WO2011114143A1 - Perfectionnements apportés ou ayant trait à l'holographie - Google Patents

Perfectionnements apportés ou ayant trait à l'holographie Download PDF

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Publication number
WO2011114143A1
WO2011114143A1 PCT/GB2011/050509 GB2011050509W WO2011114143A1 WO 2011114143 A1 WO2011114143 A1 WO 2011114143A1 GB 2011050509 W GB2011050509 W GB 2011050509W WO 2011114143 A1 WO2011114143 A1 WO 2011114143A1
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WO
WIPO (PCT)
Prior art keywords
pattern
modulation
iterative process
amplitude
image
Prior art date
Application number
PCT/GB2011/050509
Other languages
English (en)
Inventor
Joshua James Cowling
Richard Mcwilliam
Alan Purvis
Florian Bryce Soulard
Peter Ivey
Nicholas Luke Seed
Gavin Lewis Williams
Jose Juan De Jesus TORIZ-GARCIA
Original Assignee
Durham University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB1004247.1A external-priority patent/GB201004247D0/en
Application filed by Durham University filed Critical Durham University
Priority to US13/578,313 priority Critical patent/US20130120813A1/en
Priority to GB1212941.7A priority patent/GB2490065B/en
Publication of WO2011114143A1 publication Critical patent/WO2011114143A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0808—Methods of numerical synthesis, e.g. coherent ray tracing [CRT], diffraction specific
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H2001/043—Non planar recording surface, e.g. curved surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0808—Methods of numerical synthesis, e.g. coherent ray tracing [CRT], diffraction specific
    • G03H2001/0816—Iterative algorithms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/22—Processes or apparatus for obtaining an optical image from holograms
    • G03H1/2249—Holobject properties
    • G03H2001/2252—Location of the holobject
    • G03H2001/2255—Holobject out of Fourier or hologram planes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/30—3D object
    • G03H2210/33—3D/2D, i.e. the object is formed of stratified 2D planes, e.g. tomographic data
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/40—Synthetic representation, i.e. digital or optical object decomposition
    • G03H2210/45—Representation of the decomposed object
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2210/00—Object characteristics
    • G03H2210/40—Synthetic representation, i.e. digital or optical object decomposition
    • G03H2210/45—Representation of the decomposed object
    • G03H2210/454—Representation of the decomposed object into planes

