WO2011006695A1

WO2011006695A1 - Removal of foreign metals from inorganic silanes

Info

Publication number: WO2011006695A1
Application number: PCT/EP2010/056714
Authority: WO
Inventors: Ekkehard MÜH; Hartwig Rauleder; Jaroslaw Monkiewicz
Original assignee: Evonik Degussa Gmbh
Priority date: 2009-07-15
Filing date: 2010-05-17
Publication date: 2011-01-20
Also published as: EP2454194A1; DE102009027729A1; JP5653427B2; JP2012532827A; TW201125821A

Abstract

The invention relates to a method for treating a composition containing at least one inorganic silane and at least one foreign metal and/or a compound containing foreign metal, wherein the composition is brought into contact with an organic, amino-functional polymeric adsorbent, and for obtaining the composition in which the content of foreign metal and/or the content of a compound containing foreign metal is reduced. The invention also relates to the use of the adsorbent for reducing foreign metal and/or compounds containing foreign metal in inorganic silane compositions.

Description

Removal of foreign metals from inorganic silanes

The invention relates to a process for the treatment of a composition containing inorganic silanes and at least one foreign metal and / or a

A foreign metal-containing compound, wherein the composition is contacted with at least one organic, amino-functionalized, polymeric adsorbent, in particular an organic aminoalkyl-functionalized polymeric adsorbent, and recovering the composition in which the content of the foreign metal and / or the foreign metal-containing compound is reduced and the

Use of these adsorbents for treating an inorganic silane or compositions of inorganic silanes for reducing the content of foreign metals and / or foreign metal-containing compounds therein.

Silicon compounds used in microelectronics, such as

for example, for the production of high-purity silicon by means of epitaxy or

Silicon nitride (SiN), silicon oxide (SiO), silicon oxynitride (SiON), silicon oxycarbide (SiOC) or silicon carbide (SiC) have to fulfill very high purity requirements. This is especially true in the production of thin layers of these materials. In chip production, contamination of the silicon compounds with metallic impurities results in undesirable doping of the epitaxial layers, e.g. Epitaxial silicon layers.

For example, silicon tetrachloride (SiCl ₄ ) is used inter alia for the production of optical waveguides. For these applications, SiCI ₄ is required in very high purity. In particular, metallic and / or metal-based

Contaminants of significant disadvantage, even if they are contained only in the detection limit or in quantities of a few μg / kg (= ppb). Metallic impurities in halosilanes affect the damping behavior of

Optical fibers negative, by increasing the attenuation values and thus reduce the signal transmission.

In addition, high purity HSiCb is an important feedstock in the production of

Solar silicon. Generally, halosilanes and / or hydrogenhalosilanes are higher Purity, in the field of electronics, the semiconductor industry as well as in the pharmaceutical industry coveted starting compounds.

As a result of production, tetrachlorosilane or trichlorosilane of silicon usually also has the chlorinated impurities present in silicon, which are sometimes carried off into the subsequent synthesis steps. In particular, these chlorinated metallic impurities have a disadvantageous effect in the production of components in the field of electronics.

WO 2009049944 A1 discloses a method for the reduction of metals or semi-metals such as iron, aluminum, and boron, from trichlorosilane with Amberlite ^® XAD-4 resin or montmorillonite K 10 TM. Amberlite ^® XAD-4 is a divinylbenzene cross-linked polystyrene with no functional groups and montmorillonite is a clay mineral that belongs to the phyllosilicates.

From DE 28 52 598 a multi-stage process for the purification of chlorosilanes is known in which adsorbs in a first step on acidic cationic resins containing aluminum trifluoride or magnesium chloride (Ex. 4) phosphoric, arsenic and antimony compounds, in a second Step are adsorbed on nitrogen-containing Lewis compounds, such as a copolymer with vinylpyridine boron and aluminum compounds and in a subsequent step, organic contaminants on activated carbon. Due to the process, it comes

probably in the first step to further contamination of the chlorosilanes with aluminum or magnesium.

