WO2012011280A1

WO2012011280A1 - Film forming apparatus

Info

Publication number: WO2012011280A1
Application number: PCT/JP2011/004104
Authority: WO
Inventors: 大園　修司; 一也斎藤
Original assignee: 株式会社アルバック
Priority date: 2010-07-22
Filing date: 2011-07-20
Publication date: 2012-01-26
Also published as: JP2013209675A; TW201209220A

Abstract

Provided is a film forming apparatus which can continuously form a film without causing thermal deformation of a film-shaped base material. A film forming apparatus (1) comprises a chamber (10), a cooling roller (13), a gas supply source (16), and a plurality of catalytic wires (17). The cooling roller (13) is rotated about a rotation axis (13a) to thereby cool a film-shaped base material (F) wound around an outer peripheral surface (13b) and to convey the base material (F) inside the chamber (10). The gas supply source (16) supplies a source gas to the base material (F) wound around the outer peripheral surface (13b), and is disposed facing the outer peripheral surface (13b). The catalytic wires (17) are disposed between the outer peripheral surface (13b) and the gas supply source (16) and can be heated to the decomposition temperature of the source gas. As a result, a film can be continuously formed on the base material (F) while the base material (F) is protected from the heat of the catalytic wires (17).

Description

Deposition equipment

The present invention relates to a film forming apparatus capable of continuously forming a film on a film-like substrate.

Catalytic chemical vapor is used as a film formation method in which a source gas is brought into contact with a catalyst wire in a chamber and decomposition species (deposition species) generated by using a catalytic reaction or thermal decomposition reaction of the source gas are deposited on a film formation substrate. A phase growth method (CAT-CVD: catalytic-Chemical Vapor Deposition) is known. For example, in the following Patent Document 1, a plurality of catalyst wires installed on a top plate of a catalytic CVD chamber are heated by energization, and SiH ₄ and NH ₃ gases are introduced into the catalytic CVD chamber, whereby a SiN film is formed on the substrate. Has been described.

Japanese Patent No. 4035011

In the catalytic chemical vapor deposition apparatus, the shorter the relative distance between the base material and the catalyst wire, the higher the film formation rate and the higher the productivity. However, a base material with low heat resistance such as a plastic film causes thermal deformation, making it difficult to perform desired film formation. Therefore, there is a need for a technique that can efficiently form a film while protecting the substrate from the heat of the catalyst wire.

In view of the circumstances as described above, an object of the present invention is to provide a film forming apparatus capable of continuously forming a film-like substrate without causing thermal deformation.

In order to achieve the above object, a film forming apparatus according to one embodiment of the present invention includes a chamber, a main roller, a gas supply source, and a plurality of catalyst wires.
The main roller has a rotation shaft and an outer peripheral surface around which a film-like base material is wound, and the chamber is rotated around the rotation shaft so as to cool the base material wound around the outer peripheral surface. Carry in.
The gas supply source is for supplying a source gas to the base material wound around the outer peripheral surface, and is disposed to face the outer peripheral surface.
The plurality of catalyst wires are installed between the outer peripheral surface and the gas supply source, and can generate heat at the decomposition temperature of the source gas.

1 is a schematic cross-sectional view of a film forming apparatus according to a first embodiment of the present invention. It is a schematic perspective view of the principal part of the film-forming apparatus shown in FIG. It is a schematic plan view of the principal part of the film-forming apparatus shown in FIG. It is a schematic front view of the principal part of the film-forming apparatus which concerns on the 2nd Embodiment of this invention. It is a schematic perspective view of the principal part of the film-forming apparatus shown in FIG. It is a schematic front view of the principal part of the film-forming apparatus which concerns on the 3rd Embodiment of this invention. It is a schematic perspective view of the principal part of the film-forming apparatus shown in FIG. It is a schematic perspective view of the principal part of the film-forming apparatus which concerns on the 4th Embodiment of this invention.

