WO2013031346A1

WO2013031346A1 - Organic electroluminescence element, display device, and illumination device

Info

Publication number: WO2013031346A1
Application number: PCT/JP2012/065691
Authority: WO
Inventors: みゆき岡庭; 和博及川
Original assignee: コニカミノルタホールディングス株式会社
Priority date: 2011-08-29
Filing date: 2012-06-20
Publication date: 2013-03-07
Also published as: JPWO2013031346A1

Abstract

An organic EL element is provided with: a support substrate (1); a positive electrode (2) and a negative electrode (8) which are formed on the support substrate (1); a light-emitting layer (5) formed between the positive electrode (2) and the negative electrode (8); a hole transport layer (4) formed between the light-emitting layer (5) and the positive electrode (2); and an electron transport layer (6) formed between the light-emitting layer (5) and the negative electrode (8). Both of the following conditional equations (i) and (ii) are satisfied: (i) Δρ(EM-HT)=(ρEM-ρHT)≥0.03 and (ii) Δρ(EM-ET)=(ρEM-ρET)≥0.03 (wherein ρEM represents the film density of the light-emitting layer (5), ρHT represents the film density of the hole transport layer (4), ρET represents the film density of the electron transport layer (6), Δρ(EM-HT) represents the difference between the film density of the light-emitting layer (5) and the film density of the hole transport layer (4), and Δρ(EM-ET) represents the difference between the film density of the light-emitting layer (5) and the film density of the electron transport layer (6)).

Description

ORGANIC ELECTROLUMINESCENT ELEMENT, DISPLAY DEVICE AND LIGHTING DEVICE

The present invention relates to an organic electroluminescence element, and more particularly to an organic electroluminescence element excellent in luminous efficiency, luminous lifetime and luminance unevenness, and a display device and an illumination device using the same.

In recent years, organic electroluminescence elements using organic substances (hereinafter, abbreviated as “organic EL elements” where appropriate) are promising for use as solid light-emitting inexpensive large-area full-color display elements and writing light source arrays. Research and development is actively underway.
The organic EL element is composed of an organic functional layer (single layer portion or multilayer portion) having a thickness of only about 0.1 μm containing an organic light emitting material between a pair of anode and cathode formed on a film. It is a thin film type all solid state device. When a relatively low voltage of about 2 to 20 V is applied to such an organic EL element, electrons are injected from the cathode and holes are injected from the anode into the organic compound layer. It is known that emission is obtained by releasing energy as light when the electrons and holes recombine in the light emitting layer and the energy level returns from the conduction band to the valence band. This technology is expected as a flat display and lighting.

In addition, recently discovered organic EL devices that use phosphorescence can realize a luminous efficiency that is approximately four times that of previous methods that use fluorescence. Research and development of organic functional layer layers and electrodes are conducted all over the world. In particular, as one of the measures to prevent global warming, application to lighting fixtures that occupy much of human energy consumption has begun to be studied. There are many attempts to reduce costs.
As a manufacturing method of these organic EL elements, there are a vacuum deposition method, a wet process (coating method) and the like. Among these manufacturing methods, the wet process (spin coating method, casting method, ink jet method, spray method, printing method, A manufacturing method in the slot type coater method is drawing attention (see, for example, Patent Document 1).

In a general organic EL element, an anode made of ITO (Indium Tin Oxide), a film made with an aqueous solvent (hole injection layer), a light emitting layer, an alkali metal such as LiF, and an alkali are formed on a substrate. An electron injection layer containing an earth metal and a cathode made of a metal thin film such as Al are laminated in this order.
In such a system, the organic EL layer (light-emitting layer) produced by coating was used in the coating process from Li atoms and ions that were chemically unstable from the peripheral layer of the light-emitting layer, impurities contained in the material, and further. The residual solvent diffuses, which causes a decrease in the light emission efficiency of the organic EL element itself and a shortened light emission lifetime. In addition, the light emitting layer manufactured by the coating process has a problem that the film thickness is not uniform compared to the light emitting layer formed by using the vapor deposition process, and luminance unevenness is likely to occur.
As these causes, it is considered that the film formed using the coating process is a coarse film as compared with the film formed using the vapor deposition process, and is easily affected by the diffusion material from the peripheral layer. Also in the film production, it is affected by the physical properties of the coating liquid, the coating process and the drying process, and it is very difficult to produce a uniform film particularly in a large area.

For such a problem, Patent Document 2 discloses a method for increasing the density of a film. Specifically, a method is disclosed in which the entire organic EL element is compressed with a laminate material to uniformly pressurize the film to increase the film density and raise the rough film formed by coating to the vapor deposition level. However, the method of Patent Document 2 places a load on the coated / dried film, tends to cause leaks, and has little effect on the residual solvent.
On the other hand, Patent Document 3 discloses a method of suppressing luminance unevenness. More specifically, a method of providing a partition and reducing luminance unevenness by making the film surface uniform by an ink jet method / nozzle coating method is disclosed (Patent Document 3). However, in the method of Patent Document 3, the effect of suppressing luminance unevenness is insufficient for a large area.

JP-A-6-33048 JP 2007-128799 A JP 2011-60518 A

On the other hand, when the thickness of the electron injection layer composed of a chemically unstable material is increased to about 5 to 10 nm, the lifetime of the organic EL element, that is, the reliability is lowered. The problem will arise.
On the other surface side of the organic EL layer (light emitting layer) formed by the coating method, an anode and a hole injection layer made of a transparent conductive material such as ITO (Indium Tin Oxide) are generally formed. The Since the light emitting layer formed using the coating method is a rough film, the lifetime of the light emitting layer may be reduced by indium atoms diffused from the anode to the light emitting layer.
As described above, various problems occur in the organic EL element mainly due to the fact that the light emitting layer formed using the coating method is a rough film.

Accordingly, a main object of the present invention is to provide an organic electroluminescence element excellent in luminous efficiency, light emission lifetime and luminance unevenness, and another object of the present invention is a display device using the organic electroluminescence element and The object is to provide a lighting device.

In order to solve the above problems, according to the present invention,
A substrate,
An anode and a cathode formed on the substrate;
A light emitting layer formed between the anode and the cathode;
A hole transport layer formed between the light emitting layer and the anode;
An electron transport layer formed between the light emitting layer and the cathode;
In an organic electroluminescence device comprising:
The film density of the light emitting layer is ρEM, the film density of the hole transport layer is ρHT, the film density of the electron transport layer is ρET, and the film density of the light emitting layer and the film density of the hole transport layer are When the difference between Δρ (EM−HT) and the difference between the film density of the light emitting layer and the film density of the electron transport layer is Δρ (EM−ET), both conditional expressions (i) and (ii) An organic electroluminescence device characterized by satisfying the above is provided.
Δρ (EM−HT) = (ρEM−ρHT) ≧ 0.03 (i)
Δρ (EM−ET) = (ρEM−ρET) ≧ 0.03 (ii)

According to the present invention, it is possible to improve the light emission efficiency and the light emission lifetime, and to suppress the occurrence of luminance unevenness.

It is a schematic sectional drawing which shows an example of a structure of an organic electroluminescent element.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

<< Configuration of organic EL element >>
As shown in FIG. 1, an organic electroluminescence element 100 (hereinafter also referred to as an organic EL element) according to a preferred embodiment of the present invention has a flexible support substrate 1. An anode 2 is formed on the flexible support substrate 1, an organic functional layer 20 is formed on the anode 2, and a cathode 8 is formed on the organic functional layer 20.
The organic functional layer 20 refers to each layer constituting the organic electroluminescence element 100 provided between the anode 2 and the cathode 8.
The organic functional layer 20 includes, for example, a hole injection layer 3, a hole transport layer 4, a light emitting layer 5, an electron transport layer 6, an electron injection layer 7, and in addition, a hole block layer, an electron block layer, and the like. May be included.
The anode 2, the organic functional layer 20, and the cathode 8 on the flexible support substrate 1 are sealed with a flexible sealing member 10 through a sealing adhesive 9.

In addition, these layer structures (refer FIG. 1) of the organic electroluminescent element 100 show only the preferable specific example, and this invention is not limited to these. For example, the organic EL device 100 according to the present invention may have a layer structure of (i) to (viii).
(I) Flexible support substrate / anode / light emitting layer / electron transport layer / cathode / thermal conductive layer / sealing adhesive / sealing member (ii) flexible support substrate / anode / hole transport layer / light emission Layer / electron transport layer / cathode / heat conducting layer / sealing adhesive / sealing member (iii) flexible support substrate / anode / hole transport layer / light emitting layer / hole block layer / electron transport layer / cathode / Heat conduction layer / adhesive for sealing / sealing member (iv) flexible support substrate / anode / hole transport layer / light emitting layer / hole block layer / electron transport layer / cathode buffer layer / cathode / heat conduction Layer / adhesive for sealing / sealing member (v) flexible support substrate / anode / anode buffer layer / hole transport layer / light emitting layer / hole block layer / electron transport layer / cathode buffer layer / cathode / heat Conductive layer / adhesive for sealing / sealing member (vi) glass support / anode / hole injection layer / light emitting layer / electron injection layer / cathode / sealing member (v i) Glass support / anode / hole injection layer / hole transport layer / light emitting layer / electron injection layer / cathode / sealing member (viii) Glass support / anode / hole injection layer / hole transport layer / light emission Layer / electron transport layer / electron injection layer / cathode / sealing member

<< Organic functional layer 20 of organic EL element >>
Subsequently, the detail of the organic functional layer which comprises the organic EL element of this invention is demonstrated.
(1) Injection layer: hole injection layer 3, electron injection layer 7
In the organic EL device of the present invention, the injection layer can be provided as necessary. The injection layer includes an electron injection layer and a hole injection layer, and may be present between the anode and the light emitting layer or the hole transport layer and between the cathode and the light emitting layer or the electron transport layer as described above.
The injection layer referred to in the present invention is a layer provided between the electrode and the organic functional layer in order to lower the driving voltage and improve the light emission luminance. “The organic EL element and its industrialization front line (November 30, 1998, NT. 2) Chapter 2 “Electrode Materials” (pages 123 to 166) of “Part 2” of S. Co., Ltd.) and includes a hole injection layer and an electron injection layer.
The details of the hole injection layer are described, for example, in JP-A-9-45479, JP-A-9-260062, and JP-A-8-288069. Injection materials include triazole derivatives, oxadiazole derivatives, imidazole derivatives, pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, stilbene derivatives. , Polymers containing silazane derivatives, aniline copolymers, polyarylalkane derivatives, or conductive polymers, preferably polythiophene derivatives, polyaniline derivatives, polypyrrole derivatives, more preferably It is a thiophene derivative.
The details of the electron injection layer are described in, for example, JP-A-6-325871, JP-A-9-17574, and JP-A-10-74586, and specific examples thereof include strontium and aluminum. A metal buffer layer, an alkali metal compound buffer layer typified by lithium fluoride, an alkaline earth metal compound buffer layer typified by magnesium fluoride, and an oxide buffer layer typified by aluminum oxide. In the present invention, the buffer layer (injection layer) is desirably a very thin film, and potassium fluoride and sodium fluoride are preferable. The film thickness is about 0.1 nm to 5 μm, preferably 0.1 to 100 nm, more preferably 0.5 to 10 nm, and most preferably 0.5 to 4 nm.

