WO2013021578A1 - Display panel - Google Patents

Display panel Download PDF

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Publication number
WO2013021578A1
WO2013021578A1 PCT/JP2012/004841 JP2012004841W WO2013021578A1 WO 2013021578 A1 WO2013021578 A1 WO 2013021578A1 JP 2012004841 W JP2012004841 W JP 2012004841W WO 2013021578 A1 WO2013021578 A1 WO 2013021578A1
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WO
WIPO (PCT)
Prior art keywords
substrate
display panel
liquid crystal
step portion
electrode
Prior art date
Application number
PCT/JP2012/004841
Other languages
French (fr)
Japanese (ja)
Inventor
健 巻口
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Publication of WO2013021578A1 publication Critical patent/WO2013021578A1/en

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/02—Details
    • H05B33/04—Sealing arrangements, e.g. against humidity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133302—Rigid substrates, e.g. inorganic substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133311—Environmental protection, e.g. against dust or humidity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/50—Protective arrangements
    • G02F2201/501—Blocking layers, e.g. against migration of ions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
    • H01L23/18—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device
    • H01L23/26—Fillings characterised by the material, its physical or chemical properties, or its arrangement within the complete device including materials for absorbing or reacting with moisture or other undesired substances, e.g. getters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Definitions

  • the present invention relates to a display panel such as a liquid crystal display panel in which a pair of substrates are overlapped at a predetermined interval and liquid crystal is sealed in a gap between the pair of substrates.
  • a liquid crystal display panel which is one of display panels, is thin and lightweight, and is therefore widely used in mobile devices such as notebook computers and mobile phones, and AV devices such as liquid crystal televisions.
  • a liquid crystal display panel includes a pair of substrates disposed opposite to each other (that is, a TFT (Thin Film Transistor) substrate and a CF (Color Filter) substrate), a liquid crystal layer provided between the pair of substrates, A pair of substrates are bonded to each other, and a sealing material provided in a frame shape to enclose the liquid crystal between both substrates, and a plurality of layers provided between the pair of substrates for regulating the thickness of the liquid crystal layer And a spacer.
  • TFT Thin Film Transistor
  • CF Color Filter
  • ions may be taken into the panel, and if these ions are present in the liquid crystal layer, a predetermined liquid crystal alignment cannot be obtained. There is a problem that display defects such as display unevenness occur.
  • This liquid crystal display panel for suppressing display unevenness due to non-uniformity of ions in the liquid crystal layer has been proposed.
  • This liquid crystal display panel includes dummy pixels to which a constant voltage is applied when the display panel is driven in a peripheral portion surrounding the display portion.
  • the present invention has been made in view of the above-described problems, and provides a display panel that can suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture. Objective.
  • a display panel includes a first substrate, a second substrate disposed opposite to the first substrate, and a display medium provided between the first substrate and the second substrate. And a sealing material that is sandwiched between the first substrate and the second substrate and adheres the first substrate and the second substrate to each other in a frame region defined around the display region for performing image display.
  • the display panel is characterized in that, in the frame region, the first substrate and the second substrate are provided with a stepped portion disposed between the display medium layer and the sealing material.
  • the step portion prevents the foreign matter from entering the display medium layer. be able to. Accordingly, since the display medium layer can be prevented from being contaminated by nonionic foreign matters such as moisture entering the inside of the display panel, display unevenness caused by nonionic foreign matters such as moisture can be prevented. The occurrence of display defects can be suppressed.
  • the stepped portion may be composed of a first stepped portion provided on the first substrate and a second stepped portion provided on the second substrate.
  • the first step portion and the second step portion may have a substantially trapezoidal cross section.
  • the metal material when a wiring is formed by depositing a metal material on the surface of the stepped portion, the metal material can be reliably deposited to prevent disconnection.
  • the first step portion may be provided on the display medium layer side, and the second step portion may be provided on the seal material side.
  • the first step portion may be provided on the sealing material side and the second step portion may be provided on the display medium layer side.
  • an adsorbing material that adsorbs foreign matter may be provided between the stepped portion and the sealing material.
  • the stepped portion is disposed between the adsorbent and the display medium layer, and the adsorbent and the display medium layer are stepped. It will arrange
  • the adsorbent may be one selected from the group consisting of a carbon adsorbent, a zeolite adsorbent, and activated alumina.
  • the display panel of the present invention further includes a first electrode provided on the first substrate and a second electrode provided on the second substrate and disposed opposite to the first electrode, the first and second electrodes.
  • a non-conductive film that prevents contact between the first electrode and the second electrode may be provided on at least one of the stepped portions.
  • the first electrode when the first step portion is provided on the first substrate and the first electrode is formed on the first substrate, the first electrode is temporarily formed on the surface of the first step portion. Even if it exists, it becomes possible to prevent a contact with a 1st electrode and a 2nd electrode reliably.
  • the second step when the second step is provided on the second substrate and the second electrode is formed on the second substrate, the second electrode is temporarily formed on the surface of the second step. However, it is possible to reliably prevent contact between the first electrode and the second electrode.
  • the non-conductive film can reliably prevent vertical leaks (point defects) due to the conductive foreign matter.
  • the display panel of the present invention has an excellent characteristic that it is possible to suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture. Therefore, the present invention is suitably used for a display panel using a liquid crystal layer as a display medium layer.
  • the present invention it is possible to suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture in the display panel.
  • 1 is a plan view showing an overall configuration of a liquid crystal display panel according to a first embodiment of the present invention.
  • 1 is a cross-sectional view of a liquid crystal display panel according to a first embodiment of the present invention.
  • 1 is an equivalent circuit diagram of a liquid crystal display panel according to a first embodiment of the present invention. It is sectional drawing which shows the whole structure of the TFT substrate which comprises the liquid crystal display panel which concerns on the 1st Embodiment of this invention. It is sectional drawing which shows the whole structure of the display part of the liquid crystal display panel which concerns on the 1st Embodiment of this invention.
  • FIG. 2 is a cross-sectional view in the side direction of the liquid crystal display panel according to the first embodiment of the present invention, and is a cross-sectional view taken along the line AA in FIG. It is sectional drawing in the edge direction of the liquid crystal display panel which concerns on the 2nd Embodiment of invention. It is sectional drawing of the liquid crystal display panel which concerns on the modification of this invention. It is sectional drawing of the liquid crystal display panel which concerns on the modification of this invention. It is sectional drawing of the liquid crystal display panel which concerns on the modification of this invention.
  • FIG. 1 is a plan view showing the overall configuration of the liquid crystal display panel according to the first embodiment of the present invention
  • FIG. 2 is a cross-sectional view of the liquid crystal display panel according to the first embodiment of the present invention.
  • FIG. 3 is an equivalent circuit diagram of the liquid crystal display panel according to the first embodiment of the present invention
  • FIG. 4 is an entire TFT substrate constituting the liquid crystal display panel according to the first embodiment of the present invention. It is sectional drawing which shows a structure.
  • FIG. 5 is a cross-sectional view showing the overall configuration of the display unit of the liquid crystal display panel according to the first embodiment of the present invention
  • FIG. 6 shows the liquid crystal display panel according to the first embodiment of the present invention.
  • FIG. 2 is a cross-sectional view in the side direction, and is a cross-sectional view along AA in FIG.
  • a liquid crystal display panel will be described as an example of the display panel.
  • the liquid crystal display panel 1 includes a TFT substrate 2 that is a first substrate, a CF substrate 3 that is a second substrate disposed opposite the TFT substrate 2, a TFT substrate 2, And a liquid crystal layer 4 which is a display medium layer provided between the CF substrates 3.
  • the liquid crystal display panel 1 is sandwiched between the TFT substrate 2 and the CF substrate 3, and a seal provided in a frame shape for adhering the TFT substrate 2 and the CF substrate 3 to each other and enclosing the liquid crystal layer 4.
  • the material 40 is provided.
  • the sealing material 40 is formed so as to go around the liquid crystal layer 4, and the TFT substrate 2 and the CF substrate 3 are bonded to each other via the sealing material 40.
  • the liquid crystal display panel 1 includes a plurality of photo spacers 25 for regulating the cell gap (that is, the thickness of the liquid crystal layer 4).
  • the TFT substrate 2 protrudes from the CF substrate 3 on the upper side, and the protruding region of the TFT substrate 2 is used for driving the liquid crystal display panel 1.
  • a terminal region T provided with a plurality of terminals 35 is configured.
  • connection wirings (gate lines, source lines, etc.) 36 connected to the plurality of terminals 35 are provided.
  • a display area D for displaying an image is defined in an area where the TFT substrate 2 and the CF substrate 3 overlap.
  • the display area D is configured by arranging a plurality of pixels, which are the minimum unit of an image, in a matrix. Further, around the display area D, a frame area F in which the sealing material 40 is disposed is defined.
  • the sealing material 40 is provided in a rectangular frame shape surrounding the entire periphery of the display area D as shown in FIG.
  • the frame width of the sealing material 40 is not particularly limited, but can be set to 0.5 mm or more and 2.0 mm or less, for example.
  • the TFT substrate 2 covers an insulating substrate 6 such as a glass substrate, a plurality of gate lines 11 extending in parallel with each other on the insulating substrate 6, and the gate lines 11.
  • the gate insulating film 12 is provided.
