WO2011026201A2 - Enrobages métalliques sur des substrats métalliques - Google Patents

Enrobages métalliques sur des substrats métalliques Download PDF

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Publication number
WO2011026201A2
WO2011026201A2 PCT/BE2010/000062 BE2010000062W WO2011026201A2 WO 2011026201 A2 WO2011026201 A2 WO 2011026201A2 BE 2010000062 W BE2010000062 W BE 2010000062W WO 2011026201 A2 WO2011026201 A2 WO 2011026201A2
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Prior art keywords
coating
metal
substrate
previous
starting
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PCT/BE2010/000062
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English (en)
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WO2011026201A3 (fr
Inventor
Annabel Braem
Tina Mattheys
Bram Neirinck
Jan Schrooten
Omer Van Der Biest
Jozef Vleugels
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Katholieke Universiteit Leuven
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Priority claimed from GB0915508A external-priority patent/GB0915508D0/en
Priority claimed from GB0915577A external-priority patent/GB0915577D0/en
Priority claimed from GB0915560A external-priority patent/GB0915560D0/en
Priority claimed from GBGB1007563.8A external-priority patent/GB201007563D0/en
Application filed by Katholieke Universiteit Leuven filed Critical Katholieke Universiteit Leuven
Publication of WO2011026201A2 publication Critical patent/WO2011026201A2/fr
Publication of WO2011026201A3 publication Critical patent/WO2011026201A3/fr

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/02—Inorganic materials
    • A61L27/04—Metals or alloys
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/02—Inorganic materials
    • A61L27/04—Metals or alloys
    • A61L27/06—Titanium or titanium alloys
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/28—Materials for coating prostheses
    • A61L27/30—Inorganic materials
    • A61L27/306—Other specific inorganic materials not covered by A61L27/303 - A61L27/32
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00—Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/50—Materials characterised by their function or physical properties, e.g. injectable or lubricating compositions, shape-memory materials, surface modified materials
    • A61L27/56—Porous materials, e.g. foams or sponges
    • B01J35/39—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B01J37/0225—Coating of metal substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C25D13/02—Electrophoretic coating characterised by the process with inorganic material
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L2420/00—Materials or methods for coatings medical devices
    • A61L2420/02—Methods for coating medical devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/026—Anodisation with spark discharge
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon

Definitions

  • the present invention relates generally to a new process of porous or closed porosity (as for instance displayed in fig 11) metal coatings such as titanium, zirconium or niobium coatings on metallic substrates. Furthermore the present invention provides a coating or coated devices with particular characteristics that are obtainable by the process of present invention and the uses thereof.
  • a particular embodiment is a prosthetic device with improved implant fixation through osteointegration by bone ingrowth into the porosity of the porous coating of present invention or enhanced bone formation by improved surface roughness. Such improved surface roughness is obtainable without influencing or drastically influencing the microstructure of the substrate material.
  • implant surface functionality towards bone formation can be improved as the metal coating generates a substantial surface area that can facilitate deposition of biologically active compounds that support bone formation and enhance attachment of osteogenic cells.
  • Another particular embodiment is a photocatalytic coating or surface with improved or different photocatalytic properties.
  • Ti and its alloys have proven their superiority for load-bearing implant applications over other metallic implant materials such as stainless steel and CoCr alloys, because of the combination of their outstanding properties such as an excellent biocompatibility, high strength and low density (high specific strength), low modulus of elasticity and good fatigue resistance [1,7]. Because of its higher strength, Ti-6A1-4V has gradually replaced commercially pure Ti [8] and is now the most commonly used titanium based alloy. However, due to the possible release of aluminium and vanadium, some concerns have risen for the long-term performance of these alloys [9]. Metal ions released by corrosion may induce aseptic loosening of the implant [10] or be related to long-term health problems, such as Alzheimer's disease [1]. Therefore, biomedical titanium alloys, consisting mainly of the non-toxic elements Ti, Nb, Ta and Zr, are recently being investigated [1].
  • This work shows coating methods and provides applications of a porous or dense pure Ti coating on a Ti-6A1-4V substrate using electrophoretic deposition (EPD) and TiH 2 powders.
  • EPD electrophoretic deposition
  • TiH 2 powders This porous or closed porosity structure at the implant surface improves the implant stability by allowing bone ingrowth and prevents leaching of metal alloying ions to the surrounding tissue.
  • the elastic modulus of a porous structure is considerably lower(10-100) GPa than that of the bulk substrate, preferably in the same range as the elastic modulus for bone, being 10-30 GPa. Hence, the risk of stress shielding is reduced [5].
  • the porous Ti coatings are applied by means of EPD of a TiH 2 -powder suspension followed by vacuum sintering.
  • EPD is a versatile coating technique that allows the deposition of a wide variety of coating thicknesses. Together with the use of powders with different grain sizes, a broad range of different pore morphologies can be prepared. Moreover, the use of Ti3 ⁇ 4- powders and in particular the small size of the powders allows to reduce the sintering temperatures compared to pure Ti powders preserving the original microstructure and concomitant desired mechanical properties of the substrate.
  • the EPD technique also offers perspectives for upscaling to large and complex components. State-of-the-art coating techniques such as vacuum plasma spraying (VPS) have only a limited flexibility in controlling the actual pore size and porosity and can not be applied to small objects such as dental implants.
