WO2012002508A1 - Conductive particle with insulative particles attached thereto, anisotropic conductive material, and connecting structure - Google Patents
Conductive particle with insulative particles attached thereto, anisotropic conductive material, and connecting structure Download PDFInfo
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- WO2012002508A1 WO2012002508A1 PCT/JP2011/065095 JP2011065095W WO2012002508A1 WO 2012002508 A1 WO2012002508 A1 WO 2012002508A1 JP 2011065095 W JP2011065095 W JP 2011065095W WO 2012002508 A1 WO2012002508 A1 WO 2012002508A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/16—Non-insulated conductors or conductive bodies characterised by their form comprising conductive material in insulating or poorly conductive material, e.g. conductive rubber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
- H01R4/04—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation using electrically conductive adhesives
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R11/00—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts
- H01R11/01—Individual connecting elements providing two or more spaced connecting locations for conductive members which are, or may be, thereby interconnected, e.g. end pieces for wires or cables supported by the wire or cable and having means for facilitating electrical connection to some other wire, terminal, or conductive member, blocks of binding posts characterised by the form or arrangement of the conductive interconnection between the connecting locations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R12/00—Structural associations of a plurality of mutually-insulated electrical connecting elements, specially adapted for printed circuits, e.g. printed circuit boards [PCB], flat or ribbon cables, or like generally planar structures, e.g. terminal strips, terminal blocks; Coupling devices specially adapted for printed circuits, flat or ribbon cables, or like generally planar structures; Terminals specially adapted for contact with, or insertion into, printed circuits, flat or ribbon cables, or like generally planar structures
- H01R12/50—Fixed connections
- H01R12/51—Fixed connections for rigid printed circuits or like structures
- H01R12/52—Fixed connections for rigid printed circuits or like structures connecting to other rigid printed circuits or like structures
Definitions
- the present invention relates to, for example, conductive particles with insulating particles that can be used for electrical connection between electrodes, and an anisotropic conductive material and a connection structure using the conductive particles with insulating particles.
- Anisotropic conductive materials such as anisotropic conductive pastes and anisotropic conductive films are widely known.
- anisotropic conductive materials conductive particles are dispersed in a binder resin.
- the anisotropic conductive material is used for connection between an IC chip and a flexible printed circuit board, connection between an IC chip and a circuit board having an ITO electrode, and the like. For example, after disposing an anisotropic conductive material between the electrode of the IC chip and the electrode of the circuit board, these electrodes can be electrically connected by heating and pressing.
- Patent Document 1 discloses conductive with insulating particles having conductive particles and insulating particles fixed to the surface of the conductive particles and having adhesive properties. Particles are disclosed.
- the insulating particles include hard particles and a polymer resin layer covering the surfaces of the hard particles.
- a physical / mechanical hybridization method is used as an immobilization method in order to immobilize the insulating particles on the surface of the conductive particles.
- Patent Document 2 includes conductive particles having a polar group on at least a part of a surface, and an insulating material that covers at least a part of the surface of the conductive particles and includes insulating particles.
- a conductive particle with insulating particles is disclosed.
- the insulating material includes a polymer electrolyte that can adsorb the polar group, and inorganic oxide particles that can adsorb the polymer electrolyte.
- the inorganic oxide particles are insulating particles.
- the insulating particles are easily detached from the surface of the conductive particles.
- the insulating particles may be easily detached from the surface of the conductive particles.
- An object of the present invention is to provide a conductive particle with an insulating particle that can improve the conduction reliability when the insulating particle is difficult to be detached from the surface of the conductive particle. It is to provide an anisotropic conductive material and a connection structure using conductive particles with insulating particles.
- conductive particles having a conductive layer on at least a surface, and insulating particles attached to the surface of the conductive particles, and the insulating particles include an insulating particle body and A layer covering at least a part of the surface of the insulating particle body and formed of a polymer compound, and the insulating particle body and the layer are chemically bonded.
- Conductive particles with insulating particles are provided.
- the insulating particle body is an inorganic particle.
- the layer is more flexible than the insulating particle body.
- the insulating particle main body having a reactive functional group on the surface and a polymer compound or a compound that becomes the polymer compound are used.
- the insulating particle body and the layer are chemically bonded by chemically bonding the layer formed of the polymer compound to the reactive functional group on the surface of the insulating particle body.
- the insulating particles are obtained.
- the insulating particles are friction by mixing using the insulating particle body and a polymer compound or a compound that becomes the polymer compound. Not formed.
- a conductive particle-containing liquid with insulating particles obtained by adding 3 parts by weight of conductive particles with insulating particles to 100 parts by weight of ethanol is 20 ° C.
- the ultrasonic treatment is performed for 5 minutes under the condition of 38 kHz or 40 kHz, the residual ratio of the insulating particles obtained by the following formula (1) is 60 to 95%.
- Residual rate of insulating particles (%) (coverage after ultrasonic treatment / coverage before ultrasonic treatment) ⁇ 100 Equation (1)
- the coverage which is the area of the portion covered with the insulating particles in the entire surface area of the conductive particles, is 40% or more. .
- the coverage is preferably over 50%.
- the anisotropic conductive material according to the present invention includes conductive particles with insulating particles configured according to the present invention and a binder resin.
- the anisotropic conductive material according to the present invention is preferably an anisotropic conductive paste.
- connection structure includes a first connection target member, a second connection target member, and a connection portion connecting the first and second connection target members, and the connection The portion is formed of conductive particles with insulating particles configured according to the present invention, or is formed of an anisotropic conductive material including the conductive particles with insulating particles and a binder resin.
- the insulating particles attached to the surface of the conductive particles having at least the conductive layer on the surface are the insulating particle main body and at least the surface of the insulating particle main body. And a layer formed of a polymer compound that covers a part of the region, and since the insulating particle body and the layer are chemically bonded to each other, the insulating particle is exposed from the surface of the conductive particle. Can be prevented from unintentionally desorbing.
- the conductive particles with insulating particles according to the present invention are used to connect the electrodes, even if a plurality of conductive particles with insulating particles come into contact, the insulating particles are not insulated between adjacent conductive particles. Since particles exist, it is difficult to electrically connect adjacent electrodes that should not be connected. For this reason, the conduction
- FIG. 1 is a cross-sectional view showing conductive particles with insulating particles according to the first embodiment of the present invention.
- FIG. 2 is a cross-sectional view showing conductive particles with insulating particles according to the second embodiment of the present invention.
- FIG. 3 is a cross-sectional view showing conductive particles with insulating particles according to the third embodiment of the present invention.
- FIG. 4 is a front cross-sectional view schematically showing a connection structure using the conductive particles with insulating particles shown in FIG.
- FIG. 5 is a schematic diagram for explaining a method for evaluating the coverage.
- FIG. 6 is a cross-sectional view showing a conventional conductive particle with insulating particles using a hybridization method.
- FIG. 1 is a sectional view showing conductive particles with insulating particles according to the first embodiment of the present invention.
- 1 includes the conductive particles 2 and a plurality of insulating particles 3 attached to the surface of the conductive particles 2.
- the insulating particles 3 have an insulating particle body 5 and a layer 6 that covers the surface of the insulating particle body 5 and is formed of a polymer compound.
- the insulating particles 3 are made of an insulating material.
- the insulating particle body 5 and the layer 6 are chemically bonded. Specifically, the surface of the insulating particle body 5 and the inner surface of the layer 6 are chemically bonded.
- the layer 6 covers the entire surface of the insulating particle body 5. Therefore, the layer 6 is disposed between the conductive particles 2 and the insulating particle main body 5.
- the layer 6 may be present so as to cover at least a part of the surface of the insulating particle main body, and may not cover the entire surface of the insulating particle main body.
- the layer 6 is preferably disposed between the conductive particles and the insulating particle main body.
- the conductive particles 2 have base material particles 11 and a conductive layer 12 provided on the surface of the base material particles 11.
- the conductive layer 12 covers the surface of the base particle 11.
- the conductive particle 2 is a coated particle in which the surface of the base particle 11 is coated with the conductive layer 12.
- the conductive particles 2 have a conductive layer 12 on the surface.
- FIG. 2 is a sectional view showing conductive particles with insulating particles according to the second embodiment of the present invention.
- the conductive particles 22 includes the conductive particles 22 and the plurality of insulating particles 3 attached to the surface of the conductive particles 22.
- the conductive particles 22 have base material particles 11 and a conductive layer 31 provided on the surface of the base material particles 11.
- the conductive particles 22 have a plurality of core substances 32 on the surface of the substrate particles 11.
- the conductive layer 31 covers the base particle 11 and the core substance 32.
- the conductive particles 22 have a plurality of protrusions 33 on the surface.
- the surface of the conductive layer 31 is raised by the core substance 32, and a plurality of protrusions 33 are formed.
- FIG. 3 is a sectional view showing conductive particles with insulating particles according to the third embodiment of the present invention.
- the conductive particle 41 with insulating particles shown in FIG. 3 includes conductive particles 42 and a plurality of insulating particles 3 attached to the surface of the conductive particles 42.
- the conductive particles 42 have base material particles 11 and a conductive layer 46 provided on the surface of the base material particles 11.
- the conductive layer 46 includes a first conductive layer 46a provided on the surface of the base particle 11 and a second conductive layer 46b provided on the surface of the first conductive layer 46a.
- the conductive particles 42 have a plurality of core substances 47 on the surface of the first conductive layer 46a.
- the second conductive layer 46 b covers the first conductive layer 46 a and the core substance 47.
- the substrate particles 11 and the core substance 47 are arranged with a space therebetween.
- a first conductive layer 46 a exists between the base particle 11 and the core substance 47.
- the conductive particles 42 By covering the core substance 47 with the second conductive layer 46b, the conductive particles 42 have a plurality of protrusions 48 on the surface.
- the surfaces of the conductive layer 46 and the second conductive layer 46b are raised by the core material 47, and a plurality of protrusions 48 are formed.
- the insulating particles 3 include an insulating particle body 5 and a layer 6 that covers the surface of the insulating particle body 5 and is formed of a polymer compound. Furthermore, the insulating particle body 5 and the layer 6 are chemically bonded. As a result, when the conductive particles with insulating particles 1, 21, 41 are added to the binder resin and kneaded, the insulating particles 3 are less likely to be detached from the surfaces of the conductive particles 2, 22, 42. Furthermore, when a plurality of conductive particles with insulating particles come into contact with each other, the insulating particles are hardly detached from the surfaces of the conductive particles 2, 22, and 42.
- the conductive particles with insulating particles 1, 21, 41 can sufficiently ensure the continuity of the upper and lower electrodes to be connected.
- the residual rate of the insulating particles 3 is preferably 60 to 95%.
- the residual rate of the insulating particles 3 is more preferably 70% or more, and more preferably 90% or less.
- the surfaces of the conductive particles 2, 22, 42 are added when the conductive particles 1, 21, 41 with insulating particles are added to the binder resin and kneaded. Insulating particles 3 are more difficult to detach from the electrode, and when electrodes are connected using conductive particles with insulating particles 1, 21 and 41, more leakage occurs between adjacent electrodes that should not be connected. It becomes difficult.
- the residual ratio of the insulating particles is less than or equal to the above upper limit, the high conductivity of the upper and lower electrodes to be connected can be sufficiently ensured.
- the “residual ratio of the insulating particles” and the coverage which is the area of the portion covered with the insulating particles in the entire surface area of the conductive particles, are obtained as follows.
- the coverage is as follows.
- One insulating particle B1 present in the circle on the outer surface (outer peripheral edge) of the conductive layer insulating property present on the circumference of the outer surface (outer peripheral edge) of the conductive layer of the conductive particle A with insulating particles
- the number of particles B2 is counted as 0.5, and is represented by the ratio of the projected area of the insulating particles to the projected area of the conductive particles A with insulating particles.
- Coverage (%) (((number of insulating particles in circle) ⁇ 1 + (number of insulating particles on the circumference) ⁇ 0.5) ⁇ projection area of insulating particles) / (with insulating particles) Projected area of conductive particles) ⁇ 100 (2)
- conductive particles with insulating particles 3 parts by weight are added to 100 parts by weight of ethanol to obtain a conductive particle-containing liquid with insulating particles.
- This conductive particle-containing liquid with insulating particles is subjected to ultrasonic treatment while being stirred for 5 minutes at 20 ° C. and 38 kHz or 40 kHz with a 400 W ultrasonic cleaner.
- 100 conductive particles with insulating particles are observed by observation with an SEM, and the portion of the conductive particles with insulating particles covered by the insulating particles occupying the entire surface area of the conductive particles.