(2) Hole transport layer 4
As the hole transport material constituting the hole transport layer, the same compounds as those applied in the hole injection layer can be used, and further, porphyrin compounds, aromatic tertiary amine compounds, and styryl. It is preferable to use an amine compound, particularly an aromatic tertiary amine compound.
Representative examples of aromatic tertiary amine compounds and styrylamine compounds include N, N, N ′, N′-tetraphenyl-4,4′-diaminophenyl; N, N′-diphenyl-N, N′— Bis (3-methylphenyl)-[1,1′-biphenyl] -4,4′-diamine (TPD); 2,2-bis (4-di-p-tolylaminophenyl) propane; 1,1-bis (4-di-p-tolylaminophenyl) cyclohexane; N, N, N ′, N′-tetra-p-tolyl-4,4′-diaminobiphenyl; 1,1-bis (4-di-p-tolyl) Aminophenyl) -4-phenylcyclohexane; bis (4-dimethylamino-2-methylphenyl) phenylmethane; bis (4-di-p-tolylaminophenyl) phenylmethane; N, N'-diphenyl-N, N ' - (4-methoxyphenyl) -4,4'-diaminobiphenyl; N, N, N ', N'-tetraphenyl-4,4'-diaminodiphenyl ether; 4,4'-bis (diphenylamino) quadriphenyl; N, N, N-tri (p-tolyl) amine; 4- (di-p-tolylamino) -4 '-[4- (di-p-tolylamino) styryl] stilbene; 4-N, N-diphenylamino- (2-diphenylvinyl) benzene; 3-methoxy-4′-N, N-diphenylaminostilbenzene; N-phenylcarbazole, and two more described in US Pat. No. 5,061,569 Having a condensed aromatic ring of, for example, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPD), JP-A-4-30 4,4 ′, 4 ″ -tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine in which three triphenylamine units described in Japanese Patent No. 688 are linked in a starburst type ( MTDATA) and the like.
Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used. In addition, inorganic compounds such as p-type-Si and p-type-SiC can also be used as the hole injection material and the hole transport material.
JP-A-4-297076, JP-A-2000-196140, JP-A-2001-102175, J. Pat. Appl. Phys. , 95, 5773 (2004), JP-A-11-251067, J. MoI. Huang et. al. It is also possible to use a hole transport material that has a so-called p-type semiconducting property as described in a published document (Applied Physics Letters 80 (2002), p. 139) and Japanese translations of PCT publication No. 2003-519432. it can.
The hole transport layer is formed by thinning the hole transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, a printing method including an ink jet method, or an LB method. Can do. The thickness of the hole transport layer is not particularly limited, but is usually about 5 nm to 5 μm, preferably 5 to 200 nm. The hole transport layer may have a single layer structure composed of one or more of the above materials.

Hereinafter, preferred specific examples ((1) to (60)) of compounds used for the hole transport material of the organic EL device of the present invention will be given, but the present invention is not limited thereto.

Note that n described in the above exemplary compounds represents the degree of polymerization and represents an integer having a weight average molecular weight in the range of 50,000 to 200,000. If the weight average molecular weight is less than this range, there is a concern of mixing with other layers during film formation due to the high solubility in the solvent. Even if a film can be formed, the light emission efficiency does not increase at a low molecular weight. When the weight average molecular weight is larger than this range, problems arise due to difficulty in synthesis and purification. Since the molecular weight distribution increases and the residual amount of impurities also increases, the light emission efficiency, voltage, and life of the organic EL element deteriorate.
These polymer compounds are disclosed in Makromol. Chem. , Pages 193, 909 (1992) and the like.

(3) Electron transport layer 6
The electron transport layer is made of a material having a function of transporting electrons, and in a broad sense, an electron injection layer and a hole blocking layer are also included in the electron transport layer. The electron transport layer can be provided as a single layer or a plurality of layers.
Conventionally, in the case of a single electron transport layer and a plurality of layers, an electron transport material (also serving as a hole blocking material) used for an electron transport layer adjacent to the cathode side with respect to the light emitting layer is injected from the cathode. As long as it has a function of transmitting electrons to the light-emitting layer, any material can be selected and used from among conventionally known compounds. For example, fluorene derivatives, carbazole derivatives, azacarbazole And metal complexes such as derivatives, oxadiazole derivatives, triazole derivatives, silole derivatives, pyridine derivatives, pyrimidine derivatives, 8-quinolinol derivatives, and the like.
In addition, metal-free or metal phthalocyanine, or those having terminal ends substituted with an alkyl group or a sulfonic acid group can be preferably used as the electron transporting material.
Among these, a carbazole derivative, an azacarbazole derivative, a pyridine derivative, and the like are preferable in the present invention, and an azacarbazole derivative is more preferable.
The electron transport layer can be formed by thinning the electron transport material by a known method such as a spin coating method, a casting method, a printing method including an ink jet method, an LB method, and the like, preferably The electron transport material can be formed by a wet process using a coating solution containing a fluorinated alcohol solvent.
The thickness of the electron transport layer is not particularly limited, but is usually about 5 nm to 5 μm, preferably 5 to 200 nm. The electron transport layer may have a single layer structure composed of one or more of the above materials.

Alternatively, an electron transport layer with high n property doped with impurities as a guest material can be used. Examples thereof include JP-A-4-297076, JP-A-10-270172, JP-A-2000-196140, 2001-102175, J.A. Appl. Phys. 95, 5773 (2004), and the like.
The electron transport layer in the present invention preferably contains an organic alkali metal salt. There are no particular restrictions on the type of organic substance, but formate, acetate, propionic acid, butyrate, valerate, caproate, enanthate, caprylate, oxalate, malonate, succinate Benzoate, phthalate, isophthalate, terephthalate, salicylate, pyruvate, lactate, malate, adipate, mesylate, tosylate, benzenesulfonate , Preferably formate, acetate, propionate, butyrate, valerate, caprate, enanthate, caprylate, oxalate, malonate, succinate, benzoate, more preferably Is preferably an alkali metal salt of an aliphatic carboxylic acid such as formate, acetate, propionate or butyrate, and the aliphatic carboxylic acid preferably has 4 or less carbon atoms. Most preferred is acetate.
The type of alkali metal of the alkali metal salt of the organic substance is not particularly limited, and examples thereof include Na, K, and Cs, preferably K, Cs, and more preferably Cs. Examples of the alkali metal salt of the organic substance include a combination of the organic substance and the alkali metal, preferably, formic acid Li, formic acid K, formic acid Na, formic acid Cs, acetic acid Li, acetic acid K, Na acetate, acetic acid Cs, propionic acid Li, Propionic acid Na, propionic acid K, propionic acid Cs, oxalic acid Li, oxalic acid Na, oxalic acid K, oxalic acid Cs, malonic acid Li, malonic acid Na, malonic acid K, malonic acid Cs, succinic acid Li, succinic acid Na, succinic acid K, succinic acid Cs, benzoic acid Li, benzoic acid Na, benzoic acid K, benzoic acid Cs, more preferably Li acetate, K acetate, Na acetate, Cs acetate, most preferably Cs acetate.
The content of these dope materials is preferably 1.5 to 35% by mass, more preferably 3 to 25% by mass, and most preferably 5 to 15% by mass with respect to the electron transport layer to be added.

4) Light emitting layer 5
The light emitting layer constituting the organic EL device of the present invention is a layer that emits light by recombination of electrons and holes injected from the electrode, the electron transport layer, or the hole transport layer, and the light emitting portion is the light emitting layer. It may be in the layer or the interface between the light emitting layer and the adjacent layer.
The light emitting layer according to the present invention is not particularly limited in its configuration as long as the contained light emitting material satisfies the above requirements.
Moreover, there may be a plurality of layers having the same emission spectrum and emission maximum wavelength. It is preferable to have a non-light emitting intermediate layer between each light emitting layer.
The total thickness of the light emitting layers in the present invention is preferably in the range of 1 to 100 nm, and more preferably 50 nm or less because a lower driving voltage can be obtained. In addition, the sum total of the film thickness of the light emitting layer as used in this invention is a film thickness also including the said intermediate | middle layer, when a nonluminous intermediate | middle layer exists between light emitting layers.
The film thickness of each light emitting layer is preferably adjusted in the range of 1 to 50 nm. In addition, each light emitting layer may emit light of each color of blue, green, and red, and there is no particular limitation on the relationship between the thickness of each light emitting layer.
In the present invention, a plurality of light emitting materials may be mixed in each light emitting layer, or a phosphorescent light emitting material and a fluorescent light emitting material may be mixed and used in the same light emitting layer.
In the present invention, the structure of the light-emitting layer preferably contains a host compound and a light-emitting material (also referred to as a light-emitting dopant compound) and emits light from the light-emitting material.

