WO2010074481A3 - Half tone mask and fabricating method - Google Patents

Half tone mask and fabricating method Download PDF

Info

Publication number
WO2010074481A3
WO2010074481A3 PCT/KR2009/007666 KR2009007666W WO2010074481A3 WO 2010074481 A3 WO2010074481 A3 WO 2010074481A3 KR 2009007666 W KR2009007666 W KR 2009007666W WO 2010074481 A3 WO2010074481 A3 WO 2010074481A3
Authority
WO
WIPO (PCT)
Prior art keywords
half tone
tone mask
fabricating method
transmittance
optical transmittance
Prior art date
Application number
PCT/KR2009/007666
Other languages
French (fr)
Other versions
WO2010074481A2 (en
Inventor
Seung Ho Back
Joo Hyun Hwang
Jin Ho Hong
Seung Han Kang
Original Assignee
Lg Innotek Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Innotek Co., Ltd. filed Critical Lg Innotek Co., Ltd.
Priority to JP2011543423A priority Critical patent/JP2012513620A/en
Priority to CN2009801518848A priority patent/CN102265381A/en
Publication of WO2010074481A2 publication Critical patent/WO2010074481A2/en
Publication of WO2010074481A3 publication Critical patent/WO2010074481A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof

Abstract

A half tone mask and a fabricating method is disclosed where the half tone mask capable of adjusting optical transmittance is provided by stacking translucent materials, wherein the optical transmittance can be implemented that is built up through data base based on, not the theoretical behavior characteristic, but on the actual process, whereby the half tone mask having a transmittance in a wide range of regions, rather than a transmittance in a particular region, can be provided.
PCT/KR2009/007666 2008-12-22 2009-12-22 Half tone mask and fabricating method WO2010074481A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011543423A JP2012513620A (en) 2008-12-22 2009-12-22 Halftone mask and manufacturing method thereof
CN2009801518848A CN102265381A (en) 2008-12-22 2009-12-22 Half tone mask and fabricating method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2008-0130806 2008-12-22
KR1020080130806A KR101079161B1 (en) 2008-12-22 2008-12-22 Half tone mask and fabricating method

Publications (2)

Publication Number Publication Date
WO2010074481A2 WO2010074481A2 (en) 2010-07-01
WO2010074481A3 true WO2010074481A3 (en) 2010-09-16

Family

ID=42288275

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2009/007666 WO2010074481A2 (en) 2008-12-22 2009-12-22 Half tone mask and fabricating method

Country Status (5)

Country Link
JP (1) JP2012513620A (en)
KR (1) KR101079161B1 (en)
CN (1) CN102265381A (en)
TW (1) TWI575304B (en)
WO (1) WO2010074481A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5233802B2 (en) * 2009-04-01 2013-07-10 大日本印刷株式会社 Gradation mask and gradation mask manufacturing method
CN105684040B (en) 2013-10-23 2020-04-03 皇家飞利浦有限公司 Method of supporting tumor response measurement
CN107132724B (en) * 2017-05-10 2019-11-26 深圳市华星光电技术有限公司 A kind of preparation method of mask plate and array substrate
CN108803232A (en) * 2018-05-31 2018-11-13 云谷（固安）科技有限公司 Exposure light shield and preparation method thereof, photoresist graphic method and engraving method
KR102254646B1 (en) * 2018-07-30 2021-05-21 호야 가부시키가이샤 Method for correcting photomask, method for manufacturing photomask, photomask, and method for manufacturing display device
CN111965887A (en) * 2020-09-18 2020-11-20 信利(仁寿)高端显示科技有限公司 Mask manufacturing method and color film substrate manufacturing process

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980018010A (en) * 1996-08-26 1998-06-05 키타오카 타카시 Phase shift mask and its manufacturing method
KR20030084781A (en) * 2002-04-26 2003-11-01 호야 가부시키가이샤 Half-tone type phase shift mask blank and half-tone type phase shift mask
KR20070098382A (en) * 2006-03-31 2007-10-05 엘지마이크론 주식회사 A half tone mask having multi-half permeation part and a method for manufacturing thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0862826A (en) * 1994-08-19 1996-03-08 Toshiba Corp Mask for exposure and its production and production of semiconductor device
KR100922800B1 (en) * 2005-05-27 2009-10-21 엘지디스플레이 주식회사 Half tone mask and Method of fabricating the same, and Fabricating method of display device using the same
WO2007034930A1 (en) * 2005-09-21 2007-03-29 Dai Nippon Printing Co., Ltd. Photomask having gradation sequence and method for manufacturing same
JP4570632B2 (en) * 2006-02-20 2010-10-27 Ｈｏｙａ株式会社 Four-tone photomask manufacturing method and photomask blank processed product
KR101255616B1 (en) * 2006-07-28 2013-04-16 삼성디스플레이 주식회사 Multi-tone optical mask, method of manufacturing the same and method of manufacturing thin film transistor substrate using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980018010A (en) * 1996-08-26 1998-06-05 키타오카 타카시 Phase shift mask and its manufacturing method
KR20030084781A (en) * 2002-04-26 2003-11-01 호야 가부시키가이샤 Half-tone type phase shift mask blank and half-tone type phase shift mask
KR20070098382A (en) * 2006-03-31 2007-10-05 엘지마이크론 주식회사 A half tone mask having multi-half permeation part and a method for manufacturing thereof

Also Published As

Publication number Publication date
KR101079161B1 (en) 2011-11-02
CN102265381A (en) 2011-11-30
WO2010074481A2 (en) 2010-07-01
JP2012513620A (en) 2012-06-14
KR20100072403A (en) 2010-07-01
TWI575304B (en) 2017-03-21
TW201033727A (en) 2010-09-16

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