  • the TFT substrate 2 includes a plurality of source lines 14 extending in parallel to each other in a direction orthogonal to each gate line 11 on the gate insulating film 12, and each intersection of the gate line 11 and each source line 14.
  • a plurality of TFTs 5 are provided.
  • the TFT substrate 2 includes an interlayer insulating film 10 provided so as to cover each source line 14 and each TFT 5, and a plurality of pixels provided in a matrix on the interlayer insulating film 10 and connected to each TFT 5.
  • An electrode 19 and an alignment film 9 provided so as to cover each pixel electrode 19 are provided.
  • the TFT 5 includes a gate electrode 17 in which each gate line 11 protrudes to the side, a gate insulating film 12 provided so as to cover the gate electrode 17, and a gate on the gate insulating film 12.
  • a semiconductor layer 13 provided in an island shape at a position overlapping with the electrode 17, and a source electrode 18 and a drain electrode 20 provided so as to face each other on the semiconductor layer 13 are provided.
  • the source electrode 18 is a portion where each source line 14 protrudes to the side.
  • the drain electrode 20 is connected to the pixel electrode 19 through a contact hole 30 formed in the interlayer insulating film 10 as shown in FIG.
  • the pixel electrode 19 includes a transparent electrode 31 provided on the interlayer insulating film 10, and a reflective electrode 32 stacked on the transparent electrode 31 and provided on the surface of the transparent electrode 31. It is comprised by.
  • the semiconductor layer 13 includes a lower intrinsic amorphous silicon layer 13 a and an upper n + amorphous silicon layer 13 b doped with phosphorus, and is exposed from the source electrode 18 and the drain electrode 20.
  • the intrinsic amorphous silicon layer 13a that constitutes the channel region.
  • the surface of the interlayer insulating film 10 under the pixel electrode 19 is formed in an uneven shape, and the reflective electrode 32 provided on the surface of the interlayer insulating film 10 via the transparent electrode 31.
  • the surface of is also formed in an uneven shape.
  • the material forming the interlayer insulating film 10 is not particularly limited, and examples thereof include silicon oxide (SiO 2 ) and silicon nitride (SiNx (x is a positive number)).
  • the thickness of the interlayer insulating film 10 is preferably 600 nm or more and 1000 nm or less.
  • the thickness of the interlayer insulating film 10 is less than 600 nm, it may be difficult to planarize the interlayer insulating film 10.
  • the thickness is larger than 1000 nm, the contact is caused by etching. This is because there may be a disadvantage that it is difficult to form the hole 30.
  • the CF substrate 3 includes an insulating substrate 21 such as a glass substrate, a color filter layer 22 provided on the insulating substrate 21, and a reflection region R and a transmission region in the reflection region P of the color filter layer 22. And a transparent layer 23 for compensating for the optical path difference in the region P.
  • an insulating substrate 21 such as a glass substrate
  • a color filter layer 22 provided on the insulating substrate 21, and a reflection region R and a transmission region in the reflection region P of the color filter layer 22.
  • a transparent layer 23 for compensating for the optical path difference in the region P.
  • the CF substrate 3 includes a common electrode 24 provided so as to cover the transmission region P and the transparent layer 23 (that is, the reflection region R) of the color filter layer 22, and a photo spacer provided in a column shape on the common electrode 24. 25 and an alignment film 26 provided so as to cover the common electrode 24 and the photospacer 25.
  • the common electrode 24 is disposed so as to face the pixel electrode 19 provided on the TFT substrate 2. Further, the color filter layer 22 includes a colored layer 28 of a red layer R, a green layer G, and a blue layer B provided for each pixel, and a black matrix 27 that is a light shielding film.
  • the black matrix 27 is provided between the adjacent colored layers 28 and has a role of partitioning the plurality of colored layers 28. Further, as shown in FIG. 5, the black matrix 27 is disposed so as to face the interlayer insulating film 10 included in the TFT substrate 2 with the photo spacer 25 interposed therebetween.
  • the photo spacer 25 shown in FIG. 1 is made of, for example, an acrylic photosensitive resin and is formed by a photolithography method.
  • the black matrix 27 is made of a metal material such as Ta (tantalum), Cr (chromium), Mo (molybdenum), Ni (nickel), Ti (titanium), Cu (copper), or Al (aluminum), or black such as carbon. It is formed of a resin material in which a pigment is dispersed or a resin material in which a plurality of colored layers having light transmittance are laminated.
  • the transflective liquid crystal display panel 1 having the above configuration reflects light incident from the CF substrate 3 side in the reflective region R by the reflective electrode 32 and backlight (not shown) incident from the TFT substrate 2 side in the transmissive region P. ) Is transmitted.
  • the liquid crystal display panel 1 includes one pixel for each pixel electrode 19.
  • a gate signal is sent from the gate line 11 and the TFT 5 is turned on in each pixel, the liquid crystal display panel 1 starts from the source line 14.
  • a source signal is sent, and a predetermined charge is written into the pixel electrode 19 via the source electrode 18 and the drain electrode 20.
  • a potential difference is generated between the pixel electrode 19 and the common electrode 24, and a predetermined voltage is applied to the liquid crystal layer 4.
  • liquid crystal display panel 1 an image is displayed by adjusting the transmittance of light incident from the backlight by utilizing the change in the alignment state of the liquid crystal molecules according to the magnitude of the applied voltage. It becomes the composition which is done.
  • the TFT substrate 2 and the CF substrate 3 are provided with a step portion 42 disposed between the liquid crystal layer 4 and the sealing material 40.
  • a step portion 42 disposed between the liquid crystal layer 4 and the sealing material 40.
  • the step portion 42 includes a first step portion 45 provided on the insulating substrate 6 of the TFT substrate 2 and a second step portion 46 provided on the insulating substrate 21 of the CF substrate 3. ing.
  • the first step portion 45 is provided on the liquid crystal layer 4 side
  • the second step portion 46 is provided on the sealing material 40 side.
  • a gap 38 is provided between the step portion 42 and the sealing material 40.
  • the step portion 42 causes the foreign matter to enter the liquid crystal layer 4. Intrusion can be prevented. Therefore, the liquid crystal layer 4 can be prevented from being contaminated by nonionic foreign matter such as moisture that has entered the liquid crystal display panel 1. Therefore, in the liquid crystal display panel 1, the liquid crystal display panel 1 is caused by nonionic foreign matter such as moisture. Occurrence of display defects such as display unevenness can be suppressed.
  • the cell gap can be held by the step portion 42 without mixing a spacer such as glass fiber formed of silica into the sealing material 40, for example.
  • the first step 45 has a substantially trapezoidal cross section. This is because, for example, when the first step 45 has a substantially rectangular cross section, a metal film such as a titanium film that is a material of the wiring 36 is formed on the entire insulating substrate 6 by sputtering, for example. In addition, the titanium film may not be formed on the side surface of the first step portion 45, and the wiring 36 may be disconnected.
  • a metal film such as a titanium film that is a material of the wiring 36 is formed on the entire insulating substrate 6 by sputtering, for example.
  • the titanium film may not be formed on the side surface of the first step portion 45, and the wiring 36 may be disconnected.
  • the second stepped portion 46 when wiring is formed across the second stepped portion 46, the second stepped portion 46 has a substantially trapezoidal cross section so that a metal film is formed on the side surface of the second stepped portion 46. Therefore, the occurrence of disconnection in the wiring can be prevented.
  • a non-conductive film 48 that prevents the pixel electrode 19 and the common electrode 24 from contacting each other is provided on the first step portion 45.
  • the non-conductive film 48 can prevent the pixel electrode 19 and the common electrode 24 from contacting each other through the conductive foreign matter. Thus, it is possible to reliably prevent the occurrence of vertical leaks (point defects) due to conductive foreign matter.
  • Examples of the material for forming the non-conductive film 48 include silicon nitride, silicon oxide, silicon nitride oxide, and polyimide resin.
  • the TFT substrate 2 and the CF substrate 3 are provided with a step portion 42 disposed between the liquid crystal layer 4 and the sealing material 40. Therefore, the liquid crystal layer 4 can be prevented from being contaminated by nonionic foreign matters such as moisture that has passed through the sealing material 40 and entered the liquid crystal display panel 1. Generation of display defects such as display unevenness due to ionic foreign matters can be suppressed.
  • the step gap 42 can hold the cell gap without mixing the sealing material 40 with a spacer such as glass fiber formed of silica.
  • the first step portion 45 having a substantially trapezoidal cross section is provided. Accordingly, occurrence of disconnection in the wiring 36 can be prevented.
  • a non-conductive film 48 that prevents contact between the pixel electrode 19 and the common electrode 24 is provided on the first step portion 45. Therefore, even when the first step 45 is provided on the TFT substrate 2, it is possible to reliably prevent the pixel electrode 19 and the common electrode 24 from contacting each other.
  • FIG. 7 is a cross-sectional view in the side direction of a liquid crystal display panel according to the second embodiment of the invention. Note that the same components as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted. Further, since the entire configuration of the liquid crystal display panel and the entire configuration of the TFT substrate are the same as those described in the first embodiment, detailed description thereof is omitted here. Also in the present embodiment, a liquid crystal display panel will be described as an example of the display panel.
  • adsorbent 37 for example, a carbon adsorbent, a zeolite adsorbent (for example, molecular sieve), activated alumina, or the like can be used.
