JPS63108374A - Duplicating method for hologram - Google Patents

Abstract

PURPOSE:To duplicate a large volume of holograms by applying electron beam or ultraviolet-ray setting resin to a substrate to form a precured resin layer, forming a light reflective thin film layeron the surface of the resin layer, pressing the thin film layer against a hologram plate, and then projecting electron beams to set the resin layer. CONSTITUTION:Electron beam, ultraviolet-ray or heat setting resin is applied to the surface of the substrate 1, electron beams or ultraviolet rays are projected to the resin or heating the resin to form the precured resin layer 2. The light reflective thin film 3 is formed on the resin layer 2 to form a hologram duplicating sheet 10. The hologram plate 20 is pressed against the sheet 10. After removing the sheet 10, electron beams 40 is projected to the resin layer 2 to completely set the resin layer 2, so that a duplicated hologram can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a hologram duplication method suitable for mass duplication.

(Prior Art) A relief hologram, which is a type of hologram, is one in which interference fringes corresponding to the wavefront of light from an object are recorded by an uneven pattern on the hologram surface. This type of hologram can be easily and mass-produced by embossing the uneven shape of the interference fringes onto a transparent thermoplastic resin.

Specific methods for duplicating such a hologram include: ■ Heat and press a hologram master onto a transparent thermoplastic resin to form hologram irregularities on the resin surface, and then apply a light-reflective fill! using vacuum deposition or the like. A method of forming and replicating one layer.

■ A method of forming a light-reflecting thin film layer on the surface of a transparent thermoplastic resin by vacuum evaporation or the like, and then heating and pressing a hologram master onto the light-reflecting thin film layer to form hologram irregularities for duplication. No. 1986-65466), etc.

(Problems to be Solved by the Invention) However, in the first method, after forming the uneven shape of minute interference fringes corresponding to the wavefront of light on the resin layer,
In order to form a light-reflective thin film layer, the light-reflective thin film layer does not sufficiently follow the deep parts of the interference fringes or the small parts of the uneven pinch, resulting in an uneven thin film, or the unevenness of the resin layer. There is also the problem of not being able to reproduce a sufficiently good hologram image due to dust and dirt being taken in during the process, and the manufacturing problem of having to perform a vapor deposition process each time for small loft objects. Complications and the resulting S! There is a problem of high I-manufacturing costs.

The second method solves the four points of the first method, but has the problem that the resin is naturally limited in order to form an appropriate uneven shape of the hologram by heating and pressurizing. The reproduced hologram does not have sufficient heat resistance, so when used as a transfer sheet, there is a problem that the uneven shape recorded on the hologram will be deformed or even disappear due to the heat during the transfer process. be.

(Means for Solving the Problems) As a result of various studies, the present inventor coated an electron beam curable resin, an ultraviolet ray curable resin, or a thermosetting resin on a base film, and coated the resin with an electron beam or a thermosetting resin. The precure resin layer obtained by precuring by irradiating with ultraviolet rays or heating has appropriate thermoformability and surface hardness, and a uniform light-reflecting Fi film layer is formed on the resin surface by vacuum deposition. can be formed, and has light reflective properties! Heat-pressure molding using embossing from above allows the uneven shape formed on the mold surface to be faithfully formed.Furthermore, the resin layer is completely cured by irradiating it with an electron beam, resulting in heat-resistant properties. The inventors completed the present invention by discovering that the material has solvent resistance, light resistance, and strength, and can be fully used as a transfer sheet, and that the hologram transferred to the base material reproduces a good hologram image. It is something.

