WO2012091154A1 - Method of producing a hydrolyzable silicon-containing compound - Google Patents
Method of producing a hydrolyzable silicon-containing compound Download PDFInfo
- Publication number
- WO2012091154A1 WO2012091154A1 PCT/JP2011/080569 JP2011080569W WO2012091154A1 WO 2012091154 A1 WO2012091154 A1 WO 2012091154A1 JP 2011080569 W JP2011080569 W JP 2011080569W WO 2012091154 A1 WO2012091154 A1 WO 2012091154A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chloride
- reaction
- group
- iii
- production method
- Prior art date
Links
- 239000002210 silicon-based material Substances 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims description 13
- 150000001875 compounds Chemical class 0.000 claims abstract description 29
- 239000011968 lewis acid catalyst Substances 0.000 claims abstract description 29
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract description 14
- 125000003710 aryl alkyl group Chemical group 0.000 claims abstract description 13
- 125000002252 acyl group Chemical group 0.000 claims abstract description 11
- 229910052801 chlorine Chemical group 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 239000000460 chlorine Chemical group 0.000 claims abstract description 7
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical group [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims abstract description 6
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 6
- 125000001246 bromo group Chemical group Br* 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims description 50
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 claims description 45
- JHXKRIRFYBPWGE-UHFFFAOYSA-K bismuth chloride Chemical compound Cl[Bi](Cl)Cl JHXKRIRFYBPWGE-UHFFFAOYSA-K 0.000 claims description 35
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 29
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 18
- 239000005046 Chlorosilane Substances 0.000 claims description 17
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 17
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 15
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 15
- NUMQCACRALPSHD-UHFFFAOYSA-N tert-butyl ethyl ether Chemical compound CCOC(C)(C)C NUMQCACRALPSHD-UHFFFAOYSA-N 0.000 claims description 12
- 150000001266 acyl halides Chemical class 0.000 claims description 11
- 229910000039 hydrogen halide Inorganic materials 0.000 claims description 11
- 239000012433 hydrogen halide Substances 0.000 claims description 11
- 150000002148 esters Chemical class 0.000 claims description 10
- 239000002841 Lewis acid Substances 0.000 claims description 9
- 150000007517 lewis acids Chemical class 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- BTHCBXJLLCHNMS-UHFFFAOYSA-N acetyloxysilicon Chemical compound CC(=O)O[Si] BTHCBXJLLCHNMS-UHFFFAOYSA-N 0.000 claims description 8
- CXKCTMHTOKXKQT-UHFFFAOYSA-N cadmium oxide Inorganic materials [Cd]=O CXKCTMHTOKXKQT-UHFFFAOYSA-N 0.000 claims description 7
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 claims description 7
- WMOVHXAZOJBABW-UHFFFAOYSA-N tert-butyl acetate Chemical group CC(=O)OC(C)(C)C WMOVHXAZOJBABW-UHFFFAOYSA-N 0.000 claims description 7
- IBNWKIKUJJNBKG-UHFFFAOYSA-N [methoxy(phenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(OC)C1=CC=CC=C1 IBNWKIKUJJNBKG-UHFFFAOYSA-N 0.000 claims description 6
- QBKMWJRMLACRJD-UHFFFAOYSA-N benzhydryl acetate Chemical compound C=1C=CC=CC=1C(OC(=O)C)C1=CC=CC=C1 QBKMWJRMLACRJD-UHFFFAOYSA-N 0.000 claims description 5
- 229910001507 metal halide Inorganic materials 0.000 claims description 5
- 150000005309 metal halides Chemical class 0.000 claims description 5
- RBCYCMNKVQPXDR-UHFFFAOYSA-N phenoxysilane Chemical compound [SiH3]OC1=CC=CC=C1 RBCYCMNKVQPXDR-UHFFFAOYSA-N 0.000 claims description 5
- JKNHZOAONLKYQL-UHFFFAOYSA-K tribromoindigane Chemical compound Br[In](Br)Br JKNHZOAONLKYQL-UHFFFAOYSA-K 0.000 claims description 5
- 229910021575 Iron(II) bromide Inorganic materials 0.000 claims description 4
- 229910021577 Iron(II) chloride Inorganic materials 0.000 claims description 4
- 229910021576 Iron(III) bromide Inorganic materials 0.000 claims description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 4
- IRMNIXXVOOMKKP-UHFFFAOYSA-N [methoxy(diphenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(OC)C1=CC=CC=C1 IRMNIXXVOOMKKP-UHFFFAOYSA-N 0.000 claims description 4
- UPWPDUACHOATKO-UHFFFAOYSA-K gallium trichloride Chemical compound Cl[Ga](Cl)Cl UPWPDUACHOATKO-UHFFFAOYSA-K 0.000 claims description 4
- SRVXDMYFQIODQI-UHFFFAOYSA-K gallium(iii) bromide Chemical compound Br[Ga](Br)Br SRVXDMYFQIODQI-UHFFFAOYSA-K 0.000 claims description 4
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 claims description 4
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 claims description 4
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 claims description 4
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 claims description 4
- 229910000359 iron(II) sulfate Inorganic materials 0.000 claims description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 4
- 229910000360 iron(III) sulfate Inorganic materials 0.000 claims description 4
- GYCHYNMREWYSKH-UHFFFAOYSA-L iron(ii) bromide Chemical compound [Fe+2].[Br-].[Br-] GYCHYNMREWYSKH-UHFFFAOYSA-L 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 claims description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 4
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 4
- FEONEKOZSGPOFN-UHFFFAOYSA-K tribromoiron Chemical compound Br[Fe](Br)Br FEONEKOZSGPOFN-UHFFFAOYSA-K 0.000 claims description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims 1
- CFEAAQFZALKQPA-UHFFFAOYSA-N cadmium(2+);oxygen(2-) Chemical compound [O-2].[Cd+2] CFEAAQFZALKQPA-UHFFFAOYSA-N 0.000 claims 1
- 229910000423 chromium oxide Inorganic materials 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 description 127
- 239000000243 solution Substances 0.000 description 29
- 239000000047 product Substances 0.000 description 26
- -1 polysiloxane Polymers 0.000 description 20
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 15
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- WFDIJRYMOXRFFG-UHFFFAOYSA-N acetic acid anhydride Natural products CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 14
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 14
- 239000005054 phenyltrichlorosilane Substances 0.000 description 14
- 239000007858 starting material Substances 0.000 description 14
- 238000003756 stirring Methods 0.000 description 14
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 14
- 239000007795 chemical reaction product Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 13
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 12
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 11
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 238000006467 substitution reaction Methods 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- 238000005481 NMR spectroscopy Methods 0.000 description 9
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 description 9
- 239000012346 acetyl chloride Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 8
- 230000035484 reaction time Effects 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 150000001721 carbon Chemical group 0.000 description 7
- YUYHCACQLHNZLS-UHFFFAOYSA-N dichloro-cyclohexyl-methylsilane Chemical compound C[Si](Cl)(Cl)C1CCCCC1 YUYHCACQLHNZLS-UHFFFAOYSA-N 0.000 description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 7
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 6
- 239000005051 trimethylchlorosilane Substances 0.000 description 6
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 6
- VQPFDLRNOCQMSN-UHFFFAOYSA-N bromosilane Chemical compound Br[SiH3] VQPFDLRNOCQMSN-UHFFFAOYSA-N 0.000 description 5
- 239000006227 byproduct Substances 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 5
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 235000009518 sodium iodide Nutrition 0.000 description 4
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 125000001309 chloro group Chemical group Cl* 0.000 description 3
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000009776 industrial production Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- GQKZBCPTCWJTAS-UHFFFAOYSA-N methoxymethylbenzene Chemical compound COCC1=CC=CC=C1 GQKZBCPTCWJTAS-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 239000005052 trichlorosilane Substances 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- DOGMJCPBZJUYGB-UHFFFAOYSA-N 3-trichlorosilylpropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](Cl)(Cl)Cl DOGMJCPBZJUYGB-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000005215 alkyl ethers Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000010923 batch production Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000004566 building material Substances 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000003776 cleavage reaction Methods 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000004035 construction material Substances 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 230000009849 deactivation Effects 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- 239000005055 methyl trichlorosilane Substances 0.000 description 2
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 2
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 2
- BKIMMITUMNQMOS-UHFFFAOYSA-N nonane Chemical compound CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 2
- 150000001367 organochlorosilanes Chemical class 0.000 description 2
- UPWOEMHINGJHOB-UHFFFAOYSA-N oxo(oxocobaltiooxy)cobalt Chemical compound O=[Co]O[Co]=O UPWOEMHINGJHOB-UHFFFAOYSA-N 0.000 description 2
- BOTNYLSAWDQNEX-UHFFFAOYSA-N phenoxymethylbenzene Chemical compound C=1C=CC=CC=1COC1=CC=CC=C1 BOTNYLSAWDQNEX-UHFFFAOYSA-N 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 230000007017 scission Effects 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- OOXSLJBUMMHDKW-UHFFFAOYSA-N trichloro(3-chloropropyl)silane Chemical compound ClCCC[Si](Cl)(Cl)Cl OOXSLJBUMMHDKW-UHFFFAOYSA-N 0.000 description 2
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 2
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 2
- QHUNJMXHQHHWQP-UHFFFAOYSA-N trimethylsilyl acetate Chemical compound CC(=O)O[Si](C)(C)C QHUNJMXHQHHWQP-UHFFFAOYSA-N 0.000 description 2
- 239000005050 vinyl trichlorosilane Substances 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical group ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- HIYKRAYZGHOHIV-UHFFFAOYSA-N 1-chloropropyl(trimethoxy)silane Chemical compound CCC(Cl)[Si](OC)(OC)OC HIYKRAYZGHOHIV-UHFFFAOYSA-N 0.000 description 1
- LAAOKLJBELVTBX-UHFFFAOYSA-N 2,2,4-trimethyl-4-propoxypentane Chemical compound CCCOC(C)(C)CC(C)(C)C LAAOKLJBELVTBX-UHFFFAOYSA-N 0.000 description 1
- YQTCQNIPQMJNTI-UHFFFAOYSA-N 2,2-dimethylpropan-1-one Chemical group CC(C)(C)[C]=O YQTCQNIPQMJNTI-UHFFFAOYSA-N 0.000 description 1
- OLSBOPIDNCSUNL-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-yl acetate Chemical compound CC(=O)OC(C)(C)CC(C)(C)C OLSBOPIDNCSUNL-UHFFFAOYSA-N 0.000 description 1
- KNUMYYOFJYPTGT-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-yl formate Chemical compound CC(C)(C)CC(C)(C)OC=O KNUMYYOFJYPTGT-UHFFFAOYSA-N 0.000 description 1
- UWBUDRXEXZBQNC-UHFFFAOYSA-N 2,4,4-trimethylpentan-2-yl propanoate Chemical compound CCC(=O)OC(C)(C)CC(C)(C)C UWBUDRXEXZBQNC-UHFFFAOYSA-N 0.000 description 1
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- ZBIZLXMISNHYIG-UHFFFAOYSA-N 2-methylpentan-2-yl acetate Chemical compound CCCC(C)(C)OC(C)=O ZBIZLXMISNHYIG-UHFFFAOYSA-N 0.000 description 1
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- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
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- GCIARMDXQWNVJF-UHFFFAOYSA-N 3-trichlorosilylpropan-1-amine Chemical compound NCCC[Si](Cl)(Cl)Cl GCIARMDXQWNVJF-UHFFFAOYSA-N 0.000 description 1
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- 238000004587 chromatography analysis Methods 0.000 description 1
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- 230000008025 crystallization Effects 0.000 description 1
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- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 1
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- SWLVAJXQIOKFSJ-UHFFFAOYSA-N dimethyl(diphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](C)(C)OC1=CC=CC=C1 SWLVAJXQIOKFSJ-UHFFFAOYSA-N 0.000 description 1
- YLDKQPMORVEBRU-UHFFFAOYSA-N diphenoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OC1=CC=CC=C1 YLDKQPMORVEBRU-UHFFFAOYSA-N 0.000 description 1
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- SCPWMSBAGXEGPW-UHFFFAOYSA-N dodecyl(trimethoxy)silane Chemical compound CCCCCCCCCCCC[Si](OC)(OC)OC SCPWMSBAGXEGPW-UHFFFAOYSA-N 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