It is an object of the present invention to provide a process for reducing the foreign metal or trace element content and / or the content of a foreign metal-containing compound in inorganic silanes. In particular, the content of boron and iron should be reduced inexpensively and easily handled in inorganic silanes. The objects are achieved according to the information in the claims, preferred embodiments are set forth in the subclaims and in detail in the description.

Surprisingly, it has been found that by treating a composition comprising at least one inorganic silane and at least one foreign metal and / or a foreign metal-containing compound, by contacting with at least one organic amino-functionalized, polymeric, porous

Adsorbent, in particular an alkylamino-functionalized, polymeric

Adsorbent, and recovering the composition, the content of the foreign metal and / or the foreign metal-containing compound is significantly reduced.

The adsorbent is used according to the invention substantially anhydrous and / or free of organic solvents for the treatment of the composition. It is further preferred when the substantially water-free and solvent-free adsorbent such as Amberlyst ^® A21 is inserted into the reactor to treat the composition. The conversion into the reactor can preferably be carried out under an inert gas atmosphere, such as under nitrogen, argon or alternatively under dry air. Preference may also be given to using a mixture of said adsorbents or with further adsorbents in order to obtain an optimum

To reduce the boron and iron content. The adsorbent is preferably used purified so as not to contribute to contamination by additional impurities. Thus, preferably only the abovementioned high-purity adsorbents are used in the process according to the invention.

Adsorbents which can be used at the same time as catalysts or have been used and are consumed can also be used appropriately

inventive methods are used, provided that they do not contribute to any additional contamination of the treated compositions.

The invention therefore relates to a method for the treatment of a

A composition containing at least one inorganic silane and at least one foreign metal and / or a foreign metal-containing compound, wherein the

Composition with at least one organic amino-functionalized, in particular aminoalkylfunktionalisierten, polymeric adsorbent is brought into contact and a composition is obtained, the content of

Foreign metal and / or at least one foreign metal-containing compound is reduced. It is of particular advantage that the foreign metal content and / or the content of the foreign metal-containing compound, - is usually a residual content of foreign metal or foreign metal-containing

A compound which can be distilled poorly or no further separation - in particular independently of one another, in each case to a content in the range of less than 100 μg / kg, in particular less than 75 μg / kg, preferably less than 25 μg / kg, preferably less than 15 μg / kg , Particularly preferably below 10 ug / kg can be reduced. The degree of reduction of the foreign metal content is also determined by the ratio of adsorbent to composition and the contact time. The person skilled in the art knows how to determine the optimum treatment conditions.

The adsorbent according to the invention is outstandingly suitable for the adsorptive separation of distillatively poorly separable foreign metal-containing compounds which dissolve in the composition or are completely dissolved therein. The adsorptive separation of the foreign metal-containing compounds is believed to occur by complex formation of the foreign metal-containing compound and the adsorbent. Particulate foreign metals are presumably retained mechanically by the adsorbent.

The determination of the foreign metals or of the foreign metal-containing compounds can generally be carried out by quantitative analysis methods, as known to those skilled in the art, for example by atomic absorption spectroscopy (AAS) or photometry, in particular by inductively coupled plasma mass spectrometry (ICP -MS) and Inductively Coupled Plasma Optical Emission Spectrometry (ICP-OES) - to name but a few. The

Adsorbent is essentially anhydrous and solvent-free. About Karl-Fischer (DIN 51 777), the water content in the adsorbent can be determined and the solvent content, for example by means of TGA-MS, TGA-IR or other, the

Professionally known analytical methods detectable. Solvents are alcohols, such as methanol, ethanol, or acetone and aromatic solvents, such as toluene. An essentially adsorbent whose water content or solvent content of organic solvents is in each case less than 2.5% by weight to, for example, 0.0001% by weight, in particular less than 1, with respect to the total weight of the adsorbent is regarded as substantially anhydrous and / or solvent-free , 5 wt .-%, preferably less than 1, 0 wt .-%, preferably less than 0.5 wt .-%, particularly preferably 0.3 wt .-%, better less than 0.1 or ideally less than 0.01 wt. % to the detection limit, for example up to 0.0001% by weight.

