WO2013029371A1 - Metamaterial-based microstrip - Google Patents

Metamaterial-based microstrip Download PDF

Info

Publication number
WO2013029371A1
WO2013029371A1 PCT/CN2012/073680 CN2012073680W WO2013029371A1 WO 2013029371 A1 WO2013029371 A1 WO 2013029371A1 CN 2012073680 W CN2012073680 W CN 2012073680W WO 2013029371 A1 WO2013029371 A1 WO 2013029371A1
Authority
WO
WIPO (PCT)
Prior art keywords
metamaterial
substrate
microstrip line
line according
metal strip
Prior art date
Application number
PCT/CN2012/073680
Other languages
French (fr)
Chinese (zh)
Inventor
刘若鹏
季春霖
岳玉涛
李星坤
周添
宿超
杨树坤
Original Assignee
深圳光启高等理工研究院
深圳光启创新技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN201110254545.1A external-priority patent/CN102956940B/en
Priority claimed from CN201110254574.8A external-priority patent/CN102956941B/en
Application filed by 深圳光启高等理工研究院, 深圳光启创新技术有限公司 filed Critical 深圳光启高等理工研究院
Publication of WO2013029371A1 publication Critical patent/WO2013029371A1/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P3/00Waveguides; Transmission lines of the waveguide type
    • H01P3/02Waveguides; Transmission lines of the waveguide type with two longitudinal conductors
    • H01P3/08Microstrips; Strip lines
    • H01P3/081Microstriplines