That is, the present invention applies an electron beam curable resin, an ultraviolet ray curable resin, or a thermosetting resin onto a base film, and precures the resin by irradiating it with an electron beam or ultraviolet rays or heating it. After forming a precure resin layer, a hologram duplication resin sheet is created by forming 11 light-reflective film layers on the precure resin layer, and then a light-reflective thin film layer of the hologram duplication resin sheet, A hologram master plate, on which holographic interference light fringes corresponding to the wavefront of light from an object are formed in an uneven shape, is pressed or heated and pressed, and then an electron beam is irradiated to completely cure the resin layer. , Said hologram?
The gist of the present invention is a method for replicating a hologram, characterized in that a hologram is replicated by forming the uneven shape of the interference fringes on the surface of a sheet made by X-ray.

Hereinafter, the present invention will be explained in detail based on the drawings.

FIGS. 1, 2, and 3 are explanatory diagrams schematically showing the steps of an example of the hologram duplication method of the present invention.

As shown in FIG. 1, the method for manufacturing a hologram of the present invention is to first coat a base film l by a conventional coating method such as a gravure coating method or a roll coating method, or by a conventional printing method such as a conventional printing method. After forming a resin layer by applying an electron beam curable resin, ultraviolet ray curable resin, or thermosetting resin to a coating thickness of 0.1 to 50 μm, preferably 0.5 to 10 μm using offcent, letterpress, silk screen, etc. , A curing means corresponding to the applied resin, for example, if it is electron beam or ultraviolet ray irradiation, it is applied by irradiating electron beam or ultraviolet ray 5 at an appropriate intensity from the base film l side or the resin layer side. Pre-cure resin F by pre-curing the resin or heating it to pre-cure the resin.
Form J2.

Pre-curing conditions vary depending on the resin used and the thickness of the + cloth, but the pre-cured resin will rise from room temperature to 3.
Conditions for curing with moldability at about 00°C are required.

The film pre-cured under these conditions is not completely cured, but the surface is not sticky and the film can be wound up. In addition, the light reflection properties of the post-process
In the vacuum evaporation process for forming N, the surface does not change due to thermal attack during evaporation (a uniform mirror-like evaporation layer ii is formed). During embossing by pressure or heating, the hologram has appropriate heat deformability because it is not completely cured, and the fine irregularities of the hologram can be well pressed.

As the above-mentioned base film 1, any film-like material can be used. Specifically, films of polyester, polyimide, polymethyl methacrylate, polystyrene, polyvinyl butyral, polycarbonate, synthetic paper, metal films, etc. can be used. The thickness of this base film l is not particularly limited, and is 1 to 1000,
El, preferably 30 to 2000, u i''.

Specifically, the following two types of resins having radically polymerizable unsaturated groups can be used as the electron beam curable resin, ultraviolet ray curable resin, or thermosetting resin used in the present invention.

(1) Polymers having radically polymerizable unsaturated groups, such as acrylic resins, polyester resins, and polyurethanes having at least one of reactive groups such as hydroxyl groups, carboxyl groups, epoxy groups, aziridinyl groups, amino groups, sulfone groups, and isocyanate groups. Those created by introducing radically polymerizable unsaturated groups into polymers or prepolymers such as resins, polystyrene resins, melamine resins, etc. by the reactions (a) to (d) described below: ゛(a) Water In the case of the polymer or prepolymer having 111 groups, a monomer having a carboxyl group such as (meth)acrylic acid is subjected to a condensation reaction.

(b) In the case of the polymer or prepolymer having a carboxyl group or a sulfone group, the polymer or prepolymer has a hydroxyl group (
A condensation reaction is performed with a meth)acrylic acid ester derivative.

(C) In the case of the above polymer or prepolymer having an epoxy group, isocyanate group or aziridinyl group, a monomer having a carboxyl group such as a (meth)acrylic acid ester derivative having a hydroxyl group or (meth)acrylic acid is added. let

(d) In the case of the above polymer or prepolymer having a hydroxyl group or a carboxyl group, an Affi form having an epoxy group or a monomer or diisocyanate compound having an aziridinyl group and a hydroxyl group-containing acrylic acid ester monomer per 1 mole. The adduct of is subjected to an addition reaction.

