in the vicinity of the terminal portion 101F, the metal wiring 102 is provided on the terminal portion 101F. Further, the terminal portion 101F formed at one end portion outside the wiring forming region R2 is exposed for electrical connection with the outside as shown in the figure.
　図１３（ｃ）は層間絶縁膜１０３の形成工程を示しており、配線形成領域Ｒ２において、端子部１０１Ｆ上に、金属配線１０２が設けられている部分と配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆとには、層間絶縁膜１０３は形成されない。 FIG. 13C shows a process of forming the interlayer insulating film 103. In the wiring formation region R2, a portion where the metal wiring 102 is provided on the terminal portion 101F and one end portion outside the wiring formation region R2. The interlayer insulating film 103 is not formed on the formed terminal portion 101F.
　図１３（ｄ）はブリッジ電極１０４の形成工程を示し、図１３（ｅ）は保護膜１０５の形成工程を示しており、配線形成領域Ｒ２において、端子部１０１Ｆ上に、金属配線１０２が設けられている部分には保護膜１０５が形成され、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆには、保護膜１０５は形成されない。 FIG. 13D shows a process for forming the bridge electrode 104, and FIG. 13E shows a process for forming the protective film 105. In the wiring formation region R2, the metal wiring 102 is provided on the terminal portion 101F. The protective film 105 is formed in the part where the protective film 105 is formed, and the protective film 105 is not formed in the terminal portion 101F formed at one end portion outside the wiring formation region R2.
　以下、図１１に基づいて、タッチパネル１００の駆動原理について説明する。 Hereinafter, the driving principle of the touch panel 100 will be described with reference to FIG.
　図示されているドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とは、互いに隣接するように形成されており、隣接するユニット電極１０１Ｕ・１０１Ｕ′間には、容量ＣＦが形成されるが、この容量ＣＦは、指やペンなどの検出対象物の非タッチ時とタッチ時とで異なる。非タッチ時の容量がタッチ時の容量より大きくなる（ＣＦ_untouch＞ＣＦ_touch）。この原理を利用して、タッチ位置を検出することができる。 The unit electrode 101U of the illustrated drive electrode line 101D and the unit electrode 101U ′ of the sense electrode line 101S are formed so as to be adjacent to each other, and there is a capacitance C F between the adjacent unit electrodes 101U and 101U ′. However, the capacitance C F is different between when the detection object such as a finger or a pen is not touched and when it is touched. The non-touch capacity becomes larger than the touch capacity (C F_untouch > C F_touch ). Using this principle, the touch position can be detected.
　そして、ドライブ電極ライン１０１Ｄと電気的に接続された端子部１０１Ｆからは、所定波形を有する信号が順次入力され、センス電極ライン１０１Ｓと電気的に接続された端子部１０１Ｆからは、検出信号が出力されるようになっている。 A signal having a predetermined waveform is sequentially input from the terminal portion 101F electrically connected to the drive electrode line 101D, and a detection signal is output from the terminal portion 101F electrically connected to the sense electrode line 101S. It has come to be.
　一方、図１４は、従来の他の単層式の相互容量方式のタッチパネル１１０の概略構成を示す図である。 On the other hand, FIG. 14 is a diagram showing a schematic configuration of another conventional single-layer type mutual capacitance touch panel 110.
　図１５は、図１４に示すタッチパネル１１０において、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとが交差する部分の部分拡大図である。 FIG. 15 is a partial enlarged view of a portion where the drive electrode line 101D and the sense electrode line 101S intersect in the touch panel 110 shown in FIG.
　図１４および図１５に図示されているタッチパネル１１０においては、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとが交差する部分において、隣接するユニット電極１０１Ｕ′同士を電気的に接続するためのブリッジ電極１０４が最下層に形成され、ブリッジ電極１０４を部分的に覆うように層間絶縁膜１０３が形成され、ユニット電極１０１Ｕ・１０１Ｕ′と同一層で形成される接続部１０１Ｃは、層間絶縁膜１０３上に形成され、隣接するユニット電極１０１Ｕ′はブリッジ電極１０４と接するように形成されている点において、上述した図１１に示す従来の単層式の相互容量方式のタッチパネル１００の構成とは異なる。 In the touch panel 110 shown in FIGS. 14 and 15, a bridge electrode 104 for electrically connecting adjacent unit electrodes 101 </ b> U ′ is provided at a portion where the drive electrode line 101 </ b> D and the sense electrode line 101 </ b> S intersect. An interlayer insulating film 103 is formed on the lowermost layer so as to partially cover the bridge electrode 104, and a connection portion 101 </ b> C formed in the same layer as the unit electrodes 101 </ b> U and 101 </ b> U ′ is formed on the interlayer insulating film 103. The adjacent unit electrodes 101U ′ are different from the configuration of the conventional single-layered mutual capacitive touch panel 100 shown in FIG. 11 in that the unit electrodes 101U ′ are formed in contact with the bridge electrode 104.
　図１６（ａ）から図１６（ｅ）は、図１４におけるＢ１－Ｂ１′線の断面と、Ｂ２－Ｂ２′線の断面と、Ｂ３－Ｂ３′線の断面と、をそれぞれ示しており、タッチパネル１１０の製造工程を示している。 16 (a) to 16 (e) show a cross section taken along line B1-B1 ', a cross section taken along line B2-B2', and a cross section taken along line B3-B3 'in FIG. 110 shows the manufacturing process.
　図１６（ａ）は、ブリッジ電極１０４と端子部１０１Ｆとを、同一層であるＩＴＯ層で形成する工程を示し、図１６（ｂ）はＭｏＮｂ/Ａｌ/ＭｏＮｂの３層構造からなる金属配線１０２の形成工程を示しており、端子部１０１Ｆ近傍の配線形成領域Ｒ２においては、端子部１０１Ｆ上に、金属配線１０２が設けられている。また、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆは、図示されているように、外部と電気的に接続するため露出されている。 16A shows a process of forming the bridge electrode 104 and the terminal portion 101F with the same ITO layer, and FIG. 16B shows a metal wiring 102 having a three-layer structure of MoNb / Al / MoNb. In the wiring formation region R2 in the vicinity of the terminal portion 101F, the metal wiring 102 is provided on the terminal portion 101F. Further, the terminal portion 101F formed at one end portion outside the wiring forming region R2 is exposed for electrical connection with the outside as shown in the figure.
　それから、図１６（ｃ）は、層間絶縁膜１０３の形成工程を示し、配線形成領域Ｒ２において、端子部１０１Ｆ上に、金属配線１０２が設けられている部分と配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆとには、層間絶縁膜１０３は形成されない。 FIG. 16C shows a process for forming the interlayer insulating film 103. In the wiring formation region R2, a portion where the metal wiring 102 is provided on the terminal portion 101F and one end portion outside the wiring formation region R2. The interlayer insulating film 103 is not formed on the terminal portion 101F formed in the above.
　そして、図１６（ｄ）は、ユニット電極１０１Ｕとユニット電極１０１Ｕ′と接続部１０１Ｃとを、同一層であるＩＴＯ層で形成する工程を示し、図１６（ｅ）は保護膜１０５の形成工程を示しており、配線形成領域Ｒ２において、端子部１０１Ｆ上に、金属配線１０２が設けられている部分には保護膜１０５が形成され、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆには、保護膜１０５は形成されない。 FIG. 16D shows a process of forming the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C with the same ITO layer, and FIG. 16E shows the process of forming the protective film 105. In the wiring formation region R2, a protective film 105 is formed on a portion where the metal wiring 102 is provided on the terminal portion 101F, and the terminal portion 101F formed at one end portion outside the wiring formation region R2. In this case, the protective film 105 is not formed.
　このように作製されたタッチパネル１００・１１０は、薄型で検出性能が高い。 The touch panels 100 and 110 manufactured in this way are thin and have high detection performance.
日本国公開特許公報「特開２０１１－７６１５５号公報（２０１１年４月１４日公開）」Japanese Patent Publication “JP 2011-76155 A (published on April 14, 2011)”
　しかしながら、図１１に示すタッチパネル１００および図１４に示すタッチパネル１１０の何れの構成においても、層間絶縁膜１０３は、ドライブ電極ライン１０１Ｄとセンス電極ライン１０１Ｓとが交差する部分においてのみ、孤立したアイランドパターンで形成されている。 However, in any of the configurations of the touch panel 100 shown in FIG. 11 and the touch panel 110 shown in FIG. 14, the interlayer insulating film 103 has an isolated island pattern only at a portion where the drive electrode line 101D and the sense electrode line 101S intersect. Is formed.
　なお、タッチパネル１００・１１０の製造工程において、金属配線１０２やブリッジ電極１０４などの導電性層の形成工程は、成膜工程・フォトリソ工程・エッチング工程・レジスト剥離工程を行い、所定形状のパターンを形成するが、エッチング工程までに、異物やパーティクルが基板に付着すると、異物やパーティクルをマスクとして、パターニングすることとなりパターン不良が発生してしまう。 In addition, in the manufacturing process of the touch panel 100/110, the formation process of the conductive layer such as the metal wiring 102 and the bridge electrode 104 is performed by a film forming process, a photolithography process, an etching process, and a resist stripping process to form a pattern with a predetermined shape However, if foreign matter or particles adhere to the substrate before the etching process, patterning is performed using the foreign matter or particles as a mask, resulting in a pattern defect.
　また、フォトリソ工程以前の工程、具体的にはレジスト塗布工程において、異物やパーティクルが付着すると、異物やパーティクルに起因して、レジスト厚が厚くなり、露光不足によるパターン不良が発生してしまう。 In addition, when foreign matter or particles adhere in a process prior to the photolithography process, specifically in the resist coating process, the resist thickness is increased due to the foreign matter or particles, and a pattern defect due to insufficient exposure occurs.
　図１７（ａ）は、図１１に示すタッチパネル１００において、上述したような導電性層のパターン不良が発生した場合を示す平面図であり、図１７（ｂ）は、図１７（ａ）に示すＡ－Ａ′線の断面図を示す。 FIG. 17A is a plan view showing a case where the above-described pattern defect of the conductive layer occurs in the touch panel 100 shown in FIG. 11, and FIG. 17B shows the case shown in FIG. A sectional view taken along line AA ′ is shown.
　図示されているように、同一層で形成された隣接するユニット電極１０１Ｕとユニット電極１０１Ｕ′との間に、金属配線１０２やブリッジ電極１０４などの導電性層の形成工程において生じたパターン不良に起因する導電性異物が存在すると、隣接するユニット電極１０１Ｕとユニット電極１０１Ｕ′との間には、短絡が生じ、タッチ検出機能障害を引き起こしてしまう恐れがある。 As shown in the figure, it is caused by a pattern defect generated in the process of forming a conductive layer such as the metal wiring 102 or the bridge electrode 104 between the adjacent unit electrodes 101U and unit electrode 101U ′ formed in the same layer. If there is a conductive foreign substance to be present, a short circuit may occur between the adjacent unit electrode 101U and the unit electrode 101U ', which may cause a touch detection function failure.
　なお、図示してないが、図１４に示すタッチパネル１１０においても、同様に、金属配線１０２やブリッジ電極１０４などの導電性層の形成工程において生じたパターン不良に起因する導電性異物の存在により、同一層で形成された隣接するユニット電極１０１Ｕとユニット電極１０１Ｕ′との間に、短絡が生じ、タッチ検出機能障害を引き起こしてしまう恐れがある。 Although not shown, in the touch panel 110 shown in FIG. 14, similarly, due to the presence of conductive foreign matters due to pattern defects generated in the process of forming the conductive layer such as the metal wiring 102 and the bridge electrode 104, There is a possibility that a short circuit occurs between adjacent unit electrodes 101U and unit electrode 101U ′ formed in the same layer, causing a touch detection function failure.
　上記特許文献１には、第２ブリッジ配線膜を印刷法の一種である液滴吐出法を用いて形成したタッチパネルについて記載されている。 Patent Document 1 describes a touch panel in which a second bridge wiring film is formed using a droplet discharge method which is a kind of printing method.
　図１８に図示されているように、Ｘ電極膜２１０は、Ｘ軸方向に配列された複数の第１島状電極部２１２と、Ｘ軸方向に隣り合う第１島状電極部２１２同士を電気的に接続する第１ブリッジ配線膜２１１とを備えており、Ｙ電極膜２２０は、Ｙ軸方向に配列された複数の第２島状電極部２２２と、Ｙ軸方向に隣り合う第２島状電極部２２２同士を接続する第２ブリッジ配線膜２２１とを備えている。 As shown in FIG. 18, the X electrode film 210 electrically connects the plurality of first island electrode portions 212 arranged in the X axis direction and the first island electrode portions 212 adjacent in the X axis direction. The first bridge wiring film 211 is connected to each other, and the Y electrode film 220 includes a plurality of second island-shaped electrode portions 222 arranged in the Y-axis direction and second island-shaped adjacent to the Y-axis direction. And a second bridge wiring film 221 that connects the electrode portions 222 to each other.
　そして、第２ブリッジ配線膜２２１と第１ブリッジ配線膜２１１とは、交差部Ｋで交差しており、第１ブリッジ配線膜２１１上に形成された絶縁膜２３０を介在させることによって電気的な絶縁性が確保されている。 The second bridge wiring film 221 and the first bridge wiring film 211 intersect at the intersection K, and are electrically insulated by interposing an insulating film 230 formed on the first bridge wiring film 211. Is secured.
　絶縁膜２３０の膜幅Ｗ１は、隣り合う第１島状電極部２１２の間隔Ｗ２の範囲の中に形成されており、絶縁膜２３０のＹ軸方向の形成長さＬ１についても、隣り合う第２島状電極部２２２の間隔Ｌ２の範囲の中に形成されている。 The film width W1 of the insulating film 230 is formed in the range of the interval W2 between the adjacent first island-shaped electrode portions 212, and the formation length L1 of the insulating film 230 in the Y-axis direction is also the second adjacent. It is formed in the range of the interval L2 between the island-like electrode portions 222.
　なお、第２ブリッジ配線膜２２１を形成する工程の前に、表面処理工程を行い、第２ブリッジ配線膜２２１の形成範囲は親液化し、第２ブリッジ配線膜２２１の形成範囲外は撥液化する。 In addition, a surface treatment process is performed before the process of forming the second bridge wiring film 221, and the formation range of the second bridge wiring film 221 becomes lyophilic, and the outside of the formation range of the second bridge wiring film 221 becomes lyophobic. .
