WO2010015599A1 - Functionalized thin film polyamide membranes - Google Patents
Functionalized thin film polyamide membranes Download PDFInfo
- Publication number
- WO2010015599A1 WO2010015599A1 PCT/EP2009/060029 EP2009060029W WO2010015599A1 WO 2010015599 A1 WO2010015599 A1 WO 2010015599A1 EP 2009060029 W EP2009060029 W EP 2009060029W WO 2010015599 A1 WO2010015599 A1 WO 2010015599A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alkyl
- formula
- hydrogen
- substituted
- alkylene
- Prior art date
Links
- 239000012528 membrane Substances 0.000 title claims abstract description 84
- 239000004952 Polyamide Substances 0.000 title claims abstract description 52
- 229920002647 polyamide Polymers 0.000 title claims abstract description 52
- 239000010409 thin film Substances 0.000 title claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 40
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 claims abstract description 38
- 239000000758 substrate Substances 0.000 claims abstract description 31
- 239000002131 composite material Substances 0.000 claims abstract description 28
- 230000004048 modification Effects 0.000 claims abstract description 6
- 238000012986 modification Methods 0.000 claims abstract description 6
- -1 aromatic acyl halide Chemical class 0.000 claims description 123
- 229910052739 hydrogen Inorganic materials 0.000 claims description 47
- 239000003795 chemical substances by application Substances 0.000 claims description 38
- 239000001257 hydrogen Substances 0.000 claims description 36
- 239000000178 monomer Substances 0.000 claims description 34
- 238000012705 nitroxide-mediated radical polymerization Methods 0.000 claims description 30
- 125000000217 alkyl group Chemical group 0.000 claims description 28
- 150000002431 hydrogen Chemical class 0.000 claims description 28
- 239000003999 initiator Substances 0.000 claims description 25
- 238000006116 polymerization reaction Methods 0.000 claims description 22
- 229910052736 halogen Inorganic materials 0.000 claims description 21
- 150000002367 halogens Chemical class 0.000 claims description 21
- 229920000642 polymer Polymers 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 19
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 18
- 229920002492 poly(sulfone) Polymers 0.000 claims description 18
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 14
- 238000002360 preparation method Methods 0.000 claims description 14
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 13
- 239000002253 acid Substances 0.000 claims description 12
- 239000000460 chlorine Substances 0.000 claims description 12
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 12
- 229910052727 yttrium Inorganic materials 0.000 claims description 12
- 125000003118 aryl group Chemical group 0.000 claims description 11
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 229910052801 chlorine Inorganic materials 0.000 claims description 11
- 125000002947 alkylene group Chemical group 0.000 claims description 10
- 150000004982 aromatic amines Chemical class 0.000 claims description 10
- 125000004122 cyclic group Chemical group 0.000 claims description 9
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 9
- 238000006068 polycondensation reaction Methods 0.000 claims description 9
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical class C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 8
- 125000005843 halogen group Chemical group 0.000 claims description 8
- 125000000896 monocarboxylic acid group Chemical group 0.000 claims description 8
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 8
- 229910052794 bromium Inorganic materials 0.000 claims description 7
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 6
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 6
- 125000000623 heterocyclic group Chemical group 0.000 claims description 6
- 125000003367 polycyclic group Chemical group 0.000 claims description 6
- 230000005855 radiation Effects 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 5
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims description 5
- 125000000304 alkynyl group Chemical group 0.000 claims description 5
- 150000001412 amines Chemical group 0.000 claims description 5
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 5
- 238000013467 fragmentation Methods 0.000 claims description 5
- 238000006062 fragmentation reaction Methods 0.000 claims description 5
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 4
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 claims description 4
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical compound O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 claims description 4
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 229910052740 iodine Inorganic materials 0.000 claims description 4
- 125000001624 naphthyl group Chemical group 0.000 claims description 4
- 125000000466 oxiranyl group Chemical group 0.000 claims description 4
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims description 4
- 238000007342 radical addition reaction Methods 0.000 claims description 4
- 238000012546 transfer Methods 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 150000001993 dienes Chemical class 0.000 claims description 3
- 238000010894 electron beam technology Methods 0.000 claims description 3
- 125000006718 (C3-C7) heterocycloalkenyl group Chemical group 0.000 claims description 2
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims description 2
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims description 2
- 239000004695 Polyether sulfone Substances 0.000 claims description 2
- 239000004743 Polypropylene Substances 0.000 claims description 2
- 150000003926 acrylamides Chemical class 0.000 claims description 2
- 125000005466 alkylenyl group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- 125000004104 aryloxy group Chemical group 0.000 claims description 2
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 2
- BEQVQKJCLJBTKZ-UHFFFAOYSA-N diphenylphosphinic acid Chemical compound C=1C=CC=CC=1P(=O)(O)C1=CC=CC=C1 BEQVQKJCLJBTKZ-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 125000004957 naphthylene group Chemical group 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 229920006393 polyether sulfone Polymers 0.000 claims description 2
- 229920001155 polypropylene Polymers 0.000 claims description 2
- 125000003011 styrenyl group Chemical group [H]\C(*)=C(/[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims 2
- 238000010526 radical polymerization reaction Methods 0.000 abstract description 16
- 239000000126 substance Substances 0.000 abstract description 5
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 3
- 230000003373 anti-fouling effect Effects 0.000 abstract description 3
- 230000000704 physical effect Effects 0.000 abstract description 3
- 101710141544 Allatotropin-related peptide Proteins 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 39
- 239000000243 solution Substances 0.000 description 26
- 239000000203 mixture Substances 0.000 description 22
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 21
- UWCPYKQBIPYOLX-UHFFFAOYSA-N benzene-1,3,5-tricarbonyl chloride Chemical compound ClC(=O)C1=CC(C(Cl)=O)=CC(C(Cl)=O)=C1 UWCPYKQBIPYOLX-UHFFFAOYSA-N 0.000 description 21
- 229940018564 m-phenylenediamine Drugs 0.000 description 21
- 238000006243 chemical reaction Methods 0.000 description 20
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 19
- 239000007864 aqueous solution Substances 0.000 description 18
- 150000003254 radicals Chemical class 0.000 description 17
- 239000012153 distilled water Substances 0.000 description 15
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 12
- 239000002904 solvent Substances 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 11
- 229910052723 transition metal Inorganic materials 0.000 description 11
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 10
- 239000012986 chain transfer agent Substances 0.000 description 10
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 10
- QNILTEGFHQSKFF-UHFFFAOYSA-N n-propan-2-ylprop-2-enamide Chemical compound CC(C)NC(=O)C=C QNILTEGFHQSKFF-UHFFFAOYSA-N 0.000 description 10
- 238000012712 reversible addition−fragmentation chain-transfer polymerization Methods 0.000 description 10
- 150000003624 transition metals Chemical class 0.000 description 10
- 238000005481 NMR spectroscopy Methods 0.000 description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 9
- 239000010408 film Substances 0.000 description 9
- 239000003446 ligand Substances 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 150000004820 halides Chemical class 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 7
- 238000012695 Interfacial polymerization Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 6
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical class CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 239000006184 cosolvent Substances 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 150000001450 anions Chemical class 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- 230000000977 initiatory effect Effects 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 238000001223 reverse osmosis Methods 0.000 description 5
- 229910052717 sulfur Inorganic materials 0.000 description 5
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- YOCIJWAHRAJQFT-UHFFFAOYSA-N 2-bromo-2-methylpropanoyl bromide Chemical compound CC(C)(Br)C(Br)=O YOCIJWAHRAJQFT-UHFFFAOYSA-N 0.000 description 4