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- FEHYCIQPPPQNMI-UHFFFAOYSA-N ethenyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C=C)OC1=CC=CC=C1 FEHYCIQPPPQNMI-UHFFFAOYSA-N 0.000 description 1
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 1
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
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- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
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- 238000002955 isolation Methods 0.000 description 1
- 125000000400 lauroyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HWSZZLVAJGOAAY-UHFFFAOYSA-L lead(II) chloride Chemical compound Cl[Pb]Cl HWSZZLVAJGOAAY-UHFFFAOYSA-L 0.000 description 1
- 150000007527 lewis bases Chemical class 0.000 description 1
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- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- BKXVGDZNDSIUAI-UHFFFAOYSA-N methoxy(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OC)C1=CC=CC=C1 BKXVGDZNDSIUAI-UHFFFAOYSA-N 0.000 description 1
- RWIQTBQZDRRGFN-UHFFFAOYSA-N methoxy-tris(3,3,3-trifluoropropyl)silane Chemical compound FC(F)(F)CC[Si](OC)(CCC(F)(F)F)CCC(F)(F)F RWIQTBQZDRRGFN-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- DRXHEPWCWBIQFJ-UHFFFAOYSA-N methyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 DRXHEPWCWBIQFJ-UHFFFAOYSA-N 0.000 description 1
- RRDYHYHEKLMERV-UHFFFAOYSA-N methyl-diphenoxy-phenylsilane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(C)OC1=CC=CC=C1 RRDYHYHEKLMERV-UHFFFAOYSA-N 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
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- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
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- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 125000001312 palmitoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000010517 secondary reaction Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 150000004819 silanols Chemical class 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 125000003696 stearoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- HVZJRWJGKQPSFL-UHFFFAOYSA-N tert-Amyl methyl ether Chemical compound CCC(C)(C)OC HVZJRWJGKQPSFL-UHFFFAOYSA-N 0.000 description 1
- WJXKWIFHRZWPET-UHFFFAOYSA-N tert-butyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC(C)(C)C WJXKWIFHRZWPET-UHFFFAOYSA-N 0.000 description 1
- RUPAXCPQAAOIPB-UHFFFAOYSA-N tert-butyl formate Chemical compound CC(C)(C)OC=O RUPAXCPQAAOIPB-UHFFFAOYSA-N 0.000 description 1
- JAELLLITIZHOGQ-UHFFFAOYSA-N tert-butyl propanoate Chemical compound CCC(=O)OC(C)(C)C JAELLLITIZHOGQ-UHFFFAOYSA-N 0.000 description 1
- HXLWJGIPGJFBEZ-UHFFFAOYSA-N tert-butyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(C)(C)C HXLWJGIPGJFBEZ-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000005377 tertiary alkyl halides Chemical class 0.000 description 1
- IEXRMSFAVATTJX-UHFFFAOYSA-N tetrachlorogermane Chemical compound Cl[Ge](Cl)(Cl)Cl IEXRMSFAVATTJX-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- BNCXNUWGWUZTCN-UHFFFAOYSA-N trichloro(dodecyl)silane Chemical compound CCCCCCCCCCCC[Si](Cl)(Cl)Cl BNCXNUWGWUZTCN-UHFFFAOYSA-N 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- IEKWPPTXWFKANS-UHFFFAOYSA-K trichlorocobalt Chemical compound Cl[Co](Cl)Cl IEKWPPTXWFKANS-UHFFFAOYSA-K 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- IXJNGXCZSCHDFE-UHFFFAOYSA-N triphenoxy(phenyl)silane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 IXJNGXCZSCHDFE-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
Definitions
- the present invention relates to a method of producing a hydrolyzable silicon-containing compound.
- the present invention also relates to a hydrolyzable silicon-containing compound that is produced by this method and that substantially does not contain a hydrogen halide or an acyl halide.
- Priority is claimed on Japanese Patent Application No. 2010-292639, filed on December 28, 2010, the content of which is incorporated herein by reference.
- an organooxysilane can be produced by reacting an alcohol or acetic acid or acetic anhydride with a chlorosilane.
- the production of an acetoxysilane by the reaction of acetic acid and acetic anhydride with a chlorosilane is described in JP 2000-063390 A.
- Patent Reference 4 German patent application DE 19670906 (DE 1298972 B)
- the hydrogen chloride released during the reaction reacts with the starting materials and product to produce unwanted by-products, which then creates the problem of a reduction in product yield.
- the released hydrogen chloride reacts with the alcohol to produce the chloride and water.
- a substantial amount of the alcohol is lost to this reaction.
- the water produced in this secondary reaction hydrolyzes the chlorosilane or the organooxysilane, resulting in the production of unwanted polysiloxane and the production of much more hydrogen chloride.
- the hydrogen chloride reacts, either by itself or in combination with the alcohol, with other functional groups that may be present in the chlorosilane.
- iodotrimethylsilane In the case of the production method that uses iodotrimethylsilane as a starting material, iodotrimethylsilane is very reactive with light and moisture and is readily decomposed by atmospheric humidity with the production of toxic and irritating hydrogen iodide, and thus its handling is highly problematic and the utilization of this method as a large-scale industrial production method is a problematic proposition.
- the reactions using sodium iodide large amounts of sodium iodide are consumed by the reaction when the chlorosilane is converted by the sodium iodide and an iodinated hydrocarbon is also produced. As a result, large amounts of waste materials are produced and the environment burden is therefore substantial.
- the present invention was accomplished in view of the state of the prior art as described above.
- An object of the present invention is therefore to provide a safe, inexpensive, and high yield means of producing a hydrolyzable silicon-containing compound, e.g., an organooxysilane and so forth.
- the object of the present invention is achieved by a method of producing a hydrolyzable silicon-containing compound by reacting (A) a compound represented by the general formula
- R 1 represents a C4 -30 , substituted or unsubstituted, tertiary alkyl group or aralkyl group and R 2 represents a Q.30, substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, with (B) a halosilane represented by the general formula
- R 3 independently represents the hydrogen atom or a d.30 substituted or unsubstituted monovalent hydrocarbyl group
- X is independently bromine or chlorine
- m represents an integer in the presence of a Lewis acid catalyst.
- the Lewis acid catalyst can be a metal-containing Lewis acid.
- metal-containing Lewis acid there are no particular limitations on the type of metal-containing Lewis acid as long as it can promote the above-described reaction, but it is preferably at least one Lewis acid selected from the group consisting of metal halides, metal oxides, and metal sulfate salts.
- Specific examples are at least one Lewis acid selected from the group consisting of gallium(III) chloride, gallium(III) bromide, indium(III) chloride, indium(ffl) bromide, bismuth(III) chloride, aluminum(IH) chloride, iron(II) chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, nickel(II) chloride, cadmium(II) oxide, chromium(III) oxide, molybdenum(VI) oxide, iron(III) oxide, iron(II) sulfate, and iron(III) sulfate.
- At least one Lewis acid selected from bismuth(III) chloride, aluminum(III) chloride, and iron(III) chloride is particularly preferred.
- Compound (A) can be an ether.
- This ether is preferably at least one ether selected from methyl tert-butyl ether, ethyl tert-butyl ether, methyl diphenylmethyl ether, and methyl
- Compound (A) can also be an ester.
- This ester is preferably tert-butyl acetate or
- the halosilane (B) is a chlorosilane or a bromosilane wherein a chlorosilane is particularly preferred. It can specifically be a monochlorosilane, dichlorosilane, trichlorosilane, or
- tetrachlorosilane and may be either an organochlorosilane, which has an organic group bonded to the silicon atom, or a hydrochlorosilane, which has a hydrogen atom bonded to the silicon atom.
- the aforementioned hydrolyzable silicon-containing compound is preferably an
- the hydrolyzable silicon-containing compound produced by the above-described production method substantially does not contain a hydrogen halide or an acyl halide.
- the production method of the present invention uses a relatively easy-to-handle chlorosilane or bromosilane as a starting material and can efficiently produce a hydrolyzable silicon-containing compound in excellent yields.
- the production method of the present invention can be carried out safely and at low cost because it exhibits a high reaction selectivity and because a tertiary alkyl halide or an aralkyl halide is substantially the only by-product.
- the amount of neutralizing agent— which has been used in conventional production methods for the purpose of bringing the reaction to completion— can be reduced. Accordingly, the production method of the present invention is useful as an industrial production method for the large-scale synthesis of hydrolyzable silicon-containing compounds.
- the hydrolyzable silicon-containing compound yielded by the production method of the present invention substantially does not contain a reactive hydrogen halide or acyl halide, and a deactivation treatment for this hydrogen halide or acyl halide is therefore unnecessary. Accordingly, this hydrolyzable silicon-containing compound is advantageous, for example, as a starting material for silicones for solar cell applications and semiconductor applications, and as a starting material for various products used, for example, as construction and building materials, such as sealants and so forth.
- Figure 1 is a 13 C- MR chart of the reaction product in Practical Example 1;
- Figure 2 is a 13 C-NMR chart of the reaction product in Practical Example 9;
- Figure 3 is a 13 C-NMR chart of the reaction product in Comparative Example 1;
- Figure 4 is a 29 Si-NMR chart that compares the reaction product from Practical Example 9 with the reaction product from Comparative Example 1 ;
- Figure 5 is a I3 C-NMR chart of the reaction product in Practical Example 11 ;
- Figure 6 is a 13 C-NMR chart of the reaction product in Practical Example 14;
- Figure 7 is a 13 C-NMR chart of the reaction product in Practical Example 15;
- Figure 8 is a 13 C-NMR chart of the reaction product in Practical Example 16.
- Figure 9 is a 13 C-NMR chart of the reaction product in Practical Example 17. Description of the Invention
- the production method of the present invention produces a hydrolyzable silicon-containing compound by reacting
- R 1 represents a C4 -30 , substituted or unsubstituted, tertiary alkyl group or aralkyl group and R 2 represents a Ci -30 , substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, and (B) a halosilane represented by the general formula
- R 3 independently represents the hydrogen atom or a Cj -3 o substituted or unsubstituted monovalent hydrocarbyl group
- X is independently bromine or chlorine
- m represents an integer from 0 to 3
- R 1 in the general formula given above for compound (A) is a tertiary alkyl group or an aralkyl group. Since cleavage of the R 1 ⁇ bond produces a very stable cation when this tertiary alkyl group or aralkyl group is present, the hydrolyzable silicon-containing compound can be obtained in high yields in the reaction according to the present invention.
- This tertiary alkyl group encompassed by R 1 has a total of 4 to 30 carbons and contains at least one tertiary carbon atom, but is not otherwise particularly limited, and branched-chain alkyl groups and cyclic alkyl groups are preferred examples.
- tertiary alkyl groups such as the tert-butyl group, tert-pentyl group, tert-hexyl group, and tert-octyl group and cycloalkyl groups such as the 1-methylcyclopentyl group and 1-methylcyclohexyl group.
- the carbon atom bonded to the oxygen atom in the general formula given above is preferably a tertiary carbon atom, and the tert-butyl group is particularly preferred.
- the aralkyl group is preferably a secondary or tertiary aralkyl group from the standpoint of the reactivity and particularly preferably has a secondary carbon atom with at least one phenyl group bonded to the carbon atom.
- the aralkyl group preferably has a secondary or tertiary carbon atom with at least two phenyl groups bonded to the carbon atom.
- Such a secondary or tertiary aralkyl group is preferably the diphenylmethyl group (H(C 6 H 5 ) 2 C-) or triphenylmethyl group ((C 6 H 5 ) 3 C-).