　したがって、吐出された第２ブリッジ配線膜２２１となる機能液は、撥液処理部で大きな接触角を有することとなるので、絶縁膜２３０の形成範囲から上記機能液が濡れ拡がることを防止でき、第２ブリッジ配線膜２２１と第１ブリッジ配線膜２１１との電気的な短絡（ショート）を防止できると記載されているが、このような印刷法の一種である液滴吐出法を用いる場合においては、用いることができる材料が限定されるとともに、その膜厚や膜質を柔軟に制御することが困難であるため、上記液滴吐出法によって形成される導電性膜の低抵抗化は困難である。また、上述した理由から、上記液滴吐出法によって形成される導電性膜の透過率の制御も困難である。 Accordingly, since the discharged functional liquid that becomes the second bridge wiring film 221 has a large contact angle in the liquid repellent treatment portion, it is possible to prevent the functional liquid from spreading out from the formation range of the insulating film 230, Although it is described that an electrical short circuit between the second bridge wiring film 221 and the first bridge wiring film 211 can be prevented, in the case of using a droplet discharge method which is a kind of such a printing method. Since the materials that can be used are limited and it is difficult to flexibly control the film thickness and film quality, it is difficult to reduce the resistance of the conductive film formed by the droplet discharge method. For the above-described reason, it is difficult to control the transmittance of the conductive film formed by the droplet discharge method.
　本発明は、上記の問題点に鑑みてなされたものであり、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できるとともに、タッチ検出性能が高いタッチパネルと、このようなタッチパネルの製造方法と、このようなタッチパネルを備えた表示装置と、を提供することを目的とする。 The present invention has been made in view of the above problems, and can prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process, and has a high touch detection performance. An object of the present invention is to provide a method for manufacturing such a touch panel and a display device including such a touch panel.
　本発明のタッチパネルは、上記の課題を解決するために、第１の方向に配列された複数の第１電極と、上記第１の方向とは異なる第２の方向に配列された複数の第２電極とが、互いに交差するように絶縁基板上に形成されたタッチパネルであって、上記複数の第１電極同士および上記複数の第２電極同士は、電気的に分離されており、上記第１電極および上記第２電極の各々は、複数の所定形状のユニット電極が電気的に接続されて形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極とは、平面視において重ならず、互いに隣接するように、同一層によって同一平面上に形成され、上記各々の第１電極における隣接するユニット電極同士を電気的に接続する、上記第１電極のユニット電極および上記第２電極のユニット電極とは異なる層で形成された第１接続部と、上記各々の第２電極における隣接するユニット電極同士を電気的に接続する、上記第１電極のユニット電極および上記第２電極のユニット電極と同一層によって形成された第２接続部と、を備え、上記第１電極と上記第２電極との交差部分において、上記第１接続部および上記第２接続部の何れか一方は、他方上に少なくとも絶縁層を介して形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には透明短絡防止層が形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層は、平面視において、上記透明短絡防止層の内側に形成されていることを特徴としている。 In order to solve the above problems, the touch panel of the present invention has a plurality of first electrodes arranged in a first direction and a plurality of second electrodes arranged in a second direction different from the first direction. A touch panel formed on an insulating substrate such that the electrodes cross each other, wherein the plurality of first electrodes and the plurality of second electrodes are electrically separated, and the first electrode Each of the second electrodes is formed by electrically connecting a plurality of unit electrodes having a predetermined shape, and the unit electrode of the first electrode and the unit electrode of the second electrode overlap each other in plan view. The unit electrode of the first electrode and the second electrode are formed on the same plane by the same layer so as to be adjacent to each other, and electrically connect adjacent unit electrodes in each of the first electrodes. No Yu A unit electrode of the first electrode and a unit of the second electrode for electrically connecting the first connection part formed of a layer different from the first electrode and the adjacent unit electrodes in each of the second electrodes A second connection part formed of the same layer as the electrode, and at the intersection of the first electrode and the second electrode, one of the first connection part and the second connection part is the other A transparent short-circuit prevention layer is formed on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion. And each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is formed inside the transparent short-circuit prevention layer in a plan view. It is a feature.
　上記構成によれば、タッチパネルに備えられた導電性膜である上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には透明短絡防止層が形成されており、上記透明短絡防止層は、平面視において、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層より広く形成されている。 According to the said structure, it is a transparent short circuit prevention layer on each formation layer of the unit electrode of the said 1st electrode which is the electroconductive film with which the touch panel was equipped, the unit electrode of the said 2nd electrode, and the said 2nd connection part. The transparent short-circuit prevention layer is formed wider than the respective formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion in plan view. .
　したがって、タッチパネルに備えられる他の導電性膜の形成工程である、例えば、上記各々の第１電極における隣接するユニット電極同士を電気的に接続する上記第１接続部の形成工程や配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 Therefore, it is a process for forming another conductive film provided in the touch panel, for example, a process for forming the first connection part or a process for forming a wiring for electrically connecting adjacent unit electrodes in each of the first electrodes. In this case, even if the conductive film is not properly removed and the remaining film of the conductive film is generated, the transparent short-circuit prevention layer, the unit electrode of the first electrode, the unit electrode of the second electrode, and the second electrode Since there is a step between each forming layer and the connection portion, the remaining film of the conductive film is cut (disconnected) at this step portion. A short circuit between the provided conductive films can be prevented.
　また、上記構成によれば、上記タッチパネルに備えられた上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、タッチパネルに備えられる他の導電性膜の形成工程である、例えば、上記各々の第１電極における隣接するユニット電極同士を電気的に接続する上記第１接続部の形成工程や配線の形成工程を、用いることができる材料が限定されるとともに、その膜厚や膜質を柔軟に制御することが困難である液滴吐出法などのような特殊な方法で行う必要がない。 Moreover, according to the said structure, each said formation layer of the said transparent short circuit prevention layer with which the said touch panel was equipped, the unit electrode of the said 1st electrode, the unit electrode of the said 2nd electrode, and the said 2nd connection part, Since there is a step between them, the remaining film portion of the conductive film is cut (disconnected) at this step portion, which is a process of forming another conductive film provided in the touch panel, for example, The materials that can be used in the first connecting portion forming step and the wiring forming step for electrically connecting adjacent unit electrodes in each first electrode are limited, and the film thickness and film quality are flexible. Therefore, it is not necessary to perform a special method such as a droplet discharge method that is difficult to control.
　したがって、上記第１接続部や上記配線などの導電性膜の種類や膜厚や膜質の選択の自由度が高いので、タッチパネルに備えられた導電性膜の低抵抗化や高透過率化を実現できる。 Therefore, since the degree of freedom in selecting the type, film thickness, and film quality of the conductive film such as the first connection part and the wiring is high, the resistance of the conductive film provided in the touch panel and the high transmittance can be realized. it can.
　よって、タッチ検出性能が高く、高透過率を有するタッチパネルを実現することができる。 Therefore, a touch panel with high touch detection performance and high transmittance can be realized.
　本発明の表示装置は、上記の課題を解決するために、上記タッチパネルと、表示パネルと、を備えていることを特徴としている。 The display device of the present invention is characterized by including the touch panel and a display panel in order to solve the above-described problems.
　上記構成によれば、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できるとともに、タッチ検出性能が高く、高透過率を有するタッチパネルを備えた表示装置を実現できる。 According to the above configuration, it is possible to prevent a short circuit between the conductive films included in the touch panel that may occur in the manufacturing process, and to realize a display device including a touch panel with high touch detection performance and high transmittance. it can.
　本発明のタッチパネルの製造方法は、上記の課題を解決するために、絶縁基板上に互いに交差するとともに、各々の配線を介して各々の端子部と電気的に接続された、第１の方向に配列された複数の第１電極と上記第１の方向とは異なる第２の方向に配列された複数の第２電極とを備えたタッチパネルの製造方法であって、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部と上記端子部とを形成する導電層を全面に形成する第１工程と、上記導電層上の全面に透明短絡防止層を形成する第２工程と、上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と端子部との形状にパターニングする第３工程と、上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部の各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第４工程と、上記第１電極のユニット電極上および上記端子部上に形成された透明短絡防止層に、上記第１電極のユニット電極と上記端子部とが露出するように開口部を形成する第５工程と、上記第１電極および上記第２電極の各々と上記各々の端子部とを、上記端子部上に形成された上記透明短絡防止層の開口部を介して、電気的に接続するための配線を形成する第６工程と、上記第１電極と上記第２電極との交差部分において、上記接続部と、上記接続部上に形成された上記透明短絡防止層と、を覆うように絶縁層を形成する第７工程と、上記各々の第１電極における隣接するユニット電極同士を、上記第１電極のユニット電極上に形成された上記透明短絡防止層の開口部を介して、電気的に接続するブリッジ電極を形成する第８工程と、を含むことを特徴としている。 In order to solve the above-described problem, the touch panel manufacturing method of the present invention intersects each other on the insulating substrate and is electrically connected to each terminal portion through each wiring in the first direction. A method of manufacturing a touch panel comprising a plurality of first electrodes arranged and a plurality of second electrodes arranged in a second direction different from the first direction, wherein the unit electrode of the first electrode and A first step of forming a conductive layer on the entire surface to form a connecting portion for electrically connecting unit electrodes of the second electrode and adjacent unit electrodes in the second electrode and the terminal portion; and on the conductive layer A second step of forming a transparent short-circuit prevention layer on the entire surface of the substrate, and patterning the transparent short-circuit prevention layer into a shape of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion. 3rd step and above Using the patterned transparent short-circuit prevention layer as a mask, the conductive layer is etched, and the unit electrode of the first electrode, the unit electrode of the second electrode, the connection layer, and the formation layer of each of the terminal portions are viewed in plan view. In the fourth step of forming on the inner side of the transparent short-circuit prevention layer, the unit electrode of the first electrode and the terminal on the transparent short-circuit prevention layer formed on the unit electrode of the first electrode and on the terminal portion The transparent short-circuit preventing layer formed on the terminal portion, the fifth step of forming an opening so that the portion is exposed, and each of the first electrode and the second electrode and each of the terminal portions. And a sixth step of forming a wiring for electrical connection through the opening, and an intersection portion between the first electrode and the second electrode, and formed on the connection portion and the connection portion. The above transparent short-circuit prevention layer A seventh step of forming an insulating layer so as to cover, and adjacent unit electrodes in each of the first electrodes, the opening of the transparent short-circuit prevention layer formed on the unit electrode of the first electrode And an eighth step of forming a bridge electrode to be electrically connected.
　上記方法によれば、タッチパネルに備えられる上記各々の第１電極における隣接するユニット電極同士を電気的に接続する上記ブリッジ電極の形成工程や上記配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層と、の間には、段差が生じるで、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 According to the above method, the conductive film is appropriately removed in the bridge electrode forming step and the wiring forming step for electrically connecting adjacent unit electrodes in each of the first electrodes provided in the touch panel. First, even if a film residue of the conductive film occurs, between the transparent short-circuit prevention layer and the formation layer of each of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion. In this step, since the film residue of the conductive film is cut (disconnected) at this step portion, a short circuit (short) between the conductive films provided in the touch panel may occur in the manufacturing process. Can be prevented.
　また、上記方法によれば、上記タッチパネルに備えられた上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、上記ブリッジ電極の形成工程や配線の形成工程を、用いることができる材料が限定されるとともに、その膜厚や膜質を柔軟に制御することが困難である液滴吐出法などのような特殊な方法で行う必要がない。 According to the method, the transparent short-circuit prevention layer provided on the touch panel, the unit electrode of the first electrode, the unit electrode of the second electrode, and the formation layer of each of the second connection portions, Since there is a level difference between the gaps, the remaining film of the conductive film is cut (disconnected) at the level difference part, so that the bridge electrode formation process and the wiring formation process can be used. However, it is not necessary to use a special method such as a droplet discharge method in which it is difficult to flexibly control the film thickness and film quality.
　したがって、上記ブリッジ電極や上記配線などの導電性膜の種類や膜厚や膜質の選択の自由度が高いので、タッチパネルに備えられた導電性膜の低抵抗化や高透過率化を実現できる。 Therefore, since the degree of freedom in selecting the type, film thickness, and film quality of the conductive film such as the bridge electrode and the wiring is high, it is possible to realize low resistance and high transmittance of the conductive film provided in the touch panel.
　よって、上記方法によれば、タッチ検出性能が高く、高透過率を有するタッチパネルを実現することができる。 Therefore, according to the above method, a touch panel with high touch detection performance and high transmittance can be realized.
　本発明のタッチパネルの製造方法は、上記の課題を解決するために、絶縁基板上に互いに交差するとともに、各々の配線を介して各々の端子部と電気的に接続された、第１の方向に配列された複数の第１電極と上記第１の方向とは異なる第２の方向に配列された複数の第２電極とを備えたタッチパネルの製造方法であって、上記各々の第１電極における隣接するユニット電極同士を、電気的に接続するブリッジ電極と上記端子部とを形成する第１工程と、上記第１電極と上記第２電極との交差部分において、上記ブリッジ電極上に絶縁層を形成する第２工程と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部とを形成する導電層を全面に形成する第３工程と、上記導電層上の全面に透明短絡防止層を形成する第４工程と、上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との形状にパターニングするとともに、平面視において、上記ブリッジ電極の両端部と上記透明短絡防止層とが重なるように形成する第５工程と、上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第６工程と、上記第１電極および上記第２電極の各々と上記各々の端子部とを電気的に接続するための配線を形成する第７工程と、を含むことを特徴としている。 In order to solve the above-described problem, the touch panel manufacturing method of the present invention intersects each other on the insulating substrate and is electrically connected to each terminal portion through each wiring in the first direction. A method for manufacturing a touch panel comprising a plurality of first electrodes arranged and a plurality of second electrodes arranged in a second direction different from the first direction, wherein the adjacent first electrodes are adjacent to each other. Forming an insulating layer on the bridge electrode at the intersection of the first electrode and the second electrode, and a first step of forming the bridge electrode and the terminal portion for electrically connecting the unit electrodes to each other Forming a conductive layer on the entire surface to form a second step, a unit electrode of the first electrode, a unit electrode of the second electrode, and a connecting portion for electrically connecting adjacent unit electrodes of the second electrode First A step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer; and the transparent short-circuit prevention layer comprising a unit electrode of the first electrode, a unit electrode of the second electrode, and the connection portion. The conductive layer is patterned using the patterned transparent short-circuit prevention layer as a mask, and a fifth step of forming the bridge electrode so that both ends of the bridge electrode and the transparent short-circuit prevention layer overlap in plan view. Etching and forming a formation layer of each of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion inside the transparent short-circuit prevention layer in a plan view, and And a seventh step of forming a wiring for electrically connecting each of the first electrode and the second electrode to each of the terminal portions.
　上記方法によれば、タッチパネルに備えられる配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 According to the above method, even if the conductive film is not properly removed in the step of forming the wiring provided in the touch panel, and the remaining film of the conductive film is generated, the transparent short-circuit preventing layer and the first electrode are formed. Since there is a step between the unit electrode, the unit electrode of the second electrode, and each forming layer of the connection portion, the film residue of the conductive film is cut (disconnected) at the step portion. Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
　また、上記方法によれば、上記配線の形成工程を、液滴吐出法などのような特殊な方法で行う必要がない。 Further, according to the above method, it is not necessary to perform the wiring formation step by a special method such as a droplet discharge method.