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical compound OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 description 4
- YYROPELSRYBVMQ-UHFFFAOYSA-N 4-toluenesulfonyl chloride Chemical compound CC1=CC=C(S(Cl)(=O)=O)C=C1 YYROPELSRYBVMQ-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 description 4
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000004760 aramid Substances 0.000 description 4
- 229920003235 aromatic polyamide Polymers 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 229920001400 block copolymer Polymers 0.000 description 4
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- MUMVIYLVHVCYGI-UHFFFAOYSA-N n,n,n',n',n",n"-hexamethylmethanetriamine Chemical compound CN(C)C(N(C)C)N(C)C MUMVIYLVHVCYGI-UHFFFAOYSA-N 0.000 description 4
- 239000012454 non-polar solvent Substances 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- MBYLVOKEDDQJDY-UHFFFAOYSA-N tris(2-aminoethyl)amine Chemical compound NCCN(CCN)CCN MBYLVOKEDDQJDY-UHFFFAOYSA-N 0.000 description 4
- 0 *C(*)(*)N(*)C(*)(*)* Chemical compound *C(*)(*)N(*)C(*)(*)* 0.000 description 3
- BZDPHNAHPCCTIC-UHFFFAOYSA-N 3,3,8,8,10,10-hexamethyl-9-[1-[4-(oxiran-2-ylmethoxy)phenyl]ethoxy]-1,5-dioxa-9-azaspiro[5.5]undecane Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)ON(C(C1)(C)C)C(C)(C)CC21OCC(C)(C)CO2 BZDPHNAHPCCTIC-UHFFFAOYSA-N 0.000 description 3
- XEUGAXUBHWKKOQ-UHFFFAOYSA-N 5-(chloromethyl)benzene-1,3-dicarboxylic acid Chemical compound OC(=O)C1=CC(CCl)=CC(C(O)=O)=C1 XEUGAXUBHWKKOQ-UHFFFAOYSA-N 0.000 description 3
- UBELVPSSMKQEPG-UHFFFAOYSA-N 5-(methylsulfanylcarbothioylsulfanylmethyl)benzene-1,3-dicarboxylic acid Chemical compound CSC(=S)SCC1=CC(C(O)=O)=CC(C(O)=O)=C1 UBELVPSSMKQEPG-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- QGJOPFRUJISHPQ-UHFFFAOYSA-N Carbon disulfide Chemical compound S=C=S QGJOPFRUJISHPQ-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 150000003863 ammonium salts Chemical class 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000007872 degassing Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- 235000019439 ethyl acetate Nutrition 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- CBOIHMRHGLHBPB-UHFFFAOYSA-N hydroxymethyl Chemical compound O[CH2] CBOIHMRHGLHBPB-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- ACEONLNNWKIPTM-UHFFFAOYSA-N methyl 2-bromopropanoate Chemical compound COC(=O)C(C)Br ACEONLNNWKIPTM-UHFFFAOYSA-N 0.000 description 3
- VMGSQCIDWAUGLQ-UHFFFAOYSA-N n',n'-bis[2-(dimethylamino)ethyl]-n,n-dimethylethane-1,2-diamine Chemical compound CN(C)CCN(CCN(C)C)CCN(C)C VMGSQCIDWAUGLQ-UHFFFAOYSA-N 0.000 description 3
- 230000007935 neutral effect Effects 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- 150000002978 peroxides Chemical class 0.000 description 3
- 239000003505 polymerization initiator Substances 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000010926 purge Methods 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- UWNADWZGEHDQAB-UHFFFAOYSA-N 2,5-dimethylhexane Chemical compound CC(C)CCC(C)C UWNADWZGEHDQAB-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- JECYNCQXXKQDJN-UHFFFAOYSA-N 2-(2-methylhexan-2-yloxymethyl)oxirane Chemical compound CCCCC(C)(C)OCC1CO1 JECYNCQXXKQDJN-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- QZPSOSOOLFHYRR-UHFFFAOYSA-N 3-hydroxypropyl prop-2-enoate Chemical compound OCCCOC(=O)C=C QZPSOSOOLFHYRR-UHFFFAOYSA-N 0.000 description 2
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- 125000004055 thiomethyl group Chemical group [H]SC([H])([H])* 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 125000004035 thiopropyl group Chemical group [H]SC([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- IBBLKSWSCDAPIF-UHFFFAOYSA-N thiopyran Chemical compound S1C=CC=C=C1 IBBLKSWSCDAPIF-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-M toluene-4-sulfonate Chemical compound CC1=CC=C(S([O-])(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-M 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- JSPLKZUTYZBBKA-UHFFFAOYSA-N trioxidane Chemical class OOO JSPLKZUTYZBBKA-UHFFFAOYSA-N 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
- 125000005065 undecenyl group Chemical group C(=CCCCCCCCCC)* 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- NLVXSWCKKBEXTG-UHFFFAOYSA-N vinylsulfonic acid Chemical class OS(=O)(=O)C=C NLVXSWCKKBEXTG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0002—Organic membrane manufacture
- B01D67/0006—Organic membrane manufacture by chemical reactions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0081—After-treatment of organic or inorganic membranes
- B01D67/0093—Chemical modification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/107—Organic support material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/1213—Laminated layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/12—Composite membranes; Ultra-thin membranes
- B01D69/125—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction
- B01D69/1251—In situ manufacturing by polymerisation, polycondensation, cross-linking or chemical reaction by interfacial polymerisation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/56—Polyamides, e.g. polyester-amides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/12—Specific ratios of components used
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2323/00—Details relating to membrane preparation
- B01D2323/32—Use of chain transfer agents or inhibitors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/48—Antimicrobial properties
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
- Y10T428/249978—Voids specified as micro
Definitions
- the present invention relates to a method of preparing RAFT, ATRP or NMRP functionalized thin film composite (TFC) polyamide membranes on a microporous substrate.
- a further aspect of the invention is the subsequent modification of the thin film composite polyamide membrane by controlled free radical polymerization (CFRP) to yield membranes having new chemical and physical properties, e.g. antifouling and/or antibacterial properties.
- Further aspects of the invention are the functionalized thin film composite (TFC) polyamide membranes on the microporous substrate itself and the membranes modified by controlled free radical polymerization.
- RAFT reversible addition fragmentation chain transfer polymerization
- ATRP atom transfer radical polymerization
- X is a free radical group, e.g. a tert. -butyl or cyanoisopropyl radical, capable of polymerizing monomer units containing ethylene groups.
- lnterfacial polymerization is copolymerization of two reactive monomers dissolved in two immiscible solutions respectively.
- the monomers can meet and react only at the interface of the solutions when two solutions are contained in a reaction chamber.
- polymer film is formed at the interface.
- the film is usually very thin because the growing interfacial polymer behaves as a barrier to diffusion of the two monomers, and the polymerization levels off at a limiting thickness, typically of the order of a micrometer or less.
- the interfacial polymerization was frequently carried out at the surface of a microporous substrate, in which case the result is called a thin-film composite membrane. This is for example described by Wamser et al., J. Am. Chem. Soc. 1 11 , 1989, 8485-8491.
- TFC thin-film-composite
- Most commercial TFC membranes are aromatic polyamides or their derivatives. It is well known that aromatic polyamide composite membranes have excellent salt rejection and water flux, and they are applicable in a wide range of water purification applications.
- fouling is currently one of the major remaining problems for aromatic polyamide RO membranes. Fouling causes deterioration of the membrane performance and shortens membrane life, limiting further application of RO membrane technology. It is thus desirable to improve the surface properties of RO membranes without impairing their transport characteristics in order to enhance their resistance to fouling. There is obviously a need for a process which allows the surface modification of TFC polyamide membranes to overcome these problems.
- RAFT/ATRP/NMRP functionalized TFC polyamide membranes can be prepared by interfacial reaction of an aromatic polyamide and a mixture of an aromatic acyl halide and a RAFT-functional or ATRP-functional acid halide or epoxy functional alkoxyamine (NMRP) on a microporous substrate.
- the present invention provides a method for preparing RAFT, ATRP or NMRP functionalized TFC polyamide membranes by condensation polymerization on a microporous substrate.
- the subsequent modification step is carried out by controlled free radical polymerization (CFRP) where the functionalized sites serve as starting points for the chain growth.
- CFRP controlled free radical polymerization
- One aspect of the invention is a method for the preparation of a functionalized thin film composite polyamide membrane on a microporous substrate comprising carrying out on the porous substrate a polycondensation reaction of a) an aromatic amine with at least two amine functionalities; with an aromatic acyl halide with at least 3 -C(O)CI groups; in the presence of b1 ) a radical addition fragmentation chain transfer (RAFT) control agent or b2) an atom transfer radical polymerization (ATRP) control agent or b3) a nitroxide-mediated radical polymerization (NMRP) control agent having a glycidyl functionality.