  • the adsorbent 37 for adsorbing foreign matters such as moisture is provided between the stepped portion 42 and the sealing material 40. Accordingly, it is possible to remove nonionic foreign matters such as moisture that have passed through the sealing material 40 and entered the liquid crystal display panel 1 by the adsorbing material 37. As a result, by providing the adsorbent 37 together with the stepped portion 42, it is possible to further suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture in the liquid crystal display panel 1. .
  • the stepped portion 42 is disposed between the adsorbent 37 and the liquid crystal layer 4. Accordingly, since the adsorbent 37 and the liquid crystal layer 4 are spaced apart from each other via the step portion 42, contamination of the liquid crystal layer 4 due to foreign matters such as moisture adsorbed on the adsorbent 37 can be prevented. .
  • the first step portion 45 is provided on the liquid crystal layer 4 side and the second step portion 46 is provided on the sealing material 40 side, but as shown in FIG.
  • the first step portion 45 may be provided on the sealing material 40 side, and the second step portion 46 may be provided on the liquid crystal layer 4 side.
  • the non-conductive film 48 is provided on the first step 45 of the TFT substrate 2.
  • the non-conductive film 48 is formed on the second step of the CF substrate 3. 46 may be provided. Further, the non-conductive film 48 may be provided on both the first step portion 45 and the second step portion 46.
  • step-difference part 42 was comprised by one 1st level
  • step-difference part 46 is provided with two or more.
  • the step portion 42 may be configured.
  • the stepped portion 42 can be configured by one first stepped portion 45 and two second stepped portions 46.
  • the adsorbent 37 is provided between the step portion 42 and the sealing material 40.
  • the adsorbent 37 may be provided on the step portion 42.
  • an adsorbent 37 can be provided on the first step portion 45.
  • liquid crystal display panel has been described as an example of the display panel, but the present invention can be applied to other display panels such as an organic EL display panel.
  • the present invention is suitable for a display panel such as a liquid crystal display panel in which a pair of substrates are overlapped at a predetermined interval and liquid crystal is sealed in a gap between the pair of substrates.
  • Liquid crystal display panel TFT substrate (first substrate) 3 CF substrate (second substrate) 4 Liquid crystal layer (display medium layer) 5 TFT 6 Insulating substrate 9 Alignment film 10 Interlayer insulating film 11 Gate line 12 Gate insulating film 13 Semiconductor layer 14 Source line 17 Gate electrode 18 Source electrode 19 Pixel electrode (first electrode) 20 Drain electrode 21 Insulating substrate 22 Color filter layer 23 Transparent layer 24 Common electrode (second electrode) 25 Photospacer 26 Alignment film 27 Black matrix 28 Colored layer 30 Contact hole 35 Terminal 36 Wiring 37 Adsorbent 38 Clearance 40 Sealing material 42 Stepped portion 45 First stepped portion 46 Second stepped portion

Abstract

A liquid crystal display panel (1) is provided with: a TFT substrate (2); a CF substrate (3) disposed facing the TFT substrate (2); a liquid crystal layer (4) provided between the TFT substrate (2) and the CF substrate (3); and a sealing material (40) that is sandwiched between the TFT substrate (2) and the CF substrate (3) in a frame region (F) prescribed around a display region (D) that displays an image, said sealing material (40) making the TFT substrate (2) and the CF substrate (3) adhere to each other. In the frame region (F), a stepped part (42) that is disposed between the liquid crystal layer (4) and the sealing material (40) is provided in the TFT substrate (2) and the CF substrate (3).

Description

表示パネルDisplay panel
　本発明は、一対の基板を所定の間隔を隔てて重ね合わせ、一対の基板の間隙に液晶を封入する液晶表示パネル等の表示パネルに関する。 The present invention relates to a display panel such as a liquid crystal display panel in which a pair of substrates are overlapped at a predetermined interval and liquid crystal is sealed in a gap between the pair of substrates.
　表示パネルの１つである液晶表示パネルは、薄型で軽量であるため、ノートパソコンや携帯電話機等のモバイル機器や、液晶テレビ等のＡＶ機器に広く用いられている。 A liquid crystal display panel, which is one of display panels, is thin and lightweight, and is therefore widely used in mobile devices such as notebook computers and mobile phones, and AV devices such as liquid crystal televisions.
　一般に、液晶表示パネルは、互いに対向して配置された一対の基板（即ち、ＴＦＴ（Thin Film Transistor）基板とＣＦ（Color Filter）基板）と、一対の基板の間に設けられた液晶層と、一対の基板を互いに接着するとともに、両基板の間に液晶を封入するために枠状に設けられたシール材と、一対の基板の間に設けられ、液晶層の厚みを規制するための複数のスペーサとを備えている。 In general, a liquid crystal display panel includes a pair of substrates disposed opposite to each other (that is, a TFT (Thin Film Transistor) substrate and a CF (Color Filter) substrate), a liquid crystal layer provided between the pair of substrates, A pair of substrates are bonded to each other, and a sealing material provided in a frame shape to enclose the liquid crystal between both substrates, and a plurality of layers provided between the pair of substrates for regulating the thickness of the liquid crystal layer And a spacer.
　ここで、このような液晶表示パネルにおいては、例えば、パネルの組み立て工程において、パネル内にイオンが取り込まれる場合があり、このイオンが液晶層に存在すると、所定の液晶配向を得ることができず、表示ムラ等の表示不良が発生するという問題があった。 Here, in such a liquid crystal display panel, for example, in the panel assembly process, ions may be taken into the panel, and if these ions are present in the liquid crystal layer, a predetermined liquid crystal alignment cannot be obtained. There is a problem that display defects such as display unevenness occur.
　そこで、液晶層中のイオンの不均一化による表示ムラを抑制するための液晶表示パネルが提案されている。この液晶表示パネルは、表示部を囲む周辺部に、表示パネルを駆動する際に一定の電圧が印加されるダミー画素を備えている。 Therefore, a liquid crystal display panel for suppressing display unevenness due to non-uniformity of ions in the liquid crystal layer has been proposed. This liquid crystal display panel includes dummy pixels to which a constant voltage is applied when the display panel is driven in a peripheral portion surrounding the display portion.
　そして、このダミー画素に電圧を印加することにより、周辺部でイオンを凝集させることができるため、液晶層におけるイオンの凝集を抑制することができ、結果として、表示部における液晶層中のイオンの不均一化を抑制することができると記載されている（例えば、特許文献１参照）。 By applying a voltage to the dummy pixel, ions can be aggregated in the peripheral portion, so that the aggregation of ions in the liquid crystal layer can be suppressed. As a result, the ions in the liquid crystal layer in the display unit can be suppressed. It is described that non-uniformization can be suppressed (see, for example, Patent Document 1).
特開２００９－３２８５号公報JP 2009-3285 A
　しかし、上記特許文献１に記載の液晶表示パネルにおいては、ダミー画素により、イオン性の異物に起因する表示ムラ等の表示不良は抑制することができるものの、シール材を通過して、液晶表示パネルの内部に侵入した水分等の非イオン性の異物を排除することができない。従って、液晶表示パネルの内部に侵入した水分等の非イオン性の異物により液晶層が汚染されて、表示ムラ等の表示不良が発生するという問題があった。 However, in the liquid crystal display panel described in Patent Document 1, display defects such as display unevenness due to ionic foreign matter can be suppressed by the dummy pixels, but the liquid crystal display panel passes through the sealing material. It is not possible to exclude nonionic foreign matters such as moisture that have entered the interior of the interior. Therefore, there is a problem that the liquid crystal layer is contaminated by nonionic foreign matters such as moisture entering the liquid crystal display panel, resulting in display defects such as display unevenness.
　そこで、本発明は、上述の問題に鑑みてなされたものであり、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生を抑制することができる表示パネルを提供することを目的とする。 Therefore, the present invention has been made in view of the above-described problems, and provides a display panel that can suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture. Objective.
　上記目的を達成するために、本発明の表示パネルは、第１基板と、第１基板に対向して配置された第２基板と、第１基板及び第２基板の間に設けられた表示媒体層と、画像表示を行う表示領域の周囲に規定された額縁領域において、第１基板と第２基板との間に挟持され、第１基板及び第２基板を互いに接着するシール材とを備えた表示パネルであって、額縁領域において、第１基板及び第２基板には、表示媒体層とシール材との間に配置された段差部が設けられていることを特徴とする。 In order to achieve the above object, a display panel according to the present invention includes a first substrate, a second substrate disposed opposite to the first substrate, and a display medium provided between the first substrate and the second substrate. And a sealing material that is sandwiched between the first substrate and the second substrate and adheres the first substrate and the second substrate to each other in a frame region defined around the display region for performing image display. The display panel is characterized in that, in the frame region, the first substrate and the second substrate are provided with a stepped portion disposed between the display medium layer and the sealing material.
　同構成によれば、シール材を通過して、表示パネルの内部に水分等の非イオン性の異物が侵入した場合であっても、段差部により、表示媒体層への異物の侵入を防止することができる。従って、表示パネルの内部に侵入した水分等の非イオン性の異物による表示媒体層の汚染を防止することができるため、表示パネルにおいて、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生を抑制することができる。 According to the configuration, even when a nonionic foreign matter such as moisture enters the inside of the display panel through the sealing material, the step portion prevents the foreign matter from entering the display medium layer. be able to. Accordingly, since the display medium layer can be prevented from being contaminated by nonionic foreign matters such as moisture entering the inside of the display panel, display unevenness caused by nonionic foreign matters such as moisture can be prevented. The occurrence of display defects can be suppressed.