  • VPS vacuum plasma spraying
  • Titanium exists in two crystallographic forms. At room temperature, unalloyed (commercially pure) titanium has a hexagonal close-packed (hep) crystal structure referred to as alpha (a) phase. At circa 883 °C (1621 °F), this transforms to a body-centered cubic (bec) structure known as beta ( ⁇ ) phase. The temperature at which this transformation occurs is called the phase transition temperature or in short transition temperature.
  • phase transition temperature The temperature at which this transformation occurs is called the phase transition temperature or in short transition temperature.
  • the manipulation of these crystallographic variations through alloying additions and thermomechanical processing is the basis for the development of a wide range of titanium alloys. Based on the crystallographic phases present, titanium alloys can be classified as either a alloys, ⁇ alloys, or ⁇ + ⁇ alloys. However most of these alloys can be transformed from one form to another through thermal treatment.
  • phase transition temperature The temperature at which this transformation is, in accordance to the pure titanium transformation, is commonly called the phase transition temperature or transition temperature
  • transition temperature Other synonyms such as phase transformation temperature, transformation temperature or transus can be found in literature.
  • the exact transition temperature depends largely on the used alloying elements. For instance the ( ⁇ + ⁇ ) to ⁇ phase transformation occurs at a temperature range of 705 to 1040 °C for most titanium alloys. More specifically Ti-13Zr- 13Nb transforms at circa 728°C, Ti-6A1-4V at approximately 975 to 995°C, Ti-10V-4.5Fe- 1.5A1 at circa 1025°C, Ti-6A16V-2SN at 945 to 955 °C and Ti-7Al-4Mo at circa 1005 °C.
  • the present invention solves the problems of the related art by developing a novel process for producing metal object such as implants or complex shaped elements for instance of an implant for instance a screw with a continued thin macroporous or closed porosity coating.
  • Porous titanium coatings have been produced on Ti-6A1-4V substrates by electrophoretic deposition of TiH2 powder suspensions, followed by vacuum sintering at 850°C.
  • the use of titanium hydride resulted in lower sintering temperatures as compared to pure titanium powders and this allowed maintaining the ⁇ - ⁇ microstructure and mechanical properties of the substrate material.
  • the released hydrogen is removed directly from the system and will not act as pore forming substance.
  • Pure Ti coatings with thicknesses varying from 10 ⁇ to over 500 ⁇ , a porosity ranging from 37 to 52 % and a surface roughness from 1.6 to 4.9 ⁇ have been produced.
  • the process allows to control the thickness and porosity of the coating.
  • the invention is broadly drawn to a method or process for producing a thin macroporous or dense titanium coating on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) with a particles size between 0.5 - 50 ⁇ or with particle size distribution at a value in the range of around 45 ⁇ to around 4 ⁇ and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperatures which do not or minimally affect the micro structure of said substrate to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • Another aspect of the invention is the use of such object of present invention for implantation in or on the body of a mammal such as a human or a mammalian animal.
  • the porosity is controllable by modification of the diameter or the size of the starting particles.
  • the use of ⁇ 50 ⁇ starting particles is improves the electrophoretic deposition process and to limit the sintering temperature.
  • the fine starting powder allows to establish coating thicknesses below 100 ⁇ , although mm thick coatings can be realized as well.
  • fine starting powder allows low porosity coating up to a closed depending on the size of the particles of the starting powder.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition., whereby the low sintering temperature is below the transition temperature of the metal substrate or of the substrate comprising metal.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition., whereby the starting particles have a particles size between 0.1 - 50 ⁇ .
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition., whereby the starting particles have a particles size between 0.5 - 50 ⁇ .
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition., whereby the starting particles have a particle size distribution at a value in the range of around 45 ⁇ to around 4 ⁇ .
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • the substrate is such as Ti-alloy substrate and the sintering temperature is below the ⁇ - ⁇ transition temperature of the Ti-alloy substrates.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, HfH2, NdH2, NbH2 , MnH2 , MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • the starting particles comprise TiH2, NbH2 or ZrH2.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • the deposited metal grains comprise Ti, Nb or Zr.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the low sintering temperature is below the transition temperature of the metal substrate or of the substrate comprising metal, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles have a particles size between 0.1 - 50 ⁇ , whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low smtering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, HfH2, NdH2, NbH2 , MnH2 , MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, where
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise TiH2, NbH2 or ZrH2
  • the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise Ti, Nb or Zr, whereby the sintering is carried out at sintering temperatures of ⁇ 1200°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 995°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the low sintering temperature is below the transition temperature of the metal substrate or of the substrate comprising metal, whereby the sintering is carried out at sintering temperatures below 995°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles have a particles size between 0.1 - 50 ⁇ , whereby the sintering is carried out at sintering temperatures below 995°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 995°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 995°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 995°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, HfH2, NdH2, NbH2 , MnH2 , MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, where
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise TiH2, NbH2 or ZrH2 whereby the sintering is carried out at sintering temperatures below 995°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements, whereby the sintering is carried out at sintering temperatures below 995°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise Ti, Nb or Zr, whereby the sintering is carried out at sintering temperatures below 995°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 950°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the low sintering temperature is below the transition temperature of the metal substrate or of the substrate comprising metal, whereby the sintering is carried out at sintering temperatures below 950°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles have a particles size between 0.1 - 50 ⁇ , whereby the sintering is carried out at sintering temperatures below 950°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 950°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 950°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 950°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, HfH2, NdH2, NbH2 , MnH2 , MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, where
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise TiH2, NbH2 or ZrH2 whereby the sintering is carried out at sintering temperatures below 950°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements, whereby the sintering is carried out at sintering temperatures below 950°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise Ti, Nb or Zr, whereby the sintering is carried out at sintering temperatures below 950°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 850°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the low sintering temperature is below the transition temperature of the metal substrate or of the substrate comprising metal, whereby the sintering is carried out at sintering temperatures below 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles have a particles size between 0.1— 50 ⁇ , whereby the sintering is carried out at sintering temperatures below 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 850°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 850°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures below 850°C.
