WO2011037317A2

WO2011037317A2 - Apparatus for growing silicon ingots, and body for the vacuum chamber of the apparatus for growing silicon ingots

Info

Publication number: WO2011037317A2
Application number: PCT/KR2010/004615
Authority: WO
Inventors: 이종구
Original assignee: 퀄리플로나라테크(주)
Priority date: 2009-09-28
Filing date: 2010-07-15
Publication date: 2011-03-31
Also published as: WO2011037317A3; KR100964356B1

Abstract

The present invention relates to an apparatus for growing silicon ingots, comprising: a vacuum chamber consisting of one or more hollow bodies (100), each of which has a guide member (110); a crucible arranged within the vacuum chamber; a heater arranged around the crucible in the vacuum chamber; and a heat-insulating member arranged around the heater in the vacuum chamber. The present invention also relates to a body for the vacuum chamber for the apparatus for growing silicon ingots. The apparatus for growing silicon ingots of the present invention is advantageous in that cooling water guided by the guide member (110) arranged in the main body (100) reaches an upper flange (105) of the main body (100), smoothly flows along the lower portion of the upper flange (105), and is discharged, thus effectively cooling the upper portion of the main body (100) and the upper flange (105) by means of the simple configuration of the apparatus of the present invention.

Description

Body for vacuum chamber provided in silicon ingot growth apparatus and silicon ingot growth apparatus

The present invention relates to a body for a vacuum chamber provided in the silicon ingot growth apparatus and the silicon ingot growth apparatus, which is provided in the silicon ingot growth apparatus and the silicon ingot growth apparatus which can maintain the flow of the cooling water smoothly and obtain an excellent cooling effect. A body for a vacuum chamber.

Silicon wafers for semiconductors are used to make various types of semiconductor devices such as DRAM, application specific integrated circuits (ASICs), transistors (TRs), MOSFETs, CMOS, PMOS, ROM, or EP-ROMs. It is an indispensable part of the whole, and is used in various electronic products, industrial automation machines, computers, and satellites. Such a semiconductor silicon wafer is obtained by first producing a silicon ingot and then cutting it to a constant thickness.

1 is a schematic cross-sectional view of a silicon ingot growth apparatus for manufacturing a silicon ingot, FIG. 2 is a perspective view illustrating a body for a vacuum chamber provided in the silicon ingot growth apparatus shown in FIG. 1, and FIG. 3 is a line AA of FIG. 2. 4 is a perspective view illustrating a state in which the upper flange is removed from the body for the vacuum chamber of FIG. 2.

As shown in FIG. 1, the silicon ingot growth apparatus 1 includes a vacuum chamber, a crucible 4 of quartz material provided inside the vacuum chamber to accommodate a silicon melt, and a crucible 4 inside the vacuum chamber. A heater 5 for supplying a heat source to the received silicon melt and surrounding the heater 5 inside the vacuum chamber to block heat emitted to the body 10 of the vacuum chamber. 6) including. The vacuum chamber consists of a domed lid (3), a cylindrical body (10), and a base plate (7). Cooling means is provided in a configuration constituting the vacuum chamber. The lid 3 is connected to the upper portion of the body 10, and the base plate 7 is connected to the lower portion of the body 10. The body 10 and the lid 3, and the body 10 and the base plate 7 may be welded to each other, or may be connected by bolting to have a flange. Since the inside of the vacuum chamber should be maintained in a vacuum, a seal means is provided at the connection portion of the body 10 and the lid 3 and the connection portion of the body 10 and the base plate 7. The space surrounded by the heat insulating material and kept at a high temperature is called a hot zone 8 in particular. In FIG. 1, reference numeral 20 shows a growth tower and 21 shows a grown silicon ingot.

As shown in FIGS. 2 to 4, the body 10 includes an annular upper flange 15, an annular lower flange 17 spaced downward from the upper flange 15, and an upper end thereof. A cylindrical outer member 11 connected to the upper flange 15 and the lower end connected to the lower flange 17, and an upper end connected to the upper flange 15 and a lower end connected to the lower flange 17. It consists of an inner member 13.

Since the inner diameter of the outer member 11 is larger than the outer diameter of the inner member 13, and the outer member 11 and the inner member 13 form concentric circles, a radius is formed between the outer member 11 and the inner member 13. The gap is formed in the direction. A space 12 is formed inside the body 10 by the upper flange 15, the lower flange 17, the inner member 13, and the outer member 11.

