WO2011145716A1 - Procédé de formation d'un motif concavo-convexe à l'aide d'un film de résine, et dispositif à utiliser dans ce procédé - Google Patents

Procédé de formation d'un motif concavo-convexe à l'aide d'un film de résine, et dispositif à utiliser dans ce procédé Download PDF

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Publication number
WO2011145716A1
WO2011145716A1 PCT/JP2011/061621 JP2011061621W WO2011145716A1 WO 2011145716 A1 WO2011145716 A1 WO 2011145716A1 JP 2011061621 W JP2011061621 W JP 2011061621W WO 2011145716 A1 WO2011145716 A1 WO 2011145716A1
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WIPO (PCT)
Prior art keywords
resin film
concavo
convex pattern
substrate
forming
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PCT/JP2011/061621
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English (en)
Japanese (ja)
Inventor
隆弘 鈴木
秀洋 赤間
亜紀子 権藤
千尋 打出
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株式会社ブリヂストン
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Publication of WO2011145716A1 publication Critical patent/WO2011145716A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Definitions

  • the present invention relates to a method for forming a concavo-convex pattern by an imprint method that can be used for manufacturing information display panels such as electronic paper, electronic devices, optical components, and recording media, and in particular, a resin film such as a resin intermediate stamper.
  • the present invention relates to a method of forming a fine concavo-convex pattern using
  • Nanoimprint technology is a method for forming inverted copies of nano- or micrometer-order concavo-convex patterns of molds (also referred to as molds and templates), and has a finer structure than conventional press processing technologies. This is a microfabrication technology to achieve this. This technique itself has no limit on resolution, and the resolution is determined by the accuracy of mold production. Therefore, as long as the mold can be manufactured, it is possible to form an ultrafine structure with an apparatus that is easier and much cheaper than conventional photolithography.
  • the nanoimprint technology is roughly divided into two types depending on the material to be transferred.
  • One is a thermal imprint technique in which a material to be transferred is heated, plastically deformed by a mold, and then cooled to form a pattern.
  • the other is to apply liquid light (generally ultraviolet (UV)) curable resin on the substrate at room temperature, then press the light-transmitting mold against the resin and irradiate the resin to cure the resin on the substrate.
  • UV imprint technology for forming a pattern.
  • UV imprint technology enables pattern formation at room temperature, so that distortion due to differences in the coefficient of linear expansion between the substrate and mold due to heat is less likely to occur, and high-precision pattern formation is possible.
  • the resin is likely to adhere to the mold that is the mother stamper, and if the resin adheres, it is extremely difficult to repair the mold. Further, since the mold does not usually have plasticity, the substrate or the mold may be physically damaged when the substrate to be patterned is not a plastic material. Since the mold (mother stamper) is very expensive, if the mold is replaced due to adhesion of a resin or physical damage, the cost is greatly increased, and it cannot be said that the entire manufacturing is inexpensive.
  • Patent Document 1 discloses an imprint method by two steps. That is, in the first step, heat is applied to a template (mother stamper) having a surface patterned with fine irregularities on the order of micrometers or nanometers, such as polycarbonate (PC), polymethyl methacrylate (PMMA), and cycloolefin.
  • a template mother stamper
  • PC polycarbonate
  • PMMA polymethyl methacrylate
  • cycloolefin cycloolefin.
  • the surface of the polymer foil (resin film) made of a plastic resin is placed so as to face and come into contact with each other, and an imprint process is formed on the surface of the polymer foil in which the pattern of the template surface is reversed.
  • the obtained polymer stamper (intermediate stamper) is arranged so that the inversion pattern of the template faces and comes into contact with the photosensitive material (ultraviolet curable resin or the like) on the substrate.
  • the photosensitive material ultraviolet curable resin or the like
  • the mold and the substrate to which the uneven pattern of the mold is transferred are not the same material. Therefore, the mold and the substrate have different coefficients of thermal expansion. Therefore, even when the mold and the substrate are subjected to the same environmental change due to heating or cooling, the ratio of dimensional change is different.
  • a resin-made intermediate stamper is obtained using a mother stamper manufactured according to the pattern of the substrate.
  • the resin intermediate stamper and the substrate are accurately aligned.
  • two or more alignment patterns also referred to as alignment marks
  • alignment cameras also referred to as alignment cameras. Observe and align the marks.
  • an object of the present invention is a method of forming a fine uneven pattern on a substrate using a resin film such as a resin intermediate stamper, and the resin film shrinkage rate variation or the temperature in the alignment process.