A film forming apparatus according to an embodiment of the present invention includes a chamber, a main roller, a gas supply source, and a plurality of catalyst wires.
The main roller has a rotation shaft and an outer peripheral surface around which a film-like base material is wound, and the chamber is rotated around the rotation shaft so as to cool the base material wound around the outer peripheral surface. Carry in.
The gas supply source is for supplying a source gas to the base material wound around the outer peripheral surface, and is disposed to face the outer peripheral surface.
The plurality of catalyst wires are installed between the outer peripheral surface and the gas supply source, and can generate heat at the decomposition temperature of the source gas.

In the film forming apparatus, the raw material gas supplied from the gas supply source toward the base material is decomposed by coming into contact with the plurality of heat-generated catalyst wires, and the decomposition species is deposited on the surface of the base material on the main roller. accumulate. The main roller continuously conveys the base material by rotating around the rotation shaft while cooling the base material wound around the outer peripheral surface thereof to prevent thermal deformation of the base material. Thereby, it becomes possible to form a film continuously on the base material while protecting the base material from the heat of the catalyst wire.

The chamber is typically a vacuum chamber that can maintain a reduced pressure atmosphere. Inside the chamber, an unwinding roller for unwinding the base material and a winding roller for winding the base material are installed, and the main roller is on the transport path of the base material from the unwinding roller to the winding roller. Be placed. The arrangement form of the catalyst wire is not particularly limited, but by forming the catalyst wire so as to be opposed to the base material on the main roller in a wide area range, uniform film formation on the base material is possible.

For example, the main roller may be disposed with the rotation axis directed in the horizontal direction. In this case, each of the plurality of catalyst wires is suspended inside the chamber in a state of being folded in the vertical direction, and is arranged at intervals in the horizontal direction.
Thereby, since a catalyst wire can be arrange | positioned along the width direction of the base material wound around the outer peripheral surface of a main roller, the film-forming uniform in the width direction with respect to a base material is attained.

At this time, each of the plurality of catalyst wires may be folded in the vertical direction so as to sandwich the main roller. Thereby, since each catalyst wire can be made to oppose a base material along the peripheral direction of the outer peripheral surface of a main roller, it can form into a film efficiently on the base material on a main roller.

Alternatively, each of the plurality of catalyst wires may be arranged so that both ends connected to the power source face each other in the horizontal direction. Thereby, since a catalyst wire can be arrange | positioned along the width direction of the outer peripheral surface of a main roller, uniform film-forming in the width direction with respect to a base material is attained.

Further, when the main roller is arranged with the rotation shaft directed in the horizontal direction, each of the plurality of catalyst wires extends along the horizontal direction and is spaced in the circumferential direction of the outer peripheral surface. It may be arranged. Thereby, since each catalyst wire can be made to oppose a base material along the width direction and peripheral direction of the outer peripheral surface of a main roller, it can form into a film efficiently on the base material on a main roller.

On the other hand, the main roller may be arranged with the rotation axis in the vertical direction. In this case, each of the plurality of catalyst wires is suspended in the chamber while being folded back in the vertical direction, and is arranged at intervals in the circumferential direction of the outer peripheral surface. Thereby, since each catalyst wire can be made to oppose a base material along the width direction and peripheral direction of the outer peripheral surface of a main roller, it can form into a film efficiently on the base material on a main roller.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

<First Embodiment>
FIG. 1 is a schematic view showing a film forming apparatus according to the first embodiment of the present invention. In the figure, the X-axis direction and the Y-axis direction indicate horizontal directions orthogonal to each other, and the Z-axis direction indicates a vertical direction (vertical direction) orthogonal to the X-axis and Y-axis, respectively. The film forming apparatus 1 according to the present embodiment includes a vacuum chamber 10 and forms a deposited film on the substrate F while transporting the film-like substrate F inside the vacuum chamber 10.