　また、額縁領域において、シール材にスペーサを混入することなく、段差部により、セルギャップを保持することが可能になる。 Also, in the frame region, it becomes possible to hold the cell gap by the stepped portion without mixing the spacer into the sealing material.
　本発明の表示パネルにおいては、段差部は、第１基板に設けられた第１段差部と、第２基板に設けられた第２段差部とにより構成されていてもよい。 In the display panel of the present invention, the stepped portion may be composed of a first stepped portion provided on the first substrate and a second stepped portion provided on the second substrate.
　本発明の表示パネルにおいては、第１段差部及び第２段差部が、断面略台形状を有する構成としてもよい。 In the display panel of the present invention, the first step portion and the second step portion may have a substantially trapezoidal cross section.
　同構成によれば、段差部の表面に金属材料を成膜することにより配線を形成する場合に、金属材料を確実に成膜して、断線の発生を防止することができる。 According to this configuration, when a wiring is formed by depositing a metal material on the surface of the stepped portion, the metal material can be reliably deposited to prevent disconnection.
　本発明の表示パネルにおいては、第１段差部が表示媒体層側に設けられ、第２段差部がシール材側に設けられていてもよい。 In the display panel of the present invention, the first step portion may be provided on the display medium layer side, and the second step portion may be provided on the seal material side.
　本発明の表示パネルにおいては、第１段差部がシール材側に設けられ、第２段差部が表示媒体層側に設けられていてもよい。 In the display panel of the present invention, the first step portion may be provided on the sealing material side and the second step portion may be provided on the display medium layer side.
　本発明の表示パネルにおいては、段差部とシール材との間に、異物を吸着する吸着材が設けられていてもよい。 In the display panel of the present invention, an adsorbing material that adsorbs foreign matter may be provided between the stepped portion and the sealing material.
　同構成によれば、シール材を通過して、表示パネルの内部に侵入した水分等の非イオン性の異物を吸着材により吸着して除去することが可能になる。従って、段差部とともに吸着材を設けることにより、表示パネルにおいて、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生をより一層抑制することが可能になる。 According to this configuration, it becomes possible to adsorb and remove nonionic foreign substances such as moisture that have passed through the sealing material and entered the display panel. Therefore, by providing the adsorbent together with the stepped portion, it is possible to further suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture in the display panel.
　また、段差部とシール材との間に吸着材が設けられているため、吸着材と表示媒体層との間に段差部が配置されることになり、吸着材と表示媒体層とが、段差部を介して、離間して配置されることになる。従って、吸着材に吸着された水分等の異物による表示媒体層の汚染を防止することができる。 In addition, since the adsorbent is provided between the stepped portion and the sealing material, the stepped portion is disposed between the adsorbent and the display medium layer, and the adsorbent and the display medium layer are stepped. It will arrange | position away via a part. Accordingly, it is possible to prevent the display medium layer from being contaminated by foreign matters such as moisture adsorbed on the adsorbent.
　本発明の表示パネルにおいては、吸着材が、カーボン吸着材、ゼオライト吸着材、活性アルミナからなる群より選ばれる１種であってもよい。 In the display panel of the present invention, the adsorbent may be one selected from the group consisting of a carbon adsorbent, a zeolite adsorbent, and activated alumina.
　本発明の表示パネルにおいては、第１基板に設けられた第１電極と、第２基板に設けられ、第１電極に対向して配置された第２電極とを更に備え、第１及び第２段差部の少なくとも一方に、第１電極と第２電極との接触を防止する非導電膜が設けられていてもよい。 The display panel of the present invention further includes a first electrode provided on the first substrate and a second electrode provided on the second substrate and disposed opposite to the first electrode, the first and second electrodes. A non-conductive film that prevents contact between the first electrode and the second electrode may be provided on at least one of the stepped portions.
　同構成によれば、第１基板に第１段差部を設けて、第１基板に第１電極を形成する際に、仮に、第１段差部の表面上に第１電極が形成された場合であっても、第１電極と第２電極との接触を確実に防止することが可能になる。また、同様に、第２基板に第２段差部を設けて、第２基板に第２電極を形成する際に、仮に、第２段差部の表面上に第２電極が形成された場合であっても、第１電極と第２電極との接触を確実に防止することが可能になる。 According to this configuration, when the first step portion is provided on the first substrate and the first electrode is formed on the first substrate, the first electrode is temporarily formed on the surface of the first step portion. Even if it exists, it becomes possible to prevent a contact with a 1st electrode and a 2nd electrode reliably. Similarly, when the second step is provided on the second substrate and the second electrode is formed on the second substrate, the second electrode is temporarily formed on the surface of the second step. However, it is possible to reliably prevent contact between the first electrode and the second electrode.
　また、表示媒体層内に導電性異物が存在する場合であっても、非導電膜により、導電性異物に起因する上下リーク（点欠陥）の発生を確実に防止することができる。 In addition, even when conductive foreign matter is present in the display medium layer, the non-conductive film can reliably prevent vertical leaks (point defects) due to the conductive foreign matter.
　また、本発明の表示パネルは、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生を抑制することができるという優れた特性を備えている。従って、本発明は、表示媒体層に、液晶層を使用した表示パネルに好適に使用される。 In addition, the display panel of the present invention has an excellent characteristic that it is possible to suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture. Therefore, the present invention is suitably used for a display panel using a liquid crystal layer as a display medium layer.
　本発明によれば、表示パネルにおいて、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生を抑制することができる。 According to the present invention, it is possible to suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture in the display panel.
本発明の第１の実施形態に係る液晶表示パネルの全体構成を示す平面図である。1 is a plan view showing an overall configuration of a liquid crystal display panel according to a first embodiment of the present invention. 本発明の第１の実施形態に係る液晶表示パネルの断面図である。1 is a cross-sectional view of a liquid crystal display panel according to a first embodiment of the present invention. 本発明の第１の実施形態に係る液晶表示パネルの等価回路図である。1 is an equivalent circuit diagram of a liquid crystal display panel according to a first embodiment of the present invention. 本発明の第１の実施形態に係る液晶表示パネルを構成するＴＦＴ基板の全体構成を示す断面図である。It is sectional drawing which shows the whole structure of the TFT substrate which comprises the liquid crystal display panel which concerns on the 1st Embodiment of this invention. 本発明の第１の実施形態に係る液晶表示パネルの表示部の全体構成を示す断面図である。It is sectional drawing which shows the whole structure of the display part of the liquid crystal display panel which concerns on the 1st Embodiment of this invention. 本発明の第１の実施形態に係る液晶表示パネルの辺方向における断面図であり、図１のＡ－Ａ断面図である。FIG. 2 is a cross-sectional view in the side direction of the liquid crystal display panel according to the first embodiment of the present invention, and is a cross-sectional view taken along the line AA in FIG. 発明の第２の実施形態に係る液晶表示パネルの辺方向における断面図である。It is sectional drawing in the edge direction of the liquid crystal display panel which concerns on the 2nd Embodiment of invention. 本発明の変形例に係る液晶表示パネルの断面図である。It is sectional drawing of the liquid crystal display panel which concerns on the modification of this invention. 本発明の変形例に係る液晶表示パネルの断面図である。It is sectional drawing of the liquid crystal display panel which concerns on the modification of this invention. 本発明の変形例に係る液晶表示パネルの断面図である。It is sectional drawing of the liquid crystal display panel which concerns on the modification of this invention.
　以下、本発明の実施形態を図面に基づいて詳細に説明する。尚、本発明は、以下の実施形態に限定されるものではない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The present invention is not limited to the following embodiment.
　（第１の実施形態）
　図１は、本発明の第１の実施形態に係る液晶表示パネルの全体構成を示す平面図であり、図２は、本発明の第１の実施形態に係る液晶表示パネルの断面図である。また、図３は、本発明の第１の実施形態に係る液晶表示パネルの等価回路図であり、図４は、本発明の第１の実施形態に係る液晶表示パネルを構成するＴＦＴ基板の全体構成を示す断面図である。また、図５は、本発明の第１の実施形態に係る液晶表示パネルの表示部の全体構成を示す断面図であり、図６は、本発明の第１の実施形態に係る液晶表示パネルの辺方向における断面図であり、図１のＡ－Ａ断面図である。なお、本実施形態においては、表示パネルとして、液晶表示パネルを例に挙げて説明する。 (First embodiment)
FIG. 1 is a plan view showing the overall configuration of the liquid crystal display panel according to the first embodiment of the present invention, and FIG. 2 is a cross-sectional view of the liquid crystal display panel according to the first embodiment of the present invention. FIG. 3 is an equivalent circuit diagram of the liquid crystal display panel according to the first embodiment of the present invention, and FIG. 4 is an entire TFT substrate constituting the liquid crystal display panel according to the first embodiment of the present invention. It is sectional drawing which shows a structure. FIG. 5 is a cross-sectional view showing the overall configuration of the display unit of the liquid crystal display panel according to the first embodiment of the present invention, and FIG. 6 shows the liquid crystal display panel according to the first embodiment of the present invention. FIG. 2 is a cross-sectional view in the side direction, and is a cross-sectional view along AA in FIG. In the present embodiment, a liquid crystal display panel will be described as an example of the display panel.
