WO2012087044A2

WO2012087044A2 - Vacuum thermal treating apparatus

Info

Publication number: WO2012087044A2
Application number: PCT/KR2011/009977
Authority: WO
Inventors: Jung Eun Han; Byung Sook Kim; Kyoung Hoon Chai
Original assignee: Lg Innotek Co., Ltd.
Priority date: 2010-12-24
Filing date: 2011-12-22
Publication date: 2012-06-28
Also published as: KR20120072668A; KR101877494B1; WO2012087044A3

Abstract

A vacuum thermal treating apparatus includes a chamber; reaction vessels positioned in the chamber; a heating member positioned between the chamber the reaction vessels and heating the reaction vessels; and an exhaust pipe discharging the inside of the reaction vessels and including a plurality of the exhaust member formed separately.

Description

VACUUM THERMAL TREATING APPARATUS

The present invention relates to a vacuum thermal treating apparatus.

The vacuum thermal treating apparatus, which manufactures a desired material by heating a material in a crucible, has advantage that does not produce pollution peripherally by heating in vacuum.

In the vacuum thermal treating apparatus, a heat insulating member is positioned in a chamber maintained in vacuum, and a heater heating the material is positioned in the heat insulating member. Gas and the like produced during the reaction is discharged by the exhaust pipe.

However, such a gas may form second phase by reacting with the composition material of the exhaust pipe when discharging the gas through the exhaust pipe. If a internal surface of the exhaust pipe is reduced due to the second phase, gas discharge through the exhaust pipe may not be smoothly made.

Cost and time may be increased by replacing the exhaust pipe. Further, if the gas discharge through the exhaust pipe is not smoothly made, the gas is discharged through the reaction vessels and the like. In such a case, a life of the heat insulating member and the like may be shorten. Furthermore, if the second phase is formed in the heat insulating member, such that problem such as thermal conduction may be created, risks of accidents etc. may be increased.

The embodiment provides a vacuum heat treatment apparatus capable of easily performing maintenance of the exhaust pipe.

A vacuum thermal treating apparatus according to the embodiment includes a chamber; reaction vessels positioned in the chamber; a heating member positioned between the chamber and the reaction vessels, and heating the reaction vessels; and an exhaust pipe discharging the gas of the inside of the reaction vessels and including a plurality of the exhaust member formed separately.

The plurality of the exhaust members may include a first exhaust member connected to the reaction vessels; a second exhaust member positioned outside the chamber; and a third exhaust member positioned between the first exhaust member and the second exhaust member.

A first groove is formed in one end of the third exhaust member, and a second groove is formed in the other end. At this moment, the first exhaust member is coupled with the first groove, and the second exhaust member may be coupled with the second groove.

The first to third exhaust member may be fastened by an insert type coupling.

The third exhaust member and the first exhaust member, and the third exhaust member and the second exhaust member are coupled by screws.

An outer diameter of the third exhaust member is different from the outer diameters of the first and second exhaust member.

An outer diameter of the third exhaust member may be larger than the outer diameters of the first and second exhaust member.

An inner diameter of the third exhaust member may be larger than the inner diameters of the first and second exhaust member.

The second phase producing guide member is positioned in the inside of the third exhaust member.

The second phase producing guide member may contain graphite.

The second phase producing guide member may be the shape of the sheets.

The exhaust pipe may contain graphite.

The vacuum thermal treating apparatus may be used for manufacture of the silicon carbide.

In the vacuum thermal treating apparatus according to the embodiment, since the exhaust pipe includes a plurality of the exhaust members, it is possible to separately replace the exhaust members only producing much second phase. Whereby, maintenance of the exhaust pipe may be easily made.

Further, the second phase producing guide member is positioned in the inside of the exhaust member producing much second phase among the plurality of exhaust members, such that the second phase is produced in the second phase producing guide member. Thereby, the exhaust pipe may be cleaned by replacing the second phase producing guide member. As a result, it is possible to improve the life of the exhaust pipe and to minimize the maintenance of the exhaust pipe.

FIG. 1 schematically shows a vacuum thermal treating apparatus according to the embodiment of the invention.

FIG. 2 is an enlarged sectional view of A portion of FIG.1.

FIG. 3 is an enlarged prospective view of B portion of FIG. 2.

In the description of the embodiment, the description in which each layer (film), region, pattern or structure are formed “up/on” or “down/under” of substrate, each layer (film), region, pad or pattern includes forming directly or by interposing another layer.

In the drawings, a thickness or size of each layer (film), region, pattern or structure may be varied for the clarity and convenience of the description, and therefore, the actual size is not entirely reflected.

Hereinafter, the embodiment of the invention will be described in more detail with reference to the attached drawings.