Definitions

  • the present invention relates to the field of microstrip lines and, more particularly, to a microstrip line based on metamaterials.
  • Microstrip Line is a hybrid microwave integrated circuit (Hybrid Microwave) Integrated Circuits, HMIC) and monolithic microwave integrated circuits (Monolithic Microwave Integrated One of the most widely used planar transmission lines in Circuits, MMIC. Structurally, the microstrip line is placed on a ground plate by a very thin metal strip at a much smaller distance than the wavelength, and the metal strip is separated from the ground plane by a dielectric substrate.
  • microstrip line is compact and lightweight, and can be used to make complex microwave circuits in a small volume by stereolithography, photolithography, etching, etc., and is easy to integrate with other microwave devices to realize microwave components and systems. Integration.
  • microstrip transmission lines can be used instead of waveguides to form microwave circuits and form various complex planar circuits on the same substrate, including Bridge circuit, matching load, attenuator antenna, etc.
  • the use of microstrip line transmission also has the disadvantages of large loss of microstrip line, crosstalk caused by easy leakage of electromagnetic energy, low Q value, difficulty in fine adjustment, and small power capacity.
  • the guided electromagnetic wave on the microstrip line continuously radiates energy along the axial direction of the microstrip line to generate leakage waves, wherein the electromagnetic wave leakage has two forms: surface wave form 2 and space wave form 1 ,As shown in Figure 1. It is known that there is a leakage main mode in the high frequency band of the microstrip line. This leakage main mode leaks electromagnetic wave energy outward in the form of surface waves. In the low frequency band, each higher order mode of the microstrip line is in the form of spatial wave. External leakage of electromagnetic wave energy.
  • a method for suppressing leakage of a microstrip main mode is mainly to apply a thin dielectric layer having a sufficiently large dielectric constant on the microstrip line; however, for the suppression of high order mode leakage of the microstrip line, there is no What is a simple and effective method. This is mainly due to the difference in the physical mechanism of the leakage of the main mode of the microstrip line and the leakage of the high-order mode. The spatial wave leakage of the higher-order mode of the microstrip line is hardly completely suppressed.
  • the object of the present invention is to overcome the defects of the spatial wave leakage of the high-order mode of the microstrip line in the prior art, and provide a microstrip line based on a metamaterial, which can effectively suppress the leakage of the space wave and solve the problem between the microstrip lines.
  • the invention provides a metamaterial-based microstrip line, which comprises a metal strip, a dielectric substrate and a grounding plate, the dielectric substrate is a metamaterial substrate, and the metamaterial substrate comprises a plurality of first metamaterial sheets, wherein the metal strips are connected
  • the floors are located on either side of the metamaterial substrate or on the same side of the metamaterial substrate.
  • the metal strip and the ground plate are respectively located on both sides of the metamaterial substrate and are in close contact with the metamaterial substrate.
  • the metal strip comprises two identical metal strips.
  • the metal strip and the grounding plate are respectively located on both sides of the metamaterial substrate, and the metal strip is closely attached to one side of the metamaterial substrate, and the grounding plate is suspended directly under the other side of the metamaterial substrate.
  • the metal strip and the ground plate are located on the same side of the metamaterial substrate, and the metal strip is in close contact with the metamaterial substrate, and the ground plate is suspended directly below the metamaterial substrate.
  • the plurality of first metamaterial sheets have the same refractive index distribution, wherein the refractive index distribution of each of the first metamaterial sheets is: the smallest refractive index directly under the metal strip And the refractive index of the two sides away from the metal strip gradually increases.
  • the first metamaterial sheet comprises a plurality of metamaterial units comprising an artificial microstructure and a unit substrate for attachment of the artificial microstructure.
  • the artificial microstructure is a planar structure or a three-dimensional structure comprising at least one wire responsive to an electromagnetic field, the wire being a copper wire or a silver wire.
  • the wire is attached to the unit substrate by etching, electroplating, drilling, photolithography, electron engraving or ion engraving.
  • the artificial microstructure is any one of a snowflake-shaped or snowflake-shaped derivative.
  • the material of the unit substrate is made of a ceramic material, an epoxy resin, a polytetrafluoroethylene, a ferroelectric material, a ferrite material or a ferromagnetic material.
  • the microstrip line further includes a metamaterial film, the metamaterial film and the metal strip are located on one side of the metamaterial substrate, and are in close contact with the metamaterial substrate, wherein the metamaterial film covers the metal strip.
  • the metamaterial film comprises a plurality of second metamaterial sheets, and the plurality of second metamaterial sheets have the same refractive index profile.
  • the refractive index distribution of the second metamaterial sheet layer is such that the refractive index distribution in the second metamaterial sheet layer is uniform, and the refractive index has a refractive index ranging from 0-1.
  • the second metamaterial sheet has a refractive index of 0.7.
  • the first metamaterial sheet layer and the second metamaterial sheet layer each comprise a plurality of metamaterial units comprising an artificial microstructure and a unit substrate for attachment of the artificial microstructure.
  • the artificial microstructure is a planar structure or a three-dimensional structure comprising at least one wire responsive to an electromagnetic field, the wire being a copper wire or a silver wire.
  • the wire is attached to the unit substrate by etching, electroplating, drilling, photolithography, electron engraving or ion engraving.
  • the artificial microstructure is any one of a snowflake-shaped or snowflake-shaped derivative.
  • the material of the unit substrate is made of a ceramic material, an epoxy resin, a polytetrafluoroethylene, a ferroelectric material, a ferrite material or a ferromagnetic material.
  • the invention has the following beneficial effects:
  • the present invention uses a metamaterial as a dielectric substrate, and by adjusting the refractive index distribution inside the supermaterial substrate, the spatial wave leakage of the microstrip line is effectively suppressed.
  • the present invention realizes the refractive index required in practical applications by changing the change of the dielectric constant inside the metamaterial, and the process is simple and easy to mass-produce.
  • a super-material based microstrip line according to the present invention comprises a layer of metamaterial film disposed on a dielectric substrate, and the super material film covers the metal strip, thereby effectively suppressing leakage waves in the form of spatial waves of the microstrip line, and reducing Electromagnetic crosstalk of adjacent microstrip lines.
  • FIG. 1 is a schematic view showing two forms of leakage waves of a microstrip line in the prior art
  • FIG. 2 is a schematic structural view of a metamaterial-based microstrip line according to a first embodiment of the present invention
  • FIG. 3 is a schematic structural view of the metamaterial substrate of FIG. 2;
  • Figure 4 is a schematic structural view of the metamaterial unit of Figure 2;
  • Figure 5 is a schematic view of a second embodiment of the present invention.
  • Figure 6 is a schematic view showing the structure of the super-material film of Figure 5;
  • Figure 7 is a schematic view of a third embodiment of the present invention.
  • Figure 8 is a schematic view of a fourth embodiment of the present invention.
  • Figure 9 is a schematic view of a fifth embodiment of the present invention.
  • the present invention discloses a metamaterial-based microstrip line including a metal strip 10, a dielectric substrate 30, and a grounding plate 20, wherein the metal strip 10 and the grounding plate 20 are respectively distributed on the medium. Both sides of the substrate 30, and the metal strip 10 is in close contact with the upper side of the dielectric substrate 30 by means of a printed circuit board.
  • the grounding plate 20 is in close contact with the lower side of the dielectric substrate 30.
  • the metamaterial substrate is used as the dielectric substrate 30, thereby reducing the phase. Electromagnetic crosstalk between adjacent microstrip lines.
  • the metamaterial substrate 30 includes a plurality of first metamaterial sheets 301, wherein each first metamaterial sheet 301 includes a plurality of metamaterial units 40, and the metamaterial unit 40 includes artificial
  • the microstructure 402 is coupled to a unit substrate 401 for attachment to the artificial microstructure 402.
  • the plurality of first metamaterial sheets 301 preferably have the same refractive index profile.
  • the refractive index distribution pattern of each of the first metamaterial sheets 301 is such that, as shown in FIG. 3, the refractive index immediately below the corresponding metal strip 10 is the smallest, and the refractive index gradually increases away from the sides of the metal strip 10.
  • the unit substrate 401 is made of a dielectric insulating material, and the manufacturing material thereof includes a ceramic material, a polymer material, a ferroelectric material, a ferrite material or a ferromagnetic material, wherein the polymer material may be a ring. Oxygen resin or polytetrafluoroethylene.
  • the artificial microstructure 402 is a metal wire which is attached to the unit substrate 401 in a certain geometric shape and is responsive to electromagnetic waves.
  • the metal wire may be a copper wire or a silver wire having a cylindrical or flat shape, and is generally made of copper because Copper wire is relatively cheap. Of course, the cross section of the wire can also be other shapes.
  • the metal wires are attached to the unit substrate 401 by etching, electroplating, drilling, photolithography, electron engraving or ion etching, and the first metamaterial sheet layer 301 includes a plurality of metamaterial units 40, each of the metamaterial units 40.
  • each of the metamaterial units 40 is responsive to electromagnetic waves passing therethrough, thereby affecting the transmission of electromagnetic waves therein, the size of each metamaterial unit 40 being dependent on the electromagnetic waves that need to be responsive, typically the desired response One tenth of the wavelength of the electromagnetic wave, otherwise the arrangement of metamaterial units 40 containing artificial microstructures 402 in space cannot be considered continuous in space.
  • the equivalent dielectric constant and equivalent of each place on the metamaterial can be adjusted by adjusting the shape and size of the artificial microstructure 402 and its spatial distribution on the unit substrate 401.
  • the magnetic permeability in turn changes the equivalent refractive index throughout the metamaterial.
  • the pattern of the artificial microstructure 402 used in this embodiment is a snowflake-shaped derivative pattern. As can be seen from FIG. 3 and FIG. 4, the size of the snow-like artificial microstructure 402 gradually increases from the directly under the metal plate 10 to both sides.
  • the microstrip line further includes a metamaterial film 50 covering the metal strip 10.
  • the metamaterial film 50 includes a plurality of second metamaterial sheets 501, and the plurality of second metamaterial sheets 501 have the same refractive index distribution.
  • the second metamaterial sheet layer 501 includes a plurality of metamaterial units 40.
  • the refractive index distribution in the second metamaterial sheet layer 501 is uniform, but the refractive index ranges from 0 to 1, because this refractive index range is the refractive index range of the medium for manufacturing the invisibility cloak, and such super
  • the material film covers the metal strip 10, which can effectively suppress the leakage of the spatial wave form of the microstrip line and reduce the electromagnetic wave crosstalk between adjacent microstrip lines.
  • the refractive index in the second metamaterial sheet layer 501 has a value of 0.7.
  • this embodiment discloses a super material-based suspended microstrip line, which is different from Embodiment 1 in that the grounding plate 20 is suspended directly below the metamaterial substrate 30 and is not closely attached. On the metamaterial substrate 30.
  • this embodiment discloses an inverted microstrip line based on metamaterial, which is different from Embodiment 3 in that the metal plate 10 is located on the same side as the ground plate 20 and is tightly attached to the metamaterial substrate 30. Stick together.
  • FIG. 9 it is a metamaterial-based coupled microstrip line, which differs from Embodiment 1 in that two identical metal strips 10 are disposed on one side of the metamaterial substrate 30, and the other side is provided. There is a ground plate 20 in which the refractive index distribution of the metamaterial substrate under each of the metal strips 10 is the same as in the first embodiment.