The inside of the vacuum chamber 10 is divided by a partition plate 15 into a first chamber R1 and a second chamber R2. In the first chamber R1, an unwinding roller 11 for continuously unwinding the film-like substrate F and a take-up roller 12 for winding the film-like substrate F are respectively installed. . In the second chamber R2, a cooling roller 13 (main roller) and a film forming source are installed. The first chamber R1 and the second chamber R2 are configured to be evacuated to a predetermined pressure by the vacuum pump P1 and the vacuum pump P2.

The unwinding roller 11 and the winding roller 12 are respectively connected to drive motors (not shown) installed outside the vacuum chamber 10, and can be rotated around

rotation shafts

11a and 12a parallel to the X axis. The unwinding roller 11 supports the roll body of the base material F cut to a predetermined width, and continuously feeds the base material F by rotating in the arrow direction in the figure. The take-up roller 12 takes up the substrate F fed from the take-up roller 11 in a roll shape by rotating in the direction of the arrow in the drawing.

The base material F is not particularly limited as long as it has a flexible film shape. For example, the base material F may be an insulating plastic film such as PET (polyethylene terephthalate), OPP (stretched polypropylene), PPS (polyphenylene sulfite), or the like. A composite plastic film on which a metal film or an insulating film is formed is applicable.

The cooling roller 13 is arranged on the way of transporting the base material F from the unwinding roller 11 to the winding roller 12 in the second chamber R2. The cooling roller 13 has a rotating shaft 13a parallel to the X axis and an outer peripheral surface 13b around which the substrate F is wound. A cooling mechanism in which a cooling medium such as cooling water circulates is provided inside the cooling roller 13, whereby the outer peripheral surface 13 b is cooled to a predetermined temperature or lower.

The rotating shaft 13a of the cooling roller 13 is rotationally driven by a driving motor (not shown) installed outside the vacuum chamber 10. The outer peripheral surface 13 b has a width larger than the width of the base material F, and is in close contact with the non-film-forming surface of the base material F. The cooling roller 13 rotates in the direction indicated by the arrow in FIG. 1 around the rotation shaft 13a, thereby transporting the substrate F in the vacuum chamber 10 while cooling the substrate F wound around the outer peripheral surface 13b. .

The partition plate 15 is formed with an opening through which the base material F can pass. The opening of the partition plate 15 conveys the base material F from the unwinding roller 11 to the cooling roller 13 and the cooling roller. A pair of guide rollers 14 for guiding the conveyance of the base material F from 13 to the take-up roller 12 are provided. The guide roller 14 can adjust the tension applied to the base material F and prevent the formation of wrinkles on the base material F.

The film formation source includes a gas supply source 16 for supplying a raw material gas for film formation, a catalyst wire 17 for decomposing the raw material gas, and a deposition plate 18. The gas supply source 16 includes a plurality of nozzle units 160 arranged along the circumferential direction of the outer peripheral surface 13 b so as to face the base material F on the cooling roller 13. Each nozzle unit 160 includes a nozzle body 161 that discharges the source gas, and a guide tube 162 that surrounds the periphery of the nozzle body 161. The catalyst wire 17 is installed between the outer peripheral surface 13b of the cooling roller 13 and the gas supply source 16, and is formed of a heating element capable of generating heat at the decomposition temperature of the raw material gas. The deposition preventing plate 18 is formed to be bent in a substantially arc shape so as to surround the periphery of the gas supply source 16, and is fixed to the inner surface of the vacuum chamber 10 via the mounting rib 18a. The deposition preventing plate 18 has a function of preventing the deposition material from adhering to the inner wall surface of the vacuum chamber 10.

In the present embodiment, each nozzle unit 160 extends along the axial direction of the cooling roller 13 and is arranged on the inner peripheral surface of the deposition preventing plate 18 with an interval in the circumferential direction. The nozzle body 161 of the nozzle unit 160 has a gas discharge port on the deposition preventing plate 18 side. The gas discharged from the discharge port is reflected by the inner surfaces of the deposition preventing plate 18 and the guide tube 162 toward the cooling roller 13.

