WO2010066999A1 - Procédé et dispositif de traitement d'au moins un composé transporté dans un liquide - Google Patents
Procédé et dispositif de traitement d'au moins un composé transporté dans un liquide Download PDFInfo
- Publication number
- WO2010066999A1 WO2010066999A1 PCT/FR2009/052434 FR2009052434W WO2010066999A1 WO 2010066999 A1 WO2010066999 A1 WO 2010066999A1 FR 2009052434 W FR2009052434 W FR 2009052434W WO 2010066999 A1 WO2010066999 A1 WO 2010066999A1
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- WIPO (PCT)
- Prior art keywords
- radial
- cavitation
- chamber
- liquid
- inlet
- Prior art date
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- 239000007788 liquid Substances 0.000 title claims abstract description 56
- 150000001875 compounds Chemical class 0.000 title claims abstract description 39
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- 230000000694 effects Effects 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 4
- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachlorophenol Chemical compound OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 description 4
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 241000894006 Bacteria Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
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- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/34—Treatment of water, waste water, or sewage with mechanical oscillations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/44—Mixers in which the components are pressed through slits
- B01F25/441—Mixers in which the components are pressed through slits characterised by the configuration of the surfaces forming the slits
- B01F25/4412—Mixers in which the components are pressed through slits characterised by the configuration of the surfaces forming the slits the slits being formed between opposed planar surfaces, e.g. pushed again each other by springs
- B01F25/44121—Mixers in which the components are pressed through slits characterised by the configuration of the surfaces forming the slits the slits being formed between opposed planar surfaces, e.g. pushed again each other by springs with a plurality of parallel slits, e.g. formed between stacked plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/40—Static mixers
- B01F25/44—Mixers in which the components are pressed through slits
- B01F25/441—Mixers in which the components are pressed through slits characterised by the configuration of the surfaces forming the slits
- B01F25/4412—Mixers in which the components are pressed through slits characterised by the configuration of the surfaces forming the slits the slits being formed between opposed planar surfaces, e.g. pushed again each other by springs
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/306—Pesticides
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/32—Hydrocarbons, e.g. oil
- C02F2101/322—Volatile compounds, e.g. benzene
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/36—Organic compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/36—Organic compounds containing halogen
- C02F2101/363—PCB's; PCP's
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor
Definitions
- the present invention relates to the field of the treatment of compounds, such as compounds or chemical or organic species or microorganisms.
- Undesirable chemical compounds are often found in polluted water, for example by volatile compounds such as hydrocarbons or chlorinated compounds (trichlorethylene for example) or by low volatility compounds such as PCBs (Polychlorobiphenyl) PCP (Pentachlorophenol) used as fungicides or certain molecules considered as endocrine disruptors. These bodies are most often carcinogenic and cause disorders in animals and men.
- US 6,200,486 discloses a device which comprises an inner cylindrical wall having orifices and an outer cylindrical wall, forming a large gap therebetween. As in the documents cited in the preceding paragraph, the flow at the outlet of the orifices is in the form of jets in this large space.
- US 4,585,357 discloses a device which comprises a radial micro-slot in front of which is installed, at a great distance, a deflection wall. Here again, the flow through the slit produces dispersion jets.
- JP 11 42432 discloses a device in which two opposite flows collide. The resulting flow flows radially and is discharged into a peripheral evacuation chamber, again in the form of dispersion jets.
- DE 3728946 discloses a device in which an axial flow is deflected to a radial chamber which has a peripheral opening. This chamber is frustoconical and formed so that its thickness is reduced by going outwards. Turbulence effects occur only beyond the peripheral opening of the radial chamber in the large exhaust chamber.
- the document JP 2008/207099 describes a device in which the liquid is introduced axially into a blind hole and is evacuated by divergent frustoconical radial channels arranged in the wall of the blind hole, away from the bottom. It is in fact, in each frustoconical radial channel diverging from a Venturi type operation, axially to this channel.
- the present invention aims to produce a particular cavitation capable of improving the mechanical and / or chemical and / or bacteriological and / or micro-organisms on the compound or compounds carried in a liquid to be treated.