　図１、図２に示す様に、液晶表示パネル１は、第１基板であるＴＦＴ基板２と、ＴＦＴ基板２に対向して配置された第２基板であるＣＦ基板３と、ＴＦＴ基板２及びＣＦ基板３の間に挟持されて設けられた表示媒体層である液晶層４とを備えている。 As shown in FIGS. 1 and 2, the liquid crystal display panel 1 includes a TFT substrate 2 that is a first substrate, a CF substrate 3 that is a second substrate disposed opposite the TFT substrate 2, a TFT substrate 2, And a liquid crystal layer 4 which is a display medium layer provided between the CF substrates 3.
　また、液晶表示パネル１は、ＴＦＴ基板２とＣＦ基板３との間に狭持され、ＴＦＴ基板２及びＣＦ基板３を互いに接着するとともに液晶層４を封入するために枠状に設けられたシール材４０とを備えている。 The liquid crystal display panel 1 is sandwiched between the TFT substrate 2 and the CF substrate 3, and a seal provided in a frame shape for adhering the TFT substrate 2 and the CF substrate 3 to each other and enclosing the liquid crystal layer 4. The material 40 is provided.
　このシール材４０は、液晶層４を周回するように形成されており、ＴＦＴ基板２とＣＦ基板３は、このシール材４０を介して相互に貼り合わされている。また、図１に示すように、液晶表示パネル１は、セルギャップ（即ち、液晶層４の厚み）を規制するための複数のフォトスペーサ２５を備えている。 The sealing material 40 is formed so as to go around the liquid crystal layer 4, and the TFT substrate 2 and the CF substrate 3 are bonded to each other via the sealing material 40. As shown in FIG. 1, the liquid crystal display panel 1 includes a plurality of photo spacers 25 for regulating the cell gap (that is, the thickness of the liquid crystal layer 4).
　また、図１に示すように、液晶表示パネル１では、ＴＦＴ基板２がその上辺においてＣＦ基板３よりも突出しており、ＴＦＴ基板２の突出した領域には、液晶表示パネル１を駆動するための複数の端子３５が設けられた端子領域Ｔが構成されている。 As shown in FIG. 1, in the liquid crystal display panel 1, the TFT substrate 2 protrudes from the CF substrate 3 on the upper side, and the protruding region of the TFT substrate 2 is used for driving the liquid crystal display panel 1. A terminal region T provided with a plurality of terminals 35 is configured.
　また、端子領域Ｔにおいては、複数の端子３５に接続された複数の接続用の配線（ゲート線やソース線等）３６が設けられている。 In the terminal region T, a plurality of connection wirings (gate lines, source lines, etc.) 36 connected to the plurality of terminals 35 are provided.
　また、液晶表示パネル１では、ＴＦＴ基板２及びＣＦ基板３が重なる領域に画像表示を行う表示領域Ｄが規定されている。ここで、表示領域Ｄは、画像の最小単位である画素がマトリクス状に複数配列されることにより構成されている。また、表示領域Ｄの周囲において、シール材４０が配置される額縁領域Ｆが規定されている。 In the liquid crystal display panel 1, a display area D for displaying an image is defined in an area where the TFT substrate 2 and the CF substrate 3 overlap. Here, the display area D is configured by arranging a plurality of pixels, which are the minimum unit of an image, in a matrix. Further, around the display area D, a frame area F in which the sealing material 40 is disposed is defined.
　なお、シール材４０は、図１に示すように、表示領域Ｄの周囲全体を囲む矩形枠状に設けられている。このシール材４０の枠幅は、特に限定されないが、例えば、０．５ｍｍ以上２．０ｍｍ以下に設定できる。 The sealing material 40 is provided in a rectangular frame shape surrounding the entire periphery of the display area D as shown in FIG. The frame width of the sealing material 40 is not particularly limited, but can be set to 0.5 mm or more and 2.0 mm or less, for example.
　ＴＦＴ基板２は、図３、図４に示すように、ガラス基板等の絶縁基板６と、当該絶縁基板６上に互いに平行に延設された複数のゲート線１１と、各ゲート線１１を覆うように設けられたゲート絶縁膜１２とを備えている。また、ＴＦＴ基板２は、ゲート絶縁膜１２上に各ゲート線１１と直交する方向に互いに平行に延設された複数のソース線１４と、各ゲート線１１及び各ソース線１４の交差部分毎にそれぞれ設けられた複数のＴＦＴ５とを備えている。 As shown in FIGS. 3 and 4, the TFT substrate 2 covers an insulating substrate 6 such as a glass substrate, a plurality of gate lines 11 extending in parallel with each other on the insulating substrate 6, and the gate lines 11. The gate insulating film 12 is provided. Further, the TFT substrate 2 includes a plurality of source lines 14 extending in parallel to each other in a direction orthogonal to each gate line 11 on the gate insulating film 12, and each intersection of the gate line 11 and each source line 14. A plurality of TFTs 5 are provided.
　また、ＴＦＴ基板２は、各ソース線１４及び各ＴＦＴ５を覆うように設けられた層間絶縁膜１０と、層間絶縁膜１０上にマトリクス状に設けられ、各ＴＦＴ５の各々に接続された複数の画素電極１９と、各画素電極１９を覆うように設けられた配向膜９とを備えている。 The TFT substrate 2 includes an interlayer insulating film 10 provided so as to cover each source line 14 and each TFT 5, and a plurality of pixels provided in a matrix on the interlayer insulating film 10 and connected to each TFT 5. An electrode 19 and an alignment film 9 provided so as to cover each pixel electrode 19 are provided.
　また、ＴＦＴ５は、図４に示すように、各ゲート線１１が側方に突出したゲート電極１７と、ゲート電極１７を覆うように設けられたゲート絶縁膜１２と、ゲート絶縁膜１２上でゲート電極１７に重なる位置において島状に設けられた半導体層１３と、半導体層１３上で互いに対峙するように設けられたソース電極１８及びドレイン電極２０とを備えている。 As shown in FIG. 4, the TFT 5 includes a gate electrode 17 in which each gate line 11 protrudes to the side, a gate insulating film 12 provided so as to cover the gate electrode 17, and a gate on the gate insulating film 12. A semiconductor layer 13 provided in an island shape at a position overlapping with the electrode 17, and a source electrode 18 and a drain electrode 20 provided so as to face each other on the semiconductor layer 13 are provided.
　ここで、ソース電極１８は、各ソース線１４が側方に突出した部分である。また、ドレイン電極２０は、図４に示すように、層間絶縁膜１０に形成されたコンタクトホール３０を介して画素電極１９に接続されている。 Here, the source electrode 18 is a portion where each source line 14 protrudes to the side. Further, the drain electrode 20 is connected to the pixel electrode 19 through a contact hole 30 formed in the interlayer insulating film 10 as shown in FIG.
　また、画素電極１９は、図５に示すように、層間絶縁膜１０上に設けられた透明電極３１と、透明電極３１上に積層され、透明電極３１の表面上に設けられた反射電極３２とにより構成されている。 As shown in FIG. 5, the pixel electrode 19 includes a transparent electrode 31 provided on the interlayer insulating film 10, and a reflective electrode 32 stacked on the transparent electrode 31 and provided on the surface of the transparent electrode 31. It is comprised by.
　また、半導体層１３は、図４に示すように、下層の真性アモルファスシリコン層１３ａと、その上層のリンがドープされたｎ＋アモルファスシリコン層１３ｂとを備え、ソース電極１８及びドレイン電極２０から露出する真性アモルファスシリコン層１３ａがチャネル領域を構成している。 Further, as shown in FIG. 4, the semiconductor layer 13 includes a lower intrinsic amorphous silicon layer 13 a and an upper n + amorphous silicon layer 13 b doped with phosphorus, and is exposed from the source electrode 18 and the drain electrode 20. The intrinsic amorphous silicon layer 13a that constitutes the channel region.
　また、ＴＦＴ基板２及びそれを備えた液晶表示パネル１の表示部では、図５に示すように、反射電極３２により反射領域Ｒが規定され、反射電極３２から露出する透明電極３１により透過領域Ｐが規定されている。 Further, in the TFT substrate 2 and the display unit of the liquid crystal display panel 1 including the TFT substrate 2, as shown in FIG. Is stipulated.
　また、画素電極１９の下層の層間絶縁膜１０の表面は、図５に示すように、凹凸状に形成されており、層間絶縁膜１０の表面に透明電極３１を介して設けられた反射電極３２の表面も凹凸状に形成されている。 Further, as shown in FIG. 5, the surface of the interlayer insulating film 10 under the pixel electrode 19 is formed in an uneven shape, and the reflective electrode 32 provided on the surface of the interlayer insulating film 10 via the transparent electrode 31. The surface of is also formed in an uneven shape.
　なお、層間絶縁膜１０を構成する材料としては、特に限定されず、例えば、酸化シリコン（ＳｉＯ２）、窒化シリコン（ＳｉＮｘ（ｘは正数））等が挙げられる。また、層間絶縁膜１０の厚みは、６００ｎｍ以上１０００ｎｍ以下が好ましい。 The material forming the interlayer insulating film 10 is not particularly limited, and examples thereof include silicon oxide (SiO 2 ) and silicon nitride (SiNx (x is a positive number)). The thickness of the interlayer insulating film 10 is preferably 600 nm or more and 1000 nm or less.