- a coverage ratio X2 (%) also referred to as an adhesion ratio X2 (%)
- the residual rate of the insulating particles is a value represented by the following formula (1) from the coverage X1 and the coverage X2.
- Residual ratio of insulating particles (coverage ratio X2 after ultrasonic treatment / coverage ratio X1 before ultrasonic treatment) ⁇ 100 (1)
- the coverage of the insulating particles is preferably 40% or more.
- the said coverage shows the area of the part coat
- the coverage is preferably 90% or less, more preferably 80% or less, and most preferably 70% or less.
- the coverage of the insulating particles is 70% or less, the insulating particles can be sufficiently eliminated without applying heat and pressure more than necessary when the electrodes are connected.
- the coverage may exceed 45%, may exceed 50%, may exceed 55%, and may exceed 60%.
- the insulating particles 3 are detached from the surfaces of the conductive particles 2, 22, 42. It becomes difficult to separate. For example, when the conductive particles 1, 21, 41 with insulating particles are added to the binder resin and kneaded, the insulating particles 3 are not easily detached from the surfaces of the conductive particles 2, 22, 42. For this reason, when the conductive particles 1, 21, 41 with insulating particles are used for the connection between the electrodes, the insulating particles 3 exist between the adjacent conductive particles 2, 22, 42. It is difficult to electrically connect adjacent electrodes that should not be connected. Therefore, when the electrodes are connected using the conductive particles with insulating particles 1, 21, 41, the conduction reliability can be improved.
- the conductive particles with insulating particles have a layer formed of a polymer compound using a polymer compound or a compound that becomes a polymer compound so as to cover at least a part of the surface of the insulating particle body. It is preferably obtained through a step of forming and obtaining insulating particles and a step of attaching the insulating particles to the surface of the conductive particles having at least the surface of the conductive layer to obtain conductive particles with insulating particles.
- the variation coefficient of the particle diameter of the conductive particles with insulating particles is preferably 8% or less, more preferably 5% or less.
- CV value ( ⁇ / Dn) ⁇ 100 ⁇ : Standard deviation of particle diameter of conductive particles with insulating particles Dn: Average value of particle diameter of conductive particles with insulating particles
- the compression elastic modulus of the conductive particles with insulating particles is preferably 1 GPa or more, more preferably 2 GPa or more, preferably 7 GPa or less, and more preferably 5 GPa or less.
- the compression recovery rate of the conductive particles with insulating particles is preferably 20% or more, more preferably 30% or more, preferably 60% or less, more preferably 50% or less.
- the compressive elastic modulus (10% K value) of the conductive particles with insulating particles at 20 ° C. is measured as follows.
- the conductive particles with insulating particles are compressed under the conditions of a compression rate of 0.33 mN / sec and a maximum test load of 20 mN on the end face of a diamond cylinder having a diameter of 50 ⁇ m.
- the load value (N) and compression displacement (mm) at this time are measured. From the measured value obtained, the compression elastic modulus can be obtained by the following formula.
- the micro compression tester for example, “Fischer Scope H-100” manufactured by Fischer is used.
- the above-described compression elastic modulus universally and quantitatively represents the hardness of the conductive particles with insulating particles.
- the hardness of the conductive particles with insulating particles can be expressed quantitatively and uniquely.
- the compression recovery rate can be measured as follows.
- ⁇ Sprinkle conductive particles with insulating particles on the sample stage With respect to one dispersed conductive particle with insulating particles, a load is applied to the reversal load value (5.00 mN) in the center direction of the conductive particles with insulating particles using a micro compression tester. Thereafter, the load is gradually reduced to the load value for origin (0.40 mN). The load-compression displacement during this period is measured, and the compression recovery rate can be obtained from the following equation.
- the load speed is 0.33 mN / sec.
- the micro compression tester for example, “Fischer Scope H-100” manufactured by Fischer is used.
- Compression recovery rate (%) [(L1-L2) / L1] ⁇ 100
- L1 Compressive displacement from the load value for the origin to the reverse load value when applying the load
- L2 Compressive displacement from the reverse load value to the load value for the origin when releasing the load
- Conductive particles with insulating particles can be obtained by attaching the insulating particles to the surface of conductive particles having at least a conductive layer on the surface.
- the conductive particles only need to have a conductive layer on at least the surface.
- the conductive particles may be conductive particles having base material particles and a conductive layer provided on the surface of the base material particles, or may be metal particles whose entirety is a conductive layer.
- the base particles and the conductive material provided on the surface of the base particles are used. Conductive particles having a layer are preferred.
- Examples of the substrate particles include resin particles, inorganic particles, organic-inorganic hybrid particles, and metal particles.
- the base material particles are preferably resin particles formed of a resin.
- the conductive particles with insulating particles are compressed by placing the conductive particles with insulating particles between the electrodes and then pressing them.
- the substrate particles are resin particles, the conductive particles are easily deformed during the above-described pressure bonding, and the contact area between the conductive particles and the electrode can be increased. For this reason, the conduction
- the resin for forming the resin particles examples include polyolefin resin, acrylic resin, phenol resin, melamine resin, benzoguanamine resin, urea resin, epoxy resin, unsaturated polyester resin, saturated polyester resin, polyethylene terephthalate, polysulfone, and polyphenylene.
- examples thereof include oxides, polyacetals, polyimides, polyamideimides, polyetheretherketones, and polyethersulfones. Since the hardness of the base particles can be easily controlled within a suitable range, the resin for forming the resin particles is a polymer obtained by polymerizing one or more polymerizable monomers having an ethylenically unsaturated group. It is preferably a coalescence.
- Examples of the inorganic substance for forming the inorganic particles include silica and carbon black.
- Examples of the organic / inorganic hybrid particles include organic / inorganic hybrid particles formed of a crosslinked alkoxysilyl polymer and an acrylic resin.
- the substrate particles are metal particles
- examples of the metal for forming the metal particles include silver, copper, nickel, silicon, gold, and titanium.
- the metal for forming the conductive layer is not particularly limited. Furthermore, when the conductive particles are metal particles that are conductive layers as a whole, the metal for forming the metal particles is not particularly limited. Examples of the metal include gold, silver, copper, palladium, platinum, palladium, zinc, iron, tin, lead, aluminum, cobalt, indium, nickel, chromium, titanium, antimony, bismuth, thallium, germanium, cadmium, and silicon. And alloys thereof. Examples of the metal include tin-doped indium oxide (ITO) and solder. Especially, since the connection resistance between electrodes can be made still lower, an alloy containing tin, nickel, palladium, copper or gold is preferable, and nickel or palladium is more preferable.
- ITO tin-doped indium oxide
- hydroxyl groups often exist on the surface of the conductive layer due to oxidation.
- hydroxyl groups are present on the surface of a conductive layer formed of nickel by oxidation.
- Such a conductive layer having a hydroxyl group is easily chemically bonded to the insulating particles, for example, chemically bonded to the insulating particles having a hydroxyl group.
- the conductive layer is formed of one layer.
- the conductive layer may be formed of a plurality of layers. That is, the conductive layer may have a stacked structure of two or more layers.
- the outermost layer is preferably a gold layer, a nickel layer, a palladium layer, a copper layer, or an alloy layer containing tin and silver, and is a gold layer. Is more preferable.
- the connection resistance between the electrodes can be further reduced.
- the corrosion resistance can be further enhanced.
- the method for forming the conductive layer on the surface of the substrate particles is not particularly limited.
- a method for forming the conductive layer for example, a method by electroless plating, a method by electroplating, a method by physical vapor deposition, and a method of coating the surface of base particles with metal powder or a paste containing metal powder and a binder Etc.
- the method by electroless plating is preferable.
- the method by physical vapor deposition include methods such as vacuum vapor deposition, ion plating, and ion sputtering.
- the average particle diameter of the conductive particles is preferably in the range of 0.5 to 100 ⁇ m.
- the average particle diameter of the conductive particles is more preferably 1 ⁇ m or more, and more preferably 20 ⁇ m or less.
- the contact area between the conductive particles and the electrodes is sufficiently large when the electrodes are connected using the conductive particles with insulating particles.
- the “average particle size” of the conductive particles indicates a number average particle size.
- the average particle diameter of the conductive particles can be obtained by observing 50 arbitrary conductive particles with an electron microscope or an optical microscope and calculating an average value.
- the thickness of the conductive layer is preferably in the range of 0.005 to 1 ⁇ m.
- the thickness of the conductive layer is more preferably 0.01 ⁇ m or more, and more preferably 0.3 ⁇ m or less.
- the thickness of the conductive layer is not less than the above lower limit and not more than the above upper limit, sufficient conductivity can be obtained, and the conductive particles do not become too hard, and the conductive particles are sufficiently bonded at the time of connection between the electrodes. Can be deformed.
- the thickness of the outermost conductive layer is in the range of 0.001 to 0.5 ⁇ m, particularly when the outermost layer is a gold layer. It is preferable that A more preferable lower limit of the thickness of the outermost conductive layer is 0.01 ⁇ m, and a more preferable upper limit is 0.1 ⁇ m.
- the thickness of the outermost conductive layer is not less than the above lower limit and not more than the above upper limit, the coating with the outermost conductive layer can be made uniform, corrosion resistance can be sufficiently enhanced, and the connection resistance between the electrodes can be increased. It can be made sufficiently low. Further, the thinner the gold layer when the outermost layer is a gold layer, the lower the cost.
- the thickness of the conductive layer can be measured by observing the cross section of the conductive particles or the conductive particles with insulating particles using, for example, a transmission electron microscope (TEM).
- TEM transmission electron microscope
- the conductive particles preferably have protrusions on the surface of the conductive layer, and the protrusions are preferably plural.
- An oxide film is often formed on the surface of the electrode connected by the conductive particles with insulating particles.
- the oxide film can be effectively eliminated by the protrusions by disposing the conductive particles between the electrodes and pressing them. For this reason, an electrode and a conductive layer can be contacted still more reliably and the connection resistance between electrodes can be made low.
- the insulating particles between the conductive particles and the electrodes can be effectively eliminated by the protrusions of the conductive particles. For this reason, the conduction
- a method of forming a conductive layer by electroless plating after attaching a core substance to the surface of the base particles, and by electroless plating on the surface of the base particles examples include forming a conductive layer, then attaching a core substance, and further forming a conductive layer by electroless plating.
- a conductive substance that becomes the core substance is added to the dispersion of the base particle, and the core substance is applied to the surface of the base particle, for example, a fan.
- the method of making a core substance accumulate and adhere on the surface of the base particle in a dispersion liquid is preferable.
- the conductive particles may have a first conductive layer on the surface of the base particle, and may have a second conductive layer on the first conductive layer.
- a core substance may be attached to the surface of the first conductive layer.
- the core material is preferably covered with a second conductive layer.
- the thickness of the first conductive layer is preferably in the range of 0.05 to 0.5 ⁇ m.
- the conductive particles form a first conductive layer on the surface of the base particle, and then a core material is deposited on the surface of the first conductive layer, and then the first conductive layer and the core material are formed. It is preferably obtained by forming a second conductive layer on the surface.
- Examples of the conductive substance constituting the core substance include metals, metal oxides, conductive nonmetals such as graphite, and conductive polymers.
- Examples of the conductive polymer include polyacetylene. Among them, metal is preferable because conductivity can be increased.
- the metal examples include gold, silver, copper, platinum, zinc, iron, lead, tin, aluminum, cobalt, indium, nickel, chromium, titanium, antimony, bismuth, germanium and cadmium, and tin-lead.
- examples thereof include alloys composed of two or more metals such as alloys, tin-copper alloys, tin-silver alloys, and tin-lead-silver alloys. Of these, nickel, copper, silver or gold is preferable.
- the metal constituting the core material may be the same as or different from the metal constituting the conductive layer.
- the shape of the core substance is not particularly limited.
- the shape of the core substance is preferably a lump.
- Examples of the core substance include a particulate lump, an agglomerate in which a plurality of fine particles are aggregated, and an irregular lump.
- the insulating particles are particles having insulating properties. Insulating particles are smaller than conductive particles. When the electrodes are connected using conductive particles with insulating particles, the insulating particles can prevent a short circuit between adjacent electrodes. Specifically, when the conductive particles with a plurality of insulating particles are in contact with each other, there are insulating particles between the conductive particles in the conductive particles with a plurality of insulating particles. Short circuit between the electrodes adjacent in the lateral direction can be prevented. Note that the insulating particles between the conductive layer and the electrode can be easily excluded by pressurizing the conductive particles with insulating particles with the two electrodes when connecting the electrodes. In the case where protrusions are provided on the surface of the conductive particles, the insulating particles between the conductive layer and the electrode can be more easily eliminated. Furthermore, since the protruding portion facilitates contact with the electrode, connection reliability is improved.
