WO2012008372A1

WO2012008372A1 - Heat-insulating die and production method thereof

Info

Publication number: WO2012008372A1
Application number: PCT/JP2011/065668
Authority: WO
Inventors: 鳥井　秀雄; 真也小島; 鈴木　孝芳
Original assignee: 神戸セラミックス株式会社
Priority date: 2010-07-12
Filing date: 2011-07-08
Publication date: 2012-01-19
Also published as: JPWO2012008372A1; TW201210789A; JP4966437B2; TWI477381B

Abstract

Provided is a die comprising a heat insulating layer which does not require a post-treatment, enables a higher level of uniformity in thickness, and has a superior adherence property to the die. Disclosed are a heat-insulating die and a production method thereof, wherein the die has a heat-insulating layer between a metal die base and a metal film configuring a molding surface, and the heat-insulating layer is made of a porous body in which ferrite crystal particles are connected in a three-dimensional mesh form.

Description

Thermal insulation mold and manufacturing method thereof

The present invention relates to a heat insulating mold used for resin molding of, for example, optical elements and precision parts, and a manufacturing method thereof.

Various resin molded products are manufactured by, for example, a resin injection molding method in which a molten resin is injected into a molding space formed between a fixed die, which is a molding die, and a movable die. In the case of injection molding, which is a typical molding method for resin molding, as soon as the molten resin is injected into the molding space of the mold, the heat of the molten resin quickly moves to the mold and comes into contact with the mold. The surface of the molten resin is rapidly cooled and solidified, and proceeds to the inside to complete the molding.

In recent years, more complicated or finer shapes are required for resin molded products. For this reason, in resin molding, a three-dimensional microfabrication pattern of a mold molding surface processed into a complicated or fine shape is required, and the microfabrication pattern needs to be faithfully transferred to a resin molded product. is there. However, in molds with fine grooving, the surface of the molten resin begins to solidify before the molten resin reaches the back (deep part) of the groove during injection molding, and the mold surface cannot be accurately transferred. May end. In order to realize accurate transfer, methods of improving molding conditions such as a method of increasing the injection pressure of the molten resin and a method of increasing the injection speed can be considered during resin molding. There is a limit.

For this reason, the following two things are more strongly demanded. In other words, in the mold, the temperature of the charged resin is not lowered so that the viscosity of the resin suitable for molding is maintained until the mold molding surface can be sufficiently transferred to the charged resin. Is to do. The other is that once the predetermined shape can be transferred, the heat held by the molten resin in the mold is immediately released through the mold and the temperature of the resin is lowered to cause solidification. As a technical means for these, after improving the transferability by heating the entire mold before injection molding, it is possible to immediately cool the entire mold and solidify the transferred resin to release the mold, It is necessary to add a large-scale heating / cooling facility for the entire mold to the resin molding apparatus, which is not appropriate in terms of cost and energy.

Therefore, as a device for gently controlling the temperature drop of the mold during resin molding, a heat insulating layer made of various substances having lower thermal conductivity than the mold material is provided in the vicinity of the molding surface of the mold. Has been proposed (see, for example, Patent Document 1).

On the other hand, in the case of a resin molded product as an optical element that requires particularly high precision, a material having high mechanical strength and a highly accurate heat insulating layer thickness are required as a heat insulating layer for the mold during the molding. For this reason, there has been proposed a method in which a ceramic material having high mechanical strength is used and not formed into a plate shape and bonded to a mold, but directly formed as a film on the mold base material. Thermal spraying is adopted as an optimum method for forming this film. The thermal spraying method melts or softens the coating material by heating with plasma, etc., accelerates and sprays at a high speed into fine particles, collides with the surface of the object to be coated, solidifies and deposits the flattened particles, It is a coating technology that forms a film. Using this technique, it has been proposed to use a ceramic material having low thermal conductivity and high mechanical strength, particularly a film formed by spraying zirconia, as a heat insulating film of a conventional mold (for example, Patent Document 2). In FIG. 24, the conventional heat insulation metal mold | die described in patent document 2 is shown. In FIG. 24, a heat insulating mold 101 is composed of a mold base material 102, a heat insulating film (heat insulating layer) 105, and a metal film layer 108 having a precision processed surface 107a. In particular, the heat insulating film 105 is characterized in that it is a heat insulating film made of a sprayed film of a ceramic material such as zirconia.

Japanese Patent No. 3382281 Patent No. 4135304

However, it is difficult to form a uniform thickness in a heat insulating film made of a thermal spray film as in the prior art, and further improvement is required. Generally, in order to enable precise transfer in a heat insulating mold, it is necessary that the heat insulating property of the molding surface of the mold is as homogeneous as possible. Therefore, it is necessary that the thickness of the heat insulating layer is uniform. On the other hand, it is difficult to make the sprayed film uniform when a heat insulating film of a mold for imparting a more precise shape than conventional is formed by a spraying method. For example, in the case of a small mold base material, when a heat insulating film is formed on the surface of a flat mold base material, the sprayed film on which the ceramic fine particles are sprayed on the surface of the mold base material is The thickness of the sprayed film tends to be different at the outer peripheral portion. Therefore, by forming a metal plating film on the surface of the sprayed coating that is considerably thicker than usual, and machining the thick plated film precisely, the surface that has changed due to the formation of the sprayed coating is corrected by processing, and as a heat insulating mold Used. However, even in this case, since the thickness of the heat insulating film at the central portion and the outer peripheral portion of the molding surface is different, strictly speaking, the heat insulating property varies depending on the location of the surface of the molding surface.

On the other hand, the following method has been proposed to make the heat insulation of the mold more uniform. For example, in the case of a mold having a molding surface with a high degree of flatness, a sprayed film that is thicker than the target thickness is formed in the sprayed film forming process, and then this is subjected to machining such as grinding and cutting. By adopting a process that uniformly processes the thickness of the sprayed coating formed on the surface of the mold base, it is possible to achieve uniform heat insulation on the mold molding surface during molding and to achieve more accurate resin molding. I have to.

However, since the added machining process is a process for precisely processing a sprayed film having high hardness, it involves difficulty and labor. Further, in the sprayed film, internal stress distortion may occur in the sprayed film in the sprayed film forming stage or the subsequent processing stage. When such an internal stress distortion occurs, cracks and the like are generated in the sprayed film, resulting in a fatal defect such as peeling of the sprayed film, which greatly impedes the molding process.

Further, in the case where the molding die has a deep concave portion, a concave portion similar to the molding surface is formed in advance on the molding surface side of the mold base material located below the heat insulating film, and a uniform thickness is formed thereon. It is necessary to form a heat insulating film. However, as described above, the thermal spraying method is a method of forming a film by spraying a high-velocity high-velocity fluid with a high degree of molten fine particles onto the surface to be formed. It is increasingly difficult to coat with a large thickness.

As described above, in the conventional technology that relies on the thermal spraying method for the formation of the heat insulating film, when a high precision is used for a mold that is required for molding, the film formed by the thermal spraying cannot be used as it is, and its hardness is reduced. A process for post-processing a high sprayed film to a uniform thickness by precision machining is required. In particular, in the case of a mold having a complex deep recess, a spraying method in which fine particles that have directionality and fly at high speed accumulate and form a film, accurately trace the shape of the recess and have a uniform thickness. It is difficult to form a film as follows. Even if the film can be formed by tracing the concave portion, the sprayed film is difficult to have a uniform thickness over the entire mold, and thus the post-machining process described above is necessary. On the other hand, post-processing which is indispensable in these processes has a risk of giving internal stress distortion to the sprayed film, and if such distortion is given, there is a risk of causing cracking, peeling, etc. of the sprayed film.

Therefore, the main object of the present invention is to provide a mold having a heat insulating layer that does not require post-processing, has a uniform thickness compared to the prior art, and has excellent adhesion to the mold. It is in.

As a result of intensive studies in view of the problems of the prior art, the present inventors have found that the above object can be achieved by employing a metal oxide formed by a hydrothermal synthesis reaction as a heat insulating layer. It came to be completed.

That is, this invention relates to the following heat insulation metal mold | die and its manufacturing method.
1. A metal mold having a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, wherein the heat insulating layer is a porous structure in which ferrite crystal particles are formed in a three-dimensional network. A heat insulating mold characterized by comprising a solid body.
2. The ferrite has the following general formula A _x Fe _3-x O ₄ (where A represents at least one metal element that can be substituted for the Fe site constituting the spinel-type iron oxide crystal, and x is 0 ≦ x <1 Meet)
Item 2. The heat-insulating mold according to Item 1, which is a compound having a spinel-type crystal structure represented by:
3. Item 3. The heat insulating mold according to Item 2, wherein A is at least one of Ca, Zn, Mn, Al, Cr, Li, and Mg.
4). Item 2. The heat insulating mold according to Item 1, wherein the heat insulating layer has a porosity of 5 to 75%.
5. The heat insulation metal mold | die of the said claim | item 1 whose thickness of a heat insulation layer is 15 micrometers or more.
6). Item 2. The heat insulating mold according to Item 1, wherein the heat insulating layer has a Vickers hardness of Hv130 to Hv560.
7. A heat insulating layer is generated by reacting 1) the surface of a metal mold base or 2) the surface of a metallic layer previously formed on the surface of the mold base with an aqueous solution or water dispersion containing a metal component. Item 2. The heat insulation mold according to Item 1, wherein the heat insulation mold is prepared.
8). Item 2. The heat insulating mold according to Item 1, wherein the metal film includes at least 1) a seed layer including a plating catalyst formed on the heat insulating layer, and 2) a metal plating film formed on the seed layer.
9. Item 2. The heat insulating mold according to Item 1, which is used for molding a composition containing a resin component.
10. A method of manufacturing a mold having a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, and as a step of forming the heat insulating layer, 1) the surface of the metal mold base material Or 2) including a step of generating a metal oxide by reacting a surface of a metallic layer previously formed on the surface of the mold base material with an aqueous solution or water dispersion containing a metal component. Production method.
11. Item 11. The method according to Item 10, comprising: 1) a step of forming a seed layer containing a catalyst on the heat insulating layer; and 2) a step of forming a metal plating film on the seed layer as the metal film forming step. .
12 Item 12. The method according to Item 11, wherein the seed layer is formed by sputtering or plating.
13. In the state in which the reaction is 1) the surface of the metal mold base material or 2) the surface of the metal layer previously formed on the mold base material is in contact with the treatment liquid obtained by mixing the metal salt, alkali and water. Item 11. The method according to Item 10, comprising a heat treatment at a temperature of 85 ° C or higher.
14 Item 14. The method according to Item 13, wherein the heat treatment is performed in an environment of a saturated water vapor pressure of 100 to 200 ° C or higher.
15. Item 11. The method according to Item 10, wherein the reaction is performed in the presence of a reducing agent.

According to the present invention, it is possible to provide a mold having a heat-insulating layer that does not require post-processing, has a uniform thickness compared to the prior art, and has excellent adhesion to the mold. Thereby, especially when resin molding is performed, a complicated molding surface can be accurately transferred, and a precise molding can be freely produced.

In particular, in the mold of the present invention, the heat insulating layer can be formed by a wet reaction (particularly hydrothermal synthesis reaction) using the material that is the base of the heat insulating layer as a starting material. In this case, a heat insulating layer having a relatively uniform thickness can be formed along the surface shape of a metal mold or the like as a base. Thereby, since the surface shape of the mold base material can be traced (reproduced) more faithfully, a molded body having a dense structure can be manufactured relatively freely. In other words, when a molten resin is used as the molding material, the molten state is effectively maintained during molding, so that the molten resin can be distributed throughout the fine grooves on the molding surface. Shape) can be faithfully reproduced.

Moreover, since the heat insulation layer is formed integrally with the metal mold etc. by the hydrothermal synthesis reaction, the risk of dropping, peeling, etc. due to cracks, internal stress, etc., as in the conventional sprayed film is greatly reduced. As a result, it is possible to further increase the production efficiency of the resin molded body.

Furthermore, in the above-described resin molding, by intentionally changing the thickness of the heat insulating layer of each fine region in the heat insulating mold, the heat retention and cooling properties of the fine region of the mold forming surface through which the molten resin flows can be improved. It can be finely controlled. As a result, resin molding of a molded product having a more complicated uneven shape can be expected. In this case, it is required that the material for forming the heat insulating layer can be easily processed, but the heat insulating film of the present invention is excellent in machinability, so that it is necessary to partially control the heat dissipation of the mold surface during resin molding. In this case, for example, a resin to be injected at the time of molding by cutting only a necessary portion with respect to the heat insulating film formed to have a uniform thickness on the entire surface of the heat insulating mold surface of the present invention. It becomes possible to control the heat flow or cooling of the glass more precisely.

Such a mold of the present invention is particularly suitable for the production of a resin molded body. Therefore, it is useful for manufacturing optical materials (lenses, prism sheets, light guide plates, optical disks such as CD / DVD disks, and other recording media), for example.

It is a schematic sectional drawing of the heat insulation metal mold | die in Example 2 of this invention. It is a figure which shows the preparation process of the heat insulation metal mold | die in Example 2 of this invention. It is an X-ray-diffraction pattern figure of the heat insulation film | membrane in Example 2 of this invention. It is a schematic sectional drawing of the sample for heat insulation evaluation provided with the heat insulation film in Example 2 of this invention. It is a schematic sectional drawing of the sample for heat insulation evaluation provided with the conventional heat insulation film | membrane. It is a schematic sectional drawing of the comparative sample of the heat insulation evaluation which does not have a heat insulation film. It is a schematic block diagram of the measuring apparatus for evaluating the heat insulation of the heat insulation film | membrane of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the heat insulation film in Example 2 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the heat insulation film in Example 2 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the conventional heat insulation film | membrane. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the conventional heat insulation film | membrane. It is a schematic sectional drawing of the heat insulation metal mold | die in Example 3 of this invention. It is a figure which shows the preparation process of the heat insulation metal mold | die in Example 3 of this invention. It is a schematic sectional drawing of the sample for heat insulation evaluation of the same structure as the heat insulation metal mold | die in Example 3 of this invention. It is a schematic sectional drawing of the comparative sample for heat insulation evaluation which does not have a heat insulation film. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the heat insulation film in Example 3 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the heat insulation film in Example 3 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the heat insulation film in Example 3 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the heat insulation film in Example 3 of this invention. It is a schematic perspective view of the heat insulation metal mold | die in Example 6 of this invention. It is sectional dimension drawing of the processing pattern of the metal mold | die base material in Example 6 of this invention. It is a X-ray-diffraction pattern figure of the heat insulation film | membrane which contains zinc in the composition in Example 5 of this invention. It is a schematic sectional drawing of the heat insulation metal mold | die in Example 7 of this invention. It is a schematic sectional drawing of the conventional heat insulation metal mold | die. It is a figure which shows the process example in the case of shape | molding molten resin using this invention metal mold | die. It is a schematic sectional drawing of the heat insulation metal mold | die in Example 1 of this invention. It is a figure which shows the preparation process of the heat insulation metal mold | die in Example 1 of this invention. It is an X-ray-diffraction pattern figure of the heat insulation film | membrane A in Example 1 of this invention. It is a figure which shows the scanning electron microscope image of the grinding | polishing surface of the heat insulation film | membrane A in Example 1 of this invention. It is a figure which shows the grinding | polishing cross section of the heat insulation film | membrane A in Example 1 of this invention. It is a figure which shows the scanning electron microscope image of the grinding | polishing surface of the heat insulation film | membrane B in Example 1 of this invention. It is a schematic sectional drawing of the sample for heat insulation evaluation of the same structure as the heat insulation metal mold | die in Example 1 of this invention. It is a schematic sectional drawing of the comparative sample for heat insulation evaluation which does not have a heat insulation film. It is a schematic block diagram of the measuring apparatus for evaluating the heat insulation of the heat insulation film | membrane of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the heat insulation film in Example 1 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the heat insulation film in Example 1 of this invention. It is a figure which shows the scanning electron microscope image of the grinding | polishing surface of the heat insulation films C, D, and E in Example 4 of this invention. It is an X-ray diffraction pattern figure of the heat insulation film | membrane which contains calcium in the composition in Example 5 of this invention. It is a figure which shows the scanning electron microscope image of the grinding | polishing surface of the heat insulation film | membrane which contains calcium in the composition in Example 5 of this invention. It is a figure which shows the measuring method of the porosity of the heat insulation layer of this invention. It is a figure which shows the scanning electron microscope image of the heat insulation film | membrane A surface in Example 1 of this invention. It is a figure which shows the scanning electron microscope image of the heat insulation film | membrane surface which contains calcium in the composition in Example 5 of this invention. It is a schematic sectional drawing of the heat insulation metal mold | die in Example 8 of this invention. It is a figure which shows the preparation process of the heat insulation metal mold | die in Example 8 of this invention. It is the schematic of the reaction container used in Example 8 of this invention. It is a X-ray-diffraction pattern figure of the heat insulation film | membrane in Example 8 of this invention. It is a figure which shows the scanning electron microscope image of the heat insulation film | membrane surface in Example 8 of this invention. It is a figure which shows the scanning electron microscope image of the grinding | polishing surface of the heat insulation film in Example 8 of this invention. It is an X-ray-diffraction pattern figure of the heat insulation film | membrane G in Example 9 of this invention. It is a figure which shows the scanning electron microscope image of the heat insulation film | membrane G surface in Example 9 of this invention. It is a figure which shows the scanning electron microscope image of the grinding | polishing surface of the heat insulation film | membrane G in Example 9 of this invention. It is an X-ray-diffraction pattern figure of the heat insulation film | membrane H in Example 9 of this invention. It is a figure which shows the scanning electron microscope image of the heat insulation film | membrane H surface in Example 9 of this invention. It is an X-ray-diffraction pattern figure of the heat insulation film | membrane I in Example 9 of this invention. It is a figure which shows the scanning electron microscope image of the heat insulation film | membrane I surface in Example 9 of this invention. It is a schematic sectional drawing of the sample for thermal insulation evaluation which has arrange | positioned the heat insulation film | membrane G. FIG. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the heat insulation film | membrane G in Example 9 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the heat insulation film | membrane G in Example 9 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature rising of the sample for heat insulation evaluation provided with the heat insulation film | membrane I in Example 9 of this invention. It is a figure which shows the heat insulation evaluation result at the time of temperature fall of the sample for heat insulation evaluation provided with the heat insulation film | membrane I in Example 9 of this invention. It is a X-ray-diffraction pattern figure of the heat insulation film | membrane from which a composition differs in Example 10 of this invention.

