WO2012018201A3 - A plate comprising an amorphous ceramic coating layer, its use and method of manufacturing the same - Google Patents
A plate comprising an amorphous ceramic coating layer, its use and method of manufacturing the same Download PDFInfo
- Publication number
- WO2012018201A3 WO2012018201A3 PCT/KR2011/005638 KR2011005638W WO2012018201A3 WO 2012018201 A3 WO2012018201 A3 WO 2012018201A3 KR 2011005638 W KR2011005638 W KR 2011005638W WO 2012018201 A3 WO2012018201 A3 WO 2012018201A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- weight
- parts
- coating layer
- ceramic coating
- plate
- Prior art date
Links
- 238000005524 ceramic coating Methods 0.000 title abstract 6
- 239000011247 coating layer Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000919 ceramic Substances 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000005299 abrasion Methods 0.000 abstract 1
- 239000000654 additive Substances 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 210000003298 dental enamel Anatomy 0.000 abstract 1
- 238000010304 firing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 230000000704 physical effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D1/00—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
- C09D1/02—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances alkali metal silicates
- C09D1/04—Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances alkali metal silicates with organic additives
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0392—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
Abstract
This invention relates to a plate including an amorphous ceramic coating layer, its use and a method of manufacturing the same. More specifically, this invention relates to plate including an amorphous ceramic coating layer obtained by coating a composition including 24 to 56 parts by weight of silica sol, 11 to 30 parts by weight of alcohol, 0.1 to 0.2 parts by weight of an additive, 0.2 to 27 parts by weight of a filling, 0.5 to 5.0 parts by weight of porous ceramic, and 15 to 32 parts by weight of a hardening agent on the plate, followed by firing at 100 to 350℃ and cooling at 10~30℃/sec. The plate including the amorphous ceramic coating layer of this invention has an enhanced durability due to very high improvement of mechanical properties such as abrasion resistance, corrosion resistance, and heat resistance. Also, the plate of this invention has no occurrence of cracks, barely exhibition of brittleness even at an excessive stress, and a hardness increase to the level of twice to three times higher than a conventional ceramic coating layer, which is similar to that of enamel. Furthermore, when multi-layered coating with more than two layers is rapidly cooled or ultra-rapidly cooled, a completed ceramic coating film with a high physical property, no cracksand no peeling shows an electrically semiconductor characteristic due to the amorphous ceramic.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201180038812XA CN103025682A (en) | 2010-08-06 | 2011-08-01 | A plate comprising an amorphous ceramic coating layer, its use and method of manufacturing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020100075972A KR101030150B1 (en) | 2010-08-06 | 2010-08-06 | A plate comprising amorphous ceramic coating layer, its use and method of manufacturing the same |
KR10-2010-0075972 | 2010-08-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012018201A2 WO2012018201A2 (en) | 2012-02-09 |
WO2012018201A3 true WO2012018201A3 (en) | 2012-05-03 |
Family
ID=44050345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2011/005638 WO2012018201A2 (en) | 2010-08-06 | 2011-08-01 | A plate comprising an amorphous ceramic coating layer, its use and method of manufacturing the same |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101030150B1 (en) |
CN (1) | CN103025682A (en) |
WO (1) | WO2012018201A2 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101401222B1 (en) * | 2013-11-07 | 2014-05-28 | 김태웅 | A reversible changeable coating composition and a method thereof |
KR102542012B1 (en) * | 2020-08-28 | 2023-06-12 | 한국과학기술연구원 | Method for forming high heat resistant coating film using liquid ceramic composition and high heat resistant coating film prepared thereby |
CN115074034B (en) * | 2022-06-24 | 2023-07-25 | 华中科技大学 | Adhesive for additive manufacturing of ceramic parts and bonding method |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070002112A (en) * | 2005-06-30 | 2007-01-05 | 대영케미칼(주) | Marble coating method |
KR20090006695A (en) * | 2007-07-12 | 2009-01-15 | 김준형 | The ceramic coating agent for metal face and ceramic coating method of metal face using it |
KR20100037153A (en) * | 2005-08-26 | 2010-04-08 | 피피지 인더스트리즈 오하이오 인코포레이티드 | Coating compositions exhibiting corrosion resistance properties, related coated substrates, and methods |
KR20100052824A (en) * | 2008-11-11 | 2010-05-20 | 표대영 | Nonadhesive inorganic ceramic coating composition and coating method using the same |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100397486B1 (en) | 2001-02-02 | 2003-09-13 | 추호길 | A solution for ceramic coating and its manufacturing method |
CN101445396B (en) * | 2008-12-09 | 2011-08-31 | 西安交通大学 | Method for preparing porcelain insulator surface super-hydrophobic coating |
CN101567406B (en) * | 2009-06-09 | 2011-03-30 | 华东师范大学 | Method for preparing quantum dot light-wave conversion layer on the surface of silica-based solar cell |
CN101629066A (en) * | 2009-07-28 | 2010-01-20 | 上海理工大学 | Nanometer composite hydrophobic hard transparent film and preparation method thereof |
-
2010
- 2010-08-06 KR KR1020100075972A patent/KR101030150B1/en not_active IP Right Cessation
-
2011
- 2011-08-01 WO PCT/KR2011/005638 patent/WO2012018201A2/en active Application Filing
- 2011-08-01 CN CN201180038812XA patent/CN103025682A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20070002112A (en) * | 2005-06-30 | 2007-01-05 | 대영케미칼(주) | Marble coating method |
KR20100037153A (en) * | 2005-08-26 | 2010-04-08 | 피피지 인더스트리즈 오하이오 인코포레이티드 | Coating compositions exhibiting corrosion resistance properties, related coated substrates, and methods |
KR20090006695A (en) * | 2007-07-12 | 2009-01-15 | 김준형 | The ceramic coating agent for metal face and ceramic coating method of metal face using it |
KR20100052824A (en) * | 2008-11-11 | 2010-05-20 | 표대영 | Nonadhesive inorganic ceramic coating composition and coating method using the same |
Also Published As
Publication number | Publication date |
---|---|
WO2012018201A2 (en) | 2012-02-09 |
KR101030150B1 (en) | 2011-04-18 |
CN103025682A (en) | 2013-04-03 |
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