- the hydrogen in the alkyl group or aralkyl group may be at least partially replaced by halogen, e.g., fluorine, and particularly by chlorine.
- R 2 in the general formula given above for compound (A) is a monovalent hydrocarbyl group or acyl group that has a total of 1 to 30 carbons, but is not otherwise particularly limited.
- the monovalent hydrocarbyl group having a total of 1 to 30 carbon atoms can be exemplified by Ci.3 0 straight-chain and branched-chain alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, dodecyl, myristyl, palmityl, stearyl, isostearyl, and behenyl; C 3-2 o cycloalkyl groups such as cyclopentyl and cyclohexyl; C 2-30 alkenyl groups such as vinyl, allyl, and butenyl; C 6-30 aryl groups such as phenyl, tolyl, xyly
- acyl group having a total of 1 to 30 carbons can be exemplified by aliphatic
- monocarboxylic acid-type acyl groups such as formyl, acetyl, propionyl, butyryl, valeryl, pivaloyl, lauroyl, myristoyl, palmitoyl, and stearoyl, and by aromatic ring-containing acyl groups such as benzoyl and cinnamoyl.
- Aliphatic monocarboxylic acid-type acyl groups are preferred, and the acetyl group is more preferred.
- the carbon-bonded hydrogen in these groups may be at least partially replaced by, for example, halogen, e.g., fluorine, but the absence of substitution is preferred.
- halogen e.g., fluorine
- R 2 is particularly preferably a primary alkyl group, secondary alkyl group, aryl group, or acyl group.
- An ether or ester can thus be favorably used as compound (A).
- the ether can be exemplified by methyl tert-butyl ether, ethyl tert-butyl ether, propyl tert-butyl ether, methyl tert-pentyl ether, ethyl tert-pentyl ether, propyl tert-pentyl ether, methyl tert-hexyl ether, ethyl tert-hexyl ether, propyl tert-hexyl ether, methyl tert-octyl ether, ethyl tert-octyl ether, propyl tert-octyl ether, methyl diphenylmethyl ether (HiCeHs C-O-CHi), methyl triphenylmethyl ether ((C 6 H 5 ) 3 C-0-CH 3 ), benzyl
- Methyl tert-butyl ether, ethyl tert-butyl ether, methyl diphenylmethyl ether, and methyl triphenylmethyl ether are particularly preferred.
- the ester can be exemplified by tert-butyl formate, tert-butyl acetate, tert-butyl propionate, tert-pentyl formate, tert- pentyl acetate, tert-pentyl propionate, tert-hexyl formate, tert-hexyl acetate, tert-hexyl propionate, tert-octyl formate, tert-octyl acetate, tert-octyl propionate, tert-butyl laurate, and diphenylmethyl acetate.
- tert-Butyl acetate and diphenylmethyl acetate are particularly preferred. Two or
- Component (B) is a halosilane represented by the general formula
- R 3 independently represents the hydrogen atom or a Ci -3 o substituted or unsubstituted monovalent hydrocarbyl group
- X is independently bromine or chlorine
- m represents an integer from 0 to 3.
- the monovalent hydrocarbyl group here is as already described, and the hydrogen bonded to the carbon in the monovalent hydrocarbyl present in the halosilane may be at least partially replaced by halogen, e.g., fluorine, or by an organic group containing, e.g., an acyl group, carboxyl group, amino group, methacryloxy group, acryloxy group, ureido group, polysulfide group, mercapto group, isocyanate group, and so forth.
- the halosilane (B) is preferably a chlorosilane wherein X is chlorine, and may be either an organochlorosilane, which has an organic group bonded to the silicon atom, or a hydrochlorosilane, which has a hydrogen atom bonded to the silicon atom.
- the halosilane (B) can be exemplified by dichlorosilane (H 2 SiCl 2 ), trichlorosilane (HSiCl 3 ), tetrachlorosilane, methyldichlorosilane, dimethylmonochlorosilane ((CH 3 ) 2 HSiCl), dimethyldichlorosilane, trimethylchlorosilane, ethyldichlorosilane, vinyltrichlorosilane, methylvinyldichlorosilane, phenyldichlorosilane, phenyltrichlorosilane, diphenyldichlorosilane, cyclohexylmethyldichlorosilane,
- halosilane (B) may also be a bromosilane wherein X is bromine.
- Species provided by the partial or complete replacement of the chlorine atom in the chlorosilanes listed above with the bromine atom may be used as the component (B) bromosilane without particular limitation.
- the amount of use of compound (A) and the amount of use of the halosilane (B) are not limited as long as a hydrolyzable silicon-containing compound is obtained; however, the compound (A)/halosilane (B) molar ratio can be, for example, in the range from 50 to 300% of stoichiometric equivalence. This molar ratio is preferably in the range from 0.75 to 2; is more preferably in the range from 0.95 to 1.3; and even more preferably is in the range from 1.1 to 1.3.
- Stoichiometric equivalence is defined as 1 mol of compound (A) per 1 mol of silicon-bonded halogen atom in the halosilane (B) added to the reaction system.
- the reaction between the compound (A) and the halosilane (B) is run in the presence of a Lewis acid catalyst.
- the type of Lewis acid catalyst is not limited as long as this reaction is promoted, but metal-containing Lewis acid catalysts are preferred.
- Metal-containing Lewis acid catalysts for the production method of the present invention can be exemplified by metal halides, metal oxides, and metal sulfate salts.
- the metal halides can be exemplified by lithium chloride, bismuth(III) chloride, aluminum(III) chloride, iron(II) chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, zinc(II) chloride, beryllium(H) chloride, antimony(III) chloride, antimony(V) chloride, boron chloride, cesium chloride, cobalt(II) chloride, cobalt(III) chloride, nickel(II) chloride, titanium(III) chloride, titanium(IV) chloride, tin(II) chloride, tin(IV) chloride, rhodium(III) chloride, cadmium(II) chloride, germanium(IV) chloride, gallium(III) chloride, gallium
- the metal oxides can be exemplified by beryllium(II) oxide, vanadium(V) oxide, chromium(III) oxide, iron(II) oxide, iron(III) oxide, cobalt(III) oxide, cadmium(II) oxide, and molybdenum(VI) oxide.
- the metal sulfate salt can be exemplified by iron(II) sulfate and iron(III) sulfate.
- gallium(III) chloride, gallium(III) bromide, indium(III) chloride, indium(III) bromide, bismuth(III) chloride, aluminum(III) chloride, iron(II) chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, nickel(II) chloride, cadmium(II) oxide, chromium(III) oxide, molybdenum(VI) oxide, iron(III) oxide, iron(II) sulfate, and iron(III) sulfate are favorable Lewis acid catalysts for the present invention, while the use of bismuth(III) chloride, aluminum(III) chloride, and iron(III) chloride is particularly preferred.
- the metal halide may be used in anhydrous form or as the hydrate; however, when water is present in the system, it can cause a hydrolysis reaction with the starting chlorosilane or bromosilane and the thereby produced silanol group can cause a polymerization reaction to occur, and for this reason the anhydrous form is preferred. At the same time, depending on the scale of the reaction, the water of crystallization may also have an almost negligible effect.
- the quantity of use for the Lewis acid catalyst is, for example, 0.0001 to 1.0 mol, preferably 0.05 to 0. 5 mol, more preferably 0.03 to 0.1 mol, and even more preferably 0.01 to 0.05 mol.
- the reaction may be slow and/or the reaction may come to a halt while still incomplete.
- too much Lewis acid catalyst there is a risk that the halosilane (B) may undergo undesirable reactions, such as cleavage of the Si-C bond.
- the reaction between compound (A) and the halosilane (B) can be carried out in a homogeneous system or a heterogeneous system depending on whether the Lewis acid catalyst dissolves in component (B).
- a Lewis acid catalyst is used that has a low solubility in component (B), such as bismuth chloride
- the reaction can be run by adding the Lewis acid catalyst to component (B) and then adding compound (A) and stirring.
- a residue originating from the catalyst in the system (this residue is a black tarry substance in the case of bismuth chloride) will precipitate to the bottom of the reaction mixture when the reaction is complete and as necessary can be separated from the reaction product by a known means, e.g., centrifugal separation.
- a Lewis acid catalyst that exhibits a high solubility in component (B), such as iron(III) chloride
- the reaction can be run by dissolving the catalyst in the halosilane (B) and then adding compound (A) and stirring.
- the reaction solution as a whole is transparent and homogeneous and the separation and precipitation of a catalyst-based residue upon the completion of the reaction does not occur; this offers the advantage making it possible to avoid problems such as the accumulation of this residue in the pipework of the facility and clogging of the pipework by this residue.
- the Lewis acid catalyst is readily soluble in compound (A)
- the catalyst may be dissolved in component (A) and the halosilane (B) may then be added.
- the temperature of this reaction is preferably from 0 to 150°C and, considered at one atmosphere, is more preferably 0 to 90°C and particularly preferably 20 to 40°C, while running the reaction at so-called room temperature (25°C) is particularly favorable.
- the reaction can also be accelerated by selecting elevated temperature conditions from 50 to 90°C. Even higher temperatures may of course be selected under pressurized conditions.
- the reaction temperature is too low, the reaction rate ends up being slow and long reaction times may then be required.
- the reaction temperature is too high, there is a risk that the hydrolyzable silicon-containing compound product may participate in undesirable reactions.
- the reaction time will vary with the reaction scale and reaction temperature, but is, for example, 10 minutes to 1 week and can preferably be from 1 to 40 hours.
- bismuth chloride or iron(III) chloride is used as the Lewis acid catalyst, from 4 to 36 hours at one atmosphere and room temperature (25°C) is preferred.
- This reaction is preferably run under an inert gas atmosphere, and the inert gas can be exemplified by nitrogen and argon.
- This reaction may be run under reduced pressure, at ambient pressure, or under an overpressure, but is preferably run at ambient pressure from the standpoint of the processability.
- the reaction between compound (A) and the halosilane (B) may be run in a solvent.
- the solvent used is preferably a solvent that does not react with compound (A) and/or the halosilane (B) and is preferably an inert solvent that is a liquid at ambient temperature and atmospheric pressure and has a boiling point no greater than 150°C.
- Such solvents can be exemplified by hydrocarbon solvents such as toluene, xylene, hexane, nonane, pentane, and octane; chlorinated hydrocarbon solvents such as carbon tetrachloride, methylene chloride, dichloroethane, dichloroethylene, 1,1,1- trichloroethane, trichloroethylene, perchloroethylene, and tetrachloroethane; and acetonitrile.
- hydrocarbon solvents such as toluene, xylene, hexane, nonane, pentane, and octane
- chlorinated hydrocarbon solvents such as carbon tetrachloride, methylene chloride, dichloroethane, dichloroethylene, 1,1,1- trichloroethane, trichloroethylene, perchloroethylene, and tetrachloroethane
- compound (A) and the halosilane (B) may be reacted and, after the reaction has reached equilibrium, it may be advanced while removing the hydrolyzable silicon-containing compound product from the reaction system by reducing the pressure within the system; the reaction may also be advanced still further while removing from the reaction system the halogenated hydrocarbon by-product originating with the tertiary alkyl group or the aralkyl group.
- the reaction selectivity is very high in this reaction since there is almost no production in this reaction of by-products other than the halogenated hydrocarbon.
- this reaction is safe since there is almost no secondary production in this reaction of a hydrogen halide such as hydrogen chloride, and the reaction can be run at lost costs because there is almost no requirement for the addition of a base, such as an amine, as a neutralizing agent for the hydrogen halide. Furthermore, since this reaction is almost entirely free of the production of a flammable ⁇ irritating acyl halide such as acetyl chloride, this reaction can be run safely and with a low environmental burden.