  • An object of the present invention is to provide a method for forming a concavo-convex pattern that can accurately form a concavo-convex pattern at a position where a concavo-convex pattern is to be formed on a substrate even if there is a change.
  • an object of the present invention is to provide an apparatus used for the method for forming the concavo-convex pattern.
  • Adjustment of the size of the fine concavo-convex pattern formed in the resin film in the planar direction is usually performed in a process of forming the concavo-convex pattern.
  • the concavo-convex pattern of the resin film is adjusted by preparing the concavo-convex pattern of the metal stamper in consideration of the shrinkage rate of the resin film. .
  • the present inventors have reached the present invention.
  • the object is to transfer the concavo-convex pattern of a resin film having a fine concavo-convex pattern formed on the surface to a photocurable resin layer made of a photocurable resin composition formed on a substrate, and A method for forming a fine concavo-convex pattern on a curable resin layer, wherein the fine concavo-convex pattern of the resin film is disposed at a position where the reverse concavo-convex pattern of a photocurable resin layer on the substrate is to be formed.
  • an alignment step for aligning the resin film and the substrate and a pressing step for placing and pressing a fine uneven pattern of the resin film on the photocurable resin layer on the substrate
  • a light irradiation step for curing or semi-curing the photocurable resin layer by irradiating light to the photocurable resin layer, and in the alignment step, the resin film is stretched in a plane direction. It is achieved by the method of forming the concavo-convex pattern, which comprises the step of using a decompression means for.
  • the stretching means is a means for stretching the resin film in the biaxial direction of the vertical direction and the horizontal direction. Thereby, it becomes possible to extend in any direction in the plane direction, and the resin film and the substrate can be more accurately aligned, and the uneven pattern can be formed at a more accurate position.
  • the stretching means is a means for stretching within an elastic deformation range of the resin film. Thereby, the resin film and the substrate can be aligned so that the formation of the inverted concavo-convex pattern due to the breakage of the resin film or the large deformation of the concavo-convex pattern does not occur.
  • At least two clamp portions that are capable of detachably fixing the edge portion of the resin film and that are independently movable and stationary in the planar direction of the resin film.
  • the edge of the resin film is fixed to the clamp part of the film holding part having the above, and the resin film is extended by moving the clamp part.
  • the resin film can be easily stretched in the plane direction by fixing the edge of the resin film with the clamp and moving the clamp.
  • the resin film has a rectangular shape, and the edge of each side of the resin film is fixed to at least one clamp part.
  • the edges of each side of the resin film are fixed with at least one clamp part, and the clamp part is moved to efficiently stretch the resin film in the plane direction. can do.
  • each side of the rectangular resin film is fixed to two or more clamp parts. Thereby, by finely adjusting the extension in the planar direction by dividing and extending each side of the resin film, the resin film and the substrate can be aligned with higher accuracy.
  • the number of clamps for fixing the edge of each side of the resin film is more preferably 3 or more, and particularly preferably 3 to 10.
  • the alignment step is a step of aligning a plurality of alignment marks provided on the resin film and the substrate. Thereby, the resin film and the substrate can be aligned efficiently and accurately.
  • At least one alignment mark for the resin film and the substrate is provided for each of two clamp portions for fixing the edge of the resin film. Since the shrinkage rate and expansion rate of the resinous film may vary depending on the resinous film part, when each side of the resinous film is divided and stretched, an alignment mark corresponding to the stretched range is provided, By aligning, the resin film and the substrate can be aligned with higher accuracy.
  • the resin film is a resin intermediate stamper.
  • the positioning step includes means for moving and adjusting the position of the resin film and / or the substrate in a planar direction, and means for adjusting the angle of the resin film and / or the substrate.
  • the resin film and the substrate can be more efficiently and accurately obtained by performing the alignment process using means for adjusting the position and angle of the resin film and the substrate. Can be aligned.
  • the above object is also a concavo-convex pattern forming apparatus used in the method for forming a concavo-convex pattern according to the present invention, wherein a fine concavo-convex pattern of the resin film is formed on a reverse concavo-convex pattern of a photocurable resin layer on the substrate.
  • An alignment means for aligning the resin film and the substrate in order to arrange the pattern at a position where the pattern is to be formed, and a fine uneven pattern of the resin film on the photocurable resin layer on the substrate
  • Mounting, pressing means for pressing, light irradiation to the photocurable resin layer, light irradiation means for curing or semi-curing the photocurable resin layer, and the alignment means This is achieved by an apparatus for forming a concavo-convex pattern characterized by including a stretching means for stretching a resin film in a planar direction.