- RAFT radical addition fragmentation chain transfer
- ATRP atom transfer radical polymerization
- NMRP nitroxide-mediated radical polymerization
- Preferred is a method for the preparation of a functionalized thin film composite membrane as defined above consisting of a continuous polyamide layer on a microporous substrate comprising carrying out on the porous substrate a polycondensation reaction of a) an aromatic amine with at least two amine functionalities; with an aromatic acyl halide with at least 3 -C(O)CI groups; and b1 ) a radical addition fragmentation chain transfer (RAFT) control agent having an acid halide functionality, b2) an atom transfer radical polymerization (ATRP) control agent having an acid halide functionality, or b3) a nitroxide-mediated radical polymerization (NMRP) control agent having a glycidyl functionality.
- RAFT radical addition fragmentation chain transfer
- ATRP atom transfer radical polymerization
- NMRP nitroxide-mediated radical polymerization
- the aromatic amine compound is of low molecular weight and soluble in water.
- the amine functional group is preferably primary rather than secondary and less (in number) than the functionality of the acyl halide compound.
- the aromatic acyl halide compound has at least three or more acyl chloride functionalities and should be soluble in a non-polar solvent.
- a non-polar solvent is a solvent that is considerably less polar than the typical polar solvents, such as water, C 1 -C3 alkanols, ammonia and the like and for instance less than 5 weight- - A -
- Typical examples are C 1 -C 12 aliphatic hydrocarbons such as pentane, hexanes, heptanes, octanes; cycloalkanes, for example cyclohexane.
- polymer as used herein includes oligomers and polymers with (units) n .
- the upper limit of an “n” will be defined by the particular characteristics of the polymer chain.
- the porous substrate comprises polymeric material containing pore sizes which are sufficient to permit the passage of permeate but are not large enough so as to interfere with the bridging over of the resulting RAFT/ATRP/NMRP functionalized TFC polyamide film.
- the pore size range may be 0.01-5 micrometers, preferably 0.1-1 micrometer, measured by SEM.
- the porous substrate may be inorganic or organic.
- inorganic materials there come into consideration porous silica in the form of thin films or, for example, zeolite.
- RAFT reversible addition fragmentation chain transfer polymerization
- specific thiocompounds RAFT control agents
- classical free radical initiators like peroxides or azo-initiators
- the RAFT polymerization process also allows to synthesize defined block copolymer structures.
- the method described above under b1 allows modifying the TFC membrane in a later stage, starting from the sites of the RAFT control agent.
- RAFT agents are known to those skilled in the art, examples are di-thio- esters, thioxanthogenates or dithiocarbamates
- the reversible addition fragmentation chain transfer agent is a di-thioester, for example di-thiobenzylbenzoate, such as described in WO98/01478.
- the polymer or copolymer can also be prepared in a controlled way by atom transfer radical polymerization (ATRP).
- ATRP atom transfer radical polymerization
- This type of polymerization is, for example, described in WO 96/30421.
- WO 96/30421 discloses a controlled or "living" polymerization process of ethylenically unsaturated monomers such as styrene or (meth)acrylates by employing the ATRP method.
- initiators are employed which generate a radical atom such as »CI, in the presence of a redox system of transition metals of different oxidation states, e.g. Cu(I) and Cu(II), providing "living" or controlled radical polymerization.
- a suitable initiating compound is of formula (Xl), IrM — Hal (Xl) with a radically
- a preferred radically transferable atom or group 'HaI is »CI or »Br, which is cleaved as a radical from the initiator molecule.
- [In] represents the polymerization initiator fragment of a polymerization initiator of formula
- polymerization initiator is selected from the group consisting of C-i-Cs-alkyl halides, Ce- Ci5-aralkylhalides, C 2 -C8 ⁇ c-haloalkyl esters, arene sulfonyl chlorides, haloalkanenitriles, ⁇ -haloacrylates and halolactones, and p and q represent one.
- the transition metal in the oxidizable transition metal complex catalyst salt used in the process of the invention is present as an oxidizable complex ion in the lower oxidation state of a redox system.
- Preferred examples of such redox systems are selected from the group consisting of Group V(B), VI(B), VII(B), VIII, IB and NB elements, such as CuVCu 2+ , Cu°/Cu + , Fe°/Fe 2+ , Fe 2 VFe 3+ , Ru 2 VRu 3+ , Ru 3 VRu 4+ , Os 2 VOs 3+ , v n+ /V (n+1)+ , Cr 2+7 Cr 3+ , CoVCo 2+ , Co 2 VCo 3+ , Ni°/Ni + , NiVNi 2+ , Ni 2 VNi 3+ , Mn°/Mn 2+ , Mn 2 VMn 3+ , Mn 3 VMn 4+ or ZnVZn 2+ .
- the ionic charges are counterbalanced by anionic ligands commonly known in complex chemistry of transition metals, such hydride ions (H ) or anions derived from inorganic or organic acids, examples being halides, e.g. F “ , Cl “ , Br “ or I “ , fluoro complexes of the type BF 4 " , PF 6 “ , SbF 6 “ or AsF 6 " , anions of oxygen acids, alcoholates or acetylides or anions of cyclopentadiene.
- H hydride ions
- anions derived from inorganic or organic acids examples being halides, e.g. F “ , Cl “ , Br “ or I " , fluoro complexes of the type BF 4 " , PF 6 “ , SbF 6 “ or AsF 6 " , anions of oxygen acids, alcoholates or acetylides or anions of cyclopentadiene.
- Anions of oxygen acids are, for example, sulfate, phosphate, perchlorate, perbromate, periodate, antimonate, arsenate, nitrate, carbonate, the anion of a Ci-C 8 carboxylic acid, such as formate, acetate, propionate, butyrate, benzoate, phenylacetate, mono-, di- or trichloro- or -fluoroacetate, sulfonates, for example methylsulfonate, ethylsulfonate, propylsulfonate, butylsulfonate, trifluoromethylsulfonate (triflate), unsubstituted or Ci.C 4 alkyl-, Ci-C 4 alkoxy- or halo-, especially fluoro-, chloro- or bromo-substituted phenylsulfonate or benzylsulfonate, for example tosylate, mesylate,
- Anionic ligands and neutral may also be present up to the preferred coordination number of the complex cation, especially four, five or six. Additional negative charges are counterbalanced by cations, especially monovalent cations such as Na + , K + , NH 4 + or (d- C 4 alkyl) 4 N + .
- Suitable neutral ligands are inorganic or organic neutral ligands commonly known in complex chemistry of transition metals. They coordinate to the metal ion through a ⁇ -, ⁇ -, ⁇ -, ⁇ -type bonding or any combinations thereof up to the preferred coordination number of the complex cation.
- Suitable inorganic ligands are selected from the group consisting of aquo (H 2 O), amino, nitrogen, carbon monoxide and nitrosyl.
- Suitable organic ligands are selected from the group consisting of phosphines, e.g.
- Heterocyclic e ⁇ donor ligands are derived, for example, from unsubstituted or substituted heteroarenes from the group consisting of furan, thiophene, pyrrole, pyridine, bis-pyridine, picolylimine, g-pyran, g-thiopyran, phenanthroline, pyrimidine, bis-pyrimidine, pyrazine, indole, coumarone, thionaphthene, carbazole, dibenzofuran, dibenzothiophene, pyrazole, imidazole, benzimidazole, oxazole, thiazole, bis-thiazole, isoxazole, isothiazole, quinoline, bis-quinoline, isoquinoline, bis-isoquinoline, acridine, chromene, phenazine, phenoxazine, phenothiazine, triazine, thianthrene,
- the oxidizable transition metal complex catalyst can be formed in a separate preliminary reaction step from its ligands or is preferably formed in-situ from its transition metal salt, e.g. Cu(I)CI, which is then converted to the complex compound by addition of compounds corresponding to the ligands present in the complex catalyst, e.g. by addition of ethylenediamine, EDTA, Me 6 TREN or PMDETA.
- transition metal salt e.g. Cu(I)CI
- the oxidizable transition metal in the transition metal complex salt is present as a transition metal complex ion in the lower oxidation state of a redox system.
- the transition metal complex ion is a Cu(I) complex ion in the Cu(l)/Cu(ll) system.
- Suitable NMRP control agents having a glycidyl functionality are, for example, described in WO 99/46261 or WO 02/48109.
