KR20080019385A - Display pannel and mehtod for manufacturing the same - Google Patents

Abstract

A display panel and a method for manufacturing the same are provided to prevent the deformation of a column spacer caused by external pressure and to distribute external pressure uniformly without the decrease of opening ration by forming a dummy spacer on a black matrix region. A color pillar substrate comprises a black matrix(210), first, second, and third color filters(221,222,223), a dummy spacer(230), a common electrode(250), and a column spacer(260). The black matrix is formed above a light transmitting substrate(100). The filters are formed at some of the light transmitting regions and at some of the upper parts of the black matrix. At least two color filters are laminated on the dummy spacer. The common electrode is formed on the filters and dummy spacer. The column spacer is formed on the common electrode. The dummy spacer is shaped like a line or a column. The dummy spacer is lower than the column spacer. Thereby, the column spacer is protected and the lower film is prevented from damage.

Description

DISPLAY PANNEL AND MEHTOD FOR MANUFACTURING THE SAME}

1 is a plan view illustrating a display panel according to an exemplary embodiment of the present invention.

2 is a cross-sectional conceptual view taken along line A-A of FIG. 1.

3 to 8 are cross-sectional conceptual views illustrating a method of manufacturing a color filter substrate according to an embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

100 thin film transistor substrate 110 gate electrode

120 thin film transistor 130 sustain electrode

140: data line 150: protective film

160 pixel electrode 200 color filter substrate

210: black matrix 221, 222, 223: color filter

230: dummy spacer 240: overcoat film

250: common electrode 260: column spacer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a display panel and a method for manufacturing the display panel, and more particularly, to a display panel and a method for manufacturing the display panel capable of preventing a damage of the column spacer due to excessive load by providing a dummy spacer.

In general, a liquid crystal display (LCD) includes a thin film transistor substrate including a pixel electrode and a thin film transistor (TFT) for switching each pixel, and a color filter substrate including a common electrode and a color filter. And liquid crystal sealed between the two substrates. Here, the liquid crystal display displays an image by applying a voltage between two substrates to drive the liquid crystal and controlling the transmittance of light.

At this time, the thin film transistor substrate and the color filter substrate are coupled through a sealant formed around an edge of the substrate. This sealant allows the liquid crystal material to be trapped between the two substrates. A column spacer is provided between the two substrates to maintain a constant gap (cell gap) between the two substrates. The column spacer has some elasticity, but when excessive pressure is applied from the outside, the column spacer collapses. In addition, a problem occurs that the lower layer under the column spacer is damaged due to external pressure.

Accordingly, an aspect of the present invention is to solve the above problems, and to provide a display panel and a method of manufacturing the same, having dummy spacers in an upper region of a black matrix to protect column spacers and prevent damage to lower layers. The purpose.

A black matrix formed on a light-transmissive substrate according to the present invention, the black matrix having a plurality of light-transmitting regions, first to third color filters formed on a portion of the light-transmitting region and a portion of the black matrix, and an upper side of the black matrix A color filter substrate including a dummy spacer formed by stacking at least two color filters in a region, a common electrode formed on the first to third color filters and the dummy spacer, and a column spacer formed on the common electrode, is provided.

Here, the dummy spacer includes the first color filter provided on the black matrix and the second or third color filter stacked on the first color filter, or the dummy spacer is sequentially formed on the black matrix. The first to third color filters stacked on the black matrix, or the dummy spacer is disposed on the first and second color filters disposed adjacent to the black matrix and on the first and second color filters disposed adjacent to each other. It is preferred to include a stacked third color filter.

The dummy spacer may be formed in a line shape or a pillar shape, and the height of the dummy spacer may be lower than that of the column spacer.

Of course, the first to third color filters are effectively a red color filter, a green color filter and a blue color filter, respectively.

Further, a black matrix formed on a light-transmissive substrate according to the present invention and having a plurality of light-transmitting regions, first to third color filters formed on a portion of the light-transmitting region and a portion of the black matrix, and the black A color filter substrate including a dummy spacer formed by stacking at least two color filters in an upper region of the matrix, a common electrode formed on the first to third color filters and the dummy spacer, and a column spacer formed on the common electrode; A display panel includes a pixel electrode corresponding to the common electrode, a thin film transistor substrate including a gate line, a data line, and a thin film transistor, and a liquid crystal layer provided between the color filter substrate and the thin film transistor substrate.