　したがって、上記配線の形成に用いられる導電性膜の種類や膜厚や膜質の選択の自由度が高いので、比較的容易に低抵抗化を実現できる。 Therefore, since the degree of freedom in selecting the type, film thickness, and film quality of the conductive film used for forming the wiring is high, the resistance can be reduced relatively easily.
　よって、上記方法によれば、タッチ検出性能が高いタッチパネルを実現することができる。 Therefore, according to the above method, a touch panel with high touch detection performance can be realized.
　本発明のタッチパネルの製造方法は、上記の課題を解決するために、絶縁基板上に互いに交差するとともに、各々の配線を介して各々の端子部と電気的に接続された、第１の方向に配列された複数の第１電極と上記第１の方向とは異なる第２の方向に配列された複数の第２電極とを備えたタッチパネルの製造方法であって、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部と上記端子部とを形成する導電層を全面に形成する第１工程と、上記導電層上の全面に透明短絡防止層を形成する第２工程と、上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部との形状にパターニングする第３工程と、上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部との各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第４工程と、全面に絶縁層を形成する第５工程と、上記第１電極のユニット電極上と上記端子部上とに形成された上記透明短絡防止層および上記絶縁層に、上記第１電極のユニット電極と上記端子部とが露出するように開口部を形成する第６工程と、上記第１電極および上記第２電極の各々と上記各々の端子部とを、上記端子部上に形成された上記開口部を介して、電気的に接続するための配線を形成する第７工程と、上記各々の第１電極における隣接するユニット電極同士を、上記第１電極のユニット電極上に形成された上記開口部を介して、電気的に接続するブリッジ電極を形成する第８工程と、を含むことを特徴としている。 In order to solve the above-described problem, the touch panel manufacturing method of the present invention intersects each other on the insulating substrate and is electrically connected to each terminal portion through each wiring in the first direction. A method of manufacturing a touch panel comprising a plurality of first electrodes arranged and a plurality of second electrodes arranged in a second direction different from the first direction, wherein the unit electrode of the first electrode and A first step of forming a conductive layer on the entire surface to form a connecting portion for electrically connecting unit electrodes of the second electrode and adjacent unit electrodes in the second electrode and the terminal portion; and on the conductive layer A second step of forming a transparent short-circuit prevention layer on the entire surface of the substrate, and patterning the transparent short-circuit prevention layer into a shape of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion. And the third step Using the patterned transparent short-circuit prevention layer as a mask, the conductive layer is etched, and each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion is formed. In plan view, the fourth step formed inside the transparent short-circuit prevention layer, the fifth step for forming an insulating layer on the entire surface, and the unit electrode formed on the unit electrode and the terminal portion of the first electrode. A sixth step of forming an opening in the transparent short-circuit prevention layer and the insulating layer so that the unit electrode of the first electrode and the terminal portion are exposed; each of the first electrode and the second electrode; and A seventh step of forming a wiring for electrically connecting each terminal portion to the terminal portion through the opening formed on the terminal portion; and adjacent unit electrodes in each of the first electrodes The first Through the opening formed on the electrode of the unit electrode, it is characterized the eighth step of forming a bridge electrode for electrically connecting, to include.
　上記方法によれば、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層上には上記透明短絡防止層とともに、絶縁層が形成されているので、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層と上記絶縁層との間の段差は比較的大きくなる。 According to the above method, since the insulating layer is formed together with the transparent short-circuit preventing layer on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion, The step difference between the formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion and the insulating layer is relatively large.
　したがって、上記ブリッジ電極の形成工程や配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記絶縁層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層と、の間には、比較的大きい段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 Therefore, in the step of forming the bridge electrode and the step of forming the wiring, even if the conductive film is not properly removed and the remaining film of the conductive film is generated, the insulating layer, the unit electrode of the first electrode, Since a relatively large step is formed between the unit electrode of the second electrode and each forming layer of the connection portion, the remaining film of the conductive film is cut (disconnected) at the step portion. Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
　また、上記方法によれば、上記ブリッジ電極の形成工程や配線の形成工程を、液滴吐出法などのような特殊な方法で行う必要がない。 Further, according to the above method, it is not necessary to perform the bridge electrode forming step and the wiring forming step by a special method such as a droplet discharge method.
　したがって、上記ブリッジ電極や上記配線の導電性膜の種類や膜厚や膜質の選択の自由度が高いので、タッチパネルに備えられた導電性膜の低抵抗化や高透過率化を実現できる。 Therefore, since the degree of freedom in selecting the type, film thickness and film quality of the conductive film of the bridge electrode and the wiring is high, it is possible to realize low resistance and high transmittance of the conductive film provided in the touch panel.
　よって、上記方法によれば、タッチ検出性能が高く、高透過率を有するタッチパネルを実現することができる。 Therefore, according to the above method, a touch panel with high touch detection performance and high transmittance can be realized.
　本発明のタッチパネルは、以上のように、上記複数の第１電極同士および上記複数の第２電極同士は、電気的に分離されており、上記第１電極および上記第２電極の各々は、複数の所定形状のユニット電極が電気的に接続されて形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極とは、平面視において重ならず、互いに隣接するように、同一層によって同一平面上に形成され、上記各々の第１電極における隣接するユニット電極同士を電気的に接続する、上記第１電極のユニット電極および上記第２電極のユニット電極とは異なる層で形成された第１接続部と、上記各々の第２電極における隣接するユニット電極同士を電気的に接続する、上記第１電極のユニット電極および上記第２電極のユニット電極と同一層によって形成された第２接続部と、を備え、上記第１電極と上記第２電極との交差部分において、上記第１接続部および上記第２接続部の何れか一方は、他方上に少なくとも絶縁層を介して形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には透明短絡防止層が形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層は、平面視において、上記透明短絡防止層の内側に形成されている構成である。 In the touch panel of the present invention, as described above, the plurality of first electrodes and the plurality of second electrodes are electrically separated, and each of the first electrode and the second electrode includes a plurality of the first electrodes and the plurality of second electrodes. The unit electrodes of the predetermined shape are electrically connected to each other, and the unit electrode of the first electrode and the unit electrode of the second electrode do not overlap each other in plan view and are adjacent to each other. The first electrode unit electrode and the second electrode unit electrode are formed in different layers, which are formed on the same plane by one layer and electrically connect adjacent unit electrodes in each of the first electrodes. The first connecting portion and the unit electrode of the first electrode and the unit electrode of the second electrode that electrically connect adjacent unit electrodes in each of the second electrodes Therefore, at the intersection of the first electrode and the second electrode, at least one of the first connection portion and the second connection portion is insulated on the other side. A transparent short-circuit prevention layer is formed on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, Each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is configured to be formed inside the transparent short-circuit prevention layer in a plan view.
　本発明の表示装置は、以上のように、上記タッチパネルと、表示パネルと、を備えている構成である。 As described above, the display device of the present invention is configured to include the touch panel and the display panel.
　本発明のタッチパネルの製造方法は、以上のように、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部と上記端子部とを形成する導電層を全面に形成する第１工程と、上記導電層上の全面に透明短絡防止層を形成する第２工程と、上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と端子部との形状にパターニングする第３工程と、上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部の各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第４工程と、上記第１電極のユニット電極上および上記端子部上に形成された透明短絡防止層に、上記第１電極のユニット電極と上記端子部とが露出するように開口部を形成する第５工程と、上記第１電極および上記第２電極の各々と上記各々の端子部とを、上記端子部上に形成された上記透明短絡防止層の開口部を介して、電気的に接続するための配線を形成する第６工程と、上記第１電極と上記第２電極との交差部分において、上記接続部と、上記接続部上に形成された上記透明短絡防止層と、を覆うように絶縁層を形成する第７工程と、上記各々の第１電極における隣接するユニット電極同士を、上記第１電極のユニット電極上に形成された上記透明短絡防止層の開口部を介して、電気的に接続するブリッジ電極を形成する第８工程と、を含む製造方法である。 As described above, the method for manufacturing a touch panel according to the present invention includes the connection unit that electrically connects the unit electrode of the first electrode, the unit electrode of the second electrode, and the adjacent unit electrodes of the second electrode; A first step of forming a conductive layer forming a terminal portion on the entire surface; a second step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer; and the transparent short-circuit prevention layer as a unit of the first electrode. A third step of patterning the electrode, the unit electrode of the second electrode, and the shape of the connection portion and the terminal portion; and etching the conductive layer using the patterned transparent short-circuit prevention layer as a mask; A fourth step of forming the unit electrode of the second electrode, the unit electrode of the second electrode, the connection layer, and the terminal layer on the inner side of the transparent short-circuit prevention layer in plan view, and the first step A fifth step of forming an opening so that the unit electrode of the first electrode and the terminal portion are exposed on the transparent short-circuit prevention layer formed on the electrode unit electrode and the terminal portion; Forming a wiring for electrically connecting each of the electrode and the second electrode and each of the terminal portions through an opening of the transparent short-circuit preventing layer formed on the terminal portion; And a seventh step of forming an insulating layer so as to cover the connecting portion and the transparent short-circuit preventing layer formed on the connecting portion at the intersection of the step and the first electrode and the second electrode And a bridge electrode that electrically connects adjacent unit electrodes in each of the first electrodes through an opening of the transparent short-circuit prevention layer formed on the unit electrode of the first electrode. And an eighth step. .
　本発明のタッチパネルの製造方法は、以上のように、上記各々の第１電極における隣接するユニット電極同士を、電気的に接続するブリッジ電極と上記端子部とを形成する第１工程と、上記第１電極と上記第２電極との交差部分において、上記ブリッジ電極上に絶縁層を形成する第２工程と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部とを形成する導電層を全面に形成する第３工程と、上記導電層上の全面に透明短絡防止層を形成する第４工程と、上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との形状にパターニングするとともに、平面視において、上記ブリッジ電極の両端部と上記透明短絡防止層とが重なるように形成する第５工程と、上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第６工程と、上記第１電極および上記第２電極の各々と上記各々の端子部とを電気的に接続するための配線を形成する第７工程と、を含む製造方法である。 As described above, the manufacturing method of the touch panel of the present invention includes the first step of forming the bridge electrode and the terminal portion that electrically connect the adjacent unit electrodes in the first electrodes, and the first step. A second step of forming an insulating layer on the bridge electrode at the intersection of one electrode and the second electrode; the unit electrode of the first electrode; the unit electrode of the second electrode; and the adjacent second electrode A third step of forming a conductive layer on the entire surface to form a connection part for electrically connecting the unit electrodes to be performed, a fourth step of forming a transparent short-circuit preventing layer on the entire surface of the conductive layer, and the transparent short circuit The prevention layer is patterned into a shape of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion, and in plan view, both ends of the bridge electrode and the transparent short A fifth step of forming the protective layer so as to overlap, and etching the conductive layer using the patterned transparent short-circuit preventing layer as a mask, the unit electrode of the first electrode, the unit electrode of the second electrode, and the above A sixth step of forming each forming layer with the connection portion inside the transparent short-circuit prevention layer in a plan view, and electrically connecting each of the first electrode and the second electrode with each of the terminal portions. And a seventh step of forming a wiring for connection to the manufacturing method.
　本発明のタッチパネルの製造方法は、以上のように、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部と上記端子部とを形成する導電層を全面に形成する第１工程と、上記導電層上の全面に透明短絡防止層を形成する第２工程と、上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部との形状にパターニングする第３工程と、上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部との各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第４工程と、全面に絶縁層を形成する第５工程と、上記第１電極のユニット電極上と上記端子部上とに形成された上記透明短絡防止層および上記絶縁層に、上記第１電極のユニット電極と上記端子部とが露出するように開口部を形成する第６工程と、上記第１電極および上記第２電極の各々と上記各々の端子部とを、上記端子部上に形成された上記開口部を介して、電気的に接続するための配線を形成する第７工程と、上記各々の第１電極における隣接するユニット電極同士を、上記第１電極のユニット電極上に形成された上記開口部を介して、電気的に接続するブリッジ電極を形成する第８工程と、を含む製造方法である。 As described above, the method for manufacturing a touch panel according to the present invention includes the connection unit that electrically connects the unit electrode of the first electrode, the unit electrode of the second electrode, and the adjacent unit electrodes of the second electrode; A first step of forming a conductive layer forming a terminal portion on the entire surface; a second step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer; and the transparent short-circuit prevention layer as a unit of the first electrode. A third step of patterning the electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion; and etching the conductive layer using the patterned transparent short-circuit prevention layer as a mask. A fourth step of forming each forming layer of the unit electrode of the electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion inside the transparent short-circuit prevention layer in a plan view; A fifth step of forming an insulating layer on the first electrode, the transparent short-circuit preventing layer formed on the unit electrode of the first electrode and the terminal portion, and the insulating layer, the unit electrode of the first electrode and the terminal A sixth step of forming an opening so that the portion is exposed, and each of the first electrode and the second electrode and each of the terminal portions via the opening formed on the terminal portion. The seventh step of forming wirings for electrical connection and the adjacent unit electrodes in each of the first electrodes are connected to each other via the opening formed on the unit electrode of the first electrode. And an eighth step of forming electrically connected bridge electrodes.
　それゆえ、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できるとともに、タッチ検出性能が高いタッチパネルと、このようなタッチパネルの製造方法と、このようなタッチパネルを備えた表示装置と、を実現することができる。 Therefore, a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process can be prevented, a touch panel with high touch detection performance, a manufacturing method of such a touch panel, and such a touch panel The display device provided can be realized.
