WO2011008055A2 - Electrical conductor and a production method therefor - Google Patents

Abstract

Provided are an electrical conductor and a production method therefor; the electrical conductor comprising a transparent substrate and an electro­conductive pattern provided on at least one surface of the transparent substrate, and the electroconductive pattern being of a type such that, for at least 30% of the entire surface area of the transparent substrate, when a straight line is drawn intersecting the electroconductive pattern, the ratio of the standard deviation to the mean value of the distances between adjacent points of intersection between the straight line and the electroconductive pattern (the distance distribution ratio) is at least 2%. Also, provided are an electrical conductor and a production method therefor; the electrical conductor comprising a transparent substrate and an electroconductive pattern provided on at least one surface of the transparent substrate, and the electroconductive pattern being of a type such that at least 30% of the entire surface area of the transparent substrate is accounted for by continuously distributed closed motifs, and the ratio of the standard deviation to the mean value of the surface areas of the closed motifs (the surface area distribution ratio) is at least 2%.

Description

Conductor and manufacturing method thereof

The present invention relates to a conductor and a method of manufacturing the same. This application is filed with the Korean Patent Application Nos. 10-2009-0065103 and 10-2009-0065106, which were filed with the Korean Intellectual Property Office on July 16, 2009, and the Korean Patent Application No. which was filed with the Korean Patent Office on July 16, 2010. Claim the benefit of the filing date of 10-2010-0069157, the entire contents of which are incorporated herein.

In general, a display apparatus refers to a TV or a computer monitor, and includes a display element for forming an image and a case for supporting the display element.

Examples of the display device include a plasma display panel (PDP), a liquid crystal display (LCD), an electrophoretic display, and a cathode-ray tube (CRT). The display device may be provided with an RGB pixel pattern and an additional optical filter for implementing an image.

The optical filter includes an anti-reflection film that prevents external light incident from the outside to be reflected back to the outside, a near-infrared shielding film that shields near-infrared rays generated from a display element to prevent malfunction of electronic devices such as a remote control, and color control dyes. Color correction film for enhancing color purity by adjusting the color tone, and at least one of the electromagnetic shielding film for shielding the electromagnetic wave generated from the display element when the display device is driven. Here, the electromagnetic shielding film includes a metal mesh pattern formed on the transparent substrate and the substrate.

On the other hand, with respect to the "display" device, as the spread of IPTV is accelerated, there is an increasing need for a touch function in which a human hand directly inputs the device without a separate input device such as a remote controller. In addition, a multi-touch function capable of writing as well as a specific point recognition is required.

The touch panel having the above function may be classified as follows according to a signal detection method.

That is, a resistive type that senses a position pressed by pressure in a state in which a DC voltage is applied through a change in current or a voltage value, and a capacitance coupling in which an AC voltage is applied There is a capacitive type, and an electromagnetic type for sensing a selected position as a change in voltage in the state of applying a magnetic field.

Among these, the most common resistive and capacitive touch panels use a transparent conductive film such as an ITO film to recognize whether the touch is made by electrical contact or change in capacitance. However, since the above-described transparent conductive film has a high resistance of 100 ohm / square or more, the sensitivity decreases at the time of large size, and the larger the screen size, the larger the price of ITO film, which is not easy to commercialize. In order to overcome this, an attempt has been made to implement an enlargement by using a metal pattern with high conductivity.

As described above, if the display device contains an electromagnetic shielding film or touch panel containing a metal pattern, they may interfere with the pixel pattern, electrode pattern or other optical film structure of the display, causing problems. It is poor. Here, moire refers to an interference fringe formed when two or more regular patterns overlap.

For example, in the plasma display panel PDP, the moiré phenomenon may occur because the pixel pattern of the plasma display panel PDP and the metal mesh pattern for shielding electromagnetic waves of the optical filter coexist. Therefore, in general, when the specification of the plasma display panel (PDP) is determined, an attempt is made to solve the moiré phenomenon through the design of the metal mesh pattern of the optical filter.

As such, the line width, pitch, and angle of the metal shielding mesh pattern for electromagnetic wave shielding are controlled in order to eliminate moiré. However, there are inconveniences in that it is necessary to cope with different patterns according to the display size and the pixel implementation method.

In particular, recently developed plasma display panels have finer pixel patterns in order to achieve high resolution, which increases the possibility of moiré generation. Therefore, the moire improvement is limited only by adjusting the line width, pitch, and angle of the existing pattern.

The present invention is to solve the problems of the prior art as described above, the present invention provides a conductor and a method of manufacturing the same, including a pattern that can not only prevent the moiré phenomenon, but also has excellent conductivity without covering the field of view. It aims to provide.

One embodiment of the present invention

A conductor comprising a transparent substrate and an electrically conductive pattern provided on at least one surface of the transparent substrate, wherein at least 30% of the total area of the transparent substrate is a straight line intersecting the electrically conductive pattern. A conductor characterized in that it has an electroconductive pattern having a ratio of the standard deviation (distance distribution ratio) to the average value of the distances between adjacent intersections of the electroconductive pattern is 2% or more. It is preferable that the straight line crossing the electrically conductive pattern is a line having a smallest deviation of the closest distance between the intersection points with the electrically conductive pattern. Or a line in a direction perpendicular to any one tangent of the electrically conductive pattern.

Another embodiment of the present invention is a method of manufacturing a conductor comprising the step of forming an electrically conductive pattern on a transparent substrate, wherein the electrically conductive conductive pattern, at least 30% of the total area of the transparent substrate, the electrical conductivity When a straight line intersecting the pattern is drawn, the ratio of the standard deviation (distance distribution ratio) to the average value of the distance between the straight line and the adjacent intersection points of the electroconductive pattern is formed in a pattern of 2% or more. It provides a manufacturing method. The electrically conductive conductive pattern can be formed using a printing method, a photolithography method, a photography method, a method using a mask, a sputtering method, or an ink jet method.

Another embodiment of the invention

A conductive material comprising a transparent substrate and an electrically conductive pattern provided on at least one surface of the transparent substrate, wherein at least 30% of the total area of the transparent substrate is formed of continuous closed figures, and the areas of the closed figures. A conductor having an electric conductivity pattern having a ratio of the standard deviation (area distribution ratio) to an average value of 2% or more is provided.

Another embodiment of the present invention is a method of manufacturing a conductor comprising the step of forming an electrically conductive pattern on a transparent substrate, the electrical conductive pattern is distributed over 30% of the total area of the transparent substrate, the distribution is continuous It provides a method for manufacturing a conductor comprising a plurality of closed figures, the ratio of the standard deviation (area distribution ratio) to the average value of the area of the closed figures in a pattern of 2% or more. The electrically conductive conductive pattern can be formed using a printing method, a photolithography method, a photography method, a method using a mask, a sputtering method, or an ink jet method.

Another embodiment of the present invention provides an electromagnetic wave shielding film, a touch panel, a display, and an organic light emitting device (OLED) light containing the conductor.