  • this apparatus includes a resin film including a stretching means for stretching the resin film in the planar direction in the method for forming a concavo-convex pattern according to the present invention
  • the apparatus includes an alignment means for aligning the resin film with the light on the substrate.
  • the reverse concavo-convex pattern of the curable resin layer can be accurately adjusted to the position where it should be formed.
  • the resin film can be placed on and pressed on the photocurable resin layer on the substrate, and the photocurable resin layer can be cured or semi-cured by irradiation with light such as ultraviolet rays. Therefore, this apparatus is a concavo-convex pattern forming apparatus capable of accurately forming the concavo-convex pattern of the resin film at the position where the inverted concavo-convex pattern is to be formed on the substrate.
  • corrugated pattern formation apparatus of this invention is an apparatus which can form an uneven
  • FIG. 1 is a schematic cross-sectional view showing a typical example of a method for forming a fine uneven pattern according to the present invention.
  • FIG. 2 is a schematic view for explaining a preferred example of the alignment step in the method for forming a fine uneven pattern of the present invention
  • FIG. 2 (a) is a schematic plan view
  • FIG. 3 is a schematic view for explaining a preferred example of the alignment step when the fine uneven pattern forming method of the present invention is performed by a roll-to-roll method.
  • FIG. 4 is a schematic cross-sectional view showing a typical example of a fine concavo-convex pattern forming apparatus of the present invention.
  • the present invention can be carried out in the same manner as a method for forming a fine uneven pattern by a general imprint method, except for an alignment process including a means for stretching a resin film.
  • FIG. 1 is a schematic cross-sectional view showing a typical example in the method for forming a fine uneven pattern of the present invention.
  • corrugated pattern was formed in the surface, and the photocurable resin layer 16 which consists of a photocurable resin composition in the surface was formed.
  • the substrate 15 and the resin film 11 are arranged so that they face each other (FIG. 1A).
  • the resin film 11 include an intermediate stamper made of a thermoplastic resin having a concavo-convex pattern transferred from a mold such as a metal stamper having a fine concavo-convex pattern by a thermal imprint method.
  • the substrate 15 include a substrate for an information display panel electronic component and a substrate on which a predetermined wiring pattern is formed.
  • a glass substrate, a silicon wafer, a metal substrate such as copper, chromium, iron, and aluminum can be used.
  • the edge part of the resin film 11 is detachably fixed by the clamp part 21.
  • the clamp part 21 is installed in the film holding part 22, and can be moved and stopped independently in the plane direction (longitudinal direction and / or lateral direction) of the resin film 11.
  • the substrate 15 is detachably fixed to the substrate holding unit 23.
  • the resin film 11 and the substrate 15 are aligned so that the concavo-convex pattern of the resin film 11 accurately matches the position where the inverted concavo-convex pattern of the photocurable resin layer 16 on the surface of the substrate 15 is to be formed.
  • an alignment mark for alignment is usually provided on the resin film 11 and the substrate 15, and is observed with an alignment camera for alignment, and is aligned automatically or manually so that the alignment marks overlap.
  • the aligning step includes stretching means for stretching the resin film 11 in the planar direction. In FIG. 1, the resin film 11 is extended in the plane direction by moving the clamp part 21 in the plane direction (FIG. 1A).
  • the stretching means may be any means as long as the resin film can be accurately controlled and stretched.
  • the film holding unit 22 and / or the substrate holding unit 23 are moved in the plane direction (longitudinal direction and / or lateral direction) or the angle is adjusted.
  • the unevenness pattern of the resinous film 11 and the inverted unevenness pattern of the surface of the substrate 15 due to the variation in the shrinkage rate when forming the unevenness pattern of the resinous film 11 and the difference in the expansion rate due to the temperature change in the alignment process.
  • There is a dimensional difference from the position where the film is to be formed also referred to as “scale level deviation” in the present invention
  • the resin film 11 is stretched in the plane direction, thereby correcting the scale level deviation of the concavo-convex pattern, thereby enabling accurate alignment.