  • XHn metal hydride
  • X or Y metal
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, HfH2, NdH2, NbH2 , MnH2 , MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, where
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise TiH2, NbH2 or ZrH2 whereby the sintering is carried out at sintering temperatures below 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements, whereby the sintering is carried out at sintering temperatures below 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise Ti, Nb or Zr, whereby the sintering is carried out at sintering temperatures below 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the low sintering temperature is below the transition temperature of the metal substrate or of the substrate comprising metal, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles have a particles size between 0.1 - 50 ⁇ , whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, Hfffi, NdH2, NbH2, MnH2, MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf,Ta, Nd, Nb, Mn, Mo and Co, whereby the method comprises the steps of
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the starting particles comprise TiH2, NbH2 or ZrH2 whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition, whereby the deposited metal grains comprise Ti, Nb or Zr, whereby the sintering is carried out at sintering temperatures in the range of 450°C to 850°C.
  • a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • the starting particles comprise a metal hydride of the group consisting of TiH2 , ZrH2 , MgH2, TaH2, HfH2, NdH2, Nbl-I2 , MnH2 , MoH2 and CoH2, or mixed hydrides of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co.
  • the deposited metal grains comprise a metal of the group consisting of Ti, Zr, Mg, Hf ,Ta, Nd, Nb, Mn, Mo and Co, or alloys of these elements.
  • dehydrogenation is carried out at a temperature between 150 - 800°C.
  • dehydrogenation is carried out at a dehydrogenation at between 300 to 750 °C.
  • dehydrogenation is carried out at a dehydrogenation at between 400 to 600 °C.
  • dehydrogenation is carried out at a duration of 0.1 to 8 hours.
  • dehydrogenation is carried out at a at a duration of 0.5 to 4 hours.
  • dehydrogenation is carried out at a at a duration of 1 to 2 hours.
  • electrophoretic deposition is carried out at a voltage of 1 to 5 V/cm.
  • electrophoretic deposition is carried out at a voltage of 5 to 250 V/cm.
  • electrophoretic deposition is carried out at a voltage of 10 to 100 V/cm
  • electrophoretic deposition is carried out at a duration of 1 to 3600 s
  • the starting particles suspension comprises PEI (polyemyleneimine).
  • the coating comprises a dense layer with a thickness between 1- 100 ⁇ . 50.
  • the coating comprises interparticle necking metal grains with a thickness between 2- 20 ⁇ .
  • a coating comprises interparticle necking metal grains with a thickness between 3 - 15 ⁇
  • the coating comprises porous spaces with average pore size from 1-100 ⁇ .
  • the coating comprises multiple square shaped particles or angular shaped particles or whereby the porous coating is a continued mass of angular shaped forms surrounding porous spaces with average pore size from 1-100 ⁇ .
  • Titanium oxide preferably titanium dioxide
  • the Titanium oxide layer has been cationic doped or anion doped
  • Titanium dioxide layer has been transformed in (V-, Fe-, or Mn-) Ti0 2 or SrTi0 3 .
  • Titanium dioxide layer has been doped of C, N and S, as in Ti0 2 -xNx, and Ti02-xC x
  • Ti-6A1-4V grade 5, LIMA Lto
  • pure titanium dental implants grade 1, LIMA Lto
  • pure titanium acetabular cups of a hip implant (0 54 mm, grade 1, Helipro) were used as substrate materials. These were ultrasonically cleaned in ethanol, acetone and demineralised water.
  • TiH 2 powder grades were tested (Grade P, U and VM, Chemetall GmbH) and one powder grade of Zr3 ⁇ 4 (grade G, Chemetall GmbH).
  • a suspension of 4.8 wt% of TiH 2 powder was prepared in absolute ethanol (Analytical grade, Prolabo) by magnetically stirring for 10 minutes.
  • ZrH 2 a suspension of 4.8 wt % was prepared in absolute ethanol by magnetically stirring for 10 minutes, H3PO4 (0,1 M in absolute ethanol, Riedel-deHaen) was added.
  • polyethyleneimine PEL 50 wt% in water diluted with absolute ethanol to 0.01 g/ml, Sigma
  • the porous Ti or Zr coatings were produced by electrophoretic deposition of the TiH 2 or Zr3 ⁇ 4 suspension on the Ti-6A1-4V discs or Ti dental implant followed by vacuum sintering or sintering under Ar in a tube furnace.