1, 31, 51, 101, 201, 1001, 2001 Insulating

mold

2, 32, 52, 102, 202, 1002, 1012, 2002, 2012

Mold base material

3, 13, 203, 1003, 1013, 2003, 2013 Thermal

insulation film underlayer

4, 14, 34, 44, 54, 104, 114, 204, 1004, 2004, 2014 Thermal insulation film (thermal insulation layer)
5, 15, 55, 115, 205, 1005, 2005, 2015

Seed layer

6, 16, 36, 46, 56, 116, 206, 216, 246, 1006, 1016, 2006, 2016

Plating undercoat film

7, 37, 47 57, 207, 247, 1007, 2007

Microfabricated metal film

7a, 37a, 57a, 107a, 207a, 1007a, 2007a Precision machined

surface

8, 18, 38, 58, 108, 208, 118, 218, 1008, 1018, 2008, 2018

Metal film layer

11, 41, 111, 211, 241, 341, 441, 1011A, 1011B, 1211, 2011G,

2011I Measurement sample

12, 42, 112, 212, 242, 1012

Base material

12a, 112a, 212a, 1012a Thermocouple mounting

holes

17, 117 217,1017 plated

metal film

18, 118, 218 thermocouple 2021 suspension 2022 insulation film forming apparatus 2023 Aline condenser 2024 reactor

1. Heat-insulating mold The heat-insulating mold of the present invention (the mold according to the present invention) is a mold having a heat-insulating layer between a metal mold base material and a metal film constituting the molding surface, It is characterized by comprising a porous body in which ferrite crystal particles are formed in a three-dimensional network.

As described above, the mold of the present invention has a basic structure of a) metal mold base material / heat insulating layer / metal film or b) metal mold base material / metallic layer / heat insulating layer / metal film. However, other layers may be included as necessary. Hereinafter, the configuration of each layer will be described.

In the present specification, unless otherwise specified, “metal” includes not only a metal simple substance but also an alloy and an intermetallic compound.

Metal mold base metal The metal mold base material only needs to be made of metal, and may be the same material as that used in known or commercially available molds. Examples thereof include metals such as iron, aluminum, and copper (metal simple substance), alloys such as carbon steel, stainless steel, copper alloy, and titanium alloy. Further, the metal mold base material may be either a melted material or a sintered body. In particular, in the present invention, it is preferable to use an iron-based metal as a metal mold base material because of the advantage that a ferrite layer as a heat insulating layer can be formed directly on the surface of the iron-based metal. That is, it is preferable to use at least one iron-based metal of metallic iron and iron alloy. It does not specifically limit as an iron alloy, For example, carbon steel, stainless steel (SUS), chromium molybdenum steel etc. can be used suitably.

Further, the molding surface side of the metal mold base material may be either a flat surface or a curved surface, and may be a reversing mold of a fine shape to be imparted to the final molded body. It can comprise suitably according to the shape of the molded object to perform. For example, in particular, when the mold requires a deep recess (groove), an inverted mold having a shape to be transferred to the molding surface in advance or a similar shape (concave) is formed on the molding surface side of the metal mold base material. May be.

Metal film The metal film should just be comprised from the metal, and may be the same as the material employ | adopted as the molding surface of a well-known or commercially available metal mold | die. Examples thereof include metals such as iron, nickel, copper, and chromium, alloys such as nickel phosphorus alloys, nickel boron, nickel tungsten phosphorus alloys, nickel copper phosphorus alloys, and the like.

Further, the metal film may be composed of a single layer or multiple layers. For example, in order to further improve the adhesion (bondability) between the heat insulating layer and the metal film, the metal film has a two-layer structure of a first metal film and a second metal film, and between the heat insulating layer and the second metal film. A first metal film may be interposed as an adhesive layer (underlayer). More specifically, a configuration including 1) a seed layer including a plating catalyst formed on the heat insulating layer and 2) a metal plating film formed on the seed layer can be employed. That is, as a seed layer, a layer made of a metal that can be a catalyst during plating of the upper metal plating film is adopted, and the metal plating film is formed while using it as a catalyst. A film can be formed. In this case, it is possible to effectively form a strong metal film regardless of the material constituting the heat insulating layer. In the above-described case, a finely processed metal film having a finely processed surface as a layer constituting the molding surface can be formed on the second metal film as the third metal film.

The formation method of the metal film is not particularly limited, and can be appropriately selected from known methods according to the metal species to be employed, the composition of the underlying layer, and the like. For example, plating methods such as electrolytic plating and electroless plating (liquid phase growth method); chemical vapor deposition methods such as thermal CVD, MOCVD, and RF plasma CVD; sputtering methods, ion plating methods, MBE methods, and vacuum deposition methods Various known thin film forming methods such as physical vapor deposition methods such as the above can be appropriately employed in combination of one or more.

When the metal film has a multilayer structure, the formation method of each layer may be different, and any of the above-described thin film formation methods can be used in appropriate combination. For example, when the first metal film as the adhesive layer (underlying layer) and the second metal film formed thereon are formed as described above, each layer can be formed by the following method. it can. For example, 1) A seed layer (first metal film) containing a plating catalyst (metal catalyst) formed by a sputtering method is formed on the heat insulation layer, and metal plating is performed on the seed layer by a plating method using the catalyst. A film (second metal film) can be suitably formed. Furthermore, when it has further a microfabricated metal film as a 3rd metal film, a micromachined metal film can be formed by the plating method on the metal plating film which is the said 2nd metal film. By taking such a structure, the joining strength of a heat insulation layer and a metal membrane | film | coat can be raised more.

The thickness of the metal film in the mold of the present invention (total thickness of each layer in the case of a multilayer structure) is not particularly limited, but is usually about 20 to 300 μm, and preferably 50 to 150 μm. What is necessary is just to set the thickness of each layer in the case of a multilayer structure suitably according to the number of layers, the material of each layer, etc.

Heat Insulating Layer The heat insulating layer (also referred to as “heat insulating film”) in the mold of the present invention is formed between a metal mold base material and a metal film constituting the molding surface. As a result, it is possible to effectively suppress or prevent the phenomenon in which the heat of the molten molding material is rapidly taken away by the metal mold base material.

In the present invention, the heat insulating layer is composed of a porous body in which ferrite crystal particles are formed in a three-dimensional network. As a material of the heat insulating layer, by adopting ferrite among metal oxides, it is possible to obtain higher heat insulating properties and to exhibit high adhesion to the metal mold or metallic layer which is the base. Can do.

The structure of the porous body is formed by connecting ferrite crystal particles in a three-dimensional network. For example, as shown in FIG. 42, a porous body is formed from a three-dimensional network structure in which a plurality of polyhedral crystal grains that are not rounded and have one or more corners are connected. Further, as shown in FIG. 42, it is preferable that communication holes are formed in the porous body. The ferrite crystal particles may be twins or may be a series of crystals. The ferrite crystal particles constituting the porous structure preferably have a spinel crystal structure.

In the present invention, the ferrite has the following general formula A _x Fe _3-x O ₄ (where A represents at least one metal element that can be substituted for the Fe site constituting the spinel-type iron oxide crystal, and x represents 0 It is preferable that the compound has a spinel type crystal structure represented by ≦ x <1.

Since x is 0 ≦ x <1, the case of x = 0, that is, the case of iron ferrite (that is, spinel-type iron oxide Fe ₃ O ₄ ) is included, and a part of the Fe site is replaced with other parts. The composition may be substituted with a metal element.

As described above, A is not limited as long as it is at least one metal element that can be substituted for the Fe site constituting the spinel-type iron oxide crystal, but Ca, Zn, Mn, Al, Cr, Li, and Mg are not particularly limited. It is desirable to be at least one of these. Therefore, in the present invention, a composition in which the A component is at least one of Ca, Zn, Mn, Al, Cr, Li, and Mg may be used. Such a composition itself may be any known one, for example, Ca _0.5 Fe _2.5 O ₄ , ZnFe ₂ O ₄ , MnFe ₂ O ₄ , AlFe ₂ O ₄ , CrFe ₂ O ₄ , Li can be mentioned _0.5 Fe _2.5 O _4, MgFe least one such ₂ O _4.

The thermal expansion coefficient of the heat insulation layer is not particularly limited, but the metal mold is used under severe conditions where the temperature rises and falls severely, so the thermal expansion coefficient of the heat insulation layer is the same as that of the metal mold. A closer value is desirable in terms of durability. Therefore, the thermal expansion coefficient of the heat insulating layer is preferably in the range of 90 to 110% of the thermal expansion coefficient of the metal mold used particularly at a high molding temperature of 200 ° C. or higher.

Although the porosity of the heat insulating layer is not limited, it is usually preferably in the range of about 5 to 75%, particularly 40 to 60% from the viewpoint that higher heat insulating performance can be achieved. The porosity can be controlled by synthesis conditions such as synthesis temperature and raw material concentration. The measuring method of the porosity in the present invention is based on the method shown in the examples described later.

The hardness of the heat insulating layer can be appropriately set according to the type of material to be molded, etc., but in general, the Vickers hardness (average value) is preferably Hv 130 to Hv 560, particularly preferably Hv 200 to Hv 400.

In the present invention, the metal oxide is preferably conductive. When forming the heat insulation layer which has electroconductivity, the metal-plating base layer for forming the metal film layer which performs the fine process of a shaping | molding surface can be formed on a heat insulation layer with an electroplating method. This makes it possible to form the plating base layer relatively easily. In this case, the conductivity of the oxide constituting the heat insulating layer is not particularly limited, but usually the conductivity at 25 ° C. may be 40 S / m or more.

The content of the metal oxide in the heat insulating layer is preferably as high as possible from the viewpoint of the heat insulating property and adhesion, but usually 90% by weight or more is preferable in the heat insulating layer, and particularly 98% by weight or more. More preferred.

Further, the thickness of the heat insulating layer may be appropriately set according to the type of molding material to be used, desired heat insulating properties, etc., but can generally be set within a range of 15 μm or more. In particular, it is preferably 15 to 1000 μm, more preferably 30 to 150 μm. By setting the thickness of the heat insulating layer within the above range, it is possible to more effectively trace the base mold shape (base material surface) with a uniform film thickness.

The heat-insulating layer of the present invention comprises: 1) the surface of a metal mold base material or 2) the surface of the metal layer previously formed on the surface of the mold base material containing an aqueous solution or water dispersion (hereinafter “ What is also produced by reacting with a "treatment solution") (wet reaction, particularly hydrothermal synthesis reaction) can be suitably used. As a result, while maintaining the same level of thermal insulation as the conventional thermal insulation layer, excellent film thickness uniformity, adhesion, etc. can be exhibited, and as a result, the underlying mold shape (concave shape) is accurately reproduced (trace) It becomes possible to obtain the effect of being able to.

The reaction with the treatment liquid can also be carried out under conditions such as a known wet reaction (hydrothermal synthesis reaction). Preferably, 2. According to the method described in 1.

Metallic layer The heat insulating layer in the mold of the present invention may be formed directly on the surface of the metal mold base material, but a metallic layer (heat insulating film base layer) is interposed as the base layer of the heat insulating layer. May be. In this case, it is desirable that the metallic layer be formed between the surface of the metal mold base material and the heat insulating layer in contact with both.

Further, the composition of the metallic layer is not particularly limited as long as it is composed of metal, and the metal exemplified in the above metal film can be used. In the present invention, it is particularly preferable to include a metal element constituting the composition of the heat insulating layer. That is, since the heat insulating layer of the present invention can be suitably formed by a hydrothermal synthesis reaction, a growth nucleus of the heat insulating layer can be formed on the surface of the metallic layer while dissolving the surface of the metallic layer serving as a base. , It is possible to form a heat insulating layer that is homogeneous and has strong adhesion with the core. Therefore, for example, when forming a ferrite layer in which the heat insulating film is iron oxide, it is desirable to have a metallic layer containing metallic iron (particularly a metallic layer made of metallic iron).

In the present invention, the metallic layer may be composed of a single layer or may be composed of multiple layers. For example, 1) a metal layer composed of a seed layer and a metal plating film, and 2) a metal layer composed of one or more layers of the metal plating film can be adopted as the metal layer.

Therefore, for the formation of the metal, the thin film formation method exemplified in the formation of the metal film can be appropriately employed depending on the configuration of the metal layer and the like. For example, 1) a method including a step of forming a seed layer on the surface of a metal mold base material by sputtering and a step of forming a metal plating film on the seed layer by a plating method, and 2) of a metal mold base material A method including a step of forming a metal plating film on the surface by a plating method can be employed.

The thickness of the metallic layer may be appropriately set according to the type of metallic element constituting the metallic layer, the thickness of the heat insulating layer, etc., but it is usually within a range of about 1 to 5 μm.

Molding material Although the material (molding material) used for the heat insulation metal mold | die of this invention is not restrict | limited, Especially it is suitable for shaping | molding of the composition (especially the resin composition which has a resin component as a main component) containing a resin component. For example, it can be suitably used for resin molding. Resin components (especially synthetic resins) include polyethylene, polypropylene, polystyrene, polyvinyl chloride, polymethyl methacrylate, polyamide, polycarbonate, ABS resin, polyethylene terephthalate, polytetrafluoroethylene, and other polycycloolefins. Etc. can be mentioned as a preferable example. Other components may also be included in the composition as necessary.

Use of heat insulating mold The heat insulating mold of the present invention can be used in the same manner as known or commercially available molds. Moreover, the molding conditions and the like when molding using a mold can be carried out according to a known method.

When molding using the mold of the present invention, the mold of the present invention can be used as a part or all of the molding space of the mold. For example, when molding is performed by injection molding in a molding space formed by two molds, a fixed mold and a movable mold, the mold of the present invention can be adopted as at least one of the fixed mold and the movable mold. Moreover, it is possible to carry out molding using the mold of the present invention simply by replacing a part or all of a commercially available mold (molding apparatus) with the mold of the present invention.

FIG. 25 shows a schematic diagram of a process example in which the mold of the present invention is used as a movable mold in a mold composed of a fixed mold and a movable mold. In FIG. 25, a mold composed of a fixed mold 301 and a movable mold 401 is used as the molding apparatus. After the resin R is injected and introduced into the space (molding space) between the fixed mold and the movable mold in a molten state, the resin R is cooled while maintaining the pressure as shown in the figure. Thereafter, the movable mold 401 is lowered, the mold is opened, the mold is released, and then a desired molding resin is recovered. In this case, the mold of the present invention is adopted as the movable mold 401, and a predetermined shape is given to the molding surface of the mold of the present invention. And, by the heat insulating layer of the mold of the present invention, even when the molten resin is injected and introduced into the molding space of the mold, the unevenness imparted to the molding surface without the heat of the molten resin being rapidly taken away by the mold Alternatively, as a result of the molten resin all over the groove, the shape is faithfully transferred to the resin side. Thereby, a molded product in which a fine shape is accurately reproduced can be obtained.

2. Manufacturing method of heat insulation metal mold | die This invention metal mold | die can be suitably manufactured especially with the following method. That is, a method of manufacturing a mold having a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, and as a step of forming the heat insulating layer, 1) a metal mold base material Or 2) a step of generating a metal oxide by reacting the surface of a metallic layer previously formed on the surface of the mold base material with an aqueous solution or aqueous dispersion (treatment liquid) containing a metal component. The method of including can be employ | adopted suitably.