- Examples of the material constituting the insulating particles include an insulating resin and an insulating inorganic substance.
- the insulating resin the said resin quoted as resin for forming the resin particle which can be used as a base particle is mentioned.
- As said insulating inorganic substance the said inorganic substance quoted as an inorganic substance for forming the inorganic particle which can be used as a base particle is mentioned.
- the insulating resin that is the material of the insulating particles include polyolefins, (meth) acrylate polymers, (meth) acrylate copolymers, block polymers, thermoplastic resins, crosslinked thermoplastic resins, heat Examples thereof include curable resins and water-soluble resins.
- thermoplastic resin examples include vinyl polymers and vinyl copolymers.
- thermosetting resin an epoxy resin, a phenol resin, a melamine resin, etc.
- water-soluble resin examples include polyvinyl alcohol, polyacrylic acid, polyacrylamide, polyvinyl pyrrolidone, polyethylene oxide, and methyl cellulose. Of these, water-soluble resins are preferable, and polyvinyl alcohol is more preferable.
- the insulating particle body is preferably inorganic particles.
- the inorganic particles include shirasu particles, hydroxyapatite particles, magnesia particles, zirconium oxide particles, and silica particles.
- the insulating particle body is preferably silica particles.
- the silica particles include pulverized silica and spherical silica, and spherical silica is preferably used.
- the silica particles preferably have a functional group capable of chemical bonding such as a carboxyl group and a hydroxyl group on the surface, and more preferably have a hydroxyl group.
- Inorganic particles are relatively hard, especially silica particles are relatively hard.
- conductive particles with insulating particles using such hard insulating particles as insulating particles are added to a binder resin and kneaded, the insulating particles are hard, so that the insulating particles are removed from the surface of the conductive particles. There is a tendency to detach easily.
- the conductive particles with insulating particles according to the present invention are used, since the insulating particles have a layer formed of the above polymer compound, even if a hard insulating particle body is used, During kneading, it is possible to prevent the insulating particles having a hard insulating particle body from being detached.
- the layer formed of the above polymer compound serves as a flexible layer, for example.
- the polymer compound in the layer formed of the polymer compound or the compound that becomes the polymer compound by polymerization or the like is preferably a compound having a polymerizable reactive functional group.
- the polymerizable reactive functional group is preferably an unsaturated double bond.
- a compound having an unsaturated double bond (a compound that becomes a polymer compound) may be subjected to a polymerization reaction on the surface of the insulating particle main body, and the reactive functional group on the surface of the polymer compound and the insulating particle main body. And may be reacted.
- the polymer compound or the compound to be the polymer compound include a compound having a (meth) acryloyl group, a compound having an epoxy group, and a compound having a vinyl group.
- the polymer compound or the compound to be the polymer compound is (meth) It preferably has at least one reactive functional group selected from the group consisting of an acryloyl group, a glycidyl group and a vinyl group.
- the polymer compound or the compound to be the polymer compound preferably has a (meth) acryloyl group.
- Specific examples of the compound having the (meth) acryloyl group include methacrylic acid, hydroxyethyl acrylate, and ethylene glycol dimethacrylate.
- epoxy compound examples include bisphenol A type epoxy resin and resorcinol glycidyl ether.
- Specific examples of the compound having a vinyl group include styrene and vinyl acetate.
- the weight average molecular weight of the polymer compound is preferably 1000 or more.
- the upper limit of the weight average molecular weight of the polymer compound is not particularly limited, but the polymer compound preferably has a weight average molecular weight of 20000 or less.
- the weight average molecular weight indicates a value in terms of polystyrene measured by gel permeation chromatography (GPC).
- the method for forming the layer formed of the polymer compound on the surface of the insulating particle body is not particularly limited. Using a polymer compound or a compound that becomes a polymer compound so as to cover at least a part of the surface of the insulating particle main body, a layer formed of the polymer compound is formed to obtain insulating particles. preferable.
- a method for forming a layer formed of the polymer compound a compound having a reactive double bond and a hydroxyl group is formed on an insulating particle body having a reactive functional group such as a vinyl group on the surface. And a method of polymerizing on the surface. However, methods other than this forming method may be used.
- the insulating particle body and the layer are chemically bonded.
- This chemical bond includes a covalent bond, a hydrogen bond, an ionic bond, a coordination bond, and the like. Of these, a covalent bond is preferable, and a chemical bond using a reactive functional group is preferable.
- Examples of the reactive functional group that forms the chemical bond include a vinyl group, (meth) acryloyl group, silane group, silanol group, carboxyl group, amino group, ammonium group, nitro group, hydroxyl group, carbonyl group, and thiol group.
- a vinyl group and a (meth) acryloyl group are preferable.
- the insulating particle body having a reactive functional group on the surface is preferable.
- the insulating particles subjected to surface treatment using a compound having a reactive functional group as the insulating particle main body is preferable to use a particle body.
- Examples of the reactive functional group on the surface of the insulating particle body include a (meth) acryloyl group, a glycidyl group, a hydroxyl group, a vinyl group, and an amino group.
- the reactive functional group on the surface of the insulating particle body is at least one reactive functional group selected from the group consisting of a (meth) acryloyl group, a glycidyl group, a hydroxyl group, a vinyl group, and an amino group. Is preferred.
- Examples of the compound (surface treatment substance) for introducing the reactive functional group onto the surface of the insulating particle body include a compound having a (meth) acryloyl group, a compound having an epoxy group, and a compound having a vinyl group. It is done.
- a silane compound having a vinyl group As a compound (surface treatment substance) for introducing a vinyl group as the reactive functional group onto the surface of the insulating particle body, a silane compound having a vinyl group, a titanium compound having a vinyl group, and a vinyl group are used.
- the phosphoric acid compound etc. which have are mentioned.
- the surface treatment substance is preferably a silane compound having a vinyl group.
- Examples of the silane compound having a vinyl group include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriacetoxysilane, and vinyltriisopropoxysilane.
- a silane compound having a (meth) acryloyl group and a (meth) acryloyl group And a phosphoric acid compound having a (meth) acryloyl group As a compound (surface treatment substance) for introducing the (meth) acryloyl group which is the reactive functional group onto the surface of the insulating particle main body, a silane compound having a (meth) acryloyl group and a (meth) acryloyl group And a phosphoric acid compound having a (meth) acryloyl group.
- the surface treatment substance is also preferably a silane compound having a (meth) acryloyl group.
- silane compound having a (meth) acryloyl group examples include (meth) acryloxypropyltriethoxysilane, (meth) acryloxypropyltrimethoxysilane, (meth) acryloxypropyltridimethoxysilane, and the like.
- the insulating particles are not formed by friction by mixing using the insulating particle body and the polymer compound or the compound to be the polymer compound. Moreover, it is preferable that the surface of the insulating particle body is not covered with the layer using a hybridization method.
- the layer is easily detached from the surface of the insulating particle body.
- the fragments of the layer formed during kneading easily adhere to the surface of the insulating particles. For this reason, a layer or a fragment of the layer detached on the surface of the conductive layer of the conductive particles with insulating particles tends to adhere, and the conduction reliability in the connection structure tends to decrease.
- the insulating particles are not formed by friction due to mixing. It is preferable not to use a hybridization method.
- the amount of the polymer compound or the compound that becomes the polymer is preferably 30 parts by weight or more, more preferably 50 parts by weight or more, preferably 100 parts by weight of the insulating particle body. Is 500 parts by weight or less, more preferably 300 parts by weight or less.
- a favorable layer can be formed as the usage-amount of the said high molecular compound is more than the said minimum and below the said upper limit.
- Examples of specific production conditions for the layer formed of the polymer compound include the following production conditions.
- a solvent such as water
- 1 to 3 parts by weight of an insulating particle body having a reactive functional group on the surface and 0.1 to 20 parts by weight of a compound having a reactive double bond and a hydroxyl group
- 0.01 to 5 parts by weight of a crosslinking agent, 0.1 to 5 parts by weight of a dispersant, and 0.1 to 5 parts by weight of a thermal polymerization initiator are added.
- the temperature is raised to a temperature higher than the reaction temperature of the thermal polymerization initiator in an oil bath, polymerization is started, and the state is maintained for 5 hours or longer to react. Thereafter, unreacted compounds are removed using a centrifuge to obtain insulating particles in which the surface of the insulating particle body is covered with the layer.
- Examples of the compound having a hydroxyl group for introducing a hydroxyl group on the surface of the insulating particles include a P—OH group-containing compound and a Si—OH group-containing compound.
- P—OH group-containing compound examples include acid phosphooxyethyl methacrylate, acid phosphooxypropyl methacrylate, acid phosphooxypolyoxyethylene glycol monomethacrylate, and acid phosphooxypolyoxypropylene glycol monomethacrylate. Only one type of P—OH group-containing compound may be used, or two or more types may be used in combination.
- Si—OH group-containing compound examples include vinyltrihydroxysilane and 3-methacryloxypropyltrihydroxysilane.
- said Si-OH group containing compound only 1 type may be used and 2 or more types may be used together.
- insulating particles having a hydroxyl group on the surface can be obtained by a treatment using a silane coupling agent.
- silane coupling agent include hydroxytrimethoxysilane.
- the particle size of the insulating particles can be appropriately selected depending on the particle size of the conductive particles, the use of the conductive particles with insulating particles, and the like.
- the average particle diameter of the insulating particles is preferably in the range of 0.005 to 1 ⁇ m.
- the average particle diameter of the insulating particles is more preferably 0.01 ⁇ m or more, and more preferably 0.5 ⁇ m or less.
- the average particle diameter of the insulating particles is equal to or more than the above lower limit, the conductive particles in the plurality of conductive particles with insulating particles are in contact with each other when the conductive particles with insulating particles are dispersed in the binder resin. It becomes difficult.
- the average particle diameter of the insulating particles is not more than the above upper limit, it is not necessary to make the pressure too high in order to eliminate the insulating particles between the electrodes and the conductive particles when connecting the electrodes, There is no need to heat to high temperatures.
- the “average particle size” of the insulating particles indicates the number average particle size.
- the average particle size of the insulating particles is determined using a particle size distribution measuring device or the like.
- the average particle size of the insulating particles is preferably 1/3 or less of the average particle size of the conductive particles, and more preferably 1/5 or less.
- the average particle diameter of the insulating particles is preferably 1/1000 or more of the average particle diameter of the conductive particles, more preferably 1/100 or more, and most preferably 1/10 or more.
- the average particle diameter of the insulating particles is 1/5 or less of the average particle diameter of the conductive particles, for example, when manufacturing the conductive particles with insulating particles, the insulating particles are further separated on the surface of the conductive particles. It can be attached efficiently.
- the average particle diameter of the insulating particles is preferably 0.5 times or more, more preferably 1 or more times the thickness of the conductive layer in the conductive particles.
- the average particle size of the insulating particles is preferably 20 times or less, more preferably 10 times or less the thickness of the conductive layer in the conductive particles.
- the average particle size of the insulating particles is preferably at least 0.5 times the average particle size of the core substance, more preferably at least 1 time.
- the average particle size of the insulating particles is preferably 20 times or less, more preferably 10 times or less, the average particle size of the core substance.
- the “average particle size” of the core material indicates the number average particle size.
- the average particle size of the core substance is determined using a particle size distribution measuring device or the like.
- the elastic modulus of the insulating particle main body is preferably 1/1 or less, more preferably 1/2 or less, of the elastic modulus of the conductive layer in the conductive particles.
- the elastic modulus of the insulating particle body is preferably 1/100 or more, and more preferably 1/50 or more, of the elastic modulus of the conductive layer in the conductive particles.
- the above elastic modulus is measured according to JIS K7208 using a precision universal testing machine.
- the sphericity of the insulating particles is preferably 50 nm or less.
- the coefficient of variation (CV value) of the insulating particles is preferably 1% or more, preferably 10% or less, more preferably 8% or less.
- Two or more kinds of insulating particles having different particle diameters may be used.
- the average particle size of the small insulating particles is preferably 1/2 or less of the average particle size of the large insulating particles.
- the number of small insulating particles is preferably 1 ⁇ 4 or less of the number of large insulating particles.
