WO2010090434A3 - 역류 방지 시스템 - Google Patents

역류 방지 시스템 Download PDF

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Publication number
WO2010090434A3
WO2010090434A3 PCT/KR2010/000649 KR2010000649W WO2010090434A3 WO 2010090434 A3 WO2010090434 A3 WO 2010090434A3 KR 2010000649 W KR2010000649 W KR 2010000649W WO 2010090434 A3 WO2010090434 A3 WO 2010090434A3
Authority
WO
WIPO (PCT)
Prior art keywords
vacuum pump
prevention system
backflow prevention
vacuum chamber
vacuum
Prior art date
Application number
PCT/KR2010/000649
Other languages
English (en)
French (fr)
Other versions
WO2010090434A2 (ko
Inventor
오재영
최한기
Original Assignee
Oh Jaeyong
Choi Hangi
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oh Jaeyong, Choi Hangi filed Critical Oh Jaeyong
Publication of WO2010090434A2 publication Critical patent/WO2010090434A2/ko
Publication of WO2010090434A3 publication Critical patent/WO2010090434A3/ko

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Abstract

본 발명은 역류 방지 시스템에 관한 것으로서, 보다 상세하게는 진공 챔버와 진공 펌프 사이에 설치되어 진공 펌프의 전원 이상 신호를 사용하여 신속하게 기체의 역류를 차단할 수 있는 역류 방지 시스템에 관한 것이다. 본 발명에 따른 역류 방지 시스템은, 진공 챔버와 진공 펌프 사이에 위치하여 상기 진공 펌프의 대기가 상기 진공 챔버로 역류하는 것을 방지하는 역류 방지 시스템에 있어서, 상기 진공 챔버와 상기 진공 펌프 사이의 배관에 설치되어 상기 배관을 차단하는 차단 밸브; 상기 진공 펌프의 전원의 이상 여부를 이용하여 상기 차단 밸브를 제어하는 밸브 제어부;를 구비하는 것을 특징으로 한다.
PCT/KR2010/000649 2009-02-05 2010-02-03 역류 방지 시스템 WO2010090434A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020090009265A KR100962547B1 (ko) 2009-02-05 2009-02-05 역류 방지 시스템
KR10-2009-0009265 2009-02-05

Publications (2)

Publication Number Publication Date
WO2010090434A2 WO2010090434A2 (ko) 2010-08-12
WO2010090434A3 true WO2010090434A3 (ko) 2010-11-04

Family

ID=42369842

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/000649 WO2010090434A2 (ko) 2009-02-05 2010-02-03 역류 방지 시스템

Country Status (2)

Country Link
KR (1) KR100962547B1 (ko)
WO (1) WO2010090434A2 (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109162925A (zh) * 2018-10-31 2019-01-08 浙江羿阳太阳能科技有限公司 一种用于铸锭炉的防回流真空泵
KR102073789B1 (ko) * 2019-07-05 2020-02-05 김태화 반도체 제조 장비용 펌프 백 스트림 방지 구조

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050111818A (ko) * 2004-05-24 2005-11-29 삼성전자주식회사 반도체 소자 제조장비에서의 진공라인 잠금장치
KR20060102447A (ko) * 2005-03-23 2006-09-27 삼성전자주식회사 반도체 제조설비의 배기장치
KR20070000063A (ko) * 2005-06-27 2007-01-02 삼성전자주식회사 반도체 기판 가공 장치의 진공 시스템 및 이의 모니터링방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6041817A (en) 1998-08-21 2000-03-28 Fairchild Semiconductor Corp. Processing system having vacuum manifold isolation
KR20070024113A (ko) * 2005-08-26 2007-03-02 삼성전자주식회사 반도체 제조 공정에서 사용되는 진공 시스템

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050111818A (ko) * 2004-05-24 2005-11-29 삼성전자주식회사 반도체 소자 제조장비에서의 진공라인 잠금장치
KR20060102447A (ko) * 2005-03-23 2006-09-27 삼성전자주식회사 반도체 제조설비의 배기장치
KR20070000063A (ko) * 2005-06-27 2007-01-02 삼성전자주식회사 반도체 기판 가공 장치의 진공 시스템 및 이의 모니터링방법

Also Published As

Publication number Publication date
KR100962547B1 (ko) 2010-06-14
WO2010090434A2 (ko) 2010-08-12

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