Definitions

  • the present invention relates to improvements in or relating to holography, and in particular to methods for generating holograms, together with associated apparatus for carrying out those methods.
  • the improvements of this disclosure are applicable to holography for any purpose, for example, but without limitation, to the sphere of manufacturing processes such as photolithography, or to the sphere of consumer electronics products, such as holographic television or other devices.
  • CGH computer generated holograms
  • diffractive masks In planar systems, little advantage over existing proximity/contact techniques have been found but for non-planar substrates, diffractive masks have an advantage over simple proximity masks because patterns imaged over such substrates imaged by conventional means are severely degraded by diffraction effects. In contrast, properly implemented diffractive masks are capable of focusing patterns over a variable depth surface with relative ease.
  • a method of generating a wave-optical exposure mask comprising:
  • said iterative process comprises specifying an intensity pattern that is defined over a bounded three dimensional geometrical surface by a series of multiple planes provided at differing positions within an image volume, extending from a diffraction plane formed by the modulation; and said iterative process is confined to a defined discrete array of amplitude and/or phase altering elements.
  • the multiple planes may be planes which are cross-sectional (x,y) with respect to, and provided at different positions along, an optical axis, z, extending from the diffraction plane.
  • said iterative process includes: a long propagation from a diffraction plane (where the modulation occurs) to a first endpoint of the object space where the pattern is to be produced;
  • the iterative process further includes filtering and spatial constraints applied at the diffraction plane.
  • amplitude correction is applied to only a sub-portion of each image plane where the sampled pixels intersect a pseudo-continuous surface function.
  • amplitude and phase information is unconstrained in
  • the amplitude and phase information may also be discarded where it is known that the surface prevents propagation.
  • a propagation routine adopted to move between image planes and hologram is that of a convolution form of the Fresnel diffraction integral.
  • said propagation routine is an application of a Rayleigh- Somerfield propagator.
  • said propagation routine is an angular spectrum method.
  • each image plane is corrected with an ideal amplitude profile, whilst retaining the propagated phase.
  • the hologram plane itself is corrected with unit amplitude to give a phase only pattern.
  • a wave-optical method of generating a hologram comprising:
  • Steps forming optional parts of the first aspect as described above may be applied also to the method of the second aspect.
  • an apparatus for generating a hologram having a desired non-planar pattern in object space comprising:
  • a radiation source for emitting coherent or partially coherent radiation
  • a modulator for modulating said incident radiation according to a modulation pattern
  • said modulator being controllable to vary a pattern of modulation that is applied;
  • said apparatus comprising a controller adapted to vary said modulation pattern via an iterative process until said modulation pattern produces a desired non-planar pattern in object space;
  • said iterative process comprises specifying an intensity pattern
  • said modulator comprises a spatial light modulator (SLM).
  • SLM spatial light modulator
  • said radiation source comprises a laser.
  • a lithographic apparatus comprising the apparatus of the third aspect and arranged for carrying out the method of the first and/or the second aspect.
  • a consumer device for generating holograms which includes the apparatus of the third aspect and/or is arranged for carrying out the method of the first and/or second aspects.
  • said consumer device comprises a holographic television with suitable projection means for projecting a hologram according to said predefined pattern into a viewing space or a display to be viewed by a user.
  • a computer program product including instructions that, when run on an computer, enables said computer to implement the method of the first or second aspects, or to form part of the apparatus of the third, fourth or fifth aspects.
  • Figure 1 is a graphical illustration of a multi-plane algorithm according to an embodiment of the disclosure
  • Figure 2 illustrates a method of partial reinforcement, where amplitude correction is applied to only a sub-section of each image plane where the sampled pixels intersect the pseudo-continuous surface function
  • Figure 3 illustrates multiple plane constraints shown for an image volume divided into three planes
  • Figure 4 illustrates example average intensity profiles and center cross sections for a simulated non-planar surface.
  • Figure 5 shows simulated contrast for variable plane separation ( ⁇ plotted on a log scale);
  • Figure 6 illustrates an optical setup according to the present disclosure
  • Figure 7 shows images of patterns developed on a coated substrate; with figure 7(a) illustrating a photoresist pattern on a flat top surface and figure 7(b) illustrating a photoresist pattern on a 45° sloped surface.
  • the present disclosure relates to a method of generating a wave-optical exposure mask that confines an incident coherent or partially-coherent wave according to a specified non-planar intensity pattern.
  • a partial, multiplane reinforcement method is disclosed that enables convergence to a suitable exposure mask with minimal error.
  • the method consists of an optical design means that is subject to two fundamental constraints:
  • the exposure mask is intentionally confined to a defined discrete array of amplitude and/or phase altering elements to yield a diffractive optical mask.
  • the Gerchberg-Saxton [3] iterative phase reconstruction algorithm comprises a simple sequence which, when repeated, can converge to a hologram phase pattern given a pair of intensity conditions for hologram and image planes.
  • Many variations and derivations of this algorithm have been applied to optics problems and, importantly, for both paraxial optical and far-field problems for which rapid algorithms such as the Fast Fourier transform (FFT) and the convolution form of the Fresnel diffraction equation may be implemented.
  • FFT Fast Fourier transform
  • convolution form of the Fresnel diffraction equation may be implemented.
  • the inventors have found that an iterative algorithm based on the Fresnel or angular-spectrum transformation can converge to holograms of continuous patterns for "thin” (on the order of the width of the point spread function) binary images. These are suitable for patterning of integrated circuit interconnections in a lithographic exposure. These methods are usually applied to a single planar image. To extend this method to 3D surfaces we have investigated multi-plane algorithms that are similar to those discussed in [6-8,13] for display and optical tweezers applications, and have extended the constraints such that it becomes possible to form a continuous exposure pattern.
