WO2011161010A3 - Substrat mit oberflächlich strukturierter flächenelektrode für eine solarzelle und verfahren zu dessen herstellung - Google Patents
Substrat mit oberflächlich strukturierter flächenelektrode für eine solarzelle und verfahren zu dessen herstellung Download PDFInfo
- Publication number
- WO2011161010A3 WO2011161010A3 PCT/EP2011/060091 EP2011060091W WO2011161010A3 WO 2011161010 A3 WO2011161010 A3 WO 2011161010A3 EP 2011060091 W EP2011060091 W EP 2011060091W WO 2011161010 A3 WO2011161010 A3 WO 2011161010A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- solar cell
- producing
- surface electrode
- layer
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 6
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 238000002485 combustion reaction Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
- H01L31/022483—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers composed of zinc oxide [ZnO]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02366—Special surface textures of the substrate or of a layer on the substrate, e.g. textured ITO/glass substrate or superstrate, textured polymer layer on glass substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Energy (AREA)
- Photovoltaic Devices (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Es wird ein Substrat (1) mit einer oberflächlich strukturierten Schicht und eine Solarzelle unter Verwendung eines solchen Substrats (1) angegeben, bei denen auf dem Substrat (1) eine Unterschicht (2) und darüber eine elektrisch leitfähige Elektrodenschicht (3, 5) zur Verwendung als Flächenelektrode abgeschieden ist, wobei die Unterschicht (2) auf seiner dem Substrat (1) abgewandten Oberfläche eine nanoskalige Oberflächenstruktur aufweist und die Elektrodenschicht (3, 5) Konformität mit unabhängig von der Oberflächenausrichtung gleichförmiger Dicke aufweist. Die nanoskalige Oberflächenstruktur der Unterschicht (2) wurde mittels eines Combustion-CVD-Verfahrens mit atmosphärisch betriebenem Plasmabrenner unter Bildung von Nanoclustern auf Strukturgrößen im Bereich von bis zu 500 nm RMS-Rauheit eingestellt.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201180030806XA CN103026493A (zh) | 2010-06-21 | 2011-06-17 | 用于太阳能电池的带有表面结构化的面电极的基底及其制造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010030301.1 | 2010-06-21 | ||
DE102010030301A DE102010030301A1 (de) | 2010-06-21 | 2010-06-21 | Substrat mit oberflächlich strukturierter Flächenelektrode |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011161010A2 WO2011161010A2 (de) | 2011-12-29 |
WO2011161010A3 true WO2011161010A3 (de) | 2012-03-08 |
Family
ID=44628892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2011/060091 WO2011161010A2 (de) | 2010-06-21 | 2011-06-17 | Substrat mit oberflächlich strukturierter flächenelektrode für eine solarzelle und verfahren zu dessen herstellung |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN103026493A (de) |
DE (1) | DE102010030301A1 (de) |
WO (1) | WO2011161010A2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012002606A1 (de) | 2012-02-13 | 2013-08-14 | Vaciontec GmbH | Erzeugen von leitfähigen Strukturen in transparenten Schichten mittels Laserbestrahlung |
DE102013109163B4 (de) | 2013-08-23 | 2022-05-12 | Helmholtz-Zentrum Berlin für Materialien und Energie Gesellschaft mit beschränkter Haftung | Verfahren zur Herstellung polykristalliner, 3D-Strukturen aufweisender Siliziumschichten gleichmäßiger Dicke |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001015787A (ja) * | 1999-04-27 | 2001-01-19 | Asahi Glass Co Ltd | 透明導電膜付き基体、その製造方法および太陽電池 |