- the glycidyl functionalized NMRP control agents are useful as initiators/regulators for controlled radical polymerization which in addition have a highly reactive functional group allowing polymer analogous reactions or a reaction during polycondensation of condensation polymers.
- the porous substrate is a polymer selected from the group consisting of a polysulfone, polycarbonate, polypropylene, polyamide and polyether sulfone.
- the method for the preparation of a functionalized thin film composite polyamide membrane on a microporous substrate comprises carrying out on the porous substrate a polycondensation reaction of
- n is a number from 1 to 4.
- Z 1 in formula (Ilia) is Ci-Ci 8 alkylene, C 3 -Ci 8 alkylene which is interrupted by one or more oxygen atoms or phenylene, which all may be substituted by CrC 4 alkyl, halogen, cyano, C 1 - C 4 alkoxy or Ci-C 4 alkoxycarbonyl;
- Z 2 in formula (NIb) is hydrogen, chlorine, CrCi 8 alkyl, phenyl, C 3 -C 7 cyloalkyl, C 3 - C 7 cycloalkenyl, C 3 -C 7 heterocycloalkyl, C 3 -C 7 heterocycloalkenyl, CrCi 8 alkylthio, phenylthio,
- Ci-Ci 8 alkoxy C 7 -Ci 2 phenylalkylthio, Ci-Ci 8 alkoxy, phenyloxy, amino, Ci-Ci 8 alkoxycarbonyl, phenyloxycarbonyl, carboxy, Ci-Ci 8 acyloxy, benzoylloxy, carbamoyl, cyano, C 2 -C 18 -dialkyl- phosphonato, diphenyl-phosphonato, Ci-Ci 8 dialkyl-phosphinato, diphenyl-phosphinato or a polymer chain having a number average degree of polymerization in the range of 5 to 1000; which groups may all be substituted by Ci-C 4 alkyl, halogen, cyano, Ci-C 4 alkoxy or C 1 -
- R 3 i and R 32 have the same meaning as R 22 and R 23 ;
- Ci 8 alkyl)carbamoyl, -C( NR 5 )(NHR 6 ); unsubstituted Ci-Ci 8 alkyl, C 2 -Ci 8 alkenyl, C 2 -Ci 8 alkynyl, C 7 -C 9 phenylalkyl, C 3 -Ci 2 cycloalkyl or
- Ci-Ci 8 alkyl C 2 -Ci 8 alkenyl, C 2 -Ci 8 alkynyl, C 7 -C 9 phenylalkyl, C 3 -Ci 2 cycloalkyl or C 2 -
- Ci 2 heterocycloalkyl which are substituted by NO 2 , halogen, amino, hydroxy, cyano, carboxy,
- R 4 is hydrogen, Ci-Ci 8 alkyl, phenyl, an alkali metal cation or a tetraalkylammonium cation;
- R 5 and R 6 are hydrogen, Ci-Ci 8 alkyl, C 2 -Ci 8 alkyl which is substituted by at least one hydroxy group or, taken together, form a C 2 -Ci 2 alkylene bridge or a C 2 -Ci 2 -alkylene bridge interrupted by at least one O or/and NR 8 atom;
- R 7 is hydrogen, Ci-Ci 8 alkyl or phenyl
- R 8 is hydrogen, Ci-Ci 8 alkyl or C 2 -Ci 8 alkyl which is substituted by at least one hydroxy group;
- R 9 is Ci-Ci 2 alkylene or a direct bond; or all Ri form together the residue of a polycyclic cycloaliphatic ring system or a polycyclic heterocycloaliphatic ring system with at least one di- or trivalent nitrogen atom; the R 2 are independently of each other phenyl or Ci-C 6 alkyl or two together with the linking carbon atom form a C 5 -C 6 cycloalkyl group;
- A is a divalent group required to form a cyclic 5-, 6- or 7-membered ring and
- R 3 is a radical of formula (II) (II), wherein
- Xi is phenylene, naphthylene or biphenylene, which are unsubstituted or substituted by NO 2 , halogen, amino, hydroxy, cyano, carboxy, Ci-C 4 alkoxy, Ci-C 4 alkylthio, Ci-C 4 alkylamino or di(Ci-C 4 alkyl)amino; the R' are independently of each other H or CH 3 ;
- n is a number from 1 to 4.
- alkyl radicals in the various substituents may be linear or branched.
- alkyl containing 1 to 18 carbon atoms are methyl, ethyl, propyl, isopropyl, butyl, 2-butyl, isobutyl, t- butyl, pentyl, 2-pentyl, hexyl, heptyl, octyl, 2-ethylhexyl, t-octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, hexadecyl and octadecyl.
- alkenyl radicals in the various substituents may be linear or branched.
- Examples of C 2 - d 8 alkenyl are vinyl, allyl, 2-methylallyl, butenyl, hexenyl, undecenyl and octadecenyl.
- C 2 -Ci 8 alkynyl examples are ethynyl,2-butynyl, 3-hexynyl, 5-undecynyl, 6-octadecynyl.
- the alkynyl radicals may be linear or branched.
- C 7 -C 9 phenylalkyl is for example benzyl, phenylpropyl, ⁇ , ⁇ -dimethylbenzyl or ⁇ -methylbenzyl.
- C 7 -Ci 2 alkylphenylthio has its preferences and examples in analogy.
- Ci-C 4 alkyl is typically cyclopropyl, cyclopentyl, methylcyclopentyl, dimethylcyclopentyl, cyclohexyl, methylcyclo- hexyl.
- Alkyl substituted by-OH is typically 2-hydroxyethyl, 2-hydroxypropyl or 2-hydroxybutyl.
- Ci-Ci 8 Alkyl substituted by CrC 8 alkoxy, preferably by CrC 4 alkoxy, in particular by methoxy or ethoxy is typically 2-methoxyethyl, 2-ethoxyethyl, 3-methoxypropyl, 3-ethoxypropyl, 3- butoxypropyl, 3-octoxypropyl and 4-methoxybutyl.
- Ci-Ci ⁇ AlkyI substituted by di(Ci-C 4 alkyl)amino is preferably e.g. dimethylamino, diethylamino, 2-dimethylaminoethyl, 2-diethylaminoethyl, 3-dimethylaminopropyl, 3-diethylaminopropyl, 3- dibutylaminopropyl and 4-diethylaminobutyl.
- Ci-Ci ⁇ AlkyI substituted by Ci-C 4 alkylamino is preferably e.g. methylamino, ethylamino, 2- methylaminoethyl, 2-ethylaminoethyl, 3-methylaminopropyl, 3-ethylaminopropyl, 3-butyl- aminopropyl and 4-ethylaminobutyl.
- Ci-C 8 Alkoxy and, preferably Ci-C 4 alkoxy are typically methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, pentoxy, isopentoxy, hexoxy, heptoxy or octoxy.
- Ci-C 4 Alkylthio is typically thiomethyl, thioethyl, thiopropyl, thioisopropyl, thiobutyl and thioisobutyl.
- C 3 -Ci 2 heterocycloalkyl and preferably C 3 -C 7 heterocycloalkyl is typically oxirane, 1 ,4-dioxane, tetrahydrofuran, ⁇ -butyrolactone, ⁇ -caprolactam, oxirane, aziridine, diaziridine, pyrrole, pyrrolidine, thiophen, furan, pyrazole, imidazole, oxazole, oxazolidine, thiazole, pyran, thiopyran, piperidine or morpholine.
- Examples of d-C ⁇ alkylene bridges preferably of C 2 -C 6 alkylene bridges, are ethylene, propylene, butylene, pentylene, hexylene.
- C 2 -Ci 2 alkylene bridges interrupted by at least one N or O atom are, for example, -CH 2 -O-CH 2 -CH 2 , -CH 2 -O-CH 2 -CH 2 -CH 2 , -CH 2 -O-CH 2 -CH 2 -CH 2 -, -CH 2 -O-CH 2 -CH 2 -O-CH2-, -CH 2 -NH-CH 2 -CH 2 , -CH 2 -NH-CH 2 -CH 2 -CH 2 -CH 2 -, -CH 2 -NH-CH 2 -CH 2 -CH 2 -CH 2 -, -CH 2 -NH-CH 2 -CH 2 -NH-CH2- or -CH 2 -NH-CH 2 -CH 2 -O-CH2-.