- a hydrogen halide such as hydrogen chloride
- a Lewis acid catalyst When a Lewis acid catalyst is used that has a low solubility in component (B), such as bismuth chloride, the catalyst resists transfer into the system and due to this is particularly useful as a supported-type catalyst in a batch process, which presupposes filtration, or in a continuous process.
- a Lewis acid catalyst that dissolves uniformly in component (B), such as iron(III) chloride, is useful in a batch process. After the reaction, a Lewis acid catalyst such as iron(III) chloride can as necessary be deactivated and easily isolated from the product by distillation.
- the solution is approximately neutral and as a consequence the obtained hydrolyzable silicon-containing compound can be directly recovered from the reaction solution by, for example, distillation.
- the hydrolyzable silicon-containing compound can also be recovered from the reaction system by adding a small amount of a compound that acts as a Lewis base in order to deactivate the Lewis acid catalyst remaining after the reaction between compound (A) and the halosilane (B), followed by, for example, distillation.
- the obtained hydrolyzable silicon-containing compound may also be used directly, without isolation, in an ensuing reaction.
- the hydrolyzable silicon-containing compound yielded by the production method of the present invention has at least one silicon-bonded hydrolyzable group, e.g., an alkoxy group, acetoxy group, phenoxy group, and so forth.
- the hydrolyzable silicon-containing compound is preferably an alkoxysilane, acetoxysilane, or phenoxysilane.
- the alkoxysilane can be exemplified by
- methoxysilane methoxytrimethylsilane, ethoxysilane, butoxysilane, dimethyldimethoxysilane, dimethylmethoxychlorosilane, trimethoxychlorosilane, trimethoxysilane, tetramethoxysilane, tert- butyltrimethoxysilane, isobutyltrimethoxysilane, isobutylmethoxysilane, octadecyltrimethoxysilane, dodecyltrimethoxysilane, cyclohexylmethyldimethoxysilane, triethoxysilane, vinyltrimethoxysilane, methylvinyldimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane,
- the acetoxysilane can be exemplified by vinyltriacetoxysilane, trimethylacetoxysilane, and so forth.
- the phenoxysilane can be exemplified by methyltriphenoxysilane, ethyltriphenoxysilane,
- the hydrolyzable silicon-containing compound yielded by the production method of the present invention substantially does not contain hydrogen halide or acyl halide.
- “substantially” means not more than 5% of the total mass (weight) of the hydrolyzable silicon-containing compound and preferably not more than 1%, more preferably not more than 0.1%, and even more preferably not more than 0.01% of the total mass (weight) of the hydrolyzable silicon-containing compound.
- the hydrolyzable silicon-containing compound yielded by the production method of the present invention may be used in an ensuing or follow-on process without having to carry out a deactivation treatment for hydrogen halide or acyl halide.
- the hydrolyzable silicon-containing compound yielded by the production method of the present invention contains no or almost no hydrogen halide or acyl halide and therefore inherently contains little impurity, but as necessary may be subjected to purification by a known method, e.g., distillation, chromatography, and so forth, in order to provide an even higher purity hydrolyzable silicon-containing compound.
- the hydrolyzable silicon-containing compound yielded by the production method of the present invention can be used in known applications.
- the alkoxysilane is useful as a silane coupling agent and as a starting material for the synthesis of a variety of organopolysiloxanes.
- alkoxysilane obtained using the production method of the present invention is useful as a starting material for silicones for solar cell and semiconductor applications, which are applications where high purity is required.
- acetoxysilane is useful as a silane coupling agent, silylating agent, crosslinking agent, and so forth; in particular, acetoxysilane obtained using the production method of the present invention is useful as a starting material for, e.g., sealants used for, e.g., construction and building materials.
- sealants used for, e.g., construction and building materials.
- the advantage accrues of obtaining a silane starting material that is favorable for application as a high-purity material and for application as an electronic material. Examples
- a magnetic stir bar was introduced into a 30-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 0.16 g (0.5 mmol) of bismuth chloride (BiCl 3 ) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 2.91 g (33 mmol) of methyl tert-butyl ether was then introduced into the flask using a syringe and the flask was placed in an ice bath (0°C).
- a magnetic stir bar was introduced into the 30-mL roundbottom flask provided with a two-way cock; 0.03 g (0.1 mmol) of bismuth chloride (BiCl 3 ) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 2.29 g (26 mmol) of methyl tert-butyl ether and 1.97 g (10 mmol) of cyclohexylmethyldichlorosilane were then introduced into the flask as in Practical Example 1 , after which the reaction was run as in Practical Example 1. The results are given in Table 1.
- a reaction was run as in Practical Example 1, but using trimethylchlorosilane in place of the phenyltrichlorosilane; using a trimethylchlorosilane : methyl tert-butyl ether in molar ratio of 1 : 1.3; and using a trimethylchlorosilane : bismuth chloride in molar ratio of 1 : 0.01.
- a magnetic stir bar was introduced into the 30-mL roundbottom flask provided with a two-way cock; 0.03 g (0.1 mmol) of bismuth chloride (B1CI3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out.
- a magnetic stir bar was introduced into a 30-mL roundbottom flask provided with a two-way cock and the flask was sealed with a septum and nitrogen substitution was then carried out.
- 0.70 g (22 mmol) of methanol and 1.97 g (10 mmol) of cyclohexylmethyldichlorosilane were then introduced into the flask as in Practical Example 1 , after which a reaction was run as in Practical Example 1.
- the reaction solution in Comparative Example 1 was a more viscous liquid than in the other, practical examples. The results are shown in Table 1.
- a magnetic stir bar was introduced into a 50-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 16 mg (0.1 mmol) of iron(III) chloride (FeCl 3 ) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 2.90 g (33 mmol) of methyl tert-butyl ether and 2.11 g (10 mmol) of phenyltrichlorosilane were then introduced into the flask as in Practical Example 1; the system was returned to room temperature (25°C); and a reaction was carried out overnight (15 hours) while stirring the solution using a magnetic stirrer.
- the iron(III) chloride-containing solution was uniform throughout and was a transparent, light yellow solution. Unlike the case of Practical Example 1, a residue or precipitate was not produced. A portion of the post-reaction solution was removed and measured by 29 Si-NMR, 13 C-NMR, and 1H-NMR and the product was identified from the measurement results, which confirmed that, as in Practical Example 1, PhSi(OMe) 3 had been produced. The results are given in Table 2.
- the hydrolyzable silicon-containing compound of the present invention could also be obtained when a metal salt acting as a Lewis acid catalyst other than bismuth chloride was used.
- the reaction was found to progress rapidly in a uniform reaction system when iron(III) chloride was used.
- a magnetic stir bar was introduced into a 100-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 0.24 g (0.75 mmol) of bismuth(III) chloride (BiCl 3 ) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out.
- a magnetic stir bar was introduced into a 30-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 32 mg (0.10 mmol) of bismuth(III) chloride (BiCl 3 ) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 4.03 g (33 mmol) of methyl benzyl ether and 2.11 g (10 mmol) of phenyltrichlorosilane were then introduced into the flask as in Practical Example 1; the system was heated to 80°C; a reaction was carried out overnight (15 hours) while stirring the solution using a magnetic stirrer; and the product yield was determined. The results are given in Table 2. The post-reaction solution had undergone a color change to black and the bismuth chloride had precipitated.
- the bismuth chloride had precipitated in the post-reaction solution. [0080] A portion of this post-reaction solution was removed and measured by Si-NMR, C-NMR, and 1H-NMR and the product was identified from the measurement results, which confirmed that
- Figure 3 The signal shapes are completely different from Figure 2 and the individual signals cannot be assigned.
- Figure 6 The signal shapes are about the same as in Figure 1 and the product is therefore the same.
- Figure 7 Signals for the unreacted starting materials are observed, but the signals agree with Figure 1 and Figure 6 and the same product can therefore be confirmed.
- Figure 9 Considering the signals other than those for the starting materials, the signal shapes are about the same as in Figure 1 and the product is therefore the same.
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Abstract
The present invention provides a safe, inexpensive, and high yield means of producing a hydrolyzable silicon-containing compound, e.g., an organooxysilane and the like. A compound (A) represented by the general formula R1-O-R2 wherein R1 represents a C4-30, substituted or unsubstituted, tertiary alkyl group or aralkyl group and R2 represents a C1-30, substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, is reacted in the presence of a Lewis acid catalyst with a halosilane (B) represented by the general formula R3
mSiX4-m wherein R3 represents the hydrogen atom or a C1-30 substituted or unsubstituted monovalent hydrocarbyl group, X is independently bromine or chlorine, and m represents an integer from 0 to 3.
Description
DESCRIPTION
METHOD OF PRODUCING A HYDROLYZABLE SILICON-CONTAINING COMPOUND Technical Field
[0001] The present invention relates to a method of producing a hydrolyzable silicon-containing compound. The present invention also relates to a hydrolyzable silicon-containing compound that is produced by this method and that substantially does not contain a hydrogen halide or an acyl halide. Priority is claimed on Japanese Patent Application No. 2010-292639, filed on December 28, 2010, the content of which is incorporated herein by reference.
Background Art
[0002] It is known that an organooxysilane can be produced by reacting an alcohol or acetic acid or acetic anhydride with a chlorosilane. For example, the production of an alkoxysilane by the reaction ≡Si-Cl + ROH = SiOR + HC1, wherein R is a monovalent hydrocarbyl group, is described in JP 08- 041077 A. The production of an acetoxysilane by the reaction of acetic acid and acetic anhydride with a chlorosilane is described in JP 2000-063390 A. The production of a diacetoxydialkoxysilane by the reaction of an alcohol and acetic anhydride with a chlorosilane is described in JP 10-168083 A. The preparation of trimethoxysilane by the direct reaction of trichlorosilane and methanol in xylene solvent is described in a German patent (DE 19670906). It has been reported, in J. Org.
Chem., Vol. 42, No. 23 (1977), that the reaction of iodotrimethylsilane with an alkyl ether at room temperature in the absence of a catalyst yields the trimethylsilylated alcohol corresponding to the alkyl ether. It has also been reported, in J. C. S. Chem. Commun.. pp. 874-875 (1978), that trimethylchlorosilane, sodium iodide, and, for example, an ester may be used to obtain a
trimethylsilylated reaction product corresponding to the ester etc.
[0003]
[Patent Reference 1] JP 08-041077 A
[Patent Reference 2] JP 2000-063390 A
[Patent Reference 3] JP 10-168083 A
[Patent Reference 4] German patent application DE 19670906 (DE 1298972 B)
[0004]
[Nonpatent Reference 1] J. Org. Chem.. Vol. 42, No. 23 (1977)
[Nonpatent Reference 2] J. C. S. Chem. Commun.. pp. 874-875 (1978)
Disclosure of Invention
Technical Problems to be Solved
[0005] However, in the case of the reaction of an alcohol and a chlorosilane to produce an organooxysilane, the hydrogen chloride released during the reaction reacts with the starting materials and product to produce unwanted by-products, which then creates the problem of a reduction in product yield. For example, the released hydrogen chloride reacts with the alcohol to produce the chloride and water. A substantial amount of the alcohol is lost to this reaction. In addition, the water produced in this secondary reaction hydrolyzes the chlorosilane or the organooxysilane, resulting in the production of unwanted polysiloxane and the production of much more hydrogen chloride. Moreover, the hydrogen chloride reacts, either by itself or in combination with the alcohol, with other functional groups that may be present in the chlorosilane. In particular, in the case of the production of a diorganodialkoxysilane or a triorganoalkoxysilane using the reaction of an alcohol and a chlorosilane to produce the organooxysilane, the result is that either the yield is drastically reduced or production does not occur at all.