  • the stretching of the resin film 11 in the planar direction may be in either the longitudinal direction or the lateral direction, but it is preferable that the resin film 11 can be stretched in the biaxial direction of the longitudinal direction and the lateral direction so that alignment can be performed more accurately. Further, the proportion of the resin film 11 that can be extended in the planar direction varies depending on the material of the resin film 11. In the elastic deformation range of the resinous film 11, the resinous film 11 is not damaged, or the shape of the concave / convex pattern is deformed, so that the formation of the inverted concave / convex pattern on the photocurable resin layer 16 does not occur. It is preferable to stretch.
  • the stretching distance is usually 1% or less, preferably 0.5% or less, based on the length of the resin film 11.
  • the concave / convex pattern formed on the resin film 11 is preferably smaller than a pattern (for example, an electrode pattern) in a range where the inverted concave / convex pattern of the photocurable resin layer 16 of the substrate 15 is to be formed. This is because it is possible to stretch the resin film 11 in the planar direction, but it is difficult to compress it in the planar direction.
  • the uneven pattern of the resin film 11 is pressed against the photocurable resin layer 16 (FIG. 1 ( b) (Pressing step)).
  • the photocurable resin layer 16 is heated as necessary so that pressing is possible. If pressing is possible at room temperature, heating is not necessary. Since the temperature change of the substrate 15, the resin film 11 and the substrate 15 affects the formation position and scale of the concavo-convex pattern, the clamp portion 21 is moved in the plane direction so that the alignment marks overlap even when pressed, and is made of resin.
  • the film 11 may be stretched.
  • the photocurable resin layer 16 is cured by irradiating light (such as ultraviolet rays) (light irradiation process).
  • the curing may be semi-curing to such an extent that the shape of the concavo-convex pattern can be maintained without being completely cured.
  • the resin film 11 before pressing the uneven
  • a vacuum process may be performed to evacuate the surroundings. Thereby, it is possible to prevent a transfer defect of the uneven pattern.
  • the vacuum process can be performed, for example, by setting a range including the resin film 11 and the substrate 15 as a sealed space and degassing the space with a vacuum pump.
  • the resin film 11 is removed from the photocurable resin layer 16c on which the concavo-convex pattern is formed and cured (FIG. 1 (c)).
  • the photocurable resin layer 16 is semi-cured, after removing the resin film 11, it is fully cured by further irradiating light.
  • the reverse concavo-convex pattern of the concavo-convex pattern of the resin film 11 on which the fine concavo-convex pattern is formed is accurately formed at the position where the reverse concavo-convex pattern of the photocurable transfer layer 16 on the surface of the substrate 15 is to be formed. can do.
  • FIG. 2 is a schematic view for explaining a preferred example of the alignment step in the method for forming a fine concavo-convex pattern according to the present invention
  • FIG. 2 (a) is a schematic plan view
  • FIG. It is a schematic sectional drawing.
  • the edge of each side of the rectangular resin film 31 on which a fine concavo-convex pattern is formed is fixed to a plurality of clamp portions 41.
  • the clamp part 41 can fix the edge part of a film so that attachment or detachment is possible by tightening with a screw or the like.
  • the clamp part 41 is installed in the film holding
  • the film holding part 42 is also preferably movable and stationary in the planar direction (longitudinal direction and / or lateral direction) of the resinous film 31, and the angle can be adjusted.
  • the resin film 31 is fixed at the edge of each side by five clamp portions 41. However, if the resin film 31 is fixed by at least two clamp portions 41. good. However, it is preferable to fix the edge of each side of the resin film 31 with at least one clamp part 41 so that the film can be extended in the vertical direction and the horizontal direction.
  • the resin film 41 has a rectangular shape, but the shape of the resin film is not particularly limited. For example, it may be circular, elliptical, or polygonal. Even in that case, it is only necessary to be fixed by at least two clamp portions 41.
  • the position which mutually opposes the vertical direction and / or horizontal direction of the edge part of the resin-made films 31 is two clamp parts 41 (for example, in Fig.2 (a)). It is preferable that they are fixed to two groups surrounded by a broken line. By moving the two clamp parts 41 in the opposite directions (or stopping one and moving the other), the resin film 31 is efficiently stretched in the plane direction without causing distortion. can do. It is sufficient that at least one pair of such two opposing clamp portions 41 is used. In order to extend the resin film 31 with higher accuracy, as shown in FIG. It is preferable that a plurality of sets are used in the lateral direction.
  • the radix of the clamp part 41 is not particularly limited. As shown in FIGS. 2 (a) and 2 (b), when the resin film is rectangular, in order to efficiently extend the resin film in the plane direction, at least one clamp on each side edge is provided. It is preferable to fix with a part.