Abstract

The present invention relates to the field of microstrip. Provided is a metamaterial-based microstrip. The microstrip comprises a metal strip, a dielectric substrate, and a ground plate. The dielectric substrate is a metamaterial substrate. The metamaterial substrate comprises multiple first metamaterial lamellae. The metal strip and the ground plate respectively are arranged on two sides of the metamaterial substrate or on a same side of the metamaterial substrate. By implementing the arrangement of refractive indexes via the metamaterial substrate, the present invention allows for effective inhibition of space wave leakage, thus solving the problem of electromagnetic wave crosstalk between adjacent microstrips, while at the same time, the metamaterial substrate is provided with a simplified manufacturing process, where a complex splicing technique is obviated, thereby allowing for reduced costs.

Description

一种基于超材料的微带线  Metamaterial based microstrip line
【技术领域】[Technical Field]
本发明涉及微带线领域,更具体的说,涉及一种基于超材料的微带线。  The present invention relates to the field of microstrip lines and, more particularly, to a microstrip line based on metamaterials.
【背景技术】 【Background technique】
微带线(Microstrip Line)是目前混合微波集成电路(Hybrid Microwave Integrated Circuits,HMIC)和单片微波集成电路(Monolithic Microwave Integrated Circuits,MMIC)中使用最多的一种平面型传输线。从结构上看,微带线是由很薄的金属带以远小于波长的间隔置于一接地板上,金属带与接地板之间用介质基板隔开。Microstrip Line is a hybrid microwave integrated circuit (Hybrid Microwave) Integrated Circuits, HMIC) and monolithic microwave integrated circuits (Monolithic Microwave Integrated One of the most widely used planar transmission lines in Circuits, MMIC. Structurally, the microstrip line is placed on a ground plate by a very thin metal strip at a much smaller distance than the wavelength, and the metal strip is separated from the ground plane by a dielectric substrate.
微带线的突出优点是结构小巧、重量轻,可以用刻板、光刻、腐蚀等工艺在不大的体积内制成复杂的微波电路,并且容易与其他的微波器件集成,实现微波部件和系统的集成化。The outstanding advantage of the microstrip line is that it is compact and lightweight, and can be used to make complex microwave circuits in a small volume by stereolithography, photolithography, etching, etc., and is easy to integrate with other microwave devices to realize microwave components and systems. Integration.
随着微波元器件和系统的日益小型化,在一些对体积和重量要求苛刻的场合,可以采用微带传输线取代波导来构成微波电路并在同一块基板上组成各种不同的复杂平面电路,包括桥型电路、匹配负载、衰减器天线等。但是采用微带线传输同样存在缺点,即微带线损耗较大、易泄漏电磁能量造成串扰、Q值低、难以实现微调、功率容量小等。With the increasing miniaturization of microwave components and systems, in some cases where volume and weight are demanding, microstrip transmission lines can be used instead of waveguides to form microwave circuits and form various complex planar circuits on the same substrate, including Bridge circuit, matching load, attenuator antenna, etc. However, the use of microstrip line transmission also has the disadvantages of large loss of microstrip line, crosstalk caused by easy leakage of electromagnetic energy, low Q value, difficulty in fine adjustment, and small power capacity.
在使用微带线传输过程中,微带线上的导行电磁波沿微带线轴向不断向空间辐射能量而产生漏波,其中电磁波泄露有两种形式:表面波形式2和空间波形式1,如图1所示。目前已经知道微带线在高频段存在一个泄漏主模,这个泄漏主模以表面波的形式向外泄漏电磁波能量;而在低频段,微带线的各个高次模则以空间波的形式向外泄漏电磁波能量。不管是表面波泄漏还是空间波泄漏,在集成电路中,这些漏波都是有害的,它不仅带来传输功率的下降,而且其泄漏的能量还会给周围其他电路带来电磁干扰问题,从而使得系统总体性能下降,因此需要抑制漏波。In the process of using microstrip line transmission, the guided electromagnetic wave on the microstrip line continuously radiates energy along the axial direction of the microstrip line to generate leakage waves, wherein the electromagnetic wave leakage has two forms: surface wave form 2 and space wave form 1 ,As shown in Figure 1. It is known that there is a leakage main mode in the high frequency band of the microstrip line. This leakage main mode leaks electromagnetic wave energy outward in the form of surface waves. In the low frequency band, each higher order mode of the microstrip line is in the form of spatial wave. External leakage of electromagnetic wave energy. Whether it is surface wave leakage or space wave leakage, these leakage waves are harmful in integrated circuits, which not only bring about a drop in transmission power, but also cause leakage of electromagnetic energy to other surrounding circuits. The overall performance of the system is degraded, so it is necessary to suppress leakage waves.
现有技术中,对于抑制微带线主模泄漏的方法主要采用在微带线上敷一层介电常数足够大的薄的介质层;然而,对于微带线高次模泄漏的抑制,则没有什么简单有效的方法。这主要是由于微带线主模泄漏与高次模泄漏的物理机制不同而造成的,微带线高次模的空间波泄漏几乎很难被完全抑制掉。In the prior art, a method for suppressing leakage of a microstrip main mode is mainly to apply a thin dielectric layer having a sufficiently large dielectric constant on the microstrip line; however, for the suppression of high order mode leakage of the microstrip line, there is no What is a simple and effective method. This is mainly due to the difference in the physical mechanism of the leakage of the main mode of the microstrip line and the leakage of the high-order mode. The spatial wave leakage of the higher-order mode of the microstrip line is hardly completely suppressed.
【发明内容】 [Summary of the Invention]
本发明的目的在于克服现有技术中微带线高次模的空间波泄露的缺陷,提供基于超材料的微带线,该微带线能够有效的抑制空间波泄露,解决微带线之间电磁波串扰的问题。The object of the present invention is to overcome the defects of the spatial wave leakage of the high-order mode of the microstrip line in the prior art, and provide a microstrip line based on a metamaterial, which can effectively suppress the leakage of the space wave and solve the problem between the microstrip lines. The problem of electromagnetic wave crosstalk.
本发明提供一种基于超材料的微带线,其包括金属带、介质基板以及接地板,介质基板为超材料基板,超材料基板包括多个第一超材料片层,其中,金属带和接地板分别位于超材料基板的两侧或是位于超材料基板的同一侧。The invention provides a metamaterial-based microstrip line, which comprises a metal strip, a dielectric substrate and a grounding plate, the dielectric substrate is a metamaterial substrate, and the metamaterial substrate comprises a plurality of first metamaterial sheets, wherein the metal strips are connected The floors are located on either side of the metamaterial substrate or on the same side of the metamaterial substrate.
