WO2010089399A1 - Micro-relief structures - Google Patents
Micro-relief structures Download PDFInfo
- Publication number
- WO2010089399A1 WO2010089399A1 PCT/EP2010/051521 EP2010051521W WO2010089399A1 WO 2010089399 A1 WO2010089399 A1 WO 2010089399A1 EP 2010051521 W EP2010051521 W EP 2010051521W WO 2010089399 A1 WO2010089399 A1 WO 2010089399A1
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- WIPO (PCT)
- Prior art keywords
- layer
- fixing layer
- relief pattern
- layered structure
- relief
- Prior art date
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Definitions
- the present invention relates to micro-relief structures, and structures employing embedded thin film structures, and to methods of producing the same.
- any perturbation of the material may allow the metal element to be easily removed from the plastics and subsequently reused in counterfeited security device or related tool.
- the present invention therefore seeks to provide a solution to such problems in which an> counterfeit, or disassembly, attempt could lead to non-reversible disintegration of the original forensic feature.
- the invention relates to a deposition of a relatively thin metallic, or non-metallic, film on a material that can receive for example a micro-relief pattern, for example such as a thermoplastic material with a microrelief embossed on the surface and subsequent fixation of the relief.
- a protective layer which, again, could comprise a thermoplastic material, or for example a silicon-based material. It should be appreciated also that this further layer could likewise comprise an over-painted. or over-deposited, layer exhibiting appropriate adhesion between the various materials. Lamination with another film is also another likely possibility. The presence of such a thin layer on the relief essentially changes its mechanical properties.
- the required elements/features could be entirely buried within the body of the structure or could simply be arranged to comprise the outermost surface thereof and whether or not including any further protective layer.
- the relief can be advantageously fixed through the thin film for further applications and technological steps, where the thermoplastic material is exposed to higher temperature even reaching or exceeding a melting point, when the microrelief itself would disappear or be seriously modified or somehow disturbed.
- This can advantageously be used in further exploitation of the microrelief, e.g. for security devices.
- the embossed material can be laminated with another thermoplastic film in such way that certain portions of the relief where no fixation of the relief is present would loose any information about the original microrelief, whilst the sections of being fixed via the approach described in the invention is preserved after the lamination. This can be generally used for such tasks when a certain material (e.g.
- This invention also relates to the manufacture and composition of articles containing a new security device, i.e. when the embedded thin film foil-like discrete elements bear a holographic and spatial information. Further, the elements are spatially organized and distributed in such a way, that can be read or detected by means of the electromagnetic radiation, or the parts of the foil are arranged in such a way, that can be detected by means of the optical tomography or a radar assisted technique, for example.
- the present invention there is provided a method of fixing a micro-relief structure such as for example a diffractive and/or holographic structure, to be formed in relation to the substrate body and through the provision of a protective layer/film material over the structure.
- the protective layer/film has no or only limited, effect on the optical properties of the relief structure.
- the substrate can comprise a thermoplastic material and the protective layer/film can comprise a metallic layer of film advantageously grown on the relief structure of the substrate material.
- the invention can allow for the provision of a selectively located fixing layer which can, for example, comprise a grown layer or a demetallised layer, and which serves to fix the relief pattern in its required form an offer subsequent protection particularly during possible further processing steps.
- a selectively located fixing layer which can, for example, comprise a grown layer or a demetallised layer, and which serves to fix the relief pattern in its required form an offer subsequent protection particularly during possible further processing steps.
- the invention also provides for a method of forming a thin fixing-layer structure, such as for example a thin metallic film/layer structure, or an organic or inorganic material layer, within a bulk body and comprising the selective deposition of the metal layer/film, in a patterned manner if required, upon an intermediate exposed surface of the bulk body and prior to further processing with a second layer of the bulk body.
- the further process comprises lamination and. in particular, further processing can serve to unify the two portions of the bulk body into a unitary member with the metallic layer/film eventually buried and/or embedded therein.
- the metallic layer/film can be formed in association with, or on a relief structure of the bulk substrate body and in a manner as defined above.