本発明の一実施の形態のタッチパネルの概略構成を示す図である。It is a figure which shows schematic structure of the touchscreen of one embodiment of this invention. 図１に示す本発明の一実施の形態のタッチパネルの製造工程を示す図である。It is a figure which shows the manufacturing process of the touchscreen of one embodiment of this invention shown in FIG. 図１に示す本発明の一実施の形態のタッチパネルに備えられた透明短絡防止層によって、製造工程において発生しうるセンス電極ラインのユニット電極とドライブ電極ラインのユニット電極との間の短絡（ショート）を防止できるメカニズムを説明するための図である。A short circuit between the unit electrode of the sense electrode line and the unit electrode of the drive electrode line that may occur in the manufacturing process by the transparent short circuit preventing layer provided in the touch panel of the embodiment of the present invention shown in FIG. It is a figure for demonstrating the mechanism which can prevent. 本発明の一実施の形態のタッチパネルを備えた２Ｄ液晶表示装置の一例を示す図である。It is a figure which shows an example of 2D liquid crystal display device provided with the touchscreen of one embodiment of this invention. 本発明の一実施の形態のオンセル型のタッチパネルを備えた液晶表示装置の一例を示す図である。It is a figure which shows an example of the liquid crystal display device provided with the on-cell type touch panel of one embodiment of this invention. 本発明の一実施の形態のタッチパネルを備えた３Ｄ液晶表示装置の一例を示す図である。It is a figure which shows an example of 3D liquid crystal display device provided with the touch panel of one embodiment of this invention. 本発明の他の一実施の形態のタッチパネルの概略構成を示す図である。It is a figure which shows schematic structure of the touchscreen of other one Embodiment of this invention. 図７に示す本発明の一実施の形態のタッチパネルの製造工程を示す図である。It is a figure which shows the manufacturing process of the touchscreen of one embodiment of this invention shown in FIG. 本発明のさらに他の一実施の形態のタッチパネルの概略構成を示す図である。It is a figure which shows schematic structure of the touchscreen of further another embodiment of this invention. 図９に示す本発明の一実施の形態のタッチパネルの製造工程を示す図である。It is a figure which shows the manufacturing process of the touchscreen of one embodiment of this invention shown in FIG. 従来のタッチパネルの概略構成を示す図である。It is a figure which shows schematic structure of the conventional touch panel. 図１１に示す従来のタッチパネルのＢ１－Ｂ１′線の断面を示す図である。It is a figure which shows the cross section of the B1-B1 'line of the conventional touch panel shown in FIG. 図１１に示す従来のタッチパネルの製造工程を示す図である。It is a figure which shows the manufacturing process of the conventional touch panel shown in FIG. さらに他の従来のタッチパネルの概略構成を示す図である。It is a figure which shows schematic structure of another conventional touch panel. 図１４に示す従来のタッチパネルのＢ１－Ｂ１′線の断面を示す図である。It is a figure which shows the cross section of the B1-B1 'line of the conventional touch panel shown in FIG. 図１４に示す従来のタッチパネルの製造工程を示す図である。It is a figure which shows the manufacturing process of the conventional touch panel shown in FIG. 従来のタッチパネルの問題点を説明するための図である。It is a figure for demonstrating the problem of the conventional touch panel. 特許文献１に記載されている従来のタッチパネルの概略構成を示す図である。It is a figure which shows schematic structure of the conventional touch panel described in patent document 1. FIG.
　以下、図面に基づいて本発明の実施の形態について詳しく説明する。ただし、この実施の形態に記載されている構成部品の寸法、材質、形状、その相対配置などはあくまで一実施形態に過ぎず、これらによってこの発明の範囲が限定解釈されるべきではない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. However, the dimensions, materials, shapes, relative arrangements, and the like of the component parts described in this embodiment are merely one embodiment, and the scope of the present invention should not be construed as being limited thereto.
　〔実施の形態１〕
　以下、図１から図６に基づいて、本発明の第１の実施形態について説明する。 [Embodiment 1]
Hereinafter, a first embodiment of the present invention will be described with reference to FIGS.
　図１は、タッチパネル１の概略構成を示す図である。 FIG. 1 is a diagram showing a schematic configuration of the touch panel 1.
　図１に示すタッチパネル１においては、第１の方向（図中の左右方向）に配列された複数のセンス電極ライン１０１Ｓと、上記第１の方向とは異なる第２の方向（図中の上下方向）に配列された複数のドライブ電極ライン１０１Ｄとが、互いに交差するように基板１０６上に形成されている。 In the touch panel 1 shown in FIG. 1, a plurality of sense electrode lines 101S arranged in a first direction (left-right direction in the figure) and a second direction (up-down direction in the figure) different from the first direction. The plurality of drive electrode lines 101D arranged on the substrate 106 are formed on the substrate 106 so as to cross each other.
　そして、センス電極ライン１０１Ｓとドライブ電極ライン１０１Ｄとが、互いに交差する箇所においては、ドライブ電極ライン１０１Ｄにおける隣接するユニット電極１０１Ｕ同士を接続する接続部１０１Ｃ（第２の接続部）と、センス電極ライン１０１Ｓにおける隣接するユニット電極１０１Ｕ′同士を電気的に接続するブリッジ電極１０４（第１の接続部）と、の間には例えば、感光性アクリル樹脂からなる層間絶縁膜１０３（絶縁層）が形成され、センス電極ライン１０１Ｓとドライブ電極ライン１０１Ｄとが、電気的に分離されている。 Then, where the sense electrode line 101S and the drive electrode line 101D intersect each other, a connection part 101C (second connection part) that connects adjacent unit electrodes 101U in the drive electrode line 101D, and a sense electrode line An interlayer insulating film 103 (insulating layer) made of, for example, a photosensitive acrylic resin is formed between the adjacent unit electrodes 101U ′ in 101S and the bridge electrode 104 (first connecting portion) that electrically connects the unit electrodes 101U ′. The sense electrode line 101S and the drive electrode line 101D are electrically separated.
　図１に示すタッチパネル１においては、同一層で形成されたユニット電極１０１Ｕとユニット電極１０１Ｕ′と接続部１０１Ｃとの上に、透明短絡防止層２が設けられている点において、図１１から図１３に基づいて、上述した従来のタッチパネル１００とは異なっており、その他の構成についてはタッチパネル１００において説明したとおりである。説明の便宜上、タッチパネル１００の図面に示した部材と同じ機能を有する部材については、同じ符号を付し、その説明を省略する。 In the touch panel 1 shown in FIG. 1, the transparent short-circuit preventing layer 2 is provided on the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C formed in the same layer, as shown in FIGS. Is different from the conventional touch panel 100 described above, and the other configurations are as described in the touch panel 100. For convenience of explanation, members having the same functions as those shown in the drawing of the touch panel 100 are denoted by the same reference numerals and description thereof is omitted.
　図示されているように、ユニット電極１０１Ｕとユニット電極１０１Ｕ′と接続部１０１Ｃとの各々の形成層は、平面視において、透明短絡防止層２の内側に形成されている。 As shown in the figure, the respective formation layers of the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C are formed inside the transparent short-circuit prevention layer 2 in plan view.
　なお、図１においては、タッチパネル１のタッチ検出領域Ｒ１のみを示し、配線形成領域Ｒ２は図示してないが、配線形成領域Ｒ２は、図１１に示す配線形成領域Ｒ２と同様である。 In FIG. 1, only the touch detection region R1 of the touch panel 1 is shown and the wiring formation region R2 is not shown, but the wiring formation region R2 is the same as the wiring formation region R2 shown in FIG.
　以下、図２に基づいて、図１に示すタッチパネル１の製造方法について説明する。 Hereinafter, a method of manufacturing the touch panel 1 shown in FIG. 1 will be described with reference to FIG.
　本実施の形態においては、透明短絡防止層２を、ポジ型の感光性アクリル樹脂を用いて形成するが、これに限定されることはなく、シリコン窒化膜、シリコン酸化膜およびシリコン窒化酸化膜などの無機系材料や有機材料と無機材料とが混合されたハイブリッド系材料を用いることもできる。 In the present embodiment, the transparent short-circuit prevention layer 2 is formed using a positive photosensitive acrylic resin, but the present invention is not limited to this, and a silicon nitride film, a silicon oxide film, a silicon nitride oxide film, etc. Inorganic materials or hybrid materials in which organic materials and inorganic materials are mixed can also be used.
　図２（ａ）から図２（ｆ）は、タッチパネル１の製造工程を示しており、図１に示すタッチパネル１のＢ１－Ｂ１′線の断面と、図１において図示を省略したタッチパネル１の図１１に示す配線形成領域Ｒ２に相当するＢ２－Ｂ２′線の断面およびＢ３－Ｂ３′線の断面と、を示している。 2 (a) to 2 (f) show the manufacturing process of the touch panel 1. FIG. 2 shows a cross section taken along line B1-B1 'of the touch panel 1 shown in FIG. 11 shows a cross section taken along line B2-B2 ′ and a cross section taken along line B3-B3 ′ corresponding to the wiring formation region R2 shown in FIG.
　図２（ａ）は、センス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとドライブ電極ライン１０１Ｄにおける隣接するユニット電極１０１Ｕ同士を接続する接続部１０１Ｃと端子部１０１Ｆとを形成するＩＴＯなどからなる導電層を全面に形成する工程（第１工程）と、上記導電層上の全面に透明短絡防止層２を形成する工程（第２工程）と、透明短絡防止層２を、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとを形成する形状に露光および現像を行ってパターニングする工程（第３工程）と、上記パターニングされた透明短絡防止層２をマスクとして、上記導電層をエッチングし、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層を、平面視において、透明短絡防止層２の内側に形成する工程（第４工程）と、を示している。 2A, the unit electrode 101U ′ of the sense electrode line 101S, the unit electrode 101U of the drive electrode line 101D, and the connection portion 101C and the terminal portion 101F that connect the adjacent unit electrodes 101U in the drive electrode line 101D are formed. A step of forming a conductive layer made of ITO or the like on the entire surface (first step), a step of forming the transparent short-circuit prevention layer 2 on the entire surface of the conductive layer (second step), and a transparent short-circuit prevention layer 2 A patterning process (third process) in which exposure and development are performed to form shapes for forming the unit electrode 101U ′, the unit electrode 101U, the connection part 101C, and the terminal part 101F, and the patterned transparent short-circuit prevention layer 2 as a mask The conductive layer is etched, and unit electrode 101U ′, unit electrode 101U, and connecting portion 1 are etched. Each of the forming layer and 1C and the terminal portion 101F, shows in a plan view, a step of forming on the inside of the transparent circuit preventing layer 2 (step 4), the.
　なお、図示されているように、上記第３工程においては、透明短絡防止層２に開口部２ｃを形成する箇所および透明短絡防止層２を除去する必要がある箇所（端子部１０１Ｆ上）には、ハーフトーン露光を行う。 In addition, as shown in the figure, in the third step, there are portions where the opening 2c is formed in the transparent short-circuit prevention layer 2 and portions where the transparent short-circuit prevention layer 2 needs to be removed (on the terminal portion 101F). And halftone exposure.
　また、上記第４工程においては、オーバーエッチング（例えば、ジャストエッチングの２００％オーバーエッチング）を行い、上記導電層をサイドエッチングし、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層上に透明短絡防止層２をひさし形状に形成することができる。 In the fourth step, overetching (for example, 200% overetching of just etching) is performed, the conductive layer is side-etched, unit electrode 101U ′, unit electrode 101U, connection portion 101C, and terminal portion 101F The transparent short-circuit prevention layer 2 can be formed in an eaves shape on each of the formation layers.
　そして、図２（ｂ）は、ユニット電極１０１Ｕ′上に形成された透明短絡防止層２に開口部２ｃを形成するとともに、端子部１０１Ｆ上に形成された透明短絡防止層２にも、端子部１０１Ｆが露出するように開口部を形成する工程（第５工程）を示している。 FIG. 2B shows that the opening 2c is formed in the transparent short-circuit prevention layer 2 formed on the unit electrode 101U ′ and the transparent short-circuit prevention layer 2 formed on the terminal portion 101F is also provided with a terminal portion. A step (fifth step) is shown in which an opening is formed so that 101F is exposed.
　上記第５工程においては、ハーフトーン露光され、薄く残存する透明短絡防止層２をアッシングして、除去することによって、透明短絡防止層２に開口部２ｃを形成するとともに、端子部１０１Ｆ上に形成された透明短絡防止層２を除去できる。なお、このアッシング処理によって、ハーフトーン露光部以外の透明短絡防止層２も薄くなるが残存する。 In the fifth step, the transparent short-circuit prevention layer 2 that has been halftone exposed and thinly remains is ashed and removed, thereby forming an opening 2c in the transparent short-circuit prevention layer 2 and forming on the terminal portion 101F. The transparent short-circuit prevention layer 2 thus formed can be removed. By this ashing process, the transparent short-circuit prevention layer 2 other than the halftone exposure part is also thinned but remains.
　なお、上記アッシングの方法としては、例えば、オゾンなどのガスを導入したアッシング室内で、紫外線などの光を照射して、ガスとレジストとの化学反応を用いてレジストを剥離する光励起アッシングやガスを高周波などでプラズマ化し、そのプラズマを利用してレジストを剥離するプラズマアッシングなどを用いることができる。 Note that as the ashing method, for example, photoexcited ashing or gas that irradiates light such as ultraviolet rays in a ashing chamber into which a gas such as ozone is introduced and peels the resist using a chemical reaction between the gas and the resist. Plasma ashing or the like can be used in which plasma is generated with a high frequency or the like and the resist is stripped using the plasma.
　図２（ｃ）は、センス電極ライン１０１Ｓおよびドライブ電極ライン１０１Ｄの各々と各々の端子部１０１Ｆとを電気的に接続するための配線１０２を形成する工程（第６工程）を示しており、図２（ｄ）は、センス電極ライン１０１Ｓとドライブ電極ライン１０１Ｄとの交差部分において、接続部１０１Ｃと、接続部１０１Ｃ上に形成された透明短絡防止層２と、を覆うように層間絶縁膜１０３を形成する工程（第７工程）を示している。 FIG. 2C shows a step (sixth step) of forming a wiring 102 for electrically connecting each of the sense electrode line 101S and the drive electrode line 101D to each terminal portion 101F. 2 (d) shows an interlayer insulating film 103 so as to cover the connection portion 101C and the transparent short-circuit prevention layer 2 formed on the connection portion 101C at the intersection of the sense electrode line 101S and the drive electrode line 101D. The process (7th process) to form is shown.
　また、上記第７工程においては、図示されているように、配線形成領域Ｒ２内における端子部１０１Ｆと配線１０２とを覆うように層間絶縁膜１０３が形成されている。このように、配線形成領域Ｒ２内に層間絶縁膜１０３が形成される点においては、図１１に示すタッチパネル１００における配線形成領域Ｒ２とは異なる。 In the seventh step, an interlayer insulating film 103 is formed so as to cover the terminal portion 101F and the wiring 102 in the wiring formation region R2, as shown in the drawing. Thus, the point that the interlayer insulating film 103 is formed in the wiring formation region R2 is different from the wiring formation region R2 in the touch panel 100 shown in FIG.
　そして、図２（ｅ）は、センス電極ライン１０１Ｓにおける隣接するユニット電極１０１Ｕ′同士を、透明短絡防止層２に形成された開口部２ｃを介して電気的に接続するブリッジ電極１０４を形成する工程（第８工程）を示しており、図２（ｆ）は、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆを、外部と電気的に接続するため露出されている箇所以外の全面に、保護膜１０５を形成する工程を示している。 FIG. 2E shows a step of forming a bridge electrode 104 that electrically connects adjacent unit electrodes 101U ′ in the sense electrode line 101S through the opening 2c formed in the transparent short-circuit prevention layer 2. (Eighth step) is shown, and FIG. 2 (f) shows a portion other than the exposed portion for electrically connecting the terminal portion 101F formed at one end portion outside the wiring formation region R2 to the outside. The process of forming the protective film 105 on the entire surface is shown.
　以下、図３に基づいて、透明短絡防止層２を備えたことにより、製造工程において発生しうるセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとの間の短絡（ショート）を防止できるメカニズムについて説明する。 Hereinafter, based on FIG. 3, by providing the transparent short-circuit preventing layer 2, a short circuit (short circuit) between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D that may occur in the manufacturing process. ) Will be described.