To carry out each of the above reactions, it is preferable to add ml of a polymerization inhibitor such as hydroquinone and carry out the reaction while blowing dry air.

(2) A compound having a radically polymerizable unsaturated group, specifically a single unit or a mixture of uHL monomers or oligomers such as acrylic acid, methacrylic acid, acrylic ester, methacrylic ester, acrylamide, methacrylamide, etc. is preferable. In addition, although the above materials can be sufficiently cured by electron beams, when curing by ultraviolet irradiation, benzoin ethers such as benzoquinone, benzoin, and benzoin methyl ether, halogenated acetophenones, Those that generate radicals when irradiated with ultraviolet rays, such as biacetyls, can be used.

Next, as shown in FIG. 2, on the precure resin layer 2,
A light reflective thin film layer 3 is formed, and a resin sheet 10 for hologram reproduction is created. Regarding the light reflection characteristics +1213, when the hologram is a reflective type, a metal thin film that reflects light is used, and when the hologram is a transparent type, a hologram that produces a hologram effect and does not hide the underlying layer is used. An effective thin film is used, and both can be appropriately selected and used depending on the purpose.

Specifically, the metal thin film used in the case of a reflection hologram is C'', Ti%Fe%CO%Ni
s Cu %A g s A u s G e s
Al, Mg5Sb, Pb, Pd%Cd%B i, Sn
<Se s I n s Ga % A thin film formed using a metal such as Rh, its oxide, nitride, etc. alone or in combination of two or more is used. Among the above metals, AI, Cr, Nis Ag, Au, etc. are particularly preferred, and the film thickness thereof is 10 to 10,000, preferably 20
It is preferable that it is 0-2.000A.

The hologram effect thin film used in the case of a transparent hologram can be made of any light-transmitting material that can produce the hologram effect. transparent material,
l1lIIN of a reflective metal compound with a thickness of 200 Å or less
can be mentioned. In the former case, the refractive index is the same as that of the hardened resin layer 4.
It may be larger or smaller, but the difference in refractive index is 0.1
The above value is preferable, and more preferably 0.5 or more.According to the experiments of the present inventor, 1.0 or more is optimal. By providing transparent 7m film layers having different refractive indexes in this manner, a hologram is expressed and the lower layer is not hidden.

In the latter case, although there are 11 layers of reflective metal compounds, the thickness is less than 200 Å, so the transmittance of light waves is high (therefore, it exhibits a hologram effect and a transparent part non-concealing effect).

Furthermore, by setting the film thickness to 200 Å or less, the unnatural appearance of the conventional high-luminance silvery gray color can be eliminated.

As the material of the thin film layer, for example, the following materials (1) to (6) can be used.

+1) A transparent continuous thin film with a higher refractive index than the hologram forming layer.There are two types of transparent continuous thin film: one that is transparent in the visible region and one that is transparent in the infrared or ultraviolet region.The former is shown in Table 1, and the latter is shown in Table 2. In the 0 tables shown in , n represents the refractive index (hereinafter, (2
) to (5).)

Table 1 Visible region transparent body material n Material n5bt Ss
3. OSiO2, OFew Os '2
．． 7 1 noz 2.0PbO2,6Y* O
s 1.9 ZnSe 2.6 TiO1,9CdS
2.6 Thaw 1.9Big 03
2. 4 Six Os 1. 9TiO*
2.3 PbF* 1.8PbC1x
2.3 Ca2ol 1.8 Cent
2.2 Mg0 1.7Tax Os
2.2 Alt Os 1.6ZnS
2.2 LaFs 1.6ZnO2,I
CeFt 1.6CdO2,I NdFs
1.6NdtOs 2゜l 5ift
1.5Sb*Os 2. O5ins 1
．． 5 Table 2 Transparent material in infrared or ultraviolet region? 1n CdSe 3.5 CdTe 2.6 G e 4.0~4.4 Hf02 2.2 PbTe 5.6 3i 3.4 To 4. 9 TICl 2.6 ZnTe 2. 8 (2) Transparent with a higher refractive index than the hologram forming layer? A
The dielectric materials are shown in Table 3.