- the present invention is based on cavitation which causes the formation of bubbles or pockets of vapor in a liquid under the effect of depressions and in which the bubbles or pockets of vapor produced during this depression then condense abruptly when the pressure is rising.
- this rapid condensation also called collapse, takes place in times of for example between one tenth of a second and one microsecond depending on the initial size of the bubble or pocket, this reaction being able to be fast enough for the gases are compressed and heat up to higher temperatures for example at 2000 0 C, thus producing a plasma.
- the present invention seeks in particular to increase the combined effects of the intense turbulence prevailing in the collapse zone of bubbles or cavitation pockets and very high speeds of the wall of the latter; and / or to increase the effects resulting from the plasma produced in the bubbles or cavitation pockets and capable in particular of producing radiation in the liquid; and / or destroying compounds present in bubbles or cavitation pockets; and / or generating the production of molecules, ions or species or chemical radicals capable of migrating into the liquid and acting on the compounds that the liquid carries; and / or to produce intense sound waves in the liquid.
- the present invention firstly relates to a method of treating a compound, such as a chemical compound and / or organic and / or a microorganism, carried by a liquid.
- This method is such that two substantially radial faces disposed opposite one another delimit between them a radial cavitation chamber, one of said faces having an axial inlet orifice arranged axially in its central part and said faces forming a peripheral opening.
- the liquid, fed axially through the axial inlet orifice, is deflected and flows into said radial cavitation chamber in various radial directions towards the peripheral exit opening; and that the thickness of said cavitation chamber (18) between said radial faces is chosen to be between 0.1 and 0.25 times the diameter of said axial inlet orifice, preferably 0, 14.
- the liquid flow conditions generate bubbles or pockets of cavitation in the first portion of the radial flow around the central inlet port. Also, bubbles or cavitation pockets implode before reaching the peripheral exit opening, in order to at least partially treat said compound in said cavitation chamber.
- the distance between the axis of said central inlet port and said peripheral opening of said cavitation chamber may be chosen to be greater than twice the diameter of said central inlet port.
- the ratio between the absolute pressure upstream of said cavitation chamber and the pressure downstream of this chamber may be between 1, 5 and 6.
- the present invention also relates to a device for treating at least one compound, such as a chemical compound and / or organic and / or a micro-organic, transported by a liquid.
- This device comprises a first element having a substantially radial face and a substantially axial inlet of the liquid inlet and a second element having a substantially radial face.
- Said radial faces are arranged vis-à-vis so as to form therebetween a space forming a radial cavitation chamber having a peripheral exit opening, said axial orifice input of the first element opening into a central portion of the cavitation chamber opposite said radial face of the second element.
- the thickness of said cavitation chamber, between said radial faces, is between 0.1 and 0.25 times the diameter of said axial inlet orifice, preferably 0, 14.
- the liquid brought axially through the axial inlet orifice, is deflected in the central inlet portion and flows into said radial cavitation chamber in various radial directions towards the peripheral exit opening and the conditions of the the liquid flow generates bubbles or pockets of cavitation in the first part of this flow, around the central inlet orifice, and that the bubbles or cavitation pockets implode before reaching the peripheral exit opening, to at least partially treat said compound.
- Said radial faces delimiting said radial cavitation chamber may be parallel.
- the distance between the axis of the central inlet orifice and said peripheral opening of said cavitation chamber may be greater than twice the diameter of said central inlet orifice.
- Said peripheral outlet opening of said radial cavitation chamber may communicate with a secondary chamber connected to at least one outlet passage.
- Another processing means may be associated with said secondary chamber, in particular an emission means generating ultraviolet radiation in said secondary chamber.
- the first element and the second element may comprise two walls forming between them a space, one of the walls having a plurality of liquid inlet ports and the other wall having a plurality of outlet orifices, so as to forming in said space and between said inlet ports and said outlet ports a plurality of cavitation chambers.
- the inlet ports may open into an inlet manifold and the outlets may open into the inlet manifold.
- an outlet collecting chamber said walls being annular and concentric, preferably cylindrical or concentric, or flat.
- Said first element may have a chamfer on the edge of said axial inlet orifice, this chamfer can be rounded and have a radius of between 0.1 and 0.5 times the distance between said radial faces in the central part of the chamber.