  • the EPD process was carried out at ambient temperature, using a controlled voltage powder supply (MCN 1400-50, FUG).
  • MN 1400-50, FUG controlled voltage powder supply
  • the electrodes were placed vertically in the deposition cell at a distance of 3.5 cm and the Ti-6A1-4V disc was used as cathode at 90 V for a predefined duration.
  • a cylindrical counterelectrode with a diameter of 4 cm.
  • the dental implant was placed in the center of the counterelectrode, used as cathode at 45 V for a predefined duration.
  • a hemispherical counterelectrode with a diameter of 110 mm was used, the cup was placed in the center and used as a cathode at 90 V for a predefined duration.
  • the samples were sintered by resistive heating under vacuum (10 "6 mbar) or Ar. To avoid contamination from the tungsten heating element in the vacuum furnace, the samples were covered by an A1 2 0 3 crucible.
  • the samples were heated at 20°C/min to a temperature level at 650°C for 2 h, followed by a sintering stage at 850°C for 2 h. The samples were allowed to cool down passively in the furnace.
  • the samples were heated at 20°C/min to a temperature level at 650°C for 2 h, followed by a sintering stage at 950°C for 2 h.
  • the powder size of the powders was analyzed by scanning electron microscopy (SEM,
  • the surface of the coatings and the polished cross- sections were examined by SEM with associated energy dispersive spectroscopy (SEM-EDS, ED AX). Chemical analysis of the coating and interface was performed using electron probe microanalysis (EPMA, JXA-733 JEOL). Characterization of the porosity of the different coatings was done by image analysis (PPM200F). The thickness of the coatings before sintering and the roughness of the surfaces after sintering was characterized by white light interferometry (WLI, Wyko NT 3300 Optical Profiler). The wettability, i.e., the contact angle with demineralised water, of the coating surfaces was measured from sessile drop tests (CaM200, KSV).
  • the hydride powders were at first deposited on the Ti-6A1-4V or pure Ti substrates by electrophoretic deposition from an ethanol based powder suspension, dried and sintered in vacuum.
  • PEI was selected as a charging agent, due to its established use for pure Ti powder suspensions and emulsions [12].
  • 100 ⁇ of 0.1 M H 3 P0 4 is added too improve the adsorption of PEI to the powder surface.
  • Y represents the yield of deposition (g) and t the deposition time (s).
  • / is a factor that takes into account that not all powder brought to the electrode by electrophoresis is incorporated in the deposit (f ⁇ 1), ⁇ is the electrophoretic mobility (m 2 /V-s), E the electrical field strength (V/m), S the surface area of the electrode (m 2 ) and c the solids loading of the suspension (g/m 3 ).
  • the deposition yield 7 is proportional to the deposition thickness.
  • the deposit thickness should evolve linearly with time for a constant voltage, given that the solids loading of the suspension does not change significantly during deposition.
  • Figure 4 shows the thickness of the TiH 2 deposits, obtained by EPD at 90 V for various durations, before and after sintering for the three powder grades. It can be observed that at 90 V, a linear correlation exists between deposit thickness and deposition time. After deposition, the coatings are sintered to obtain sufficient interparticle necking for good mechanical strength. Because of the high reactivity of titanium with oxygen at elevated temperature, the deposits were sintered in vacuum. Prior to sintering, an additional thermal step is required to allow completion of the dehydrogenation. Based on the TGA results of the powders ( Figure 3 ), dehydrogenation was carried out for 2 h at 650°C for the TiH 2 . For the Zr3 ⁇ 4, dehydrogenation was carried out for 2 h at 650°C.
  • Representative cross-sectioned Ti coatings obtained by EPD of different TiH 2 powder grades at 90 V for 150 s followed by vacuum sintering are compared with a state-of-the-art VPS Ti coating in Figure 5.
  • the sintering treatment at 850°C (950 D C in the case of porous Zr) already resulted in substantial neck formation, indicating that lower sintering temperatures can be used in comparison to pure Ti deposits where a temperature of 1000 to 1100°C is necessary to establish neck formation [12].
  • a possible explanation for this reduced sintering temperature is that the resulting oc-Ti has a higher sinterability after the dehydrogenation step in vacuum due to the absence of an oxide layer at the particle surface.
  • FIG. 6 shows cross sections of a pure Ti dental implant with a porous Ti coating obtained by EPD of TiH 2 powder grade VM at 90 V for 150 s followed by vacuum sintering and figure 7 shows a topview and a cross section of a pure Ti acetabular cup a hip implant with a porous Ti coating obtained by EPD of TiHo powder grade VM at 90 V for 120 s followed by sintering under Ar in a tube furnace, this shows that electrophoretic deposition is a versatile coating technique that can easily be applied to complex components.
  • Figure 8 shows a cross section of a porous Zr coating on a Ti6A14V substrate.
  • porous-surfaced implants for orthopedic or dental implants
  • fixation efficacy of an implant strongly depends on the mechanical integrity and its bonding to the underlying substrate [15], but also and perhaps even more on the amount of bone ingrowth into the porous structure. This bone ingrowth can be affected by several parameters such as the porous structure (porosity, pore size and interconnectivity), the surface roughness and the surface chemistry of the coating.