- Phenyl substituted by 1 , 2 or 3 CrC 4 alkyl or Ci-C 4 alkoxy is typically methylphenyl, dimethyl- phenyl, trimethylphenyl, t-butylphenyl, di-t-butylphenyl, 3,5-di-t-butyl-4-methylphenyl, methoxyphenyl, ethoxyphenyl and butoxyphenyl.
- Examples of polycyclic cycloaliphatic ring systems are adamantane, cubane, twistane, norbornane, bicyclo[2.2.2]octane or bicyclo[3.2.1]octane.
- polycyclic heterocycloaliphatic ring system is hexamethylentetramine (urotropine).
- Examples for a divalent group A required to form a cyclic 5-, 6- or 7-membered ring are: C 2 -C 4 alkylene, C 2 -C 4 alkenylene, C 2 -C 4 alkinylene, 1 ,2 phenylene which groups may be unsubstituted or substituted by NO 2 , halogen, amino, hydroxy, cyano, carboxy, carbonyl, d- Ci 8 alkoxy, CrCi 8 acyloxy, benzoyloxy, CrCi 8 alkylthio, Ci-Ci 8 alkylamino or di(C r Ci 8 alkyl)amino or phenyl.
- C 2 -C 4 alkylene or C 2 -C 4 alkenylene these groups may also be interrupted by an O or N atom.
- C 2 -C 4 alkylene bridges interrupted by at least one N or O atom are, for example, -CH 2 -O-CH 2 -CH 2 , -CH 2 -O-CH 2 -, -O-CH 2 -CH 2 -,-O-CH 2 -O-CH2-, -CH 2 -NH-CH 2 -, -CH 2 -NH-CH 2 - CH 2 -, -NH-CH 2 -CH 2 -, -NH-CH 2 -NH-CH2-, -0-CH 2 - Or -CH 2 -O-C(O)-.
- Examples of a monocarboxylic acid having up to 18 carbon atoms are formic acid, acetic acid, propionic acid, the isomers of valeric acid, methyl ethyl acetic acid, trimethyl acetic acid, capronic acid, lauric acid or stearic acid.
- Examples for unsaturated aliphatic acids are acrylic acid, methacrylic acid, crotonic acid, linolic acid and oleic acid.
- Typical examples of cycloaliphatic carboxylic acids are cyclohexane carboxylic acid or cyclopentane carboxylic acid.
- aromatic carboxylic acids examples include benzoic acid, salicylic acid or cinnamic acid.
- the C-atom to which the substituents Ri are bound is preferably a secondary or tertiary C- atom more preferably it is a tertiary C-atom.
- aromatic amine of formula (I) two of R-io - R 1 5 are - NH 2 in para or ortho position and the others are independently hydrogen or Ci-C 4 alkyl; in the aromatic acyl halide of formula (II) 3 °f Ri ⁇ -R21 are a group -C(O)CI and the others are independently hydrogen or d-C 4 alkyl;
- n is a number from 1 to 3;
- Z 1 in formula (Ilia) is Ci-Ci 8 alkylene or phenylene
- R 22 in formula (Ilia) is a homolytic leaving group selected from the group consisting of Cr Ci 8 alkyl, C 2 -Ci 8 alkenyl, C 2 -Ci 8 alkynyl;
- Z 2 in formula (NIb) is hydrogen, chlorine, Ci-Ci 8 alkyl, phenyl, Ci-Ci 8 alkylthio, phenylthio, C 7 - Ci 2 phenylalkylthio;
- R 23 in formula (NIb) is Ci-Ci 8 alkylene or phenylene
- R 30 is Ci-Ci 8 alkylene or phenylene
- R 3 i and R 32 are independently hydrogen, Ci-Ci 8 alkyl, C 3 -C 8 cycloalkyl, C 3 -C 8 cycloalkenyl or phenyl;
- NMRP control agent of formula (Vb) is of formula (Vc)
- R' is H or CH 3 ; m is 1 , 2 or 3; Y and Y' are independently d-C ⁇ alkyl, C 3 -Ci 2 alkenyl, C 3 -Ci 2 alkinyl, C 5 -C 8 cycloalkyl, phenyl, naphthyl, C 7 -C 9 phenylalkyl; or
- Y and Y' together form one of the bivalent groups -C(R'i)(R' 2 )-CH(R' 3 )-, CH(R'i)-CH 2 - C(R' 2 )(R' 3 )-, -CH(R' 2 )-CH 2 -C(R'i)(R' 3 )-, -CH 2 -C(R'i)(R' 2 )-CH(R' 3 )-, o-phenylene, 1 ,2- cyclohexyliden,
- R'i is hydrogen, C r Ci 2 alkyl, COOH, COO-(C r Ci 2 )alkyl or CH 2 OR 4 ;
- R' 2 and R' 3 are independently hydrogen, methyl ethyl, COOH or COO-(Ci-Ci 2 )alkyl;
- R' 4 is hydrogen, Ci-Ci 2 alkyl, benzyl, or a monovalent acyl residue derived from an aliphatic, cycloaliphatic or aromatic monocarboxylic acid having up to 18 carbon atoms.
- Y and Y' together form one of the bivalent groups
- R'i is hydrogen, C r Ci 2 alkyl, COOH, COO-(C r Ci 2 )alkyl or CH 2 OR 4 ;
- R' 2 and R' 3 are independently hydrogen, methyl ethyl, COOH or COO-(Ci-Ci 2 )alkyl;
- R 4 is hydrogen, Ci-Ci 2 alkyl, benzyl, or a monovalent acyl residue derived from an aliphatic, cycloaliphatic or aromatic monocarboxylic acid having up to 18 carbon atoms.
- Suitable individual NMRP control agents are listed below.
- the compounds are known and can be prepared as described in WO 02/48109 or WO 99/46261.
- the polycondensation may be carried out in any convenient solvent, which does not interact with the reagents.
- a convenient way to carry out the polycondensation reaction and to prepare the RAFT/ATRP/NMRP functionalized polyamide membrane is by: a) the preparation of an aqueous solution containing the aromatic polyamine; b) the preparation of an organic solution containing a mixture of the aromatic polyacyl halide and the RAFT CTA acid chloride or ATRP initiator acid halide or epoxy-functional NMRP initiator dissolved in a "non polar solvent"; c) soaking the microporous substrate in the aqueous solution containing the aromatic polyamine; d) pouring the aromatic solution (aromatic polyacyl halide + RAFT CTA acid chloride, ATRP initiator acid halide or epoxy functional NMRP initiator) on the soaked microporous surface. e) allowing the reaction at the interface between the solutions, at room temperature for 10 seconds.
- the amount of the RAFT control agent, the ATRP control agent or the NMRP control agent having a glycidyl functionality is typically 0.01 % to 5 % by weight based on the weight of the aromatic amine and the aromatic acyl halide.
- the weight ratio between the aromatic acyl halide with at least 3 -C(O)CI groups; and the RAFT control agent, the ATRP control agent or the NMRP control agent having a glycidyl functionality is from 50:1 to 1 :5.
- the polycondesation reaction is, for example, carried out at a temperature from 5° C to 40° C, preferably at a temperature between 15° C and 25° C at normal pressure.
- the reaction time can vary in a wide range, typically between 1 second and 60 minutes, preferably between 1 second and 60 seconds.
- the obtained film should be dried with a hot air flow or under ambient conditions and washed three times with distilled water to eliminate some secondary products formed by competing reactions (aminolysis) and to remove excess reagents.
- nonpolar solvent may be aliphatic liquids such as pentane, hexanes, heptanes, octanes; cycloalkanes such as cyclohexane.
- Another aspect of the invention is a method for the modification of a functionalized thin film composite polyamide membrane on a microporous substrate according to claim 1 or 2, comprising polymerizing an ethylenically unsaturated monomer in the presence of a source of free radicals and the functionalized thin film composite polyamide membrane, resulting in the formation of polymer chains that are covalently bound to the thin film composite membrane.
- Preferences and definitions for the aromatic amine with at least two amine functionalities, the aromatic acyl halide with at least 3 -C(O)CI groups, the RAFT control agent, the ATRP control agent and the NMRP control agent having a glycidyl functionality have been described above and apply equally for the other aspects of the invention.