- cavitation or be frustoconical being disposed at an angle of between 30 ° and 60 °, preferably at 45 °, and a height, along the axis of said axial inlet port, between 0, 1 and 0.5 times the distance between said radial faces in the central portion of the cavitation chamber.
- FIG. 1 shows a longitudinal section of a treatment device
- FIG. 2 shows a cross section along H-II of the processing device of Figure 1;
- FIG. 3 represents an enlarged radial section of the cavitation chamber of the treatment device of FIG. 1;
- FIG. 4 shows a longitudinal section of an alternative embodiment of the treatment device
- FIG. 5 represents a radial section along V-V of the processing device of FIG. 4;
- FIG. 6 shows a longitudinal section of a variant of the treatment device
- FIG. 7 represents an internal side view of the processing device of FIG. 6; - Figure 8 shows an enlarged radial section of the central portion of the cavitation chamber, according to an alternative embodiment; and - Figure 9 shows an enlarged radial section of the central portion of the cavitation chamber, according to another embodiment.
- a treatment device 1 represented in FIGS. 1 to 3 comprises a casing 2 which comprises two opposite shells 3 and 4 having a vertical axis 5 and delimiting between them a radial cavity
- a spacer 9 which comprises a disk 10 which has a radial face 1 1 resting on the annular radial face 7 of the shell 3 and which comprises a cylindrical peripheral portion 12 projecting from the disk 10 and resting on the annular radial face 8 of the shell 4.
- the shells 3 and 4 have adjacent peripheral portions 13 and 14 connected by bolts 15 to fix them and maintain the supports above.
- An annular sealing gasket 16 is installed between the periphery of the cylindrical peripheral portion 12 of the spacer 9 and the periphery of the cavity 6, in the annular zone of the radial faces vis-à-vis the adjacent peripheral parts 13 and 14 hulls 3 and 4.
- the shell 3 Within its annular radial face 7, the shell 3 (first element) has a recess 17 which delimits, with the radial face 11 of the disk 10 (second element), a cavitation chamber 18, the bottom 19 of the recess 17 extending radially, parallel to the radial face 1 1 of the disc 10.
- the shell 3 has an axial passage 20 which has a central terminal orifice 21, for example cylindrical, which opens axially into the central portion of the cavitation chamber 18, through the radial face constituted by the bottom 19 of the recess 17
- the shell 4 has an axial passage 25 which opens axially, for example through a central terminal orifice 26, in the central part of the secondary chamber 27 formed in the spacer 9, opposite the radial cavitation chamber 18.
- the passage 25 is engaged and sealingly attached to the end of the liquid discharge duct 28, for example by an annular gland system 29.
- the disk 10 of the spacer 9 has a plurality of through passages 30 which open on the one hand in the periphery of the radial cavitation chamber 18 and on the other hand in the secondary chamber 27.
- the through passages 30 are regularly distributed over a circumference so as to constitute a peripheral outlet opening of the radial cavitation chamber 18.
- These through passages 30 may be formed by cylindrical holes or circumferential slots.
- the liquid 23, supplied by the supply duct 22, is introduced into the central portion of the radial cavitation chamber 18 through the central orifice 21, then is deflected radially in this central portion, then flows into the radial cavitation chamber 18 in various radial directions towards the peripheral outlet opening formed by the through passages 30. Then, the liquid from the through passages 30 is collected in the secondary chamber 27, then discharged through the exhaust duct 28.
- the conditions of the radial flow of the liquid 23 in the radial cavitation chamber 18, from the central inlet orifice 21 to the peripheral through passages 30, are such that this flow is hydrodynamic, that bubbles or cavitation pockets 31 appear in the first part of this flow, around the central inlet orifice 21, then collapse or implode immediately before, preferably well before, that these bubbles or cavitation pockets 31 reach the through passages output devices 30.
- the phenomenon of creation and collapse of bubbles or pockets of cavitation results from the effects of depressions followed immediately overpressures.
- gases dissolved in the liquid tend to be released in these bubbles.
- an adiabatic compression occurs which generates very high temperatures and very high pressures in the imploding bubbles.
- the cavitation produced is a hydrodynamic cavitation which results from the acceleration of the flow due to a decrease in its passage section followed by a gradual increase of said passage section in a quasi radial direction.