根据本发明一优选实施例,金属带和接地板分别位于超材料基板的两侧且均与超材料基板紧贴。According to a preferred embodiment of the present invention, the metal strip and the ground plate are respectively located on both sides of the metamaterial substrate and are in close contact with the metamaterial substrate.
根据本发明一优选实施例,金属带包括两条相同的金属带。According to a preferred embodiment of the invention, the metal strip comprises two identical metal strips.
根据本发明一优选实施例,金属带和接地板分别位于超材料基板的两侧,且金属带紧贴在超材料基板一侧上,接地板悬置于超材料基板另一侧的正下方。According to a preferred embodiment of the present invention, the metal strip and the grounding plate are respectively located on both sides of the metamaterial substrate, and the metal strip is closely attached to one side of the metamaterial substrate, and the grounding plate is suspended directly under the other side of the metamaterial substrate.
根据本发明一优选实施例,金属带和接地板位于超材料基板的同一侧,且金属带与超材料基板紧贴,接地板悬置于超材料基板的正下方。According to a preferred embodiment of the present invention, the metal strip and the ground plate are located on the same side of the metamaterial substrate, and the metal strip is in close contact with the metamaterial substrate, and the ground plate is suspended directly below the metamaterial substrate.
根据本发明一优选实施例,多个第一超材料片层具有相同的折射率分布,其中,每一第一超材料片层的折射率分布规律为:与金属带正下方处的折射率最小,且远离金属带的两侧的折射率逐渐增大。According to a preferred embodiment of the present invention, the plurality of first metamaterial sheets have the same refractive index distribution, wherein the refractive index distribution of each of the first metamaterial sheets is: the smallest refractive index directly under the metal strip And the refractive index of the two sides away from the metal strip gradually increases.
根据本发明一优选实施例,第一超材料片层包括多个超材料单元,超材料单元包括人造微结构和供人造微结构附着的单元基材。In accordance with a preferred embodiment of the present invention, the first metamaterial sheet comprises a plurality of metamaterial units comprising an artificial microstructure and a unit substrate for attachment of the artificial microstructure.
根据本发明一优选实施例,人造微结构为包括至少一根金属丝组成对电磁场有响应的平面结构或立体结构,金属丝为铜丝或银丝。According to a preferred embodiment of the invention, the artificial microstructure is a planar structure or a three-dimensional structure comprising at least one wire responsive to an electromagnetic field, the wire being a copper wire or a silver wire.
根据本发明一优选实施例,金属丝通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻的方法附着在单元基材上。In accordance with a preferred embodiment of the invention, the wire is attached to the unit substrate by etching, electroplating, drilling, photolithography, electron engraving or ion engraving.
根据本发明一优选实施例,人造微结构为雪花状或雪花状的衍生形任意一种。According to a preferred embodiment of the invention, the artificial microstructure is any one of a snowflake-shaped or snowflake-shaped derivative.
根据本发明一优选实施例,单元基材的制造材料包括陶瓷材料、环氧树脂、聚四氟乙烯、铁电材料、铁氧材料或铁磁材料。According to a preferred embodiment of the present invention, the material of the unit substrate is made of a ceramic material, an epoxy resin, a polytetrafluoroethylene, a ferroelectric material, a ferrite material or a ferromagnetic material.
根据本发明一优选实施例,微带线还包括超材料薄膜,超材料薄膜和金属带位于超材料基板的一侧,且紧贴于超材料基板,其中,超材料薄膜覆盖金属带。According to a preferred embodiment of the present invention, the microstrip line further includes a metamaterial film, the metamaterial film and the metal strip are located on one side of the metamaterial substrate, and are in close contact with the metamaterial substrate, wherein the metamaterial film covers the metal strip.
根据本发明一优选实施例,超材料薄膜包括多个第二超材料片层,且多个第二超材料片层具有相同的折射率分布。In accordance with a preferred embodiment of the present invention, the metamaterial film comprises a plurality of second metamaterial sheets, and the plurality of second metamaterial sheets have the same refractive index profile.
根据本发明一优选实施例,第二超材料片层的折射率分布规律为:第二超材料片层内的折射率分布是均匀的,且其折射率的取值范围为:0-1。According to a preferred embodiment of the present invention, the refractive index distribution of the second metamaterial sheet layer is such that the refractive index distribution in the second metamaterial sheet layer is uniform, and the refractive index has a refractive index ranging from 0-1.
根据本发明一优选实施例,第二超材料片层的折射率为0.7。According to a preferred embodiment of the invention, the second metamaterial sheet has a refractive index of 0.7.
根据本发明一优选实施例,第一超材料片层和第二超材料片层均包括多个超材料单元,超材料单元包括人造微结构和供人造微结构附着的单元基材。In accordance with a preferred embodiment of the present invention, the first metamaterial sheet layer and the second metamaterial sheet layer each comprise a plurality of metamaterial units comprising an artificial microstructure and a unit substrate for attachment of the artificial microstructure.
根据本发明一优选实施例,人造微结构为包括至少一根金属丝组成对电磁场有响应的平面结构或立体结构,金属丝为铜丝或银丝。According to a preferred embodiment of the invention, the artificial microstructure is a planar structure or a three-dimensional structure comprising at least one wire responsive to an electromagnetic field, the wire being a copper wire or a silver wire.
根据本发明一优选实施例,金属丝通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻的方法附着在单元基材上。In accordance with a preferred embodiment of the invention, the wire is attached to the unit substrate by etching, electroplating, drilling, photolithography, electron engraving or ion engraving.
根据本发明一优选实施例,人造微结构为雪花状或雪花状的衍生形任意一种。According to a preferred embodiment of the invention, the artificial microstructure is any one of a snowflake-shaped or snowflake-shaped derivative.
根据本发明一优选实施例,单元基材的制造材料包括陶瓷材料、环氧树脂、聚四氟乙烯、铁电材料、铁氧材料或铁磁材料。According to a preferred embodiment of the present invention, the material of the unit substrate is made of a ceramic material, an epoxy resin, a polytetrafluoroethylene, a ferroelectric material, a ferrite material or a ferromagnetic material.