- the metallised layer/film over the relief structure can serve to not only protect the relief structure due in further processing'lamination of the substrate but likewise serves to lead to selective provision of a patent diffractive structure insofar as the further processing/lamination of the substrate is specifically designed Io allow for destruction of regions of the relief structure not so protective.
- the method also provides for the provision of a visibly discernable motif and/or graphical character and comprising a plurality of spatially located embedded layer/film segments and exhibiting a predefined spatial location which can be interrogated through the application of appropriate radiation.
- Each of said layer/film elements can advantageously be formed in accordance with the further steps such as those noted above.
- the invention can provide for a combination of any of the processing steps and of course to the provision of structures such as those formed in accordance with such methods and wherein the layer/ film structures can be such as those discussed above.
- the metallic film or any other appropriate non-nonmetallic material, has to be applied, and as a further example, metal elements can be grown but not removed from the surface as in WO 2005/078530. They can remain the surface and would cause the fixation of the relief.
- the galvanized layer may thus be essentially thinner than previously known as the metallic body is not necessarily self-supporting (self-standing). It should be just as thin as needed to copy the relief. Of course thicker elements are useful as well. However, the provision of a particularly thin layer also leads to further advantageous effects and features. For example, with a relatively thick layer, i.e.
- the required relief pattern will be accurate! copied on one side of the interface, however, the opposite side of the layer will not bear any such details of the relief pattern and will appear substantially flat If, however, the thickness of the deposited layer is compatible with the height depth of the relief, that is, for example, not more than two or three times the depth, the reliet can be replicated on both sides of the deposited layer such that both interfaces offered by the layer with them rep ⁇ icatud the relief structure
- All such steps are preferably done towards a further lamination, where the hologram (embossed surface) situated in the interface when two thermoplastic bodies being instantly attached.
- the invention advantageously employs controlled deposition of the layer in order to fix, or to maintain the relief when further processed. This can be done either through direct deposition on top of the embossed surface, the layer would copy the relief. Another way is to deposit a specialty layer, being then embossed and further processed. Of course, any appropriate masking technique, with a recess being exposed and developed, or any appropriate printing technique properly defining the required shield (14) and the borders thereof can be provided.
- the invention deals with a way of presenting the relief. In other case the relief will be definitely lost, either melted during the lamination, or there will be no refractive index contrast, so the relief would have zero optical properties.
- the invention also relates to the controlled distribution of the layer can thus be as thin as few tens of nm, what is new regarding the application mentioned above.
- the layer is advantageously just thick enough to "freeze " ' the relief of to exhibit some optical properties change.
- Fig 1 is a schematic cross section through an embossed substrate for forming a structure according to an embodiment of the present invention
- I- igs 2a-2c are schematic plan views ot a substrate such as that of Fig I and illustrating different processing steps of an embodiment of the invention;
- Figs 3a-3c illustrates further process steps of the structure of Figs 2a-2c;
- Fig 4 is a plan view of the substrate illustrating different forms of shapes and graphical motifs that can be provided within a substrate in accordance with an embodiment of the present invention
- Fig 5 shows in greater detail one of the motifs illustrated in Fig 4;
- Fig 6 illustrates a variety of forms of antennae configurations accordingly to an embodiment of the present invention
- Fig 7 illustrates the examples of different patterns formed within the substrate in accordance within the present invention.
- Figs 8a and 8b show the formation of brief elements at different levels, positions within a substrate according to an embodiment of the present invention.
- one particular aspect of the present invention relates to the provision of a "fixed" micro relief structure that can readily be provided in a discrete and isolated manner, within the body of a. for example, thermoplastic substrate,
- the substrate is provided preferably consisting of at least one substrate layer, for example a thermoplastic layer, or any other appropriate material such as PE I , and wherein a micro-, or nano-relief structure is embossed and subsequently ccvered with an ultra thin conductive film/layer.