- This cavitation makes it possible to create a very sudden rise in pressure in the zone of condensation or collapse, which has the effect of increasing the intensity of the effects described above for a given flow rate.
- the particular form of this device is that the phenomenon is produced with a loss of pressure and therefore a minimum energy expenditure.
- the cavitation pockets or cavities 31 may comprise a pocket or annular main bubble very close to the inlet orifice.
- This annular main pocket or bubble is divided into smaller sized pockets or bubbles that move away from the center of the chamber and condense, collapse, or implode.
- the cavitation bubbles or cavities 31 produced are able to at least partially treat the compound or compounds transported by the liquid.
- This treatment can be of a chemical, thermal, chemical and thermal order and / or possibly sonic order because the cavitation phenomenon can possibly produce sonic waves radiating in the liquid.
- the formation against the wall 19 and the collapse of the bubbles or vapor pockets 31 can be located in a virtually predetermined manner and / or can be controlled. Because of the adapted thickness of the radial cavitation chamber 18 with respect to the cavitation bubbles or cavities 31 produced, the cavitation concerns all the liquid to be treated flowing in this chamber 18. In the case where the liquid such as water carries a chemical compound or compounds, specific chemical radicals or species can be formed in cavitation bubbles 3 1 produced and collapsing, these specific chemical radicals or species being suitable for react with these chemical compounds and produce other compounds.
- the chemical effects can produce the destruction of compounds present in the bubbles, generally volatile compounds initially dissolved in the liquid by production of molecules, ions or radicals able to migrate in the liquid and to have an action on the compounds that it transported.
- the oxidation by OH ° radicals makes it possible to destroy dissolved molecules that are difficult to eliminate.
- the cavitation bubbles 31 produced can make it possible to attack these microorganisms and / or films or clusters of the latter, to destroy them, to disperse or dislocate them by chemical, mechanical or intense pressure waves.
- the flow conditions of the liquid in the cavitation chamber 18 of the treatment device 1 may result from a subsequent dimensioning.
- the thickness of the cavitation chamber 18 between the opposite radial faces 7 and 19 may be between 0.1 and 0.25 times the diameter of the central supply orifice 21.
- the thickness of the cavitation chamber 18 may in particular be equal to 0.14 times the diameter of the central supply orifice 21.
- the distance between the axis 5 of the central supply orifice 21 and the circumference on which is formed the peripheral opening of the cavitation chamber 18 determined by the through passages 30 may be greater than 2.5 times the diameter of the central supply port 21
- the ratio of the inlet pressure to the outlet pressure may be in the range of 1.5 to 6.
- the diameter of the supply orifice 21 may be equal to 8 mm
- the thickness of the chamber of cavitation 18 may be equal to 1, 12 mm
- the distance between the axis 5 of the central supply orifice 21 and the circumference on which is formed the peripheral opening of the cavitation chamber 18 determined by the through passages 30 may be equal to 30 mm.
- said first element 3 may have a rounded bevel 21 arranged on the edge of the axial inlet orifice 21 and joining the face 17. This rounded bevel 21 may have a radius r between 0, 1 and 0.5 times the distance between the radial faces 1 1 and 19 in the central portion of the cavitation chamber 18.
- said first element 3 may have a frustoconical bevel 21b arranged on the edge of the axial inlet orifice 21.
- This frustoconical bevel 21b may be arranged at an angle of between 30.degree. ° and 60 °, preferably at 45 °.
- Its height h, along the axis of the axial inlet orifice 21, can be between 0, 1 and 0.5 times the distance between the radial faces 1 1 and 19 in the central part of the cavitation chamber 18. .
- the chamfers 21a or 21b may facilitate the formation of the cavitation pocket 31 at their periphery.
- FIGS. 4 and 5 it can be seen that another processing device 100 has been shown which comprises a cylinder 101 (first element) which has a radial end face 102 in which a cylindrical recess 103 is formed and which comprises a circular disk 104 (second element) remotely engaged in the cylindrical recess 103 and fixed axially against three inner fingers 105 of a circular washer 106 resting on the radial end face 102 of the cylinder 101.