本发明相对于现有技术,具有以下有益效果:Compared with the prior art, the invention has the following beneficial effects:
1、本发明采用超材料作为介质基板,通过调节超材料基板内部的折射率分布,有效的抑制了微带线的空间波泄露。1. The present invention uses a metamaterial as a dielectric substrate, and by adjusting the refractive index distribution inside the supermaterial substrate, the spatial wave leakage of the microstrip line is effectively suppressed.
2、本发明通过改变超材料内部的介电常数的变化来实现实际应用中需要的折射率,工艺简单,且易于批量生产。2. The present invention realizes the refractive index required in practical applications by changing the change of the dielectric constant inside the metamaterial, and the process is simple and easy to mass-produce.
3、利用超材料作为基板材料,免除了介质拼接技术,节约了成本。3, the use of metamaterials as a substrate material, eliminating the need for media splicing technology, saving costs.
4、本发明一种基于超材料的微带线通过在介质基板上设置一层超材料薄膜,且超材料薄膜覆盖金属带,有效的抑制了微带线空间波形式的漏波,减小了相邻微带线的电磁波串扰。4. A super-material based microstrip line according to the present invention comprises a layer of metamaterial film disposed on a dielectric substrate, and the super material film covers the metal strip, thereby effectively suppressing leakage waves in the form of spatial waves of the microstrip line, and reducing Electromagnetic crosstalk of adjacent microstrip lines.
【附图说明】 [Description of the Drawings]
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。其中:In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly described below. It is obvious that the drawings in the following description are only some embodiments of the present invention. Other drawings may also be obtained from those of ordinary skill in the art in light of the inventive work. among them:
图1是现有技术中微带线的两种泄露波形式的示意图;1 is a schematic view showing two forms of leakage waves of a microstrip line in the prior art;
图2是本发明第一实施例的基于超材料的微带线的结构示意图;2 is a schematic structural view of a metamaterial-based microstrip line according to a first embodiment of the present invention;
图3是图2中超材料基板的结构示意图;3 is a schematic structural view of the metamaterial substrate of FIG. 2;
图4是图2中超材料单元的结构示意图;Figure 4 is a schematic structural view of the metamaterial unit of Figure 2;
图5是本发明第二实施例的示意图;Figure 5 is a schematic view of a second embodiment of the present invention;
图6是图5中超材料薄膜结构示意图;Figure 6 is a schematic view showing the structure of the super-material film of Figure 5;
图7是本发明第三实施例的示意图;Figure 7 is a schematic view of a third embodiment of the present invention;
图8是本发明第四实施例的示意图;Figure 8 is a schematic view of a fourth embodiment of the present invention;
图9是本发明第五实施例的示意图。Figure 9 is a schematic view of a fifth embodiment of the present invention.
【具体实施方式】 【detailed description】
下面结合实施例及附图,对本发明作进一步地详细说明,但本发明的实施方式不限于此。The present invention will be further described in detail below with reference to the embodiments and drawings, but the embodiments of the present invention are not limited thereto.
实施例1Example 1
如图2所示,本发明揭示了一种基于超材料的微带线,该微带线包括金属带10、介质基板30以及接地板20,其中,金属带10和接地板20分别分布于介质基板30的两侧,且金属带10通过印刷电路板的方式紧贴于介质基板30的上侧。As shown in FIG. 2, the present invention discloses a metamaterial-based microstrip line including a metal strip 10, a dielectric substrate 30, and a grounding plate 20, wherein the metal strip 10 and the grounding plate 20 are respectively distributed on the medium. Both sides of the substrate 30, and the metal strip 10 is in close contact with the upper side of the dielectric substrate 30 by means of a printed circuit board.
本发明较佳的实施例中,接地板20紧贴于介质基板30的下侧,为了抑制金属带10电磁波传输过程中产生的空间波形式泄露,采用超材料基板作为介质基板30,进而减少相邻微带线之间的电磁波串扰。In a preferred embodiment of the present invention, the grounding plate 20 is in close contact with the lower side of the dielectric substrate 30. In order to suppress the leakage of the spatial wave generated during the electromagnetic wave transmission of the metal strip 10, the metamaterial substrate is used as the dielectric substrate 30, thereby reducing the phase. Electromagnetic crosstalk between adjacent microstrip lines.
请参阅图3和图4所示,超材料基板30包括多个第一超材料片层301,其中,每个第一超材料片层301包括多个超材料单元40,超材料单元40包括人造微结构402和供人造微结构402附着的单元基材401。Referring to FIGS. 3 and 4, the metamaterial substrate 30 includes a plurality of first metamaterial sheets 301, wherein each first metamaterial sheet 301 includes a plurality of metamaterial units 40, and the metamaterial unit 40 includes artificial The microstructure 402 is coupled to a unit substrate 401 for attachment to the artificial microstructure 402.
在本发明实施例中,多个第一超材料片层301优选为具有相同的折射率分布。In an embodiment of the invention, the plurality of first metamaterial sheets 301 preferably have the same refractive index profile.
每个第一超材料片层301的折射率分布规律为:如图3所示,对应金属带10正下方处的折射率最小,且远离金属带10两侧的地方折射率逐渐增大。The refractive index distribution pattern of each of the first metamaterial sheets 301 is such that, as shown in FIG. 3, the refractive index immediately below the corresponding metal strip 10 is the smallest, and the refractive index gradually increases away from the sides of the metal strip 10.