As the treatment liquid, an aqueous solution or a water dispersion containing a metal component can be suitably used. As the metal component, a component that can form a ferrite crystal may be adopted, and at least one of Fe, Ca, Zn, Mn, Al, Cr, Li, and Mg is particularly desirable. For the preparation of the aqueous solution or aqueous dispersion, for example, a compound serving as a supply source of a metal component can be used. For example, a metal salt, a metal oxide, a metal hydroxide, or the like can be used. For these, any of water-soluble (water-soluble) or poorly water-soluble metal compounds can be used, but in the present invention, a water-soluble metal compound can be more suitably used.

The concentration of the metal component in the treatment liquid can be appropriately set according to the type of metal component to be used, reaction conditions, etc., but it is usually preferably 0.03 to 0.35 g / mL.

The reaction can be carried out according to a known wet reaction method, and for example, any of a method of immersing in a processing solution, a method of applying a processing solution by spraying, or the like can be employed. In particular, in the present invention, it is preferable to carry out the hydrothermal synthesis reaction using the treatment liquid. The hydrothermal synthesis reaction condition itself may be a known method, but it is particularly preferable to carry out the following method. That is, as the hydrothermal synthesis reaction, 1) a metal mold base material surface or 2) a metal layer surface previously formed on the mold base material is a treatment liquid in which a metal salt, alkali and water are mixed. It is preferable to employ a method including a step of heat-treating in an environment of a saturated water vapor pressure of 100 to 200 ° C. or higher while in contact with

In the above hydrothermal synthesis reaction, it is preferable to use a treatment liquid obtained by mixing a metal salt, an alkali and water. The mixing method is not particularly limited, and the blending order is not limited.

As the metal salt, at least one of an inorganic acid salt and an organic acid salt can be used. As the inorganic acid salt, for example, sulfate, carbonate, chloride and the like can be used. Moreover, acetate, an oxalate, etc. can be used as organic acid salt.

Further, the alkali is not particularly limited, and for example, at least one of sodium hydroxide, potassium hydroxide, ammonia and the like can be used.

The treatment liquid may be a metal salt or alkali dissolved in water or a partly dissolved solution. Moreover, the thing (suspension (water dispersion)) disperse | distributed without melt | dissolving a metal salt or an alkali may be sufficient. In this case, the content of the metal salt in the treatment liquid is generally preferably 0.03 to 0.35 g / mL, although it depends on the type of metal salt used. The alkali is generally 0.05 to 0.18 g / mL, although it depends on the type of alkali used.

In the present invention, the reaction with the treatment liquid can also be carried out in the presence of a reducing agent. By using a reducing agent, it is possible to form a more excellent heat insulating film by suppressing or preventing the production of trivalent iron ions in the reaction system. Therefore, the reducing agent is not limited as long as it can suppress or prevent the production of trivalent iron ions, and can be appropriately selected from known reducing agents. For example, compounds known as antioxidants such as ascorbic acid and hydroquinones can be suitably used. In the present invention, it is preferable to contain a reducing agent in the treatment liquid (particularly, the reducing agent is dissolved in the treatment liquid).

In the present invention, the treatment liquid is brought into contact with 1) the surface of a metal mold base material or 2) the surface of a metal layer previously formed on the mold base material. That is, the treatment liquid is applied to the region where the heat insulating layer is to be formed. The method of providing is not particularly limited, and can be performed according to a known method such as dipping or coating. As a usage amount of the treatment liquid, it is preferable to give a sufficient amount for forming a predetermined heat insulating layer. Therefore, in this invention, the method of immersing the site | part which should form a heat insulation layer in a process liquid can be employ | adopted suitably, for example.

The conditions for reacting with the treatment liquid are not particularly limited as long as ferrite can be generated. In particular, when a hydrothermal synthesis reaction is performed as a reaction with the treatment liquid, the temperature and pressure conditions are preferably heat treatment in an environment of a saturated water vapor pressure of 100 to 200 ° C. (particularly 110 to 200 ° C.) or higher. . A predetermined heat insulation layer can be suitably formed by heat-treating under such temperature and pressure. Such temperature and pressure conditions can be set using a known device such as an autoclave device (sealed system).

Further, the time for reacting with the treatment liquid (reaction time for hydrothermal synthesis reaction) can be appropriately adjusted according to the desired thickness of the heat insulating layer. That is, the reaction may be continued until the heat insulating film having the preferred thickness is formed. In order to obtain a heat insulating film having a uniform thickness with a desired thickness, the reaction is usually performed for 2 to 12 hours in the case of hydrothermal synthesis reaction. What is necessary is just to form by the method of repeating reaction within the range several times.

In the production method of the present invention, the above-described 1. Therefore, it is preferable to use an iron-based metal as the metal base material or the metallic layer. By reacting the iron-based metal surface with the treatment liquid (particularly, hydrothermal synthesis reaction), a ferrite layer as a heat insulating layer can be suitably formed. For example, when iron ferrite (when x = 0) is generated, according to the hydrothermal synthesis reaction of the present invention, ferrite can be generated from iron through the following steps 1) to 2).
1) Fe ²⁺ + OH ⁻ → Fe (OH) ₂ , 2) Fe (OH) ₂ → Fe ₃ O ₄

As an embodiment of the manufacturing method of the present invention, there are various variations depending on the layer structure, and these are all included in the present invention.
For example, when hydrothermal synthesis reaction (or normal wet reaction) is used: 1) A process of forming a heat insulation film on the metal mold base material by a hydrothermal synthesis reaction (wet reaction), sputtering on the surface of the heat insulation film A method including a step of forming a seed layer by a method and a step of forming a metal film layer by contact with the seed layer by a plating method. 2) Under a heat insulating film by a plating method or a sputtering method on an upper layer of a metal mold base material. A step of forming a base layer, a step of forming a heat insulating film by a hydrothermal synthesis reaction (wet reaction) on the surface of the heat insulating film base layer, a step of forming a seed layer by a sputtering method on the surface of the heat insulating film, and A method comprising a step of forming a metal film layer in contact with a plating method by plating,
3) A step of forming a heat insulating film underlayer by plating or sputtering on the upper layer of a metal mold base material, a step of forming a heat insulating film by a hydrothermal synthesis reaction (wet reaction) on the heat insulating film underlayer, and heat insulation A method comprising a step of forming a base adhesion film of a metal film layer by contact with an upper surface of the film by an electroplating method or a sputtering method, and a step of forming a metal film layer by a plating method in contact with the upper surface of the base film of the metal film layer ,
These are all included in the production method of the present invention.

Hereinafter, the features of the present invention will be described more specifically with reference to examples. However, the scope of the present invention is not limited to the examples.

Example 1
In FIG. 26, sectional drawing of the layer structure of the heat insulation metal mold | die in a present Example is shown. The heat insulating mold 1001 is a mold used for molding a resin part having a precise finely processed shape. This uses pure copper having high thermal conductivity as the material of the mold base material, and has the following layer structure. That is, an iron sulfate plating bath is formed on the surface of a mold base material 1002 having a height of 15.0 mm and a diameter of 20.0 mm from a bottom surface having a collar portion (diameter: 25.0 mm) having a height of 2.5 mm. The heat insulating film base layer 1003 made of an iron film having a film thickness of 3 μm is disposed, and a heat insulating film 1004 made of iron ferrite (that is, spinel iron oxide) having a thickness of 50 μm is further formed thereon, and a palladium catalyst is formed thereon. A seed layer 1005 made of a fine particle film is disposed, and a metal film layer 1008 is formed thereon. The metal film layer 1008 is made of a plating base film 1006 (thickness 1 μm) made of nickel and a microfabricated metal film 1007 (average thickness 6 μm) made of an amorphous nickel-phosphorus alloy film formed thereon. It is configured. On the molding surface side of the microfabricated metal film 1007 is a precision machined surface 1007a in which a micropattern for press molding of a molded part having a maximum depth of 3 μm is formed by machining.

According to the above configuration, by using an oxide material that is a metal oxide (spinel type iron oxide) with low thermal conductivity and has pores as a heat insulating layer, it is possible to perform good resin molding with a fine pattern. Become. In other words, as seen in the prior art, the heat of the hot molten resin that is molded on the molding surface of the metal mold escapes through the mold substrate, so that the resin is more than necessary during molding. It is possible to effectively avoid a resin molding defect caused by a temperature drop.

In FIG. 27, the example of a manufacturing process of the heat insulation metal mold | die 1001 of this invention is shown. A heat insulating film base layer 1003 made of an iron film having a thickness of 3 μm was formed on the surface of the mold base 1002 on the molding surface side using an iron sulfate plating bath (FIG. 27 (1)). Subsequently, a heat insulating film 1004 made of spinel iron oxide having a thickness of 50 μm was formed on this surface (FIG. 27 (2)). The heat insulating film 1004 was formed as follows. That is, an aqueous solution in which 41.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) was dissolved in 60 ml of water produced by distillation in nitrogen gas was mixed with 60 ml of a 21.6 g aqueous solution of sodium hydroxide (NaOH). To prepare a suspension. The suspension was placed in a stainless steel autoclave reaction vessel having an internal volume of 200 ml, and the mold base material on which the heat insulating base layer 1003 was formed was immersed therein and held using a jig. The mold base material 1002 was previously masked with a sealing tape made of ethylene tetrafluoride except for the molding surface on which the heat insulating base layer 1003 was formed. The above operation was performed in a nitrogen gas atmosphere. The autoclave reaction vessel was heated from the outside to react at 150 ° C. for 10 hours. After the reaction, the mold base material was taken out together with the jig, and washed sufficiently with water in order to separate from the powder compound of the reaction residue produced at the same time. The autoclave reaction vessel was also washed with water in order to remove the reaction residue produced in the same manner, and again the same amount of suspension was prepared as above, and the mold base material was attached together with the jig. For 10 hours to form a heat insulating film 1004 having a thickness of 50 μm.

Thus, after the metal mold | die with which the heat insulation film | membrane 1004 was formed was washed with water and fully dried, by using the direct current | flow sputtering apparatus which attached the target of palladium, by forming the palladium fine particle film | membrane on the surface of the heat insulation film | membrane 1004, A seed layer 1005 was formed (FIG. 27 (3)). Next, a plating base film 1006 made of a nickel film having a thickness of 1 μm was coated by an electroless nickel plating method. Furthermore, a metal film layer 1008 is formed by forming a microfabricated metal film 1007 made of a nickel phosphorus alloy plating film for precision processing having a thickness of 6 μm by an electroless nickel plating method, and heat-treated at 200 ° C. for 3 hours (FIG. 27 (4)). Thereafter, a precision machining surface 1007a was formed using a precision cutting machine to obtain a heat insulating mold 1001 for a fine machining die (FIG. 27 (5)).

In addition, although the example of the method by a plating method was described in the present Example as a formation method of the heat insulation film | membrane base layer 1003 which consists of an iron film formed on the surface of the metal mold | die base material 1002, as a foundation | substrate of a heat insulation film, a heat insulation film | membrane is described. A metal film made of a metal element that forms the heat insulating film may be provided immediately below. Further, the method for forming the metal film is not limited to the plating method described in this embodiment. For example, this iron film may be formed directly on the surface of the mold base material by a sputtering method.

According to the above process, the heat insulating film of the present invention is different from the mold using the conventional zirconia sprayed film as the heat insulating film, and does not require post-processing such as precision grinding, and the molding surface of the metal mold. The desired thickness can be formed directly on the side.

For the heat insulating film 1004, for the purpose of confirming whether a film of a desired material is formed or not, a rectangular substrate (size: 50 mm length, 20 mm width) of the same material (pure copper) as the mold base material 1002 is separately provided. A thickness of 2.0 mm) was prepared, and a heat insulating film was formed using this substrate. The obtained sample was used as the heat insulation film A, and the material was evaluated in detail. A method for producing the heat insulating film A will be described below. First, a similar heat insulating film foundation layer was formed on the surface of the substrate in the same manner as in the step of manufacturing the heat insulating mold 1001 (FIG. 27). Thereafter, in the same manner as the heat insulating film 1004 of the heat insulating mold 1001, suspensions of the same composition prepared with the same mixing ratio and the same composition are used, the same autoclave reaction vessel is used, and the same hydrothermal synthesis condition is 150 ° C. The reaction for 10 hours was further repeated 5 times (6 times in total) to produce a heat insulating film A having a thickness of 150 μm. Here, the reason why the film that is thicker than that used for the mold is formed is that, in addition to the composition and crystal structure necessary for specifying the material of the heat insulating film, the porosity and Vickers hardness described later are the same sample. This is to evaluate at the same time.

The film thus formed on the substrate was a black film. The composition of the film was examined using a fluorescent X-ray apparatus. As a result, it was found that the metal ion was a compound having a composition composed only of iron. Furthermore, the crystal structure was examined by X-ray diffraction analysis. As a result, it was found that the lattice constant a ₀ = 8.40Å was spinel iron oxide (= iron ferrite), Fe ₃ O ₄ . That is, it was confirmed that the heat insulating film 1004 was spinel iron oxide. The X-ray diffraction pattern is shown in FIG. Further, FIG. 41 shows a scanning electron microscope image of the surface after the heat insulating film A is formed. It can be seen that the film structure has a three-dimensional network structure with sharp corners and continuous crystal grains of different sizes. Furthermore, if you observe closely, it is a film in which the crystal grains that appear to be twin crystals are continuously grown in three dimensions, and it is a porous film that has numerous pores inside the film. I understand that.

Ferrite ceramics, a type of iron-based oxide, is a material that is easy to machine into complex shapes, such as cutting, and is a material that is finely processed and used as the core material of magnetic heads. is there.

The heat insulating film of the present invention is an iron ferrite material having the same spinel crystal structure as the above ferrite ceramic material, and is a material that is relatively easy to machine. Therefore, for the heat insulating film A formed in this example, when the surface is polished gradually from the surface, when the film sample is observed with a scanning electron microscope, not only the pores opened on the film surface in the heat insulating film, It was found that there were many closed pores. Therefore, after forming the heat insulation film A, the porosity is determined by a simple method of forming a smooth surface by surface polishing and measuring the existence ratio of pores to the entire smooth surface including pores formed by polishing. It was measured.

First, a sample having a smooth polished surface necessary for measuring the porosity was prepared as follows. Using the 1000th polishing sheet, the surface of the heat insulating film A was roughly polished from the film surface to a depth of about 30 to 50 μm. Next, this rough polished surface was hand-polished using a No. 4000 wrapping film sheet made of an aluminum oxide fine powder abrasive to prepare a sample having a polished surface for measuring porosity.

Next, in order to extract the measurement region of the porosity of the heat insulating film A, the smooth polished surface is observed with a scanning electron microscope (SEM), and the degree of surface roughness looks average over the entire sample. Four square areas each having a side of 150 μm were extracted from a wide range of the entire sample surface.

For each of the four square regions extracted by SEM observation, as shown in FIG. 40 (a), using a non-contact surface roughness measurement method using a laser microscope, the length is 150 μm and the width is 150 μm. The unevenness shape in the depth direction of the square region was measured. The magnification of the laser microscope at this time was 2000 times. Next, an image of the cross section of the straight portion of the upper lateral side (length: 150 μm) of this square region is cut out, and the uneven profile is measured with a laser microscope in the obtained uneven profile depth profile (FIG. 40B). The ratio of the sum of the horizontal distances of the concave portions having a depth of 5 μm from the surface to the total distance of 150 μm (FIG. 40C) is obtained, and the percentage is the ratio of the pores existing on the measurement line, that is, the porosity. Pa ₁ was set.

Similarly, six straight lines connecting both ends can be drawn at intervals of 25 μm with a length of 150 μm parallel to the upper side of the square area. The porosity corresponding to the portion was obtained, and the values of the respective porosity Pa ₁ to Pa ₇ obtained from these seven linear portions were arithmetically averaged to obtain the porosity Pa of the square region.
About the heat insulation film | membrane A, the porosity Pa, Pb, Pc, and Pd of the square area | region of 150 micrometers of one side each mentioned above were calculated | required, respectively, and the porosity P of the heat insulation film | membrane A was computed from those arithmetic mean values. The porosity is displayed as a value in increments of 5% in consideration of measurement errors in sampling of the measurement region, and is set as a porosity value P of the heat insulating film A.

As a result, it was found that the porosity of the heat insulating film A was 55%. FIG. 29 shows a scanning electron microscope image of the polished surface of the heat insulation film A whose porosity was measured in this way.

Furthermore, the Vickers hardness of the heat insulation film A was measured using a Vickers hardness meter. The Vickers hardness meter used was equipped with a regular quadrangular pyramid diamond indenter, and the hardness was measured under a test load of 50 g. About the sample of the heat insulation film | membrane used for the measurement, the film | membrane cross section of each heat insulation film | membrane sample used for the measurement of a porosity was measured so that it might be hard to be influenced by the hardness of the base material which is the foundation | substrate of a heat insulation film | membrane. Each of the cross sections of the heat insulating film was polished by the same method as in the porosity measurement, and the smooth cross section was used as the surface for Vickers measurement. A polished cross section of the heat insulation film A is shown in FIG. There were many polished smooth surface areas that could be evaluated by indenting a diamond indenter for measurement, and Vickers hardness could be measured. The measurement was performed by pushing a Vickers indenter into any 12 locations in a region consisting of a smooth surface dispersed in the surface of the polished cross section shown in FIG. As a result, the heat insulating film A synthesized under exactly the same reaction conditions as the heat insulating film 1004 had a Vickers hardness of a maximum value Hv407, a minimum value Hv190, and an average value Hv257.