- the layer can be formed continuously covering the surface of the thermoplastic substrate or, alternatively, can be arranged to remain/ cover only selected portions of substrate such as in a patterned manner or otherwise I he ultra lhin conductive layer is substantially thinner than the height of the relief and therefore offers minimum influence over the optical, diffractivc and/or mechanical properties of the relief.
- a layered structure 10 comprising an embossed substrate 12 comprising a thermo plastic substrate 12 having an embossed micro or nano relief pattern formed thereon prior to, as an example, the selected formation of a electro- insulating material shield 14.
- the embossed substrate 12, and its relief pattern is galvanized in the regions not covered by the shield 14 and so as to form a grown layer 16, comprising an ultra thin metal film in the illustrated example and which serves to "fix" the holographic relief offered b> the relief pattern on the underlying substrate 12.
- a grown layer 16 comprising an ultra thin metal film in the illustrated example and which serves to "fix" the holographic relief offered b> the relief pattern on the underlying substrate 12.
- the effects of metal layer' film 16 can be from a few nm to a few mm.
- an alternative process would be to print or otherwise deposit some for of dielectric material on top of the surface of the substrate prior to embossing. A specific colour could be chosen whether for the layer 16 of Fig 1. or whether as part of a printed dielectric and, if the latter, the layer/film can be subsequently patterned due to an appropriate photographic-type technique in order to yield the desired surface pattern.
- a schematic view of a further substrate 18 is provided accordingly to an embodiment of the present invention and upon which a holographic diffraetive relief plan 20 is formed as illustrated in Fig 2a.
- the holographic relief pattern in this example is embossed on the surface of the substrate 18.
- the upper surface bearing the relief pattern 20 is then itself patterned, either directly by printing or through a lithographic/masking type process or in accordance with the example illustrated in Fig 1 such that patterned overlying metal films 22, 24 are then provided on the relief of the substrate 18 and at the pre selected locations.
- the introduction of the patterned metal films 22, 24 to the relief structure 20 serves to "fix" the relief structure of the underlying substrate 18 in ihe portions beneath the patterns 22. 24.
- the relief pattern within the portions, 22, 24 is actually provided b> way of the metal film which, as noted, while fixing the relief structure, offer a generally very limited influence on the optical/physical characteristics of the relief structure and as illustrated further in Fig 2c.
- the substrate 18 Fig 2c with its selectively '"fixed " ' regions 22, 24 of micro structure can then be further processed, for example, by way of an additional step of lamination.
- Such a further laminated step is illustrated in Figs 3a-3b.
- the substrate 18 with the embossed, now metallised hologram areas 22, 24 is covered with a further layer of thermoplastic material 26 as illustrated in Fig 3a.
- the required layer can be provided in an inverse manner, that is through a selective de-metallisation, or other material-removal, procedure in order to arrive at a required pattern of fixing element.
- the two thermoplastic elements i.e. the additional layer 26 and the substrate 18 become a single bulk body 18, 26 as illustrated in Fig 3b and with the metallised relief patterns 22, 24 encased within that combined body
- the invention envisages any appropriate adhesive— assisted technique, and techniques involving the fusing of layers, for providing the required structure.
- the holographic relief patterns found within the thermoplastic substrate 18 not covered by the metal 22, 24 is perturbed, and generally totally disappears, by virtue of the further laminating process-particularly since the relief pattern in those areas has not been fixed by the addition of the metal film as indeed, the case at locations 22. 24,
- a top view of the combined laminating body is illustrated at Hg 3c from which the stripes 22 24 are clearly visible and which carry holographic information of the original micro structure of the substrate 18.
- various patterning techniques can be employed so as to form a wide variety of various shapes and graphical motifs in accordance with the present invention.
- the invention is not limited to the "S" stripes such as illustrated in Figs 2 and 3. Rather, a thermoplastic body 28 can be provided with a wide variety of shapes and motifs" such as the series dots 30, lines 32, random dots 34, or organised dots 36.