[0006] These same problems also appear in the production of an organooxysilane by the reaction of acetic anhydride and a chlorosilane, and the acetyl chloride is flammable and irritating. In addition, since hydrogen chloride is again produced by the reaction of water and acetyl chloride, removal by a special treatment must be performed in order to ensure safety; also, this reaction is an exothermic
reaction with water and is very hazardous. The execution of this treatment makes the production of an organooxysilane by the above-described production reaction quite problematic and is also disadvantageous from the standpoint of production costs. In the case of the production method that uses iodotrimethylsilane as a starting material, iodotrimethylsilane is very reactive with light and moisture and is readily decomposed by atmospheric humidity with the production of toxic and irritating hydrogen iodide, and thus its handling is highly problematic and the utilization of this method as a large-scale industrial production method is a problematic proposition. Similarly, in the case of the reactions using sodium iodide, large amounts of sodium iodide are consumed by the reaction when the chlorosilane is converted by the sodium iodide and an iodinated hydrocarbon is also produced. As a result, large amounts of waste materials are produced and the environment burden is therefore substantial.
[0007] The present invention was accomplished in view of the state of the prior art as described above. An object of the present invention is therefore to provide a safe, inexpensive, and high yield means of producing a hydrolyzable silicon-containing compound, e.g., an organooxysilane and so forth.
Solution to Problems
[0008] The inventors accomplished the present invention as a result of intensive investigations directed to achieving the previously described object. Thus, the object of the present invention is achieved by a method of producing a hydrolyzable silicon-containing compound by reacting (A) a compound represented by the general formula
R -O-R2
wherein R1 represents a C4-30, substituted or unsubstituted, tertiary alkyl group or aralkyl group and R2 represents a Q.30, substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, with (B) a halosilane represented by the general formula
wherein R3 independently represents the hydrogen atom or a d.30 substituted or unsubstituted monovalent hydrocarbyl group, X is independently bromine or chlorine, and m represents an integer in the presence of a Lewis acid catalyst.
[0009] The Lewis acid catalyst can be a metal-containing Lewis acid. There are no particular limitations on the type of metal-containing Lewis acid as long as it can promote the above-described reaction, but it is preferably at least one Lewis acid selected from the group consisting of metal halides, metal oxides, and metal sulfate salts. Specific examples are at least one Lewis acid selected from the group consisting of gallium(III) chloride, gallium(III) bromide, indium(III) chloride, indium(ffl) bromide, bismuth(III) chloride, aluminum(IH) chloride, iron(II) chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, nickel(II) chloride, cadmium(II) oxide, chromium(III) oxide, molybdenum(VI) oxide, iron(III) oxide, iron(II) sulfate, and iron(III) sulfate. At least one Lewis acid selected from bismuth(III) chloride, aluminum(III) chloride, and iron(III) chloride is particularly preferred.
[0010] Compound (A) can be an ether. This ether is preferably at least one ether selected from methyl tert-butyl ether, ethyl tert-butyl ether, methyl diphenylmethyl ether, and methyl
triphenylmethyl ether.
[0011] Compound (A) can also be an ester. This ester is preferably tert-butyl acetate or
diphenylmethyl acetate.
[0012] The halosilane (B) is a chlorosilane or a bromosilane wherein a chlorosilane is particularly preferred. It can specifically be a monochlorosilane, dichlorosilane, trichlorosilane, or
tetrachlorosilane and may be either an organochlorosilane, which has an organic group bonded to the silicon atom, or a hydrochlorosilane, which has a hydrogen atom bonded to the silicon atom.
[0013] The aforementioned hydrolyzable silicon-containing compound is preferably an
alkoxysilane, a phenoxysilane, or an acetoxysilane.
[0014] The hydrolyzable silicon-containing compound produced by the above-described production method substantially does not contain a hydrogen halide or an acyl halide.
Advantageous Effects of Invention
[0015] The production method of the present invention uses a relatively easy-to-handle chlorosilane or bromosilane as a starting material and can efficiently produce a hydrolyzable silicon-containing compound in excellent yields. In addition, the production method of the present invention can be carried out safely and at low cost because it exhibits a high reaction selectivity and because a tertiary alkyl halide or an aralkyl halide is substantially the only by-product. In addition, the amount of neutralizing agent— which has been used in conventional production methods for the purpose of bringing the reaction to completion— can be reduced. Accordingly, the production method of the present invention is useful as an industrial production method for the large-scale synthesis of hydrolyzable silicon-containing compounds.
[0016] With regard to the use of an ether and particularly methyl tert-butyl ether, ethyl tert-butyl ether, methyl diphenylmethyl ether, or methyl triphenylmethyl ether as compound (A), these compounds exhibit a high stability and a high safety and are also inexpensive and for these reasons make it possible to carry out alkoxysilane production safely and at low cost.
[0017] When an ester and particularly tert-butyl acetate or diphenylmethyl acetate is used as compound (A), almost no secondary production of acetyl chloride occurs and its treatment is rendered unnecessary as a result. The acetoxysilane can thus be stably produced at low cost and this method is therefore particularly useful as an industrial production method.
[0018] The use of a Lewis acid catalyst— and particularly bismuth(III) chloride, aluminum(III) chloride, or iron(III) chloride— as the catalyst provides a low catalyst toxicity and a small environmental burden and for these reasons makes possible a favorable execution of the reaction.
[0019] The hydrolyzable silicon-containing compound yielded by the production method of the present invention substantially does not contain a reactive hydrogen halide or acyl halide, and a
deactivation treatment for this hydrogen halide or acyl halide is therefore unnecessary. Accordingly, this hydrolyzable silicon-containing compound is advantageous, for example, as a starting material for silicones for solar cell applications and semiconductor applications, and as a starting material for various products used, for example, as construction and building materials, such as sealants and so forth.
Brief Description of the Drawings
[0020]
Figure 1 is a 13C- MR chart of the reaction product in Practical Example 1;
Figure 2 is a 13C-NMR chart of the reaction product in Practical Example 9;
Figure 3 is a 13C-NMR chart of the reaction product in Comparative Example 1;
Figure 4 is a 29Si-NMR chart that compares the reaction product from Practical Example 9 with the reaction product from Comparative Example 1 ;
Figure 5 is a I3C-NMR chart of the reaction product in Practical Example 11 ;
Figure 6 is a 13C-NMR chart of the reaction product in Practical Example 14;
Figure 7 is a 13C-NMR chart of the reaction product in Practical Example 15;
Figure 8 is a 13C-NMR chart of the reaction product in Practical Example 16; and
Figure 9 is a 13C-NMR chart of the reaction product in Practical Example 17. Description of the Invention
[0021] The production method of the present invention produces a hydrolyzable silicon-containing compound by reacting
(A) a compound represented by the general formula
R'-O-R2
wherein R1 represents a C4-30, substituted or unsubstituted, tertiary alkyl group or aralkyl group and R2 represents a Ci-30, substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, and
(B) a halosilane represented by the general formula
R3 mSi 4_m
wherein R3 independently represents the hydrogen atom or a Cj-3o substituted or unsubstituted monovalent hydrocarbyl group, X is independently bromine or chlorine, and m represents an integer from 0 to 3,
in the presence of a Lewis acid catalyst.
[0022] R1 in the general formula given above for compound (A) is a tertiary alkyl group or an aralkyl group. Since cleavage of the R1^ bond produces a very stable cation when this tertiary alkyl group or aralkyl group is present, the hydrolyzable silicon-containing compound can be obtained in high yields in the reaction according to the present invention. This tertiary alkyl group encompassed by R1 has a total of 4 to 30 carbons and contains at least one tertiary carbon atom, but is not otherwise particularly limited, and branched-chain alkyl groups and cyclic alkyl groups are preferred examples. More specific examples are tertiary alkyl groups such as the tert-butyl group, tert-pentyl group, tert-hexyl group, and tert-octyl group and cycloalkyl groups such as the 1-methylcyclopentyl group and 1-methylcyclohexyl group. The carbon atom bonded to the oxygen atom in the general formula given above is preferably a tertiary carbon atom, and the tert-butyl group is particularly preferred. Similarly, the aralkyl group is preferably a secondary or tertiary aralkyl group from the standpoint of the reactivity and particularly preferably has a secondary carbon atom with at least one phenyl group bonded to the carbon atom. In a more favorable embodiment, the aralkyl group preferably has a secondary or tertiary carbon atom with at least two phenyl groups bonded to the carbon atom. Such a secondary or tertiary aralkyl group is preferably the diphenylmethyl group (H(C6H5)2C-) or triphenylmethyl group ((C6H5)3C-). The hydrogen in the alkyl group or aralkyl group may be at least partially replaced by halogen, e.g., fluorine, and particularly by chlorine.
[0023] R2 in the general formula given above for compound (A) is a monovalent hydrocarbyl group or acyl group that has a total of 1 to 30 carbons, but is not otherwise particularly limited.
[0024] The monovalent hydrocarbyl group having a total of 1 to 30 carbon atoms can be exemplified by Ci.30 straight-chain and branched-chain alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, decyl, dodecyl, myristyl, palmityl, stearyl, isostearyl, and behenyl; C3-2o cycloalkyl groups such as cyclopentyl and cyclohexyl; C2-30 alkenyl groups such as vinyl, allyl, and butenyl; C6-30 aryl groups such as phenyl, tolyl, xylyl, naphthyl, and styryl; and C7-30 aralkyl groups such as benzyl. Straight-chain Ci-6 alkyl groups and the phenyl group are preferred, while methyl, ethyl, and phenyl are more preferred.
[0025] The acyl group having a total of 1 to 30 carbons can be exemplified by aliphatic
monocarboxylic acid-type acyl groups such as formyl, acetyl, propionyl, butyryl, valeryl, pivaloyl, lauroyl, myristoyl, palmitoyl, and stearoyl, and by aromatic ring-containing acyl groups such as benzoyl and cinnamoyl. Aliphatic monocarboxylic acid-type acyl groups are preferred, and the acetyl group is more preferred.
[0026] The carbon-bonded hydrogen in these groups may be at least partially replaced by, for example, halogen, e.g., fluorine, but the absence of substitution is preferred.
[0027] R2 is particularly preferably a primary alkyl group, secondary alkyl group, aryl group, or acyl group.
[0028] An ether or ester can thus be favorably used as compound (A). The ether can be exemplified by methyl tert-butyl ether, ethyl tert-butyl ether, propyl tert-butyl ether, methyl tert-pentyl ether, ethyl tert-pentyl ether, propyl tert-pentyl ether, methyl tert-hexyl ether, ethyl tert-hexyl ether, propyl tert-hexyl ether, methyl tert-octyl ether, ethyl tert-octyl ether, propyl tert-octyl ether, methyl diphenylmethyl ether (HiCeHs C-O-CHi), methyl triphenylmethyl ether ((C6H5)3C-0-CH3), benzyl methyl ether, and benzyl phenyl ether. Methyl tert-butyl ether, ethyl tert-butyl ether, methyl diphenylmethyl ether, and methyl triphenylmethyl ether are particularly preferred. The ester can be exemplified by tert-butyl formate, tert-butyl acetate, tert-butyl propionate, tert-pentyl formate, tert- pentyl acetate, tert-pentyl propionate, tert-hexyl formate, tert-hexyl acetate, tert-hexyl propionate, tert-octyl formate, tert-octyl acetate, tert-octyl propionate, tert-butyl laurate, and diphenylmethyl
acetate. tert-Butyl acetate and diphenylmethyl acetate are particularly preferred. Two or more different selections from these ethers may be used in combination or two or more different selections from these esters may be used in combination.
[0029] Component (B) is a halosilane represented by the general formula
R3 mSiX4_m
wherein R3 independently represents the hydrogen atom or a Ci-3o substituted or unsubstituted monovalent hydrocarbyl group, X is independently bromine or chlorine, and m represents an integer from 0 to 3. The monovalent hydrocarbyl group here is as already described, and the hydrogen bonded to the carbon in the monovalent hydrocarbyl present in the halosilane may be at least partially replaced by halogen, e.g., fluorine, or by an organic group containing, e.g., an acyl group, carboxyl group, amino group, methacryloxy group, acryloxy group, ureido group, polysulfide group, mercapto group, isocyanate group, and so forth.