  • Figure 1 shows a multi-plane algorithm illustrated graphically.
  • the image volume is offset from the diffraction plane hologram by a distance z 3 .
  • the algorithm invokes a numerically evaluated angular-spectrum propagation [9] between uniformly spaced planes inside an image volume and a single input diffraction plane.
  • the process may be outlined as:
  • step (IV) altering and spatial constraints may also be applied.
  • the above process is repeated, and we expect the error to reduce in both the hologram and image.
  • Surface patterns are then applied on the nearest constraint plane (along the optical axis).
  • Line segment holograms [2] can be used to generate image lines. To generate the initial hologram, we superimpose planar line segment holograms and then confine the resulting pattern to a phase-only distribution. This produces a non-ideal starting hologram, which is refined by the iterative procedure.
  • the 2D "rect" function limits the size of the hologram according to A and B where these are determined by the length of the lines and the width of the hologram respectively.
  • a final further step is performed to curtail this to a phase only pattern.
  • the method of partial reinforcement proceeds by amplitude correction of only a sub-section of each image plane where the sampled pixels intersect the pseudo-continuous surface function, as shown in Figure 2. Since we are only interested in the part of the volume which intersects with the surface of a photoresist coated substrate, we can break up our pattern into many planar sections rather than full planes. This type of technique has been seen to work in other publications [7] but under a much larger plane gap and not for a pseudo-continuous 3D pattern. We have advanced on this method by implementation of this technique on a real SLM device and with it have considered the physical sampling constraints involved in the system as well as taking the number of planes and plane gap to extremes with 256 planes spaced 4-40 ⁇ apart.
  • a propagation routine adopted to move between image planes and the hologram is that of a convolution form of the Fresnel diffraction integral [9,10].
  • f : 1 ⁇ ' ⁇ ' is the hologram plane field
  • V(x,y) is output plane field
  • z is distance along the optical axis
  • ⁇ is wavelength
  • k 2 ⁇ / ⁇ .
  • transfer function(TF) may be calculated in the frequency domain. This avoids
  • V(x, y) F- l (F(U(t, )) / / ( / ', ⁇ ⁇ /'. chorus) )
  • H( x , y ) e J'27r V (l/A)2+l ' +£/*
  • F is the Fourier transfornn (which would be evaluated using an FFT) and v x and v y are coordinates in the spatial frequency domain.
  • Some implementations would constrain the iteration propagations to the sample spacings of the implementation medium, i.e. pixel pitch on the Liquid Crystal On Silicon (LcoS) Spatial Light Modulator or phase-only optic. This is improved by a routine which samples at above the implemented device pitch and imposes an sampling constraint at the hologram plane.
  • LcoS Liquid Crystal On Silicon
  • Running simulations with a sample pitch of 4 ⁇ in both x & y and an image size of 8.192mm x 8.192mm, we produce an image of a bus comprising 8 lines which descend a 45° slope and a total depth of z 2 4.096mm, as shown in Figure 3.
  • the lines have a width of 8 ⁇ at a pitch of 24 ⁇ .
  • a "full width at half maximum" measurement of this profile gives a depth of focus (DOF) of approximately 0.92mm. Considering the depth of the surface topology this DOF would present a significant barrier to generating an focused image using a planar imaging system based on either refractive or holographic optical principals.
  • Example image line profiles and cross sections can be seen in Figure 4. Dips in these profiles occur at the edge of each constrained region and are due to a combination of out of focus image patterns as the sloped surface is descended, and interference between the patterns imposed on separate planes.
  • SF beam splitter
  • SLM modulator
  • substrate substrate
  • the hologram was implemented on an 8 ⁇ sample pitch phase-only spatial light modulator (SLM “Pluto” from Holoeye Photonics AG) by resampling the simulated hologram.
  • SLM sample pitch phase-only spatial light modulator
  • This device is illuminated by an on-axis expanded laser beam (Coherent “Cube” 405nm 50mW).
  • the photoresist used was "BPRS200". This layer was approximately 2 ⁇ thick.
  • figure 7(a) illustrates photoresist pattern on a flat top surface
  • figure 7(b) illustrates photoresist pattern on a 45° sloped surface.
  • the arrows in the figure indicate areas at the edge of image constraints for separate planes.
  • the functions and configurations described may be implemented in hardware, software, firmware, or any combination thereof. If implemented in software, the functions can be stored on or transmitted over as one or more instructions or code on a computer-readable medium.
  • Computer-readable media includes both computer storage media and communication media including any medium that facilitates transfer of a computer program from one place to another.
  • a storage media may be any available media that can be accessed by a computer.
  • Such computer-readable media can comprise RAM, ROM, EEPROM, CD-ROM or other optical disk storage, magnetic disk storage or other magnetic storage devices, or any other medium that can be used to carry or store desired program code in the form of instructions or data structures and that can be accessed by a computer.
  • any connection is properly termed a computer-readable medium.
  • the software is transmitted from a website, server, or other remote source using a coaxial cable, fiber optic cable, twisted pair, digital subscriber line (DSL), or wireless technologies such as infrared, radio, and microwave
  • the coaxial cable, fiber optic cable, twisted pair, DSL, or wireless technologies such as infrared, radio, and microwave are included in the definition of medium.
  • Disk and disc includes compact disc (CD), laser disc, optical disc, digital versatile disc (DVD), floppy disk and blu-ray disc where disks usually reproduce data magnetically, while discs reproduce data optically with lasers.
  • the instructions or code associated with a computer-readable medium of the computer program product may be executed by a computer, e.g., by one or more processors, such as one or more digital signal processors (DSPs), general purpose microprocessors, ASICs, FPGAs, or other equivalent integrated or discrete logic circuitry.
  • DSPs digital signal processors
  • ASICs application specific integrated circuits
  • FPGAs field-programmable gate arrays

