WO2013002253A1 - Method for producing benzophenone derivative - Google Patents

Method for producing benzophenone derivative Download PDF

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WO2013002253A1
WO2013002253A1 PCT/JP2012/066368 JP2012066368W WO2013002253A1 WO 2013002253 A1 WO2013002253 A1 WO 2013002253A1 JP 2012066368 W JP2012066368 W JP 2012066368W WO 2013002253 A1 WO2013002253 A1 WO 2013002253A1
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salt
producing
benzophenone derivative
compound
ethyl
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PCT/JP2012/066368
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French (fr)
Japanese (ja)
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務 松村
敏一 齋藤
和修 竹村
小林 健太郎
真里子 新田
浩二 ▲萩▼原
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協和発酵キリン株式会社
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/734Ethers
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/08Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly bound oxygen or sulfur atoms

Definitions

  • the present invention relates to a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.
  • Patent Documents 1 and 2 2- ⁇ 2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl ⁇ -N, N-bis (2-methoxyethyl) acetamide is It is known to be useful as an Hsp90 antagonist, an antitumor agent, etc. (Patent Documents 1 and 2).
  • Patent Document 1 the Friedel-Crafts reaction of a benzoic acid derivative and a dihydroxybenzene derivative is used to construct a benzophenone skeleton of the compound.
  • a dihydroxybenzene derivative in which hydroxy is protected with allyl is used.
  • Non-Patent Documents 1 to 5 examples using dihydroxybenzene derivatives in which hydroxy is protected with benzyl are known.
  • An object of the present invention is to provide a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.
  • the present invention relates to the following (1) to (31).
  • R 1a and R 1b represent the same or different benzyl substituted with 1 to 3 halogens, and when the halogen is 2 or 3, each halogen may be the same or different, R 2 represents optionally substituted lower alkyl, R 3 represents a lower alkoxycarbonyl which may have a substituent) or a salt thereof, and formula (II)
  • R 4 represents a lower alkyl which may have a substituent
  • R 5 is characterized in that a compound or a salt thereof represented) the aliphatic heterocyclic alkyl optionally having a substituent, the presence of an acid, reacting the formula (III)
  • R 1a, R 1b, R 2, R 3, R 4 and R 5 are respectively the same as the aforementioned
  • benzophenone derivatives or the preparation of a salt thereof (2) The method for producing a benzophenone derivative or a salt thereof according to the above (1), wherein R 1a and R 1b are dichlorobenzyl. (3) The method for producing a benzophenone derivative or a salt thereof according to the above (1), wherein R 1a and R 1b are 3,4-dichlorobenzyl. (4) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (3), wherein R 2 is lower alkyl.
  • R 1a , R 1b , R 2 and R 3 are as defined above, or a salt thereof, and formula (II)
  • R 1a , R 1b , R 2 , R 3 , R 4 and R 5 are as defined above, respectively, and a step of obtaining a salt thereof.
  • R 6 represents an optionally substituted N-lower alkylaminocarbonyl or an optionally substituted N, N-dilower alkylaminocarbonyl)) or a salt thereof.
  • Manufacturing method (15) The process for producing a benzophenone derivative or a salt thereof according to the above (14), wherein R 1a and R 1b are dichlorobenzyl. (16) The process for producing a benzophenone derivative or a salt thereof according to the above (14), wherein R 1a and R 1b are 3,4-dichlorobenzyl.
  • R 1a and R 1b represent the same or different benzyl substituted with 1 to 3 halogens, and when the halogen is 2 or 3, each halogen may be the same or different, R 2 represents optionally substituted lower alkyl, R 3 represents a lower alkoxycarbonyl which may have a substituent, or a salt thereof.
  • R 1a and R 1b are 3,4-dichlorobenzyl, R 2 is ethyl, and R 3 is methoxycarbonyl.
  • R 1a , R 1b , R 2 , R 3 , R 4 and R 5 are as defined above
  • R 1a and R 1b are 3,4-dichlorobenzyl
  • R 2 is ethyl
  • R 3 is methoxycarbonyl
  • R 4 is methyl
  • R 5 is 2-morpholinoethyl
  • the present invention provides a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.
  • N-dilower alkylaminocarbonyl include, for example, linear or branched alkyl having 1 to 10 carbon atoms, and more specifically, Includes methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, tert-pentyl, hexyl, isohexyl, heptyl, octyl, iso
  • the alkylene part of the aliphatic heterocyclic alkyl has the same meaning as that obtained by removing one hydrogen atom from the lower alkyl.
  • Examples of the aliphatic heterocyclic group and the aliphatic heterocyclic group part of the aliphatic heterocyclic alkyl include, for example, a 3- to 8-membered monocyclic aliphatic group containing at least one atom selected from a nitrogen atom, an oxygen atom, and a sulfur atom.
  • Halogen represents each atom of fluorine, chlorine, bromine and iodine.
  • Substituents in substituted lower alkyl, substituted lower alkoxycarbonyl, N-substituted lower alkylaminocarbonyl, N-lower alkyl-N-substituted lower alkylaminocarbonyl and N, N-disubstituted lower alkylaminocarbonyl are the same or different. Examples thereof include hydroxy having 1 to 3 substituents, oxo, halogen, lower alkoxy and the like.
  • the substitution position of the substituent is not particularly limited.
  • halogen is as defined above.
  • the lower alkyl part of lower alkoxy has the same meaning as the lower alkyl.
  • Examples of the substituent in the substituted aliphatic heterocyclic alkyl are the same or different and include, for example, hydroxy, halogen, oxo, lower alkyl, lower alkoxy, aliphatic heterocyclic group having 1 to 3 substituents.
  • the substitution position of the substituent is not particularly limited. Halogen, lower alkyl and aliphatic heterocyclic groups are as defined above.
  • the lower alkyl part of lower alkoxy has the same meaning as the lower alkyl.
  • Examples of the salts of the compounds (I), (II), (III) and (IV) include acid addition salts, metal salts, ammonium salts, organic amine addition salts, amino acid addition salts and the like.
  • Examples of acid addition salts of compounds (I), (II), (III) and (IV) include inorganic acid salts such as hydrochloride, nitrate, sulfate and phosphate, acetate, maleate and fumaric acid.
  • Organic salts such as salts and citrates are listed.
  • Examples of metal salts include alkali metal salts such as sodium salt and potassium salt, alkaline earth metal salts such as magnesium salt and calcium salt, aluminum salt, zinc salt and the like.
  • ammonium salts include ammonium and tetramethylammonium salts
  • examples of organic amine addition salts include morpholine addition salts and piperidine addition salts
  • examples of amino acid addition salts include glycine addition salts. Phenylalanine addition salt, lysine addition salt, aspartic acid addition salt, glutamic acid addition salt, and the like.
  • R 1a and R 1b are preferably 4-chlorobenzyl, 2,4-dichlorobenzyl, 3,4-dichlorobenzyl, and more preferably 3,4-dichlorobenzyl.
  • Compound (III) can be obtained by reacting compound (I) and compound (II) in the presence of an acid in a solvent or without a solvent.
  • Examples of the acid include formic acid, acetic acid, propionic acid, trifluoroacetic acid, phosphoric acid, hydrochloric acid, trifluoromethanesulfonic acid, methanesulfonic acid, paratoluenesulfonic acid, and other organic acids, aluminum (III) chloride, titanium tetrachloride, three Examples thereof include Lewis acids such as boron fluoride / diethyl ether complex, boron trichloride, zinc chloride, iron chloride, aluminum triflate, copper triflate, etc., and preferably 1 to 50 equivalents are used relative to compound (I). .
  • Lewis acids such as boron fluoride / diethyl ether complex, boron trichloride, zinc chloride, iron chloride, aluminum triflate, copper triflate, etc., and preferably 1 to 50 equivalents are used relative to compound (I). .
  • the reaction can be promoted by adding 1 to 10 equivalents of acetic anhydride, trifluoroacetic anhydride, thionyl chloride, isobutyl chloroformate, 1,1′-dicarbonylimidazole and the like as additives.
  • the solvent include inert solvents such as dichloromethane, 1,2-dichloroethane and chloroform, aromatic hydrocarbon solvents such as toluene and xylene, ethers such as tetrahydrofuran (THF), diethyl ether, diisopropyl ether and tert-butyl methyl ether.
  • Solvent such as N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone, nitrile solvent such as acetonitrile, propylonitrile, methanol, ethanol, 1-propanol, 2-propanol, Examples thereof include alcohol solvents such as 1-butanol and 2-butanol, dimethyl sulfoxide, and the like, and these are used alone or in combination. Trifluoroacetic acid can also be used as a solvent. When an ether solvent, an amide solvent, or a nitrile solvent is used, the reaction may be performed using an excess amount of acid as necessary.
  • amide solvent such as N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone
  • nitrile solvent such as acetonitrile, propylonitrile
  • methanol ethanol
  • ethanol 1-propanol
  • 2-propanol Examples thereof include alcohol
  • reaction is usually carried out at a temperature between -50 ° C. and the boiling point of the solvent used for 5 minutes to 24 hours.
  • Compound (I) can be obtained by known methods [for example, Comprehensive Organic Transformations, second edition, by RC Larock, John Wiley and Sons Incorporated. (John Wiley & Sons Inc.) (1999) etc.] or a method according to them.
  • Compound (II) is a commercially available product or a known method [for example, Comprehensive Organic Transformations, 2nd Edition, by R. C. Larock, John Wiley & Sons Inc. (1999); Bioorganic & Medicinal Chemistry Letters (Bioorganic & Chemistry & Letters) (2009) etc.] or similar methods Obtainable.
  • Compound (IV) can be synthesized from compound (III) obtained by the production method of the present invention through steps such as ester hydrolysis, amidation, and deprotection. These transformations can be performed using known methods [for example, Comprehensive Organic Transformations 2nd edition (Comprehensive Organic Transformations 2nd edition), R. C. Larock, Vch Verlagsgesellscaft Mbh (1999), protective ⁇ Groups in Organic Synthesis 4th Edition (Protective Groups Organic Synthesis, 4th edition), by Green (T. W. Greene), John Wiley & Sons Inc. (2006), etc.] It is possible to do.
  • the target compound in the above production method can be isolated and purified by subjecting it to a separation and purification method commonly used in organic synthetic chemistry, for example, filtration, extraction, washing, drying, concentration, recrystallization, various chromatography and the like.
  • the intermediate can be subjected to the next reaction without any particular purification.
  • Some of the compounds (I), (II) and (III) may have stereoisomers such as geometric isomers and optical isomers, but the present invention includes all possible Including isomers and mixtures thereof.
  • compounds (I), (II) and (III) may exist in the form of adducts with water or various solvents, and these adducts are also included in the present invention.
  • Examples of the compound (III) obtained by the present invention include the following benzophenone derivatives.
  • Step 2 2- ⁇ 3,5-bis (3,4-dichlorobenzyloxy) -2-ethyl-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl ⁇ -N, Preparation of N-bis (2-methoxyethyl) acetamide (Compound D) Compound C (8.5 g, 11 mmol) was mixed with ethyl acetate (85 mL) and 1,1'-dicarbonyldiimidazole (4.4 g, 27 mmol). In addition, the mixture was stirred at 40 ° C. for 1.5 hours.
  • Step 3 2- ⁇ 2-Ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl ⁇ -N, N-bis (2-methoxyethyl)
  • Acetamide Compound E
  • THF 16 mL
  • 2-propanol 60 mL
  • water 8 mL
  • ammonium formate 5.7 g, 90 mmol
  • Pd / C 5% palladium carbon
  • Ethyl acetate, THF and brine were added to the residue, and the pH was adjusted to 7.0 with a saturated aqueous sodium carbonate solution, followed by liquid separation.
  • Ethyl acetate (40 mL) and THF (40 mL) were added to the aqueous layer for extraction, and the organic layers were combined and concentrated under reduced pressure.
  • 2-propanol (13 mL) and water (62 mL) were added to the residue, and the mixture was stirred at 50 ° C for 1 hour, at 25 ° C for 1 hour, and at 5 ° C for 1 hour. , 83%).
  • Step 4 Production of Compound F Ethanol (0.4 mL) and water (0.08 mL) were added to Compound E (100 mg, 0.17 mmol) and stirred at 60 ° C for 10 minutes, and then activated carbon (10 mg) was added for 15 minutes. Stir. The reaction mixture was filtered through Celite, ethanol (0.2 mL) and concentrated hydrochloric acid (0.03 mL) were added to the filtrate, and the mixture was stirred at 55 ° C. for 30 min., Then stirred at 5 ° C. for 2 hr. (95 mg, 91%) was obtained.
  • the reaction mixture was dropped into a mixed solvent of ethyl acetate (225 mL) and water (200 mL), and the pH was adjusted to 6.5 with 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation.
  • the organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure.
  • the reaction mixture was dropped into a mixed solvent of ethyl acetate (225 mL) and water (200 mL), and the pH was adjusted to 6.5 with 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation.
  • the organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure.
  • Process 2 Compound K is dissolved in toluene (1.75 L), trifluoroacetic acid (550 mL), acetic acid (111 g, 1.85 mol), and trifluoroacetic anhydride (519 g, 2.47 mol) are added, and then at 20 ° C. for 18 hours. Stir. The reaction mixture was added dropwise to a mixed solution of water (3.88 L), THF (2.75 L), and toluene (1.00 L), and the pH was adjusted to 7 with a 10 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with water and then concentrated to 750 mL under reduced pressure.
  • Process 3 Compound L (400 g, 0.737 mol) was dissolved in toluene (400 mL), trifluoroacetic acid (1.20 L) and triethylsilane (257 g, 2.21 mol) were added, and the mixture was stirred at 20 ° C. for 18 hours.
  • the reaction mixture was added dropwise to a mixed solution of water (2.00 L), THF (2.00 L), and toluene (1.60 L), adjusted to pH 7 with a 10 mol / L aqueous sodium hydroxide solution, and separated.
  • the organic layer was washed with water and then concentrated to about 1200 mL under reduced pressure.
  • Reference Example 1 Production process 1 of 3-methoxy-4- (2-morpholin-4-ylethoxy) benzoic acid monohydrochloride (Compound A) Dissolve ethyl vanillate (200 g, 1.02 mol) in acetonitrile (2.0 L), add potassium carbonate (317 g, 2.29 mol) and 4- (2-chloroethyl) morpholine hydrochloride (199 g, 1.07 mol), The mixture was stirred at 60 ° C. for 6 hours.
  • Compound A Dissolve ethyl vanillate (200 g, 1.02 mol) in acetonitrile (2.0 L), add potassium carbonate (317 g, 2.29 mol) and 4- (2-chloroethyl) morpholine hydrochloride (199 g, 1.07 mol), The mixture was stirred at 60 ° C. for 6 hours.
  • Process 4 Add 1,4-dioxane (44 mL), ammonium formate (1.0 g, 16 mmol), bis (triphenylphosphine) palladium (II) dichloride (0.15 g, 0.21 mmol) to compound S (2.6 g, 4.0 mmol) And refluxed for 2 hours.
  • the reaction mixture was cooled to 25 ° C., ethyl acetate (25 mL), methanol (25 mL), activated carbon (0.15 g) were added, and the mixture was stirred at 25 ° C. for 2 hr.
  • the reaction mixture was filtered through celite, and the filtrate was concentrated under reduced pressure.
  • Comparative Example 1 is a 2- ⁇ 2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- () having a Friedel-Crafts reaction using a benzene derivative in which hydroxy is protected with allyl as a key step.
