WO2012128481A3 - 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법 - Google Patents

원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법 Download PDF

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Publication number
WO2012128481A3
WO2012128481A3 PCT/KR2012/001467 KR2012001467W WO2012128481A3 WO 2012128481 A3 WO2012128481 A3 WO 2012128481A3 KR 2012001467 W KR2012001467 W KR 2012001467W WO 2012128481 A3 WO2012128481 A3 WO 2012128481A3
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WO
WIPO (PCT)
Prior art keywords
pattern
mold
exposure process
cylindrical mold
duplicating
Prior art date
Application number
PCT/KR2012/001467
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English (en)
French (fr)
Other versions
WO2012128481A2 (ko
Inventor
신명동
김유성
허지원
정상효
Original Assignee
(주)뉴옵틱스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)뉴옵틱스 filed Critical (주)뉴옵틱스
Publication of WO2012128481A2 publication Critical patent/WO2012128481A2/ko
Publication of WO2012128481A3 publication Critical patent/WO2012128481A3/ko

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/18—Coating curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

본 발명은 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법에 관한 것으로, 보다 자세하게는 원통 금형에 패턴을 복제함에 있어서, 패턴이 생성된 원통 금형을 이용하여 대칭 패턴 또는 동일 패턴을 생성하는 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법에 관한 것이다. 본 발명의 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법은 원본 금형의 패턴에 잉크를 도포하는 제 1단계와 감광제가 균일하게 도포된 복제 금형에 상기 원본 금형의 패턴에 도포된 잉크가 인쇄되어 패턴을 생성하는 제 2단계와 상기 복제 금형을 UV 노광 및 현상하는 제 3단계와 및 상기 복제 금형을 식각하는 제 4단계를 포함함에 기술적 특징이 있다.
PCT/KR2012/001467 2011-03-22 2012-02-27 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법 WO2012128481A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110025351A KR101389270B1 (ko) 2011-03-22 2011-03-22 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법
KR10-2011-0025351 2011-03-22

Publications (2)

Publication Number Publication Date
WO2012128481A2 WO2012128481A2 (ko) 2012-09-27
WO2012128481A3 true WO2012128481A3 (ko) 2012-12-27

Family

ID=46879844

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/001467 WO2012128481A2 (ko) 2011-03-22 2012-02-27 원통 금형에 노광 공정을 이용하여 패턴을 복제하는 방법

Country Status (2)

Country Link
KR (1) KR101389270B1 (ko)
WO (1) WO2012128481A2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101658955B1 (ko) * 2014-09-05 2016-09-30 한국기계연구원 롤제판 제작방법
KR101658956B1 (ko) * 2014-09-05 2016-09-23 한국기계연구원 필름 마스크를 이용한 롤제판 제작방법

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030013988A (ko) * 2001-08-10 2003-02-15 주식회사 알티즌 인쇄 형판 제작 시스템 및 그 제조방법
KR20050114968A (ko) * 2004-06-02 2005-12-07 엘지.필립스 엘시디 주식회사 패턴형성을 위한 인쇄장치 및 이를 이용한 패턴형성방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005246712A (ja) * 2004-03-03 2005-09-15 Hitachi Chem Co Ltd レジストパターン形成法、電子部品の製造方法、および電子部品

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030013988A (ko) * 2001-08-10 2003-02-15 주식회사 알티즌 인쇄 형판 제작 시스템 및 그 제조방법
KR20050114968A (ko) * 2004-06-02 2005-12-07 엘지.필립스 엘시디 주식회사 패턴형성을 위한 인쇄장치 및 이를 이용한 패턴형성방법

Also Published As

Publication number Publication date
KR20120107695A (ko) 2012-10-04
WO2012128481A2 (ko) 2012-09-27
KR101389270B1 (ko) 2014-04-30

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