In this way, the gas supply source 16 efficiently decomposes the source gas by supplying the source gas uniformly to the catalyst wire 17, and the source material is evenly distributed over the entire film forming surface of the substrate F on the cooling roller 13. Supply gas decomposition species. The number of nozzle units 160 arranged, the arrangement interval, the shape of the guide tube 162, and the like are set as appropriate so that the source gas is uniformly supplied to the catalyst wire 17 and the film formation surface of the substrate F. The deposition preventing plate 18 and the guide tube 162 also have a function as a deposition preventing member that prevents the decomposition species of the source gas from adhering to the discharge port of the nozzle body 161.

The source gas is appropriately selected according to the type of material to be deposited on the substrate F. For example, when forming a silicon (Si) film, a mixed gas of silane (SiH ₄ ) and hydrogen (H ₂ ) is used as a source gas. When forming a silicon nitride film, silane, hydrogen, ammonia (NH ₃ ) or the like is used as a source gas, and when forming a silicon oxide film, silane, hydrogen, oxygen, dinitrogen monoxide, or the like is used. It is done.

The catalyst wire 17 is formed of a metal wire capable of generating heat by Joule heat generated by energization, and is formed of a high melting point metal such as tungsten, molybdenum, or tantalum. The catalyst line 17 is heated to a temperature at which the source gas can be decomposed (for example, 1700 ° C. or higher), thereby thermally decomposing the source gas supplied from the gas supply source 16 and depositing species deposited on the substrate F Is generated. The diameter, length, number, arrangement interval, etc. of the catalyst wires 17 are appropriately set according to the required film quality.

FIG. 2 is a perspective view of the cooling roller 13 and shows an arrangement relationship between the cooling roller 13 and the catalyst wire 17. A plurality of catalyst wires 17 are provided around the cooling roller 13 at regular intervals along the axial direction (X-axis direction) of the cooling roller 13. In the present embodiment, each of the plurality of catalyst wires 17 is suspended inside the vacuum chamber 10 in a state of being folded in the vertical direction (Z-axis direction) so as to sandwich the cooling roller 13. Thereby, the base material F is made to oppose the catalyst wire 17 on the outer peripheral surface 13 b of the cooling roller 13.

As shown in FIG. 1, one end of each catalyst wire 17 is connected to the first power supply terminal 191, and the other end is connected to the second power supply terminal 192. A plurality of first and second

power supply terminals

191 and 192 are installed corresponding to the individual catalyst wires 17 and connected to power supply units (not shown) installed outside the vacuum chamber 10. The power supply method for the catalyst wire 17 is not particularly limited, and may be direct current or alternating current. In the example of FIG. 1, the

power supply terminals

191 and 192 are installed on the partition plate 15 so as to face each other in the Y-axis direction. Instead, the

power supply terminals

191 and 192 are supported and extend in the horizontal direction. A member to be installed may be installed inside the vacuum chamber 10.

Further, the terminal cover 193 is installed in such a way that it penetrates the partition plate 15 from the

power supply terminals

191 and 192 of the first chamber R1 and protrudes toward the second chamber R2. The terminal cover 193 covers the periphery of the side surface of each catalyst wire 17 suspended through the terminal cover 193 over a distance of about 50 mm to 100 mm in the vertical direction in the chamber R2. The terminal cover 193 prevents the source gas from coming into contact with the base of the catalyst wire 17, so that even if the temperature of each catalyst wire 17 changes due to heat radiation from the

power supply terminals

191 and 192, The embrittlement of the catalyst wire 17 can be prevented without generating a reaction product of 17 and the source gas.