- the layer formed of the polymer compound preferably has higher flexibility than the insulating particle body.
- a layer formed of a polymer compound formed of an organic compound has higher flexibility than inorganic particles.
- the flexibility between the layer and the insulating particle body can be evaluated, for example, by measuring the compression recovery rate. Further, by measuring the compression recovery rate of the insulating particles rather than the compression recovery rate of the insulating particle main body and the compression recovery rate of the layer, and calculating the difference from the value of the compression recovery rate of the insulating particles, the layer and The flexibility with the insulating particle body can be determined.
- the compression recovery rate can be calculated, for example, by calculating the ratio of the amount of change in particle size when the weight is released to the amount of change in particle size when a constant load is applied to the insulating particles.
- insulating particles whose surfaces are coated with a layer formed of a polymer compound are compressed with a force of 1 N at 20 ° C. using a micro compression tester (manufactured by Shimadzu Corporation), and then subjected to weighting.
- the compression recovery rate can be measured by measuring the deformation of the particles when the is opened.
- the insulating particles were put into a 1 cm 3 (inner diameter 1 cm ⁇ width 1 cm ⁇ height 1 cm) stainless steel cup so as to be closely packed, and then 0.90 cm 2 (length 0.95 cm ⁇ width 0.3 mm).
- a 95 cm) stainless steel lid may be installed so as to be movable, a compression test may be performed from the top of the lid, and the compression recovery rate may be measured from the movement range of the lid.
- Examples of the method for attaching the insulating particles to the surfaces of the conductive particles and the conductive layer include chemical methods and physical or mechanical methods.
- Examples of the chemical method include an interfacial polymerization method, a suspension polymerization method in the presence of particles, and an emulsion polymerization method.
- Examples of the physical or mechanical method include spray drying, hybridization, electrostatic adhesion, spraying, dipping, and vacuum deposition.
- the hybridization method tends to cause the detachment of the insulating particles
- the method of attaching the insulating particles to the surfaces of the conductive particles and the conductive layer is a method other than the hybridization method. Is preferred. Among these, a method of attaching the insulating particles to the surface of the conductive layer through a chemical bond is preferable because the insulating particles are not easily detached.
- the insulating particles are preferably not attached by a hybridization method. It is preferable that the polymer compound is not attached to a portion other than the portion to which the insulating particles are attached on the surface of the conductive particles. Such conductive particles with insulating particles can be obtained without using a hybridization method.
- the portions 102 b other than the portions 102 a on the surface of the conductive particles 102 are attached to the portions 102 b.
- the polymer compound 104 adheres. This is because in the hybridization method, a compressive shear force is applied, the insulating particles are repeatedly attached and detached, and the insulating particles are gradually attached.
- the layer formed of the polymer compound of the insulating particles is peeled off by the compressive shearing force, and the peeled polymer compound is attached to a portion other than the portion where the insulating particles are attached on the surface of the conductive particles.
- the polymer compound adhering to the portion other than the portion to which the insulating particles adhere on the surface of the conductive particles increases the volume resistivity of the conductive particles or decreases the connection resistance between the electrodes.
- the conductive particles are put in a solvent such as water, and the insulating particles are gradually added while stirring. After sufficiently stirring, the conductive particles with insulating particles are separated and dried by a vacuum dryer or the like to obtain conductive particles with insulating particles.
- the conductive layer preferably has a reactive functional group capable of reacting with insulating particles on the surface.
- the insulating particles preferably have a reactive functional group capable of reacting with the conductive layer on the surface. These reactive functional groups make it difficult for the insulating particles to be unintentionally detached from the surface of the conductive particles.
- an appropriate group is selected in consideration of reactivity. Examples of the reactive functional group include a hydroxyl group, a vinyl group, and an amino group. Since the reactivity is excellent, the reactive functional group is preferably a hydroxyl group.
- the conductive particles preferably have a hydroxyl group on the surface.
- the insulating particles preferably have a hydroxyl group on the surface.
- the anisotropic conductive material according to the present invention includes the conductive particles with insulating particles of the present invention and a binder resin.
- the insulating particles are not easily detached from the surface of the conductive particles when the conductive particles with insulating particles are dispersed in the binder resin.
- the binder resin is not particularly limited. In general, an insulating resin is used as the binder resin.
- the binder resin include vinyl resins, thermoplastic resins, curable resins, thermoplastic block copolymers, and elastomers. As for the said binder resin, only 1 type may be used and 2 or more types may be used together.
- Examples of the vinyl resin include vinyl acetate resin, acrylic resin, and styrene resin.
- examples of the thermoplastic resin include polyolefin resin, ethylene-vinyl acetate copolymer, and polyamide resin.
- examples of the curable resin include an epoxy resin, a urethane resin, a polyimide resin, and an unsaturated polyester resin.
- the curable resin may be a room temperature curable resin, a thermosetting resin, a photocurable resin, or a moisture curable resin.
- the curable resin may be used in combination with a curing agent.
- thermoplastic block copolymer examples include a styrene-butadiene-styrene block copolymer, a styrene-isoprene-styrene block copolymer, a hydrogenated product of a styrene-butadiene-styrene block copolymer, and a styrene-isoprene. -Hydrogenated products of styrene block copolymers.
- the elastomer examples include styrene-butadiene copolymer rubber and acrylonitrile-styrene block copolymer rubber.
- the anisotropic conductive material includes, for example, a filler, an extender, a softener, a plasticizer, a polymerization catalyst, a curing catalyst, a colorant, and an antioxidant.
- various additives such as a heat stabilizer, a light stabilizer, an ultraviolet absorber, a lubricant, an antistatic agent and a flame retardant may be contained.
- the method for dispersing the conductive particles with insulating particles in the binder resin is not particularly limited, and a conventionally known dispersion method can be used.
- Examples of a method for dispersing conductive particles with insulating particles in a binder resin include, for example, a method in which conductive particles with insulating particles are added to a binder resin and then kneaded and dispersed with a planetary mixer or the like.
- Conductive particles with particles are uniformly dispersed in water or an organic solvent using a homogenizer or the like, then added to the binder resin, kneaded and dispersed with a planetary mixer, etc., and the binder resin is water or organic Examples include a method of adding conductive particles with insulating particles after diluting with a solvent or the like, and kneading and dispersing with a planetary mixer or the like.
- the anisotropic conductive material according to the present invention can be used as an anisotropic conductive paste or an anisotropic conductive film.
- the anisotropic conductive material according to the present invention is used as a film-like adhesive such as an anisotropic conductive film
- the film-like adhesive including the conductive particles with insulating particles is used as the insulating particles.
- a film-like adhesive that does not contain attached conductive particles or conductive particles may be laminated.
- the anisotropic conductive material according to the present invention is preferably an anisotropic conductive paste.
- An anisotropic conductive paste is excellent in handleability and circuit fillability.
- a relatively large force is imparted to the conductive particles with insulating particles, but by using the conductive particles with insulating particles of the present invention, insulation from the surface of the conductive particles is achieved. It is possible to suppress the separation of the particles.
- the content of the binder resin is preferably in the range of 10 to 99.99% by weight.
- the content of the binder resin is more preferably 30% by weight or more, still more preferably 50% by weight or more, particularly preferably 70% by weight or more, and more preferably 99.9% by weight or more.
- the conductive particles with insulating particles can be efficiently arranged between the electrodes, and the conduction reliability of the connection target member connected by the anisotropic conductive material Can be further increased.
- the content of the conductive particles with insulating particles is preferably in the range of 0.01 to 40% by weight.
- the content of the conductive particles with the upper insulating particles is more preferably 0.1% by weight or more, more preferably 20% by weight or less, and still more preferably 15% by weight or less.
- the content of the conductive particles with insulating particles is not less than the above lower limit and not more than the above upper limit, the conduction reliability between the electrodes can be further enhanced.
- connection structure By connecting the connection target members using the conductive particles with insulating particles of the present invention or using an anisotropic conductive material containing the conductive particles with insulating particles and a binder resin, a connection structure Can be obtained.
- the connection structure includes a first connection target member, a second connection target member, and a connection portion that electrically connects the first and second connection target members.
- the connection structure is preferably formed of conductive particles with insulating particles or formed of an anisotropic conductive material including the conductive particles with insulating particles and a binder resin.
- the connecting portion itself is formed of conductive particles with insulating particles. That is, the first and second connection target members are electrically connected by the conductive particles in the conductive particles with insulating particles.
- FIG. 4 is a cross-sectional view schematically showing a connection structure using the conductive particles 1 with insulating particles shown in FIG.
- connection part 54 is formed of an anisotropic conductive material including the conductive particles 1 with insulating particles and a binder resin.
- the conductive particles 1 with insulating particles are schematically shown for convenience of illustration. Instead of the conductive particles 1 with insulating particles, conductive particles 21 and 41 with insulating particles may be used.
- the first connection object member 52 has a plurality of electrodes 52b on the upper surface 52a.
- the second connection target member 53 has a plurality of electrodes 53b on the lower surface 53a.
- the electrode 52b and the electrode 53b are electrically connected by one or more conductive particles 1 with insulating particles. Therefore, the first and second connection target members 52 and 53 are electrically connected by the conductive particles 1 with insulating particles.
- connection structure is not particularly limited.
- the anisotropic conductive material is disposed between a first connection target member and a second connection target member to obtain a laminate, and then the laminate is heated and
- the method of pressurizing is mentioned.
- the pressurizing pressure is about 9.8 ⁇ 10 4 to 4.9 ⁇ 10 6 Pa.
- the heating temperature is about 120 to 220 ° C.
- the insulating particles 3 existing between the conductive particles 2 and the electrodes 52b and 53b can be eliminated.
- the insulating particles 3 existing between the conductive particles 2 and the electrodes 52b and 53b are melted or deformed, so that the surface of the conductive particles 2 Is partially exposed.
- a large force is applied during the heating and pressurization, so that some of the insulating particles 3 are peeled off from the surface of the conductive particles 2 and the surface of the conductive particles 2 is partially exposed.
- the portion where the surface of the conductive particle 2 is exposed contacts the electrodes 52b and 53b, whereby the electrodes 52b and 53b can be electrically connected via the conductive particle 2.
- connection target member examples include electronic components such as semiconductor chips, capacitors, and diodes, and electronic components such as circuit boards such as printed boards, flexible printed boards, and glass boards.
- the anisotropic conductive material is in a paste form, and is preferably applied on the connection target member in a paste state.
- the conductive particles with insulating particles and the anisotropic conductive material are preferably used for connection of a connection target member that is an electronic component.
- the conductive particles with insulating particles according to the present invention are particularly suitable for COG having a glass substrate and a semiconductor chip as connection target members, or FOG having a glass substrate and a flexible printed circuit board (FPC) as connection target members. Is done.
- the conductive particles with insulating particles according to the present invention may be used for COG or FOG.
- the first and second connection target members are preferably a glass substrate and a semiconductor chip, or a glass substrate and a flexible printed board.
- the first and second connection target members may be a glass substrate and a semiconductor chip, or may be a glass substrate and a flexible printed board.
- bumps are provided on a semiconductor chip used in a COG having a glass substrate and a semiconductor chip as connection target members.
- the bump size is preferably an electrode area of 1000 ⁇ m 2 or more and 10,000 ⁇ m 2 or less.
- the electrode space in the semiconductor chip provided with the bump (electrode) is preferably 30 ⁇ m or less, more preferably 20 ⁇ m or less, and still more preferably 10 ⁇ m or less.
- the conductive particles with insulating particles according to the present invention are preferably used.
- the electrode space is preferably 30 ⁇ m or less, more preferably 20 ⁇ m or less.
- the electrode provided on the connection target member examples include metal electrodes such as a gold electrode, a nickel electrode, a tin electrode, an aluminum electrode, a copper electrode, a molybdenum electrode, and a tungsten electrode.
- the electrode is preferably a gold electrode, a nickel electrode, a tin electrode, or a copper electrode.
- the connection target member is a glass substrate, the electrode is preferably an aluminum electrode, a copper electrode, a molybdenum electrode, or a tungsten electrode.
- the said electrode is an aluminum electrode, the electrode formed only with aluminum may be sufficient and the electrode by which the aluminum layer was laminated
- the metal oxide include indium oxide doped with a trivalent metal element and zinc oxide doped with a trivalent metal element. Examples of the trivalent metal element include Sn, Al, and Ga.
- Example 1 Conductive particles: Conductive particles (average particle diameter: 3.01 ⁇ m, conductive layer thickness: 0.2 ⁇ m) having a nickel plating layer (conductive layer) formed on the surface of divinylbenzene resin particles were prepared.