Table 3 Material n CuC12,0 CuBr 2.2 GaAa 3.3-3.6 Ga P 3.3-3.5 NA CHt 6 1.6 LiNbQ3 2.3 LiTa03 2.2 BaTiOs 2. 4 SrTi03 2. 4 KTa0. 2. 2 (3) Table 4 shows transparent continuous thin films having a lower refractive index than the hologram forming layer.

Table 4 Material n LiF 1.4 MgF 1.4 3NaF-AIFs 1.4 AIF l.4 NaF 1.3 GaFt '1.3 (4) Reflective metal with a thickness of 200 Å or less in Reflective metal f
Ill has a complex refractive index, where n is nm
It is expressed as n l K. n is the refractive index, and K is the absorption coefficient. The materials of the reflective metal thin film layer used in the present invention are shown in Table 5, and the above n and K are also shown in the same table.

Fifth surface material M n K Re 2. 7 0. 9 Mg O, 66, 1 Ca O, 38, 1 Cr 3. 3 1. 3 Mn 2. 5 1. 3 Cu O,72,4 Ag O,13,3 AI O,85,3 Sb 3.0 1.6 Pd 1.9 1.3 Ni 1. 8 1. 8 Sr 0. 6 3. 2 Ba 0. 9 1. 7 La 1.8 1. 9 C@ 1.7. 1.4 Au 0. 3 2. 4 Other materials include Sn%In5Te, Fe%co
% Zfi% Ga, Pb% Cd, B 1.5 Bit*
Ga, Rh, etc. can be used. See you on &! Oxides, nitrides, etc. of the metals listed above can also be used, and metals, their oxides, nitrides, etc. can also be used alone.
Two or more of each can be used in combination.

(5) Resin having a different refractive index from the hologram forming layer The hologram forming layer may have a large or small refractive index, examples of which are shown in Table 6.

Table 6 Resin n Polytetrafluoroethylene 1.35 Polychlorotrifluoroethylene 1.43 Vinyl acetate resin
1.46 polyethylene
1.52 Polypropylene 1.49
Methyl mecrylate 1.49 nylon
1.53 polystyrene
1.60 polyvinylidene chloride
1.62 Vinyl butyral resin 1.48
Vinyl formal resin 1.50 Polyvinyl chloride 1.53 Polyester resin
1.55 Stone Coal Water Lumin Resin
1.60 In addition to the above, -a synthesis 4M! 1 can be used, but a resin having a large difference in refractive index with the hologram forming layer is particularly preferred.

(6) Laminate formed by appropriately combining the materials (1) to (5) above The combinations of the materials (1) to (5) above are arbitrary;
Further, the vertical positional relationship of each layer in the layer structure is arbitrarily selected.

Among the thin film layers (1) to (6) above, the thin l1 of (4)
5! The thickness of the layer is 200 Å or less, but +1) to (3)
The thickness of the m film layer in (5) and (6) may be within the transparent range of the material forming the thin film;
0000 people is preferable, more preferably 100-500 people
There are 0 people.

The method for forming the light-reflective thin film layer 3 on the precure resin layer 2 is applicable when the thin film layer is a thin film layer of a metal compound and when the material is a hologram effect layer, the material is from (1) to (1) above.
If the material is 4), general thin film forming methods such as vacuum evaporation, sputtering, ion blating, plating, etc. can be used, and if the thin film layer is a hologram effect layer and the material is In the case of the material mentioned in (5) above, a -M coating method or the like can be used. In addition, the thin film layer is a hologram effect layer and its material is the above (
In the case of the material 6), the above-mentioned means and methods are used in combination as appropriate.