(4.1) Host compound As the host compound contained in the light emitting layer of the organic EL device of the present invention, a compound having a phosphorescence quantum yield of phosphorescence emission at room temperature (25 ° C) of less than 0.1 is preferable. More preferably, the phosphorescence quantum yield is less than 0.01. Moreover, it is preferable that the volume ratio in the layer is 50% or more among the compounds contained in a light emitting layer.
As the host compound, known host compounds may be used alone or in combination of two or more. By using a plurality of types of host compounds, it is possible to adjust the movement of charges, and the organic EL element can be made highly efficient. Moreover, it becomes possible to mix different light emission by using multiple types of luminescent material mentioned later, and can thereby obtain arbitrary luminescent colors.

The light emitting host used in the present invention may be a conventionally known low molecular compound or a high molecular compound having a repeating unit, and a low molecular compound having a polymerizable group such as a vinyl group or an epoxy group (polymerizable light emission). However, when a polymer material is used, it is difficult to purify, and the phenomenon that the compound is difficult to escape such as swelling and gelation due to incorporation of the solvent is likely to occur. It is preferably not high, and specifically, a material having a molecular weight of 2,000 or less at the time of coating is preferably used, and a material having a molecular weight of 1,000 or less at the time of coating is more preferably used.

As the known host compound, a compound having a hole transporting ability and an electron transporting ability, preventing an increase in the wavelength of light emission, and having a high Tg (glass transition temperature) is preferable. Here, the glass transition point (Tg) is a value determined by a method based on JIS-K-7121 using DSC (Differential Scanning Colorimetry).
Specific examples of known host compounds include compounds described in the following documents. For example, Japanese Patent Laid-Open Nos. 2001-257076, 2002-308855, 2001-313179, 2002-319491, 2001-357777, 2002-334786, 2002-8860 Gazette, 2002-334787, 2002-15871, 2002-334788, 2002-43056, 2002-334789, 2002-75645, 2002-338579 No. 2002-105445, No. 2002-343568, No. 2002-141173, No. 2002-352957, No. 2002-203683, No. 2002-363227, No. 2002-231453. No. 2003-3165, No. 2002-234888, No. 2003-27048, No. 2002-255934, No. 2002-286061, No. 2002-280183, No. 2002-299060. No. 2002-302516, No. 2002-305083, No. 2002-305084, No. 2002-308837, and the like.
The host compound used in the present invention is preferably a carbazole derivative.

The host compound is preferably a compound represented by the general formula (1).

In the formula (1), “X” represents NR ′, O, S, CR′R ″ or SiR′R ″.
“R ′” and “R ″” each represent a hydrogen atom or a substituent.
“Ar” represents an aromatic ring.
“N” represents an integer of 0 to 8.

In X in the general formula (1), examples of the substituent represented by R ′ and R ″ include an alkyl group (for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a t-butyl group, a pentyl group, Hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, etc.), cycloalkyl group (for example, cyclopentyl group, cyclohexyl group, etc.), alkenyl group (for example, vinyl group, allyl group, etc.), alkynyl group ( For example, ethynyl group, propargyl group, etc.), aromatic hydrocarbon ring group (aromatic carbocyclic group, aryl group, etc.), for example, phenyl group, p-chlorophenyl group, mesityl group, tolyl group, xylyl group, naphthyl group , Anthryl group, azulenyl group, acenaphthenyl group, fluorenyl group, phenanthryl group, indenyl group, pyreth Group, biphenylyl group, etc.), aromatic heterocyclic group (for example, pyridyl group, pyrimidinyl group, furyl group, pyrrolyl group, imidazolyl group, benzoimidazolyl group, pyrazolyl group, pyrazinyl group, triazolyl group (for example, 1,2,4) -Triazol-1-yl group, 1,2,3-triazol-1-yl group, etc.), oxazolyl group, benzoxazolyl group, thiazolyl group, isoxazolyl group, isothiazolyl group, furazanyl group, thienyl group, quinolyl group, Benzofuryl group, dibenzofuryl group, benzothienyl group, dibenzothienyl group, indolyl group, carbazolyl group, carbolinyl group, diazacarbazolyl group (one of the carbon atoms constituting the carboline ring of the carbolinyl group is replaced by a nitrogen atom) Quinoxalinyl group, pyridazinyl group Triazinyl group, quinazolinyl group, phthalazinyl group, etc.), heterocyclic group (eg, pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (eg, methoxy group, ethoxy group, propyloxy group, pentyloxy group, Hexyloxy group, octyloxy group, dodecyloxy group, etc.), cycloalkoxy group (eg, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (eg, phenoxy group, naphthyloxy group, etc.), alkylthio group (eg, Methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group, dodecylthio group, etc.), cycloalkylthio group (eg, cyclopentylthio group, cyclohexylthio group, etc.), arylthio group (eg, phenyl) Thio group, naphthylthio group, etc.), alkoxycarbonyl group (eg, methyloxycarbonyl group, ethyloxycarbonyl group, butyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group, etc.), aryloxycarbonyl group (eg, phenyloxy) Carbonyl group, naphthyloxycarbonyl group, etc.), sulfamoyl group (for example, aminosulfonyl group, methylaminosulfonyl group, dimethylaminosulfonyl group, butylaminosulfonyl group, hexylaminosulfonyl group, cyclohexylaminosulfonyl group, octylaminosulfonyl group, dodecyl) Aminosulfonyl group, phenylaminosulfonyl group, naphthylaminosulfonyl group, 2-pyridylaminosulfonyl group, etc.), acyl group (for example, acetyl group, ethyl group) Rubonyl, propylcarbonyl, pentylcarbonyl, cyclohexylcarbonyl, octylcarbonyl, 2-ethylhexylcarbonyl, dodecylcarbonyl, phenylcarbonyl, naphthylcarbonyl, pyridylcarbonyl, etc.), acyloxy groups (eg acetyloxy) Group, ethylcarbonyloxy group, butylcarbonyloxy group, octylcarbonyloxy group, dodecylcarbonyloxy group, phenylcarbonyloxy group, etc.), amide group (for example, methylcarbonylamino group, ethylcarbonylamino group, dimethylcarbonylamino group, propyl) Carbonylamino group, pentylcarbonylamino group, cyclohexylcarbonylamino group, 2-ethylhexylcarbonylamino group, octylcarbonylamino group Dodecylcarbonylamino group, phenylcarbonylamino group, naphthylcarbonylamino group, etc.), carbamoyl group (for example, aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, propylaminocarbonyl group, pentylaminocarbonyl group, cyclohexylaminocarbonyl group) Octylaminocarbonyl group, 2-ethylhexylaminocarbonyl group, dodecylaminocarbonyl group, phenylaminocarbonyl group, naphthylaminocarbonyl group, 2-pyridylaminocarbonyl group, etc.), ureido group (for example, methylureido group, ethylureido group, pentyl) Ureido group, cyclohexylureido group, octylureido group, dodecylureido group, phenylureido group, naphthylureido group, 2-pyridylaminourei Group), sulfinyl group (for example, methylsulfinyl group, ethylsulfinyl group, butylsulfinyl group, cyclohexylsulfinyl group, 2-ethylhexylsulfinyl group, dodecylsulfinyl group, phenylsulfinyl group, naphthylsulfinyl group, 2-pyridylsulfinyl group, etc.) ), Alkylsulfonyl groups (eg, methylsulfonyl group, ethylsulfonyl group, butylsulfonyl group, cyclohexylsulfonyl group, 2-ethylhexylsulfonyl group, dodecylsulfonyl group, etc.), arylsulfonyl groups or heteroarylsulfonyl groups (eg, phenylsulfonyl group) Naphthylsulfonyl group, 2-pyridylsulfonyl group, etc.), amino group (for example, amino group, ethylamino group, dimethylamino group, butylamino group, cyclopente) Luamino group, 2-ethylhexylamino group, dodecylamino group, anilino group, naphthylamino group, 2-pyridylamino group, etc.), halogen atom (eg, fluorine atom, chlorine atom, bromine atom etc.), fluorinated hydrocarbon group (eg. , Fluoromethyl group, trifluoromethyl group, pentafluoroethyl group, pentafluorophenyl group, etc.), cyano group, nitro group, hydroxy group, mercapto group, silyl group (for example, trimethylsilyl group, triisopropylsilyl group, triphenylsilyl group) Group, phenyldiethylsilyl group, etc.). These substituents may be further substituted with the above substituents. A plurality of these substituents may be bonded to each other to form a ring.

Among these, X is preferably NR ′ or O, and R ′ is an aromatic hydrocarbon group (also referred to as an aromatic carbocyclic group, an aryl group, etc., for example, a phenyl group, a p-chlorophenyl group, a mesityl group, A tolyl group, a xylyl group, a naphthyl group, an anthryl group, an azulenyl group, an acenaphthenyl group, a fluorenyl group, a phenanthryl group, an indenyl group, a pyrenyl group, a biphenylyl group, or an aromatic heterocyclic group (for example, a furyl group, a thienyl group, a pyridyl group) Group, pyridazinyl group, pyrimidinyl group, pyrazinyl group, triazinyl group, imidazolyl group, pyrazolyl group, thiazolyl group, quinazolinyl group, phthalazinyl group and the like are particularly preferable.

The above aromatic hydrocarbon group and aromatic heterocyclic group each may have a substituent represented by R ′ or R ″ in X of the general formula (1).

In the general formula (1), examples of the aromatic ring represented by Ar include an aromatic hydrocarbon ring and an aromatic heterocyclic ring. The aromatic ring may be a single ring or a condensed ring, and may be unsubstituted or may have a substituent represented by R ′ or R ″ in X of the general formula (1).