  • Table 1 gives an overview of the measured coating adhesion strength together with the porosity, the average surface roughness and the water contact angle of the coatings obtained with the three different Ti3 ⁇ 4 powders (after EPD at 90 V during 150 s followed by vacuum sintering) and a state-of-the-art VPS Ti coating.
  • Figure 10 shows the differential intrusion volume during mercury porosimetry as a function of the pore diameter for the same coatings.
  • Adhesion testing confirmed the good sinterability of the coatings at 850°C, as summarized in Table 1. However the reported values do not univocally represent the bond strengths of the coatings. Two modes of rupture were observed: coating failure (indicated by C in Table 1 and premature loosening between adhesive and coating (indicated by A in Table 1). Due to the lower roughness of the coatings obtained from TiH 2 powder grades VM and U, the adhesive between coating and counterpart failed prior to coating failure. Table 1 however shows that all coatings had a bond strength that was higher than for the state-of-the-art vacuum plasma sprayed Ti coating.
  • the water contact angle of the TiH 2 based coatings varied between 85° and 110° independent of the particle size of the starting powders and was found to be less hydrophobic than VPS Ti coating. This improved wetting can enhance the degree of osseointegration, since it promotes the molecular adsorption which is crucial for the deposition of a conditioning film on the implant surface [18].
  • Table 1 Adhesion strength, porosity, average roughness (Ra) and contact angle of three Ti coatings obtained from different Ti3 ⁇ 4 powders after EPD at 90 V during 150 s followed by vacuum sintering in comparison to a state-of-the-art VPS Ti coating. Two modes of failure were observed during adhesion testing: coating failure (C) and premature loosening between adhesive and coating (A). Reported values are an average of five samples.
  • Implant materials are under no condition allowed to be toxic, therefore cytotoxicity tests were performed on the porous Ti coatings. Cell viability was higher than for the negative (non- cytotoxic) control, allowing to conclude that the porous Ti coatings are not cytotoxic nor cytostatic (see Figure ).
  • TO treatment can be used to create a Titanium oxide , preferably titanium dioxide, surface on Ti or Ti alloy coating. For instance by heat treating a Ti alloy to several hundred degrees Celsius in either air or a binary gas mixture to produces a micrometer-thick Titanium oxide , preferably titanium dioxide, surface layer and an underlying oxygen enriched layer. This can for instance under a flow of air or oxygen under an hydrothermal treatment for instance at a temperature range of 400° C to 1100° C. The temperature and treatment duration can be used to control the type and depth of the oxide layer [19].
  • Another suitable oxidation methods is anodization (anodizing the Ti or Ti alloy layers). Control over the applied voltage and annodisation medium can be used to control the thickness and type of the obtained titanium oxide, preferably titanium dioxide, layer.
  • Another suitable oxidation method is hydrothermal treatment. In this technique titanium or titanium alloys are treated with superheated steam in order to form a controUedoxidation layer. The process parameters such as pressure, temperature and treatment time are used to control the thickness and type of formed titanium oxide, preferably titanium dioxide,.
  • Another suitable oxidation method is microarc oxidation. Localized electric discharges oxidize the surface of titanium and titanium alloys placed in a specific medium.
  • titanium oxide preferably titanium dioxide
  • active ingredients in the medium such as calcium, phosphorus or potassium
  • oxides of a different chemical composition than the oxidized metal can be obtained.
  • the present invention demonstrated a new powder metallurgical processing route for porous Ti coatings on metallic substrates.
  • the porous coatings of pure Ti were processed on Ti-6A1- 4V substrates by electrophoretic deposition of Ti3 ⁇ 4 powder suspensions followed by sintering in vacuum.
  • the use of TiH 2 powders resulted in a higher sinterability as compared to pure Ti systems, which allowed the use of sintering temperatures below the ⁇ - ⁇ transition temperature (995 °C) of the Ti-6A1-4V substrates. Hence the superior mechanical properties of the substrate material can be maintained.
  • the method and process of present can be used for surface reshaping of an object, for instance by providing a thin layer of Ti, Co or Cr on a Ti-6A1-4V or a Ti, Co or Cr substrate.
  • the advantage is that cheap metal substrates can be formed by the surface reshaping of present invention into substrates with the same properties as for instance the high value substrates such as Ti, Co or Cr.
  • a particular advantage of the present invention is that such layer can be add to a substrate without essentially affecting the microstructure of the substrate.
  • High purity coatings are obtainable by the method or process of present invention.
  • the small starting particles are of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is titanium
  • pure titanium coatings are obtainable which are of the ASTM GRADE 4 Unalloyed titanium, the ASTM GRADE 3 Unalloyed titanium , the ASTM GRADE 2 Unalloyed titanium or even of the ASTM GRADE 1 Unalloyed titanium .
  • the high pure titanium coatings obtainable by the process of present invention have an oxygen content 0.40 wt%, preferably below 0.35 wt%, more preferably below 0.25 wt%and most preferably below 0.18 wt%. Preferably they are without measurable hydrogen content.
  • Present invention concerns a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • the low sintering temperature is preferably below the transition temperature of the metal substrate or of the substrate comprising metal.
  • the starting particles can have a particles size between 0.1 - 50 ⁇ and preferably between 0.5 - 50 ⁇ .