为使超材料基板30的每个第一超材料片层301实现图3所示折射率的变化,经过理论和实际证明,可对人造微结构402的拓扑结构、几何尺寸以及其在单元基材401上的分布进行设计,单元基材401采用介电绝缘材料制成,其制造材料包括陶瓷材料、高分子材料、铁电材料、铁氧材料或铁磁材料,其中,高分子材料可以是环氧树脂或聚四氟乙烯。人造微结构402为以一定的几何形状附着在单元基材401上能够对电磁波有响应的金属线,金属线可以是剖面为圆柱状或者扁平状的铜线、银线等,一般采用铜,因为铜丝相对比较便宜。当然,金属线的剖面也可以为其他形状。金属线通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻等工艺附着在单元基材401上,第一超材料片层301包括多个超材料单元40,每一超材料单元40都具有一个人造微结构402,每一个超材料单元40都会对通过其中的电磁波产生响应,从而影响电磁波在其中的传输,每个超材料单元40的尺寸取决于需要响应的电磁波,通常为所需响应的电磁波波长的十分之一,否则空间中包含人造微结构402的超材料单元40所组成的排列在空间中不能被视为连续。In order to realize the change of the refractive index shown in FIG. 3 for each of the first metamaterial sheets 301 of the metamaterial substrate 30, theoretically and practically, the topology, geometry and unit cell of the artificial microstructure 402 can be obtained. The distribution on the 401 is designed. The unit substrate 401 is made of a dielectric insulating material, and the manufacturing material thereof includes a ceramic material, a polymer material, a ferroelectric material, a ferrite material or a ferromagnetic material, wherein the polymer material may be a ring. Oxygen resin or polytetrafluoroethylene. The artificial microstructure 402 is a metal wire which is attached to the unit substrate 401 in a certain geometric shape and is responsive to electromagnetic waves. The metal wire may be a copper wire or a silver wire having a cylindrical or flat shape, and is generally made of copper because Copper wire is relatively cheap. Of course, the cross section of the wire can also be other shapes. The metal wires are attached to the unit substrate 401 by etching, electroplating, drilling, photolithography, electron engraving or ion etching, and the first metamaterial sheet layer 301 includes a plurality of metamaterial units 40, each of the metamaterial units 40. Having an artificial microstructure 402, each of the metamaterial units 40 is responsive to electromagnetic waves passing therethrough, thereby affecting the transmission of electromagnetic waves therein, the size of each metamaterial unit 40 being dependent on the electromagnetic waves that need to be responsive, typically the desired response One tenth of the wavelength of the electromagnetic wave, otherwise the arrangement of metamaterial units 40 containing artificial microstructures 402 in space cannot be considered continuous in space.
在单元基材401的选定的情况下,通过调整人造微结构402的形状、尺寸及其在单元基材401上的空间分布,可以调整超材料上各处的等效介电常数及等效磁导率进而改变超材料各处的等效折射率。当人造微结构402采用相同的几何形状时,某处人造微结构的尺寸越大,则该处的等效介电常数越大,折射率也越大。In the case of the selection of the unit substrate 401, the equivalent dielectric constant and equivalent of each place on the metamaterial can be adjusted by adjusting the shape and size of the artificial microstructure 402 and its spatial distribution on the unit substrate 401. The magnetic permeability in turn changes the equivalent refractive index throughout the metamaterial. When the artificial microstructure 402 adopts the same geometry, the larger the size of the artificial microstructure at a certain place, the larger the equivalent dielectric constant and the larger the refractive index.
本实施例采用的人造微结构402的图案为雪花状的衍生图案,由图3和图4可知,雪花状人造微结构402的尺寸从金属板10正下方处向两侧逐渐变大。The pattern of the artificial microstructure 402 used in this embodiment is a snowflake-shaped derivative pattern. As can be seen from FIG. 3 and FIG. 4, the size of the snow-like artificial microstructure 402 gradually increases from the directly under the metal plate 10 to both sides.
实施例2Example 2
如图5-6所示,本发明的另一实施例,与实施例1不同之处在于:微带线还进一步包括超材料薄膜50,超材料薄膜50覆盖金属带10。其中,超材料薄膜50包括多个第二超材料片层501,且多个第二超材料片层501具有相同的折射率分布。第二超材料片层501包括多个超材料单元40。其中,第二超材料片层501内的折射率分布是均匀的,但是折射率取值范围在0和1之间,因为这个折射率范围是制造隐身衣的介质折射率范围,用这样的超材料薄膜覆盖金属带10,能够有效的抑制微带线的空间波形式泄露,减少相邻微带线之间的电磁波串扰。本发明较佳的实施例中,第二超材料片层501内的折射率的取值为0.7。As shown in FIGS. 5-6, another embodiment of the present invention differs from Embodiment 1 in that the microstrip line further includes a metamaterial film 50 covering the metal strip 10. Wherein, the metamaterial film 50 includes a plurality of second metamaterial sheets 501, and the plurality of second metamaterial sheets 501 have the same refractive index distribution. The second metamaterial sheet layer 501 includes a plurality of metamaterial units 40. Wherein, the refractive index distribution in the second metamaterial sheet layer 501 is uniform, but the refractive index ranges from 0 to 1, because this refractive index range is the refractive index range of the medium for manufacturing the invisibility cloak, and such super The material film covers the metal strip 10, which can effectively suppress the leakage of the spatial wave form of the microstrip line and reduce the electromagnetic wave crosstalk between adjacent microstrip lines. In a preferred embodiment of the invention, the refractive index in the second metamaterial sheet layer 501 has a value of 0.7.
实施例3Example 3
如图7所示,本实施例揭示了一种基于超材料的悬置微带线,与实施例1不同之处在于:接地板20悬置于超材料基板30的正下方,并没有紧贴于超材料基板30。As shown in FIG. 7, this embodiment discloses a super material-based suspended microstrip line, which is different from Embodiment 1 in that the grounding plate 20 is suspended directly below the metamaterial substrate 30 and is not closely attached. On the metamaterial substrate 30.
实施例4Example 4
如图8所示,本实施例揭示了一种基于超材料的倒置微带线,与实施例3不同之处在于:金属板10位于与接地板20的同一侧,且与超材料基板30紧贴一起。As shown in FIG. 8 , this embodiment discloses an inverted microstrip line based on metamaterial, which is different from Embodiment 3 in that the metal plate 10 is located on the same side as the ground plate 20 and is tightly attached to the metamaterial substrate 30. Stick together.
实施例5Example 5
如图9所示,是一种基于超材料的耦合微带线,与实施例1不同之处在于,在超材料基板30的一侧设置有两条相同的金属带10,另一侧为设置有一接地板20,其中每一条金属带10下面的超材料基板的折射率分布情况均与实施例1相同。As shown in FIG. 9, it is a metamaterial-based coupled microstrip line, which differs from Embodiment 1 in that two identical metal strips 10 are disposed on one side of the metamaterial substrate 30, and the other side is provided. There is a ground plate 20 in which the refractive index distribution of the metamaterial substrate under each of the metal strips 10 is the same as in the first embodiment.
上述实施例为本发明较佳的实施方式,但本发明的实施方式并不受上述实施例的限制,其他的任何未违背本发明的精神实质与原理下所作的改变、修饰、替代、组合、简化,均应为等效的置换方式,都包含在本发明的保护范围之内。The above embodiments are preferred embodiments of the present invention, but the embodiments of the present invention are not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and modifications made without departing from the spirit and scope of the present invention. Simplifications should all be equivalent replacements and are included in the scope of the present invention.