[0030] The halosilane (B) is preferably a chlorosilane wherein X is chlorine, and may be either an organochlorosilane, which has an organic group bonded to the silicon atom, or a hydrochlorosilane, which has a hydrogen atom bonded to the silicon atom. The halosilane (B) can be exemplified by dichlorosilane (H2SiCl2), trichlorosilane (HSiCl3), tetrachlorosilane, methyldichlorosilane, dimethylmonochlorosilane ((CH3)2HSiCl), dimethyldichlorosilane, trimethylchlorosilane, ethyldichlorosilane, vinyltrichlorosilane, methylvinyldichlorosilane, phenyldichlorosilane, phenyltrichlorosilane, diphenyldichlorosilane, cyclohexylmethyldichlorosilane,
(chloropropyl)trichlorosilane, bis(3,3,3-trifluoropropyl)dichlorosilane, tris(3,3,3- trifluoropropyl)chlorosilane, 3-methacryloxypropylmethyldichlorosilane, 3- methacryloxypropyltrichlorosilane, 3 -acryloxypropyltrichlorosilane, 3-aminopropyltri chlorosilane, 3-mercaptopropylmethyldichlorosilane, and 3-mercaptopropyltrichlorosilane. The halosilane (B) may also be a bromosilane wherein X is bromine. Species provided by the partial or complete replacement of the chlorine atom in the chlorosilanes listed above with the bromine atom may be used as the component (B) bromosilane without particular limitation.
[0031] The amount of use of compound (A) and the amount of use of the halosilane (B) are not limited as long as a hydrolyzable silicon-containing compound is obtained; however, the compound (A)/halosilane (B) molar ratio can be, for example, in the range from 50 to 300% of stoichiometric equivalence. This molar ratio is preferably in the range from 0.75 to 2; is more preferably in the range from 0.95 to 1.3; and even more preferably is in the range from 1.1 to 1.3. Stoichiometric equivalence is defined as 1 mol of compound (A) per 1 mol of silicon-bonded halogen atom in the halosilane (B) added to the reaction system.
[0032] The reaction between the compound (A) and the halosilane (B) is run in the presence of a Lewis acid catalyst. The type of Lewis acid catalyst is not limited as long as this reaction is promoted, but metal-containing Lewis acid catalysts are preferred.
[0033] Metal-containing Lewis acid catalysts for the production method of the present invention can be exemplified by metal halides, metal oxides, and metal sulfate salts. The metal halides can be exemplified by lithium chloride, bismuth(III) chloride, aluminum(III) chloride, iron(II) chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, zinc(II) chloride, beryllium(H) chloride, antimony(III) chloride, antimony(V) chloride, boron chloride, cesium chloride, cobalt(II) chloride, cobalt(III) chloride, nickel(II) chloride, titanium(III) chloride, titanium(IV) chloride, tin(II) chloride, tin(IV) chloride, rhodium(III) chloride, cadmium(II) chloride, germanium(IV) chloride, gallium(III) chloride, gallium(III) bromide, indium(III) chloride, indium(III) bromide, lead(II) chloride, manganese(II) chloride, and palladium(II) chloride. The metal oxides can be exemplified by beryllium(II) oxide, vanadium(V) oxide, chromium(III) oxide, iron(II) oxide, iron(III) oxide, cobalt(III) oxide, cadmium(II) oxide, and molybdenum(VI) oxide. The metal sulfate salt can be exemplified by iron(II) sulfate and iron(III) sulfate.
[0034] Among the preceding, gallium(III) chloride, gallium(III) bromide, indium(III) chloride, indium(III) bromide, bismuth(III) chloride, aluminum(III) chloride, iron(II) chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, nickel(II) chloride, cadmium(II) oxide, chromium(III) oxide, molybdenum(VI) oxide, iron(III) oxide, iron(II) sulfate, and iron(III) sulfate are favorable
Lewis acid catalysts for the present invention, while the use of bismuth(III) chloride, aluminum(III) chloride, and iron(III) chloride is particularly preferred. The metal halide may be used in anhydrous form or as the hydrate; however, when water is present in the system, it can cause a hydrolysis reaction with the starting chlorosilane or bromosilane and the thereby produced silanol group can cause a polymerization reaction to occur, and for this reason the anhydrous form is preferred. At the same time, depending on the scale of the reaction, the water of crystallization may also have an almost negligible effect.
[0035] Expressed per 1 mole of the halosilane (B), the quantity of use for the Lewis acid catalyst is, for example, 0.0001 to 1.0 mol, preferably 0.05 to 0. 5 mol, more preferably 0.03 to 0.1 mol, and even more preferably 0.01 to 0.05 mol. When too little Lewis acid catalyst is used, the reaction may be slow and/or the reaction may come to a halt while still incomplete. When too much Lewis acid catalyst is used, there is a risk that the halosilane (B) may undergo undesirable reactions, such as cleavage of the Si-C bond.
[0036] The reaction between compound (A) and the halosilane (B) can be carried out in a homogeneous system or a heterogeneous system depending on whether the Lewis acid catalyst dissolves in component (B). When a Lewis acid catalyst is used that has a low solubility in component (B), such as bismuth chloride, the reaction can be run by adding the Lewis acid catalyst to component (B) and then adding compound (A) and stirring. In this case, a residue originating from the catalyst in the system (this residue is a black tarry substance in the case of bismuth chloride) will precipitate to the bottom of the reaction mixture when the reaction is complete and as necessary can be separated from the reaction product by a known means, e.g., centrifugal separation. When, on the other hand, a Lewis acid catalyst is used that exhibits a high solubility in component (B), such as iron(III) chloride, the reaction can be run by dissolving the catalyst in the halosilane (B) and then adding compound (A) and stirring. In this case, the reaction solution as a whole is transparent and homogeneous and the separation and precipitation of a catalyst-based residue upon the completion of the reaction does not occur; this offers the advantage making it possible to avoid
problems such as the accumulation of this residue in the pipework of the facility and clogging of the pipework by this residue. When the Lewis acid catalyst is readily soluble in compound (A), the catalyst may be dissolved in component (A) and the halosilane (B) may then be added.
[0037] The temperature of this reaction is preferably from 0 to 150°C and, considered at one atmosphere, is more preferably 0 to 90°C and particularly preferably 20 to 40°C, while running the reaction at so-called room temperature (25°C) is particularly favorable. On the other hand, depending on the catalyst and starting material selection, the reaction can also be accelerated by selecting elevated temperature conditions from 50 to 90°C. Even higher temperatures may of course be selected under pressurized conditions. When the reaction temperature is too low, the reaction rate ends up being slow and long reaction times may then be required. When, on the other hand, the reaction temperature is too high, there is a risk that the hydrolyzable silicon-containing compound product may participate in undesirable reactions. The reaction time will vary with the reaction scale and reaction temperature, but is, for example, 10 minutes to 1 week and can preferably be from 1 to 40 hours. When in particular bismuth chloride or iron(III) chloride is used as the Lewis acid catalyst, from 4 to 36 hours at one atmosphere and room temperature (25°C) is preferred.
[0038] This reaction is preferably run under an inert gas atmosphere, and the inert gas can be exemplified by nitrogen and argon. This reaction may be run under reduced pressure, at ambient pressure, or under an overpressure, but is preferably run at ambient pressure from the standpoint of the processability.
[0039] The reaction between compound (A) and the halosilane (B) may be run in a solvent. The solvent used is preferably a solvent that does not react with compound (A) and/or the halosilane (B) and is preferably an inert solvent that is a liquid at ambient temperature and atmospheric pressure and has a boiling point no greater than 150°C. Such solvents can be exemplified by hydrocarbon solvents such as toluene, xylene, hexane, nonane, pentane, and octane; chlorinated hydrocarbon solvents such as carbon tetrachloride, methylene chloride, dichloroethane, dichloroethylene, 1,1,1- trichloroethane, trichloroethylene, perchloroethylene, and tetrachloroethane; and acetonitrile.
[0040] The reaction between compound (A) and the halosilane (B) can be run using a batch or continuous regime. When the reaction is run using a continuous regime, compound (A) and the halosilane (B) may be reacted and, after the reaction has reached equilibrium, it may be advanced while removing the hydrolyzable silicon-containing compound product from the reaction system by reducing the pressure within the system; the reaction may also be advanced still further while removing from the reaction system the halogenated hydrocarbon by-product originating with the tertiary alkyl group or the aralkyl group. The reaction selectivity is very high in this reaction since there is almost no production in this reaction of by-products other than the halogenated hydrocarbon. Moreover, this reaction is safe since there is almost no secondary production in this reaction of a hydrogen halide such as hydrogen chloride, and the reaction can be run at lost costs because there is almost no requirement for the addition of a base, such as an amine, as a neutralizing agent for the hydrogen halide. Furthermore, since this reaction is almost entirely free of the production of a flammable · irritating acyl halide such as acetyl chloride, this reaction can be run safely and with a low environmental burden.
[0041] When a Lewis acid catalyst is used that has a low solubility in component (B), such as bismuth chloride, the catalyst resists transfer into the system and due to this is particularly useful as a supported-type catalyst in a batch process, which presupposes filtration, or in a continuous process. A Lewis acid catalyst that dissolves uniformly in component (B), such as iron(III) chloride, is useful in a batch process. After the reaction, a Lewis acid catalyst such as iron(III) chloride can as necessary be deactivated and easily isolated from the product by distillation.
[0042] After the reaction, the solution is approximately neutral and as a consequence the obtained hydrolyzable silicon-containing compound can be directly recovered from the reaction solution by, for example, distillation. In addition, as necessary the hydrolyzable silicon-containing compound can also be recovered from the reaction system by adding a small amount of a compound that acts as a Lewis base in order to deactivate the Lewis acid catalyst remaining after the reaction between compound (A) and the halosilane (B), followed by, for example, distillation. The obtained
hydrolyzable silicon-containing compound may also be used directly, without isolation, in an ensuing reaction.
[0043] The hydrolyzable silicon-containing compound yielded by the production method of the present invention has at least one silicon-bonded hydrolyzable group, e.g., an alkoxy group, acetoxy group, phenoxy group, and so forth. The hydrolyzable silicon-containing compound is preferably an alkoxysilane, acetoxysilane, or phenoxysilane. The alkoxysilane can be exemplified by
methoxysilane, methoxytrimethylsilane, ethoxysilane, butoxysilane, dimethyldimethoxysilane, dimethylmethoxychlorosilane, trimethoxychlorosilane, trimethoxysilane, tetramethoxysilane, tert- butyltrimethoxysilane, isobutyltrimethoxysilane, isobutylmethoxysilane, octadecyltrimethoxysilane, dodecyltrimethoxysilane, cyclohexylmethyldimethoxysilane, triethoxysilane, vinyltrimethoxysilane, methylvinyldimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane,
diphenyldimethoxysilane, phenylmethoxychlorosilane, triphenylmethoxysilane, 2- phenylpropylmethyldimethoxysilane, methylhexanedienyldimethoxysilane,
(chloropropyl)trimethoxy silane, (3,3,3 -trifluoropropyl)trimethoxysilane, bis(3 ,3 ,3- trifluoropropyl)dimethoxysilane, tris(3,3,3-trifluoropropyl)methoxysilane, 3- methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3- acryloxypropyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3- mercaptopropylmethyldimethoxysilane, 3-mercaptopropyltrimethoxysilane, and so forth. The acetoxysilane can be exemplified by vinyltriacetoxysilane, trimethylacetoxysilane, and so forth. The phenoxysilane can be exemplified by methyltriphenoxysilane, ethyltriphenoxysilane,
vinyltriphenoxysilane, phenyltriphenoxysilane, dimethyldiphenoxysilane,
methylvinyldiphenoxysilane, divinyldiphenoxysilane, methylphenyldiphenoxysilane,
diphenyldiphenoxysilane, and so forth. Hydrolyzable silicon-containing compounds such as the preceding can be obtained in high yields using the production method of the present invention.