Inorganic silane is understood to mean, in particular, halosilanes, hydrohalosilanes, halosilanes which are substituted by at least one organic radical and / or hydrohalosilanes which are substituted by at least one organic radical and also mixtures comprising at least one of these silanes. In one embodiment, pure hydrogen silanes may also be included. In the halogen-containing inorganic silanes, each halogen independently of other halogen atoms can be selected from the group fluorine, chlorine, bromine or iodine, so that, for example, mixed halosilanes such as SiBrCI ₂ F or SiBr ₂ CIF can be included.

The inorganic silanes preferably include the chlorine-substituted silanes, predominantly monomeric silanes, such as, for example, tetrachlorosilane, trichlorosilane, dichlorosilane, monochlorosilane, methyltrichlorosilane, trichloromethylsilane,

Trimethylchlorosilane, dimethyldichlorosilane, phenylmethyldichlorosilane, phenyltrichlorosilane, vinyltrichlorosilane, dihydrodichlorosilane. But also the monomeric silanes, such as tetramethylsilane, trimethylsilane, dimethylsilane, methylsilane, monosilane or

Organohydrogensilanes or also disilane, trisilane, tetrasilane and / or pentasilane and higher homologous silanes can be reduced in their foreign metal content according to the method according to the invention. In addition to these preferred, predominantly monomeric compounds but also more dimeric silanes, such as

Hexachlorodisilane, oligomeric silanes, such as octachlorothsilane, decachlorotetrasilane, and higher homologous halogenpolysilanes and mixed hydrogenated halogenated polysilanes, such. As Pentachlorhydrogendisilan or Tetrachlordihydrogendisilan, and

Mixtures of these with monomeric, linear, branched and / or cyclic oligomeric and / or polymeric inorganic silanes corresponding in their Foreign metal content can be reduced. The cyclic oligomeric inorganic silanes include compounds of the type Si _n X 2n, with n> 3, such as Si ₅ CliO, and to the polymeric inorganic compounds, for example, halopolysilanes, ie

Polysilicon halides Si _n X 2n + 2 with n> 5 and / or polysilicon hydrogen halides SinH _a X [(2n + 2) -a] with n> 2 and 0 <a <(2n + 2), where X is in each case a halogen, such as F, Cl, Br, J, especially Cl.

The process according to the invention is particularly suitable for the treatment of

Trichlorosilane, dichlorosilane or a mixture of these with monosilane, monochlorosilane and / or tetrachlorosilane.

As foreign metals and / or foreign metal-containing compounds are considered those in which the metal or semimetal does not correspond to silicon. The

Adsorption of the at least one foreign metal and / or the foreign metal-containing compound is carried out in particular selectively from the inorganic silane-containing composition, while the adsorption can be carried out both in solution and in the gas phase. As foreign metals or foreign metal-containing compounds are also understood half metals or compounds containing semimetals, such as boron and boron trichloride.

In particular, the foreign metals and / or foreign metal-containing compounds to be reduced are metal halides,

Metallhydrogenhalogenide and / or metal hydrides and mixtures of these

Links. But also with organic radicals such as alkyl or aryl groups, functionalized metal halides, metal hydrogen halides or metal hydrides can be removed with very good results from inorganic silanes.

Examples include aluminum trichloride or iron (III) -chlohd as well as entrained particulate metals, which can come from continuous processes.

The contents of boron, aluminum, potassium, lithium, sodium,

Magnesium, calcium and / or iron are reduced, particularly preferably, the content of boron and iron in the composition or in the inorganic silane be significantly reduced, in particular, based on these metals

Compounds separated. As stated above, the compounds are often dissolved in the composition and can be poorly separated by distillation, such as BCI ₃ .

The inventive method is particularly suitable for the separation or

Reduction of foreign metal containing compounds whose boiling point is

Range of the boiling point of an inorganic silane or with this as

Azeotrope would pass. These foreign metal-containing compounds can sometimes be difficult to remove by distillation or not at all. As the boiling point, which is in the range of the boiling point of an inorganic silane compound, a boiling point is considered, which is in the range of ± 20 ⁰ C of the boiling point of one of the inorganic silanes at atmospheric pressure (about 1013.25 hPa or 1013.25 mbar). The compounds to be adsorbed are distinguished by the fact that they are generally completely dissolved in the composition and can only be separated off poorly by distillation.