The conductor according to the present invention not only hides the field of view but also has excellent conductivity, and can also prevent moiré phenomenon. In addition, the conductor according to the present invention can be formed by various methods such as printing, photolithography, photography, masking, sputtering, or inkjet, after the desired pattern is predetermined. It is also cheap.

1 and 2 show a state in which an arbitrary straight line is drawn on the electroconductive pattern of the conductor according to the exemplary embodiment of the present invention, respectively.

Figure 3 illustrates the electrical conductivity pattern of the conductor according to an embodiment of the present invention, respectively.

4 is a schematic diagram illustrating an offset printing process.

5 illustrates pattern formation using a Voronoi diagram generator according to one embodiment of the invention.

Figure 6 illustrates the electroconductive pattern of the conductor according to the present invention.

7 to 9 illustrate the electrical conductivity pattern of the conductor according to the present invention.

10 illustrates pattern formation using a Delaunay pattern generator according to one embodiment of the present invention.

11 to 13 illustrate the electrical conductivity pattern of the conductor according to the present invention.

14 illustrates the placement of a Delaunay pattern generator in accordance with one embodiment of the present invention.

15 and 16 show the electroconductive pattern of the conductor according to the prior art.

Figure 17 illustrates the result of measuring the sheet resistance value for each position of the conductor using the electrically conductive pattern according to an embodiment of the present invention.

18 illustrates a result of measuring sheet resistance values of respective conductors using an electrically conductive pattern according to an exemplary embodiment of the present invention.

19 is an example of comparing the occurrence of Moire by angle after overlapping a conductor including an electrically conductive pattern according to an exemplary embodiment of the present invention and a conventional PDP filter 5 cm on a 42-inch PDP, respectively.

20 is an example of comparing the occurrence of Moire by angle after overlapping a conductor including an electrically conductive pattern according to an exemplary embodiment of the present invention and a conventional PDP filter 5 cm on a 42-inch PDP, respectively.

FIG. 21 illustrates the results of measuring an EMI shielding function in a frequency region of 30 to 1000 MHz when a conductor including an electrically conductive pattern according to an exemplary embodiment of the present invention is used as an electromagnetic shielding (EMI) filter of a PDP. It is.

22 illustrates a structure of a touch screen including an electrically conductive pattern according to an exemplary embodiment of the present invention.

FIG. 23 illustrates a result of performing a linearity evaluation indicating the accuracy of a touch screen by fabricating a 40-inch touch screen having the structure of FIG. 22 and comparing the result with that of a touch screen having a conventional transparent conductive substrate (ITO). It is illustrated.

24 shows photographs before and after blackening of the conductors prepared in Examples.

25 and 26 illustrate a structure of an auxiliary electrode for lighting an organic light emitting device according to an exemplary embodiment of the present invention.

27 illustrates a moiré phenomenon according to line width and pitch.

Hereinafter, the present invention will be described in more detail.

The conductor according to the present invention includes a transparent substrate and an electrically conductive pattern provided on at least one surface of the transparent substrate, wherein at least 30% of the total area of the transparent substrate has drawn a straight line intersecting the electrically conductive pattern. Wherein the ratio (distance distribution ratio) of the standard deviation with respect to the average value of the distance between the straight line and the adjacent intersection points of the electroconductive pattern has an electroconductive conductive pattern of 2% or more.

Alternatively, the conductor according to the present invention comprises a transparent substrate, and an electrical conductor including a conductive pattern provided on at least one surface of the transparent substrate, wherein at least 30% of the total area of the transparent substrate is a continuous closed figure. And a ratio (area distribution ratio) of the standard deviation with respect to the average value of the areas of the closed figures having an electric conductivity pattern.

When forming the transparent front conductive layer as in the prior art there is a problem that the resistance is too high. In addition, the electrical conductivity pattern formed in a regular pattern of one type, such as a grid method or a linear method, may be used for a display having a regular internal structure, for example, a pixel structure, or an optical film having a regular pattern structure. In the case of including the electrode structures in a display including the electrode structures, there is a problem that moiré phenomenon occurs due to relative interference between the patterns due to light sources adjacent to these pattern structures. When this moiré phenomenon occurs, the visual perception (visibility) is poor. Accordingly, in order to solve this problem, the present invention focuses on the fact that the regularity of the pattern causes such moiré, thereby preventing the moiré from occurring by making the pattern irregular.

In the present invention, when the straight line intersecting the electrically conductive pattern, 30% or more, preferably 70% or more, more preferably 90% or more of the total area of the transparent substrate as described above, when the straight line and the electrically conductive By having an electrically conductive pattern with a ratio of the standard deviation (distance distribution ratio) of 2% or more to the average value of the distances between adjacent intersection points of the pattern, it is possible to obtain a conductor that satisfies the excellent electrical conductivity and optical characteristics simultaneously to prevent moiré phenomena. You can provide it.

In the present invention, it is preferable that the straight line intersecting the electrically conductive pattern is the line having the smallest standard deviation of the distance between adjacent intersections with the electrically conductive pattern. Alternatively, the straight line intersecting the electrically conductive pattern may be a straight line extending in a direction perpendicular to the tangent of any one of the electrically conductive patterns.

In the conductor according to the present invention, it is preferable that a straight line intersecting the electrically conductive pattern has 80 or more intersection points with the electrically conductive pattern.

It is preferable that the ratio (distance distribution ratio) of the standard deviation with respect to the average value of the distance between the straight line which intersects the said electrically conductive pattern and the adjacent intersections of the electrically conductive pattern is 2% or more, It is more preferable that it is 10% or more, 20 Even more preferred is more than%.

The pattern having a ratio of the standard deviation (distance distribution ratio) of 2% or more to the average value of the distance between the straight line intersecting the electrically conductive pattern and the adjacent intersections of the electrically conductive pattern is 30% or more with respect to the total area of the transparent substrate. desirable. At least a part of the surface of the transparent substrate provided with the electrically conductive pattern may be provided in another type of electrically conductive pattern.

In the conductor according to the invention, it is preferred that there are at least 100 such closed figures.

The ratio of the standard deviation (area distribution ratio) to the average value of the areas of the closed figures is preferably 2% or more, more preferably 10% or more, and even more preferably 20% or more.

The pattern consisting of closed figures having a ratio of the standard deviation (area distribution ratio) to the average value of the area of 2% or more is preferably 30% or more of the total area of the transparent substrate. At least a part of the surface of the transparent substrate provided with the electrically conductive pattern may be provided in another type of electrically conductive pattern.

The conductor according to the invention is arranged at a distance of 5 cm or less from a device having a regular pattern, such as a pixel pattern or color filter pattern, for example, a display, and then at a line perpendicular to the transparent substrate and at an angle between 0 and 80 degrees. When the device is observed, the interference pattern due to the moire phenomenon is not observed.