  • 2 shows a method for producing 2-morpholin-4-ylethoxy) benzoyl] phenyl ⁇ -N, N-bis (2-methoxyethyl) acetamide (Compound E).
  • Example 1 is a Friedel-Crafts reaction using a benzene derivative in which hydroxy is protected with 3,4-dichlorobenzyl
  • Example 2 is a method for producing Compound E from the benzophenone derivative obtained in Example 1. Is shown.
  • the production methods of Examples 1 and 2 are referred to as invention methods
  • the production method of Comparative Example 1 is referred to as a conventional method.
  • reaction mixture was added dropwise to a mixed solvent of ethyl acetate (100 mL) and water (100 mL), and the pH was adjusted to 7.0 with a 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with saturated brine, dried over sodium sulfate, and concentrated under reduced pressure.
  • the present invention provides a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.

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Abstract

Provided are: a compound represented by general formula (I) (wherein R1a and R1b may be the same as or different from each other and independently represent a benzyl group substituted by one to three halogen atoms, wherein, when the number of the halogen atoms is two or three, the halogen atoms may be the same as or different from each other; R2 represents a lower alkyl group which may have a substituent; and R3 represents a lower alkoxycarbonyl group which may have a substituent) or a salt thereof, which is useful in, for example, a method for producing an intermediate for the synthesis of a benzophenone derivative having an anti-tumor activity and the like; a method for producing a benzophenone derivative represented by general formula (III) (wherein R1a, R1b, R2 and R3 are as defined above; R4 represents a lower alkyl group which may have a substituent; and R5 represents an aliphatic heterocyclic alkyl group which may have a substituent) or a salt thereof, the method being characterized by comprising reacting a compound represented by general formula (II) (wherein R4 and R5 are as defined above) or a salt thereof in the presence of an acid; and others.

Description

ベンゾフェノン誘導体の製造法Method for producing benzophenone derivative
 本発明は、抗腫瘍活性等を有するベンゾフェノン誘導体の合成中間体の製造法等に関する。 The present invention relates to a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.
 2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミドが、Hsp90拮抗剤、抗腫瘍剤等として有用であることが知られている(特許文献1及び2)。特許文献1の記載によると、該化合物のベンゾフェノン骨格の構築に、安息香酸誘導体とジヒドロキシベンゼン誘導体のフリーデル-クラフツ反応が使用されている。本合成法においては、ヒドロキシがアリルで保護されたジヒドロキシベンゼン誘導体が用いられている。 2- {2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) acetamide is It is known to be useful as an Hsp90 antagonist, an antitumor agent, etc. (Patent Documents 1 and 2). According to the description in Patent Document 1, the Friedel-Crafts reaction of a benzoic acid derivative and a dihydroxybenzene derivative is used to construct a benzophenone skeleton of the compound. In this synthesis method, a dihydroxybenzene derivative in which hydroxy is protected with allyl is used.
 ジヒドロキシベンゼン誘導体と安息香酸誘導体のフリーデル-クラフツ反応によるベンゾフェノン誘導体の合成において、ヒドロキシがベンジルで保護されたジヒドロキシベンゼン誘導体を用いる例が知られている(非特許文献1~5)。 In the synthesis of benzophenone derivatives by Friedel-Crafts reaction of dihydroxybenzene derivatives and benzoic acid derivatives, examples using dihydroxybenzene derivatives in which hydroxy is protected with benzyl are known (Non-Patent Documents 1 to 5).
国際公開第2005/000778号パンフレットInternational Publication No. 2005/000778 Pamphlet 国際公開第2006/088193号パンフレットInternational Publication No. 2006/088193 Pamphlet
 本発明の目的は、抗腫瘍活性等を有するベンゾフェノン誘導体の合成中間体の製造法等を提供することにある。 An object of the present invention is to provide a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.
 本発明は、以下の(1)~(31)に関する。
(1)式(I)
The present invention relates to the following (1) to (31).
(1) Formula (I)
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
(式中、R1a及びR1bは同一または異なって1~3のハロゲンで置換されたベンジルを表し、該ハロゲンが2または3である場合、それぞれのハロゲンは同一でも異なっていてもよく、
R2は置換基を有していてもよい低級アルキルを表し、
R3は置換基を有していてもよい低級アルコキシカルボニルを表す)で表される化合物またはその塩、及び式(II)
(Wherein R 1a and R 1b represent the same or different benzyl substituted with 1 to 3 halogens, and when the halogen is 2 or 3, each halogen may be the same or different,
R 2 represents optionally substituted lower alkyl,
R 3 represents a lower alkoxycarbonyl which may have a substituent) or a salt thereof, and formula (II)
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
(式中、R4は置換基を有していてもよい低級アルキルを表し、
R5は置換基を有していてもよい脂肪族複素環アルキルを表す)で表される化合物またはその塩を、酸の存在下、反応させることを特徴とする、式(III)
(In the formula, R 4 represents a lower alkyl which may have a substituent,
R 5 is characterized in that a compound or a salt thereof represented) the aliphatic heterocyclic alkyl optionally having a substituent, the presence of an acid, reacting the formula (III)
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
(式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)で表されるベンゾフェノン誘導体またはその塩の製造法。
(2)R1a及びR1bがジクロロベンジルである前記(1)記載のベンゾフェノン誘導体またはその塩の製造法。
(3)R1a及びR1bが3,4-ジクロロベンジルである前記(1)記載のベンゾフェノン誘導体またはその塩の製造法。
(4)R2が低級アルキルである前記(1)~(3)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(5)R2がエチルである前記(1)~(3)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(6)R3が低級アルコキシカルボニルである前記(1)~(5)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(7)R3がメトキシカルボニルである前記(1)~(5)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(Wherein, R 1a, R 1b, R 2, R 3, R 4 and R 5 are respectively the same as the aforementioned) benzophenone derivatives or the preparation of a salt thereof.
(2) The method for producing a benzophenone derivative or a salt thereof according to the above (1), wherein R 1a and R 1b are dichlorobenzyl.
(3) The method for producing a benzophenone derivative or a salt thereof according to the above (1), wherein R 1a and R 1b are 3,4-dichlorobenzyl.
(4) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (3), wherein R 2 is lower alkyl.
(5) The method for producing a benzophenone derivative or a salt thereof according to any one of (1) to (3), wherein R 2 is ethyl.
(6) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (5), wherein R 3 is lower alkoxycarbonyl.
(7) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (5), wherein R 3 is methoxycarbonyl.
(8)R4が低級アルキルである前記(1)~(7)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(9)R4がメチルである前記(1)~(7)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(10)R5が脂肪族族複素環アルキルである前記(1)~(9)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(11)R5が、2位が脂肪複素環基で置換されたエチルである前記(1)~(9)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(12)R5が2-モルホリノエチルである前記(1)~(9)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(13)酸がトリフルオロ酢酸である前記(1)~(12)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(14)式(I)
(8) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (7), wherein R 4 is lower alkyl.
(9) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (7), wherein R 4 is methyl.
(10) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (9), wherein R 5 is an aliphatic heterocyclic alkyl.
(11) R 5 is 2-position benzophenone derivatives or the preparation of a salt thereof according to any one of the ethyl substituted with aliphatic heterocyclic group (1) to (9).
(12) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (9), wherein R 5 is 2-morpholinoethyl.
(13) The process for producing a benzophenone derivative or a salt thereof according to any one of (1) to (12), wherein the acid is trifluoroacetic acid.
(14) Formula (I)
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
(式中、R1a、R1b、R2及びR3はそれぞれ前記と同義である)で表される化合物またはその塩、及び式(II) Wherein R 1a , R 1b , R 2 and R 3 are as defined above, or a salt thereof, and formula (II)
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
(式中、R4及びR5はそれぞれ前記と同義である)で表される化合物またはその塩を、酸の存在下、反応させ、式(III) (Wherein R 4 and R 5 are as defined above) or a salt thereof, in the presence of an acid, to react,
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
(式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)で表されるベンゾフェノン誘導体またはその塩を得る工程を含むことを特徴とする、式(IV) Wherein R 1a , R 1b , R 2 , R 3 , R 4 and R 5 are as defined above, respectively, and a step of obtaining a salt thereof. (IV)
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
(式中、R2、R4及びR5はそれぞれ前記と同義であり、
R6は置換基を有していてもよいN-低級アルキルアミノカルボニルまたは置換基を有していてもよいN,N-ジ低級アルキルアミノカルボニルを表す)で表されるベンゾフェノン誘導体またはその塩の製造法。
(15)R1a及びR1bがジクロロベンジルである前記(14)記載のベンゾフェノン誘導体またはその塩の製造法。
(16)R1a及びR1bが3,4-ジクロロベンジルである前記(14)記載のベンゾフェノン誘導体またはその塩の製造法。
(17)R2が低級アルキルである前記(14)~(16)記載のベンゾフェノン誘導体またはその塩の製造法。
(18)R2がエチルである前記(14)~(16)記載のベンゾフェノン誘導体またはその塩の製造法。
(19)R3が低級アルコキシカルボニルである前記(14)~(18)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(20)R3がメトキシカルボニルである前記(14)~(18)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
Wherein R 2 , R 4 and R 5 are as defined above,
R 6 represents an optionally substituted N-lower alkylaminocarbonyl or an optionally substituted N, N-dilower alkylaminocarbonyl)) or a salt thereof. Manufacturing method.
(15) The process for producing a benzophenone derivative or a salt thereof according to the above (14), wherein R 1a and R 1b are dichlorobenzyl.
(16) The process for producing a benzophenone derivative or a salt thereof according to the above (14), wherein R 1a and R 1b are 3,4-dichlorobenzyl.
(17) The method for producing a benzophenone derivative or a salt thereof according to the above (14) to (16), wherein R 2 is lower alkyl.
(18) The method for producing a benzophenone derivative or a salt thereof according to the above (14) to (16), wherein R 2 is ethyl.
(19) The process for producing a benzophenone derivative or a salt thereof according to any one of the above (14) to (18), wherein R 3 is lower alkoxycarbonyl.
(20) The process for producing a benzophenone derivative or a salt thereof according to any one of (14) to (18), wherein R 3 is methoxycarbonyl.
(21)R4が低級アルキルである前記(14)~(20)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(22)R4がメチルである前記(14)~(20)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(23)R5が脂肪族複素環アルキルである前記(14)~(22)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(24)R5が、2位が脂肪族複素環基で置換されたエチルである前記(14)~(22)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(25)R5が2-モルホリノエチルである前記(14)~(22)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(26)R6がN,N-ビス(2-メトキシエチル)アミノカルボニルである前記(14)~(25)のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。
(27)式(IV)で表されるベンゾフェノン誘導体が
(21) The process for producing a benzophenone derivative or a salt thereof according to any one of (14) to (20), wherein R 4 is lower alkyl.
(22) The process for producing a benzophenone derivative or a salt thereof according to any one of (14) to (20), wherein R 4 is methyl.
(23) benzophenone derivatives or the preparation of a salt thereof according to any one of the R 5 is aliphatic heterocyclic alkyl (14) to (22).
(24) The process for producing a benzophenone derivative or a salt thereof according to any one of the above (14) to (22), wherein R 5 is ethyl substituted at the 2-position with an aliphatic heterocyclic group.
(25) The process for producing a benzophenone derivative or a salt thereof according to any one of (14) to (22), wherein R 5 is 2-morpholinoethyl.
(26) The process for producing a benzophenone derivative or a salt thereof according to any one of (14) to (25), wherein R 6 is N, N-bis (2-methoxyethyl) aminocarbonyl.
(27) A benzophenone derivative represented by the formula (IV) is
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
で表される2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミドである、前記(14)記載のベンゾフェノン誘導体またはその塩の製造法。
(28)式(I)
2- {2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) ) A process for producing a benzophenone derivative or a salt thereof according to (14), which is acetamide.
(28) Formula (I)
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
(式中、R1a及びR1bは同一または異なって1~3のハロゲンで置換されたベンジルを表し、該ハロゲンが2または3である場合、それぞれのハロゲンは同一でも異なっていてもよく、
R2は置換基を有していてもよい低級アルキルを表し、
R3は置換基を有していてもよい低級アルコキシカルボニルを表す)で表される化合物またはその塩。
(29)R1a及びR1bが3,4-ジクロロベンジルであり、R2がエチルであり、R3がメトキシカルボニルである前記(28)記載の化合物またはその塩。
(30)式(III)
(Wherein R 1a and R 1b represent the same or different benzyl substituted with 1 to 3 halogens, and when the halogen is 2 or 3, each halogen may be the same or different,
R 2 represents optionally substituted lower alkyl,
R 3 represents a lower alkoxycarbonyl which may have a substituent, or a salt thereof.
(29) The compound or a salt thereof according to the above (28), wherein R 1a and R 1b are 3,4-dichlorobenzyl, R 2 is ethyl, and R 3 is methoxycarbonyl.
(30) Formula (III)
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
(式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)で表されるベンゾフェノン誘導体またはその塩。
(31)R1a及びR1bが3,4-ジクロロベンジルであり、R2がエチルであり、R3がメトキシカルボニルであり、R4がメチルであり、R5が2-モルホリノエチルである前記(30)記載のベンゾフェノン誘導体またはその塩。
(Wherein R 1a , R 1b , R 2 , R 3 , R 4 and R 5 are as defined above) or a salt thereof.
(31) The above wherein R 1a and R 1b are 3,4-dichlorobenzyl, R 2 is ethyl, R 3 is methoxycarbonyl, R 4 is methyl, and R 5 is 2-morpholinoethyl (30) The benzophenone derivative or a salt thereof according to the above.
 本発明により、抗腫瘍活性等を有するベンゾフェノン誘導体の合成中間体の製造法等が提供される。 The present invention provides a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.
 以下、式(I)、(II)、(III)及び(IV)で表される化合物を、それぞれ化合物(I)、(II)、(III)及び(IV)という。他の式番号の化合物についても同様である。
 化合物(I)、(II)、(III)及び(IV)の各基の定義において、
 低級アルキル、ならびに低級アルコキシカルボニル、N-低級アルキルアミノカルボニル及びN,N-ジ低級アルキルアミノカルボニルの低級アルキル部分としては、例えば直鎖または分岐状の炭素数1~10のアルキル、より具体的にはメチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、sec-ブチル、tert-ブチル、ペンチル、イソペンチル、ネオペンチル、tert-ペンチル、ヘキシル、イソヘキシル、ヘプチル、オクチル、イソオクチル、ノニル、デシル等が挙げられる。N,N-ジ低級アルキルアミノカルボニルの2つの低級アルキル部分は同一でも異なっていてもよい。
Hereinafter, the compounds represented by the formulas (I), (II), (III) and (IV) are referred to as compounds (I), (II), (III) and (IV), respectively. The same applies to the compounds of other formula numbers.
In the definition of each group of compounds (I), (II), (III) and (IV),
Lower alkyl, lower alkoxycarbonyl, N-lower alkylaminocarbonyl, and lower alkyl part of N, N-dilower alkylaminocarbonyl include, for example, linear or branched alkyl having 1 to 10 carbon atoms, and more specifically, Includes methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, tert-butyl, pentyl, isopentyl, neopentyl, tert-pentyl, hexyl, isohexyl, heptyl, octyl, isooctyl, nonyl, decyl and the like. The two lower alkyl moieties of N, N-dilower alkylaminocarbonyl may be the same or different.