Claims (20)

  1. 一种基于超材料的微带线,所述微带线包括金属带、介质基板以及接地板,其特征在于,所述介质基板为超材料基板,所述超材料基板包括多个第一超材料片层,其中,所述金属带和所述接地板分别位于所述超材料基板的两侧或是位于所述超材料基板的同一侧。 A micromaterial based microstrip line, the microstrip line comprising a metal strip, a dielectric substrate, and a grounding plate, wherein the dielectric substrate is a metamaterial substrate, and the metamaterial substrate comprises a plurality of first metamaterials a layer, wherein the metal strip and the ground plate are respectively located on two sides of the metamaterial substrate or on the same side of the metamaterial substrate.
  2. 根据权利要求1所述的微带线,其特征在于,所述金属带和所述接地板分别位于所述超材料基板的两侧且均与所述超材料基板紧贴。The microstrip line according to claim 1, wherein the metal strip and the grounding plate are respectively located on both sides of the metamaterial substrate and are in close contact with the metamaterial substrate.
  3. 根据权利要求2所述的基于超材料的微带线,其特征在于,所述金属带包括两条相同的金属带。The metamaterial-based microstrip line according to claim 2, wherein the metal strip comprises two identical metal strips.
  4. 根据权利要求1所述的微带线,其特征在于,所述金属带和所述接地板分别位于所述超材料基板的两侧,且所述金属带紧贴在所述超材料基板一侧上,所述接地板悬置于所述超材料基板另一侧的正下方。The microstrip line according to claim 1, wherein the metal strip and the grounding plate are respectively located at two sides of the metamaterial substrate, and the metal strip is closely attached to one side of the metamaterial substrate. The ground plate is suspended directly below the other side of the metamaterial substrate.
  5. 根据权利要求1所述的微带线,其特征在于,所述金属带和所述接地板位于所述超材料基板的同一侧,且所述金属带与所述超材料基板紧贴,所述接地板悬置于所述超材料基板的正下方。The microstrip line according to claim 1, wherein the metal strip and the ground plate are located on the same side of the metamaterial substrate, and the metal strip is in close contact with the metamaterial substrate, A ground plate is suspended directly below the metamaterial substrate.
  6. 根据权利要求1所述的微带线,其特征在于,多个所述第一超材料片层具有相同的折射率分布,其中,每一所述第一超材料片层的折射率分布规律为:与所述金属带正下方处的折射率最小,且远离所述金属带的两侧的折射率逐渐增大。 The microstrip line according to claim 1, wherein a plurality of said first metamaterial sheets have the same refractive index distribution, wherein a refractive index distribution of each of said first metamaterial sheets is The refractive index at the bottom directly under the metal strip is the smallest, and the refractive index away from both sides of the metal strip is gradually increased.
  7. 根据权利要求6所述的微带线,其特征在于,所述第一超材料片层包括多个超材料单元,所述超材料单元包括人造微结构和供所述人造微结构附着的单元基材。The microstrip line according to claim 6, wherein said first metamaterial sheet layer comprises a plurality of metamaterial units, said metamaterial unit comprising an artificial microstructure and a unit base for attachment of said artificial microstructure material.
  8. 根据权利要求7所述的微带线,其特征在于,所述人造微结构为包括至少一根金属丝组成对电磁场有响应的平面结构或立体结构,所述金属丝为铜丝或银丝。The microstrip line according to claim 7, wherein the artificial microstructure is a planar structure or a three-dimensional structure comprising at least one wire responsive to an electromagnetic field, the wire being a copper wire or a silver wire.
  9. 根据权利要求8所述的微带线,其特征在于,所述金属丝通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻的方法附着在所述单元基材上。The microstrip line according to claim 8, wherein the wire is attached to the unit substrate by etching, plating, drilling, photolithography, electron engraving or ion etching.
  10. 根据权利要求7所述的微带线,其特征在于,所述人造微结构为雪花状或雪花状的衍生形任意一种。The microstrip line according to claim 7, wherein the artificial microstructure is any one of a snowflake-shaped or snowflake-shaped derivative.
  11. 根据权利要求10所述的微带线,其特征在于,所述单元基材的制造材料包括陶瓷材料、环氧树脂、聚四氟乙烯、铁电材料、铁氧材料或铁磁材料。The microstrip line according to claim 10, wherein the material of the unit substrate is made of a ceramic material, an epoxy resin, a polytetrafluoroethylene, a ferroelectric material, a ferrite material or a ferromagnetic material.
  12. 根据权利要求6所述的微带线,其特征在于,所述微带线还包括超材料薄膜,所述超材料薄膜和所述金属带位于所述超材料基板的一侧,且紧贴于所述超材料基板,其中,所述超材料薄膜覆盖所述金属带。The microstrip line according to claim 6, wherein the microstrip line further comprises a metamaterial film, the metamaterial film and the metal strip are located on one side of the metamaterial substrate, and are in close contact with The metamaterial substrate, wherein the metamaterial film covers the metal strip.
  13. 根据权利要求12所述的微带线,其特征在于,所述超材料薄膜包括多个第二超材料片层,且多个所述第二超材料片层具有相同的折射率分布。The microstrip line according to claim 12, wherein the metamaterial film comprises a plurality of second metamaterial sheets, and the plurality of second metamaterial sheets have the same refractive index profile.
  14. 根据权利要求13所述的微带线,其特征在于,所述第二超材料片层的折射率分布规律为:所述第二超材料片层内的折射率分布是均匀的,且其折射率的取值范围为:0-1。The microstrip line according to claim 13, wherein the refractive index distribution of the second metamaterial sheet is such that the refractive index distribution in the second metamaterial sheet is uniform and its refraction The range of values is: 0-1.
  15. 根据权利要求14所述的微带线,其特征在于,所述第二超材料片层的折射率为0.7。The microstrip line according to claim 14, wherein the second metamaterial sheet has a refractive index of 0.7.
  16. 根据权利要求13所述的微带线,其特征在于,所述第一超材料片层和第二超材料片层均包括多个超材料单元,所述超材料单元包括人造微结构和供所述人造微结构附着的单元基材。The microstrip line according to claim 13, wherein said first metamaterial sheet layer and said second metamaterial sheet layer each comprise a plurality of metamaterial units, said metamaterial unit comprising an artificial microstructure and a supply A unit substrate to which an artificial microstructure is attached.
  17. 根据权利要求16所述的微带线,其特征在于,所述人造微结构为包括至少一根金属丝组成对电磁场有响应的平面结构或立体结构,所述金属丝为铜丝或银丝。The microstrip line according to claim 16, wherein the artificial microstructure is a planar structure or a three-dimensional structure comprising at least one wire responsive to an electromagnetic field, the wire being a copper wire or a silver wire.
  18. 根据权利要求17所述的微带线,其特征在于,所述金属丝通过蚀刻、电镀、钻刻、光刻、电子刻或离子刻的方法附着在所述单元基材上。The microstrip line according to claim 17, wherein the wire is attached to the unit substrate by etching, plating, drilling, photolithography, electron engraving or ion engraving.
  19. 根据权利要求16所述的微带线,其特征在于,所述人造微结构为雪花状或雪花状的衍生形任意一种。The microstrip line according to claim 16, wherein the artificial microstructure is any one of a snowflake-shaped or snowflake-shaped derivative.
  20. 根据权利要求16所述的微带线,其特征在于,所述单元基材的制造材料包括陶瓷材料、环氧树脂、聚四氟乙烯、铁电材料、铁氧材料或铁磁材料。The microstrip line according to claim 16, wherein the material of the unit substrate is made of a ceramic material, an epoxy resin, a polytetrafluoroethylene, a ferroelectric material, a ferrite material or a ferromagnetic material.
PCT/CN2012/073680 2011-08-31 2012-04-09 Metamaterial-based microstrip WO2013029371A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CN201110254545.1A CN102956940B (en) 2011-08-31 2011-08-31 Based on the microstrip line of Meta Materials
CN201110254574.8 2011-08-31
CN201110254574.8A CN102956941B (en) 2011-08-31 2011-08-31 Based on the microstrip line of Meta Materials
CN201110254545.1 2011-08-31