- a cylinder 101 first element
- second element remotely engaged in the cylindrical recess 103 and fixed axially against three inner fingers 105 of a circular washer 106 resting on the radial end face 102 of the cylinder 101.
- the stack constituted by the cylinder 101 and the circular washer 106 is engaged in the end of an outer cylindrical tube 107 so that the washer bears on an inner shoulder 108 of this tube 107.
- peripheral shoulder 109 and fixing screws 1 10 pass through this shoulder and are screwed into the cylindrical tube 107 to fix this stacking.
- An annular seal 1 1 1 seals between said stack and the cylindrical tube 107.
- the circular disc 104 is placed in the cylindrical recess
- the radial bottom 103 a of the recess 103 is provided with projecting bosses 103b against which the radial face 1 12 of the disc
- bosses 103b are placed at the periphery so as not to interfere with the flow of the liquid.
- the bosses 103b also center the disc 104 in the recess 103.
- the cylinder 101 has an axial passage 1 15 which has a central central orifice 1 16, for example cylindrical, which opens axially in the central part of the cavitation chamber 1 13.
- a tip 1 17 in which is fixed sealingly the end of the conduit 1 18 for supplying a liquid.
- the structure thus formed is such that the cavitation chamber 13 is equivalent to the cavitation chamber 18 of the treatment device 1.
- the treatment device 100 may advantageously be followed by another treatment device 100a as described below.
- the other end of the cylindrical tube 107 is closed by a radial wall January 19 and has a lateral outlet opening 120 in the vicinity of this wall January 19.
- a conduit not shown can be connected to the outlet side opening 120 to evacuate the treated liquid.
- the wall 1 19 is penetrated in a sealed manner, thanks to a seal 1 19a held by a sleeve January 19b by an inner axial cylindrical tube 121, for example quartz, a closed end 122 is located at near the circular disc 104, the inner fingers 105 of the circular washer 106 being extended by lugs 123 for centering and holding the end 122 of the inner cylindrical tube 121.
- an inner axial cylindrical tube 121 for example quartz
- the inner tube 121 is connected to known means, not shown, capable of generating in this tube 121 ultraviolet radiation radiating in the annular chamber 124 formed between the outer tube 107 and the inner tube 120.
- a liquid such as water carrying one or more compounds to be treated is, in a first step, treated by the treatment device 100 and immediately, in a second step, treated by the treatment device 100a, in the chamber annular secondary 124 by the ultraviolet radiation generated by the inner tube 120, then discharged through the outlet side opening 120.
- the radiation radiates throughout the annular secondary chamber 124.
- the disk 104 being quartz, the radiation can also reach the passage 1 through 14 and the cavitation chamber 13.
- the means for generating radiation could be placed around the outer tube 107.
- a processing device 200 comprises an inner cylindrical wall 201 and an outer cylindrical wall 202, which are concentric and which delimit between them a cylindrical space 203 of constant thickness closed at its ends by any known means.
- the inner cylindrical wall 201 has a plurality of inlet orifices 204 opening on the one hand in the space 203 and on the other hand in the interior space 205 of this wall 201, this inner space 205 forming a longitudinal collector chamber entrance.
- the outer cylindrical wall 202 has a plurality of outlet orifices 206 opening on the one hand in the space 203 and on the other hand in a peripheral space 207 delimited by a wall cylindrical peripheral 208, the peripheral space 207 forming an annular longitudinal outlet collector chamber.
- the outlet orifices 206 are distributed around and away from the inlet orifices 204 so as to form a plurality of substantially radial cavitation chambers 209 with substantially parallel flows, functioning respectively as the cavitation chambers described in the preceding examples.
- the inlet orifices 204 are distributed at equal distances from each other, around the inner cylindrical wall 201 and longitudinally to the latter, and the outlet orifices 206 are distributed at equal distances from each other, all around the outer cylindrical wall 202 and longitudinally to the latter, being offset by a half-step relative to the inlet ports 204, circumferentially and longitudinally.
- the outlet orifices 206 advantageously have sections much larger than the sections of the inlet orifices 204.
- the internal space 205 forming an inlet collecting chamber is closed at one end by a radial wall 205a and can communicate at its other end with an axial duct of FIG. 210 input adapted to be connected to a source of liquid to be treated.