The black matrix may be disposed in an upper region of the gate line, the data line, and the thin film transistor, and the dummy spacer may be formed in a line or column shape in at least one of the gate line, the data line, and the upper region of the thin film transistor. desirable.

The method may further include forming a black matrix on the light transmissive substrate, forming first to third color filters on the light transmissive substrate and a portion of the black matrix, and forming at least two regions on the black matrix. Stacking color filters to form dummy spacers, forming a common electrode on the substrate on which the dummy spacers are formed, and forming a column spacer on the common electrode. do.

The forming of the dummy spacer may include forming a first color filter on a portion of the upper portion of the black matrix and forming a second or third color filter on the first color filter formed on the black matrix. It is preferred to include the step.

Of course, the forming of the dummy spacer may include forming a first color filter on a portion of the upper portion of the black matrix, and forming the second color filter on an area adjacent to the first color filter formed on the black matrix. And forming a third color filter on top of said first and second color filters disposed adjacent said black matrix.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention in more detail. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the embodiments are intended to complete the disclosure of the present invention, and to those skilled in the art to fully understand the scope of the invention. It is provided to inform you.

In the drawings, the thickness of layers, films, panels, regions, etc., may be exaggerated for clarity, and like reference numerals designate like elements. In addition, when a part such as a layer, a film, an area, or a plate is expressed as being on or above another part, not only when each part is directly above or directly above the other part but also another part between each part and another part This includes cases.

1 is a plan view illustrating a display panel according to an exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view taken along line A-A of FIG. 1.

1 and 2, the display panel according to the present exemplary embodiment includes the thin film transistor substrate 100 on which the thin film transistor 120 and the pixel electrode 160 are formed, the color filters 221, 222, and 223, and the common electrode. And a color filter substrate 200 having a 250, a column spacer 260, and a dummy spacer 230, and a liquid crystal layer (not shown) provided between the thin film transistor substrate 100 and the color filter substrate 200. .

The thin film transistor substrate 100 includes a plurality of gate lines 110 extending in a horizontal direction and a plurality of data lines 140 extending in a vertical direction. The thin film transistor 120, the storage electrode 130, and the pixel electrode 160 are provided in the intersection region (ie, the pixel region) of the gate line 110 and the data line 140.

The gate line 110 includes a gate electrode 111 having a protrusion shape. In this case, a gate pad (not shown) is formed at one end of the gate line 110. The storage electrode line 131 extends in the same direction as the gate line 110 to electrically connect the plurality of storage electrodes 130. The gate line 110, the gate electrode 111, the storage electrode line 131, and the storage electrode 130 may be formed of at least one of Al, Nd, Ag, Ti, Ta, Mo, Cr, MoW, and Cu. Preference is given to using metals or alloys containing them. It may be manufactured in a single layer, or may be formed in a multi-layer formed by successive stacking of the metals. In addition to the aluminum or chromium, various metals may be used.

A gate insulating layer 121 is formed on the gate line 110, the gate electrode 111, and the storage electrode 130. In this case, an insulating film including a silicon oxide film and a silicon nitride film is used as the gate insulating film 121.

A source electrode 124 branched in the form of a protrusion is formed on the data line 140 crossing the gate line 110, and a drain electrode 125 is formed adjacent to the source electrode 124. The source electrode 124 and the drain electrode 125 may be made of the same material as the material of the gate line 110 described above, or may be manufactured in a single layer or multiple layers. An active layer 122 used as a channel portion of the thin film transistor 120 is formed under the source electrode 124 and the drain electrode 125. An ohmic contact layer 123 is formed between the active layer 122, the source electrode 124, and the drain electrode 125 to reduce contact resistance. It is preferable to use an amorphous silicon layer as the active layer 122, and to use the amorphous silicon layer doped with a high concentration of silicide or N-type impurities as the ohmic contact layer 123.

The passivation layer 150 is formed on the data line 140, the source electrode 124, and the drain electrode 125. As the protective film 150, an organic insulator such as an inorganic insulator or a resin can be used. In the passivation layer 150, a contact hole 151 exposing the drain electrode 125 is formed. The pixel electrode 160 is formed on the passivation layer 150, and the pixel electrode 160 is connected to the drain electrode 125 through the contact hole 151. The pixel electrode 160 may be formed of indium tin oxide (ITO) or indium zinc oxide (IZO). Although not shown, the pixel electrode 160 may be divided into a plurality of domains, and may include an incision pattern or a protrusion pattern as the domain regulation means. And a micro uneven | corrugated pattern for regulating the orientation of liquid crystal molecules in a domain may be formed.