In addition, after fabricating a 42-inch PDP using the conductor according to the present invention as an electromagnetic shielding (EMI) film, in order to measure the electromagnetic shielding (EMI) capability level, a frequency range of 30MHz to 1000MHz at a distance of 3m As a result of the measurement, it showed that the EMI shielding ability of Class B level or more. At this time, when the PDP was observed at a line perpendicular to the transparent substrate and at an angle between 0 and 80 degrees, no interference pattern caused by the moire phenomenon was observed.

In addition, after fabricating a 40-inch projected capacitance type touch screen using a conductor according to the present invention, a linearity evaluation was performed to evaluate the accuracy of the touch screen. A touch screen with higher precision than an ITO based touch screen could be realized. At this time, when the touch screen is observed at a line perpendicular to the touch screen and at an angle between 0 degrees and 80 degrees, the interference pattern due to the moire phenomenon is not observed.

On the other hand, when the patterns are completely irregular, there may be a difference between a small place and a dense place in the distribution of lines. The distribution of these lines, however thin, may cause visible visual cognitive problems and may not meet the necessary requirements for the intended use of the conductor itself. For example, when used for electromagnetic shielding, if the pattern is completely irregular and the spacing of some patterns becomes too wide, defects may occur because electromagnetic waves can pass through the widened pattern. In addition, in the case of use for the touch panel, when roughness of the pattern occurs, there is a possibility that the touched position may be incorrectly formed due to irregular resistance or capacitance. In order to solve such a problem, in the present invention, regularity and irregularity can be appropriately harmonized when forming an electrically conductive pattern. For example, the basic unit may be defined so that the electrical conductive pattern does not stand out or the local conductivity occurs, and the electrical conductive pattern may be irregularly formed within the basic unit. By using this method, the distribution of the electroconductivity pattern is not concentrated at any one point, thereby compensating the visuality and satisfying the specification suitable for the purpose of the product.

As described above, it is preferable that the aperture ratio of the pattern is constant in the unit area for the sake of uniform uniform electrical conductivity and visibility of the conductor. The conductor preferably has a transmittance deviation of 5% or less for any circle having a diameter of 20 cm. In this case, the conductor can prevent the local conductivity.

In the present invention, the electrically conductive pattern may be formed by straight lines, but various modifications such as curved lines, wavy lines, and zigzag lines are possible. In addition, at least two of the above types of lines may be mixed.

1 and 2 show when an arbitrary line is drawn on the electroconductive pattern according to an embodiment of the present invention. However, the scope of the present invention is not limited thereto. FIG. 1 is a one-dimensional form in which the electrically conductive patterns are not crossed with each other, and FIG. 2 is a two-dimensional form in which the electrically conductive patterns are intersected with each other and a closed figure is formed in at least a portion of the region. 6 illustrates an example of the above-described electrically conductive conductive pattern, but the scope of the present invention is not limited thereto.

Figure 3 illustrates the electrical conductivity pattern according to an embodiment of the present invention. The area distribution ratio of such a pattern is 20% or more, for example, 20%-35%.

According to an exemplary embodiment of the present invention, the electrically conductive pattern may be in the form of a boundary line of figures constituting a Voronoi diagram.

In the present invention, the moire phenomenon can be prevented by forming the electrically conductive pattern in the form of a boundary line of figures constituting the Voronoi diagram. In the Voronoi diagram, if you place the points of the Voronoi diagram generator in the area you want to fill, each point fills the area closest to the point compared to the other points. Pattern in a way. For example, suppose that a large discount store in the country is displayed as a dot and consumers go to the nearest large discount store. That is, when the space is filled with a regular hexagon and each point of the regular hexagon is selected as a Voronoi generator, the honeycomb structure may be the electrically conductive pattern. In the present invention, when the electroconductive pattern is formed by using the Voronoi diagram generator, there is an advantage that it is easy to determine a complex pattern shape that can prevent the moiré phenomenon that may occur due to interference with other regular patterns. 3 shows the pattern formation using the Voronoi diagram generator. An example of the conductive pattern is illustrated in FIGS. 7 to 9, but the scope of the present invention is not limited thereto.

In the present invention, a pattern derived from the generator can be used by regularly or irregularly positioning the Voronoi diagram generator.

Even in the case of forming the electrical conductivity pattern in the form of the boundary line of the figures constituting the Voronoi diagram, in order to solve the problem of visual cognition as described above, regularity and irregularity can be appropriately balanced when generating the Voronoi diagram generator. . For example, after designating an area of a certain size as a basic unit for the area to be patterned, a point is generated so that the distribution of points in the basic unit is irregular, and then a Voronoi pattern may be manufactured. Using this method, the visual distribution can be compensated by preventing the distribution of lines from being concentrated at any one point.

As described above, when the aperture ratio of the pattern is constant at the unit area for uniform conductivity and visibility of the conductor, the number per unit area of the Voronoi diagram generator may be adjusted. At this time, when the number per unit area of the Voronoi diagram generator is uniformly adjusted, the unit area is preferably 5 cm ² or less, and more preferably 1 cm ² or less. Number per unit area of the Voronoi diagram generator is 25-2500 pieces / cm ² is not preferred, and is more preferably from 100-2000 pieces / cm ^2.

At least one of the figures constituting the pattern within the unit area may have a shape different from the remaining figures.

According to another exemplary embodiment of the present invention, the electrically conductive pattern may be in the form of a boundary line of figures consisting of at least one triangle constituting the Delaunay pattern. Specifically, the shape of the electrically conductive pattern may be in the form of a boundary line of triangles constituting the Delaunay pattern, or in the form of a boundary line of figures consisting of at least two triangles constituting the Delaunay pattern, or a combination thereof.

By forming the electrically conductive pattern in the form of a boundary line of figures consisting of at least one triangle constituting the Delaunay pattern, side effects due to diffraction and interference of light can be minimized. Delaunay pattern is a pattern that is called the Delaunay pattern generator in the area to fill the pattern and connects three surrounding points to form a triangle, but includes all the vertices of the triangle. When a circle is drawn, a pattern is formed by drawing a triangle so that no other point exists in the circle. In order to form such a pattern, Delaunay triangulation and circulation may be repeated based on the Delaunay pattern generator. The Delaunay triangulation can be performed in such a way as to avoid the skinny triangle by maximizing the minimum angle of all angles of the triangle. The concept of the Delaunay pattern was proposed in 1934 by Boris Delaunay. An example of forming the Delaunay pattern is illustrated in FIG. 7. In addition, examples of the Delaunay pattern are shown in FIGS. 11 to 13. However, the scope of the present invention is not limited only to this.

The pattern in the form of a boundary line of figures consisting of at least one triangle constituting the Delaunay pattern may use a pattern derived from the generator by regularly or irregularly positioning the location of the Delaunay pattern generator. In the present invention, when the electroconductive pattern is formed using the Delaunay pattern generator, there is an advantage that the complex pattern shape that can prevent the moire phenomenon can be easily determined.