In the general formula (1), examples of the aromatic hydrocarbon ring represented by Ar include a benzene ring, biphenyl ring, naphthalene ring, azulene ring, anthracene ring, phenanthrene ring, pyrene ring, chrysene ring, naphthacene ring, triphenylene ring, o-terphenyl ring, m-terphenyl ring, p-terphenyl ring, acenaphthene ring, coronene ring, fluorene ring, fluoranthrene ring, naphthacene ring, pentacene ring, perylene ring, pentaphen ring, picene ring, pyrene ring, Examples include a pyranthrene ring and anthraanthrene ring. These rings may further have substituents represented by R ′ and R ″ in X of the partial structure represented by the general formula (a).

In the partial structure represented by the general formula (1), examples of the aromatic heterocycle represented by Ar include a furan ring, a dibenzofuran ring, a thiophene ring, an oxazole ring, a pyrrole ring, a pyridine ring, a pyridazine ring, and a pyrimidine ring. , Pyrazine ring, triazine ring, benzimidazole ring, oxadiazole ring, triazole ring, imidazole ring, pyrazole ring, thiazole ring, indole ring, indazole ring, benzimidazole ring, benzothiazole ring, benzoxazole ring, quinoxaline ring, quinazoline Ring, cinnoline ring, quinoline ring, isoquinoline ring, phthalazine ring, naphthyridine ring, carbazole ring, carboline ring, diazacarbazole ring (one of the carbon atoms of the hydrocarbon ring constituting the carboline ring is further substituted with a nitrogen atom) Etc.) And the like.

These rings may further have substituents represented by R ′ and R ″ in the general formula (1).

Among these, in the general formula (1), the aromatic ring represented by Ar is preferably a carbazole ring, a carboline ring, a dibenzofuran ring, or a benzene ring, and more preferably a carbazole ring, A carboline ring and a benzene ring, more preferably a benzene ring having a substituent, and particularly preferably a benzene ring having a carbazolyl group.

In the general formula (1), the aromatic ring represented by Ar is preferably a condensed ring of three or more rings, and the aromatic hydrocarbon condensed ring condensed with three or more rings is specifically exemplified. Naphthacene ring, anthracene ring, tetracene ring, pentacene ring, hexacene ring, phenanthrene ring, pyrene ring, benzopyrene ring, benzoazulene ring, chrysene ring, benzochrysene ring, acenaphthene ring, acenaphthylene ring, triphenylene ring, coronene ring, benzocoronene Ring, hexabenzocoronene ring, fluorene ring, benzofluorene ring, fluoranthene ring, perylene ring, naphthperylene ring, pentabenzoperylene ring, benzoperylene ring, pentaphen ring, picene ring, pyrantolen ring, coronene ring, naphthocoronene ring, ovalen ring, Anthracanthrene ring And the like. In addition, these rings may further have the above substituent.

Specific examples of the aromatic heterocycle condensed with three or more rings include an acridine ring, a benzoquinoline ring, a carbazole ring, a carboline ring, a phenazine ring, a phenanthridine ring, a phenanthroline ring, a carboline ring, a cyclazine ring, Kindin ring, tepenidine ring, quinindrin ring, triphenodithiazine ring, triphenodioxazine ring, phenanthrazine ring, anthrazine ring, perimidine ring, diazacarbazole ring (any one of the carbon atoms constituting the carboline ring is a nitrogen atom Phenanthroline ring, dibenzofuran ring, dibenzothiophene ring, naphthofuran ring, naphthothiophene ring, benzodifuran ring, benzodithiophene ring, naphthodifuran ring, naphthodithiophene ring, anthrafuran ring, anthradifuran ring, Emissions tiger thiophene ring, anthradithiophene ring, thianthrene ring, phenoxathiin ring, such as thio fan train ring (naphthothiophene ring). In addition, these rings may further have a substituent.

In the general formula (1), n represents an integer of 0 to 8, preferably 0 to 2, particularly preferably 1 to 2 when X is O or S.

In the present invention, a host compound having both a dibenzofuran ring and a carbazole ring is particularly preferable.

Specific examples (a-1 to a-41) of the host compound represented by the general formula (1) are shown below, but are not limited thereto.

(4.2) Luminescent dopant compound A luminescent dopant compound (also referred to as a luminescent dopant) will be described.
As the light-emitting dopant, a fluorescent dopant (also referred to as a fluorescent compound) or a phosphorescent dopant (also referred to as a phosphorescent emitter, a phosphorescent compound, a phosphorescent compound, or the like) can be used.

(4.2.1) Fluorescent dopant (also called fluorescent compound)
As fluorescent dopants, coumarin dyes, pyran dyes, cyanine dyes, croconium dyes, squalium dyes, oxobenzanthracene dyes, fluorescein dyes, rhodamine dyes, pyrylium dyes, perylene dyes, stilbene dyes , Polythiophene dyes, rare earth complex phosphors, and the like, and compounds having a high fluorescence quantum yield such as laser dyes.

(4.2.2) Phosphorescent dopant (also called phosphorescent dopant)
The phosphorescent dopant according to the present invention will be described.
The phosphorescent dopant compound according to the present invention is a compound in which light emission from an excited triplet is observed, specifically, a compound that emits phosphorescence at room temperature (25 ° C.), and has a phosphorescence quantum yield of 25. Although it is defined as a compound of 0.01 or more at ° C., a preferable phosphorescence quantum yield is 0.1 or more.
The phosphorescence quantum yield can be measured by the method described in Spectroscopic II, page 398 (1992 edition, Maruzen) of Experimental Chemistry Course 4 of the 4th edition. Although the phosphorescence quantum yield in a solution can be measured using various solvents, the phosphorescence dopant according to the present invention achieves the phosphorescence quantum yield (0.01 or more) in any solvent. That's fine.
There are two types of light emission of the phosphorescent dopant in principle.
One is that recombination of carriers occurs on the host compound to which carriers are transported to generate an excited state of the luminescent host compound, and this energy is transferred to the phosphorescent dopant to obtain light emission from the phosphorescent dopant. It is an energy transfer type.
The other is a carrier trap type in which a phosphorescent dopant serves as a carrier trap, carrier recombination occurs on the phosphorescent dopant, and light emission from the phosphorescent dopant compound is obtained.
In any case, it is a condition that the excited state energy of the phosphorescent dopant is lower than the excited state energy of the host compound.

Moreover, you may use together the compound etc. which are described in the following patent gazettes in the light emitting layer which concerns on this invention.
For example, International Publication No. 00/70655, JP 2002-280178, JP 2001-181616, JP 2002-280179, JP 2001-181617, JP 2002-280180, JP 2001-247859, JP 2002-299060, JP 2001-313178, JP 2002-302671, JP 2001-345183, JP 2002-324679, International publication No. 02/15645, JP 2002-332291 A, JP 2002-50484 A, JP 2002-332292 A, JP 2002-83684 A, JP 2002-540572 A, JP 2002-2002 A. No. 117978, Japanese Patent Laid-Open No. 2002-33858 Publication No. 2002-170684 Publication No. 2002-352960 Publication No. WO 01/93642 Publication No. 2002-50483 Publication No. 2002-1000047 Publication No. 2002-173684 Publication JP-A-2002-359082, JP-A-2002-17584, JP-A-2002-363552, JP-A-2002-184582, JP-A-2003-7469, JP-A-2002-525808, JP 2003-7471, JP-A 2002-525833, JP-A 2003-31366, JP-A 2002-226495, JP-A 2002-234894, JP-A 2002-23576, JP-A 2002 -241751 and JP-A-2001-319779 Japanese Patent Laid-Open No. 2001-319780, Japanese Patent Laid-Open No. 2002-62824, Japanese Patent Laid-Open No. 2002-1000047, Japanese Patent Laid-Open No. 2002-203679, Japanese Patent Laid-Open No. 2002-343572, Japanese Patent Laid-Open No. 2002-203678, etc. It is.
In addition, the light-emitting dopant according to the present invention may be used in combination of a plurality of types of compounds, or may be a combination of phosphorescent dopants having different structures, or a combination of a phosphorescent dopant and a fluorescent dopant.

(4.2.2a) Specific Examples Specific examples (D-1 to D-55) of known phosphorescent dopant compounds that can be preferably used in the present invention are listed below. Of course, the present invention is not limited to these.

(4.4.2b) Film density In this embodiment, the film density of the light emitting layer has a certain relationship with the film density of the other layers.
Specifically, the film density of the light emitting layer is ρEM, the film density of the hole transport layer is ρHT, the film density of the electron transport layer is ρET, and the difference between the film density of the light emitting layer and the film density of the hole transport layer is When Δρ (EM−HT) and the difference between the film density of the light emitting layer and the film density of the electron transport layer are Δρ (EM−ET), both of the conditional expressions (i) and (ii) are satisfied. .
Δρ (EM−HT) = (ρEM−ρHT) ≧ 0.03 (i)
Δρ (EM−ET) = (ρEM−ρET) ≧ 0.03 (ii)
The value of ρEM is preferably 1.40 or more.

Furthermore, when a plurality of non-light emitting layers including a hole transport layer or an electron transport layer are formed between the anode and the cathode disposed on the support substrate side and the light emitting layer, the light emitting layer and the non-light emitting layer are formed. Among the film densities of the layers, the value of ρEM is the largest, and the non-light emitting layer has a higher film density as the layer is closer to the light emitting layer.
For example, when an anode is formed on a support substrate and two non-light-emitting layers of a hole injection layer and a hole transport layer are formed between the anode and the light-emitting layer, hole injection is performed on the anode. When the layer, the hole transport layer and the light emitting layer are formed in this order, and the hole transport layer is in contact with the light emitting layer, the film density of the light emitting layer is larger than the film density of each of the hole injection layer and the hole transport layer, Of the hole injection layer and the hole transport layer of the non-light emitting layer, the film density of the hole transport layer close to the light emitting layer is higher than the film density of the hole injection layer.
On the other hand, a cathode is formed on the support substrate, and two non-light-emitting layers, ie, an electron injection layer and an electron transport layer, are formed between the cathode and the light-emitting layer. When the transport layer and the light-emitting layer are formed in this order, and the electron transport layer is in contact with the light-emitting layer, the film density of the light-emitting layer is larger than the film density of the electron injection layer and the electron transport layer, and the electron injection layer of the non-light-emitting layer And the electron transport layer, the film density of the electron transport layer close to the light emitting layer is larger than the film density of the electron injection layer.