 脂肪族複素環アルキルのアルキレン部分は、前記低級アルキルから水素原子を1つ除いたものと同義である。
 脂肪族複素環基及び脂肪族複素環アルキルの脂肪族複素環基部分としては、例えば窒素原子、酸素原子及び硫黄原子から選ばれる少なくとも1個の原子を含む3~8員の単環性脂肪族複素環基、3~8員の環が縮合した二環または三環性で窒素原子、酸素原子及び硫黄原子から選ばれる少なくとも1個の原子を含む縮環性脂肪族複素環基等があげられ、より具体的にはアジリジニル、アゼチジニル、ピロリジニル、ピペリジノ、ピペリジル、アゼパニル、1,2,5,6-テトラヒドロピリジル、イミダゾリジニル、ピラゾリジニル、ピペラジニル、ホモピペラジニル、ピラゾリニル、オキシラニル、オキセタニル、テトラヒドロフラニル、テトラヒドロ-2H-ピラニル、5,6-ジヒドロ-2H-ピラニル、テトラヒドロチオピラニル、オキサゾリジニル、モルホリノ、モルホリニル、チオキサゾリジニル、チオモルホリノ、チオモルホリニル、2H-オキサゾリル、2H-チオキサゾリル、ジヒドロインドリル、ジヒドロイソインドリル、ジヒドロベンゾフラニル、ベンゾイミダゾリジニル、ジヒドロベンゾオキサゾリル、ジヒドロベンゾチオキサゾリル、ベンゾジオキソリニル、テトラヒドロキノリル、テトラヒドロイソキノリル、ジヒドロ-2H-クロマニル、ジヒドロ-1H-クロマニル、ジヒドロ-2H-チオクロマニル、ジヒドロ-1H-チオクロマニル、テトラヒドロキノキサリニル、テトラヒドロキナゾリニル、ジヒドロベンゾジオキサニル、ジヒドロキノリル、ジヒドロイソキノリル、ジヒドロジベンゾアゼピニル等があげられる。
The alkylene part of the aliphatic heterocyclic alkyl has the same meaning as that obtained by removing one hydrogen atom from the lower alkyl.
Examples of the aliphatic heterocyclic group and the aliphatic heterocyclic group part of the aliphatic heterocyclic alkyl include, for example, a 3- to 8-membered monocyclic aliphatic group containing at least one atom selected from a nitrogen atom, an oxygen atom, and a sulfur atom. Heterocyclic groups, bicyclic or tricyclic condensed 3- to 8-membered rings containing at least one atom selected from a nitrogen atom, oxygen atom and sulfur atom, etc. , More specifically aziridinyl, azetidinyl, pyrrolidinyl, piperidino, piperidyl, azepanyl, 1,2,5,6-tetrahydropyridyl, imidazolidinyl, pyrazolidinyl, piperazinyl, homopiperazinyl, pyrazolinyl, oxiranyl, oxetanyl, tetrahydrofuranyl, tetrahydro-2H- Pyranyl, 5,6-dihydro-2H-pyranyl, tetrahydrothiopyranyl, oxazolidinyl, morpholino, mol Linyl, thioxazolidinyl, thiomorpholino, thiomorpholinyl, 2H-oxazolyl, 2H-thioxazolyl, dihydroindolyl, dihydroisoindolyl, dihydrobenzofuranyl, benzimidazolidinyl, dihydrobenzoxazolyl, dihydrobenzothioxa Zolyl, benzodioxolinyl, tetrahydroquinolyl, tetrahydroisoquinolyl, dihydro-2H-chromanyl, dihydro-1H-chromanyl, dihydro-2H-thiochromanyl, dihydro-1H-thiochromanyl, tetrahydroquinoxalinyl, tetrahydroquina Zolinyl, dihydrobenzodioxanyl, dihydroquinolyl, dihydroisoquinolyl, dihydrodibenzoazepinyl and the like can be mentioned.
 ハロゲンは、フッ素、塩素、臭素及びヨウ素の各原子を表す。
 置換低級アルキル、置換低級アルコキシカルボニル、N-置換低級アルキルアミノカルボニル、N-低級アルキル-N-置換低級アルキルアミノカルボニル及びN,N-ジ置換低級アルキルアミノカルボニルにおける置換基としては、同一または異なって、例えば置換数1~3のヒドロキシ、オキソ、ハロゲン、低級アルコキシ等があげられる。置換基の置換位置は特に限定されない。ここで、ハロゲンは前記と同義である。低級アルコキシの低級アルキル部分は前記低級アルキルと同義である。
Halogen represents each atom of fluorine, chlorine, bromine and iodine.
Substituents in substituted lower alkyl, substituted lower alkoxycarbonyl, N-substituted lower alkylaminocarbonyl, N-lower alkyl-N-substituted lower alkylaminocarbonyl and N, N-disubstituted lower alkylaminocarbonyl are the same or different. Examples thereof include hydroxy having 1 to 3 substituents, oxo, halogen, lower alkoxy and the like. The substitution position of the substituent is not particularly limited. Here, halogen is as defined above. The lower alkyl part of lower alkoxy has the same meaning as the lower alkyl.
 置換脂肪族複素環アルキルにおける置換基としては、同一または異なって、例えば置換数1~3のヒドロキシ、ハロゲン、オキソ、低級アルキル、低級アルコキシ、脂肪族複素環基等があげられる。置換基の置換位置は特に限定されない。ハロゲン、低級アルキル及び脂肪族複素環基はそれぞれ前記と同義である。低級アルコキシの低級アルキル部分は前記低級アルキルと同義である。 Examples of the substituent in the substituted aliphatic heterocyclic alkyl are the same or different and include, for example, hydroxy, halogen, oxo, lower alkyl, lower alkoxy, aliphatic heterocyclic group having 1 to 3 substituents. The substitution position of the substituent is not particularly limited. Halogen, lower alkyl and aliphatic heterocyclic groups are as defined above. The lower alkyl part of lower alkoxy has the same meaning as the lower alkyl.
 化合物(I)、(II)、(III)及び(IV)の塩としては、例えば酸付加塩、金属塩、アンモニウム塩、有機アミン付加塩、アミノ酸付加塩等があげられる。
 化合物(I)、(II)、(III)及び(IV)の酸付加塩としては、例えば塩酸塩、硝酸塩、硫酸塩、リン酸塩等の無機酸塩、酢酸塩、マレイン酸塩、フマル酸塩、クエン酸塩等の有機酸塩があげられ、金属塩としては、例えばナトリウム塩、カリウム塩等のアルカリ金属塩、マグネシウム塩、カルシウム塩等のアルカリ土類金属塩、アルミニウム塩、亜鉛塩等があげられ、アンモニウム塩としては、例えばアンモニウム、テトラメチルアンモニウム等の塩があげられ、有機アミン付加塩としては、モルホリン付加塩、ピペリジン付加塩等があげられ、アミノ酸付加塩としては、グリシン付加塩、フェニルアラニン付加塩、リジン付加塩、アスパラギン酸付加塩、グルタミン酸付加塩等が挙げられる。
Examples of the salts of the compounds (I), (II), (III) and (IV) include acid addition salts, metal salts, ammonium salts, organic amine addition salts, amino acid addition salts and the like.
Examples of acid addition salts of compounds (I), (II), (III) and (IV) include inorganic acid salts such as hydrochloride, nitrate, sulfate and phosphate, acetate, maleate and fumaric acid. Organic salts such as salts and citrates are listed. Examples of metal salts include alkali metal salts such as sodium salt and potassium salt, alkaline earth metal salts such as magnesium salt and calcium salt, aluminum salt, zinc salt and the like. Examples of ammonium salts include ammonium and tetramethylammonium salts, examples of organic amine addition salts include morpholine addition salts and piperidine addition salts, and examples of amino acid addition salts include glycine addition salts. Phenylalanine addition salt, lysine addition salt, aspartic acid addition salt, glutamic acid addition salt, and the like.
 R1a及びR1bとしては、4-クロロベンジル、2,4-ジクロロベンジル、3,4-ジクロロベンジル等が好ましく、3,4-ジクロロベンジルがより好ましい。
 次に、本発明の製造法について説明する。なお、以下に示す製造法において、定義した基が該製造法の条件下で変化するか、または該製造法を実施するのに不適切な場合、有機合成化学で常用される保護基の導入及び除去方法[例えば、プロテクティブ・グループス・イン・オーガニック・シンセシス第4版(Protective Groups in Organic Synthesis, fourth edition)、グリーン(T.W.Greene)著、John Wiley & Sons Inc.(2006年)等に記載の方法]等を用いることにより、目的化合物を製造することができる。
製造法
R 1a and R 1b are preferably 4-chlorobenzyl, 2,4-dichlorobenzyl, 3,4-dichlorobenzyl, and more preferably 3,4-dichlorobenzyl.
Next, the manufacturing method of this invention is demonstrated. In the production method shown below, when the defined group changes under the conditions of the production method or is inappropriate for carrying out the production method, introduction of a protective group commonly used in organic synthetic chemistry and Removal methods [e.g., Protective Groups in Organic Synthesis, 4th edition, written by TWGreene, John Wiley & Sons Inc. (2006), etc. ] Can be used to produce the target compound.
Manufacturing method
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
(式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)
 化合物(III)は、化合物(I)及び化合物(II)を酸存在下、溶媒中もしくは無溶媒で反応させることにより、得ることができる。
 酸としては、例えばギ酸、酢酸、プロピオン酸、トリフルオロ酢酸、リン酸、塩酸、トリフルオロメタンスルホン酸、メタンスルホン酸、パラトルエンスルホン酸等の有機酸、塩化アルミニウム(III)、四塩化チタン、三フッ化ホウ素・ジエチルエーテル錯体、三塩化ホウ素、塩化亜鉛、塩化鉄、アルミニウムトリフレート、銅トリフレート等のルイス酸等が挙げられ、化合物(I)に対して、好ましくは1~50当量用いられる。
(Wherein, R 1a , R 1b , R 2 , R 3 , R 4 and R 5 have the same meanings as described above)
Compound (III) can be obtained by reacting compound (I) and compound (II) in the presence of an acid in a solvent or without a solvent.
Examples of the acid include formic acid, acetic acid, propionic acid, trifluoroacetic acid, phosphoric acid, hydrochloric acid, trifluoromethanesulfonic acid, methanesulfonic acid, paratoluenesulfonic acid, and other organic acids, aluminum (III) chloride, titanium tetrachloride, three Examples thereof include Lewis acids such as boron fluoride / diethyl ether complex, boron trichloride, zinc chloride, iron chloride, aluminum triflate, copper triflate, etc., and preferably 1 to 50 equivalents are used relative to compound (I). .
 添加剤として、1~10当量の無水酢酸、無水トリフルオロ酢酸、塩化チオニル、クロロギ酸イソブチル、1,1’-ジカルボニルイミダゾール等を添加することにより、反応を促進することもできる。
 溶媒としては、例えばジクロロメタン、1,2-ジクロロエタン、クロロホルム等の不活性溶媒、トルエン、キシレン等の芳香族炭化水素溶媒、テトラヒドロフラン(THF)、ジエチルエーテル、ジイソプロピルエーテル、tert-ブチルメチルエーテル等のエーテル溶媒、N,N-ジメチルホルムアミド(DMF)、N,N-ジメチルアセトアミド、N-メチルピロリドン等のアミド溶媒、アセトニトリル、プロピルオニトリル等のニトリル溶媒、メタノール、エタノール、1-プロパノール、2-プロパノール、1-ブタノール、2-ブタノール等のアルコール溶媒、ジメチルスルホキシド等が挙げられ、これらは単独または混合して用いられる。また、トリフルオロ酢酸を溶媒として用いることもでき、エーテル溶媒、アミド溶媒、ニトリル溶媒を用いる場合、必要に応じて過剰量の酸を用いて反応を行ってもよい。
The reaction can be promoted by adding 1 to 10 equivalents of acetic anhydride, trifluoroacetic anhydride, thionyl chloride, isobutyl chloroformate, 1,1′-dicarbonylimidazole and the like as additives.
Examples of the solvent include inert solvents such as dichloromethane, 1,2-dichloroethane and chloroform, aromatic hydrocarbon solvents such as toluene and xylene, ethers such as tetrahydrofuran (THF), diethyl ether, diisopropyl ether and tert-butyl methyl ether. Solvent, amide solvent such as N, N-dimethylformamide (DMF), N, N-dimethylacetamide, N-methylpyrrolidone, nitrile solvent such as acetonitrile, propylonitrile, methanol, ethanol, 1-propanol, 2-propanol, Examples thereof include alcohol solvents such as 1-butanol and 2-butanol, dimethyl sulfoxide, and the like, and these are used alone or in combination. Trifluoroacetic acid can also be used as a solvent. When an ether solvent, an amide solvent, or a nitrile solvent is used, the reaction may be performed using an excess amount of acid as necessary.
 反応は、通常-50 ℃から用いる溶媒の沸点の間の温度で、5分間~24時間行われる。
 化合物(I)は、公知の方法[例えば、コンプリヘンシブ・オーガニック・トランスフォーメーションズ第二版(Comprehensive Organic Transformations, second edition)、ラロック(R. C. Larock)著、ジョン・ワイリー・アンド・サンズ・インコーポレイテッド(John Wiley & Sons Inc.)(1999年)等]またはそれらに準じた方法により得ることができる。
The reaction is usually carried out at a temperature between -50 ° C. and the boiling point of the solvent used for 5 minutes to 24 hours.
Compound (I) can be obtained by known methods [for example, Comprehensive Organic Transformations, second edition, by RC Larock, John Wiley and Sons Incorporated. (John Wiley & Sons Inc.) (1999) etc.] or a method according to them.
 化合物(II)は、市販品として、または公知の方法[例えば、コンプリヘンシブ・オーガニック・トランスフォーメーションズ第二版(Comprehensive Organic Transformations, second edition)、ラロック(R. C. Larock)著、ジョン・ワイリー・アンド・サンズ・インコーポレイテッド(John Wiley & Sons Inc.)(1999年);バイオオーガニック・アンド・メディシナルケミストリーレターズ (Bioorganic & Medicinal Chemistry Letters)(2009年)等]もしくはそれらに準じた方法により得ることができる。 Compound (II) is a commercially available product or a known method [for example, Comprehensive Organic Transformations, 2nd Edition, by R. C. Larock, John Wiley & Sons Inc. (1999); Bioorganic & Medicinal Chemistry Letters (Bioorganic & Chemistry & Letters) (2009) etc.] or similar methods Obtainable.
 化合物(IV)は、本発明の製造法で得られる化合物(III)から、エステル加水分解、アミド化、脱保護等の工程を経て合成することができる。それらの変換は、公知の方法[例えば、コンプリヘンシブ・オーガニック・トランスフォーメーションズ第2版(Comprehensive Organic Transformations 2nd edition)、R. C. ラロック(Larock)著、Vch Verlagsgesellscaft Mbh(1999年)、プロテクティブ・グループス・イン・オーガニック・シンセシス第4版(Protective Groups in Organic Synthesis, 4th edition)、グリーン(T. W. Greene)著、John Wiley & Sons Inc.(2006年)等に記載の方法]に従って行なうことが可能である。 Compound (IV) can be synthesized from compound (III) obtained by the production method of the present invention through steps such as ester hydrolysis, amidation, and deprotection. These transformations can be performed using known methods [for example, Comprehensive Organic Transformations 2nd edition (Comprehensive Organic Transformations 2nd edition), R. C. Larock, Vch Verlagsgesellscaft Mbh (1999), protective・ Groups in Organic Synthesis 4th Edition (Protective Groups Organic Synthesis, 4th edition), by Green (T. W. Greene), John Wiley & Sons Inc. (2006), etc.] It is possible to do.