Even when the electroconductive pattern is formed in the form of a boundary line of figures consisting of at least one triangle constituting the Delaunay pattern, in order to solve the visual cognitive problem and the local conductivity problem as described above, a Delaunay pattern generator may be generated. At the same time, regularity and irregularity can be properly balanced. For example, first, create an irregular and homogeneous reference point in the area where the pattern will be placed. In this case, the irregularity means that the distance between each point is not constant, and the uniformity means that the number of points included per unit area is the same.

For example, the method of generating irregular and homogeneous reference points as described above is as follows. As shown in 1 of FIG. 14, an arbitrary point is generated in the entire area. Then, the spacing of the generated points is measured, and the points are removed when the spacing of the points is smaller than the preset value. In addition, a Delaunay triangle pattern is formed based on the points, and when the area of the triangle is larger than the preset value, a point is added inside the triangle. By repeating the above process, irregular and homogeneous reference points are generated as shown in FIG. Next, we create a Delaunay triangle that contains the generated reference points one by one. This step can be accomplished using a Delaunay pattern. Using this method, the visual distribution can be compensated by preventing the distribution of lines from being concentrated at any one point.

As described above, when the aperture ratio of the pattern is made constant in the unit area for uniform conductivity and visibility of the conductor, it is preferable to adjust the number per unit area of the Delaunay pattern generator. In this case, the unit area is preferably 5 cm ² or less, and more preferably 1 cm ² or less when the number per unit area of the Delaunay pattern generator is uniformly adjusted. Number per unit area of the del Ronnie pattern generator dog 25-2500 / cm ² is not preferable, and more preferably from 100-2000 pieces / cm ^2.

At least one of the figures constituting the pattern within the unit area may have a shape different from the remaining figures.

In the present invention, the above-described electrically conductive pattern can be made uniform in line width and line height when formed on a transparent substrate by the method described below. According to an exemplary embodiment of the present invention, at least a part of the electrically conductive pattern may be artificially formed differently from the other patterns. By such a configuration, a desired electric conductivity pattern can be obtained. For example, depending on the purpose, if some areas require higher electrical conductivity compared to the remaining area, or if the touch panel electrodes require more sensitive touch sensing in some areas, the patterns of electrical conductivity in those areas and the remaining areas may differ. can do. The line width or line spacing of the printed pattern may be different so that at least a part of the electrically conductive pattern is different from the remaining printed patterns. For example, in the case of a capacitive touch screen, a portion of the capacitive touch screen connected to a pad has a high issue of high conductivity.

According to an exemplary embodiment of the present invention, the conductor may include a region in which no electrically conductive pattern is formed.

In order to maximize the moiré phenomenon preventive effect, the electrically conductive pattern may be formed so that the pattern area consisting of figures of asymmetric structure is 10% or more with respect to the total pattern area. In addition, at least one of the lines connecting the center point of one figure constituting the Voronoi diagram with the center point of the adjacent figure forming the boundary with the figure has an area of 10% of the total area of the electroconductive pattern pattern. It can be formed so that it may become abnormal.

When manufacturing the electrically conductive pattern, a large area pattern may be manufactured by using a method of designing a pattern in a limited area and then repeatedly connecting the limited area. In order to repeatedly connect the patterns, the repetitive patterns may be connected to each other by fixing the positions of the points of each quadrangle. At this time, the limited area is preferably to have an area of 1 cm ² or more, more preferably 10 cm ² or more in order to prevent the moiré phenomenon due to regularity.

The moiré phenomenon can be avoided by the above pattern, but it is possible to maximize the avoidance of the moiré phenomenon by adjusting the line width and pitch of the conductive pattern. Specifically, the conductive pattern has a fine line width of 100 micrometers or less, preferably 0.1 to 30 micrometers, more preferably 0.5 to 10 micrometers, and more preferably 1 to 5 micrometers, until the residual moiré phenomenon. You can prevent it. In addition, the pitch of the conductive line pattern does not coincide with the size unit of the pixel of the display, for example, in the case of a display having a sub pixel of 250 micrometers in the long axis direction, the pitch interval of the conductive pattern is avoided by 250 pitch to prevent the pixel interference. This can prevent the color distortion of the display. The moiré phenomenon according to the line width and pitch is shown in FIG. 27. As a result of evaluating the moire according to the line width and pitch change of less than 10 micrometers, it can be confirmed that in the case of 1,3 micrometers, the generation of residual moir is eliminated. In addition, iridescent light was observed for 250 pitches. From this, we can check the correlation with the pixel long axis length of the display such as LCD.

In the present invention, first, after determining the desired pattern shape, by using a printing method, a photolithography method, a photography method, a method using a mask, a sputtering method, or an inkjet method, the line width is thin on a transparent substrate, and the precise electrical conductivity pattern Can be formed. In determining the pattern shape, a Voronoi diagram generator can be used, whereby a complicated pattern shape can be easily determined. Here, the Voronoi diagram generator means points arranged to form the Voronoi diagram as described above. However, the scope of the present invention is not limited thereto, and other methods may be used when determining the desired pattern form.

The printing method may be performed by transferring a paste including an electroconductive conductive pattern material onto a transparent substrate in the form of a desired pattern and then baking it. The transfer method is not particularly limited, but the pattern shape may be formed on a pattern transfer medium such as an intaglio or a screen, and a desired pattern may be transferred onto the transparent substrate using the pattern shape. The method of forming a pattern shape on the pattern transfer medium may use a method known in the art.

The printing method is not particularly limited, and printing methods such as offset printing, screen printing, gravure printing, flexographic printing, inkjet printing, and the like may be used. Among these, more than one type of composite method may be used. The printing method may use a roll to roll method, a roll to plate, a plate to roll or a plate to plate method.

Offset printing may be performed by filling a paste on a patterned intaglio and then performing a primary transfer with a silicone rubber called a blanket, and then performing a secondary transfer by bringing the blanket and the transparent substrate into close contact with each other. Screen printing may be performed by placing the paste on a patterned screen and then placing the paste on the substrate directly through the screen where the space is empty while pushing the squeegee. Gravure printing may be performed by winding a blanket engraved with a pattern on a roll, filling a paste into a pattern, and then transferring the transparent substrate. In the present invention, the above schemes as well as the above schemes may be used in combination. It is also possible to use a printing method known to those skilled in the art.

In the case of the offset printing method, a blanket cleaning process is not necessary because the paste is almost transferred to a transparent substrate such as glass due to the release property of the blanket. The intaglio may be manufactured by precisely etching a glass engraved with a desired electroconductive pattern, and may be coated with metal or DLC (Diamond-like Carbon) on the glass surface for durability. The intaglio may be produced by etching a metal plate.