Next, a heat insulation film sample B having a porosity different from that of the heat insulation film sample A was tried by selecting a synthesis condition different from the hydrothermal synthesis condition of the heat insulation film sample A having a porosity of 55%.

Formation of the heat insulation film B was performed as follows. That is, an aqueous solution obtained by dissolving 10.4 g of ferrous sulfate (FeSO ₄ .7H ₂ O) in 60 ml of water produced by distillation in nitrogen gas, and an aqueous solution similar to the alkaline aqueous solution used for the synthesis of the heat insulating film A A suspension was prepared by mixing 60 ml of an aqueous solution of 21.6 g of sodium hydroxide (NaOH). Using this suspension as a starting material, the same reaction vessel as the synthesis of the heat insulating film A was used, and a sample base material in which a heat insulating base layer (iron film similar to the heat insulating base layer 1003 of the heat insulating mold 1001) was formed was prepared. It was immersed and held using a jig. The above operation was performed in a nitrogen gas atmosphere. This autoclave reaction vessel was heated from the outside to react at 140 ° C. for 12 hours. After the reaction, the sample substrate was taken out together with the jig, and washed sufficiently with water in order to separate from the powder compound of the reaction residue at the same time. Similarly, the autoclave reaction vessel was washed with water in order to remove reaction residues, and again the same amount of suspension was prepared as above, and the mold base material was attached together with the jig. Reacted for hours. By repeating this operation eight times in total, a heat insulating film B having a film thickness of 150 μm was formed.

The heat insulating film B thus obtained was also a black film. About the film | membrane, it carried out similarly to the heat insulation film | membrane A, and investigated the composition, the crystal structure, and the porosity. As a result, the heat insulating film B was also spinel type iron oxide Fe ₃ O ₄ having the same lattice constant a ₀ = 8.40 Å as that of the heat insulating film A. In addition, the surface of the heat insulating film B after the film formation is observed in a scanning electron microscope (SEM), as in the case of the heat insulating film A, the crystal grains that look like twin crystals with sharp corners are continuously three-dimensionally. The film was a grown film, and the film was a porous film having innumerable pores inside the film.

As in the case of the heat insulation film A, the porosity and Vickers hardness of the heat insulation film B were measured. As a result, the porosity was 40%, and the Vickers hardness was a maximum value Hv435, a minimum value Hv239, and an average value Hv298. FIG. 31 shows a scanning electron microscope image of the polished surface of the heat insulation film B whose porosity was measured.

Evaluation of heat insulation About the same layer structure as the heat insulation metal mold | die of this invention, the heat insulation performance of the said 2 types of heat insulation film | membrane A and the heat insulation film | membrane B was evaluated.

Measurement samples

1011A and 1011B for thermal insulation evaluation made of the same material and the same configuration including the thermal insulation film A or B were produced. FIG. 32 shows a schematic cross-sectional configuration diagram of a measurement sample 1011A in which the heat insulation film A is arranged. The measurement sample 1011B is the same as the configuration shown in FIG. 32 except that the material of the heat insulating film is the heat insulating film B. The measurement sample 1011A was produced as follows. First, a round bar made of the same material as the mold base material 1002 used in the heat insulating mold 1001 of the present embodiment having a diameter of 10.0 mm and a length of 44.0 mm is prepared, and a diameter of 3.5 mm is provided at the center of one end face thereof. Then, a thermocouple mounting hole 1012a having a depth of 22.0 mm was formed, and a metal rod 1012 was produced. Using this base material 1012, a manufacturing method similar to the method shown in FIG. 27 is made of an iron film having a thickness of 3 μm from the bottom of the end face at a position opposite to the end face with the thermocouple mounting hole 1012 a to a position of 30.0 mm. A heat insulating film base layer 1013 was formed, and a heat insulating film 1014 made of the heat insulating film A of the present invention having a thickness of 50 μm was formed thereon. Subsequently, resin masking is performed from the end face with the thermoelectric mounting hole 1012a thereon, and a seed layer 1015 made of an ultrathin palladium catalyst fine particle film is formed from the bottom of the end face to a position of 23.0 mm by a sputtering method. A plating base film 1016 (thickness 1 μm) made of nickel is formed thereon by electroless nickel plating, and further, a plating metal made of an amorphous nickel phosphorus alloy film 6 μm thick by electroless nickel plating thereon A film 1017 was formed, and a metal film layer 1018 composed of a plating base film 1016 and a plating metal film 1017 was formed.

Measurement sample 1011B is a measurement sample produced by forming a heat insulating film made of heat insulating film B in place of heat insulating film 1014 made of heat insulating film A in measurement sample 1011A shown in FIG.

For comparison of thermal insulation evaluation, a comparative sample 1211 having no thermal insulation film was also produced. The structure of this comparative sample is shown in FIG. A base material 1212 processed in the same shape and with the same material as that of the base material 1012 was prepared. Resin masking was applied to the end face side having the thermocouple mounting hole 1212a, leaving a position of 23.0 mm from the bottom of the end face. Thereafter, a 1 μm-thick plating base film 1216 made of a nickel plating film is formed by a wood strike bath, and an amorphous nickel phosphorus alloy film having a thickness of 6 μm is formed thereon by electroless nickel plating in the same manner as described above. A plated metal film 1217 was formed, and a metal film layer 1218 was formed. In this way, a measurement sample 1211 was produced.

The three types of

measurement samples

1011A, 1011B, and 1211 thus produced were simultaneously evaluated for heat insulation properties as follows.

FIG. 34 shows a schematic cross-sectional view of the thermal insulation evaluation device 21 used in this example. This apparatus is made of a rigid foamed polystyrene resin holding a constant temperature water tank 22 for high temperature water, a constant temperature water tank 23 for cold water, and three

measurement samples

1011A, 1011B, and 1211, both of which are made of a transparent glass beaker. The heat insulating plate 1024 has a size (square, size 20 cm) that can cover the top surface of the thermostatic water tank and can be used as a lid, and is 5 mm thick. An electric heater 25 is disposed below the constant temperature water tank 22 for high-temperature water, and has a structure that can be heated. Next to that, a constant temperature water tank 23 for cold water is placed on a table 26 so as to have the same height. In the heat insulating plate 1024, three through-holes with a diameter of 10.0 mm are formed at equal intervals, and the measurement sample is such that 20 mm from the end surface of the measurement sample exits from the heat insulating plate 1024 at the portion where each metal film layer is formed. 1011A, 1011B, and 1211 are arranged. Each measurement sample has

thermocouples

18, 118, 218 attached to thermocouple attachment holes provided on the other end face, and is connected to each

temperature indicator

19, 119, 219 for each measurement. It is the structure which can display the temperature of the base material of the metal round bar which comprises a sample. In order to reduce the influence of the outside air temperature on the temperature measurement result, in each of the

measurement samples

1011A, 1011B, and 1211, the upper part connected to the thermocouple is completely hidden from the upper side of the heat insulating plate 24. Further, they were covered with

heat insulating covers

27, 28, 29 made of styrene foam resin having exactly the same shape. High temperature water and cold water were used in the two constant

temperature water tanks

22 and 23 so that the 15 mm portions were immersed from the lower end surfaces of the three types of

measurement samples

1011A, 1011B, and 1211 attached to the heat insulating plate 24, respectively. . During the measurement, the constant-temperature water tank 22 for high-temperature water was adjusted using an electric heater 25 so that the water temperature was constant, and the constant-temperature water tank 23 for cold water was used while maintaining a constant water temperature by replacing the cold water.

The heat insulating property evaluation of the heat insulating film of the present invention is performed using three

measurement samples

1011A, 1011B, and 1211 that are kept at room temperature in high-temperature water maintained at 95 ° C. in the constant temperature water tank 22 of the heat insulating evaluation device 21. The heat insulation effect at the time of temperature rise was investigated by immersing at the same time with attaching to the heat insulation board 1024, and measuring the speed of the temperature rise. Subsequently, the

measurement samples

1011A, 1011B, and 1211 that have risen in temperature are directly attached to the heat insulating plate 24 while being immersed in water kept at 32 ° C. in the constant temperature water bath 23, and the rate of temperature drop is measured by measuring the rate of temperature drop. The heat insulation effect was investigated.

In FIG. 35, the thermal insulation film of the present invention is provided in comparison with the measurement sample 1211 having no thermal insulation film with respect to the time change of the temperature rise when immersed in the constant temperature water bath 22 kept at 95 ° C. from room temperature. As the measurement results of the measurement sample 1011A (porosity 55%) and 1011B (porosity 40%), the time change of the temperature rise and the time change of the temperature difference between the two measurement samples are shown. FIG. 36 shows the measurement result of the time change of the temperature drop when the

measurement samples

1011A, 1011B, and 1211 once heated are immersed in a constant temperature water bath maintained at 32 ° C. at the same time.

As is apparent from the results of FIGS. 35 and 36, it can be seen that the heat insulating film of the present invention has an effect of making it difficult to transfer heat to the base material against an external temperature change. Further, it can be seen that the heat insulation effect becomes higher as the measurement sample is provided with a heat insulating film having a higher porosity.

Example 2
In FIG. 1, sectional drawing which shows the laminated structure of the heat insulation metal mold | die in a present Example is shown. The heat insulating mold 1 is a stainless steel mold used for molding a resin part having a precise finely processed shape, and has the following layer structure. That is, a 3 μm thick iron is formed on the surface of a mold base 2 having a height of 15.0 mm and a diameter of 20.0 mm from a bottom surface having a brim shape (diameter 25.0 mm) having a height of 2.5 mm. A heat insulating film base layer 3 made of a film is formed, a heat insulating film 4 made of iron ferrite (that is, spinel iron oxide) having a thickness of 150 μm is formed thereon, and a seed layer 5 made of a catalyst fine particle film of palladium is formed thereon. The metal film layer 8 is formed thereon. The metal film layer 8 is composed of a plating base film 6 (thickness 2 μm) made of nickel and a microfabricated metal film 7 (average thickness 60 μm) made of an amorphous nickel-phosphorus alloy film formed thereon. Has been. The molding surface side of the microfabricated metal film 7 is a precision machined surface 7a on which a micropattern for press molding of a molded part is formed by machining.

Production of the heat insulating mold of this example was performed in the same manner as in Example 1. An example of the manufacturing process is shown in FIG. A heat insulating film base layer 3 made of an iron film having a thickness of 3 μm was formed on the surface of the mold base 2 on the molding surface side using an iron sulfate plating bath. Subsequently, a heat insulating film 4 made of spinel iron oxide having a thickness of 150 μm was formed on the surface. The heat insulating film 4 was formed as follows. First, an aqueous solution in which 41.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) is dissolved in 60 ml of water produced by distillation in nitrogen gas is mixed with 60 ml of a 21.6 g sodium hydroxide (NaOH) aqueous solution. Thus, a suspension was prepared as a treatment liquid. The suspension was placed in a stainless steel autoclave reaction vessel having an internal volume of 200 ml, and the mold base material on which the heat insulating base layer 3 was formed was immersed therein and held using a jig. This mold base material was masked in advance with a tetrafluoroethylene sealing tape except for the molding surface on which the heat insulating base layer 3 was formed. The above operation was performed in a nitrogen gas atmosphere. The autoclave reaction vessel was heated from the outside to react at 150 ° C. for 10 hours. After the reaction, the mold base material was taken out together with the jig and washed sufficiently with water in order to separate from the powder compound produced at the same time. Similarly, the autoclave reaction vessel was washed with water to remove the generated powder, and again the same amount of suspension was prepared as above, and the mold base material was attached together with the jig. For 10 hours. By repeating this operation six times in total, a heat insulating film 4 made of spinel iron oxide having a film thickness of 150 μm was formed.

In this way, the mold on which the laminated film is formed is washed with water and sufficiently dried, and then a direct-current sputtering apparatus equipped with a palladium target is used to form a palladium fine particle film on the surface of the heat insulating film 4. A seed layer 5 was formed. Next, a plating base film 6 made of a nickel film having a thickness of 2 μm was coated by an electroless nickel plating method. Further, a metal film layer 8 was formed by forming a microfabricated metal film 7 made of a nickel phosphorus alloy plating film for precision processing having a thickness of 150 μm by an electroless nickel plating method, and then heat-treated at 200 ° C. for 3 hours. Next, the heat-insulating mold 1 for a microfabrication mold was obtained by forming the precision-machined surface 7a using a precision cutting machine.

In addition, for the purpose of confirming whether or not a film of a desired material is formed on the heat insulating film 4, a square plate (size: 18.0 mm square with a thickness of 2 with the same material as the mold base material 2) is separately provided. 0.0 mm), and in the step of manufacturing the heat insulating mold 1 described above, a similar heat insulating film base layer was formed. Thereafter, in the step of forming the heat insulating film 4 of the heat insulating mold 1, the square plate sample is put in the same autoclave reaction vessel together with the heat insulating mold 1, and simultaneously with the heat insulating film 4, A heat insulating film was formed. For the film formed on the square plate, the same material evaluation as in Example 1 was performed. From the result of the composition analysis of the fluorescent X-ray apparatus and the result of the analysis of the X-ray diffraction pattern (FIG. 3) obtained by X-ray diffraction, the heat insulating film 4 is the same as the heat insulating film 1004 shown in the first embodiment. It was confirmed that the spinel-type iron oxide Fe ₃ O ₄ had a lattice constant a ₀ = 8.40 Å. Further, the porosity of the heat insulating film 4 was 55%, and the Vickers hardness Hv was a maximum value 410, a minimum value 180, and an average value 265.

Evaluation of thermal insulation For the purpose of evaluating the thermal insulation performance of the thermal insulation mold having the above-described configuration of the present invention, a measurement sample 11 for thermal insulation evaluation including the same material and the same configuration including the thermal insulation film of the present invention was produced. The schematic cross-sectional configuration diagram is shown in FIG. This measurement sample 11 was produced as follows. First, a round bar made of the same material as the mold base material 2 used in the heat insulating mold 1 having a diameter of 9.5 mm and a length of 45.0 mm was prepared, and a diameter of 3 at the center of one end face thereof. A thermocouple mounting hole 12a having a depth of 5 mm and a depth of 22.0 mm was formed. Further, for the purpose of improving the adhesion of the heat insulating film formed thereon, a concave and convex groove having a pitch of 125 μm and a depth of 15 μm was formed on the entire side surface of the round bar to prepare a metal round bar base 12. Using this base material 12, an iron film having a thickness from the bottom of the end surface at a position opposite to the end surface with the thermocouple mounting hole 12 a to a position of 30.0 mm by the same manufacturing method as the heat insulating mold of this example The heat insulation film | membrane underlayer 13 which consists of was formed, and the heat insulation film | membrane 14 which consists of spinel type iron oxide of this invention with a thickness of 150 micrometers was formed on it. Subsequently, the resin masking is performed from the end face with the thermocouple mounting hole 12a thereon, and the seed layer 15 made of an ultrathin palladium catalyst fine particle film is formed by a sputtering method from the bottom of the end face to a position of 23.0 mm, On top of this, a plating base film 16 (thickness 2 μm) made of nickel is formed by electroless nickel plating, and further on the amorphous nickel phosphorus alloy film having a thickness of 18 μm by electroless nickel plating. A plated metal film 17 was formed, and a metal film layer 18 composed of the plating base film 16 and the plated metal film 17 was formed.

For comparison of evaluation of heat insulation properties, comparative samples having two different configurations as shown in FIGS. 5 and 6 were also prepared.

One comparative sample is a measurement sample 111 provided with a conventional heat insulating film using a zirconia sprayed film as a heat insulating film, and its configuration is shown in FIG. The measurement sample 111 was produced as follows. Prepare the base material 112 processed into the same shape and the same material as the base material 12 of the measurement sample 11 above, from the bottom of the end surface at the position opposite to the end surface with the thermocouple mounting hole 112a, to a position of 30.0 mm, High temperature zirconia fine particles were uniformly sprayed so as to have an average thickness of about 250 μm by a thermal spraying method to form a zirconia sprayed film. The thermally sprayed film was precisely ground to reduce the thickness to 150 μm, and a heat insulating film 114 made of a zirconia sprayed film was formed. Then, resin masking was performed from the end surface having the thermoelectric mounting hole 112a on the top, leaving a position of 23.0 mm from the bottom of the end surface. A palladium catalyst seed layer 115 was formed by a pretreatment step of degreasing and pickling, an immersion treatment in a hydrochloric acid acidic stannous chloride solution, and an immersion treatment in a palladium chloride solution. A plating base film 116 (thickness 2 μm) made of nickel is formed thereon, and a plating metal film 117 made of an amorphous nickel phosphorus alloy film having a thickness of 18 μm is formed thereon by electroless nickel plating, A metal film layer 118 was formed. In this way, a measurement sample 111 was produced.