Publications (1)

Publication Number Publication Date
WO2013029371A1 true WO2013029371A1 (en) 2013-03-07

Family

ID=47755257

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2012/073680 WO2013029371A1 (en) 2011-08-31 2012-04-09 Metamaterial-based microstrip

Country Status (1)

Country Link
WO (1) WO2013029371A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101320838A (en) * 2008-07-17 2008-12-10 上海联能科技有限公司 Micro-miniature terminal antenna based on composite right/left-handed transmission line
CN101587990A (en) * 2009-07-01 2009-11-25 东南大学 Broad band cylindrical lens antenna based on artificial electromagnetic materials
CN101919109A (en) * 2007-02-07 2010-12-15 台湾积体电路制造股份有限公司 Design method for transmission lines using meta-materials

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101919109A (en) * 2007-02-07 2010-12-15 台湾积体电路制造股份有限公司 Design method for transmission lines using meta-materials
CN101320838A (en) * 2008-07-17 2008-12-10 上海联能科技有限公司 Micro-miniature terminal antenna based on composite right/left-handed transmission line
CN101587990A (en) * 2009-07-01 2009-11-25 东南大学 Broad band cylindrical lens antenna based on artificial electromagnetic materials

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
ZHOU, EN: "Utilization and Suppression of Leaky-Wave on Microstrip Line", CHINA DOCTORAL DISSERTATIONS FULL-TEXT DATABASE, vol. 4, 15 April 2007 (2007-04-15), pages 1 - 2 AND 79, Retrieved from the Internet <URL:1671-6779> *

Similar Documents

Publication Publication Date Title
WO2012142831A1 (en) Broadband wave-absorbing metamaterial
US8704730B2 (en) Metamaterial antenna device with mechanical connection
US9070965B2 (en) Hybrid metamaterial antenna structures
WO2019237765A1 (en) Metamaterial structural unit, metamaterial and electronic device
US8872725B1 (en) Electronically-tunable flexible low profile microwave antenna
CN109378591B (en) Conformal broadband reflection type linear polarization converter insensitive to angle
CN113688550A (en) Incident wave anti-reflection glass based on transparent metal material and anti-reflection method
CN108649343B (en) Tunable polarization converter and electronic device
US8558120B2 (en) Multilayer board for suppressing unwanted electromagnetic waves and noise
WO2013044618A1 (en) Microstrip
CN216901662U (en) Incident wave anti-reflection glass based on transparent metal material
WO2013029371A1 (en) Metamaterial-based microstrip
US20220352623A1 (en) Antenna and manufacturing method thereof
WO2013029372A1 (en) Microstrip
US10237969B2 (en) Electromagnetic bandgap structure and method for manufacturing the same
CN110233353B (en) Metamaterial unit and metamaterial-based double-layer radiation antenna device
US20120001804A1 (en) Crlh antenna structures
Chen et al. A compact electromagnetic bandgap structure based on multi-layer technology for 7-Tesla magnetic resonance imaging applications
WO2022153388A1 (en) Electromagnetic wave absorber
Martynyuk et al. 2-bit $ X $-band reflective waveguide phase shifter with BCB-based bias circuits
WO2015149317A1 (en) Stacked chip ceramic radio-frequency low-pass filter and manufacturing method thereof
CN102956940B (en) Based on the microstrip line of Meta Materials
CN102956942B (en) Based on the microstrip line of Meta Materials
Hu et al. A Bandpass Substrate Integrated Waveguide Filter Mix-loaded with Multiple DGS
JP2023026302A (en) waveguide element

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 12828912

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 12828912

Country of ref document: EP

Kind code of ref document: A1