In the present invention, in order to implement a more precise electroconductive pattern, an offset printing method is preferable. 4 illustrates an offset printing method. According to FIG. 2, after the paste is filled in the pattern of the intaglio using a doctor blade as a first step, the blanket is first transferred by rotating the blanket, and the blanket is rotated as the second step to make the surface of the transparent substrate. 2nd Warrior

In the present invention, the photolithography step is not limited to the printing method described above. For example, in a photolithography process, an electrically conductive conductive pattern material layer is formed on a front surface of a transparent substrate, a photoresist layer is formed thereon, the photoresist layer is patterned by a selective exposure and development process, and then the patterned photoresist is formed. The layer may be used as a mask to pattern the electroconductive pattern and to remove the photoresist layer.

The present invention may also utilize a photography method. For example, after applying a photosensitive material containing silver halide on a transparent substrate, the photosensitive material may be patterned by selective exposure and development processes. More detailed examples are as follows. First, a negative photosensitive material is apply | coated on the base material to form a pattern. In this case, a polymer film such as PET or acetyl celluloid may be used as the substrate. The polymer film material coated with the photosensitive material will be referred to herein as a film. The negative photosensitive material may generally be composed of silver halide (Silver Halide) mixed with some AgI in AgBr which is very sensitive and regular reaction to light. Since the image processed by photographing a general negative photosensitive material is negative in contrast with a subject, contrast, photographing may be performed using a mask having a pattern shape to be formed, preferably an irregular pattern shape.

Plating may be further performed to increase the conductivity of the electrically conductive pattern formed using photolithography and a photolithography process. The plating may use an electroless plating method, and copper or nickel may be used as the plating material, and nickel plating may be performed thereon after copper plating, but the scope of the present invention is limited only to these examples. It is not.

The present invention may also use a method using a mask. For example, after a mask having a shape of a desired conductive pattern is placed near the substrate, the mask may be patterned by depositing an electrically conductive pattern material on the substrate. In this case, the deposition method may be thermal vapor deposition by heat or electron beam and physical vapor deposition (PVD) such as sputtering, or chemical vapor deposition (CVD) using an organometallic material. It may be.

In the present invention, the transparent base material is not particularly limited, but light transmittance is preferably 50% or more, preferably 75% or more. Specifically, glass may be used as the transparent substrate, or a plastic substrate or a plastic film may be used. As the plastic substrate or film, materials known in the art may be used, and for example, at least one resin selected from polyacrylic, polyurethane, polyester, polyepoxy, polyolefin, polycarbonate, and cellulose based materials. The formed can be used. More specifically, films having a visible light transmittance of 80% or more such as polyethylene terephthalate (PET), polyvinylbutyral (PVB), polyethylene naphthalate (PEN), polyethersulfon (PES), polycarbonate (PC), and acetyl celluloid are preferable. The thickness of the plastic film is preferably 12.5 to 500 micrometers, more preferably 50 to 450 micrometers, and more preferably 50 to 250 micrometers. The plastic substrate may be a substrate having a structure in which various functional layers such as moisture, a gas barrier layer for blocking gas, and a hard coat layer for strengthening strength are laminated on one or both surfaces of the plastic film. The functional layer that can be included in the plastic substrate is not limited to those described above, and various functional layers may be provided.

The electroconductive pattern may be formed directly on a component, such as a substrate, in a device or device in which the conductor of the invention is to be applied, such as a display.

In the present invention, it is preferable to use a metal having excellent electrical conductivity as a material of the electrical conductivity pattern. In addition, the specific resistance value of the electrically conductive conductive pattern material may have a value of 1 microOhm cm or more and 200 microOhm cm or less. As a specific example of the electrically conductive conductive pattern material, copper, silver, gold, iron, nickel, aluminum, carbon nanotubes (CNT) and the like may be used, and silver is most preferred. The electrically conductive conductive pattern material may be used in the form of particles. In the present invention, copper particles coated with silver may also be used as the electrically conductive conductive pattern material.

In the present invention, in the case of using the paste containing the electroconductive conductive material, the paste may further include an organic binder in addition to the electroconductive conductive material described above to facilitate the printing process. It is preferable that the organic binder has a property of volatilization in the firing process. The organic binders include polyacrylic resins, polyurethane resins, polyester resins, polyolefin resins, polycarbonate resins, cellulose resins, polyimide resins, polyethylene naphthalate resins, and modified epoxies. It is not limited only to.

In order to improve the adhesion of the paste to a transparent substrate such as glass, the paste may further include glass frit. The glass frit may be selected from commercially available products, but it is preferable to use an environmentally friendly glass frit free of lead. The glass frit used should have an average aperture of 2 micrometers or less and a maximum aperture of 50 micrometers or less.

If necessary, a solvent may be further added to the paste. The solvent may include butyl carbitol acetate, carbitol acetate, cyclohexanon, cellosolve acetate, terpineol, and the like. The scope of the present invention is not limited.

In the present invention, in the case of using a paste containing an electrically conductive conductive pattern material, an organic binder, a glass frit and a solvent, the weight ratio of each component is 50-90% of the electrically conductive conductive pattern material, 1-20% organic binder and 0.1 glass frit. -10% and solvent 1-20% are preferred.

According to an exemplary embodiment of the present invention, the electrically conductive pattern may be blackened. When the paste containing the metal material is fired at a high temperature, metallic luster may be expressed and visibility may deteriorate due to reflection of light. This problem can be prevented by blackening the electrically conductive pattern. In order to blacken the electroconductive pattern, the blackening material may be added to a paste for forming the electroconductive pattern, or the blackening pattern may be blackened after printing and firing the paste.

Blackening materials that may be added to the paste include metal oxides, carbon black, carbon nanotubes, black pigments, colored glass frits, and the like. At this time, the composition of the paste is 50-90 wt% of the electrically conductive conductive pattern material, 1-20 wt% of the organic binder, 1-10 wt% of the blackening material, 0.1-10 wt% of the glass frit, and 1-20 wt% of the solvent. % Is good.

When the blackening treatment is performed after the baking, the composition of the paste is 50-90% by weight of the electrically conductive conductive pattern material, 1-20% by weight of the organic binder, 0.1-10% by weight of the glass frit, and 1-20% by weight of the solvent. It is good. The blackening treatment after firing includes immersion in an oxidizing solution such as Fe or Cu ion-containing solution, immersion in a halogen ion-containing solution such as chlorine ion, immersion in hydrogen peroxide, nitric acid, and the like, and treatment with halogen gas.

According to one embodiment of the present invention, an electrically conductive pattern material, an organic binder and a glass frit can be prepared by dispersing it in a solvent. Specifically, the organic binder is dissolved in a solvent to prepare an organic binder resin solution, glass frit is added thereto, and finally, the powder of the metal described above is added as a conductive material, followed by kneading. It can be prepared to uniformly disperse the agglomerated metal powder and glass frit. However, this invention is not limited to the above methods.

The line width of the aforementioned electroconductive conductive pattern may be formed to be 100 micrometers or less, preferably 30 micrometers or less, and more preferably 25 micrometers or less.