The other comparative sample is a measurement sample 211 having no heat insulation film. The configuration is shown in FIG. Prepare the base material 212 processed in the same shape and with the same material as the

base material

12 or 112, and leave the position 23.0mm from the bottom of the end face, and apply resin masking to the end face side with the thermocouple mounting hole 212a. did. Thereafter, a 2 μm-thick plating base film 216 made of a nickel plating film is formed in a wood strike bath, and a plating made of an amorphous nickel phosphorus alloy film having a thickness of 18 μm is formed thereon by electroless nickel plating in the same manner as described above. A metal film 217 was formed, and a metal film layer 218 was formed. In this way, a measurement sample 211 was produced.

The three types of

measurement samples

11, 111 and 211 prepared as described above were simultaneously evaluated for heat insulation properties as follows.

Evaluation of heat insulation was performed by the same method using the same apparatus as the heat insulation evaluation apparatus shown in FIG. 34 used in Example 1. Here, instead of the

measurement samples

1011A, 1011B, and 1211 in Example 1, the

measurement samples

11, 111, and 211 of this example were installed in a heat insulation evaluation device, respectively. As the heat insulating plate for holding the three measurement samples, a heat insulating plate 24 provided with three through holes having a diameter of 9.5 mm was used instead of the heat insulating plate 1024 used in FIG. The state at the time of this measurement evaluation is shown in FIG.

Evaluation of heat insulation is performed by three

measurement samples

11, 111, and 211 which are kept at a constant temperature by being kept at room temperature in high-temperature water kept at 90 ° C. in a constant temperature water tank 22 of the heat insulation evaluation device 21 shown in FIG. Was attached to the heat insulating plate 24 at the same time, and the heat insulation effect at the time of temperature rise was examined by measuring the rate of temperature rise. Subsequently, the

measurement samples

11, 111, and 211 that have risen in temperature are attached to the heat insulating plate 24 as they are, and are simultaneously immersed in cold water kept at 20 ° C. in the constant temperature water bath 23, and the rate of temperature drop is measured. The heat insulation effect of was investigated.

In FIG. 8, the thermal insulation film of the present invention is provided in comparison with the measurement sample 211 that does not have the thermal insulation film regarding the time change of the temperature rise when immersed in the constant temperature water tank 22 that is kept at 90 ° C. from room temperature. As a measurement result of the measurement sample 21, the time change of the temperature rise and the time change of the temperature difference between the two measurement samples are shown. In FIG. 9, the measurement result of the time change of the temperature fall at the time of being immersed in the constant temperature water tank which hold | maintained the

measurement samples

11 and 211 once temperature-rise at 20 degreeC simultaneously is shown.

Similarly, with respect to the measurement sample 111 provided with the conventional heat insulating film, the measurement results carried out in the same manner as the measurement sample of the heat insulating material of the present invention are shown in FIGS.

As is clear from the results of FIGS. 8 to 11, it can be seen that the heat insulating film of the present invention has a clear effect of making it difficult to transfer heat to the base material against an external temperature change. Moreover, it turns out that the heat insulation effect is substantially equivalent to the heat insulation film which consists of a conventional zirconia sprayed film.

Example 3
In FIG. 12, the schematic sectional drawing which shows the laminated structure of the heat insulation metal mold | die in a present Example is shown. The heat insulating mold 31 is a mold used for resin molding of an optical element having a precise finely processed surface, and has the following layer structure. That is, a steel with a height of 15.0 mm having a cylindrical shape with a diameter of 10.0 mm processed into an approximate molded shape of the optical element and a collar-shaped portion with a diameter of 14.0 mm and a height of 2.0 mm at the bottom. A heat insulating layer 34 made of spinel iron oxide and having a thickness of 105 μm is disposed on the molding surface side of the mold base material 32 made of a material. An adhesion layer 35 made of an iron film having a thickness of 3 μm is disposed on the surface, and a metal film layer 38 is disposed on the upper surface. The metal film layer 38 is composed of a nickel plating base film 36 having a thickness of 2 μm, and a microfabricated metal film 37 made of an amorphous nickel phosphorus alloy film having a thickness of 100 μm thereon. Note that the surface of the microfabricated metal film 37 is a molding transfer surface at the time of resin molding, and is a precision machined surface 37a that is micromachined to the shape of the molding object.

FIG. 13 shows the steps in the method for manufacturing a heat insulating mold of this example. First, a heat insulating film 34 made of spinel-type iron oxide having a thickness of 105 μm is formed on the molding surface of a die base material 32 obtained by machining a rod made of steel containing iron as a main component, and the same autoclave reaction as that of the second embodiment. Using a vessel, the same hydrothermal reaction was repeated four times to form (FIG. 13 (1)). In addition, this metal mold | die base material masked the surface other than the molding surface of the metal mold | die base material 32 beforehand with the tetrafluoroethylene sealing tape.

Thus, after the metal mold | die with which the heat insulation film 34 was formed was washed with water, the contact | adherence layer 35 which consists of an iron plating film | membrane was formed by the electroplating method of the organic acid iron plating bath using a citric acid (FIG. 13 ( 2)). Next, a plating base film 36 made of a nickel film having a thickness of 2 μm was coated by an electroless nickel plating method. Furthermore, a microfabricated metal film 37 made of a nickel phosphorus alloy plating film for precision machining having a thickness of 150 μm is formed by electroless nickel plating to produce a metal film layer 38, and heat-treated at 200 ° C. for 3 hours (FIG. 13). (3)). Thereafter, the surface of the microfabricated metal film 37 is machined using a precision cutting machine to form a precision machined surface 38 in the shape of a molding, and a heat insulating mold used for resin molding of optical elements. 31 was produced (FIG. 13 (4)).

Thus, since the spinel type iron oxide which comprises the heat insulation film | membrane of a present Example is a metal oxide which has electroconductivity, in the electroplating method to the fine ceramic heat insulation film | membrane made difficult by the conventional manufacturing process It can be seen that the metal film can be directly formed.

Evaluation of thermal insulation For the purpose of evaluating the thermal insulation performance of the above-mentioned thermal insulation mold, a measurement sample 41 for thermal insulation evaluation comprising the same material and the same configuration including the thermal insulation film of the present invention was produced. A schematic cross-sectional view thereof is shown in FIG. The measurement sample 41 was produced as follows. First, a round bar made of the same material as the mold base material 32 of this embodiment having a diameter of 5.5 mm and a length of 52.0 mm is prepared, and from the one end, a thermocouple for measuring the temperature of the base material is embedded. A thermocouple mounting through hole 42a having a diameter of 2.0 mm was formed on the cylindrical side surface at a position of 0 mm at right angles to the axial direction, and the base material 42 was produced. Thereafter, from one end of this base material 42, it is masked in advance with a tetrafluoroethylene seal tape, and in the same manner as the method of forming the heat insulating film 34 in FIG. 13, the other end is 22.0 mm from the bottom of the end face. A heat insulating film 44 having a thickness of 105 μm was formed. Subsequently, the portion up to a position of 20.0 mm from the bottom of the end face is left, the remaining portion is masked with a resin sealing material, and the adhesion layer 45 made of an iron plating film is formed in the same manner as the formation method of the adhesion layer 35 in the heat insulating mold 31. Further, a plating base film 46 made of a nickel film having a thickness of 2 μm by an electroless nickel plating method and a metal film 47 made of a nickel phosphorus alloy plating film for precision processing having a thickness of 28 μm by the same electroless nickel plating method. A measurement sample 41 was produced by coating the film.

As a comparative sample for the thermal insulation evaluation of the measurement sample 41 provided with the heat insulation film of the present invention, a measurement sample 241 having no heat insulation film was produced as follows. A schematic cross-sectional view thereof is shown in FIG. A base material 242 processed in the same shape and with the same material as the base material 42 was prepared, and resin masking was applied to the end face side where the thermocouple mounting hole 242a is provided, leaving a position of 20.0 mm from the bottom of the end face. . Thereafter, a 2 μm-thickness plating base film 246 made of a nickel plating film is formed by electroless nickel plating, and an amorphous nickel phosphorus alloy film having a thickness of 28 μm is formed thereon by electroless nickel plating in the same manner as described above. A plated metal film 247 was formed. In this way, a measurement sample 241 was produced.

The

measurement samples

41 and 241 produced in this manner were the same as those used in Example 1, except that the heat insulating plate 24 was changed to provide a through hole having a diameter of 6.0 mm so as to hold the

measurement samples

41 and 241. Using a device having the same configuration as the property evaluation device 21, the heat insulation property was evaluated in the same manner as in Example 1. In addition, thermal insulation evaluation was performed so that the 15-mm part from the lower end surface of the

measurement samples

41 and 241 attached to the heat insulation film 24 was immersed in the high temperature water and cold water which were stored in the thermostat.

FIG. 16 shows that the thermal insulation film of the present invention is provided in comparison with the measurement sample 241 that does not have the thermal insulation film with respect to the time change of the temperature rise when immersed in a constant temperature water bath maintained at 95 ° C. from room temperature. The measurement result of the measurement sample 41 is shown. In addition, FIG. 17 shows the measurement results of the time change of the temperature drop when the

measurement samples

41 and 241 that have once increased in temperature are immersed in a constant temperature water bath that is maintained at different temperatures and at 18 ° C. at the same time.

As is clear from the results of FIGS. 16 and 17, similarly to the result of Example 1, the heat insulating film of the present invention clearly shows the effect of making it difficult to transfer heat to the substrate with respect to an external temperature change. I understand.

Further, in the same manner as the above-described measurement sample, a measurement sample 341 having a heat insulation film thickness of 15 μm and a measurement sample 441 having a heat insulation film thickness of 30 μm are prepared, and three samples of the measurement sample 241 having no heat insulation film are prepared. Evaluation was carried out in the same manner as in the measurement of heat insulation. However, the heat insulation was evaluated so that the 19 mm portions from the lower end faces of the three measurement samples 241, 341, and 441 were immersed in high-temperature water and cold water stored in a thermostatic bath.

In FIG. 18, the thermal insulation film of the present invention is provided in comparison with the measurement sample 241 that does not have the thermal insulation film with respect to the time change of the temperature rise when immersed in a constant temperature water bath maintained at 95 ° C. from room temperature. The measurement results of the measurement samples 341 and 441 are shown. FIG. 19 shows the measurement results of the time change of the temperature drop when the measurement samples 241, 341 and 441 whose temperature has once increased are immersed in a constant temperature water bath maintained at 27 ° C. at different temperatures at the same time.

As is clear from the results of FIGS. 18 and 19, similarly to the result of Example 1, even when the heat insulating film of the present invention has a film thickness of 15 μm, it is difficult to transfer heat to the substrate with respect to an external temperature change. It turns out that the effect to do is clear.

Example 4
As shown in Example 1, by selecting the reaction conditions for hydrothermal synthesis, it is possible to form heat insulating films having various porosities that greatly affect the heat insulating performance. In this example, three types of heat insulating films C, D, and E having different porosities were produced by variously changing hydrothermal synthesis conditions. In hydrothermal synthesis, all raw material solutions were prepared using water distilled in nitrogen gas.

Assuming that an iron mold is used as the base material for forming the heat insulating film, three rectangular substrates (size: 50 mm long, 20 mm wide, 2.0 mm thick) made of iron are prepared, and the surfaces of these substrates Each heat insulating film was formed.

The heat insulating film C was formed as follows. A suspension was prepared by mixing an aqueous solution in which 38.3 g of ferrous sulfate (FeSO ₄ .7H ₂ O) was dissolved in 60 ml of water and 60 ml of an aqueous solution of 29.7 g of sodium hydroxide (NaOH). The suspension is put into an autoclave reaction vessel having the same shape as that used in Example 1, the substrate is held and immersed using a jig, the reaction vessel is sealed, and heated at 100 ° C. Held. After 45 hours, the pressure inside the reaction vessel had risen to 0.20 MPa. Thereafter, the heating was stopped, the pressure valve was opened to release the internal pressure, the reaction vessel was opened, the sample base material was taken out together with the jig, and washed with water sufficiently to separate it from the reaction residue at the same time. Thereafter, the reaction vessel is also washed with water in order to remove the reaction residue, and again the same amount of suspension is prepared as above, and the substrate after washing with water is again attached to the jig, and the same. And reacted at 100 ° C. for 45 hours. By repeating this operation six times in total, a heat insulating film C having a film thickness of 146 μm was formed.

About the heat insulation film | membrane C formed in this way, it is the same as the material evaluation of the heat insulation film | membrane A of Example 1, and a chemical composition is measured using a fluorescent X-ray apparatus, an X-ray diffractometer, a laser microscope, a Vickers hardness meter, etc. The crystal structure, porosity and Vickers hardness were examined respectively. As a result, it was confirmed that the heat insulating film C was spinel type iron oxide having a lattice constant a ₀ = 8.40 Å. The porosity was 5%, and it was found that the Vickers hardness was the maximum value Hv314, the minimum value Hv230, and the average value HV278.

The formation method of the heat insulation film | membrane D is as follows. First, an aqueous solution in which 41.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) is dissolved in 60 ml of water produced by distillation in nitrogen gas, and 60 ml of an aqueous solution of 26.0 g of sodium hydroxide (NaOH) are mixed. To prepare a suspension. This suspension was placed in a reaction vessel having the same shape as that used for forming the heat insulation film C, and reacted at 110 ° C. for 40 hours in the same manner as in the case of the heat insulation film C. After the reaction, the film-formed substrate is taken out, washed thoroughly with water, the substrate is immersed in a new raw material suspension in a reaction vessel, the vessel is sealed, and the same reaction is performed at 110 ° C. for 40 hours. It was. By repeating this operation four times in total, a heat insulating film D having a film thickness of 150 μm was formed.

As a result of material evaluation of the obtained heat insulating film D, the heat insulating film D is composed of spinel-type iron oxide Fe ₃ O ₄ having a lattice constant a ₀ = 8.40 、, its porosity is 15%, and the Vickers hardness is the maximum value Hv560. The minimum value was Hv303 and the average value was Hv448.

The formation method of the heat insulation film | membrane E is as follows. First, an aqueous solution in which 41.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) is dissolved in 60 ml of water produced by distillation in nitrogen gas is mixed with 60 ml of a 21.6 g sodium hydroxide (NaOH) aqueous solution. To prepare a suspension. This suspension was put in a reaction vessel having the same shape as that used for forming the heat insulation film C, and reacted at 145 ° C. for 90 minutes in the same manner as in the case of the heat insulation film C. After the reaction, the film-formed substrate is taken out, washed thoroughly with water, again immersed in a new raw material suspension in the reaction vessel, the vessel is sealed, and reacted at 145 ° C. for 90 minutes. It was. By repeating this operation 14 times in total, a heat insulating film E having a film thickness of 150 μm was formed.

With respect to the black heat insulating film E thus obtained, as a result of material evaluation, the heat insulating film E is composed of spinel-type iron oxide Fe ₃ O ₄ having a lattice constant a ₀ = 8.40 Å, and its porosity Was 75%. However, the heat insulating film E having a large porosity of 75% cannot measure a Vickers hardness because a smooth polished surface having a size capable of forming an indentation by pressing a Vickers indenter cannot be obtained. could not. FIG. 37 shows scanning microscope images of the polished surfaces of the heat insulating films C, D, and E having different porosities. In addition, as with the heat insulation film A, the surfaces after the formation of the heat insulation films C, D, and E are films in which crystal grains that look like twin crystals with sharp corners are continuously grown in three dimensions. In addition, the film is a porous film having innumerable pores inside the film.

It is known that a zirconia sintered body or a zirconia sprayed film, which is a conventional heat-insulating oxide material, has a high Vickers hardness Hv of 1200 and is a difficult-to-work material. On the other hand, the heat insulating film material of the present invention has a low hardness regardless of the size of the porosity, and is a material that can be finely processed, such as precision cutting and precision grinding, relatively easily like conventional ferrite ceramics. I understand.

Example 5
Whether or not substituted ferrites of various compositions can be formed into a film shape on a substrate by hydrothermal synthesis reaction by substituting some of the iron ions forming spinel iron oxide Fe ₃ O ₄ with various metal ions It was investigated. These ferrites have almost no difference in thermal conductivity depending on the type of substitution ions, but other material properties such as thermal expansion coefficient can be changed. The film formation is important.

In the formation of substituted ferrite films of various compositions, water distilled in nitrogen gas was used in the preparation of the raw material solution.