The outer member 11 is spaced up and down and provided with an inlet 18 and an outlet 19, and the inlet 18 and the outlet 19 communicate with the space 12. 2 and 3 the outlet 19 is provided as close to the upper flange 15 as possible, and the inlet 18 is provided as close to the lower flange 17 as possible.

During the process of growing the silicon ingot with the silicon ingot growth apparatus 1, the coolant is continuously injected into the inlet 18 and the coolant is discharged into the outlet 19 to cool the body 10. Detailed description of the growth of the silicon ingot is omitted.

The body 10 provided in the conventional vacuum chamber is injected into the space portion 12 through the inlet 18 so that the coolant filled from the bottom is discharged through the outlet 19 of the upper portion of the upper flange of the body 10 The upper flange 15 of the body 10 may not be sufficiently cooled because the upper flange 15 is not sufficiently cooled because the upper flange 15 may not be discharged without reaching up to 15 or may not flow smoothly in the upper portion of the body 10, that is, the lower portion of the upper flange 15. There is a problem that the sealing is provided between the lid 15 and the vacuum seal 3 is damaged, the deformation occurs in the body 10 and the upper flange 15 and corrosion occurs in a short time.

The present invention has been proposed to solve the above problems, the cooling water is filled up to the lower portion of the upper flange and flows along the lower portion of the upper flange and then discharged to the outlet to sufficiently cool the upper flange damage of the sealing by high temperature It is an object of the present invention to provide a silicon ingot growth apparatus and a body for a vacuum chamber provided in the silicon ingot growth apparatus, which can be prevented and also prevent corrosion or deformation occurring in the body and the upper flange.

In order to achieve the above object, the present invention provides a vacuum chamber consisting of one or more bodies which are hollow bodies having a guide member, a crucible provided inside the vacuum chamber, a heater provided around the crucible inside the vacuum chamber, A heat insulator provided around the heater inside the vacuum chamber; The body is a double tube body with both ends sealed to form a space between the pipe body, the inlet is provided with a coolant is injected into the space and the outlet is spaced from the inlet and the outlet for cooling water discharged from the space; The guide member is provided in the space portion so that the inlet is located on one side and the outlet is located on the other side, and a guide portion forming a gap communicating with the outlet from the inlet, and extending from the guide to one end of the body and between the gap and the outlet. Including a located blocking portion, the cooling water introduced through the inlet is provided through the gap and flows along the guide to provide a silicon ingot growth apparatus discharged to the outlet.

In addition, the present invention is the body is an annular upper flange, an annular lower flange provided to be spaced apart from the upper flange, the outer container is one end is connected to the upper flange and the other end is connected to the lower flange, and one end An inner container which is connected to the upper flange and whose other end is connected to the lower flange and which is spaced inwardly of the outer container; The space portion is formed by the upper flange, the lower flange, the inner container and the outer container; The inlet and outlet are spaced apart from each other vertically to provide a silicon ingot growth apparatus provided in the outer container.

In addition, the present invention provides a silicon ingot growth apparatus, wherein the inner edge of the guide portion is connected to the inner container, the outer edge is connected to the outer container, and the gap is provided adjacent to the outlet.

On the other hand, the present invention in the vacuum chamber body is provided with one or more in the silicon ingot growth apparatus, the body is a double tube formed with a space between the two ends is sealed between the tube, the injection hole in which the coolant is injected into the space, and the injection hole A discharge member spaced apart from the discharge port through which the coolant is discharged from the space, and a guide member provided in the space to guide the coolant; The guide member is provided in the space portion so that the inlet is located on one side and the outlet is located on the other side, and a guide portion forming a gap communicating with the outlet from the inlet, and extending from the guide to one end of the body and between the gap and the outlet. Including a blocking unit located therein, the cooling water introduced through the injection port provides a body for the vacuum chamber provided in the silicon ingot growth apparatus discharged to the discharge port through the gap and flows along the guide.

In addition, the present invention is the body is an annular upper flange, an annular lower flange provided to be spaced apart from the upper flange, the outer container is one end is connected to the upper flange and the other end is connected to the lower flange, and one end An inner container which is connected to the upper flange and whose other end is connected to the lower flange and which is spaced inwardly of the outer container; The space portion is formed by the upper flange, the lower flange, the inner container and the outer container; The inlet and outlet are spaced vertically apart from each other to provide a body for the vacuum chamber provided in the silicon ingot growth apparatus provided in the outer container, the outlet is close to the upper flange, the inlet is close to the lower flange.