- the peripheral space 207 forming an outlet collecting chamber is closed at one end by an annular wall 207a and can communicate with an axial outlet duct 21 1 for the liquid treated in parallel in the cavitation chambers 209, this axial outlet duct 21 1 being opposed to the axial inlet conduit 210.
- the inner and outer cylindrical walls 201 and 202 are carried at one end by the wall 205a and at the other end by the wall 207a, sealingly through annular joints 205b and 207b.
- the walls 201 and 202 could have other annular shapes, for example be frustoconical, or could be flat.
- treatment devices according to any one of those just described, could be put in series, the liquid outlet of one being in communication with the liquid inlet of the next.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Water Treatments (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
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BRPI0922556 BRPI0922556B1 (pt) | 2008-12-09 | 2009-12-08 | processo e dispositivo de tratamento de pelo menos um composto transportado em um líquido. |
EP09803818.5A EP2355921B1 (fr) | 2008-12-09 | 2009-12-08 | Procédé et dispositif de traitement d'au moins un composé transporté dans un liquide |
US13/133,308 US9579614B2 (en) | 2008-12-09 | 2009-12-08 | Device comprising a cavitation chamber with opposed radial and parallel faces, in communication with a secondary chamber, for treating compounds in a liquid |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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FR0858405 | 2008-12-09 | ||
FR0858405A FR2939423B1 (fr) | 2008-12-09 | 2008-12-09 | Procede et dispositif de traitement d'au moins un compose transporte dans un liquide |
Publications (1)
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WO2010066999A1 true WO2010066999A1 (fr) | 2010-06-17 |
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PCT/FR2009/052434 WO2010066999A1 (fr) | 2008-12-09 | 2009-12-08 | Procédé et dispositif de traitement d'au moins un composé transporté dans un liquide |
Country Status (6)
Country | Link |
---|---|
US (1) | US9579614B2 (fr) |
EP (1) | EP2355921B1 (fr) |
KR (1) | KR20110097928A (fr) |
BR (1) | BRPI0922556B1 (fr) |
FR (1) | FR2939423B1 (fr) |
WO (1) | WO2010066999A1 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150201578A1 (en) * | 2012-07-05 | 2015-07-23 | Tetra Laval Holdings & Finance S.A. | Homogenizer valve |
WO2021113424A1 (fr) | 2019-12-05 | 2021-06-10 | Hydrocav, Llc | Dispositif de filtration de fluide |
CN110921770A (zh) * | 2019-12-23 | 2020-03-27 | 北京工业大学 | 一种自激振荡空化撞击流反应器 |
FR3111077B1 (fr) * | 2020-06-08 | 2022-07-22 | Behring | Dispositif de traitement d’un liquide par rayonnements ultra-violets |
Citations (11)
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US4585357A (en) | 1984-10-18 | 1986-04-29 | Kazuo Ogata | Homogenizer |
DE3728946A1 (de) | 1987-08-29 | 1989-03-09 | Bran & Luebbe | Homogenisiervorrichtung |
JPH01142432A (ja) | 1987-11-28 | 1989-06-05 | Minolta Camera Co Ltd | シリンドリカルレンズの物性値測定装置 |
US5749650A (en) | 1997-03-13 | 1998-05-12 | Apv Homogenizer Group, A Division Of Apv North America, Inc. | Homogenization valve |
JPH1142432A (ja) * | 1997-07-25 | 1999-02-16 | Jiinasu:Kk | 微粒化方法および装置 |
US6200486B1 (en) | 1999-04-02 | 2001-03-13 | Dynaflow, Inc. | Fluid jet cavitation method and system for efficient decontamination of liquids |
WO2005028375A1 (fr) | 2003-08-29 | 2005-03-31 | BIONIK GmbH - Innovative Technik für die Umwelt | Procede et dispositif permettant la desintegration de substances organiques particulaires dans des suspensions de microorganismes |