A method for measuring the film density used in the present invention will be described.
The film density of the present invention can be determined by an X-ray reflectance measurement method.
It is obtained by measuring the reflectance at a very low angle, for example, in the range of 0.2 to 2 degrees, and fitting the obtained reflectance curve to the reflectance formula of the multilayer film sample obtained from the Fresnel formula. . For the fitting method, see L.C. G. Parratt, Phis. Rev. , 95359 (1954).
Specifically, the X-ray generation source is operated at 50 kV-300 mA with copper as a target. X-rays monochromatized with a multilayer mirror and a Ge (111) channel cut monochromator are used. The measurement was performed using the software ATX-CrystalGuide Ver. 6.5.3.4, halved, after alignment adjustment, 2θ / ω = 0 ° to 1 ° from 0.002 ° / step to 0.05 ° / min. Scan with.
After measuring the reflectance curve under the above measurement conditions, GXRRVer. 2.1.0.0 Measurements can be made using analysis software.

<Method for forming each layer of organic functional layer>
In the organic electroluminescent device of the present invention, it is sufficient that at least one light emitting layer as a constituent layer is formed by a coating method, and the method for forming the other layers is not particularly limited to the coating method, and is necessary. In accordance with the above, it is also possible to form a film using a vapor deposition method or the like.

In the method for producing an organic EL device of the present invention, a coating method (also referred to as a coating film forming method) is used as a method for forming a light emitting layer.
As a method for forming the light emitting layer, there are a spin coat method, a cast method, an ink jet method, a spray method, a printing method, a slot type coater method and the like.
From the standpoint that a homogeneous film is easily obtained and pinholes are not easily generated, the light emitting layer is preferably formed by a coating method such as a spin coating method, an ink jet method, a spray method, a printing method, or a slot coater method. Of these, the slot type coater method is preferably used.

Of course, it is preferable to apply the above-described coating method (coating film forming method) also to the constituent layers other than the light emitting layer of the organic EL element of the present invention.

After the coating film formation, the coating solution is dried.
As a drying method after coating film formation, spin drying, hot air drying, far-infrared drying, vacuum drying, reduced pressure drying, or the like can be applied.

Hereinafter, as a part of the manufacturing method of the organic EL element of the present invention, a coating film forming method of the light emitting layer will be described in detail.
The “coating film-forming method” as used herein means a process from application of a coating solution to completion of drying of the coating solution.
The present inventors prepared low molecular organic thin films formed so as to have the same film thickness by various coating film forming methods, and suppressed the size and content of contained microcrystals in the low molecular organic thin films. As a result of intensive research, we have mixed various host materials, mixed various dopants (also referred to as light-emitting dopants), mixed various solvents (also referred to as light-emitting hosts), heated the coating environment, and finally after coating and drying. By shortening the drying time up to a 5% increase in thickness, the slope of the Guinier plot of scattered rays from low-molecular-weight organic substances in the X-ray small angle scattering measurement is gentle, that is, there is little aggregation or voids, and the material is uniform. It has been found that a thin film dispersed in can be formed.

Specifically, it is sufficient that one type of host material is mixed in the light emitting layer, preferably three or more types are mixed, more preferably five or more types are mixed, and still more preferably seven or more types are mixed. Is good.
In the light emitting layer, at least two kinds of dopant materials are preferably mixed, and more preferably three or more kinds are mixed.
As the solvent of the coating solution for the light emitting layer, a low boiling point solvent having a boiling point of 100 ° C. or less is used, and preferably isopropyl acetate or npropyl acetate is used.
The coating solution for the light emitting layer is preferably composed of two or more mixed solvents.
As a film forming condition of the coating solution for the light emitting layer, the film is preferably formed in a coating environment of 35 ° C. or higher, and is preferably formed at 40 ° C. or higher.
The coating solution for the light emitting layer may be subjected to a drying treatment within 5 seconds after being applied (after completion of the coating), and is preferably subjected to a drying treatment within 3 seconds after being applied. Good.
In the coating film forming method, in order to generate a supercooled state depending on the case, cooling may be performed after coating and drying.
In the drying step after coating film formation, spin drying, hot air drying, far infrared drying, vacuum drying, reduced pressure drying, or the like can be applied.
These drying conditions are as follows. When the coating solution for the light emitting layer is applied, the coating solution is dried, and the drying time is 5% of the final film thickness after drying, the drying time is 3 Preferably, it is within 2 seconds, and more preferably within 2 seconds.

By the above-mentioned means, it is possible to form a thin film in which a material such as a vapor deposition film in which the slope of the Guinier plot of the scattered radiation due to the low-molecular-weight organic substance is gentle in the X-ray small angle scattering measurement, that is, there is little aggregation or void is dispersed. did it.
In the process of coating and drying thin films such as the light-emitting layer, as the film evaporates as the thin film is formed and drying proceeds after the solution is applied, the film thickness decreases and the solvent evaporates after sufficient drying. It becomes a thin film having a final film thickness after drying.
The “film thickness that is 5% more than the final film thickness after drying” means that, for example, when a thin film having a final film thickness after drying of 50 nm is to be produced, the film thickness is 52.5 nm. It corresponds to.
For example, a spectroscopic ellipsometer (for example, UVISEL manufactured by Joban Yvon) can be used to measure the thickness of the light emitting layer.

<< Anode 2 >>
As the anode constituting the organic EL device, an electrode material made of a metal, an alloy, an electrically conductive compound or a mixture thereof having a high work function (4 eV or more) is preferably used. Specific examples of such electrode materials include metals such as Au, and conductive transparent materials such as CuI, indium tin oxide (ITO), SnO ₂ , and ZnO. Alternatively, an amorphous material such as IDIXO (In ₂ O ₃ —ZnO) capable of forming a transparent conductive film may be used. For the anode, these electrode materials may be formed into a thin film by a method such as vapor deposition or sputtering, and a desired shape pattern may be formed by a photolithography method, or when pattern accuracy is not so high (about 100 μm or more) A pattern may be formed through a mask having a desired shape at the time of vapor deposition or sputtering of the electrode material. Or when using the substance which can be apply | coated like an organic electroconductivity compound, wet film-forming methods, such as a printing system and a coating system, can also be used. When light emission is extracted from the anode, it is desirable that the transmittance be greater than 10%, and the sheet resistance as the anode is preferably several hundred Ω / □ or less. Further, although the film thickness depends on the material, it is usually in the range of 10 to 1000 nm, preferably in the range of 10 to 200 nm.

<< Cathode 8 >>
On the other hand, as the cathode, a material having a low work function (4 eV or less) metal (referred to as an electron injecting metal), an alloy, an electrically conductive compound, and a mixture thereof as an electrode material is used. Specific examples of such electrode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al ₂ O ₃ ) Mixtures, indium, lithium / aluminum mixtures, rare earth metals and the like. Among these, from the point of durability against electron injection and oxidation, etc., a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function than this, for example, a magnesium / silver mixture, Magnesium / aluminum mixtures, magnesium / indium mixtures, aluminum / aluminum oxide (Al ₂ O ₃ ) mixtures, lithium / aluminum mixtures, aluminum and the like are preferred. The cathode can be produced by forming a thin film of these electrode materials by a method such as vapor deposition or sputtering. The sheet resistance as the cathode is preferably several hundred Ω / □ or less, and the film thickness is usually selected in the range of 10 nm to 5 μm, preferably 50 to 200 nm. In order to transmit the emitted light, if either one of the anode or the cathode of the organic EL element is transparent or translucent, the light emission luminance is improved, which is convenient.
In addition, a transparent or translucent cathode can be produced by forming the above metal on the cathode with a film thickness of 1 to 20 nm and then forming the conductive transparent material mentioned in the description of the anode thereon. By applying this, an organic EL element in which both the anode and the cathode are transmissive can be produced.

<Supporting substrate 1>
The support substrate (hereinafter also referred to as a substrate, substrate, substrate, support, etc.) that can be used in the organic EL device of the present invention is not particularly limited in the type of glass, plastic, etc., and is transparent. May be opaque. When extracting light from the support substrate side, the support substrate is preferably transparent. Examples of the transparent support substrate preferably used include glass, quartz, and a transparent resin film. Since the effect of suppressing high-temperature storage stability and chromaticity variation appears greatly in a flexible substrate than a rigid substrate, a particularly preferable support substrate has flexibility that can give flexibility to an organic EL element. Resin film.
Examples of the resin film include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellophane, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, cellulose acetate propionate (CAP), Cellulose esters such as cellulose acetate phthalate (TAC) and cellulose nitrate or derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide , Polyethersulfone (PES), polyphenylene sulfide, polysulfones Cycloolefin resins such as polyetherimide, polyetherketoneimide, polyamide, fluororesin, nylon, polymethylmethacrylate, acrylic or polyarylate, Arton (trade name, manufactured by JSR) or Appel (trade name, manufactured by Mitsui Chemicals) Can be mentioned.