In addition, the present invention provides a body for the vacuum chamber is provided in the silicon ingot growth apparatus, the inner edge of the guide portion is connected to the inner container and the outer edge is connected to the outer container, the gap is provided adjacent to the outlet.

In addition, the present invention is the outer container and the inner container is a tubular body of circular cross section; The guide portion is circularly arced at both ends and has an inner edge connected to the inner container and an outer edge connected to the outer container; The gap provides a body for the vacuum chamber provided in the silicon ingot growth apparatus formed between the guide, the outer container and the inner container.

In addition, the present invention is the outer container and the inner container is a tubular body of circular cross section; The guide is annular with an inner edge connected to the inner container and an outer edge connected to the outer container; The gap provides a body for a vacuum chamber provided in the silicon ingot growth apparatus that is a through hole formed in the guide portion.

In addition, the present invention, the outer container and the inner container is a tubular body having a circular cross section and is formed in a cross-sectional annular shape of the space portion, the injection hole is provided in the silicon ingot growth apparatus provided to have an acute angle with respect to the tangential direction of the space portion Provided is a body for a vacuum chamber.

The vacuum chamber body provided in the silicon ingot growth apparatus and the silicon ingot growth apparatus according to the present invention is the coolant guided by the guide member 110 provided in the body 100 to the upper flange 105 of the body 100. Since it can reach and flow smoothly along the lower portion of the upper flange 105, the discharge can be effectively cooled the upper and upper flanges 105 of the body 100 in a simple configuration.

1 is a schematic cross-sectional view showing a silicon ingot growth apparatus.

FIG. 2 is a perspective view illustrating a body for a vacuum chamber provided in the silicon ingot growth apparatus of FIG. 1.

3 is a cross-sectional view taken along the line A-A of FIG.

4 is a perspective view illustrating a state in which the upper flange is removed from the body for the vacuum chamber of FIG. 2.

5 is a perspective view showing a body for a vacuum chamber according to the present invention.

FIG. 6 is a schematic perspective view illustrating a state in which the upper flange is removed from the body for the vacuum chamber of FIG. 5.

FIG. 7 is an enlarged view of a portion A of FIG. 6.

8 is a plan view of the body for the vacuum chamber of FIG.

Figure 9 is a schematic perspective view showing a guide member provided in the body for the vacuum chamber according to the present invention.

FIG. 10 is an enlarged view of a portion A of FIG. 9 and illustrates a modified example of the guide member provided in the body for a vacuum chamber according to the present invention.

11 is a schematic perspective view showing another embodiment of a guide member provided in the body for a vacuum chamber according to the present invention.

12 and 13 are schematic cross-sectional views taken along the line A-A of FIG.

14 is a cross-sectional view taken along line B-B of FIG. 5.

Hereinafter, with reference to the drawings will be described in detail the body for the vacuum chamber provided in the silicon ingot growth apparatus and the silicon ingot growth apparatus according to a preferred embodiment of the present invention.

5 is a perspective view showing a body for a vacuum chamber according to the present invention, Figure 6 is a schematic partial perspective view showing a state in which the upper flange is removed from the body for the vacuum chamber of Figure 5, Figure 7 is part A of Figure 6 8 is a plan view illustrating the vacuum chamber body of FIG. 5, and FIG. 9 is a schematic perspective view illustrating a guide member provided in the vacuum chamber body according to the present invention, and FIG. 10 is FIG. 9. An enlarged view of part A of a modified example of the guide member provided in the body for the vacuum chamber according to the present invention, Figure 11 shows another embodiment of the guide member provided in the body for the vacuum chamber according to the

present invention

12 and 13 are schematic cross-sectional views taken along line AA of FIG. 5, and FIG. 14 is a cross-sectional view taken along line BB of FIG. 5.

Hereinafter, the vertical direction of FIG. 5 will be described as an up-down direction or an axial direction, and a description of a configuration overlapping with the prior art will be omitted.

The silicon ingot growth apparatus according to the present invention has a vacuum chamber made of a body 100, which is a hollow body having a guide member 110 connected to a base plate connected to a lower portion thereof, and a crucible provided inside the vacuum chamber. And a heater provided around the crucible inside the vacuum chamber and a heat insulating material provided around the heater in the vacuum chamber. As shown in FIG. 5, the body 100 is a hollow cylindrical body, and the crucible is positioned inside the body 100 (see FIG. 1). The body 100 may be divided into upper and lower sides and provided with two or more cylindrical bodies stacked vertically. Therefore, two or more cylindrical bodies 100 may be provided in a vertically connected state. When two or more bodies 100 are provided, the lower portion of the other body 100 is connected to the upper portion of the body 100 positioned at the lower portion, and the lid is connected to the upper portion of the body 100 positioned at the upper portion.