[0044] Because the reaction between compound (A) and the halosilane (B) results in almost no production or in the complete absence of production of reactive hydrogen halide or acyl halide, the
hydrolyzable silicon-containing compound yielded by the production method of the present invention substantially does not contain hydrogen halide or acyl halide. Here, "substantially" means not more than 5% of the total mass (weight) of the hydrolyzable silicon-containing compound and preferably not more than 1%, more preferably not more than 0.1%, and even more preferably not more than 0.01% of the total mass (weight) of the hydrolyzable silicon-containing compound.
Accordingly, the hydrolyzable silicon-containing compound yielded by the production method of the present invention may be used in an ensuing or follow-on process without having to carry out a deactivation treatment for hydrogen halide or acyl halide.
[0045] The hydrolyzable silicon-containing compound yielded by the production method of the present invention contains no or almost no hydrogen halide or acyl halide and therefore inherently contains little impurity, but as necessary may be subjected to purification by a known method, e.g., distillation, chromatography, and so forth, in order to provide an even higher purity hydrolyzable silicon-containing compound.
[0046] The hydrolyzable silicon-containing compound yielded by the production method of the present invention can be used in known applications. For example, the alkoxysilane is useful as a silane coupling agent and as a starting material for the synthesis of a variety of organopolysiloxanes. In particular, alkoxysilane obtained using the production method of the present invention is useful as a starting material for silicones for solar cell and semiconductor applications, which are applications where high purity is required. The acetoxysilane, on the other hand, is useful as a silane coupling agent, silylating agent, crosslinking agent, and so forth; in particular, acetoxysilane obtained using the production method of the present invention is useful as a starting material for, e.g., sealants used for, e.g., construction and building materials. Similarly, since the previously described reaction produces almost no flammable · irritating acyl halide, e.g., acetyl chloride, the advantage accrues of obtaining a silane starting material that is favorable for application as a high-purity material and for application as an electronic material.
Examples
[0047] The description continues below with practical examples of the present invention, but the present invention is not limited by these. The products in the practical examples and comparative examples were identified using NMR for the 29Si, 13C, and !H nuclides. Specifically, a JEOL JNM- ECX-500 NMR measurement instrument from JEOL, Ltd., was used. The measurements were performed using deuterated chloroform (CDC13) as the solvent; a small amount of chromium acetylacetate was added as a relaxation accelerator; and tetramethylsilane (δ = 0, ]H-NMR, 13C- NMR, 29Si-NMR) was used as an internal standard. The reaction product yield was determined based on the ratio of the integrated value of signals assigned to the reactants and product.
[0048] [Practical Example 1]
A magnetic stir bar was introduced into a 30-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 0.16 g (0.5 mmol) of bismuth chloride (BiCl3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 2.91 g (33 mmol) of methyl tert-butyl ether was then introduced into the flask using a syringe and the flask was placed in an ice bath (0°C). While on the ice bath (0°C), 2.11 g (10 mmol) of phenyltrichlorosilane was introduced into the flask by gradual dropwise addition from a syringe; the system was returned to room temperature (25°C) after the completion of dropwise addition; and a reaction was carried out overnight (15 hours) while stirring the solution using a magnetic stirrer. After the completion of the reaction, the solution was measured by 29Si-NMR, 13C-NMR, and 'H-NMR and the product was identified and the product yield was determined from the measurement results. The results are given in Table 1. A small amount of a black, catalyst-derived precipitate was precipitated in the solution after the reaction.
[0049] [Practical Example 2]
A reaction was run as in Practical Example 1 , but using the same molar amount (= 1.70 g) of tetrachlorosilane in place of the phenyltrichlorosilane. The results are given in Table 1.
[0050] [Practical Example 3]
A reaction was run as in Practical Example 1, but using the same molar amount (= 1.35 g) of hydrotrichlorosilane in place of the phenyltrichlorosilane. The results are given in Table 1.
[0051] [Practical Example 4]
A reaction was run as in Practical Example 1, but using the same molar amount (= 3.04 g) of dodecyltrichlorosilane in place of the phenyltrichlorosilane. The results are given in Table 1.
[0052] [Practical Example 5]
A reaction was run as in Practical Example 1, but using the same molar amount (= 1.62 g) of vinyltrichlorosilane in place of the phenyltrichlorosilane. The results are given in Table 1.
[0053] [Practical Example 6]
A reaction was run as in Practical Example 1, but using the same molar amount (= 3.37 g) of ethyl tert-butyl ether in place of the methyl tert-butyl ether. The results are given in Table 1.
[0054] [Practical Example 7]
A reaction was run as in Practical Example 2, but using the tetrachlorosilane and methyl tert-butyl ether in a proportion of 3 moles methyl tert-butyl ether per 1 mole of tetrachlorosilane. Thus, a reaction was run as in Practical Example 2, but using 2.64 g (30 mmol) for the amount of methyl tert-butyl ether used. The results are given in Table 1.
[0055] [Practical Example 8]
A reaction was run as in Practical Example 1, but using dimethyldichlorosilane in place of the phenyltrichlorosilane and using a dimethyldichlorosilane : methyl tert-butyl ether molar ratio of 1 : 2.6. Thus, a reaction was run as in Practical Example 1, but using 2.29 g (26 mmol) for the amount of methyl tert-butyl ether used and using 1.29 g (10 mmol) of dimethyldichlorosilane in place of the phenyltrichlorosilane. The results are given in Table 1.
[0056] [Practical Example 9]
A reaction was run as in Practical Example 1, but using cyclohexylmethyldichlorosilane in place of the phenyltrichlorosilane; using a cyclohexylmethyldichlorosilane : methyl tert-butyl ether in molar ratio of 1 : 2.6; and using a cyclohexylmethyldichlorosilane : bismuth chloride in molar ratio of 1 :
0.01. Thus, a magnetic stir bar was introduced into the 30-mL roundbottom flask provided with a two-way cock; 0.03 g (0.1 mmol) of bismuth chloride (BiCl3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 2.29 g (26 mmol) of methyl tert-butyl ether and 1.97 g (10 mmol) of cyclohexylmethyldichlorosilane were then introduced into the flask as in Practical Example 1 , after which the reaction was run as in Practical Example 1. The results are given in Table 1.
[0057] [Practical Example 10]
A reaction was run as in Practical Example 1, but using trimethylchlorosilane in place of the phenyltrichlorosilane; using a trimethylchlorosilane : methyl tert-butyl ether in molar ratio of 1 : 1.3; and using a trimethylchlorosilane : bismuth chloride in molar ratio of 1 : 0.01. Thus, a magnetic stir bar was introduced into the 30-mL roundbottom flask provided with a two-way cock; 0.03 g (0.1 mmol) of bismuth chloride (B1CI3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 1.15 g (13 mmol) of methyl tert-butyl ether and 1.09 g (10 mmol) of trimethylchlorosilane were then introduced into the flask as in Practical Example 1, after which the reaction was run as in Practical Example 1. The results are given in Table 1.
[0058] [Practical Example 11 ]
A reaction was run as in Practical Example 5, but using the same molar amount (= 3.83 g) of tert- butyl acetate in place of the methyl tert-butyl ether. The results are given in Table 1. The secondary production of acetyl chloride could not be identified from the NMR chart, and the obtained vinyltriacetoxysilane thus had a high purity.
[0059] [Practical Example 12]
A reaction was run as in Practical Example 10, but using the same molar amount (= 1.51 g) of tert- butyl acetate in place of the methyl tert-butyl ether. The results are given in Table 1. The secondary production of acetyl chloride could not be identified from the NMR chart, and the obtained trimethylacetoxysilane thus had a high purity.
[0060] [Practical Example 13]
A reaction was run as in Practical Example 1, but using the same molar amount (= 2.12 g) of chloropropyltrichlorosilane in place of the phenyltrichlorosilane. The results are given in Table 1.
[0061] [Comparative Example 1]
A magnetic stir bar was introduced into a 30-mL roundbottom flask provided with a two-way cock and the flask was sealed with a septum and nitrogen substitution was then carried out. 0.70 g (22 mmol) of methanol and 1.97 g (10 mmol) of cyclohexylmethyldichlorosilane were then introduced into the flask as in Practical Example 1 , after which a reaction was run as in Practical Example 1. The reaction solution in Comparative Example 1 was a more viscous liquid than in the other, practical examples. The results are shown in Table 1.
[0062] [Comparative Example 2]
A reaction was run as in Practical Example 2, but omitting the use of bismuth chloride (B1CI3) and extending the reaction time from 15 hours to 3 days. The results are shown in Table 1. Under conditions in which the Lewis acid catalyst was not present, a hydrolyzable silicon-containing compound was not produced by the reaction of tetrachlorosilane and methyl tert-butyl ether, even when the reaction time was extended to 3 days, and no change was seen in the MR chart of the solution pre-versus-post-reaction.
[0063] As shown in Table 1, the reactions in Practical Examples 1 to 13 could provide the products indicated in Table 1 in high yields.
[0064] On the other hand, a complex mixture of a large number of species was produced by the reaction in Comparative Example 1 and it was not possible to identify the product at all. It is thought that the hydrogen chloride that is a reaction by-product in Comparative Example 1 reacts with unreacted methanol to produce water by the reaction MeOH + HC1 -» MeCl + H20; that this water further reacts with the chlorosilane to provide a silanol; and that this silanol undergoes an increase in molecular weight by polymerization. The reaction system in Comparative Example 1 became a highly viscous liquid and was unable to produce a hydrolyzable silane in the high yields shown in the practical examples. For purposes of comparison, the post-reaction 29Si-NMR charts are shown in
Figure 4 for Comparative Example 1 and Practical Example 9, which used the same
cyclohexylmethyldichlorosilane starting material.
[0065] In the case of the reaction in Comparative Example 2, the reaction between tetrachlorosilane and methyl tert-butyl ether did not proceed and a comparison with Practical Example 2 showed that this reaction required a Lewis acid catalyst.
[0066] [Table 1.]
*) The functional group abbreviations used in the table are as follows.
Me : methyl group
Ph : phenyl group
cyc-Hex: cyclohexyl group
tert-Bu: tert-butyl group
Ac: acetyl group
**) No progress by the reaction could be seen by NMR even at a reaction time of 3 days.
[0067] [Practical Example 14]
A magnetic stir bar was introduced into a 50-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 16 mg (0.1 mmol) of iron(III) chloride (FeCl3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 2.90 g (33 mmol) of methyl tert-butyl ether and 2.11 g (10 mmol) of phenyltrichlorosilane were then introduced into the flask as in Practical Example 1; the system was returned to room temperature (25°C); and a reaction was carried out overnight (15 hours) while stirring the solution using a magnetic stirrer.
[0068] After the reaction, the iron(III) chloride-containing solution was uniform throughout and was a transparent, light yellow solution. Unlike the case of Practical Example 1, a residue or precipitate was not produced. A portion of the post-reaction solution was removed and measured by 29Si-NMR, 13C-NMR, and 1H-NMR and the product was identified from the measurement results, which confirmed that, as in Practical Example 1, PhSi(OMe)3 had been produced. The results are given in Table 2.
[0069] [Practical Example 15]
A reaction was run as in Practical Example 14, but using in place of the iron(III) chloride the same molar amount (= 13 mg) of aluminum chloride (A1C13). The results are given in Table 2.
[0070] After the reaction had been run overnight ( 15 hours), the aluminum chloride-containing post-reaction solution was uniform throughout and was a transparent, milky white solution. Unlike the case of Practical Example 1 , a residue or precipitate was not produced. A portion of the post- reaction solution was removed and measured by 29Si-NMR, 13C-NMR, and 1H- MR and the product was identified from the measurement results, which confirmed that PhSi(OMe)3 had been produced. However, unlike Practical Example 1 and Practical Example 14, a majority of the
phenyltrichlorosilane was unreacted after the reaction time of 15 hours.