On the surface of the resin film, an inorganic film, an organic film or a hybrid film of both may be formed. The water vapor permeability (25 ± 0.5 ° C.) measured by a method according to JIS K 7129-1992. And a relative humidity (90 ± 2)% RH) of 0.01 g / (m ² · 24 h) or less is preferable, and oxygen permeability measured by a method according to JIS K 7126-1987. The film is preferably a high-barrier film having a degree of 10 ⁻³ cm ³ / (m ² · 24 h · atm) or less and a water vapor permeability of 10 ⁻³ g / (m ² · 24 h) or less. More preferably, the degree is 10 ⁻⁵ g / (m ² · 24 h) or less.
As a material for forming the barrier film, any material may be used as long as it has a function of suppressing entry of factors that cause deterioration of the organic EL element such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like is used. Can do. Further, in order to improve the brittleness of the film, it is more preferable to have a laminated structure of these inorganic layers and organic material layers. Although there is no restriction | limiting in particular about the lamination order of an inorganic layer and an organic functional layer, It is preferable to laminate | stack both alternately several times.
The method for forming the barrier film is not particularly limited. For example, the vacuum deposition method, sputtering method, reactive sputtering method, molecular beam epitaxy method, cluster ion beam method, ion plating method, plasma polymerization method, atmospheric pressure plasma A polymerization method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, and the like can be used, but an atmospheric pressure plasma polymerization method as described in JP-A-2004-68143 is particularly preferable.

Examples of the opaque support substrate include metal plates such as aluminum and stainless steel, films, opaque resin substrates, and ceramic substrates.
In the organic EL device of the present invention, the external extraction efficiency of light emission at room temperature is preferably 1% or more, more preferably 5% or more.
Here, the external extraction quantum efficiency (%) = the number of photons emitted to the outside of the organic EL element / the number of electrons sent to the organic EL element × 100.

<< Sealing (sealing adhesive 9, sealing member 10) >>
As a sealing means applicable to the organic EL element of the present invention, for example, a method of adhering a sealing member, an electrode, and a support substrate with an adhesive can be mentioned.
As a sealing member, it should just be arrange | positioned so that the display area | region of an organic EL element may be covered, and concave plate shape or flat plate shape may be sufficient. Further, transparency and electrical insulation are not particularly limited.
Specific examples include a glass plate, a polymer plate / film, and a metal plate / film. Examples of the glass plate include soda-lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz. Examples of the polymer plate include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone. Examples of the metal plate include those made of one or more metals or alloys selected from the group consisting of stainless steel, iron, copper, aluminum, magnesium, nickel, zinc, chromium, titanium, molybdenum, silicone, germanium, and tantalum.

In the present invention, a polymer film and a metal film can be preferably used because the element can be thinned. Furthermore, the polymer film has an oxygen permeability measured by a method according to JIS K 7126-1987 of 1 × 10 ⁻³ cm ³ / (m ² · 24 h · atm) or less, and conforms to JIS K 7129-1992. The water vapor permeability (25 ± 0.5 ° C., relative humidity (90 ± 2)% RH) measured by the above method is preferably 1 × 10 ⁻³ g / (m ² · 24 h) or less.
For processing the sealing member into a concave shape, sandblasting, chemical etching, or the like is used.

Specific examples of the adhesive include photocuring and thermosetting adhesives having reactive vinyl groups of acrylic acid oligomers and methacrylic acid oligomers, and moisture curing adhesives such as 2-cyanoacrylates. Can be mentioned. Moreover, heat | fever and chemical curing types (two-component mixing), such as an epoxy type, can be mentioned. Moreover, hot-melt type polyamide, polyester, and polyolefin can be mentioned. Moreover, a cationic curing type ultraviolet curing epoxy resin adhesive can be mentioned.
In addition, since an organic EL element may deteriorate by heat processing, what can be adhesive-hardened from room temperature to 80 degreeC is preferable. Further, a desiccant may be dispersed in the adhesive. Application | coating of the adhesive agent to a sealing part may use commercially available dispenser, and may print like screen printing.

It is also preferable to cover the electrode and the organic functional layer on the outer side of the electrode facing the support substrate with the organic functional layer in between, and form an inorganic or organic layer in contact with the support substrate to form a sealing film Can be. In this case, the material for forming the film may be a material having a function of suppressing intrusion of elements that cause deterioration of elements such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like may be used. it can. Further, in order to improve the brittleness of the film, it is preferable to have a laminated structure of these inorganic layers and layers made of organic materials. The method for forming these films is not particularly limited. For example, vacuum deposition method, sputtering method, reactive sputtering method, molecular beam epitaxy method, cluster ion beam method, ion plating method, plasma polymerization method, atmospheric pressure plasma A polymerization method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used.

In order to form a gas phase and a liquid phase in the gap between the sealing member and the display area of the organic EL element, an inert gas such as nitrogen or argon, an inert gas such as fluorinated hydrocarbon or silicon oil is used. It is preferable to inject a liquid. A vacuum is also possible. Moreover, a hygroscopic compound can also be enclosed inside.
Examples of the hygroscopic compound include metal oxides (for example, sodium oxide, potassium oxide, calcium oxide, barium oxide, magnesium oxide, aluminum oxide) and sulfates (for example, sodium sulfate, calcium sulfate, magnesium sulfate, cobalt sulfate). Etc.), metal halides (eg calcium chloride, magnesium chloride, cesium fluoride, tantalum fluoride, cerium bromide, magnesium bromide, barium iodide, magnesium iodide etc.), perchloric acids (eg perchloric acid) Barium, magnesium perchlorate, and the like), and anhydrous salts are preferably used in sulfates, metal halides, and perchloric acids.

Sealing includes casing type sealing (can sealing) and close contact type sealing (solid sealing), but solid sealing is preferable from the viewpoint of thinning. Moreover, when producing a flexible organic EL element, since sealing is also required for the sealing member, solid sealing is preferable.

Below, the preferable aspect in the case of performing solid sealing is demonstrated.
As the sealing adhesive according to the present invention, a thermosetting adhesive, an ultraviolet curable resin, or the like can be used, but preferably a thermosetting adhesive such as an epoxy resin, an acrylic resin, or a silicone resin, more preferably moisture resistant. It is an epoxy thermosetting adhesive resin that is excellent in water resistance and water resistance and has little shrinkage during curing.
The water content of the sealing adhesive according to the present invention is preferably 300 ppm or less, more preferably 0.01 to 200 ppm, and most preferably 0.01 to 100 ppm.
The moisture content referred to in the present invention may be measured by any method. For example, a volumetric moisture meter (Karl Fischer), an infrared moisture meter, a microwave transmission moisture meter, a heat-dry weight method, GC / MS , IR, DSC (differential scanning calorimeter), TDS (temperature programmed desorption analysis). Further, using a precision moisture meter AVM-3000 (Omnitech) or the like, moisture can be measured from a pressure increase caused by evaporation of moisture, and moisture content of a film or a solid film can be measured.
In the present invention, the moisture content of the sealing adhesive can be adjusted by, for example, placing it in a nitrogen atmosphere with a dew point temperature of −80 ° C. or lower and an oxygen concentration of 0.8 ppm, and changing the time. Further, it can be dried in a vacuum state of 100 Pa or less while changing the time. Further, the sealing adhesive can be dried only with an adhesive, but can also be placed in advance on the sealing member and dried.
When close sealing (solid sealing) is performed, as the sealing member, for example, a 50 μm thick PET (polyethylene terephthalate) laminated with an aluminum foil (30 μm thick) is used. Using this as a sealing member, it is uniformly applied to the aluminum surface using a dispenser, a sealing adhesive is placed in advance, the resin substrate 1 and the sealing member 5 are aligned, and both are pressure-bonded ( 0.1-3 MPa) and a temperature of 80-180 ° C. for close contact / bonding (adhesion), and close sealing (solid sealing).
Heating or pressure bonding time varies depending on the type, amount, and area of the adhesive, but temporary bonding is performed at a pressure of 0.1 to 3 MPa, and heat curing time is in the range of 5 seconds to 10 minutes at a temperature of 80 to 180 ° C. Just choose.
The use of a heated crimping roll is preferred because it allows simultaneous crimping (temporary bonding) and heating, and eliminates internal voids at the same time.
As a method for forming the adhesive layer, a coating method such as roll coating, spin coating, screen printing, or spray coating, or a printing method can be used depending on the material.

As described above, solid sealing is a form in which there is no space between the sealing member and the organic EL element substrate and the resin is covered with a cured resin.
Examples of the sealing member include metals such as stainless steel, aluminum and magnesium alloys, polyethylene terephthalate, polycarbonate, polystyrene, nylon, plastics such as polyvinyl chloride, and composites thereof, glass, and the like. In the case of a resin film, a laminate of gas barrier layers such as aluminum, aluminum oxide, silicon oxide, and silicon nitride can be used as in the case of a resin substrate.
The gas barrier layer can be formed by sputtering, vapor deposition or the like on both surfaces or one surface of the sealing member before molding the sealing member, or may be formed on both surfaces or one surface of the sealing member after sealing by a similar method. . Also in this case, the oxygen permeability is 1 × 10 ⁻³ ml / (m ² · 24 h · atm) or less, the water vapor permeability (25 ± 0.5 ° C., relative humidity (90 ± 2)% RH) is 1 × It is preferably 10 ⁻³ g / (m ² · 24 h) or less.
The sealing member may be a film laminated with a metal foil such as aluminum. As a method for laminating the polymer film on one side of the metal foil, a generally used laminating machine can be used. As the adhesive, polyurethane-based, polyester-based, epoxy-based, acrylic-based adhesives and the like can be used. You may use a hardening | curing agent together as needed. A hot melt lamination method, an extrusion lamination method and a coextrusion lamination method can also be used, but a dry lamination method is preferred.
In addition, when the metal foil is formed by sputtering or vapor deposition and is formed from a fluid electrode material such as a conductive paste, it may be created by a method of forming a metal foil on a polymer film as a base. Good.