Referring to FIG.1, the vacuum thermal treating apparatus 100 of the embodiment includes a chamber 10, a heat insulating member 20 positioned in the chamber 10, reaction vessels 30 and a heating member 40 positioned in the heat insulating member. Further, an exhaust pipe 50 discharging the gas of the reaction vessels 30 by discharging gas produced during the reaction is connected to the reaction vessels 30. The detailed description about above contents is as follows.

Ambient gas is injected into the inside of the chamber through a ambient gas supply pipe(not shown). Inert gas such as argon gas (Ar) may be used as the ambient gas.

The heat insulating member 20 positioned in the chamber 10 performs heat insulating function so that the reaction vessels 30 may be maintained at temperatures suitable for the reaction. The heat insulating member 20 may contain graphite to withstand high temperature.

Mixing material is filled into the heat insulating member 20, and the reaction vessels 30, in which the desired material is produced, are positioned by the reaction. The reaction vessels 30 may contain graphite to withstand high temperatures.

A heating member 40 heating the reaction vessels 30 is positioned between the heat insulating member 20 and the reaction vessels 30. The heating member 40 may provide heat to the reaction vessels 30 by various method. For an example, the heating member 40 applies voltage to the graphite to generate the heat.

The vacuum thermal treating apparatus 100 may be, for an example, used as an manufacturing apparatus of silicon carbide manufacturing the silicon carbide by heating the mixing material containing sources of carbon and silicon. However, the embodiment is not limited thereto.

Further, the exhaust pipe 50 may contain, for an example, graphite to withstand high temperatures. The exhaust pipe 50 is described in more detail with reference to FIG.2 and FIG.3. FIG. 2 is an enlarged sectional view of A portion of FIG.1, and FIG. 3 is an enlarged prospective view of B portion of FIG. 2.

Referring to FIG.2, the exhaust pipe 50 of the embodiment includes a first exhaust member 510 connected from the heating insulating member 20 to the reaction vessel (reference numeral 30 in FIG.1, same below), a second exhaust member 520 positioned outside the chamber 10, and a third exhaust member 530 positioned between the first exhaust member 510 and the second exhaust member 520.

At this moment, a first groove 512 is formed in one end of the third exhaust member 530, and a second groove 522 is formed in the other end. The first exhaust member 510 is coupled with the first groove 512, and the second exhaust member 520 may be coupled with the second groove 514. Further, the third exhaust member 530 and the first exhaust member 510 are fastened by a first screw 514, and the third exhaust member 530 and the second exhaust member 520 are fastened by a second screw 524.

In the drawings and above-described description, it is illustrated that the first to

third exhaust member

510, 520, 530 are fastened by the first and

second screw

514, 524. It is possible to rigidly fasten the first to

third exhaust member

510, 520, 530 by such a screw coupling.

However, the embodiment is not limited thereto. The first to

third exhaust member

510, 520, 530 may be also fastened by an insert type coupling using the first groove 512 and the second groove 522 only without having the first and

second screw

514, 524. Therefore, it is possible to ease attachment and detachment of the first to

third exhaust member

510, 520, 530, thereby to reduce the time required for the repair and replacement. Further, The first to

third exhaust member

510, 520, 530 may be fastened using the first screw 514 and the second screw 524 only without having the first and

second screw

512, 522.

In the present invention, since an outer diameter W1 of the third exhaust member 530 is larger than an outer diameter W2 of the first and

second exhaust member

510, 520, the first and

second screw

512, 522 may be stably formed in the third exhaust member 530. As a result, it is possible to improve bond stability of the first to

third exhaust member

510, 520, 530.

However, the embodiment is not limited thereto, an outer diameter W1 of the third exhaust member 530 is smaller than an outer diameter W2 of the first and

second exhaust member

510, 520, it is also possible to form the groove in the first and

second exhaust member

510, 520.

At this moment, temperature gradients may be formed greatly in the third exhaust member 530 by the difference in the temperature between the inside of the heating insulating member 20 and the outside of the chamber 10.

Therefore, the secondary phase may occur most frequently in the third exhaust member 530. For an example, when the vacuum thermal treating apparatus (reference numeral 100 in FIG. 1, same above) is used for manufacture of silicon carbide, CO or CO₂ gas, non-reaction gas, that is, SiO gas and the like produced during the reaction may be attached in the third exhaust member 530 by reacting with the third exhaust member 530 having large temperature gradients.

In the embodiment, when cleaning or replacing the third exhaust member 530 only mainly forming the second phase like this, the exhaust pipe 50 may be organized, thereby to reduce maintenance time of the exhaust pipe 50. That is, in the embodiment, since the exhaust pipe 50 has the plurality of the

exhaust members

510, 520, 530, the maintenance time of the exhaust pipe 50 is reduced. In the drawing and description, 3

exhaust members

510, 520, 530 are illustrated, but the embodiment is not limited thereto. Accordingly, if the exhaust pipe 50 includes the plurality(i.e. two or more) of the

exhaust members

510, 520, 530 formed individually, that is enough.