In the present invention, in the case of using the above-described paste, after the paste is printed according to the above-described pattern and subjected to a baking process, a pattern having electrical conductivity is formed. At this time, the firing temperature is not particularly limited, but may be 4 to 800 ℃, preferably 600 to 700 ℃. When the transparent substrate forming the electroconductive pattern is glass, the glass may be molded to suit the intended use in the firing step if necessary. In addition, when a plastic substrate or a film is used as the transparent substrate forming the electroconductive pattern, it is preferable to perform firing at a relatively low temperature. For example, it may be carried out at 50 to 350 ℃.

The line width of the electroconductive pattern of the conductor is 100 micrometers or less, preferably 30 micrometers or less, more preferably 25 micrometers or less, and preferably 5 micrometers or more. The interval between the lines of the electroconductive pattern is preferably 30 mm or less, more preferably 10 micrometers to 10 mm, more preferably 50 micrometers to 1000 micrometers, and more preferably 200 micrometers to 650 micrometers. desirable. The height of the electroconductive conductive pattern is 1 to 100 micrometers, more preferably 3 micrometers. By the above-described methods, the line width and line height of the electroconductive pattern can be made uniform. In the present invention, the uniformity of the electrical conductivity pattern may be within a range of ± 3 micrometers in the case of the line width, and may be within a range of ± 1 micrometer in the case of the sentence.

The conductor according to the present invention can be connected to a power source, wherein the resistance value per unit area considering the aperture ratio is 0.01 ohm / square to 1000 ohm / square at room temperature, preferably 0.05 ohm / square to 500 ohm / square.

The conductor according to the invention can be limited to the use of conducting current by external factors other than the configuration of the conductor itself. At this time, the amount of current flowing is 1 A or less based on 1 minute. As one example, when the conductor according to the present invention is used as an electromagnetic shielding (EMI) film, a flow of current occurs in the conductor due to the generation of electromagnetic waves in a display such as a PDP, and the generated current is dissipated through the ground portion. . As another example, when the conductor according to the present invention is used as one electrode layer of a touch panel, current is generated by the potential difference and contact with the conductive substrate facing the conductor according to the present invention. As another example, when the conductor according to the present invention is used as an auxiliary electrode for organic light emitting diode (OLED) illumination, current flows according to the potential of the corresponding electrode formed on the conductor.

In the conductor according to the present invention, it is preferable that the opening ratio of the electrically conductive conductive pattern, that is, the area ratio of the transparent substrate not covered by the pattern, is 70% or more.

The conductor according to the invention can be used for applications where electrical conductivity is required. For example, it can be used for electromagnetic shielding film, touch panel, light emitting element auxiliary electrode and so on. The light emitting device auxiliary electrode may be specifically, an organic light emitting device (OLED) lighting auxiliary electrode.

According to one embodiment of the present invention, there is provided an electromagnetic shielding film containing a conductor of the present invention as described above and a display device including the same. The electromagnetic shielding film may further include a grounding portion connected with the electrically conductive pattern described above. For example, the grounding portion may be formed at the edge of the surface on which the electrical conductive pattern of the transparent substrate is formed. In addition, at least one of the electromagnetic shielding film may be provided with at least one of an anti-reflection film, a near infrared shielding film, and a color correction film. According to design specifications, in addition to the above-described functional film may further include a functional film of another kind. Such electromagnetic shielding films can be applied to display devices such as plasma display panels (PDPs), liquid crystal displays (LCDs), and cathode-ray tubes (CRTs).

For example, the above-described plasma display panel includes two panels; And a pixel pattern provided between the two panels. The electromagnetic shielding filter may be attached to one surface of the plasma display panel. Alternatively, the electroconductive pattern of the electromagnetic shielding film may be provided in a form directly printed on one surface of the plasma display panel. In this case, the substrate of the electromagnetic shielding film corresponds to a plasma display panel.

When the substrate of the electromagnetic wave shielding film according to the present invention is attached to a supporting substrate or a device, it can be attached using a bonding film. As the material of the bonding film, any material having adhesion and transparent after bonding may be used. For example, PVB film, EVA film, PU film and the like can be used, but is not limited to these examples. Although the said bonding film is not specifically limited, It is preferable that the thickness is 100 micrometers-800 micrometers.

According to one embodiment of the present invention, there is provided a touch panel comprising the conductor of the invention described above. The touch panel according to the invention is described in the lower part; Upper substrate; And an electrode layer provided on one or both surfaces of the lower surface of the lower substrate and in contact with the lower substrate of the upper substrate. The electrode electrode layer may function as an X axis position detection and a Y axis position detection, respectively.

At this time, both the lower electrode substrate and the electrode layer provided on the surface of the lower substrate in contact with the upper substrate; and the electrode layer provided on the surface of the upper substrate and the lower substrate of the upper substrate. There may be conductive conductors. When only one of the electrode layers is the conductor according to the present invention, the other may have a pattern known in the art.

When an electrode layer is formed on one surface of both the upper substrate and the lower substrate to form two layers of electrode layers, an insulating layer or spacer is provided between the lower substrate and the upper substrate so as to maintain a constant distance between the electrode layers and prevent connection. It can be equipped. It is preferable that the said insulating layer is an adhesive or hot melt resin. The electrode can be connected to an external circuit.

According to another exemplary embodiment of the present invention, there is provided an organic light emitting diode (OLED) auxiliary electrode including the conductor of the present invention described above and an organic light emitting diode lighting including the same. As one example, the organic light emitting device illumination according to the present invention includes a first electrode, an auxiliary electrode disposed on the first electrode, an insulating layer disposed on the auxiliary electrode, at least one organic layer and a second electrode The auxiliary electrode may be a conductor according to the present invention. The auxiliary electrode may be directly formed on the first electrode, or a conductor including a transparent substrate and an electrically conductive pattern may be positioned on the first electrode. An auxiliary electrode of the organic light emitting device illumination according to the present invention is illustrated in FIGS. 25 and 26.

Hereinafter, the present invention is illustrated by examples. However, the following examples are provided to illustrate the present invention, and the scope of the present invention is not limited thereto.

EXAMPLE

Example 1

The silver paste was prepared by dissolving 80% by weight of silver particles having a particle diameter of 2 micrometers, 5% by weight of polyester resin, and 5% by weight of glass frit in 10% by weight of BCA (Butyl carbitol acetate) solvent. The intaglio was glass having a pattern as shown in FIG. At this time, when a straight line intersecting the formed pattern was drawn, the ratio (distance distribution ratio) of the standard deviation to the average value of the distance between the straight line and the adjacent intersection points of the pattern was about 30%.

The silver pattern was formed on the glass substrate by using the offset printer using the method shown in FIG. 4, and then fired at 600 ° C. for 3 minutes to form a pattern as shown in FIG. 1.

The sheet resistance of the glass substrate was 0.6 ohm / square. As a result of measuring sheet resistance at each of nine positions on the glass substrate, it was confirmed that a distribution curve as shown in FIG. 17 was shown, and the sheet resistance value and distribution curve at this time were as shown in FIG. 17. At this time, the standard deviation was 0.018.