《Protective film, protective plate》
In order to increase the mechanical strength of the organic EL element, a protective film or a protective plate may be provided outside the sealing film on the side facing the support substrate with the organic functional layer interposed therebetween or on the outer side of the sealing film. In particular, when sealing is performed with a sealing film, the mechanical strength is not necessarily high, and thus it is preferable to provide such a protective film and a protective plate. As a material that can be used for this, the same glass plate, polymer plate / film, metal plate / film, etc. used for the sealing can be used, but the polymer film is light and thin. Is preferably used.
In the present invention, it is preferable to have a light extraction member between the flexible support substrate and the anode, or at any location on the light emission side from the flexible support substrate.
Examples of the light extraction member include a prism sheet, a lens sheet, and a diffusion sheet. Further, a diffraction grating or a diffusion structure introduced into an interface or any medium that causes total reflection can be used.
In general, in an organic electroluminescence element that emits light from a substrate, a part of the light emitted from the light emitting layer causes total reflection at the interface between the substrate and air, causing a problem of loss of light. In order to solve this problem, prismatic or lens-like processing is applied to the surface of the substrate, or prism sheets, lens sheets, and diffusion sheets are affixed to the surface of the substrate, thereby suppressing total reflection and light extraction efficiency. To improve.
In order to increase the light extraction efficiency, a method of introducing a diffraction grating or a method of introducing a diffusion structure in an interface or any medium that causes total reflection is known.

<< Method for Manufacturing Organic EL Element 100 >>
As an example of the method for producing an organic EL device of the present invention, a method for producing an organic EL device comprising an anode / hole injection layer / hole transport layer / light emitting layer / electron transport layer / electron injection layer / cathode will be described.

First, a desired electrode material, for example, a thin film made of an anode material is formed on a suitable substrate by a thin film forming method such as vapor deposition or sputtering so as to have a thickness of 1 μm or less, preferably 10 to 200 nm. An anode is produced.

Next, a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an organic functional layer (organic compound thin film) of an electron injection layer, which are organic EL element materials, are formed thereon.
The process of forming the organic functional layer mainly includes
(I) a step of coating and laminating the coating liquid constituting the organic functional layer on the anode of the support substrate; and (ii) a step of drying the coating liquid after coating and laminating;
Consists of.
The light emitting layer forming method (coating film forming method) is as described above.

In the step (i), as a method for forming each layer, as described above, a vapor deposition method, a wet process (for example, spin coating method, casting method, die coating method, blade coating method, roll coating method, ink jet method, printing method, spray coating). Method, curtain coating method, LB method (Langmuir Brodgett method and the like can be used), and at least the light emitting layer of the present invention is preferably formed by a wet process.
In the formation of the organic functional layer other than the light emitting layer, it is preferable to use a wet process in the present invention from the viewpoint that a homogeneous film is easily obtained and pinholes are difficult to be generated, among others, a spin coating method, a casting method, Film formation by a coating method such as a die coating method, a blade coating method, a roll coating method, or an ink jet method is preferable.
Examples of the liquid medium for dissolving or dispersing the organic EL material according to the present invention include ketones such as methyl ethyl ketone and cyclohexanone, fatty acid esters such as ethyl acetate, halogenated hydrocarbons such as dichlorobenzene, toluene, xylene, and mesitylene. Aromatic hydrocarbons such as cyclohexylbenzene, aliphatic hydrocarbons such as cyclohexane, decalin, and dodecane, and organic solvents such as dimethylformamide (DMF) and dimethylsulfoxide (DMSO) can be used. Moreover, as a dispersion method, it can disperse | distribute by dispersion methods, such as an ultrasonic wave, high shear force dispersion | distribution, and media dispersion | distribution.
In addition, the preparation step for dissolving or dispersing the organic EL material according to the present invention and the coating process until coating on the base material are preferably performed under an inert gas atmosphere. Since the film can be formed without degrading the performance of the organic EL element even if it is not carried out in step 1, it may not necessarily be carried out in an inert gas atmosphere. In this case, the manufacturing cost can be suppressed, which is more preferable.

In the step (ii), the coated and laminated organic functional layer is dried.
The term “drying” as used herein refers to a reduction to 0.2% or less when the solvent content of the film immediately after coating is 100%.
As a means for drying, those generally used can be used, and examples thereof include reduced pressure or pressure drying, heat drying, air drying, IR drying, and electromagnetic wave drying. Of these, heat drying is preferable, the temperature is equal to or higher than the boiling point of the solvent having the lowest boiling point in the organic functional layer coating solvent, and the temperature is lower than (Tg + 20) ° C. of the material having the lowest Tg among the Tg of the organic functional layer material. Most preferably, it is held at In the present invention, more specifically, it is preferable to hold and dry at 80 ° C. or higher and 150 ° C. or lower, and more preferable to hold and dry at 100 ° C. or higher and 130 ° C. or lower.
The atmosphere when drying the coating liquid after coating / lamination is preferably an atmosphere having a volume concentration of a gas other than the inert gas of 200 ppm or less, but it is not necessarily in an inert gas atmosphere as in the liquid preparation coating process. It may not be necessary. In this case, the manufacturing cost can be suppressed, which is more preferable.
The inert gas is preferably a rare gas such as nitrogen gas and argon gas, and most preferably nitrogen gas in terms of production cost.

The coating / laminating and drying steps of these layers may be single wafer manufacturing or line manufacturing. Further, the drying process may be performed while being conveyed on the line, but from the viewpoint of productivity, it may be deposited or rolled in a non-contact manner in a roll form.

After these layers are dried, a thin film made of a cathode material is formed thereon by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably in the range of 50 nm to 200 nm. By providing, a desired organic EL element can be obtained.
After the heat treatment, the organic EL element can be produced by adhering the close-sealing or sealing member to the electrode and the support substrate with an adhesive.

<Application>
The organic EL element of the present invention can be used as a display device, a display, and various light emission sources.
Examples of light sources include home lighting, interior lighting, clock and liquid crystal backlights, billboard advertisements, traffic lights, light sources for optical storage media, light sources for electrophotographic copying machines, light sources for optical communication processors, and light sources for optical sensors. Furthermore, it can be used in a wide range of applications such as general household appliances that require a display device, but it can be used effectively as a backlight for a liquid crystal display device combined with a color filter, and as a light source for illumination. it can.
In the organic EL element of the present invention, patterning may be performed by a metal mask, an ink jet printing method, or the like as needed during film formation. In the case of patterning, only the electrode may be patterned, the electrode and the light emitting layer may be patterned, or the entire layer of the element may be patterned. In the fabrication of the element, a conventionally known method is used. Can do.

EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto.
In addition, although the display of "part" or "%" is used in an Example, unless otherwise indicated, "part by mass" or "mass%" is represented.

<< Production of organic EL element >>
(1) Production of Example Sample 1 (1.1) Production of Gas Barrier Flexible Film First of polyethylene naphthalate film (Teijin DuPont film, hereinafter abbreviated as PEN) as the flexible film. An inorganic gas barrier film made of SiOx is continuously formed on the flexible film on the entire surface on the electrode forming side using an atmospheric pressure plasma discharge treatment apparatus having the structure described in JP-A-2004-68143. A gas barrier flexible film having an oxygen permeability of 0.001 ml / m ² / day or less and a water vapor permeability of 0.001 g / m ² / day or less was formed.

(1.2) Formation of first electrode layer A 120 nm thick ITO (Indium Tin Oxide) film is formed on the prepared gas barrier flexible film by sputtering and patterned by photolithography. An electrode layer (anode) was formed.
The pattern was such that the light emission area was 50 mm square.

(1.3) Formation of hole injection layer The patterned ITO substrate was ultrasonically cleaned with isopropyl alcohol, dried with dry nitrogen gas, and subjected to UV ozone cleaning for 5 minutes.
On this substrate, a solution obtained by diluting poly (3,4-ethylenedioxythiophene) -polystyrene sulfonate (abbreviated as PEDOT / PSS, manufactured by Bayer, Baytron P Al 4083) to 70% with pure water at 3000 rpm for 30 seconds. The film was formed by spin coating and held at 200 ° C. for 1 hour to provide a hole injection layer having a thickness of 30 nm.

(1.4) Formation of hole transport layer This substrate was transferred to a nitrogen atmosphere using nitrogen gas (grade G1), and exemplary compound (60) (Mw = 80,000) as the hole transport material was transferred. A solution prepared by dissolving 0.5% in chlorobenzene was formed by spin coating at 1500 rpm for 30 seconds, and kept at 160 ° C. for 30 minutes to form a 30 nm-thick hole transport layer.

(1.5) Formation of Light-Emitting Layer Next, a light-emitting layer composition having the following composition was formed by a spin coating method at 1500 rpm for 30 seconds and held at 120 ° C. for 30 minutes to form a light-emitting layer having a thickness of 40 nm. .
<Light emitting layer composition>
Host material ... Exemplified compound a-6 13.95 parts by mass Dopant material ... Exemplified compound D-24: D-25: D-26: D-51: D-55 equimolar mixture 2.45 parts by mass Dopant material ... Exemplified compound D-1 0.025 parts by mass Dopant material ... Exemplary compound D-10 0.025 parts by mass Solvent species ... Toluene: isopropyl acetate = 1: 1 2,000 parts by mass The coating film was kept at 30 ° C., and after 5 seconds (within 5 seconds) from the end of the application of the light emitting layer composition, the coating film was dried by applying dry air to the coating film.

(1.6) Formation of Electron Transport Layer Subsequently, a solution obtained by dissolving 20 mg of the exemplified compound (compound A), which is a compound represented by the general formula (A), in 4 ml of tetrafluoropropanol (TFPO) is 1500 rpm. The film was formed by spin coating in 30 seconds and held at 120 ° C. for 30 minutes to form an electron transport layer having a thickness of 30 nm.

(1.7) Formation of electron injection layer and cathode Subsequently, the substrate was attached to a vacuum deposition apparatus without being exposed to the atmosphere.
In addition, a molybdenum resistance heating boat containing sodium fluoride and potassium fluoride is attached to a vacuum deposition apparatus, and after the vacuum chamber is depressurized to 4 × 10 ⁻⁵ Pa, the boat is energized and heated to heat the boat. A thin film having a thickness of 1 nm is formed on the electron transport layer at a rate of 0.02 nm / second with sodium fluoride, and then an electron with a thickness of 1.5 nm on the sodium fluoride at a rate of 0.02 nm / second in the same manner. An injection layer was formed.
Subsequently, 100 nm of aluminum was deposited to form a cathode.