 上記製造法における目的化合物は、有機合成化学で常用される分離精製法、例えば、濾過、抽出、洗浄、乾燥、濃縮、再結晶、各種クロマトグラフィー等に付して単離精製することができる。また、中間体においては特に精製することなく次の反応に供することも可能である。
 化合物(I)、(II)及び(III)の中には、幾何異性体、光学異性体等の立体異性体が存在し得るものもあるが、本発明は、これらを含め、全ての可能な異性体及びそれらの混合物を包含する。
The target compound in the above production method can be isolated and purified by subjecting it to a separation and purification method commonly used in organic synthetic chemistry, for example, filtration, extraction, washing, drying, concentration, recrystallization, various chromatography and the like. The intermediate can be subjected to the next reaction without any particular purification.
Some of the compounds (I), (II) and (III) may have stereoisomers such as geometric isomers and optical isomers, but the present invention includes all possible Including isomers and mixtures thereof.
 また、化合物(I)、(II)及び(III)は、水あるいは各種溶媒との付加物の形で存在することもあるが、これらの付加物も本発明に包含される。
 本発明によって得られる化合物(III)としては、例えば以下のベンゾフェノン誘導体があげられる。
In addition, compounds (I), (II) and (III) may exist in the form of adducts with water or various solvents, and these adducts are also included in the present invention.
Examples of the compound (III) obtained by the present invention include the following benzophenone derivatives.
Figure JPOXMLDOC01-appb-T000022
Figure JPOXMLDOC01-appb-T000022
 以下に、本発明の態様を実施例及び参考例で説明する。しかし、本発明はこれらに限定されるものではない。 Hereinafter, embodiments of the present invention will be described with reference to examples and reference examples. However, the present invention is not limited to these.
フリーデル-クラフツ反応による3,5-ビス(3,4-ジクロロベンジルオキシ)-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸メチル(化合物3)の製造
 化合物A(4.5 g, 14 mmol)にトリフルオロ酢酸(25 mL, 333 mmol)と無水トリフルオロ酢酸(6.7 mL, 46 mmol)を加え、25 ℃で1時間攪拌した。反応混合物にトルエン(5 mL)と化合物B(5.0 g, 9.5 mmol)を加えた後、25 ℃で18時間反応した。反応混合物を酢酸エチル(225 mL)と水(200 mL)の混合溶媒中に滴下した後、10 mol/L 水酸化ナトリウム水溶液でpHを6.5に調整し、分液した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した後、50 mLまで減圧濃縮した。残渣にn-ヘプタン(100 mL)を加えた後、45 ℃で1時間攪拌し、25 ℃で終夜静置した。その後、5 ℃で2時間攪拌後、析出した結晶を濾過して化合物3(7.0 g, 93%)を得た。
1H NMR (CDCl3) : 1.12 (t, J = 7.3 Hz, 3H), 2.51-2.53 (m, 4H), 2.68 (q, J= 7.3 Hz, 2H), 2.86 (t, J = 5.9 Hz, 2H), 3.49 (s, 3H), 3.67 (s, 2H), 3.67-3.80 (m, 4H), 3.90 (s, 3H), 4.20 (t, J = 5.9 Hz, 2H), 4.83 (s, 2H), 5.03 (s, 2H), 6.41 (s, 1H), 6.76-6.87 (m, 2H), 6.91 (d, J = 1.8 Hz, 1H), 7.21-7.34 (m, 3 H), 7.49 (d, J = 8.2 Hz, 1H), 7.53 (d, J= 1.8 Hz, 1H), 7.55 (d, J = 1.8 Hz, 1H).
Methyl 3,5-bis (3,4-dichlorobenzyloxy) -2-ethyl-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenylacetate (compound) by Friedel-Crafts reaction 3) Production Trifluoroacetic acid (25 mL, 333 mmol) and trifluoroacetic anhydride (6.7 mL, 46 mmol) were added to compound A (4.5 g, 14 mmol), and the mixture was stirred at 25 ° C. for 1 hour. Toluene (5 mL) and compound B (5.0 g, 9.5 mmol) were added to the reaction mixture, and the mixture was reacted at 25 ° C. for 18 hours. The reaction mixture was added dropwise to a mixed solvent of ethyl acetate (225 mL) and water (200 mL), and the pH was adjusted to 6.5 with a 10 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure to 50 mL. After adding n-heptane (100 mL) to the residue, the mixture was stirred at 45 ° C. for 1 hour and allowed to stand at 25 ° C. overnight. Then, after stirring at 5 ° C. for 2 hours, the precipitated crystals were filtered to obtain Compound 3 (7.0 g, 93%).
1 H NMR (CDCl 3 ): 1.12 (t, J = 7.3 Hz, 3H), 2.51-2.53 (m, 4H), 2.68 (q, J = 7.3 Hz, 2H), 2.86 (t, J = 5.9 Hz, 2H), 3.49 (s, 3H), 3.67 (s, 2H), 3.67-3.80 (m, 4H), 3.90 (s, 3H), 4.20 (t, J = 5.9 Hz, 2H), 4.83 (s, 2H ), 5.03 (s, 2H), 6.41 (s, 1H), 6.76-6.87 (m, 2H), 6.91 (d, J = 1.8 Hz, 1H), 7.21-7.34 (m, 3 H), 7.49 (d , J = 8.2 Hz, 1H), 7.53 (d, J = 1.8 Hz, 1H), 7.55 (d, J = 1.8 Hz, 1H).
化合物3を用いる2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド 1塩酸塩(化合物F)の製造
工程1:3,5-ビス(3,4-ジクロロベンジルオキシ)-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸(化合物C)の製造
 化合物3(10 g, 13 mmol)にメタノール(50 mL)とTHF(50 mL)と4 mol/L水酸化ナトリウム水溶液(35 mL)を加え、60 ℃で1時間攪拌した。反応混合物を減圧濃縮し、メタノール(150 mL)を加えた後、6 mol/L塩酸でpHを6.5に調整した。45 ℃で1時間、25 ℃で1時間攪拌した後、析出した結晶を濾過して化合物C(9.5 g, 96%)を得た。
1H NMR (DMSO-d6) : 1.06 (t, J = 7.3 Hz, 3H), 2.40-2.55 (m, 4H), 2.58 (q, J = 7.3 Hz, 2H), 2.70 (t, J = 5.6 Hz, 2H), 3.48 (s, 2H), 3.50-3.65 (m, 4H), 3.75 (s, 3H), 4.14 (t, J = 5.7 Hz, 2H), 5.03 (s, 2H), 5.24 (s, 2H), 6.83-6.95 (m, 2H), 6.95-7.05 (m, 1H), 7.01 (d, J = 8.4 Hz, 1H), 7.18 (d, J = 8.3 Hz, 1H), 7.35 (s, 1H), 7.46 (d, J = 8.2 Hz, 1H), 7.47-7.52 (m, 1H), 7.70 (d, J = 8.2 Hz, 1H), 7.75 (s, 1H), 12.25 (br s, 1H).
2- {2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) using compound 3 ) Acetamide monohydrochloride (compound F) production step 1: 3,5-bis (3,4-dichlorobenzyloxy) -2-ethyl-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) ) Preparation of benzoyl] phenylacetic acid (Compound C) Methanol (50 mL), THF (50 mL) and 4 mol / L aqueous sodium hydroxide (35 mL) were added to Compound 3 (10 g, 13 mmol) at 60 ° C. For 1 hour. The reaction mixture was concentrated under reduced pressure, methanol (150 mL) was added, and the pH was adjusted to 6.5 with 6 mol / L hydrochloric acid. After stirring at 45 ° C. for 1 hour and at 25 ° C. for 1 hour, the precipitated crystals were filtered to obtain Compound C (9.5 g, 96%).
1 H NMR (DMSO-d 6 ): 1.06 (t, J = 7.3 Hz, 3H), 2.40-2.55 (m, 4H), 2.58 (q, J = 7.3 Hz, 2H), 2.70 (t, J = 5.6 Hz, 2H), 3.48 (s, 2H), 3.50-3.65 (m, 4H), 3.75 (s, 3H), 4.14 (t, J = 5.7 Hz, 2H), 5.03 (s, 2H), 5.24 (s , 2H), 6.83-6.95 (m, 2H), 6.95-7.05 (m, 1H), 7.01 (d, J = 8.4 Hz, 1H), 7.18 (d, J = 8.3 Hz, 1H), 7.35 (s, 1H), 7.46 (d, J = 8.2 Hz, 1H), 7.47-7.52 (m, 1H), 7.70 (d, J = 8.2 Hz, 1H), 7.75 (s, 1H), 12.25 (br s, 1H) .
工程2:2-{3,5-ビス(3,4-ジクロロベンジルオキシ)-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド(化合物D)の製造
 化合物C(8.5 g, 11 mmol)に酢酸エチル(85 mL)と1,1’-ジカルボニルジイミダゾール(4.4 g, 27 mmol)を加え、40 ℃で1.5時間攪拌した。反応混合物にビス(2-メトキシエチル)アミン(2.1 mL, 14 mmol)を加えて2時間攪拌した。反応混合物を25 ℃まで冷却し、酢酸エチル(43 mL)と食塩水(85 mL)を加えた後、6 mol/L 塩酸で中和し、分液した。水層に酢酸エチル(43 mL)を加え、抽出した後、有機層を合わせて減圧濃縮した。残渣に酢酸エチル(26 mL)とヘプタン(26 mL)を加え、50 ℃で1時間、5 ℃で2時間攪拌した後、析出した結晶を濾過して化合物D(9.3 g, 95%)を得た。
1H NMR (CDCl3) : 1.11 (t, J = 7.3 Hz, 3H), 2.56-2.70 (m, 6H), 2.85 (t, J= 6.0 Hz, 2H), 3.15 (s, 3H), 3.21 (t, J= 5.6 Hz, 2H), 3.30 (s, 3H), 3.35 (t, J= 5.2 Hz, 2H), 3.36-3.52 (m, 4H), 3.65-3.75 (m, 4H), 3.78 (s, 2H), 3.88 (s, 3H), 4.19 (t, J = 5.9 Hz, 2H), 4.80 (s, 2H), 5.01 (s, 2H), 6.37 (s, 1H), 6.75-6.84 (m, 1H), 6.82 (d, J = 8.3 Hz, 1H), 6.90 (d, J = 1.4 Hz, 1H), 7.21-7.33 (m, 2H), 7.40 (dd, J = 8.2, 1.8 Hz, 1H), 7.48 (d, J = 8.3 Hz, 1H), 7.51-7.57 (m, 2H).
Step 2: 2- {3,5-bis (3,4-dichlorobenzyloxy) -2-ethyl-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, Preparation of N-bis (2-methoxyethyl) acetamide (Compound D) Compound C (8.5 g, 11 mmol) was mixed with ethyl acetate (85 mL) and 1,1'-dicarbonyldiimidazole (4.4 g, 27 mmol). In addition, the mixture was stirred at 40 ° C. for 1.5 hours. Bis (2-methoxyethyl) amine (2.1 mL, 14 mmol) was added to the reaction mixture and stirred for 2 hours. The reaction mixture was cooled to 25 ° C., ethyl acetate (43 mL) and brine (85 mL) were added, and the mixture was neutralized with 6 mol / L hydrochloric acid and separated. Ethyl acetate (43 mL) was added to the aqueous layer for extraction, and the organic layers were combined and concentrated under reduced pressure. Ethyl acetate (26 mL) and heptane (26 mL) were added to the residue, and the mixture was stirred at 50 ° C. for 1 hour and at 5 ° C. for 2 hours. The precipitated crystals were filtered to obtain compound D (9.3 g, 95%). It was.
1 H NMR (CDCl 3 ): 1.11 (t, J = 7.3 Hz, 3H), 2.56-2.70 (m, 6H), 2.85 (t, J = 6.0 Hz, 2H), 3.15 (s, 3H), 3.21 ( t, J = 5.6 Hz, 2H), 3.30 (s, 3H), 3.35 (t, J = 5.2 Hz, 2H), 3.36-3.52 (m, 4H), 3.65-3.75 (m, 4H), 3.78 (s , 2H), 3.88 (s, 3H), 4.19 (t, J = 5.9 Hz, 2H), 4.80 (s, 2H), 5.01 (s, 2H), 6.37 (s, 1H), 6.75-6.84 (m, 1H), 6.82 (d, J = 8.3 Hz, 1H), 6.90 (d, J = 1.4 Hz, 1H), 7.21-7.33 (m, 2H), 7.40 (dd, J = 8.2, 1.8 Hz, 1H), 7.48 (d, J = 8.3 Hz, 1H), 7.51-7.57 (m, 2H).
工程3:2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド(化合物E)の製造
 化合物D(8.0 g, 9.0 mmol)にTHF(16 mL)、2-プロパノール(60 mL)、水(8 mL)を加えて50 ℃に加熱した後、ギ酸アンモニウム(5.7 g, 90 mmol)と5% パラジウム炭素(Pd/C)(400 mg)を加えて2時間攪拌した。反応混合物をセライト濾過し、減圧濃縮した。残渣に酢酸エチルとTHFと食塩水を加え、飽和炭酸ナトリウム水溶液でpHを7.0に調整した後、分液した。水層に酢酸エチル(40 mL)とTHF(40 mL)を加え、抽出した後、有機層を合わせて減圧濃縮した。残渣に2-プロパノール(13 mL)と水(62 mL)を加え、50 ℃で1時間、25 ℃で1時間、5 ℃で1時間攪拌後、析出した結晶を濾過して化合物E(4.3 g, 83%)を得た。
1H-NMR (DMSO-d6): 0.99 (t, J = 7.4 Hz, 3H), 2.37 (q, J = 7.4 Hz, 2H), 2.45-2.50 (m, 4H), 2.70 (t, J = 5.8 Hz, 2H), 3.04 (t, J = 6.1 Hz, 2H), 3.07 (s, 3H), 3.19 (s, 3H), 3.22 (t, J= 6.1 Hz, 2H), 3.31 (t, J = 5.3 Hz, 2H), 3.38 (t, J = 5.3 Hz, 2H), 3.51 (s, 2H), 3.57 (t, J = 4.6 Hz, 4H), 3.76 (s, 3H), 4.13 (t, J = 5.8 Hz, 2H), 6.34 (s, 1H), 6.99 (d, J = 8.4 Hz, 1H), 7.24 (dd, J = 8.4, 1.9 Hz, 1H), 7.35 (d, J = 1.9 Hz, 1H), 9.05 (br s, 1H), 9.34 (br s, 1H).
Step 3: 2- {2-Ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) Preparation of Acetamide (Compound E) THF (16 mL), 2-propanol (60 mL) and water (8 mL) were added to Compound D (8.0 g, 9.0 mmol) and heated to 50 ° C., then ammonium formate (5.7 g, 90 mmol) and 5% palladium carbon (Pd / C) (400 mg) were added and stirred for 2 hours. The reaction mixture was filtered through celite and concentrated under reduced pressure. Ethyl acetate, THF and brine were added to the residue, and the pH was adjusted to 7.0 with a saturated aqueous sodium carbonate solution, followed by liquid separation. Ethyl acetate (40 mL) and THF (40 mL) were added to the aqueous layer for extraction, and the organic layers were combined and concentrated under reduced pressure. To the residue were added 2-propanol (13 mL) and water (62 mL), and the mixture was stirred at 50 ° C for 1 hour, at 25 ° C for 1 hour, and at 5 ° C for 1 hour. , 83%).