As a result of observing the moire phenomenon by making a 40 inch PDP using the glass substrate, no moire pattern was observed between 0 degrees and 80 degrees with respect to the line perpendicular to the plane of the PDP. Did. In addition, the moire pattern was not observed when the glass substrate was rotated from 0 degrees to 45 degrees relative to the PDP pixel.

19 is a view showing whether the moire phenomenon by angle is observed when each of the conventional patterns (line width 30 micrometers, line spacing 300 micrometers) and the conductor having the irregular pattern manufactured in Example 1 are used as shown in FIG. 15 (O: Observed, X: not observed).

Example 2

The silver paste was prepared by dissolving 80% by weight of silver particles having a particle diameter of 2 micrometers, 5% by weight of polyester resin, and 5% by weight of glass frit in 10% by weight of BCA (Butyl carbitol acetate) solvent. The intaglio was a glass having a pattern as shown in Figure 6 having a width of 20 micrometers, 7.5 micrometers deep.

A silver pattern was formed on a glass substrate (100 mm x 100 mm) using an offset printer using the method shown in FIG. 3, and then fired at 600 ° C. for about 3 minutes to form a pattern as shown in FIG. 6. . At this time, when a straight line intersecting the formed pattern was drawn, the ratio (distance distribution ratio) of the standard deviation to the average value of the distance between the straight line and the adjacent intersection points of the pattern was about 50%.

As a result of observing the moire phenomenon by making a 40 inch PDP using the glass substrate, no moire pattern was observed between 0 degrees and 80 degrees with respect to the line perpendicular to the plane of the PDP. Did. In addition, the moire pattern was not observed when the glass substrate was rotated from 0 degrees to 45 degrees relative to the PDP pixel. The sheet resistance and moiré observation were as shown in FIGS. 17 and 19.

Comparative Example 1

A grid pattern based on a square of 0.09 mm ² was produced, and the figure of the pattern is shown in FIG. 15. At this time, when a straight line intersecting the formed pattern was drawn, the ratio (distance distribution ratio) of the standard deviation to the average value of the distance between the straight line and the adjacent intersection points of the pattern was about 0%.

A 40-inch PDP was fabricated using the glass substrate, and the result of observing the moire phenomenon was shown in FIG. 19 (middle column, O: observed, X: not observed).

Comparative Example 2

The pattern (pitch 0.3 mm) similar to FIG. 16 was produced. At this time, when a straight line intersecting the formed pattern was drawn, the ratio (distance distribution ratio) of the standard deviation to the average value of the distance between the straight line and the adjacent intersection points of the pattern was about 0%.

As a result of observing the moire phenomenon by manufacturing a 40 inch PDP using the glass substrate, the moire pattern except for 45 degree, 90 degree and 225 degree based on the line perpendicular to the plane of the PDP. ) Was observed.

Example 3

The negative photosensitive material was coated on the PET film substrate to form a pattern. Negative photoresist is composed of silver halide (Silver Halide) which is mixed with some AgI in AgBr which is very sensitive to light and reacts regularly. Irregular patterns formed on the PET film substrate were the same pattern as in Example 1. The light was irradiated to the film according to the set exposure time and the light intensity by using a negative mask in a configuration in which light is transmitted through the designed pattern region and light is not transmitted to regions other than the pattern. By this process, the photosensitive silver in the photosensitive emulsion layer was exposed to form a latent image. As the latent image was formed, the photosensitive silver was changed into black silver while the reverse phase pattern of the mask pattern was formed as a visible image. The characteristics of the pattern of the blackened silver material formed on the PET film substrate through the photograph process are shown in Table 1 below.

Table 1

Line width (micrometer)	Sentence (micrometer)	Permeability (%)
20	6.5	75.6

The film was laminated to glass using an adhesive film.

As a result of observing the moire phenomenon by making a 40 inch PDP using the glass substrate, no moire pattern was observed between 0 degrees and 80 degrees with respect to the line perpendicular to the plane of the PDP. Did. In addition, the moire pattern was not observed when the glass substrate was rotated from 0 degrees to 45 degrees relative to the PDP pixel.

Example 4

The silver paste was prepared by dissolving 80% by weight silver particles having a particle diameter of 2 micrometers, 5% by weight of polyester resin, and 5% by weight of glass frit in 10% by weight of Butyl Carbitol Acetate (BCA) solvent. The intaglio used glass with Voronoi pattern, 20 microns wide and 7.5 microns deep. In the Voronoi pattern, a square of 0.09 mm ² was designated as a basic unit, and then a distribution of points in the basic unit was generated by giving irregularity, thereby manufacturing a Voronoi pattern as shown in FIG. 3. The area distribution ratio of the closed figure in this pattern was 23%.

The silver pattern was formed on the glass substrate by using an offset printer using the method shown in FIG. 4, and then fired at 600 ° C. for 3 minutes to form a silver wire as shown in FIG. 3.

The sheet resistance of the glass substrate was 0.6 ohm / square. As a result of measuring sheet resistance at each of nine positions on the glass substrate, it was confirmed that a distribution curve as shown in FIG. 18 was shown, and the sheet resistance value and distribution curve at this time were as shown in FIG. 18. At this time, the standard deviation was 0.018.

As a result of observing the moire phenomenon by making a 40 inch PDP using the glass substrate, no moire pattern was observed between 0 degrees and 80 degrees with respect to the line perpendicular to the plane of the PDP. Did. In addition, the moire pattern was not observed when the glass substrate was rotated from 0 degrees to 45 degrees relative to the PDP pixel.

20 is a view showing whether the moire phenomenon by angle when using the conventional pattern (line width 30 micrometers, line spacing 300 micrometers) and the conductor having an irregular pattern prepared in Example 4 as shown in Figure 15 (O: Observed, X: not observed).

Example 5

After grounding the conductive pattern manufactured in the same manner as in Example 4 and using it as an electromagnetic shielding filter of 40-inch PDP, the result of measuring the EMI level from a distance of 3 m is shown in FIG. 21.

Example 6

A touch screen having a shape as shown in FIG. 22 was manufactured using the pattern manufactured by the method of Example 4, and linearity evaluation was performed using the touch screen. The result was as shown in FIG. In this case, the linearity error of the existing ITO-based touch screen is 2 pixels, whereas the touch screen using the print-based conductor manufactured in Example 4 has a linearity error of less than 1 pixel.

Example 7

The blackening process was performed using the pattern manufactured by the method of Example 4. Specifically, the blackening process was performed by immersing the prepared conductive pattern substrate in FeCl ₃ (Kanto Chemical Co., 16019-02) 1% aqueous solution at room temperature for 1 minute.

By blackening, it was confirmed that the reflectivity of Ag can be greatly improved to a level where there is no problem in visibility. The photograph which shows the reflectivity before and behind blackening is shown in FIG.