In general, the foreign metal and / or the foreign metal-containing

Compound be reduced by 50 to 99 wt .-%. Preferably, the

Foreign metal content reduced by 70 to 90 wt .-%, preferably by 70 to 99 wt .-%, particularly preferably by 85 to 99 wt .-%. For iron containing

Compositions, the process allows a reduction of the residual content by 70 wt .-%, preferably 95 to 99 wt .-%. In general, for example, the iron content of a composition of inorganic silanes by 50 to 99 wt .-%, preferably 70 to 99 wt .-% and the boron content by at least 90 wt .-%, preferably by 95 to 99.5 wt .-% be reduced, especially in one process step.

The foreign metal content and / or the content of the foreign metal-containing compound in a composition may preferably be in the range from below 100 μg / kg to the detection limit, in particular below 25 μg / kg, with respect to the metallic compound, in particular independently , preferably below 15 μg / kg, more preferably 0.1 to 10 μg / kg, down to the respective limit of detection. To carry out the process, it is particularly preferred to use aminofunctionalized, aromatic polymers having alkyl-functionalized secondary, tertiary and / or quaternary amino groups as adsorbents. The alkyl groups may be linear, branched or cyclic, preferably methyl or ethyl.

According to the invention, amino-functionalized divinylbenzene-styrene copolymers can be used, i. H. Divinylbenzene crosslinked polystyrene resins, wherein the from the group of dialkylamino or dialkylaminomethylenfunktionalisierten divinylbenzene-styrene copolymers or thalkylammonium- or trialkylammoniummethylen- functionalized divinylbenzene-styrene copolymers are particularly preferred, in particular with alkyl is methyl or ethyl, preferably dimethyl- or trimethylaminomethyl-functionalized copolymers.

In addition to the dimethylaminofunktionalisierten with divinylbenzene crosslinked, porous polystyrene resins, other functionalized with quaternary and optionally tertiary amino groups functionalized with divinylbenzene, porous polystyrene resins for the treatment of inorganic silanes can be used. The

Adsorbents are all characterized by a high specific surface area and porosity.

The following formulas ideally illustrate the structure of the above-mentioned functionalized divinylbenzene-styrene copolymers:

alkyl

\ Dialkylaminofunktionalisiert.es

I N R '

/ Divinylbenzene-styrene copolymer,

alkyl

dialkylaminomethylenfunktionalisiert.es

Divinyl benzene-styrene copolymer,

alkyl

I _Θ ^A trialkylammoniurinfunktionalisertes

Alkyl N R '

I divinylbenzene-styrene copolymer

Alkyl as well

alkyl

I _Θ ^A trialkylamnunnunnnnnethylfunktionalisiertes

Alkyl N CH ₂ R '

I divinylbenzene-styrene copolymer,

Alkyl wherein R 'for a polymeric carrier, in particular crosslinked with divinylbenzene

Polystyrene, ie divinylbenzene-styrene copolymer, is independently alkyl, preferably methyl, ethyl, n-propyl, i-propyl, n-butyl or i-butyl, and ^{AΘ is} independently an anion, for example but not limited to the series OH ^Θ (hydroxy), Cl ^" (chloride), CH ₃ COO ^" (acetate) or HCOO ^" (formate) is, in particular OH ^Θ

Be particularly suitable for the inventive method prove with

Divinylbenzene crosslinked polystyrene resins having tertiary amino groups as

Adsorbents such as Amberlyst ^® A 21 an ion exchange resin based on cross-linked polystyrene divinylbenzene resin having dimethylamino groups on the polymeric backbone of the resin. Amberlyst ^® A21 is a weakly basic

Anion exchange resin which can be purchased in the form of free base and in spherical beads having an average diameter of about 0.49 to 0.69 mm and a water content of up to 54 to 60 wt .-% in relation to the total weight. The surface area is about 25 m ² / g and the mean pore diameter is 400

Angstroms.