- Fig 5 there is provided an illustration of one of the possible patterns comprising the general motif 40 of Fig 4 and which, as confirmed by the details of Fig 5, is formed from a patterned array of small dots/elements 46,
- the coordinate position and dimensions of each of the dots such as illustrated by a ⁇ a 2 , a,, bi, bi; and ci, C 2 can be employed to not only combined to provide a readiiy identifiable visual indication of the motif but can, through their predefined spatial orientation, serve to provide a configuration of such dots/elements 46 that can be readily detectable through use of electromagnetic wave interrogation, for example radar-assisted techniques through observing a diffractive pattern of the structure.
- electromagnetic wave interrogation for example radar-assisted techniques through observing a diffractive pattern of the structure.
- the characteristic size of each particular element, as well as the spacing between such elements can be varied, and to some extent be dependent upon, the actual technique employed for the graphical termination of the elements.
- the use of standard optical lithographic and masking techniques, as well as printing techniques allows for precision in the order of the few microns, and features in the region of 1 ⁇ m could be provided.
- advanced optical lithographic techniques generally UV assisted, or even electron beam writing techniques, can offer potential depiction of details of the element has small as 100 ran. In this manner, the particular details of the relief structure could be of a size compatible with the characteristic size of the release itself.
- metallised structures embedded within a substrate can themselves comprise electronic components and Fig 6, illustrates the substrate 50 having metallised portions forming a dipole antenna 52 with width w and length 1, and an inductor-type antenna 54 and a butterfly antenna 56 having the triangular half loops with the respective dimensions e, W n and e - 2 as indicated.
- the sizes of the particular elements that can he achieved by way of this technique offer advantageous features insofar as a variety of rudimentary electronic elements working within a broad spectrum of frequencies, for example up to FH/ can be provided.
- the methods embodying the present invention allows for the production of ices from the category of so called photonic devices and meta-material devices.
- Fig 7 shows another arrangement in which the embedded metallised portions within a substrate 58 having an integrated circuit or electronic device 60 therein and comprising conductive contacts 62 therefor.
- the provision for such connective structures are particularly useful for standard electronic configurations, such as that employed for Surface Mounted Devices or for applications such as printed electronics or nanoembossed electronic elements.
- Figs 8a and 8b there are illustrated various metal elements provided at different levels within a thermoplastic bulk body 64. That is, from the perspective front view of Fig 8a, and the side view of Fig 8b, it will be appreciated that both elements 66. 68 are provided at an upper level within the bulk body 64, whereas the element 70 is provided a lower level.
- the present invention can provide for a method of forming a relief pattern as part of a layered structure and comprising, forming a relief pattern on the surface of a layer of the said structure and subsequently forming a protective fixing layer on at least part of the said relief pattern and serving to protect the underlying relief pattern during any subsequent processing of the said structure, and thereby also provides for a layered structure, generally comprising a substrate having a relief pattern formed on a surface of the substrate and wherein at least a portion of the said relief has been provided with a protective fixing layer serving to retain the characteristics of the relief pattern during any subsequent processing of the structure such as. for example, when forming a laminate structure with the relief pattern provided therein.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Electromagnetism (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Credit Cards Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BRPI1008128A BRPI1008128A2 (en) | 2009-02-09 | 2010-02-08 | "method for forming a relief pattern as part of a stratified structure, and stratified structure". |