1 H-NMR (DMSO-d 6 ): 0.99 (t, J = 7.4 Hz, 3H), 2.37 (q, J = 7.4 Hz, 2H), 2.45-2.50 (m, 4H), 2.70 (t, J = 5.8 Hz, 2H), 3.04 (t, J = 6.1 Hz, 2H), 3.07 (s, 3H), 3.19 (s, 3H), 3.22 (t, J = 6.1 Hz, 2H), 3.31 (t, J = 5.3 Hz, 2H), 3.38 (t, J = 5.3 Hz, 2H), 3.51 (s, 2H), 3.57 (t, J = 4.6 Hz, 4H), 3.76 (s, 3H), 4.13 (t, J = 5.8 Hz, 2H), 6.34 (s, 1H), 6.99 (d, J = 8.4 Hz, 1H), 7.24 (dd, J = 8.4, 1.9 Hz, 1H), 7.35 (d, J = 1.9 Hz, 1H) , 9.05 (br s, 1H), 9.34 (br s, 1H).
工程4:化合物Fの製造
 化合物E(100 mg, 0.17 mmol)にエタノール(0.4 mL)と水(0.08 mL)を加えて60 ℃で10分攪拌した後、活性炭(10 mg)を加えて15分攪拌した。反応混合物をセライト濾過し、濾液にエタノール(0.2 mL)と濃塩酸(0.03 mL)を加えて55 ℃で30分攪拌した後、5 ℃で2時間攪拌し、析出した結晶を濾過して化合物F(95 mg, 91%)を得た。
1H-NMR (DMSO-d6): 0.97 (t, J = 7.3 Hz, 3H), 2.34 (q, J = 7.3 Hz, 2H), 3.06 (s, 3H), 3.04-3.07 (m, 2H), 3.18 (s, 3H), 3.15-3.23 (m, 4H), 3.36-3.44 (m, 4H), 3.48-3.51 (m, 6H), 3.76 (s, 3H), 3.81-3.83 (m, 2H), 3.93-3.97 (m, 2H), 4.47 (m, 2H), 6.37 (s, 1H), 7.03 (d, J = 8.4 Hz, 1H), 7.25 (dd, J= 8.4, 1.8 Hz, 1H), 7.37 (d, J = 1.8 Hz, 1H), 9.09 (br s, 1H), 9.37 (br s, 1H), 11.3 (br s, 1H).
Step 4: Production of Compound F Ethanol (0.4 mL) and water (0.08 mL) were added to Compound E (100 mg, 0.17 mmol) and stirred at 60 ° C for 10 minutes, and then activated carbon (10 mg) was added for 15 minutes. Stir. The reaction mixture was filtered through Celite, ethanol (0.2 mL) and concentrated hydrochloric acid (0.03 mL) were added to the filtrate, and the mixture was stirred at 55 ° C. for 30 min., Then stirred at 5 ° C. for 2 hr. (95 mg, 91%) was obtained.
1 H-NMR (DMSO-d 6 ): 0.97 (t, J = 7.3 Hz, 3H), 2.34 (q, J = 7.3 Hz, 2H), 3.06 (s, 3H), 3.04-3.07 (m, 2H) , 3.18 (s, 3H), 3.15-3.23 (m, 4H), 3.36-3.44 (m, 4H), 3.48-3.51 (m, 6H), 3.76 (s, 3H), 3.81-3.83 (m, 2H) , 3.93-3.97 (m, 2H), 4.47 (m, 2H), 6.37 (s, 1H), 7.03 (d, J = 8.4 Hz, 1H), 7.25 (dd, J = 8.4, 1.8 Hz, 1H), 7.37 (d, J = 1.8 Hz, 1H), 9.09 (br s, 1H), 9.37 (br s, 1H), 11.3 (br s, 1H).
4-クロロベンジルオキシを有する化合物(I)のフリーデル-クラフツ反応
 化合物A(0.72 g, 2.3 mmol)にトリフルオロ酢酸(3.5 mL, 47 mmol)と無水トリフルオロ酢酸(1.1 mL, 7.5 mmol)を加えて、25 ℃で30分攪拌した。反応混合物にトルエン(0.7 mL)と2-[3,5-ビス(4-クロロベンジルオキシ)-2-エチルフェニル]酢酸メチル(化合物G)(0.70 g, 1.5 mmol)を加え、25 ℃で6時間攪拌した。反応混合物を酢酸エチル(225 mL)と水(200 mL)の混合溶媒中に滴下した後、6 mol/L 水酸化ナトリウム水溶液でpHを6.5に調整し、分液した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した後、減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(酢酸エチル/ヘプタン=70/30~90/10)で精製し、3,5-ビス(4-クロロベンジルオキシ)-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸メチル(化合物1)(0.90 g, 83%)を得た。
1H NMR (CDCl3) : 1.10 (t, J = 7.3 Hz, 3H), 2.51-2.74 (m, 6H), 2.89 (t, J = 5.9 Hz, 2H), 3.48 (s, 3H), 3.65 (s, 2H), 3.70-3.79 (m, 4H), 3.88 (s, 3H), 4.21 (t, J = 5.9 Hz, 2H), 4.84 (s, 2H), 5.03 (s, 2H), 6.44 (s, 1H), 6.80 (d, J = 8.3 Hz, 1H), 6.80-6.89 (m, 2H), 7.11-7.19 (m, 2H), 7.25-7.40 (m, 5H), 7.52 (d, J = 1.9 Hz, 1H).
Friedel-Crafts reaction of compound (I) with 4-chlorobenzyloxy Compound A (0.72 g, 2.3 mmol) was treated with trifluoroacetic acid (3.5 mL, 47 mmol) and trifluoroacetic anhydride (1.1 mL, 7.5 mmol). In addition, the mixture was stirred at 25 ° C. for 30 minutes. Toluene (0.7 mL) and methyl 2- [3,5-bis (4-chlorobenzyloxy) -2-ethylphenyl] acetate (Compound G) (0.70 g, 1.5 mmol) were added to the reaction mixture. Stir for hours. The reaction mixture was dropped into a mixed solvent of ethyl acetate (225 mL) and water (200 mL), and the pH was adjusted to 6.5 with 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (ethyl acetate / heptane = 70/30 to 90/10), and 3,5-bis (4-chlorobenzyloxy) -2-ethyl-6- [3-methoxy-4- Methyl (2-morpholin-4-ylethoxy) benzoyl] phenylacetate (Compound 1) (0.90 g, 83%) was obtained.
1 H NMR (CDCl 3 ): 1.10 (t, J = 7.3 Hz, 3H), 2.51-2.74 (m, 6H), 2.89 (t, J = 5.9 Hz, 2H), 3.48 (s, 3H), 3.65 ( s, 2H), 3.70-3.79 (m, 4H), 3.88 (s, 3H), 4.21 (t, J = 5.9 Hz, 2H), 4.84 (s, 2H), 5.03 (s, 2H), 6.44 (s , 1H), 6.80 (d, J = 8.3 Hz, 1H), 6.80-6.89 (m, 2H), 7.11-7.19 (m, 2H), 7.25-7.40 (m, 5H), 7.52 (d, J = 1.9 Hz, 1H).
2,4-ジクロロベンジルオキシを有する化合物(I)のフリーデル-クラフツ反応
 化合物A(0.62 g, 2.0 mmol)にトリフルオロ酢酸(3.5 mL, 47 mmol)と無水トリフルオロ酢酸(0.92 mL, 6.5 mmol)を加えて、25 ℃で30分攪拌した。反応混合物にトルエン(0.7 mL)と2-[3,5-ビス(2,4-ジクロロベンジルオキシ)-2-エチルフェニル]酢酸メチル(化合物I)(0.70 g, 1.3 mmol)を加えた後、25 ℃で6時間攪拌した後、終夜静置した。反応混合物を酢酸エチル(225 mL)と水(200 mL)の混合溶媒中に滴下した後、6 mol/L 水酸化ナトリウム水溶液でpHを6.5に調整し、分液した。有機層を飽和食塩水で洗浄し、硫酸マグネシウムで乾燥した後、減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(酢酸エチル/ヘプタン=70/30~90/10)で精製し、3,5-ビス(2,4-ジクロロベンジルオキシ)-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸メチル(化合物2)(0.95 g, 92%)を得た。
1H NMR (CDCl3) : 1.13 (t, J = 7.2 Hz, 3H), 2.54-2.75 (m, 6H), 2.85-2.95 (m, 2H), 3.49 (s, 3H), 3.66 (s, 2H), 3.71-3.79 (m, 4H), 3.90 (s, 3H), 4.21 (t, J = 5.8 Hz, 2H), 4.95 (s, 2H), 5.15 (s, 2H), 6.41 (s, 1H), 6.78 (s, 1H), 6.81 (s, 1H), 7.00 (dd, J = 8.3, 2.1 Hz, 1H), 7.23-7.34 (m, 3H), 7.37-7.47 (m, 2H), 7.55 (d, J = 1.8 Hz, 1H).
Friedel-Crafts reaction of compound (I) with 2,4-dichlorobenzyloxy Compound A (0.62 g, 2.0 mmol) to trifluoroacetic acid (3.5 mL, 47 mmol) and trifluoroacetic anhydride (0.92 mL, 6.5 mmol) ) And stirred at 25 ° C. for 30 minutes. Toluene (0.7 mL) and methyl 2- [3,5-bis (2,4-dichlorobenzyloxy) -2-ethylphenyl] acetate (Compound I) (0.70 g, 1.3 mmol) were added to the reaction mixture, After stirring at 25 ° C. for 6 hours, the mixture was allowed to stand overnight. The reaction mixture was dropped into a mixed solvent of ethyl acetate (225 mL) and water (200 mL), and the pH was adjusted to 6.5 with 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with saturated brine, dried over magnesium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (ethyl acetate / heptane = 70/30 to 90/10), and 3,5-bis (2,4-dichlorobenzyloxy) -2-ethyl-6- [3-methoxy- Methyl 4- (2-morpholin-4-ylethoxy) benzoyl] phenylacetate (Compound 2) (0.95 g, 92%) was obtained.
1 H NMR (CDCl 3 ): 1.13 (t, J = 7.2 Hz, 3H), 2.54-2.75 (m, 6H), 2.85-2.95 (m, 2H), 3.49 (s, 3H), 3.66 (s, 2H ), 3.71-3.79 (m, 4H), 3.90 (s, 3H), 4.21 (t, J = 5.8 Hz, 2H), 4.95 (s, 2H), 5.15 (s, 2H), 6.41 (s, 1H) , 6.78 (s, 1H), 6.81 (s, 1H), 7.00 (dd, J = 8.3, 2.1 Hz, 1H), 7.23-7.34 (m, 3H), 7.37-7.47 (m, 2H), 7.55 (d , J = 1.8 Hz, 1H).
2-[3,5-ビス(3,4-ジクロロベンジルオキシ)-2-エチルフェニル]酢酸メチル(化合物B)の製造
工程1
 3,5-ジヒドロキシフェニル酢酸メチル(250 g, 1.37 mol)をDMF(1.25 L)に溶解し、炭酸カリウム(474 g, 3.43 mol)及び3,4-ジクロロベンジルクロリド(617 g, 3.16 mol)を加え、50 ℃で5時間攪拌した。反応混合物に酢酸エチル(2.50 L)を加え、濾過し、濾液に5%食塩水(2.50 L)及び1 mol/L塩酸(25 mL)を加え、分液した。有機層を10%食塩水(2.50 L)で洗浄した後、減圧濃縮した。残渣にトルエンを加え、減圧濃縮し、2-[3,5-ビス(3,4-ジクロロベンジルオキシ)フェニル]酢酸メチル(化合物K)を得た。化合物Kはそのまま次工程に用いた。
1H NMR (CDCl3) : 3.56 (s, 2H), 3.69 (s, 3H), 4.16 (s, 4H), 6.45-6.57 (m, 3H), 7.20-7.30 (m, 2H), 7.40-7.57 (m, 4H).
Production process 1 of methyl 2- [3,5-bis (3,4-dichlorobenzyloxy) -2-ethylphenyl] acetate (compound B)
Dissolve methyl 3,5-dihydroxyphenylacetate (250 g, 1.37 mol) in DMF (1.25 L) and add potassium carbonate (474 g, 3.43 mol) and 3,4-dichlorobenzyl chloride (617 g, 3.16 mol). The mixture was further stirred at 50 ° C. for 5 hours. Ethyl acetate (2.50 L) was added to the reaction mixture and filtered, and 5% brine (2.50 L) and 1 mol / L hydrochloric acid (25 mL) were added to the filtrate to separate the layers. The organic layer was washed with 10% brine (2.50 L) and concentrated under reduced pressure. Toluene was added to the residue, followed by concentration under reduced pressure to obtain methyl 2- [3,5-bis (3,4-dichlorobenzyloxy) phenyl] acetate (Compound K). Compound K was directly used in the next step.
1 H NMR (CDCl 3 ): 3.56 (s, 2H), 3.69 (s, 3H), 4.16 (s, 4H), 6.45-6.57 (m, 3H), 7.20-7.30 (m, 2H), 7.40-7.57 (m, 4H).
工程2
 化合物Kをトルエン(1.75 L)に溶解し、トリフルオロ酢酸(550 mL)、酢酸(111 g, 1.85 mol)、及びトリフルオロ酢酸無水物(519 g, 2.47 mol)を加え、20 ℃で18時間攪拌した。反応混合物を水(3.88 L)、THF(2.75 L)、及びトルエン(1.00 L)の混合溶液に滴加した後、10 mol/L水酸化ナトリウム水溶液でpHを7に調整し、分液した。有機層を水で洗浄した後、減圧下で750 mLまで濃縮した。残渣に2-プロパノール(1.00 L)を加え、55 ℃で1時間攪拌した後、室温に冷却した。反応混合物に2-プロパノール(2.00 L)を加え、室温で1時間、5 ℃で2時間攪拌した。析出した結晶を濾過し、2-[2-アセチル-3,5-ビス(3,4-ジクロロベンジルオキシ)フェニル]酢酸メチル(化合物L)(590 g, 79%)を得た。
1H NMR (CDCl3) : 2.50 (s, 3H), 3.69 (s, 3H), 3.70 (s, 2H), 5.00 (s, 2H), 5.02 (s, 2H), 6.46 (m, 2H), 7.17-7.25 (m, 2H), 7.48-7.53 (m, 4H).
Process 2
Compound K is dissolved in toluene (1.75 L), trifluoroacetic acid (550 mL), acetic acid (111 g, 1.85 mol), and trifluoroacetic anhydride (519 g, 2.47 mol) are added, and then at 20 ° C. for 18 hours. Stir. The reaction mixture was added dropwise to a mixed solution of water (3.88 L), THF (2.75 L), and toluene (1.00 L), and the pH was adjusted to 7 with a 10 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with water and then concentrated to 750 mL under reduced pressure. 2-Propanol (1.00 L) was added to the residue, and the mixture was stirred at 55 ° C. for 1 hour, and then cooled to room temperature. 2-Propanol (2.00 L) was added to the reaction mixture, and the mixture was stirred at room temperature for 1 hour and at 5 ° C. for 2 hours. The precipitated crystals were filtered to obtain methyl 2- [2-acetyl-3,5-bis (3,4-dichlorobenzyloxy) phenyl] acetate (Compound L) (590 g, 79%).
1 H NMR (CDCl 3 ): 2.50 (s, 3H), 3.69 (s, 3H), 3.70 (s, 2H), 5.00 (s, 2H), 5.02 (s, 2H), 6.46 (m, 2H), 7.17-7.25 (m, 2H), 7.48-7.53 (m, 4H).