Likewise can Amberlyst ^® A 26 OH, which is based on a quaternary trimethylammonium functionalized divinylbenzene-styrene copolymer and having a highly porous structure can be used for treatment according to the invention in the process. The average particle diameter of the adsorbent is usually 0.5 to 0.7 mm. The resin is sold as an ionic form (called "hydroxide" form, "OH"). The water content may be 66 to 75% by weight based on the total weight. The surface area is about 30 m ₂ / g with an average pore diameter of 290 angstroms.

In general, the treatment according to the invention will be at least one

inorganic silane-containing compositions carried out such that first the adsorbent is dried thoroughly to prevent hydrolysis of the silanes to be purified. The drying of the adsorbent is preferably carried out under vacuum, for example at elevated temperature and below 175 ⁰ C. Subsequently, the dried adsorbent, for example, under an inert gas atmosphere in the reactor, and brought into contact with the composition, optionally stirred. Suitably, the treatment is carried out at room temperature and atmospheric pressure for several hours. Typically, the composition is contacted with the adsorbent for between 1 minute to 10 hours, typically up to 5 hours. The recovery or separation of the purified composition is usually carried out by filtration, centrifugation or sedimentation. Preferably, the pretreatment of the absorbent takes place outside the reactor, thereby indicating the use of organic

Solvents are not needed for cleaning the adsorbent and for removing adhering water.

The process of the treatment can be discontinuous or continuous as needed. In batchwise treatment, the treatment can be carried out in a reactor, for example with stirring, or in a continuous

Treatment may include treatment in a flow-through reactor, e.g. B. one

Flow tube, done. The resulting composition based on at least one inorganic silane or a mixture containing at least one

Inorganic silane has a reduced by 50 to 99 wt .-% of foreign metal content and / or content of foreign metal-containing compound.

The invention likewise provides a method for treating a

Composition comprising at least one inorganic silane and at least one foreign metal and / or a foreign metal-containing compound, according to the above described method, wherein at least one inorganic silane corresponds to the general formula I,

Si _n H _a RbX ((2n + 2) -ab) (I) where n, a and b are integers and 1≤n≤5, 0≤a≤12, 0≤b≤12, and each X in the silane is different from each other independently of a halogen selected from the group of fluorine, chlorine, bromine or iodine, and each group R in the silane independently of one another correspond to a linear, branched and / or cyclic alkyl group having 1 to 16 carbon atoms or an aryl group. Where as an aryl group also alkyl-substituted aryls, with linear, branched or cyclic alkyl groups having 1 to 8 carbon atoms, understood. Particularly preferably, at least one silane of the general formula I with n = 1, X = chlorine, 0≤a≤3, 0≤b≤3 and a + b≤3 and R corresponds to a linear, branched and / or cyclic alkyl group 1 to 16 carbon atoms or an aryl group, more preferred are also silanes with n = 1, b = 1, 2 or 3 and a = 0, 1 or 2, in particular with n = 1, b = 1 and a = 0 for SiRX3 ..

Particularly preferred inorganic silanes include the chlorine-substituted monomeric silanes with n = 1 and X = Cl, such as, for example, tetrachlorosilane,

Trichlorosilane, trichloromethylsilane, trimethylchlorosilane, dimethyldichlorosilane,

Phenylmethyldichlorosilane, phenyltrichlorosilane, vinyltrichlorosilane, dihydrogendichlorosilane, dichlorosilane, monochlorosilane, methyltrichlorosilane. Preferably, the treatment of trichlorosilane is optionally carried out in mixtures with monosilane, dichlorosilane and / or tetrachlorosilane in a continuously operated reactor.

Preferably, the method is also suitable for the treatment of compositions containing compounds of the type of general formula I,

Si _n H _a RbX ((2n + 2) -ab) (I) where a, b and n are integers and n = 1, a = 4 or 0≤a≤3, 0≤b≤3 and a + b ≤3, or dimeric compounds where n = 2, 0≤a≤4, 0≤b≤4, and wherein each X in the silane is independently a halogen selected from the group consisting of fluorine, Chloro, bromo or iodo, and each group R in the silane independently of one another correspond to a linear, branched and / or cyclic alkyl group having 1 to 16 C atoms or an aryl group. Where as an aryl group also alkyl-substituted aryls, with linear, branched or cyclic alkyl groups having 1 to 8 carbon atoms, understood. In trimeric linear compounds n = 3, 0≤a≤8, O≤b≤8, where the substitution pattern of X and R may be as listed above. Similarly, the substitution pattern in tetrameric compounds is n = 4, 0≤a≤10, 0≤b≤10 and in pentameric linear compounds n = 5, 0≤a≤12, 0≤b≤12, where the substitution pattern of X and R as listed above, with the halogen-substituted compounds being preferred.