US13/147,328 US20130189489A1 (en) | 2009-02-09 | 2010-02-08 | Micro-relief structures |
RU2011137153/12A RU2566928C2 (en) | 2009-02-09 | 2010-02-08 | Microrelief structure, |
CA2751013A CA2751013A1 (en) | 2009-02-09 | 2010-02-08 | Micro-relief structures |
CN201080007141.6A CN102307719B (en) | 2009-02-09 | 2010-02-08 | Micro relief profile |
MX2011008103A MX2011008103A (en) | 2009-02-09 | 2010-02-08 | Micro-relief structures. |
JP2011548722A JP2012517610A (en) | 2009-02-09 | 2010-02-08 | Micro relief structure |
EP10703844A EP2393653A1 (en) | 2009-02-09 | 2010-02-08 | Micro-relief structures |
AU2010210070A AU2010210070B2 (en) | 2009-02-09 | 2010-02-08 | Micro-relief structures |
IL214329A IL214329A0 (en) | 2009-02-09 | 2011-07-28 | Micro-relief structures |
ZA2011/05633A ZA201105633B (en) | 2009-02-09 | 2011-07-29 | Micro-relief structures |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0902000.9 | 2009-02-09 | ||
GBGB0902000.9A GB0902000D0 (en) | 2009-02-09 | 2009-02-09 | Micro-relief structures |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2010089399A1 true WO2010089399A1 (en) | 2010-08-12 |
Family
ID=40469716
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2010/051521 WO2010089399A1 (en) | 2009-02-09 | 2010-02-08 | Micro-relief structures |
Country Status (14)
Country | Link |
---|---|
US (1) | US20130189489A1 (en) |
EP (1) | EP2393653A1 (en) |
JP (1) | JP2012517610A (en) |
KR (1) | KR20110119786A (en) |
CN (1) | CN102307719B (en) |
AU (1) | AU2010210070B2 (en) |
BR (1) | BRPI1008128A2 (en) |
CA (1) | CA2751013A1 (en) |
GB (1) | GB0902000D0 (en) |
IL (1) | IL214329A0 (en) |
MX (1) | MX2011008103A (en) |
RU (1) | RU2566928C2 (en) |
WO (1) | WO2010089399A1 (en) |
ZA (1) | ZA201105633B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2752305A1 (en) | 2013-01-07 | 2014-07-09 | Istituto Poligrafico e Zecca dello Stato S.p.A. | A method of making variable diffractive metallic microelements in a laminable plastic body |
WO2018193195A1 (en) * | 2017-04-19 | 2018-10-25 | Idemia France | Method for producing a security device composed of stacked layers and method for authenticating such a security device |
EP3888929A1 (en) | 2020-03-31 | 2021-10-06 | NWM Research Spolka z ograniczona Odpowiedzialnoscia Spolka komandytowa | A method of manufacturing a discretized optical security microstructure on a substrate and a shim for use in the method |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015161834A1 (en) | 2014-04-23 | 2015-10-29 | Merit Chain Limited | Method of manufacturing laminate and the laminate |
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GB2300379A (en) * | 1995-04-05 | 1996-11-06 | Applied Holographics | Application to substrates of elements or films which have a surface relief pattern providing an optically variable effect |
WO2004024836A2 (en) * | 2002-09-13 | 2004-03-25 | Jds Uniphase Corporation | Alignable diffractive pigment flakes |
WO2005078530A1 (en) | 2004-02-12 | 2005-08-25 | Optaglio S.R.O. | Metal identification platelet and method of producing thereof |
US20070089831A1 (en) * | 2005-10-17 | 2007-04-26 | Celerino Florentino | Card with hologram formed over magnetic strip |
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JPS58198007A (en) * | 1982-05-14 | 1983-11-17 | Ricoh Co Ltd | Diffraction grating having protective film |
KR860009325A (en) * | 1985-05-07 | 1986-12-22 | 기다지마 요시도시 | Transparent Hologram |
JPS63108374A (en) * | 1986-10-25 | 1988-05-13 | Dainippon Printing Co Ltd | Duplicating method for hologram |
JPH06214117A (en) * | 1992-08-04 | 1994-08-05 | Nippondenso Co Ltd | Hologram and its sticking method |