First, a film formation of calcium ferrite, which is a ferrite containing calcium ions as substitution ions, was attempted. The substitution ferrite film was synthesized as follows. The base substrate used for film formation for the purpose of confirming whether a desired ferrite film can be formed by a hydrothermal reaction similar to the method shown in Example 1 was used for the material evaluation of the heat insulating film of Example 1. A rectangular substrate (size: length 50 mm × width 20 mm × thickness 2.0 mm) made of the same material (pure copper) as that of the substrate and a similar heat insulating film underlayer (iron plating film having a thickness of 3 μm) was formed. Is.

As a treatment liquid, 60 ml of an aqueous solution in which 19.9 g of ferrous chloride (FeCl ₂ .4H ₂ O) and 7.4 g of calcium chloride (CaCl ₂ .2H ₂ O) are dissolved in water and 21.6 g of hydroxylated water are used. A suspension was prepared by mixing 60 ml of an aqueous sodium (NaOH) solution. The suspension is put into a stainless steel autoclave reaction vessel having an internal volume of 200 ml similar to that used in Example 1, and the base substrate for evaluation is immersed therein, and a jig is used. Held. After reacting at 150 ° C. for 2 hours, the base material was taken out together with the jig, and washed sufficiently with water in order to separate it from the produced powder compound. Similarly, the autoclave reaction vessel was washed with water in order to remove the generated powder, and again the same amount of suspension was prepared as above, and the mold base material was attached together with the jig, and the same reaction was performed. Repeated times.

Thus, the film | membrane formed on the base material was a black film | membrane, and the thickness was 104 micrometers. This film was subjected to composition analysis using a fluorescent X-ray apparatus. As a result, it was found to be a compound of iron and calcium, and its chemical composition (molar ratio) was iron: calcium = 85: 15. Further, the crystal structure was examined using an X-ray diffractometer. The X-ray diffraction pattern is shown in FIG. As a result, it was confirmed to be composed of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.40 Å. That is, it was confirmed that the obtained film was calcium ferrite Ca _0.45 Fe _2.55 O ₄ . Further, FIG. 42 shows a scanning electron microscope image of the surface of this film after the film formation. Similar to the heat insulation film A shown in Example 1, the crystal grains that appear to be twin crystals with sharp corners are continuously grown in three dimensions, and there are innumerable pores inside the film. It can be seen that the film has a porous structure.

Further, in the same manner as in the method shown in Example 1, the film surface and the film cross section were polished to produce measurement surfaces, and the porosity and Vickers hardness were measured. FIG. 39 shows a scanning microscope image of the film surface after polishing. As a result, the porosity was 20%. The Vickers hardness had a maximum value of Hv339 and a minimum value of Hv130, and the average value thereof was Hv220.

Next, the possibility of film formation of zinc ferrite, which is a ferrite containing zinc ions as substitution ions, was examined. However, here, as a base material for evaluation, a square plate (size 18.0 mm square and thickness 2.0 mm) made of the same material as the mold base material 32 (steel material) used in Example 3 was used. Using. The synthesis was performed as follows. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) and 7.2 g of zinc sulfate (ZnSO ₄ · 7H ₂ O) are dissolved in 60 ml of water and 21.6 g of hydroxylated water are used. A suspension was prepared by mixing 60 ml of an aqueous sodium (NaOH) solution. The suspension is placed in a stainless steel autoclave reaction vessel having an internal volume of 200 ml used in the synthesis of the calcium ferrite, and the substrate for evaluation is immersed therein and held using a jig. did. After reacting at 180 ° C. for 4 hours, the substrate was taken out together with the jig, and washed sufficiently with water to separate from the produced powder compound at the same time. In the autoclave reaction vessel as well, the inside was washed with water to remove the generated powder, the same amount of suspension was prepared again, the mold base material was attached together with the jig, and the same reaction was repeated. Repeated times.

The film formed on the square plate was subjected to composition analysis using a fluorescent X-ray apparatus. As a result, it was confirmed to be a compound of iron and zinc. However, due to the fact that the underlying base material is a steel material, the component (iron) of the base material is also added as a composition analysis value during the fluorescent X-ray composition analysis, so the exact composition of the ferrite film Quantification of was difficult. Only the qualitative analysis of the composition as to whether or not the substituted metal ion is contained in the ferrite composition was performed. The crystal structure was examined by X-ray diffraction analysis. The X-ray diffraction pattern is shown in FIG. As a result, it was confirmed that it was composed only of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.49 Å. That is, it was confirmed that the obtained film was zinc ferrite.

In the same manner as in the preparation and examination of the above-described zinc ferrite, the film formation of ferrite when the substitution ions are manganese (Mn) ions was examined. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O) and 6.0 g of manganese sulfate (MnSO ₄ .5H ₂ O) were dissolved in 60 ml of water, and 21.6 g of hydroxylated water were used. The only difference was that 60 mL of a sodium (NaOH) aqueous solution was mixed to prepare a suspension, and the other steps were carried out in exactly the same manner as in the case of the above-described study of the film formation of zinc ferrite. About the film | membrane formed on the square plate put in the autoclave reaction container, the composition analysis was performed using the fluorescent X ray apparatus. As a result, it was confirmed to be a compound of iron and manganese. Further, the crystal structure was examined by X-ray diffraction analysis. As a result, it was clarified that the obtained film was composed only of a compound having a spinel crystal structure with a lattice constant a ₀ = 8.43 Å. That is, it was confirmed that the obtained film was manganese ferrite.

Next, the film formation of ferrite when the substitution ions are magnesium (Mg) ions was examined. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) and 6.2 g of magnesium sulfate (MgSO ₄ · 7H ₂ O) are dissolved in 60 ml of water and 21.6 g of hydroxylated water are used. The only difference was that 60 ml of a sodium (NaOH) aqueous solution was mixed to produce a suspension, and the other steps were carried out in exactly the same manner as in the case of the above-described film formation study of zinc ferrite. About the film | membrane formed on the square plate put in the autoclave reaction container, the composition analysis was performed using the fluorescent X ray apparatus. As a result, it was confirmed to be a compound of iron and magnesium. Further, the crystal structure was examined by X-ray diffraction analysis. As a result, it was revealed that the obtained film was composed only of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.40 Å. That is, it was confirmed that the obtained film was magnesium ferrite. For the purpose of examining film formation under different reaction temperatures, a suspension prepared in the same manner as described above was placed in an autoclave container and a film formation experiment at 110 ° C. for 4 hours was attempted. As a result, it was confirmed that a magnesium ferrite having a spinel crystal structure with a lattice constant a ₀ = 8.40 できる could be synthesized in the same manner as described above.

Furthermore, the film formation of the ferrite when the substitution ions are aluminum (Al) ions was examined. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) and 7.9 g of aluminum sulfate (AlSO ₄ · 16H ₂ O) are dissolved in 60 ml of water and 21.6 g of hydroxylated water are used. The only difference was the use of a suspension prepared by mixing 60 ml of a sodium (NaOH) aqueous solution, and the other steps were carried out in exactly the same manner as in the case of the above-described film formation study of zinc ferrite. With respect to the film formed on the square plate placed in the autoclave reaction vessel, composition analysis was performed using a fluorescent X-ray apparatus. As a result, it was confirmed to be a compound of iron and aluminum. Further, the crystal structure was examined by X-ray diffraction analysis. As a result, it was clarified that the obtained film was composed only of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.35 Å. That is, it was confirmed that the obtained film was aluminum ferrite.

A study was also made on the film formation of ferrite when the substitution ions were chromium (Cr) ions. As a treatment liquid, an aqueous solution obtained by dissolving 34.7 g of ferrous sulfate (FeSO4 · 7H ₂ O) and 5.6 g of chromium sulfate (CrSO ₄ · 3H ₂ O) in 60 ml of water, and 21.6 g of sodium hydroxide The only difference was the use of a suspension prepared by mixing 60 ml of a (NaOH) aqueous solution, and the other steps were carried out in exactly the same manner as in the above-described study of the film formation of zinc ferrite. About the film | membrane formed on the square plate put in the autoclave reaction container, the composition analysis was performed using the fluorescent X ray apparatus. As a result, it was confirmed that it was a compound of iron and chromium. Further, the crystal structure was examined by X-ray diffraction analysis. As a result, it was clarified that the obtained film was composed only of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.38Å. That is, it was confirmed that the obtained film was chromium ferrite.

The film formation of ferrite in the case where the substitution ions are lithium (Li) ions was also examined. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O) and 3.2 g of chromium sulfate (LiSO ₄ .H ₂ O) are dissolved in 60 ml of water and 21.6 g of hydroxylated water are used. The only difference was that a suspension prepared by mixing 60 ml of an aqueous solution of sodium (NaOH) was used, and the other steps were carried out in exactly the same manner as in the above-described study of the film formability of zinc ferrite. The crystal structure of the film formed on the square plate placed in the autoclave reaction vessel was examined by X-ray diffraction analysis. As a result, it was confirmed that the obtained film was composed only of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.39 Å. Further, the obtained film was dissolved in hydrochloric acid and subjected to composition analysis by ICP emission spectrometry. As a result, it was found to be a compound of iron and lithium. That is, it was confirmed that the obtained film was lithium ferrite. In addition, as a result of observation of the film surface using the scanning electron microscope (SEM) about the obtained various ferrite films containing zinc from the above zinc, all the respective films were twins with sharp edges as described above. The crystal grains appearing as crystals were continuously grown in three dimensions, and the film was porous with innumerable pores inside the film.

From the above results, it can be seen that various ferrite films substituted with various metal ions can be effectively formed on the substrate by the hydrothermal synthesis method similar to the formation of the heat insulating film of spinel iron oxide.

Example 6
In FIG. 20, the schematic perspective view of the layer structure of the heat insulation metal mold | die in a present Example is shown. The heat insulating mold 51 is a mold used for resin molding having a precise finely machined surface, and has a rectangular shape with a minor axis of 6.00 mm and a major axis of 9.00 mm and a height of 20.00 mm. And has the following laminated structure. First, the mold base material 52 is made of a steel material having the same composition as that of the third embodiment. On the surface of the mold base 52 on the rectangular molding surface side, a concave groove pattern finely processed into a cross-sectional shape with the dimensions shown in FIG. 21 is formed at the center of the minor axis of the molding surface side surface. It is formed parallel to the shaft. A heat insulating layer 54 made of spinel iron oxide and having a thickness of 50 μm is disposed so as to cover the surface of the finely processed surface. An adhesion layer 55 made of an iron film having a thickness of 3 μm is disposed on the surface. Further, a metal film layer 58 is formed on the surface, and a microfabricated metal film made of nickel plating film 56 having a thickness of 2 μm and an amorphous nickel phosphorus alloy film having a film thickness of 65 μm formed thereon. 57. Note that the surface of the microfabricated metal film 57 is a molding transfer surface at the time of resin molding, and is a precision machined surface 57a that is micromachined to the same dimensions as in FIG.

The manufacturing method of the heat insulating mold in the present example was performed through the same steps as in Example 3 except that the formation conditions of the heat insulating film 54 were different. That is, a heat insulating film 54 made of spinel iron oxide having a thickness of 50 μm is formed on a mold base material 52 on which a microfabricated pattern is formed using the same autoclave reaction vessel as the same raw material in the same operation as in Example 1. A 7 hour hydrothermal reaction at 155 ° C. was repeated twice. Further, a finely processed metal film 57 of nickel phosphorus alloy plating alloy having a thickness of 100 μm was formed on the plating base film 56 covered with the adhesion layer formed in the same manner as in Example 2.

Further, the surface of this finely machined metal film 57 is machined to the same dimensions as those shown in FIG. 21 using a precision cutting machine to form a precision machined surface 57a, and four sides are precisely ground. It processed and produced the heat insulation metal mold | die 51. FIG.

Evaluation of Coverability of Heat Insulating Film In the heat insulating mold 51 thus obtained, the cross section of the laminated film including the heat insulating film could be observed on the ground side. The thickness of the heat insulation film of the present invention was observed using a scanning microscope. The coverage and adhesion of the mold base material 52, the heat insulating film 53, and the heat insulating film 53 and the metal laminated film on the heat insulating film 53 (consisting of the adhesion layer 55, the plating base film 56, and the microfabricated metal film 57) are both good. It was observed that there were no cracks or gaps between the layers. Subsequently, the thickness measurement of the heat insulating film is performed on the processing pattern cross-sectional view of the mold base material shown in FIG. 21 with A, A ′, B, B ′, C, C ′, E, E ′, F, F ′. It performed about 10 parts shown by. Here, five points A, B, C, D, and E are five points of the mold base material 52 on one side surface of the short axis side of the rectangular shaped surface of the heat insulating mold 51, and A ′, B ′, C ′, D ′, and E ′ are five points of the mold base material 52 on the other short-axis side surface. Their positions are the dimensions shown in FIG. The thicknesses of the heat insulating films present immediately above the locations indicated by the above symbols are A: 50 μm, A ′: 50 μm, B: 50 μm, B ′: 50 μm, C: 51 μm, C ′: 51 μm, E: They were 50 μm, E ′: 50 μm, F: 50 μm, and F ′: 50 μm. From the above results, it can be seen that the formed heat insulating film 54 can be coated with good adhesion in a substantially uniform film state on the concave groove pattern formed in the mold base material 52.

According to the method for producing a heat insulating film of the present invention, in order to form a heat insulating film by a chemical reaction called a hydrothermal synthesis reaction, it is performed evenly and slowly with respect to the mold surface in contact with the treatment liquid of the raw material for the hydrothermal synthesis reaction. A film can be grown. For this reason, it is possible to form a heat insulating film with good rounding even on a mold base material molding surface having a complicated shape subjected to deep groove processing or the like. Furthermore, according to the present invention, a thin film thickness is possible, no post-machining is required, and a heat insulating film can be formed efficiently.

Example 7
A heat insulating mold made of a non-ferrous metal mold base material was produced. In FIG. 23, the layer structure of the heat insulation metal mold | die in a present Example is shown. The heat insulation mold 201 is a mold composed of a non-ferrous metal mold base material and a heat insulation film used for molding a resin part having a precise micro-fabrication shape composed of deep grooves. Become. That is, it is made of a titanium alloy that has low thermal conductivity and does not lose its strength even at high temperatures, and has a height from the bottom surface having a brim-shaped portion (diameter 25.0 mm) having a diameter of 20.0 mm × height of 2.5 mm. A base layer 203a made of a nickel plating film having a thickness of 2 μm is formed on the surface of a mold base material 202 having a thickness of 10.0 mm, and a heat insulating film base layer 203 made of an iron film having a thickness of 3 μm is formed thereon. A heat insulating film 204 made of zinc ferrite which is a kind of ferrite material having a thickness of 200 μm is formed, a seed layer 205 made of a catalyst fine particle film of palladium is disposed thereon, and a metal film layer 208 is formed thereon. Yes. The metal film layer 208 is composed of a plating base film 206 (thickness 2 μm) made of nickel and a microfabricated metal film 207 (average thickness 78 μm) made of an amorphous nickel phosphorus alloy film formed thereon. Has been. The molding surface side of the microfabricated metal film 207 is a precision machined surface 207a on which a micropattern for press molding of a molded part is formed by machining.

According to the above configuration, by using a zinc ferrite film having a low thermal conductivity as a heat insulating film together with a die base material made of a titanium alloy having a low thermal conductivity, a molding surface subjected to microfabrication of deep and fine grooves can be obtained. A deep fine pattern can be formed even in resin molding using a mold having a mold. In the prior art, the heat of the high temperature resin molded on the molding surface of the mold escapes through the mold base and the resin causes an excessive temperature drop during molding, preventing the resin molding Occurs. On the other hand, in the present invention, as a result of effectively avoiding such a situation, a fine pattern can be more reliably formed.

The above-described heat insulation mold 201 was produced as follows. A base film 203a having a thickness of 2 μm made of a nickel plating film is formed by a wood strike bath on the surface of the mold base material 202 made by machining a titanium alloy that is a non-ferrous metal, and the surface thereof Then, a heat insulating film base layer 203 made of an iron film having a thickness of 3 μm was formed using an iron sulfate plating bath. Subsequently, a heat insulating film 204 made of a zinc ferrite film having a thickness of 200 μm was formed on the surface as follows. That is, as the processing liquid, in water 60ml manufactured by distillation in nitrogen gas, ferrous sulfate _{_{34.7g (FeSO 4 · 7H 2 O}} ) and 7.2g of zinc sulfate _(ZnSO 4 · _7H 2 O ) And an aqueous solution of 21.6 g of sodium hydroxide (NaOH) were mixed to prepare a suspension. The suspension was placed in a stainless steel autoclave reaction vessel with an internal volume of 200 ml, and the mold base material on which the heat insulating base layer 203 was formed was immersed therein and held using a jig. This mold base material was masked in advance with a tetrafluoroethylene sealing tape except for the molding surface on which the heat insulating base layer 203 was formed. The above operation was performed in a nitrogen gas atmosphere. The autoclave reaction vessel was externally heated to react at 180 ° C. for 6 hours. After the reaction, the mold base material was taken out together with the jig and washed sufficiently with water in order to separate from the powder compound produced at the same time. Similarly, the autoclave reaction vessel was washed with water in order to remove the generated powder, and again the same amount of suspension was prepared as above, and the mold base material was attached together with the jig, and similarly 180 ° C. For 6 hours. By repeating this operation eight times in total, a heat insulating film 204 made of a zinc ferrite film having a thickness of 200 μm was formed.