The foreign metal content and / or the content of the foreign metal-containing compound of this composition may preferably in each case with respect to the metallic compound, in each case to a content in the range of below 100 ug / kg, in particular of less than 75 ug / kg, preferably below 25 μg / kg, preferably below 15 μg / kg, more preferably below 10 μg / kg.

For carrying out the process, preference is given to using the abovementioned organic, alkylaminofunctional polymeric adsorbents, particularly preferably the dialkylamino-functionalized polymers.

The invention also provides the use of an organic

amino-functionalized polymeric adsorbent for reducing the content of at least one foreign metal and / or at least one foreign metal-containing compound from compositions comprising at least one inorganic silane, in particular a silane of the general formula I,

Si _n H _a RbX ((2n + 2) -ab) (I) where n, a and b are each integers with 1≤n≤5, 0≤a≤12, 0≤b≤12 and each X in the silane independently of one another a halogen and each group R in the silane independently of one another correspond to a linear, branched and / or cyclic alkyl group having 1 to 16 C atoms or an aryl group. Preferably, the composition contains an inorganic silane selected from the compounds of general formula I with n = 1, X = chlorine, 0≤a≤3, 0≤b≤3 and a + b≤3, wherein R independently of one another of a linear, branched and / or cyclic alkyl group having 1 to 16 C Atom or an aryl group. Also included is a composition containing a mixture of at least two of the silanes of general formula I.

The use for reducing the content is at least one

Foreign metal and / or at least one foreign metal-containing compound comprising compositions comprising at least one silane selected from monosilane, monochlorosilane, dichlorosilane, trichlorosilane, tetrachlorosilane, methyltrichlorosilane,

Dimethyldichlorosilane, trimethylchlorosilane or mixtures containing at least one of the silanes particularly preferred. According to the invention, the use according to claim 11 according to one of claims 1 to 10.

The invention also provides the use of the organic amino- functionalized polymeric, porous adsorbent, in particular Amberlyst A21 ^®, as an adsorbent, and at the same time as a catalyst for the disproportionation of a compound of formula I with b = 0, n = 1, a = 1, 2 or 3 and b = 1, 2, or 3 with a + b = 4, in particular of trichlorosilane and / or dichlorosilane to monosilane and / or

Tetrachlorosilane, in particular for the preparation of compounds of formula I with b = 0, n = 1, a = 0, 1, 2 or 4 or b = 0, 1, 2 or 4, preferably b = 4, with a + b = 4, preferred are compounds with a = 4 or b = 4, preferably in only one

Process step. Wherein the use is preferably carried out in a continuously operated reactor. As stated above, the adsorbent is used substantially anhydrous and solvent-free, in particular by being optionally washed with ultrapure water as described above and subsequently treated under vacuum and / or elevated temperature.

The invention is explained in more detail by the following examples. Examples

Example 1.1

Pretreatment of the adsorbent

The adsorbents are carefully dried prior to use in the process to prevent hydrolysis of the silanes to be purified.

Example 1.2

General procedure for the treatment of contaminated with foreign metals and / or metallic compounds silane

A defined amount of adsorbent is placed in a 500 ml stirred apparatus comprising a glass four-necked flask with condenser (water, dry ice), dropping funnel, stirrer, thermometer and nitrogen inlet and under vacuum (<1 mbar) (rotary vane pump) and at 95 ⁰ C. dried over 5 hours, then slowly aerated with dry nitrogen and cooled.

Subsequently, 250 ml of the silane to be purified are added via the dropping funnel. Over a period of 5 hours, the adsorption process is carried out under normal pressure at room temperature under a protective gas atmosphere.