Like this, a second phase producing guide member 540 may be positioned in the inside of the third exhaust member 530 in which the second phase producing occurs most frequently. The second phase producing guide member 540 may be composed of the same material, for example, graphite as the exhaust pipe 50. If the second phase is produced in the second phase producing guide member 540 positioned in the third exhaust member 530, the exhaust pipe 50 may be maintained and repaired by replacing second phase producing guide member 540, thereby efficiently saving cost and time required for it.

The second phase producing guide member 540 is formed in the shape of the sheets to block contact between the exhaust pipe 50 and reaction or non-reaction gas, and therefore, like FIG. 3, may be formed to cover a surface of the third exhaust member 530. The second phase producing guide member 540 may be positioned while naturally covering the surface of the third exhaust member 530 without having separate fastening means when putting the second phase producing guide member 540 of the shape of the sheets rolled up in a circle shape similarly to the shape of the exhaust pipe 50 into the inside of the third exhaust member 530.

At this moment, if an inner diameter W3 of the third exhaust member 530 is larger than the inner diameter W4 of the first and

second exhaust member

510, 520, a step formed by the difference in the inner diameter may prevent the second phase producing guide member 540 from moving from the third exhaust member 530 to the first and

second exhaust member

510, 520.

It is appreciated that the present invention can be carried out in other specific forms without changing a technical idea or essential characteristics by one having ordinary skilled in the art to which the present invention pertains to. Therefore, embodiments described above are for illustration purpose in all respect but not limited to them. The scope of the present invention is represented by claims described below rather than the detailed description, and any change and variations derived from the meaning, the scope and the concept of equality of claims should be interpreted to be included to the scope of the present invention.

In addition, although the preferred embodiments of the present invention are shown and described above, the present invention is not limited to above-described specific embodiment and is variously modified by one skilled in the art without the gist of the present invention claimed in the claim, such that the modified embodiment is not to be understood separately from technical ideas or views of the present invention.

Claims

A vacuum thermal treating apparatus, comprising: a chamber; reaction vessels positioned in the chamber; a heating member positioned between the chamber and the reaction vessels and heating the reaction vessels; and an exhaust pipe discharging a gas of the inside of the reaction vessels and including a plurality of the exhaust member formed separately.
The vacuum thermal treating apparatus according to claim 1, wherein the plurality of the exhaust members includes a first exhaust member connected to the reaction vessels; a second exhaust member positioned outside the chamber; and a third exhaust member positioned between the first exhaust member and the second exhaust member.
The vacuum thermal treating apparatus according to claim 2, wherein a first groove is formed in one end of the third exhaust member, and a second groove is formed in the other end.
The vacuum thermal treating apparatus according to claim 3, wherein the first exhaust member is coupled with the first groove, and the second exhaust member may be coupled with the second groove.
The vacuum thermal treating apparatus according to claim 3, wherein the first to third exhaust member may be fastened by an insert type coupling.
The vacuum thermal treating apparatus according to claim 3, wherein the third exhaust member and the first exhaust member are coupled by a first screw, and the third exhaust member and the second exhaust member are coupled by a second screw.
The vacuum thermal treating apparatus according to claim 2, wherein an outer diameter of the third exhaust member is different from the outer diameters of the first and second exhaust member.
The vacuum thermal treating apparatus according to claim 7, wherein an outer diameter of the third exhaust member is larger than the outer diameters of the first and second exhaust member.
The vacuum thermal treating apparatus according to claim 7, wherein an outer diameter of the third exhaust member is smaller than the outer diameters of the first and second exhaust member.
The vacuum thermal treating apparatus according to claim 2, wherein an inner diameter of the third exhaust member is different from the inner diameters of the first and second exhaust member.
The vacuum thermal treating apparatus according to claim 10, wherein an inner diameter of the third exhaust member is larger than the inner diameters of the first and second exhaust member.
The vacuum thermal treating apparatus according to claim 2, wherein the second phase producing guide member is positioned in the inside of the third exhaust member.
The vacuum thermal treating apparatus according to claim 12, wherein the second phase producing guide member may contain graphite.
The vacuum thermal treating apparatus according to claim 12, wherein the second phase producing guide member is the shape of the sheets.
The vacuum thermal treating apparatus according to claim 1, wherein the exhaust pipe may contain graphite.
The vacuum thermal treating apparatus according to claim 1, wherein the vacuum thermal treating apparatus may be used for manufacture of the silicon carbide.