　これは、層間絶縁膜１０の厚みが６００ｎｍ未満の場合は、層間絶縁膜１０を平坦化することが困難になるという不都合が生じる場合があるためであり、１０００ｎｍより大きい場合は、エッチングにより、コンタクトホール３０を形成することが困難になるという不都合が生じる場合があるためである。 This is because when the thickness of the interlayer insulating film 10 is less than 600 nm, it may be difficult to planarize the interlayer insulating film 10. When the thickness is larger than 1000 nm, the contact is caused by etching. This is because there may be a disadvantage that it is difficult to form the hole 30.
　ＣＦ基板３は、図５に示すように、ガラス基板等の絶縁基板２１と、絶縁基板２１上に設けられたカラーフィルター層２２と、カラーフィルター層２２の反射領域Ｐにおいて、反射領域Ｒ及び透過領域Ｐにおける光路差を補償するための透明層２３とを備えている。 As shown in FIG. 5, the CF substrate 3 includes an insulating substrate 21 such as a glass substrate, a color filter layer 22 provided on the insulating substrate 21, and a reflection region R and a transmission region in the reflection region P of the color filter layer 22. And a transparent layer 23 for compensating for the optical path difference in the region P.
　また、ＣＦ基板３は、カラーフィルター層２２の透過領域Ｐ及び透明層２３（即ち、反射領域Ｒ）を覆うように設けられた共通電極２４と、共通電極２４上に柱状に設けられたフォトスペーサ２５と、共通電極２４及びフォトスペーサ２５を覆うように設けられた配向膜２６とを有している。 The CF substrate 3 includes a common electrode 24 provided so as to cover the transmission region P and the transparent layer 23 (that is, the reflection region R) of the color filter layer 22, and a photo spacer provided in a column shape on the common electrode 24. 25 and an alignment film 26 provided so as to cover the common electrode 24 and the photospacer 25.
　なお、共通電極２４は、ＴＦＴ基板２に設けられた画素電極１９と対向して配置されている。また、カラーフィルター層２２には、各画素に対して設けられた赤色層Ｒ、緑色層Ｇ、および青色層Ｂの着色層２８と、遮光膜であるブラックマトリクス２７とが含まれる。 The common electrode 24 is disposed so as to face the pixel electrode 19 provided on the TFT substrate 2. Further, the color filter layer 22 includes a colored layer 28 of a red layer R, a green layer G, and a blue layer B provided for each pixel, and a black matrix 27 that is a light shielding film.
　ブラックマトリクス２７は、隣接する着色層２８の間に設けられ、これら複数の着色層２８を区画する役割を有するものである。また、図５に示すように、ブラックマトリクス２７は、フォトスペーサ２５を介して、ＴＦＴ基板２が有する層間絶縁膜１０に対向して配置されている。 The black matrix 27 is provided between the adjacent colored layers 28 and has a role of partitioning the plurality of colored layers 28. Further, as shown in FIG. 5, the black matrix 27 is disposed so as to face the interlayer insulating film 10 included in the TFT substrate 2 with the photo spacer 25 interposed therebetween.
　また、図１に示すフォトスペーサ２５は、例えば、アクリル系の感光性樹脂からなり、フォトリソグラフィー法により形成される。 The photo spacer 25 shown in FIG. 1 is made of, for example, an acrylic photosensitive resin and is formed by a photolithography method.
　また、ブラックマトリクス２７は、Ｔａ（タンタル）、Ｃｒ（クロム）、Ｍｏ（モリブデン）、Ｎｉ（ニッケル）、Ｔｉ（チタン）、Ｃｕ（銅）、Ａｌ（アルミニウム）等の金属材料、カーボンなどの黒色顔料が分散された樹脂材料、または、各々、光透過性を有する複数色の着色層が積層された樹脂材料などにより形成される。 The black matrix 27 is made of a metal material such as Ta (tantalum), Cr (chromium), Mo (molybdenum), Ni (nickel), Ti (titanium), Cu (copper), or Al (aluminum), or black such as carbon. It is formed of a resin material in which a pigment is dispersed or a resin material in which a plurality of colored layers having light transmittance are laminated.
　上記構成の半透過型の液晶表示パネル１は、反射領域ＲにおいてＣＦ基板３側から入射する光を反射電極３２で反射するとともに、透過領域ＰにおいてＴＦＴ基板２側から入射するバックライト（不図示）からの光を透過するように構成されている。 The transflective liquid crystal display panel 1 having the above configuration reflects light incident from the CF substrate 3 side in the reflective region R by the reflective electrode 32 and backlight (not shown) incident from the TFT substrate 2 side in the transmissive region P. ) Is transmitted.
　そして、液晶表示パネル１は、各画素電極１９毎に１つの画素が構成されており、各画素において、ゲート線１１からゲート信号が送られてＴＦＴ５をオン状態にした場合に、ソース線１４からソース信号が送られてソース電極１８及びドレイン電極２０を介して、画素電極１９に所定の電荷が書き込まれる。そして、画素電極１９と共通電極２４との間で電位差が生じ、液晶層４に所定の電圧が印加されるように構成されている。 The liquid crystal display panel 1 includes one pixel for each pixel electrode 19. When a gate signal is sent from the gate line 11 and the TFT 5 is turned on in each pixel, the liquid crystal display panel 1 starts from the source line 14. A source signal is sent, and a predetermined charge is written into the pixel electrode 19 via the source electrode 18 and the drain electrode 20. A potential difference is generated between the pixel electrode 19 and the common electrode 24, and a predetermined voltage is applied to the liquid crystal layer 4.
　そして、液晶表示パネル１では、印加された電圧の大きさに応じて、液晶分子の配向状態が変わることを利用して、バックライトから入射する光の透過率を調整することにより、画像が表示される構成となっている。 In the liquid crystal display panel 1, an image is displayed by adjusting the transmittance of light incident from the backlight by utilizing the change in the alignment state of the liquid crystal molecules according to the magnitude of the applied voltage. It becomes the composition which is done.
　ここで、本実施形態においては、図６に示すように、額縁領域Ｆにおいて、ＴＦＴ基板２とＣＦ基板３に、液晶層４とシール材４０との間に配置された段差部４２が設けられている点に特徴がある。 Here, in this embodiment, as shown in FIG. 6, in the frame region F, the TFT substrate 2 and the CF substrate 3 are provided with a step portion 42 disposed between the liquid crystal layer 4 and the sealing material 40. There is a feature in that.
　より具体的には、この段差部４２は、ＴＦＴ基板２の絶縁基板６に設けられた第１段差部４５と、ＣＦ基板３の絶縁基板２１に設けられた第２段差部４６とにより構成されている。そして、額縁領域Ｆにおいて、第１段差部４５が液晶層４側に設けられ、第２段差部４６がシール材４０側に設けられている。なお、段差部４２とシール材４０との間には、隙間３８が設けられている。 More specifically, the step portion 42 includes a first step portion 45 provided on the insulating substrate 6 of the TFT substrate 2 and a second step portion 46 provided on the insulating substrate 21 of the CF substrate 3. ing. In the frame region F, the first step portion 45 is provided on the liquid crystal layer 4 side, and the second step portion 46 is provided on the sealing material 40 side. A gap 38 is provided between the step portion 42 and the sealing material 40.
　このような構成により、シール材４０を通過して、液晶表示パネル１の内部に水分等の非イオン性の異物が侵入した場合であっても、段差部４２により、液晶層４への異物の侵入を防止することができる。従って、液晶表示パネル１の内部に侵入した水分等の非イオン性の異物による液晶層４の汚染を防止することができるため、液晶表示パネル１において、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生を抑制することができる。 With such a configuration, even when a nonionic foreign matter such as moisture enters the liquid crystal display panel 1 through the sealing material 40, the step portion 42 causes the foreign matter to enter the liquid crystal layer 4. Intrusion can be prevented. Therefore, the liquid crystal layer 4 can be prevented from being contaminated by nonionic foreign matter such as moisture that has entered the liquid crystal display panel 1. Therefore, in the liquid crystal display panel 1, the liquid crystal display panel 1 is caused by nonionic foreign matter such as moisture. Occurrence of display defects such as display unevenness can be suppressed.
　また、額縁領域Ｆにおいて、シール材４０に、例えば、シリカにより形成されたガラスファイバー等のスペーサを混入することなく、段差部４２により、セルギャップを保持することが可能になる。 Further, in the frame region F, the cell gap can be held by the step portion 42 without mixing a spacer such as glass fiber formed of silica into the sealing material 40, for example.
　また、図６に示すように、第１段差部４５は、断面略台形状を有している。これは、例えば、第１段差部４５が、断面略矩形状を有する場合、絶縁基板６の全体に、スパッタリング法により、例えば、配線３６の材料であるチタン膜などの金属膜を成膜する際に、第１段差部４５の側面に、チタン膜が成膜されない場合が生じてしまい、配線３６に断線が生じる場合があるためである。 Further, as shown in FIG. 6, the first step 45 has a substantially trapezoidal cross section. This is because, for example, when the first step 45 has a substantially rectangular cross section, a metal film such as a titanium film that is a material of the wiring 36 is formed on the entire insulating substrate 6 by sputtering, for example. In addition, the titanium film may not be formed on the side surface of the first step portion 45, and the wiring 36 may be disconnected.