The adsorbent is separated from the silane by passing it through a frit (Por. 4) into an evacuated 500 ml glass flask with a vent. Subsequently, the glass flask is vented with nitrogen and flushed with nitrogen

Schott glass bottle drained.

Example 1.3

The following example was carried out according to the general procedure with the amounts given here. 39.39 g Amberlyst ^® A 21 were as described in Example 1.2 according to the general procedure, pre-treated and 250 ml of trichlorosilane were added. The metal contents before and after treatment were determined by ICP-MS.

Table 1.3

Foreign metal contents before and after treatment:

Example 1.4 - Comparative Example

The Amberlite ^® XAD4 used in Comparative Example is based on cross-linked polystyrene with divinylbenzene, and in the form of small beads (mean 0 0.5 mm) is supplied wasserbefeuchtet. Amberlite XAD4 ^® has no additional functional groups on the polymeric backbone on, it is suitable, as outlined in the above reference, as adsorbent for the separation of metallic contaminants from chlorosilanes. The ability to adsorb is due to the absence of further functional groups due to the porous structure or interactions with the aromatic-rich polymer backbone.

40.13 g of Amberlite XAD4 ^® were as described in Example 1.2 according to the general procedure, pre-treated and 250 ml of trichlorosilane were added. The metal contents before and after treatment were determined by ICP-MS.

Table 1.4

Foreign metal contents before and after treatment:

Claims

claims

A process for treating a composition containing at least one inorganic silane and at least one foreign metal and / or a foreign metal-containing compound,

characterized,

that the composition contains at least one organic,

amino-functionalized polymeric adsorbent is contacted and recovering the composition in which the content of foreign metal and / or the foreign metal-containing compound is reduced.

2. The method according to claim 1,

characterized,

the inorganic silanes are selected from halosilanes,

Hydrogen halosilanes, organohydrogensilanes, hydrogen silanes, from substituted with at least one organic radical halosilanes and / or substituted with at least one organic radical hydrogenhalosilanes and / or mixtures of these silanes.

3 Method according to one of claims 1 or 2,

characterized,

that the foreign metal-containing compound is selected from

Metal halides, metal hydrides substituted with organic radicals

Metal halides and / or substituted with organic radicals metal hydrides.

4. The method according to any one of claims 1 to 3,

characterized,

that the boiling point of the foreign metal-containing compound is in the range of ± 20 ⁰ C of the boiling point of an inorganic silane at atmospheric pressure.

5. The method according to any one of claims 1 to 4,

characterized,

in that the foreign metal and / or the foreign metal-containing compound comprises boron, aluminum, sodium, potassium, lithium, magnesium, calcium and / or iron.

6. The method according to any one of claims 1 to 5,

characterized,

that the content of the foreign metal and / or the foreign metal-containing compound is reduced by 50 to 99 wt .-%.

7. The method according to any one of claims 1 to 6,

characterized,

that the adsorbent is used substantially anhydrous and free of organic solvents for treatment.

8. The method according to claim 7,

characterized,

in that the adsorbent is a divinylbenzene crosslinked polystyrene resin having tertiary amino groups and / or quaternary amino groups, wherein the amino groups are substituted by ethyl or methyl groups.

9. A method for treating a composition comprising at least one inorganic silane and at least one foreign metal and / or a foreign metal-containing compound according to any one of claims 1 to 8,

characterized,

that at least one inorganic silane corresponds to the general formula I,

Si _n H _a RbX ((2n + 2) -ab) (I) where n, a and b are each integers with 1≤n≤5, 0≤a≤12, 0≤b≤12 and each X in the silane independently of one another halogen and each group R in silane independently of one another correspond to a linear, branched and / or cyclic alkyl group having 1 to 16 C atoms or an aryl group.

10. The method according to any one of claims 1 to 9,

characterized,

that the silane is monosilane, monochlorosilane, dichlorosilane, trichlorosilane,

Tetrachlorosilane, methyltrichlorosilane, dimethyldichlorosilane and / or

Trimethylchlorosilane is.

11. Use of an organic, amino-functionalized, polymeric

Adsorbent for reducing the content of at least one foreign metal and / or at least one foreign metal-containing compound from

Compositions containing at least one inorganic silane according to one of claims 1 to 10.