The suspension state of each catalyst wire 17 is adjusted such that the distance from the outer peripheral surface 13b of the cooling roller 13 is constant or substantially constant in the circumferential direction of the cooling roller 13. Thereby, the film forming rate on the base material F can be kept constant with respect to the circumferential direction of the cooling roller 13. Further, the power supply terminal 191 and the power supply terminal 192 that respectively support the both ends of the catalyst wire 17 are not limited to being disposed so as to face each other in the direction parallel to the Y axis. For example, as schematically shown in FIG. 3, either one may be arranged shifted in the X-axis direction so as not to face each other. Thereby, the uniformity of the film thickness can be improved in the width direction of the substrate F.

Next, the operation of the film forming apparatus 1 of the present embodiment configured as described above will be described.

The roll body of the base material F is attached to the unwinding roller 11, and the base material F is bridged to the winding roller 12 via the cooling roller 13 and the guide roller 14. Each chamber R1, R2 of the vacuum chamber 10 is evacuated to a predetermined pressure by vacuum pumps P1, P2. Each catalyst wire 17 is energized through

power supply terminals

191 and 192 and is heated to a high temperature of, for example, 1700 ° C. or higher. The cooling roller 13 is cooled to a temperature at which the outer peripheral surface 13b is prevented from being thermally deformed by circulating and supplying a cooling medium therein. The source gas discharged from each nozzle unit 160 of the gas supply source 16 is thermally decomposed by being close to or in contact with the heated catalyst wire 17. The deposited species generated by the thermal decomposition adhere and deposit on the substrate F.

The unwinding roller 11, the winding roller 12, and the cooling roller 13 rotate at respective equal speeds in the directions indicated by the arrows in the drawing around the respective rotating shafts. As a result, the substrate F is continuously fed out from the unwinding roller 11, and after being subjected to a film forming process while being wound around the outer peripheral surface 13 b of the cooling roller 13, the substrate F is wound up onto the winding roller 12.

In this embodiment, since the base material F is maintained in close contact with the outer peripheral surface 13b of the cooling roller 13, thermal deformation due to radiant heat from the catalyst wire 17 is prevented, and stable film formation on the base material F is achieved. Secured. And since film-forming to the base material F is implemented on the cooling roller 13 rotated around the rotating shaft 13a, the film-forming process can be continuously performed on the long film-like base material F, Productivity can be improved.

Further, in the present embodiment, the gas discharge port of the nozzle body 161 constituting the nozzle unit 160 faces the deposition plate 18 side opposite to the cooling roller 13 side. As a result, the source gas is uniformly supplied to the catalyst wire 17 to efficiently decompose the source gas, and the source gas decomposition species is uniformly supplied to the entire film forming surface of the base material F on the cooling roller 13. be able to. In addition, since the probability that the reaction product of the raw material gas generated by the contact with the catalyst wire 17 adheres to the gas discharge port of the nozzle body 161 can be reduced, the supply of the raw material gas from the gas supply source 16 can be performed for a long time. It can be kept stable.

Furthermore, in this embodiment, since the catalyst wire 17 is suspended in the vacuum chamber 10 while being hung down by its own weight, the relative position with respect to the cooling roller 13 due to the extension of the catalyst wire 17 is changed. Therefore, stable film formation can be achieved over a long period of time.

<Second Embodiment>
4 and 5 show a film forming apparatus according to the second embodiment of the present invention. FIG. 4 is a front view of the main part showing the positional relationship between the cooling roller and the catalyst wire, and FIG. It is a perspective view of the principal part which shows. In the present embodiment, the description of the same parts as those of the first embodiment will be omitted or simplified, and different parts from the first embodiment will be mainly described.

As shown in FIG. 1, the film forming apparatus 2 of the present embodiment includes a vacuum chamber having a first chamber R1 and a second chamber R2, a cooling roller 13 installed in the second chamber R2, and a plurality of It has a gas supply source 26 and a plurality of catalyst wires 27.