EP1443527A1 (de) * | 2001-10-19 | 2004-08-04 | Asahi Glass Company Ltd. | Substrat mit transparentem leitfähigem oxidfilm und herstellungsverfahren dafür und photoelektrisches umsetzungselement |
EP1732139A1 (de) * | 2004-03-25 | 2006-12-13 | Kaneka Corporation | Träger für dünnfilmsolarzelle, verfahren zu deren herstellung und ihn einsetzende dünnfilmsolarzelle |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61241983A (ja) * | 1985-04-18 | 1986-10-28 | Sanyo Electric Co Ltd | 光起電力装置 |
DE102004017680B4 (de) | 2004-04-10 | 2008-01-24 | Forschungszentrum Jülich GmbH | Verfahren zur Behandlung von Substraten mit vorstrukturierten Zinkoxidschichten |
FR2915834B1 (fr) * | 2007-05-04 | 2009-12-18 | Saint Gobain | Substrat transparent muni d'une couche electrode perfectionnee |
DE102007025068B4 (de) | 2007-05-29 | 2009-06-25 | Innovent E.V. | Gasbrenner |
US20080308145A1 (en) * | 2007-06-12 | 2008-12-18 | Guardian Industries Corp | Front electrode including transparent conductive coating on etched glass substrate for use in photovoltaic device and method of making same |
DE102008025108B4 (de) | 2008-05-23 | 2012-02-23 | Verein zur Förderung von Innovationen durch Forschung, Entwicklung und Technologietransfer e.V. (Verein INNOVENT e.V.) | Verfahren zur Herstellung von nanoskaligen elektrisch leitfähigen Mehrschichtsystemen |
CN101308882A (zh) | 2008-07-22 | 2008-11-19 | 东莞宏威数码机械有限公司 | 透明导电氧化物绒面的制备方法 |
-
2010
- 2010-06-21 DE DE102010030301A patent/DE102010030301A1/de not_active Ceased
-
2011
- 2011-06-17 WO PCT/EP2011/060091 patent/WO2011161010A2/de active Application Filing
- 2011-06-17 CN CN201180030806XA patent/CN103026493A/zh active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001015787A (ja) * | 1999-04-27 | 2001-01-19 | Asahi Glass Co Ltd | 透明導電膜付き基体、その製造方法および太陽電池 |
EP1443527A1 (de) * | 2001-10-19 | 2004-08-04 | Asahi Glass Company Ltd. | Substrat mit transparentem leitfähigem oxidfilm und herstellungsverfahren dafür und photoelektrisches umsetzungselement |
EP1732139A1 (de) * | 2004-03-25 | 2006-12-13 | Kaneka Corporation | Träger für dünnfilmsolarzelle, verfahren zu deren herstellung und ihn einsetzende dünnfilmsolarzelle |
Non-Patent Citations (3)
Title |
---|
TADATSUGU MINAMI: "Transparent conducting oxide semiconductors for transparent electrodes; Transparent conducting oxide semiconductors for transparent electrodes", SEMICONDUCTOR SCIENCE AND TECHNOLOGY, IOP PUBLISHING LTD, GB, vol. 20, no. 4, 1 April 2005 (2005-04-01), pages S35 - S44, XP020086463, ISSN: 0268-1242, DOI: 10.1088/0268-1242/20/4/004 * |
WORSCH C ET AL: "Effect of substrate temperature during combustion chemical vapour deposition on the formation of silica films", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 518, no. 17, 1 February 2010 (2010-02-01), pages 4798 - 4803, XP027065073, ISSN: 0040-6090, [retrieved on 20100201], DOI: 10.1016/J.TSF.2010.01.032 * |
ZHAO Z ET AL: "Transparent conducting ZnO:Al films via CCVD for amorphous silicon solar cells", CONFERENCE RECORD OF THE IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE 2002 INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS INC. US; [IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE],, vol. CONF. 29, 19 May 2002 (2002-05-19), pages 1282 - 1285, XP010666517, ISBN: 978-0-7803-7471-3, DOI: 10.1109/PVSC.2002.1190843 * |
Also Published As
Publication number | Publication date |
---|---|
WO2011161010A2 (de) | 2011-12-29 |
DE102010030301A1 (de) | 2011-12-22 |
CN103026493A (zh) | 2013-04-03 |
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