5, 6, 8, 12 and 13, the body 100 is a double tube body formed in the space portion 102 between the upper and lower ends are sealed between the tube, the space portion 102 ) Is provided with an inlet 108 through which coolant is injected and an outlet 109 spaced apart from the inlet 108 and discharging the coolant from the space 102. The outlet 109 is provided at an upper portion, and the injection hole 108 is provided spaced downward from the outlet 109. More specifically, the body 100 has an annular upper flange 105 connected to the lid, an annular lower flange 107 provided to be spaced downward from the upper flange 105, and one end of the upper portion. An outer container 101 which is connected to the flange 105 and the other end is a tube connected to the lower flange 107, and one end is connected to the upper flange 105, and the other end is connected to the lower flange 107. It consists of an inner container 103 which is a tubular body provided spaced inward of 101. A gap is formed between the outer container 101 and the inner container 103, and the space portion 102 includes the upper flange 105, the lower flange 107, the inner container 103, and the outer container ( 101). The injection port 108 and the discharge port 109 are spaced vertically apart from each other provided in the outer container 101, it is communicated to the space 102.

As shown in Figure 5 to 9, the guide member 110 is provided in the space portion 102 so that the injection port 108 is located on one side and the discharge port 109 is located on the other side and the discharge port from the injection hole 108 A guide part 111 forming a communication path 115 communicating with 109, and extending from the guide part 111 to one end of the body 100 and positioned between the communication path 115 and the outlet 109. It is configured to include a blocking unit 113. An outlet 109 is positioned above the guide 111, and an injection hole 108 is positioned below the guide 111. 6 to 9 illustrate the path through which the coolant flows.

5 and 14, two or more injection holes 108 may be provided, and when the cross section of the space portion 102 is formed in an annular shape, the injection hole 108 may be a space portion ( It is preferable that the coolant is formed to have an acute angle with the tangential direction of the 102 and injected into the space 102 through the injection hole 108 so as to pivot along the space 102 as shown by the arrow in FIG. 14. . As shown by arrows in FIG. 14, when the coolant is swiveled upward, the cooling of the body 100 may be uniform and effective.

The inner edge of the guide 111 is connected to the inner container 103 and the outer edge is connected to the outer container 101, the upper flange 105 as shown in FIGS. 5, 8, 12 and 13. ), A passage 119 through which the coolant flowing into the upper portion of the guide portion 111 flows through the communication passage 115 formed by the inner container 103, the outer container 101, and the guide portion 111. Is formed. The cross-sectional area of the passage 119 is preferably in the range of 80% to 120% of the cross-sectional area of the outlet 109. If the cross-sectional area of the passage 119 is smaller than 80% of the cross-sectional area of the outlet 109, the pressure rises in the passage 119 to become high pressure, and if the cross-sectional area of the passage 119 is larger than 120%, the flow velocity decreases in the passage 119, thereby causing 105) cannot be sufficiently cooled.

As illustrated in FIG. 6, the outer container 101 and the inner container 103 may be cylindrical cylinders having a circular cross section. The outer container 101 and the inner container 103 are provided to form concentric circles with each other. At this time, the inner diameter of the outer container 101 is larger than the outer diameter of the inner container 103 is formed between the outer container 101 and the inner container 103 in the radial direction.

The upper flange 105 is annularly coupled to the upper portion of the outer container 101 and the inner container 103. The inner diameter of the upper flange 105 is the same as or smaller than the inner diameter of the inner container 103, the outer diameter of the upper flange 105 is formed larger than the outer diameter of the outer container 101 to the upper flange 105 The gap formed between the outer container 101 and the inner container 103 is closed in the axial direction. The inner diameter of the upper flange 105 may be manufactured larger than the inner diameter of the inner container 103 and smaller than the outer diameter of the inner container 103.

The lower flange 107 is coupled to the lower portion of the outer container 101 and the inner container 103 in an annular shape. The inner diameter of the lower flange 107 is formed to be the same as or smaller than the inner diameter of the inner container 103, the outer diameter of the lower flange 107 is formed larger than the outer diameter of the outer container 101 to the outside by the lower flange 107 The gap formed between the container 101 and the inner container 103 is closed in the axial direction.

The upper flange 105 and the lower flange 107 are coupled to the outer container 101 and the inner container 103 by welding or the like.