The gas supply source 26 is disposed to face the outer peripheral surface 13 b of the cooling roller 13. The gas supply source 26 is for supplying source gas to the base material F wound around the outer peripheral surface 13b, and has a plurality of nozzle units 260 configured in the same manner as in the first embodiment. The gas supply sources 26 are arranged on both sides of the cooling roller 13 so as to face each other in the Y-axis direction so as to sandwich the cooling roller 13, and each nozzle unit 260 extends in parallel with the X-axis direction and extends in the Z-axis direction. Are arranged in each. Each nozzle unit 260 is supported by the deposition preventing plate 28.

Each of the catalyst wires 27 is suspended in the vacuum chamber in a state of being folded in the vertical direction (Z-axis direction), and a plurality of the catalyst wires 27 are provided on both sides of the cooling roller 13 in the axial direction (X-axis direction). Are installed at regular intervals. Each catalyst line 27 is installed between the gas supply source 26 and the cooling roller 13 and is heated to a temperature equal to or higher than the decomposition temperature of the source gas. The diameter, length, number, arrangement interval, etc. of the catalyst wire 27 are appropriately set according to the required film formation quality. In the example of FIG. 5, the folding intervals and the arrangement intervals of the catalyst wires 27 are set to be approximately the same size so that the catalyst wires 27 are equally spaced in the width direction of the base material F. Thereby, the uniformity of the film-forming to the base material F can be improved.

Both ends of each of the catalyst wires 27 are arranged so as to face each other in the axial direction (X-axis direction) of the cooling roller 13. Thereby, since the distance between each catalyst line 27 and the cooling roller 13 becomes constant, uniform film formation in the width direction of the base material F is possible. Further, with respect to the conveying direction of the base material F on the cooling roller 13, the catalyst wire 27 located on the upstream side and the catalyst wire 27 located on the downstream side may be arranged to face each other in the Y-axis direction. You may arrange | position so that it may not mutually oppose. Thereby, since the catalyst wire 27 can be arrange | positioned along the width direction of the outer peripheral surface 13b of the cooling roller 13, it becomes possible to aim at the uniformity of a film thickness regarding the width direction of the base material F. FIG.

Also in the film forming apparatus 2 of the present embodiment configured as described above, the same effects as those of the first embodiment described above can be obtained. That is, since the base material F is maintained in close contact with the outer peripheral surface 13b of the cooling roller 13, thermal deformation due to radiant heat from the catalyst wire 27 is prevented, and stable film formation on the base material F is ensured. . Further, since the film formation on the base material F is performed on the cooling roller 13 rotating around the rotation shaft 13a, the film formation processing can be continuously performed on the long film-shaped base material F, Productivity can be improved.

Furthermore, in this embodiment, since the catalyst wire 27 is suspended in the vacuum chamber while being hung down by its own weight, the fluctuation of the relative position with the cooling roller 13 due to the extension of the catalyst wire 27 is suppressed. And stable film formation is possible over a long period of time.

<Third Embodiment>
6 and 7 show a film forming apparatus according to the third embodiment of the present invention. FIG. 6 is a front view of the main part showing the arrangement relationship between the cooling roller and the catalyst wire, and FIG. 7 shows the relationship therebetween. It is a perspective view of the principal part which shows. In the present embodiment, the description of the same parts as those of the first embodiment will be omitted or simplified, and different parts from the first embodiment will be mainly described.

As shown in FIG. 1, the film forming apparatus 3 according to the present embodiment includes a vacuum chamber having a first chamber R1 and a second chamber R2, a cooling roller 13 installed in the second chamber R2, and a gas supply. A source 36 and a plurality of catalyst wires 37 are provided.

The gas supply source 36 is disposed to face the outer peripheral surface 13 b of the cooling roller 13. The gas supply source 36 is for supplying source gas to the base material F wound around the outer peripheral surface 13b, and has a plurality of nozzle units 360 configured in the same manner as in the first embodiment. Each nozzle unit 360 extends in parallel to the X-axis direction and is arranged so as to surround the cooling roller 13 along the circumferential direction of the cooling roller 13. Each nozzle unit 360 is supported by the deposition preventing plate 38.