　図３（ａ）は、図１に示すタッチパネル１において、隣接するセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとの間に、導電性異物が跨って存在する場合を示す図である。 FIG. 3A shows a case where a conductive foreign material is present across the unit electrode 101U ′ of the adjacent sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D in the touch panel 1 shown in FIG. FIG.
　上記導電性異物は、配線１０２やブリッジ電極１０４の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生し、生じたものである。 The conductive foreign matter is generated when the conductive film is not properly removed in the formation process of the wiring 102 and the bridge electrode 104 and the conductive film is left behind.
　図３（ｂ）は、図３（ａ）のＡ－Ａ′線の断面を示す図である。 FIG. 3B is a view showing a cross section taken along line AA ′ of FIG.
　図示されているように、透明短絡防止層２と、センス電極ライン１０１Ｓのユニット電極１０１Ｕ′およびドライブ電極ライン１０１Ｄのユニット電極１０１Ｕと、の間には、段差が生じており、ユニット電極１０１Ｕ′とユニット電極１０１Ｕとの各々の形成層上に形成された透明短絡防止層２はひさし形状に形成されている。 As shown in the figure, a step is formed between the transparent short-circuit prevention layer 2 and the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D. The transparent short-circuit prevention layer 2 formed on each formation layer with the unit electrode 101U is formed in an eaves shape.
　図示されているように、この段差部分においては、配線１０２やブリッジ電極１０４の形成工程において、生じた上記導電性膜の膜残りは、切断（断線）されるので、製造工程において発生しうるセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとの間の短絡（ショート）を防止できる。 As shown in the drawing, in the step portion, the film residue of the conductive film generated in the process of forming the wiring 102 and the bridge electrode 104 is cut (disconnected), so that sense that may occur in the manufacturing process is generated. A short circuit between the unit electrode 101U ′ of the electrode line 101S and the unit electrode 101U of the drive electrode line 101D can be prevented.
　また、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、配線１０２やブリッジ電極１０４の形成工程を、用いることができる材料が限定されるとともに、その膜厚や膜質を柔軟に制御することが困難である液滴吐出法などのような特殊な方法で行う必要がない。 Further, since the film residue of the conductive film is cut (disconnected) at the step portion, the material that can be used for the formation process of the wiring 102 and the bridge electrode 104 is limited, and the film thickness and There is no need to use a special method such as a droplet discharge method in which it is difficult to control the film quality flexibly.
　したがって、タッチパネル１においては、配線１０２やブリッジ電極１０４をＩＴＯ（Ｉｎｄｉｕｍ　Ｔｉｎ　Ｏｘｉｄｅ）以外である、ＩＺＯ（Ｉｎｄｉｕｍ　Ｚｉｎｃ　Ｏｘｉｄｅ）を用いて形成することもでき、さらには、例えば、チタン（Ｔｉ）、銅（Ｃｕ）、金（Ａｕ）、アルミニウム（Ａｌ）、タングステン（Ｗ）、亜鉛（Ｚｎ）、ニッケル（Ｎｉ）、スズ（Ｓｎ）、クロム（Ｃｒ）、モリブデン（Ｍｏ）、タンタル（Ｔａ）等の抵抗の低い金属およびその金属化合物並びに金属シリサイド等の金属材料で形成することもできる。また、上記金属材料が積層された材料を用いることもできる。 Therefore, in the touch panel 1, the wiring 102 and the bridge electrode 104 can be formed using IZO (Indium Zinc Oxide) other than ITO (Indium Tin Oxide), and further, for example, titanium (Ti), copper (Cu), gold (Au), aluminum (Al), tungsten (W), zinc (Zn), nickel (Ni), tin (Sn), chromium (Cr), molybdenum (Mo), tantalum (Ta), etc. It can also be formed of a metal having low resistance, a metal compound thereof, and a metal material such as metal silicide. Alternatively, a material in which the above metal materials are stacked can be used.
　したがって、タッチパネル１に備えられた導電性膜の低抵抗化を実現できるので、タッチ検出性能が高いタッチパネル１を実現することができる。 Therefore, since the resistance of the conductive film provided in the touch panel 1 can be reduced, the touch panel 1 with high touch detection performance can be realized.
　また、タッチパネル１においては、配線１０２やブリッジ電極１０４の形成工程において、用いることが可能な方法が液滴吐出法などのような特殊な方法に限定されないので、導電性膜の膜厚や膜質の選択の自由度が高いので、タッチパネル１に備えられた導電性膜の低抵抗化や高透過率化を容易に実現できるので、タッチ検出性能が高く、高透過率を有するタッチパネル１を実現できる。 In the touch panel 1, the method that can be used in the formation process of the wiring 102 and the bridge electrode 104 is not limited to a special method such as a droplet discharge method. Since the degree of freedom of selection is high, it is possible to easily realize low resistance and high transmittance of the conductive film provided in the touch panel 1, so that it is possible to realize the touch panel 1 having high touch detection performance and high transmittance.
　なお、図３（ｂ）に図示されているように、タッチパネル１においては、ユニット電極１０１Ｕとユニット電極１０１Ｕ′との各々の形成層は、平面視において、透明短絡防止層２の端部より０．１μｍ以上内側に形成されていることが好ましい。 As shown in FIG. 3B, in the touch panel 1, each formation layer of the unit electrode 101 </ b> U and the unit electrode 101 </ b> U ′ is 0 from the end of the transparent short-circuit prevention layer 2 in a plan view. It is preferable to be formed inside 1 μm or more.
　このような構成によれば、ユニット電極１０１Ｕとユニット電極１０１Ｕ′との各々の形成層上に形成される透明短絡防止層２を、より完全なひさし形状に形成することができ、配線１０２やブリッジ電極１０４の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記ひさし形状の段差部によって、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとの間の短絡（ショート）を防止できる。 According to such a configuration, the transparent short-circuit prevention layer 2 formed on the respective formation layers of the unit electrode 101U and the unit electrode 101U ′ can be formed in a more complete eaves shape, and the wiring 102 and the bridge In the step of forming the electrode 104, even if the conductive film is not properly removed and the film residue of the conductive film is generated, the film residue of the conductive film is cut (disconnected) by the eaves-shaped stepped portion. Therefore, it is possible to prevent a short circuit between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D, which may occur in the manufacturing process.
　次に、図４から図６に基づいて、上述したタッチパネル１を備えた表示装置の一例として、液晶表示装置を例に挙げて説明する。 Next, based on FIGS. 4 to 6, a liquid crystal display device will be described as an example of the display device including the touch panel 1 described above.
　図４は、タッチパネルを備えた２Ｄ液晶表示装置１０の一例を示す図である。 FIG. 4 is a diagram illustrating an example of the 2D liquid crystal display device 10 including a touch panel.
　図示されているように、上述したタッチパネルに相当するタッチパネル６１は、基板１０６と、基板１０６と対向するように設けられた基板６１ｂと、両基板間であって、両基板１０６・６１ｂの何れか一方側に形成された複数の膜６１ａ（タッチパネル１に備えられた複数の膜）と、を備えている。 As shown in the figure, a touch panel 61 corresponding to the touch panel described above includes a substrate 106, a substrate 61b provided so as to face the substrate 106, and between the substrates, and either of the substrates 106 and 61b. And a plurality of films 61a (a plurality of films provided in the touch panel 1) formed on one side.
　一方、液晶パネル６２は、ＴＦＴ基板６２ａと、カラーフィルタ基板６２ｂと、両基板を貼り合わせるためのシール材６２ｃと、貼り合わせられた両基板間に封入された液晶層６２ｄと、ＴＦＴ基板６２ａにおいて、液晶層６２ｄと接する面側の反対面に設けられた偏光板６２ｅと、カラーフィルタ基板６２ｂにおいて、液晶層６２ｄと接する面側の反対面に設けられた偏光板６２ｆと、を備えている。 On the other hand, the liquid crystal panel 62 includes a TFT substrate 62a, a color filter substrate 62b, a sealing material 62c for bonding the two substrates, a liquid crystal layer 62d sealed between the bonded substrates, and a TFT substrate 62a. And a polarizing plate 62e provided on the opposite side of the surface in contact with the liquid crystal layer 62d, and a polarizing plate 62f provided on the opposite side of the surface in contact with the liquid crystal layer 62d in the color filter substrate 62b.
　なお、タッチパネル６１と液晶パネル６２とは、図示されてないが、接着層（未図示）などを用いて、貼り合わせられ、タッチパネル付き２Ｄ液晶表示装置１０を完成させることができる。 Although the touch panel 61 and the liquid crystal panel 62 are not shown, they can be bonded together using an adhesive layer (not shown) or the like to complete the 2D liquid crystal display device 10 with a touch panel.
　図５は、オンセル型のタッチパネルを備えた液晶表示装置２０の一例を示す図である。 FIG. 5 is a diagram illustrating an example of the liquid crystal display device 20 including an on-cell type touch panel.
　図示されているように、液晶表示装置２０においては、カラーフィルタ基板６２ｂにおいて、液晶層６２ｄと接する面側の反対面に複数の膜６１ａ（タッチパネル１に備えられた複数の膜）が形成され、その上に偏光板６２ｆが形成され、最後に基板６１ｂが形成されるという点で、図４に示したタッチパネルを備えた２Ｄ液晶表示装置１０とは異なる。 As illustrated, in the liquid crystal display device 20, a plurality of films 61a (a plurality of films provided in the touch panel 1) are formed on the color filter substrate 62b on the surface opposite to the surface in contact with the liquid crystal layer 62d. It is different from the 2D liquid crystal display device 10 provided with the touch panel shown in FIG. 4 in that a polarizing plate 62f is formed thereon and finally a substrate 61b is formed.
　液晶表示装置２０においては、タッチパネル側に備えられる基板が一つ少ない分、薄型化することができる。 The liquid crystal display device 20 can be thinned by one less substrate provided on the touch panel side.
　図６は、タッチパネルを備えた３Ｄ液晶表示装置３０の一例を示す図である。 FIG. 6 is a diagram illustrating an example of a 3D liquid crystal display device 30 including a touch panel.
　図示されているように、３Ｄ液晶表示装置３０には、タッチパネル６１と液晶パネル６２との他に、タッチパネル６１と液晶パネル６２との間にスイッチ液層パネル６３が備えられている。 As shown in the figure, the 3D liquid crystal display device 30 is provided with a switch liquid layer panel 63 between the touch panel 61 and the liquid crystal panel 62 in addition to the touch panel 61 and the liquid crystal panel 62.
　スイッチ液層パネル６３は、下側スイッチ基板６３ａと上側スイッチ基板６３ｂとが、シール材６３ｃによって張り合わせられており、上記両基板間には液晶層６３ｄが備えられている。 In the switch liquid layer panel 63, a lower switch substrate 63a and an upper switch substrate 63b are bonded together by a sealing material 63c, and a liquid crystal layer 63d is provided between the two substrates.
　下側スイッチ基板６３ａにおいて、液晶層６３ｄと接する側の面には、コモン電極６４が形成されており、一方、上側スイッチ基板６３ｂにおいて、液晶層６３ｄと接する側の面には、複数のセグメント電極６５が形成されている。 A common electrode 64 is formed on the surface of the lower switch substrate 63a that is in contact with the liquid crystal layer 63d, while a plurality of segment electrodes are formed on the surface of the upper switch substrate 63b that is in contact with the liquid crystal layer 63d. 65 is formed.
　そして、上側スイッチ基板６３ｂにおいて、タッチパネル６１と接する側の面には偏光板６３ｅが設けられており、下側スイッチ基板６３ａにおいて、液晶パネル６２と接する側の面には、接着層６６が形成されている。 In the upper switch substrate 63b, a polarizing plate 63e is provided on the surface in contact with the touch panel 61, and an adhesive layer 66 is formed on the surface in contact with the liquid crystal panel 62 in the lower switch substrate 63a. ing.
　なお、スイッチ液晶パネル６３は、液晶パネル６２によって表示される両眼視差を有する右画像と左画像とを、所定周期で交互に表示させる役割をする。 The switch liquid crystal panel 63 plays a role of alternately displaying a right image and a left image having binocular parallax displayed by the liquid crystal panel 62 at a predetermined cycle.
　なお、本実施の形態においては、タッチパネルを備えた液晶表示装置を例に挙げて説明をしたが、表示部の種類は液晶パネルに限定されることはなく、例えば、タッチパネルを備えた有機ＥＬ表示装置などであってもよいのは勿論である。 In this embodiment, the liquid crystal display device provided with the touch panel has been described as an example. However, the type of the display unit is not limited to the liquid crystal panel, and for example, an organic EL display provided with the touch panel. Of course, it may be a device or the like.
　〔実施の形態２〕
　次に、図７および図８に基づいて、本発明の第２の実施形態について説明する。本実施の形態のタッチパネル１ａにおいては、ブリッジ電極１０４が最下層に形成され、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層と、透明短絡防止層２と、層間絶縁膜１０３と、の積層順が実施の形態１とは異なっている。 [Embodiment 2]
Next, a second embodiment of the present invention will be described based on FIG. 7 and FIG. In the touch panel 1a of the present embodiment, the bridge electrode 104 is formed in the lowermost layer, the formation layers of the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F, the transparent short-circuit prevention layer 2, and the like. The order of lamination with the interlayer insulating film 103 is different from that of the first embodiment.
　図７は、タッチパネル１ａの概略構成を示す図である。 FIG. 7 is a diagram showing a schematic configuration of the touch panel 1a.
　図示されているように、タッチパネル１ａにおいては、ブリッジ電極１０４が基板１０６の最下層に形成され、その上から層間絶縁膜１０３と、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層と、透明短絡防止層２と、が順に積層された構成となっている。 As shown in the drawing, in the touch panel 1a, the bridge electrode 104 is formed on the lowermost layer of the substrate 106, and from above, the interlayer insulating film 103, the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F. Each of the formation layers and the transparent short-circuit prevention layer 2 are laminated in order.
　なお、図７に示すタッチパネル１ａにおいては、同一層で形成されたユニット電極１０１Ｕとユニット電極１０１Ｕ′と接続部１０１Ｃとの上に、透明短絡防止層２が設けられている点において、図１４から図１６に基づいて、上述した従来のタッチパネル１１０とは異なっており、その他の構成についてはタッチパネル１１０において説明したとおりである。説明の便宜上、タッチパネル１１０の図面に示した部材と同じ機能を有する部材については、同じ符号を付し、その説明を省略する。 In the touch panel 1a shown in FIG. 7, the transparent short-circuit prevention layer 2 is provided on the unit electrode 101U, the unit electrode 101U ′, and the connection portion 101C formed of the same layer, as shown in FIG. Based on FIG. 16, it is different from the above-described conventional touch panel 110, and the other configuration is as described in the touch panel 110. For convenience of explanation, members having the same functions as those shown in the drawing of the touch panel 110 are denoted by the same reference numerals and description thereof is omitted.
　以下、図８に基づいて、図７に示すタッチパネル１ａの製造方法について説明する。 Hereinafter, a method of manufacturing the touch panel 1a shown in FIG. 7 will be described with reference to FIG.