In the present embodiment, as shown in FIG. 1, the drain electrode 125 extends above the storage electrode 130 to overlap the storage electrode 130 with a portion thereof. As a result, the gap between the storage electrode 130 and the pixel electrode 160 can be reduced, thereby increasing the capacitance of the storage capacitor. Of course, the present invention is not limited thereto, and a portion of the passivation layer 150 on the storage electrode 130 may be removed to reduce the distance between the pixel electrode 160 and the storage electrode 130. The active layer 122 may also be formed in the lower region of the data line 140.

Meanwhile, a black matrix 210 is patterned on the color filter substrate 200 to prevent light leakage. The black matrix 210 may be formed in a region corresponding to the gate line 111, the data line 140, and the thin film transistor 120 of the thin film transistor substrate 100. The black matrix 210 pattern defines a light transmitting region having a substantially rectangular shape. The light transmissive area refers to a region in which light is transmitted to display an image among the pixel areas.

Red, green, and blue color filters 221, 222, and 223 are formed in the plurality of light transmitting regions, respectively. In this case, a dummy spacer 230 in which a part of the color filters 221, 222, and 223 are stacked is formed on a portion of the upper region of the black matrix 210. In the present embodiment, the red, green, and blue color filters 221, 222, and 223 are sequentially patterned in three adjacent light-transmitting regions, respectively. A dummy spacer 230 in which red and green color filters 221 and 222 are stacked is formed on the black matrix 210. Of course, the present invention is not limited thereto, and the three color filters 221, 222, and 223 may be stacked. That is, the dummy spacer 230 is formed on the black matrix 210 and its position is not limited. The blue color filter 223 may be stacked on the green color filter 222, and the blue color filter 223 may be stacked on the red color filter 221. All of the red, green and blue color filters 221, 222, 223 may be stacked. In addition, an area in which the dummy spacer 230 is formed may be changed according to the formation order of the color filters 221, 222, and 223.

As shown in FIG. 1, the dummy spacer 230 of the present exemplary embodiment is formed in a line shape on an upper region of some data lines 140 of the thin film transistor substrate 100. However, the present invention is not limited thereto, and the dummy spacer 230 may be formed in an upper region of the gate line 110. In addition, the dummy spacer 230 may be formed in a plurality of pillar shapes.

The dummy spacer 230 as described above prevents damage to the column spacer 260 and the thin film provided below when the excessive force is applied. That is, when a slight force is applied, the column spacer 260 can sufficiently disperse the force. However, when excessive external force is applied, the column spacer 260 is excessively pressed, and in the severe case, the initial state is not restored. In addition, if the column spacer 260 is excessively pressed, the lower common electrode 250 is damaged. However, in the present embodiment, when excessive force is applied through the dummy spacer 230, the dummy spacer 230 is connected to the lower substrate 100 to disperse the external excessive force. Through this, the column spacer 260 and the lower thin film may be protected.

An overcoat layer 240 is formed on the color filters 221, 222, and 223 and the upper region of the dummy spacer 230. Of course, the over code layer 240 may be omitted in the present embodiment. The common electrode 250 is formed on the overcoat layer 240. In this case, the common electrode 250 may use the same materials as those of the pixel electrode 160. The common electrode 250 may be provided with a protrusion pattern corresponding to the cutting pattern of the pixel electrode 160.

A column spacer 260 is provided in a portion of the common electrode 250 to maintain a cell gap. The column spacer 260 is preferably manufactured using a photosensitive organic film.

Although not shown, an alignment layer may be formed on the color filter substrate 200 and the thin film transistor substrate 100 on the surfaces facing each other.

In the present exemplary embodiment, the thin film transistor substrate 100 and the color filter substrate 200 are aligned and coupled, and a liquid crystal material is injected therebetween to fabricate a basic panel of the display device.