By washing the mold in which the heat insulating film is formed in this manner and sufficiently drying it, by using a DC sputtering apparatus to which a palladium target is attached, by forming a palladium fine particle film on the surface of the heat insulating film 204, A seed layer 205 was formed. Next, a plating base film 206 made of a nickel film having a thickness of 2 μm was coated by an electroless nickel plating method. Further, a metal film layer 208 was formed by forming a microfabricated metal film 207 made of a nickel phosphorus alloy plating film for precision processing having a thickness of 100 μm by an electroless nickel plating method. Next, the metal film layer 208 was heat-treated at 200 ° C. for 3 hours. Then, the precision processing surface 207a was formed using the precision cutting machine, and the heat insulation metal mold | die 201 for fine process type | molds was produced.

In addition, in order to confirm whether or not a film of a desired material is formed on the heat insulating film 204, a square plate (size 20.0 mm square and thickness 2 made of the same titanium alloy as the mold base material 202) is separately provided. In the step of preparing the above-described heat insulation mold 201, a base film having a thickness of 2 μm made of the same nickel plating film is formed, and a heat insulation film made of an iron plating film having a thickness of 3 μm is further formed on the surface thereof. An underlayer was formed. Thereafter, in the step of forming the heat insulating film 204 of the heat insulating mold 201, the square plate sample is put in the same autoclave reaction container together with the heat insulating mold 201, and simultaneously with the heat insulating film 204, A heat insulating film was formed. About the film | membrane formed on the said square plate, as a result of investigating a composition using the fluorescent X ray apparatus, it has confirmed that it was a compound which consists of a composition of iron and zinc. Furthermore, the crystal structure was examined using X-ray diffraction. As a result, it was found that the compound had a spinel crystal structure with a lattice constant a ₀ = 8.49 Å. That is, it was confirmed that the heat insulating film 204 was zinc ferrite.

Here, even if the temperature of the hydrothermal synthesis reaction for forming the heat insulation film made of the zinc ferrite film is 200 ° C., a zinc ferrite film having the same composition as described above can be formed. However, when the film thickness grown at one time is different, a heat insulating film having the same thickness as described above can be formed by appropriately changing the conditions of hydrothermal synthesis, the number of treatments, and the like as necessary.

Further, as a metal layer formed on the surface of the mold base material 202 and serving as a base of the heat insulating film, in this embodiment, a laminated film of a base layer 203a that is a nickel plating film and a heat insulating film base layer 203 that is an iron plating film However, it is sufficient that the base of the heat insulating film is a metal film made of a metal element that forms the heat insulating film immediately below the heat insulating film. However, the present invention is not limited to the above laminated film. For example, an iron film formed directly on the surface of a mold base material by a sputtering method may be used.

In this example, the process of forming the seed layer on the surface of the heat insulating film was described by sputtering, but apart from this method, the iron film was directly formed by using the same sputtering method and using the target of metallic iron. The same heat insulation mold can be manufactured by the method of doing. Furthermore, if necessary, this iron film is also omitted, and a nickel target is used instead of the nickel plating film as a plating base film of a microfabricated metal film made of a nickel phosphorus alloy plating film for precision processing. A nickel film formed by a sputtering method may be used.

Example 8
A sectional view of the heat insulating mold in Example 8 is shown in FIG. The heat insulating mold 2001 is a mold used for molding a resin part having a precise mirror surface shape. Here, pure copper having high thermal conductivity is used as a material for the mold base material, and the following lamination is performed. It is configured in the form of a structure. Using an iron sulfate plating bath on the surface of a mold base material 2002 having a height of 15.0 mm and a diameter of 20.0 mm from a bottom surface having a brim-shaped portion (diameter: 25.0 mm) having a height of 2.5 mm, A heat insulating film base layer 2003 made of an iron film having a thickness of 3 μm is disposed, and further a heat insulating film 2004 made of iron ferrite (ie, spinel iron oxide) having a thickness of 50 μm is formed thereon, and a palladium catalyst fine particle film is formed thereon. A seed layer 2005 is disposed, and a metal film layer 2008 is formed thereon. The metal film layer 2008 is composed of a plating base film 2006 (thickness 1 μm) made of nickel and a microfabricated metal film 2007 (thickness 6 μm) made of an amorphous nickel-phosphorus alloy film formed thereon. ing. The molding surface side of the microfabricated metal film 2007 is a precision machined surface 2007a on which a mirror surface is formed by machining. That is, the configuration is similar to the stacked configuration shown in FIG. 26 of Example 1, except that the precision processing surface is a mirror surface. As a manufacturing method of this mold, the above-described precision processed surface is prepared by forming a finely processed metal film with an average thickness of 10 μm in advance and then machining it into a mirror surface to a thickness of 6 μm. In addition, regarding the heat insulating film 2004 made of spinel iron oxide constituting the eighth embodiment, the manufacturing method is different from the formation method by hydrothermal synthesis of the heat insulating film 1004 of the first embodiment under an atmospheric pressure of 100 ° C. or less. It is characterized in that it is made by combining with. Thus, by using an oxide material composed of a metal oxide (spinel type iron oxide) having a low thermal conductivity and having pores as a heat insulating layer, resin molding with good specularity becomes possible. That is, the heat of the high-temperature molten resin molded by the mirror surface of the metal mold escapes through the mold base, and the resin molding occurs due to the temperature dropping more than necessary during molding. Defects can be avoided.

In FIG. 44, the manufacturing process of the heat insulation metal mold | die 2001 of this invention is shown. A heat insulating film base layer 2003 made of an iron film having a thickness of 3 μm was formed on the surface of the mold base 2002 on the molding surface side using an iron sulfate plating bath (FIG. 44 (1)). Subsequently, a heat insulating film 2004 made of spinel iron oxide having a thickness of 50 μm was formed on this surface (FIG. 44 (2)). The heat insulating film 2004 was formed in the air as follows. That is, first, an aqueous solution in which 41.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O) was dissolved in 60 ml of water was prepared, and 21.6 g of sodium hydroxide was further added to this aqueous solution. A suspension 2021 was prepared by mixing 60 ml of a strong alkaline aqueous solution prepared by dissolving (NaOH). The water used here was water distilled in nitrogen gas. Next, a heat insulating film 2004 was formed using this suspension 2021. For the film formation at that time, a heat insulating film forming apparatus 2022 shown in FIG. 45 was used. A glass Aleen cooler 2023 is attached to the upper part, and further comprises a reaction vessel 2024 made of stainless alloy having an internal volume of 300 ml so that nitrogen gas can flow inside. The above suspension 2021 was placed in the reaction container 2024, and the mold base material 2002 on which the heat insulating base layer 2003 was formed was immersed therein and held using a jig 2025. This mold base material was masked in advance with a tetrafluoroethylene sealing tape except for the molding surface on which the heat insulating base layer 2003 was formed. The reaction vessel 2024 was placed in an oil bath 2026 heated and maintained at 98 ° C. and heated to react for 120 hours. During the reaction time, nitrogen gas was kept flowing into the reaction vessel 2024. After the reaction, the mold base material was taken out together with the jig and thoroughly washed with water.

In this way, the mold on which the heat insulating film 1004 having a film thickness of 50 μm is formed is washed with water and sufficiently dried, and then a palladium fine particle film is formed on the surface of the heat insulating film 2004 using a DC sputtering apparatus with a palladium target attached. Thus, a seed layer 2005 was formed (FIG. 44 (3)). Next, a plating base film 2006 made of a nickel film having a thickness of 1 μm was coated by an electroless nickel plating method. Further, a metal film layer 2008 was formed by forming a micro-processed metal film 2007 made of a nickel phosphorus alloy plating film for precision processing having a thickness of 10 μm by an electroless nickel plating method, and heat-treated at 200 ° C. for 3 hours (FIG. 44 (4)). Thereafter, using the precision cutting machine, the finely processed metal film 2007 was ground to a thickness of 6 μm to form a precise mirror surface 1007a, thereby obtaining a heat insulating mold for a finely processed die (FIG. 44 (5)). ).

In addition, although the example of the method by a plating method was described in the present Example as a formation method of the heat insulation film | membrane base layer 2003 which consists of an iron film formed on the surface of the metal mold | die base material 2002, as in Example 1, heat insulation is described. The formation method of the film base layer 2003 is not limited to the plating method described in this embodiment. For example, this iron film may be formed directly on the surface of the mold base material by a sputtering method.

For the heat insulating film 2004, for the purpose of confirming whether a film of a desired material is formed or not, a rectangular substrate (size: 50 mm length, 20 mm width) of the same material (pure copper) as the mold base material 2002 is separately provided. A thickness of 2.0 mm) was prepared, a heat insulating film was formed using this substrate, and the material was evaluated in detail as this heat insulating film F. The production of the heat insulating film F will be described below. First, a similar heat insulating film foundation layer was formed on the surface of the substrate in the same manner as in the step of manufacturing the heat insulating mold 2001 (FIG. 44 (1)). Thereafter, in the same manner as the heat insulating film 2004 of the heat insulating mold 2001, a suspension having the same composition as the suspension 2021 described above was used, and the reaction vessel shown in FIG. The above reaction was repeated a total of 3 times (a total of 360 hours) to produce a heat insulating film F having a film thickness of about 150 μm. Here, a film having a thicker film than that used for the mold was produced in the same manner as in Example 1, in addition to the composition and crystal structure necessary to specify the material of the heat insulating film, the porosity and Vickers hardness. This is because the same sample is evaluated simultaneously.

The heat insulating film F thus formed on the substrate is black, and composition analysis using a fluorescent X-ray apparatus for the film shows that the metal ion is a compound having a composition composed only of iron. From X-ray diffraction, it could be identified as spinel iron oxide having a lattice constant a ₀ = 8.39 Å. That is, it was confirmed that the heat insulating film F was spinel type iron oxide, Fe ₃ O ₄ . The X-ray diffraction pattern is shown in FIG. FIG. 47 shows a scanning electron microscope image of the surface after the heat insulating film F is formed. Similar to the heat insulation film A of Example 1, it can be seen that the film structure has a three-dimensional network structure with sharp corners and connected crystal grains having different sizes. Furthermore, when closely observed, the crystal grains that appear to be twin crystals are continuously three-dimensionally grown, and there are innumerable pores consisting of gaps formed by the network structure inside the film. It was confirmed that the film had a porous structure.

Further, in the same manner as in Example 1, the porosity and Vickers hardness of the heat insulating film F were measured. As a result, it was found that the porosity of the heat insulating film F was 65%. The Vickers hardness was a maximum value Hv370, a minimum value Hv180, and an average value Hv240. FIG. 48 shows a scanning electron microscope image of the polished surface of the heat insulating film F in which the porosity was measured. From this example, it was confirmed that the film produced at 100 ° C. or lower under atmospheric pressure was also a porous ferrite film, similar to the films obtained by hydrothermal synthesis in Examples 1 to 7.

Example 9
When the iron ferrite (Fe ₃ O ₄ ) film is formed by the wet synthesis reaction of the present invention,
1) Fe ²⁺ + OH ⁻ → Fe (OH) ₂ and 2) Fe (OH) ₂ → Fe ₃ O ₄
That is,
1) Ferrous hydroxide (Fe (OH) ₂ ) is produced from divalent iron ions in an alkaline atmosphere.
2) As the hydrolysis reaction proceeds, this ferrous hydroxide changes to an iron ferrite (Fe ₃ O ₄ ) film,
Through these two reactions, ferrite is generated from iron ions.

In Examples 1 to 8, for the production of all the heat insulating films of the present invention, water distilled in a nitrogen atmosphere was used as water for dissolving the raw material. The reason for this is to obtain a high purity and homogeneous ferrous hydroxide (Fe (OH) ₂ ), which is an intermediate product when the ferrite film is synthesized by smoothly proceeding the reaction of 1) above. is there. That is, when oxygen in the atmosphere is dissolved in water used for dissolving ferrous salt (for example, ferrous sulfate) as a raw material, divalent iron ions formed by dissolving the raw material in this water A part of (Fe ²⁺ ions) is changed into trivalent iron ions (Fe ³⁺ ions) due to dissolved oxygen present therein, and is prevented from being mixed and present as an impurity in the aqueous solution of the iron raw material. Because. That is, when trivalent iron ions are present in a raw material solution originally composed only of divalent iron ions, and the amount thereof is constantly changed, the reproducibility of the formation of the ferrite film of the present invention varies. There is a possibility. However, when mass-producing heat insulation membranes, it is desirable to use ion-exchanged water that is easy to handle instead of water distilled in a nitrogen atmosphere that requires attention to storage as the water used for synthesis. .

Therefore, as water used for the synthesis of the heat insulating film, whether or not water obtained by adding a reducing agent to ion-exchanged water can be used instead of the water distilled in the above nitrogen atmosphere, is the same as that of the heat insulating film F of Example 8. An attempt was made to prepare a sample film using a substrate.

In Example 9, a sample film was prepared in the same manner as the heat insulating film F except for the raw material suspension used for the synthesis of the heat insulating film F of Example 8, and the other steps. That is, in the preparation of the raw material suspension, instead of water distilled in a nitrogen atmosphere used in the synthesis of the heat insulating membrane F, water in which ascorbic acid, which is a kind of reducing agent, is dissolved in ion exchange water is used as water. Using. First, an aqueous solution in which 41.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O) was dissolved in 60 ml of ion-exchanged water was prepared, and further 24 mg of ascorbic acid as a reducing agent was added and dissolved in this aqueous solution. Furthermore, 60 ml of a strong alkaline aqueous solution prepared by dissolving 21.6 g of sodium hydroxide (NaOH) in ion exchange water was mixed with the above aqueous solution to prepare a raw material suspension. Using this raw material suspension, the reaction for 115 hours at 98 ° C., which is the same synthesis condition, was performed three times in total using the heat insulating film forming apparatus 2022 (FIG. 45) used for forming the heat insulating film F of Example 8. The heat insulation film | membrane G with a film thickness of about 150 micrometers was produced repeatedly.

For the heat insulating film G, the material was evaluated in exactly the same manner as the heat insulating film F for the purpose of confirming whether a film of a desired material was formed. Similar to Example 1, in addition to the composition and crystal structure necessary for specifying the material of the heat insulating film, the porosity and Vickers hardness were also evaluated.

The heat insulating film G formed on the substrate in this way is spinel iron oxide Fe ₃ O ₄ having a lattice constant a ₀ = 8.39 Å based on composition analysis using an X-ray fluorescence apparatus and X-ray diffraction. Was confirmed. The X-ray diffraction pattern is shown in FIG. FIG. 50 shows a film scanning electron microscope image of the surface after the heat insulation film G is formed. Similar to the heat insulation film A of Example 1, crystal grains having different sizes are connected to form a film structure grown in a three-dimensional network structure, and a gap portion in which the network structure is formed inside It can be seen that there are innumerable pores consisting of.

Further, in the same manner as in Example 1, the porosity and Vickers hardness of the heat insulating film G were measured. As a result, the porosity of the heat insulating film G was 65%. The Vickers hardness was a maximum value Hv380, a minimum value Hv180, and an average value Hv240. FIG. 51 shows a scanning electron microscope image of the polished surface of the heat insulating film G in which the porosity was measured. From this example, it can be seen that even when ion-exchanged water in which a reducing agent is dissolved is used for the synthesis of the heat insulating film, a porous ferrite film can be produced in the same manner as the films obtained by hydrothermal synthesis in Examples 1 to 8. .

Next, in the preparation of the raw material suspension used for the synthesis of the heat insulating film G, hydroquinone (24 mg), which is another type of reducing agent, was added instead of ascorbic acid (24 mg) used as the reducing agent. The only other difference was that the reaction was carried out at 98 ° C. for 88 hours under the same synthesis conditions as those for forming the heat insulation film G to try to synthesize the heat insulation film H. As a result, a film having a thickness of 13 μm was formed on the substrate. This film was analyzed using composition analysis and X-ray diffraction using a fluorescent X-ray apparatus in the same manner as the heat insulating film G, and the heat insulating film H was spinel type iron oxide Fe ₃ O ₄ having a lattice constant a ₀ = 8.38 Å. I understood it. The X-ray diffraction pattern is shown in FIG. A scanning electron microscope image of the film surface after the film formation is shown in FIG. It can be seen that the heat-insulating film G and the porous film have the same shape but different in particle size.

