WO2011041087A3 - Inductively-coupled plasma (icp) resonant source element - Google Patents

Inductively-coupled plasma (icp) resonant source element Download PDF

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Publication number
WO2011041087A3
WO2011041087A3 PCT/US2010/048573 US2010048573W WO2011041087A3 WO 2011041087 A3 WO2011041087 A3 WO 2011041087A3 US 2010048573 W US2010048573 W US 2010048573W WO 2011041087 A3 WO2011041087 A3 WO 2011041087A3
Authority
WO
WIPO (PCT)
Prior art keywords
coil
inductively
overlapping area
coupled plasma
coupled
Prior art date
Application number
PCT/US2010/048573
Other languages
French (fr)
Other versions
WO2011041087A2 (en
Inventor
John M. White
Jonghoon Baek
Tsutomu Tanaka (Tom)
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Publication of WO2011041087A2 publication Critical patent/WO2011041087A2/en
Publication of WO2011041087A3 publication Critical patent/WO2011041087A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)

Abstract

The present invention generally relates to an inductive-capacitive element that may be used to form a single coil within an inductively-coupled plasma apparatus. One or more elements may be used and coupled together to collectively form the coil. The coil may be coupled to a single match network. Therefore, a single input and a single output may be used for the coil so that fewer penetrations through the chamber walls may be used. The individual inductive-capacitive elements may comprise two overlapping tubes with an insulating material disposed therebetween in an overlapping area. The overlapping area forms a capacitor segment and the non-overlapping area forms an inductor segment. The tubes and insulating material may be welded together to create a resonant circuit with an impedance of zero. Thus, the inductance of the coil is low, only two wall penetrations are utilized and a single match network is utilized.
PCT/US2010/048573 2009-09-29 2010-09-13 Inductively-coupled plasma (icp) resonant source element WO2011041087A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US24692809P 2009-09-29 2009-09-29
US61/246,928 2009-09-29

Publications (2)

Publication Number Publication Date
WO2011041087A2 WO2011041087A2 (en) 2011-04-07
WO2011041087A3 true WO2011041087A3 (en) 2011-09-29

Family

ID=43826839

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/048573 WO2011041087A2 (en) 2009-09-29 2010-09-13 Inductively-coupled plasma (icp) resonant source element

Country Status (1)

Country Link
WO (1) WO2011041087A2 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6473332B2 (en) * 2012-01-27 2019-02-20 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Segmented antenna assembly and plasma generator
JP6473889B2 (en) * 2014-09-19 2019-02-27 パナソニックＩｐマネジメント株式会社 Plasma processing apparatus and method, and electronic device manufacturing method
CN105491780B (en) * 2014-10-01 2018-03-30 日新电机株式会社 The antenna of plasma generation and the plasma processing apparatus for possessing the antenna
JP7025711B2 (en) * 2018-03-14 2022-02-25 日新電機株式会社 Antenna and plasma processing equipment
JP7101335B2 (en) * 2018-03-19 2022-07-15 日新電機株式会社 Antenna and plasma processing equipment
JP7233639B2 (en) * 2019-04-19 2023-03-07 日新電機株式会社 Silicon film deposition method
JP7290080B2 (en) * 2019-07-19 2023-06-13 日新電機株式会社 Plasma processing equipment
CN117751422A (en) * 2021-08-20 2024-03-22 东京毅力科创株式会社 Apparatus for plasma processing
JP2024068522A (en) * 2022-11-08 2024-05-20 日新電機株式会社 Plasma Processing Equipment

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6265031B1 (en) * 1993-01-12 2001-07-24 Tokyo Electron Limited Method for plasma processing by shaping an induced electric field
JP2003109798A (en) * 2001-09-27 2003-04-11 Ishikawajima Harima Heavy Ind Co Ltd Discharge device, plasma treatment method and solar cell
KR20070048480A (en) * 2005-11-04 2007-05-09 세메스 주식회사 Plasma treatment apparatus
KR20090059884A (en) * 2007-12-07 2009-06-11 성균관대학교산학협력단 Plasma sources having ferrite structures and plasma generating apparatus employing the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6265031B1 (en) * 1993-01-12 2001-07-24 Tokyo Electron Limited Method for plasma processing by shaping an induced electric field
JP2003109798A (en) * 2001-09-27 2003-04-11 Ishikawajima Harima Heavy Ind Co Ltd Discharge device, plasma treatment method and solar cell
KR20070048480A (en) * 2005-11-04 2007-05-09 세메스 주식회사 Plasma treatment apparatus
KR20090059884A (en) * 2007-12-07 2009-06-11 성균관대학교산학협력단 Plasma sources having ferrite structures and plasma generating apparatus employing the same

Also Published As

Publication number Publication date
WO2011041087A2 (en) 2011-04-07

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