[0071] On the other hand, when the reaction time was extended and the reaction was continued for 3 days (72 hours) with stirring, the aluminum chloride-containing post-reaction solution was uniform
throughout and had become a transparent, pale pink solution. A portion of the post-reaction solution was removed and measured by 29Si-NMR, 13C-NMR, and 1H-NMR and the product was identified from the measurement results, which confirmed that, as in Practical Example 1, PhSi(OMe)3 had been produced.
[0072] Based on the preceding results, it was confirmed that the hydrolyzable silicon-containing compound of the present invention could also be obtained when a metal salt acting as a Lewis acid catalyst other than bismuth chloride was used. In particular, the reaction was found to progress rapidly in a uniform reaction system when iron(III) chloride was used.
[0073] [Practical Example 16]
A magnetic stir bar was introduced into a 100-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 0.24 g (0.75 mmol) of bismuth(III) chloride (BiCl3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 21.9 g (248 mmol) of methyl tert-butyl ether and 19.62 g (75 mmol) of 3-methacryloxypropyltrichlorosilane were then introduced into the flask as in Practical Example 1; the system was returned to room temperature (25°C); and a reaction was carried out for 3 days (72 hours) while stirring the solution using a magnetic stirrer and shielding the entire flask from light using aluminum foil. Due to the precipitation of the bismuth chloride in the post-reaction solution, the bismuth chloride was removed by a Celite filtration and the yield of the product was then determined. The results are given in Table 2.
[0074] A portion of this post-reaction solution was removed and measured by 29Si-NMR, 13C-NMR, and ]H-NMR and the product was identified from the measurement results, which confirmed that 3- methacryloxypropyltrimethoxysilane CH2=C(CH3)COOC3H6-Si(OMe)3 had been produced.
[0075] [Practical Example 17]
A magnetic stir bar was introduced into a 30-mL roundbottom flask (Schlenk tube) provided with a two-way cock; 32 mg (0.10 mmol) of bismuth(III) chloride (BiCl3) was introduced; and the flask was sealed with a septum and nitrogen substitution was carried out. 4.03 g (33 mmol) of methyl benzyl ether and 2.11 g (10 mmol) of phenyltrichlorosilane were then introduced into the flask as in
Practical Example 1; the system was heated to 80°C; a reaction was carried out overnight (15 hours) while stirring the solution using a magnetic stirrer; and the product yield was determined. The results are given in Table 2. The post-reaction solution had undergone a color change to black and the bismuth chloride had precipitated.
[0076] A portion of this post-reaction solution was removed and measured by 29Si-NMR, 13C-NMR, and ^- MR and the product was identified from the measurement results, which confirmed that, as in Practical Example 1, PhSi(OMe)3 had been produced.
[0077] [Practical Example 18]
32 mg (0.10 mmol) of bismuth(III) chloride (BiCl3) was introduced into a stirrer-equipped 30-mL roundbottom flask (Schlenk tube) provided with a two-way cock and the flask was sealed with a septum and nitrogen substitution was carried out. 6.08 g (33 mmol) of phenyl benzyl ether and 1.50 g (10 mmol) of methyltrichlorosilane were then introduced into the flask as in Practical Example 1; the system was heated to 60°C; a reaction was carried out overnight (15 hours); and the product yield was determined. The results are given in Table 2. The bismuth chloride had precipitated in the post-reaction solution.
[0078] A portion of this post-reaction solution was removed and measured by 29Si-NMR, 13C-NMR, and 1H-NMR and the product was identified from the measurement results, which confirmed that the phenoxysilane represented by MeSi(OPh)3 had been produced.
[0079] [Practical Example 19]
32 mg (0.10 mmol) of bismuth(III) chloride (BiCl3) was introduced into a stirrer-equipped 30-mL roundbottom flask (Schlenk tube) provided with a two-way cock and the flask was sealed with a septum after nitrogen substitution. 6.54 g (33 mmol) of methyl diphenylmethyl ether with the chemical formula CH3-0-CH(C6H5)2 and 1.50 g (10 mmol) of methyltrichlorosilane were then introduced into the flask as in Practical Example 1; the system was returned to room temperature (25°C); a reaction was carried out overnight (15 hours); and the product yield was determined. The results are given in Table 2. The bismuth chloride had precipitated in the post-reaction solution.
[0080] A portion of this post-reaction solution was removed and measured by Si-NMR, C-NMR, and 1H-NMR and the product was identified from the measurement results, which confirmed that
MeSi(OMe)3 had been produced.
[0081] [Table 2.]
Table 2.
*) The functional group abbreviations used in the table are as follows.
Me : methyl group
Ph : phenyl group
tert-Bu: tert-butyl group
**) The reaction time was 3 days.
[0082] The 13C assignments for the individual hydrolyzable silanes are as shown in the figures. The sharp signal in the vicinity of σ = 34.5 ppm is assigned to the tert-BuCl that is produced, while the sharp signal in the vicinity of δ = 27.0 ppm is assigned to the excess tert-BuOMe. According to the comparison of Comparative Example 1 and Practical Example 9 shown in Figure 4, there was almost no production of the corresponding hydrolyzable silane in the direct reaction with methanol. In addition, as shown in Figure 5, the production of acetyl chloride could not be confirmed at all by NMR.
[0083] < Description of the NMR charts >
The functional group abbreviations are as follows.
Me: methyl group
Ph: phenyl group
cyc-Hex: cyclohexyl group
Ac: acetyl group
methacryloxypropyl: 3-methacryloxypropyl group CH2=C(CH3)COOC3He-
Figure 1: A signal in the vicinity of δ = 128.0-135.0 ppm assigned to the phenyl group in
PhSi(OMe)3 and a signal in the vicinity of δ = 50.5 ppm assigned to the methoxy group in
PhSi(OMe)3 are present.
Figure 2: A signal in the vicinity of δ = 50.3 ppm assigned to the methoxy group in cyc- HexMeSi(OMe)2 and a signal in the vicinity of δ = 24-27.96 ppm assigned to the cyclohexyl group in cyc-HexMeSi(OMe)2 are present.
Figure 3: The signal shapes are completely different from Figure 2 and the individual signals cannot be assigned.
Figure 4: A signal in the vicinity of δ = -3.57 ppm assigned to the 29Si in cyc-HexMeSi(OMe)2 is present in the upper section, which concerns Practical Example 9, and a signal in the vicinity of δ = 32.6 ppm assigned to the 29Si in the cyc-HexMeSiCl2 starting material is present in the lower section, which concerns Comparative Example 1.
Figure 5: Signals in the vicinity of δ = 140.5, 125.5, and 22.5 ppm assigned to CH2=CHSi(OAc)3 were present, while the signal in the vicinity of 33.68 ppm assigned to acetyl chloride was not observed.
Figure 6: The signal shapes are about the same as in Figure 1 and the product is therefore the same. A signal in the vicinity of δ = 128.0-134.9 ppm assigned to the phenyl group in PhSi(OMe)3 and a signal in the vicinity of δ = 50.8 ppm assigned to the methoxy group in PhSi(OMe)3 are present. Figure 7: Signals for the unreacted starting materials are observed, but the signals agree with Figure 1 and Figure 6 and the same product can therefore be confirmed. A signal in the vicinity of δ =
128.0-134.9 ppm assigned to the phenyl group in PhSi(OMe)3 and a signal in the vicinity of δ = 50.8 ppm assigned to the methoxy group in PhSi(OMe)3 are present.
Figure 8: Signals assigned to methacryloxypropylSi(OMe)3 in the vicinity of δ = 167.4, 136.6, 125.2, 66.6, 50.5, 22.2, 18.3, and 5.8 ppm are present.
Figure 9: Considering the signals other than those for the starting materials, the signal shapes are about the same as in Figure 1 and the product is therefore the same. A signal in the vicinity of δ = 127.6-134.8 ppm assigned to the phenyl group in PhSi(OMe)3 and a signal in the vicinity of δ = 50.7 ppm assigned to the methoxy group in PhSi(OMe)3 are present.
Claims
' A method of producing a hydrolyzable silicon-containing compound by reacting
(A) a compound represented by the general formula
R'-O-R2
wherein R1 represents a C4-30, substituted or unsubstituted, tertiary alkyl group or aralkyl group and R represents a C1-3o, substituted or unsubstituted, monovalent hydrocarbyl group or acyl group, and
(B) a halosilane represented by the general formula
wherein R independently represents the hydrogen atom or a C1-30 substituted or unsubstituted monovalent hydrocarbyl group, X is independently bromine or chlorine, and m represents an integer from 0 to 3,
in the presence of a Lewis acid catalyst.
The production method according to claim 1, wherein the Lewis acid catalyst is a metal- containing Lewis acid.
The production method according to claim 1 or 2, wherein the Lewis acid catalyst is at least one Lewis acid selected from the group consisting of metal halides, metal oxides, and metal sulfate salts.
The production method according to any of claims 1 to 3, wherein the Lewis acid catalyst is at least one Lewis acid selected from the group consisting of gallium(III) chloride, gallium(III) bromide, indium chloride, indium bromide, bismuth chloride, aluminum chloride, iron(II)
chloride, iron(III) chloride, iron(II) bromide, iron(III) bromide, nickel chloride, cadmium oxide, chromium oxide, molybdenum(VI) oxide, iron(III) oxide, iron(II) sulfate, and iron(III) sulfate.
5. The production method according to any of claims 1 to 4, wherein the halosilane (B) is a
chlorosilane.
6. The production method according to any of claims 1 to 5, wherein the compound (A) is an
ether.
7. The production method according to claim 6, wherein the ether is at least one ether selected from methyl tert-butyl ether, ethyl tert-butyl ether, methyl diphenylmethyl ether, and methyl triphenylmethyl ether.
8. The production method according to any of claims 1 to 5, wherein compound (A) is an ester.
9. The production method according to claim 8, wherein the ester is tert-butyl acetate or
diphenylmethyl acetate.
10. The production method according to any of claims 1 to 9, wherein the hydrolyzable silicon- containing compound is an alkoxysilane, a phenoxysilane, or an acetoxysilane.
11. A hydrolyzable silicon-containing compound that is produced by the production method
according to any of claims 1 to 10 and that substantially does not contain a hydrogen halide or an acyl halide.
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CN112047975A (en) * | 2020-09-02 | 2020-12-08 | 山东阳谷华泰化工股份有限公司 | Synthesis method of silane coupling agent Si69 and intermediate thereof |
EP3782599A1 (en) | 2019-08-19 | 2021-02-24 | VOCO GmbH | Dental polymerizable composition based on condensed silanes |
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JP6265431B2 (en) * | 2014-09-22 | 2018-01-24 | 国立研究開発法人産業技術総合研究所 | Process for producing alkoxyhalosilane compound |
CN114181243B (en) * | 2021-12-01 | 2024-04-02 | 浙江皇马科技股份有限公司 | Preparation method of methyldimethoxy hydrosilane |
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JP4025383B2 (en) * | 1996-04-26 | 2007-12-19 | 東レ・ダウコーニング株式会社 | Method for purifying 3-methacryloxypropyldimethylhalosilane or 3-methacryloxypropylmethyldihalosilane |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3782599A1 (en) | 2019-08-19 | 2021-02-24 | VOCO GmbH | Dental polymerizable composition based on condensed silanes |
US11992538B2 (en) | 2019-08-19 | 2024-05-28 | Voco Gmbh | Polymerizable dental composition based on condensed silanes |
CN112047975A (en) * | 2020-09-02 | 2020-12-08 | 山东阳谷华泰化工股份有限公司 | Synthesis method of silane coupling agent Si69 and intermediate thereof |
CN112047975B (en) * | 2020-09-02 | 2023-09-05 | 山东阳谷华泰化工股份有限公司 | Synthesis method of silane coupling agent Si69 and intermediate thereof |
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JP5844520B2 (en) | 2016-01-20 |
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