- the source of initiating radicals can be any suitable method for generating free radicals such as the thermally induced homolytic scission of a suitable compound as thermal initiators such as peroxides and azo compounds; the spontaneous generation from monomer (e.g. styrene), photochemical initiating systems or high energy radiation such as electron beam, X-, UV or gamma radiation.
- the initiator should have the requisite solubility in the reaction media or monomer mixture.
- the source of free radicals is UV-light together with a photoinitiator, ⁇ -radiation, electron beam radiation, a redox pair or heat together with a thermal initiator.
- the source of free radicals i. e. the thermal radical initiator is preferably an azo compound, a peroxide, perester or a hydroperoxide.
- radical sources are 2,2'-azobisisobutyronitrile, 2,2'-azobis(2-methyl- butyronitrile), 2,2'-azobis(2,4-dimethylvaleronitrile), 2,2'-azobis(4-methoxy-2,4-dimethylvale- ronitrile), 1 ,1 '-azobis(1-cyclohexanecarbonitrile), 2,2'-azobis(isobutyramide) dihydrate, 2- phenylazo-2,4-dimethyl-4-methoxyvaleronitrile, dimethyl-2,2'-azobisisobutyrate, 2-
- the radical source is preferably present in an amount of from 0.01 mol-% to 30 mol-%, more preferred in an amount of from 0.1 mol-% to 20 mol-% and most preferred in an amount of from 0.5 mol-% to 10 mol-% based on the monomer or monomer mixture.
- the temperature at which the radical polymerization is typically carried out depends on the origin of the reactive sites of the membrane and the source of free radicals.
- RAFT or ATRP reactive sites are the staring points for polymerization
- a typical reaction temperature between 5° C and 40° C is applied, in particular when X-ray, ⁇ -ray or UV radiation is used.
- the NMRP reactive sites are the starting points for radical polymerization the temperature may vary between 50° C and 150° C, in particular when thermal initiators are used.
- the reaction time is for example from 10 minutes to 24 hours at ambient pressure.
- the monomers suitable for use in the present invention may be water-soluble or water- insoluble.
- Water soluble monomers contain typically a salt of a carboxylic acid group.
- Water insoluble monomers are typically free of acid and phenolic groups.
- Typical metal atoms are Na, K or Li.
- Typical monoethylenically unsaturated monomers free of carboxylic acid and phenolic groups which are suitable for this invention include the alkyl esters of acrylic or methacrylic acids such as methyl acrylate, ethyl acrylate, butyl acrylate, methyl methacrylate, ethyl methacrylate, butyl methacrylate and isobutyl methacrylate; the hydroxyalkyl esters of acrylic or methacrylic acids, such as hydroxyethyl acrylate, hydroxypropyl acrylate, hydroxyethyl methacrylate, and hydroxypropyl methacrylate; acrylamide, methacrylamide, N-tertiary butylacrylamide, N-methylacrylamide, N,N-dimethylacrylamide; acrylonitrile, methacrylonitrile, allyl alcohol, dimethylaminoethyl acrylate, dimethylaminoethyl methacrylate, phosphoethyl me
- Preferred ethylenically unsaturated monomers or oligomers are selected from the group consisting of styrene, substituted styrene, conjugated dienes, acrolein, vinyl acetate, (alkyl)acrylic acidanhydrides, (alkyl)acrylic acid salts, (alkyl)acrylic esters or (alkyl)acrylamides.
- ethylenically unsaturated monomers are styrene, ⁇ -methyl styrene, p- methyl styrene, butadiene, methylacrylate, ethylacrylate, propylacrylate, n-butyl acrylate, tert. -butyl acrylate and acrylnitril.
- Preferred acrylates are methylacrylate, ethylacrylate, butylacrylate, isobutylacrylate, tert. butylacrylate, hydroxyethylacrylate, hydroxypropylacrylate, dimethylaminoethylacrylate, glycidylacrylates, methyl(meth)acrylate, ethyl(meth)acrylate, butyl(meth)acrylate, hydroxyethyl(meth)acrylate, hydroxypropyl(meth)acrylate, dimethylaminoethyl(meth)acrylate, glycidyl(meth)acrylates, acrylonitrile, acrylamide or methacrylamide.
- C 8 -Ci 6 ethylenically unsaturated phenolics which may also be used as comonomers include 4-hydroxy styrene, 4-hydroxy- ⁇ -methyl styrene, and 2,6-ditert. butyl, 4- vinyl phenol.
- carboxylic acid monomers suitable for use as comonomers in this invention are the alkali metal and ammonium salts of C 4 -C6-ethylenically unsaturated dicarboxylic acids. Suitable examples include maleic acid, maleic anhydride, itaconic acid, mesaconic acid, fumaric acid and citraconic acid. Maleic anhydride (and itaconic acid are) is the preferred monoethylenically unsaturated dicarboxylic acid monomer(s).
- the acid monomers suitable for use in this invention are in the form of the alkali metal salts or ammonium salts of the acid.
- the polymerizable composition of the present invention may additionally comprise a solvent selected from the group consisting of water, alcohols, esters, ethers, ketones, amides, sulfoxides, hydrocarbons and halogenated hydrocarbons.
- a solvent selected from the group consisting of water, alcohols, esters, ethers, ketones, amides, sulfoxides, hydrocarbons and halogenated hydrocarbons.
- the weight ratio of functionalized thin film composite polyamide membrane to ethylenically unsaturated monomer is from 10:1 to 1 :10.
- radical polymerization is a living polymerization different monomers can be used subsequently to form a growing block copolymer.
- Random copolymers and tapered copolymer structures can be synthesized as well by using a mixture of monomers or adding a second monomer before the first one is completely consumed.
- the process may be carried out in the presence of an organic solvent or in the presence of water or in mixtures of organic solvents and water. Additional cosolvents or surfactants, such as glycols or ammonium salts of fatty acids, may be present. Other suitable cosolvents are described hereinafter.
- Preferred processes use water as a solvent.
- suitable solvents or mixtures of solvents are typically pure alkanes (hexane, heptane, octane, isooctane), hydrocarbons (benzene, toluene, xylene), halogenated hydrocarbons (chlorobenzene), alkanols (methanol, ethanol, ethylene glycol, ethylene glycol monomethyl ether), esters (ethyl acetate, propyl, butyl or hexyl acetate) and ethers (diethyl ether, dibutyl ether, ethylene glycol dimethyl ether), or mixtures thereof.
- alkanes hexane, heptane, octane, isooctane
- hydrocarbons benzene, toluene, xylene
- chlorobenzene chlorobenzene
- alkanols methanol, ethanol, ethylene glycol, ethylene glycol monomethyl
- the aqueous polymerization reactions can be supplemented with a water-miscible or hydrophilic cosolvent to help ensure that the reaction mixture remains a homogeneous single phase throughout the monomer conversion.
- a water-miscible or hydrophilic cosolvent Any water-soluble or water-miscible cosolvent may be used, as long as the aqueous solvent medium is effective in providing a solvent system which prevents precipitation or phase separation of the reactants or polymer products until after all polymerization reactions have been completed.
- Exemplary cosolvents useful in the present invention may be selected from the group consisting of aliphatic alcohols, glycols, ethers, glycol ethers, pyrrolidines, N-alkyl pyrrolidinones, N-alkyl pyrrolidones, polyethylene glycols, polypropylene glycols, amides, carboxylic acids and salts thereof, esters, organosulfides, sulfoxides, sulfones, alcohol derivatives, hydroxyether derivatives such as butyl carbitol or cellosolve, amino alcohols, ketones, and the like, as well as derivatives thereof and mixtures thereof.
- the water to cosolvent weight ratio is typically in the range of about 100:0 to about 10:90.
- the monomers, polymers, copolymers and modified functionalized TFC polyamide membranes of the present invention can be separated from one another or from the polymerization reaction mixture by washing the membrane with the suitable solvent. After the polymerizing step is complete, the modified functionalized TFC polyamide membrane obtained is isolated.
- the isolating step of the present process is conducted by known procedures, e.g. by washing the membrane with a suitable solvent and drying it under vacuum.
- the (co)polymers of the present invention may have a number average molecular weight from 1000 to 400000 g/mol, preferably from 2000 to 250000 g/mol, and more preferably from 2000 to 200000 g/mol.