工程3
 化合物L(400 g, 0.737 mol)をトルエン(400 mL)に溶解し、トリフルオロ酢酸(1.20 L)及びトリエチルシラン(257 g, 2.21 mol)を加え、20 ℃で18時間攪拌した。反応混合物を水(2.00 L)、THF(2.00 L)、及びトルエン(1.60 L)の混合溶液に滴加した後、10 mol/L水酸化ナトリウム水溶液でpH 7に調整し、分液した。有機層を水で洗浄した後、減圧下で約1200 mLまで濃縮した。残渣に2-プロパノール(800 mL)を加え、55 ℃で1時間攪拌した後、室温に冷却した。反応混合物に2-プロパノール(1.60 L)を加え、室温で1時間、5 ℃で2時間攪拌した。反応混合物を濾過し、粗体を得た。
Process 3
Compound L (400 g, 0.737 mol) was dissolved in toluene (400 mL), trifluoroacetic acid (1.20 L) and triethylsilane (257 g, 2.21 mol) were added, and the mixture was stirred at 20 ° C. for 18 hours. The reaction mixture was added dropwise to a mixed solution of water (2.00 L), THF (2.00 L), and toluene (1.60 L), adjusted to pH 7 with a 10 mol / L aqueous sodium hydroxide solution, and separated. The organic layer was washed with water and then concentrated to about 1200 mL under reduced pressure. 2-propanol (800 mL) was added to the residue, and the mixture was stirred at 55 ° C. for 1 hour, and then cooled to room temperature. 2-Propanol (1.60 L) was added to the reaction mixture, and the mixture was stirred at room temperature for 1 hour and at 5 ° C. for 2 hours. The reaction mixture was filtered to obtain a crude product.
 得られた粗体にTHF(800 mL)及びエタノール(800 mL)を加え、55 ℃に加温して溶解する。反応混合物にエタノール(800 mL)を加え40 ℃に冷却し種晶(40.0 mg, 0.01wt%)を添加した後、1時間攪拌した。反応混合物を、室温で1時間、5 ℃で2時間攪拌した。析出した結晶を濾過し、化合物B(332 g, 85%)を得た。
1H NMR (CDCl3) : 1.09 (t, J= 7.4 Hz, 3H), 2.66 (q, J = 7.4 Hz, 2H), 3.64 (s, 2H), 3.69 (s, 3H), 4.96 (s, 2H), 4.98 (s, 2H), 6.43 (d, J = 2.4 Hz, 1H), 6.46 (d, J = 2.4 Hz, 1H), 7.18-7.30 (m, 2H), 7.44 (d, J = 3.5 Hz, 1H), 7.47 (d, J = 3.5 Hz, 1H), 7.51 (d, J = 2.2 Hz, 1H), 7.52 (d, J = 2.2 Hz, 1H).
また、工程3(化合物Lから化合物Bへの変換)は、下記の方法によっても合成することができる。
Add THF (800 mL) and ethanol (800 mL) to the resulting crude product, and dissolve by heating to 55 ° C. Ethanol (800 mL) was added to the reaction mixture, the mixture was cooled to 40 ° C., seed crystals (40.0 mg, 0.01 wt%) were added, and the mixture was stirred for 1 hr. The reaction mixture was stirred at room temperature for 1 hour and at 5 ° C. for 2 hours. The precipitated crystals were filtered to obtain Compound B (332 g, 85%).
1 H NMR (CDCl 3 ): 1.09 (t, J = 7.4 Hz, 3H), 2.66 (q, J = 7.4 Hz, 2H), 3.64 (s, 2H), 3.69 (s, 3H), 4.96 (s, 2H), 4.98 (s, 2H), 6.43 (d, J = 2.4 Hz, 1H), 6.46 (d, J = 2.4 Hz, 1H), 7.18-7.30 (m, 2H), 7.44 (d, J = 3.5 Hz, 1H), 7.47 (d, J = 3.5 Hz, 1H), 7.51 (d, J = 2.2 Hz, 1H), 7.52 (d, J = 2.2 Hz, 1H).
Step 3 (conversion from compound L to compound B) can also be synthesized by the following method.
 化合物L(2.0 g, 3.69 mmol)をトルエン(10 mL)に溶解させ、トリフルオロ酢酸(6 mL)を加えた後、0 ℃に冷却した。水素化ホウ素ナトリウム(419 mg, 11.1 mmol)をゆっくり加え、20 ℃で24時間攪拌した。反応混合物を水(5 mL)及びトルエン(10 mL)の混合溶液に滴加した後、10 mol/L水酸化ナトリウム水溶液でpH 7に調整し、分液した。有機層を水で洗浄した後、減圧濃縮した。残渣にトルエン(4 mL)及びn-ヘプタン(16 mL)を加え、50 ℃で1時間、室温で1時間攪拌した。析出した結晶を濾過し、化合物B(1.74 g, 89%)を得た。 Compound L (2.0 g, 3.69 mmol) was dissolved in toluene (10 mL), trifluoroacetic acid (6 mL) was added, and the mixture was cooled to 0 ° C. Sodium borohydride (419 mg, 11.1 mmol) was slowly added and stirred at 20 ° C. for 24 hours. The reaction mixture was added dropwise to a mixed solution of water (5 mL) and toluene (10 mL), adjusted to pH 7 with a 10 mol / L aqueous sodium hydroxide solution, and separated. The organic layer was washed with water and then concentrated under reduced pressure. Toluene (4 mL) and n-heptane (16 mL) were added to the residue, and the mixture was stirred at 50 ° C for 1 hour and at room temperature for 1 hour. The precipitated crystals were filtered to obtain Compound B (1.74 g, 89%).
参考例1:3-メトキシ-4-(2-モルホリン-4-イルエトキシ)安息香酸 1塩酸塩(化合物A)の製造
工程1
 バニリン酸エチル(200 g, 1.02 mol)をアセトニトリル(2.0 L)に溶解し、炭酸カリウム(317 g, 2.29 mol)及び4-(2-クロロエチル)モルホリン塩酸塩(199 g, 1.07 mol)を加え、60 ℃で6時間攪拌した。反応混合物を濾過し、濾液を減圧下で1000 mLまで濃縮し、3-メトキシ-4-(2-モルホリン-4-イルエトキシ)安息香酸エチル(化合物N)を含むアセトニトリル溶液を得た。そのまま次工程に用いた。
1H-NMR (DMSO-d6): 1.31 (t, J = 7.1 Hz, 3H), 2.48 (t, J= 4.5 Hz, 4H), 2.71 (t, J = 5.9 Hz, 2H), 3.57 (t, J = 4.5 Hz, 4H), 3.82 (s, 3H), 4.14 (t, J = 5.9 Hz, 2H), 4.28 (q, J = 7.1 Hz, 2H), 7.07 (d, J = 8.4 Hz, 1H), 7.45 (d, J = 1.6 Hz, 1H), 7.56 (dd, J = 8.4, 1.6 Hz, 1H).
Reference Example 1: Production process 1 of 3-methoxy-4- (2-morpholin-4-ylethoxy) benzoic acid monohydrochloride (Compound A)
Dissolve ethyl vanillate (200 g, 1.02 mol) in acetonitrile (2.0 L), add potassium carbonate (317 g, 2.29 mol) and 4- (2-chloroethyl) morpholine hydrochloride (199 g, 1.07 mol), The mixture was stirred at 60 ° C. for 6 hours. The reaction mixture was filtered, and the filtrate was concentrated to 1000 mL under reduced pressure to obtain an acetonitrile solution containing ethyl 3-methoxy-4- (2-morpholin-4-ylethoxy) benzoate (Compound N). Used as is in the next step.
1 H-NMR (DMSO-d 6 ): 1.31 (t, J = 7.1 Hz, 3H), 2.48 (t, J = 4.5 Hz, 4H), 2.71 (t, J = 5.9 Hz, 2H), 3.57 (t , J = 4.5 Hz, 4H), 3.82 (s, 3H), 4.14 (t, J = 5.9 Hz, 2H), 4.28 (q, J = 7.1 Hz, 2H), 7.07 (d, J = 8.4 Hz, 1H ), 7.45 (d, J = 1.6 Hz, 1H), 7.56 (dd, J = 8.4, 1.6 Hz, 1H).
工程2
 工程1で得られた化合物Nのアセトニトリル溶液にエタノール(500 mL)及び3 mol/L水酸化ナトリウム水溶液(850 mL, 2.55 mol)を加え、45 ℃で3時間攪拌した。反応混合物を5 ℃に冷却し、濃塩酸で中和し、酢酸エチル(500 mL)及び2-メチル-1-プロパノール(1.50 L)を加え、分液した。水層に酢酸エチル(250 mL)及び2-メチル-1-プロパノール(750 mL)を加え、抽出した後、有機層をあわせて、減圧下で1000 mLまで濃縮した。残渣に酢酸エチルを加え、15 ℃で1時間攪拌した。析出した結晶を濾過し、粗体(318 g, 83%)を得た。得られた粗体(5.0 g, 13 mmol)にメタノール(50 mL)を加え、還流下2時間攪拌した。反応混合物を15 ℃まで冷却し、2時間攪拌した。析出した結晶を濾過し、化合物A(3.3 g, 74%)を得た。
1H-NMR (DMSO-d6): 3.20-3.37 (m, 2H), 3.38-3.70 (m, 2H), 3.57 (t, J = 4.9 Hz, 2H), 3.82 (s, 3H), 3.85-4.00 (m, 2H), 3.91 (s, 2H), 4.55 (t, J= 4.9 Hz, 2H), 7.12 (d, J = 8.4 Hz, 1H), 7.48 (d, J = 1.8 Hz, 1H), 7.56 (dd, J = 8.4, 1.8 Hz, 1H).
Process 2
Ethanol (500 mL) and a 3 mol / L aqueous sodium hydroxide solution (850 mL, 2.55 mol) were added to the acetonitrile solution of compound N obtained in step 1, and the mixture was stirred at 45 ° C. for 3 hours. The reaction mixture was cooled to 5 ° C., neutralized with concentrated hydrochloric acid, and ethyl acetate (500 mL) and 2-methyl-1-propanol (1.50 L) were added to separate the layers. Ethyl acetate (250 mL) and 2-methyl-1-propanol (750 mL) were added to the aqueous layer for extraction, and then the organic layers were combined and concentrated to 1000 mL under reduced pressure. Ethyl acetate was added to the residue and stirred at 15 ° C. for 1 hour. The precipitated crystals were filtered to obtain a crude product (318 g, 83%). Methanol (50 mL) was added to the obtained crude product (5.0 g, 13 mmol), and the mixture was stirred for 2 hours under reflux. The reaction mixture was cooled to 15 ° C. and stirred for 2 hours. The precipitated crystals were filtered to obtain Compound A (3.3 g, 74%).
1 H-NMR (DMSO-d 6 ): 3.20-3.37 (m, 2H), 3.38-3.70 (m, 2H), 3.57 (t, J = 4.9 Hz, 2H), 3.82 (s, 3H), 3.85- 4.00 (m, 2H), 3.91 (s, 2H), 4.55 (t, J = 4.9 Hz, 2H), 7.12 (d, J = 8.4 Hz, 1H), 7.48 (d, J = 1.8 Hz, 1H), 7.56 (dd, J = 8.4, 1.8 Hz, 1H).
比較例1:アリルオキシを有するベンゼン誘導体を用いたフリーデル-クラフツ反応を含む2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド(化合物E)の製造
工程1:アリルオキシを有するベンゼン誘導体を用いたフリーデル-クラフツ反応
 化合物A(4.7 g, 16 mmol)と2-(3,5-ジアリルオキシ-2-エチルフェニル)酢酸メチル(化合物Q)(4.3 g, 15 mmol)にトリフルオロ酢酸(43 mL)と無水トリフルオロ酢酸(7.5 mL, 53 mmol)を加えて1.5時間攪拌した。反応混合物を減圧濃縮し、酢酸エチル(100 mL)と水(100 mL)を加え、6 mol/L水酸化ナトリウム水溶液でpHを9.0に調整後、分液した。有機層を飽和食塩水(100 mL)で洗浄し、硫酸ナトリウムで乾燥した後、減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(酢酸エチル/メタノール=100/0~10/1)で精製し、3,5-ジアリルオキシ-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸メチル(化合物P)(7.0 g, 86%)を得た。
1H-NMR (CDCl3):1.09 (t, J = 7.5 Hz, 3H), 2.57-2.70 (m, 6H), 2.83 (t, J = 5.4 Hz, 2H), 3.45 (s, 3H), 3.58 (s, 2H), 3.69 (t, J = 4.7 Hz, 4H), 3.82 (s, 3H), 4.21 (t, J = 5.4 Hz, 2H), 4.42 (d, J = 4.8 Hz, 2H), 4.63 (d, J = 4.8 Hz, 2H), 4.96-5.09 (m, 2H), 5.29 (dd, J = 10.5, 1.5 Hz, 1H), 5.54 (dd, J = 17.3, 1.5 Hz, 1H), 5.63-5.78 (m, 1H), 6.04-6.18 (m, 1H), 6.63 (s, 1H), 6.96 (d, J = 8.4 Hz, 1H), 7.29 (dd, J = 8.4, 1.8 Hz, 1H), 7.43 (d, J = 1.8 Hz, 1H).
Comparative Example 1: 2- {2-Ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) with Friedel-Crafts reaction using benzene derivatives with allyloxy Benzoyl] phenyl} -N, N-bis (2-methoxyethyl) acetamide (compound E) production process 1: Friedel-Crafts reaction using benzene derivative with allyloxy Compound A (4.7 g, 16 mmol) and 2 To methyl-(3,5-diallyloxy-2-ethylphenyl) acetate (compound Q) (4.3 g, 15 mmol) was added trifluoroacetic acid (43 mL) and trifluoroacetic anhydride (7.5 mL, 53 mmol). Stir for 1.5 hours. The reaction mixture was concentrated under reduced pressure, ethyl acetate (100 mL) and water (100 mL) were added, and the pH was adjusted to 9.0 with 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with saturated brine (100 mL), dried over sodium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (ethyl acetate / methanol = 100/0 to 10/1), and 3,5-diallyloxy-2-ethyl-6- [3-methoxy-4- (2-morpholine-4 Methyl -ylethoxy) benzoyl] phenylacetate (Compound P) (7.0 g, 86%) was obtained.
1 H-NMR (CDCl 3 ): 1.09 (t, J = 7.5 Hz, 3H), 2.57-2.70 (m, 6H), 2.83 (t, J = 5.4 Hz, 2H), 3.45 (s, 3H), 3.58 (s, 2H), 3.69 (t, J = 4.7 Hz, 4H), 3.82 (s, 3H), 4.21 (t, J = 5.4 Hz, 2H), 4.42 (d, J = 4.8 Hz, 2H), 4.63 (d, J = 4.8 Hz, 2H), 4.96-5.09 (m, 2H), 5.29 (dd, J = 10.5, 1.5 Hz, 1H), 5.54 (dd, J = 17.3, 1.5 Hz, 1H), 5.63- 5.78 (m, 1H), 6.04-6.18 (m, 1H), 6.63 (s, 1H), 6.96 (d, J = 8.4 Hz, 1H), 7.29 (dd, J = 8.4, 1.8 Hz, 1H), 7.43 (d, J = 1.8 Hz, 1H).