  • a plurality of clamp portions 41 may be used to fix each side of the resin film 31 in multiple divisions (FIG. 2A), and a clamp having a width that can fix the edges of each side at once. You may fix the edge of each edge
  • clamp portions 41 are used at the edge of each side. It is preferable to divide and fix the sides. By dividing and extending each side of the resin film, fine adjustment of the extension in the plane direction can be performed, and the resin film and the substrate can be aligned with higher accuracy.
  • the clamp part 41 for fixing the edge part of each side of the resin film 31 is more preferably 3 or more, and particularly preferably 3 to 10 groups.
  • the width of the fixing portion for fixing the edge portion of the resin film 31 in one clamp portion 41 is not particularly limited.
  • the width of the fixing part of one clamp part is usually 5 to 200 mm, preferably 10 to 100 mm.
  • the substrate 35 on which the photocurable resin layer 36 is formed is detachably fixed to the substrate holding portion 43. It is preferable that the substrate holder 43 is also movable and stationary in the plane direction (longitudinal direction and / or lateral direction) of the resin film 31 and the angle can be adjusted.
  • the resin film 31 and the substrate 35 have an uneven pattern of the resin film 31, and the photocurable resin layer 36 on the surface of the substrate 35 is inverted.
  • Alignment alignment marks 45a and 45b are respectively provided so as to match the position where the uneven pattern is to be formed. Then, the alignment marks 45a and 45b are observed by the alignment camera 50, and the clamp part 41 is moved in the plane direction automatically or manually so that the two overlap each other, and the resin film 31 is stretched efficiently and accurately.
  • the film 31 and the substrate 35 can be aligned.
  • the resin film 31 can be more efficiently and accurately used by using a means for moving the film holding portion 42 and / or the substrate holding portion 43 in the plane direction or adjusting the angle as necessary. And the substrate 35 can be aligned.
  • the alignment step includes means for extending the resin film 31 in the plane direction as described above, even if the resin film 31 and the substrate 35 are shifted in scale level, a plurality of displacements occur. There is no case where the alignment mark is not aligned and accurate alignment cannot be performed.
  • At least two alignment marks 45a and 45b are provided on the resin film 31 and the substrate 35, respectively.
  • the alignment mark it is preferable that 45a and 45b are provided at least one by one, preferably two by two with respect to two of the clamp part 41 (for example, two shown by being surrounded by a broken line in FIG. 2A).
  • the alignment marks 45a and 45b corresponding to the range where each clamp part 41 extends the resin film are provided. By aligning, the resin film 31 and the substrate 35 can be aligned with higher accuracy.
  • the alignment step can be performed by a method as shown in FIG.
  • FIG. 3 is a schematic view for explaining a preferred example of the alignment step when the fine uneven pattern forming method of the present invention is performed by a roll-to-roll method.
  • the edges of two sides parallel to the transport direction of the roll 30 of the resin film 31 are fixed by the clamp portion 41, and the plane direction (the roll transport direction and Stretch in the direction that goes straight.
  • the plane direction the roll transport direction and Stretch in the direction that goes straight.
  • a plane direction (the same direction as a roll conveyance direction) is adjusted by adjusting the tension applied to the resin film 31 in the roll conveyance.
  • the alignment marks 45a and 45b can be aligned similarly to the description of FIG. 2 described above, and the resin film 31 and the substrate 35 can be aligned with high accuracy.
  • any resin film on which a fine concavo-convex pattern is formed may be used.
  • a light transmissive resin film is preferable.
  • an intermediate stamper made of a resin transferred from a nanoimprint stamper made of a material such as nickel, titanium, silicon, quartz or the like having a fine concavo-convex pattern onto a thermoplastic resin film by a thermal imprint method, a photo-curing resin was used.
  • Examples include an intermediate stamper formed by the UV imprint method, and a resin film formed with a concavo-convex pattern by an etching method, laser processing, cutting with a tool provided with a fine shape, or the like.
  • a resin-made intermediate stamper is preferable in that the number of processes is small, the formation of a fine concavo-convex pattern is easy, and the formation accuracy of the concavo-convex pattern is high, and an intermediate stamper made of a thermoplastic resin obtained by a thermal imprint method is particularly preferable. Is preferred.
  • the material for the resin film include polycarbonate, cycloolefin copolymer (COC), polymethyl methacrylate (PMMA), and the like.
  • photocurable resin composition In the method for forming a concavo-convex pattern of the present invention, any photocurable resin composition for forming a photocurable resin layer may be used.