- the number average molecular weight When produced in bulk, the number average molecular weight may be up to 500000 g/mol (with the same minimum weights as mentioned above).
- the number average molecular weight may be determined by analyzing the non-grafted polymer formed during the reaction. The characterization may be by size exclusion chromatography (GPC), matrix assisted laser desorption/ionization mass spectroscopy (MALDI-MS) or, if the initiator carries a group which can be easily distinguished from the monomer(s), by NMR spectroscopy or other conventional methods.
- the modified functionalized TFC polyamide membranes prepared by the present invention may be employed in water purification processes, separation processes such as the desalination of water or brackish water; other treatments of water such as softening of hard water whereby salts are removed.
- Microporous polysulfone membranes are used as received. Reagent grade chemicals are used as received.
- the RAFT CTA acid chloride of formula (XIII) is prepared according to the bibliography.
- Diethyl 5-hydroxymethylisophthalate is prepared according to the method of Leon et al. (J. W. Leon et al., J. Am. Chem. Soc. 1996, 118, 8847-8859). This is used to prepare the ATRP acid chloride initiator of formula (XII) as outlined in Example 1.
- the RAFT CTA acid chloride of formula (XIV) is prepared as outlined in Example 2. is obtained from Ciba and used as received. It has been prepared according to WO 02/48109. lnterfacial polymerization reactions are performed at room temperature. Trimesoyl chloride, m-phenylene diamine, ethyl 2-bromoisobutyrate, methyl -2-bromopropionate, 2- bromoisobutyryl bromide and cyclohexane are used as received. Water and acrylic acid are distilled before use. ⁇ /-isopropyl acrylamide as passed through a column of alkaline aluminium oxide prior to use.
- N,N,N',N',N",N"-Hexamethyl tris(aminoethyl) amine is prepared according to the method of Ciampolini et al. (Inorg. Chem. 1966, 5, 41 -44).
- Bis( ⁇ , ⁇ -dimethyl acetic acid) trithiocarbonate is synthesized according to the method of J. T. Lai et al. (Macromolecules, 2002, 35, 6754-6756).
- Gamma radiation initiated RAFT polymerization reactions are carried out in an insulated room with a 60 Co source with a dose rate of 30 Gy. h "1 at ambient temperature.
- Attenuated Total Reflected Fourier Spectroscopy (ATR-FTIR) measurements are performed using Bruker FRA 106S Fourier transform spectrometer.
- XPS X-ray Al k alpha source
- Pass energy 10OeV for wide scans or 2OeV for region scans
- spectral step size 1 eV for wide scans or 0.1 eV for region scans.
- the NMR spectra are recorded on a Bruker AC200 (200 MHz for 1 H NMR) spectrometer.
- Example 3 Synthesis of RAFT-functionalized TFC polyamide membrane by interfacial polymerization of m-phenylenediamine (MPD), trimesoyl chloride (TMC) and RAFT CTA acid chloride (XIII) on microporous polysulfone membrane.
- MPD m-phenylenediamine
- TMC trimesoyl chloride
- XIII RAFT CTA acid chloride
- aqueous solution containing 3% w/v of MPD and an organic solution containing a mixture of TMC (0.1 % w/v) and of RAFT CTA acid chloride (XV) (0.1 % w/v) in cyclohexane are prepared.
- the polysulfone microporous substrate is then fixed on a glass flat support and soaked with the aqueous solution containing the MPD. After 2 minutes the excess solution is drained off the surface.
- the organic solution (TMC + XV in cyclohexane) is then poured onto the soaked polysulfone surface and allowed to react during 10 seconds.
- the film is dried with a hot air flow, ished 3 times with distilled water and dried under vacuum at 60 0 C for 12 h.
- XPS analysis C 74%, O 21 %, N 0.46%, S 3.46%.
- Contact angle 89°.
- Example 4 Synthesis of RAFT-functionalized TFC polyamide membrane by interfacial polymerization of m-phenylenediamine (MPD), trimesoyl chloride (TMC) and RAFT CTA acid chloride (XIV) on microporous polysulfone membrane.
- MPD m-phenylenediamine
- TMC trimesoyl chloride
- XIV RAFT CTA acid chloride
- aqueous solution containing 2% w/v of MPD and an organic solution containing a mixture of TMC (0.075% w/v) and of RAFT CTA acid chloride (XVI) (0.025% w/v) in cyclohexane are prepared.
- the polysulfone microporous substrate is soaked with the aqueous solution containing the MPD. After 2 minutes the excess solution is drained off the surface.
- the organic solution (TMC + XVI in cyclohexane) is then poured onto the soaked polysulfone surface and allowed to react during 10 seconds.
- the film is dried with a hot air flow, washed 3 times with distilled water and dried under vacuum at 60 0 C for 12 h.
- XPS analysis C 69.8%,
- Example 5 Polymerization of N-isopropyl acrylamide on RAFT functionalized TFC polyamide membranes using ⁇ -radiation.
- N-isopropylacrylamide (35 mmol) and XIII (0.03 mmol) are dissolved in 24 ml of water and stirred at room temperature during 20 minutes.
- the RAFT functionalized TFC polyamide membrane (Example 3) is placed in a glass sample vial containing 3 ml of the aqueous solution previously prepared. The vial is capped with a rubber septum and deoxygenated by purging with nitrogen gas for 15 min. The sample is placed in an insulated room with a 60 Co source with a dose rate of 30 Gy.h "1 at ambient temperature. After 4h of reaction, the membrane is washed with distilled water during 3 days and dried under vacuum.
- XPS analysis C 69.21 %, O 17.45%, N 2.90%, S 1.62%. Contact angle: 55° (after 5 seconds).
- Example 6 Polymerization of Acrylic Acid on RAFT Functionalized TFC Polyamide membranes using UV-radiation.
- Acrylic acid (300 mmol), XIII (0.15 mmol) and UV-initiator (2-methyl-4'-(methylthio)-2- morpholinopropriophenone) (0.015 mmol) are dissolved in 24 ml. of water and stirred at room temperature during 20 minutes.
- the RAFT functionalized TFC polyamide membrane (Example 3) is placed in a glass sample vial containing 3 ml of the aqueous solution previously prepared. The vial is capped with a rubber septum and deoxygenated by purging with nitrogen gas for 15 minutes. The sample is placed in an insulated room with a UV source at ambient temperature. After 4h of reaction, the membrane is washed with distilled water during 3 days and dried under vacuum.
- Example 7 Polymerization of N-isopropyl acrylamide on RAFT Functionalized TFC Polyamide membranes using thermal initiation.
- N-isopropylacrylamide (5.5 g), bis( ⁇ , ⁇ -dimethylacetic acid) trithiocarbonate (57 mg) and VA- 044 (270 mg) are dissolved in 100 ml of phosphate buffer (pH 7) and stirred at room temperature during 20 minutes.
- the RAFT functionalized TFC polyamide membrane (Example 4) is placed in a glass sample vial containing 10 ml of the aqueous solution previously prepared. The vial is deoxygenated by purging with nitrogen gas for 15 min. The sample is placed in a nitrogen-filled vacuum oven at ambient temperature. After 16h of reaction, the membrane is washed with distilled water during 3 days and dried under vacuum.
- XPS analysis C 73.6%, O 14.5%, N 10.8%, S 1.1%.
- Example 8 Synthesis of ATRP-functionalized TFC polyamide membrane by interfacial polymerization of m-phenylenediamine (MPD), trimesoyl chloride (TMC) and 2- bromoisobutyryl bromide on microporous polysulfone membrane.
- MPD m-phenylenediamine
- TMC trimesoyl chloride
- 2- bromoisobutyryl bromide on microporous polysulfone membrane.
- aqueous solution containing 2% w/v of MPD and an organic solution containing a mixture of TMC (0.05% w/v) and of 2-bromoisobutyryl bromide (0.05% w/v) in cyclohexane are prepared.
- the polysulfone microporous substrate is soaked with the aqueous solution containing the MPD. After 2 minutes the excess solution is drained off the surface.
- the organic solution (TMC + bromoisobutyryl bromide) is then poured onto the soaked polysulfone surface and allowed to react during 10 seconds. The film is dried, washed 3 times with distilled water and dried under vacuum at 60 0 C for 12 h.