工程2
 化合物P(6.0 g, 11 mmol)にメタノール(54 mL)と2 mol/L水酸化ナトリウム水溶液(42 mL)を加えて、60 ℃で2時間攪拌した。反応混合物を減圧濃縮し、4 mol/L塩酸でpHを6.8に調整後、析出した結晶を濾過して、3,5-ジアリルオキシ-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸(化合物R)(4.4 g, 75%)を得た。
1H-NMR (acetone-d6):1.12 (t, J = 7.5 Hz, 3H), 2.53 (t, J = 4.7 Hz, 4H), 2.69 (q, J = 7.5 Hz, 2H), 2.76 (t, J = 5.9 Hz, 2H), 3.58 (s, 2H), 3.58 (t, J = 4.7 Hz, 4H), 3.81 (s, 3H), 4.18 (t, J = 5.9 Hz, 2H), 4.47 (dt, J = 4.8, 1.7 Hz, 2H), 4.68 (dt, J = 5.0, 1.7 Hz, 2H), 5.00 (dq, J = 10.5, 1.7 Hz, 1H), 5.04 (dq, J = 17.1, 1.7 Hz, 1H), 5.28 (dq, J = 10.5, 1.7 Hz, 1H), 5.48 (dq, J = 17.1, 1.7 Hz, 1H), 5.71 (ddt, J = 17.1, 10.5, 4.8 Hz, 1H), 6.14 (ddt, J = 17.1, 10.5, 5.0 Hz, 1H), 6.72 (s, 1H), 6.96 (d, J = 8.3 Hz, 1H), 7.30 (dd, J = 8.3, 2.1 Hz, 1H), 7.44 (d, J = 2.1 Hz, 1H).
Process 2
Methanol (54 mL) and 2 mol / L aqueous sodium hydroxide solution (42 mL) were added to compound P (6.0 g, 11 mmol), and the mixture was stirred at 60 ° C. for 2 hr. The reaction mixture was concentrated under reduced pressure, the pH was adjusted to 6.8 with 4 mol / L hydrochloric acid, and the precipitated crystals were filtered to give 3,5-diallyloxy-2-ethyl-6- [3-methoxy-4- (2 -Morpholin-4-ylethoxy) benzoyl] phenylacetic acid (Compound R) (4.4 g, 75%) was obtained.
1 H-NMR (acetone-d 6 ): 1.12 (t, J = 7.5 Hz, 3H), 2.53 (t, J = 4.7 Hz, 4H), 2.69 (q, J = 7.5 Hz, 2H), 2.76 (t , J = 5.9 Hz, 2H), 3.58 (s, 2H), 3.58 (t, J = 4.7 Hz, 4H), 3.81 (s, 3H), 4.18 (t, J = 5.9 Hz, 2H), 4.47 (dt , J = 4.8, 1.7 Hz, 2H), 4.68 (dt, J = 5.0, 1.7 Hz, 2H), 5.00 (dq, J = 10.5, 1.7 Hz, 1H), 5.04 (dq, J = 17.1, 1.7 Hz, 1H), 5.28 (dq, J = 10.5, 1.7 Hz, 1H), 5.48 (dq, J = 17.1, 1.7 Hz, 1H), 5.71 (ddt, J = 17.1, 10.5, 4.8 Hz, 1H), 6.14 (ddt , J = 17.1, 10.5, 5.0 Hz, 1H), 6.72 (s, 1H), 6.96 (d, J = 8.3 Hz, 1H), 7.30 (dd, J = 8.3, 2.1 Hz, 1H), 7.44 (d, J = 2.1 Hz, 1H).
工程3
 化合物R(100 mg, 0.19 mmol)にTHF(1 mL)、1,1’-ジカルボニルジイミダゾール(0.036 mL, 0.24 mmol)、1-ヒドロキシベンゾトリアゾール1水和物(31 mg, 0.20 mmol)、N-(3-ジメチルアミノプロピル)-N-エチルカルボジイミド塩酸塩(39.1 mg, 0.20 mmol)を加え、20 ℃で8時間攪拌した。反応混合物に酢酸エチル(15 mL)と水(15 mL)を加えて、分液した。有機層を飽和食塩水で洗浄し、硫酸ナトリウムで乾燥した後、減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(クロロホルム/メタノール=100/0~97/3)で精製し、2-{3,5-ジアリルオキシ-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド(化合物S)(111 mg, 92%)を得た。
1H-NMR (CDCl3):1.09 (t, J = 7.4 Hz, 3H), 2.53-2.66 (m, 6H), 2.85 (t, J = 6.0 Hz, 2H), 3.15 (s, 3H), 3.19 (t, J = 5.6 Hz, 2H), 3.29 (s, 3H), 3.34 (t, J = 5.6 Hz, 2H), 3.35-3.48 (m, 4H), 3.72 (t, J = 4.5 Hz, 4H), 3.77 (s, 2H), 3.88 (s, 3H), 4.18 (t, J = 6.0 Hz, 2H), 4.36 (dt, J = 4.8, 1.7 Hz, 2H), 4.55 (dt, J = 4.8, 1.7 Hz, 2H), 5.07-4.97 (m, 2H), 5.28 (dq, J = 10.2, 1.7 Hz, 1H), 5.44 (dq, J = 17.4, 1.7 Hz, 1H), 5.69 (ddt, J = 17.4, 10.2, 4.8 Hz, 1H), 6.07 (ddt, J = 17.4, 10.2, 4.8 Hz, 1H), 6.40 (s, 1H), 6.80 (d, J = 8.6 Hz, 1H), 7.39 (dd, J = 8.6, 1.8 Hz, 1H), 7.53 (d, J = 1.8 Hz, 1H).
Process 3
Compound R (100 mg, 0.19 mmol) to THF (1 mL), 1,1'-dicarbonyldiimidazole (0.036 mL, 0.24 mmol), 1-hydroxybenzotriazole monohydrate (31 mg, 0.20 mmol), N- (3-dimethylaminopropyl) -N-ethylcarbodiimide hydrochloride (39.1 mg, 0.20 mmol) was added, and the mixture was stirred at 20 ° C. for 8 hr. Ethyl acetate (15 mL) and water (15 mL) were added to the reaction mixture, and the phases were separated. The organic layer was washed with saturated brine, dried over sodium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (chloroform / methanol = 100/0 to 97/3) to give 2- {3,5-diallyloxy-2-ethyl-6- [3-methoxy-4- (2-morpholine). -4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) acetamide (Compound S) (111 mg, 92%) was obtained.
1 H-NMR (CDCl 3 ): 1.09 (t, J = 7.4 Hz, 3H), 2.53-2.66 (m, 6H), 2.85 (t, J = 6.0 Hz, 2H), 3.15 (s, 3H), 3.19 (t, J = 5.6 Hz, 2H), 3.29 (s, 3H), 3.34 (t, J = 5.6 Hz, 2H), 3.35-3.48 (m, 4H), 3.72 (t, J = 4.5 Hz, 4H) , 3.77 (s, 2H), 3.88 (s, 3H), 4.18 (t, J = 6.0 Hz, 2H), 4.36 (dt, J = 4.8, 1.7 Hz, 2H), 4.55 (dt, J = 4.8, 1.7 Hz, 2H), 5.07-4.97 (m, 2H), 5.28 (dq, J = 10.2, 1.7 Hz, 1H), 5.44 (dq, J = 17.4, 1.7 Hz, 1H), 5.69 (ddt, J = 17.4, 10.2, 4.8 Hz, 1H), 6.07 (ddt, J = 17.4, 10.2, 4.8 Hz, 1H), 6.40 (s, 1H), 6.80 (d, J = 8.6 Hz, 1H), 7.39 (dd, J = 8.6 , 1.8 Hz, 1H), 7.53 (d, J = 1.8 Hz, 1H).
工程4
 化合物S(2.6 g, 4.0 mmol)に1,4-ジオキサン(44 mL)、ギ酸アンモニウム(1.0 g, 16 mmol)、ビス(トリフェニルホスフィン)パラジウム(II)ジクロリド(0.15 g, 0.21 mmol)を加えて2時間加熱還流した。反応混合物を25 ℃まで冷却した後、酢酸エチル(25 mL)、メタノール(25 mL)、活性炭(0.15 g)を加え、25 ℃で2時間攪拌した。反応混合物をセライト濾過し、濾液を減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(酢酸エチル/メタノール=100/0~80/20)で精製した後、酢酸エチルで結晶化して2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド(化合物E)(2.1 g, 94%)を得た。
1H-NMR (DMSO-d6): 0.99 (t, J = 7.4 Hz, 3H), 2.37 (q, J = 7.4 Hz, 2H), 2.45-2.50 (m, 4H), 2.70 (t, J = 5.8 Hz, 2H), 3.04 (t, J = 6.1 Hz, 2H), 3.07 (s, 3H), 3.19 (s, 3H), 3.22 (t, J= 6.1 Hz, 2H), 3.31 (t, J = 5.3 Hz, 2H), 3.38 (t, J = 5.3 Hz, 2H), 3.51 (s, 2H), 3.57 (t, J = 4.6 Hz, 4H), 3.76 (s, 3H), 4.13 (t, J = 5.8 Hz, 2H), 6.34 (s, 1H), 6.99 (d, J = 8.4 Hz, 1H), 7.24 (dd, J = 8.4, 1.9 Hz, 1H), 7.35 (d, J = 1.9 Hz, 1H), 9.05 (br s, 1H), 9.34 (br s, 1H).
Process 4
Add 1,4-dioxane (44 mL), ammonium formate (1.0 g, 16 mmol), bis (triphenylphosphine) palladium (II) dichloride (0.15 g, 0.21 mmol) to compound S (2.6 g, 4.0 mmol) And refluxed for 2 hours. The reaction mixture was cooled to 25 ° C., ethyl acetate (25 mL), methanol (25 mL), activated carbon (0.15 g) were added, and the mixture was stirred at 25 ° C. for 2 hr. The reaction mixture was filtered through celite, and the filtrate was concentrated under reduced pressure. The residue was purified by silica gel column chromatography (ethyl acetate / methanol = 100 / 0-80 / 20), crystallized with ethyl acetate and 2- {2-ethyl-3,5-dihydroxy-6- [3-methoxy -4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) acetamide (Compound E) (2.1 g, 94%) was obtained.
1 H-NMR (DMSO-d 6 ): 0.99 (t, J = 7.4 Hz, 3H), 2.37 (q, J = 7.4 Hz, 2H), 2.45-2.50 (m, 4H), 2.70 (t, J = 5.8 Hz, 2H), 3.04 (t, J = 6.1 Hz, 2H), 3.07 (s, 3H), 3.19 (s, 3H), 3.22 (t, J = 6.1 Hz, 2H), 3.31 (t, J = 5.3 Hz, 2H), 3.38 (t, J = 5.3 Hz, 2H), 3.51 (s, 2H), 3.57 (t, J = 4.6 Hz, 4H), 3.76 (s, 3H), 4.13 (t, J = 5.8 Hz, 2H), 6.34 (s, 1H), 6.99 (d, J = 8.4 Hz, 1H), 7.24 (dd, J = 8.4, 1.9 Hz, 1H), 7.35 (d, J = 1.9 Hz, 1H) , 9.05 (br s, 1H), 9.34 (br s, 1H).
 上記の比較例1はヒドロキシをアリルで保護したベンゼン誘導体を用いたフリーデル-クラフツ反応を鍵工程とする2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミド(化合物E)の製造法を示したものである。一方、実施例1はヒドロキシを3,4-ジクロロベンジルで保護したベンゼン誘導体を用いたフリーデル-クラフツ反応であり、実施例2は実施例1で得られたベンゾフェノン誘導体からの化合物Eの製造法を示したものである。なお、ここでは実施例1及び2の製造法を発明法、比較例1の製造法を従来法と呼ぶこととする。 The above Comparative Example 1 is a 2- {2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- () having a Friedel-Crafts reaction using a benzene derivative in which hydroxy is protected with allyl as a key step. 2 shows a method for producing 2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) acetamide (Compound E). On the other hand, Example 1 is a Friedel-Crafts reaction using a benzene derivative in which hydroxy is protected with 3,4-dichlorobenzyl, and Example 2 is a method for producing Compound E from the benzophenone derivative obtained in Example 1. Is shown. Here, the production methods of Examples 1 and 2 are referred to as invention methods, and the production method of Comparative Example 1 is referred to as a conventional method.
 発明法及び従来法における、フリーデル-クラフツ反応から化合物Eを得る工程までの総収率を比較すると、発明法では70%であるのに対し、従来法は56%であった。従って、収率の点で発明法は従来法よりも優れた製造法と言える。
 また、それぞれの製造法における、各中間体及び化合物Eの精製法を比べてみると、従来法では3回シリカゲルカラムクロマトグラフィーを用いているのに対し、発明法ではシリカゲルカラムクロマトグラフィーを用いず、全て結晶化により目的化合物を得ている。工業的な大量合成を志向した場合、カラムクロマトグラフィーに比べて結晶化の方が操作性、コスト等の面で有利である。また、発明法では全ての中間体が結晶として得られるのに対し、従来法ではいくつかの中間体は油状物質として得られるが、操作性、物性等の点で、一般に結晶の方が有利な点が多い。従って、精製法、中間体の物性の点で発明法は従来法よりも優れた方法と言える。
Comparing the total yield from the Friedel-Crafts reaction to the step of obtaining compound E in the inventive method and the conventional method, it was 70% in the inventive method, and 56% in the conventional method. Therefore, it can be said that the invention method is superior to the conventional method in terms of yield.
In addition, when comparing the purification methods of each intermediate and compound E in each production method, the conventional method uses silica gel column chromatography three times, whereas the invention method does not use silica gel column chromatography. All obtained the target compound by crystallization. In the case of industrial mass synthesis, crystallization is more advantageous in terms of operability and cost than column chromatography. In addition, in the method of the invention, all intermediates are obtained as crystals, whereas in the conventional method, some intermediates are obtained as oily substances, but crystals are generally more advantageous in terms of operability and physical properties. There are many points. Therefore, the invention method can be said to be superior to the conventional method in terms of the purification method and the physical properties of the intermediate.
 一方、ヒドロキシの保護基の脱保護において、従来法ではビス(トリフェニルホスフィン)パラジウム(II)ジクロリドを用い、発明法ではPd/Cを用いている。一般にビス(トリフェニルホスフィン)パラジウム(II)ジクロリド等の均一系触媒は除去が困難であり、Pd/C等の不均一系触媒は除去が容易であることが知られている。一方、医薬の活性成分となる化合物の合成では不純物の混入について厳しい基準が設けられている。そのため、除去が難しい均一系触媒を用いる従来法と比べ、除去が容易な不均一系触媒を用いる発明法は医薬の活性成分の製造法として優れていると考えられる。 On the other hand, in the deprotection of the hydroxy protecting group, bis (triphenylphosphine) palladium (II) dichloride is used in the conventional method, and Pd / C is used in the invention method. In general, it is known that a homogeneous catalyst such as bis (triphenylphosphine) palladium (II) dichloride is difficult to remove, and a heterogeneous catalyst such as Pd / C is easy to remove. On the other hand, in the synthesis of a compound that is an active ingredient of a medicine, strict standards are set for contamination of impurities. Therefore, compared with the conventional method using a homogeneous catalyst that is difficult to remove, the invention method using a heterogeneous catalyst that is easy to remove is considered to be superior as a method for producing a pharmaceutical active ingredient.