- silica particles average particle size 200 nm
- insulating particles having vinyl groups as reactive functional groups on the surface were obtained as insulating particle bodies.
- 10 parts by weight of silica particles were dispersed in 400 ml of a liquid in which water and ethanol were mixed at a weight ratio of 1: 9 using a three-one motor to obtain a first dispersion.
- 0.1 part by weight of vinyltriethoxysilane was dispersed in 100 ml of a mixture of water and ethanol in a weight ratio of 1: 9 to obtain a second dispersion.
- the second dispersion was dropped into the first dispersion over 10 minutes to obtain a mixed solution.
- the resulting mixture was stirred for 30 minutes.
- the mixed solution was filtered, dried at 100 ° C. for 2 hours, and then sieved to obtain an insulating particle body.
- the mixture was cooled, solid-liquid separation was performed twice with a centrifuge, excess monomers were removed by washing, and insulating particles whose entire surface was coated with the polymer compound were obtained. Next, the obtained insulating particles were dispersed in 30 mL of pure water to obtain a dispersion of insulating particles.
- the average particle diameter of the insulating particles coated with the polymer compound was 324 nm.
- a 1 L separable flask was charged with 250 mL of pure water, 50 mL of ethanol, and 15 parts by weight of the conductive particles, and stirred sufficiently to obtain a liquid containing conductive particles.
- the dispersion liquid of the insulating particles was dropped over 10 minutes while applying ultrasonic waves, and then heated to 40 ° C. and stirred for 1 hour. Then, it filtered and it was made to dry at 100 degreeC with a vacuum dryer for 8 hours, and the electroconductive particle with an insulating particle was obtained.
- Example 2 When obtaining insulating particles whose entire surface is coated with a polymer compound, the compound that becomes the polymer compound was changed to 2.5 parts by weight of methacrylic acid and 1.2 parts by weight of divinylbenzene. In the same manner as in Example 1, conductive particles with insulating particles were obtained.
- the average particle diameter of the insulating particles coated with the polymer compound in the state of dispersion of the insulating particles was 335 nm.
- Example 3 The surface of the silica particles was coated with methacryloxypropyltriethoxysilane to obtain insulating particles having methacryloyl groups on the surface as the insulating particle main body, and the entire surface was made of a polymer compound using the insulating particle main body.
- Example 1 except that when the coated insulating particles were obtained, the compound to be a polymer compound was changed to 2.2 parts by weight of vinyl acetate and 1.0 part by weight of N, N-methylenebisacrylamide. In the same manner, conductive particles with insulating particles were obtained.
- the insulating particle body was obtained in the same manner as in Example 1 except that 10 parts by weight of silica particles and 0.1 part by weight of methacryloxypropyltriethoxysilane were used when obtaining the insulating particle body. It was.
- the average particle diameter of the insulating particles covered with the polymer compound in the state of the dispersion of the insulating particles was 326 nm.
- Example 4 Conductivity in which nickel powder (100 nm) is attached as a core material to the surface of divinylbenzene resin particles, and a nickel plating layer (conductive layer) is formed on the surface of divinylbenzene particles to which nickel powder is attached Conductive particles with insulating particles were obtained in the same manner as in Example 1 except that particles (average particle size: 3.03 ⁇ m, conductive layer thickness: 0.21 ⁇ m) were used.
- Example 5 When obtaining insulating particles whose entire surface is coated with the polymer compound, the compound to be the polymer compound was changed to 0.4 parts by weight of methacrylic acid and 0.05 parts by weight of ethylene glycol dimethacrylate. Except that, conductive particles with insulating particles were obtained in the same manner as Example 1.
- the average particle diameter of the insulating particles coated with the polymer compound in the state of dispersion of the insulating particles was 248 nm.
- the insulating particles when the insulating particles are attached to the surface of the conductive particles, the insulating particles (not coated with the polymer compound) having the vinyl group on the surface are used as pure water as a dispersion of the insulating particles.
- a dispersion liquid dispersed in 30 mL was used.
- Example 6 Using the physical / mechanical hybridization method, the insulating particles produced in Example 1 were attached to the conductive particles prepared in Example 1 to obtain conductive particles with insulating particles.
- Insulating particles are provided in the same manner as in Example 1 except that polymer fine particles (average particle size 240 nm) (not coated with a polymer compound) made of a polymer of divinylbenzene are used as the insulating particles. Conductive particles were obtained.
- conductive particles with insulating particles 3 parts by weight was added to 100 parts by weight of ethanol to obtain a conductive particle-containing liquid with insulating particles.
- This conductive particle-containing liquid with insulating particles was subjected to ultrasonic treatment while being stirred for 5 minutes at 20 ° C. and 38 kHz with a 400 W ultrasonic cleaner.
- 100 conductive particles with insulating particles are observed by observation with an SEM, and the portion of the conductive particles with insulating particles covered by the insulating particles occupying the entire surface area of the conductive particles.
- the coverage X2 which is the projected area, was determined.
- the remaining rate of the insulating particles at 38 kHz was obtained from the following formula (1) from the coverage X1 and the coverage X2.
- Residual ratio of insulating particles (coverage ratio X2 after ultrasonic treatment / coverage ratio X1 before ultrasonic treatment) ⁇ 100 (1)
- the residual rate of the insulating particles at 40 kHz was obtained in the same manner except that the sonication conditions were changed from 38 kHz to 40 kHz.
- connection structure 1 (COG1)
- the conductive particles with insulating particles of Examples and Comparative Examples were added to “Struct Bond XN-5A” manufactured by Mitsui Chemicals so as to have a content of 10% by weight, and dispersed to obtain an anisotropic conductive paste. It was.
- a transparent glass substrate having an ITO electrode pattern having an L / S of 20 ⁇ m / 20 ⁇ m on the upper surface was prepared.
- the semiconductor chip which has a copper electrode pattern which L / S is 20 micrometers / 20 micrometers on the lower surface was prepared.
- the electrode area of the bump of this semiconductor chip was 2000 ⁇ m 2 .
- the obtained anisotropic conductive paste was applied on the transparent glass substrate so as to have a thickness of 30 ⁇ m to form an anisotropic conductive paste layer.
- the semiconductor chip was stacked on the anisotropic conductive paste layer so that the electrodes face each other.
- a pressure heating head is placed on the upper surface of the semiconductor chip and a pressure of 3 MPa is applied to form the anisotropic conductive paste layer.
- COG1 connection structure
- connection structure (COG1)
- the presence or absence of leakage between adjacent electrodes was evaluated by measuring the resistance with a tester. When the resistance exceeded 500 M ⁇ , the result was judged as “O” as no leakage, and when the resistance was 500 M ⁇ or less, the result was judged as “x” as a leakage.
- connection structure 2 (COG2) A transparent glass substrate having an ITO electrode pattern having an L / S of 30 ⁇ m / 30 ⁇ m on the upper surface was prepared. Moreover, the semiconductor chip which has a copper electrode pattern whose L / S is 30 micrometers / 30 micrometers on the lower surface was prepared. The electrode area of the bump of this semiconductor chip was 3000 ⁇ m 2 . A connection structure (COG2) was obtained in the same manner as in the production of the connection structure (2) except that the connection target members were changed.
- connection structure 3 The conductive particles with insulating particles of Examples and Comparative Examples were added to “Struct Bond XN-5A” manufactured by Mitsui Chemicals so that the content was 5% by weight, and dispersed to obtain an anisotropic conductive paste. It was.
- a transparent glass substrate having an ITO electrode pattern with an L / S of 30 ⁇ m / 30 ⁇ m on the upper surface was prepared.
- the flexible printed circuit board which has a copper electrode pattern which L / S is 30 micrometers / 30 micrometers on the lower surface was prepared.
- the obtained anisotropic conductive paste was applied on the transparent glass substrate so as to have a thickness of 50 ⁇ m to form an anisotropic conductive paste layer.
- the flexible printed circuit board was laminated on the anisotropic conductive paste layer so that the electrodes face each other. Then, while adjusting the temperature of the head so that the temperature of the anisotropic conductive paste layer becomes 185 ° C., a pressure heating head is placed on the upper surface of the semiconductor chip and a pressure of 1 MPa is applied to form the anisotropic conductive paste layer. Completely cured at 185 ° C. to obtain a connection structure.
- the layer formed of the polymer compound is more flexible than the silica particles by measuring the compression recovery rate of the insulating particles by the method described above. Confirmed that it was high.
- Example 6 since the physical / mechanical hybridization method is used, the portion where the polymer compound is attached to the portion other than the portion where the insulating particles are attached on the surface of the conductive particles. was there. Thus, if the polymer compound is attached to a portion other than the portion to which the insulating particles are attached on the surface of the conductive particles, the conduction reliability may be lowered depending on the case.
- Conductive particles Conductive particles (average particle diameter: 3.01 ⁇ m, conductive layer thickness: 0.2 ⁇ m) having a nickel plating layer (conductive layer) formed on the surface of divinylbenzene resin particles were prepared.
- insulating particles The surface of silica particles (average particle size 200 nm) produced using the sol-gel method was coated with vinyltriethoxysilane, and insulating particles having vinyl groups as reactive functional groups on the surface were obtained as insulating particle bodies. .
- the mixture was cooled, solid-liquid separation was performed twice with a centrifuge, excess monomers were removed by washing, and insulating particles whose entire surface was coated with the polymer compound were obtained. Next, the obtained insulating particles were dispersed in 30 mL of pure water to obtain a dispersion of insulating particles.
- a 1 L separable flask was charged with 250 mL of pure water, 50 mL of ethanol, and 15 parts by weight of the conductive particles, and stirred sufficiently to obtain a liquid containing conductive particles.
- the dispersion liquid of the insulating particles was dropped over 10 minutes while applying ultrasonic waves, and then heated to 40 ° C. and stirred for 1 hour. Then, it filtered and it was made to dry at 100 degreeC with a vacuum dryer for 8 hours, and the electroconductive particle with an insulating particle was obtained.
- Example 8 When obtaining insulating particles whose entire surface is coated with a polymer compound, the compound that becomes the polymer compound was changed to 0.33 parts by weight of methacrylic acid and 0.05 parts by weight of divinylbenzene. In the same manner as in Example 7, conductive particles with insulating particles were obtained.
- Example 9 The surface of the silica particles was coated with methacryloxypropyltriethoxysilane to obtain insulating particles having methacryloyl groups on the surface as the insulating particle main body, and the entire surface was made of a polymer compound using the insulating particle main body.
- Example 7 except that when the coated insulating particles were obtained, the polymer compound was changed to 0.28 parts by weight of vinyl acetate and 0.05 parts by weight of N, N-methylenebisacrylamide. In the same manner, conductive particles with insulating particles were obtained.
- Example 10 Conductivity in which nickel powder (100 nm) is attached as a core material to the surface of divinylbenzene resin particles, and a nickel plating layer (conductive layer) is formed on the surface of divinylbenzene particles to which nickel powder is attached
- Conductive particles with insulating particles were obtained in the same manner as in Example 7, except that particles (average particle size: 3.03 ⁇ m, conductive layer thickness: 0.21 ⁇ m) were used.
- Example 11 Using the physical / mechanical hybridization method, the insulating particles produced in Example 7 were attached to the conductive particles prepared in Example 7 to obtain conductive particles with insulating particles.
- the layer formed of the polymer compound is more flexible than the silica particles by measuring the compression recovery rate of the insulating particles by the method described above. Confirmed that it was high.
- Example 11 since the physical / mechanical hybridization method is used, the portion where the polymer compound is attached to the portion other than the portion where the insulating particles are attached on the surface of the conductive particles. was there. Thus, if the polymer compound is attached to a portion other than the portion to which the insulating particles are attached on the surface of the conductive particles, the conduction reliability may be lowered depending on the case.
- Example 12 In the same manner as in Example 1 except that polymer fine particles (average particle diameter 200 nm) having a hydroxy group on the surface, prepared by polymerizing methacrylic acid and ethylene glycol dimethacrylate instead of silica particles, were used. Conductive particles with insulating particles were obtained.
- Example 12 The conductive particles with insulating particles obtained in Example 12 were evaluated in the same manner as in Examples 1 to 6 and Comparative Examples 1 and 2.
- the shell layer formed of the polymer compound is more flexible than the core particles formed of the polymer by measuring the compression recovery rate of the insulating particles. Was confirmed to be high.