　なお、ＣＦ基板３においても、第２段差部４６を跨いで配線を形成する場合、第２段差部４６が断面略台形状を有することにより、第２段差部４６の側面に金属膜を成膜することが可能になるため、配線における断線の発生を防止することができる。 Also in the CF substrate 3, when wiring is formed across the second stepped portion 46, the second stepped portion 46 has a substantially trapezoidal cross section so that a metal film is formed on the side surface of the second stepped portion 46. Therefore, the occurrence of disconnection in the wiring can be prevented.
　また、本実施形態においては、図６に示すように、第１段差部４５上に、画素電極１９と共通電極２４との接触を防止する非導電膜４８が設けられている。このような構成により、絶縁基板６に第１段差部４５を設けて、絶縁基板６上に画素電極１９を形成する際に、仮に、第１段差部４５の表面上に画素電極１９が形成された場合であっても、画素電極１９と共通電極２４との接触を確実に防止することが可能になる。 Further, in the present embodiment, as shown in FIG. 6, a non-conductive film 48 that prevents the pixel electrode 19 and the common electrode 24 from contacting each other is provided on the first step portion 45. With such a configuration, when the first step portion 45 is provided on the insulating substrate 6 and the pixel electrode 19 is formed on the insulating substrate 6, the pixel electrode 19 is temporarily formed on the surface of the first step portion 45. Even in this case, contact between the pixel electrode 19 and the common electrode 24 can be reliably prevented.
　また、液晶層４内に導電性異物が存在する場合であっても、非導電膜４８により、導電性異物を介して画素電極１９と共通電極２４とが接触することを防止することができるため、導電性異物に起因する上下リーク（点欠陥）の発生を確実に防止することができる。 Further, even when conductive foreign matter is present in the liquid crystal layer 4, the non-conductive film 48 can prevent the pixel electrode 19 and the common electrode 24 from contacting each other through the conductive foreign matter. Thus, it is possible to reliably prevent the occurrence of vertical leaks (point defects) due to conductive foreign matter.
　この非導電膜４８を形成する材料としては、例えば、窒化シリコン、酸化シリコン、窒化酸化シリコン、及びポリイミド樹脂等が挙げられる。 Examples of the material for forming the non-conductive film 48 include silicon nitride, silicon oxide, silicon nitride oxide, and polyimide resin.
　以上に説明した本実施形態によれば、以下の効果を得ることができる。 According to the present embodiment described above, the following effects can be obtained.
　（１）本実施形態においては、額縁領域Ｆにおいて、ＴＦＴ基板２とＣＦ基板３に、液晶層４とシール材４０との間に配置された段差部４２を設ける構成としている。従って、シール材４０を通過して、液晶表示パネル１の内部に侵入した水分等の非イオン性の異物による液晶層４の汚染を防止することができ、液晶表示パネル１において、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生を抑制することができる。 (1) In the present embodiment, in the frame region F, the TFT substrate 2 and the CF substrate 3 are provided with a step portion 42 disposed between the liquid crystal layer 4 and the sealing material 40. Therefore, the liquid crystal layer 4 can be prevented from being contaminated by nonionic foreign matters such as moisture that has passed through the sealing material 40 and entered the liquid crystal display panel 1. Generation of display defects such as display unevenness due to ionic foreign matters can be suppressed.
　（２）また、額縁領域Ｆにおいて、シール材４０に、例えば、シリカにより形成されたガラスファイバー等のスペーサを混入することなく、段差部４２により、セルギャップを保持することが可能になる。 (2) Further, in the frame region F, the step gap 42 can hold the cell gap without mixing the sealing material 40 with a spacer such as glass fiber formed of silica.
　（３）本実施形態においては、断面略台形状を有する第１段差部４５を設ける構成としている。従って、配線３６における断線の発生を防止することができる。 (3) In the present embodiment, the first step portion 45 having a substantially trapezoidal cross section is provided. Accordingly, occurrence of disconnection in the wiring 36 can be prevented.
　（４）本実施形態においては、第１段差部４５上に、画素電極１９と共通電極２４との接触を防止する非導電膜４８を設ける構成としている。従って、ＴＦＴ基板２に第１段差部４５を設けた場合であっても、画素電極１９と共通電極２４との接触を確実に防止することが可能になる。 (4) In the present embodiment, a non-conductive film 48 that prevents contact between the pixel electrode 19 and the common electrode 24 is provided on the first step portion 45. Therefore, even when the first step 45 is provided on the TFT substrate 2, it is possible to reliably prevent the pixel electrode 19 and the common electrode 24 from contacting each other.
　（第２の実施形態）
　次に、本発明の第２の実施形態について説明する。図７は、発明の第２の実施形態に係る液晶表示パネルの辺方向における断面図である。なお、上記第１の実施形態と同様の構成部分については同一の符号を付してその説明を省略する。また、液晶表示パネルの全体構成、ＴＦＴ基板の全体構成は、上述の第１の実施形態において説明したものと同様であるため、ここでは詳しい説明を省略する。また、本実施形態においても、表示パネルとして、液晶表示パネルを例に挙げて説明する。 (Second Embodiment)
Next, a second embodiment of the present invention will be described. FIG. 7 is a cross-sectional view in the side direction of a liquid crystal display panel according to the second embodiment of the invention. Note that the same components as those in the first embodiment are denoted by the same reference numerals, and description thereof is omitted. Further, since the entire configuration of the liquid crystal display panel and the entire configuration of the TFT substrate are the same as those described in the first embodiment, detailed description thereof is omitted here. Also in the present embodiment, a liquid crystal display panel will be described as an example of the display panel.
　本実施形態においては、図７に示すように、額縁領域Ｆにおいて、段差部４２とシール材４０との間（即ち、上述の段差部４２とシール材４０との隙間３８）に、水分等の異物を吸着するための吸着材３７が設けられている点に特徴がある。 In the present embodiment, as shown in FIG. 7, in the frame region F, between the stepped portion 42 and the sealing material 40 (that is, the gap 38 between the above-described stepped portion 42 and the sealing material 40) It is characterized in that an adsorbent 37 for adsorbing foreign matter is provided.
　このような構成により、シール材４０を通過して、液晶表示パネル１の内部に侵入した水分等の非イオン性の異物を吸着材３７により吸着して除去することが可能になるため、液晶表示パネル１において、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生をより一層抑制することが可能になる。 With such a configuration, it becomes possible to adsorb and remove nonionic foreign matters such as moisture that have passed through the sealing material 40 and entered the liquid crystal display panel 1, so that the liquid crystal display In the panel 1, it is possible to further suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture.
　なお、この吸着材３７としては、例えば、カーボン吸着材、ゼオライト吸着材（例えば、モレキュラーシーブ）、活性アルミナ等を使用することができる。 As the adsorbent 37, for example, a carbon adsorbent, a zeolite adsorbent (for example, molecular sieve), activated alumina, or the like can be used.
　以上に説明した本実施形態によれば、上記（１）～（４）の効果に加えて、以下の効果を得ることができる。 According to the present embodiment described above, the following effects can be obtained in addition to the effects (1) to (4).
　（５）本実施形態においては、額縁領域Ｆにおいて、段差部４２とシール材４０との間に、水分等の異物を吸着するための吸着材３７を設ける構成としている。従って、シール材４０を通過して、液晶表示パネル１の内部に侵入した水分等の非イオン性の異物を吸着材３７により吸着して除去することが可能になる。その結果、段差部４２とともに吸着材３７を設けることにより、液晶表示パネル１において、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生をより一層抑制することが可能になる。 (5) In the present embodiment, in the frame region F, the adsorbent 37 for adsorbing foreign matters such as moisture is provided between the stepped portion 42 and the sealing material 40. Accordingly, it is possible to remove nonionic foreign matters such as moisture that have passed through the sealing material 40 and entered the liquid crystal display panel 1 by the adsorbing material 37. As a result, by providing the adsorbent 37 together with the stepped portion 42, it is possible to further suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture in the liquid crystal display panel 1. .
　（６）また、段差部４２とシール材４０との間に吸着材３７が設けられているため、吸着材３７と液晶層４との間に段差部４２が配置されることになる。従って、吸着材３７と液晶層４とが、段差部４２を介して、離間して配置されるため、吸着材３７に吸着された水分等の異物による液晶層４の汚染を防止することができる。 (6) Further, since the adsorbent 37 is provided between the stepped portion 42 and the sealing material 40, the stepped portion 42 is disposed between the adsorbent 37 and the liquid crystal layer 4. Accordingly, since the adsorbent 37 and the liquid crystal layer 4 are spaced apart from each other via the step portion 42, contamination of the liquid crystal layer 4 due to foreign matters such as moisture adsorbed on the adsorbent 37 can be prevented. .
　なお、上記実施形態は以下のように変更しても良い。 Note that the above embodiment may be modified as follows.
　上述の実施形態においては、額縁領域Ｆにおいて、第１段差部４５を液晶層４側に設けるとともに、第２段差部４６をシール材４０側に設ける構成としたが、図８に示すように、第１段差部４５をシール材４０側に設けるとともに、第２段差部４６を液晶層４側に設ける構成としてもよい。 In the above-described embodiment, in the frame region F, the first step portion 45 is provided on the liquid crystal layer 4 side and the second step portion 46 is provided on the sealing material 40 side, but as shown in FIG. The first step portion 45 may be provided on the sealing material 40 side, and the second step portion 46 may be provided on the liquid crystal layer 4 side.