The display panel according to the present exemplary embodiment is not limited to the above description, and various modifications are possible. That is, the pixel electrode can be manufactured separately from the first pixel electrode and the second pixel electrode. By dividing the pixel electrode into two, and by changing the peak voltage applied to each of them, the gray scale can be expressed naturally and the side visibility distortion can be improved. In this case, two transistors may be formed in a single pixel area in order to change the peak voltage at each of the two pixel electrodes. In addition, different peak voltages may be applied to each of the two pixel electrodes through the two data lines. In addition, one of the two pixel electrodes may be floated. The pixel area of the above-described embodiment has a shape in which the length in the vertical direction is longer than the length in the horizontal direction. The length in the horizontal direction may be longer than that in the vertical direction, without being limited thereto.

The liquid crystal display device may be manufactured by disposing elements such as a polarizing plate, a backlight, and a compensation plate on both sides of the display panel of the present embodiment.

Hereinafter, a method of manufacturing the display panel of the present embodiment having the dummy spacer described above with reference to the drawings.

3 to 8 are cross-sectional conceptual views illustrating a method of manufacturing a color filter substrate according to an embodiment of the present invention.

Referring to FIG. 3, a light blocking film for a black matrix is coated on the light transmissive color filter substrate 200 and then patterned to form a black matrix 210 pattern. As the light shielding film for the black matrix, it is preferable to use at least one of chromium / chromium oxide bilayer, carbon black, and titanium oxide. In the present exemplary embodiment, it is preferable that the black matrix 210 is patterned through an exposure and development process using a mask using a material film having a photosensitive characteristic as the light blocking film. The black matrix 210 may be patterned in a shape capable of shielding regions of the gate line 110, the data line 140, and the thin film transistor 120 of the thin film transistor substrate 100.

Referring to FIG. 4, a photosensitive film including an azo red pigment for a red color filter is coated on the entire structure. Exposure and development processes using a mask are performed, and the developed photosensitive film is cured to form a red color filter 221. In this case, the red color filter 221 is formed on the color filter substrate 200 in the light transmissive region exposed by the black matrix 210. A portion of the red color filter 221 extends to the region above the black matrix 210. That is, the red color filter 221 is formed not only on the light transmissive region but also on the black matrix 210.

Referring to FIG. 5, a photosensitive film including a protarocyanine-based green pigment is coated on the color filter substrate 200 on which the red color filter 221 is formed. Exposure and development processes using a mask are performed, and the developed photosensitive film is cured to form a green color filter 222. A portion of the green color filter 222 is provided on the red color filter 221 formed on the black matrix 210 to form the dummy spacer 230. In this case, the green color filter 222 is formed on the color filter substrate 200 adjacent to the red color filter 221, and a part thereof extends to the upper region of the black matrix 210. The green color filter 222 is stacked on the red color filter 221 formed on the black matrix 210.

The dummy spacer 230 of the present embodiment preferably has a height lower than that of the column spacer 260 formed through a subsequent process. That is, when excessive pressure is applied, the pressure is dispersed by the dummy spacer 230, thereby preventing the problem of deformation of the column spacer 260 or damage to the lower thin film. For example, when the height of the column spacer 260 is 3.2um, considering that the dummy spacer 230 is manufactured to a height smaller than about 0.4um (that is, 2.8um) as follows. In the case of the color filters 221, 222, and 223, the height T1 formed on the substrate 200 is about 2.0 μm, but the height T2 formed on the black matrix 210 is 0.8 μm. In this case, the black matrix 210 has a height of about 1.5 μm. As a result, the color filters 221, 222, and 223 formed between the upper region of the black matrix 210 and the upper region of the substrate 200 have an angular step. In the present exemplary embodiment, the red color filter 221 is first formed on the black matrix 210 pattern at a height of 0.8 um (T2). Subsequently, when the green color filter 222 is formed on the red color filter 221 on the black matrix 210, the height T1 of the green color filter 222 is formed on the substrate 200. It becomes the height of 2.0um same as (T1). Therefore, even with two layers of color filters (ie, the red color filter 221 and the green color filter 222), the stacking portion having the height of 2.8 μm (that is, the dummy spacer 230) may be formed.

Referring to FIG. 6, a photosensitive film including a phthalocyanine-based blue pigment is coated on the color filter substrate 200 on which the green color filter 222 is formed. Exposure and development processes using a mask are performed, and the developed photosensitive film is cured to form a blue color filter 223. The blue color filter 223 is preferably provided in an adjacent region of the green color filter 223.

