WO2010109465A1 - Process for sintering nanoparticles at low temperatures - Google Patents
Process for sintering nanoparticles at low temperatures Download PDFInfo
- Publication number
- WO2010109465A1 WO2010109465A1 PCT/IL2010/000249 IL2010000249W WO2010109465A1 WO 2010109465 A1 WO2010109465 A1 WO 2010109465A1 IL 2010000249 W IL2010000249 W IL 2010000249W WO 2010109465 A1 WO2010109465 A1 WO 2010109465A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- process according
- nps
- substrate
- sintering
- pattern
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
- C23C24/085—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
- C23C24/085—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
- C23C24/087—Coating with metal alloys or metal elements only
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1283—After-treatment of the printed patterns, e.g. sintering or curing methods
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1131—Sintering, i.e. fusing of metal particles to achieve or improve electrical conductivity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
Definitions
- the nanoparticles are sphere-like particles or substantially spherical particles of a nanometric diameter.
- the formulation may also comprise at least one dispersant capable of promoting the formation and stabilization of the formulation of the invention, prior to application.
- the at least one dispersant is selected amongst polyelectrolites or polymeric materials capable of forming salts with a multitude of electrolytes.
- Representative examples of such dispersants include without limitation polycarboxylic acid esters, unsaturated polyamides, polycarboxylic acids, alkyl amine salts of polycarboxylic acids, polyacrylate dispersants, polyethyleneimine dispersants, and polyurethane dispersants.
- the dispersant is selected without limitation from: Disperse BYK® 190, Disperse BYK® 161, Disperse BYK® 163, Disperse BYK® 164, Disperse BYK® 2000 and Disperse BYK® 2001, all of which available from BYK; EFKA® 4046 and EFKA® 4047, available from EFKA; and Solsperse® 40000 and Solsperse® 24000 available from Lubrizol; and XP 1742 available from Coatex.
- the patterns were conductive, having a sheet resistance and resistivity of 0.078 ( ⁇ 0.005) ⁇ square and 7.8 ( ⁇ 0.5) ⁇ cm, respectively, while printed on Epson photo paper and 0.68 ( ⁇ 0.07) ⁇ square and 68 ( ⁇ 0.7) ⁇ cm, respectively, while printed on copier paper (these resistivities did not change over a period of at least 6 months).
- resistivities only 5 times higher than that of bulk silver (in the case of the photo paper), were reported until now only for metallic patterns heated at elevated temperatures [8,11] for extended periods while with the process of the invention, the low resistivity was achieved spontaneously at room temperature.
- the higher resistivity which was achieved on the copier paper was probably due to the surface roughness of the paper which affects the uniformity of the pattern and therefore reduces the number of percolation paths.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Powder Metallurgy (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
Claims
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10720202A EP2411560A1 (en) | 2009-03-24 | 2010-03-24 | Process for sintering nanoparticles at low temperatures |
US13/258,766 US20120168684A1 (en) | 2009-03-24 | 2010-03-24 | Process for sintering nanoparticles at low temperatures |
JP2012501501A JP2012521493A (en) | 2009-03-24 | 2010-03-24 | Nanoparticle sintering process at low temperature |
CN2010800189206A CN102686777A (en) | 2009-03-24 | 2010-03-24 | Process for sintering nanoparticles at low temperatures |
KR1020117025036A KR20130010101A (en) | 2009-03-24 | 2010-03-24 | Process for sintering nanoparticles at low temperatures |
IL215192A IL215192A0 (en) | 2009-03-24 | 2011-09-18 | Process for sintering nanoparticles at low temperatures |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US16274409P | 2009-03-24 | 2009-03-24 | |