  • the starting particles can have a particle size distribution at a value in the range of around 45 ⁇ to around 4 ⁇ .
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • the pure Ti coating is of an ASTM GRADE 4 Unalloyed titanium, preferably of an ASTM GRADE 3 Unalloyed titanium, more preferably of an ASTM GRADE 2 Unalloyed titanium and most preferably of an ASTM GRADE 1 Unalloyed titanium
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • the pure Ti coating is of an ASTM GRADE 4 Unalloyed titanium, preferably of an ASTM GRADE 3 Unalloyed titanium, more preferably of an ASTM GRADE 2 Unalloyed titanium and most preferably of an ASTM GRADE 1 Unalloyed titanium
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of
  • the pure Ti coating is of an ASTM GRADE 4 Unalloyed titanium, preferably of an ASTM GRADE 3 Unalloyed titanium, more preferably of an ASTM GRADE 2 Unalloyed titanium and most preferably of an ASTM GRADE 1 Unalloyed titanium
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • the pure Ti coating is of an ASTM GRADE 4 Unalloyed titanium, preferably of an ASTM GRADE 3 Unalloyed titanium, more preferably of an ASTM GRADE 2 Unalloyed titanium and most preferably of an ASTM GRADE 1 Unalloyed titanium
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a i surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface
  • this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a.5 surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal0 hydride based on the solid mass whereby X is Co b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Co b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a nietal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure b coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition.
  • XHn metal hydride
  • X or Y metal
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for
  • Present invention also concerns a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • X or Y metal
  • the low sintering temperature is preferably below the transition temperature of the metal substrate or of the substrate comprising metal.
  • the starting particles can have a particles size between 0.1 - 50 ⁇ and preferably between 0.5— 50 ⁇ .
  • the starting particles can have a particle size distribution at a value in the range of around 45 ⁇ to around 4 ⁇ .
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low smtering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • the surface of the pure Ti coating
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating
  • An embodiment of present invention is a coated object whereby coating is a pure Ti coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Ti b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • the surface of the pure Ti coating has been oxidized.
  • the Titanium dioxide layer in a particular embodiment has been cationic doped or anion doped.
  • the surface or upper layer of the titanium dioxide layer has can be transformed in (V-, Fe-, or Mn-) Ti0 2 or SrTi0 3 .
  • the Titanium dioxide layer in a particular embodiment has been doped of C, N and S, as in Ti0 2 -xNx, Ti02-xCx and Ti02-xSx.
  • Components having oxidation-reduction ability such as Pt, Pd, Rh, Ru, Os, Ir, Au and Fe, can be used to dope the Titanium dioxide.
  • Hitherto known methods are adoptable. For example, an aqueous solution of a metal component-soluble salt is added to the titanium oxide surface and is hydrolyzed to precipitate the metal.
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Zr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Zr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a contmued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Co b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • the surface of the pure Co coating has
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Co b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • the surface of the pure Co coating has been oxid
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Co b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Co coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Co b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Cr coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Cr b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • XHn metal hydride
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • the surface of the pure Nb coating has
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating with thicknesses between 2 ⁇ to 1000 ⁇ ,, a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • An embodiment of present invention is a coated object whereby coating is a pure Nb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Nb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and d) oxidizing the top layer of the metallic coating.
  • the surface of the pure Nb coating has
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating coating with thicknesses between 2 ⁇ to 200 ⁇ , a closed porosity ranging from 0 -5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 200 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a closed porosity ranging from 0 - 5 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) s
  • An embodiment of present invention is a coated object whereby coating is a pure Mg, Ta, Hf, Nd, Mn or Mb coating with thicknesses between 2 ⁇ to 1000 ⁇ , a porosity ranging from 25 to 75 % and a surface roughness from 1.2 to 5.5 ⁇ and this object is obtainable method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass whereby X is Mg, Ta, Hf, Nd, Mn or Mb b) dehydrogenation of the deposited layer and c) sintering
  • XHn metal hydride
  • X or Y metal
  • Present invention concerns a method or process for producing a metallic coating that is closed or porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and e) disposing nanospecies structures on said coating.
  • XHn metal hydride
  • X or Y metal
  • the nanospecies can be selected from a semiconductor quantum dot, a metal nanoparticle, and a magnetic nanoparticle.
  • the metal nanoparticle is selected from at least one of the following: gold nanoparticles, platinum nanoparticles, silver nanoparticles, and copper nanoparticles.
  • the nanospecies structures can coated with the chemical compound.
  • the quantum dot can comprises a core and a cap and the quantum dot can be s selected from the group consisting of IIB-VIB semiconductors, IIIB-VB semiconductors, and IVB ⁇ IVB semiconductors.
  • Thee core of the quantum dot is CdS or CdSe.
  • cap can be selected from the group consisting of IIB-VIB semiconductors of high band gap.
  • the cap can be selected from ZnS and CdS.
  • the nanospecies can also selected from a semiconductor quantum dot, a metal nanoparticle, and a magnetic nanoparticle and the metal nanoparticle can be selected from at least one of the following: gold nanoparticles, platinum nanoparticles, silver nanoparticles, and copper nanoparticles.