The outlet 109 is provided in the outer container 101 adjacent to the upper flange 105, and the inlet 108 is provided in the outer container 101 adjacent to the lower flange 107.

As shown in FIG. 9, the guide part 111 of the guide member 110 is formed in an arc shape in which a portion of the guide member 110 is cut off, and both ends thereof are spaced apart from each other, and the blocking part 113 extends upward from one end. . The blocking unit 113 does not necessarily need to be extended from the guide unit 111 and may be extended to have a gentle inclination as shown in FIG. 10.

When the guide member 110 is provided between the outer container 101 and the inner container 103, that is, in the space 102, the guide member 111 is cut as shown in FIGS. 6 and 8. The portion is positioned adjacent to the outlet 109. A communication path 115 through which the coolant flows into the passage 119 is formed by the cut portion of the guide part 111, the inner surface of the outer container 101, and the outer surface of the inner container 103. The blocking part 113 extends from the guide part 111 and is located between the communication path 115 and the outlet 109. The blocking portion 113 extends from the guide portion 111 to the upper flange 105 to block the passage 119. Therefore, the cooling water introduced into the passage 119 through the communication path 115 from the bottom flows along the passage 119 to be blocked by the blocking portion 113 and is discharged to the outlet 109.

In order to maximize the cooling effect of the upper flange 105 by maximizing the flow distance of the coolant, the outlet 109 and the communication path 115 are preferably located as close to each other as possible.

The communication path 115 may be formed by forming the guide portion 111 in an annular shape and drilling a through hole in the guide portion 111. In this case, the communication path 115 is formed by a through hole.

11 illustrates a guide member 110 according to another embodiment of the present invention. When the discharge port 109 is provided in the outer container 101, two arc-shaped guide parts 111 are spaced apart from each other, and two ends thereof are separated from one end of the spaced guide parts 111. The guide 113 may be provided with two parts 113. In the above, the communication path 115 is formed between the spaced both ends of the guide part 111 and the outer container 101 and the inner container 103. The communication path 115 is positioned to be adjacent to the discharge port 109, and each blocking portion 113 is located between the discharge port 109 and the communication path 115 at a close distance to each other. FIG. 11 illustrates a case in which two discharge ports 109 are provided opposite to the outer container 101. The two communication paths 115 are provided at an angle of 180 ° and the blocking part 113 is likewise. ) Is also provided at an angle of 180 °. When three outlets 109 are provided in the outer container 101 at three angles of 120 °, three communication paths 115 having three guide parts 111 and having angles of 120 ° to each other, Three blocking portions 113 are provided. In FIG. 11, the arrow shows a path through which the coolant flows when the guide member 110 is provided in the space.

It is preferable that the size of the communication path 115 formed by the guide part 111 is as small as possible to increase the flow distance of the coolant, but the inlet 108 is used to smoothly flow the coolant into the passage 119. It can have the same size as the cross-sectional area.

12 and 13, the guide 111 may be provided horizontally, or may be provided to be inclined toward any one side.

When the coolant is injected into the injection hole 108 provided in the outer container 101 adjacent to the lower flange 107 in the vacuum chamber body 100 provided in the silicon ingot growth apparatus according to the present invention, the coolant is a space portion ( When it reaches the lower portion of the guide portion 111 of the guide member 110 from the lower portion of the 102, it is introduced into the passage 119 through the communication path 115, flows along the passage 119 and then to the blocking portion 113. This leads to discharge through the outlet 109 adjacent to the blocking portion 113. Therefore, the coolant flows along the lower part of the upper flange 105 and the upper part of the outer container 101 and the inner container 103 and then discharges, so that the upper flange 105 and the outer container 101 and the inner container 103 are discharged. It is possible to effectively cool the top of the.

The term 'adjacent' in the above is meant to include a position close to each other to a range not overlapping with being spaced close to each other.

Although the present invention has been described above with reference to the drawings, the scope of the present invention is not limited thereto, and the scope obvious to those skilled in the art to which the present invention belongs should be interpreted as belonging to the rights of the present invention.