US61/162,744 | 2009-03-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010109465A1 true WO2010109465A1 (en) | 2010-09-30 |
Family
ID=42315343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/IL2010/000249 WO2010109465A1 (en) | 2009-03-24 | 2010-03-24 | Process for sintering nanoparticles at low temperatures |
Country Status (6)
Country | Link |
---|---|
US (1) | US20120168684A1 (en) |
EP (1) | EP2411560A1 (en) |
JP (1) | JP2012521493A (en) |
KR (1) | KR20130010101A (en) |
CN (1) | CN102686777A (en) |
WO (1) | WO2010109465A1 (en) |
Cited By (27)
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JP2013137891A (en) * | 2011-12-28 | 2013-07-11 | Dowa Electronics Materials Co Ltd | Silver conductive film and method for producing the same |
CN103228110A (en) * | 2013-03-01 | 2013-07-31 | 溧阳市新力机械铸造有限公司 | Line resistance welding process for printed circuit board |
WO2013192437A2 (en) | 2012-06-22 | 2013-12-27 | C3Nano Inc. | Metal nanostructured networks and transparent conductive material |
WO2014120993A1 (en) | 2013-02-04 | 2014-08-07 | Eastman Kodak Company | Metal nanoparticle composition with water soluble polymer |
US8828536B2 (en) | 2013-02-04 | 2014-09-09 | Eastman Kodak Company | Conductive article having silver nanoparticles |
US8828502B2 (en) | 2013-02-04 | 2014-09-09 | Eastman Kodak Company | Making a conductive article |
US20140252274A1 (en) * | 2013-03-05 | 2014-09-11 | Georgeta Masson | Quantum dot (qd) delivery method |
US20140332723A1 (en) * | 2013-03-05 | 2014-11-13 | Juanita N. Kurtin | Quantum dot (qd) delivery method |
CN104254572A (en) * | 2012-04-27 | 2014-12-31 | 帝斯曼知识产权资产管理有限公司 | Electrically conductive polyamide substrate |
WO2015034579A1 (en) * | 2013-09-05 | 2015-03-12 | Henkel IP & Holding GmbH | Metal sintering film compositions |
WO2015034674A1 (en) * | 2013-09-04 | 2015-03-12 | Eastman Kodak Company | Method of forming conductive films with micro-wires |
WO2015084588A1 (en) | 2013-12-03 | 2015-06-11 | Eastman Kodak Company | Preparation of articles with conductive micro-wire pattern |
US9085699B2 (en) | 2013-01-22 | 2015-07-21 | Eastman Kodak Company | Silver metal nanoparticle composition |
CN105189666A (en) * | 2013-03-20 | 2015-12-23 | 爱克发-格法特公司 | A method to prepare a metallic nanoparticle dispersion |
US9328253B2 (en) | 2013-01-22 | 2016-05-03 | Eastman Kodak Company | Method of making electrically conductive micro-wires |
EP2871644A4 (en) * | 2012-07-03 | 2016-06-15 | Ishihara Chemical Co Ltd | Method for forming conductive film and sintering promoter |
WO2016151586A1 (en) * | 2015-03-25 | 2016-09-29 | Stratasys Ltd. | Method and system for in situ sintering of conductive ink |
US9680072B2 (en) | 2013-03-05 | 2017-06-13 | Pacific Light Technologies Corp. | Quantum dot (QD) delivery method |
US10000670B2 (en) | 2012-07-30 | 2018-06-19 | Henkel IP & Holding GmbH | Silver sintering compositions with fluxing or reducing agents for metal adhesion |
US20180287608A1 (en) * | 2013-02-26 | 2018-10-04 | C3Nano Inc. | Fused metal nanostructured networks, fusing solutions with reducing agents and methods for forming metal networks |
US10870772B2 (en) | 2014-07-31 | 2020-12-22 | C3Nano Inc. | Transparent conductive films with fused networks |
US11090858B2 (en) | 2014-03-25 | 2021-08-17 | Stratasys Ltd. | Method and system for fabricating cross-layer pattern |
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- 2010-03-24 JP JP2012501501A patent/JP2012521493A/en active Pending
- 2010-03-24 CN CN2010800189206A patent/CN102686777A/en active Pending
- 2010-03-24 US US13/258,766 patent/US20120168684A1/en not_active Abandoned
- 2010-03-24 KR KR1020117025036A patent/KR20130010101A/en not_active Application Discontinuation
- 2010-03-24 EP EP10720202A patent/EP2411560A1/en not_active Withdrawn
- 2010-03-24 WO PCT/IL2010/000249 patent/WO2010109465A1/en active Application Filing
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US20120168684A1 (en) | 2012-07-05 |
JP2012521493A (en) | 2012-09-13 |
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