Next, as shown in FIG. 3, a hologram copying resin sheet 1O and a hologram original plate 2, which is a stamping mold on which interference fringes corresponding to the wavefront of light from an object are formed in an uneven shape, are formed on the mold surface.
0 is brought into pressure contact with the light reflective thin film layer 3 by a roll 30, which is a pressurized or heated pressure roll, so that the light reflective thin film layer 3 is in contact with the mold surface of the hologram original plate 20, and an uneven shape is formed only on the light reflective thin film layer 3. Embossed or light reflective thin film F13
After embossing a concavo-convex shape on both layers of the hologram master 20 and the precure resin N2, the electron beam 40 is irradiated with the hologram original plate 20 and the hologram duplication resin sheet 10 having the concavo-convex shape stamped on its surface separated. The precure resin layer 2 is completely cured to maintain the uneven shape, and a hologram sheet 50 having a replicated hologram is obtained.

The hologram original plate 20 has irregularities formed on its surface, which are interference fringes of a hologram corresponding to the wavefront of light from an object. This hologram original plate 20 can be created by a conventionally known method, and its material may be metal or resin (in short, any material that can form unevenness, which is the interference fringes of the hologram) is fine. In addition, the hologram formed on such a hologram original plate 10 may be used as a flat plate, or may be provided on a roll surface and used in a curved state. It is a type of hologram that can record interference fringes two-dimensionally.Specifically, Fresnel hologram, image hologram, rainbow hologram, holographic ink stereo duram,
A holographic ink diffraction grating or the like is used.

Hologram original plate 20 and hologram duplication resin sheet 10
When performing pressure welding or heat pressure welding, a means such as a pressure roll or a heating roll can be used, and the temperature of the heating roll at this time varies greatly depending on the type of resin to be used, the material and thickness of the base film, etc. Although it varies, the temperature ranges from room temperature to 300°C, preferably 100 to 200°C. Further, the hologram original plate 20 and the resin sheet 10 for hologram duplication have a weight of 0.1 pupil/- or more, preferably 5 kg/c.
It is preferable to press the resin sheet 10 for hologram duplication under a pressure of 0.1 m/sin to 50 m/sin.
m/win preferably 0.5m/s+in~lo a/
It is sin. Naturally, when using fixed heat pressure welding, the above-mentioned conveyance speed is 0.

In the present invention, the electron beam may be irradiated once and then irradiated again to fully cure the resin, but usually the resin is sufficiently cured with one irradiation.

The amount of electron beam irradiation is determined depending on the resin used, but the amount of irradiation that can sufficiently cure the resin is required, and is usually in the range of 3 Mrad to 30 Mrad.

In addition, in the present invention, a protective layer for protecting the uneven shape of the formed hologram is provided with a light reflecting property m)I! It can be provided on N. Examples of resins that form such a protective layer include thermosetting resins, ultraviolet curable resins, room temperature curable resins, and electron beam curable resins that have a certain degree of abrasion resistance, stain resistance, solvent resistance, etc. A wide range of resins can be used, such as cellulose resins, acrylic resins, urethane resins, epoxy resins, olefin resins, polyester resins, melamine resins, and vinyl acetate resins.

Mixtures, copolymers, etc. can be used.

In forming the protective layer, the resin is coated with a light-reflecting thin film layer by a coating method such as a gravure coating method, a roll coating method, or a conventional printing method such as offset, letterpress, or silk screen. It can be formed by coating the resin to an appropriate thickness and then curing it using a curing means that corresponds to the resin used.

FIG. 4 is a cross-sectional view of a hologram sheet 50 having a hologram replicated as described above, in which a cured resin layer 4 and a light reflective thin film layer 3 are sequentially laminated on a base film l. .

FIG. 5 is a cross-sectional view of a hologram transfer sheet 60 using the hologram sheet 50.

The hologram transfer sheet 60 can be obtained by forming the heat-sensitive adhesive layer 6 on the light-reflective thin film layer of the hologram sheet 50 obtained as described above, and the heat-sensitive adhesive layer 6 can be formed using a general method. It can be formed with a thickness of about 3 to 20 μm using a heat-sensitive adhesive by a conventional coating method or printing method.