  • a particular embodiment is a method or process for producing a metallic coating that is porous on a metal substrate or a substrate comprising metal, whereby the method comprises the steps of a) electrophoretic deposition on the metal substrate or a substrate comprising metal from a suspension of small starting particles of a metal hydride (XHn) and of a metal (X or Y) composed of 11 - 100 wt% metal hydride based on the solid mass b) dehydrogenation of the deposited layer c) sintering of said deposit at a low sintering temperature to form a continued coating on zones of the substrate that are exposed for deposition and e) disposing nanospecies structures within the pores of a porous.
  • XHn metal hydride
  • X or Y metal
  • Structures having one or more classes and/or types of nanospecies can be disposed on the surface of the coating or can even be disposed within the pores of a porous coatings produced by the method or process of present invention.
  • Methods of fabricating these s nanospecies structures, and methods of disposing them in the pores are available for instancen by interaction of a characteristic of the nanospecies with a characteristic of the porous coating which cause the nanospecies to interact with the porous coating and become embedded within the pores of the porous material.
  • the methods of producing these structures allow for precise quantitative control of the amount of nanospecies disposed in the pores of the porous material.
  • the structures can be modified so that the structures interact with certain target molecules, which allow detection of the target molecules after exposure to a first energy.
  • these structures can be used as "molecular codes" to identify target molecules.
  • the structures can be used in many fields of endeavor such as, but not limited to, biosensing, biolabeling, high- speed screening, gene expression studies, protein studies, medical diagnostics, diagnostic libraries, combinatorial libraries, microfluidic systems, optoelectronics, high-density memory, fluorescent ink (counterfeit), fluorescent cosmetics, flow cytometry, wavelength-resolved spectroscopy, multispectral imaging, fluorescent security marking, catalysis, and human identification.
  • the nanospecies can be selected from a semiconductor quantum dot, a metal nanoparticle, and a magnetic nanoparticle.
  • the metal nanoparticle is selected from at least one of the following: gold nanoparticles, platinum nanoparticles, silver nanoparticles, and copper nanoparticles.
  • the nanospecies structures can coated with the chemical compound.
  • R is a saturated linear C4 to CI 8 hydrocarbon.
  • the quantum dot can comprises a core and a cap and the quantum dot can be s selected from the group consisting of IIB-VIB semiconductors, IIIB-VB semiconductors, and 1VB--IVB semiconductors.
  • Thee core of the quantum dot is CdS or CdSe.
  • cap can be selected from the group consisting of IIB-VIB semiconductors of high band gap. Or the cap can be selected from ZnS and CdS.
  • the nanospecies can also selected from a semiconductor quantum dot, a metal nanoparticle, and a magnetic nanoparticle and the metal nanoparticle can be selected from at least one of the following: gold nanoparticles, platinum nanoparticles, silver nanoparticles, and copper nanoparticles.
  • silica material, ceramic, zeolite comprising nanospecies are disposed on the coating of present invention.
  • the nanospecies can be selected from a semiconductor quantum dot, a metal nanoparticle, and a magnetic nanoparticle.
  • the metal nanoparticle is selected from at least one of the following: gold nanoparticles, platinum nanoparticles, silver nanoparticles, and copper nanoparticles.
  • the nanospecies structures can coated with the chemical compound.
  • the quantum dot can comprises a core and a cap and the quantum dot can be s selected from the group consisting of IIB-VIB semiconductors, IIIB-VB semiconductors, and rVB ⁇ IVB semiconductors.
  • Thee core of the quantum dot is CdS or CdSe.
  • cap can be selected from the group consisting of IIB-VIB semiconductors of high band gap. Or the cap can be selected from ZnS and CdS.
  • the nanospecies can also selected from a semiconductor quantum dot, a metal nanoparticle, and a magnetic nanoparticle and the metal nanoparticle can be selected from at least one of the following: gold nanoparticles, platinum nanoparticles, silver nanoparticles, and copper nanoparticles. Other specifics on these methods of present invention have been described in the claims of present invention which are hereby as well incorporated in the description.
  • the present invention also concerns the objects that are obtainable by the method or process of present invention. Coated objects can be achieved with specific features that have been described in the claims of present application which claims are hereby also incorporated in the description.
  • Figure 1 provides SEM micrographs of the starting powders: (a) TiH 2 grade P with a broad particle distribution around 45 ⁇ , (b) TiH 2 grade U around 25 ⁇ , (c) TiH 2 grade VM around 10 ⁇ and (d) ZrH 2 grade G around 15 ⁇ .
  • Figure 2 provides a XRD spectrum of (a) porous Ti coating obtained after EPD and sintering for 2 h at 850°C of a TiH 2 coating and (b) a TiH 2 powder (grade VM) before heat treatment.
  • Figure 3 displays a simultaneous TGA/DSC plot at a constant heating rate of 10°C/min in Ar for a Ti3 ⁇ 4 powder (grade P).
  • the two endothermic peaks indicate a two-step decomposition of TiH 2 over TiH x to a-Ti.
  • Figure 4 is a graphic display of the thickness of the TiH 2 deposits obtained by electrophoretic deposition at 90 V for different deposition times, before and after sintering for (a) grade P, (b) grade U and (c) grade VM.