  • a liquid composition that can be used in the nanoimprint process method is preferred.
  • the viscosity is preferably 10 to 10,000 cps.
  • the photocurable resin composition is preferably a composition containing a photocurable resin and a photoinitiator.
  • photocurable resin examples include urethane acrylate, polyester acrylate, epoxy acrylate, epoxy resin, imide-based oligomer, and polyene / thiol-based oligomer.
  • Urethane acrylates include, for example, diisocyanates such as hexamethylene diisocyanate, isophorone diisocyanate, methylene bis (4-cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, tolylene diisocyanate, 4,4-diphenylmethane diisocyanate, xylylene diisocyanate, and poly (propylene oxide).
  • diisocyanates such as hexamethylene diisocyanate, isophorone diisocyanate, methylene bis (4-cyclohexyl isocyanate), trimethylhexamethylene diisocyanate, tolylene diisocyanate, 4,4-diphenylmethane diisocyanate, xylylene diisocyanate, and poly (propylene oxide).
  • Polyols such as diol, poly (propylene oxide) triol, poly (tetramethylene oxide) diol, ethoxylated bisphenol A and 2-hydroxyethyl acrylate 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, glycidol dimethacrylate, pentaerythritol tri Hydroxy acrylates such as acrylate Obtained by reacting, those having an acryloyl group and a urethane bond as a functional group in the molecule.
  • polyester acrylate examples include polyester acrylate composed of phthalic anhydride, propylene oxide and acrylic acid, polyester acrylate composed of adipic acid, 1,6-hexanediol and acrylic acid, trimellitic acid, diethylene glycol and acrylic acid. And polyester acrylate.
  • the epoxy acrylate is synthesized by reaction of an epoxy compound such as epichlorohydrin and acrylic acid or methacrylic acid.
  • an epoxy compound such as epichlorohydrin and acrylic acid or methacrylic acid.
  • bisphenol A type epoxy acrylate and bisphenol S synthesized by reaction of bisphenol A, epichlorohydrin and acrylic acid.
  • Bisphenol S-type epoxy acrylate synthesized by reaction of chlorophenol, epichlorohydrin and acrylic acid bisphenol F-type epoxy acrylate synthesized by reaction of bisphenol F, epichlorohydrin and acrylic acid, synthesis by reaction of phenol novolac, epichlorohydrin and acrylic acid And phenol novolac type epoxy acrylate.
  • epoxy resin examples include bisphenol type epoxy resins such as bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol AD type epoxy resin, and bisphenol S type epoxy resin; phenol novolac type epoxy resin, cresol novolak type epoxy resin and the like.
  • examples include novolak-type epoxy resins; aromatic epoxy resins such as trisphenolmethane triglycidyl ether, and hydrogenated products and brominated products thereof.
  • a photoradical polymerization initiator and a photocationic polymerization initiator are preferable.
  • the photoradical polymerization initiator for example, 4- (2-hydroxyethoxy) phenyl (2-hydroxy-2-) Propyl) ketone, ⁇ -hydroxy- ⁇ - ⁇ '-dimethylacetophenone, methoxyacetophenone, acetophenone derivatives such as 2,2-dimethoxy-2-phenylacetophenone; benzoin ether compounds such as benzoin ethyl ether and benzoin propyl ether; benzyldimethyl Ketal derivatives such as ketals; halogenated ketones, acyl phosphine oxides, acyl phosphonates, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-benzyl-2 -N, N-dimethylamino- 1- (4-morpholinophenyl)
  • photocationic polymerization initiator examples include iron-allene complex compounds, aromatic diazonium salts, aromatic iodonium salts, aromatic sulfonium salts, onium salts, pyridinium salts, aluminum complexes / silanol salts, trichloromethyltriazine derivatives, and the like. It is done.
  • Examples of the counter anion of the onium salt or pyridinium salt include SbF 6 ⁇ , PF 6 ⁇ , AsF 6 ⁇ , BF 4 ⁇ , tetrakis (pentafluoro) borate, trifluoromethane sulfonate, methane sulfonate, trifluoro Examples include acetate, acetate, sulfonate, tosylate, and nitrate.
  • the addition amount of the photopolymerization initiator (G) is generally 0.1 to 15 parts by weight, preferably 0.5 to 10 parts by weight with respect to 100 parts by weight of the photocurable resin.
  • a reactive diluent may be added to the photocurable resin composition.