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JP4254367B2 (en) * | 2003-06-17 | 2009-04-15 | 凸版印刷株式会社 | Transfer sheet and manufacturing method thereof |
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JP2006272816A (en) * | 2005-03-30 | 2006-10-12 | National Printing Bureau | Printed matter and its reading out device |
JP2006330487A (en) * | 2005-05-27 | 2006-12-07 | Nidec Sankyo Corp | Optical element, method of manufacturing optical element, and optical desk device |
JP2007148074A (en) * | 2005-11-29 | 2007-06-14 | Dainippon Printing Co Ltd | Light diffracting sheet |
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-
2009
- 2009-02-09 GB GBGB0902000.9A patent/GB0902000D0/en not_active Ceased
-
2010
- 2010-02-08 RU RU2011137153/12A patent/RU2566928C2/en not_active IP Right Cessation
- 2010-02-08 EP EP10703844A patent/EP2393653A1/en not_active Withdrawn
- 2010-02-08 BR BRPI1008128A patent/BRPI1008128A2/en not_active IP Right Cessation
- 2010-02-08 CN CN201080007141.6A patent/CN102307719B/en not_active Expired - Fee Related
- 2010-02-08 US US13/147,328 patent/US20130189489A1/en not_active Abandoned
- 2010-02-08 JP JP2011548722A patent/JP2012517610A/en active Pending
- 2010-02-08 AU AU2010210070A patent/AU2010210070B2/en not_active Expired - Fee Related
- 2010-02-08 CA CA2751013A patent/CA2751013A1/en not_active Abandoned
- 2010-02-08 MX MX2011008103A patent/MX2011008103A/en not_active Application Discontinuation
- 2010-02-08 WO PCT/EP2010/051521 patent/WO2010089399A1/en active Application Filing
- 2010-02-08 KR KR1020117020891A patent/KR20110119786A/en not_active Application Discontinuation
-
2011
- 2011-07-28 IL IL214329A patent/IL214329A0/en unknown
- 2011-07-29 ZA ZA2011/05633A patent/ZA201105633B/en unknown
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GB2300379A (en) * | 1995-04-05 | 1996-11-06 | Applied Holographics | Application to substrates of elements or films which have a surface relief pattern providing an optically variable effect |
WO2004024836A2 (en) * | 2002-09-13 | 2004-03-25 | Jds Uniphase Corporation | Alignable diffractive pigment flakes |
WO2005078530A1 (en) | 2004-02-12 | 2005-08-25 | Optaglio S.R.O. | Metal identification platelet and method of producing thereof |
US20070089831A1 (en) * | 2005-10-17 | 2007-04-26 | Celerino Florentino | Card with hologram formed over magnetic strip |
Cited By (5)
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EP2752305A1 (en) | 2013-01-07 | 2014-07-09 | Istituto Poligrafico e Zecca dello Stato S.p.A. | A method of making variable diffractive metallic microelements in a laminable plastic body |
WO2018193195A1 (en) * | 2017-04-19 | 2018-10-25 | Idemia France | Method for producing a security device composed of stacked layers and method for authenticating such a security device |
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EP3888929A1 (en) | 2020-03-31 | 2021-10-06 | NWM Research Spolka z ograniczona Odpowiedzialnoscia Spolka komandytowa | A method of manufacturing a discretized optical security microstructure on a substrate and a shim for use in the method |
WO2021197692A1 (en) | 2020-03-31 | 2021-10-07 | Nwm Research Sp. Z O.O. Sp. K. | A method of manufacturing a discretized optical security microstructure on a substrate and a shim for use in the method |
Also Published As
Publication number | Publication date |
---|---|
MX2011008103A (en) | 2011-11-18 |
ZA201105633B (en) | 2016-07-27 |
RU2566928C2 (en) | 2015-10-27 |
CN102307719A (en) | 2012-01-04 |
CN102307719B (en) | 2015-11-25 |
AU2010210070B2 (en) | 2015-11-12 |
AU2010210070A1 (en) | 2011-08-18 |
JP2012517610A (en) | 2012-08-02 |
GB0902000D0 (en) | 2009-03-11 |
KR20110119786A (en) | 2011-11-02 |
CA2751013A1 (en) | 2010-08-12 |
RU2011137153A (en) | 2013-03-27 |
IL214329A0 (en) | 2011-09-27 |
BRPI1008128A2 (en) | 2016-03-08 |
EP2393653A1 (en) | 2011-12-14 |
US20130189489A1 (en) | 2013-07-25 |
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