- Example 9 Synthesis of ATRP-functionalized TFC polyamide membrane by interfacial polymerization of m-phenylenediamine (MPD), trimesoyl chloride (TMC) and 5- chloromethyl isophthaloyl chloride (X) on microporous polysulfone membrane.
- MPD m-phenylenediamine
- TMC trimesoyl chloride
- X 5- chloromethyl isophthaloyl chloride
- aqueous solution containing 2% w/v of MPD and an organic solution containing a mixture of TMC (0.09% w/v) and of X (0.01% w/v) in cyclohexane are prepared.
- the polysulfone microporous substrate is soaked with the aqueous solution containing the MPD. After 2 minutes the excess solution is drained off the surface.
- the organic solution (TMC + X) is then poured onto the soaked polysulfone surface and allowed to react during 10 seconds. The film is dried, washed 3 times with distilled water and dried under vacuum at 60 0 C for 12 h.
- XPS analysis C 69.6%, O 23.1 %, N 6.8%, Cl 0.6%. Contact angle: 37°.
- Example 10 Synthesis of NMRP-functionalized TFC polyamide membrane by interfacial polymerization of m-phenylenediamine (MPD), trimesoyl chloride (TMC) and CGX-PR774 (XIIa) on microporous polysulfone membrane.
- MPD m-phenylenediamine
- TMC trimesoyl chloride
- XIIa CGX-PR774
- aqueous solution containing 2% w/v of MPD and an organic solution containing a mixture of TMC (0.05% w/v) and of XII (0.05% w/v) in cyclohexane are prepared.
- the polysulfone microporous substrate is soaked with the aqueous solution containing the MPD. After 2 minutes the excess solution is drained off the surface.
- the organic solution (TMC + XII) is then poured onto the soaked polysulfone surface and allowed to react during 10 seconds.
- the film is dried in an oven at 80 0 C for 30 min, washed 3 times with distilled water and dried under vacuum at 60°C for 12 h.
- XPS analysis C 70.0%, O 21.9%, N 6.6%.
- Example 11 Polymerization of N-isopropyl acrylamide on ATRP Functionalized TFC Polyamide membranes in presence of sacrificial initiator.
- N-isopropylacrylamide (5 g), N,N,N',N',N",N"-hexamethyl tris(aminoethyl)amine (Me ⁇ tren, 407 mg) is dissolved in 100 ml of distilled water degassed by sparging with N 2 during 20 minutes. CuCI (43.7 mg) and CuCI 2 (1 19 mg) is added and degassing is continued for 40 minutes.
- the ATRP functionalized TFC polyamide membrane (Example 8) is placed in a glass sample vial containing 15 ml of the aqueous solution previously prepared. Methyl 2- bromopropionate (8 ⁇ l_) is added to the vial, which is purged by sparging with N 2 gas for 1 minute, then sealed. After 3h of reaction at ambient temperature, the membrane is washed with distilled water during 3 days and dried under vacuum. XPS analysis: C 77.3%, O 11.3%, N 11.3%. Conversion (NMR of bulk solution) 90.0%.
- Example 12 Polymerization of N-isopropyl acrylamide on ATRP Functionalized TFC Polyamide membranes in presence of sacrificial initiator.
- N-isopropylacrylamide (5 g) N,N,N',N',N",N"-hexamethyl tris(aminoethyl)amine (Me 6 tren, 407 mg) is dissolved in 100 ml of distilled water degassed by sparging with N 2 during 20 minutes.
- CuCI (43.7 mg) and CuCI 2 (1 19 mg) is added and degassing is continued for 40 minutes.
- the ATRP functionalized TFC polyamide membrane (Example 9) is placed in a glass sample vial containing 15 ml of the aqueous solution previously prepared.
- Methyl 2- bromopropionate (10 ⁇ l_) is added to the vial, which is purged by sparging with N 2 gas for 1 minute, then sealed. After 30 min of reaction at ambient temperature, the membrane is washed with distilled water during 3 days and dried under vacuum. XPS analysis: C 74.2%, O 13.5%, N 12.3%. Conversion (NMR of bulk solution): 97.2%.
- Example 13 Polymerization of N-isopropyl acrylamide on ATRP Functionalized TFC Polyamide membranes without sacrificial initiator.
- N-isopropylacrylamide (5 g), N,N,N',N',N",N"-hexamethyl tris(aminoethyl)amine (Me 6 tren, 407 mg) is dissolved in 100 ml of distilled water degassed by sparging with N 2 during 20 minutes. CuCI (43.7 mg) and CuCI 2 (1 19 mg) is added and degassing is continued for 40 minutes.
- the ATRP functionalized TFC polyamide membrane (Example 8) is placed in a glass sample vial containing 15 ml of the aqueous solution previously prepared. The vial is purged by sparging with N 2 gas for 1 minute, then sealed. After 24h of reaction at ambient temperature, the membrane is washed with distilled water during 3 days and dried under vacuum. XPS analysis: C 75.3%, O 12.7%, N 12.0%. NMR analysis showed negligible polymerization had occurred in the solution.
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Priority Applications (16)
Application Number | Priority Date | Filing Date | Title |
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MX2011001208A MX2011001208A (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes. |
US13/056,687 US8544658B2 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
BRPI0917221A BRPI0917221A2 (en) | 2008-08-05 | 2009-08-03 | methods for the preparation and modification of a functionalized thin film composite polyamide membrane on a microporous substrate, and functionalized thin film composite polyamide membrane. |
CN2009801303511A CN102112214A (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
DK09804553T DK2313184T3 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
PL09804553T PL2313184T3 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
ES09804553T ES2397073T3 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
EP20090804553 EP2313184B1 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
AU2009279188A AU2009279188B2 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
CA2732873A CA2732873A1 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide membranes |
JP2011521551A JP5431478B2 (en) | 2008-08-05 | 2009-08-03 | Functionalized thin film polyamide film |
RU2011108403/05A RU2519377C9 (en) | 2008-08-05 | 2009-08-03 | Functionalised thin-film polyamide membranes |
TN2011000032A TN2011000032A1 (en) | 2009-08-03 | 2011-01-26 | Functionalized thin film polyamide membranes |
EG2011020195A EG26765A (en) | 2008-08-05 | 2011-02-06 | Functionalized thin film polyamide membranes |
MA33645A MA32585B1 (en) | 2008-08-05 | 2011-02-24 | Thin-film polyamide membranes |
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WO2013114300A1 (en) * | 2012-01-31 | 2013-08-08 | Polymers Crc Ltd. | Active modified acrylic coatings for improved bio-fouling resistance of reverse osmosis membranes |
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US20140224728A1 (en) * | 2012-11-30 | 2014-08-14 | Lg Chem, Ltd. | Water treatment membrane having high chlorine resistance and high permeability and method of manufacturing the same |
US8925738B2 (en) * | 2012-11-30 | 2015-01-06 | Lg Chem, Ltd. | Water treatment membrane having high chlorine resistance and high permeability and method of manufacturing the same |
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ES2397073T3 (en) | 2013-03-04 |
JP5431478B2 (en) | 2014-03-05 |
KR20110042343A (en) | 2011-04-26 |
CA2732873A1 (en) | 2010-02-11 |
AU2009279188A1 (en) | 2010-02-11 |
MA32585B1 (en) | 2011-08-01 |
RU2519377C2 (en) | 2014-06-10 |
CN102112214A (en) | 2011-06-29 |
RU2011108403A (en) | 2012-09-10 |
RU2519377C9 (en) | 2015-03-20 |
MX2011001208A (en) | 2012-06-29 |
DK2313184T3 (en) | 2013-01-21 |
EP2313184B1 (en) | 2012-10-10 |
US20110189469A1 (en) | 2011-08-04 |
EP2313184A1 (en) | 2011-04-27 |
PT2313184E (en) | 2013-01-10 |
PL2313184T3 (en) | 2013-03-29 |
US8544658B2 (en) | 2013-10-01 |
JP2011529789A (en) | 2011-12-15 |
AU2009279188B2 (en) | 2016-05-26 |
ZA201101606B (en) | 2012-05-30 |
BRPI0917221A2 (en) | 2015-11-24 |
EG26765A (en) | 2014-08-17 |
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