US20060256645A1 (en) | 2003-11-03 | 2006-11-16 | Invensys Process System A/S | Treatment of particle-bearing liquid |
EP1738775A1 (fr) | 2005-05-26 | 2007-01-03 | Henri Drean | Epurateur bacterien |
US20070280861A1 (en) | 2003-03-06 | 2007-12-06 | Hitachi, Ltd. | Water treatment method and water treatment device |
JP2008207099A (ja) | 2007-02-27 | 2008-09-11 | Meidensha Corp | マイクロバブル発生装置及びマイクロバブル発生システム |
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US4193635A (en) * | 1978-04-07 | 1980-03-18 | Hochrein Ambrose A Jr | Controlled cavitation erosion process and system |
US4610321A (en) * | 1985-03-25 | 1986-09-09 | Whaling Michael H | Cavitating jet device |
US20030199595A1 (en) * | 2002-04-22 | 2003-10-23 | Kozyuk Oleg V. | Device and method of creating hydrodynamic cavitation in fluids |
AU2003281265A1 (en) * | 2002-07-09 | 2004-01-23 | Toshiba Plant Systems & Services Corporation | Liquid mixing apparatus and method of liquid mixing |
DE60307741T2 (de) * | 2002-07-16 | 2007-08-23 | M Technique Co., Ltd., Izumi | Verfahren und Verarbeitungsgerät for Flüssigkeiten |
EP2191890B1 (fr) * | 2007-09-21 | 2014-03-19 | M Technique Co., Ltd. | Procédé de fabrication de fines particules |
-
2008
- 2008-12-09 FR FR0858405A patent/FR2939423B1/fr not_active Expired - Fee Related
-
2009
- 2009-12-08 KR KR1020117015555A patent/KR20110097928A/ko not_active Application Discontinuation
- 2009-12-08 BR BRPI0922556 patent/BRPI0922556B1/pt active IP Right Grant
- 2009-12-08 WO PCT/FR2009/052434 patent/WO2010066999A1/fr active Application Filing
- 2009-12-08 US US13/133,308 patent/US9579614B2/en active Active
- 2009-12-08 EP EP09803818.5A patent/EP2355921B1/fr active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4585357A (en) | 1984-10-18 | 1986-04-29 | Kazuo Ogata | Homogenizer |
DE3728946A1 (de) | 1987-08-29 | 1989-03-09 | Bran & Luebbe | Homogenisiervorrichtung |
JPH01142432A (ja) | 1987-11-28 | 1989-06-05 | Minolta Camera Co Ltd | シリンドリカルレンズの物性値測定装置 |
US5749650A (en) | 1997-03-13 | 1998-05-12 | Apv Homogenizer Group, A Division Of Apv North America, Inc. | Homogenization valve |
US5899564A (en) | 1997-03-13 | 1999-05-04 | Apv Homogenizer Group, Div. Of Apv North America | Homogenization valve |
JPH1142432A (ja) * | 1997-07-25 | 1999-02-16 | Jiinasu:Kk | 微粒化方法および装置 |
US6200486B1 (en) | 1999-04-02 | 2001-03-13 | Dynaflow, Inc. | Fluid jet cavitation method and system for efficient decontamination of liquids |
US20070280861A1 (en) | 2003-03-06 | 2007-12-06 | Hitachi, Ltd. | Water treatment method and water treatment device |
WO2005028375A1 (fr) | 2003-08-29 | 2005-03-31 | BIONIK GmbH - Innovative Technik für die Umwelt | Procede et dispositif permettant la desintegration de substances organiques particulaires dans des suspensions de microorganismes |
US20060256645A1 (en) | 2003-11-03 | 2006-11-16 | Invensys Process System A/S | Treatment of particle-bearing liquid |
EP1738775A1 (fr) | 2005-05-26 | 2007-01-03 | Henri Drean | Epurateur bacterien |
JP2008207099A (ja) | 2007-02-27 | 2008-09-11 | Meidensha Corp | マイクロバブル発生装置及びマイクロバブル発生システム |
Also Published As
Publication number | Publication date |
---|---|
US20110284478A1 (en) | 2011-11-24 |
BRPI0922556B1 (pt) | 2019-12-10 |
FR2939423B1 (fr) | 2011-12-09 |
US9579614B2 (en) | 2017-02-28 |
FR2939423A1 (fr) | 2010-06-11 |
EP2355921A1 (fr) | 2011-08-17 |
EP2355921B1 (fr) | 2014-03-05 |
KR20110097928A (ko) | 2011-08-31 |
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