On the other hand, each of the plurality of catalyst wires 37 extends along the axial direction (X-axis direction) of the cooling roller 13 and is arranged at intervals in the circumferential direction of the cooling roller 13. Each catalyst line 27 is installed between the gas supply source 26 and the cooling roller 13 and is heated to a temperature equal to or higher than the decomposition temperature of the source gas. The diameter, length, number, arrangement interval, etc. of the catalyst wire 37 are appropriately set according to the required film quality.

Both ends of the catalyst wire 37 are connected to power supply terminals (not shown). The power supply terminal may be fixed to the inner wall of the vacuum chamber, or may be fixed to an arbitrary structure installed inside the vacuum chamber. Further, an elastic member such as a spring may be interposed between both ends of the catalyst wire 37 and the power supply terminal. Thereby, the extension of the catalyst wire 37 due to its own weight or heat is absorbed by the elastic member, and the shape change due to the deflection of the catalyst wire 37 can be suppressed.

Also in the film forming apparatus 3 of the present embodiment configured as described above, the same effects as those of the first embodiment can be obtained. That is, since the base material F is maintained in close contact with the outer peripheral surface 13b of the cooling roller 13, thermal deformation due to radiant heat from the catalyst wire 37 is prevented, and stable film formation on the base material F is ensured. . Further, since the film formation on the base material F is performed on the cooling roller 13 rotating around the rotation shaft 13a, the film formation processing can be continuously performed on the long film-shaped base material F, Productivity can be improved.

<Fourth Embodiment>
FIG. 8 is a perspective view of the main part showing the positional relationship between the cooling roller and the catalyst wire in the film forming apparatus according to the third embodiment of the present invention. In the present embodiment, the description of the same parts as those of the first embodiment will be omitted or simplified, and different parts from the first embodiment will be mainly described.

As shown in FIG. 1, the film forming apparatus 4 of the present embodiment includes a vacuum chamber having a first chamber R1 and a second chamber R2, a cooling roller 43 installed in the second chamber R2, a gas supply A source and a plurality of catalyst wires 47.

In the present embodiment, the cooling roller 43 has a cylindrical shape having a rotating shaft 43a arranged along the vertical direction (Z-axis direction), and the base material is wound around the outer peripheral surface thereof. Although not shown, the gas supply source is for supplying the source gas to the base material F wound around the outer peripheral surface of the cooling roller 43, and includes a plurality of nozzle units configured in the same manner as in the first embodiment. Have. Each nozzle unit extends in parallel to the Z-axis direction and is arranged so as to surround the cooling roller 43 along the circumferential direction of the cooling roller 13.

Each catalyst wire 47 is installed between the gas supply source and the cooling roller 43, and is heated to a temperature equal to or higher than the decomposition temperature of the raw material gas. The wire diameter, length, number, arrangement interval and the like of the catalyst wire 47 are appropriately set according to the required film formation quality. In the example of FIG. 8, the folding interval and the arrangement interval of the catalyst wires 47 are set to the same size so that the catalyst wires 47 are equally spaced with respect to the longitudinal direction (conveying direction) of the base material F. Thereby, the uniformity of the film-forming to the base material F can be improved.

In the present embodiment, each catalyst wire 47 is suspended inside the vacuum chamber in a state of being folded in the vertical direction (Z-axis direction), and is installed at a certain interval along the circumferential direction of the cooling roller 43. Has been. Thereby, since each catalyst wire 47 can be made to oppose a base material along the width direction and the circumferential direction of the outer peripheral surface of the cooling roller 43, film formation can be efficiently performed on the base material on the cooling roller 43. .