Of course, the present invention is not limited thereto, and the dummy spacer 230 may be manufactured by further stacking the blue color filter 223 on the green color filter 223. In addition, the blue color filter 223 instead of the green color filter 222 may be formed on the red color filter 221. Alternatively, a red color filter 221 and a green color filter 222 may be adjacent to each other in the upper region of the black matrix 210, and a blue color filter 223 may be formed above the two adjacent regions. Through this, the red color filter 221 and the green color filter 222 may be provided at the lower portion, and the dummy spacer 230 having the blue color filter 223 may be formed at the upper portion thereof.

Referring to FIG. 7, an overcoat layer 240 is formed on the entire structure in which the red, green, and blue color filters 221, 222, and 223 and the dummy spacer 230 are formed. In this case, it is preferable to use an organic material film as the overcoat film 240. The common electrode 250 is formed on the overcoat layer 240. As the common electrode 250, a transparent conductive film including indium tin oxide (ITO) or indium zinc oxide (IZO) is used.

Referring to FIG. 8, a light transmissive organic film for a spacer is coated on the entire structure where the common electrode 250 is formed. Subsequently, the column spacer 260 is formed by performing exposure and development processes using a mask.

The thin film transistor substrate 100 on which the gate line 110, the data line 140, the thin film transistor 120, and the pixel electrode 160 are formed is arranged on the color filter substrate 200. Thereafter, the two substrates are sealed, and a liquid crystal layer is formed between the two substrates to manufacture the display panel.

As described above, the present invention can form a dummy spacer to prevent the column spacer from being deformed by external pressure or damaging the lower membrane.

In addition, the present invention can form a dummy spacer in the black matrix region to uniformly distribute the external pressure without reducing the aperture ratio.

Although described with reference to the embodiments, it will be understood by those skilled in the art that the present invention may be modified and changed without departing from the spirit and scope of the invention as set forth in the claims below. .

Claims (9)

A black matrix formed on the light transmissive substrate and having a plurality of light transmissive regions; First to third color filters formed on a part of the light-transmitting area and a part of the upper portion of the black matrix; A dummy spacer formed by stacking at least two color filters in an upper region of the black matrix; A common electrode formed on the first to third color filters and the dummy spacer; And A color filter substrate comprising a column spacer formed on the common electrode. The method according to claim 1, The dummy spacer includes the first color filter provided on the black matrix and the second or third color filter stacked on the first color filter, or the dummy spacers are sequentially stacked on the black matrix. The first to third color filters, wherein the dummy spacers are stacked on the first and second color filters disposed adjacent to the black matrix and on the adjacent first and second color filters. A color filter substrate comprising a third color filter. The method according to claim 1, The dummy spacer is formed in the form of a line or column, And a height of the dummy spacer is lower than a height of the column spacer. The method according to claim 1, Each of the first to third color filters is a red color filter, a green color filter, and a blue color filter. A black matrix formed on the light-transmissive substrate and having a plurality of light-transmitting regions, first to third color filters formed on a portion of the light-transmitting region and a portion of the black matrix upper portion, and at least two on the black matrix upper region A color filter substrate including a dummy spacer formed by stacking color filters, a common electrode formed on the first to third color filters and the dummy spacer, and a column spacer formed on the common electrode; A thin film transistor substrate including a pixel electrode corresponding to the common electrode, a gate line, a data line, and a thin film transistor; And And a liquid crystal layer disposed between the color filter substrate and the thin film transistor substrate. The method according to claim 5, The black matrix is disposed in an upper region of the gate line, the data line, and the thin film transistor. The dummy spacer is formed in a line or column shape on at least one of the gate line, the data line, and the upper region of the thin film transistor. Forming a black matrix on the light transmissive substrate; Forming a first to third color filters on the light-transmitting substrate and a portion of the upper portion of the black matrix, and stacking at least two color filters on the upper portion of the black matrix to form dummy spacers; Forming a common electrode on the substrate on which the dummy spacer is formed; Forming a column spacer on the common electrode. The method of claim 7, wherein the forming of the dummy spacer, Forming a first color filter on a portion of the upper portion of the black matrix; And Forming a second or third color filter on the first color filter formed on the black matrix. The method of claim 7, wherein the forming of the dummy spacer, Forming a first color filter on a portion of the upper portion of the black matrix; Forming the second color filter in an area adjacent to the first color filter formed on the black matrix; Forming a third color filter on top of said first and second color filters disposed adjacent said black matrix.

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