  • the reactive diluent include 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate, neopentyl, and the like.
  • Glycol diacrylate 2- (2-ethoxyethoxy) ethyl acrylate, tetrahydrofurfuryl acrylate, 2-phenoxyethyl acrylate, diethylene glycol diacrylate, tetraethylene glycol diacrylate, 1,3-butylene glycol diacrylate, tripropylene glycol diacrylate , Trimethylolpropane triacrylate, pentaerythritol tetraacrylate, and hydroxypivalic acid neopentyl glycol diacrylate.
  • the photo-curable resin composition further includes photopolymerization initiation assistants, thermal polymerization inhibitors, fillers, adhesion-imparting agents, thixotropic agents, plasticizers, colorants, etc. that are generally added as necessary. May be added.
  • the photocurable resin layer when the photocurable resin layer is cured, many light sources that emit light in the ultraviolet to visible region can be used as the light source. , Mercury halogen lamp, carbon arc lamp, incandescent lamp, laser beam and the like.
  • the irradiation time is not generally determined depending on the type of the lamp and the intensity of the light source, but is about 0.1 to several tens of seconds, preferably 0.5 to several seconds.
  • the ultraviolet irradiation amount is preferably 300 mJ / cm 2 or more.
  • the laminate may be preheated to 30 to 80 ° C. and irradiated with light (such as ultraviolet rays).
  • the concavo-convex pattern forming apparatus of the present invention includes a resin film and a substrate in order to dispose the fine concavo-convex pattern of the resin film at a position where the inverted concavo-convex pattern of the photocured resin layer on the substrate should be formed.
  • the positioning means for positioning includes stretching means for stretching the resin film in the planar direction. And after aligning a resin film and a board
  • FIG. 4 is a schematic sectional view showing a typical example of the uneven pattern forming apparatus of the present invention.
  • a plurality of clamp parts 61 for detachably fixing a resin film 51 on which a fine uneven pattern is formed are installed on a film holding part 62 so as to be movable and stationary in a plane direction.
  • the clamp part 61 can fix the edge of a film so that attachment or detachment is possible by tightening with a screw or the like.
  • the film holding portion 62 is also movable and stationary in the plane direction and can be adjusted in angle.
  • a substrate holding part 63 for detachably fixing the substrate 55 on which the photocurable resin layer 56 is formed is installed so as to face the film holding part 62. It is preferable that the substrate holder 63 is also movable and stationary in the plane direction, and the angle can be adjusted.
  • a plurality of alignment cameras 70 for observing alignment marks for alignment of the resin film 51 and the substrate 55 are installed above the resin film 51 fixed to the clamp portion 61. It is preferable that one alignment camera 70 is installed for each pair of alignment marks.
  • a UV-type pressing unit 73 provided with a transmission-type pressing unit 71 that presses against the photo-curable resin layer 56 and a UV lamp 72 for irradiating ultraviolet rays is installed in a state where the resin film 51 is stretched.
  • the transmissive pressing part 71 and the UV lamp 72 may be installed separately, the integrated UV pressing part 73 of the integrated UV pressing part 73 can be irradiated with ultraviolet rays while the resin film 51 is pressed against the photocurable resin layer 56.
  • Such an apparatus is preferred.
  • the UV pressing unit 73 Even if the UV pressing unit 73 is not pressed by a solid (for example, quartz) like the transmission pressing unit 71, the UV pressing unit 73 applies a pressure by a liquid medium such as a constant compressible gas such as air or oil, and the resin. You may have a device which presses the film-made film 51 against the photocurable resin layer 56.
  • a liquid medium such as a constant compressible gas such as air or oil
  • the resin film and the substrate can be accurately aligned, and the concavo-convex pattern can be accurately formed at the position where the concavo-convex pattern is to be formed on the substrate.
  • the uneven pattern forming apparatus of the present invention is an apparatus used for a method of continuously forming an uneven pattern by a roll-to-roll method using a long resin film as shown in FIG. May be.
  • the apparatus which has said positioning means and a press means is installed on the conveyance line of the roll of resin films.
  • the extending method in the planar direction of the alignment means is performed by fixing the clamp unit in the direction orthogonal to the roll conveyance direction, and is applied to the resin film in the roll conveyance in the same direction as the roll conveyance direction. This is done by adjusting the tension.
  • partitions of information display panels such as high-quality electronic displays and electronic paper, electronic devices (lithography, transistors), optical components (microlens arrays, waveguides, optical filters, Photonic crystals), bio-related materials (DNA chips, microreactors), recording media (patterned media, DVD) and the like can be advantageously obtained.