Also in the film forming apparatus 4 of the present embodiment configured as described above, the same operational effects as those of the first embodiment can be obtained. That is, thermal deformation of the base material due to radiant heat from the catalyst wire 47 is prevented, and stable film formation on the base material F is ensured. In addition, since the film is formed on the base material on the cooling roller 43 that rotates around the rotation shaft 43a, the film forming process can be continuously performed on the long film-like base material. Can be improved.

Furthermore, in this embodiment, since the catalyst wire 47 is suspended in the vacuum chamber while being hung down by its own weight, the fluctuation of the relative position with the cooling roller 43 due to the extension of the catalyst wire 47 is suppressed. And stable film formation is possible over a long period of time.

As shown in FIG. 8, the length of the catalyst wire 47 is set so that the folded portion 47 a of the catalyst wire 47 is located below the lower end of the cooling roller 43. On the other hand, only the straight portion of the catalyst wire 47 can be opposed. Thereby, the film-forming material particles activated by the catalyst wire 47 can be radiated almost uniformly on the substrate in terms of density.

As mentioned above, although embodiment of this invention was described, this invention is not limited to this, A various deformation | transformation is possible based on the technical idea of this invention.

For example, in the above-described embodiment, the case where a silicon-based thin film such as a silicon film, a silicon oxide film, or a silicon nitride film is formed has been described as an example. It is.

It is also possible to configure a film forming apparatus by combining the above-described embodiments. For example, a film forming apparatus in which the catalyst wire described in the first embodiment and the catalyst wire described in the second embodiment and / or the third embodiment are mixed may be configured.

DESCRIPTION OF

SYMBOLS

1, 2, 3, 4 ... Film-forming apparatus 10 ...

Vacuum chamber

13, 43 ... Cooling

roller

13a, 43a ... Rotating shaft 13b ... Outer

peripheral surface

16, 26, 36 ...

Gas supply source

17, 27, 37, 47 ... Catalyst wire F ... Base material

Claims

A chamber;
A rotating shaft and an outer peripheral surface around which the film-like base material is wound, and the substrate wound around the outer peripheral surface is conveyed in the chamber while being cooled by rotating around the rotating shaft. A main roller configured in
A gas supply source for supplying a source gas to the base material, which is disposed to face the outer peripheral surface and is wound around the outer peripheral surface;
A film forming apparatus comprising a plurality of catalyst wires installed between the outer peripheral surface and the gas supply source and capable of generating heat at a decomposition temperature of the source gas.
The film forming apparatus according to claim 1,
The main roller is disposed with the rotating shaft directed in the horizontal direction,
Each of the plurality of catalyst wires is suspended in the chamber in a state of being folded back in the vertical direction, and is deposited in the horizontal direction at intervals.
The film forming apparatus according to claim 2,
Each of the plurality of catalyst wires is a film forming apparatus that is folded in a vertical direction so as to sandwich the main roller.
The film forming apparatus according to claim 2,
Each of the plurality of catalyst wires has both end portions connected to a power source, and the both end portions face each other in the horizontal direction.
The film forming apparatus according to claim 1,
The main roller is disposed with the rotating shaft directed in the horizontal direction,
Each of the plurality of catalyst wires extends in the horizontal direction, and is a film forming apparatus that is arranged at intervals in the circumferential direction of the outer peripheral surface.
The film forming apparatus according to claim 1,
The main roller is arranged with the rotation axis directed in the vertical direction,
Each of the plurality of catalyst wires is suspended in the chamber in a state of being folded in the vertical direction, and is deposited in the circumferential direction of the outer peripheral surface at intervals.
The film forming apparatus according to claim 1,
The gas supply source is:
A plurality of nozzle units arranged in the circumferential direction of the outer peripheral surface;
A film forming apparatus including an adhesion preventing member surrounding the plurality of nozzle units.
The film forming apparatus according to claim 7,
Each of the plurality of nozzle units has a gas discharge port on the deposition member side.