- the Cv values of the conductive particles with insulating particles obtained in Examples 1 to 11 and Comparative Examples 1 and 2 are 4.6, the 10% K value at 20 ° C. is 4650 N / mm 2 , and the compression at 20 ° C. The recovery rate was 51%.
Abstract
Description
上記異方性導電材料は、ICチップとフレキシブルプリント回路基板との接続、及びICチップとITO電極を有する回路基板との接続等に使用されている。例えば、ICチップの電極と回路基板の電極との間に異方性導電材料を配置した後、加熱及び加圧することにより、これらの電極を電気的に接続できる。 Anisotropic conductive materials such as anisotropic conductive pastes and anisotropic conductive films are widely known. In these anisotropic conductive materials, conductive particles are dispersed in a binder resin.
The anisotropic conductive material is used for connection between an IC chip and a flexible printed circuit board, connection between an IC chip and a circuit board having an ITO electrode, and the like. For example, after disposing an anisotropic conductive material between the electrode of the IC chip and the electrode of the circuit board, these electrodes can be electrically connected by heating and pressing.
図1に、本発明の第1の実施形態に係る絶縁性粒子付き導電性粒子を断面図で示す。 (Conductive particle body with insulating particles)
FIG. 1 is a sectional view showing conductive particles with insulating particles according to the first embodiment of the present invention.
被覆率(%)=(((円内の絶縁性粒子の数)×1+(円周上の絶縁性粒子の数)×0.5)×絶縁性粒子の投影面積)/(絶縁性粒子付き導電性粒子の投影面積)×100 ・・・式(2) That is, the said coverage is represented by following formula (2).
Coverage (%) = (((number of insulating particles in circle) × 1 + (number of insulating particles on the circumference) × 0.5) × projection area of insulating particles) / (with insulating particles) Projected area of conductive particles) × 100 (2)
CV値(%)=(ρ/Dn)×100
ρ:絶縁性粒子付き導電性粒子の粒子径の標準偏差
Dn:絶縁性粒子付き導電性粒子の粒子径の平均値 The coefficient of variation (CV value) is expressed by the following equation.
CV value (%) = (ρ / Dn) × 100
ρ: Standard deviation of particle diameter of conductive particles with insulating particles Dn: Average value of particle diameter of conductive particles with insulating particles
F:絶縁性粒子付き導電性粒子が10%圧縮変形したときの荷重値(N)
S:絶縁性粒子付き導電性粒子が10%圧縮変形したときの圧縮変位(mm)
R:絶縁性粒子付き導電性粒子の半径(mm) 10% K value (N / mm 2 ) = (3/2 1/2 ) · F · S −3 / 2 · R −1/2
F: Load value (N) when conductive particles with insulating particles are compressively deformed by 10%
S: Compression displacement (mm) when conductive particles with insulating particles are 10% compressively deformed
R: radius of conductive particles with insulating particles (mm)
L1:負荷を与えるときの原点用荷重値から反転荷重値に至るまでのまでの圧縮変位
L2:負荷を解放するときの反転荷重値から原点用荷重値に至るまでの圧縮変位 Compression recovery rate (%) = [(L1-L2) / L1] × 100
L1: Compressive displacement from the load value for the origin to the reverse load value when applying the load L2: Compressive displacement from the reverse load value to the load value for the origin when releasing the load
導電層を少なくとも表面に有する導電性粒子の表面に、上記絶縁性粒子を付着させることにより、絶縁性粒子付き導電性粒子を得ることができる。 [Conductive particles]
Conductive particles with insulating particles can be obtained by attaching the insulating particles to the surface of conductive particles having at least a conductive layer on the surface.
上記基材粒子が金属粒子である場合に、該金属粒子を形成するための金属としては、銀、銅、ニッケル、ケイ素、金及びチタン等が挙げられる。 Examples of the inorganic substance for forming the inorganic particles include silica and carbon black. Examples of the organic / inorganic hybrid particles include organic / inorganic hybrid particles formed of a crosslinked alkoxysilyl polymer and an acrylic resin.
When the substrate particles are metal particles, examples of the metal for forming the metal particles include silver, copper, nickel, silicon, gold, and titanium.
上記絶縁性粒子は、絶縁性を有する粒子である。絶縁性粒子は導電性粒子よりも小さい。絶縁性粒子付き導電性粒子を用いて電極間を接続すると、絶縁性粒子により、隣接する電極間の短絡を防止できる。具体的には、複数の絶縁性粒子付き導電性粒子が接触したときに、複数の絶縁性粒子付き導電性粒子における導電性粒子間には絶縁性粒子が存在するので、上下の電極間ではなく、横方向に隣り合う電極間の短絡を防止できる。なお、電極間の接続の際に、2つの電極で絶縁性粒子付き導電性粒子を加圧することにより、導電層と電極との間の絶縁性粒子を容易に排除できる。導電性粒子の表面に突起が設けられている場合には、導電層と電極との間の絶縁性粒子をより一層容易に排除できる。さらに突起部分が電極との接触を容易にするため接続信頼性が向上する。 [Insulating particles]
The insulating particles are particles having insulating properties. Insulating particles are smaller than conductive particles. When the electrodes are connected using conductive particles with insulating particles, the insulating particles can prevent a short circuit between adjacent electrodes. Specifically, when the conductive particles with a plurality of insulating particles are in contact with each other, there are insulating particles between the conductive particles in the conductive particles with a plurality of insulating particles. Short circuit between the electrodes adjacent in the lateral direction can be prevented. Note that the insulating particles between the conductive layer and the electrode can be easily excluded by pressurizing the conductive particles with insulating particles with the two electrodes when connecting the electrodes. In the case where protrusions are provided on the surface of the conductive particles, the insulating particles between the conductive layer and the electrode can be more easily eliminated. Furthermore, since the protruding portion facilitates contact with the electrode, connection reliability is improved.
上記圧縮回復率は、例えば、上記絶縁性粒子に一定加重をかけた時の粒径の変化量に対する、加重を開放した時の粒径の変化量の割合を計算して算出できる。 The layer formed of the polymer compound preferably has higher flexibility than the insulating particle body. In general, a layer formed of a polymer compound formed of an organic compound has higher flexibility than inorganic particles. The flexibility between the layer and the insulating particle body can be evaluated, for example, by measuring the compression recovery rate. Further, by measuring the compression recovery rate of the insulating particles rather than the compression recovery rate of the insulating particle main body and the compression recovery rate of the layer, and calculating the difference from the value of the compression recovery rate of the insulating particles, the layer and The flexibility with the insulating particle body can be determined.
The compression recovery rate can be calculated, for example, by calculating the ratio of the amount of change in particle size when the weight is released to the amount of change in particle size when a constant load is applied to the insulating particles.
上記導電性粒子及び上記導電層の表面に絶縁性粒子を付着させる方法としては、化学的方法、及び物理的もしくは機械的方法等が挙げられる。上記化学的方法としては、例えば、界面重合法、粒子存在下での懸濁重合法及び乳化重合法等が挙げられる。上記物理的もしくは機械的方法としては、スプレードライ、ハイブリダイゼーション、静電付着法、噴霧法、ディッピング及び真空蒸着による方法等が挙げられる。ただし、ハイブリダイゼーション法では、絶縁性粒子の脱離が生じやすい傾向があるので、上記導電性粒子及び上記導電層の表面に絶縁性粒子を付着させる方法は、ハイブリダイゼーション法以外の方法であることが好ましい。なかでも、絶縁性粒子が脱離し難いことから、導電層の表面に、化学結合を介して絶縁性粒子を付着させる方法が好ましい。 (Conductive particles with insulating particles)
Examples of the method for attaching the insulating particles to the surfaces of the conductive particles and the conductive layer include chemical methods and physical or mechanical methods. Examples of the chemical method include an interfacial polymerization method, a suspension polymerization method in the presence of particles, and an emulsion polymerization method. Examples of the physical or mechanical method include spray drying, hybridization, electrostatic adhesion, spraying, dipping, and vacuum deposition. However, since the hybridization method tends to cause the detachment of the insulating particles, the method of attaching the insulating particles to the surfaces of the conductive particles and the conductive layer is a method other than the hybridization method. Is preferred. Among these, a method of attaching the insulating particles to the surface of the conductive layer through a chemical bond is preferable because the insulating particles are not easily detached.
上記反応性官能基として、反応性を考慮して適宜の基が選択される。上記反応性官能基としては、水酸基、ビニル基及びアミノ基等が挙げられる。反応性に優れているので、上記反応性官能基は水酸基であることが好ましい。上記導電性粒子は表面に、水酸基を有することが好ましい。上記絶縁性粒子は表面に、水酸基を有することが好ましい。 The conductive layer preferably has a reactive functional group capable of reacting with insulating particles on the surface. The insulating particles preferably have a reactive functional group capable of reacting with the conductive layer on the surface. These reactive functional groups make it difficult for the insulating particles to be unintentionally detached from the surface of the conductive particles.
As the reactive functional group, an appropriate group is selected in consideration of reactivity. Examples of the reactive functional group include a hydroxyl group, a vinyl group, and an amino group. Since the reactivity is excellent, the reactive functional group is preferably a hydroxyl group. The conductive particles preferably have a hydroxyl group on the surface. The insulating particles preferably have a hydroxyl group on the surface.
本発明に係る異方性導電材料は、本発明の絶縁性粒子付き導電性粒子と、バインダー樹脂とを含む。 (Anisotropic conductive material)
The anisotropic conductive material according to the present invention includes the conductive particles with insulating particles of the present invention and a binder resin.
上記異方性導電材料は、上記絶縁性粒子付き導電性粒子及び上記バインダー樹脂の他に、例えば、充填剤、増量剤、軟化剤、可塑剤、重合触媒、硬化触媒、着色剤、酸化防止剤、熱安定剤、光安定剤、紫外線吸収剤、滑剤、帯電防止剤及び難燃剤等の各種添加剤を含んでいてもよい。 Examples of the vinyl resin include vinyl acetate resin, acrylic resin, and styrene resin. Examples of the thermoplastic resin include polyolefin resin, ethylene-vinyl acetate copolymer, and polyamide resin. Examples of the curable resin include an epoxy resin, a urethane resin, a polyimide resin, and an unsaturated polyester resin. The curable resin may be a room temperature curable resin, a thermosetting resin, a photocurable resin, or a moisture curable resin. The curable resin may be used in combination with a curing agent. Examples of the thermoplastic block copolymer include a styrene-butadiene-styrene block copolymer, a styrene-isoprene-styrene block copolymer, a hydrogenated product of a styrene-butadiene-styrene block copolymer, and a styrene-isoprene. -Hydrogenated products of styrene block copolymers. Examples of the elastomer include styrene-butadiene copolymer rubber and acrylonitrile-styrene block copolymer rubber.
In addition to the conductive particles with insulating particles and the binder resin, the anisotropic conductive material includes, for example, a filler, an extender, a softener, a plasticizer, a polymerization catalyst, a curing catalyst, a colorant, and an antioxidant. In addition, various additives such as a heat stabilizer, a light stabilizer, an ultraviolet absorber, a lubricant, an antistatic agent and a flame retardant may be contained.
本発明の絶縁性粒子付き導電性粒子を用いて、又は該絶縁性粒子付き導電性粒子とバインダー樹脂とを含む異方性導電材料を用いて、接続対象部材を接続することにより、接続構造体を得ることができる。 (Connection structure)
By connecting the connection target members using the conductive particles with insulating particles of the present invention or using an anisotropic conductive material containing the conductive particles with insulating particles and a binder resin, a connection structure Can be obtained.
上記加圧の圧力は9.8×104~4.9×106Pa程度である。上記加熱の温度は、120~220℃程度である。 The manufacturing method of the connection structure is not particularly limited. As an example of a method for manufacturing a connection structure, the anisotropic conductive material is disposed between a first connection target member and a second connection target member to obtain a laminate, and then the laminate is heated and The method of pressurizing is mentioned.
The pressurizing pressure is about 9.8 × 10 4 to 4.9 × 10 6 Pa. The heating temperature is about 120 to 220 ° C.
導電性粒子:
ジビニルベンゼン樹脂粒子の表面上にニッケルめっき層(導電層)が形成されている導電性粒子(平均粒子径3.01μm、導電層の厚み0.2μm)を用意した。 Example 1
Conductive particles:
Conductive particles (average particle diameter: 3.01 μm, conductive layer thickness: 0.2 μm) having a nickel plating layer (conductive layer) formed on the surface of divinylbenzene resin particles were prepared.