比較例2:ベンジル体のフリーデル-クラフツ反応
 化合物A(1.4 g, 4.5 mmol)と2-(3,5-ジベンジルオキシ-2-エチルフェニル)酢酸メチル(化合物U)(1.0 g, 2.6 mmol)にトリフルオロ酢酸(10 mL)と無水トリフルオロ酢酸(3.6 mL, 26 mmol)を加えて0 ℃で30分攪拌した。反応混合物を、酢酸エチル(100 mL)と水(100 mL)の混合溶媒に滴下した後、6 mol/L 水酸化ナトリウム水溶液でpHを7.0に調整し、分液した。有機層を飽和食塩水で洗浄後、硫酸ナトリウムで乾燥し、減圧濃縮した。残渣をシリカゲルカラムクロマトグラフィー(クロロホルム/メタノール=100/0~20/1)にて精製し、3,5-ジベンジルオキシ-2-エチル-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル酢酸メチル(化合物T)(1.3 g, 68%)を得た。
1H-NMR (CDCl3):1.11 (t, J = 7.5 Hz, 3H), 2.59 (t, J = 4.7 Hz, 4H), 2.67 (q, J = 7.5 Hz, 2H), 2.86 (t, J = 6.0 Hz, 2H), 3.48 (s, 3H), 3.66 (s, 2H), 3.73 (t, J = 4.7 Hz, 4H), 3.88 (s, 3H), 4.20 (t, J = 6.0 Hz, 2H), 4.88 (s, 2H), 5.06 (s, 2H), 6.51 (s, 1H), 6.83 (d, J = 8.4 Hz, 1H), 6.92-7.00 (m, 2H), 7.17-7.23 (m, 2H), 7.31 (dd, J = 8.4, 2.1 Hz, 1H), 7.45-7.33 (m, 6H), 7.53 (d, J = 2.1 Hz, 1H).
Comparative Example 2: Friedel-Crafts reaction of benzyl compound Compound A (1.4 g, 4.5 mmol) and methyl 2- (3,5-dibenzyloxy-2-ethylphenyl) acetate (Compound U) (1.0 g, 2.6 mmol) ) Was added trifluoroacetic acid (10 mL) and trifluoroacetic anhydride (3.6 mL, 26 mmol), and the mixture was stirred at 0 ° C. for 30 minutes. The reaction mixture was added dropwise to a mixed solvent of ethyl acetate (100 mL) and water (100 mL), and the pH was adjusted to 7.0 with a 6 mol / L aqueous sodium hydroxide solution, followed by liquid separation. The organic layer was washed with saturated brine, dried over sodium sulfate, and concentrated under reduced pressure. The residue was purified by silica gel column chromatography (chloroform / methanol = 100/0 to 20/1), and 3,5-dibenzyloxy-2-ethyl-6- [3-methoxy-4- (2-morpholine- Methyl 4-ylethoxy) benzoyl] phenylacetate (Compound T) (1.3 g, 68%) was obtained.
1 H-NMR (CDCl 3 ): 1.11 (t, J = 7.5 Hz, 3H), 2.59 (t, J = 4.7 Hz, 4H), 2.67 (q, J = 7.5 Hz, 2H), 2.86 (t, J = 6.0 Hz, 2H), 3.48 (s, 3H), 3.66 (s, 2H), 3.73 (t, J = 4.7 Hz, 4H), 3.88 (s, 3H), 4.20 (t, J = 6.0 Hz, 2H ), 4.88 (s, 2H), 5.06 (s, 2H), 6.51 (s, 1H), 6.83 (d, J = 8.4 Hz, 1H), 6.92-7.00 (m, 2H), 7.17-7.23 (m, 2H), 7.31 (dd, J = 8.4, 2.1 Hz, 1H), 7.45-7.33 (m, 6H), 7.53 (d, J = 2.1 Hz, 1H).
 上記の通り、本反応の収率(68%)は、前記の実施例1、3及び4の収率(それぞれ93%、83%及び92%)と比較して低いものであった。これらの結果から、ヒドロキシがハロベンジルで保護されたジヒドロキシベンゼンを用いる本発明のベンゾフェノン誘導体の製造法が、ヒドロキシがベンジルで保護されたジヒドロキシベンゼンを用いる方法に比べて、収率の面で優れていることが示唆された。 As described above, the yield of this reaction (68%) was lower than the yields of Examples 1, 3 and 4 (93%, 83% and 92%, respectively). From these results, the production method of the benzophenone derivative of the present invention using dihydroxybenzene in which hydroxy is protected with halobenzyl is superior in yield compared to the method using dihydroxybenzene in which hydroxy is protected with benzyl. It has been suggested.
 本発明により、抗腫瘍活性等を有するベンゾフェノン誘導体の合成中間体の製造法等が提供される。 The present invention provides a method for producing a synthetic intermediate of a benzophenone derivative having antitumor activity and the like.

Claims (31)

  1. 式(I)
    Figure JPOXMLDOC01-appb-C000001
    (式中、R1a及びR1bは同一または異なって1~3のハロゲンで置換されたベンジルを表し、該ハロゲンが2または3である場合、それぞれのハロゲンは同一でも異なっていてもよく、
    R2は置換基を有していてもよい低級アルキルを表し、
    R3は置換基を有していてもよい低級アルコキシカルボニルを表す)で表される化合物またはその塩、及び式(II)
    Figure JPOXMLDOC01-appb-C000002
    (式中、R4は置換基を有していてもよい低級アルキルを表し、
    R5は置換基を有していてもよい脂肪族複素環アルキルを表す)で表される化合物またはその塩を、酸の存在下、反応させることを特徴とする、式(III)
    Figure JPOXMLDOC01-appb-C000003
    (式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)で表されるベンゾフェノン誘導体またはその塩の製造法。
    Formula (I)
    Figure JPOXMLDOC01-appb-C000001
    (Wherein R 1a and R 1b represent the same or different benzyl substituted with 1 to 3 halogens, and when the halogen is 2 or 3, each halogen may be the same or different,
    R 2 represents optionally substituted lower alkyl,
    R 3 represents a lower alkoxycarbonyl which may have a substituent) or a salt thereof, and formula (II)
    Figure JPOXMLDOC01-appb-C000002
    (In the formula, R 4 represents a lower alkyl which may have a substituent,
    Wherein R 5 represents an optionally substituted aliphatic heterocyclic alkyl) or a salt thereof in the presence of an acid, the compound represented by formula (III)
    Figure JPOXMLDOC01-appb-C000003
    (Wherein R 1a , R 1b , R 2 , R 3 , R 4, and R 5 are as defined above), or a salt thereof.
  2. R1a及びR1bがジクロロベンジルである請求項1記載のベンゾフェノン誘導体またはその塩の製造法。 2. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 1a and R 1b are dichlorobenzyl.
  3. R1a及びR1bが3,4-ジクロロベンジルである請求項1記載のベンゾフェノン誘導体またはその塩の製造法。 2. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 1a and R 1b are 3,4-dichlorobenzyl.
  4. R2が低級アルキルである請求項1~3のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 4. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 2 is lower alkyl.
  5. R2がエチルである請求項1~3のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 1 to 3, wherein R 2 is ethyl.
  6. R3が低級アルコキシカルボニルである請求項1~5のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 6. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 3 is lower alkoxycarbonyl.
  7. R3がメトキシカルボニルである請求項1~5のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 6. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 3 is methoxycarbonyl.
  8. R4が低級アルキルである請求項1~7のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 8. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 4 is lower alkyl.
  9. R4がメチルである請求項1~7のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 1 to 7, wherein R 4 is methyl.
  10. R5が脂肪族複素環アルキルである請求項1~9のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 10. The process for producing a benzophenone derivative or a salt thereof according to claim 1, wherein R 5 is an aliphatic heterocyclic alkyl.
  11. R5が、2位が脂肪族複素環基で置換されたエチルである請求項1~9のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 10. The process for producing a benzophenone derivative or a salt thereof according to any one of claims 1 to 9, wherein R 5 is ethyl substituted at the 2-position with an aliphatic heterocyclic group.
  12. R5が2-モルホリノエチルである請求項1~9のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 10. The process for producing a benzophenone derivative or a salt thereof according to any one of claims 1 to 9, wherein R 5 is 2-morpholinoethyl.
  13. 酸がトリフルオロ酢酸である請求項1~12のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The process for producing a benzophenone derivative or a salt thereof according to any one of claims 1 to 12, wherein the acid is trifluoroacetic acid.
  14. 式(I)
    Figure JPOXMLDOC01-appb-C000004
    (式中、R1a、R1b、R2及びR3はそれぞれ前記と同義である)で表される化合物またはその塩、及び式(II)
    Figure JPOXMLDOC01-appb-C000005
    (式中、R4及びR5はそれぞれ前記と同義である)で表される化合物またはその塩を、酸の存在下、反応させ、式(III)
    Figure JPOXMLDOC01-appb-C000006
    (式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)で表されるベンゾフェノン誘導体またはその塩を得る工程を含むことを特徴とする、式(IV)
    Figure JPOXMLDOC01-appb-C000007
    (式中、R2、R4及びR5はそれぞれ前記と同義であり、
    R6は置換基を有していてもよいN-低級アルキルアミノカルボニルまたは置換基を有していてもよいN,N-ジ低級アルキルアミノカルボニルを表す)で表されるベンゾフェノン誘導体またはその塩の製造法。
    Formula (I)
    Figure JPOXMLDOC01-appb-C000004
    Wherein R 1a , R 1b , R 2 and R 3 are as defined above, or a salt thereof, and formula (II)
    Figure JPOXMLDOC01-appb-C000005
    (Wherein R 4 and R 5 are as defined above) or a salt thereof, in the presence of an acid, to react,
    Figure JPOXMLDOC01-appb-C000006
    Wherein R 1a , R 1b , R 2 , R 3 , R 4 and R 5 are as defined above, respectively, and a step of obtaining a salt thereof. (IV)
    Figure JPOXMLDOC01-appb-C000007
    Wherein R 2 , R 4 and R 5 are as defined above,
    R 6 represents an optionally substituted N-lower alkylaminocarbonyl or an optionally substituted N, N-dilower alkylaminocarbonyl)) or a salt thereof. Manufacturing method.
  15. R1a及びR1bがジクロロベンジルである請求項14記載のベンゾフェノン誘導体またはその塩の製造法。 15. The process for producing a benzophenone derivative or a salt thereof according to claim 14, wherein R 1a and R 1b are dichlorobenzyl.
  16. R1a及びR1bが3,4-ジクロロベンジルである請求項14記載のベンゾフェノン誘導体またはその塩の製造法。 15. The process for producing a benzophenone derivative or a salt thereof according to claim 14, wherein R 1a and R 1b are 3,4-dichlorobenzyl.
  17. R2が低級アルキルである請求項14~16記載のベンゾフェノン誘導体またはその塩の製造法。 17. The process for producing a benzophenone derivative or a salt thereof according to claim 14, wherein R 2 is lower alkyl.
  18. R2がエチルである請求項14~16記載のベンゾフェノン誘導体またはその塩の製造法。 17. The process for producing a benzophenone derivative or a salt thereof according to claim 14, wherein R 2 is ethyl.
  19. R3が低級アルコキシカルボニルである請求項14~18のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 18, wherein R 3 is lower alkoxycarbonyl.
  20. R3がメトキシカルボニルである請求項14~18のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 18, wherein R 3 is methoxycarbonyl.
  21. R4が低級アルキルである請求項14~20のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 20, wherein R 4 is lower alkyl.
  22. R4がメチルである請求項14~20のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 20, wherein R 4 is methyl.
  23. R5が脂肪族複素環アルキルである請求項14~22のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 22, wherein R 5 is an aliphatic heterocyclic alkyl.
  24. R5が、2位が脂肪族複素環基で置換されたエチルである請求項14~22のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 22, wherein R 5 is ethyl substituted at the 2-position with an aliphatic heterocyclic group.
  25. R5が2-モルホリノエチルである請求項14~22のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The process for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 22, wherein R 5 is 2-morpholinoethyl.
  26. R6がN,N-ビス(2-メトキシエチル)アミノカルボニルである請求項14~25のいずれかに記載のベンゾフェノン誘導体またはその塩の製造法。 The method for producing a benzophenone derivative or a salt thereof according to any one of claims 14 to 25, wherein R 6 is N, N-bis (2-methoxyethyl) aminocarbonyl.
  27. 式(IV)で表されるベンゾフェノン誘導体が
    Figure JPOXMLDOC01-appb-C000008
    で表される2-{2-エチル-3,5-ジヒドロキシ-6-[3-メトキシ-4-(2-モルホリン-4-イルエトキシ)ベンゾイル]フェニル}-N,N-ビス(2-メトキシエチル)アセトアミドである、請求項14記載のベンゾフェノン誘導体またはその塩の製造法。
    The benzophenone derivative represented by the formula (IV) is
    Figure JPOXMLDOC01-appb-C000008
    2- {2-ethyl-3,5-dihydroxy-6- [3-methoxy-4- (2-morpholin-4-ylethoxy) benzoyl] phenyl} -N, N-bis (2-methoxyethyl) 15. The method for producing a benzophenone derivative or a salt thereof according to claim 14, which is acetamide.
  28. 式(I)
    Figure JPOXMLDOC01-appb-C000009
    (式中、R1a及びR1bは同一または異なって1~3のハロゲンで置換されたベンジルを表し、該ハロゲンが2または3である場合、それぞれのハロゲンは同一でも異なっていてもよく、
    R2は置換基を有していてもよい低級アルキルを表し、
    R3は置換基を有していてもよい低級アルコキシカルボニルを表す)で表される化合物またはその塩。
    Formula (I)
    Figure JPOXMLDOC01-appb-C000009
    (Wherein R 1a and R 1b represent the same or different benzyl substituted with 1 to 3 halogens, and when the halogen is 2 or 3, each halogen may be the same or different,
    R 2 represents optionally substituted lower alkyl,
    R 3 represents a lower alkoxycarbonyl which may have a substituent, or a salt thereof.
  29. R1a及びR1bが3,4-ジクロロベンジルであり、R2がエチルであり、R3がメトキシカルボニルである請求項28記載の化合物またはその塩。 29. The compound or a salt thereof according to claim 28, wherein R 1a and R 1b are 3,4-dichlorobenzyl, R 2 is ethyl, and R 3 is methoxycarbonyl.
  30. 式(III)
    Figure JPOXMLDOC01-appb-C000010
    (式中、R1a、R1b、R2、R3、R4及びR5はそれぞれ前記と同義である)で表されるベンゾフェノン誘導体またはその塩。
    Formula (III)
    Figure JPOXMLDOC01-appb-C000010
    (Wherein R 1a , R 1b , R 2 , R 3 , R 4 and R 5 are as defined above) or a salt thereof.
  31. R1a及びR1bが3,4-ジクロロベンジルであり、R2がエチルであり、R3がメトキシカルボニルであり、R4がメチルであり、R5が2-モルホリノエチルである請求項30記載のベンゾフェノン誘導体またはその塩。 The R 1a and R 1b are 3,4-dichlorobenzyl, R 2 is ethyl, R 3 is methoxycarbonyl, R 4 is methyl, and R 5 is 2-morpholinoethyl. A benzophenone derivative or a salt thereof.
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Citations (1)

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Publication number Priority date Publication date Assignee Title
WO2005000778A1 (en) * 2003-06-27 2005-01-06 Kyowa Hakko Kogyo Co., Ltd. Hsp90 FAMILY PROTEIN INHIBITORS

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Publication number Priority date Publication date Assignee Title
WO2005000778A1 (en) * 2003-06-27 2005-01-06 Kyowa Hakko Kogyo Co., Ltd. Hsp90 FAMILY PROTEIN INHIBITORS

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