Claims (40)

1. A conductor comprising a transparent substrate and an electrically conductive pattern provided on at least one surface of the transparent substrate, wherein at least 30% of the total area of the transparent substrate is a straight line intersecting the electrically conductive pattern. A conductor having an electrically conductive pattern having a ratio of the standard deviation (distance distribution ratio) to an average value of distances between adjacent intersection points of the electrically conductive pattern is 2% or more.
2. The conductor according to claim 1, wherein the straight line crossing the electrically conductive pattern is a line having the smallest standard deviation of the distances between the intersection points adjacent to the electrically conductive pattern.
3. The conductor according to claim 1, wherein the straight line crossing the electrically conductive pattern is a straight line extending in a direction perpendicular to a tangent of any one point of the electrically conductive pattern.
4. The conductor of claim 1, wherein a straight line crossing the electrically conductive pattern has 80 or more intersection points with the electrically conductive pattern.
5. The conductor according to claim 1, wherein a ratio (distance distribution ratio) of a standard deviation to an average value of distances between straight lines intersecting the electrically conductive pattern and intersecting points of the electrically conductive pattern is 20% or more.
6. The conductor of claim 1, wherein the electrical conductivity pattern has a pattern in the form of a boundary line of figures constituting the Voronoi diagram.
7. The conductor according to claim 1, wherein the electrically conductive conductive pattern has a line width of 100 micrometers or less, a line spacing of 30 mm or less, and a height of a line from a transparent substrate surface of 1 to 100 micrometers.
8. The conductor according to claim 1, wherein the transmittance deviation for any circle having a diameter of 20 cm is 5% or less.
9. The conductor of claim 1, wherein the transparent substrate is glass, a plastic substrate, or a plastic film.
10. The conductor according to claim 1, wherein the conductor has an opening ratio of 70% or more.
11. The conductor according to claim 1, wherein the conductor has a resistance value per unit area of 0.01 ohm / square to 1000 ohm / square at room temperature.
12. The conductor of claim 1, wherein the conductor is configured to conduct a current by external factors.
13. The conductor according to claim 1, wherein the average current is 1 A or less based on 1 minute.
14. The conductor of claim 1, wherein the electrically conductive pattern is blackened.
15. A method for manufacturing a conductor comprising the step of forming an electrically conductive pattern on a transparent substrate, wherein when the electrically conductive conductive pattern is drawn at 30% or more of the total area of the transparent substrate, a straight line intersecting the electrically conductive pattern is drawn. And the ratio (distance distribution ratio) of the standard deviation with respect to the average value of the distances between the straight lines and the adjacent intersection points of the electrically conductive patterns is formed in a pattern of 2% or more.
16. The method of manufacturing a conductor according to claim 15, wherein the electrically conductive pattern is formed by a printing method, a photolithography method, a photography method, a method using a mask, a sputtering method, or an ink jet method.
17. The method of claim 15, further comprising determining the electrically conductive pattern by using a Voronoi diagram generator before forming the electrically conductive pattern on the transparent substrate.
18. The method of manufacturing a conductor according to claim 1, wherein the electrically conductive pattern is formed to have a line width of 100 micrometers or less, a line spacing of 30 mm or less, and a height of 1 to 100 micrometers of the line from the surface of the transparent substrate.
19. A conductive material comprising a transparent substrate and an electrically conductive pattern provided on at least one surface of the transparent substrate, wherein at least 30% of the total area of the transparent substrate is formed of continuous closed figures, and the areas of the closed figures. A conductor having an electric conductivity pattern having a ratio of the standard deviation (area distribution ratio) to an average value of 2% or more.
20. 20. The method of claim 19, wherein at least 30% of the total area of the transparent substrate is composed of continuous closed figures, and the ratio of the standard deviation (area distribution ratio) to the average value of the areas of the closed figures is 20% or more. A conductor having an electrical conductivity pattern.
21. 20. The conductor of claim 19, wherein the enclosed figure is at least 100.
22. 20. The conductor according to claim 19, wherein the electrically conductive pattern has a borderline pattern of figures constituting the Voronoi diagram.
23. The conductor of claim 19, wherein the electroconductive pattern has a pattern in the form of a boundary line of figures consisting of at least one triangle constituting a deloni pattern.
24. The conductor according to claim 19, wherein the electrically conductive conductive pattern has a line width of 100 micrometers or less, a line spacing of 30 mm or less, and a height of a line from a transparent substrate surface of 1 to 100 micrometers.
25. 20. The conductor according to claim 19, wherein the transmittance deviation for any circle having a diameter of 20 cm is 5% or less.
26. The conductor of claim 1, wherein the transparent substrate is glass, a plastic substrate, or a plastic film.
27. The conductor of claim 1, wherein the conductor has an aperture ratio of at least 70%.
28. The conductor of claim 1, wherein the conductor has a resistance value per unit area of 0.01 ohm / square to 1000 ohm / square at room temperature.
29. The conductor of claim 1, wherein the conductor is configured to conduct a current by external factors.
30. The conductor according to claim 1, wherein the average current is 1 A or less based on 1 minute.
31. The conductor of claim 1, wherein the electrically conductive pattern is blackened.
32. A method for manufacturing a conductor comprising the step of forming an electrically conductive pattern on a transparent substrate, wherein when the electrically conductive conductive pattern is drawn at 30% or more of the total area of the transparent substrate, a straight line intersecting the electrically conductive pattern is drawn. And the ratio (distance distribution ratio) of the standard deviation with respect to the average value of the distances between the straight lines and the adjacent intersection points of the electrically conductive patterns is formed in a pattern of 2% or more.
33. The method of manufacturing a conductor according to claim 32, wherein the electroconductive pattern is formed by a printing method, a photolithography method, a photography method, a method using a mask, a sputtering method, or an inkjet method.
34. 33. The method of claim 32, further comprising determining the electrically conductive pattern by using a Voronoi diagram generator or a Delaunay pattern generator before forming the electrically conductive pattern on the transparent substrate.
35. 33. The method of claim 32, wherein the electrically conductive conductive pattern is formed to have a line width of 100 micrometers or less, a line spacing of 30 mm or less, and a height of 1 to 100 micrometers of the line from the surface of the transparent substrate.
36. An electromagnetic shielding film comprising a conductor according to any of claims 1 to 14 and 19 to 31.
37. 36. The electromagnetic shielding film of claim 36, further comprising a grounding portion provided at the edge of the rear surface of the transparent substrate, wherein the transparent conductive pattern is provided.
38. A touch panel comprising a conductor according to any one of claims 1 to 14 and 19 to 31.
39. According to claim 38, the lower description; Upper substrate; And an electrode layer provided on at least one surface of the lower surface of the lower substrate and in contact with the upper substrate of the lower substrate, the electrode layer being provided on the lower substrate and the upper surface of the lower substrate. A touch panel, wherein one or both of the upper substrate and the lower electrode layer provided on the lower surface of the upper substrate are the conductive conductors.
40. An organic light emitting device illumination comprising as an auxiliary electrode a conductor according to any one of claims 1 to 14 and 19 to 31.

Images