Further, although not shown, a peeling layer for facilitating hologram transfer can be provided between the base film 1 and the resin WJ4.

Transfer of the hologram using this hologram transfer sheet 60 is performed by placing the surface of the heat-sensitive adhesive layer 5 on the object to be transferred and applying heat and pressure from the base film side.

(Effects of the Invention) According to the hologram duplication method of the present invention, the electron beam curable resin, ultraviolet ray curable resin, or thermosetting resin coated on the base film is irradiated with an electron beam or ultraviolet rays, or
Alternatively, since precure is performed by heating, the precure resin layer has appropriate thermoformability and surface hardness, and a uniform light-reflective thin film layer can be formed on the resin surface by vacuum deposition. , in heating and pressure molding of uneven shapes by embossing on the light reflective thin film layer,
The uneven shape formed on the mold surface can be formed faithfully. Moreover, since the resin can be made into a suitably cured body by precuring, the range of selection of the resin to be used is expanded, and it becomes possible to use a resin having optical characteristics suitable for a hologram.

Furthermore, the replicated hologram obtained by completely curing the resin layer by irradiating electron beams has heat resistance, solvent resistance, light resistance, and high strength, so even when used as a transfer sheet, it is difficult to transfer. The uneven shape of the surface does not change during heating, and since the resin is completely cured, the transferred hologram does not whiten due to heating and can reproduce a good hologram image. can.

(Examples) Hereinafter, the present invention will be explained in more detail based on specific examples.

Example 1 A resin liquid having the following composition was applied to a thickness of 2μ by gravure coating on a polyethylene terephthalate film having a thickness of 25μ as a base material.
At a position 10cm below a mercury lamp of W/cm, 10a+/mi
The resin was passed through at a speed of n to precure to form a precure resin layer. This film could be rolled up without the surface becoming sticky.

Next, on the precure resin layer, aluminum was deposited to a thickness of 300 ml by vacuum evaporation to form a light reflective thin film layer, thereby creating a resin sheet for hologram reproduction.

Next, a mold in which a hologram uneven shape is formed is brought into close contact with the surface of the light-reflective thin film layer of the resin sheet for hologram duplication created in this manner under heat and pressure, and then a strength of 175 kV and 10 Mrad is applied from the film side. The resin layer was completely cured by irradiating it with an electron beam to reproduce the hologram and obtain a hologram sheet.

The obtained hologram had excellent heat resistance and solvent resistance, and reproduced a good hologram image.

In addition, similarly good holograms were obtained when precure was performed under electron beam irradiation conditions of 3 Mrad.

Resin liquid composition (1) Urethane acrylate of the following general formula 100 parts RalIA (CHm) scOh1CHgCIItO
hirRt-Ra-+0CIItCII*hHOC(CH
m) =shi1h+1. -2 + fl + afi 2 (2) 4 parts of Irgakiev 184 (manufactured by Ciba Geigy) (
3) Methyl ethyl ketone 300 parts Example 2 A prepolymer of melanin acrylate (
average molecular weight 10.000) too part is 2-butanone/
A resin solution dissolved in 300 parts of a cyclohexanone mixed solvent was applied at 8 g/@'' by gravure coating, followed by hot air drying at 120° C. for 1 minute to pre-air the resin to form a pre-air resin layer.

Next, aluminum was deposited to a thickness of 300 mm on the pre-quenching resin layer using a vacuum evaporation method to form a light-reflecting thin film layer, thereby producing a resin sheet for hologram reproduction.

Next, a mold in which the uneven shape of the hologram is formed is brought into close contact with the surface of the light-reflective thin film layer of the resin sheet for hologram duplication created in this way under heat and pressure. The resin layer was completely cured by irradiating it with an electron beam to reproduce the hologram and obtain a hologram sheet.