　図８（ａ）から図８（ｅ）は、タッチパネル１ａの製造工程を示しており、図７に示すタッチパネル１ａのＢ１－Ｂ１′線の断面と、図７において図示を省略したタッチパネル１ａの図１４に示す配線形成領域Ｒ２に相当するＢ２－Ｂ２′線の断面およびＢ３－Ｂ３′線の断面と、を示している。 8 (a) to 8 (e) show the manufacturing process of the touch panel 1a. FIG. 8 shows a cross section taken along line B1-B1 ′ of the touch panel 1a shown in FIG. 7, and a diagram of the touch panel 1a not shown in FIG. 14 shows a cross section taken along line B2-B2 ′ and a cross section taken along line B3-B3 ′ corresponding to the wiring formation region R2 shown in FIG.
　図８（ａ）は、センス電極ライン１０１Ｓにおける隣接するユニット電極１０１Ｕ′同士を、電気的に接続するブリッジ電極１０４と端子部１０１Ｆとを形成する工程（第１工程）を示しており、図８（ｂ）は、センス電極ライン１０１Ｓとドライブ電極ライン１０１Ｄとの交差部分において、ブリッジ電極１０４上に層間絶縁膜１０３を形成する工程（第２工程）を示す。 FIG. 8A shows a step (first step) of forming the bridge electrode 104 and the terminal portion 101F that electrically connect adjacent unit electrodes 101U ′ in the sense electrode line 101S. FIG. 6B shows a step (second step) of forming the interlayer insulating film 103 on the bridge electrode 104 at the intersection of the sense electrode line 101S and the drive electrode line 101D.
　そして、図８（ｃ）は、センス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとドライブ電極ライン１０１Ｄにおける隣接するユニット電極１０１Ｕ同士を接続する接続部１０１Ｃとを形成するＩＴＯなどからなる導電層を全面に形成する工程（第３工程）と、上記導電層上の全面に透明短絡防止層２を形成する工程（第４工程）と、透明短絡防止層２を、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃとを形成する形状に露光および現像を行ってパターニングするとともに、平面視において、ブリッジ電極１０４の両端部と透明短絡防止層２とが重なるように形成する工程（第５工程）と、パターニングされた透明短絡防止層２をマスクとして、上記導電層をエッチングし、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃとの各々の形成層を、平面視において、透明短絡防止層２の内側に形成する工程（第６工程）と、を示している。 FIG. 8C shows the ITO that forms the unit electrode 101U ′ of the sense electrode line 101S, the unit electrode 101U of the drive electrode line 101D, and the connection portion 101C that connects the adjacent unit electrodes 101U in the drive electrode line 101D. A step of forming a conductive layer comprising the entire surface (third step), a step of forming the transparent short-circuit prevention layer 2 on the entire surface of the conductive layer (fourth step), and the transparent short-circuit prevention layer 2 as unit electrodes. The patterning is performed by exposing and developing the shape forming the 101U ′, the unit electrode 101U, and the connection portion 101C, and forming the both ends of the bridge electrode 104 and the transparent short-circuit prevention layer 2 so as to overlap in plan view. (5th step) and using the patterned transparent short-circuit prevention layer 2 as a mask, the conductive layer is etched. And quenching, each of the forming layer and the unit electrode 101U 'and the unit electrode 101U connecting portions 101C, shows in a plan view, a step of forming on the inside of the transparent circuit preventing layer 2 (sixth step), the.
　なお、本実施の形態においては、端子部１０１Ｆはブリッジ電極１０４と同一層によって形成されており、端子部１０１Ｆはブリッジ電極１０４のパターニング時に、一緒にパターニングされる。 In this embodiment, the terminal portion 101F is formed of the same layer as the bridge electrode 104, and the terminal portion 101F is patterned together when the bridge electrode 104 is patterned.
　また、ブリッジ電極１０４とセンス電極ライン１０１Ｓにおける隣接するユニット電極１０１Ｕ′同士の電気的な接続は、ブリッジ電極１０４上にユニット電極１０１Ｕ′が直接接するように形成されることにより行われている。 The electrical connection between the unit electrodes 101U ′ adjacent to each other in the bridge electrode 104 and the sense electrode line 101S is performed by forming the unit electrode 101U ′ in direct contact with the bridge electrode 104.
　したがって、本実施の形態においては、実施の形態１のようにユニット電極１０１Ｕ′上に形成された透明短絡防止層２に開口部２ｃを形成するとともに、端子部１０１Ｆ上に形成された透明短絡防止層２にも、端子部１０１Ｆが露出するように開口部を形成する必要がないので、ハーフトーン露光は不要となる。 Therefore, in the present embodiment, the opening 2c is formed in the transparent short-circuit prevention layer 2 formed on the unit electrode 101U ′ as in the first embodiment, and the transparent short-circuit prevention formed on the terminal portion 101F. Since it is not necessary to form an opening in the layer 2 so that the terminal portion 101F is exposed, halftone exposure is not necessary.
　それから、図８（ｄ）は、センス電極ライン１０１Ｓおよびドライブ電極ライン１０１Ｄの各々と各々の端子部１０１Ｆとを電気的に接続するための配線１０２を形成する工程（第７工程）を示しており、図８（ｅ）は、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆを、外部と電気的に接続するため露出されている箇所以外の全面に、保護膜１０５を形成する工程を示している。 Then, FIG. 8D shows a step (seventh step) of forming the wiring 102 for electrically connecting each of the sense electrode line 101S and the drive electrode line 101D and each terminal portion 101F. In FIG. 8E, the protective film 105 is formed on the entire surface other than the exposed portion of the terminal portion 101F formed at one end portion outside the wiring formation region R2 for electrical connection with the outside. The process is shown.
　上記タッチパネル１ａにおいては、配線１０２の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、透明短絡防止層２と、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃとの各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとの間の短絡（ショート）を防止できる。 In the touch panel 1a, even if the conductive film is not properly removed in the step of forming the wiring 102 and the remaining film of the conductive film is generated, the transparent short-circuit prevention layer 2, the unit electrode 101U ′, and the unit electrode 101U Since there is a step between each of the forming layers of the connecting portion 101C and the connection portion 101C, the remaining film of the conductive film is cut (disconnected) at the step portion, which may occur in the manufacturing process. A short circuit between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D can be prevented.
　また、配線１０２の形成工程を、液滴吐出法などのような特殊な方法で行う必要はなく、配線１０２の形成に用いられる導電性膜の種類や膜厚や膜質の選択の自由度が高いので、比較的容易に低抵抗化を実現できる。 Further, it is not necessary to perform the formation process of the wiring 102 by a special method such as a droplet discharge method, and there is a high degree of freedom in selecting the type, film thickness, and film quality of the conductive film used for forming the wiring 102. Therefore, a low resistance can be realized relatively easily.
　よって、タッチ検出性能が高いタッチパネル1ａを実現することができる。 Therefore, the touch panel 1a having high touch detection performance can be realized.
　〔実施の形態３〕
　次に、図９および図１０に基づいて、本発明の第３の実施形態について説明する。本実施の形態のタッチパネル１ｂにおいては、透明短絡防止層２ａと層間絶縁膜１０３とが積層された膜と、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃとの各々の形成層と、の間には、段差が形成されるという点において、実施の形態１および実施の形態２とは異なっている。 [Embodiment 3]
Next, a third embodiment of the present invention will be described based on FIG. 9 and FIG. In the touch panel 1b according to the present embodiment, between the film in which the transparent short-circuit preventing layer 2a and the interlayer insulating film 103 are laminated, and the respective formation layers of the unit electrode 101U ′, the unit electrode 101U, and the connection portion 101C. Is different from the first and second embodiments in that a step is formed.
　図９は、タッチパネル１ｂの概略構成を示す図である。 FIG. 9 is a diagram showing a schematic configuration of the touch panel 1b.
　図示されているように、タッチパネル１ｂにおいては、透明短絡防止層２ａ上に層間絶縁膜１０３を、センス電極ライン１０１Ｓとドライブ電極ライン１０１Ｄとが交差する部分のみでなく、全面に形成し、必要な部分に開口部１０３ｃを設けるようになっている。 As shown in the figure, in the touch panel 1b, an interlayer insulating film 103 is formed on the entire surface of the transparent short-circuit prevention layer 2a, not only at a portion where the sense electrode line 101S and the drive electrode line 101D intersect with each other. An opening 103c is provided in the portion.
　したがって、透明短絡防止層２ａと層間絶縁膜１０３とが積層された膜と、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃとの各々の形成層と、の間に、段差が形成されるようになっている。 Therefore, a step is formed between the film in which the transparent short-circuit prevention layer 2a and the interlayer insulating film 103 are laminated and the respective formation layers of the unit electrode 101U ′, the unit electrode 101U, and the connection portion 101C. It has become.
　なお、本実施の形態においては、透明短絡防止層２ａを、シリコン酸化膜を用いて形成している。 In the present embodiment, the transparent short-circuit prevention layer 2a is formed using a silicon oxide film.
　図１０（ａ）から図１０（ｅ）は、タッチパネル１ｂの製造工程を示しており、図９に示すタッチパネル１ｂのＢ１－Ｂ１′線の断面と、図９において図示を省略したタッチパネル１ｂの図１１に示す配線形成領域Ｒ２に相当するＢ２－Ｂ２′線の断面およびＢ３－Ｂ３′線の断面と、を示している。 10 (a) to 10 (e) show the manufacturing process of the touch panel 1b. FIG. 10 is a cross-sectional view taken along line B1-B1 ′ of the touch panel 1b shown in FIG. 11 shows a cross section taken along line B2-B2 ′ and a cross section taken along line B3-B3 ′ corresponding to the wiring formation region R2 shown in FIG.
　図１０（ａ）は、センス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとドライブ電極ライン１０１Ｄにおける隣接するユニット電極１０１Ｕ同士を接続する接続部１０１Ｃと端子部１０１Ｆとを形成するＩＴＯなどからなる導電層を全面に形成する工程（第１工程）と、上記導電層上の全面に透明短絡防止層２ａを形成する工程（第２工程）と、透明短絡防止層２ａを、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとを形成する形状にパターニングする工程（第３工程）と、上記パターニングされた透明短絡防止層２ａをマスクとして、上記導電層をエッチングし、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層を、平面視において、透明短絡防止層２ａの内側に形成する工程（第４工程）と、を示している。 In FIG. 10A, the unit electrode 101U ′ of the sense electrode line 101S, the unit electrode 101U of the drive electrode line 101D, and the connection portion 101C and the terminal portion 101F that connect the adjacent unit electrodes 101U in the drive electrode line 101D are formed. A step of forming a conductive layer made of ITO or the like on the entire surface (first step), a step of forming a transparent short-circuit prevention layer 2a on the entire surface of the conductive layer (second step), and a transparent short-circuit prevention layer 2a, Etching the conductive layer using the patterned transparent short-circuit prevention layer 2a as a mask, and a patterning step (third step) to form the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F. Unit electrode 101U ', unit electrode 101U, connecting portion 101C, and terminal portion Each of the forming layer and 01F, show in a plan view, a step of forming on the inside of the transparent circuit preventing layer 2a (step 4), the.
　なお、上記第３工程においては、透明短絡防止層２ａが感光性のないシリコン酸化膜を用いて形成されているため、レジスト膜を露光・現像工程を行って、所定形状に形成した後、このレジスト膜をマスクにして、透明短絡防止層２ａのパターニングを行っている。 In the third step, since the transparent short-circuit prevention layer 2a is formed using a non-photosensitive silicon oxide film, the resist film is subjected to an exposure / development process and formed into a predetermined shape. The transparent short-circuit prevention layer 2a is patterned using the resist film as a mask.
　また、上記第４工程においては、オーバーエッチング（例えば、ジャストエッチングの２００％オーバーエッチング）を行い、上記導電層をサイドエッチングし、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層上に透明短絡防止層２ａをひさし形状に形成することができる。 In the fourth step, overetching (for example, 200% overetching of just etching) is performed, the conductive layer is side-etched, unit electrode 101U ′, unit electrode 101U, connection portion 101C, and terminal portion 101F The transparent short-circuit prevention layer 2a can be formed in an eaves shape on each of the formation layers.
　図１０(ｂ)は、全面に層間絶縁膜１０３を形成する工程（第５工程）と、ユニット電極１０１Ｕ′上と端子部１０１Ｆ上とに形成された透明短絡防止層２ａおよび層間絶縁膜１０３に開口部２ｃ・１０３ｃを形成する工程（第６工程）と、を示す。 FIG. 10B shows a step (fifth step) of forming the interlayer insulating film 103 on the entire surface, and the transparent short-circuit preventing layer 2a and the interlayer insulating film 103 formed on the unit electrode 101U ′ and the terminal portion 101F. A step of forming the openings 2c and 103c (sixth step).
　本実施の形態において用いられている層間絶縁膜１０３は感光性を有するため、現像・露光工程を行い、ユニット電極１０１Ｕ′上と端子部１０１Ｆ上とに、層間絶縁膜１０３の開口部１０３ｃを形成することができ、この開口部１０３ｃを有する層間絶縁膜１０３をマスクとして、ドライエッチングを行い、ユニット電極１０１Ｕ′上と端子部１０１Ｆ上とに、透明短絡防止層２ａの開口部２ｃを形成することができる。 Since the interlayer insulating film 103 used in this embodiment has photosensitivity, an opening 103c of the interlayer insulating film 103 is formed on the unit electrode 101U ′ and the terminal portion 101F by performing a development / exposure process. Using the interlayer insulating film 103 having the opening 103c as a mask, dry etching is performed to form the opening 2c of the transparent short-circuit prevention layer 2a on the unit electrode 101U ′ and the terminal portion 101F. Can do.
　図１０（ｃ）は、センス電極ライン１０１Ｓおよびドライブ電極ライン１０１Ｄの各々と各々の端子部１０１Ｆとを電気的に接続するための配線１０２を形成する工程（第７工程）を示しており、本実施の形態においては、端子部１０１Ｆ上に形成された透明短絡防止層２ａを除去する工程がないため、図１０（ｂ）で説明したように、端子部１０１Ｆ上に形成された開口部２ｃ・１０３ｃを介して、端子部１０１Ｆと配線１０２とが電気的に接続される。 FIG. 10C shows a step (seventh step) of forming a wiring 102 for electrically connecting each of the sense electrode line 101S and the drive electrode line 101D to each terminal portion 101F. In the embodiment, since there is no step of removing the transparent short-circuit prevention layer 2a formed on the terminal portion 101F, as described with reference to FIG. 10B, the opening portion 2c formed on the terminal portion 101F. The terminal portion 101F and the wiring 102 are electrically connected via 103c.