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  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

L'invention porte sur un procédé pour former un motif concavo-convexe fin sur un substrat à l'aide d'un film de résine, procédé qui peut former le motif concavo-convexe avec précision dans une position dans laquelle le motif concavo-convexe doit être formé sur le substrat, même s'il se produit une fluctuation dans les rapports de retrait du film de résine, une variation de la température dans une étape d'alignement ou équivalent. L'invention a plus précisément pour objet : un procédé pour former un motif concavo-convexe par transfert d'un motif concavo-convexe fin formé sur la surface d'un film de résine (11) à une couche de résine photodurcissable (16) qui est formée sur un substrat (15) et qui comprend une composition de résine photodurcissable pour former par ce moyen un motif concavo-convexe fin inversé sur la couche de résine photodurcissable (16), le procédé étant caractérisé en ce qu'il comporte une étape d'alignement du film de résine (11) avec le substrat (15) afin de placer le motif concavo-convexe formé sur le film de résine (11) dans une position dans laquelle le motif concavo-convexe inversé doit être formé sur la couche de résine photodurcissable (16) placée sur le substrat (15), l'étape d'alignement comprenant une sous-étape d'utilisation d'un moyen d'extension qui peut étendre le film de résine (11) dans le direction du plan ; et un dispositif destiné à être utilisé dans le procédé.
PCT/JP2011/061621 2010-05-20 2011-05-20 Procédé de formation d'un motif concavo-convexe à l'aide d'un film de résine, et dispositif à utiliser dans ce procédé WO2011145716A1 (fr)

Applications Claiming Priority (2)

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JP2010-115927 2010-05-20
JP2010115927A JP2011240643A (ja) 2010-05-20 2010-05-20 樹脂製フィルムを用いた凹凸パターンの形成方法、その方法に使用する装置

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JP2014217951A (ja) * 2013-05-01 2014-11-20 株式会社リコー 平型部品製造方法、平型部品製造装置、及び金型
WO2016090395A1 (fr) * 2014-12-10 2016-06-16 Joanneum Research Forschungsgesellschaft Mbh Composition polymère ou prépolymère ou peinture d'impression en relief comprenant une telle composition et son utilisation
CN108352301A (zh) * 2015-10-26 2018-07-31 大日本印刷株式会社 薄膜模具以及压印方法
CN111443405A (zh) * 2015-12-18 2020-07-24 迪睿合电子材料有限公司 光学膜

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KR101684238B1 (ko) * 2015-03-25 2016-12-20 한국기계연구원 유연성 클리쉐를 이용한 인쇄보정 시스템 및 이를 이용한 인쇄방법
KR101631968B1 (ko) * 2015-04-28 2016-06-20 부산대학교 산학협력단 마이크로 표면 주름을 갖는 구조체의 제조 장치 및 방법
KR101688615B1 (ko) * 2015-05-07 2017-01-02 한국기계연구원 유연성 클리쉐를 이용하여 위치보정된 하드 클리쉐를 이용한 인쇄보정 시스템 및 이를 이용한 인쇄방법
JP2017034276A (ja) * 2016-10-20 2017-02-09 大日本印刷株式会社 インプリント用モールドとインプリント方法

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JP2014217951A (ja) * 2013-05-01 2014-11-20 株式会社リコー 平型部品製造方法、平型部品製造装置、及び金型
WO2016090395A1 (fr) * 2014-12-10 2016-06-16 Joanneum Research Forschungsgesellschaft Mbh Composition polymère ou prépolymère ou peinture d'impression en relief comprenant une telle composition et son utilisation
KR20170093229A (ko) * 2014-12-10 2017-08-14 요하노이움 리서치 포르슝스게젤샤프트 엠베하 폴리- 또는 프리폴리머 조성물, 또는 이러한 조성물을 포함하는 엠보싱 래커 및 이의 용도
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CN108352301A (zh) * 2015-10-26 2018-07-31 大日本印刷株式会社 薄膜模具以及压印方法
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CN108352301B (zh) * 2015-10-26 2023-03-24 大日本印刷株式会社 薄膜模具以及压印方法
CN111443405A (zh) * 2015-12-18 2020-07-24 迪睿合电子材料有限公司 光学膜
CN111443405B (zh) * 2015-12-18 2023-08-25 迪睿合电子材料有限公司 光学膜的使用方法

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