ゾルゲル法を使用して作製したシリカ粒子(平均粒子径200nm)の表面をビニルトリエトキシシランで被覆し、反応性官能基であるビニル基を表面に有する絶縁性粒子を絶縁性粒子本体として得た。具体的には、シリカ粒子10重量部を水とエタノールとが重量比1:9で混合された液400mlにスリーワンモーターを用いて分散させて、第1の分散液を得た。次いでビニルトリエトキシシラン0.1重量部を水とエタノールとが重量比1:9で混合された液100mlに分散させて、第2の分散液を得た。その後、上記第2の分散液を上記第1の分散液に10分かけて滴下し、混合液を得た。滴下後、得られた混合液を30分攪拌した。その後、混合液をろ過し、100℃で2時間乾燥した後、ふるいで篩うことにより、絶縁性粒子本体を得た。 Production of insulating particles:
The surface of silica particles (average particle size 200 nm) produced using the sol-gel method was coated with vinyltriethoxysilane, and insulating particles having vinyl groups as reactive functional groups on the surface were obtained as insulating particle bodies. . Specifically, 10 parts by weight of silica particles were dispersed in 400 ml of a liquid in which water and ethanol were mixed at a weight ratio of 1: 9 using a three-one motor to obtain a first dispersion. Next, 0.1 part by weight of vinyltriethoxysilane was dispersed in 100 ml of a mixture of water and ethanol in a weight ratio of 1: 9 to obtain a second dispersion. Thereafter, the second dispersion was dropped into the first dispersion over 10 minutes to obtain a mixed solution. After the dropwise addition, the resulting mixture was stirred for 30 minutes. Thereafter, the mixed solution was filtered, dried at 100 ° C. for 2 hours, and then sieved to obtain an insulating particle body.
1Lのセパラブルフラスコに純水250mLと、エタノール50mLと、上記導電性粒子15重量部とを入れ、十分に攪拌し、導電性粒子を含む液を得た。この導電性粒子を含む液に、超音波を当てながら上記絶縁性粒子の分散液を10分間かけて滴下した後、40℃に昇温し1時間攪拌した。その後、ろ過し、真空乾燥機により100℃で8時間乾燥させ、絶縁性粒子付き導電性粒子を得た。 Production of conductive particles with insulating particles:
A 1 L separable flask was charged with 250 mL of pure water, 50 mL of ethanol, and 15 parts by weight of the conductive particles, and stirred sufficiently to obtain a liquid containing conductive particles. To the liquid containing the conductive particles, the dispersion liquid of the insulating particles was dropped over 10 minutes while applying ultrasonic waves, and then heated to 40 ° C. and stirred for 1 hour. Then, it filtered and it was made to dry at 100 degreeC with a vacuum dryer for 8 hours, and the electroconductive particle with an insulating particle was obtained.
高分子化合物により表面全体が被覆された絶縁性粒子を得る際に、高分子化合物となる化合物を、メタクリル酸2.5重量部と、ジビニルベンゼン1.2重量部とに変更したこと以外は実施例1と同様にして、絶縁性粒子付き導電性粒子を得た。 (Example 2)
When obtaining insulating particles whose entire surface is coated with a polymer compound, the compound that becomes the polymer compound was changed to 2.5 parts by weight of methacrylic acid and 1.2 parts by weight of divinylbenzene. In the same manner as in Example 1, conductive particles with insulating particles were obtained.
シリカ粒子の表面をメタクリロキシプロピルトリエトキシシランで被覆し、メタクリロイル基を表面に有する絶縁性粒子を絶縁性粒子本体として得たこと、並びに該絶縁性粒子本体を用いて高分子化合物により表面全体が被覆された絶縁性粒子を得る際に、高分子化合物となる化合物を、酢酸ビニル2.2重量部と、N,N-メチレンビスアクリルアミド1.0重量部とに変更したこと以外は実施例1と同様にして、絶縁性粒子付き導電性粒子を得た。 (Example 3)
The surface of the silica particles was coated with methacryloxypropyltriethoxysilane to obtain insulating particles having methacryloyl groups on the surface as the insulating particle main body, and the entire surface was made of a polymer compound using the insulating particle main body. Example 1 except that when the coated insulating particles were obtained, the compound to be a polymer compound was changed to 2.2 parts by weight of vinyl acetate and 1.0 part by weight of N, N-methylenebisacrylamide. In the same manner, conductive particles with insulating particles were obtained.
ジビニルベンゼン樹脂粒子の表面に芯物質としてニッケル粉体(100nm)が付着しており、かつニッケル粉体が付着したジビニルベンゼン粒子の表面上にニッケルめっき層(導電層)が形成されている導電性粒子(平均粒子径3.03μm、導電層の厚み0.21μm)を用いたこと以外は実施例1と同様にして、絶縁性粒子付き導電性粒子を得た。 Example 4
Conductivity in which nickel powder (100 nm) is attached as a core material to the surface of divinylbenzene resin particles, and a nickel plating layer (conductive layer) is formed on the surface of divinylbenzene particles to which nickel powder is attached Conductive particles with insulating particles were obtained in the same manner as in Example 1 except that particles (average particle size: 3.03 μm, conductive layer thickness: 0.21 μm) were used.
高分子化合物により表面全体が被覆された絶縁性粒子を得る際に、高分子化合物となる化合物を、メタクリル酸0.4重量部と、ジメタクリル酸エチレングリコール0.05重量部とに変更したこと以外は実施例1と同様にして絶縁性粒子付き導電性粒子を得た。 (Example 5)
When obtaining insulating particles whose entire surface is coated with the polymer compound, the compound to be the polymer compound was changed to 0.4 parts by weight of methacrylic acid and 0.05 parts by weight of ethylene glycol dimethacrylate. Except that, conductive particles with insulating particles were obtained in the same manner as Example 1.
絶縁性粒子本体の表面を高分子化合物により被覆しなかったこと以外は実施例1と同様にして、絶縁性粒子付き導電性粒子を得た。 (Comparative Example 1)
Conductive particles with insulating particles were obtained in the same manner as in Example 1 except that the surface of the insulating particle main body was not coated with the polymer compound.
物理的/機械的ハイブリダイゼーション法を使用して、実施例1で作製した絶縁性粒子を、実施例1で用意した導電性粒子に付着させて、絶縁性粒子付き導電性粒子を得た。 (Example 6)
Using the physical / mechanical hybridization method, the insulating particles produced in Example 1 were attached to the conductive particles prepared in Example 1 to obtain conductive particles with insulating particles.
絶縁性粒子として、ジビニルベンゼンの重合体で作製した高分子微粒子(平均粒子径240nm)(高分子化合物により被覆されていない)を用いたこと以外は実施例1と同様にして、絶縁性粒子付き導電性粒子を得た。 (Comparative Example 2)
Insulating particles are provided in the same manner as in Example 1 except that polymer fine particles (average particle size 240 nm) (not coated with a polymer compound) made of a polymer of divinylbenzene are used as the insulating particles. Conductive particles were obtained.
(1)絶縁性粒子付き導電性粒子における被覆率及び絶縁性粒子の残存率
超音波処理前に、SEMでの観察により100個の実施例及び比較例の絶縁性粒子付き導電性粒子を観察した。絶縁性粒子付き導電性粒子における導電性粒子の表面積全体に占める絶縁性粒子により被覆されている部分の投影面積である被覆率X1を求めた。 (Evaluation of Examples 1 to 6 and Comparative Examples 1 and 2)
(1) Coverage rate of conductive particles with insulating particles and residual rate of insulating particles Before sonication, 100 conductive particles with insulating particles of Examples and Comparative Examples were observed by observation with an SEM. . The coverage X1 which is the projected area of the portion covered with the insulating particles in the entire surface area of the conductive particles in the conductive particles with the insulating particles was determined.
実施例及び比較例の絶縁性粒子付き導電性粒子を含有量が10重量%となるように、三井化学社製「ストラクトボンドXN-5A」に添加し、分散させ、異方性導電ペーストを得た。 (2) Fabrication of connection structure 1 (COG1)
The conductive particles with insulating particles of Examples and Comparative Examples were added to “Struct Bond XN-5A” manufactured by Mitsui Chemicals so as to have a content of 10% by weight, and dispersed to obtain an anisotropic conductive paste. It was.
得られた接続構造体(COG1)の上下の電極間の接続抵抗をそれぞれ、4端子法により測定した。2つの接続抵抗の平均値を算出した。なお、電圧=電流×抵抗の関係から、一定の電流を流した時の電圧を測定することにより接続抵抗を求めることができる。接続抵抗の平均値が2.0Ω以下である場合を「○」、接続抵抗の平均値が2.0Ωを超える場合を「×」と判定した。 (3) Conductivity evaluation (between upper and lower electrodes)
The connection resistance between the upper and lower electrodes of the obtained connection structure (COG1) was measured by a four-terminal method. The average value of the two connection resistances was calculated. Note that the connection resistance can be obtained by measuring the voltage when a constant current is passed from the relationship of voltage = current × resistance. The case where the average value of the connection resistance was 2.0Ω or less was judged as “◯”, and the case where the average value of the connection resistance exceeded 2.0Ω was judged as “X”.
得られた接続構造体(COG1)において、隣接する電極間のリークの有無を、テスターで抵抗を測定することにより評価した。抵抗が500MΩを超える場合にリーク無しとして結果を「○」とし、抵抗が500MΩ以下の場合にリーク有りとして結果を「×」と判定した。 (4) Insulation evaluation (between adjacent electrodes in the horizontal direction)
In the obtained connection structure (COG1), the presence or absence of leakage between adjacent electrodes was evaluated by measuring the resistance with a tester. When the resistance exceeded 500 MΩ, the result was judged as “O” as no leakage, and when the resistance was 500 MΩ or less, the result was judged as “x” as a leakage.
L/Sが30μm/30μmであるITO電極パターンを上面に有する透明ガラス基板を用意した。また、L/Sが30μm/30μmである銅電極パターンを下面に有する半導体チップを用意した。この半導体チップのバンプの電極面積は3000μm2であった。これらの接続対象部材に変更したこと以外は、上記(2)接続構造体の作製と同様にして、接続構造体(COG2)を得た。 (5) Fabrication of connection structure 2 (COG2)
A transparent glass substrate having an ITO electrode pattern having an L / S of 30 μm / 30 μm on the upper surface was prepared. Moreover, the semiconductor chip which has a copper electrode pattern whose L / S is 30 micrometers / 30 micrometers on the lower surface was prepared. The electrode area of the bump of this semiconductor chip was 3000 μm 2 . A connection structure (COG2) was obtained in the same manner as in the production of the connection structure (2) except that the connection target members were changed.
得られた接続構造体(COG2)について、上記(3)と同様の評価を行った。 (6) Conductivity evaluation (between upper and lower electrodes)
About the obtained connection structure (COG2), evaluation similar to said (3) was performed.
得られた接続構造体(COG2)について、上記(4)と同様の評価を行った。 (7) Insulation evaluation (between adjacent electrodes in the horizontal direction)
About the obtained connection structure (COG2), evaluation similar to said (4) was performed.
実施例及び比較例の絶縁性粒子付き導電性粒子を含有量が5重量%となるように、三井化学社製「ストラクトボンドXN-5A」に添加し、分散させ、異方性導電ペーストを得た。 (8) Fabrication of connection structure 3 (FOG)
The conductive particles with insulating particles of Examples and Comparative Examples were added to “Struct Bond XN-5A” manufactured by Mitsui Chemicals so that the content was 5% by weight, and dispersed to obtain an anisotropic conductive paste. It was.
得られた接続構造体(FOG)について、上記(3)と同様の評価を行った。 (9) Conductivity evaluation (between upper and lower electrodes)
About the obtained connection structure (FOG), evaluation similar to said (3) was performed.
得られた接続構造体(FOG)について、上記(4)と同様の評価を行った。
結果を下記の表1に示す。 (10) Insulation evaluation (between adjacent electrodes in the horizontal direction)
About the obtained connection structure (FOG), evaluation similar to said (4) was performed.
The results are shown in Table 1 below.
導電性粒子:
ジビニルベンゼン樹脂粒子の表面上にニッケルめっき層(導電層)が形成されている導電性粒子(平均粒子径3.01μm、導電層の厚み0.2μm)を用意した。 (Example 7)
Conductive particles:
Conductive particles (average particle diameter: 3.01 μm, conductive layer thickness: 0.2 μm) having a nickel plating layer (conductive layer) formed on the surface of divinylbenzene resin particles were prepared.