Claims

A vacuum chamber comprising at least one body 100 which is a hollow body having a guide member 110, a crucible provided inside the vacuum chamber, a heater provided around the crucible inside the vacuum chamber, and inside the vacuum chamber A heat insulator provided around the heater; The body 100 is a double tube body having both ends sealed and a space portion 102 formed between the tube bodies, spaced apart from the injection hole 108 and the injection hole 108 into which the coolant is injected into the space portion 102. An outlet 109 through which cooling water is discharged from 102; The guide member 110 is provided in the space portion 102 so that the injection hole 108 is located on one side and the discharge hole 109 is located on the other side, and the communication path 115 communicates with the discharge hole 109 from the injection hole 108. Including a guide portion 111 and a blocking portion 113 extending from the guide portion 111 to one end of the body 100 and positioned between the communication path 115 and the discharge port 109, Cooling water introduced through the 108 is through the communication path 115 and flows along the guide portion 111 is discharged to the silicon ingot growth apparatus, characterized in that discharged to the outlet (109).
According to claim 1, wherein the body 100 is an annular upper flange 105, an annular lower flange 107 provided to be spaced apart from the upper flange 105, and one end to the upper flange 105 The outer end 101 connected to the lower flange 107 and the other end connected to the upper flange 105, the other end connected to the lower flange 107, and the other end connected to the inner side of the outer container 101. It consists of the inner container 103 which is a spaced body provided; The space portion (102) is formed by the upper flange (105), the lower flange (107), the inner container (103) and the outer container (101); The inlet 108 and the outlet 109 is spaced vertically spaced apart from each other is provided in the silicon ingot growth apparatus, characterized in that provided in the outer container (101).
According to claim 2, wherein the inner edge of the guide portion 111 is connected to the inner container 103 and the outer edge is connected to the outer container 101, the communication path 115 is adjacent to the outlet 109 Silicon ingot growth apparatus, characterized in that provided.
In the vacuum chamber body is provided with at least one silicon ingot growth apparatus, the body 100 is a double tube body formed in the space portion 102 is sealed between both ends, the cooling water is injected into the space portion 102 The injection hole 108, spaced apart from the injection hole 108, a discharge port 109 through which the coolant is discharged from the space part 102, and a guide member 110 provided in the space part 102 to guide the coolant. Includes; The guide member 110 is provided in the space portion 102 so that the injection hole 108 is located on one side and the discharge hole 109 is located on the other side, and the communication path 115 communicates with the discharge hole 109 from the injection hole 108. Including a guide portion 111 and a blocking portion 113 extending from the guide portion 111 to one end of the body 100 and positioned between the communication path 115 and the outlet 109, Cooling water introduced through the inlet 108 is passed through the communication path 115 and flows along the guide portion 111 is discharged to the discharge port 109, the body for the vacuum chamber provided in the silicon ingot growth apparatus ( 100).
5. The body 100 of claim 4, wherein the body 100 has an annular upper flange 105, an annular lower flange 107 spaced apart from the upper flange 105, and one end of the body 100. The outer end 101 connected to the lower flange 107 and the other end connected to the upper flange 105, the other end connected to the lower flange 107, and the other end connected to the inner side of the outer container 101. It consists of the inner container 103 which is a spaced body provided; The space portion (102) is formed by the upper flange (105), the lower flange (107), the inner container (103) and the outer container (101); The inlet 108 and the outlet 109 is spaced up and down each other so that the outlet 109 is close to the upper flange 105, the inlet 108 is provided in the outer container 101 close to the lower flange 107 Body for vacuum chamber provided in the silicon ingot growth apparatus characterized in that.
The method of claim 5, wherein the inner edge of the guide portion 111 is connected to the inner container 103 and the outer edge is connected to the outer container 101, the communication path 115 is adjacent to the outlet 109 Body for vacuum chamber provided in the silicon ingot growth apparatus, characterized in that provided.
6. The outer container (101) and the inner container (103) are tubular bodies having a circular cross section; The guide portion 111 is an arc shape with both ends spaced apart and the inner edge thereof is connected to the inner container 103 and the outer edge thereof is connected to the outer container 101; The communication path (115) is a vacuum chamber body (100) provided in the silicon ingot growth apparatus, characterized in that formed between the guide portion 111, the outer container 101 and the inner container (103).
6. The outer container (101) and the inner container (103) are tubular bodies having a circular cross section; The guide portion 111 is annular with an inner edge connected to the inner container 103 and an outer edge connected to the outer container 101; The communication path 115 is a vacuum chamber body 100 provided in the silicon ingot growth apparatus, characterized in that the through hole formed in the guide portion (111).
6. The outer container 101 and the inner container 103 are tubular bodies having a circular cross section and are formed in a cross-sectional shape of the space portion 102, and the injection hole 108 is formed in the space portion 102. Body (100) for the vacuum chamber provided in the silicon ingot growth apparatus, characterized in that it is provided with an acute angle with respect to the tangential direction.