　そして、図１０（ｄ）は、センス電極ライン１０１Ｓにおける隣接するユニット電極１０１Ｕ′同士を、透明短絡防止層２ａおよび層間絶縁膜１０３に形成された開口部２ｃ・１０３ｃを介して電気的に接続するブリッジ電極１０４を形成する工程（第８工程）を示しており、図１０（ｅ）は、配線形成領域Ｒ２の外側の一端部に形成された端子部１０１Ｆを、外部と電気的に接続するため露出されている箇所以外の全面に、保護膜１０５を形成する工程を示している。 10D, the adjacent unit electrodes 101U ′ in the sense electrode line 101S are electrically connected to each other through the openings 2c and 103c formed in the transparent short-circuit prevention layer 2a and the interlayer insulating film 103. FIG. 10E shows a step of forming the bridge electrode 104 (eighth step). FIG. 10E is for electrically connecting the terminal portion 101F formed at one end portion outside the wiring formation region R2 to the outside. The process of forming the protective film 105 on the entire surface other than the exposed portion is shown.
　上述したタッチパネル１ｂにおいては、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層上には透明短絡防止層２ａとともに、層間絶縁膜１０３が形成されているので、ユニット電極１０１Ｕ′とユニット電極１０１Ｕと接続部１０１Ｃと端子部１０１Ｆとの各々の形成層と層間絶縁膜１０３との間の形成される段差は比較的大きくなる。 In the touch panel 1b described above, since the interlayer insulating film 103 is formed together with the transparent short-circuit preventing layer 2a on each of the formation layers of the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F, The steps formed between the formation layers of the unit electrode 101U ′, the unit electrode 101U, the connection portion 101C, and the terminal portion 101F and the interlayer insulating film 103 are relatively large.
　したがって、ブリッジ電極１０４の形成工程や配線１０２の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記比較的大きい段差部が存在するので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるセンス電極ライン１０１Ｓのユニット電極１０１Ｕ′とドライブ電極ライン１０１Ｄのユニット電極１０１Ｕとの間の短絡（ショート）を防止できる。 Therefore, in the formation process of the bridge electrode 104 and the formation process of the wiring 102, the conductive film is not properly removed, and even if a film residue of the conductive film occurs, the relatively large step portion exists. In the step portion, the remaining film of the conductive film is cut (disconnected), so that a short circuit between the unit electrode 101U ′ of the sense electrode line 101S and the unit electrode 101U of the drive electrode line 101D that may occur in the manufacturing process. (Short circuit) can be prevented.
　また、上述したタッチパネル１ｂにおいては、上記比較的大きい段差部が存在するので、ブリッジ電極１０４の形成工程や配線１０２の形成工程を、液滴吐出法などのような特殊な方法で行う必要がない。 Further, in the touch panel 1b described above, since the relatively large step portion exists, it is not necessary to perform the bridge electrode 104 formation process and the wiring 102 formation process by a special method such as a droplet discharge method. .
　したがって、ブリッジ電極１０４や配線１０２の導電性膜の種類や膜厚や膜質の選択の自由度が高いので、タッチパネル１ｂに備えられた導電性膜の低抵抗化や高透過率化を実現できる。 Therefore, since the degree of freedom in selecting the type, film thickness, and film quality of the conductive film of the bridge electrode 104 and the wiring 102 is high, it is possible to realize low resistance and high transmittance of the conductive film provided in the touch panel 1b.
　よって、タッチ検出性能が高く、高透過率を有するタッチパネル１ｂを実現することができる。 Therefore, the touch panel 1b having high touch detection performance and high transmittance can be realized.
　本発明のタッチパネルは、上記第１電極と上記第２電極との交差部分においては、上記第１接続部が上記第２接続部上に、上記絶縁層と上記透明短絡防止層とを介して形成されており、上記透明短絡防止層の開口部は、上記第１電極のユニット電極上に形成されており、上記各々の第１電極における隣接するユニット電極同士は、上記透明短絡防止層の開口部を介して形成された上記第１接続部によって電気的に接続されていることが好ましい。 In the touch panel of the present invention, at the intersection of the first electrode and the second electrode, the first connection part is formed on the second connection part via the insulating layer and the transparent short-circuit prevention layer. The opening of the transparent short-circuit prevention layer is formed on the unit electrode of the first electrode, and the adjacent unit electrodes in the first electrodes are openings of the transparent short-circuit prevention layer. It is preferable that they are electrically connected by the first connecting portion formed via the.
　上記構成によれば、タッチパネルに備えられる上記各々の第１電極における隣接するユニット電極同士を電気的に接続する上記第１接続部の形成工程や配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 According to the above configuration, the conductive film is appropriately removed in the first connection portion forming step and the wiring forming step for electrically connecting adjacent unit electrodes in each of the first electrodes provided in the touch panel. Even if a film residue of the conductive film occurs, the transparent short-circuit preventing layer, the unit electrode of the first electrode, the unit electrode of the second electrode, and the formation layer of each of the second connection portions, In this step portion, the remaining film of the conductive film is cut (disconnected), and thus a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process. (Short circuit) can be prevented.
　本発明のタッチパネルは、上記第１電極と上記第２電極との交差部分においては、上記第２接続部が上記第１接続部上に、上記絶縁層を介して形成されており、上記各々の第１電極における隣接するユニット電極は、上記第１接続部上に接するように形成されていることが好ましい。 In the touch panel of the present invention, at the intersection of the first electrode and the second electrode, the second connection part is formed on the first connection part via the insulating layer, The adjacent unit electrodes in the first electrode are preferably formed so as to be in contact with the first connection portion.
　上記構成によれば、タッチパネルに備えられる配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記透明短絡防止層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と、の間には、段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 According to the above configuration, even when the conductive film is not properly removed in the wiring forming process provided in the touch panel and the remaining film of the conductive film is generated, the transparent short-circuit preventing layer and the first electrode are formed. Since there is a step between the unit electrode, the unit electrode of the second electrode, and each of the formation layers of the second connection portion, the remaining film of the conductive film is cut off at this step portion ( Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
　本発明のタッチパネルは、上記第１電極と上記第２電極との交差部分においては、上記第１接続部が上記第２接続部上に、上記絶縁層と上記透明短絡防止層とを介して形成されており、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には、上記透明短絡防止層と上記絶縁層とが形成されており、上記透明短絡防止層の開口部と上記絶縁層の開口部とは、平面視において少なくとも一部で重なるとともに、上記第１電極のユニット電極上に形成されており、上記各々の第１電極における隣接するユニット電極同士は、上記透明短絡防止層の開口部と上記絶縁層の開口部とを介して形成された上記第１接続部によって電気的に接続されていることが好ましい。 In the touch panel of the present invention, at the intersection of the first electrode and the second electrode, the first connection part is formed on the second connection part via the insulating layer and the transparent short-circuit prevention layer. The transparent short-circuit preventing layer and the insulating layer are formed on the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, respectively. The opening of the transparent short-circuit prevention layer and the opening of the insulating layer overlap at least partially in plan view, and are formed on the unit electrode of the first electrode. It is preferable that adjacent unit electrodes are electrically connected by the first connection part formed through the opening of the transparent short-circuit prevention layer and the opening of the insulating layer.
　上記構成によれば、タッチパネルに備えられた導電性膜である上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には上記透明短絡防止層とともに、絶縁層が形成されているので、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と上記絶縁層との間の段差は比較的大きくなる。 According to the above configuration, the transparent short circuit prevention is provided on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, which is a conductive film provided in the touch panel. Since the insulating layer is formed together with the layer, the step difference between the forming layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connecting portion and the insulating layer is compared. Become bigger.
　したがって、タッチパネルに備えられる他の導電性膜の形成工程である、例えば、上記各々の第１電極における隣接するユニット電極同士を電気的に接続する上記第１接続部の形成工程や配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記絶縁層と、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層と、の間には、比較的大きい段差が生じるので、この段差部分においては、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 Therefore, it is a process for forming another conductive film provided in the touch panel, for example, a process for forming the first connection part or a process for forming a wiring for electrically connecting adjacent unit electrodes in each of the first electrodes. In this case, even if the conductive film is not properly removed and the remaining film of the conductive film is generated, the insulating layer, the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion Since there is a relatively large step between each of the forming layers, the remaining portion of the conductive film is cut (disconnected) at this step portion, so that the touch panel that may occur in the manufacturing process It is possible to prevent a short circuit between the conductive films provided in the.
　本発明のタッチパネルおいては、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層は、平面視において、上記透明短絡防止層の端部より０．１μｍ以上内側に形成されていることが好ましい。 In the touch panel of the present invention, each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is from an end of the transparent short-circuit prevention layer in a plan view. It is preferable to be formed inside 0.1 μm or more.
　上記構成によれば、上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上に形成される上記透明短絡防止層を、より完全なひさし形状に形成することができ、タッチパネルに備えられる他の導電性膜の形成工程である、例えば、上記各々の第１電極における隣接するユニット電極同士を電気的に接続する上記第１接続部の形成工程や配線の形成工程において、導電性膜が適切に除去されず、導電性膜の膜残りが発生しても、上記ひさし形状の段差部によって、上記導電性膜の膜残りが切断（断線）されるので、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できる。 According to the said structure, the said transparent short-circuit prevention layer formed on each formation layer of the unit electrode of the said 1st electrode, the unit electrode of the said 2nd electrode, and the said 2nd connection part is more complete eaves shape For example, the step of forming the first connection portion that electrically connects adjacent unit electrodes in each of the first electrodes is a step of forming another conductive film included in the touch panel. Even when the conductive film is not properly removed in the wiring formation process and the film residue of the conductive film is generated, the film residue of the conductive film is cut (disconnected) by the eaves-shaped stepped portion. Therefore, it is possible to prevent a short circuit between the conductive films provided in the touch panel that may occur in the manufacturing process.
　本発明のタッチパネルおいては、上記透明短絡防止層は、シリコン窒化膜、シリコン酸化膜またはシリコン窒化酸化膜の何れかで形成されていることが好ましい。 In the touch panel of the present invention, the transparent short-circuit prevention layer is preferably formed of any one of a silicon nitride film, a silicon oxide film, and a silicon oxynitride film.
　上記構成によれば、より膜厚の薄い透明短絡防止層を形成することができる。 According to the above configuration, it is possible to form a transparent short-circuit prevention layer with a thinner film thickness.
　本発明の表示装置おいては、上記表示パネルは、液晶層を備えた液晶パネルであってもよい。 In the display device of the present invention, the display panel may be a liquid crystal panel including a liquid crystal layer.
　本発明の表示装置おいては、上記表示パネルは、有機ＥＬ層を備えた有機ＥＬパネルであってもよい。 In the display device of the present invention, the display panel may be an organic EL panel including an organic EL layer.
　上記構成によれば、製造工程において発生しうるタッチパネルに備えられた導電性膜間の短絡（ショート）を防止できるとともに、タッチ検出性能が高く、高透過率を有するタッチパネルを備えた表示装置を実現できる。 According to the above configuration, it is possible to prevent a short circuit between the conductive films included in the touch panel that may occur in the manufacturing process, and to realize a display device including a touch panel with high touch detection performance and high transmittance. it can.
　本発明のタッチパネルの製造方法においては、上記透明短絡防止層は、感光性を有する透明樹脂層であり、上記第３工程において、上記透明短絡防止層のパターニングは、ハーフトーン露光を含む露光および現像によって行われ、上記第５工程においては、アッシングによって、上記透明短絡防止層に開口部を形成することが好ましい。 In the touch panel manufacturing method of the present invention, the transparent short-circuit prevention layer is a transparent resin layer having photosensitivity, and in the third step, the patterning of the transparent short-circuit prevention layer includes exposure and development including halftone exposure. In the fifth step, it is preferable to form an opening in the transparent short-circuit prevention layer by ashing.
　上記方法によれば、上記透明短絡防止層として、感光性を有する透明樹脂層を用いることができる。 According to the above method, a transparent resin layer having photosensitivity can be used as the transparent short circuit preventing layer.
　本発明は上記した各実施の形態に限定されるものではなく、請求項に示した範囲で種々の変更が可能であり、異なる実施の形態にそれぞれ開示された技術的手段を適宜組み合わせて得られる実施の形態についても本発明の技術的範囲に含まれる。 The present invention is not limited to the above-described embodiments, and various modifications are possible within the scope shown in the claims, and the present invention can be obtained by appropriately combining technical means disclosed in different embodiments. Embodiments are also included in the technical scope of the present invention.
　本発明は、タッチパネルおよびタッチパネルを備えた表示装置に好適に用いることができる。 The present invention can be suitably used for a touch panel and a display device including the touch panel.
　１、１ａ、１ｂ、６１　タッチパネル
　２、２ａ　　　　　　　透明短絡防止層
　２ｃ　　　　　　　　　開口部
　１０　　　　　　　　　液晶表示装置（表示装置）
　２０　　　　　　　　　液晶表示装置（表示装置）
　３０　　　　　　　　　液晶表示装置（表示装置）
　１０１Ｄ　　　　　　　ドライブ電極ライン（第２電極）
　１０１Ｓ　　　　　　　センス電極ライン（第１電極）
　１０１Ｕ、１０１Ｕ′　ユニット電極
　１０１Ｃ　　　　　　　接続部（第２接続部）
　１０１Ｅ　　　　　　　接続電極
　１０１Ｆ　　　　　　　端子部
　１０２　　　　　　　　配線
　１０３　　　　　　　　層間絶縁膜（絶縁膜）
　１０３ｃ　　　　　　　開口部
　１０４　　　　　　　　第１のブリッジ電極（第１接続部）
　１０５　　　　　　　　保護膜
　１０６　　　　　　　　基板（絶縁基板） 1, 1a, 1b, 61 Touch panel 2, 2a Transparent short-circuit prevention layer 2c Opening 10 Liquid crystal display device (display device)
20 Liquid crystal display device (display device)
30 Liquid crystal display device (display device)
101D Drive electrode line (second electrode)
101S sense electrode line (first electrode)
101U, 101U ′ unit electrode 101C connection part (second connection part)
101E Connection electrode 101F Terminal portion 102 Wiring 103 Interlayer insulating film (insulating film)
103c opening 104 first bridge electrode (first connecting portion)
105 Protective film 106 Substrate (insulating substrate)

Claims (13)

  1. 　第１の方向に配列された複数の第１電極と、上記第１の方向とは異なる第２の方向に配列された複数の第２電極とが、互いに交差するように絶縁基板上に形成されたタッチパネルであって、
    　上記複数の第１電極同士および上記複数の第２電極同士は、電気的に分離されており、
    　上記第１電極および上記第２電極の各々は、複数の所定形状のユニット電極が電気的に接続されて形成されており、
    　上記第１電極のユニット電極と上記第２電極のユニット電極とは、平面視において重ならず、互いに隣接するように、同一層によって同一平面上に形成され、
    　上記各々の第１電極における隣接するユニット電極同士を電気的に接続する、上記第１電極のユニット電極および上記第２電極のユニット電極とは異なる層で形成された第１接続部と、
    　上記各々の第２電極における隣接するユニット電極同士を電気的に接続する、上記第１電極のユニット電極および上記第２電極のユニット電極と同一層によって形成された第２接続部と、を備え、
    　上記第１電極と上記第２電極との交差部分において、上記第１接続部および上記第２接続部の何れか一方は、他方上に少なくとも絶縁層を介して形成されており、
    　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には透明短絡防止層が形成されており、
    　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層は、平面視において、上記透明短絡防止層の内側に形成されていることを特徴とするタッチパネル。     A plurality of first electrodes arranged in a first direction and a plurality of second electrodes arranged in a second direction different from the first direction are formed on the insulating substrate so as to cross each other. Touch panel,
    The plurality of first electrodes and the plurality of second electrodes are electrically separated,
    Each of the first electrode and the second electrode is formed by electrically connecting a plurality of unit electrodes of a predetermined shape,
    The unit electrode of the first electrode and the unit electrode of the second electrode are formed on the same plane by the same layer so as not to overlap each other in plan view,
    A first connection portion formed of a layer different from the unit electrode of the first electrode and the unit electrode of the second electrode, which electrically connect adjacent unit electrodes in each of the first electrodes;
    A unit electrode of the first electrode and a second connection part formed by the same layer as the unit electrode of the second electrode, which electrically connect adjacent unit electrodes in each of the second electrodes;
    At the intersection of the first electrode and the second electrode, one of the first connection part and the second connection part is formed on the other side through at least an insulating layer,
    A transparent short-circuit preventing layer is formed on each of the formation layers of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion,
    Each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is formed inside the transparent short-circuit prevention layer in a plan view. Touch panel.