ゾルゲル法を使用して作製したシリカ粒子(平均粒子径200nm)の表面をビニルトリエトキシシランで被覆し、反応性官能基であるビニル基を表面に有する絶縁性粒子を絶縁性粒子本体として得た。 Production of insulating particles:
The surface of silica particles (average particle size 200 nm) produced using the sol-gel method was coated with vinyltriethoxysilane, and insulating particles having vinyl groups as reactive functional groups on the surface were obtained as insulating particle bodies. .
1Lのセパラブルフラスコに純水250mLと、エタノール50mLと、上記導電性粒子15重量部とを入れ、十分に攪拌し、導電性粒子を含む液を得た。この導電性粒子を含む液に、超音波を当てながら上記絶縁性粒子の分散液を10分間かけて滴下した後、40℃に昇温し1時間攪拌した。その後、ろ過し、真空乾燥機により100℃で8時間乾燥させ、絶縁性粒子付き導電性粒子を得た。 Production of conductive particles with insulating particles:
A 1 L separable flask was charged with 250 mL of pure water, 50 mL of ethanol, and 15 parts by weight of the conductive particles, and stirred sufficiently to obtain a liquid containing conductive particles. To the liquid containing the conductive particles, the dispersion liquid of the insulating particles was dropped over 10 minutes while applying ultrasonic waves, and then heated to 40 ° C. and stirred for 1 hour. Then, it filtered and it was made to dry at 100 degreeC with a vacuum dryer for 8 hours, and the electroconductive particle with an insulating particle was obtained.
高分子化合物により表面全体が被覆された絶縁性粒子を得る際に、高分子化合物となる化合物を、メタクリル酸0.33重量部と、ジビニルベンゼン0.05重量部とに変更したこと以外は実施例7と同様にして、絶縁性粒子付き導電性粒子を得た。 (Example 8)
When obtaining insulating particles whose entire surface is coated with a polymer compound, the compound that becomes the polymer compound was changed to 0.33 parts by weight of methacrylic acid and 0.05 parts by weight of divinylbenzene. In the same manner as in Example 7, conductive particles with insulating particles were obtained.
シリカ粒子の表面をメタクリロキシプロピルトリエトキシシランで被覆し、メタクリロイル基を表面に有する絶縁性粒子を絶縁性粒子本体として得たこと、並びに該絶縁性粒子本体を用いて高分子化合物により表面全体が被覆された絶縁性粒子を得る際に、高分子化合物となる化合物を、酢酸ビニル0.28重量部と、N,N-メチレンビスアクリルアミド0.05重量部とに変更したこと以外は実施例7と同様にして、絶縁性粒子付き導電性粒子を得た。 Example 9
The surface of the silica particles was coated with methacryloxypropyltriethoxysilane to obtain insulating particles having methacryloyl groups on the surface as the insulating particle main body, and the entire surface was made of a polymer compound using the insulating particle main body. Example 7 except that when the coated insulating particles were obtained, the polymer compound was changed to 0.28 parts by weight of vinyl acetate and 0.05 parts by weight of N, N-methylenebisacrylamide. In the same manner, conductive particles with insulating particles were obtained.
ジビニルベンゼン樹脂粒子の表面に芯物質としてニッケル粉体(100nm)が付着しており、かつニッケル粉体が付着したジビニルベンゼン粒子の表面上にニッケルめっき層(導電層)が形成されている導電性粒子(平均粒子径3.03μm、導電層の厚み0.21μm)を用いたこと以外は実施例7と同様にして、絶縁性粒子付き導電性粒子を得た。 (Example 10)
Conductivity in which nickel powder (100 nm) is attached as a core material to the surface of divinylbenzene resin particles, and a nickel plating layer (conductive layer) is formed on the surface of divinylbenzene particles to which nickel powder is attached Conductive particles with insulating particles were obtained in the same manner as in Example 7, except that particles (average particle size: 3.03 μm, conductive layer thickness: 0.21 μm) were used.
物理的/機械的ハイブリダイゼーション法を使用して、実施例7で作製した絶縁性粒子を、実施例7で用意した導電性粒子に付着させて、絶縁性粒子付き導電性粒子を得た。 (Example 11)
Using the physical / mechanical hybridization method, the insulating particles produced in Example 7 were attached to the conductive particles prepared in Example 7 to obtain conductive particles with insulating particles.
実施例7~11で得られた絶縁性粒子付き導電性粒子に関して、実施例1~6及び比較例1,2と同様の評価を行った。 (Evaluation of Examples 7 to 11)
The conductive particles with insulating particles obtained in Examples 7 to 11 were evaluated in the same manner as in Examples 1 to 6 and Comparative Examples 1 and 2.
シリカ粒子のかわりに、メタクリル酸及びジメタクリル酸エチレングリコールを重合して作製された、表面にヒドロキシ基を有する高分子微粒子(平均粒子径200nm)を用いたこと以外は実施例1と同様にして絶縁性粒子付き導電性粒子を得た。 (Example 12)
In the same manner as in Example 1 except that polymer fine particles (average particle diameter 200 nm) having a hydroxy group on the surface, prepared by polymerizing methacrylic acid and ethylene glycol dimethacrylate instead of silica particles, were used. Conductive particles with insulating particles were obtained.
実施例12で得られた絶縁性粒子付き導電性粒子に関して、実施例1~6及び比較例1,2と同様の評価を行った。 (Evaluation of Example 12)
The conductive particles with insulating particles obtained in Example 12 were evaluated in the same manner as in Examples 1 to 6 and Comparative Examples 1 and 2.
2…導電性粒子
3…絶縁性粒子
5…絶縁性粒子本体
6…層
11…基材粒子
12…導電層
21…絶縁性粒子付き導電性粒子
22…導電性粒子
31…導電層
32…芯物質
33…突起
41…絶縁性粒子付き導電性粒子
42…導電性粒子
46…導電層
46a…第1の導電層
46b…第2の導電層
47…芯物質
48…突起
51…接続構造体
52…第1の接続対象部材
52a…上面
52b…電極
53…第2の接続対象部材
53a…下面
53b…電極
54…接続部 DESCRIPTION OF
Claims (12)
- 導電層を少なくとも表面に有する導電性粒子と、
前記導電性粒子の表面に付着している絶縁性粒子とを備え、
前記絶縁性粒子が、絶縁性粒子本体と、該絶縁性粒子本体の表面の少なくとも一部の領域を覆っておりかつ高分子化合物により形成された層とを有し、
前記絶縁性粒子本体と前記層とが化学的に結合している、絶縁性粒子付き導電性粒子。 Conductive particles having at least a conductive layer on the surface;
Insulating particles attached to the surface of the conductive particles,
The insulating particles have an insulating particle body, and a layer that covers at least a part of the surface of the insulating particle body and is formed of a polymer compound,
Conductive particles with insulating particles, wherein the insulating particle main body and the layer are chemically bonded. - 前記絶縁性粒子本体が無機粒子である、請求項1に記載の絶縁性粒子付き導電性粒子。 The conductive particles with insulating particles according to claim 1, wherein the insulating particle body is inorganic particles.
- 前記層は前記絶縁性粒子本体よりも、柔軟性が高い、請求項1又は2に記載の絶縁性粒子付き導電性粒子。 The conductive particles with insulating particles according to claim 1, wherein the layer has higher flexibility than the insulating particle main body.
- 反応性官能基を表面に有する前記絶縁性粒子本体と、高分子化合物又は該高分子化合物となる化合物とを用いて、前記絶縁性粒子本体の表面の反応性官能基に、前記高分子化合物により形成された層を化学的に結合させることにより、前記絶縁性粒子本体と前記層とが化学的に結合している前記絶縁性粒子が得られている、請求項1~3のいずれか1項に記載の絶縁性粒子付き導電性粒子。 Using the insulating particle main body having a reactive functional group on the surface and a polymer compound or a compound to be the polymer compound, the reactive functional group on the surface of the insulating particle main body is The insulating particles in which the insulating particle main body and the layer are chemically bonded are obtained by chemically bonding the formed layers. Conductive particles with insulating particles according to 1.
- 前記絶縁性粒子が、前記絶縁性粒子本体と高分子化合物又は該高分子化合物となる化合物とを用いた混合による摩擦で形成されていない、請求項1~4のいずれか1項に記載の絶縁性粒子付き導電性粒子。 The insulation according to any one of claims 1 to 4, wherein the insulating particles are not formed by friction by mixing using the insulating particle main body and a polymer compound or a compound to be the polymer compound. Conductive particles with conductive particles.
- エタノール100重量部に、絶縁性粒子付き導電性粒子3重量部を添加した絶縁性粒子付き導電性粒子含有液を20℃及び40kHzの条件で5分間超音波処理したときに、下記式(1)により求められる絶縁性粒子の残存率が60~95%である、請求項1~5のいずれか1項に記載の絶縁性粒子付き導電性粒子。
絶縁性粒子の残存率(%)=(超音波処理後の被覆率/超音波処理前の被覆率)×100 ・・・式(1) When the conductive particle-containing liquid with insulating particles obtained by adding 3 parts by weight of conductive particles with insulating particles to 100 parts by weight of ethanol was subjected to ultrasonic treatment for 5 minutes at 20 ° C. and 40 kHz, the following formula (1) The conductive particles with insulating particles according to any one of claims 1 to 5, wherein the residual ratio of the insulating particles obtained by the above is 60 to 95%.
Residual ratio of insulating particles (%) = (coverage ratio after sonication / coverage ratio before sonication) × 100 (1) - エタノール100重量部に、絶縁性粒子付き導電性粒子3重量部を添加した絶縁性粒子付き導電性粒子含有液を20℃及び38kHzの条件で5分間超音波処理したときに、下記式(1)により求められる絶縁性粒子の残存率が60~95%である、請求項1~6のいずれか1項に記載の絶縁性粒子付き導電性粒子。
絶縁性粒子の残存率(%)=(超音波処理後の被覆率/超音波処理前の被覆率)×100 ・・・式(1) When the conductive particle-containing liquid with insulating particles obtained by adding 3 parts by weight of conductive particles with insulating particles to 100 parts by weight of ethanol was subjected to ultrasonic treatment for 5 minutes at 20 ° C. and 38 kHz, the following formula (1) The conductive particles with insulating particles according to any one of claims 1 to 6, wherein the residual ratio of the insulating particles obtained by the method is 60 to 95%.
Residual ratio of insulating particles (%) = (coverage ratio after sonication / coverage ratio before sonication) × 100 (1) - 前記導電性粒子の表面積全体に占める前記絶縁性粒子により被覆されている部分の面積である被覆率が40%以上である、請求項1~7のいずれか1項に記載の絶縁性粒子付き導電性粒子。 The conductive material with insulating particles according to any one of claims 1 to 7, wherein a covering ratio that is an area of a portion covered with the insulating particles occupying the entire surface area of the conductive particles is 40% or more. Sex particles.
- 前記被覆率が50%を超える、請求項8に記載の絶縁性粒子付き導電性粒子。 The conductive particles with insulating particles according to claim 8, wherein the coverage ratio exceeds 50%.
- 請求項1~9のいずれか1項に記載の絶縁性粒子付き導電性粒子と、バインダー樹脂とを含む、異方性導電材料。 An anisotropic conductive material comprising the conductive particles with insulating particles according to any one of claims 1 to 9, and a binder resin.
- 異方性導電ペーストである、請求項10に記載の異方性導電材料。 The anisotropic conductive material according to claim 10, which is an anisotropic conductive paste.
- 第1の接続対象部材と、第2の接続対象部材と、該第1,第2の接続対象部材を接続している接続部とを備え、
前記接続部が、請求項1~9のいずれか1項に記載の絶縁性粒子付き導電性粒子により形成されているか、又は該絶縁性粒子付き導電性粒子とバインダー樹脂とを含む異方性導電材料により形成されている、接続構造体。 A first connection target member, a second connection target member, and a connection part connecting the first and second connection target members;
The connecting portion is formed of the conductive particles with insulating particles according to any one of claims 1 to 9, or an anisotropic conductive material including the conductive particles with insulating particles and a binder resin. A connection structure made of a material.
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Also Published As
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JP5060655B2 (en) | 2012-10-31 |
KR20130016387A (en) | 2013-02-14 |
TW201207071A (en) | 2012-02-16 |
JPWO2012002508A1 (en) | 2013-08-29 |
KR101321636B1 (en) | 2013-10-23 |
CN102959641A (en) | 2013-03-06 |
CN102959641B (en) | 2013-12-11 |
TWI498405B (en) | 2015-09-01 |
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