　また、上記実施形態においては、非導電膜４８をＴＦＴ基板２の第１段差部４５に設ける構成としたが、図９に示すように、非導電膜４８を、ＣＦ基板３の第２段差部４６に設ける構成としてもよい。また、第１段差部４５及び第２段差部４６の双方に非導電膜４８を設ける構成としてもよい。 In the above embodiment, the non-conductive film 48 is provided on the first step 45 of the TFT substrate 2. However, as shown in FIG. 9, the non-conductive film 48 is formed on the second step of the CF substrate 3. 46 may be provided. Further, the non-conductive film 48 may be provided on both the first step portion 45 and the second step portion 46.
　また、上記実施形態においては、１つの第１段差部４５と１つの第２段差部４６により、段差部４２を構成したが、第１段差部４５及び第２段差部４６の少なくとも一方を複数設けることにより、段差部４２を構成しても良い。例えば、図１０に示すように、１つの第１段差部４５と２つの第２段差部４６により、段差部４２を構成することができる。このような構成により、シール材４０を通過して、液晶表示パネル１の内部に侵入した水分等の非イオン性の異物が、液晶層４へ到達するまでの距離が長くなるため、液晶表示パネル１において、水分等の非イオン性の異物に起因する表示ムラ等の表示不良の発生をより一層抑制することができる。 Moreover, in the said embodiment, although the level | step-difference part 42 was comprised by one 1st level | step-difference part 45 and one 2nd level | step-difference part 46, at least one of the 1st level | step-difference part 45 and the 2nd level | step-difference part 46 is provided with two or more. Accordingly, the step portion 42 may be configured. For example, as shown in FIG. 10, the stepped portion 42 can be configured by one first stepped portion 45 and two second stepped portions 46. With such a configuration, a distance until a nonionic foreign matter such as moisture that has passed through the sealing material 40 and entered the liquid crystal display panel 1 reaches the liquid crystal layer 4 is increased. 1, it is possible to further suppress the occurrence of display defects such as display unevenness due to nonionic foreign matters such as moisture.
　また、上記実施形態においては、段差部４２とシール材４０との間に、吸着材３７を設ける構成としたが、この吸着材３７を段差部４２に設ける構成としてもよい。例えば、図１０に示すように、第１段差部４５上に吸着材３７を設けることができる。 In the above embodiment, the adsorbent 37 is provided between the step portion 42 and the sealing material 40. However, the adsorbent 37 may be provided on the step portion 42. For example, as shown in FIG. 10, an adsorbent 37 can be provided on the first step portion 45.
　上記実施形態においては、表示パネルとして、液晶表示パネルを例に挙げて説明したが、例えば、有機ＥＬ表示パネル等の他の表示パネルについても、本発明を適用することができる。 In the above embodiment, the liquid crystal display panel has been described as an example of the display panel, but the present invention can be applied to other display panels such as an organic EL display panel.
　以上説明したように、本発明は、一対の基板を所定の間隔を隔てて重ね合わせ、一対の基板の間隙に液晶を封入する液晶表示パネル等の表示パネルに適している。 As described above, the present invention is suitable for a display panel such as a liquid crystal display panel in which a pair of substrates are overlapped at a predetermined interval and liquid crystal is sealed in a gap between the pair of substrates.
　１　　液晶表示パネル
　２　　ＴＦＴ基板（第１基板）
　３　　ＣＦ基板（第２基板）
　４　　液晶層（表示媒体層）
　５　　ＴＦＴ
　６　　絶縁基板
　９　　配向膜
　１０　　層間絶縁膜
　１１　　ゲート線
　１２　　ゲート絶縁膜
　１３　　半導体層
　１４　　ソース線
　１７　　ゲート電極
　１８　　ソース電極
　１９　　画素電極（第１電極）
　２０　　ドレイン電極
　２１　　絶縁基板
　２２　　カラーフィルター層
　２３　　透明層
　２４　　共通電極（第２電極）
　２５　　フォトスペーサ
　２６　　配向膜
　２７　　ブラックマトリクス
　２８　　着色層
　３０　　コンタクトホール
　３５　　端子
　３６　　配線
　３７　　吸着材
　３８　　隙間
　４０　　シール材
　４２　　段差部
　４５　　第１段差部
　４６　　第２段差部 1 Liquid crystal display panel 2 TFT substrate (first substrate)
3 CF substrate (second substrate)
4 Liquid crystal layer (display medium layer)
5 TFT
6 Insulating substrate 9 Alignment film 10 Interlayer insulating film 11 Gate line 12 Gate insulating film 13 Semiconductor layer 14 Source line 17 Gate electrode 18 Source electrode 19 Pixel electrode (first electrode)
20 Drain electrode 21 Insulating substrate 22 Color filter layer 23 Transparent layer 24 Common electrode (second electrode)
25 Photospacer 26 Alignment film 27 Black matrix 28 Colored layer 30 Contact hole 35 Terminal 36 Wiring 37 Adsorbent 38 Clearance 40 Sealing material 42 Stepped portion 45 First stepped portion 46 Second stepped portion

Claims (9)

  1. 　第１基板と、
    　前記第１基板に対向して配置された第２基板と、
    　前記第１基板及び前記第２基板の間に設けられた表示媒体層と、
    　画像表示を行う表示領域の周囲に規定された額縁領域において、前記第１基板と前記第２基板との間に挟持され、前記第１基板及び前記第２基板を互いに接着するシール材と
    　を備えた表示パネルであって、
    　前記額縁領域において、前記第１基板及び前記第２基板には、前記表示媒体層と前記シール材との間に配置された段差部が設けられていることを特徴とする表示パネル。     A first substrate;
    A second substrate disposed opposite the first substrate;
    A display medium layer provided between the first substrate and the second substrate;
    A seal material sandwiched between the first substrate and the second substrate in a frame region defined around a display region for performing image display, and for bonding the first substrate and the second substrate to each other. Display panel,
    In the frame region, the first substrate and the second substrate are provided with a step portion disposed between the display medium layer and the sealing material.
  2. 　前記段差部は、前記第１基板に設けられた第１段差部と、前記第２基板に設けられた第２段差部とにより構成されていることを特徴とする請求項１に記載の表示パネル。 The display panel according to claim 1, wherein the step portion includes a first step portion provided on the first substrate and a second step portion provided on the second substrate. .
  3. 　前記第１段差部及び前記第２段差部は、断面略台形状を有することを特徴とする請求項２に記載の表示パネル。 3. The display panel according to claim 2, wherein the first step portion and the second step portion have a substantially trapezoidal cross section.
  4. 　前記第１段差部が前記表示媒体層側に設けられ、前記第２段差部が前記シール材側に設けられていることを特徴とする請求項２または請求項３に記載の表示パネル。 4. The display panel according to claim 2, wherein the first step portion is provided on the display medium layer side, and the second step portion is provided on the sealing material side.
  5. 　前記第１段差部が前記シール材側に設けられ、前記第２段差部が前記表示媒体層側に設けられていることを特徴とする請求項２または請求項３に記載の表示パネル。 4. The display panel according to claim 2, wherein the first step portion is provided on the sealing material side, and the second step portion is provided on the display medium layer side.
  6. 　前記段差部と前記シール材との間に、異物を吸着する吸着材が設けられていることを特徴とする請求項１～請求項５のいずれか１項に記載の表示パネル。 The display panel according to any one of claims 1 to 5, wherein an adsorbing material that adsorbs foreign matter is provided between the stepped portion and the sealing material.
  7. 　前記吸着材が、カーボン吸着材、ゼオライト吸着材、及び活性アルミナからなる群より選ばれる１種であることを特徴とする請求項６に記載の表示パネル。 The display panel according to claim 6, wherein the adsorbent is one selected from the group consisting of a carbon adsorbent, a zeolite adsorbent, and activated alumina.
  8. 　前記第１基板に設けられた第１電極と、前記第２基板に設けられ、前記第１電極に対向して配置された第２電極とを更に備え、
    　前記第１段差部及び前記第２段差部の少なくとも一方に、前記第１電極と前記第２電極との接触を防止する非導電膜が設けられていることを特徴とする請求項２～請求項７のいずれか１項に記載の表示パネル。     A first electrode provided on the first substrate; and a second electrode provided on the second substrate and disposed opposite to the first electrode;
    The non-conductive film for preventing contact between the first electrode and the second electrode is provided on at least one of the first step portion and the second step portion. 8. The display panel according to any one of 7 above.
  9. 　前記表示媒体層が液晶層であることを特徴とする請求項１～請求項８のいずれか１項に記載の表示パネル。 The display panel according to any one of claims 1 to 8, wherein the display medium layer is a liquid crystal layer.
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JPS5391639U (en) * 1976-12-27 1978-07-26
JPH06267435A (en) * 1993-03-15 1994-09-22 Fujitsu Ltd Plasma display panel
JPH07159795A (en) * 1993-12-01 1995-06-23 Fujitsu Ltd Production of liquid crystal display panel
JPH07175073A (en) * 1993-12-20 1995-07-14 Hitachi Ltd Liquid crystal display element
JPH07244287A (en) * 1994-03-07 1995-09-19 Sharp Corp Liquid crystal display element
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JP2000019533A (en) * 1998-07-02 2000-01-21 Ricoh Co Ltd Liquid crystal display device
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