Furthermore, production of the heat insulation film I was attempted by selecting a synthesis temperature condition lower than the synthesis temperature condition of the heat insulation film G described above. The heat insulating film I was synthesized as follows. Except for the synthesis temperature condition of 88 ° C., a film was formed using the same synthesis conditions and synthesis apparatus as those for the synthesis of the heat insulating film G, with the reaction time set to 212 hours. The heat insulating film H thus obtained had a thickness of 25 μm. Further, as with the heat insulating film G, the composition and crystal structure were examined. As a result, it was found that the heat insulating film I was Fe ₃ O ₄ , a spinel type iron oxide having a lattice constant a ₀ = 8.37 Å. The X-ray diffraction pattern is shown in FIG. Further, FIG. 55 shows a scanning electron microscope image of the film surface when the film is formed. FIG. 55 shows that a porous film is formed.

In this example, the heat insulating film obtained by synthesis under atmospheric pressure of 100 ° C. or less was described. However, the raw material suspension of the heat insulating film obtained by hydrothermal synthesis shown in Examples 1 to 7 was used. Even in the production, as the water used for the synthesis of the heat insulating film, in place of the water distilled in the nitrogen atmosphere, water obtained by adding a reducing agent to ion-exchanged water can be used in the same manner as in this example. It can be seen that a heat insulating film made of ferrite can be synthesized.

In the method for synthesizing the heat insulating film, an example of a method using ascorbic acid or hydroquinone as a reducing agent as a starting material has been described. However, the reducing agent is not limited to those described in the present embodiment. Divalent iron ions (Fe ²⁺ ions) in an aqueous solution of an iron salt (eg, ferrous sulfate) are immediately produced in an iron hydroxide suspension produced until a strong alkaline aqueous solution is added or a strong alkaline aqueous solution is added. Any reducing reagent having an effect of preventing oxidation to trivalent iron ions (Fe ³⁺ ions) may be used. For example, water-soluble hydroquinone compounds of various derivatives of hydroquinone may be used as the reducing agent.

Evaluation of heat insulation About the same layer structure as the heat insulation metal mold | die of this invention, the heat insulation performance of said two types of heat insulation film | membrane G and heat insulation film | membrane I was evaluated. Measurement samples 2011G and 2011I for thermal insulation evaluation comprising the same material and the same configuration including the thermal insulation film G or the thermal insulation film I of the present invention were produced. FIG. 56 shows a schematic cross-sectional configuration diagram of the measurement sample 2011 on which the heat insulating film G is arranged. The measurement sample 2011I has the same configuration as that shown in FIG. 56 except that the material of the heat insulating film is the heat insulating film I having a film thickness of 25 μm.

The measurement sample 2011G was produced as follows. First, a round bar made of the same material as the mold base material 2002 used for the heat insulating mold 2001 having the diameter of 10.0 mm and the length of 44.0 mm in the configuration of the eighth embodiment is prepared, and the diameter is formed at the center of one end face thereof. A thermocouple mounting hole 2012a having a depth of 3.5 mm and a depth of 22.0 mm was formed to produce a metal round bar base material 2012. Using this base material 2012, from the iron film having a thickness of 3 μm from the bottom of the end face at the position opposite to the end face with the thermocouple mounting hole 2012a to the position of 23.0 mm, by the same manufacturing method as shown in FIG. A heat insulating film base layer 2013 is formed, and a heat insulating film 2014 made of the heat insulating film G of the present invention having a thickness of 50 μm is formed thereon by the same method as that for forming the heat insulating film G described above. Subsequently, a seed layer 2015 made of an ultrathin palladium catalyst fine particle film is formed by sputtering from the end face with the thermoelectric attachment hole 2012a thereon to the position of 23.0 mm from the bottom face of the end face by sputtering. On top of this, a plating base film 2016 (thickness 1 μm) made of nickel is formed by an electroless nickel plating method, and further on the amorphous nickel phosphorus alloy film having a thickness of 6 μm by an electroless nickel plating method. A plated metal film 2017 was formed, and a metal film layer 2018 composed of a plating base film 2016 and a plated metal film 2017 was formed.

The measurement sample 2011I is the measurement sample 2011 shown in FIG. 56, in which a heat insulating film made of a heat insulating film I having a film thickness of 25 μm is formed instead of the heat insulating film 2014 made of the heat insulating film G having a film thickness of 50 μm. It is a sample.
For comparison of the evaluation of heat insulation, the comparative sample 1211 (FIG. 33) used in Example 1 was used as a comparative sample having a structure having no heat insulating film. Evaluation of heat insulation was performed as follows using the heat insulation evaluation apparatus 21 (FIG. 34) used in Example 1. First, the heat insulating property of the heat insulating film G was measured using the measurement sample 2011G and the comparative sample 1211.

The thermal insulation evaluation of the thermal insulation film G of the present invention was performed at the same time with the two measurement samples 2011G and 1211 kept in the constant temperature water tank 22 shown in FIG. The thermal insulation effect at the time of temperature rise was investigated by measuring the rate of temperature rise. Subsequently, both measurement samples 2011F and 1211 whose temperature rose were attached to the heat insulation plate 24, and were immersed in the low-temperature water of the constant temperature water bath 23 at the same time, and the heat insulation effect at the time of temperature reduction was investigated by measuring the rate of temperature drop. .

In FIG. 57, both measurement samples 2011G and 1211 are compared with the measurement sample 1211 having no heat insulation film with respect to the time change of the temperature rise when immersed in the constant temperature water bath 22 kept at 90 ° C. from room temperature. As a measurement result of the measurement sample 2011G provided with the heat insulating film of the present invention, a time change in temperature rise and a time change in temperature difference between the two measurement samples are shown. FIG. 58 shows the measurement result of the time change of the temperature drop when both the measurement samples 2011G and 1211 whose temperature has been once increased are immersed in a constant temperature water bath kept at 28 ° C. at the same time.

In the same manner, the heat insulating property of the heat insulating film I of the present invention was also evaluated using the measurement sample 2011I and the comparative sample 1211. FIG. 59 shows the time change of the temperature rise when the measurement sample 2011I and the comparison sample 1211 are immersed in the constant temperature water bath 22 kept at 92 ° C. from room temperature, compared with the measurement sample 1211 having no heat insulation film. As a measurement result of the measurement sample 2011I provided with the heat insulating film of the present invention, a time change in temperature rise and a time change in temperature difference between the two measurement samples are shown. FIG. 60 shows the measurement results of the time change of the temperature drop when both the measurement samples 2011I and 1211 whose temperature has been increased are immersed in a constant temperature water bath maintained at 22 ° C. at the same time. As is clear from the results of FIGS. 57 to 60, it is clear that the two types of heat insulating films of the present invention have an effect of making it difficult to transfer heat to the substrate with respect to an external temperature change.

Example 10
As shown in Example 5, in the case of a heat insulating film by a hydrothermal synthesis method, by replacing some of iron ions forming spinel iron oxide Fe ₃ O ₄ with various metal ions, substituted ferrites having various compositions Can be produced in the form of a film on the substrate. In the same manner as in Example 5, in the synthesis under the atmospheric pressure of 100 ° C. or less, which is the synthesis condition of the heat insulating film described in Examples 8 and 9, can substituted ferrites of various compositions be formed in a film shape on the substrate? I examined whether.

First, an attempt was made to form aluminum ferrite, which is a ferrite containing aluminum ions as substitution ions. The synthesis study was performed as follows. The base substrate used for film formation for the purpose of confirming whether a desired ferrite film can be formed by the reaction under atmospheric pressure similar to the method shown in Example 8 is the material evaluation of the heat insulating film of Example 8. The same material (pure copper) and the same shape as the substrate used for the substrate (size: 50 mm long, 20 mm wide, 2.0 mm thick), and the same heat insulating film underlayer (3 μm thick iron plating film) Is formed.

As a processing solution, 34.7 g of ferrous sulfate (FeSO ₄ · 7H ₂ O), 7.9 g of aluminum sulfate (AlSO ₄ · 16H ₂ O) and 48 mg of ascorbic acid are dissolved in ion-exchanged water in 60 ml of water. A suspension was prepared by mixing 60 ml of the prepared aqueous solution and 60 ml of a strong alkaline aqueous solution prepared by dissolving 21.6 g of sodium hydroxide (NaOH) in ion-exchanged water. For the film formation on the substrate, the above-described suspension is put into a stainless steel reaction vessel 2024 having an internal volume of 300 ml using a heat insulating film forming apparatus 2022 shown in FIG. 45, and a heat insulating base layer is formed therein. The substrate was immersed and held using a jig 2025. The reaction was carried out at 98 ° C. for 40 hours. After the reaction, the substrate was taken out together with the jig and thoroughly washed with water. After completion of the reaction, a film having a thickness of 47 μm was formed on the substrate. This film was subjected to composition analysis using a fluorescent X-ray apparatus. As a result, it was confirmed to be a compound of iron and aluminum. Further, the crystal structure was examined using X-ray diffraction. The X-ray diffraction pattern is shown in FIG. As a result of analysis, it was revealed that the obtained film was composed only of a compound having a spinel crystal structure having a lattice constant a ₀ = 8.35 Å. That is, it was confirmed that the obtained film was aluminum ferrite. In addition, observation of the raw surface of this film with a scanning electron microscope revealed that this film was a porous film.

Next, the ferrite film formation in the case where the substitution ions are chromium (Cr) ions was examined. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O), 5.6 g of chromium sulfate (CrSO ₄ .3H ₂ O), and 48 mg of ascorbic acid are dissolved in 60 ml of water, 21 The only difference is that a suspension prepared by mixing 60 ml of a strong alkaline aqueous solution prepared by dissolving 0.6 g of sodium hydroxide (NaOH) in ion-exchanged water is used. A film was formed by reacting at 98 ° C. for 40 hours in exactly the same manner as in the case of examining the film. A film having a thickness of 6 μm was formed on the substrate. This film was analyzed using a composition analysis by an X-ray fluorescence apparatus and X-ray diffraction as in the case of the above-mentioned aluminum ferrite, and a spinel crystal having a chemical composition of iron and chromium and a lattice constant of a ₀ = 8.39 Å. It was found to be an oxide of structure, ie chromium ferrite. The X-ray diffraction pattern is shown in FIG. Although this film was a thin film, it was found from observation of the unprocessed surface with a scanning electron microscope that the film was a porous film.

The film formation of ferrite when the substitution ions are magnesium (Mg) ions was examined. As a treatment liquid, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O), 6.2 g of magnesium sulfate (MgSO ₄ .7H ₂ O), and 48 mg of ascorbic acid were dissolved in 60 ml of water, 21 .6 g of sodium hydroxide (NaOH) dissolved in ion-exchanged water, except that a suspension prepared by mixing 60 ml of a strong alkaline aqueous solution was used. In the same manner as in the case, a film was formed by reacting at 98 ° C. for 40 hours. A film having a thickness of 11 μm was formed on the substrate. This film was analyzed using a composition analysis using a fluorescent X-ray apparatus and X-ray diffraction in the same manner as described above, and an oxide having a spinel crystal structure with a chemical composition of iron and magnesium and a lattice constant a ₀ = 8.36 、, In other words, it was found to be magnesium ferrite. The X-ray diffraction pattern is shown in FIG. This membrane was also a porous membrane.

The film formation of ferrite when the substitution ions are manganese (Mn) ions was examined. As a treatment liquid, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O), 6.0 g of manganese sulfate (MnSO ₄ .5H ₂ O), and 48 mg of ascorbic acid were dissolved in 60 ml of water, 21 .6 g of sodium hydroxide (NaOH) dissolved in ion-exchanged water, except that a suspension prepared by mixing 60 ml of a strong alkaline aqueous solution was used. In the same manner as in the case, a film was formed by reacting at 98 ° C. for 40 hours. A film having a thickness of 18 μm was formed on the substrate. As a result of material analysis of the film in the same manner as described above, it was revealed that the film was composed of only a compound having a spinel crystal structure with a chemical composition of iron and manganese and a lattice constant a ₀ = 8.43 Å. That is, it was confirmed that the obtained film was manganese ferrite. The X-ray diffraction pattern is shown in FIG. This membrane was also a porous membrane.

The film formation of ferrite when the substitution ions are zinc (Zn) ions was examined. As a treatment solution, an aqueous solution in which 34.7 g of ferrous sulfate (FeSO ₄ .7H ₂ O), 7.2 g of zinc sulfate (ZnSO ₄ .7H ₂ O), and 48 mg of ascorbic acid were dissolved in 60 ml of water, 21 .6 g of sodium hydroxide (NaOH) dissolved in ion-exchanged water, except that a suspension prepared by mixing 60 ml of a strong alkaline aqueous solution was used. In the same manner as in the case, a film was formed by reacting at 98 ° C. for 40 hours. A film having a thickness of 20 μm was formed on the substrate. As a result of material analysis of this film in the same manner as described above, it was found that it was an oxide of spinel crystal structure having a chemical composition of iron and zinc and a lattice constant a ₀ = 8.45Å, that is, zinc ferrite. The X-ray diffraction pattern is shown in FIG. This membrane was also a porous membrane.

The film formation of ferrite when the substitution ions are calcium ions was examined. As a treatment liquid, 19.9 g of ferrous chloride (FeCl ₂ .4H ₂ O), 7.4 g of calcium chloride (CaCl ₂ .2H ₂ O), and 60 ml of an aqueous solution in which 48 mg of ascorbic acid are dissolved in ion-exchanged water, The only difference is the use of a suspension prepared by mixing 60 ml of a strongly alkaline aqueous solution prepared by dissolving 21.6 g of sodium hydroxide (NaOH) in ion-exchanged water. A film was formed by reacting at 98 ° C. for 40 hours in exactly the same manner as in. A film having a thickness of 21 μm was formed on the substrate. As a result of material analysis of this film in the same manner as described above, it was found that the film was a spinel crystal structure oxide having a chemical composition of iron and calcium and a lattice constant a ₀ = 8.36 Å, that is, calcium ferrite. The X-ray diffraction pattern is shown in FIG. This membrane was also a porous membrane.

From the above, it can be seen that various ferrite films substituted with various metal ions can be formed into a film shape on a substrate in the synthesis under atmospheric pressure of 100 ° C. or lower, as in Example 5.

In addition to excellent heat insulation, the mold of the present invention with a predetermined heat insulation layer has excellent mold base forming surface coverage and can be directly formed while adjusting the film thickness without post-processing. Therefore, it is useful as a heat insulating mold for resin molding having a complicated shape such as an optical element or a molded product having a fine pattern shape. It can also be applied to uses such as a mold for nanoimprinting.

Claims

A metal mold having a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, wherein the heat insulating layer is a porous structure in which ferrite crystal particles are formed in a three-dimensional network. A heat insulating mold characterized by comprising a solid material.
The ferrite has the following general formula A x Fe 3-x O 4 (where A represents at least one metal element that can be substituted for the Fe site constituting the spinel-type iron oxide crystal, and x is 0 ≦ x <1 Meet)
The heat insulation metal mold | die of Claim 1 which is a compound which has a spinel type crystal structure shown by these.
The heat insulation metal mold | die of Claim 2 whose said A is at least 1 sort (s) of Ca, Zn, Mn, Al, Cr, Li, and Mg.
The heat insulating mold according to claim 1, wherein the heat insulating layer has a porosity of 5 to 75%.
The heat insulation metal mold | die of Claim 1 whose thickness of a heat insulation layer is 15 micrometers or more.
The heat insulating mold according to claim 1, wherein the heat insulating layer has a Vickers hardness of Hv130 to Hv560.
A heat insulating layer is generated by reacting 1) the surface of a metal mold base or 2) the surface of a metallic layer previously formed on the surface of the mold base with an aqueous solution or water dispersion containing a metal component. The heat insulation metal mold | die of Claim 1 which is what was made to do.
The heat insulation metal mold | die of Claim 1 which contains at least 1) the seed layer containing the plating catalyst formed on the said heat insulation layer as the said metal film, and 2) the metal plating film formed on the said seed layer.
The heat insulation metal mold | die of Claim 1 used for shaping | molding of the composition containing a resin component.
A method of manufacturing a mold having a heat insulating layer between a metal mold base material and a metal film constituting a molding surface, and as a step of forming the heat insulating layer, 1) the surface of the metal mold base material Or 2) including a step of generating a metal oxide by reacting a surface of a metallic layer previously formed on the surface of the mold base material with an aqueous solution or water dispersion containing a metal component. Production method.
The manufacturing method according to claim 10, comprising: 1) a step of forming a seed layer containing a catalyst on the heat insulating layer, and 2) a step of forming a metal plating film on the seed layer as the formation step of the metal film. .
The manufacturing method according to claim 11, wherein the seed layer is formed by a sputtering method or a plating method.
In the state in which the reaction is 1) the surface of the metal mold base material or 2) the surface of the metal layer previously formed on the mold base material is in contact with the treatment liquid obtained by mixing the metal salt, alkali and water. The manufacturing method of Claim 10 including the process heat-processed at the temperature of 85 degreeC or more.
The production method according to claim 13, wherein the heat treatment is performed in an environment of a saturated water vapor pressure of 100 to 200 ° C or higher.
The manufacturing method of Claim 10 which performs the said reaction in presence of a reducing agent.