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)

Abstract

L'invention concerne un algorithme itératif pour la conception d'hologrammes au moyen de multiples plans d'image de sortie, qui sont placés de manière à être très proches afin de produire des motifs continus à l'intérieur d'un volume d'imagerie. Ces hologrammes peuvent ensuite être utilisés pour la photolithographie sur des surfaces 3D, ou pour la production d'hologrammes s'utilisant dans des dispositifs de consommation.
PCT/GB2011/050509 2008-07-30 2011-03-15 Perfectionnements apportés ou ayant trait à l'holographie WO2011114143A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/578,313 US20130120813A1 (en) 2008-07-30 2011-03-15 Holography
GB1212941.7A GB2490065B (en) 2010-03-15 2011-03-15 Improvements in or relating to holography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB1004247.1A GB201004247D0 (en) 2008-07-30 2010-03-15 Iterative differactive optic masks for non-planar imaging
GB1004247.1 2010-03-15

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WO2011114143A1 true WO2011114143A1 (fr) 2011-09-22

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4339712A1 (fr) * 2022-09-15 2024-03-20 Envisics Ltd. Mise à jour optimisée d'hologrammes

Citations (2)

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WO2006021818A1 (fr) 2004-08-24 2006-03-02 University Of Durham Lithographie holographique
WO2006066919A1 (fr) * 2004-12-23 2006-06-29 Seereal Technologies Gmbh Methode de calcul d'un hologramme

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WO2006021818A1 (fr) 2004-08-24 2006-03-02 University Of Durham Lithographie holographique
WO2006066919A1 (fr) * 2004-12-23 2006-06-29 Seereal Technologies Gmbh Methode de calcul d'un hologramme

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4339712A1 (fr) * 2022-09-15 2024-03-20 Envisics Ltd. Mise à jour optimisée d'hologrammes

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GB2490065B (en) 2018-04-11
GB2490065A (en) 2012-10-17
GB201212941D0 (en) 2012-09-05

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