  • Figure 5 provides SEM micrographs of a cross section of a Ti coating obtained by EPD at 90 V during 150 s and sintering of (a) TiH 2 grade P and (b) grade U and (c) grade VM and a state-of-the-art VPS Ti coating.
  • Figure 6 provides SEM micrograph of a cross section of a Ti coating obtained by EPD at 90 V during 150 s and sintering of Ti3 ⁇ 4 grade VM on a pure titanium dental implant.
  • Figure 7 (a) provides a topview and figure 7 (b) provides SEM micrograph of a cross section of a Ti coating obtained by EPD at 90 V during 120 s and sintering of Ti3 ⁇ 4 grade VM on a pure titanium acetabular cup of a hip implant.
  • Figure 8 provides SEM micrograph of a cross section of a Zr coating obtained by EPD at 90 V during 150 s and sintering of ZrH 2 on a Ti6A14V substrate.
  • Figure 9 provides SEM micrograph of a Ti-6A1-4V substrate after a heat treatment under vacuum (a) above and (b) below the ⁇ - ⁇ transition temperature (995°C).
  • Figure 10 is a display of differential intrusion volume as a function of the pore diameter, as measured by mercury porosimetry, for three Ti coatings obtained from different Ti3 ⁇ 4 powders after EPD at 90 V during 150 s followed by vacuum sintering in comparison to a state-of-the-art VPS Ti coating.
  • Figure 11 orders photos of negative control, positive control and porous Ti on Ti6Al Results of the cytotoxicity testing on the porous Ti coatings (grade P).
  • a negative (non-cytotoxic) and positive (cytotoxic) control were run in parallel with the porous Ti coating sample and demonstrates 100% cell viability for the engative control, 48% cell viability for the positive control and 110% viability for the porous Ti on Ti6A14V.
  • Figure 12 displays a TiAlV disc with closed porosity pure Ti coating
  • Figure 13 Iconographies of human bone marrow cells and human endothelial cells on porous Ti coatings (grade P) in comparison with a negative (not cytotoxic) control sample.

Abstract

L'invention concerne des enrobages en titane produits sur des substrats Ti-6A1-4V par dépôt par éléetrophorèse de suspensions de poudre de TiH2, suivi d'un frittage sous vide à 850°C. L'utilisation d'un hybride du titane permet d'obtenir des températures de frittage plus basses par rapport aux poudres de titane ce qui permet de conserver la microstructure α-β et les propriétés mécaniques du matériau de substrat. Ce mode de réalisation a permis d'obtenir des enrobages de Ti pur dont les épaisseurs varient de 10 μm à plus de 500 μm, une porosité de 37 à 52% et une rugosité de la surface de 1,6 à 4,9 μm. Le procédé permet de réguler l'épaisseur et la porosité de l'enrobage. Ce procédé permet d'obtenir des enrobages métalliques avec des métaux du groupe comprenant Ti, Zr, Mg5 Hf, Ta, Nd, Nb, Mn, et Mo ayant des épaisseurs qui varient de 1 μm à 90 μm, de 2 μm à 90 μm ou de 2 μm à 1000 μm et une porosité de 0 à 70%, de préférence de 2 à 70%, et plus avantageusement, de 45 à 70%. Il est également possible de produire des enrobages qui présentent une porosité de 0 à 5% seulement. Des d'essais d'adhésion des enrobages ont montré une résistance d'adhésion à l'étirement supérieure à 22 MPa.
PCT/BE2010/000062 2009-09-04 2010-09-03 Enrobages métalliques sur des substrats métalliques WO2011026201A2 (fr)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
GB0915508.6 2009-09-04
GB0915508A GB0915508D0 (en) 2009-09-04 2009-09-04 Production of porous titanium coatings on metallic subtrates
GB0915577.1 2009-09-07
GB0915577A GB0915577D0 (en) 2009-09-07 2009-09-07 Metallic coatings on metallic substrates
GB0915560A GB0915560D0 (en) 2009-09-07 2009-09-07 Metallic coatings on metallic substrates
GB0915560.7 2009-09-07
GB1007563.8 2010-05-06
GBGB1007563.8A GB201007563D0 (en) 2010-05-06 2010-05-06 Metallic coatings on metallic substrates

Publications (2)

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US11851327B2 (en) 2011-12-15 2023-12-26 USW Commercial Services Ltd. Metal hydrides and their use in hydrogen storage applications
CN103199290A (zh) * 2013-03-14 2013-07-10 江南大学 一种太阳光强化产电的沉积型微生物燃料电池
US20140370406A1 (en) * 2013-06-14 2014-12-18 University Of South Wales Commercial Services Ltd. Synthesis and hydrogen storage properties of novel mangenese hydrides
US9960441B2 (en) * 2013-06-14 2018-05-01 University Of South Wales Commercial Services Ltd. Synthesis and hydrogen storage properties of novel manganese hydrides
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RU2567417C1 (ru) * 2014-05-19 2015-11-10 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Саратовский государственный технический университет имени Гагарина Ю.А." (СГТУ имени Гагарина Ю.А.) Способ нанесения покрытий на обработанные поверхности изделий из титана и его сплавов
CN107081424A (zh) * 2017-05-02 2017-08-22 常州大学 一种钛合金粉末注射成型专用料及其制备方法
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