  2. 　上記第１電極と上記第２電極との交差部分においては、上記第１接続部が上記第２接続部上に、上記絶縁層と上記透明短絡防止層とを介して形成されており、
    　上記透明短絡防止層の開口部は、上記第１電極のユニット電極上に形成されており、
    　上記各々の第１電極における隣接するユニット電極同士は、上記透明短絡防止層の開口部を介して形成された上記第１接続部によって電気的に接続されていることを特徴とする請求項１に記載のタッチパネル。     At the intersection of the first electrode and the second electrode, the first connection part is formed on the second connection part via the insulating layer and the transparent short-circuit prevention layer,
    The opening of the transparent short-circuit prevention layer is formed on the unit electrode of the first electrode,
    The adjacent unit electrodes in each of the first electrodes are electrically connected by the first connection portion formed through the opening of the transparent short-circuit prevention layer. The touch panel described.
  3. 　上記第１電極と上記第２電極との交差部分においては、上記第２接続部が上記第１接続部上に、上記絶縁層を介して形成されており、
    　上記各々の第１電極における隣接するユニット電極は、上記第１接続部上に接するように形成されていることを特徴とする請求項１に記載のタッチパネル。     At the intersection of the first electrode and the second electrode, the second connection part is formed on the first connection part via the insulating layer,
    2. The touch panel according to claim 1, wherein adjacent unit electrodes in each of the first electrodes are formed so as to be in contact with the first connection portion.
  4. 　上記第１電極と上記第２電極との交差部分においては、上記第１接続部が上記第２接続部上に、上記絶縁層と上記透明短絡防止層とを介して形成されており、
    　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層上には、上記透明短絡防止層と上記絶縁層とが形成されており、
    　上記透明短絡防止層の開口部と上記絶縁層の開口部とは、平面視において少なくとも一部で重なるとともに、上記第１電極のユニット電極上に形成されており、
    　上記各々の第１電極における隣接するユニット電極同士は、上記透明短絡防止層の開口部と上記絶縁層の開口部とを介して形成された上記第１接続部によって電気的に接続されていることを特徴とする請求項１に記載のタッチパネル。     At the intersection of the first electrode and the second electrode, the first connection part is formed on the second connection part via the insulating layer and the transparent short-circuit prevention layer,
    On each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion, the transparent short-circuit prevention layer and the insulating layer are formed,
    The opening of the transparent short-circuit prevention layer and the opening of the insulating layer overlap at least partially in plan view, and are formed on the unit electrode of the first electrode,
    Adjacent unit electrodes in each of the first electrodes are electrically connected by the first connection portion formed through the opening of the transparent short-circuit prevention layer and the opening of the insulating layer. The touch panel according to claim 1.
  5. 　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２接続部との各々の形成層は、平面視において、上記透明短絡防止層の端部より０．１μｍ以上内側に形成されていることを特徴とする請求項１から４の何れか１項に記載のタッチパネル。 Each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the second connection portion is formed 0.1 μm or more inward from the end of the transparent short-circuit prevention layer in a plan view. The touch panel according to any one of claims 1 to 4, wherein the touch panel is provided.
  6. 　上記透明短絡防止層は、シリコン窒化膜、シリコン酸化膜またはシリコン窒化酸化膜の何れかで形成されていることを特徴とする請求項１から５の何れか１項に記載のタッチパネル。 6. The touch panel according to claim 1, wherein the transparent short-circuit prevention layer is formed of any one of a silicon nitride film, a silicon oxide film, and a silicon nitride oxide film.
  7. 　請求項１から６の何れか１項に記載のタッチパネルと、表示パネルと、を備えていることを特徴とする表示装置。 A display device comprising the touch panel according to any one of claims 1 to 6 and a display panel.
  8. 　上記表示パネルは、液晶層を備えた液晶パネルであることを特徴とする請求項７に記載の表示装置。 The display device according to claim 7, wherein the display panel is a liquid crystal panel including a liquid crystal layer.
  9. 　上記表示パネルは、有機ＥＬ層を備えた有機ＥＬパネルであることを特徴とする請求項７に記載の表示装置。 The display device according to claim 7, wherein the display panel is an organic EL panel including an organic EL layer.
  10. 　絶縁基板上に互いに交差するとともに、各々の配線を介して各々の端子部と電気的に接続された、第１の方向に配列された複数の第１電極と上記第１の方向とは異なる第２の方向に配列された複数の第２電極とを備えたタッチパネルの製造方法であって、
    　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部と上記端子部とを形成する導電層を全面に形成する第１工程と、
    　上記導電層上の全面に透明短絡防止層を形成する第２工程と、
    　上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と端子部との形状にパターニングする第３工程と、
    　上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部の各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第４工程と、
    　上記第１電極のユニット電極上および上記端子部上に形成された透明短絡防止層に、上記第１電極のユニット電極と上記端子部とが露出するように開口部を形成する第５工程と、
    　上記第１電極および上記第２電極の各々と上記各々の端子部とを、上記端子部上に形成された上記透明短絡防止層の開口部を介して、電気的に接続するための配線を形成する第６工程と、
    　上記第１電極と上記第２電極との交差部分において、上記接続部と、上記接続部上に形成された上記透明短絡防止層と、を覆うように絶縁層を形成する第７工程と、
    　上記各々の第１電極における隣接するユニット電極同士を、上記第１電極のユニット電極上に形成された上記透明短絡防止層の開口部を介して、電気的に接続するブリッジ電極を形成する第８工程と、を含むことを特徴とするタッチパネルの製造方法。     A plurality of first electrodes arranged in the first direction and intersecting each other on the insulating substrate and electrically connected to the respective terminal portions through the respective wirings are different from the first direction. A method for manufacturing a touch panel comprising a plurality of second electrodes arranged in two directions,
    A conductive layer is formed on the entire surface to form a connection portion for electrically connecting unit electrodes of the first electrode, a unit electrode of the second electrode, and adjacent unit electrodes of the second electrode, and the terminal portion. 1 process,
    A second step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer;
    A third step of patterning the transparent short-circuit prevention layer into the shape of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion;
    Using the patterned transparent short-circuit prevention layer as a mask, the conductive layer is etched, and the formation layer of each of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion is planarized. In view, a fourth step of forming inside the transparent short-circuit prevention layer,
    A fifth step of forming an opening in the transparent short-circuit prevention layer formed on the unit electrode of the first electrode and on the terminal portion so that the unit electrode of the first electrode and the terminal portion are exposed;
    A wiring for electrically connecting each of the first electrode and the second electrode and each of the terminal portions through the opening of the transparent short-circuit preventing layer formed on the terminal portion is formed. And a sixth step to
    A seventh step of forming an insulating layer so as to cover the connection portion and the transparent short-circuit prevention layer formed on the connection portion at the intersection of the first electrode and the second electrode;
    Eighth forming a bridge electrode for electrically connecting adjacent unit electrodes in each of the first electrodes through an opening of the transparent short-circuit prevention layer formed on the unit electrode of the first electrode. And a process for producing a touch panel.
  11. 　絶縁基板上に互いに交差するとともに、各々の配線を介して各々の端子部と電気的に接続された、第１の方向に配列された複数の第１電極と上記第１の方向とは異なる第２の方向に配列された複数の第２電極とを備えたタッチパネルの製造方法であって、
    　上記各々の第１電極における隣接するユニット電極同士を、電気的に接続するブリッジ電極と上記端子部とを形成する第１工程と、
    　上記第１電極と上記第２電極との交差部分において、上記ブリッジ電極上に絶縁層を形成する第２工程と、
    　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部とを形成する導電層を全面に形成する第３工程と、
    　上記導電層上の全面に透明短絡防止層を形成する第４工程と、
    　上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との形状にパターニングするとともに、平面視において、上記ブリッジ電極の両端部と上記透明短絡防止層とが重なるように形成する第５工程と、
    　上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部との各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第６工程と、
    　上記第１電極および上記第２電極の各々と上記各々の端子部とを電気的に接続するための配線を形成する第７工程と、を含むことを特徴とするタッチパネルの製造方法。     A plurality of first electrodes arranged in the first direction and intersecting each other on the insulating substrate and electrically connected to the respective terminal portions through the respective wirings are different from the first direction. A method for manufacturing a touch panel comprising a plurality of second electrodes arranged in two directions,
    A first step of forming a bridge electrode for electrically connecting adjacent unit electrodes in each of the first electrodes and the terminal portion;
    A second step of forming an insulating layer on the bridge electrode at the intersection of the first electrode and the second electrode;
    A third step of forming a conductive layer on the entire surface to form a unit electrode of the first electrode, a unit electrode of the second electrode, and a connection portion for electrically connecting adjacent unit electrodes in the second electrode;
    A fourth step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer;
    The transparent short-circuit prevention layer is patterned into the shape of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion, and in plan view, both ends of the bridge electrode and the transparent short-circuit prevention layer And a fifth step of forming so as to overlap,
    Using the patterned transparent short-circuit prevention layer as a mask, the conductive layer is etched, and each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, and the connection portion is viewed in a plan view. A sixth step of forming inside the transparent short-circuit prevention layer;
    And a seventh step of forming a wiring for electrically connecting each of the first electrode and the second electrode to each of the terminal portions.
  12. 　絶縁基板上に互いに交差するとともに、各々の配線を介して各々の端子部と電気的に接続された、第１の方向に配列された複数の第１電極と上記第１の方向とは異なる第２の方向に配列された複数の第２電極とを備えたタッチパネルの製造方法であって、
    　上記第１電極のユニット電極と上記第２電極のユニット電極と上記第２電極における隣接するユニット電極同士を電気的に接続する接続部と上記端子部とを形成する導電層を全面に形成する第１工程と、
    　上記導電層上の全面に透明短絡防止層を形成する第２工程と、
    　上記透明短絡防止層を、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部との形状にパターニングする第３工程と、
    　上記パターニングされた透明短絡防止層をマスクとして、上記導電層をエッチングし、上記第１電極のユニット電極と上記第２電極のユニット電極と上記接続部と上記端子部との各々の形成層を、平面視において、上記透明短絡防止層の内側に形成する第４工程と、
    　全面に絶縁層を形成する第５工程と、
    　上記第１電極のユニット電極上と上記端子部上とに形成された上記透明短絡防止層および上記絶縁層に、上記第１電極のユニット電極と上記端子部とが露出するように開口部を形成する第６工程と、
    　上記第１電極および上記第２電極の各々と上記各々の端子部とを、上記端子部上に形成された上記開口部を介して、電気的に接続するための配線を形成する第７工程と、
    　上記各々の第１電極における隣接するユニット電極同士を、上記第１電極のユニット電極上に形成された上記開口部を介して、電気的に接続するブリッジ電極を形成する第８工程と、を含むことを特徴とするタッチパネルの製造方法。     A plurality of first electrodes arranged in the first direction and intersecting each other on the insulating substrate and electrically connected to the respective terminal portions through the respective wirings are different from the first direction. A method for manufacturing a touch panel comprising a plurality of second electrodes arranged in two directions,
    A conductive layer is formed on the entire surface to form a connection portion for electrically connecting unit electrodes of the first electrode, a unit electrode of the second electrode, and adjacent unit electrodes of the second electrode, and the terminal portion. 1 process,
    A second step of forming a transparent short-circuit prevention layer on the entire surface of the conductive layer;
    A third step of patterning the transparent short-circuit prevention layer into the shape of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion;
    Using the patterned transparent short-circuit prevention layer as a mask, the conductive layer is etched, and each formation layer of the unit electrode of the first electrode, the unit electrode of the second electrode, the connection portion, and the terminal portion is formed. A fourth step of forming the transparent short-circuit prevention layer inside in the plan view;
    A fifth step of forming an insulating layer on the entire surface;
    An opening is formed in the transparent short-circuit prevention layer and the insulating layer formed on the unit electrode of the first electrode and the terminal portion so that the unit electrode of the first electrode and the terminal portion are exposed. And a sixth step to
    A seventh step of forming a wiring for electrically connecting each of the first electrode and the second electrode and each of the terminal portions through the opening formed on the terminal portion; ,
    And an eighth step of forming a bridge electrode for electrically connecting adjacent unit electrodes in each of the first electrodes through the opening formed on the unit electrode of the first electrode. A manufacturing method of a touch panel characterized by the above.
  13. 　上記透明短絡防止層は、感光性を有する透明樹脂層であり、
    　上記第３工程において、上記透明短絡防止層のパターニングは、ハーフトーン露光を含む露光および現像によって行われ、
    　上記第５工程においては、アッシングによって、上記透明短絡防止層に開口部を形成することを特徴とする請求項１０に記載のタッチパネルの製造方法。     The transparent short-circuit prevention layer is a transparent resin layer having photosensitivity,
    In the third step, the patterning of the transparent short-circuit prevention layer is performed by exposure and development including halftone exposure,
    In the said 5th process, an opening part is formed in the said transparent short circuit prevention layer by ashing, The manufacturing method of the touchscreen of Claim 10 characterized by the above-mentioned.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011013279A1 (en) * 2009-07-31 2011-02-03 シャープ株式会社 Electrode substrate, method for manufacturing electrode substrate, and image display device
JP2011128674A (en) * 2009-12-15 2011-06-30 Sony Corp Electrostatic capacitance-type input device and method for manufacturing the same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011013279A1 (en) * 2009-07-31 2011-02-03 シャープ株式会社 Electrode substrate, method for manufacturing electrode substrate, and image display device
JP2011128674A (en) * 2009-12-15 2011-06-30 Sony Corp Electrostatic capacitance-type input device and method for manufacturing the same

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