The obtained hologram had excellent heat resistance and solvent resistance, and reproduced a good hologram image.

In addition, similarly good holograms were obtained when pre-airing was performed under the electron beam irradiation condition IF4rad and when it was performed at a speed of 1011/sin at a position 10 cm below a mercury lamp with ultraviolet irradiation conditions 8ON/c-. It was done.

Example 3 A polyethylene terephthalate film with a thickness of 25μ as a base material was placed on top, and acrylic resin (Acrynal 110G
, Toei Kasei (4m'M) dissolved in 100 parts of methyl ethyl ketone/toluene mixed solvent was applied to a thickness of 0.5 μm by gravure coating and dried to form a release layer.

Next, in the same manner as in Example 1, the hologram was duplicated to obtain a hologram sheet.

Next, an acrylic adhesive (Acrynal #300, manufactured by Toei Kasei) was applied to the hologram replication surface of the obtained hologram sheet to a thickness of 8# using a gravure coating method to form a heat-sensitive adhesive layer. A hologram transfer sheet was obtained.

The surface of the heat-sensitive adhesive layer of the obtained hologram transfer sheet was placed on paper and heated at -150°C with a pressure crab of 10 kg/c 8
Hot stamping was performed under the conditions of 0 hours: 1 minute,
The hologram was transferred to paper.

The transferred hologram reproduced a good hologram reproduction image.

Example 4 A hologram was duplicated to obtain a hologram sheet in the same manner as in Example 2, except that SbgSs was formed as a light-reflective 1M4 layer to a thickness of 300 mm by vacuum evaporation.

The obtained hologram had excellent heat resistance and solvent resistance, reproduced a good hologram image, and was able to see the scenery on the opposite side through the hologram.

Comparative Example 1 In Example 1, the film was wound up without being pre-cured with ultraviolet rays, but the film blocked and could not be used. In addition, after applying resin,
Immediately, when aluminum was vacuum-deposited, the resin softened due to heat attack during vacuum-deposition, and the deposited surface turned white.

Comparative Example 2 A hologram transfer sheet was produced in the same manner as in Example 3, except that the electron beam was not irradiated after embossing. This hologram transfer sheet was transferred to paper under the same conditions as in Example 3, but due to the lack of heat resistance, the aluminum y1 film layer turned white after transfer, making it impossible to transfer a good hologram.

[Brief explanation of the drawing]

FIG. 1, FIG. 2, and FIG. 3 are explanatory diagrams schematically showing the steps of an example of the hologram duplication method of the present invention.
The figure is a partial sectional view of a hologram sheet having a hologram reproduced by the method of the present invention, and FIG. 5 is a partial sectional view of a hologram transfer sheet using the hologram sheet. l-...Base film 2...-Precured resin layer 3...-
・Light reflective thin film layer 4...Cured resin layer 5...Electron beam or ultraviolet ray for precure
......Resin sheet for hologram duplication 40...
...Electron beam or ultraviolet light for curing 50 ... Hologram sheet 60 ... Hologram transfer sheet Applicant
Dai Nippon Printing Co., Ltd. Agent Patent Attorney Atsumi Konishi] Figure 3

Claims (1)

[Claims] Applying an electron beam curable resin, an ultraviolet ray curable resin, or a thermosetting resin onto the base film, and precure the resin by irradiating it with an electron beam or ultraviolet rays or heating it to form a precure resin layer. After that, a light reflective thin film layer is formed on the precure resin layer to create a resin sheet for hologram duplication, and then the light reflective thin film layer of the hologram duplication resin sheet and the surface of the resin sheet are coated with light from an object. The hologram original plate, in which the interference light fringes of the hologram corresponding to the wavefront are formed in an uneven shape, is pressed or heated and pressed, and then the resin layer is completely cured by irradiation with an electron beam to form the hologram duplication sheet. A method for duplicating a hologram, comprising duplicating a hologram by forming the uneven shape of the interference fringes on a surface.