(1.8) Sealing and Production of Organic EL Element Subsequently, a sealing member was bonded using a commercially available roll laminating apparatus to produce Example Sample 1 (organic EL element).

Specifically, as a sealing member, a flexible aluminum foil (made by Toyo Aluminum Co., Ltd.) having a thickness of 30 μm, a polyethylene terephthalate (PET) film (12 μm thickness) and an adhesive for dry lamination (two-component reaction type urethane) (Adhesive layer thickness 1.5 μm) was used.
As a sealing adhesive, a thermosetting adhesive was uniformly applied to the aluminum surface with a thickness of 20 μm along the adhesive surface (shiny surface) of the aluminum foil using a dispenser. This was dried under a vacuum of 100 Pa or less for 12 hours. Furthermore, it moved to a nitrogen atmosphere with a dew point temperature of −80 ° C. or lower and an oxygen concentration of 0.8 ppm, dried for 12 hours or longer, and adjusted the water content of the sealing adhesive to 100 ppm or lower.
As the thermosetting adhesive, an epoxy adhesive mixed with the following (A) to (C) was used.
(A) Bisphenol A diglycidyl ether (DGEBA)
(B) Dicyandiamide (DICY)
(C) Epoxy adduct curing accelerator

As described above, the sealing substrate is closely attached and arranged so as to cover the joint portion between the extraction electrode and the electrode lead so as to be in the form shown in FIG. Example sample 1 (organic EL element) was manufactured by closely sealing at a temperature of 120 ° C., a pressure of 0.5 MPa, and an apparatus speed of 0.3 m / min.

(2) Production of Example Samples 2 to 7 In the production of Example Sample 1, the application environment of the light-emitting layer (application temperature, time from the end of application to the start of drying, solvent type of application liquid) is shown in Table 1, respectively The environment was changed.
Other than that was the same as Example Sample 1.

(3) Production of Example Sample 8 In the production of Example Sample 1, the application environment of the light emitting layer (application temperature, time from the end of application to the start of drying, solvent type of the application liquid) are shown in Table 1, respectively. And the host material was an equal mass mixture of a-1, a-6, and a-41.
Other than that was the same as Example Sample 1.

(4) Production of Comparative Sample 9 In production of Example Sample 1, the application environment of the light emitting layer was changed to the environment shown in Table 1.
Other than that was the same as Example Sample 1.

(5) Preparation of Comparative Sample 10 In the preparation of Example Sample 1, the electron transport layer coating solution was used as the electron transport layer composition 1 below.
<Electron transport layer composition 1>
Electron transport material ... Exemplified compound (Compound A) 19.88 mg
Dopant material ... Exemplary compound D-55 0.12 mg
Solvent type: Tetrafluoropropanol (TFPO) 4.0000 ml
Other than that was the same as Example Sample 1.

(6) Preparation of Comparative Sample 11 In preparation of Example Sample 1, the hole transport layer composition 1 was used as the hole transport layer coating solution.
<Hole transport layer composition 1>
Hole transport material ... Exemplified compound (60) 24.97mg
Dopant material: Exemplified compound D-55 0.03 mg
Solvent type ... chlorobenzene 5.00ml
Other than that was the same as Example Sample 1.

(7) Preparation of Comparative Sample 12 In the preparation of Example Sample 1, the hole transport layer composition 2 was used as the hole transport layer coating solution.
<Hole transport layer composition 2>
Hole transport material ... Exemplified compound (60) 24.94mg
Dopant material: Exemplified compound D-55 0.06 mg
Solvent type ... chlorobenzene 5.00ml
Other than that was the same as Example Sample 1.

(8) Preparation of Comparative Sample 13 In preparation of Example Sample 1, the electron transport layer coating solution was used as the following electron transport layer composition 2.
<Electron transport layer composition 2>
Electron transport material ... Exemplified compound (Compound A) 19.64 mg
Dopant material: Exemplified compound D-55 0.36 mg
Solvent type: Tetrafluoropropanol (TFPO) 4.0000 ml
Other than that was the same as Example Sample 1.

<< Evaluation of organic EL elements >>
Example Samples 1 to 8 and Comparative Samples 9 to 13 were subjected to (1) measurement of the film density of the light emitting layer and the evaluations (2) to (4).

(1) Measurement of film density The film densities of the light emitting layers and the like of Example Samples 1 to 8 and Comparative Samples 9 to 13 were measured by the measurement method described above. The results are shown in Table 2.
In Table 2, “ρHIL” represents the film density of the hole injection layer, “ρHT” represents the film density of the hole transport layer, “ρEM” represents the film density of the light emitting layer, and “ρET” represents the film of the electron transport layer. Each density is shown. “Δρ (EM-HT)” is the difference between the film density of the light emitting layer and the film density of the hole transport layer (ρEM−ρHT), and “Δρ (EM-ET)” is the film density of the light emitting layer and the electron (ΡEM−ρET), which is the difference from the film density of the transport layer, is shown.

(2) Evaluation of luminous efficiency Each sample was lighted in a room temperature environment (about 23 to 25 ° C.) and under a constant luminance condition of 1000 cd / m ² , and a spectral radiance meter CS-2000 (manufactured by Konica Minolta Sensing) was used. The light emission luminance of each sample was measured, and the light emission efficiency (current is constant) at the light emission luminance of 1000 cd / m ² was determined. Table 2 shows the obtained results.
In Table 2, assuming that the luminous efficiency of the comparative example sample 9 is “100”, the luminous luminances of the example samples 1 to 8 and the comparative example samples 10 to 13 are shown as relative values.

(3) Evaluation of luminous lifetime Each sample was wound around a cylinder with a radius of 5 cm, and then continuously driven in a state where each sample was bent, and the luminance was measured using the spectral radiance meter CS-2000. The time to halve (LT50) was determined. The driving condition was set to a current value of 4000 cd / m ² at the start of continuous driving.
The relative value which made LT50 of the comparative example sample 9 "100" was calculated | required, and this was made into the scale of continuous drive stability.
The larger the value, the better the continuous driving stability (long life).

(4) Evaluation of luminance unevenness Each sample was lighted under a room temperature environment (about 23 to 25 ° C.) and under a constant luminance condition of 1000 cd / m 2, visually evaluated, and ranked according to the following five criteria.
“5”: No brightness unevenness “4”: Level where brightness unevenness is confirmed only slightly “3”: Level where brightness unevenness is confirmed but cannot be identified when 0.3 m or more away “2”: Brightness unevenness is confirmed , Level that cannot be discriminated when separated by 1.0 m or more “1”: Level that luminance unevenness is confirmed and recognized even if separated by 1.0 m or more

(4) Summary As shown in Table 2, comparison between Example Samples 1 to 8 and Comparative Example Samples 9 to 13 (particularly Comparative Example Sample 9) shows that Example Samples 1 to 8 have good results in each evaluation. there were.
From the above, in order to improve the light emission efficiency, the light emission lifetime, and the suppression of luminance unevenness, both of the conditional expressions (i) and (ii) are satisfied (Δρ (EM−HT) and Δρ (EM− It can be seen that it is useful to set both the value of (ET) to 0.03 or more.

The present invention can be particularly suitably used for improving luminous efficiency and luminous lifetime and suppressing occurrence of luminance unevenness.

DESCRIPTION OF SYMBOLS 1 Flexible support substrate 2 Anode 3 Hole injection layer 4 Hole transport layer 5 Light emitting layer 6 Electron transport layer 7 Electron injection layer 8 Cathode 9 Sealing adhesive 10 Flexible sealing member 20 Organic functional layer 100 Organic electro Luminescence element

Claims

A substrate,
An anode and a cathode formed on the substrate;
A light emitting layer formed between the anode and the cathode;
A hole transport layer formed between the light emitting layer and the anode;
An electron transport layer formed between the light emitting layer and the cathode;
In an organic electroluminescence device comprising:
The film density of the light emitting layer is ρEM, the film density of the hole transport layer is ρHT, the film density of the electron transport layer is ρET, and the film density of the light emitting layer and the film density of the hole transport layer are When the difference between Δρ (EM−HT) and the difference between the film density of the light emitting layer and the film density of the electron transport layer is Δρ (EM−ET), both conditional expressions (i) and (ii) An organic electroluminescence element characterized by satisfying
Δρ (EM−HT) = (ρEM−ρHT) ≧ 0.03 (i)
Δρ (EM−ET) = (ρEM−ρET) ≧ 0.03 (ii)
The organic electroluminescent device according to claim 1,
An organic electroluminescence device having a ρEM value of 1.40 or more.
The organic electroluminescent device according to claim 1,
A plurality of non-light-emitting layers including the hole-transport layer or the electron-transport layer are formed between the light-emitting layer and the electrode disposed on the substrate side among the anode and the cathode,
Among the film densities of the light emitting layer, the hole transport layer, the electron transport layer, and the non-light emitting layer, the value of ρEM is the largest,
The non-light-emitting layer is an organic electroluminescence device characterized in that the layer density closer to the light-emitting layer increases.
The organic electroluminescent device according to claim 1,
The organic light-emitting device, wherein the light-emitting layer is formed by a coating method using a coating liquid in which a light-emitting material is dispersed in at least one solvent.
In the organic electroluminescent element according to claim 4,
An organic electroluminescence element, wherein the coating liquid is applied in an environment of 35 ° C. or higher.
In the organic electroluminescent element according to claim 4,
An organic electroluminescence device, wherein the coating solution is subjected to a drying treatment within 3 seconds after being applied.
In the organic electroluminescent element according to claim 4,
An organic electroluminescence device, wherein the solvent of the coating solution is a low boiling point solvent having a boiling point of 100 ° C. or lower.
The organic electroluminescence device according to claim 7,
An organic electroluminescence device, wherein the solvent of the coating solution is isopropyl acetate or n-propyl acetate.
The organic electroluminescent device according to claim 1,
The light emitting layer contains at least three or more kinds of host materials.
A display device using the organic electroluminescence element according to claim 1.
An illuminating device using the organic electroluminescence element according to claim 1.